JPH07253276A - Heat treating furnace, and manufacture thereof - Google Patents

Heat treating furnace, and manufacture thereof

Info

Publication number
JPH07253276A
JPH07253276A JP6071552A JP7155294A JPH07253276A JP H07253276 A JPH07253276 A JP H07253276A JP 6071552 A JP6071552 A JP 6071552A JP 7155294 A JP7155294 A JP 7155294A JP H07253276 A JPH07253276 A JP H07253276A
Authority
JP
Japan
Prior art keywords
insulating material
heat insulating
heat
support
heating resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6071552A
Other languages
Japanese (ja)
Inventor
Masaru Hidano
勝 肥田野
Takaaki Miura
恭彰 三浦
Osamu Yokogawa
修 横川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Tokyo Electron Tohoku Ltd
Original Assignee
Tokyo Electron Ltd
Tokyo Electron Tohoku Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Tokyo Electron Tohoku Ltd filed Critical Tokyo Electron Ltd
Priority to JP6071552A priority Critical patent/JPH07253276A/en
Priority to US08/337,366 priority patent/US5506389A/en
Priority to JP6300298A priority patent/JP2840558B2/en
Priority to KR1019940029435A priority patent/KR100235548B1/en
Priority to TW083110430A priority patent/TW273637B/zh
Publication of JPH07253276A publication Critical patent/JPH07253276A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide a heat treating furnace and a method for manufacturing the same in which operability is improved, a manufacturing time is shortened, and an accuracy of an arranging pitch of heat generating resistors is improved. CONSTITUTION:A heat treating furnace 1 comprises spiral heat generating resistors 9 along an inner wall surface of a cylindrical heat insulator 10, and a support 18 divided into a plurality in an axial direction of the insulator 10 to support the resistors 9. The supports 18 have a plurality of support pieces extended radially outward via pitches of the resistors 9 at a base disposed inside the resistors 9, wherein the ends of the pieces are buried in the insulator 10. Thus, since its structure is simplified, its manufacture is facilitated, operability is improved, its manufacturing time is shortened, and an accuracy of arranging pitch of the resistors 9 is improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、熱処理炉及びその製造
方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat treatment furnace and its manufacturing method.

【0002】[0002]

【従来の技術】被処理体である例えば半導体ウエハの製
造においては、酸化、拡散、CVD(Chemical Vapor D
eposition)などの処理を行うために、各種の熱処理装
置が用いられている。そして、その一般的な熱処理装置
は、半導体ウエハを収容して処理するための処理室を形
成するプロセスチューブと、このプロセスチューブの周
囲に設けられた発熱抵抗体からなるヒータと、このヒー
タの周囲に設けられた断熱材とで熱処理炉を構成し、そ
の断熱材の内壁面に前記発熱抵抗体が設置されている。
2. Description of the Related Art In manufacturing a semiconductor wafer, which is an object to be processed, oxidation, diffusion, CVD (Chemical Vapor D
Various heat treatment apparatuses are used to perform processing such as eposition). In addition, the general heat treatment apparatus includes a process tube that forms a processing chamber for accommodating and processing a semiconductor wafer, a heater that is provided around the process tube and that includes a heating resistor, and the periphery of the heater. A heat treatment furnace is constituted by the heat insulating material provided in the heat insulating material, and the heat generating resistor is installed on the inner wall surface of the heat insulating material.

【0003】前記発熱抵抗体としては、例えばバッチ処
理が可能な熱処理装置の場合でいうと、筒状の断熱材の
内壁面に沿って螺旋状に設けられるヒータ線が用いら
れ、炉室内を例えば1200℃程度まで高温加熱するよ
うになっている。また、前記断熱材としては、例えばセ
ラミックファイバ等が用いられ、輻射熱及び伝導熱とし
て奪われる熱量を減少させて効率のよい加熱を助長でき
るようになっている。
As the heating resistor, for example, in the case of a heat treatment apparatus capable of batch processing, a heater wire spirally provided along the inner wall surface of a cylindrical heat insulating material is used, for example, in a furnace chamber. It is designed to be heated to a high temperature of about 1200 ° C. Further, as the heat insulating material, for example, a ceramic fiber or the like is used, and the amount of heat taken as radiant heat and conductive heat can be reduced to promote efficient heating.

【0004】ところで、前記断熱材に発熱抵抗体を設置
する場合の方法としては、例えば特開昭60−2465
82号公報に記載された方法がある。この方法は、発熱
抵抗体としてコイル状のヒータ線を用い、このヒータ線
に熱収縮チューブを被覆して熱収縮させることでヒータ
線の配列ピッチを固定した後、円柱状の中心型に窓型を
螺旋状に巻き付けると共にこの窓型上に沿って前記ヒー
タ線を巻き付ける。
By the way, as a method for installing a heating resistor on the heat insulating material, for example, Japanese Patent Laid-Open No. 60-2465 is used.
There is a method described in Japanese Patent Publication No. 82. In this method, a coil-shaped heater wire is used as a heating resistor, and the heater wire is covered with a heat-shrinkable tube to be heat-shrinked to fix the array pitch of the heater wires, and then a window-shaped center type is used. Is spirally wound and the heater wire is wound along the window mold.

【0005】次いで、前記中心型に底型及び外型を配置
する型枠の組立を行い、この型枠内にモルタル状の断熱
材を充填する。そして、その断熱材を硬化させた後、離
型、乾燥及び焼成を順次行うことにより、熱収縮チュー
ブが溶解したヒータ線が断熱材の内壁面の放熱窓から臨
んだ状態で埋め込まれた断熱材を得る。
Next, a mold for arranging the bottom mold and the outer mold in the central mold is assembled, and the mold is filled with a mortar-shaped heat insulating material. Then, after the heat insulating material is cured, release, drying, and firing are sequentially performed, so that the heater wire in which the heat-shrinkable tube is melted is embedded in a state that the heater wire faces the heat dissipation window on the inner wall surface of the heat insulating material. To get

【0006】[0006]

【発明が解決しようとする課題】しかしながら、前述し
た方法では、ヒータ線に対する熱収縮チューブの被覆、
中心型に対する窓型及び前記ヒータ線の巻き付け、型枠
の組立及び離型、断熱材の硬化、乾燥及び焼成等、作業
工程を多く必要とし、作業性が悪く、製造時間が多くか
かるという問題がある。また、ヒータ線を所定の配列ピ
ッチで螺旋状に形成するに際しては、作業者の経験に頼
るところが多いため、高い精度を得ることが難しい。
However, in the method described above, the coating of the heat shrinkable tube on the heater wire,
There is a problem that many work steps are required such as winding of the window type and the heater wire with respect to the center type, assembling and releasing of the form, curing of the heat insulating material, drying and baking, and the workability is poor and the manufacturing time is long. is there. Further, when forming the heater wires in a spiral shape at a predetermined arrangement pitch, it is difficult to obtain high accuracy because the operator's experience is often used.

【0007】そこで、本発明の目的は、前記問題点を解
決し、作業性の向上及び製造時間の短縮が図れると共
に、発熱抵抗体の配列ピッチの精度の向上が図れる熱処
理炉及びその製造方法を提供することにある。
Therefore, an object of the present invention is to provide a heat treatment furnace and a manufacturing method thereof which can solve the above problems, improve workability and shorten the manufacturing time, and improve the accuracy of the arrangement pitch of the heating resistors. To provide.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
に請求項1記載の発明は、筒状の断熱材の内壁面に沿っ
て螺旋状の発熱抵抗体を備えた熱処理炉であって、前記
断熱材の軸方向に複数に分割されて前記発熱抵抗体を支
持する支持体を有し、各支持体は前記発熱抵抗体の内側
に位置する基部にその発熱抵抗体のピッチ間を通って径
方向外方へ延出する複数本の支持片を形成してなり、こ
れら支持片の先端部が前記断熱材に埋設されていること
を特徴とする。
In order to achieve the above object, the invention according to claim 1 is a heat treatment furnace provided with a spiral heating resistor along an inner wall surface of a cylindrical heat insulating material, There is a support body that is divided into a plurality of in the axial direction of the heat insulating material and supports the heating resistor, and each support passes through the pitch of the heating resistor on the base located inside the heating resistor. It is characterized in that a plurality of support pieces extending outward in the radial direction are formed, and the tips of these support pieces are embedded in the heat insulating material.

