TWI536003B - Apparatus and method of detecting defect for patterned retardation film and method of manufacturing patterned retardation film - Google Patents

Apparatus and method of detecting defect for patterned retardation film and method of manufacturing patterned retardation film Download PDF

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TWI536003B
TWI536003B TW101126060A TW101126060A TWI536003B TW I536003 B TWI536003 B TW I536003B TW 101126060 A TW101126060 A TW 101126060A TW 101126060 A TW101126060 A TW 101126060A TW I536003 B TWI536003 B TW I536003B
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image
phase difference
retardation film
defect
polarizing plate
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TW201310012A (en
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高橋一平
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富士軟片股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8848Polarisation of light

Description

圖案化相位差膜的缺陷檢測裝置與方法以及製造方法 Defect detecting device and method for patterning retardation film and manufacturing method

本發明是有關於圖案化相位差膜的缺陷檢測裝置與方法以及製造方法。 The present invention relates to a defect detecting apparatus and method and a manufacturing method relating to a patterned retardation film.

近年來,已有空間分割方式作為市場已逐步擴大的三維(3D)電視(television)的顯示方法之一。於空間分割方式中,僅顯示畫面的例如奇數行的右眼用的影像光進入至右眼,僅偶數行的左眼用的影像光進入至左眼。作為利用此種空間分割方式的顯示方法,將圖案化相位差膜配置於顯示面板(panel)的表面的方法已為人所知。作為代表性的圖案化相位差膜,已有具有1/4波長板的功能的圖案化相位差膜。 In recent years, there has been a spatial segmentation method as one of the three-dimensional (3D) television display methods that the market has gradually expanded. In the spatial division method, only the image light for the right eye such as an odd line of the display screen enters the right eye, and only the image light for the left eye of the even line enters the left eye. As a display method using such a spatial division method, a method of arranging a patterned retardation film on the surface of a display panel is known. As a typical patterned retardation film, a patterned retardation film having a function of a quarter-wave plate is known.

上述圖案化相位差膜以固定的間距(pitch),交替地並排配置有條狀(stripe shape)的兩種相位差區域。兩種相位差區域具有使光學軸(進相軸或遲相軸)彼此正交的λ/4波長板的功能。使奇數行的直線偏光的影像光射入至一個相位差區域,另外,使偶數行的直線偏光的影像光射入至另一個相位差區域。藉此,例如將奇數行的影像光轉換為右旋圓偏光,使該右旋圓偏光射出,另外,將偶數行的影像光轉換為左旋圓偏光,使該左旋圓偏光射出。而且,觀察者經由左右的偏光的旋轉方向互不相同的圓偏光眼鏡而進行觀察,藉此,僅使一行的右眼用的影像進入至右眼,且僅使左眼用的影像進入至左眼,結果會觀察到3D影像。 The patterned retardation film is alternately arranged with a stripe shape of two phase difference regions at a fixed pitch. The two phase difference regions have a function of a λ/4 wavelength plate that orthogonalizes the optical axes (the phase axis or the slow phase axis). The linearly polarized image light of the odd-numbered rows is incident on one phase difference region, and the even-line linearly polarized image light is incident on the other phase difference region. Thereby, for example, the odd-numbered lines of image light are converted into right-handed circularly polarized light, the right-handed circularly polarized light is emitted, and the even-numbered lines of image light are converted into left-handed circularly polarized light, and the left-handed circularly polarized light is emitted. Further, the observer observes the circularly polarized glasses having different rotational directions of the left and right polarized lights, thereby allowing only the image for the right eye of one line to enter the right eye, and only the image for the left eye is entered to the left. Eyes, the result will be observed 3D images.

圖案化相位差膜的製造步驟是於嚴格的管理下進行。由於該製造步驟中的各種因素,難以完全消除缺陷。作為缺陷,存在異物的混入、配光不均、以及損傷等。因此,實施在製造線上進行檢查的所謂的在線(on line)檢查。接著,掌握已產生缺陷的圖案化相位差膜的位置,將該缺陷部位予以除去,或不使用該部分地實現製品化。又,根據情況,進行排除缺陷原因的處置。 The manufacturing steps of the patterned retardation film are carried out under strict management. Due to various factors in this manufacturing step, it is difficult to completely eliminate defects. As a defect, there is a mixture of foreign matter, uneven light distribution, damage, and the like. Therefore, a so-called on line inspection which performs inspection on the manufacturing line is carried out. Next, the position of the patterned retardation film on which the defect has occurred is grasped, and the defective portion is removed or the product is not used. Further, depending on the situation, the treatment for eliminating the cause of the defect is performed.

以圖案化相位差膜為對象的缺陷檢測技術尚未為人所知。再者,根據透明膜或相位差膜這一觀點,例如,如日本專利特開平6-148095號公報(專利文獻1)、日本專利特開2008-267991號公報(專利文獻2)之類的缺陷檢查裝置已為人所知。專利文獻1的檢查裝置為如下的構成,即,將透明膜作為檢查對象,使透明膜處於配置在第1偏光板及第2偏光板之間的狀態,經由第1偏光板而照射出光,經由第2偏光板來接收自透明膜射出的光。 Defect detection techniques targeting patterned retardation films are not known. In the case of the transparent film or the retardation film, for example, a defect such as Japanese Patent Laid-Open No. Hei 6-148095 (Patent Document 1), Japanese Patent Laid-Open Publication No. 2008-267991 (Patent Document 2) Inspection devices are known. In the inspection apparatus of the patent document 1, the transparent film is placed between the first polarizing plate and the second polarizing plate, and the transparent film is placed between the first polarizing plate and the second polarizing plate, and the light is emitted through the first polarizing plate. The second polarizing plate receives the light emitted from the transparent film.

又,專利文獻2的檢查裝置是將相位差膜作為檢查對象,與專利文獻1同樣地,使相位差膜處於配置在兩塊偏光板之間的狀態,利用受光器來接收光。於該檢查裝置中,對各偏光板進行正交偏光(cross nicol)配置,並且將受光機的垂直受光角度θ1設為0°<θ1<90°,且將平行受光角度θ2設為0°<θ2<90°,藉此,對相位差膜的厚度方向的阻滯(retardation)所引起的相位差性的缺陷進行檢測。 In the inspection apparatus of the patent document 2, the retardation film is inspected, and in the same manner as in the case of the patent document 1, the phase difference film is placed between the two polarizing plates, and the light is received by the light receiver. In the inspection apparatus, a cross nicol is arranged for each polarizing plate, and the vertical light receiving angle θ1 of the light receiver is set to 0°<θ1<90°, and the parallel light receiving angle θ2 is set to 0°< Θ2 < 90°, thereby detecting a phase difference defect caused by retardation in the thickness direction of the retardation film.

然而,如上所述,圖案化相位差膜交替地配置有多個光學軸的方向互不相同的相位差區域。因此,若如上述專 利文獻1、專利文獻2般,僅配置偏光板,則會導致各相位差區域所觀察到的亮度有所不同。因此,存在如下的問題,即,無法精度良好地對缺陷進行檢測。 However, as described above, the patterned retardation film is alternately arranged with a phase difference region in which the directions of the plurality of optical axes are different from each other. Therefore, if the above special As in the case of Patent Document 1 and Patent Document 2, when only the polarizing plate is disposed, the brightness observed in each phase difference region is different. Therefore, there is a problem that the defect cannot be detected with high precision.

本發明是鑒於上述課題而成的發明,本發明的目的在於提供可精度良好地對圖案化相位差膜的缺陷進行檢測的圖案化相位差膜的缺陷檢測裝置與方法以及製造方法。 The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a defect detecting apparatus, method, and manufacturing method of a patterned retardation film which can accurately detect defects of a patterned retardation film.

為了實現上述課題,本發明的圖案化相位差膜的缺陷檢測裝置包括:第1偏光板及第2偏光板,以隔著圖案化相位差膜的方式而正交偏光地配置,於上述圖案化相位差膜中,多個光學軸彼此大致正交的條狀的第1相位差區域及第2相位差區域交替地並排地排列,且上述區域作為λ/4波長板而發揮功能;光源部,經由第1偏光板而將檢查光照射至圖案化相位差膜;攝影裝置,經由第2偏光板而拍攝圖案化相位差膜,獲得亮度圖像;以及缺陷檢測部,自亮度圖像中檢測出缺陷。對第1偏光板及第2偏光板的一個偏光透射軸的方向進行調整,使得在任一個偏光透射軸與第1相位差區域及第2相位差區域的任一個光學軸大致呈平行的狀態下,利用攝影裝置來對正常的第1相位差區域及第2相位差區域進行拍攝時的各亮度在消光狀態附近達到相同水準(level)。於該情形時,針對以低亮度水準所拍攝的圖案化相位差膜的第1相位差區域與第2相位差區域的正常部分,可以高亮度來拍攝缺陷部分,而且由於正常部分的亮度在第1相位差區域與第2相位差區域中相 同,因此,可精度良好地對缺陷進行檢測。 In order to achieve the above-described problem, the defect detecting device for a patterned retardation film of the present invention includes: a first polarizing plate and a second polarizing plate, which are arranged to be orthogonally polarized with a patterning retardation film interposed therebetween, and patterned in the above-described patterning In the retardation film, a stripe-shaped first phase difference region and a second phase difference region in which a plurality of optical axes are substantially perpendicular to each other are alternately arranged side by side, and the region functions as a λ/4 wavelength plate; The inspection light is irradiated onto the patterned retardation film via the first polarizing plate; the imaging device captures the patterned retardation film via the second polarizing plate to obtain a luminance image; and the defect detecting unit detects the luminance image defect. The direction of one polarization transmission axis of the first polarizing plate and the second polarizing plate is adjusted so that any one of the polarization transmission axes is substantially parallel to any one of the first phase difference region and the second phase difference region. Each of the luminances when the normal first phase difference region and the second phase difference region are imaged by the imaging device reaches the same level in the vicinity of the extinction state. In this case, for the first phase difference region and the normal portion of the second phase difference region of the patterned retardation film taken at a low luminance level, the defective portion can be photographed with high luminance, and since the brightness of the normal portion is 1 phase difference region and phase 2 in the second phase difference region In the same way, defects can be detected with high precision.

較佳為當圖案化相位差膜將相位差層積層於包含透明膜的支持體,藉此來形成第1相位差區域及第2相位差區域時,將消除支持體所具有的相位差特性的相位差補償板,配置於第1偏光板與圖案化相位差膜之間、或第2偏光板與圖案化相位差膜之間。簡便的是將該相位差補償板設為與支持體相同的透明膜。 It is preferable that when the patterned retardation film is laminated on the support including the transparent film to form the first retardation region and the second retardation region, the phase difference characteristic of the support is eliminated. The phase difference compensation plate is disposed between the first polarizing plate and the patterned retardation film or between the second polarizing plate and the patterned retardation film. Conveniently, the phase difference compensation plate is set to be the same transparent film as the support.

較佳為圖像處理部包括:二值化電路,以規定的臨限值來對已拍攝的亮度圖像進行二值化,將各畫素設為臨限值以上的明畫素與低於臨限值的暗畫素;以及候補缺陷抽出電路,將多個明畫素相連而成的區域設為候補缺陷區域,缺陷檢測部在邊界線的排列方向上,對候補缺陷區域與鄰接的其他候補缺陷區域之間的畫素數進行計數,當計數出的畫素數為規定值以下時,將相關的候補缺陷區域設為缺陷。 Preferably, the image processing unit includes a binarization circuit that binarizes the captured luminance image with a predetermined threshold value, and sets each pixel to a bright pixel or lower than a threshold value. a dark pixel of the threshold value; and a candidate defect extraction circuit, wherein a region in which a plurality of bright pixels are connected is a candidate defect region, and the defect detecting portion is adjacent to the candidate defect region and adjacent to each other in the direction in which the boundary line is arranged. The number of pixels between the candidate defect regions is counted, and when the number of pixels counted is equal to or less than a predetermined value, the relevant candidate defect region is set as a defect.

較佳為包括圖像處理部,該圖像處理部將與第1相位差區域及第2相位差區域的邊界相對應的亮度圖像內的邊界線消去,缺陷檢測部基於邊界線已被消去的亮度圖像,對缺陷進行檢測。 Preferably, the image processing unit erases a boundary line in the luminance image corresponding to the boundary between the first phase difference region and the second phase difference region, and the defect detecting unit has been erased based on the boundary line. The brightness image is used to detect defects.

又,較佳為圖像處理部包括:二值化電路,以規定的臨限值來對已拍攝的亮度圖像進行二值化,將各畫素設為臨限值以上的明畫素與低於臨限值的暗畫素;以及收縮處理電路,以與邊界線的寬度相對應的次數,對已二值化的亮度圖像進行收縮處理,將邊界線消去,上述收縮處理是 在邊界線的排列方向上使明畫素的區域收縮的處理。 Further, preferably, the image processing unit includes a binarization circuit that binarizes the captured luminance image with a predetermined threshold value, and sets each pixel to a bright pixel of a threshold or more. a dark pixel below the threshold; and a shrinkage processing circuit that shrinks the binarized luminance image by the number of times corresponding to the width of the boundary line, and eliminates the boundary line, and the shrinking process is A process of shrinking a region of a plain pixel in the direction in which the boundary lines are arranged.

較佳為圖像處理部包括膨脹處理電路,該膨脹處理電路對經收縮處理的亮度圖像進行膨脹處理,使收縮處理中所殘留的明畫素的區域恢復至收縮處理之前的尺寸(size),上述膨脹處理是在與收縮處理相同的方向上使明畫素的區域膨脹的處理,缺陷檢測部基於經膨脹處理的亮度圖像,對缺陷進行檢測。 Preferably, the image processing unit includes an expansion processing circuit that expands the contracted luminance image to restore the area of the bright pixel remaining in the contraction process to the size before the contraction process. The expansion process is a process of expanding a region of the plain pixel in the same direction as the shrinkage process, and the defect detection unit detects the defect based on the brightness image subjected to the expansion process.

又,較佳為圖像處理部包括:差分圖像產生電路,對亮度圖像上的各畫素進行差分處理,藉此,產生已實質上將邊界線消去的差分圖像,上述差分處理是針對亮度圖像上的畫素,將至少在邊界線的排列方向上與相關畫素僅相隔與邊界線間隔相對應的畫素數的畫素作為對方畫素,將自相關畫素的亮度減去對方畫素的亮度所得的值設為相關畫素的新的值;以及二值化電路,以規定的臨限值來對差分圖像進行二值化,將各畫素設為臨限值以上的明畫素與低於臨限值的暗畫素。 Further, preferably, the image processing unit includes a difference image generation circuit that performs difference processing on each pixel on the luminance image, thereby generating a difference image in which the boundary line is substantially eliminated, and the difference processing is For the pixels on the luminance image, at least in the direction of the boundary line, the pixels of the pixel number corresponding to the boundary of the correlation pixel are separated from the boundary line as the opposite pixel, and the luminance of the autocorrelation pixel is reduced. The value obtained by removing the luminance of the pixel of the opposite party is set to a new value of the relevant pixel; and the binarization circuit binarizes the difference image with a predetermined threshold value, and sets each pixel as a threshold value The above bright pixels and dark pixels below the threshold.

較佳為差分圖像產生電路在亮度圖像上的互不相同的方向的對方畫素之間進行差分處理,藉此,分別產生各個方向的差分圖像,二值化電路以規定的臨限值,分別對多個差分圖像進行二值化,產生多個二值化圖像,缺陷檢測部對多個二值化圖像進行缺陷檢測。 Preferably, the difference image generating circuit performs differential processing between the opposite pixels in mutually different directions on the luminance image, thereby generating differential images in respective directions, and the binarization circuit has a predetermined threshold The values are binarized to generate a plurality of binarized images, and the defect detecting unit performs defect detection on the plurality of binarized images.

又,本發明包括:第1偏光板及第2偏光板,以隔著圖案化相位差膜的方式而配置;照明光源,經由第1偏光板而將照明光照射至圖案化相位差膜;λ/4波長板,配置 於圖案化相位差膜與第2偏光板之間;攝影條件變更部,選擇性地設定為第1狀態與第2狀態,上述第1狀態是在使第1偏光板的透射軸相對於圖案化相位差膜的光學軸傾斜45°的狀態下,使第2偏光板的透射軸相對於λ/4波長板的光學軸達到+45度,上述第2狀態是使第2偏光板的透射軸相對於λ/4波長板的光學軸達到-45度;攝影裝置,在由攝影條件變更部產生的第1狀態及第2狀態下,經由λ/4波長板及第2偏光板而拍攝圖案化相位差膜,獲得第1圖像及第2圖像;圖像合成部,使第1圖像與第2圖像的第1相位差區域及第2相位差區域一致,使第1圖像及第2圖像重合,從而對該第1圖像及第2圖像進行合成;以及缺陷檢測部,基於來自圖像合成部的合成圖像信號,對缺陷進行檢測。於該情形時,可與一般的相位差膜同樣地,對圖案化相位差膜的缺陷進行檢測,而且,由於在遵循使用用途的原理的光學條件下進行拍攝,因此,可準確且精度良好地對成為實際運用方面的問題的缺陷進行檢測。 Further, the present invention includes: the first polarizing plate and the second polarizing plate are disposed so as to sandwich the retardation film; and the illumination light source irradiates the illumination light to the patterned retardation film via the first polarizing plate; /4 wavelength board, configuration Between the patterned retardation film and the second polarizing plate, the imaging condition changing unit is selectively set to a first state and a second state, and the first state is to pattern the transmission axis of the first polarizing plate When the optical axis of the retardation film is inclined by 45 degrees, the transmission axis of the second polarizing plate is brought to +45 degrees with respect to the optical axis of the λ/4 wavelength plate, and the second state is such that the transmission axis of the second polarizing plate is relatively The optical axis of the λ/4 wavelength plate is -45 degrees, and the imaging device captures the patterned phase via the λ/4 wavelength plate and the second polarizing plate in the first state and the second state generated by the imaging condition changing unit. The first film and the second image are obtained by the difference film, and the image combining unit matches the first phase difference region and the second phase difference region of the first image with the second image to make the first image and the first image The two images are superimposed to combine the first image and the second image, and the defect detecting unit detects the defect based on the composite image signal from the image combining unit. In this case, the defect of the patterned retardation film can be detected similarly to the general retardation film, and since the imaging is performed under the optical conditions following the principle of use, the accuracy can be accurately and accurately Test for defects that become problems in practical use.

較佳為圖像合成部於圖像合成時,改變與第1相位差區域及第2相位差區域的邊界線正交的方向上的第1圖像與第2圖像的相對位置,使該第1圖像與第2圖像重合,在使重合之後的合成圖像的平均亮度為最小的相對位置,製成合成圖像。又,較佳為使相對於第1圖像與第2圖像中的第1相位差區域及第2相位差區域的明部亮度,達到圖像合成部的動態範圍(dynamic range)與攝影裝置的動態範圍中的範圍較狹窄的動態範圍的大致一半的亮度,接 著進行拍攝。較佳為圖像合成部針對第1圖像與第2圖像而產生二值化信號,使一個二值化信號的明暗反轉而設為反轉二值信號,取得該反轉二值信號與另一個二值化信號的互斥或(exclusive OR)。 Preferably, the image synthesizing unit changes the relative positions of the first image and the second image in a direction orthogonal to the boundary line between the first phase difference region and the second phase difference region during image synthesis. The first image is superimposed on the second image, and a composite image is produced at a relative position where the average luminance of the composite image after the overlap is minimized. Further, it is preferable that the brightness of the bright portion of the first phase difference region and the second phase difference region in the first image and the second image is equal to the dynamic range of the image combining unit and the imaging device. The dynamic range of the range is less than half the brightness of the narrow dynamic range, Shooting. Preferably, the image synthesizing unit generates a binarized signal for the first image and the second image, inverts the brightness of one binarized signal, and sets the inverted binary signal to obtain the inverted binary signal. Exclusive OR with another binarized signal.

較佳為包括圖案邊界消去部,該圖案邊界消去部將由圖像合成部產生的二值化合成圖像中,基於第1相位差區域及第2相位差區域的邊界的圖案邊界部消去。較佳為圖案邊界消去部將包含第1相位差區域及第2相位差區域的邊界寬度的畫素區域作為雜訊(noise)而進行縮小處理。較佳為圖案化相位差膜是在第1相位差區域及第2相位差區域的列方向上搬送的網狀物(web),攝影裝置包括:取得第1圖像的第1攝影裝置本體、與取得第2圖像的第2攝影裝置本體,且與網狀物的搬送同步地拍攝網狀物。 Preferably, the pattern boundary erasing unit erases the pattern boundary portion based on the boundary between the first phase difference region and the second phase difference region in the binarized composite image generated by the image combining unit. Preferably, the pattern boundary erasing unit performs a reduction process on the pixel region including the boundary width of the first phase difference region and the second phase difference region as noise. Preferably, the patterned retardation film is a web that is transported in the column direction of the first phase difference region and the second phase difference region, and the imaging device includes a first imaging device body that acquires the first image, The mesh is photographed in synchronization with the conveyance of the mesh with the second image pickup apparatus main body that has acquired the second image.

本發明的圖案化相位差膜的缺陷檢測方法包括:調整步驟,在使第1偏光板及第2偏光板的任一個偏光透射軸的方向與第1相位差區域及第2相位差區域的任一個光學軸大致呈平行的範圍內進行調整,使得在將圖案化相位差膜配置於正交偏光地配置的第1偏光板及第2偏光板之間的狀態下,當經由第1偏光板而將檢查光照射至圖案化相位差膜時,經由第2偏光板而拍攝的正常的第1相位差區域及第2相位差區域的各亮度在消光狀態附近達到相同水準,於上述圖案化相位差膜中,多個光學軸彼此大致正交的條狀的第1相位差區域及第2相位差區域交替地並排地排列,且上述區域作為λ/4波長板而發揮功能;攝影步驟, 將圖案化相位差膜配置於偏光透射軸的方向經調整的第1偏光板及第2偏光板之間,經由第1偏光板而將檢查光照射至圖案化相位差膜,經由第2偏光板來拍攝相位差膜,取得亮度圖像;以及檢測步驟,基於已取得的亮度圖像來對缺陷進行檢測。 In the method of detecting a defect of the patterned retardation film of the present invention, the adjustment step is such that the direction of the polarization transmission axis of any of the first polarizing plate and the second polarizing plate is different from the first phase difference region and the second phase difference region. The optical axis is adjusted in a substantially parallel range so that the patterned retardation film is disposed between the first polarizing plate and the second polarizing plate disposed orthogonally polarized, and is passed through the first polarizing plate. When the inspection light is irradiated onto the patterned retardation film, the luminances of the normal first phase difference region and the second phase difference region imaged by the second polarizing plate reach the same level in the vicinity of the extinction state, and the patterning phase difference is obtained. In the film, a stripe-shaped first phase difference region and a second phase difference region in which a plurality of optical axes are substantially orthogonal to each other are alternately arranged side by side, and the region functions as a λ/4 wavelength plate; and a photographing step The patterned retardation film is disposed between the first polarizing plate and the second polarizing plate which are adjusted in the direction of the polarization transmission axis, and irradiates the inspection light to the patterned retardation film via the first polarizing plate, and passes through the second polarizing plate. The phase difference film is photographed to obtain a brightness image; and the detecting step detects the defect based on the acquired brightness image.

較佳為當圖案化相位差膜將相位差層積層於包含透明膜的支持體,藉此來形成第1相位差區域及第2相位差區域,於調整步驟及攝影步驟中,將消除支持體所具有的相位差特性的相位差補償板,配置於第1偏光板與圖案化相位差膜之間、或第2偏光板與圖案化相位差膜之間。簡便的是將相位差補償板設為與支持體相同的透明膜。 Preferably, the patterned retardation film is laminated on the support including the transparent film to form the first retardation region and the second retardation region, and the support is removed in the adjustment step and the photographing step. The phase difference compensation plate having the phase difference characteristics is disposed between the first polarizing plate and the patterned retardation film or between the second polarizing plate and the patterned retardation film. It is simple to set the phase difference compensation plate to be the same transparent film as the support.

較佳為圖像處理部包括:二值化步驟,以規定的臨限值來對已拍攝的亮度圖像進行二值化,將各畫素設為臨限值以上的明畫素與低於臨限值的暗畫素;以及候補缺陷抽出步驟,將多個明畫素相連而成的區域設為候補缺陷區域,檢測步驟是在邊界線的排列方向上,對候補缺陷區域與鄰接的其他候補缺陷區域之間的畫素數進行計數,當計數出的畫素數為規定值以下時,將相關的候補缺陷區域設為缺陷。 Preferably, the image processing unit includes a binarization step of binarizing the captured luminance image with a predetermined threshold value, and setting each pixel to a clear pixel or more below a threshold value. a dark pixel of the threshold value; and a candidate defect extraction step, wherein a region in which a plurality of bright pixels are connected is a candidate defect region, and the detection step is in the direction in which the boundary lines are arranged, and the candidate defect region and the adjacent other The number of pixels between the candidate defect regions is counted, and when the number of pixels counted is equal to or less than a predetermined value, the relevant candidate defect region is set as a defect.

較佳為包括消去步驟,該消去步驟將與第1相位差區域及第2相位差區域的邊界相對應的亮度圖像內的邊界線消去,檢測步驟基於邊界線已被消去的亮度圖像,對缺陷進行檢測。 Preferably, the erasing step includes erasing a boundary line in the luminance image corresponding to the boundary between the first phase difference region and the second phase difference region, and the detecting step is based on the luminance image in which the boundary line has been erased. Detect defects.

