TWI529225B - A conductive fine particle dispersion liquid, a photohardenable composition containing conductive microparticles, and a hardening film containing conductive microparticles - Google Patents

A conductive fine particle dispersion liquid, a photohardenable composition containing conductive microparticles, and a hardening film containing conductive microparticles Download PDF

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TWI529225B
TWI529225B TW099131643A TW99131643A TWI529225B TW I529225 B TWI529225 B TW I529225B TW 099131643 A TW099131643 A TW 099131643A TW 99131643 A TW99131643 A TW 99131643A TW I529225 B TWI529225 B TW I529225B
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fine particles
conductive fine
parts
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mass
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TW201124490A (en
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Masato Murouchi
Kenji Hayashi
Kaoru Suzuki
Daigou Mizoguchi
Masaaki Murakami
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Dainippon Toryo Kk
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material

Description

導電性微粒子分散液、含導電性微粒子之光硬化性組成物、及含導電性微粒子之硬化膜Conductive fine particle dispersion, photocurable composition containing conductive fine particles, and cured film containing conductive fine particles

本發明係有關一種保存安定性優異的導電性微粒子分散液、含導電性微粒子之光硬化性組成物及由該組成物所得的含導電性微粒子之硬化膜,更詳言之,係有關在塑膠、金屬、木材、紙、玻璃、石板等之各種基材表面上形成透明性優異且具有抗靜電機能之含導電性微粒子之硬化膜所得的光硬化性組成物、由該組成物所得的透明性優異且具有抗靜電機能之硬化膜,及調製該光硬化性組成物時所使用的保存安定性優異的導電性微粒子分散液。The present invention relates to a conductive fine particle dispersion liquid excellent in stability, a photocurable composition containing conductive fine particles, and a cured film containing conductive fine particles obtained from the composition, and more specifically, related to plastics. And a photocurable composition obtained by forming a cured film containing conductive fine particles having excellent transparency and having an antistatic function on the surface of various substrates such as metal, wood, paper, glass, slate, etc., and transparency obtained from the composition A cured film having excellent antistatic properties and a conductive fine particle dispersion excellent in storage stability used for preparing the photocurable composition.

近年來,為防止各種基材之表面刮傷(擦傷)或防止污染時之保護塗佈材料、或印刷油墨之接著材料,要求具有優異的塗佈性,且可在各種基材表面上形成硬度、耐擦傷性、耐摩擦性、低翹曲性、密接性、透明性、耐藥品性、塗膜面之外觀等優異的硬化膜之硬化性組成物。In recent years, in order to prevent the surface of various substrates from being scratched (scratched) or to prevent contamination, the coating material or the printing ink is required to have excellent coating properties and to form hardness on various substrate surfaces. A curable composition of a cured film excellent in scratch resistance, abrasion resistance, low warpage, adhesion, transparency, chemical resistance, and appearance of a coating film surface.

另外,使用於平坦面板顯示裝置、觸控板、塑膠光學零件等之用途時,除上述要求外,更為要求可形成透明性優異且具有抗靜電機能之透明導電膜等硬化膜的硬化性組成物。In addition, when used in applications such as flat panel display devices, touch panels, and plastic optical components, in addition to the above requirements, it is required to form a hardenable film of a cured film such as a transparent conductive film having excellent transparency and antistatic function. Things.

此外,於液晶顯示裝置、陰極管顯示裝置等之影像顯示裝置及光學製品中,係使用防止反射膜(硬化膜)。該防止反射膜除具有高透明性及低反射率之特性外,被要求具有耐擦傷性及防止灰塵或垃圾等異物附著的機能。因此,防止反射膜之高折射率層,除高透明性及高折射率特性外,被要求具有優異的耐擦傷性及抗靜電特性。Further, in an image display device such as a liquid crystal display device or a cathode tube display device, and an optical product, an antireflection film (cured film) is used. In addition to the characteristics of high transparency and low reflectance, the antireflection film is required to have scratch resistance and prevent adhesion of foreign matter such as dust or garbage. Therefore, the high refractive index layer of the antireflection film is required to have excellent scratch resistance and antistatic properties in addition to high transparency and high refractive index characteristics.

其次,賦予該硬化膜具有抗靜電機能之方法,已知有在硬化性組成物中添加界面活性劑、導電性聚合物或主要由金屬氧化物所形成的導電性微粒子等之方法,特別是考慮製作具有永久抗靜電效果之膜為目的時,一般而言使用添加導電性微粒子的方法。該添加導電性微粒子之方法,係在樹脂溶液或溶劑中配合螯合劑,且在該配合物中分散無機氧化物的方法(例如參照專利文獻1及2)。Next, a method of imparting an antistatic function to the cured film is known, and a method of adding a surfactant, a conductive polymer, or a conductive fine particle mainly composed of a metal oxide to the curable composition is known, and in particular, For the purpose of producing a film having a permanent antistatic effect, a method of adding conductive fine particles is generally used. The method of adding the conductive fine particles is a method in which a chelating agent is blended in a resin solution or a solvent, and an inorganic oxide is dispersed in the complex (see, for example, Patent Documents 1 and 2).

[習知技術文獻][Practical Technical Literature]

[專利文獻][Patent Literature]

[專利文獻1]日本特開2001-139,847號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2001-139,847

[專利文獻2]日本特開2001-139,889號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2001-139,889

有關上述用途所使用的導電性微粒子分散液及其硬化性組成物,被要求導電性微粒子之粒徑小且分散液之保存安定性優異。上述專利文獻1及2中記載的螯合劑,由於與金屬形成金屬螯合物,會有在分散處理過程中被使用的金屬製機器或塗佈機材被腐蝕的問題。The conductive fine particle dispersion liquid and the curable composition used for the above-described use are required to have a small particle diameter of the conductive fine particles and excellent storage stability of the dispersion liquid. In the chelating agents described in Patent Documents 1 and 2, since a metal chelate compound is formed with a metal, there is a problem that a metal machine or a coating machine used during the dispersion treatment is corroded.

本發明係有鑑於上述間題者,以提供(1)可在基材表面上形成透明性優異且同時具有抗靜電機能之硬化膜,在分散處理過程中使用的金屬製機器或塗佈機材不會被腐蝕的含導電性微粒子之光硬化性組成物,(2)由該含導電性微粒子之光硬化性組成物所得的透明導電膜等之各種硬化膜,(3)具有由該含導電性微粒子之光硬化性組成物所得的硬化膜之顯示裝置,以及(4)調製該含導電性微粒子之光硬化性組成物時所使用的保存安定性優異的導電性微粒子分散液為目的。The present invention has been made in view of the above problems to provide (1) a cured film which is excellent in transparency and has an antistatic function on the surface of the substrate, and the metal machine or the coating machine used in the dispersion process is not (2) various cured films such as a transparent conductive film obtained from the photocurable composition containing conductive fine particles, and (3) having such a conductive property, a photocurable composition containing conductive fine particles which is corroded, (2) a transparent conductive film obtained from the photocurable composition containing conductive fine particles The display device of the cured film obtained by the photocurable composition of the microparticles, and (4) the conductive fine particle dispersion liquid excellent in storage stability used when preparing the photocurable composition containing the conductive fine particles.

本發明人等為達成上述各種目的時,再三深入研究檢討的結果,發現藉由在分散媒中分散導電性微粒子及金屬錯合物,可得保存安定性優異的導電性微粒子分散液,此外,發現藉由使用該導電性微粒子分散液,可得在分散處理過程中不會有金屬製機器或塗佈機材被腐蝕的含導電性微粒子之光硬化性組成物,遂而完成本發明。In order to achieve the above various objectives, the inventors of the present invention have further studied the results of the review, and found that by dispersing the conductive fine particles and the metal complex in the dispersion medium, it is possible to obtain a conductive fine particle dispersion having excellent stability. It has been found that by using the conductive fine particle dispersion liquid, a photocurable composition containing conductive fine particles which is not corroded by a metal machine or a coating material during the dispersion treatment can be obtained, and the present invention has been completed.

換言之,本發明之導電性微粒子分散液,其特徵為由導電性微粒子、金屬錯合物及分散媒所成,較佳者每100質量份之導電性微粒子中,金屬錯合物之含量為2~45質量份,分散媒之含量為40~1000質量份。In other words, the conductive fine particle dispersion of the present invention is characterized by being composed of conductive fine particles, a metal complex, and a dispersion medium. Preferably, the content of the metal complex is 2 per 100 parts by mass of the conductive fine particles. ~45 parts by mass, the content of the dispersion medium is 40 to 1000 parts by mass.

另外,於本發明中,除透明導電特性外,尚企求高折射率特性,該導電性微粒子分散液,其特徵為由折射率為1.8以上之高折射率微粒子、導電性微粒子、不含烷氧化物之金屬錯合物及分散媒所成,水分為3質量%以下,較佳者每100質量份高折射率微粒子中,導電性微粒子之含量為30~900質量份,金屬錯合物之含量為3~450質量份及分散媒之含量為60~9000質量份。Further, in the present invention, in addition to the transparent conductive property, high refractive index characteristics are required, and the conductive fine particle dispersion is characterized by high refractive index fine particles having a refractive index of 1.8 or more, conductive fine particles, and no alkoxylation. The metal complex and the dispersion medium are formed, and the water content is 3% by mass or less. Preferably, the content of the conductive fine particles is from 30 to 900 parts by mass, and the content of the metal complex is contained per 100 parts by mass of the high refractive index fine particles. The content is from 3 to 450 parts by mass and the dispersion medium is from 60 to 9000 parts by mass.