【0009】また、請求項2記載の発明は、請求項1記
載における前記発熱抵抗体が、前記断熱材を貫通して外
部に延出された端子板を断熱材の軸方向に適宜間隔で有
し、且つこれら端子板の板面が前記断熱材の軸方向に沿
って配置されていることを特徴とする。
According to a second aspect of the present invention, the heat generating resistor according to the first aspect has terminal plates extending through the heat insulating material to the outside at appropriate intervals in the axial direction of the heat insulating material. In addition, the plate surfaces of these terminal boards are arranged along the axial direction of the heat insulating material.

【0010】更に、請求項3記載の発明は、筒状の断熱
材の内壁面に螺旋状の発熱抵抗体を備えた熱処理炉の製
造方法であって、外側に軸方向に適宜間隔で且つ板面が
軸方向に沿って配置された端子板を有する螺旋状の発熱
抵抗体と、この発熱抵抗体の内側に位置する基部にその
発熱抵抗体のピッチ間を通って径方向外方へ延出する複
数本の支持片を形成してなる支持体及びこの支持体を発
熱抵抗体の周方向で所定位置に位置決めして軸方向に整
列させる治具とを準備し、この治具を回転させながら治
具上に前記支持体を介して前記発熱抵抗体を装着する工
程と、前記発熱抵抗体の外周に前記端子板及び支持体の
支持片を避けてろ過材を配置し、このろ過材上に前記発
熱抵抗体の軸方向に沿う細径の棒材を周方向に適宜間隔
で配置する工程と、前記発熱抵抗体を断熱材料をなす無
機質繊維を含む懸濁液中に浸漬させて発熱抵抗体の内側
からの吸引により前記ろ過材上に前記断熱材料を堆積さ
せる工程と、この堆積した断熱材料を乾燥させる工程
と、乾燥後に断熱材と前記ろ過材との間から前記棒材を
抜き取り、更に断熱材と前記発熱抵抗体との間から前記
ろ過材を抜き取る工程と、前記治具を前記支持体から除
去する工程とを備えたことを特徴とする。
Further, a third aspect of the present invention is a method for manufacturing a heat treatment furnace in which a spiral heating resistor is provided on the inner wall surface of a cylindrical heat insulating material, and the plates are arranged outside at appropriate intervals in the axial direction. A spiral heating resistor having a terminal plate whose surface is arranged along the axial direction, and a base located inside the heating resistor that extends radially outward through the pitch of the heating resistor. Prepare a support formed by forming a plurality of support pieces and a jig for positioning the support at a predetermined position in the circumferential direction of the heating resistor and aligning it in the axial direction, while rotating the jig. A step of mounting the heating resistor on the jig via the support, and a filter medium is disposed on the outer periphery of the heat resistor avoiding the terminal plate and the supporting piece of the support, and the filter medium is placed on the filter. A step of arranging thin rods along the axial direction of the heating resistor at appropriate intervals in the circumferential direction; A step of immersing the heating resistor in a suspension containing inorganic fibers forming a heat insulating material and depositing the heat insulating material on the filter medium by suction from the inside of the heat generating resistor; and A step of drying, a step of extracting the rod material from between the heat insulating material and the filter material after drying, and a step of extracting the filter material from between the heat insulating material and the heat generating resistor; And a step of removing the same from the above.

【0011】[0011]

【作用】請求項1記載の発明によれば、筒状の断熱材の
内壁面に螺旋状の発熱抵抗体のピッチ間を通って径方向
外方へ延出する複数本の支持片を有する支持体をその支
持片の先端部が断熱材に埋設する状態で断熱材の軸方向
に配列して発熱抵抗体を支持する簡単な構造となり、前
記支持体の複数の支持片が発熱抵抗体の配列ピッチを設
定する。このため、製造が容易で作業性の向上及び製造
時間の短縮が図れると共に、発熱抵抗体の配列ピッチの
精度の向上が図れる。また、前記支持片は個々に独立し
ているのではなく、支持体の基部に複数本ずつ形成され
ているため、強度の向上が図れると共に形崩れすること
もなく、発熱抵抗体を安定して支持することが可能とな
り、また、隣り合う支持片間の隙間で発熱抵抗体の径方
向への熱膨張及び熱収縮を許容することが可能となる。
According to the invention as set forth in claim 1, a support having a plurality of support pieces extending radially outward on the inner wall surface of the cylindrical heat insulating material through the pitches of the spiral heating resistors. The body has a simple structure that supports the heat generating resistor by arranging the body in the axial direction of the heat insulating material in a state where the tip of the support piece is embedded in the heat insulating material. Set the pitch. Therefore, the manufacturing is easy, the workability is improved, the manufacturing time is shortened, and the accuracy of the arrangement pitch of the heating resistors is improved. In addition, since the support pieces are not independent, but are formed in plurality at the base of the support body, the strength can be improved and the shape can be maintained, so that the heating resistor can be stabilized. It is possible to support, and it is possible to allow the thermal expansion and contraction of the heating resistor in the radial direction in the gap between the adjacent support pieces.

【0012】請求項2記載の発明によれば、発熱抵抗体
に設けられた端子板の板面が断熱材の軸方向に沿って配
置されているため、製造工程で発熱抵抗体と断熱材との
間に介設されたろ過材を抜き取る際に、ろ過材が端子板
に引っ掛かることがなく、ろ過材を容易に抜き取ること
が可能となり、作業性が更に向上する。
According to the second aspect of the present invention, since the plate surface of the terminal plate provided on the heat generating resistor is arranged along the axial direction of the heat insulating material, the heat generating resistor and the heat insulating material are formed in the manufacturing process. When the filter material provided between the two is removed, the filter material does not get caught on the terminal plate, and the filter material can be easily removed, further improving workability.

【0013】請求項3記載の発明によれば、発熱抵抗体
が予め螺旋状に形成されており、この発熱抵抗体の内側
に位置する基部にその発熱抵抗体のピッチ間を通って径
方向外方へ延出する複数本の支持片を形成してなる支持
体及びこの支持体を発熱抵抗体の周方向で所定位置に位
置決めして軸方向に整列させる治具を用い、この治具を
回転させながらこの治具に前記支持体を介して前記発熱
抵抗体を装着するため、発熱抵抗体を螺旋状に巻き付け
る手間が省け、しかも、前記支持片によって発熱抵抗体
の配列ピッチが自動的に設定されることから配列の手間
も省ける。
According to the third aspect of the present invention, the heating resistor is preliminarily formed in a spiral shape, and the base portion located inside the heating resistor passes through the pitch of the heating resistor and is radially outside. Rotate this jig by using a support formed of a plurality of support pieces extending in one direction and a jig that positions this support at a predetermined position in the circumferential direction of the heating resistor and aligns it axially. Since the heating resistors are mounted on this jig via the support while being done, the labor of winding the heating resistors in a spiral shape is saved, and the array pitch of the heating resistors is automatically set by the support piece. Since it is done, the labor of arrangement can be saved.