較佳為消去步驟包括:二值化步驟,以規定的臨限值 來對已拍攝的亮度圖像進行二值化,將各畫素設為臨限值以上的明畫素與低於臨限值的暗畫素;以及收縮步驟,以與邊界線的寬度相對應的次數,對已二值化的亮度圖像進行收縮處理,將邊界線消去,上述收縮處理是在邊界線的排列方向上使明畫素的區域收縮的處理。 Preferably, the erasing step comprises: a binarization step to a prescribed threshold To binarize the captured luminance image, set each pixel to a bright pixel above the threshold and a dark pixel below the threshold; and a shrinking step to correspond to the width of the boundary line The number of times is to shrink the binarized luminance image and to remove the boundary line, which is a process of shrinking the region of the bright pixel in the direction in which the boundary lines are arranged.

較佳為消去步驟包括膨脹處理步驟,該膨脹處理步驟對經收縮處理的亮度圖像進行膨脹處理,使收縮處理中所殘留的明畫素的區域恢復至收縮處理之前的尺寸,上述膨脹處理是在與收縮處理相同的方向上使明畫素的區域膨脹的處理,檢測步驟基於經膨脹處理的亮度圖像,對缺陷進行檢測。 Preferably, the erasing step includes an expansion processing step of expanding the contracted brightness image to restore the area of the bright pixel remaining in the shrinking process to the size before the shrinking process, the expansion process being The process of expanding the area of the bright pixel in the same direction as the shrinking process, the detecting step detects the defect based on the brightness image of the expanded process.

較佳為消去步驟包括:差分圖像產生步驟,對亮度圖像上的各畫素進行差分處理,藉此,產生已實質上將邊界線消去的差分圖像,上述差分處理是針對亮度圖像上的畫素,將至少在邊界線的排列方向上與相關畫素僅相隔與邊界線間隔相對應的畫素數的畫素作為對方畫素,將自相關畫素的亮度減去對方畫素的亮度所得的值設為相關畫素的新的值;以及二值化步驟,以規定的臨限值來對差分圖像進行二值化,將各畫素設為臨限值以上的明畫素與低於臨限值的暗畫素。 Preferably, the erasing step includes: a difference image generating step of performing differential processing on each pixel on the luminance image, thereby generating a difference image that substantially eliminates the boundary line, wherein the difference processing is for the luminance image The upper pixel will be at least the pixel of the pixel corresponding to the boundary line spacing in the direction of the boundary line, and the pixel of the autocorrelation pixel is subtracted from the luminance of the autocorrelation pixel. The value obtained by the brightness is set to a new value of the correlation pixel; and the binarization step is to binarize the difference image with a predetermined threshold value, and each pixel is set as a threshold above the limit value Prime and dark pixels below the threshold.

較佳為差分圖像產生步驟在亮度圖像上的互不相同的方向的對方畫素之間進行差分處理,藉此,分別產生各個方向的差分圖像,二值化步驟以規定的臨限值,分別對多個差分圖像進行二值化,產生多個二值化圖像,檢測步驟 對多個二值化圖像進行缺陷檢測。 Preferably, the difference image generating step performs differential processing between the opposite pixels in mutually different directions on the luminance image, thereby generating difference images in respective directions, and the binarization step is performed with a predetermined threshold a value, respectively binarizing a plurality of difference images to generate a plurality of binarized images, and detecting steps Defect detection is performed on a plurality of binarized images.

又,本發明是以隔著圖案化相位差膜的方式而配置第1偏光板及第2偏光板,藉由照明光源,經由第1偏光板而將照明光照射至圖案化相位差膜,將λ/4波長板配置於圖案化相位差膜與第2偏光板之間,設定為第1狀態與第2狀態,藉由攝影裝置,經由λ/4波長板及第2偏光板,在第1狀態下進行拍攝而取得第1圖像,在第2狀態下進行拍攝而取得第2圖像,上述第1狀態是在使第1偏光板的透射軸相對於圖案化相位差膜的光學軸傾斜45°的狀態下,使第2偏光板的透射軸相對於λ/4波長板的光學軸達到+45度,上述第2狀態是使第2偏光板的透射軸相對於λ/4波長板的光學軸達到-45度,藉由圖像合成部,使第1圖像與第2圖像的第1相位差區域及第2相位差區域一致而重合,製成合成圖像,基於合成圖像來對上述缺陷進行檢測。 Further, in the present invention, the first polarizing plate and the second polarizing plate are disposed so as to sandwich the retardation film, and the illumination light is applied to the patterned retardation film via the first polarizing plate by the illumination light source. The λ/4 wavelength plate is disposed between the patterned retardation film and the second polarizing plate, and is set to the first state and the second state, and is first by the imaging device via the λ/4 wavelength plate and the second polarizing plate. The first image is acquired by photographing in the state, and the second image is obtained by photographing in the second state, and the first state is such that the transmission axis of the first polarizing plate is inclined with respect to the optical axis of the patterned retardation film. In the state of 45°, the transmission axis of the second polarizing plate is brought to +45 degrees with respect to the optical axis of the λ/4 wavelength plate, and the second state is such that the transmission axis of the second polarizing plate is opposite to the λ/4 wavelength plate. When the optical axis reaches -45 degrees, the image combining unit overlaps the first phase difference region and the second phase difference region of the first image and the second image to form a composite image based on the composite image. To detect the above defects.

本發明的圖案化相位差膜的製造方法包括:製造步驟,製造圖案化相位差膜,於該圖案化相位差膜中,多個光學軸彼此大致正交的條狀的第1相位差區域及第2相位差區域交替地並排地排列,且上述區域作為λ/4波長板而發揮功能;取得步驟,將圖案化相位差膜配置於偏光透射軸的方向經調整的第1偏光板及第2偏光板之間,經由第1偏光板而將檢查光照射至上述圖案化相位差膜,經由上述第2偏光板而拍攝相位差膜,取得亮度圖像;檢測步驟,基於已取得的亮度圖像,對缺陷進行檢測;以及調整步驟, 在取得步驟之前實施,且在使第1偏光板及第2偏光板的任一個偏光透射軸的方向與第1相位差區域及第2相位差區域的任一個光學軸大致呈平行的範圍內進行調整,使得在將圖案化相位差膜配置於第1偏光板及第2偏光板之間的狀態下,當經由第1偏光板而將檢查光照射至圖案化相位差膜時,經由第2偏光板而拍攝的正常的第1相位差區域及第2相位差區域的各亮度在消光狀態附近達到相同水準。 A method for producing a patterned retardation film according to the present invention includes a manufacturing step of producing a patterned retardation film in which a plurality of stripe first phase difference regions having a plurality of optical axes substantially orthogonal to each other and The second phase difference regions are alternately arranged side by side, and the region functions as a λ/4 wavelength plate; and the obtaining step is to arrange the patterned retardation film in the direction of the polarization transmission axis to adjust the first polarizing plate and the second Between the polarizing plates, the inspection light is irradiated onto the patterned retardation film via the first polarizing plate, the retardation film is imaged through the second polarizing plate, and a luminance image is obtained. The detection step is based on the acquired luminance image. , detecting defects; and adjusting steps, The pre-step is performed in a range in which the direction of the polarization transmission axis of any of the first polarizing plate and the second polarizing plate is substantially parallel to any one of the first phase difference region and the second phase difference region. In the state where the patterned retardation film is disposed between the first polarizing plate and the second polarizing plate, when the inspection light is irradiated to the patterned retardation film via the first polarizing plate, the second polarized light is transmitted. The luminances of the normal first phase difference region and the second phase difference region captured by the panel reach the same level in the vicinity of the extinction state.

又,本發明包括:製造步驟,製造圖案化相位差膜,於該圖案化相位差膜中,多個光學軸彼此正交的各個帶狀的第1相位差區域及第2相位差區域交替地並排地排列;照明步驟,以隔著圖案化相位差膜的方式而配置第1偏光板及第2偏光板,藉由照明光源,經由第1偏光板而將照明光照射至上述圖案化相位差膜;攝影步驟,將λ/4波長板配置於圖案化相位差膜與第2偏光板之間,設定為第1狀態與第2狀態,藉由攝影裝置,經由λ/4波長板及第2偏光板,在第1狀態下進行拍攝而取得第1圖像,在第2狀態下進行拍攝而取得第2圖像,上述第1狀態是在使第1偏光板的透射軸相對於圖案化相位差膜的光學軸傾斜45°的狀態下,使第2偏光板的透射軸相對於λ/4波長板的光學軸達到+45度,上述第2狀態是使第2偏光板的透射軸相對於λ/4波長板的光學軸達到-45度;圖像合成步驟,使第1圖像與第2圖像的第1相位差區域及第2相位差區域一致而重合,製成合成圖像;以及檢測步驟,基於合成 圖像來對缺陷進行檢測。 Moreover, the present invention includes a manufacturing step of manufacturing a patterned retardation film in which a plurality of strip-shaped first phase difference regions and second phase difference regions having a plurality of optical axes orthogonal to each other are alternately arranged In the illumination step, the first polarizing plate and the second polarizing plate are disposed so as to sandwich the retardation film, and the illumination light is irradiated to the patterned phase difference via the first polarizing plate by the illumination light source. In the filming step, the λ/4 wavelength plate is disposed between the patterned retardation film and the second polarizing plate, and is set to the first state and the second state, and is passed through the λ/4 wavelength plate and the second by the imaging device. The polarizing plate captures the first image by capturing the image in the first state, and acquires the second image by capturing the image in the second state. The first state is to make the transmission axis of the first polarizing plate relative to the patterned phase. When the optical axis of the differential film is inclined by 45 degrees, the transmission axis of the second polarizing plate is brought to +45 degrees with respect to the optical axis of the λ/4 wavelength plate, and the second state is such that the transmission axis of the second polarizing plate is opposite to the transmission axis. The optical axis of the λ/4 wavelength plate reaches -45 degrees; the image synthesis step makes A first retardation region image and the second image and the second retardation region is consistent overlap, a synthetic image; and a step of detecting, based on the synthesis of Image to detect defects.

根據本發明,可精度良好地對圖案化相位差膜的缺陷進行檢測,於該圖案化相位差膜中,多個光學軸彼此大致正交的條狀的第1相位差區域及第2相位差區域交替地並排地排列,且上述區域作為λ/4波長板而發揮功能。 According to the present invention, it is possible to accurately detect a defect of the patterned retardation film, and in the patterned retardation film, a stripe first phase difference region and a second phase difference in which a plurality of optical axes are substantially orthogonal to each other The regions are alternately arranged side by side, and the above regions function as λ/4 wavelength plates.

[第一實施形態] [First Embodiment]

於圖1中,缺陷檢測裝置10設置在圖案化相位差膜的製造線上。來自相位差膜形成步驟的長條的圖案化相位差膜(以下僅稱為相位差膜)12被連續地供給至上述缺陷檢測裝置10,對該相位差膜12進行缺陷檢測。再者,於以下的說明中,將相位差膜12的長度方向設為X方向,將與該X方向正交的相位差膜12的寬度方向設為Y方向。 In FIG. 1, the defect detecting device 10 is disposed on a manufacturing line of a patterned retardation film. The stripe patterned retardation film (hereinafter simply referred to as retardation film) 12 from the retardation film forming step is continuously supplied to the defect detecting device 10, and the retardation film 12 is subjected to defect detection. In the following description, the longitudinal direction of the retardation film 12 is defined as the X direction, and the width direction of the retardation film 12 orthogonal to the X direction is referred to as the Y direction.

如圖2所示,於相位差膜12中,相位差層12b的相位差特性不同的第1相位差區域14與第2相位差區域15在Y方向上交替地排列。相位差膜12是於相位差膜形成步驟中,在包含三醋酸纖維素(Triacetyl Cellulose,TAC)等透明膜的支持體12a的表面形成相位差層12b,該相位差層12b表現出第1相位差區域14、第2相位差區域15的相位差。 As shown in FIG. 2, in the retardation film 12, the first phase difference region 14 and the second phase difference region 15 having different phase difference characteristics of the phase difference layer 12b are alternately arranged in the Y direction. In the retardation film forming step, the retardation film 12 is formed with a retardation layer 12b on the surface of the support 12a including a transparent film such as Triacetyl Cellulose (TAC), and the retardation layer 12b exhibits the first phase. The phase difference between the difference region 14 and the second phase difference region 15 is obtained.

如圖1所示,第1相位差區域14、第2相位差區域15呈沿著相位差膜12的長度方向延伸的條狀,且在Y方向上,以固定的間距交替地排列配置。各相位差區域14、15的寬度(Y方向的長度)例如為270μm,各相位差區域 14、15以與上述寬度相同的間距而排列於Y方向。再者,於圖1中,誇張地描繪了各相位差區域14、15的寬度。 As shown in FIG. 1, the first phase difference region 14 and the second phase difference region 15 have a strip shape extending in the longitudinal direction of the retardation film 12, and are alternately arranged at a fixed pitch in the Y direction. The width (length in the Y direction) of each of the phase difference regions 14 and 15 is, for example, 270 μm, and each phase difference region 14, 15 are arranged in the Y direction at the same pitch as the above width. Further, in Fig. 1, the widths of the phase difference regions 14, 15 are exaggeratedly drawn.

以X方向為基準(0°),如圖3所示,第1相位差區域14是以如下的方式形成,即,作為光學軸(遲相軸或進相軸)例如遲相軸As1僅傾斜了「-45°(=-θ)」的λ/4波長板而發揮功能,一個第2相位差區域15(參照圖1)是以如下的方式形成,即,作為遲相軸As2僅傾斜了「+45°(=+θ)」的λ/4波長板而發揮功能。因此,相位差膜12成為以使第1相位差區域14的遲相軸As1與第2相位差區域15的遲相軸As2彼此正交的方式而形成的圖案化相位差膜。此種相位差膜12例如貼附於液晶螢幕(screen),且用以觀察立體圖像。 With reference to the X direction (0°), as shown in FIG. 3, the first phase difference region 14 is formed in such a manner that the optical axis (late phase axis or phase advance axis), for example, the phase axis A1 is only tilted. The λ/4 wavelength plate of "-45° (=-θ)" functions, and one second phase difference region 15 (see Fig. 1) is formed in such a manner that the retardation axis As2 is only tilted. "+45° (= +θ)" λ/4 wavelength plate functions. Therefore, the retardation film 12 is a patterned retardation film formed such that the slow axis A1 of the first phase difference region 14 and the slow axis A2 of the second phase difference region 15 are orthogonal to each other. Such a retardation film 12 is attached to, for example, a liquid crystal screen and is used to observe a stereoscopic image.

再者,詳情如下所述,相位差膜12的遲相軸As1、As2無需相對於X方向嚴格地傾斜±45°,且作為基準的方向亦任意,只要為各相位差區域14、15的遲相軸彼此大致正交的圖案化相位差膜,則該圖案化相位差膜成為檢查對象。又,如下的圖案化相位差膜亦成為檢查對象,該圖案化相位差膜是以使進相軸彼此正交而非使遲相軸彼此正交的方式,形成各相位差區域。 In addition, as described below, the retardation axes As1 and As2 of the retardation film 12 need not be strictly inclined by ±45° with respect to the X direction, and the direction as a reference is also arbitrary, as long as the phase difference regions 14 and 15 are delayed. When the patterned retardation film having substantially the same axis axis is orthogonal to each other, the patterned retardation film serves as an inspection target. Moreover, the patterned retardation film which forms each phase difference area so that the advancing axes are orthogonal to each other, and the slow axis is orthogonal to each other, is also inspected.

如圖1所示,缺陷檢測裝置10包括:光源部16、攝影裝置17、第1偏光板18、第2偏光板19、以及缺陷檢測單元20。假設3D電視作為使用有相位差膜12的最終製品,當觀賞者對該3D電視進行通常的觀察時,例如只要可檢測出直徑為100μm左右的缺陷即可,以此方式來決 定缺陷檢測裝置10中的各部分的各規格。原因在於:電視觀賞者不會識別出尺寸為100μm以下的缺陷,因此,在實際運用方面無問題。又,可列舉:異物、污物、損傷、或配光不均(相位差特性的局部性紊亂)等作為缺陷。 As shown in FIG. 1, the defect detecting apparatus 10 includes a light source unit 16, an imaging device 17, a first polarizing plate 18, a second polarizing plate 19, and a defect detecting unit 20. Assuming that the 3D television is the final product using the retardation film 12, when the viewer observes the 3D television normally, for example, as long as a defect having a diameter of about 100 μm can be detected, the method can be determined in this way. Each specification of each part in the defect detecting device 10 is determined. The reason is that the TV viewer does not recognize a defect having a size of 100 μm or less, and therefore, there is no problem in practical use. Further, as a defect, foreign matter, dirt, damage, or uneven light distribution (local disturbance of phase difference characteristics) may be mentioned.

於缺陷檢測裝置10中,藉由搬送機構(省略圖示),在X方向上對相位差膜形成步驟所供給的相位差膜12進行連續搬送。於該相位差膜12的搬送路徑中,以規定的間隔配置有2根引導輥(guide roller)(省略圖示)。將相位差膜12掛在上述引導輥上,藉此,於各引導輥之間的檢查平台(stage)上,相位差膜12保持為平面狀。 In the defect detecting device 10, the retardation film 12 supplied from the retardation film forming step is continuously conveyed in the X direction by a transport mechanism (not shown). In the transport path of the retardation film 12, two guide rollers (not shown) are arranged at predetermined intervals. The retardation film 12 is hung on the guide roller, whereby the retardation film 12 is maintained in a planar shape on an inspection stage between the respective guide rollers.

檢查平台中配置有光源部16、攝影裝置17、第1偏光板18、以及第2偏光板19。光源部16與攝影裝置17隔著搬送路徑而彼此配置於相反側。光源部16包括鹵素燈(halogen lamp)等光源,於本例中,自搬送路徑的下側經由第1偏光板18,在寬度方向上,一致地朝相位差膜12的下表面照射檢查光。再者,光源部16的光源可為金屬鹵化物燈(metal halide lamp)等其他燈,亦可為發光二極體(Light Emitting Diode,LED)等。 The light source unit 16, the imaging device 17, the first polarizing plate 18, and the second polarizing plate 19 are disposed in the inspection platform. The light source unit 16 and the imaging device 17 are disposed on the opposite side of each other with a transport path interposed therebetween. In the present embodiment, the light source unit 16 includes a light source such as a halogen lamp. In the present embodiment, the inspection light is uniformly applied to the lower surface of the retardation film 12 in the width direction via the first polarizing plate 18 from the lower side of the transport path. Further, the light source of the light source unit 16 may be another lamp such as a metal halide lamp, or may be a light emitting diode (LED) or the like.

攝影裝置17於搬送路徑的上側,自相位差膜12的法線方向經由第2偏光板19而拍攝相位差膜12的亮度圖像。該攝影裝置17是包含攝影透鏡(lens)17a與電荷耦合器件(Charge Coupled Device,CCD)線感測器(line sensor)17b等的線列式相機(linear array camera),且利用一次攝影,在相位差膜12的寬度方向上,對平行的一條 線進行拍攝,上述CCD線感測器17b包含呈線狀地排列的多個受光元件。亮度圖像的各畫素的值是表示自對應的相位差膜12的部分射出且透過第2偏光板19的光量、即經由第2偏光板19而觀察到的亮度。每當搬送一條線的量的相位差膜12時,藉由攝影裝置17來進行一次攝影,藉此,依序拍攝通過檢查平台的相位差膜12的亮度圖像。攝影裝置17的畫素解析度、即與亮度圖像的一個畫素相對應的相位差膜12上的Y方向的長度例如為10μm/畫素。再者,亦可不使用線列式相機,而是使用同時對多條線進行拍攝的區域相機(area camera)作為攝影裝置17。 The imaging device 17 captures the luminance image of the phase difference film 12 from the normal direction of the phase difference film 12 via the second polarizing plate 19 on the upper side of the transport path. The photographing device 17 is a linear array camera including a photographing lens 17a, a charge coupled device (CCD) line sensor 17b, and the like, and uses one shot at a time. a pair of parallel lines in the width direction of the retardation film 12 The line is photographed, and the CCD line sensor 17b includes a plurality of light receiving elements arranged in a line. The value of each pixel of the luminance image is the amount of light that is emitted from the portion of the corresponding phase difference film 12 and transmitted through the second polarizing plate 19, that is, the brightness observed through the second polarizing plate 19. Each time the phase difference film 12 of one line is conveyed, the photographing device 17 performs one shot, whereby the brightness image of the phase difference film 12 passing through the inspection stage is sequentially photographed. The pixel resolution of the photographing device 17, that is, the length in the Y direction on the retardation film 12 corresponding to one pixel of the luminance image is, for example, 10 μm/pixel. Further, instead of using a line camera, an area camera that simultaneously photographs a plurality of lines may be used as the photographing device 17.

第1偏光板18是以與相位差膜12呈平行的姿勢,配置於光源部16與相位差膜12之間,另外,第2偏光板19是以與相位差膜12呈平行的姿勢,配置於相位差膜12與攝影裝置17之間。各偏光板18、19均為直線偏光型的偏光板。而且呈所謂的正交偏光配置,即,第1偏光板18的偏光透射軸P1與第2偏光板19的偏光透射軸P2彼此正交。 The first polarizing plate 18 is disposed between the light source unit 16 and the retardation film 12 in a posture parallel to the retardation film 12, and the second polarizing plate 19 is disposed in a posture parallel to the retardation film 12. Between the retardation film 12 and the photographing device 17. Each of the polarizing plates 18 and 19 is a linearly polarizing polarizing plate. Further, in the so-called orthogonal polarization arrangement, the polarization transmission axis P1 of the first polarizing plate 18 and the polarization transmission axis P2 of the second polarizing plate 19 are orthogonal to each other.

對第1偏光板18與第2偏光板19的相對於相位差膜12的偏光透射軸P1、P2的方向進行調整,使得當利用攝影裝置17來拍攝無缺陷的正常的第1相位差區域14與第2相位差區域15時,上述各相位差區域14、15達到相同的亮度水準。於如下的範圍內進行上述調整,上述範圍是指偏光透射軸P1與遲相軸As1大致呈平行,且偏光透射軸P2與遲相軸As2大致呈平行。藉此,在接近於消光狀 態的狀態(消光狀態附近)下,第1相位差區域14與第2相位差區域15的各亮度達到相同的水準,上述消光狀態是透過正常的第1相位差區域14與第2相位差區域15的檢查光不透過第2偏光板19的狀態。 The direction of the first polarizing plate 18 and the second polarizing plate 19 with respect to the polarization transmission axes P1 and P2 of the retardation film 12 is adjusted so that the normal first phase difference region 14 without defects is imaged by the imaging device 17. When the second phase difference region 15 is formed, the phase difference regions 14 and 15 reach the same brightness level. The above adjustment is performed in a range in which the polarization transmission axis P1 is substantially parallel to the slow axis A1, and the polarization transmission axis P2 is substantially parallel to the slow axis A2. Thereby, close to the matting In the state of the state (near the extinction state), the luminances of the first phase difference region 14 and the second phase difference region 15 reach the same level, and the extinction state is transmitted through the normal first phase difference region 14 and the second phase difference region. The inspection light of 15 does not pass through the state of the second polarizing plate 19.

相位差膜12是以使遲相軸As1、As2正交的方式而形成第1相位差區域14與第2相位差區域15,但實際上,有時因各種理由,會偏離遲相軸As1、As2彼此正交的狀態。因此,例如於將偏光透射軸P1調整為與遲相軸As1呈平行的情形下,有時第1相位差區域14處於不使檢查光通過的消光狀態,但第2相位差區域15並不處於消光狀態,上述第1相位差區域14與第2相位差區域15的亮度水準產生差異。如此,若各相位差區域14、15產生亮度差,則無法基於攝影裝置17的亮度圖像而精度良好地對缺陷進行檢測。因此,進行調整,使得雖非在消光狀態下,但如上所述在接近於消光狀態的狀態下,第1相位差區域14與第2相位差區域15的各亮度達到相同的水準,從而可精度良好地進行缺陷檢測。 The retardation film 12 forms the first phase difference region 14 and the second phase difference region 15 such that the slow phase axes As1 and As2 are orthogonal to each other. Actually, the retardation film A1 may deviate from the slow phase axis As1 for various reasons. The state in which As2 is orthogonal to each other. Therefore, for example, when the polarization transmission axis P1 is adjusted to be parallel to the slow axis A1, the first phase difference region 14 may be in an extinction state in which the inspection light is not passed, but the second phase difference region 15 is not in the In the matte state, the luminance levels of the first phase difference region 14 and the second phase difference region 15 are different. As described above, when the difference in luminance is generated in each of the phase difference regions 14 and 15, the defect cannot be accurately detected based on the luminance image of the imaging device 17. Therefore, the adjustment is performed such that, in the state of being close to the extinction state, the luminances of the first phase difference region 14 and the second phase difference region 15 reach the same level as described above, and the accuracy can be adjusted. Defect detection is performed well.