其次,本發明之含導電性微粒子之光硬化性組成物,其特徵為由導電性微粒子、金屬錯合物、活性能量線硬化性化合物、光聚合引發劑及分散媒所成,較佳者每100質量份導電性微粒子中,金屬錯合物之含量為2~45質量份,分散媒之含量為40~1000質量份,活性能量線硬化性化合物之含有量為10~1000質量份,且每100質量份活性能量線硬化性化合物中,光聚合引發劑之含量為0.1~20質量份。Next, the photocurable composition containing conductive fine particles of the present invention is characterized by being composed of conductive fine particles, a metal complex, an active energy ray-curable compound, a photopolymerization initiator, and a dispersion medium, preferably each The content of the metal complex in 100 parts by mass of the conductive fine particles is 2 to 45 parts by mass, the content of the dispersion medium is 40 to 1000 parts by mass, and the content of the active energy ray-curable compound is 10 to 1000 parts by mass, and each In 100 parts by mass of the active energy ray-curable compound, the content of the photopolymerization initiator is from 0.1 to 20 parts by mass.

而且,於本發明中被要求高折射率特性之透明導電膜形成用之含導電性微粒子的光硬化性組成物,其特徵為由折射率為1.8以上之高折射率微粒子、導電性微粒子、不含烷氧化物之金屬錯合物、活性能量線硬化性化合物、光聚合引發劑及分散媒所成,水分為3質量%以下,較佳者每100質量份高折射率微粒子中,導電性微粒子之含量為30~900質量份,金屬錯合物之含量為3~450質量份,分散媒之含量為60~70000質量份及活性能量線硬化性化合物之含量為14~10000質量份,且每100質量份該活性能量線硬化性化合物中,光聚合引發劑之含量為0.1~20質量份。Further, in the present invention, a photocurable composition containing conductive fine particles for forming a transparent conductive film having high refractive index characteristics is characterized by high refractive index fine particles having a refractive index of 1.8 or more, conductive fine particles, and no a metal oxide containing an alkoxide, an active energy ray-curable compound, a photopolymerization initiator, and a dispersion medium, and having a water content of 3% by mass or less, preferably 100 parts by mass of the high refractive index fine particles, and conductive fine particles The content is 30 to 900 parts by mass, the content of the metal complex is 3 to 450 parts by mass, the content of the dispersion medium is 60 to 70,000 parts by mass, and the content of the active energy ray-curable compound is 14 to 10,000 parts by mass, and each In 100 parts by mass of the active energy ray-curable compound, the content of the photopolymerization initiator is from 0.1 to 20 parts by mass.

此外,本發明之含導電性微粒子之硬化膜,其特徵為在基材上塗佈或印刷上述之含導電性微粒子之光硬化性組成物,予以硬化所得者,較佳者折射率為1.45~1.90,光透過率為75%以上,霾度為2.0%以下,且表面電阻值為1012Ω/□以下。Further, the cured film containing conductive fine particles of the present invention is characterized in that the photocurable composition containing the above-mentioned conductive fine particles is applied or printed on a substrate, and is cured, preferably having a refractive index of 1.45. 1.90, the light transmittance is 75% or more, the twist is 2.0% or less, and the surface resistance value is 10 12 Ω/□ or less.

而且,於本發明中,被要求高折射率特性之透明導電膜形成用之含導電性微粒子的硬化膜,其特徵為在基材上塗佈或印刷上述之透明導電膜形成用之含導電性微粒子之光硬化性組成物,予以硬化所得者,較佳者折射率為1.55~1.90,光透過率為85%以上,霾度為1.5%以下,且表面電阻值為1012Ω/□以下。Further, in the present invention, a cured film containing conductive fine particles for forming a transparent conductive film having high refractive index characteristics is characterized in that the conductive property for forming the above transparent conductive film is coated or printed on a substrate. The photocurable composition of the microparticles is preferably obtained by curing the refractive index of 1.55 to 1.90, the light transmittance of 85% or more, the twist of 1.5% or less, and the surface resistance value of 10 12 Ω/□ or less.

[發明效果][Effect of the invention]

藉由本發明,可提供(1)分散液之保存安定性優異的導電性微粒子分散液,(2)可在基材表面上形成透明性優異且具有抗靜電機能之硬化膜,在分散處理過程中所使用的金屬製機器或塗佈機材不會被腐蝕的含導電性微粒子之光硬化性組成物,以及(3)由該組成物所得的透明優異且具有抗靜電機能之含導電性微粒子之硬化膜。According to the present invention, (1) a conductive fine particle dispersion liquid excellent in storage stability of the dispersion liquid can be provided, and (2) a cured film having excellent transparency and antistatic function can be formed on the surface of the substrate, during the dispersion treatment. The photocurable composition containing conductive fine particles which is not corroded by the metal machine or the coating material to be used, and (3) the hardening of the conductive microparticles which are excellent in transparency and have antistatic properties obtained from the composition membrane.

此外,藉由本發明,可提供(1)可在基材表面上形成透明性優異且具有高折射率、抗靜電機能之透明導電膜,在分散處理過程中使用的金屬製機器或塗佈機材不會被腐蝕的光硬化性透明導電膜形成用組成物,(2)由該透明導電膜形成用組成物所得的透明性優異且具有高折射率及抗靜電機能之透明導電膜,(3)具有該透明導電膜之顯示裝置,以及(4)調製該透明導電膜形成用組成物時所使用的保存安定性優異的分散液。Further, according to the present invention, it is possible to provide (1) a transparent conductive film which is excellent in transparency and has high refractive index and antistatic function on the surface of the substrate, and the metal machine or the coating machine used in the dispersion process is not (2) a transparent conductive film having excellent transparency and high refractive index and antistatic function, which is obtained by forming a composition for forming a photocurable transparent conductive film which is corroded, and (3) having The display device of the transparent conductive film and (4) a dispersion liquid excellent in storage stability used when preparing the composition for forming a transparent conductive film.

[為實施發明時之最佳形態][The best form for implementing the invention]

於下述中,具體地說明本發明之實施形態。Hereinafter, embodiments of the present invention will be specifically described.

本發明之導電性微粒子分散液,含有導電性微粒子、金屬錯合物及分散媒。有關本發明所使用的導電性微粒子之形狀,沒有特別的限制。導電性微粒子之導電性,係體積電阻值為107Ω‧cm以下,較佳者為103Ω‧cm以下。此外,有關導電性微粒子之尺寸大小,通常使用一次粒徑為1~500nm者,較佳者為10~100nm。The conductive fine particle dispersion of the present invention contains conductive fine particles, a metal complex, and a dispersion medium. The shape of the conductive fine particles used in the present invention is not particularly limited. The conductivity of the conductive fine particles is 10 7 Ω ‧ cm or less, preferably 10 3 Ω ‧ cm or less. Further, as for the size of the conductive fine particles, a primary particle diameter of 1 to 500 nm is usually used, and preferably 10 to 100 nm.

另外,於本發明中透明導電膜等特別被要求具有高折射率特性時,其導電性微粒子分散液係含有折射率為1.8以上之高折射率微粒子、導電性微粒子、不含烷氧化物之金屬錯合物及分散媒,水分為3質量%以下。有關本發明所使用的高折射率微粒子及導電性微粒子之形狀,沒有特別的限制。而且,有關高折射率微粒子及導電性微粒子之尺寸大小,通常可使用一次粒徑為1~500nm者,較佳者為10~100nm。Further, in the present invention, when a transparent conductive film or the like is required to have high refractive index characteristics, the conductive fine particle dispersion liquid contains high refractive index fine particles having a refractive index of 1.8 or more, conductive fine particles, and a metal containing no alkoxide. The complex compound and the dispersion medium have a water content of 3% by mass or less. The shape of the high refractive index fine particles and the conductive fine particles used in the present invention is not particularly limited. Further, as for the size of the high refractive index fine particles and the conductive fine particles, a primary particle diameter of usually 1 to 500 nm, preferably 10 to 100 nm can be used.

有關本發明所使用的導電性微粒子之種類,只要是可達成目的者即可,沒有特別的限制,可使用市售品等之習知品。例如可使用ITO、ATO、氧化錫、氧化鋅、氧化銦、銻酸鋅及五氧化銻等之金屬氧化物或構成此等金屬氧化物之金屬的氫氧化物。有關氧化錫,亦可使用摻雜有磷等元素者。而且,有關氧化鋅,亦可使用摻雜有鎵或鋁者。此外,亦可為金、銀、銅、鉑、鋁等之金屬微粒子及有機導電性微粒子。此等之導電性微粒子,可僅使用1種,亦可併用2種以上。The type of the conductive fine particles used in the present invention is not particularly limited as long as it can achieve the object, and a conventional product such as a commercially available product can be used. For example, a metal oxide such as ITO, ATO, tin oxide, zinc oxide, indium oxide, zinc antimonate or antimony pentoxide or a hydroxide constituting a metal of such a metal oxide can be used. For tin oxide, an element doped with phosphorus or the like can also be used. Moreover, regarding zinc oxide, those doped with gallium or aluminum can also be used. Further, it may be metal fine particles such as gold, silver, copper, platinum, or aluminum, and organic conductive fine particles. These conductive fine particles may be used alone or in combination of two or more.