【0014】また、発熱抵抗体の外側に断熱材を設ける
場合には、単に懸濁液中に浸漬された発熱抵抗体の内側
からの吸引のみで発熱抵抗体の外側に断熱材料を堆積さ
せることにより断熱材を形成することができるので、型
枠の組立や離型作業が不要であり、しかも、断熱材は乾
燥するだけでよく、焼成工程が不要であることから、短
時間で形成することが可能となる。更に、発熱抵抗体と
断熱材との間に介設されたろ過材を抜き取る場合には、
ろ過材と断熱材との間に介設された棒材を抜き取ること
によりろ過材と断熱材との間に隙間が生じること、及び
端子板の板面が断熱材の軸方向に配置されていてろ過材
が端子板に引っ掛かり難いことから、ろ過材を容易に抜
き取ることが可能となる。以上により熱処理炉を製造す
る場合における作業性の向上及び製造時間の短縮が図れ
ると共に、発熱抵抗体の配列ピッチの精度の向上が図れ
る。
When the heat insulating material is provided on the outside of the heat generating resistor, the heat insulating material is deposited on the outer side of the heat generating resistor simply by suction from the inside of the heat generating resistor immersed in the suspension. Since it is possible to form the heat insulating material, it is not necessary to assemble and release the mold, and the heat insulating material only needs to be dried and the firing process is not necessary. Is possible. Furthermore, when removing the filter material interposed between the heating resistor and the heat insulating material,
There is a gap between the filter material and the heat insulating material due to the removal of the bar material interposed between the filter material and the heat insulating material, and the plate surface of the terminal board is arranged in the axial direction of the heat insulating material. Since it is difficult for the filter material to be caught on the terminal plate, the filter material can be easily removed. As described above, it is possible to improve the workability in manufacturing the heat treatment furnace, shorten the manufacturing time, and improve the accuracy of the arrangement pitch of the heating resistors.

【0015】[0015]

【実施例】以下に、本発明の実施例を添付図面に基づい
て詳述する。
Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

【0016】図1は本発明の一実施例である熱処理炉の
全体構成を示す縦断面図である。この熱処理炉1は、被
処理体である半導体ウエハWに減圧CVDによる成膜処
理を施すのに適するように構成された縦型炉であり、中
央部に円形の開口部2aを有する例えばステンレススチ
ール製のベースプレート2を水平に備えている。
FIG. 1 is a vertical sectional view showing the overall construction of a heat treatment furnace which is an embodiment of the present invention. The heat treatment furnace 1 is a vertical furnace configured to be suitable for performing a film forming process by a low pressure CVD on a semiconductor wafer W which is an object to be processed, and has a circular opening 2a in a central portion thereof, for example, stainless steel. The base plate 2 made of is horizontally provided.

【0017】このベースプレート2の下部には耐熱性金
属例えばステンレススチール製の短い筒状のマニホール
ド3が前記開口部2aと軸心を一致させてボルト止めに
より着脱可能に取付けられ、このマニホールド3上には
処理室を形成する耐熱性材料例えば石英からなる円筒状
のプロセスチューブ4が設けられている。このプロセス
チューブ4は、本実施例の場合、上下両端部が開放され
た内管5と、上端部が閉塞された外管6とを同心円状に
配した二重管構造になっているが、外管のみからなって
いてもよい。
A short cylindrical manifold 3 made of a heat-resistant metal, such as stainless steel, is detachably attached to the lower portion of the base plate 2 by bolting with the shaft center aligned with the opening 2a. Is provided with a cylindrical process tube 4 made of a heat-resistant material such as quartz for forming the processing chamber. In the case of this embodiment, the process tube 4 has a double pipe structure in which an inner pipe 5 whose upper and lower ends are open and an outer pipe 6 whose upper end is closed are concentrically arranged. It may consist of the outer tube only.

【0018】このマニホールド3にはプロセスチューブ
4内に図示しない処理ガス供給源からの処理ガスを導入
するための入口ポート7と、プロセスチューブ4内を図
示しない減圧手段により排気して例えば10〜10-8
orr程度に真空引きするための出口ポート8が設けら
れている。前記プロセスチューブ4の周囲にはプロセス
チューブ4内を高温例えば800〜1200℃程度に加
熱するヒータとして後述の発熱抵抗体9及びこれを包囲
する円筒状の断熱材10が設けられ、この断熱材10の
外側は例えばステンレススチール製の図示しないアウタ
ーシェルで覆われている。なお、これら断熱材10及び
アウターシェルは前記ベースプレート2上に支持されて
いる。
An inlet port 7 for introducing a processing gas from a processing gas supply source (not shown) into the process tube 4 is provided in the manifold 3, and the inside of the process tube 4 is exhausted by a decompressing means (not shown) to, for example, 10 to 10. -8 T
An outlet port 8 for vacuuming to about orr is provided. A heating resistor 9 to be described later and a cylindrical heat insulating member 10 surrounding the heat resistor 9 are provided around the process tube 4 as a heater for heating the inside of the process tube 4 to a high temperature, for example, about 800 to 1200 ° C. Is covered with an outer shell (not shown) made of, for example, stainless steel. The heat insulating material 10 and the outer shell are supported on the base plate 2.

【0019】前記マニホールド3の下方にはその下面開
口(炉口)を開閉する例えばステンレススチール製の蓋
体11が昇降機構12により昇降可能に設けられ、この
蓋体11上には多数枚例えば150枚程度の半導体ウエ
ハWを水平状態で上下方向に間隔をおいて多段に保持す
るウエハボート13が保温筒14を介して載置されてい
る。なお、蓋体11には保温筒14を回転駆動する回転
機構15等が設けられている。
Below the manifold 3, a lid 11 made of, for example, stainless steel for opening and closing the lower surface opening (furnace port) is provided so as to be able to move up and down by an elevating mechanism 12, and a large number of sheets, for example 150 A wafer boat 13 that holds a plurality of semiconductor wafers W in a horizontal state in multiple stages at intervals in the vertical direction is mounted via a heat insulating cylinder 14. It should be noted that the lid 11 is provided with a rotation mechanism 15 and the like for rotationally driving the heat retaining cylinder 14.

【0020】一方、前記発熱抵抗体9は、例えば鉄(F
e)、クロム(Cr)及びアルミニウム(Al)の合金
線であるカンタル線からなり、その太さは熱処理炉1の
仕様によっても異なるが、本実施例では例えば直径が
3.5mm程度のものが用いられている。この発熱抵抗
体9は、図2に示すように前記断熱材10の内壁面に沿
って所要のピッチで螺旋状に形成されており、この螺旋
状の発熱抵抗体9には前記断熱材10を貫通して外部に
延出された電極接続用の端子板16が断熱材10の軸方
向に適宜間隔で設けられ、熱処理炉1内を上下方向に複
数のゾーンに分けて温度制御ができるように構成されて
いる。この端子板16は発熱抵抗体9と同じ材質からな
り、溶断防止と放熱量の抑制の観点から所要断面積の板
状に形成されている。
On the other hand, the heating resistor 9 is made of, for example, iron (F).
e), chrome (Cr) and aluminum (Al) alloy wire made of Kanthal wire, the thickness of which varies depending on the specifications of the heat treatment furnace 1, but in the present embodiment, the diameter is about 3.5 mm. It is used. As shown in FIG. 2, the heat generating resistor 9 is formed in a spiral shape along the inner wall surface of the heat insulating material 10 at a required pitch, and the heat insulating material 10 is attached to the spiral heat generating resistor 9. Terminal plates 16 for electrode connection that penetrate through and extend to the outside are provided at appropriate intervals in the axial direction of the heat insulating material 10 so that the temperature inside the heat treatment furnace 1 can be divided into a plurality of zones in the vertical direction for temperature control. It is configured. The terminal plate 16 is made of the same material as the heat generating resistor 9, and is formed in a plate shape having a required cross-sectional area from the viewpoint of fusing prevention and suppression of heat radiation.

