TWI547008B - Antenna producing process - Google Patents
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- TWI547008B TWI547008B TW100136023A TW100136023A TWI547008B TW I547008 B TWI547008 B TW I547008B TW 100136023 A TW100136023 A TW 100136023A TW 100136023 A TW100136023 A TW 100136023A TW I547008 B TWI547008 B TW I547008B
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Description
本發明係有關於一種天線製作方法,特別係有關於一種透過圖案化製程形成天線之天線製作方法。 The present invention relates to a method of fabricating an antenna, and more particularly to a method of fabricating an antenna for forming an antenna through a patterning process.
習知之天線結構,一般由金屬件所構成,其主要係透過板金等機械方式製作。習知的板金天線因體積較大,必須在電子裝置的機殼中預留空間,以供設置板金天線,因此電子裝置的尺寸無法進一步降低。 The conventional antenna structure is generally composed of metal parts, which are mainly manufactured by mechanical means such as sheet metal. Due to the large size of the conventional sheet metal antenna, space must be reserved in the casing of the electronic device for setting the sheet metal antenna, so that the size of the electronic device cannot be further reduced.
本發明即為了欲解決習知技術之問題而提供之一種天線製作方法,包括下述步驟。首先提供一基板,包括一基板表面;再,在該基板表面上形成一導電層;接著,對該導電層進行一圖案化製程,以使該導電層形成一天線圖案。 The present invention is an antenna manufacturing method provided to solve the problems of the prior art, and includes the following steps. First, a substrate is provided, including a substrate surface; and then, a conductive layer is formed on the surface of the substrate; then, the conductive layer is patterned to form the conductive layer to form an antenna pattern.
於一實施例中,本發明之天線製造方法更包括:進行一增厚製程,增加該導電層之該天線圖案的厚度,藉此形成本發明之天線結構。 In one embodiment, the antenna manufacturing method of the present invention further includes: performing a thickening process to increase the thickness of the antenna pattern of the conductive layer, thereby forming the antenna structure of the present invention.
於另一實施例中,於本發明之天線製造方法中之該導電層為一複合導電層,而在該基板表面上形成該導電層的步驟中,包括:透過一化學鍍膜方式於該基板之整個表面之上形成一第一導電層;以及施行一電鍍製程,於該基板之整個表面之上以形成完全覆蓋該第一導電層。 In another embodiment, the conductive layer in the antenna manufacturing method of the present invention is a composite conductive layer, and the step of forming the conductive layer on the surface of the substrate includes: performing an electroless plating on the substrate Forming a first conductive layer over the entire surface; and performing an electroplating process over the entire surface of the substrate to form a complete coverage of the first conductive layer.
應用本發明之天線製作方法所形成之天線結構包括一第一導電層以及一第二導電層。於一實施例中,該第一導電層係透過真空濺鍍的方式形成。該第二導電層形成於該 第一導電層之上,其中,該第二導電層係以化學鍍膜、電鍍或印刷等方式形成。於另一實施例中,該第一導電層係透過化學鍍膜的方式形成,而該第二導電層係以電鍍方式形成於該第一導電層之上。 The antenna structure formed by applying the antenna manufacturing method of the present invention includes a first conductive layer and a second conductive layer. In one embodiment, the first conductive layer is formed by vacuum sputtering. The second conductive layer is formed on the Above the first conductive layer, wherein the second conductive layer is formed by electroless plating, electroplating or printing. In another embodiment, the first conductive layer is formed by electroless plating, and the second conductive layer is formed on the first conductive layer by electroplating.
用本發明之天線製作方法,可以在基板之基板表面上形成天線,藉此,天線所佔用的空間可以降低到最小,可節省可攜式電子裝置的內部空間,並進一步縮小可攜式電子裝置的體積。 With the antenna manufacturing method of the present invention, an antenna can be formed on the surface of the substrate of the substrate, whereby the space occupied by the antenna can be minimized, the internal space of the portable electronic device can be saved, and the portable electronic device can be further reduced. volume of.