而且,本發明中於透明導電膜等之特別被要求高折射率特性的用途時之導電性微粒子分散液中所配合的高折射率微粒子,為控制所形成的透明導電膜之折射率時所添加者,以使用折射率為1.8~3.0之金屬氧化物較佳。而且,在各文獻中記載有各高折射率微粒子之折射率為材料原有之值。使用折射率未達1.8之高折射率微粒子時,無法製得高折射率之膜,此外,使用折射率超過3.0之高折射率微粒子時,會有膜之透明性降低的傾向。有關本發明所使用的高折射率微粒子之種類,只要是可達成目的者即可,沒有特別的限制,可使用市售品等之習知品。例如,可使用氧化鋯(n=2.2)、氧化鈦(n=2.76)及氧化鈰(=2.2)等。此等之高折射率微粒子,可僅使用1種,亦可併用2種以上。 Further, in the present invention, the high refractive index fine particles blended in the conductive fine particle dispersion liquid in the case where the transparent conductive film or the like is particularly required to have high refractive index characteristics are added to control the refractive index of the formed transparent conductive film. It is preferred to use a metal oxide having a refractive index of 1.8 to 3.0. Further, in each document, the refractive index of each of the high refractive index fine particles is described as the original value of the material. When a high refractive index fine particle having a refractive index of less than 1.8 is used, a film having a high refractive index cannot be obtained, and when a high refractive index fine particle having a refractive index of more than 3.0 is used, the transparency of the film tends to be lowered. The type of the high refractive index fine particles used in the present invention is not particularly limited as long as it can achieve the object, and a conventional product such as a commercially available product can be used. For example, zirconium oxide (n = 2.2), titanium oxide (n = 2.76), cerium oxide (= 2.2), or the like can be used. These high-refractive-index fine particles may be used alone or in combination of two or more.

於本發明之導電性微粒子分散液中,除上述之導電性微粒子及特別被要求高折射率特性之用途時所配合的高折射率微粒子外,在分散媒中配合金屬錯合物。該金屬錯合物,由於於分散液中作為分散劑之機能,可製得分散液之保存安定性優異的導電性微粒子分散液。而且,金屬錯合物幾乎完全沒有使分散過程中所使用的金屬製機器或塗佈機材被腐蝕的情形。 In the conductive fine particle dispersion of the present invention, a metal complex is blended in a dispersion medium in addition to the above-mentioned conductive fine particles and high refractive index fine particles to be blended in the application of high refractive index properties. The metal complex compound can function as a dispersing agent in the dispersion liquid, and can obtain a conductive fine particle dispersion liquid excellent in storage stability of the dispersion liquid. Moreover, the metal complex is almost completely free of the case where the metal machine or coating machine used in the dispersion process is corroded.

本發明所使用的金屬錯合物,係由選自鋯、鈦、鉻、錳、鐵、鈷、鎳、銅、釩、鋁、鋅、銦、錫及鉑所成群之金屬(就分散液之色味少而言,較佳者例如選自鋯、鈦、鋁、鋅、銦及錫所成群之金屬),與選自β-二酮所成群的配位子(較佳者為選自三甲基乙醯基三氟化丙酮、乙醯基丙 酮、三氟化乙醯基丙酮及六氟化乙醯基丙酮所成群的配位子)所成,更佳者為不含烷氧化物之金屬錯合物。使用不含烷氧化物之金屬錯合物時,烷氧化物與溶劑中所含的水分或空氣中之水分進行經時反應,會有導電性微粒子分散液及透明導電膜形成用之含導電性微粒子之光硬化性組成物的保存安定性及膜特性降低的傾向。 The metal complex used in the present invention is a metal group selected from the group consisting of zirconium, titanium, chromium, manganese, iron, cobalt, nickel, copper, vanadium, aluminum, zinc, indium, tin, and platinum. In the case of a small amount of color, preferably, for example, a metal selected from the group consisting of zirconium, titanium, aluminum, zinc, indium, and tin, and a ligand selected from the group consisting of β-diketones (preferably Selected from trimethylethyl fluorenylacetone, ethyl acetophenone It is formed by a group of ketones, acetylacetone trifluoride and hexamethylene acetonide, and more preferably an alkoxide-free metal complex. When a metal complex containing no alkoxide is used, the alkoxide reacts with the water contained in the solvent or the moisture in the air, and the conductive fine particle dispersion and the transparent conductive film are formed to have conductivity. The storage stability of the photocurable composition of the fine particles and the tendency of the film properties to be lowered.

於本發明中,有關於透明導電膜等之特別被要求高折射率特性的用途時所配合的金屬錯合物,係使用不含烷氧化物之金屬錯合物。使用不含烷氧化物之金屬錯合物時,烷氧化物與溶劑中所含的水分或空氣中之水分進行經時反應,會有導電性微粒子分散液及透明導電膜形成用之含有導電性微粒子之光硬化性組成物的保存安定性及膜特性降低的情形。 In the present invention, a metal complex compound to be used in the case where a transparent conductive film or the like is particularly required to have a high refractive index property is used, and a metal complex containing no alkoxide is used. When a metal complex containing no alkoxide is used, the alkoxide reacts with the water contained in the solvent or the moisture in the air, and the conductive fine particle dispersion and the transparent conductive film are formed to contain conductivity. The storage stability and film properties of the photocurable composition of the microparticles are lowered.

而且,以更為提高分散液之保存安定性為目的時,亦可另外添加其他的分散劑作為分散助劑。該分散助劑之種類,沒有特別的限制,該分散劑例如以具有聚氧化乙烯烷基構造之磷酸酯系非離子型分散劑。 Further, in order to further improve the storage stability of the dispersion, another dispersant may be additionally added as a dispersing aid. The type of the dispersing aid is not particularly limited, and the dispersing agent is, for example, a phosphate-based nonionic dispersing agent having a polyoxyethylene alkyl structure.

本發明所使用的分散媒,例如水、甲醇、乙醇、異丙醇、正丁醇、2-丁醇、辛醇等之醇類;丙酮、甲基乙酮、甲基異丁酮、環己酮、4-羥基-4-甲基-2-戊酮等之酮類;醋酸乙酯、醋酸丁酯、乳酸乙酯、γ-丁內酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯等之酯類;乙二醇單甲醚、二乙二醇單丁醚等之醚類;苯、甲苯、二甲苯、乙苯等之芳香族烴類;二甲基甲醯胺、N,N-二甲基乙醯基乙醯胺、N-甲基吡啶烷酮等之醯胺類等。於此等之中,以乙醇、異丙醇、正丁醇、2-丁醇、甲基乙酮、甲基異丁酮、環己酮、4-羥基-4-甲基-2-戊酮、醋酸乙酯、醋酸丁酯、甲苯、二甲苯、乙苯較佳,以甲基乙酮、丁醇、二甲苯、乙苯、甲苯更佳。於本發明中,可單獨使用一種,亦可併用二種以上作為分散媒。The dispersing medium used in the present invention, for example, an alcohol such as water, methanol, ethanol, isopropanol, n-butanol, 2-butanol or octanol; acetone, methyl ethyl ketone, methyl isobutyl ketone or cyclohexane Ketones, ketones such as 4-hydroxy-4-methyl-2-pentanone; ethyl acetate, butyl acetate, ethyl lactate, γ-butyrolactone, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether Esters such as acid esters; ethers such as ethylene glycol monomethyl ether and diethylene glycol monobutyl ether; aromatic hydrocarbons such as benzene, toluene, xylene, ethylbenzene; dimethylformamide, N An indoleamine such as N-dimethylethendylacetamide or N-methylpyridinone. Among these, ethanol, isopropanol, n-butanol, 2-butanol, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone Ethyl acetate, butyl acetate, toluene, xylene and ethylbenzene are preferred, and methyl ethyl ketone, butanol, xylene, ethylbenzene and toluene are more preferred. In the present invention, one type may be used alone or two or more types may be used in combination as a dispersion medium.

於本發明中,有關於透明導電膜等之特別被要求高折射率特性的用途時所配合的分散媒,為防止導電性微粒子分散液或透明導電膜形成用之含導電性微粒子之光硬化性組成物中所含的微粒子之粒徑產生經時性變大時,所含的水份量為3質量%以下,較佳者為1質量%以下,更佳者為0.5質量%以下。In the present invention, the dispersing medium to be used in the case where the transparent conductive film or the like is required to have a high refractive index characteristic, and the photocuring property of the conductive microparticles for preventing the formation of the conductive fine particle dispersion or the transparent conductive film When the particle diameter of the fine particles contained in the composition is increased over time, the amount of water contained is 3% by mass or less, preferably 1% by mass or less, and more preferably 0.5% by mass or less.