於本例中,進行調整,使得在第1相位差區域14的遲相軸As1與第1偏光板18的偏光透射軸P1大致呈平行的狀態下,正常的第1相位差區域14與第2相位差區域15的各亮度達到相同的水準,根據上述內容可知:以上述方式設為大致呈平行的狀態的原因在於設為接近於消光狀態的狀態。此處,在接近於消光狀態的狀態下,正常的第1相位差區域14與第2相位差區域15的各亮度達到相同的 水準,意味著調整為如下的狀態,即,若將遲相軸As1、As2所成的角度與90°之間的偏差設為△θ,則在偏光透射軸P1、P2所成的角度維持90°(正交偏光)的狀態下,偏光透射軸P1相對於遲相軸As1僅偏離△θ/2,另外,偏光透射軸P2相對於遲相軸As2僅偏離△θ/2。 In this example, the normal first phase difference region 14 and the second phase are adjusted so that the slow axis A1 of the first phase difference region 14 and the polarization transmission axis P1 of the first polarizing plate 18 are substantially parallel. The respective luminances of the phase difference regions 15 are at the same level. According to the above, it is understood that the reason for the substantially parallel state in the above-described manner is that the state is close to the extinction state. Here, in the state close to the extinction state, the luminances of the normal first phase difference region 14 and the second phase difference region 15 are the same. The level means that the angle between the angle formed by the retardation axes As1 and As2 and 90° is Δθ, and the angle formed by the polarization transmission axes P1 and P2 is maintained at 90. In the state of (orthogonal polarization), the polarization transmission axis P1 is shifted by Δθ/2 with respect to the slow axis A1, and the polarization transmission axis P2 is shifted by Δθ/2 with respect to the slow axis A2.

又,只要進行調整,使得第1偏光板18與第2偏光板19的任一個偏光透射軸,達到與第1相位差區域14及第2相位差區域15的任一個光學軸(遲相軸或進相軸)大致呈平行的狀態,從而使正常的第1相位差區域14與第2相位差區域15的各亮度達到相同的水準即可。因此,亦可進行調整,使得在第1偏光板18的偏光透射軸P1與第1相位差區域14的遲相軸As1大致正交的狀態下,正常的第1相位差區域14與第2相位差區域15的各亮度達到相同的水準。又,亦可進行調整,使得在偏光透射軸P1與第1相位差區域14的進相軸大致呈平行的狀態下或正交的狀態下,正常的第1相位差區域14與第2相位差區域15的各亮度達到相同的水準。 In addition, by adjusting the polarization transmission axis of any of the first polarizing plate 18 and the second polarizing plate 19, it is possible to achieve either of the optical axes of the first phase difference region 14 and the second phase difference region 15 (late phase axis or The phase advancement axis is substantially parallel, and the luminances of the normal first phase difference region 14 and the second phase difference region 15 may be at the same level. Therefore, adjustment may be made such that the normal first phase difference region 14 and the second phase are in a state where the polarization transmission axis P1 of the first polarizing plate 18 and the slow axis A1 of the first phase difference region 14 are substantially orthogonal to each other. The brightness of the difference region 15 reaches the same level. Further, adjustment may be made such that the normal first phase difference region 14 and the second phase difference are in a state in which the polarization transmission axis P1 and the first phase difference region 14 are substantially parallel to each other or in an orthogonal state. The brightness of the area 15 reaches the same level.

再者,第1偏光板18與第2偏光板19設為正交偏光配置,另外,第1相位差區域14與第2相位差區域15的各光學軸(例如遲相軸As1、As2)大致正交。因此,將一個偏光板的偏光透射軸與一個相位差區域的光學軸設為大致呈平行的狀態的意思,等同於將一個偏光板的偏光透射軸與另一個相位差區域的光學軸設為大致正交的狀態;將另一個偏光板的偏光透射軸與另一個相位差區域的光學軸 設定大致呈平行的狀態;以及將另一個偏光板的偏光透射軸與一個相位差區域的光學軸設為大致正交的狀態。 In addition, the first polarizing plate 18 and the second polarizing plate 19 are arranged in an orthogonal polarization, and the optical axes of the first phase difference region 14 and the second phase difference region 15 (for example, the slow phase axes As1 and As2) are substantially Orthogonal. Therefore, the polarization transmission axis of one polarizing plate and the optical axis of one phase difference region are substantially parallel, which is equivalent to the optical axis of one polarizing plate and the optical axis of the other phase difference region. Orthogonal state; the optical axis of the polarizing transmission axis of the other polarizing plate and the optical phase of the other phase difference region The substantially parallel state is set; and the polarization transmission axis of the other polarizing plate and the optical axis of one phase difference region are substantially orthogonal to each other.

來自攝影裝置17的亮度圖像被發送至缺陷檢測單元20。該缺陷檢測單元20基於由攝影裝置17獲得的亮度圖像,對相位差膜12的缺陷進行檢測。如圖4所示,缺陷檢測單元20包括圖像處理部21與缺陷檢測部22,圖像處理部21包括:D/A轉換器(數位-類比轉換器)23、記憶體(memory)24、二值化電路25、收縮處理電路26、膨脹處理電路27、以及雜訊除去電路28。 The luminance image from the photographing device 17 is sent to the defect detecting unit 20. The defect detecting unit 20 detects a defect of the phase difference film 12 based on the luminance image obtained by the photographing device 17. As shown in FIG. 4, the defect detecting unit 20 includes an image processing unit 21 and a defect detecting unit 22, and the image processing unit 21 includes a D/A converter (digital-to-analog converter) 23, a memory (memory) 24, The binarization circuit 25, the contraction processing circuit 26, the expansion processing circuit 27, and the noise removing circuit 28.

D/A轉換器23使亮度圖像的各畫素的亮度水準成為數位資料。記憶體24能夠記憶多條線的亮度圖像,且依序積存逐條線地輸入的亮度圖像,藉此,產生二維亮度圖像。又,記憶體24亦用作工作記憶體(work memory),該工作記憶體用以使缺陷檢測單元20的各部分進行處理。 The D/A converter 23 makes the luminance level of each pixel of the luminance image into digital data. The memory 24 is capable of memorizing the luminance images of a plurality of lines, and sequentially stores the luminance images input line by line, thereby generating a two-dimensional luminance image. Further, the memory 24 is also used as a work memory for processing the respective portions of the defect detecting unit 20.

於記憶體24中產生包含規定線數例如400條線的二維亮度圖像,將該二維亮度圖像作為一個處理單位來實施以後的圖像處理。以在前後的亮度圖像之間重疊的方式,產生包含400條線的二維亮度圖像,使得能夠無遺漏地對二維亮度圖像之間的邊界附近的缺陷進行檢測。每當於記憶體24中產生規定線數的亮度圖像時,圖像處理部21的各部分將上述亮度圖像予以讀出,接著對該亮度圖像實施規定的處理之後,再次將該亮度圖像保存至記憶體24。 A two-dimensional luminance image including a predetermined number of lines, for example, 400 lines, is generated in the memory 24, and the two-dimensional luminance image is subjected to subsequent image processing as one processing unit. A two-dimensional luminance image including 400 lines is generated in such a manner as to overlap between the front and rear luminance images, so that defects near the boundary between the two-dimensional luminance images can be detected without fail. Each time a luminance image having a predetermined number of lines is generated in the memory 24, each portion of the image processing unit 21 reads the luminance image, and then performs predetermined processing on the luminance image, and then the luminance is again performed. The image is saved to the memory 24.

將識別資料賦予亮度圖像。該識別資料表示圖像處理部21所實施的處理的歷程,每當利用圖像處理部21的各 部分來進行處理時,將上述識別資料的內容予以更新。圖像處理部21的各部分基於上述識別資料,識別是否對保存於記憶體24的亮度圖像進行上述處理,若存在應進行上述處理的亮度圖像,則自記憶體24讀出該亮度圖像,接著實施上述處理。藉此,藉由圖像處理部21來對二維亮度圖像依序實施規定的圖像處理。 The identification data is given to the brightness image. This identification data indicates the history of the processing performed by the image processing unit 21, and each time the image processing unit 21 is used. When the part is processed, the content of the above identification data is updated. Each part of the image processing unit 21 recognizes whether or not the above-described processing is performed on the luminance image stored in the memory 24 based on the identification data, and reads the luminance image from the memory 24 if there is a luminance image to be subjected to the above processing. For example, the above processing is carried out. Thereby, the image processing unit 21 sequentially performs predetermined image processing on the two-dimensional luminance image.

二值化電路25針對記憶於記憶體24的亮度圖像的各畫素,將亮度水準與規定的臨限值作比較而實現二值化。藉由該二值化,將亮度水準低於臨限值的畫素設為值為「0」的暗畫素,將亮度水準為臨限值以上的畫素設為值為「1」的明畫素。於上述二值化過程中,只要與相位差區域14、15的正常部分相對應的畫素為暗畫素,且亮度比上述正常部分更高且成為候補缺陷的畫素為明畫素即可,因此,在對第1偏光板18的偏光透射軸P1的方向進行調整之後,基於自正常部分獲得的亮度來設定臨限值。 The binarization circuit 25 binarizes the luminance level with respect to each pixel of the luminance image stored in the memory 24 by comparing the luminance level with a predetermined threshold value. By this binarization, a pixel whose luminance level is lower than the threshold value is set to a dark pixel whose value is "0", and a pixel whose luminance level is equal to or greater than the threshold value is set to a value of "1". Picture. In the above binarization process, the pixels corresponding to the normal portions of the phase difference regions 14 and 15 are dark pixels, and the luminance is higher than the normal portion, and the pixel that becomes the candidate defect is a bright pixel. Therefore, after adjusting the direction of the polarization transmission axis P1 of the first polarizing plate 18, the threshold value is set based on the luminance obtained from the normal portion.

於第1偏光板18、第2偏光板19經調整的狀態下,第1相位差區域14、第2相位差區域15的正常部分的亮度在接近於消光狀態的狀態下,兩者達到相同的亮度水準。用於上述二值化的臨限值只要為高於上述正常部分的亮度水準的亮度水準即可。根據將何亮度水準以上的亮度部分設為候補缺陷來決定上述臨限值。通常,可將預先模擬地產生的缺陷樣本(sample)或實際產生的缺陷樣本,放置於已調整的缺陷檢測裝置10或同等的光學系統的實驗機,接著對該缺陷的亮度進行測定,從而決定上述亮度 水準。 In a state where the first polarizing plate 18 and the second polarizing plate 19 are adjusted, the luminances of the normal portions of the first phase difference region 14 and the second phase difference region 15 are close to the extinction state, and both of them are the same. Brightness level. The threshold value for the above binarization may be a brightness level higher than the brightness level of the normal portion described above. The threshold value is determined based on the brightness portion above which the brightness level is equal to the candidate defect. In general, a sample of a defect generated in advance or an actually generated defect sample may be placed in an experimental machine of the adjusted defect detecting device 10 or an equivalent optical system, and then the brightness of the defect is measured to determine Above brightness level.

收縮處理電路26將亮度圖像中所含的相位差區域14、15的邊界線或雜訊消去。第1相位差區域14與第2相位差區域15的邊界雖寬度狹窄,但相位差特性不佳,與缺陷同樣地,亮度會變高。因此,於二維亮度圖像上,邊界線在Y方向上為規定的畫素數例如2個畫素~3個畫素,且沿著X方向的直線上的亮度變高。 The shrinkage processing circuit 26 erases the boundary line or noise of the phase difference regions 14, 15 included in the luminance image. Although the width of the boundary between the first phase difference region 14 and the second phase difference region 15 is narrow, the phase difference characteristics are not good, and the brightness is increased similarly to the defect. Therefore, in the two-dimensional luminance image, the boundary line is a predetermined number of pixels in the Y direction, for example, two pixels to three pixels, and the luminance on the straight line along the X direction becomes high.

為了將邊界線消去,收縮處理電路26對已二值化的亮度圖像進行收縮處理。又,藉由收縮處理,同時將Y方向的長度小且成為雜訊的明畫素消去。邊界線的各畫素藉由二值化而被轉換為明畫素。以在各相位差區域14、15的排列方向即Y方向上使明畫素的寬度縮小的方式,進行收縮處理。以僅可將邊界線消去的次數,即,以與邊界線的寬度(Y方向的畫素數)相對應的次數,進行上述收縮處理。以上述方式將邊界線消去,藉此,消除各相位差區域14、15的邊界的影響,從而可精度良好地對缺陷進行檢測。 In order to erase the boundary line, the contraction processing circuit 26 performs a contraction process on the binarized luminance image. Further, by the shrinking process, the bright pixels having a small length in the Y direction and being noise are eliminated. Each pixel of the boundary line is converted into a bright pixel by binarization. The shrinkage process is performed so that the width of the bright pixel is reduced in the Y direction of the arrangement direction of the phase difference regions 14 and 15. The shrinking process is performed in the number of times the boundary line can be erased only, that is, the number of times corresponding to the width of the boundary line (the number of pixels in the Y direction). By eliminating the boundary line in the above manner, the influence of the boundary of each of the phase difference regions 14, 15 is eliminated, and the defect can be accurately detected.

於一次收縮處理中,針對注視的亮度圖像上的畫素,當同一條線中的鄰接於上述畫素的畫素的另一側例如右側為暗畫素(值為「0」)時,對各畫素進行將注視畫素設為暗畫素(值為「0」)的處理。亦即,於同一條線上,將明畫素區域的右端的畫素設為暗畫素而除去。因此,例如當邊界線的寬度為2個畫素時,進行兩次收縮處理,當邊界線的寬度為3個畫素時,進行三次收縮處理,藉此,將邊界線消去。可根據攝影裝置17的解析度與相位差膜12上 的邊界線的寬度來決定進行幾次收縮處理。較為理想的是考慮邊界線的寬度的正常範圍內的偏差,藉由實驗且根據亮度圖像上的邊界線的寬度(畫素數)來決定上述收縮處理的次數。 In the primary contraction process, for the pixel on the gaze luminance image, when the other side of the pixel adjacent to the pixel in the same line, for example, the right side is a dark pixel (the value is "0"), For each pixel, a process of setting the attention pixel to a dark pixel (the value is "0") is performed. That is, on the same line, the pixel at the right end of the bright pixel region is removed as a dark pixel. Therefore, for example, when the width of the boundary line is 2 pixels, the contraction process is performed twice, and when the width of the boundary line is 3 pixels, the contraction process is performed three times, thereby eliminating the boundary line. According to the resolution of the photographing device 17 and the phase difference film 12 The width of the boundary line determines the number of shrinkage processes to be performed. It is preferable to consider the deviation in the normal range of the width of the boundary line, and determine the number of times of the above-described contraction processing by experiment and based on the width (number of pixels) of the boundary line on the luminance image.

再者,於上述收縮處理中,每當進行處理時,將明畫素區域的右端的畫素設為暗畫素而除去,但亦可將明畫素區域的左端的畫素設為暗畫素而除去。 Further, in the above-described contraction processing, the pixel at the right end of the bright pixel region is removed as a dark pixel every time the processing is performed, but the pixel at the left end of the bright pixel region may be set as a dark image. Removed.

膨脹處理電路27對收縮處理之後的亮度圖像實施膨脹處理。藉由該膨脹處理,使殘留於亮度圖像的明畫素的區域的Y方向的長度恢復。藉此,當進行缺陷判定時,可精度良好地對缺陷尺寸進行判定。在Y方向上,以收縮處理的逆邏輯來進行膨脹處理,針對亮度圖像上的注視畫素,當同一條線中的在左側鄰接於上述注視畫素的畫素為明畫素(值為「1」)時,對各畫素進行將注視畫素設為明畫素(值為「1」)的處理。以與收縮處理相同的處理次數來進行上述膨脹處理。 The expansion processing circuit 27 performs expansion processing on the luminance image after the contraction processing. By this expansion processing, the length in the Y direction of the region of the bright pixels remaining in the luminance image is restored. Thereby, when the defect determination is performed, the defect size can be accurately determined. In the Y direction, the expansion process is performed by the inverse logic of the contraction process, and for the attention pixel on the luminance image, the pixel adjacent to the attention pixel on the left side of the same line is a bright pixel (value is In the case of "1"), the process of setting the fixation pixel to the bright pixel (the value is "1") is performed for each pixel. The above expansion process is performed in the same number of processes as the shrinkage process.

再者,於本例中,當進行缺陷檢測時,為了容易基於畫素數來將缺陷予以抽出或對缺陷進行判定,進行膨脹處理,使殘留的明畫素的區域的尺寸恢復。因此,若不根據明畫素的區域的尺寸而判斷為缺陷,則可將膨脹處理予以省略。又,於本例中,僅在Y方向上進行收縮處理及膨脹處理,因此,亦可不使亮度圖像實現二維化而逐條線地進行收縮處理及膨脹處理。而且,於本例中,僅以Y方向為對象而進行收縮、膨脹處理,但亦可在X方向上進行收縮、 膨脹處理,藉此,同時將X方向的長度小且成為雜訊的明畫素消去。 Further, in the present example, when the defect detection is performed, in order to easily extract the defect or determine the defect based on the number of pixels, the expansion process is performed to restore the size of the area of the remaining bright pixels. Therefore, if it is determined that the defect is not based on the size of the region of the bright pixel, the expansion process can be omitted. Moreover, in this example, since the shrinking process and the expansion process are performed only in the Y direction, the shrinkage process and the expansion process may be performed line by line without making the brightness image two-dimensional. Further, in this example, the shrinkage and expansion treatment are performed only for the Y direction, but the shrinkage may be performed in the X direction. The expansion process is performed by simultaneously removing the bright pixels which are small in the X direction and become noise.

雜訊除去電路28將規定畫素數以下的明畫素的區域作為雜訊,自亮度圖像予以除去。於本例中,在收縮處理之後及膨脹處理之前的階段,將周圍全部為暗畫素的孤立的一個畫素的明畫素(孤立點)作為雜訊而消去。將明畫素轉換為暗畫素,藉此,進行上述消去。再者,由雜訊除去電路28進行的雜訊除去是消除作為電性雜訊等的因各種因素而出現的雜訊的明畫素、或面積(畫素數)小至如下的程度的明畫素的區域,上述程度是指即便不對缺陷進行檢測,亦不會成為問題的程度,且不限於一個畫素的明畫素的區域,亦可將多個明畫素相連而成的明畫素的區域作為雜訊而予以除去。又,亦可將收縮處理之前的亮度圖像的雜訊予以除去,或在膨脹處理之後且在即將進行缺陷檢測之前,將雜訊予以除去。 The noise removing circuit 28 removes the area of the bright pixel having a predetermined number of pixels or less as noise from the luminance image. In this example, after the shrinking process and before the expansion process, the clear pixels (isolated points) of one of the surrounding pixels which are all dark pixels are eliminated as noise. The above-described erasing is performed by converting the bright pixels into dark pixels. In addition, the noise removal by the noise removing circuit 28 is to eliminate the bright pixels of the noise which are caused by various factors such as electrical noise, or the area (the number of pixels) is as small as the following. In the region of the pixel, the above-mentioned degree means that the defect is not a problem even if the defect is not detected, and is not limited to the region of the bright pixel of one pixel, and the bright painting in which a plurality of bright pixels are connected. The area of the prime is removed as a noise. Further, the noise of the luminance image before the shrinking process may be removed, or the noise may be removed after the expansion process and immediately before the defect detection.

缺陷檢測部22根據膨脹處理之後的亮度圖像來對缺陷進行檢測。該缺陷檢測部22於缺陷的檢測過程中,將亮度圖像上的明畫素的區域予以抽出,接著將該抽出的區域確定為缺陷部分。又,亦可藉由檢查明畫素的區域的畫素數來對缺陷的X方向、Y方向的長度、尺寸、以及形狀進行判定。亦即,亦可基於明畫素的區域的長度或尺寸,判定是否將該明畫素的區域設為缺陷部分。當檢測出缺陷時,缺陷檢測部22產生且輸出缺陷資訊,該缺陷資訊包含該缺陷在相位差膜12上的位置或檢測出的缺陷的尺寸。該 缺陷資訊被用作控制資訊,該控制資訊的作用在於不將缺陷部分用作製品。 The defect detecting unit 22 detects a defect based on the brightness image after the expansion process. The defect detecting unit 22 extracts the region of the bright pixel on the luminance image during the detection of the defect, and then determines the extracted region as the defective portion. Further, the length, the size, and the shape of the X-direction and the Y-direction of the defect can be determined by checking the number of pixels of the region of the bright pixel. That is, it is also possible to determine whether or not the region of the bright pixel is a defective portion based on the length or size of the region of the bright pixel. When a defect is detected, the defect detecting portion 22 generates and outputs defect information including the position of the defect on the retardation film 12 or the size of the detected defect. The The defect information is used as control information, and the purpose of the control information is not to use the defective portion as an article.

接著,對上述構成的作用進行說明。在由缺陷檢測裝置10進行的缺陷檢查之前,如圖5所示,先對偏光透射軸的方向進行調整。首先,設為如下的狀態,即,將作為檢查對象的相位差膜12的預先已確定的正常部分,配置於檢查平台的第1偏光板18與第2偏光板19之間。接著,使第1偏光板18與第2偏光板19的各偏光透射軸P1、P2正交,從而設為正交偏光狀態。 Next, the action of the above configuration will be described. Before the defect inspection by the defect detecting device 10, as shown in Fig. 5, the direction of the polarization transmission axis is first adjusted. First, a predetermined normal portion of the retardation film 12 to be inspected is placed between the first polarizing plate 18 and the second polarizing plate 19 of the inspection platform. Then, the polarization-transmission axes P1 and P2 of the first polarizing plate 18 and the second polarizing plate 19 are orthogonal to each other to be in a state of orthogonal polarization.

一面維持正交偏光狀態、及與相位差膜12呈平行的平行狀態,一面進行粗調整,利用該粗調整,使第1偏光板18的偏光透射軸P1與第1相位差區域14的遲相軸As1呈平行。此時,無需使偏光透射軸P1與遲相軸As1嚴格地平行,可為大致平行的程度。簡單而言,在使光源部16點燈的狀態下,當經由第2偏光板19而對第1相位差區域14、或第2相位差區域15進行觀察時,只要以達到消光狀態的方式進行調整即可,上述消光狀態是透過的光量變得最少的狀態。 While maintaining the orthogonal polarization state and the parallel state parallel to the retardation film 12, coarse adjustment is performed, and the polarization adjustment axis P1 of the first polarizing plate 18 and the first phase difference region 14 are delayed by the coarse adjustment. The axis As1 is parallel. At this time, it is not necessary to make the polarization transmission axis P1 and the slow axis A1 strictly parallel, and it is possible to be substantially parallel. In the state in which the light source unit 16 is turned on, when the first retardation region 14 or the second retardation region 15 is observed via the second polarizing plate 19, the matte state is achieved. The adjustment may be performed, and the above-described extinction state is a state in which the amount of transmitted light is minimized.

於粗調整之後,使光源部16及攝影裝置17作動,使得能夠基於攝影裝置17所拍攝的亮度圖像,來參照第1相位差區域14與第2相位差區域15的各亮度水準。然後,以使各相位差區域14、15的亮度水準相同的方式進行微調整。 After the coarse adjustment, the light source unit 16 and the imaging device 17 are activated so that the respective brightness levels of the first phase difference region 14 and the second phase difference region 15 can be referred to based on the luminance image captured by the imaging device 17. Then, the fine adjustment is performed such that the luminance levels of the phase difference regions 14 and 15 are the same.

於微調整中,一面維持正交偏光狀態、及與相位差膜 12呈平行的平行狀態,一面以使各亮度水準相同的方式進行設定。於該微調整中,不使偏光透射軸P1的方向大幅度地改變,一面維持偏光透射軸P1與遲相軸As1大致呈平行且接近於消光狀態的狀態,一面對偏光透射軸P1的方向進行調整。 In the micro adjustment, one side maintains the orthogonal polarization state, and the phase difference film 12 is in a parallel parallel state, and one side is set so that the brightness levels are the same. In this fine adjustment, the direction in which the polarization transmission axis P1 and the slow axis A1 are substantially parallel and close to the extinction state is maintained without changing the direction of the polarization transmission axis P1, and the direction of the polarization transmission axis P1 is faced. Make adjustments.

來自光源部16的檢查光經由第1偏光板18而成為直線偏光,接著射入至相位差膜12。此處,當偏光透射軸P1準確地與第1相位差區域14的遲相軸As1呈平行時,自第1偏光板18射出的直線偏光的檢查光即便透過第1相位差區域14,亦不會產生相位差。因此,上述檢查光是在直線偏光的狀態下,射入至第2偏光板9。接著,射入至第2偏光板19的檢查光的偏光方向與第2偏光板19的偏光透射軸P2正交,因此,不會自第2偏光板19射出。 The inspection light from the light source unit 16 is linearly polarized via the first polarizing plate 18, and then incident on the retardation film 12. When the polarization transmission axis P1 is accurately parallel to the slow axis A1 of the first phase difference region 14, the inspection light of the linearly polarized light emitted from the first polarizing plate 18 does not pass through the first phase difference region 14, A phase difference will result. Therefore, the inspection light is incident on the second polarizing plate 9 in a state of being linearly polarized. Then, the polarization direction of the inspection light incident on the second polarizing plate 19 is orthogonal to the polarization transmission axis P2 of the second polarizing plate 19, and therefore, it is not emitted from the second polarizing plate 19.