參照第1A圖,其係顯示本發明之一實施例之天線製作方法的主要步驟,包括:首先,提供一基板,包括一基板表面(S1);再,在該基板表面上形成一導電層(S2);接著,對該導電層進行一圖案化製程,以使該導電層形成一天線圖案(S3);最後,進行一增厚製程,增加該導電層之該天線圖案的厚度(S4),藉此形成本發明之一實施例之天線結構。 Referring to FIG. 1A, which shows the main steps of an antenna manufacturing method according to an embodiment of the present invention, comprising: firstly, providing a substrate including a substrate surface (S1); and further forming a conductive layer on the surface of the substrate ( S2); then, performing a patterning process on the conductive layer to form the antenna layer into an antenna pattern (S3); finally, performing a thickening process to increase the thickness of the antenna pattern of the conductive layer (S4), Thereby, an antenna structure of an embodiment of the present invention is formed.
該基板可以為可攜式電子裝置的機殼。該基板表面可以為可攜式電子裝置機殼的內/外表面。參照第2A圖,其係顯示本發明所述之基板10之一實施例,其具有一基板表面11,該基板表面11可以為曲面。 The substrate can be a casing of a portable electronic device. The surface of the substrate may be an inner/outer surface of the casing of the portable electronic device. Referring to Figure 2A, there is shown an embodiment of a substrate 10 of the present invention having a substrate surface 11 which may be curved.
參照第3圖,應用本發明之天線製作方法,可以在基板10之基板表面11上形成天線21,藉此,天線21所佔用的空間可以降低到最小,可節省可攜式電子裝置的內部空間,並進一步縮小可攜式電子裝置的體積。 Referring to FIG. 3, the antenna 21 can be formed on the substrate surface 11 of the substrate 10 by applying the antenna manufacturing method of the present invention, whereby the space occupied by the antenna 21 can be minimized, and the internal space of the portable electronic device can be saved. And further reduce the size of the portable electronic device.
以下進一步描述此實施例之天線製作方法之各步驟細節。The details of the steps of the antenna fabrication method of this embodiment are further described below.
回到第1A圖,在該基板表面上形成該導電層(S2)之前,該基板表面可以被粗化,藉此提高該導電層在該基板表面上的附著力。Returning to Fig. 1A, before the conductive layer (S2) is formed on the surface of the substrate, the surface of the substrate can be roughened, thereby increasing the adhesion of the conductive layer on the surface of the substrate.
在該基板表面上形成該導電層(S2)的步驟中,可以透過對該基板表面進行真空濺鍍方式,以將金屬離子附著於該基板表面。參照第2B圖,其係顯示導電層20附著於基板10之基板表面11之上。In the step of forming the conductive layer (S2) on the surface of the substrate, the surface of the substrate may be subjected to vacuum sputtering to adhere metal ions to the surface of the substrate. Referring to FIG. 2B, it is shown that the conductive layer 20 is attached to the substrate surface 11 of the substrate 10.
除上述真空濺鍍的方式之外,亦可以透過印刷或其他方式將該導電層附著於該基板表面之上。In addition to the above-described manner of vacuum sputtering, the conductive layer may be attached to the surface of the substrate by printing or other means.
接著,參照第1B圖,在對該導電層進行一圖案化製程,以使該導電層形成該天線圖案(S3)的步驟中,包括下述多個步驟:首先,在該導電層上塗佈一光阻層(S31);再,對該光阻層進行曝光,以將該天線圖案轉印至該光阻層(S32);接著,對該光阻層進行顯影,以留下該天線圖案(S33);再,對該導電層進行蝕刻,以圖案化該導電層並形成該天線圖案(S34);並,去除光阻層(S35)。Next, referring to FIG. 1B, in the step of performing a patterning process on the conductive layer to form the conductive layer into the antenna pattern (S3), the following steps are included: first, coating on the conductive layer a photoresist layer (S31); and then exposing the photoresist layer to transfer the antenna pattern to the photoresist layer (S32); then, developing the photoresist layer to leave the antenna pattern (S33); further, etching the conductive layer to pattern the conductive layer and form the antenna pattern (S34); and removing the photoresist layer (S35).