於本發明之導電性微粒子分散液中,各成份之配合比例可視導電性微粒子分散液之用途而定予以適當設定,每100質量份導電性微粒子中,金屬錯合物之含量為2~45質量份、較佳者為5~20質量份,分散媒之含量為40~1000質量份、較佳者為60~600質量份。金屬錯合物之量較上述之下限值更少時,導電性微粒子之分散變得不佳,較上述之上限值更多時,金屬錯合物不溶解於分散媒中而產生沉澱情形。而且,分散媒之量較上述之下限值更少時,金屬錯合物之溶解、導電性微粒子之分散變得不充分,較上述之上限值更多時,導電性微粒子分散液之濃度過薄時,變得沒有實用價值。In the conductive fine particle dispersion of the present invention, the mixing ratio of each component can be appropriately set depending on the use of the conductive fine particle dispersion, and the content of the metal complex is 2 to 45 mass per 100 parts by mass of the conductive fine particles. The amount is preferably 5 to 20 parts by mass, and the content of the dispersion medium is 40 to 1000 parts by mass, preferably 60 to 600 parts by mass. When the amount of the metal complex is less than the above lower limit, the dispersion of the conductive fine particles becomes poor, and when the upper limit is more than the above upper limit, the metal complex does not dissolve in the dispersion medium to cause precipitation. . In addition, when the amount of the dispersion medium is less than the above lower limit, the dissolution of the metal complex and the dispersion of the conductive fine particles are insufficient, and when the amount is more than the above upper limit, the concentration of the conductive fine particle dispersion When it is too thin, it has no practical value.

此外,於本發明中透明導電膜等之特別被要求高折射率特性的用途時之導電性微粒子分散液中,每100質量份高折射率微粒子中,導電性微粒子之含量為30~900質量份(較佳者為40~500質量份),金屬錯合物之含量為3~450質量份(較佳者為7~200質量份),分散媒之含量為60~9000質量份(較佳者為10~5000質量份)。導電性微粒子之量較上述之下限值更少時,所形成的膜之折射率變高,惟導電性降低。反之,導電性微粒子之量較上述之上限值更高時,所形成的膜之導電性變高,惟折射率降低。另外,金屬錯合物之量較上述之下限值更少時,高折射率微粒子及導電性微粒子之分散性變得不佳,較上述之上限值更多時,金屬錯合物不會溶解於分散媒中而產生沉澱情形。而且,分散媒之量較上述之下限值更少時,金屬錯合物之溶解、高折射率及導電性微粒子之分散變得不充分,較上述之上限值更多時,高折射率微粒子及導電性微粒子之濃度過薄,變得沒有實用價值。Further, in the conductive fine particle dispersion liquid in the case where the transparent conductive film or the like is particularly required to have a high refractive index property, the content of the conductive fine particles per 100 parts by mass of the high refractive index fine particles is 30 to 900 parts by mass. (preferably 40 to 500 parts by mass), the content of the metal complex is 3 to 450 parts by mass (preferably 7 to 200 parts by mass), and the content of the dispersion medium is 60 to 9000 parts by mass (preferred It is 10 to 5000 parts by mass). When the amount of the conductive fine particles is less than the above lower limit, the refractive index of the formed film becomes high, but the conductivity is lowered. On the other hand, when the amount of the conductive fine particles is higher than the above upper limit, the conductivity of the formed film becomes high, but the refractive index is lowered. Further, when the amount of the metal complex is less than the above lower limit, the dispersibility of the high refractive index fine particles and the conductive fine particles becomes poor, and when the upper limit is more than the above upper limit, the metal complex does not It is dissolved in a dispersion medium to cause precipitation. Further, when the amount of the dispersion medium is less than the above lower limit, the dissolution of the metal complex, the high refractive index, and the dispersion of the conductive fine particles are insufficient, and when the amount is more than the above upper limit, the high refractive index is high. The concentration of the fine particles and the conductive fine particles is too thin, and there is no practical value.

本發明之導電性微粒子分散液,係藉由以任意順序添加導電性微粒子、金屬錯合物及分散媒,以及特別被要求高折射率特性之用途時所配合的高折射率微粒子,且進行充分混合而製得。通常,在使金屬錯合物溶解的分散媒中分散導電性微粒子或高折射率微粒子予以製造。亦可於進行分散操作前,進行預分散操作。預分散操作係可於溶解有金屬錯合物之分散媒中,以分散器等進行攪拌且慢慢地添加導電性微粒子或高折射率微粒子,以目視確認沒有導電性微粒子或高折射率微粒子之塊狀物為止進行均勻地攪拌。而且,配合有高折射率微粒子時,亦可預先調製由高折射率微粒子、金屬錯合物及分散媒所成的分散液,與由導電性微粒子、金屬錯合物及分散媒所成的分散液,然後,混合此等之分散液予以製造。The conductive fine particle dispersion of the present invention is prepared by adding conductive fine particles, a metal complex, a dispersion medium, and a high refractive index fine particle to be used in a case where high refractive index characteristics are particularly required. Made by mixing. Usually, conductive fine particles or high refractive index fine particles are dispersed in a dispersion medium in which a metal complex is dissolved. It is also possible to carry out a pre-dispersion operation before the dispersion operation. In the dispersion medium in which the metal complex is dissolved, the conductive fine particles or the high refractive index fine particles are gradually added by stirring with a disperser or the like, and it is visually confirmed that there is no conductive fine particles or high refractive index fine particles. The blocks were uniformly stirred until they were. Further, when high refractive index fine particles are blended, a dispersion liquid composed of high refractive index fine particles, a metal complex, and a dispersion medium can be prepared in advance and dispersed by conductive fine particles, a metal complex, and a dispersion medium. The liquid is then prepared by mixing the dispersions.

導電性微粒子或高折射率微粒子之分散操作,可使用油漆攪拌器、球磨機、砂磨機、離心磨機(Centrimill)等。於分散操作時,以使用玻璃珠、鋯珠等之分散珠較佳。珠徑沒有特別的限制,通常約為0.05~1mm,較佳者為0.05~0.65nm。配合有高折射率微粒子時,更佳者為0.08~0.65nm、最佳者為0.08~0.5mm。For the dispersion operation of the conductive fine particles or the high refractive index fine particles, a paint mixer, a ball mill, a sand mill, a centrifugal mill (Centrimill) or the like can be used. In the dispersion operation, it is preferred to use dispersed beads such as glass beads, zirconium beads or the like. The bead diameter is not particularly limited and is usually about 0.05 to 1 mm, preferably 0.05 to 0.65 nm. When the high refractive index fine particles are blended, it is more preferably 0.08 to 0.65 nm, and most preferably 0.08 to 0.5 mm.

於本發明之導電性微粒子分散液中,導電性微粒子或高折射率微粒子之粒徑,中徑以120nm以下較佳、更佳者為80nm以下。中徑為該值以上時,會有由含導電性微粒子之光硬化性組成物所得的含導電性微粒子之硬化膜的霾度變高的傾向。In the conductive fine particle dispersion of the present invention, the particle diameter of the conductive fine particles or the high refractive index fine particles is preferably 120 nm or less, and more preferably 80 nm or less. When the median diameter is equal to or greater than this value, the degree of twist of the cured film containing conductive fine particles obtained from the photocurable composition containing conductive fine particles tends to be high.

本發明之導電性微粒子分散液,經過長時間後導電性微粒子或高折射率微粒子仍安定地分散,而且,由於不含會使金屬腐蝕的乙醯基丙酮等時,故可保管於金屬製容器中。In the conductive fine particle dispersion liquid of the present invention, the conductive fine particles or the high refractive index fine particles are stably dispersed after a long period of time, and since the ethylene acetylacetone which corrodes the metal is not contained, it can be stored in a metal container. in.

本發明之導電性微粒子分散液,可包含於保護膜形成用組成物、防止反射膜形成用組成物、接著劑、密封材料、接著材料等使用,特別是適合形成具有抗靜電機能之防止反射膜的組成物使用。The conductive fine particle dispersion of the present invention can be used in a protective film-forming composition, a composition for preventing reflection film formation, an adhesive, a sealing material, a bonding material, and the like, and is particularly suitable for forming an anti-reflection film having an antistatic function. The composition is used.

本發明之含導電性微粒子的光硬化性組成物,含有導電性微粒子、金屬錯合物、活性能量線硬化性化合物、光聚合引發劑及分散媒,導電性微粒子、金屬錯合物及分散媒如上所述。The photocurable composition containing conductive fine particles of the present invention contains conductive fine particles, a metal complex, an active energy ray-curable compound, a photopolymerization initiator, and a dispersion medium, and conductive fine particles, a metal complex, and a dispersion medium. As mentioned above.

而且,本發明之透明導電膜形成用之含導電性微粒子的光硬化性組成物,含有折射率為1.8以上的高折射率微粒子、導電性微粒子、不含烷氧化物之金屬錯合物、活性能量線硬化性化合物、光聚合引發劑及分散媒,水分為3質量%以下,高折射率微粒子、導電性微粒子及分散媒如上所述。Further, the photocurable composition containing conductive fine particles for forming a transparent conductive film of the present invention contains high refractive index fine particles having a refractive index of 1.8 or more, conductive fine particles, a metal complex containing no alkoxide, and activity. The energy ray-curable compound, the photopolymerization initiator, and the dispersion medium have a water content of 3% by mass or less, and the high refractive index fine particles, the conductive fine particles, and the dispersion medium are as described above.

此外,於本發明之含導電性微粒子的光硬化性組成物中,為賦予硬化膜之耐擦傷性、耐摩擦性、低翹曲性、密接性、透明性、折射率、耐藥品性、抗靜電性時,可使用除上述導電性微粒子外之微粒子。有關微粒子之種類,只要是可達成目的者即可,沒有特別的限制,可使用市售品等之習知品。例如,氧化鋯、氧化鈦、氧化鋁及氧化矽等之無機微粒子或有機微粒子等。此等之微粒子,可僅使用1種,亦可2種以上併用。Further, in the photocurable composition containing conductive fine particles of the present invention, the cured film is provided with scratch resistance, abrasion resistance, low warpage, adhesion, transparency, refractive index, chemical resistance, and resistance. In the case of static electricity, fine particles other than the above-mentioned conductive fine particles can be used. The type of the fine particles is not particularly limited as long as it can achieve the purpose, and a conventional product such as a commercially available product can be used. For example, inorganic fine particles such as zirconia, titanium oxide, aluminum oxide, and cerium oxide, or organic fine particles. These fine particles may be used alone or in combination of two or more.