【0021】また、前記端子板16は、その板面が断熱
材10の軸方向に沿うようにして配置されている。これ
は後述の製造工程で発熱抵抗体9と断熱材10との間に
介設されたろ過材17(図6参照)を抜き取る際に、ろ
過材17が端子板16に引っ掛かることがなく、ろ過材
17を容易に抜き取ることを可能とするためである。こ
のような配置構成とするために、発熱抵抗体9は例えば
図7ないし図8に示すようにその中間位置においては端
子板16の取付部分で切断され、切断した両端部9a,
9bが径方向外方に折り曲げられ、折り曲げた両端部9
a,9b間に端子板16の一端の両面が挟持されて溶接
等で固定されている(なお、発熱抵抗体の両端位置にお
いてはその端部を折り曲げ、これに端子板の片面を溶接
等で固定する。)。
The terminal plate 16 is arranged such that its plate surface is along the axial direction of the heat insulating material 10. This is because the filter material 17 does not get caught on the terminal plate 16 when the filter material 17 (see FIG. 6) interposed between the heating resistor 9 and the heat insulating material 10 is pulled out in the manufacturing process described later, This is because it is possible to easily remove the material 17. In order to have such an arrangement configuration, the heating resistor 9 is cut at the mounting portion of the terminal plate 16 at its intermediate position as shown in FIGS.
9b is bent outward in the radial direction, and both ends 9 are bent.
Both sides of one end of the terminal plate 16 are sandwiched between a and 9b and fixed by welding or the like (Note that at both end positions of the heating resistor, the ends are bent, and one side of the terminal plate is welded thereto. Fix it.).

【0022】そして、前記発熱抵抗体9は、図2〜図4
に示すように耐熱性及び電気絶縁性材料例えばセラミッ
クからなる支持体18を介して所要熱量が確保できる配
列ピッチが設定された状態で前記断熱材10の内壁面に
所要の隙間Gを隔てて取付けられている。この支持体1
8は断熱材10の軸方向に複数に分割されており、各支
持体18は図5にも示すように発熱体抵抗体9の内側に
位置される基部19に発熱抵抗体9の隣り合うピッチ間
を通って径方向外方へ延出する複数本(実施例では4
本)の支持片20を一体形成してなり、いわゆる櫛歯状
に形成されている。
The heating resistor 9 is shown in FIGS.
As shown in FIG. 5, the heat insulating and electrically insulating material, such as ceramics, is attached to the inner wall surface of the heat insulating material 10 with a required gap G in a state in which the arrangement pitch is set so that a required amount of heat can be secured through the support 18. Has been. This support 1
8 is divided into a plurality of parts in the axial direction of the heat insulating material 10, and each support 18 has a base 19 located inside the heating element resistor 9 and adjacent pitches of the heating resistor 9 as shown in FIG. A plurality of wires (4 in the embodiment) that extend radially outward through the spaces
The supporting piece 20 of (book) is integrally formed, and is formed in a so-called comb shape.

【0023】前記支持片20の先端部は断熱材10中に
埋設支持されるが、その場合の支持強度を得るために長
さの長いものが適宜形成されている。実施例では、隣り
合うもの同士の長さが異なるよう、長さの長い支持片2
0aと短い支持片20bが交互に形成され、隣り合う支
持片20a,20b間には発熱抵抗体9を収容するスリ
ット状の隙間Sが設けられている。また、長い支持片2
0aの先端部には断熱材10からの抜け止めのための突
起部21が形成されている。この突起部21は製造時の
型抜きを容易にするために支持片20aの片面に形成さ
れているが、両面に形成されていてもよい。
The tip end of the support piece 20 is embedded and supported in the heat insulating material 10, and a long one is appropriately formed to obtain the support strength in that case. In the embodiment, the support piece 2 having a long length is used so that the adjacent pieces have different lengths.
0a and short support pieces 20b are alternately formed, and a slit-shaped gap S for accommodating the heating resistor 9 is provided between the adjacent support pieces 20a and 20b. Also, a long support piece 2
A protrusion 21 for preventing the heat insulating material 10 from coming off is formed at the tip portion of 0a. The protrusion 21 is formed on one surface of the support piece 20a in order to facilitate the die cutting at the time of manufacturing, but it may be formed on both surfaces.

【0024】このように形成された支持体18は支持片
20の先端部を断熱材10に埋設させた状態で断熱材1
0の軸方向に直列に配置されると共に、周方向に等間隔
例えば円周角が30度程度の間隔で配置されている。な
お、断熱材10による支持片20の支持強度が十分得ら
れる場合は、支持片20の長さは同じでもよく、また、
突起部21が設けられていなくてもよい。
The support 18 formed in this manner has the support piece 20 with the tip end portion thereof embedded in the heat insulation material 10.
They are arranged in series in the axial direction of 0, and are arranged at equal intervals in the circumferential direction, for example, at intervals of a circumferential angle of about 30 degrees. In addition, when the supporting strength of the supporting piece 20 by the heat insulating material 10 is sufficiently obtained, the supporting pieces 20 may have the same length.
The protrusion 21 may not be provided.

【0025】以上のように構成された熱処理炉1によれ
ば、筒状の断熱材10の内壁面に螺旋状の発熱抵抗体9
のピッチ間を通って径方向外方へ延出する複数本の支持
片20を有する支持体18をその支持片20の先端部が
断熱材10に埋設する状態で断熱材10の軸方向に配列
して発熱抵抗体9を支持する簡単な構造となり、前記支
持体18の複数の支持片20が発熱抵抗体の配列ピッチ
を設定するため、製造が容易で作業性の向上及び製造時
間の短縮が図れると共に、発熱抵抗体9の配列ピッチの
精度の向上が図れる。
According to the heat treatment furnace 1 configured as described above, the spiral heating resistor 9 is provided on the inner wall surface of the cylindrical heat insulating material 10.
Support 18 having a plurality of support pieces 20 extending outward in the radial direction through the pitches of the pitches of the support pieces 20 are arranged in the axial direction of the heat insulation material 10 with the tips of the support pieces 20 embedded in the heat insulation material 10. Then, the heating resistor 9 is supported in a simple structure, and the plurality of support pieces 20 of the support 18 set the arrangement pitch of the heating resistors, so that the manufacturing is easy and the workability is improved and the manufacturing time is shortened. At the same time, the accuracy of the arrangement pitch of the heating resistors 9 can be improved.

【0026】また、前記支持片20は個々に独立してい
るのではなく、支持体18の基部19に複数本ずつ形成
されているため、強度の向上が図れると共に形崩れする
こともなく、発熱抵抗体9を安定して支持することがで
きる。そして、隣り合う支持片20間にはスリット状の
隙間Sが形成され、且つ発熱抵抗体9と断熱材10の内
壁面との間には隙間Gが形成されているため、発熱抵抗
体9の径方向への熱膨張及び熱収縮を許容することがで
きる。
Further, since the supporting pieces 20 are not individually independent but are formed in plurals on the base portion 19 of the supporting body 18, the strength is improved and the shape is not lost, and heat is generated. The resistor 9 can be stably supported. Since a slit-shaped gap S is formed between the adjacent support pieces 20 and a gap G is formed between the heat generating resistor 9 and the inner wall surface of the heat insulating material 10, the heat generating resistor 9 has a gap. It is possible to allow thermal expansion and contraction in the radial direction.

【0027】また、発熱抵抗体9に設けられた端子板1
6の板面が断熱材10の軸方向に沿って配置されている
ため、製造工程で発熱抵抗体9と断熱材10との間に介
設されたろ過材17を断熱材10の軸方向から抜き取る
際に、ろ過材17が端子板16に引っ掛かることがな
く、ろ過材17を容易に抜き取ることが可能となり、作
業性が更に向上する。
Further, the terminal board 1 provided on the heating resistor 9
Since the plate surface of 6 is arranged along the axial direction of the heat insulating material 10, the filter material 17 interposed between the heating resistor 9 and the heat insulating material 10 in the manufacturing process is removed from the axial direction of the heat insulating material 10. When the filter material 17 is pulled out, the filter material 17 is not caught on the terminal plate 16, and the filter material 17 can be easily pulled out, further improving workability.