在該導電層上塗佈該光阻層(S31)之步驟中,該光阻層係以靜電噴塗(Spray Coating)、旋轉塗佈(Spin Coating)等方式塗佈,藉此將光阻層均勻的覆蓋於該導電層之上。In the step of coating the photoresist layer (S31) on the conductive layer, the photoresist layer is applied by means of spray coating, spin coating or the like, thereby uniformizing the photoresist layer. Overlying the conductive layer.
參照第2C圖,在對該光阻層進行曝光,以將該天線圖案轉印至該光阻層(S32)的步驟中,可使用具有天線圖案的光罩1進行曝光。由於該基板表面為曲面,參照第2D圖,在一實施例中,可以多個方向以及多個光罩分別進行曝光,以將該天線圖案轉印至該光阻層30,該等曝光方向可以相互垂直。Referring to FIG. 2C, in the step of exposing the photoresist layer to transfer the antenna pattern to the photoresist layer (S32), exposure can be performed using the photomask 1 having an antenna pattern. Since the surface of the substrate is a curved surface, referring to FIG. 2D, in an embodiment, exposure may be performed in a plurality of directions and a plurality of masks to transfer the antenna pattern to the photoresist layer 30, and the exposure directions may be Vertical to each other.
在對該導電層進行蝕刻,以圖案化該導電層並形成該天線圖案(S34)的過程中,可使用氫氧化鈉(NaOH)或其他蝕刻劑進行濕蝕刻。In the process of etching the conductive layer to pattern the conductive layer and form the antenna pattern (S34), wet etching may be performed using sodium hydroxide (NaOH) or other etchant.
在對該導電層進行顯影製程,以使該導電層形成該天線圖案(S3)之後,進行該增厚製程,增加該(天線)天線圖案的厚度(S4),其中,該增厚製程包括化學鍍膜製程、電鍍製程或印刷製程。After the conductive layer is developed to form the conductive pattern to form the antenna pattern (S3), the thickening process is performed to increase the thickness of the (antenna) antenna pattern (S4), wherein the thickening process includes chemistry Coating process, electroplating process or printing process.
參照第4圖,其係顯示應用本發明之上述實施例之天線製作方法所形成之天線結構的截面圖,本發明之天線製作方法所形成之天線結構21包括一第一導電層211以及一第二導電層212。該第一導電層211係透過真空濺鍍的方式形成。該第二導電層212形成於該第一導電層211之上,其中,該第二導電層212係以化學鍍膜、電鍍或印刷等方式形成。Referring to FIG. 4, which is a cross-sectional view showing an antenna structure formed by applying the antenna manufacturing method of the above-described embodiment of the present invention, the antenna structure 21 formed by the antenna manufacturing method of the present invention includes a first conductive layer 211 and a first Two conductive layers 212. The first conductive layer 211 is formed by vacuum sputtering. The second conductive layer 212 is formed on the first conductive layer 211, wherein the second conductive layer 212 is formed by electroless plating, electroplating or printing.
本發明之天線製作方法並不以上述實施例為限,請參照第5A圖,其係顯示本發明之另一實施例之天線製作方法的主要步驟,包括:首先,提供一基板,包括一基板表面(S5);再,在該基板表面上形成一複合導電層(S6);接著,對該複合導電層進行一圖案化製程,以使該複合導電層形成一天線圖案(S7),藉此形成本發明實施例之天線結構。The antenna manufacturing method of the present invention is not limited to the above embodiment. Please refer to FIG. 5A, which shows the main steps of the antenna manufacturing method according to another embodiment of the present invention, including: firstly, providing a substrate including a substrate a surface (S5); further, forming a composite conductive layer on the surface of the substrate (S6); and then performing a patterning process on the composite conductive layer to form the antenna pattern (S7) The antenna structure of the embodiment of the present invention is formed.