本發明中使用的活性能量線硬化性化合物,例如可為游離基聚合性單體、游離基聚合性低聚物等。The active energy ray-curable compound used in the present invention may be, for example, a radical polymerizable monomer or a radical polymerizable oligomer.

游離基聚合性單體之具體例,如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸四氫呋喃酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、單(甲基)丙烯酸聚乙二醇酯、單(甲基)丙烯酸甲氧基聚乙二醇酯、單(甲基)丙烯酸聚丙二醇酯、單(甲基)丙烯酸聚乙二醇聚丙二醇酯、單(甲基)丙烯酸聚乙二醇聚四甲二醇酯、(甲基)丙烯酸環氧丙酯等之單官能(甲基)丙烯酸酯;二(甲基)丙烯酸乙二醇酯、二(甲基)丙烯酸二乙二醇酯、二(甲基)丙烯酸三乙二醇酯、二(甲基)丙烯酸四乙二醇酯、二(甲基)丙烯酸聚乙二醇酯、二(甲基)丙烯酸聚丙二醇酯、二(甲基)丙烯酸新戊醇酯、二(甲基)丙烯酸烯丙酯、二(甲基)丙烯酸雙酚A酯、二(甲基)丙烯酸氧化乙烯改性雙酚A酯、二(甲基)丙烯酸聚氧化乙烯改性雙酚A酯、二(甲基)丙烯酸氧化乙烯改性雙酚S酯、二(甲基)丙烯酸雙酚S酯、二(甲基)丙烯酸1,4-丁二醇酯、二(甲基)丙烯酸1,3-丁二醇酯等之二官能(甲基)丙烯酸酯;三(甲基)丙烯酸三羥甲基丙烷酯、三(甲基)丙烯酸丙三醇酯、三(甲基)丙烯酸季戊四醇酯、四(甲基)丙烯酸季戊四醇酯、三(甲基)丙烯酸乙烯改性三羥甲基丙烷酯、五(甲基)丙烯酸二季戊四醇酯、六(甲基)丙烯酸二季戊四醇酯等之三官能以上的(甲基)丙烯酸乙酯;苯乙烯、乙烯基甲苯、醋酸乙烯酯、N-乙烯基吡咯烷酮、丙烯腈、烯丙醇等之游離基聚合性單體。Specific examples of the radical polymerizable monomer are, for example, methyl (meth)acrylate, ethyl (meth)acrylate, isopropyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, (A) Butyl acrylate, cyclohexyl (meth) acrylate, tetrahydrofuran (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, mono (methyl) Polyethylene glycol acrylate, methoxypolyethylene glycol mono(meth)acrylate, polypropylene glycol mono(meth)acrylate, polyethylene glycol polypropylene glycol mono(meth)acrylate, mono (methyl) a monofunctional (meth) acrylate such as poly(ethylene glycol) polytetramethylene glycol acrylate, glycidyl (meth) acrylate, etc.; ethylene glycol di(meth)acrylate, di(meth)acrylic acid Diethylene glycol ester, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate Ester, neopentyl bis(meth)acrylate, allyl bis(meth)acrylate, bisphenol A di(meth)acrylate, oxyethylene modified bisphenol A di(meth)acrylate, two (methyl) propyl Acid polyoxyethylene modified bisphenol A ester, di(meth)acrylic acid oxyethylene modified bisphenol S ester, di(meth)acrylic acid bisphenol S ester, di(meth)acrylic acid 1,4-butanediol Difunctional (meth) acrylate such as ester, 1,3-butylene glycol di(meth)acrylate; trimethylolpropane tris(meth)acrylate; glycerol tri(meth)acrylate , pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, ethylene modified trimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, hexa(methyl) a trifunctional or higher (ethyl) acrylate such as dipentaerythritol acrylate; a radical polymerizable monomer such as styrene, vinyl toluene, vinyl acetate, N-vinylpyrrolidone, acrylonitrile or allyl alcohol.

另外,游離基聚合性低聚物之具體例,如聚酯(甲基)丙烯酸酯、聚胺基甲酸酯(甲基)丙烯酸酯、(甲基)丙烯酸環氧酯、聚醚(甲基)丙烯酸酯、低聚(甲基)丙烯酸酯、烷基化(甲基)丙烯酸酯、(甲基)丙烯酸多元醇酯、聚矽氧(甲基)丙烯酸酯等之至少具有1個(甲基)丙烯醯基之預聚物。更佳的游離基聚合性低聚物,為聚酯、環氧基、聚胺基甲酸酯之各(甲基)丙烯酸酯。於本發明中,活性能量線硬化性化合物可單獨一種使用,亦可二種以上併用。Further, specific examples of the radical polymerizable oligomer, such as polyester (meth) acrylate, polyurethane (meth) acrylate, (meth) acrylate epoxy, polyether (methyl At least one of acrylate, oligo(meth) acrylate, alkylated (meth) acrylate, (meth) acrylate polyol, poly methoxy (meth) acrylate, etc. a prepolymer of acrylonitrile. More preferably, the radical polymerizable oligomer is a (meth) acrylate of a polyester, an epoxy group or a polyurethane. In the present invention, the active energy ray-curable compounds may be used alone or in combination of two or more.

於本發明之含導電性微粒子的光硬化性組成物中,由於含有光聚引發劑(光增感劑),故可以少量的活性能量線照射,使含導電性微粒子之光硬化性組成物硬化。In the photocurable composition containing conductive fine particles of the present invention, since a photopolymerization initiator (photosensitizer) is contained, a small amount of active energy rays can be irradiated to harden the photocurable composition containing conductive fine particles. .

本發明使用的光聚合引發劑(光增感劑),例如1-羥基環己基苯酮、二苯甲酮、苯甲基二甲酮、苯偶因甲醚、苯偶因乙醚、p-氯化二苯甲酮、4-苯甲醯基-4-甲基二苯基硫醚、2-苯甲基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮-1,2-甲基-1-[4-(甲基硫代)苯基]-2-嗎啉基丙酮-1。光聚合引發劑可單獨一種使用,亦可二種以上併用。Photopolymerization initiator (photosensitizer) used in the present invention, for example, 1-hydroxycyclohexyl benzophenone, benzophenone, benzyl ketone, benzoin methyl ether, benzoin ether, p-chloride Benzophenone, 4-benzylidene-4-methyldiphenyl sulfide, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butyl Keto-1,2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylacetone-1. The photopolymerization initiator may be used alone or in combination of two or more.

於本發明之含導電性微粒子的光硬化性組成物中,各成份之配合比例可視含導電性微粒子之光硬化性組成物的用途而定予以適當設定,每100質量份導電性微粒子中,金屬錯合物之含量以2~45質量份較佳(更佳者為5~20質量份),分散媒之含量以40~1000質量份較佳(更佳者為60~600質量份),活性能量線硬化性化合物之含量以10~1000質量份較佳(更佳者為25~150質量份),且每100質量份活性能量線硬化性化合物中,光聚合引發劑之含量以0.1~20質量份較佳(更佳者為1~15質量份)。In the photocurable composition containing conductive fine particles of the present invention, the blending ratio of each component can be appropriately set depending on the use of the photocurable composition containing conductive fine particles, and the metal is contained per 100 parts by mass of the conductive fine particles. The content of the complex compound is preferably 2 to 45 parts by mass (more preferably 5 to 20 parts by mass), and the content of the dispersion medium is preferably 40 to 1000 parts by mass (more preferably 60 to 600 parts by mass). The content of the energy ray-curable compound is preferably from 10 to 1,000 parts by mass (more preferably from 25 to 150 parts by mass), and the content of the photopolymerization initiator is from 0.1 to 20 per 100 parts by mass of the active energy ray-curable compound. The mass fraction is preferably (more preferably from 1 to 15 parts by mass).

此處,金屬錯合物之量較上述下限值更少時,會有導電性微粒子之分散性不佳的傾向,較上述上限值更多時,會有金屬錯合物沒有溶解於分散媒中而產生沉澱的情形。分散媒之量較上述下限值更少時,會有金屬錯合物溶解、導電性微粒子之分散性變得不充分的傾向,較上述上限值更多時,導電性微粒子分散液之濃度過薄時,導電性微粒子之添加效果變得不充分的傾向。活性能量線硬化性化合物之量較上述下限值過少時,會有硬化膜之折射率變高,透明性降低的傾向,較上述上限值更多時,不易使硬化膜之折射率變成企求程度之高值。而且,光聚合引發劑之量較上述下限值更少時,會有光硬化性組成物之硬化速度降低的傾向,較上述上限值更多時,無法得到符合的效果。Here, when the amount of the metal complex is less than the above lower limit, the dispersibility of the conductive fine particles tends to be poor, and when the amount is more than the above upper limit, the metal complex is not dissolved in the dispersion. A situation in which precipitation occurs in the medium. When the amount of the dispersion medium is less than the above lower limit, the metal complex is dissolved and the dispersibility of the conductive fine particles tends to be insufficient. When the amount of the dispersion medium is more than the above upper limit, the concentration of the conductive fine particle dispersion is increased. When it is too thin, the effect of adding conductive fine particles tends to be insufficient. When the amount of the active energy ray-curable compound is too small as compared with the above lower limit, the refractive index of the cured film is increased, and the transparency tends to be lowered. When the amount is more than the above upper limit, the refractive index of the cured film is less likely to become desired. The high value of the degree. In addition, when the amount of the photopolymerization initiator is less than the above lower limit, the curing rate of the photocurable composition tends to decrease, and when it is more than the above upper limit, a satisfactory effect cannot be obtained.