【0028】次に、このような構成からなる熱処理炉1
の製造方法について説明する。この製造方法は、主とし
て、(1)治具への発熱抵抗体の装着工程、(2)発熱
抵抗体へのろ過材及び棒材の配置工程、(3)発熱抵抗
体への断熱材料の堆積工程、(4)断熱材料の乾燥工
程、(5)ろ過材及び棒材の抜取工程、(6)治具の除
去工程からなり、これらの各工程を以下に説明する。
Next, the heat treatment furnace 1 having the above structure.
The manufacturing method of will be described. This manufacturing method mainly includes (1) a step of mounting a heating resistor on a jig, (2) a step of arranging a filter material and a rod on the heating resistor, and (3) deposition of a heat insulating material on the heating resistor. Steps (4) drying the heat insulating material, (5) extracting the filtering material and the rod, and (6) removing the jig. These steps will be described below.

【0029】(1)治具への発熱抵抗体の装着工程 先ず、図7ないし図8に示すように外側に軸方向に適宜
間隔で且つ板面が軸方向に沿って配置された端子板16
を有する螺旋状の前記発熱抵抗体9と、図6に示すよう
にこの発熱抵抗体9の内側に位置する基部19にその発
熱抵抗体9のピッチ間を通って径方向外方へ延出する複
数本の支持片20(20a,20b)を形成してなる支
持体18及びこの支持体18を発熱抵抗体9の周方向で
所定位置に位置決めして軸方向に整列させる治具22と
を準備する。
(1) Step of mounting heat generating resistor on jig First, as shown in FIGS. 7 to 8, the terminal plate 16 is arranged on the outside at appropriate intervals in the axial direction and the plate surfaces are arranged along the axial direction.
The heating resistor 9 having a spiral shape and a base portion 19 located inside the heating resistor 9 as shown in FIG. 6, extend radially outward through the pitch of the heating resistor 9. A support 18 formed by forming a plurality of support pieces 20 (20a, 20b) and a jig 22 for positioning the support 18 at a predetermined position in the circumferential direction of the heating resistor 9 and aligning them in the axial direction are prepared. To do.

【0030】この治具22は、中空状の支軸23上に放
射状のスポーク24を介して円環状の基盤25を軸方向
に沿って適宜間隔で設け、これら基盤25の外周に外向
きに開放したチャンネル形状のガイド部材26を軸方向
に掛け渡すと共に周方向に等間隔で配置することによ
り、ドラム状に形成されている。この治具22のガイド
部材26内に前記支持体18が取付けられる。また、前
記支軸23の周面には複数の吸引孔27が設けられてい
る。
This jig 22 is provided with annular bases 25 on a hollow support shaft 23 via radial spokes 24 at appropriate intervals along the axial direction, and is opened outward on the outer periphery of these bases 25. The channel-shaped guide members 26 are formed in a drum shape by spanning the guide members 26 in the axial direction and arranging them at equal intervals in the circumferential direction. The support 18 is mounted in the guide member 26 of the jig 22. A plurality of suction holes 27 are provided on the peripheral surface of the support shaft 23.

【0031】そして、このように構成された治具22を
回転させながらこの治具22上にその一端から前記螺旋
状の発熱抵抗体9を支持体18の支持片20間の隙間S
に通して螺合させるようにして装着する。
While rotating the jig 22 thus constructed, the spiral heating resistor 9 is provided on the jig 22 from one end thereof and the gap S between the support pieces 20 of the support 18 is formed.
Insert it through and screw it in.

【0032】(2)発熱抵抗体へのろ過材及び棒材の配
置工程 前記発熱抵抗体9の外周に前記端子板16及び支持体1
8の支持片20を避けてろ過材17を配置し、このろ過
材17上に前記発熱抵抗体9の軸方向に沿う細径の棒材
28を周方向に適宜間隔で配置する。前記ろ過材17と
しては、例えば網目の細かいアルミニウム製のメッシュ
等が好適であり、また、前記棒材28としては、例えば
直径が1〜2mm程度のステンレススチール製の丸棒が
好適である。前記ろ過材17を前記発熱抵抗体9の外周
全面に前記支持片20及び端子板16を避けるようにし
て、且つ軸方向から抜取可能にして所定の厚さで配置
し、そのろ過材17上に前記棒材28を配置して糸等で
固定する。
(2) Step of disposing the filtering material and the rod material on the heating resistor 9. The terminal board 16 and the support 1 are provided on the outer periphery of the heating resistor 9.
The filter material 17 is arranged avoiding the supporting pieces 20 of No. 8 and the thin rods 28 along the axial direction of the heating resistor 9 are arranged on the filter material 17 at appropriate intervals in the circumferential direction. As the filter material 17, for example, a fine mesh made of aluminum or the like is suitable, and as the rod material 28, for example, a round bar made of stainless steel having a diameter of about 1 to 2 mm is suitable. The filter material 17 is arranged on the entire outer peripheral surface of the heat generating resistor 9 so as to avoid the support piece 20 and the terminal plate 16 and is removable from the axial direction so as to have a predetermined thickness. The rod 28 is arranged and fixed with a thread or the like.

【0033】(3)発熱抵抗体への断熱材料の堆積工程 前記発熱抵抗体9を断熱材料をなす無機質繊維を含む懸
濁液29中に浸漬させて発熱抵抗体9の内側からの吸引
により前記ろ過材17上に前記断熱材料を堆積させる。
この場合、図9に示すように発熱抵抗体9における治具
22の軸方向両端部を塞いだ状態にして発熱抵抗体9を
治具22ごと懸濁液槽30内に浸漬する。前記懸濁液2
9としては、例えばシリカ、アルミナ或いは珪酸アルミ
ナを含む無機質繊維と、水及びバインダからなるスラリ
ー状のものが用いられる。
(3) Step of depositing heat insulating material on heat generating resistor The heat generating resistor 9 is dipped in a suspension 29 containing inorganic fibers forming a heat insulating material and sucked from the inside of the heat generating resistor 9. The heat insulating material is deposited on the filter material 17.
In this case, as shown in FIG. 9, the heating resistor 9 together with the jig 22 is immersed in the suspension tank 30 with both ends of the jig 22 in the axial direction of the heating resistor 9 being closed. The suspension 2
As the material 9, there is used a slurry-like material composed of an inorganic fiber containing silica, alumina or alumina silicate, water and a binder.

【0034】前記治具22の中空状の支軸23に吸引ポ
ンプ31を接続することにより、支軸23の吸引孔27
を介して発熱抵抗体9の内部を減圧すると、懸濁液29
がろ過材17の表面に吸い寄せられてろ過材17を透過
しない断熱材料である繊維質成分がろ過材17上に積層
される。なお、ろ過材17を透過した水分並びに繊維質
成分は吸引ポンプ31の吐出パイプ32を介して回収さ
れるが、再度懸濁液槽30内に循環させるようにしても
よい。
By connecting a suction pump 31 to the hollow support shaft 23 of the jig 22, a suction hole 27 of the support shaft 23 is formed.
When the pressure inside the heating resistor 9 is reduced via the
Is attracted to the surface of the filter material 17 and a fibrous component that is a heat insulating material that does not pass through the filter material 17 is laminated on the filter material 17. Although the moisture and the fibrous components that have passed through the filter material 17 are recovered via the discharge pipe 32 of the suction pump 31, they may be circulated again in the suspension tank 30.

【0035】また、この場合、支軸23を介して治具2
2を回転させることにより、懸濁液槽30内の懸濁液2
9を攪拌することができると共に、ろ過材17上に均一
な厚さで断熱材料を堆積させることができる。このよう
にしてろ過材17上に断熱材料が堆積されることによ
り、所望の層厚の断熱材10が形成され、支持体18の
支持片20先端部が断熱材10中に埋設されることにな
る。
Further, in this case, the jig 2 is inserted through the support shaft 23.
The suspension 2 in the suspension tank 30 is rotated by rotating the suspension 2.
9 can be agitated and the heat insulating material can be deposited on the filter material 17 with a uniform thickness. By depositing the heat insulating material on the filter material 17 in this manner, the heat insulating material 10 having a desired layer thickness is formed, and the tip end portion of the support piece 20 of the support 18 is embedded in the heat insulating material 10. Become.