該基板可以為可攜式電子裝置的機殼。該基板表面可以為可攜式電子裝置機殼的內/外表面。參照第6A圖,其係顯示本發明所述之基板10之一實施例,其具有一基板表面11,該基板表面11可以為曲面。The substrate can be a casing of a portable electronic device. The surface of the substrate may be an inner/outer surface of the casing of the portable electronic device. Referring to Figure 6A, there is shown an embodiment of a substrate 10 of the present invention having a substrate surface 11 which may be curved.
參照第7圖,應用本實施例之天線製作方法,可以在基板10之基板表面11上形成天線21’,藉此,天線21’所佔用的空間可以降低到最小,可節省可攜式電子裝置的內部空間,並進一步縮小可攜式電子裝置的體積。 Referring to FIG. 7, the antenna 21' can be formed on the substrate surface 11 of the substrate 10 by using the antenna manufacturing method of the embodiment, whereby the space occupied by the antenna 21' can be minimized, and the portable electronic device can be saved. The internal space and further reduce the size of the portable electronic device.
以下進一步描述此實施例之本發明之天線製作方法之各步驟細節。 The details of the steps of the antenna manufacturing method of the present invention of this embodiment are further described below.
回到第6A圖,在該基板表面上形成該複合導電層之前(S5),該基板表面可以被粗化,藉此提高該導電層在該基板表面上的附著力。 Returning to Fig. 6A, before the composite conductive layer is formed on the surface of the substrate (S5), the surface of the substrate can be roughened, thereby increasing the adhesion of the conductive layer on the surface of the substrate.
在該基板表面上形成該複合導電層(S6)的步驟中,可以透過化學鍍膜方式於該基板之整個表面之上形成一第一導電層(請參照第8圖內之第一導電層211’)。於上述第一導電層形成後,接著施行另一沈積程序,例如為電鍍製程,於該基板之整個表面之上形成一第二導電層(請參照第8圖內之第二導電層212’)以完全覆蓋該第一導電層。在此,第二導電層與其下之第一導電層構成了形成於該基板上之一複合導電層,其中第二導電層之厚度係大於第一導電層之厚度,而第二導電層之使用材料可不同於第一導電層之使用材料且其可為當今使用之天線材料。。參照第6B圖,其係顯示一複合導電層20’附著於基板10之基板表面11之上。 In the step of forming the composite conductive layer (S6) on the surface of the substrate, a first conductive layer may be formed on the entire surface of the substrate by electroless plating (refer to the first conductive layer 211 in FIG. 8). ). After the first conductive layer is formed, another deposition process, such as an electroplating process, is performed to form a second conductive layer over the entire surface of the substrate (refer to the second conductive layer 212' in FIG. 8) The first conductive layer is completely covered. Here, the second conductive layer and the first conductive layer thereunder form a composite conductive layer formed on the substrate, wherein the thickness of the second conductive layer is greater than the thickness of the first conductive layer, and the use of the second conductive layer The material may be different from the material used for the first conductive layer and it may be the antenna material used today. . Referring to Fig. 6B, a composite conductive layer 20' is attached to the substrate surface 11 of the substrate 10.