此外,透明導電膜形成用之含導電性微粒子的光硬化性組成物,每100質量份高折射率微粒子中,導電性微粒子之含量以30~900質量份較佳(更佳者為40~500質量份),金屬錯合物之含量以3~450質量份較佳(更佳者為7~200質量份),分散媒之含量以60~70000質量份較佳(更佳者為100~50000質量份),活性能量線硬化性化合物之含量以14~10000質量份較佳(更佳者為35~2000質量份),且每100質量份活性能量線硬化性化合物中,光聚合引發劑之含量以0.1~20質量份較佳(更佳者為1~15質量份)。Further, in the photocurable composition containing conductive fine particles for forming a transparent conductive film, the content of the conductive fine particles is preferably 30 to 900 parts by mass per 100 parts by mass of the high refractive index fine particles (more preferably 40 to 500). The content of the metal complex is preferably from 3 to 450 parts by mass (more preferably from 7 to 200 parts by mass), and the content of the dispersion medium is preferably from 60 to 70,000 parts by mass (more preferably from 100 to 50,000 parts). The content of the active energy ray-curable compound is preferably from 14 to 10,000 parts by mass (more preferably from 35 to 2000 parts by mass), and per 100 parts by mass of the active energy ray-curable compound, the photopolymerization initiator The content is preferably 0.1 to 20 parts by mass (more preferably 1 to 15 parts by mass).

於該透明導電膜形成用之含導電性微粒子的光硬化性組成物中,導電性微粒子之量較上述下限值更少時,導電性降低。反之,導電性微粒子之量較上述上限值更高時,所形成的膜之導電性變高,折射率降低。金屬錯合物之量較上述下限值更少時,會有高折射率微粒子及導電性微粒子之分散不佳的傾向,較上述上限值更多時,會有金屬錯合物沒有溶解於分散媒中而產生沉澱的情形。分散媒之量較上述下限值更少時,會有金屬錯合物之溶解、高折射率微粒子及導電性微粒子之分散變得不佳的傾向,較上述上限值更多時,光硬化性組成物之濃度過薄,變得不具實用價值。活性能量線硬化性化合物之量較上述下限值更少時,會有透明導電膜之折射率變高,透明性降低的傾向,較上述上限值更多時,透明導電膜之折射率無法達到企求程度的高值,且抗靜電機能變得不充分。而且,光聚合引發劑之量較上述下限值更少時,會有光硬化性組成物之硬化速度降低的傾向,較上述上限值過多時,無法得到符合的效果。In the photocurable composition containing conductive fine particles for forming the transparent conductive film, when the amount of the conductive fine particles is less than the above lower limit value, the conductivity is lowered. On the other hand, when the amount of the conductive fine particles is higher than the above upper limit value, the conductivity of the formed film becomes high and the refractive index is lowered. When the amount of the metal complex is less than the above lower limit, the dispersion of the high refractive index fine particles and the conductive fine particles tends to be poor, and when the amount is larger than the above upper limit, the metal complex is not dissolved. A situation in which a precipitate is formed in a dispersion medium. When the amount of the dispersion medium is less than the above lower limit value, the dissolution of the metal complex, the dispersion of the high refractive index fine particles and the conductive fine particles tend to be poor, and when the amount is more than the above upper limit, the photohardening occurs. The concentration of the sexual composition is too thin to become practical. When the amount of the active energy ray-curable compound is less than the above lower limit, the refractive index of the transparent conductive film is increased, and the transparency tends to be lowered. When the amount is more than the above upper limit, the refractive index of the transparent conductive film cannot be obtained. The high value of the degree of demand is achieved, and the antistatic function becomes insufficient. In addition, when the amount of the photopolymerization initiator is less than the above lower limit value, the curing rate of the photocurable composition tends to decrease, and when it is too large as compared with the above upper limit value, a satisfactory effect cannot be obtained.

而且,於本發明之含導電性微粒子的光硬化性組成物中,在不會損害其目的之範圍內,亦可配合除上述外之慣用的各種添加劑。該添加劑例如禁止聚合劑、硬化觸媒、抗氧化劑、整平劑、偶合劑等。Further, in the photocurable composition containing conductive fine particles of the present invention, various additives conventionally used in addition to the above may be blended insofar as the object is not impaired. The additive is, for example, a polymerization agent, a curing catalyst, an antioxidant, a leveling agent, a coupling agent, or the like.

本發明之含導電性微粒子的光硬化性組成物,可塗佈或印刷於塑膠(聚碳酸酯、聚甲基丙烯酸甲酯、聚苯乙烯、聚酯、聚烯烴、環氧樹脂、蜜胺樹脂、三乙醯基纖維素樹脂、聚對苯二甲酸乙烯酯、ABS樹脂、AS樹脂、原菠烯系樹脂等)、金屬、木材、紙、玻璃、石板等之各種基材表面上,且予以硬化形成膜,例如使用於塑膠光學零件、觸控板、薄膜型液晶元件、塑膠容器、作為建築內裝材料之床材、壁材、人工大理石等之防止刮傷(擦傷)或防止污染時之保護塗佈材料;薄膜型液晶元件、觸控板、塑膠光學零件等之防止反射膜;各種基材之接著劑、密封材料;印刷油墨之接著材料等,特別是可適合使用於形成具有抗靜電機能之防止反射膜的組成物。此外,配合有高折射率微粒子之含導電性微粒子的光硬化性組成物時,特別是可適合使用於形成高折射率之透明導電膜。The photocurable composition containing conductive fine particles of the present invention can be coated or printed on plastic (polycarbonate, polymethyl methacrylate, polystyrene, polyester, polyolefin, epoxy resin, melamine resin). On the surface of various substrates such as triethylenesulfonyl cellulose resin, polyethylene terephthalate, ABS resin, AS resin, raw spinel resin, etc., metal, wood, paper, glass, slate, etc. Hardening to form a film, for example, for plastic optical parts, touch panels, film-type liquid crystal elements, plastic containers, bed materials for building interior materials, wall materials, artificial marble, etc. to prevent scratches (scratches) or to prevent contamination Protective coating material; anti-reflection film for film-type liquid crystal elements, touch panels, plastic optical parts, etc.; adhesives and sealing materials for various substrates; adhesive materials for printing inks, etc., especially suitable for forming antistatic Functional composition of the antireflective film. Further, when a photocurable composition containing conductive fine particles of high refractive index fine particles is blended, it is particularly preferably used for forming a transparent conductive film having a high refractive index.

將含導電性微粒子之光硬化性組成物塗佈或印刷於基材時,可以例如輥塗佈、旋轉塗佈、篩網印刷等之方法進行。視其所需,進行加熱,使分散媒(溶劑)蒸發,使塗膜乾燥,然後,照射活性能量線(紫外線或電子線)。活性能量線源可使用低壓水銀燈、高壓水銀燈、金屬鹵素化燈、氙氣燈、準分子雷射、色素雷射等之紫外線源,及電子線加速裝置。活性能量線之照射量,以紫外線時為50~3000mJ/cm2,電子線時為0.2~1000μC/cm2之範圍內為宜。藉由該活性能量線照射,使上述活性能量線硬化性化合物聚合,且形成以樹脂結合導電性微粒子之膜。一般而言,該膜之膜厚以0.1~10.0μm之範圍內較佳。When the photocurable composition containing conductive fine particles is applied or printed on a substrate, it can be carried out, for example, by a method such as roll coating, spin coating, or screen printing. Heating is carried out as needed, the dispersion medium (solvent) is evaporated, the coating film is dried, and then the active energy ray (ultraviolet light or electron beam) is irradiated. The active energy source may be a low-pressure mercury lamp, a high-pressure mercury lamp, a metal halogen lamp, a xenon lamp, an excimer laser, a pigment laser, or the like, and an electron beam acceleration device. The irradiation amount of the active energy ray is preferably in the range of 50 to 3000 mJ/cm 2 in the case of ultraviolet rays and 0.2 to 1000 μC/cm 2 in the case of the electron beam. The active energy ray-curable compound is polymerized by irradiation with the active energy ray to form a film in which conductive fine particles are bonded by a resin. In general, the film thickness of the film is preferably in the range of 0.1 to 10.0 μm.

使以本發明之導電性微粒子分散液所調製的含導電性微粒子之光硬化性組成物硬化所得的本發明之含導電性微粒子的硬化膜,導電性微粒子均勻地分散於硬化膜內,可控制折射率、透明高、霾度低,具體而言折射率為1.45~1.90、光透過率為75%以上、霾度為2.0%以下,且表面電阻值為1012Ω/□以下。The conductive fine particle-containing cured film of the present invention obtained by curing the photocurable composition containing conductive fine particles prepared by the conductive fine particle dispersion of the present invention, the conductive fine particles are uniformly dispersed in the cured film, and can be controlled The refractive index, the transparency is high, and the twist is low. Specifically, the refractive index is 1.45 to 1.90, the light transmittance is 75% or more, the twist is 2.0% or less, and the surface resistance is 10 12 Ω/□ or less.