【0036】この工程においては、懸濁液29の密度を
変えることにより図3に示すように断熱材10を内側の
高密度層10Aと外側の低密度層10Bの二層構造或い
は複数層構造とすることが可能であるが、単一層構造で
あっても勿論構わない。実施例の場合、高密度層10A
により支持体20の支持強度の向上が図れ、低密度層1
0Bにより断熱性の向上及び軽量化が図れる。
In this step, by changing the density of the suspension 29, as shown in FIG. 3, the heat insulating material 10 has a two-layer structure of a high density layer 10A on the inner side and a low density layer 10B on the outer side, or a multi-layer structure. However, a single layer structure is also acceptable. In the case of the embodiment, the high density layer 10A
By this, the support strength of the support 20 can be improved, and the low-density layer 1
With 0B, the heat insulation can be improved and the weight can be reduced.

【0037】(4)断熱材料の乾燥工程 前記工程でろ過材17上に所望の厚さの断熱材10が形
成されたなら、これを治具22ごと懸濁液槽30から引
き上げ、ろ過材17上に堆積した断熱材料を自然或いは
強制的に乾燥させる。これにより円筒状の断熱材10が
得られる。
(4) Drying Step of Heat Insulating Material When the heat insulating material 10 having a desired thickness is formed on the filter material 17 in the above step, the jig 22 and the heat insulating material 10 are pulled out from the suspension tank 30 to remove the filter material 17 The insulating material deposited on it is dried naturally or by force. As a result, the cylindrical heat insulating material 10 is obtained.

【0038】(5)ろ過材及び棒材の抜取工程 乾燥後に、前記断熱材10と前記ろ過材17との間から
前記棒材28を軸方向から抜き取り、更に断熱材10と
前記発熱抵抗体9との間から前記ろ過材17を抜き取
る。棒材28は細径で断熱材10との接触面積が小さい
ため容易に抜き取ることができ、また、棒材28を抜き
取ることで断熱材10とろ過材17との間に多少の隙間
が生じるので、ろ過材17を比較的容易に抜き取ること
ができる。このろ過材17を抜き取ることにより、断熱
材10と発熱抵抗体9との間には隙間Gが形成され、こ
の隙間Gにより発熱抵抗体9の熱膨張による径方向外方
への変位を許容することができる。
(5) Extraction Step of Filter Material and Rod Material After drying, the rod material 28 is extracted axially from between the heat insulating material 10 and the filter material 17, and the heat insulating material 10 and the heat generating resistor 9 are further removed. The filter material 17 is pulled out from between. Since the rod 28 has a small diameter and a small contact area with the heat insulating material 10, it can be easily pulled out, and when the rod 28 is pulled out, a slight gap is generated between the heat insulating material 10 and the filtering material 17. The filter material 17 can be extracted relatively easily. By removing the filter material 17, a gap G is formed between the heat insulating material 10 and the heat generating resistor 9, and the gap G allows the heat generating resistor 9 to be displaced radially outward due to thermal expansion. be able to.

【0039】(6)治具の除去工程 この工程では、支持体18を支えている治具22を断熱
材10の軸方向から引き抜くことにより、治具22を前
記支持体18から除去する。そして、前記断熱材10の
表面処理等を行うことにより、円筒状の断熱材10の内
壁面に支持体18を介して発熱抵抗体9が設置された状
態の熱処理炉1が得られる。
(6) Jig Removal Step In this step, the jig 22 supporting the support 18 is pulled out from the axial direction of the heat insulating material 10 to remove the jig 22 from the support 18. Then, by performing the surface treatment of the heat insulating material 10 or the like, the heat treatment furnace 1 in which the heating resistor 9 is installed on the inner wall surface of the cylindrical heat insulating material 10 via the support 18 is obtained.

【0040】このような工程からなる熱処理炉1の製造
方法によれば、発熱抵抗体9が予め螺旋状に形成されて
おり、この発熱抵抗体9の内側に位置する基部19にそ
の発熱抵抗体9のピッチ間を通って径方向外方へ延出す
る複数本の支持片20を形成してなる支持体18及びこ
の支持体18を発熱抵抗体9の周方向で所定位置に位置
決めして軸方向に整列させる治具22を用い、この治具
22を回転させながらこの治具22上に前記支持体18
を介して前記発熱抵抗体9を装着するため、発熱抵抗体
9を螺旋状に巻き付ける手間が省け、しかも、前記支持
体18の複数本の支持片20によって発熱抵抗体9の配
列ピッチが自動的に設定されることから配列の手間も省
ける。
According to the method for manufacturing the heat treatment furnace 1 having such steps, the heating resistor 9 is formed in a spiral shape in advance, and the heating resistor 9 is formed on the base portion 19 located inside the heating resistor 9. A support 18 formed by a plurality of support pieces 20 extending outward in the radial direction through the pitches of 9 and the support 18 is positioned at a predetermined position in the circumferential direction of the heating resistor 9 Using a jig 22 that is aligned in the direction, the support 18 is placed on the jig 22 while rotating the jig 22.
Since the heat generating resistors 9 are mounted via the connector, it is not necessary to wind the heat generating resistors 9 in a spiral shape, and moreover, the arrangement pitch of the heat generating resistors 9 is automatically adjusted by the plurality of supporting pieces 20 of the supporting body 18. Since it is set to, the labor of arrangement can be saved.

【0041】また、発熱抵抗体9の外側に断熱材10を
設ける場合には、単に懸濁液29中に浸漬された発熱抵
抗体9の内側からの吸引のみで発熱抵抗体9の外側にろ
過材17を介して断熱材料を堆積させることにより断熱
材10を形成することができるので、型枠の組立や離型
作業が不要であり、しかも、断熱材10は乾燥するだけ
でよく、焼成工程が不要であることから、短時間で形成
することが可能となる。更に、発熱抵抗体9と断熱材1
0との間に介設されたろ過材17を抜取る場合には、ろ
過材17と断熱材10との間に介設された棒材28を抜
取ることによりろ過材17と断熱材10との間に隙間が
できること、及び端子板16の板面が断熱材10の軸方
向に配置されていてろ過材17が端子板16に引っ掛か
り難いことから、ろ過材17を容易に抜取ることが可能
となる。以上により熱処理炉1を製造する場合における
作業性の向上及び製造時間の短縮が図れると共に、発熱
抵抗体9の配列ピッチの精度の向上が図れる。
When the heat insulating material 10 is provided on the outside of the heating resistor 9, the outside of the heating resistor 9 is filtered only by suction from the inside of the heating resistor 9 immersed in the suspension 29. Since the heat insulating material 10 can be formed by depositing the heat insulating material through the material 17, the work of assembling the mold and the mold releasing work are unnecessary, and the heat insulating material 10 only needs to be dried, and the firing process Since it is unnecessary, it can be formed in a short time. Furthermore, the heating resistor 9 and the heat insulating material 1
When removing the filter material 17 interposed between the filter material 17 and the heat insulating material 10, the rod material 28 interposed between the filter material 17 and the heat insulating material 10 is removed. Since there is a gap between them and the plate surface of the terminal plate 16 is arranged in the axial direction of the heat insulating material 10 so that the filter material 17 is not easily caught by the terminal plate 16, the filter material 17 can be easily removed. Becomes As described above, the workability in manufacturing the heat treatment furnace 1 can be improved, the manufacturing time can be shortened, and the accuracy of the arrangement pitch of the heating resistors 9 can be improved.

【0042】なお、本発明は、前記実施例に限定される
ものではなく、本発明の要旨の範囲内で種々の変形実施
が可能である。例えば、前記実施例のように断熱材を二
層に形成する場合、その高密度層10Aと低密度層10
Bの間に例えばアルミニウム製等のメッシュ材を設けて
もよく、これにより発熱抵抗体9からの輻射熱の反射や
断熱材10の強度の向上が図れる。また、発熱抵抗体9
から断熱材に向う輻射熱を反射させるために、断熱材1
0の内壁面に例えばシリカ製のクロス材を張設するよう
にしてもよい。
The present invention is not limited to the above embodiment, but various modifications can be made within the scope of the gist of the present invention. For example, when the heat insulating material is formed in two layers as in the above embodiment, the high density layer 10A and the low density layer 10 are formed.
A mesh material made of, for example, aluminum may be provided between B, whereby the reflection of radiant heat from the heating resistor 9 and the strength of the heat insulating material 10 can be improved. Also, the heating resistor 9
Insulation material 1 to reflect radiant heat from the
A cloth material made of silica, for example, may be stretched on the inner wall surface of No. 0.