又,當偏光透射軸P1與第1相位差區域14的遲相軸As1大致呈平行,而非準確地呈平行時,檢查光在透過第1相位差區域14時會產生相位差而成為橢圓偏光,接著射入至第2偏光板19。因此,於該情形時,已成為橢圓偏光的檢查光中,與偏光透射軸P2正交的偏光成分不會自第2偏光板19射出,但與偏光透射軸P2呈平行的偏光成分會自第2偏光板19射出。而且,偏光透射軸P1與遲相軸As1之間的方向關係越是大幅度地偏離平行狀態,則與偏光透射軸P2呈平行的偏光成分越大,因此,來自第2偏光板19的射出光量變大,第1相位差區域的亮度變高。 Further, when the polarization transmission axis P1 is substantially parallel to the slow axis A1 of the first phase difference region 14, and is not exactly parallel, the inspection light is phase-diffused when it passes through the first phase difference region 14, and becomes elliptically polarized. Then, it is incident on the second polarizing plate 19. Therefore, in this case, in the inspection light that has become elliptically polarized, the polarization component orthogonal to the polarization transmission axis P2 is not emitted from the second polarizing plate 19, but the polarization component parallel to the polarization transmission axis P2 is from the first. 2 The polarizing plate 19 is emitted. Further, the more the direction relationship between the polarization transmission axis P1 and the slow axis A1 is largely deviated from the parallel state, the larger the polarization component parallel to the polarization transmission axis P2, and therefore the amount of light emitted from the second polarizing plate 19 When the size is increased, the brightness of the first phase difference region is increased.

另一方面,雖對於第2相位差區域15而言亦相同,但 偏光透射軸P1、P2相對於遲相軸As2的關係與第1相位差區域14相反。亦即,當偏光透射軸P1準確地與第2相位差區域15的遲相軸As2正交時,來自第1偏光板18的直線偏光的檢查光的偏光方向準確地與遲相軸As2正交,因此,即便透過第2相位差區域15,亦會不產生相位差地射入至第2偏光板19。而且,上述檢查光的偏光方向與第2偏光板19的偏光透射軸P2正交,因此,不會自第2偏光板19射出。 On the other hand, the same is true for the second phase difference region 15, but The relationship between the polarization transmission axes P1 and P2 with respect to the slow axis A2 is opposite to that of the first phase difference region 14. In other words, when the polarization transmission axis P1 is accurately orthogonal to the slow axis A2 of the second phase difference region 15, the polarization direction of the inspection light of the linearly polarized light from the first polarizing plate 18 is accurately orthogonal to the slow axis A2. Therefore, even if it passes through the second phase difference region 15, it will enter the second polarizing plate 19 without causing a phase difference. Further, since the polarization direction of the inspection light is orthogonal to the polarization transmission axis P2 of the second polarizing plate 19, it is not emitted from the second polarizing plate 19.

又,當偏光透射軸P1與第2相位差區域15的遲相軸As1大致正交,而非準確地正交時,檢查光在透過第2相位差區域15時會產生相位差而成為橢圓偏光。已成為橢圓偏光的檢查光中,僅與偏光透射軸P2呈平行的偏光成分自第2偏光板19射出。偏光透射軸P1與遲相軸As2之間的方向關係越是大幅度地偏離正交狀態,則與偏光透射軸P2呈平行的偏光成分越大,來自第2偏光板19的射出光量變大,亮度變高。 Further, when the polarization transmission axis P1 is substantially orthogonal to the slow axis A1 of the second phase difference region 15, and is not orthogonally orthogonal, the inspection light is phase-diffused when it passes through the second phase difference region 15, and becomes elliptically polarized. . Among the inspection lights that have become elliptically polarized, only the polarization component parallel to the polarization transmission axis P2 is emitted from the second polarizing plate 19. When the direction relationship between the polarization transmission axis P1 and the slow axis A2 is largely shifted from the orthogonal state, the amount of light emitted from the second polarizing plate 19 increases as the polarization component parallel to the polarization transmission axis P2 increases. The brightness becomes higher.

當如下的相位差膜12為檢查對象時,遲相軸As1與偏光透射軸P1相對於平行的偏移的增減,是與遲相軸As2與偏光透射軸P1相對於正交的偏移的增減相同,且該偏移的大小相同,上述相位差膜12以使遲相軸As1、As2彼此準確地正交的方式而形成有第1相位差區域14與第2相位差區域15。因此,在偏光透射軸P1達到與遲相軸As1呈平行的狀態的同時,偏光透射軸P1達到與遲相軸As2正交的狀態,因此,來自第1相位差區域14、第2相位差 區域15的檢查光不會自第2偏光板19射出,可將任一個區域的亮度均調整為「0」(消光狀態)。 When the retardation film 12 as follows is an inspection object, the increase or decrease of the retardation axis As1 and the polarization transmission axis P1 with respect to the parallel shift is an offset with respect to the orthogonal phase axis A2 and the polarization transmission axis P1 with respect to the orthogonal direction. The increase and decrease are the same, and the magnitude of the offset is the same. The retardation film 12 is formed with the first phase difference region 14 and the second phase difference region 15 such that the slow axis axes As1 and As2 are accurately orthogonal to each other. Therefore, the polarization transmission axis P1 is in a state parallel to the slow axis A1, and the polarization transmission axis P1 is in a state orthogonal to the slow axis A2. Therefore, the first phase difference region 14 and the second phase difference are obtained. The inspection light of the area 15 is not emitted from the second polarizing plate 19, and the brightness of any of the areas can be adjusted to "0" (extinction state).

如上所述,對於相位差膜12而言,理想的狀態是遲相軸As1、As2彼此準確地正交的狀態,但在多數情形下,由於如下的相位差區域形成時的遲相軸的朝向的誤差等因素,遲相軸As1與遲相軸As2不會準確地正交,而是稍微偏離正交狀態,上述相位差區域即便支持體12a稍小,仍表現出雙折射性。於該情形時,無法在使偏光透射軸P1達到與遲相軸As1呈平行的狀態的同時,使偏光透射軸P1達到與遲相軸As2正交的狀態。亦即,無法以如下的方式進行微調整,該方式是指同時將第1相位差區域14及第2相位差區域15的亮度水準設為「0」來拍攝該兩個相位差區域。 As described above, in the retardation film 12, the ideal state is a state in which the slow phase axes As1 and As2 are exactly orthogonal to each other, but in many cases, the orientation of the slow phase axis is formed due to the following phase difference region formation. The error phase and the like, the retardation axis As1 and the slow phase axis As2 are not exactly orthogonal, but slightly deviate from the orthogonal state, and the phase difference region exhibits birefringence even if the support 12a is slightly smaller. In this case, the polarization transmission axis P1 cannot be brought into a state parallel to the slow axis A1, and the polarization transmission axis P1 cannot be made orthogonal to the slow axis A2. In other words, the fine adjustment cannot be performed in such a manner that the luminance levels of the first phase difference region 14 and the second phase difference region 15 are simultaneously set to "0", and the two phase difference regions are captured.

然而,可使遲相軸As1與偏光透射軸P1相對於平行的偏移、及遲相軸As2與偏光透射軸P1相對於正交的偏移的大小相同,從而使透過第1相位差區域14、第2相位差區域15而自第2偏光板19射出的檢查光的偏光成分的大小相同。因此,可在非「0」但亮度水準低的接近於消光狀態的狀態下,同時將第1相位差區域14、第2相位差區域15的亮度微調整為相同的亮度水準。 However, the offset of the slow axis A1 and the polarization transmission axis P1 with respect to the parallel direction and the offset of the slow axis A2 and the polarization transmission axis P1 with respect to the orthogonal direction can be made the same, so that the first phase difference region 14 is transmitted. The polarization components of the inspection light emitted from the second polarizing plate 19 in the second phase difference region 15 have the same magnitude. Therefore, the luminances of the first phase difference region 14 and the second phase difference region 15 can be finely adjusted to the same brightness level in a state close to the extinction state, which is not "0" but the luminance level is low.

如上所述,對偏光透射軸P1進行微調整之後,取得由攝影裝置17對第1相位差區域14或第2相位差區域15的正常部分進行拍攝所得的亮度水準,將稍高於該亮度水準的臨限值設定至二值化電路25。然後,開始對相位差膜 12進行缺陷檢查。 As described above, after the polarization transmission axis P1 is finely adjusted, the brightness level obtained by the imaging device 17 for capturing the normal portion of the first phase difference region 14 or the second phase difference region 15 is slightly higher than the brightness level. The threshold value is set to the binarization circuit 25. Then, start the phase difference film 12 Perform defect inspection.

缺陷檢查開始之後,自相位差膜形成步驟起,將相位差膜12連續地供給至缺陷檢測裝置10,該相位差膜12經由檢查平台,進一步朝下游搬送。於該搬送過程中,來自光源部16的檢查光經由第1偏光板18而照射至相位差膜12,每當搬送一條線的量的相位差膜12時,藉由攝影裝置17來拍攝一條線的量的亮度圖像。 After the start of the defect inspection, the retardation film 12 is continuously supplied to the defect detecting device 10 from the retardation film forming step, and the retardation film 12 is further transported downstream via the inspection platform. In the transport process, the inspection light from the light source unit 16 is irradiated to the retardation film 12 via the first polarizing plate 18, and each time a phase difference film 12 of one line is transported, a line is taken by the photographing device 17. The amount of brightness image.

每當進行拍攝時,一條線的量的亮度圖像自攝影裝置17發送至缺陷檢測單元20,D/A轉換器23使各畫素的亮度水準成為數位資料之後,該數位資料被寫入至記憶體24。藉此,產生二維亮度圖像。若規定線數的亮度圖像被寫入至記憶體24,則藉由二值化電路25,自記憶體24將亮度圖像予以讀出,接著將各畫素與之前所設定的臨限值作比較,從而實現二值化。 Whenever shooting is performed, the luminance image of the amount of one line is sent from the photographing device 17 to the defect detecting unit 20, and after the D/A converter 23 makes the luminance level of each pixel into digital data, the digital data is written to Memory 24. Thereby, a two-dimensional luminance image is generated. When the luminance image of the predetermined number of lines is written to the memory 24, the luminance image is read from the memory 24 by the binarization circuit 25, and then the pixels are set to the previously set threshold. Compare to achieve binarization.

如圖6A中的一例所示,於已二值化的亮度圖像I中,除了包含與第1相位差區域14、第2相位差區域15的正常部分相對應的暗畫素區域D1、邊界線D2之外,亦包含明畫素區域D3~明畫素區域D7。第1相位差區域14、第2相位差區域15的正常部分的亮度低於臨限值,因此,該正常部分成為暗畫素的條狀的暗畫素區域D1。若將各相位差區域14、15的寬度設為約270μm,且將攝影裝置17的畫素解析度設為10μm/畫素,則各暗畫素區域D1在Y方向上排列有約27個暗畫素,且在X方向上呈長的條狀。與缺陷部分同樣地,邊界線D2因鄰接的各暗畫素區域D1 的相位差特性的紊亂而表現為明畫素。各邊界線D2例如在Y方向上排列有約2個~3個明畫素,且呈沿著X方向延伸的直線狀。 As shown in the example of FIG. 6A, in the binarized luminance image I, the dark pixel region D1 corresponding to the normal portion of the first phase difference region 14 and the second phase difference region 15 is included. In addition to the line D2, the bright pixel area D3 to the bright pixel area D7 is also included. Since the luminance of the normal portion of the first phase difference region 14 and the second phase difference region 15 is lower than the threshold value, the normal portion becomes the strip-shaped dark pixel region D1 of the dark pixel. When the width of each of the phase difference regions 14 and 15 is set to about 270 μm and the pixel resolution of the imaging device 17 is set to 10 μm/pixel, each of the dark pixel regions D1 is arranged in the Y direction by about 27 dark. A pixel with a long strip in the X direction. Similarly to the defective portion, the boundary line D2 is adjacent to each of the dark pixel regions D1. The phase difference characteristic is disordered and appears as a bright pixel. Each of the boundary lines D2 has, for example, about two to three bright pixels arranged in the Y direction, and has a linear shape extending in the X direction.

於第1相位差區域14、第2相位差區域15內,混入有異物的部分、或存在損傷的部分、及產生了配光不均的部分等缺陷部分的相位差特性會紊亂,因此,當直線偏光的檢查光透過時,偏光方向會紊亂,從而使自第2偏光板19射出的成分比正常部分更多。因此,上述缺陷部分的亮度變高而成為明畫素,該明畫素的區域尺寸與缺陷部分的尺寸相對應。又,例如當電性雜訊重疊於亮度圖像的畫素時,該畫素會成為明畫素。明畫素區域D3~明畫素區域D7對應於如上所述的缺陷部分或雜訊。 In the first phase difference region 14 and the second phase difference region 15, the phase difference characteristics of the defective portion such as the portion in which the foreign matter is mixed, the portion where the damage is present, and the portion where the light distribution is uneven are disturbed. Therefore, when When the inspection light of the linearly polarized light is transmitted, the direction of the polarization is disturbed, and the component emitted from the second polarizing plate 19 is made larger than the normal portion. Therefore, the brightness of the defective portion becomes high and becomes a bright pixel, and the area size of the bright pixel corresponds to the size of the defective portion. Further, for example, when electrical noise is superimposed on a pixel of a luminance image, the pixel becomes a bright pixel. The bright pixel region D3 to the bright pixel region D7 corresponds to a defective portion or noise as described above.

藉由收縮處理電路26,自記憶體24將已二值化的亮度圖像予以讀出,將與Y方向相關的收縮處理實施規定次數例如3次。藉此,如圖6B般,邊界線D2作為暗畫素而被消去。又,Y方向的長度小且與雜訊或微小的缺陷部分相對應的明畫素區域D4~明畫素區域D7亦作為暗畫素而同時被消去。藉由收縮處理而被消去的明畫素區域微小,且在實際運用方面不會成為問題。再者,當邊界線比所期望的寬度更粗時,即便進行規定次數的收縮處理,該部分的明畫素亦會殘留,因此,能夠作為缺陷而被檢測。 By the shrinkage processing circuit 26, the binarized luminance image is read from the memory 24, and the contraction processing related to the Y direction is performed a predetermined number of times, for example, three times. Thereby, as shown in FIG. 6B, the boundary line D2 is erased as a dark pixel. Further, the bright pixel area D4 to the bright pixel area D7 corresponding to the noise in the Y direction and corresponding to the noise or the minute defective portion are simultaneously erased as the dark pixels. The area of the bright pixel which is removed by the shrinkage processing is small, and it does not become a problem in practical use. Further, when the boundary line is thicker than the desired width, even if the shrinkage process is performed a predetermined number of times, the moiré of the portion remains, and therefore, it can be detected as a defect.

藉由雜訊除去電路28,將規定次數的收縮處理之後的亮度圖像的雜訊予以除去。藉此,將未被收縮處理消去的成為雜訊的小的明畫素的區域自亮度圖像中消去。 The noise removal circuit 28 removes the noise of the luminance image after the predetermined number of shrinking processes. Thereby, the area of the small bright pixel which becomes the noise which is not removed by the shrinking process is erased from the luminance image.

然後,藉由膨脹處理電路27來實施規定次數例如3次的膨脹處理,經收縮處理的亮度圖像的明畫素區域的寬度會恢復。藉此,如圖6C般,收縮處理中所殘留的明畫素區域D3的寬度恢復至收縮處理之前的寬度。 Then, the expansion processing circuit 27 performs the expansion processing for a predetermined number of times, for example, three times, and the width of the bright pixel region of the contracted luminance image is restored. Thereby, as shown in FIG. 6C, the width of the bright pixel region D3 remaining in the shrinking process is restored to the width before the shrinking process.

於膨脹處理之後,藉由缺陷檢測部22來將殘留於亮度圖像的明畫素區域予以抽出,將該明畫素區域確定為缺陷部分。藉此,於圖6C中,明畫素區域D3作為缺陷部分而被檢測。接著,產生且輸出包含位置資訊或缺陷尺寸等的缺陷資訊,上述位置資訊表示檢測出的缺陷部分的位置。 After the expansion processing, the defect detecting unit 22 extracts the bright pixel region remaining in the luminance image, and determines the bright pixel region as the defective portion. Thereby, in FIG. 6C, the bright pixel region D3 is detected as a defective portion. Next, defect information including position information, defect size, and the like is generated and output, and the position information indicates the position of the detected defective portion.

[第2實施形態] [Second Embodiment]

第2實施形態是對亮度圖像上的注視畫素的亮度、與僅相隔規定的圖像數的畫素的亮度進行比較而取得差分,將該差分設為注視畫素的新的值,藉此,將邊界線消去。再者,除了以下所說明的內容之外,其他與第1實施形態相同,對實質上相同的構成構件附上相同的符號,且將該構成構件的詳細說明予以省略。 In the second embodiment, the luminance of the attention pixel on the luminance image is compared with the luminance of the pixel separated by only a predetermined number of images, and the difference is obtained as a new value of the attention pixel. So, the boundary line is eliminated. In the same manner as in the first embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and the detailed description of the components will be omitted.

如圖7所示,本例中的圖像處理部21包含:D/A轉換器23、記憶體24、差分圖像產生電路31、二值化電路25、以及雜訊除去電路28。差分圖像產生電路31對已由D/A轉換器23實現數位化的一條線的亮度圖像上的注視畫素進行差分處理,該差分處理是將僅相隔規定的圖像數的畫素作為對方畫素,取得上述注視畫素的亮度與該對方畫素的亮度的差分,將該差分設為注視畫素的新的值。對亮度圖像的各畫素進行上述差分處理,藉此來產生差分圖像。 當求出差分時,將自注視畫素的值減去對方畫素的值所得的值,設為注視畫素的新的值。 As shown in FIG. 7, the image processing unit 21 in this example includes a D/A converter 23, a memory 24, a difference image generating circuit 31, a binarization circuit 25, and a noise removing circuit 28. The difference image generation circuit 31 performs differential processing on the attention pixel on the luminance image of one line that has been digitized by the D/A converter 23, which is a pixel that separates only a predetermined number of images as The opponent's pixel acquires the difference between the brightness of the above-mentioned attention pixel and the brightness of the opponent's pixel, and sets the difference as a new value of the attention pixel. The above difference processing is performed on each pixel of the luminance image, thereby generating a difference image. When the difference is obtained, the value obtained by subtracting the value of the opponent's pixel from the value of the gaze pixel is set as a new value of the gaze pixel.

產生上述差分圖像的作用在於:將亮度圖像中的第1相位差區域14、第2相位差區域15的邊界線消去,當注視畫素為邊界線上的畫素時,以使對方畫素成為邊界線上的畫素的方式,決定差分時的畫素的距離(畫素數)。邊界線上的各畫素為大致同等的亮度水準,因此,將邊界線上的畫素的新的值大致設為「0」,從而實質上將邊界線消去。 The difference image is generated by erasing the boundary line between the first phase difference region 14 and the second phase difference region 15 in the luminance image, and when the pixel is the pixel on the boundary line, the pixel of the opposite direction is used. The way to be a pixel on the boundary line determines the distance (pixel number) of the pixel at the time of the difference. Since each pixel on the boundary line has substantially the same brightness level, the new value of the pixel on the boundary line is set to substantially “0”, and the boundary line is substantially eliminated.

自注視畫素朝向對方畫素的方向只要至少在Y方向上相隔即可,亦可為X方向與Y方向該兩個方向。如圖8所示,當相對於注視畫素Px1,將直至對方畫素Px2為止的X方向的畫素數設為「x1」個畫素,且將Y方向的畫素數設為「y1」個畫素時,「y1」設為邊界線的間隔、即與相位差區域的寬度(Y方向的長度)相對應的畫素數的n倍(n=1、2、3...)。「x1」可設為任意的值。例如當將「x1」設為「0」時,且當注視畫素Px1為邊界線上的畫素時,對方畫素Px2為相同的線上的其他邊界線上的畫素。 The direction of the self-care pixels toward the opponent's pixels may be at least separated in the Y direction, and may be the two directions of the X direction and the Y direction. As shown in FIG. 8, the number of pixels in the X direction up to the opponent pixel Px2 is set to "x1" pixels, and the number of pixels in the Y direction is set to "y1" with respect to the attention pixel Px1. In the case of a single pixel, "y1" is an interval of the boundary line, that is, n times (n = 1, 2, 3, ...) of the number of pixels corresponding to the width of the phase difference region (the length in the Y direction). "x1" can be set to any value. For example, when "x1" is set to "0", and when the pixel Px1 is the pixel on the boundary line, the pixel Px2 is a pixel on the other boundary line on the same line.

又,亦可將「y1」設為與相位差區域的寬度(邊界線的間隔)相對應的畫素數的n倍,將x1設定為「1」以上。於該情形時,由於與相隔「x1」條線的線上的畫素之間的差分被求出,因此,當注視畫素Px1為邊界線上的畫素時,對方畫素Px2為不同的線上的其他邊界線上的畫素。 In addition, "y1" may be set to n times or more of the number of pixels corresponding to the width of the phase difference region (interval of the boundary line), and x1 may be set to "1" or more. In this case, since the difference between the pixels on the line separated by the "x1" line is obtained, when the pixel Px1 is the pixel on the boundary line, the pixel Px2 is on a different line. The pixels on other boundary lines.

又,當有可能相對於X方向而在固定的角度方向上,產生呈條紋狀地產生的亮點(以下稱為條紋缺陷)時,應 以不將該亮點消去的方式,對不使條紋缺陷的畫素彼此被比較的x1、y1的值進行設定。 Further, when it is possible to produce a bright spot (hereinafter referred to as a stripe defect) which is generated in a stripe shape in a fixed angular direction with respect to the X direction, The values of x1 and y1 in which the pixels of the stripe defect are not compared with each other are set so as not to erase the bright spot.

例如,當條紋缺陷容易出現在相對於X方向呈45°的方向上時,為了不將該條紋缺陷消去,以不使對方畫素Px2處於注視畫素Px1的45°的方向的方式,決定「x1」與「y1」的組合。此時,需要考慮X方向與Y方向的各畫素解析度來決定「x1」與「y1」的組合。如本例般,當攝影裝置17為線列式相機時,根據攝影裝置17的攝影解析度來決定Y方向的畫素解析度,但根據攝影裝置17的一條線的攝影週期與相位差膜12的搬送速度來決定X方向的畫素解析度。例如當X方向的畫素解析度為6μm,且Y方向的畫素解析度為3μm時,為了不將45°方向的條紋缺陷消去而不滿足「x1:y1=1:2」。 For example, when the stripe defect is likely to occur in a direction of 45° with respect to the X direction, in order not to eliminate the stripe defect, the relative pixel Px2 is not in the direction of 45° of the gaze pixel Px1. The combination of x1" and "y1". In this case, it is necessary to determine the combination of "x1" and "y1" in consideration of the pixel resolutions in the X direction and the Y direction. As in the case of the present embodiment, when the photographing device 17 is a line camera, the pixel resolution in the Y direction is determined based on the imaging resolution of the photographing device 17, but the photographing period and the retardation film 12 in accordance with one line of the photographing device 17 are used. The transfer speed determines the pixel resolution in the X direction. For example, when the pixel resolution in the X direction is 6 μm and the pixel resolution in the Y direction is 3 μm, “x1: y1=1: 2” is not satisfied in order to eliminate the stripe defect in the 45° direction.

二值化電路25是以規定的臨限值來對差分圖像進行二值化,將各畫素設為明畫素與暗畫素。雜訊除去電路28自已二值化的差分圖像中,將微小的明畫素的區域作為雜訊而消去。缺陷檢測部22將雜訊除去電路28的處理之後所殘留的明畫素的區域確定為缺陷部分。 The binarization circuit 25 binarizes the difference image with a predetermined threshold value, and sets each pixel as a bright pixel and a dark pixel. The noise removing circuit 28 erases the area of the minute bright pixels from the binarized difference image as noise. The defect detecting unit 22 determines the region of the bright pixel remaining after the processing of the noise removing circuit 28 as the defective portion.

再者,當以上述方式製成差分圖像時,與第1實施形態的收縮處理不同,於差分圖像的產生階段,小的明畫素區域未被消去,另外,由於源於攝影裝置17的解析度的誤差、及邊界線自身的邊緣部分的偏差等,小的明畫素區域會大量地殘留。因此,當產生差分圖像來進行缺陷檢測時,較佳為將雜訊消去。 Further, when the difference image is formed as described above, unlike the contraction processing of the first embodiment, the small bright pixel region is not erased at the generation stage of the difference image, and is derived from the photographing device 17 The error of the resolution and the deviation of the edge portion of the boundary line itself may cause a large amount of small bright pixel regions to remain. Therefore, when a difference image is generated for defect detection, it is preferable to erase the noise.

根據本例,針對亮度圖像的各畫素,求出注視畫素與對方畫素的差分而產生差分圖像,求出亮度圖像的邊界線上的各畫素與相同或不同邊界線上的對方畫素的差分。而且,由於各邊界線上的畫素的亮度為大致相同的水準,因此,注視畫素的新的值大致為「0」。因此,若對上述畫素進行二值化,則上述畫素會成為暗畫素,因此,結果是邊界線被消去。 According to this example, the difference between the gaze pixel and the opposite pixel is obtained for each pixel of the luminance image, and a difference image is generated, and each pixel on the boundary line of the luminance image and the other party on the same or different boundary line are obtained. The difference of pixels. Further, since the luminances of the pixels on the respective boundary lines are at substantially the same level, the new value of the attention pixel is substantially "0". Therefore, if the pixel is binarized, the pixel will become a dark pixel, and as a result, the boundary line is erased.

