TWI532577B - 模具用鋼材之硏磨性評估方法以及模具之硏磨性的評估方法 - Google Patents
模具用鋼材之硏磨性評估方法以及模具之硏磨性的評估方法 Download PDFInfo
- Publication number
- TWI532577B TWI532577B TW102110941A TW102110941A TWI532577B TW I532577 B TWI532577 B TW I532577B TW 102110941 A TW102110941 A TW 102110941A TW 102110941 A TW102110941 A TW 102110941A TW I532577 B TWI532577 B TW I532577B
- Authority
- TW
- Taiwan
- Prior art keywords
- mold
- waviness
- value
- steel
- evaluating
- Prior art date
Links
- 229910000831 Steel Inorganic materials 0.000 title claims description 97
- 239000010959 steel Substances 0.000 title claims description 97
- 239000000463 material Substances 0.000 title claims description 44
- 238000000034 method Methods 0.000 title claims description 36
- 239000006061 abrasive grain Substances 0.000 claims description 40
- 239000002245 particle Substances 0.000 claims description 39
- 238000005498 polishing Methods 0.000 claims description 29
- 238000007517 polishing process Methods 0.000 claims description 15
- 238000012545 processing Methods 0.000 claims description 11
- 238000005259 measurement Methods 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229910003460 diamond Inorganic materials 0.000 description 14
- 239000010432 diamond Substances 0.000 description 14
- 238000011156 evaluation Methods 0.000 description 10
- 230000003746 surface roughness Effects 0.000 description 10
- 230000000875 corresponding effect Effects 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000010998 test method Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 239000002436 steel type Substances 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000010137 moulding (plastic) Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/30—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring roughness or irregularity of surfaces
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3043—Making grooves, e.g. cutting
Landscapes
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- A Measuring Device Byusing Mechanical Method (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Investigating And Analyzing Materials By Characteristic Methods (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Metal Extraction Processes (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012073094 | 2012-03-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201350299A TW201350299A (zh) | 2013-12-16 |
TWI532577B true TWI532577B (zh) | 2016-05-11 |
Family
ID=49366141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102110941A TWI532577B (zh) | 2012-03-28 | 2013-03-27 | 模具用鋼材之硏磨性評估方法以及模具之硏磨性的評估方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6086311B2 (ja) |
KR (1) | KR101397291B1 (ja) |
CN (1) | CN103364295B (ja) |
TW (1) | TWI532577B (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6235877B2 (ja) * | 2013-11-21 | 2017-11-22 | 矢崎総業株式会社 | 金属調加飾部品 |
DE102018110909A1 (de) | 2017-12-22 | 2018-06-21 | Schott Ag | Abdeckplatte mit farbneutraler Beschichtung |
DE202018102534U1 (de) | 2017-12-22 | 2018-05-15 | Schott Ag | Transparente, eingefärbte Lithiumaluminiumsilikat-Glaskeramik |
DE102018110897A1 (de) | 2017-12-22 | 2018-06-21 | Schott Ag | Einrichtungs- und Ausstattungsgegenstände für Küchen oder Labore mit Anzeigeeinrichtung |
DE102018110910A1 (de) | 2017-12-22 | 2018-06-21 | Schott Ag | Einrichtungs- und Ausstattungsgegenstände für Küchen oder Labore mit Leuchtelement |
DE102018110855A1 (de) | 2017-12-22 | 2018-06-28 | Schott Ag | Glaskeramik mit reduziertem Lithium-Gehalt |
TWI744991B (zh) * | 2020-07-20 | 2021-11-01 | 中國鋼鐵股份有限公司 | 成形後鋼材表面之粗化巨觀缺陷的評估方法 |
CN114034592A (zh) * | 2021-10-28 | 2022-02-11 | 青岛雨荣研磨材料有限公司 | 一种磨料磨耗及破碎性能检测分析方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08159751A (ja) * | 1994-12-08 | 1996-06-21 | Nippon Sheet Glass Co Ltd | ガラス板表面評価方法 |
JPH10103948A (ja) * | 1996-09-30 | 1998-04-24 | Tokyo Seimitsu Co Ltd | 表面粗さ形状測定機の測定条件設定方法及びその装置 |
JP3241615B2 (ja) * | 1996-11-01 | 2001-12-25 | 株式会社東京精密 | 表面粗さ形状測定機の測定条件自動設定方法及びその装置 |
JP3525432B2 (ja) * | 2000-09-29 | 2004-05-10 | 株式会社東京精密 | 粗さ測定方法及び粗さ測定装置 |
CN100537669C (zh) * | 2003-08-26 | 2009-09-09 | 三菱丽阳株式会社 | 光反射体用热塑性树脂组合物、光反射体用成形品、光发射体及光反射体用成形品的制造方法 |
JP5095141B2 (ja) * | 2006-07-05 | 2012-12-12 | 日本ミクロコーティング株式会社 | テープ状金属基材の表面研磨システム及び研磨方法 |
CN101352818A (zh) * | 2007-07-23 | 2009-01-28 | 江苏海迅实业集团股份有限公司 | 一种金属工件表面抛光降低粗糙度方法 |
JP2010214547A (ja) | 2009-03-17 | 2010-09-30 | Nihon Micro Coating Co Ltd | 研磨シート及びその製造方法 |
JP2010214576A (ja) | 2009-03-19 | 2010-09-30 | Konica Minolta Opto Inc | 研磨方法、光学素子の製造方法および金型の再加工方法 |
JP5385653B2 (ja) | 2009-03-25 | 2014-01-08 | 株式会社アドマテックス | 研磨用パッド及び研磨方法 |
CN105070657B (zh) * | 2009-08-19 | 2018-03-30 | 日立化成株式会社 | Cmp研磨液及其应用、研磨方法 |
JP5717593B2 (ja) * | 2011-08-31 | 2015-05-13 | 住友ゴム工業株式会社 | プレフィルドシリンジ用ガスケットの成型金型 |
-
2013
- 2013-02-20 JP JP2013030809A patent/JP6086311B2/ja active Active
- 2013-03-27 TW TW102110941A patent/TWI532577B/zh active
- 2013-03-27 KR KR1020130032784A patent/KR101397291B1/ko active IP Right Grant
- 2013-03-28 CN CN201310105490.7A patent/CN103364295B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN103364295B (zh) | 2015-07-15 |
CN103364295A (zh) | 2013-10-23 |
KR20130110095A (ko) | 2013-10-08 |
KR101397291B1 (ko) | 2014-05-20 |
TW201350299A (zh) | 2013-12-16 |
JP2013228369A (ja) | 2013-11-07 |
JP6086311B2 (ja) | 2017-03-01 |
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