而且,於本發明中,使企求高折射率特性之透明導電膜形成用之含導電性微粒子的組成物硬化所得的本發明透明導電膜,在透明導電膜內均勻地分散高折射率微粒子及導電性微粒子,可控制折射率,且折射率高、透明性高、霾度低,具體而言折射率為1.55~1.90、光透過率為85%以上、霾度為1.5%以下,且表面電阻值為1012Ω/□以下。為控制折射率時,可調整高折射率微粒子及導電性微粒子之量與活性能量線硬化性化合物之量的比例。透明導電膜可使用於導電性防止反射材料或顯示裝置之顯示面等。Further, in the present invention, the transparent conductive film of the present invention obtained by curing the composition containing conductive fine particles for forming a transparent conductive film having high refractive index characteristics uniformly disperses high refractive index fine particles and conductive in the transparent conductive film. The fine particles can control the refractive index, have a high refractive index, have high transparency, and have low twist. Specifically, the refractive index is 1.55 to 1.90, the light transmittance is 85% or more, the twist is 1.5% or less, and the surface resistance value is It is 10 12 Ω/□ or less. In order to control the refractive index, the ratio of the amount of the high refractive index fine particles and the conductive fine particles to the amount of the active energy ray-curable compound can be adjusted. The transparent conductive film can be used for a conductive anti-reflective material or a display surface of a display device or the like.

於下述中,藉由實施例及比較例具體地說明本發明。而且,於實施例及比較例中,「份」全部為「質量份」。In the following, the invention will be specifically described by way of examples and comparative examples. Moreover, in the examples and comparative examples, "parts" are all "parts by mass".

[實施例][Examples]

[實施例1~5及比較例1~2][Examples 1 to 5 and Comparative Examples 1 and 2]

實施例1~5及比較例1~2所使用的成分,如下所述。The components used in Examples 1 to 5 and Comparative Examples 1 and 2 were as follows.

<導電性微粒子><Electroconductive microparticles>

ATO(折射率2.0、體積電阻值10Ω‧cm、一次粒徑0.05μm)ATO (refractive index 2.0, volume resistance value 10 Ω ‧ cm, primary particle diameter 0.05 μm)

ITO(折射率2.0、體積電阻值0.02Ω‧cm、一次粒徑0.04μm)ITO (refractive index 2.0, volume resistivity 0.02 Ω ‧ cm, primary particle size 0.04 μm)

氧化錫(折射率2.0、體積電阻值100Ω‧cm、一次粒徑0.06μm)Tin oxide (refractive index 2.0, volume resistance 100Ω‧cm, primary particle size 0.06μm)

氧化鋅(折射率1.95、體積電阻值100Ω‧cm、一次粒徑0.06μm)Zinc oxide (refractive index 1.95, volume resistance 100Ω‧cm, primary particle size 0.06μm)

<無機微粒子><Inorganic microparticles>

氧化鋁(折射率1.76、一次粒徑0.04μm)Alumina (refractive index 1.76, primary particle size 0.04 μm)

<金屬錯合物><metal complex>

乙醯基乙酸鋯[Zr(C5H7O2)4]Zirconium acetylacetate [Zr(C 5 H 7 O 2 ) 4 ]

乙醯基乙酸鈦[Ti(C5H7O2)4]Titanium acetate acetate [Ti(C 5 H 7 O 2 ) 4 ]

乙醯基乙酸鋅[Zn(C5H7O2)2]Zinc acetylacetate [Zn(C 5 H 7 O 2 ) 2 ]

雙乙醯基乙酸二丁基錫[(C4H9)2Sn(C5H7O2)2]Dibutyltin diacetate [(C 4 H 9 ) 2 Sn(C 5 H 7 O 2 ) 2 ]

<分散助劑><Dispersing Aid>

BYK(股)製、BYK-142BYK (share) system, BYK-142

<活性能量線硬化性化合物><Active energy ray-curable compound>

日本化藥(股)製、KAYARAD DPHANippon Chemical Co., Ltd., KAYARAD DPHA

<光聚合引發劑><Photopolymerization initiator>

Chiba‧Speciality‧Chemicals(股)製、IRGACURE 184Chiba‧Speciality‧Chemicals, IRGACURE 184

<螯合劑><chelating agent>

Daicel Chemical Industry(股)製、乙醯基丙酮Daicel Chemical Industry, acetonitrile

[實施例1][Example 1]

在容器內以相對於100份氧化錫,全量加入20份之乙醯基乙酸鋯、250份之甲基乙酮及400份之玻璃珠之量,以手動混合器進行混練3小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入43份之DPHA、2份之IRGACURE 184及65份之甲基乙酮,製得光硬化性組成物。使用棒塗佈器,將該光硬化性組成物塗佈於膜厚100μm之PET薄膜(東洋紡(股)製A4100)上,使有機溶劑蒸發後,在空氣中使用高壓水銀燈照射300mJ/cm2之光,製作厚度3μm之透明導電膜。膜之製作係於光硬化性組成物後及6個月後進行。Into the vessel, 20 parts of zirconium ethoxide, 250 parts of methyl ethyl ketone and 400 parts of glass beads were added in total with respect to 100 parts of tin oxide, and kneaded in a hand mixer for 3 hours. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 43 parts of DPHA, 2 parts of IRGACURE 184 and 65 parts of methyl ethyl ketone were added to prepare a photocurable composition. The photocurable composition was applied onto a PET film (A4100, manufactured by Toyobo Co., Ltd.) having a thickness of 100 μm using a bar coater, and the organic solvent was evaporated, and then irradiated with 300 gJ/cm 2 in a high-pressure mercury lamp in the air. Light, a transparent conductive film having a thickness of 3 μm was produced. The film was produced after the photocurable composition and after 6 months.

[實施例2][Embodiment 2]

在容器內以相對於100份ATO,全量加入10份之乙醯基乙酸鈦、10份之BYK-142、250份之2-丁醇及400份之玻璃珠之量,以手動混合器進行混練3小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入43份之DPHA、2份之IRGACURE 184及65份之2-丁醇,製得光硬化性組成物。然後,藉由與實施例1相同的方法,製作厚度3μm之透明導電膜。Adding 10 parts of titanium acetoxyacetate, 10 parts of BYK-142, 250 parts of 2-butanol and 400 parts of glass beads in a total amount relative to 100 parts of ATO in a container, and mixing by hand mixer 3 hours. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 43 parts of DPHA, 2 parts of IRGACURE 184 and 65 parts of 2-butanol were added to prepare a photocurable composition. Then, a transparent conductive film having a thickness of 3 μm was produced by the same method as in Example 1.

[實施例3][Example 3]

在容器內以相對於100份ATO,全量加入10份之雙乙醯基乙酸二丁基錫、25份之2-丁醇及400份之玻璃珠之量,以手動混合器進行混練3小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入43份之DPHA、2份之IRGACURE 184及65份之2-丁醇,製得光硬化性組成物。然後,藉由與實施例1相同的方法,製作厚度3μm之透明導電膜。The amount of 10 parts of dibutyltin bisacetate, 25 parts of 2-butanol, and 400 parts of glass beads was added in a total amount to 100 parts of ATO in a container, and kneaded in a hand mixer for 3 hours. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 43 parts of DPHA, 2 parts of IRGACURE 184 and 65 parts of 2-butanol were added to prepare a photocurable composition. Then, a transparent conductive film having a thickness of 3 μm was produced by the same method as in Example 1.

[實施例4][Example 4]

在容器內以相對於50份ATO,全量加入50份之ITO、10份之雙乙醯基乙酸二丁基錫、250份之2-丁醇及400份之玻璃珠之量,以手動混合器進行混練3小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入43份之DPHA、2份之IRGACURE 184及65份之2-丁醇,製得光硬化性組成物。然後,藉由與實施例1相同的方法,製作厚度3μm之透明導電膜。Add 50 parts of ITO, 10 parts of dibutyltin bisacetate, 250 parts of 2-butanol and 400 parts of glass beads to 50 parts of ATO in a container, and mix by hand mixer. 3 hours. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 43 parts of DPHA, 2 parts of IRGACURE 184 and 65 parts of 2-butanol were added to prepare a photocurable composition. Then, a transparent conductive film having a thickness of 3 μm was produced by the same method as in Example 1.

[實施例5][Example 5]

在容器內以相對於60份ITO,全量加入40份之氧化鋁、25份之雙乙醯基乙酸二丁基錫、250份之2-丁醇及400份之玻璃珠之量,以手動混合器進行混練3小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入67份之DPHA、6.7份之IRGACURE 184及170份之2-丁醇,製得光硬化性組成物。然後,藉由與實施例1相同的方法,製作厚度3μm之透明導電膜。In a container, 40 parts of alumina, 25 parts of dibutyltin bisacetate, 250 parts of 2-butanol, and 400 parts of glass beads were added in a total amount with respect to 60 parts of ITO, and the mixture was carried out by hand mixer. Mix for 3 hours. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 67 parts of DPHA, 6.7 parts of IRGACURE 184 and 170 parts of 2-butanol were added to prepare a photocurable composition. Then, a transparent conductive film having a thickness of 3 μm was produced by the same method as in Example 1.