接著,參照第5B圖,在對該複合導電層進行一圖案化製程,以使該複合導電層形成該天線圖案(S7)的步驟中,包括下述多個步驟:首先,在該複合導電層上塗佈一光阻層(S71);再,對該光阻層進行曝光,以將該天線圖案轉印 至該光阻層(S72);接著,對該光阻層進行顯影,以留下該天線圖案(S73);再,對該複合導電層進行蝕刻,以圖案化該複合導電層並形成該天線圖案(S74);並,去除光阻層(S75)。 Next, referring to FIG. 5B, in the step of performing a patterning process on the composite conductive layer to form the composite conductive layer to form the antenna pattern (S7), the method includes the following steps: First, in the composite conductive layer Coating a photoresist layer (S71); and exposing the photoresist layer to transfer the antenna pattern To the photoresist layer (S72); then, developing the photoresist layer to leave the antenna pattern (S73); and etching the composite conductive layer to pattern the composite conductive layer and form the antenna Pattern (S74); and, the photoresist layer is removed (S75).
在該導電層上塗佈該光阻層(S71)之步驟中,該光阻層係以靜電噴塗(Spray Coating)、旋轉塗佈(Spin Coating)、浸泡(dipping)方式塗佈,藉此將光阻層均勻的覆蓋於該導電層之上。 In the step of coating the photoresist layer (S71) on the conductive layer, the photoresist layer is applied by spray coating, spin coating, and dipping. The photoresist layer is uniformly covered on the conductive layer.
參照第6C圖,在對該光阻層進行曝光,以將該天線圖案轉印至該光阻層(S62)的步驟中,可使用具有天線圖案的光罩1進行曝光。由於該基板表面為曲面,參照第6D圖,在一實施例中,可以多個方向以及多個光罩分別進行曝光,以將該天線圖案轉印至該光阻層30,該等曝光方向可以相互垂直。 Referring to Fig. 6C, in the step of exposing the photoresist layer to transfer the antenna pattern to the photoresist layer (S62), exposure can be performed using the photomask 1 having an antenna pattern. Since the surface of the substrate is a curved surface, referring to FIG. 6D, in an embodiment, exposure may be performed in a plurality of directions and a plurality of masks to transfer the antenna pattern to the photoresist layer 30, and the exposure directions may be Vertical to each other.
在對該複合導電層進行蝕刻,以圖案化該複合導電層並形成該天線圖案(S74)的過程中,可使用氫氧化鈉(NaOH)或其他蝕刻劑進行濕蝕刻。 In the process of etching the composite conductive layer to pattern the composite conductive layer and form the antenna pattern (S74), wet etching may be performed using sodium hydroxide (NaOH) or other etchant.
參照第7圖,其係顯示應用本發明之上述實施例之天線製作方法所形成之天線結構的截面圖,本發明之天線製作方法所形成之天線結構21包括一第一導電層211’以及一第二導電層212’。該第一導電層211’係透過化學鍍膜方式形成,而該第二導電層212’係藉由如電鍍製程之一沈積程序而形成於該第一導電層211’之上,其中,該第一導電層211’與該第二導電層212’係先形成於基板之所有表面之上並接著為一圖案化製程所圖案化,進而形成了此天線結構21’。Referring to FIG. 7, a cross-sectional view showing an antenna structure formed by applying the antenna manufacturing method of the above-described embodiment of the present invention, the antenna structure 21 formed by the antenna manufacturing method of the present invention includes a first conductive layer 211' and a Second conductive layer 212'. The first conductive layer 211 ′ is formed by an electroless plating method, and the second conductive layer 212 ′ is formed on the first conductive layer 211 ′ by a deposition process such as an electroplating process, wherein the first The conductive layer 211' and the second conductive layer 212' are formed on all surfaces of the substrate and then patterned for a patterning process to form the antenna structure 21'.
雖然本發明已以具體之較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此項技藝者,在不脫離本發明之精神和範圍內,仍可作些許的更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been described above in terms of the preferred embodiments thereof, it is not intended to limit the invention, and those skilled in the art can make some modifications and refinements without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.