【0043】更に、本発明が適用される熱処理炉によっ
て熱処理される被処理体としては、少なくとも面状の被
処理体であればよく、半導体ウエハW以外に、例えばL
CD基板等が適用可能である。また、本発明が適用され
る熱処理炉としては、減圧CDV以外に、例えば酸化、
拡散、アニール等の処理に適するものであってもよい。
Further, the object to be heat-treated in the heat treatment furnace to which the present invention is applied may be at least a planar object to be processed, and other than the semiconductor wafer W, for example, L
A CD substrate or the like can be applied. Further, as the heat treatment furnace to which the present invention is applied, other than the reduced pressure CDV, for example, oxidation,
It may be suitable for treatments such as diffusion and annealing.

【0044】[0044]

【発明の効果】以上要するに本発明によれば、次のよう
な優れた効果が得られる。
In summary, according to the present invention, the following excellent effects can be obtained.

【0045】(1)請求項1記載の発明によれば、筒状
の断熱材の内壁面に螺旋状の発熱抵抗体のピッチ間を通
って径方向外方へ延出する複数本の支持片を有する支持
体をその支持片の先端部が断熱材に埋設する状態で断熱
材の軸方向に配列して発熱抵抗体を支持する簡単な構造
となり、前記支持体の複数の支持片が発熱抵抗体の配列
ピッチを設定するため、製造が容易で作業性の向上及び
製造時間の短縮が図れると共に、発熱抵抗体の配列ピッ
チの精度の向上が図れる。
(1) According to the invention described in claim 1, a plurality of support pieces extending radially outward through the inner wall surface of the cylindrical heat insulating material through the pitch of the spiral heating resistors. With a simple structure for supporting the heat-generating resistor by arranging the support having the support member in the axial direction of the heat-insulating material in a state where the tip of the support piece is embedded in the heat-insulating material, the plurality of support pieces of the support member have heat-generating resistance. Since the arrangement pitch of the bodies is set, the manufacturing is easy, the workability is improved, the manufacturing time is shortened, and the accuracy of the arrangement pitch of the heating resistors is improved.

【0046】(2)請求項2記載の発明によれば、発熱
抵抗体に設けられた端子板の板面が断熱材の軸方向に沿
って配置されているため、製造工程で発熱抵抗体と断熱
材との間に介設されたろ過材を抜き取る際に、ろ過材が
端子板に引っ掛かることがなく、ろ過材を容易に抜き取
ることが可能となり、作業性が更に向上する。
(2) According to the second aspect of the invention, since the plate surface of the terminal plate provided on the heating resistor is disposed along the axial direction of the heat insulating material, the heating resistor is not formed in the manufacturing process. When the filter material provided between the heat insulating material and the heat insulating material is removed, the filter material does not get caught on the terminal plate, and the filter material can be easily removed, further improving the workability.

【0047】(3)請求項3記載の発明によれば、支持
体を配列した治具を回転させるだけで螺旋状の発熱抵抗
体を前記支持体を介して治具に装着させることができ、
前記支持体の支持片によって発熱抵抗体の配列ピッチが
設定され、発熱抵抗体を懸濁液中に浸漬させて発熱抵抗
体の内側から吸引するだけで発熱抵抗体の外側に断熱材
料を堆積させて断熱材を短時間で形成することができ、
発熱抵抗体と断熱材との間に介設されたろ過材を抜き取
る場合には、ろ過材と断熱材との間に介設された棒材を
抜き取ることによりろ過材と断熱材との間に隙間が生じ
ること、及び、端子板の板面が断熱材の軸方向に配置さ
れていてろ過材が端子板に引っ掛かり難いことから、ろ
過材を容易に抜き取ることができる。従って、熱処理炉
を製造する場合における作業性の向上及び製造時間の短
縮が図れると共に、発熱抵抗体の配列ピッチの精度の向
上が図れる。
(3) According to the third aspect of the invention, the spiral heating resistor can be attached to the jig via the support simply by rotating the jig in which the support is arranged.
The arrangement pitch of the heating resistors is set by the supporting pieces of the supporting body, and the heat insulating material is deposited on the outside of the heating resistor simply by immersing the heating resistor in the suspension and sucking it from the inside of the heating resistor. Insulation can be formed in a short time,
When removing the filter material that is interposed between the heat generating resistor and the heat insulating material, remove the bar material that is interposed between the filter material and the heat insulating material to remove the filter material between the filter material and the heat insulating material. Since there is a gap and the plate surface of the terminal plate is arranged in the axial direction of the heat insulating material so that the filter material is not easily caught on the terminal plate, the filter material can be easily removed. Therefore, it is possible to improve the workability and shorten the manufacturing time when manufacturing the heat treatment furnace, and to improve the accuracy of the arrangement pitch of the heating resistors.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例である熱処理炉の全体構成を
示す縦断面図である。
FIG. 1 is a vertical cross-sectional view showing the overall structure of a heat treatment furnace which is an embodiment of the present invention.

【図2】同熱処理炉の一部を示す斜視図である。FIG. 2 is a perspective view showing a part of the heat treatment furnace.

【図3】同熱処理炉の部分的拡大平面断面図である。FIG. 3 is a partially enlarged plan sectional view of the heat treatment furnace.

【図4】同熱処理炉の部分的拡大側面断面図である。FIG. 4 is a partially enlarged side sectional view of the heat treatment furnace.

【図5】支持体の拡大斜視図である。FIG. 5 is an enlarged perspective view of a support.

【図6】本発明を適用した熱処理炉の製造方法において
用いられる治具の構成を説明するための斜視図である。
FIG. 6 is a perspective view for explaining the configuration of a jig used in the method for manufacturing a heat treatment furnace to which the present invention is applied.

【図7】端子板を有する発熱抵抗体を示す側面図であ
る。
FIG. 7 is a side view showing a heating resistor having a terminal plate.

【図8】同発熱抵抗体における端子板の取付状態を部分
的に示す平面図である。
FIG. 8 is a plan view partially showing a mounting state of a terminal plate in the same heating resistor.

【図9】熱処理炉の製造方法においてろ過材上に断熱材
料を堆積させる工程を説明するための模式図である。
FIG. 9 is a schematic diagram for explaining a step of depositing a heat insulating material on the filter material in the method for manufacturing the heat treatment furnace.