另一方面,當注視畫素為缺陷部分的畫素時,在多數情形下,亮度水準頗低的正常部分的畫素為對方畫素,因此,缺陷部分的畫素的新的值不太會發生改變,該缺陷部分的畫素會藉由二值化而成為明畫素。因此,可不將缺陷部分消去而檢測為缺陷。 On the other hand, when the pixel is the pixel of the defective portion, in most cases, the pixel of the normal portion whose luminance level is relatively low is the pixel of the opposite party, and therefore, the new value of the pixel of the defective portion is less likely. When a change occurs, the pixel of the defect portion becomes a bright pixel by binarization. Therefore, the defect portion can be detected as a defect without being erased.

再者,為了可對在隨機的方向上產生的條紋狀的缺陷等所有方向的條紋狀的缺陷進行檢測,亦可以注視畫素為基點,分別求出該注視畫素與不同方向的多個對方畫素的差分,根據相同的亮度圖像而分別產生與各方向相關的差分圖像,接著自各差分圖像中檢測出缺陷。由此,可將x1、y1之比(x1/y1)不同的位置的畫素作為各對方畫素而分別產生差分圖像。例如,以使自注視畫素算起的對方畫素的方向為45°的方式,對x1、y1進行設定,製成45°方向的差分圖像,並且以使自注視畫素算起的對方畫素的方向為30°的方式,對x1、y1進行設定,製成30°方向的差分圖像。接著,對各差分圖像進行缺陷檢測,將45°方向的差分圖像所確定的缺陷部分、及30°方向的差分圖像所確 定的缺陷部分一併設為相位差膜12的缺陷部分。再者,於本例中,兩個方向為45°與30°,但亦可適當地對方向(角度)及方向數進行設定。 Furthermore, in order to detect stripe-shaped defects in all directions such as streaky defects generated in a random direction, it is also possible to look at the pixels as a base point and obtain the plurality of opponents in the different directions. The difference of the pixels generates a difference image associated with each direction based on the same luminance image, and then detects a defect from each of the difference images. Thereby, a pixel at a position different in the ratio of x1 and y1 (x1/y1) can be generated as a difference image as each of the respective pixels. For example, x1 and y1 are set so that the direction of the opponent's pixel from the gaze pixel is 45°, and a difference image in the 45° direction is created, and the opponent is calculated from the gaze pixel. The direction of the pixel is 30°, and x1 and y1 are set to form a difference image in the direction of 30°. Next, defect detection is performed on each difference image, and the defective portion determined by the difference image in the 45° direction and the difference image in the 30° direction are confirmed. The predetermined defect portion is collectively set as the defective portion of the phase difference film 12. Furthermore, in this example, the two directions are 45° and 30°, but the direction (angle) and the number of directions may be appropriately set.

[第3實施形態] [Third embodiment]

於第3實施形態中,將二維亮度圖像中的亮度高的畫素(明畫素)的區域作為候補缺陷而予以抽出,針對各個候補缺陷,對直至在Y方向上相鄰接的候補缺陷為止的畫素數進行計數作為鄰接距離畫素數,當該計數出的鄰接距離畫素數為規定值以下時,將該候補缺陷判定為缺陷。再者,除了以下所說明的內容之外,其他與第1實施形態相同,對實質上相同的構成構件附上相同的符號,且將該構成構件的詳細說明予以省略。 In the third embodiment, a region of a pixel (bright pixel) having a high luminance in a two-dimensional luminance image is extracted as a candidate defect, and candidates adjacent to each other in the Y direction are selected for each candidate defect. The number of pixels up to the defect is counted as the adjacent distance pixel number, and when the counted adjacent distance pixel number is equal to or less than a predetermined value, the candidate defect is determined as a defect. In the same manner as in the first embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and the detailed description of the components will be omitted.

於本例中,如圖9所示,圖像處理部21包含:D/A轉換器23、記憶體24、二值化電路25、以及計數電路41。一條線的亮度圖像的各畫素由D/A轉換器23實現數位化且被寫入至記憶體24之後,藉由二值化電路25而成為明畫素或暗畫素。 In the present example, as shown in FIG. 9, the image processing unit 21 includes a D/A converter 23, a memory 24, a binarization circuit 25, and a counter circuit 41. The pixels of the luminance image of one line are digitized by the D/A converter 23 and written to the memory 24, and then become a bright pixel or a dark pixel by the binarization circuit 25.

計數電路41將亮度圖像上的多個明畫素相連而成的明畫素區域分別設為候補缺陷。計數電路41針對各候補缺陷,分別對直至一條線中的即在Y方向上相鄰接的候補缺陷為止的畫素數進行計數作為鄰接距離畫素數Cp。當計數電路41所計數出的鄰接距離畫素數Cp為規定畫素數Cpth以下時,缺陷檢測部22將該候補缺陷確定為缺陷部分。規定畫素數Cpth是設為比亮度圖像上的邊界線D2彼此的間 隔Cy更小的值。 The counting circuit 41 sets the bright pixel regions in which a plurality of bright pixels on the luminance image are connected as candidate defects. The counting circuit 41 counts the number of pixels up to the candidate defect adjacent to the Y direction in one line for each candidate defect as the adjacent distance pixel number Cp. When the adjacent distance pixel number Cp counted by the counter circuit 41 is equal to or less than the predetermined pixel number Cpth, the defect detecting unit 22 determines the candidate defect as the defective portion. The specified pixel number Cpth is set to be larger than the boundary line D2 on the luminance image. A smaller value than Cy.

再者,亦可根據一個明畫素而將明畫素區域設為候補缺陷,但於本例中,即便不將此種明畫素區域檢測為雜訊或實際運用方面的缺陷,亦無問題,因此,不將此種明畫素區域設為候補缺陷。 Furthermore, the bright pixel region may be set as a candidate defect based on a bright pixel, but in this example, there is no problem even if the bright pixel region is not detected as a noise or a practical defect. Therefore, such a bright pixel area is not set as a candidate defect.

如圖10中的一例所示,亮度圖像I上設為候補缺陷的明畫素區域除了包含實際上成為缺陷的明畫素區域D8之外,亦包含各邊界線D2。如此,將邊界線D2設為候補缺陷,但於正常部分,邊界線D2彼此在Y方向上大於規定畫素數Cpth地相隔(Cp>Cpth),因此,不將上述邊界線D2確定為缺陷部分。另一方面,當第1相位差區域14或第2相位差區域15內存在缺陷時,或當邊界線的寬度異常地變粗時,明畫素區域相對於其他明畫素區域,比邊界線彼此的間隔Cy更靠近。因此,鄰接距離畫素數Cp為規定畫素數Cpth以下,如上所述的明畫素區域被確定為缺陷部分。再者,當於邊界線D2的附近,邊界線D2以外的候補缺陷靠近時,該邊界線D2亦被判定為缺陷,但並無候補缺陷檢查的運用方面的實際損害。 As shown in the example of FIG. 10, the bright pixel region which is a candidate defect in the luminance image I includes the boundary line D2 in addition to the bright pixel region D8 which is actually a defect. In this way, the boundary line D2 is set as the candidate defect, but in the normal portion, the boundary line D2 is separated from each other by a predetermined number of pixels Cpth in the Y direction (Cp>Cpth), and therefore, the boundary line D2 is not determined as the defective portion. . On the other hand, when there is a defect in the first phase difference region 14 or the second phase difference region 15, or when the width of the boundary line is abnormally thick, the bright pixel region is larger than the boundary line with respect to other bright pixel regions. The intervals Cy are closer to each other. Therefore, the adjacent distance pixel number Cp is equal to or less than the predetermined pixel number Cpth, and the bright pixel area as described above is determined as the defective portion. Further, when the candidate defect other than the boundary line D2 approaches in the vicinity of the boundary line D2, the boundary line D2 is also determined to be defective, but there is no actual damage in the operation of the candidate defect inspection.

本例利用了如下的事實,即,各邊界線以固定的間隔(畫素數)相隔,可利用極簡單的邏輯(logic)來將缺陷予以抽出。若對鄰接距離畫素數Cp進行計數的方向為Y方向,則可自候補缺陷起,朝任一個方向進行計數,亦可朝兩個方向進行計數。而且,與其他實施形態同樣地,亦可設置除去電路,該除去電路將畫素數為規定值(例如2 個畫素以下)的明畫素區域作為雜訊而予以除去。 This example takes advantage of the fact that the boundary lines are separated by a fixed interval (the number of pixels), and the extremely simple logic can be used to extract the defects. When the direction in which the adjacent distance pixel number Cp is counted is the Y direction, the count can be counted in either direction from the candidate defect, and the count can be performed in both directions. Further, similarly to the other embodiments, a removal circuit that sets the number of pixels to a predetermined value (for example, 2) may be provided. The bright pixel area of the following pixels is removed as noise.

[第4實施形態] [Fourth embodiment]

於第4實施形態中,設置了消除相位差膜的支持體所具有的相位差特性的相位差補償板,將上述支持體所具有的相位差特性抵消。再者,除了設置相位差補償板之外,可與第1實施形態至第3實施形態相同。 In the fourth embodiment, the phase difference compensation plate for eliminating the phase difference characteristic of the support of the retardation film is provided, and the phase difference characteristic of the support is canceled. In addition, the first embodiment to the third embodiment can be used in addition to the phase difference compensation plate.

於該第4實施形態中,如圖11所示,將相位差補償板37配置於相位差膜12與第2偏光板19之間。相位差補償板37消除相位差膜12的支持體12a所具有的相位差特性,且以與相位差膜12呈平行的姿勢配置。上述相位差補償板37只要是消除支持體12a所具有的相位差特性的相位差補償板,則無限定,簡單而言,可與作為檢查對象的相位差膜12的支持體12a同樣地使用透明膜,於本例中亦如此。於該情形時,相位差補償板37是以使光學軸與支持體12a的光學軸(例如遲相軸)正交的方式而配置。 In the fourth embodiment, as shown in FIG. 11, the phase difference compensation plate 37 is disposed between the retardation film 12 and the second polarizing plate 19. The phase difference compensation plate 37 eliminates the phase difference characteristics of the support 12a of the retardation film 12, and is disposed in a posture parallel to the retardation film 12. The phase difference compensation plate 37 is not limited as long as it is a phase difference compensation plate that eliminates the phase difference characteristic of the support 12a. In the simplest manner, the phase difference compensation plate 37 can be transparently used in the same manner as the support 12a of the retardation film 12 to be inspected. The film is also the same in this example. In this case, the phase difference compensation plate 37 is disposed such that the optical axis is orthogonal to the optical axis (for example, the slow phase axis) of the support 12a.

根據本例,可使第1相位差區域14、第2相位差區域15的亮度水準更接近於消光狀態,從而使亮度圖像的對比度(contrast)提高。藉此,可更高精度地對相位差膜12的缺陷進行檢測。再者,於本例中,將相位差補償板37配置於相位差膜12與第2偏光板19之間,但亦可將相位差補償板37配置於第1偏光板18與相位差膜12之間。 According to this example, the luminance levels of the first phase difference region 14 and the second phase difference region 15 can be made closer to the extinction state, and the contrast of the luminance image can be improved. Thereby, the defect of the phase difference film 12 can be detected with higher precision. In the present embodiment, the phase difference compensation plate 37 is disposed between the retardation film 12 and the second polarizing plate 19, but the phase difference compensation plate 37 may be disposed on the first polarizing plate 18 and the retardation film 12. between.

[第5實施形態] [Fifth Embodiment]

如圖12所示,圖案化相位差膜的缺陷檢測裝置50包括:光源部51、攝影裝置52、第1偏光板53、λ/4波長板 54、第2偏光板55、以及控制部(controller)56。於光源部51、攝影裝置52之間,自光源部51側起,依序配置有第1偏光板53、λ/4波長板54、以及第2偏光板55。於第1偏光板53與λ/4波長板54之間,作為檢查對象膜的圖案化相位差膜60位於靠近第1偏光板53的位置。來自攝影裝置52的攝影信號被發送至控制部56內的圖像處理部57,利用圖像處理部57來對各種缺陷進行檢測。 As shown in FIG. 12, the defect detecting device 50 of the patterned retardation film includes a light source unit 51, a photographing device 52, a first polarizing plate 53, and a λ/4 wavelength plate. 54. The second polarizing plate 55 and a controller 56. Between the light source unit 51 and the imaging device 52, the first polarizing plate 53, the λ/4 wavelength plate 54, and the second polarizing plate 55 are disposed in this order from the light source unit 51 side. Between the first polarizing plate 53 and the λ/4 wavelength plate 54, the patterned retardation film 60 as the inspection target film is located close to the first polarizing plate 53. The image pickup signal from the photographing device 52 is sent to the image processing unit 57 in the control unit 56, and the image processing unit 57 detects various defects.

圖案化相位差膜60是在經由相位差膜形成步驟之後,以與使用的顯示器(display)相對應的尺寸而被切割為片狀,藉由未圖示的膜供給裝置來將該圖案化相位差膜60定位於檢查位置。圖案化相位差膜60包括圖案60A、60B,該圖案60A、60B是在作為支持體的透明的TAC膜上,由具有不同的光學軸且具有λ/4波長板特性的相位差層交替地排列而成。各圖案60A、60B例如以270μm的寬度而形成為條狀。對於一個鄰接的條狀圖案60A而言,當將圖案的長度方向(列方向)即Y方向設為基準0°時,相對於該基準0°,作為λ/4波長板特性的光學軸為+45°,對於另一個圖案60B而言,光學軸為-45°。又,將與圖案60A、60B的長度方向(Y方向)正交的方向,稱為對圖案60A、60B進行排列時的圖案排列方向(X方向)。 The patterned retardation film 60 is cut into a sheet shape by a size corresponding to a display used after passing through the retardation film forming step, and the patterned phase is formed by a film supply device (not shown). The poor film 60 is positioned at the inspection position. The patterned retardation film 60 includes patterns 60A, 60B which are alternately arranged on a transparent TAC film as a support by phase difference layers having different optical axes and having λ/4 wavelength plate characteristics. Made. Each of the patterns 60A and 60B is formed in a strip shape, for example, at a width of 270 μm. For one adjacent stripe pattern 60A, when the longitudinal direction (column direction) of the pattern, that is, the Y direction is set to the reference 0°, the optical axis which is the characteristic of the λ/4 wavelength plate is + with respect to the reference 0°. 45°, for another pattern 60B, the optical axis is -45°. Moreover, the direction orthogonal to the longitudinal direction (Y direction) of the patterns 60A and 60B is called the pattern arrangement direction (X direction) when the patterns 60A and 60B are arranged.

當考慮3D電視作為使用上述圖案化相位差膜60的最終製品時,若假設電視觀賞者進行通常的觀察,則例如對直徑約為100μm左右的漏光(亮點)或異物、污物進行檢測,使得缺陷不會朝下游流動。電視觀賞者不會識別出 尺寸為100μm以下的缺陷,因此,在實際運用方面無問題。 When a 3D television is considered as a final product using the patterned retardation film 60, it is assumed that a television viewer performs normal observation, for example, detecting light leakage (bright spots) having a diameter of about 100 μm, foreign matter, or dirt, so that Defects do not flow downstream. TV viewers will not recognize The size is less than 100 μm, so there is no problem in practical use.

光源部51包括大於檢查對象的切割片尺寸的照明面51A,內置了鹵素燈等光源,且將均一的散射光照射至檢查對象膜。再者,雖省略圖示,但光源部51包括光量調整部,基於由光源附近所設置的感測器檢測出的光量檢測信號,以使光量固定的方式,對鹵素燈進行控制。藉此,可將光量均一的光照射至圖案化相位差膜60,從而總是能夠以相同的感度來進行缺陷檢測。再者,亦可使用金屬鹵化物燈等其他燈、或LED作為光源。 The light source unit 51 includes an illumination surface 51A that is larger than the size of the cut piece to be inspected, and incorporates a light source such as a halogen lamp, and irradiates uniform scattered light to the inspection target film. In addition, although the illustration is omitted, the light source unit 51 includes a light amount adjustment unit that controls the halogen lamp so that the amount of light is fixed based on the light amount detection signal detected by the sensor provided near the light source. Thereby, light having a uniform amount of light can be irradiated onto the patterned retardation film 60, so that defect detection can always be performed with the same sensitivity. Further, other lamps such as a metal halide lamp or an LED may be used as the light source.

攝影裝置52包括CCD區域感測器,針對圖案化相位差膜60,使用10μm/畫素的畫素解析度。攝影裝置52聚焦於膜60的已圖案化的相位差層的表面而進行拍攝。 The photographing device 52 includes a CCD area sensor, and for the patterned retardation film 60, a pixel resolution of 10 μm/pixel is used. The photographing device 52 focuses on the surface of the patterned phase difference layer of the film 60 to perform photographing.

控制部56例如包含個人電腦(personal computer)。而且,藉由安裝應用程式(application),於控制部56內構建圖像處理部57、攝影條件變更部61、以及缺陷資料記憶部63,上述圖像處理部57基於攝影信號來對缺陷信號進行檢測,上述攝影條件變更部61將攝影條件予以變更,上述缺陷資料記憶部63確定基於檢測信號而檢測出的缺陷與該缺陷的部位。 The control unit 56 includes, for example, a personal computer. Further, by installing an application, the image processing unit 57, the imaging condition changing unit 61, and the defect data storage unit 63 are constructed in the control unit 56, and the image processing unit 57 performs the defect signal based on the imaging signal. In the detection, the imaging condition changing unit 61 changes the imaging condition, and the defect data storage unit 63 identifies the defect detected by the detection signal and the portion of the defect.

將第1偏光板53的透射軸角度設定為基準0°。藉此,通過圖案化相位差膜60的光藉由各圖案60A、60B而成為旋轉方向不同的圓偏光。經由λ/4波長板54與第2偏光板55,拍攝成為上述圓偏光的透射光。λ/4波長板54與第2 偏光板55是作為3D觀察時的圓偏光眼鏡而發揮功能。因此,與圓偏光眼鏡同樣地,受光光學系統在如下的條件下,取得第1圖像65及第2圖像66該兩種圖像,上述條件是指相對於λ/4波長板54的光學軸,使第2偏光板的透射軸為±45°(若一個透射軸為+45°,則另一個透射軸為-45°)。例如當對3D影像進行目視時,第1圖像65為右眼用影像,第2圖像66為左眼用影像。 The transmission axis angle of the first polarizing plate 53 is set to the reference 0°. Thereby, the light that has been patterned by the retardation film 60 is circularly polarized light having different rotation directions by the respective patterns 60A and 60B. The transmitted light that becomes the above-described circularly polarized light is imaged through the λ/4 wavelength plate 54 and the second polarizing plate 55. λ/4 wavelength plate 54 and 2nd The polarizing plate 55 functions as a circularly polarized spectacles at the time of 3D observation. Therefore, similarly to the circularly polarized glasses, the light receiving optical system acquires the two images of the first image 65 and the second image 66 under the following conditions, and the above conditions refer to the optical with respect to the λ/4 wavelength plate 54. The axis is such that the transmission axis of the second polarizing plate is ±45° (if one transmission axis is +45°, the other transmission axis is -45°). For example, when visualizing a 3D image, the first image 65 is a right-eye image, and the second image 66 is a left-eye image.

如圖12所示,具體的受光光學系統為兩種,即,相對於安裝位置已固定的λ/4波長板54,將第2偏光板55的透射軸設為+45°的受光光學系統、與將第2偏光板55的透射軸設為-45°的受光光學系統。因此,第2偏光板55藉由旋轉機構64,以使透射軸為+45°與-45°的方式,在90°的角度範圍內旋轉。將透射軸設定為+45°的狀態是第1狀態,將透射軸設定為-45°的狀態是第2狀態。藉由控制部56內的攝影條件變更部61來對旋轉機構64進行控制。而且,控制部56將第2偏光板55設為第1狀態而取得第1圖像65之後,將旋轉機構64予以驅動,使第2偏光板55旋轉90°而達到第2狀態,從而取得第2圖像66。取得第2圖像66之後,控制部56使第2偏光板55返回至第1狀態。 As shown in FIG. 12, the specific light receiving optical system has two types, that is, a light receiving optical system in which the transmission axis of the second polarizing plate 55 is set to +45° with respect to the λ/4 wavelength plate 54 whose mounting position is fixed, A light receiving optical system in which the transmission axis of the second polarizing plate 55 is set to -45°. Therefore, the second polarizing plate 55 is rotated by the rotation mechanism 64 so as to have a transmission axis of +45° and -45° in an angular range of 90°. The state in which the transmission axis is set to +45° is the first state, and the state in which the transmission axis is set to -45° is the second state. The rotation mechanism 64 is controlled by the imaging condition changing unit 61 in the control unit 56. When the second polarizing plate 55 is in the first state and the first image 65 is obtained, the control unit 56 drives the rotating mechanism 64 to rotate the second polarizing plate 55 by 90° to reach the second state, thereby obtaining the first state. 2 image 66. After acquiring the second image 66, the control unit 56 returns the second polarizing plate 55 to the first state.

再者,亦可將第2偏光板55予以固定,代替將λ/4波長板54予以固定,於該情形時,以將λ/4波長板54的光學軸(進相軸或遲相軸中的任一個軸)設為+45°與-45°的方式,藉由未圖示的旋轉機構,使上述λ/4波長板54在90°的角度範圍內旋轉。如此,使λ/4波長板54或偏光板55 中的任一者在90°的範圍旋轉移位,獲得不同的兩個條件下的第1圖像65及第2圖像66。 Further, the second polarizing plate 55 may be fixed instead of fixing the λ/4 wavelength plate 54. In this case, the optical axis of the λ/4 wavelength plate 54 (in the phase axis or the slow phase axis) The λ/4 wavelength plate 54 is rotated within an angular range of 90° by a rotation mechanism (not shown) such that any one of the axes is set to +45° and -45°. Thus, the λ/4 wavelength plate 54 or the polarizing plate 55 is made Any one of them is rotationally shifted in the range of 90° to obtain the first image 65 and the second image 66 under two different conditions.

第1圖像65及第2圖像66的取得方法如圖12所示,對旋轉機構64進行控制而再次設定為不同的光學條件,利用一個攝影裝置52來進行拍攝,亦可如圖16所示,使用兩個攝影單元82、83,且利用各自專用的光學系統來進行拍攝,從而取得第1圖像65及第2圖像66。再者,使λ/4波長板54或第2偏光板55旋轉移位,藉此來將攝影條件予以變更,接著取得第1圖像65及第2圖像66,但亦可相鄰地設置將光學軸設為+45°與-45°的λ/4波長板54,將任一個光學軸設定為攝影光軸,藉此,將攝影條件予以變更。同樣地,代替第2偏光板55的旋轉移位,亦可相鄰地設置將透射軸設為+45°及-45°的第2偏光板55,將任一個透射軸設定為攝影光軸,從而將攝影條件予以變更。 As shown in FIG. 12, the first image 65 and the second image 66 are controlled by the rotation mechanism 64, and are set to different optical conditions again, and are imaged by one imaging device 52, as shown in FIG. The first image 65 and the second image 66 are obtained by using the two imaging units 82 and 83 and performing imaging using respective dedicated optical systems. Further, the λ/4 wavelength plate 54 or the second polarizing plate 55 is rotationally shifted to change the imaging conditions, and then the first image 65 and the second image 66 are obtained, but they may be adjacently provided. The λ/4 wavelength plate 54 having the optical axes of +45° and -45° is set, and any optical axis is set as the photographic optical axis, whereby the imaging conditions are changed. Similarly, instead of the rotational displacement of the second polarizing plate 55, the second polarizing plate 55 having the transmission axes of +45° and -45° may be adjacently provided, and any one of the transmission axes may be set as the imaging optical axis. Thereby the photography conditions are changed.

於第5實施形態中,首先,彼此正交的直線偏光的光經由第2偏光板55而被攝影裝置52接收。此時,將旋轉機構64予以驅動,使第2偏光板55的透射軸角度為+45°而進行拍攝,獲得第1圖像65。又,將旋轉機構64予以驅動,使第2偏光板55的透射軸角度為-45°而進行拍攝,獲得第2圖像66。 In the fifth embodiment, first, the linearly polarized light orthogonal to each other is received by the imaging device 52 via the second polarizing plate 55. At this time, the rotation mechanism 64 is driven, and the transmission axis angle of the second polarizing plate 55 is set to +45°, and imaging is performed to obtain the first image 65. Moreover, the rotation mechanism 64 is driven, and the transmission axis angle of the second polarizing plate 55 is set to -45°, and imaging is performed to obtain the second image 66.