1...光罩1. . . Mask
10...基板10. . . Substrate
11...基板表面11. . . Substrate surface
20...導電層20. . . Conductive layer
20’...複合導電層20’. . . Composite conductive layer
21、21’...天線21, 21’. . . antenna
211、211’...第一導電層211, 211’. . . First conductive layer
212、212’...第二導電層212, 212’. . . Second conductive layer
30...光阻層30. . . Photoresist layer
S1、S2、S3、S4、S5、S6、S7...主要步驟S1, S2, S3, S4, S5, S6, S7. . . The main steps
S31、S32、S33、S34、S35、S71、S72、S73、S74、S75...圖案化製程S31, S32, S33, S34, S35, S71, S72, S73, S74, S75. . . Patterning process
第1A圖係顯示本發明一實施例之天線製作方法的主要步驟;1A is a view showing main steps of a method of fabricating an antenna according to an embodiment of the present invention;
第1B圖係顯示在對第1A圖之實施例內該導電層進行圖案化製程的細部步驟;Figure 1B shows a detailed step of patterning the conductive layer in the embodiment of Figure 1A;
第2A圖係顯示本發明所述之基板之一實施例;2A is a view showing an embodiment of the substrate of the present invention;
第2B圖係顯示導電層附著於基板之基板表面之上;Figure 2B shows the conductive layer attached to the surface of the substrate of the substrate;
第2C圖係顯示具有該天線圖案的光罩;Figure 2C shows a photomask having the antenna pattern;
第2D圖係顯示以多個方向以及多個光罩分別進行曝光,以將該天線圖案轉印至該光阻層的情形;2D is a view showing a case where exposure is performed in a plurality of directions and a plurality of masks to transfer the antenna pattern to the photoresist layer;
第3圖係顯示本發明之一實施例之天線結構;Figure 3 is a diagram showing an antenna structure of an embodiment of the present invention;
第4圖其係顯示應用本發明之一實施例之天線製作方法所形成之天線結構的截面圖;4 is a cross-sectional view showing an antenna structure formed by applying an antenna manufacturing method according to an embodiment of the present invention;
第5A圖係顯示本發明另一實施例之天線製作方法的主要步驟;Figure 5A is a diagram showing the main steps of a method of fabricating an antenna according to another embodiment of the present invention;
第5B圖係顯示在對第5A圖之實施例內該導電層進行圖案化製程的細部步驟;Figure 5B shows a detailed step of patterning the conductive layer in the embodiment of Figure 5A;
第6A圖係顯示本發明所述之基板之另一實施例;Figure 6A is a view showing another embodiment of the substrate of the present invention;
第6B圖係顯示複合導電層附著於基板之基板表面之上;Figure 6B shows the composite conductive layer attached to the surface of the substrate of the substrate;
第6C圖係顯示具有該天線圖案的光罩;Figure 6C shows a photomask having the antenna pattern;
第6D圖係顯示以多個方向以及多個光罩分別進行曝光,以將該天線圖案轉印至該光阻層的情形;6D is a view showing a case where exposure is performed in a plurality of directions and a plurality of masks to transfer the antenna pattern to the photoresist layer;
第7圖係顯示本發明之另一實施例之天線結構;以及Figure 7 is a diagram showing an antenna structure of another embodiment of the present invention;
第8圖其係顯示應用本發明之另一實施例之天線製作方法所形成之天線結構的截面圖。Figure 8 is a cross-sectional view showing an antenna structure formed by an antenna manufacturing method to which another embodiment of the present invention is applied.
S1、S2、S3、S4‧‧‧主要步驟S1, S2, S3, S4‧‧‧ main steps
Claims (9)
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TW100136023A TWI547008B (en) | 2011-10-05 | 2011-10-05 | Antenna producing process |
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TW100136023A TWI547008B (en) | 2011-10-05 | 2011-10-05 | Antenna producing process |
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TW201316607A TW201316607A (en) | 2013-04-16 |
TWI547008B true TWI547008B (en) | 2016-08-21 |
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TW100136023A TWI547008B (en) | 2011-10-05 | 2011-10-05 | Antenna producing process |
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