【符号の説明】[Explanation of symbols]

1 熱処理炉 9 発熱抵抗体 10 断熱材 16 端子板 17 ろ過材 18 支持体 19 基部 20 支持片 22 治具 28 棒材 DESCRIPTION OF SYMBOLS 1 Heat treatment furnace 9 Exothermic resistor 10 Thermal insulation 16 Terminal board 17 Filtration material 18 Support 19 Base 20 Support piece 22 Jig 28 Bar

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 21/22 511 A 21/324 H H05B 3/06 A 7512−3K (72)発明者 三浦 恭彰 神奈川県津久井群城山町町屋1丁目2番41 号 東京エレクトロン東北株式会社相模事 業所内 (72)発明者 横川 修 神奈川県津久井群城山町町屋1丁目2番41 号 東京エレクトロン東北株式会社相模事 業所内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Office reference number FI Technical indication location H01L 21/22 511 A 21/324 H H05B 3/06 A 7512-3K (72) Inventor Yasuaki Miura Kanagawa Prefecture Tsukui Group Shiroyama Town Machiya 1-24-1 Tokyo Electron Tohoku Co., Ltd. Sagami Business Office (72) Inventor Osamu Yokokawa Kanagawa Prefecture Tsukui Group Shiroyama Machiya 1-241 Tokyo Electron Tohoku Co., Ltd. Sagami Business In-house

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 筒状の断熱材の内壁面に沿って螺旋状の
発熱抵抗体を備えた熱処理炉であって、前記断熱材の軸
方向に複数に分割されて前記発熱抵抗体を支持する支持
体を有し、各支持体は前記発熱抵抗体の内側に位置する
基部にその発熱抵抗体のピッチ間を通って径方向外方へ
延出する複数本の支持片を形成してなり、これら支持片
の先端部が前記断熱材に埋設されていることを特徴とす
る熱処理炉。
1. A heat treatment furnace provided with a spiral heating resistor along an inner wall surface of a cylindrical heat insulating material, wherein the heat insulating furnace is divided into a plurality of parts in the axial direction of the heat insulating material to support the heat generating resistor. A support member, each support member having a plurality of support pieces extending outward in the radial direction at a base portion located inside the heat generating resistor, passing through the pitch of the heat generating resistor; A heat treatment furnace, wherein the tip ends of these support pieces are embedded in the heat insulating material.
【請求項2】 前記発熱抵抗体が、前記断熱材を貫通し
て外部に延出された端子板を断熱材の軸方向に適宜間隔
で有し、且つこれら端子板の板面が前記断熱材の軸方向
に沿って配置されていることを特徴とする請求項1記載
の熱処理炉。
2. The heating resistor has terminal plates that extend through the heat insulating material to the outside at appropriate intervals in the axial direction of the heat insulating material, and the plate surfaces of these terminal plates are the heat insulating material. The heat treatment furnace according to claim 1, wherein the heat treatment furnace is arranged along the axial direction of.
【請求項3】 筒状の断熱材の内壁面に螺旋状の発熱抵
抗体を備えた熱処理炉の製造方法であって、外側に軸方
向に適宜間隔で且つ板面が軸方向に沿って配置された端
子板を有する螺旋状の発熱抵抗体と、この発熱抵抗体の
内側に位置する基部にその発熱抵抗体のピッチ間を通っ
て径方向外方へ延出する複数本の支持片を形成してなる
支持体及びこの支持体を発熱抵抗体の周方向で所定位置
に位置決めして軸方向に整列させる治具とを準備し、こ
の治具を回転させながら治具上に前記支持体を介して前
記発熱抵抗体を装着する工程と、前記発熱抵抗体の外周
に前記端子板及び支持体の支持片を避けてろ過材を配置
し、このろ過材上に前記発熱抵抗体の軸方向に沿う細径
の棒材を周方向に適宜間隔で配置する工程と、前記発熱
抵抗体を断熱材料をなす無機質繊維を含む懸濁液中に浸
漬させて発熱抵抗体の内側からの吸引により前記ろ過材
上に前記断熱材料を堆積させる工程と、この堆積した断
熱材料を乾燥させる工程と、乾燥後に断熱材と前記ろ過
材との間から前記棒材を抜き取り、更に断熱材と前記発
熱抵抗体との間から前記ろ過材を抜き取る工程と、前記
治具を前記支持体から除去する工程とを備えたことを特
徴とする熱処理炉の製造方法。
3. A method for manufacturing a heat treatment furnace comprising a spiral heat generating resistor provided on an inner wall surface of a cylindrical heat insulating material, the plate surface being arranged along the axial direction at appropriate intervals on the outside. A spiral heating resistor having a terminal plate formed therein, and a plurality of supporting pieces extending radially outward through the pitch of the heating resistor at a base portion located inside the heating resistor. And a jig for positioning the support at a predetermined position in the circumferential direction of the heating resistor and aligning the support in the axial direction, and rotating the jig to place the support on the jig. Through the step of mounting the heat generating resistor through, and disposing the filter material on the outer periphery of the heat generating resistor while avoiding the supporting pieces of the terminal plate and the support, and on the filter material in the axial direction of the heat generating resistor. A step of arranging thin rods along the circumference at appropriate intervals, and a heat insulating material for the heating resistor. A step of immersing the heat insulating material in a suspension containing the inorganic fiber and depositing the heat insulating material on the filter medium by suction from the inside of the heating resistor, a step of drying the deposited heat insulating material, and a heat insulation after drying. A step of extracting the rod material from between the material and the filter material, further removing the filter material from between the heat insulating material and the heating resistor, and a step of removing the jig from the support. A method for manufacturing a heat treatment furnace characterized by the above.
JP6071552A 1993-11-10 1994-03-16 Heat treating furnace, and manufacture thereof Pending JPH07253276A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP6071552A JPH07253276A (en) 1994-03-16 1994-03-16 Heat treating furnace, and manufacture thereof
US08/337,366 US5506389A (en) 1993-11-10 1994-11-08 Thermal processing furnace and fabrication method thereof
JP6300298A JP2840558B2 (en) 1993-11-10 1994-11-09 Heat treatment furnace and manufacturing method thereof
KR1019940029435A KR100235548B1 (en) 1993-11-10 1994-11-10 Manufacture of heat-treating furnace and heat-treating furnace
TW083110430A TW273637B (en) 1993-11-10 1994-11-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6071552A JPH07253276A (en) 1994-03-16 1994-03-16 Heat treating furnace, and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH07253276A true JPH07253276A (en) 1995-10-03

Family

ID=13464019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6071552A Pending JPH07253276A (en) 1993-11-10 1994-03-16 Heat treating furnace, and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH07253276A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100483457B1 (en) * 1997-02-18 2005-08-29 동경 엘렉트론 주식회사 Heat treatment equipment
KR100643661B1 (en) * 2005-04-11 2006-11-10 (주)비에이치티 Heater assembly of heat treatment equipment and fabrication method thereof
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JP2008263170A (en) * 2007-03-20 2008-10-30 Tokyo Electron Ltd Heat treatment furnace and vertical heat treatment equipment
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US7888622B2 (en) * 2006-09-22 2011-02-15 Tokyo Electron Limited Heat-processing furnace and manufacturing method thereof
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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100483457B1 (en) * 1997-02-18 2005-08-29 동경 엘렉트론 주식회사 Heat treatment equipment
KR100643661B1 (en) * 2005-04-11 2006-11-10 (주)비에이치티 Heater assembly of heat treatment equipment and fabrication method thereof
JP2007088324A (en) * 2005-09-26 2007-04-05 Hitachi Kokusai Electric Inc Heating element holding structure, insulated structure, heating unit and substrate processing equipment
US7888622B2 (en) * 2006-09-22 2011-02-15 Tokyo Electron Limited Heat-processing furnace and manufacturing method thereof
JP2008263170A (en) * 2007-03-20 2008-10-30 Tokyo Electron Ltd Heat treatment furnace and vertical heat treatment equipment
US8134100B2 (en) * 2007-06-01 2012-03-13 Tokyo Electron Limited Heat processing furnace and method of manufacturing the same
JP2010017635A (en) * 2008-07-09 2010-01-28 Teoss Corp Silicon heating furnace and silicon crushing machine using the same
JP2012033926A (en) * 2011-07-19 2012-02-16 Hitachi Kokusai Electric Inc Insulation structure, heating apparatus and substrate processing apparatus
JP2014079990A (en) * 2012-10-18 2014-05-08 Tokyo Electron Ltd Method for manufacturing heat-insulating wall body and heat-insulating wall body
CN112575295A (en) * 2019-09-27 2021-03-30 佳能特机株式会社 Evaporation source apparatus, film forming method, and method for manufacturing electronic device
JP2021055123A (en) * 2019-09-27 2021-04-08 キヤノントッキ株式会社 Vapor deposition source apparatus, film deposition apparatus, film deposition method, and method of manufacturing electronic device
CN112575295B (en) * 2019-09-27 2023-04-07 佳能特机株式会社 Evaporation source apparatus, film forming method, and method for manufacturing electronic device

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