如圖13A、圖13B所示,於第1圖像65與第2圖像66中,藉由圖案60A、60B(參照圖12),獲得與各圖案相對應的部分的明暗彼此已反轉的圖像。此時,利用光源部51的光量控制、或攝影裝置52的光圈等,對兩個圖像 65、66均正常的部分的圖案的明部進行調整,以使該明部的亮度達到圖像處理裝置的亮度的動態範圍與上述攝影裝置的動態範圍中的範圍較狹窄的動態範圍的中間濃度。具體而言,若亮度水準為256灰階,則達到中間的亮度水準即128灰階。另一方面,由圖案60A、60B產生的暗部的光量極低,因此,亮度水準大致為「0」。此處,若於圖案的暗部圖像部分存在亮點(漏光),則如圖13A、圖13B所示,會出現高亮度亮點(明缺陷)BP1、BP2。又,若於圖案的明部圖像部分存在異物或污物等遮光性的缺陷,則會出現低亮度亮點(暗缺陷)BP3、BP4。 As shown in FIG. 13A and FIG. 13B, in the first image 65 and the second image 66, the patterns 60A and 60B (see FIG. 12) are obtained, and the brightness and darkness of the portions corresponding to the respective patterns are reversed. image. At this time, the two images are used by the light amount control of the light source unit 51 or the aperture of the imaging device 52. The bright portions of the patterns of the 65 and 66 normal portions are adjusted such that the brightness of the bright portion reaches the intermediate range of the dynamic range of the brightness of the image processing apparatus and the dynamic range of the narrow range of the dynamic range of the photographing apparatus. . Specifically, if the brightness level is 256 gray levels, the intermediate brightness level is 128 gray levels. On the other hand, since the amount of light in the dark portion generated by the patterns 60A and 60B is extremely low, the luminance level is substantially "0". Here, if there is a bright spot (light leakage) in the dark portion image portion of the pattern, as shown in FIGS. 13A and 13B, high-brightness bright spots (bright defects) BP1, BP2 appear. Further, if there is a light-shielding defect such as foreign matter or dirt in the bright image portion of the pattern, low-brightness bright spots (dark defects) BP3 and BP4 appear.

如圖12所示,來自攝影裝置52的第1圖像65與第2圖像66的信號被發送至圖像處理部57。於圖像處理部57中,藉由圖14及圖15所示的處理順序來將缺陷予以抽出。首先,拍攝第1圖像及第2圖像(ST1~ST4)之後,藉由圖像合成部70,使相對於圖案化相位差膜60的各圖案60A、60B的明部亮度,達到圖像處理部57的動態範圍與上述攝影裝置的動態範圍中的範圍較狹窄的動態範圍的大致中間亮度,將第1圖像65與第2圖像66相加(ST5)。當利用上述相加來進行圖像合成時,如圖15的ST6~ST9所示,在與各圖案的邊界部68正交的X方向上,逐步改變相對位置,對在各相對位置使第1圖像65與第2圖像66重合時的平均亮度進行計算。於固定範圍內進行上述計算,在達到最小平均亮度的相對位置,使第1圖像65與第2圖像66重合。藉此,藉由簡單的構成,如圖13C所示, 獲得合成圖像67,該合成圖像67是在上述第1相位差區域及第2相位差區域一致的位置,使第1圖像65與第2圖像66重合所得的圖像。因此,可不使用高度的圖像處理方法,而是簡單地在使圖案化相位差膜60的各圖案的位置精度良好地對準的狀態下,對第1圖像65及第2圖像66進行合成。而且,積極地利用邊界部分,以該邊界部分為基準而使兩者重合,藉此,可簡單地進行X方向上的位置對準,亦無位置偏移。 As shown in FIG. 12, the signals of the first image 65 and the second image 66 from the imaging device 52 are sent to the image processing unit 57. In the image processing unit 57, the defects are extracted by the processing sequence shown in Figs. 14 and 15 . First, after the first image and the second image (ST1 to ST4) are imaged, the image combining unit 70 causes the brightness of the bright portion of each of the patterns 60A and 60B of the patterned retardation film 60 to reach the image. The dynamic range of the processing unit 57 and the substantially intermediate luminance of the dynamic range having a narrow range in the dynamic range of the imaging device are added to the first image 65 and the second image 66 (ST5). When image synthesis is performed by the above-described addition, as shown in ST6 to ST9 of FIG. 15, the relative position is gradually changed in the X direction orthogonal to the boundary portion 68 of each pattern, and the first position is made for each relative position. The average luminance when the image 65 coincides with the second image 66 is calculated. The above calculation is performed within a fixed range, and the first image 65 and the second image 66 are superimposed on the relative position at which the minimum average luminance is reached. Thereby, by a simple configuration, as shown in FIG. 13C, The composite image 67 is obtained, and the composite image 67 is an image obtained by superimposing the first image 65 and the second image 66 at positions where the first phase difference region and the second phase difference region match each other. Therefore, the first image 65 and the second image 66 can be simply placed in a state where the positions of the respective patterns of the patterned retardation film 60 are accurately aligned without using a high image processing method. synthesis. Further, the boundary portion is actively used, and the two are superimposed on the basis of the boundary portion, whereby the alignment in the X direction can be easily performed without positional displacement.

在將平均的亮度水準設為128灰階(將灰階水準設為256灰階時的中間灰階)的狀態下,對第1圖像65及第2圖像66進行圖像合成,因此,合成圖像67於各圖案中,成為大致均一的濃度圖像。而且,第1圖像65及第2圖像66的明暗在與圖案化相位差膜60的各圖案相同的位置反轉,從而獲得如下的狀態的合成圖像67,該狀態是指第1圖像65及第2圖像66的明缺陷BP1、明缺陷BP2、暗缺陷BP3、及暗缺陷BP4均保持了與其周邊的亮度水準之間的亮度差。 In the state where the average luminance level is set to 128 gray scales (the intermediate gray scale when the gray scale level is 256 gray scales), image synthesis is performed on the first image 65 and the second image 66. The composite image 67 is a substantially uniform density image in each of the patterns. Further, the brightness of the first image 65 and the second image 66 is reversed at the same position as each pattern of the patterned retardation film 60, and a composite image 67 in a state in which the state is referred to as the first image is obtained. The bright defects BP1, the bright defects BP2, the dark defects BP3, and the dark defects BP4 of the 65 and the second image 66 maintain the luminance difference between the brightness levels of the periphery and the brightness of the periphery.

然後,使用規定的臨限值來對合成圖像67進行二值化(ST10)。根據該二值化合成圖像71、72,將候補缺陷予以抽出。關於二值化處理的臨限值,相對於中間亮度(128灰階水準)而使用高亮度側臨限值與低亮度側臨限值該兩個臨限值。藉此,例如,如圖13D所示,自使用了高於中間亮度的高亮度側臨限值的二值化合成圖像71,將光洩漏缺陷(明缺陷)BP1、BP2予以抽出,如圖13E所示,自 使用了低於中間亮度的低亮度側臨限值的二值化合成圖像32,將由異物、污物引起的遮光性缺陷(暗缺陷)BP3、BP4予以抽出。 Then, the synthesized image 67 is binarized using a predetermined threshold (ST10). Based on the binarized composite images 71 and 72, candidate defects are extracted. Regarding the threshold value of the binarization processing, the two threshold values are used for the high luminance side threshold and the low luminance side threshold with respect to the intermediate luminance (128 gray level). Thereby, for example, as shown in FIG. 13D, the optical leakage defects (bright defects) BP1, BP2 are extracted from the binarized composite image 71 using the high luminance side threshold value higher than the intermediate luminance, as shown in the figure. As shown in 13E, since The binarized composite image 32 having a low luminance side threshold value lower than the intermediate luminance is used, and the light-shielding defects (dark defects) BP3 and BP4 caused by foreign matter and dirt are extracted.

如圖13D、圖13E所示,有時即便進行明缺陷抽出、暗缺陷抽出的二值化,圖案邊界部分亦會作為異常部69而殘留於二值化合成圖像71、72。因此,以在90°方向(圖像中的寬度方向(X方向))上稍大於預定的邊界寬度的畫素的量(於本實施形態的條件下為3個畫素左右),對各個二值化合成圖像71、72進行針對雜訊的縮小處理(ST11)。當圖案邊界部分作為異常部69而殘留時,以能夠將該邊界部分消去的次數、及與邊界部分的寬度(Y方向的畫素數)相對應的次數,進行上述收縮處理。 As shown in FIG. 13D and FIG. 13E, even if binarization of the bright defect extraction or the dark defect extraction is performed, the pattern boundary portion remains as the abnormal portion 69 in the binarized composite images 71 and 72. Therefore, the amount of the pixel slightly larger than the predetermined boundary width in the 90° direction (the width direction (X direction) in the image) (about 3 pixels in the condition of the present embodiment) The valued composite images 71 and 72 perform reduction processing for noise (ST11). When the pattern boundary portion remains as the abnormal portion 69, the contraction processing is performed in the number of times the boundary portion can be erased and the number of times corresponding to the width of the boundary portion (the number of pixels in the Y direction).

例如,所謂「一個畫素收縮」,是指「朝上下左右各縮減一個畫素」,當在X方向上收縮3個畫素時,「朝左或右收縮3個畫素」=「朝左或右將一個畫素收縮進行三次」。對於圖13D而言,由於明部為缺陷,因此,以明部為基準來進行收縮,如圖13F般,將邊界部分消去。又,對於圖13E而言,由於暗部為缺陷,因此,以暗部為基準來進行收縮,如圖13G般,將邊界部分消去。以上述方式將邊界部分消去,藉此,可消除邊界的影響,從而可精度良好地對缺陷進行檢測。 For example, the phrase "one pixel shrinks" means "reducing one pixel to the top, bottom, left, and right". When shrinking three pixels in the X direction, "shrinking three pixels to the left or right" = "to the left" Or right, shrink one pixel three times." In Fig. 13D, since the bright portion is a defect, the contraction is performed on the basis of the bright portion, and the boundary portion is eliminated as shown in Fig. 13F. Further, in Fig. 13E, since the dark portion is a defect, the contraction is performed on the basis of the dark portion, and the boundary portion is eliminated as shown in Fig. 13G. The boundary portion is eliminated in the above manner, whereby the influence of the boundary can be eliminated, so that the defect can be detected with high precision.

藉由縮小處理,由於圖案邊界部分所引起的異常部69的寬度小於縮小畫素,因此,如圖13F、圖13G的縮小處理圖像73、74所示,上述異常部69完全消去,另一方面, 由於應檢測的亮點或異物的大小為100μm左右,因此,在寬度方向上,亮點或異物的尺寸至少接近於10個畫素,不會因上述縮小處理而消去。接著,僅將大於規定尺寸的明缺陷BP1、BP2及暗缺陷BP3、BP4予以抽出。於本實施形態中,將不足100μm的缺陷視為在實際運用方面無問題的缺陷,將100μm以上的缺陷作為明缺陷及暗缺陷而予以抽出(ST12)。根據眾所周知的方法,例如在畫面位置中確定上述抽出的明缺陷BP1、BP2及暗缺陷BP3、BP4,將該位置資料與缺陷資訊一併記憶於缺陷資料記憶部63(ST13)。 By the reduction processing, since the width of the abnormal portion 69 due to the boundary portion of the pattern is smaller than the reduced pixel, the abnormal portion 69 is completely erased as shown by the reduction processing images 73 and 74 of FIGS. 13F and 13G, and the other abnormal portion 69 is completely eliminated. aspect, Since the size of the bright spot or the foreign matter to be detected is about 100 μm, the size of the bright spot or the foreign matter in the width direction is at least close to 10 pixels, and is not eliminated by the above-described reduction processing. Next, only the bright defects BP1 and BP2 and the dark defects BP3 and BP4 larger than the predetermined size are extracted. In the present embodiment, a defect of less than 100 μm is regarded as a defect that is not problematic in practical use, and a defect of 100 μm or more is extracted as a bright defect and a dark defect (ST12). According to a well-known method, for example, the extracted bright defects BP1, BP2 and dark defects BP3, BP4 are determined in the screen position, and the position data and the defect information are collectively stored in the defect data storage unit 63 (ST13).

再者,代替藉由畫素縮小的雜訊除去方法來將邊界線部分消去,亦可將圖像的縱方向的條紋予以除去,藉此,將邊界線部分消去。又,亦可將在圖像的橫方向上以固定間距出現的條紋缺陷判斷為邊界部而消去。如此,藉由將由邊界部分引起的雜訊予以除去,可僅將明缺陷BP1、BP2與暗缺陷BP3、BP4予以抽出,從而可精度良好地確定亮度缺陷或異物缺陷。 Furthermore, instead of removing the boundary line by the noise removal method by pixel reduction, the stripe in the longitudinal direction of the image can be removed, thereby eliminating the boundary line portion. Further, the streak defect appearing at a fixed pitch in the lateral direction of the image may be determined as a boundary portion and eliminated. As described above, by removing the noise caused by the boundary portion, only the bright defects BP1 and BP2 and the dark defects BP3 and BP4 can be extracted, and the luminance defect or the foreign matter defect can be accurately determined.

[第6實施形態] [Sixth embodiment]

接著,代替切割為片狀的圖案化相位差膜60,參照圖16及圖17(A)~圖17(F),對呈網狀地相連的圖案化相位差膜80的缺陷檢查裝置81進行說明。該第6實施形態與第5實施形態的不同點在於:為了對於移行的網狀的圖案化相位差膜80而連續地取得圖像,使用CCD線影像感測器作為攝影裝置,連續地取得網狀物的攝影圖像。因此, 設置第1圖像專用的攝影單元82、第2圖像專用的攝影單元83、以及控制部84,連續地取得圖像。上述攝影單元82、83基本上為與第5實施形態的攝影單元相同的構成,第1圖像用的攝影條件及第2圖像用的攝影條件亦與第5實施形態相同。然而,於第6實施形態中,由於分別設置有第1圖像專用的攝影單元82及第2圖像專用的攝影單元83,因此,無需第5實施形態的旋轉機構64或攝影條件變更部61等。 Next, instead of the patterned retardation film 60 cut into a sheet shape, referring to FIG. 16 and FIGS. 17(A) to 17(F), the defect inspection device 81 of the patterned retardation film 80 connected in a mesh shape is subjected to the defect inspection device 81. Description. The sixth embodiment is different from the fifth embodiment in that a CCD line image sensor is used as a photographing device to continuously acquire a web in order to continuously acquire an image for the meshed patterned retardation film 80 that has migrated. A photographic image of the object. therefore, The imaging unit 82 dedicated to the first image, the imaging unit 83 dedicated to the second image, and the control unit 84 are provided to continuously acquire an image. The imaging units 82 and 83 are basically the same configuration as the imaging unit of the fifth embodiment, and the imaging conditions for the first image and the imaging conditions for the second image are also the same as those of the fifth embodiment. However, in the sixth embodiment, since the first image-only imaging unit 82 and the second image-only imaging unit 83 are provided, the rotation mechanism 64 or the imaging condition changing unit 61 of the fifth embodiment is not required. Wait.

第1圖像攝影單元82包括:光源部91、攝影裝置92、第1偏光板93、λ/4波長板94、以及第2偏光板95。於光源部91與攝影裝置92之間,自光源部91側起,依序配置有第1偏光板93、λ/4波長板94、以及第2偏光板95。圖案化相位差膜80位於第1偏光板93與λ/4波長板94之間。又,第2圖像攝影單元83亦是與第1圖像攝影單元82同樣地構成,且包括:光源部101、攝影裝置102、第1偏光板103、λ/4波長板104、以及第2偏光板105。 The first image capturing unit 82 includes a light source unit 91, an imaging device 92, a first polarizing plate 93, a λ/4 wavelength plate 94, and a second polarizing plate 95. Between the light source unit 91 and the imaging device 92, the first polarizing plate 93, the λ/4 wavelength plate 94, and the second polarizing plate 95 are sequentially disposed from the light source unit 91 side. The patterned retardation film 80 is located between the first polarizing plate 93 and the λ/4 wavelength plate 94. Further, the second image capturing unit 83 is configured similarly to the first image capturing unit 82, and includes a light source unit 101, an imaging device 102, a first polarizing plate 103, a λ/4 wavelength plate 104, and a second Polarizing plate 105.

控制部84包括圖像處理部96及缺陷資料記憶部97。來自攝影裝置92、102的攝影信號被發送至控制部84的圖像處理部96,利用圖像處理部96來對各種缺陷進行檢測。 The control unit 84 includes an image processing unit 96 and a defect data storage unit 97. The imaging signals from the imaging devices 92 and 102 are transmitted to the image processing unit 96 of the control unit 84, and the image processing unit 96 detects various defects.

圖像處理部96包括:二值化電路106、圖像反轉電路107、互斥或運算電路108及雜訊除去電路109。首先,如圖17(A)、圖17(B)所示,取得由線感測器獲得的各條線的圖像信號。由於各攝影單元82、83相隔地配置於網狀物移行方向,因此,考慮該相隔量來確定網狀物移行方向 上的同一條線的畫素彼此。接著,如圖17(C)、圖17(D)所示,與第5實施形態同樣地,使用二值化電路106且基於高亮度側臨限值及低亮度側臨限值,對上述同一條線的第1圖像信號及第2圖像信號進行二值化。 The image processing unit 96 includes a binarization circuit 106, an image inversion circuit 107, a mutually exclusive OR operation circuit 108, and a noise removal circuit 109. First, as shown in FIGS. 17(A) and 17(B), image signals of respective lines obtained by the line sensor are obtained. Since each of the photographing units 82 and 83 is disposed in the moving direction of the web, the amount of separation is used to determine the moving direction of the web. The pixels on the same line are on each other. Then, as shown in FIG. 17(C) and FIG. 17(D), in the same manner as in the fifth embodiment, the binarization circuit 106 is used, and the high luminance side threshold and the low luminance side threshold are used. The first image signal and the second image signal of one line are binarized.

接著,如圖17(E)所示,利用圖像反轉電路107來使第2圖像的二值化資料反轉。接著,如圖17(F)所示,利用互斥或運算電路108來對上述已反轉的信號與第1圖像的二值化信號進行運算,且輸出為互斥或。藉此,獲得將存在明缺陷及暗缺陷的部分確定為「1」的輸出信號。再者,當在第1圖像與第2圖像的相同位置存在缺陷時,互斥或運算電路108將「0」予以輸出,但在缺陷圖像的性質方面,由於不可能在同一位置同時產生明圖像中的暗缺陷及暗圖像中的明缺陷,因此,即便特別地輸出「0」,亦無問題。例如,於第1圖像的正常部分的圖案的明部,異物等將光予以遮蔽而成為暗缺陷的部分在第2圖像中存在於暗部,由於該部分原本將光予以遮蔽,因此,不會成為缺陷。雖罕有如下的情形,即,例如異物嵌入至膜而損害異物周邊的偏光特性,但即便於該情形時,成為缺陷的核的異物本身亦僅為暗缺陷,異物周邊的偏光特性異常僅會被識別為明缺陷(亮點),且上述暗缺陷與明缺陷(亮點)的產生位置雖靠近,但必然有所不同。如此,相對於一個圖像信號,對另一個圖像信號的反轉輸出信號進行互斥或運算,藉此,可藉由簡單的構成,使明缺陷與暗缺陷明顯地顯示於同一畫面上。再者,當使圖17(A)~圖17(F) 中的圖17(A)的第1圖像資料與圖17(B)的第2圖像資料在X方向上進行位置對準時,可如圖15所示,求出使第1圖像資料與第2圖像資料合成時的平均亮度為最小的相對位置,接著以該相對位置為基準,對兩個圖像資料進行位置對準。 Next, as shown in FIG. 17(E), the image inversion circuit 107 inverts the binarized data of the second image. Next, as shown in FIG. 17(F), the inverted signal and the binarized signal of the first image are calculated by the exclusive OR operation circuit 108, and the outputs are mutually exclusive. Thereby, an output signal in which a portion having a bright defect and a dark defect is determined to be "1" is obtained. Further, when there is a defect at the same position of the first image and the second image, the exclusive OR operation circuit 108 outputs "0", but in terms of the nature of the defective image, since it is impossible to simultaneously A dark defect in a bright image and a bright defect in a dark image are generated, and therefore, even if "0" is specifically output, there is no problem. For example, in the bright portion of the pattern of the normal portion of the first image, a portion such as a foreign matter that blocks light and becomes a dark defect exists in the dark portion in the second image, and since the portion originally shields the light, the Will become a defect. There are cases where, for example, a foreign matter is embedded in a film to impair the polarization characteristics around the foreign matter, but even in this case, the foreign matter that becomes the core of the defect is only a dark defect, and the polarization characteristic around the foreign object is only abnormal. It is recognized as a bright defect (bright spot), and the positions of the above-mentioned dark defects and bright defects (bright spots) are close, but they are necessarily different. In this way, the inverted output signal of the other image signal is mutually exclusive or calculated with respect to one image signal, whereby the bright defect and the dark defect can be clearly displayed on the same screen by a simple configuration. Furthermore, when making Figure 17 (A) ~ Figure 17 (F) When the first image data of FIG. 17(A) and the second image data of FIG. 17(B) are aligned in the X direction, as shown in FIG. 15, the first image data can be obtained. The average brightness at the time of synthesizing the second image data is the smallest relative position, and then the two image data are aligned based on the relative position.

再者,當由於光在各圖案60A、60B的邊界部分洩漏而出現雜訊時,與第5實施形態同樣地,藉由雜訊除去電路109來將雜訊予以除去。如此,即便對於連續地移行的圖案化相位差膜,亦可精度良好地對明缺陷及暗缺陷進行檢測。 Further, when noise occurs due to leakage of light at the boundary portion of each of the patterns 60A and 60B, the noise is removed by the noise removing circuit 109 as in the fifth embodiment. In this manner, even for the patterned retardation film that continuously moves, the bright defects and the dark defects can be accurately detected.

於第6實施形態中,由於在圖像處理的初始階段,對圖像信號進行二值化,因此,可使處理的圖像資料大幅度地減少,從而能夠高速地進行缺陷檢查。因此,即便不使用高速且昂貴的圖像處理裝置,亦可即時地對移行的網狀物的缺陷進行全面檢查。再者,如圖16所示,於第6實施形態中,將光源部91、101個別地設置於各攝影單元82、83,但亦可將一個光源部的照明區域擴大,從而藉由一個光源部來進行照明。 In the sixth embodiment, since the image signal is binarized at the initial stage of image processing, the processed image data can be greatly reduced, and the defect inspection can be performed at high speed. Therefore, even if a high-speed and expensive image processing apparatus is not used, it is possible to comprehensively inspect the defects of the moving mesh in real time. Further, as shown in FIG. 16, in the sixth embodiment, the light source units 91 and 101 are individually provided in the respective imaging units 82 and 83. However, the illumination area of one light source unit may be enlarged to provide a light source. To carry out lighting.

又,於第6實施形態中,基於線感測器的圖像信號,逐條線地對缺陷進行檢測,但亦可使用影像區域感測器,一次性地取得多條線的圖像信號,基於每條線的圖像信號來對缺陷進行檢測。又,於第6實施形態中,代替片狀的圖案化相位差膜60,將網狀的圖案化相位差膜80配置於檢查位置,設置網狀物儲器(web reservoir)且使網狀膜 間歇地前進,對每個固定區間進行缺陷檢查,上述網狀物儲器暫時積存著長度超過攝影範圍的網狀物,藉此,可連續地對網狀膜的整個面進行缺陷檢測。 Further, in the sixth embodiment, the defect is detected line by line based on the image signal of the line sensor, but the image area sensor can be used to acquire the image signals of the plurality of lines at one time. Defects are detected based on image signals for each line. Further, in the sixth embodiment, instead of the sheet-shaped patterned retardation film 60, the mesh-shaped patterned retardation film 80 is placed at the inspection position, and a web reservoir is provided and the mesh film is provided. Advancing intermittently, defect inspection is performed for each fixed section, and the mesh reservoir temporarily accumulates a mesh having a length exceeding the photographing range, whereby the entire surface of the mesh film can be continuously detected for defects.

[實例1] [Example 1]

於實例1中,使用以第1實施形態的方式構成的缺陷檢測裝置10,實際地對相位差膜12進行缺陷檢查。於該缺陷檢查中,將相位差膜12設為檢查對象,該相位差膜12將TAC作為支持體12a。 In the example 1, the defect detecting device 10 configured as described in the first embodiment is used to actually perform defect inspection on the phase difference film 12. In the defect inspection, the retardation film 12 is set as an inspection object, and the retardation film 12 has TAC as the support 12a.

形成於相位差膜12的第1相位差區域14、第2相位差區域15的寬度為270μm。又,攝影裝置17所拍攝的亮度圖像中的Y方向的畫素解析度為10μm/畫素。第1相位差區域14、第2相位差區域15的邊界在亮度圖像上,是Y方向的畫素數為2個~3個的邊界線(明畫素),因此,進行在Y方向上僅收縮3個畫素的三次收縮處理,接著將一個畫素的明畫素區域作為雜訊而消去之後,進行在Y方向上僅膨脹3個畫素的三次膨脹處理,然後將明畫素區域確定為缺陷部分。結果,可檢測出直徑約為100μm的缺陷。 The width of the first phase difference region 14 and the second phase difference region 15 formed in the retardation film 12 is 270 μm. Further, the pixel resolution in the Y direction in the luminance image captured by the imaging device 17 is 10 μm/pixel. The boundary between the first phase difference region 14 and the second phase difference region 15 is a boundary line (bright pixel) having two to three pixel numbers in the Y direction on the luminance image, and therefore is performed in the Y direction. Only shrinking the three-contraction process of three pixels, and then eliminating the bright pixel region of one pixel as noise, performing a three-expansion process of expanding only three pixels in the Y direction, and then the bright pixel region Determined as a defective part. As a result, a defect having a diameter of about 100 μm can be detected.

