TWI532577B - 模具用鋼材之硏磨性評估方法以及模具之硏磨性的評估方法 - Google Patents

模具用鋼材之硏磨性評估方法以及模具之硏磨性的評估方法 Download PDF

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Publication number
TWI532577B
TWI532577B TW102110941A TW102110941A TWI532577B TW I532577 B TWI532577 B TW I532577B TW 102110941 A TW102110941 A TW 102110941A TW 102110941 A TW102110941 A TW 102110941A TW I532577 B TWI532577 B TW I532577B
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TW
Taiwan
Prior art keywords
mold
waviness
value
steel
evaluating
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TW102110941A
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English (en)
Chinese (zh)
Other versions
TW201350299A (zh
Inventor
菅野隆一朗
長澤政幸
岸川円
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日立金屬股份有限公司
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Publication of TW201350299A publication Critical patent/TW201350299A/zh
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Publication of TWI532577B publication Critical patent/TWI532577B/zh

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/30Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring roughness or irregularity of surfaces
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • H01L21/3043Making grooves, e.g. cutting

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  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Organic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • A Measuring Device Byusing Mechanical Method (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Investigating And Analyzing Materials By Characteristic Methods (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Metal Extraction Processes (AREA)
TW102110941A 2012-03-28 2013-03-27 模具用鋼材之硏磨性評估方法以及模具之硏磨性的評估方法 TWI532577B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012073094 2012-03-28

Publications (2)

Publication Number Publication Date
TW201350299A TW201350299A (zh) 2013-12-16
TWI532577B true TWI532577B (zh) 2016-05-11

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Family Applications (1)

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TW102110941A TWI532577B (zh) 2012-03-28 2013-03-27 模具用鋼材之硏磨性評估方法以及模具之硏磨性的評估方法

Country Status (4)

Country Link
JP (1) JP6086311B2 (ja)
KR (1) KR101397291B1 (ja)
CN (1) CN103364295B (ja)
TW (1) TWI532577B (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6235877B2 (ja) * 2013-11-21 2017-11-22 矢崎総業株式会社 金属調加飾部品
DE102018110909A1 (de) 2017-12-22 2018-06-21 Schott Ag Abdeckplatte mit farbneutraler Beschichtung
DE202018102534U1 (de) 2017-12-22 2018-05-15 Schott Ag Transparente, eingefärbte Lithiumaluminiumsilikat-Glaskeramik
DE102018110897A1 (de) 2017-12-22 2018-06-21 Schott Ag Einrichtungs- und Ausstattungsgegenstände für Küchen oder Labore mit Anzeigeeinrichtung
DE102018110910A1 (de) 2017-12-22 2018-06-21 Schott Ag Einrichtungs- und Ausstattungsgegenstände für Küchen oder Labore mit Leuchtelement
DE102018110855A1 (de) 2017-12-22 2018-06-28 Schott Ag Glaskeramik mit reduziertem Lithium-Gehalt
TWI744991B (zh) * 2020-07-20 2021-11-01 中國鋼鐵股份有限公司 成形後鋼材表面之粗化巨觀缺陷的評估方法
CN114034592A (zh) * 2021-10-28 2022-02-11 青岛雨荣研磨材料有限公司 一种磨料磨耗及破碎性能检测分析方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08159751A (ja) * 1994-12-08 1996-06-21 Nippon Sheet Glass Co Ltd ガラス板表面評価方法
JPH10103948A (ja) * 1996-09-30 1998-04-24 Tokyo Seimitsu Co Ltd 表面粗さ形状測定機の測定条件設定方法及びその装置
JP3241615B2 (ja) * 1996-11-01 2001-12-25 株式会社東京精密 表面粗さ形状測定機の測定条件自動設定方法及びその装置
JP3525432B2 (ja) * 2000-09-29 2004-05-10 株式会社東京精密 粗さ測定方法及び粗さ測定装置
CN100537669C (zh) * 2003-08-26 2009-09-09 三菱丽阳株式会社 光反射体用热塑性树脂组合物、光反射体用成形品、光发射体及光反射体用成形品的制造方法
JP5095141B2 (ja) * 2006-07-05 2012-12-12 日本ミクロコーティング株式会社 テープ状金属基材の表面研磨システム及び研磨方法
CN101352818A (zh) * 2007-07-23 2009-01-28 江苏海迅实业集团股份有限公司 一种金属工件表面抛光降低粗糙度方法
JP2010214547A (ja) 2009-03-17 2010-09-30 Nihon Micro Coating Co Ltd 研磨シート及びその製造方法
JP2010214576A (ja) 2009-03-19 2010-09-30 Konica Minolta Opto Inc 研磨方法、光学素子の製造方法および金型の再加工方法
JP5385653B2 (ja) 2009-03-25 2014-01-08 株式会社アドマテックス 研磨用パッド及び研磨方法
CN105070657B (zh) * 2009-08-19 2018-03-30 日立化成株式会社 Cmp研磨液及其应用、研磨方法
JP5717593B2 (ja) * 2011-08-31 2015-05-13 住友ゴム工業株式会社 プレフィルドシリンジ用ガスケットの成型金型

Also Published As

Publication number Publication date
CN103364295B (zh) 2015-07-15
CN103364295A (zh) 2013-10-23
KR20130110095A (ko) 2013-10-08
KR101397291B1 (ko) 2014-05-20
TW201350299A (zh) 2013-12-16
JP2013228369A (ja) 2013-11-07
JP6086311B2 (ja) 2017-03-01

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