[實例2] [Example 2]

於實例2中,如第4實施形態般設置相位差補償板37,對相位差膜12進行缺陷檢測。該缺陷檢測中所使用的缺陷檢測裝置10除了設置有相位差補償板37之外,構成與第2實施形態相同,製成差分圖像來對缺陷進行檢測。相位差補償板37使用與相位差膜12的支持體12a相同的 透明膜的正常部分,且以使相位差補償板37的光學軸與支持體12a的光學軸正交的方式配置。於該實例2中,第1相位差區域14、第2相位差區域15的寬度為270μm,為了更高精度地對缺陷尺寸進行檢測,將畫素解析度設為3μm/畫素。因此,於亮度圖像上,邊界線在Y方向上為5個~7個畫素的寬度。 In the example 2, the phase difference compensation plate 37 is provided as in the fourth embodiment, and the phase difference film 12 is subjected to defect detection. The defect detecting device 10 used for the defect detection has the same configuration as that of the second embodiment except that the phase difference compensating plate 37 is provided, and a difference image is prepared to detect the defect. The phase difference compensation plate 37 is the same as the support 12a of the retardation film 12. The normal portion of the transparent film is disposed such that the optical axis of the phase difference compensation plate 37 is orthogonal to the optical axis of the support 12a. In the second example, the width of the first phase difference region 14 and the second phase difference region 15 is 270 μm, and the pixel resolution is set to 3 μm/pixel in order to detect the defect size with higher precision. Therefore, on the luminance image, the boundary line is the width of 5 to 7 pixels in the Y direction.

藉由配置相位差補償板37,如上所述,相位差膜12的第1相位差區域14、第2相位差區域15均更接近於消光狀態,圖像的正常面的亮度水準比實例1更低(更暗),亮點的對比度得到改善。對比度得到改善,相應地能夠將二值化時的臨限值設定為低臨限值,亦可將透過第2偏光板19的光量少的缺陷部分轉換為明畫素,從而以高精度來對缺陷進行檢測。 By arranging the phase difference compensation plate 37, as described above, the first phase difference region 14 and the second phase difference region 15 of the phase difference film 12 are all closer to the extinction state, and the brightness level of the normal surface of the image is higher than that of the example 1. Low (darker), the contrast of the bright spots is improved. The contrast is improved, and accordingly, the threshold value at the time of binarization can be set to a low threshold value, and the defective portion having a small amount of light transmitted through the second polarizing plate 19 can be converted into a bright pixel, thereby achieving high precision. Detect defects.

相對於亮度圖像的各畫素,設為「y1=90」,產生與在Y方向上相隔90個畫素的對方畫素之間的差分圖像。結果,對於邊界線上的各畫素而言,將鄰接於該邊界線的其他邊界線上的畫素作為對方畫素而取得差分的新的值大致為「0」。藉此,可藉由二值化,自亮度圖像將邊界線消去。於二值化之後,能夠以充分的精度,自如下的圖像中檢測出缺陷,該圖像是將2個畫素以下的明畫素區域作為雜訊而消去所得的圖像。即便為僅與邊界線的寬度相同程度的微小的缺陷,亦能夠檢測。 With respect to each pixel of the luminance image, "y1=90" is generated, and a difference image is generated between the pixels of the opposite pixel that are separated by 90 pixels in the Y direction. As a result, for each pixel on the boundary line, the new value obtained by taking the pixel on the other boundary line adjacent to the boundary line as the opponent pixel is approximately "0". Thereby, the boundary line can be eliminated from the luminance image by binarization. After the binarization, a defect can be detected from an image with sufficient precision as an image obtained by canceling the bright pixel region of two pixels or less as noise. It can be detected even if it is a minute defect that is only the same as the width of the boundary line.

10、50‧‧‧缺陷檢測裝置 10, 50‧‧‧ Defect detection device

12‧‧‧圖案化相位差膜/相位差膜 12‧‧‧Phase retardation film / retardation film

12a‧‧‧支持體 12a‧‧‧Support

12b‧‧‧相位差層 12b‧‧‧ phase difference layer

14、15‧‧‧相位差區域 14, 15‧‧‧ phase difference area

16、51、91、101‧‧‧光源部 16, 51, 91, 101‧‧‧ Light source department

17、52、92、102‧‧‧攝影裝置 17, 52, 92, 102‧ ‧ photographic equipment

17a‧‧‧攝影透鏡 17a‧‧‧Photographic lens

17b‧‧‧CCD線感測器 17b‧‧‧CCD line sensor

18、19、53、55、93、95、103、105‧‧‧偏光板 18, 19, 53, 55, 93, 95, 103, 105‧‧‧ polarizing plates

20‧‧‧缺陷檢測單元 20‧‧‧ Defect detection unit

21、57、96‧‧‧圖像處理部 21, 57, 96‧‧‧Image Processing Department

22‧‧‧缺陷檢測部 22‧‧‧Defect Detection Department

23‧‧‧D/A轉換器 23‧‧‧D/A converter

24‧‧‧記憶體 24‧‧‧ memory

25、106‧‧‧二值化電路 25, 106‧‧‧ Binarization Circuit

26‧‧‧收縮處理電路 26‧‧‧Shrinkage processing circuit

27‧‧‧膨脹處理電路 27‧‧‧Expansion processing circuit

28、109‧‧‧雜訊除去電路 28, 109‧‧‧ noise removal circuit

31‧‧‧差分圖像產生電路 31‧‧‧Differential image generation circuit

37‧‧‧相位差補償板 37‧‧‧ phase difference compensation board

41‧‧‧計數電路 41‧‧‧Counting circuit

51A‧‧‧照明面 51A‧‧‧Lighting surface

54、94、104‧‧‧λ/4波長板 54, 94, 104‧‧‧λ/4 Wavelength Board

56、84‧‧‧控制部 56, 84‧‧‧Control Department

60‧‧‧圖案化相位差膜 60‧‧‧ patterned retardation film

60A、60B‧‧‧圖案 60A, 60B‧‧‧ pattern

61‧‧‧攝影條件變更部 61‧‧‧Photographic Condition Change Department

63、97‧‧‧缺陷資料記憶部 63, 97‧‧‧Defects in the Memory of Defects

64‧‧‧旋轉機構 64‧‧‧Rotating mechanism

65、66‧‧‧圖像 65, 66‧‧‧ images

67‧‧‧合成圖像 67‧‧‧Composite images

69‧‧‧異常部 69‧‧‧Exception Department

70‧‧‧圖像合成部 70‧‧‧Image Synthesis Department

71、72‧‧‧二值化合成圖像 71, 72‧‧‧ Binarized composite image

73、74‧‧‧縮小處理圖像 73, 74‧‧‧ Reduced processing image

80‧‧‧圖案化相位差膜 80‧‧‧ patterned retardation film

81‧‧‧缺陷檢查裝置 81‧‧‧ Defect inspection device

82、83‧‧‧攝影單元 82, 83‧‧‧Photographic unit

107‧‧‧圖像反轉電路 107‧‧‧Image reversal circuit

108‧‧‧互斥或運算電路 108‧‧‧Exclusive or arithmetic circuit

As1、As2‧‧‧遲相軸 As1, As2‧‧‧ late phase axis

BP1、BP2‧‧‧明缺陷 BP1, BP2‧‧‧ Defects

BP3、BP4‧‧‧暗缺陷 BP3, BP4‧‧‧Dark defects

Cp‧‧‧鄰接距離畫素數 Cp‧‧‧adjacent distance

Cy‧‧‧間隔 Cy‧‧‧ interval

D1‧‧‧暗畫素區域 D1‧‧‧Dark pixel area

D2‧‧‧邊界線 D2‧‧‧ boundary line

D3~D8‧‧‧明畫素區域 D3~D8‧‧‧ bright pixels area

I‧‧‧亮度圖像 I‧‧‧Brightness image

P1、P2‧‧‧偏光透射軸 P1, P2‧‧‧ polarized transmission axis

Px1‧‧‧注視畫素 Px1‧‧‧ gaze

Px2‧‧‧對方畫素 Px2‧‧‧Participating pixels

ST1~ST13‧‧‧步驟 ST1~ST13‧‧‧Steps

X、Y‧‧‧方向 X, Y‧‧ direction

x1、y1‧‧‧畫素數 X1, y1‧‧ ‧ prime numbers

θ‧‧‧角度 Θ‧‧‧ angle

圖1是表示實施本發明的缺陷檢測裝置的構成的立體 圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing the configuration of a defect detecting device embodying the present invention. Figure.

圖2是表示圖案化相位差膜的層構造的剖面圖。 2 is a cross-sectional view showing a layer structure of a patterned retardation film.

圖3是表示各相位差區域的遲相軸的斜度的說明圖。 3 is an explanatory view showing a slope of a slow phase axis of each phase difference region.

圖4是表示缺陷檢測單元的構成的方塊圖。 4 is a block diagram showing the configuration of a defect detecting unit.

圖5是表示用於檢查的處理順序的流程圖。 Fig. 5 is a flow chart showing the processing procedure for inspection.

圖6A是表示已二值化的亮度圖像的一例的說明圖。 FIG. 6A is an explanatory diagram showing an example of a luminance image that has been binarized.

圖6B是表示藉由收縮處理來將邊界線或雜訊、微小的缺陷部分消去的亮度圖像的一例的說明圖。 FIG. 6B is an explanatory diagram showing an example of a luminance image in which boundary lines, noise, and minute defective portions are erased by the contraction process.

圖6C是表示藉由膨脹處理來使亮度圖像的明畫素區域的寬度恢復的亮度圖像的一例的說明圖。 FIG. 6C is an explanatory diagram showing an example of a luminance image in which the width of the bright pixel region of the luminance image is restored by the expansion processing.

圖7是表示藉由產生差分圖像來將邊界線消去的例子中的缺陷檢測單元的方塊圖。 Fig. 7 is a block diagram showing a defect detecting unit in an example in which a boundary line is erased by generating a difference image.

圖8是表示產生差分圖像時的對方畫素的距離的說明圖。 FIG. 8 is an explanatory diagram showing a distance of a counterpart pixel when a difference image is generated.

圖9是表示根據直至鄰接的候補缺陷為止的畫素數來判定是否有缺陷的例子中的缺陷檢測單元的方塊圖。 FIG. 9 is a block diagram showing a defect detecting unit in an example of determining whether or not there is a defect based on the number of pixels up to the adjacent candidate defect.

圖10是表示基於直至在Y方向上相鄰接的候補缺陷為止的畫素數來判定為缺陷的例子的說明圖。 FIG. 10 is an explanatory diagram showing an example in which a defect is determined based on the number of pixels up to the candidate defect adjacent in the Y direction.

圖11是表示設置有相位差補償板的例子的側面圖。 Fig. 11 is a side view showing an example in which a phase difference compensation plate is provided.

圖12是表示片狀的圖案化相位差膜的缺陷檢測裝置的立體圖。 FIG. 12 is a perspective view showing a defect detecting device of a sheet-shaped patterned retardation film.

圖13A是表示第1圖像的一例的說明圖。 FIG. 13A is an explanatory diagram showing an example of a first image.

圖13B是表示第2圖像的一例的說明圖。 FIG. 13B is an explanatory diagram showing an example of a second image.

圖13C是表示第1圖像及第2圖像的合成圖像的一例 的說明圖。 13C is a diagram showing an example of a composite image of the first image and the second image. Illustration of the diagram.

圖13D是表示基於合成圖像來將明缺陷予以抽出時的圖像的說明圖。 FIG. 13D is an explanatory diagram showing an image when a bright defect is extracted based on a composite image. FIG.

圖13E是表示基於合成圖像來將暗缺陷予以抽出時的圖像的說明圖。 FIG. 13E is an explanatory diagram showing an image when a dark defect is extracted based on a composite image. FIG.

圖13F是表示自圖13D所示的圖像將邊界部分消去所得的圖像的說明圖。 Fig. 13F is an explanatory diagram showing an image obtained by erasing the boundary portion from the image shown in Fig. 13D.

圖13G是表示自圖13F所示的圖像將邊界部分消去所得的圖像的說明圖。 Fig. 13G is an explanatory diagram showing an image obtained by erasing the boundary portion from the image shown in Fig. 13F.

圖14是表示缺陷檢測的處理順序的流程圖。 Fig. 14 is a flow chart showing the processing procedure of defect detection.

圖15是表示圖像合成時的X方向位置對準的處理順序的流程圖。 Fig. 15 is a flowchart showing a processing procedure of the X-direction positional alignment at the time of image composition.

圖16是表示網狀的圖案化相位差膜的缺陷檢測裝置的立體圖。 Fig. 16 is a perspective view showing a defect detecting device of a mesh-shaped patterned retardation film.

圖17(A)~圖17(F)是表示基於第1圖像信號及第2圖像信號來將缺陷予以抽出的方法的時序圖。 17(A) to 17(F) are timing charts showing a method of extracting a defect based on the first image signal and the second image signal.

As1、As2‧‧‧遲相軸 As1, As2‧‧‧ late phase axis

X‧‧‧方向 X‧‧‧ direction

θ‧‧‧角度 Θ‧‧‧ angle

Claims (34)

一種圖案化相位差膜的缺陷檢測裝置,其是對圖案化相位差膜的缺陷進行檢測的缺陷檢測裝置,於上述圖案化相位差膜中,多個光學軸彼此大致正交的條狀的第1相位差區域及第2相位差區域交替地並排地排列,且上述第1相位差區域及上述第2相位差區域作為λ/4波長板而發揮功能,上述圖案化相位差膜的缺陷檢測裝置的特徵在於包括:第1偏光板及第2偏光板,以隔著上述圖案化相位差膜的方式而正交偏光地配置;光源部,經由上述第1偏光板而將檢查光照射至上述圖案化相位差膜;攝影裝置,經由上述第2偏光板而拍攝上述圖案化相位差膜,獲得亮度圖像;以及缺陷檢測部,自上述亮度圖像中檢測出上述缺陷,對上述第1偏光板及上述第2偏光板的一個偏光透射軸的方向進行調整,使得在任一個上述偏光透射軸與上述第1相位差區域及上述第2相位差區域的任一個光學軸大致呈平行的狀態下,利用攝影裝置來對正常的上述第1相位差區域及上述第2相位差區域進行拍攝時的各亮度在消光狀態附近達到相同水準。 A defect detecting device for patterning a retardation film, which is a defect detecting device for detecting a defect of a patterned retardation film, wherein the plurality of optical axes are substantially orthogonal to each other in the patterned retardation film The phase difference region and the second phase difference region are alternately arranged side by side, and the first phase difference region and the second phase difference region function as a λ/4 wavelength plate, and the patterned retardation film defect detecting device The first polarizing plate and the second polarizing plate are arranged to be orthogonally polarized so as to sandwich the patterned retardation film, and the light source unit irradiates the inspection light to the pattern via the first polarizing plate. a retardation film; an imaging device that images the patterned retardation film through the second polarizing plate to obtain a luminance image; and a defect detecting unit that detects the defect from the luminance image to the first polarizing plate And adjusting a direction of one polarization transmission axis of the second polarizing plate so that any one of the polarization transmission axis and the first phase difference region and the second phase difference region are In a state in which one optical axis is substantially parallel, each of the luminances when the normal first phase difference region and the second phase difference region are imaged by the imaging device reaches the same level in the vicinity of the extinction state. 如申請專利範圍第1項所述之圖案化相位差膜的缺陷檢測裝置,其中上述圖案化相位差膜是將相位差層積層於包含透明膜 的支持體,藉此來形成上述第1相位差區域及上述第2相位差區域,且上述圖案化相位差膜的缺陷檢測裝置包括相位差補償板,上述相位差補償板配置於上述第1偏光板與上述圖案化相位差膜之間、或上述第2偏光板與上述圖案化相位差膜之間,且消除上述支持體所具有的相位差特性。 The defect detecting device of the patterned retardation film according to claim 1, wherein the patterned retardation film laminates the phase difference layer to include a transparent film The support body is configured to form the first phase difference region and the second phase difference region, and the defect detecting device for the patterned retardation film includes a phase difference compensation plate, and the phase difference compensation plate is disposed on the first polarization beam The plate is interposed between the patterned retardation film or the second polarizing plate and the patterned retardation film, and the phase difference characteristic of the support is eliminated. 如申請專利範圍第2項所述之圖案化相位差膜的缺陷檢測裝置,其中上述相位差補償板是與上述支持體相同的透明膜。 The defect detecting device for a patterned retardation film according to claim 2, wherein the phase difference compensation plate is the same transparent film as the support. 如申請專利範圍第3項所述之圖案化相位差膜的缺陷檢測裝置,包括圖像處理部,上述圖像處理部將與上述第1相位差區域及上述第2相位差區域的邊界相對應的上述亮度圖像內的邊界線消去,上述缺陷檢測部基於上述邊界線已被消去的上述亮度圖像,對上述缺陷進行檢測。 The defect detecting device for a patterned retardation film according to claim 3, further comprising an image processing unit, wherein the image processing unit corresponds to a boundary between the first phase difference region and the second phase difference region The boundary line in the luminance image is erased, and the defect detecting unit detects the defect based on the luminance image in which the boundary line has been erased. 如申請專利範圍第4項所述之圖案化相位差膜的缺陷檢測裝置,其中上述圖像處理部包括:二值化電路,以規定的臨限值來對已拍攝的上述亮度圖像進行二值化,將各畫素設為上述臨限值以上的明畫素與低於上述臨限值的暗畫素;以及候補缺陷抽出電路,將多個上述明畫素相連而成的區域設為候補缺陷區域, 上述缺陷檢測部在上述邊界線的排列方向上,對上述候補缺陷區域與鄰接的其他上述候補缺陷區域之間的畫素數進行計數,當計數出的上述畫素數為規定值以下時,將相關的上述候補缺陷區域設為上述缺陷。 The defect detecting device of the patterned retardation film according to claim 4, wherein the image processing unit includes: a binarization circuit that performs the above-described luminance image with a predetermined threshold value; For each value, each pixel is a bright pixel having a threshold value or more and a dark pixel lower than the threshold value; and a candidate defect extraction circuit is provided with a region in which a plurality of the bright pixels are connected to each other. Alternate defect area, The defect detecting unit counts a pixel number between the candidate defect region and another adjacent candidate defect region in the direction in which the boundary line is arranged, and when the counted pixel number is equal to or smaller than a predetermined value, The related candidate defect region described above is set as the above defect. 如申請專利範圍第4項所述之圖案化相位差膜的缺陷檢測裝置,其中上述圖像處理部包括:二值化電路,以規定的臨限值來對已拍攝的上述亮度圖像進行二值化,將各畫素設為上述臨限值以上的明畫素與低於上述臨限值的暗畫素;以及收縮處理電路,以與上述邊界線的寬度相對應的次數,對已二值化的上述亮度圖像進行收縮處理,將上述邊界線消去,上述收縮處理是在上述邊界線的排列方向上使上述明畫素的區域收縮的處理。 The defect detecting device of the patterned retardation film according to claim 4, wherein the image processing unit includes: a binarization circuit that performs the above-described luminance image with a predetermined threshold value; For each value, each pixel is set to a bright pixel above the threshold and a dark pixel lower than the threshold; and the shrink processing circuit has a number of times corresponding to the width of the boundary line, The value-enhanced luminance image is subjected to a contraction process to erase the boundary line, and the contraction process is a process of shrinking the region of the bright pixel in the direction in which the boundary lines are arranged. 如申請專利範圍第6項所述之圖案化相位差膜的缺陷檢測裝置,其中上述圖像處理部包括膨脹處理電路,上述膨脹處理電路對經上述收縮處理的上述亮度圖像進行膨脹處理,使上述收縮處理中所殘留的上述明畫素的區域恢復至上述收縮處理之前的尺寸,上述膨脹處理是在與上述收縮處理相同的方向上使上述明畫素的區域膨脹的處理,上述缺陷檢測部基於經上述膨脹處理的上述亮度圖像,對上述缺陷進行檢測。 The defect detecting device of the patterned retardation film according to claim 6, wherein the image processing unit includes an expansion processing circuit that expands the brightness image subjected to the shrinking process to cause expansion processing The area of the bright pixel remaining in the shrinkage process is restored to the size before the shrinkage process, and the expansion process is a process of expanding the region of the bright pixel in the same direction as the shrinkage process, and the defect detecting unit The above defects are detected based on the above-described luminance image subjected to the above expansion processing. 如申請專利範圍第4項所述之圖案化相位差膜的缺 陷檢測裝置,其中上述圖像處理部包括:差分圖像產生電路,對上述亮度圖像上的各畫素進行差分處理,藉此,產生已實質上將上述邊界線消去的差分圖像,上述差分處理是針對上述亮度圖像上的畫素,將至少在上述邊界線的排列方向上與相關畫素僅相隔與上述邊界線間隔相對應的畫素數的畫素作為對方畫素,將自上述相關畫素的亮度減去上述對方畫素的亮度所得的值設為上述相關畫素的新的值;以及二值化電路,以規定的臨限值來對上述差分圖像進行二值化,將各畫素設為上述臨限值以上的明畫素與低於上述臨限值的暗畫素。 Lack of patterned retardation film as described in claim 4 a trapping detection device, wherein the image processing unit includes a difference image generating circuit that performs differential processing on each of the pixels on the luminance image, thereby generating a difference image that substantially eliminates the boundary line, The difference processing is a pixel on the luminance image, and the pixel of the pixel number corresponding to the boundary of the boundary is separated from the correlation pixel by at least the arrangement direction of the boundary line as a pixel of the opposite party. a value obtained by subtracting the luminance of the opposite pixel from the luminance of the relevant pixel as a new value of the correlation pixel; and a binarization circuit binarizing the difference image with a predetermined threshold value Each pixel is set to a bright pixel above the threshold and a dark pixel below the threshold. 如申請專利範圍第8項所述之圖案化相位差膜的缺陷檢測裝置,其中上述差分圖像產生電路在上述亮度圖像上的互不相同的方向的上述對方畫素之間進行上述差分處理,藉此,分別產生各個方向的上述差分圖像,上述二值化電路以規定的上述臨限值,分別對多個上述差分圖像進行二值化,產生多個二值化圖像,上述缺陷檢測部對多個上述二值化圖像進行缺陷檢測。 The defect detecting device of the patterned retardation film according to claim 8, wherein the differential image generating circuit performs the differential processing between the opposite pixels in mutually different directions on the luminance image. Thereby, each of the difference images in each direction is generated, and the binarization circuit binarizes the plurality of difference images by a predetermined threshold value to generate a plurality of binarized images. The defect detecting unit performs defect detection on the plurality of binarized images. 一種圖案化相位差膜的缺陷檢查裝置,其是對圖案化相位差膜的缺陷進行檢測的缺陷檢測裝置,於上述圖案化相位差膜中,多個光學軸彼此大致正交的條狀的第1 相位差區域及第2相位差區域交替地並排地排列,且上述第1相位差區域及上述第2相位差區域作為λ/4波長板而發揮功能,上述圖案化相位差膜的缺陷檢查裝置的特徵在於包括:第1偏光板及第2偏光板,以隔著上述圖案化相位差膜的方式而配置;照明光源,經由上述第1偏光板而將照明光照射至上述圖案化相位差膜;上述λ/4波長板,配置於上述圖案化相位差膜與上述第2偏光板之間;攝影條件變更部,選擇性地設定為第1狀態與第2狀態,上述第1狀態是在使上述第1偏光板的透射軸相對於上述圖案化相位差膜的光學軸傾斜45°的狀態下,使上述第2偏光板的透射軸相對於上述λ/4波長板的光學軸達到+45度,上述第2狀態是使上述第2偏光板的透射軸相對於上述λ/4波長板的光學軸達到-45度;攝影裝置,在由上述攝影條件變更部產生的上述第1狀態及上述第2狀態下,經由上述λ/4波長板及上述第2偏光板而拍攝上述圖案化相位差膜,獲得第1圖像及第2圖像;圖像合成部,使上述第1圖像與上述第2圖像的上述第1相位差區域及上述第2相位差區域一致,使上述第1圖像及上述第2圖像重合,從而對上述第1圖像及上述第2圖像進行合成;以及 缺陷檢測部,基於來自上述圖像合成部的合成圖像信號,對上述缺陷進行檢測。 A defect inspection device for patterning a retardation film, which is a defect detecting device for detecting a defect of a patterned retardation film, wherein the plurality of optical axes are substantially orthogonal to each other in the patterned retardation film 1 The phase difference region and the second phase difference region are alternately arranged side by side, and the first phase difference region and the second phase difference region function as a λ/4 wavelength plate, and the defect inspection device of the patterned retardation film The first polarizing plate and the second polarizing plate are disposed so as to be interposed between the patterned retardation film, and the illumination light source irradiates the illumination light to the patterned retardation film via the first polarizing plate; The λ/4 wavelength plate is disposed between the patterned retardation film and the second polarizing plate, and the imaging condition changing unit is selectively set to a first state and a second state, wherein the first state is The transmission axis of the first polarizing plate is inclined by 45° with respect to the optical axis of the patterned retardation film, and the transmission axis of the second polarizing plate is +45 degrees with respect to the optical axis of the λ/4 wavelength plate. In the second state, the transmission axis of the second polarizing plate is set to -45 degrees with respect to the optical axis of the λ/4 wavelength plate, and the imaging device is in the first state and the second state generated by the imaging condition changing unit. State The λ/4 wavelength plate and the second polarizing plate capture the patterned retardation film to obtain a first image and a second image, and the image combining unit makes the first image and the second image The first phase difference region and the second phase difference region are identical, and the first image and the second image are superimposed to synthesize the first image and the second image; The defect detecting unit detects the defect based on the composite image signal from the image combining unit. 如申請專利範圍第10項所述之圖案化相位差膜的缺陷檢查裝置,其中上述圖像合成部於圖像合成時,改變與上述第1相位差區域及上述第2相位差區域的邊界線正交的方向上的上述第1圖像與上述第2圖像的相對位置,使上述第1圖像與上述第2圖像重合,在使重合之後的合成圖像的平均亮度為最小的上述相對位置,製成上述合成圖像。 The defect inspection apparatus of the patterned retardation film according to claim 10, wherein the image synthesizing unit changes a boundary line between the first phase difference region and the second phase difference region during image synthesis. The relative position between the first image and the second image in the orthogonal direction is such that the first image and the second image are superimposed, and the average luminance of the composite image after the overlap is minimized. The above composite image was produced in relative position. 如申請專利範圍第11項所述之圖案化相位差膜的缺陷檢查裝置,其中使相對於上述第1圖像與上述第2圖像中的上述第1相位差區域及上述第2相位差區域的明部亮度,達到上述圖像合成部的動態範圍與上述攝影裝置的動態範圍中的範圍較狹窄的動態範圍的大致一半的亮度,接著進行拍攝。 The defect inspection apparatus of the patterned retardation film according to claim 11, wherein the first phase difference region and the second phase difference region in the first image and the second image are provided The brightness of the bright portion reaches the brightness of the dynamic range of the image synthesizing unit and approximately half of the narrow dynamic range of the dynamic range of the imaging device, and then the imaging is performed. 如申請專利範圍第12項所述之圖案化相位差膜的缺陷檢查裝置,其中上述圖像合成部針對上述第1圖像與上述第2圖像而產生二值化信號,使一個二值化信號的明暗反轉而設為反轉二值信號,取得上述反轉二值信號與另一個二值化信號的互斥或(exclusive OR)。 The defect inspection apparatus of the patterned retardation film according to claim 12, wherein the image synthesizing unit generates a binarized signal for the first image and the second image to make a binarization The light and dark of the signal is inverted to be an inverted binary signal, and an exclusive OR of the inverted binary signal and another binary signal is obtained. 如申請專利範圍第13項所述之圖案化相位差膜的缺陷檢查裝置,包括圖案邊界消去部,上述圖案邊界消去部將由上述圖像 合成部產生的二值化合成圖像中,基於上述第1相位差區域及上述第2相位差區域的邊界的圖案邊界部消去。 The defect inspection device for a patterned retardation film according to claim 13, comprising a pattern boundary erasing portion, wherein the pattern boundary erasing portion is to be imaged by the image In the binarized composite image generated by the combining unit, the pattern boundary portion based on the boundary between the first phase difference region and the second phase difference region is erased. 如申請專利範圍第14項所述之圖案化相位差膜的缺陷檢查裝置,其中上述圖案邊界消去部將包含上述第1相位差區域及上述第2相位差區域的邊界寬度的畫素區域作為雜訊而進行縮小處理。 The defect inspection device for a patterned retardation film according to claim 14, wherein the pattern boundary erasing unit uses a pixel region including a boundary width of the first phase difference region and the second phase difference region as a impurity The news is reduced. 如申請專利範圍第10項至第15項中任一項所述之圖案化相位差膜的缺陷檢查裝置,其中上述圖案化相位差膜是在上述第1相位差區域及上述第2相位差區域的列方向上搬送的網狀物,上述攝影裝置包括:取得上述第1圖像的第1攝影裝置本體、與取得上述第2圖像的第2攝影裝置本體,且與上述網狀物的搬送同步地拍攝上述網狀物。 The defect inspection apparatus of the patterned retardation film according to any one of claims 10 to 15, wherein the patterned retardation film is in the first phase difference region and the second phase difference region. In the mesh device that is transported in the column direction, the imaging device includes: a first imaging device main body that acquires the first image, and a second imaging device main body that acquires the second image, and the mesh device is transported The above mesh was taken synchronously. 一種圖案化相位差膜的缺陷檢測方法,其是對圖案化相位差膜的缺陷進行檢測的缺陷檢測方法,於上述圖案化相位差膜中,多個光學軸彼此大致正交的條狀的第1相位差區域及第2相位差區域交替地並排地排列,且上述第1相位差區域及上述第2相位差區域作為λ/4波長板而發揮功能,上述圖案化相位差膜的缺陷檢測方法的特徵在於包括:調整步驟,在使第1偏光板及第2偏光板的任一個偏光透射軸的方向與上述第1相位差區域及上述第2相位差區域的任一個光學軸大致呈平行的範圍內進行調整,使得 在將上述圖案化相位差膜配置於正交偏光地配置的上述第1偏光板及上述第2偏光板之間的狀態下,當經由上述第1偏光板而將檢查光照射至上述圖案化相位差膜時,經由上述第2偏光板而拍攝的正常的上述第1相位差區域及上述第2相位差區域的各亮度在消光狀態附近達到相同水準;攝影步驟,將上述圖案化相位差膜配置於上述偏光透射軸的方向經調整的上述第1偏光板及上述第2偏光板之間,經由上述第1偏光板而將上述檢查光照射至上述圖案化相位差膜,經由上述第2偏光板來拍攝上述圖案化相位差膜,取得亮度圖像;以及檢測步驟,基於已取得的上述亮度圖像來對上述缺陷進行檢測。 A method for detecting a defect of a patterned retardation film, which is a defect detecting method for detecting a defect of a patterned retardation film, wherein the plurality of optical axes are substantially orthogonal to each other in the patterned retardation film The phase difference region and the second phase difference region are alternately arranged side by side, and the first phase difference region and the second phase difference region function as a λ/4 wavelength plate, and the patterning retardation film defect detecting method The adjustment step includes an adjustment step of substantially paralleling one of the first retardation region and the second retardation region with respect to one of the first retardation region and the second retardation region of the first polarizing plate and the second polarizing plate. Adjust within the range so that In a state in which the patterned retardation film is disposed between the first polarizing plate and the second polarizing plate which are disposed orthogonally polarized, the inspection light is irradiated to the patterned phase via the first polarizing plate. In the case of a poor film, the luminances of the normal first phase difference region and the second phase difference region which are imaged by the second polarizing plate are at the same level in the vicinity of the extinction state, and the imaging step is to arrange the patterned retardation film. Between the first polarizing plate and the second polarizing plate adjusted in the direction of the polarization transmission axis, the inspection light is irradiated onto the patterned retardation film via the first polarizing plate, and the second polarizing plate is passed through the second polarizing plate. The patterned retardation film is captured to obtain a luminance image, and a detecting step is performed to detect the defect based on the acquired luminance image. 如申請專利範圍第17項所述之圖案化相位差膜的缺陷檢測方法,其中上述圖案化相位差膜是將相位差層積層於包含透明膜的支持體,藉此來形成上述第1相位差區域及上述第2相位差區域,於上述調整步驟及上述攝影步驟中,將消除上述支持體所具有的相位差特性的相位差補償板,配置於上述第1偏光板與上述圖案化相位差膜之間、或上述第2偏光板與上述圖案化相位差膜之間。 The method for detecting a defect of a patterned retardation film according to claim 17, wherein the patterned retardation film is formed by laminating a phase difference layer on a support including a transparent film, thereby forming the first phase difference. In the adjustment step and the imaging step, the phase difference compensation plate that eliminates the phase difference characteristic of the support is disposed in the region and the second phase difference region, and is disposed in the first polarizing plate and the patterned retardation film. Between or between the second polarizing plate and the patterned retardation film. 如申請專利範圍第18項所述之圖案化相位差膜的缺陷檢測方法,其中上述相位差補償板是與上述支持體相同的透明膜。 The method for detecting a defect of a patterned retardation film according to claim 18, wherein the phase difference compensation plate is the same transparent film as the support. 如申請專利範圍第19項所述之圖案化相位差膜的 缺陷檢測方法,包括消去步驟,上述消去步驟將與上述第1相位差區域及上述第2相位差區域的邊界相對應的上述亮度圖像內的邊界線消去,上述檢測步驟基於上述邊界線已被消去的上述亮度圖像,對上述缺陷進行檢測。 The patterned retardation film according to claim 19 of the patent application scope The defect detecting method includes an erasing step of erasing a boundary line in the luminance image corresponding to a boundary between the first phase difference region and the second phase difference region, and the detecting step is based on the boundary line The above-mentioned luminance image is erased to detect the above defect. 如申請專利範圍第20項所述之圖案化相位差膜的缺陷檢測方法,包括:二值化步驟,圖像處理部以規定的臨限值來對已拍攝的上述亮度圖像進行二值化,將各畫素設為上述臨限值以上的明畫素與低於上述臨限值的暗畫素;以及候補缺陷抽出步驟,將多個上述明畫素相連而成的區域設為候補缺陷區域,上述檢測步驟是在上述邊界線的排列方向上,對上述候補缺陷區域與鄰接的其他上述候補缺陷區域之間的畫素數進行計數,當計數出的畫素數為規定值以下時,將相關的上述候補缺陷區域設為上述缺陷。 The method for detecting a defect of a patterned retardation film according to claim 20, comprising: a binarization step of binarizing the captured luminance image with a predetermined threshold value; And each pixel is a bright pixel having a threshold value or more and a dark pixel lower than the threshold value; and a candidate defect extraction step, wherein a region in which the plurality of bright pixels are connected is a candidate defect In the region, the detecting step is to count the number of pixels between the candidate defect region and the adjacent candidate defect regions in the direction in which the boundary lines are arranged, and when the number of pixels counted is equal to or less than a predetermined value, The related candidate defect region is set as the above defect. 如申請專利範圍第20項所述之圖案化相位差膜的缺陷檢測方法,其中上述消去步驟包括:二值化步驟,以規定的臨限值來對已拍攝的上述亮度圖像進行二值化,將各畫素設為上述臨限值以上的明畫素與低於上述臨限值的暗畫素;以及收縮步驟,以與上述邊界線的寬度相對應的次數,對 已二值化的上述亮度圖像進行收縮處理,將上述邊界線消去,上述收縮處理是在上述邊界線的排列方向上使上述明畫素的區域收縮的處理。 The method for detecting a defect of a patterned retardation film according to claim 20, wherein the eliminating step includes a binarization step of binarizing the captured luminance image with a predetermined threshold value. And setting each pixel to a bright pixel above the threshold value and a dark pixel lower than the threshold value; and a shrinking step, the number of times corresponding to the width of the boundary line, The binarized luminance image is subjected to a contraction process to erase the boundary line, and the contraction process is a process of shrinking the region of the bright pixel in the direction in which the boundary lines are arranged. 如申請專利範圍第22項所述之圖案化相位差膜的缺陷檢測方法,其中上述消去步驟包括膨脹處理步驟,上述膨脹處理步驟對經上述收縮處理的上述亮度圖像進行膨脹處理,使上述收縮處理中所殘留的上述明畫素的區域恢復至上述收縮處理之前的尺寸,上述膨脹處理是在與上述收縮處理相同的方向上使上述明畫素的區域膨脹的處理,上述檢測步驟基於經上述膨脹處理的上述亮度圖像,對上述缺陷進行檢測。 The defect detecting method of the patterned retardation film according to claim 22, wherein the eliminating step includes an expansion processing step of expanding the brightness image subjected to the shrinking process to cause the shrinkage The region of the bright pixel remaining in the process is restored to the size before the shrinkage process, and the expansion process is a process of expanding the region of the bright pixel in the same direction as the shrinkage process, and the detecting step is based on the above The above-described luminance image of the expansion process is used to detect the above defect. 如申請專利範圍第20項所述之圖案化相位差膜的缺陷檢測方法,其中上述消去步驟包括:差分圖像產生步驟,對上述亮度圖像上的各畫素進行差分處理,藉此,產生已實質上將上述邊界線消去的差分圖像,上述差分處理是針對上述亮度圖像上的畫素,將至少在上述邊界線的排列方向上與相關畫素僅相隔與上述邊界線間隔相對應的畫素數的畫素作為對方畫素,將自上述相關畫素的亮度減去上述對方畫素的亮度所得的值設為上述相關畫素的新的值;以及二值化步驟,以規定的臨限值來對上述差分圖像進行二值化,將各畫素設為上述臨限值以上的明畫素與低於上 述臨限值的暗畫素。 The method for detecting a defect of a patterned retardation film according to claim 20, wherein the eliminating step includes: a difference image generating step of performing differential processing on each pixel on the luminance image, thereby generating a difference image obtained by substantially eliminating the boundary line, wherein the difference processing is for a pixel on the luminance image, and at least in the arrangement direction of the boundary line is separated from the correlation pixel by only the boundary line interval The pixel of the prime number is used as the counterpart pixel, and the value obtained by subtracting the brightness of the above-mentioned pixel from the brightness of the above-mentioned pixel is set to a new value of the related pixel; and the binarization step is specified The threshold value is used to binarize the difference image, and each pixel is set to be above the threshold value and lower than the upper limit. A dark pixel that describes the threshold. 如申請專利範圍第24項所述之圖案化相位差膜的缺陷檢測方法,其中上述差分圖像產生步驟在上述亮度圖像上的互不相同的方向的上述對方畫素之間進行上述差分處理,藉此,分別產生各個方向的上述差分圖像,上述二值化步驟以規定的上述臨限值,分別對多個上述差分圖像進行二值化,產生多個二值化圖像,上述檢測步驟對多個上述二值化圖像進行缺陷檢測。 The method of detecting a defect of a patterned retardation film according to claim 24, wherein the difference image generating step performs the differential processing between the opposite pixels in mutually different directions on the luminance image. Thereby, each of the difference images in each direction is generated, and the binarization step binarizes the plurality of difference images by a predetermined threshold value to generate a plurality of binarized images. The detecting step performs defect detection on a plurality of the above-described binarized images. 一種圖案化相位差膜的缺陷檢查方法,其是對圖案化相位差膜的缺陷進行檢測的缺陷檢測方法,於上述圖案化相位差膜中,多個光學軸彼此大致正交的條狀的第1相位差區域及第2相位差區域交替地並排地排列,且上述第1相位差區域及上述第2相位差區域作為λ/4波長板而發揮功能,上述圖案化相位差膜的缺陷檢查方法的特徵在於包括:照明步驟,以隔著上述圖案化相位差膜的方式而配置第1偏光板及第2偏光板,藉由照明光源,經由上述第1偏光板而將照明光照射至上述圖案化相位差膜;攝影步驟,將上述λ/4波長板配置於上述圖案化相位差膜與上述第2偏光板之間,設定為第1狀態與第2狀態,藉由攝影裝置,經由上述λ/4波長板及上述第2偏光板,在上述第1狀態下進行拍攝而取得第1圖像,在上述第2狀態下進行拍攝而取得第2圖像,上述第1狀態是在使上 述第1偏光板的透射軸相對於上述圖案化相位差膜的光學軸傾斜45°的狀態下,使上述第2偏光板的透射軸相對於上述λ/4波長板的光學軸達到+45度,上述第2狀態是使上述第2偏光板的透射軸相對於上述λ/4波長板的光學軸達到-45度;圖像合成步驟,使上述第1圖像與上述第2圖像的上述第1相位差區域及上述第2相位差區域一致而重合,製成合成圖像;以及檢測步驟,基於上述合成圖像來對上述缺陷進行檢測。 A defect inspection method for patterning a retardation film, which is a defect detection method for detecting a defect of a patterned retardation film, wherein the plurality of optical axes are substantially orthogonal to each other in the patterned retardation film The phase difference region and the second phase difference region are alternately arranged side by side, and the first phase difference region and the second phase difference region function as a λ/4 wavelength plate, and the patterned retardation film defect inspection method The illumination step includes arranging the first polarizing plate and the second polarizing plate so as to interpose the retardation film, and irradiating the illumination light to the pattern via the first polarizing plate by the illumination light source. In the imaging step, the λ/4 wavelength plate is disposed between the patterned retardation film and the second polarizing plate, and is set to the first state and the second state, and is passed through the λ by the imaging device. The fourth wavelength plate and the second polarizing plate are imaged in the first state to obtain a first image, and the second image is captured in the second state, and the first image is obtained. The transmission axis of the first polarizing plate is inclined by 45° with respect to the optical axis of the patterned retardation film, and the transmission axis of the second polarizing plate is increased by +45 degrees with respect to the optical axis of the λ/4 wavelength plate. The second state is such that the transmission axis of the second polarizing plate reaches -45 degrees with respect to the optical axis of the λ/4 wavelength plate; and the image combining step causes the first image and the second image to be The first phase difference region and the second phase difference region are coincident with each other to form a composite image, and a detecting step of detecting the defect based on the composite image. 如申請專利範圍第26項所述之圖案化相位差膜的缺陷檢查方法,其中上述合成圖像步驟改變與上述第1相位差區域及上述第2相位差區域的邊界線正交的方向上的上述第1圖像與上述第2圖像的相對位置,使上述第1圖像與上述第2圖像重合,在使重合之後的上述合成圖像的平均亮度為最小的上述相對位置,製成上述合成圖像。 The defect inspection method of the patterned retardation film according to Item 26, wherein the synthetic image step is changed in a direction orthogonal to a boundary line between the first phase difference region and the second phase difference region. The relative position between the first image and the second image is such that the first image and the second image are superimposed, and the relative position of the composite image after the overlap is minimized. The above composite image. 如申請專利範圍第27項所述之圖案化相位差膜的缺陷檢查方法,其中上述攝影步驟使相對於上述第1圖像與上述第2圖像中的上述第1相位差區域及上述第2相位差區域的明部亮度,達到圖像合成部的動態範圍與上述攝影裝置的動態範圍中的範圍較狹窄的動態範圍的大致一半的亮度,接著進行拍攝。 The defect inspection method of the patterned retardation film according to claim 27, wherein the photographing step makes the first phase difference region and the second portion in the first image and the second image The brightness of the bright portion of the phase difference region is equal to the brightness of the dynamic range of the image combining unit and approximately half of the dynamic range of the narrow range of the dynamic range of the imaging device, and then the image is captured. 如申請專利範圍第28項所述之圖案化相位差膜的 缺陷檢查方法,其中上述圖像合成步驟針對上述第1圖像與上述第2圖像而產生二值化信號,使一個二值化信號的明暗反轉而設為反轉二值信號,取得上述反轉二值信號與另一個二值化信號的互斥或。 The patterned retardation film according to claim 28 of the patent application scope In the defect inspection method, the image synthesizing step generates a binarized signal for the first image and the second image, and inverts the brightness of one binarized signal to obtain an inverted binary signal. Reverse the exclusive OR of the binary signal and another binary signal. 如申請專利範圍第29項所述之圖案化相位差膜的缺陷檢查方法,其中上述圖像合成步驟將二值化合成圖像中,基於上述第1相位差區域及上述第2相位差區域的邊界的圖案邊界部消去。 The defect inspection method of the patterned retardation film according to claim 29, wherein the image synthesis step is based on the first phase difference region and the second phase difference region in the binarized composite image The boundary portion of the boundary of the border is eliminated. 如申請專利範圍第30項所述之圖案化相位差膜的缺陷檢查方法,其中上述圖像合成步驟將包含上述第1相位差區域及上述第2相位差區域的邊界寬度的畫素區域作為雜訊而進行縮小處理,將上述圖案邊界部消去。 The defect inspection method of the patterned retardation film according to claim 30, wherein the image synthesis step uses a pixel region including a boundary width of the first phase difference region and the second phase difference region as a impurity The reduction process is performed to eliminate the boundary portion of the pattern. 如申請專利範圍第26項至第31項中任一項所述之圖案化相位差膜的缺陷檢查方法,其中上述圖案化相位差膜是在與上述第1相位差區域及上述第2相位差區域的排列方向正交的方向上搬送的網狀物,上述攝影裝置包括:取得上述第1圖像的第1攝影裝置本體、與取得上述第2圖像的第2攝影裝置本體,且與上述網狀物的搬送同步地拍攝上述網狀物。 The defect inspection method of the patterned retardation film according to any one of claims 26 to 31, wherein the patterned retardation film is different from the first phase difference region and the second phase difference a mesh that is transported in a direction in which the arrangement direction of the regions is orthogonal to the image capturing device includes: a first imaging device main body that acquires the first image; and a second imaging device main body that acquires the second image, and the above The mesh is conveyed in synchronization with the mesh. 一種圖案化相位差膜的製造方法,其特徵在於包 括:製造步驟,製造圖案化相位差膜,於上述圖案化相位差膜中,多個光學軸彼此大致正交的條狀的第1相位差區域及第2相位差區域交替地並排地排列,且上述第1相位差區域及上述第2相位差區域作為λ/4波長板而發揮功能;取得步驟,將上述圖案化相位差膜配置於偏光透射軸的方向經調整的第1偏光板及第2偏光板之間,經由上述第1偏光板而將檢查光照射至上述圖案化相位差膜,經由上述第2偏光板而拍攝上述圖案化相位差膜,取得亮度圖像;檢測步驟,基於已取得的上述亮度圖像,對缺陷進行檢測;以及調整步驟,在上述取得步驟之前實施,且在使上述第1偏光板及上述第2偏光板的任一個偏光透射軸的方向與上述第1相位差區域及上述第2相位差區域的任一個光學軸大致呈平行的範圍內進行調整,使得在將上述圖案化相位差膜配置於上述第1偏光板及上述第2偏光板之間的狀態下,當經由上述第1偏光板而將上述檢查光照射至上述圖案化相位差膜時,經由上述第2偏光板而拍攝的正常的上述第1相位差區域及上述第2相位差區域的各亮度在消光狀態附近達到相同水準。 A method for manufacturing a patterned retardation film, characterized by In the manufacturing step, the patterned retardation film is formed, and the stripe first phase difference region and the second phase difference region in which the plurality of optical axes are substantially orthogonal to each other are alternately arranged side by side in the patterned retardation film. The first phase difference region and the second phase difference region function as a λ/4 wavelength plate, and the obtaining step is to adjust the first polarizing plate and the first polarizing plate in which the patterned retardation film is disposed in the direction of the polarization transmission axis. 2 between the polarizing plates, the inspection light is irradiated onto the patterned retardation film via the first polarizing plate, and the patterned retardation film is imaged through the second polarizing plate to obtain a luminance image; and the detecting step is based on The acquired luminance image detects the defect; and the adjusting step is performed before the obtaining step, and the direction of the polarization transmission axis of the first polarizing plate and the second polarizing plate is made to be the first phase The difference between the difference region and the optical phase of the second phase difference region is substantially parallel, and the patterned retardation film is disposed on the first polarizing plate and In the state between the second polarizing plates, when the inspection light is irradiated onto the patterned retardation film via the first polarizing plate, the normal first phase difference region imaged by the second polarizing plate and Each of the luminances in the second phase difference region reaches the same level in the vicinity of the extinction state. 一種圖案化相位差膜的製造方法,其特徵在於包括:製造步驟,製造圖案化相位差膜,於上述圖案化相位 差膜中,多個光學軸彼此正交的各個帶狀的第1相位差區域及第2相位差區域交替地並排地排列;照明步驟,以隔著上述圖案化相位差膜的方式而配置第1偏光板及第2偏光板,藉由照明光源,經由上述第1偏光板而將照明光照射至上述圖案化相位差膜;攝影步驟,將λ/4波長板配置於上述圖案化相位差膜與上述第2偏光板之間,設定為第1狀態與第2狀態,藉由攝影裝置,經由上述λ/4波長板及上述第2偏光板,在上述第1狀態下進行拍攝而取得第1圖像,在上述第2狀態下進行拍攝而取得第2圖像,上述第1狀態是在使上述第1偏光板的透射軸相對於上述圖案化相位差膜的光學軸傾斜45°的狀態下,使上述第2偏光板的透射軸相對於上述λ/4波長板的光學軸達到+45度,上述第2狀態是使上述第2偏光板的透射軸相對於上述λ/4波長板的光學軸達到-45度;圖像合成步驟,使上述第1圖像與上述第2圖像的上述第1相位差區域及上述第2相位差區域一致而重合,製成合成圖像;以及檢測步驟,基於上述合成圖像來對上述缺陷進行檢測。 A method of manufacturing a patterned retardation film, comprising: a manufacturing step of fabricating a patterned retardation film at the patterned phase In the differential film, the strip-shaped first phase difference regions and the second phase difference regions in which the plurality of optical axes are orthogonal to each other are alternately arranged side by side, and the illumination step is arranged such that the patterned retardation film is interposed therebetween. a polarizing plate and a second polarizing plate, wherein illumination light is applied to the patterned retardation film via the first polarizing plate by an illumination light source; and a λ/4 wavelength plate is disposed on the patterned retardation film by an imaging step The first state and the second state are set between the first polarizing plate and the second polarizing plate, and the first illuminating plate and the second polarizing plate are imaged by the imaging device in the first state to obtain the first state. The image is captured in the second state to obtain a second image, and the first state is a state in which the transmission axis of the first polarizing plate is inclined by 45° with respect to the optical axis of the patterned retardation film. The transmission axis of the second polarizing plate is +45 degrees with respect to the optical axis of the λ/4 wavelength plate, and the second state is optical for transmitting the transmission axis of the second polarizing plate with respect to the λ/4 wavelength plate. The axis reaches -45 degrees; the image synthesis step makes the above Consistent with an image of the first retardation region in the second image and the second retardation region overlap, a synthetic image; and a detection step to detect the above-mentioned defects based on the synthesized image.
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KR101294220B1 (en) * 2011-11-21 2013-08-07 동우 화인켐 주식회사 Apparatus for acquiring image of patterned retarder
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JP7348799B2 (en) * 2018-10-15 2023-09-21 日東電工株式会社 Manufacturing method of polarizing plate with retardation layer
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