[比較例1][Comparative Example 1]

在容器內以相對於100份之氧化錫,全量加入20份之BYK-142、250份之2-丁醇及400份之玻璃珠之量,以手動混合器進行混練3小時。於混練中分散液有增黏情形。The amount of BYK-142, 250 parts of 2-butanol and 400 parts of glass beads was added in a total amount of 100 parts of tin oxide in a container, and kneaded in a hand mixer for 3 hours. The dispersion has a viscosity-increasing condition during the mixing.

[比較例2][Comparative Example 2]

除在容器內添加20份之乙醯基丙酮取代20份之乙醯基乙酸鈦外,藉由與實施例2相同的方法,製作厚度3μm之透明導電膜。A transparent conductive film having a thickness of 3 μm was produced in the same manner as in Example 2 except that 20 parts of acetalacetone was added in place of 20 parts of titanium acetoxyacetate.

<評估方法><Evaluation method>

(1) 無機微粒子之中徑(1) The diameter of inorganic particles

使分散於以實施例及比較例所製作的分散液及光硬化組成物之無機微粒子的中徑,使用日機裝(股)製Microtrac粒度分布計,於製作後、3個月後(保管於40℃)、6個月後(保管於40℃)以下述條件進行測定。The median diameter of the inorganic fine particles dispersed in the dispersion liquid and the photocurable composition produced in the examples and the comparative examples was measured by using a Microtrac particle size distribution meter manufactured by Nikkiso Co., Ltd., three months after the production (stored in After 40 months, and after 6 months (stored at 40 ° C), the measurement was carried out under the following conditions.

(2) 透明導電膜之透過率、霾度(2) Transmittance and twist of transparent conductive film

有關實施例及比較例所得的透明導電膜,以日本電色工業(股)製NDH5000進行測定透過率及霾度。測定值係含基材之值。The transparent conductive films obtained in the examples and the comparative examples were measured for transmittance and twist by NDH5000 manufactured by Nippon Denshoku Industries Co., Ltd. The measured value is the value of the substrate.

(3) 表面電阻值(3) Surface resistance value

有關實施例及比較例所得的透明導電膜,以三菱化學股份有限公司製之Hiresta IP MCP-HT260進行測定。The transparent conductive film obtained in the examples and the comparative examples was measured by Hiresta IP MCP-HT260 manufactured by Mitsubishi Chemical Corporation.

(4) 折射率(4) Refractive index

有關實施例及比較例所得的透明導電膜,以Atago製阿貝(Abbe)折射計DRM4(20℃)進行測定。The transparent conductive films obtained in the examples and the comparative examples were measured by an Abbe refractometer DRM4 (20 ° C) manufactured by Atago.

(5) 金屬製容器之腐蝕狀態(5) Corrosion status of metal containers

將實施例及比較例所製作的分散液加入不銹鋼容器(SUS304;Fe-Cr-Ni系不銹鋼製)中,以目視評估靜置1個月後之不銹鋼容器的腐蝕狀態。The dispersion prepared in the examples and the comparative examples was placed in a stainless steel container (SUS304; Fe-Cr-Ni-based stainless steel), and the corrosion state of the stainless steel container after standing for one month was visually evaluated.

上述各測定結果、評估結果與各組成物之組成,皆如表1所示。The above measurement results, evaluation results, and composition of each composition are shown in Table 1.

由表1所示之數據可知,含有金屬錯合物時(實施例1~5),與是否含有分散助劑無關,可得具有優異的保存安定性之分散液,即使保管於金屬製容器時,仍沒有金屬容器被腐蝕的狀態。另外,塗佈使用實施例1~5所得的分散液之光硬化性組成物所得的透明導電膜,折射率為1.45~1.90、透過率為75%、霾度為2.0以下、表面電阻值為1012Ω/□以下、具有抗靜電機能、高透明性且導電性優異。沒有添加金屬錯合物時(比較例1),分散困難而無法製得均勻的分散液。而且,使添加乙醯基丙酮、經分散的分散液(比較例2)保存於金屬製容器時,確認有顯著的容器之腐蝕狀態。As is clear from the data shown in Table 1, when the metal complex is contained (Examples 1 to 5), regardless of whether or not the dispersing aid is contained, a dispersion having excellent storage stability can be obtained, even when stored in a metal container. There is still no state in which the metal container is corroded. Further, the transparent conductive film obtained by applying the photocurable composition of the dispersion liquids obtained in Examples 1 to 5 had a refractive index of 1.45 to 1.90, a transmittance of 75%, a twist of 2.0 or less, and a surface resistance value of 10. 12 Ω/□ or less, it has antistatic function, high transparency, and excellent electrical conductivity. When the metal complex was not added (Comparative Example 1), the dispersion was difficult and a uniform dispersion could not be obtained. Further, when the ethylene glycol was added and the dispersed dispersion (Comparative Example 2) was stored in a metal container, it was confirmed that there was a significant corrosion state of the container.

於下述中,藉由實施例及參考例,具體說明本發明被要求高折射率特性的用途之導電性微粒子分散液、透明導電膜形成用之含導電性微粒子的組成物及透明導電膜。而且,於實施例及比較例中,「份」全部為「質量份」。In the following, the conductive fine particle dispersion liquid for which the high refractive index property is required, the conductive fine particle-containing composition for forming a transparent conductive film, and the transparent conductive film of the present invention will be specifically described by way of examples and reference examples. Moreover, in the examples and comparative examples, "parts" are all "parts by mass".

[實施例6~11及參考例1~6][Examples 6 to 11 and Reference Examples 1 to 6]

實施例6~11及參考例1~6中使用的成分,如下所述。The components used in Examples 6 to 11 and Reference Examples 1 to 6 are as follows.

<高折射率微粒子><High refractive index microparticles>

氧化鋯(折射率2.2、一次粒徑0.02μm)Zirconia (refractive index 2.2, primary particle size 0.02 μm)

氧化鈦(折射率2.76、一次粒徑0.02μm)Titanium oxide (refractive index 2.76, primary particle size 0.02 μm)

<導電性微粒子><Electroconductive microparticles>

ATO(折射率2.0、體積電阻值10Ω‧cm、一次粒徑0.06μm)ATO (refractive index 2.0, volume resistance value 10 Ω ‧ cm, primary particle diameter 0.06 μm)

氧化錫(折射率2.0、體積電阻值100Ω‧cm、一次粒徑0.06μm)Tin oxide (refractive index 2.0, volume resistance 100Ω‧cm, primary particle size 0.06μm)

氧化鋅(折射率1.95、體積電阻值100Ω‧cm、一次粒徑0.06μm)Zinc oxide (refractive index 1.95, volume resistance 100Ω‧cm, primary particle size 0.06μm)

<金屬錯合物><metal complex>

乙醯基乙酸鋯[Zr(C5H7O2)4]Zirconium acetylacetate [Zr(C 5 H 7 O 2 ) 4 ]

乙醯基乙酸鈦[Ti(C5H7O2)4]Titanium acetate acetate [Ti(C 5 H 7 O 2 ) 4 ]

乙醯基乙酸鋁[Al(C5H7O2)3]Aluminum acetonitrile acetate [Al(C 5 H 7 O 2 ) 3 ]

乙醯基乙酸鋅[Zn(C5H7O2)2]Zinc acetylacetate [Zn(C 5 H 7 O 2 ) 2 ]

乙醯基乙酸銦[In(C5H7O2)3]Indium acetate indium [In(C 5 H 7 O 2 ) 3 ]

雙乙醯基乙酸二丁基錫[(C4H9)2Sn(C5H7O2)2]Dibutyltin diacetate [(C 4 H 9 ) 2 Sn(C 5 H 7 O 2 ) 2 ]

單乙醯基乙酸三丁氧基鋯[(C4H9O)3Zr(C5H7O2)2]Zirconium tributoxyacetate [(C 4 H 9 O) 3 Zr(C 5 H 7 O 2 ) 2 ]

<分散助劑><Dispersing Aid>

BYK(股)製、BYK-142BYK (share) system, BYK-142

<活性能量線硬化性化合物><Active energy ray-curable compound>

日本化藥(股)製、KAYARAD DPHANippon Chemical Co., Ltd., KAYARAD DPHA

<光聚合引發劑><Photopolymerization initiator>

Chiba‧Speciality‧Chemicals(股)製、IRGACURE 184Chiba‧Speciality‧Chemicals, IRGACURE 184

<螯合劑><chelating agent>

Daicel Chemical Industry(股)製、乙醯基丙酮Daicel Chemical Industry, acetonitrile

[實施例6][Embodiment 6]

在容器內以相對於100份氧化鋯,全量加入100份氧化錫、40份之乙醯基乙酸鋯、500份之2-丁醇及800份之玻璃珠之量,以手動混合器進行混練7小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入86份之DPHA、4.3份之IRGACURE 184及130份之2-丁醇,製得光硬化性組成物。使用輥塗佈器,將該光硬化性組成物塗佈於膜厚100μm之PET薄膜(東洋紡(股)製A4100)上,使有機溶劑蒸發後,在空氣中使用高壓水銀燈照射300mJ/cm2之光,製作厚度3μm之透明導電膜。膜之製作係於光硬化性組成物後及6個月後進行。Adding 100 parts of tin oxide, 40 parts of zirconium ethoxide, 500 parts of 2-butanol and 800 parts of glass beads to 100 parts of zirconia in a container, and mixing by hand mixer 7 hour. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 86 parts of DPHA, 4.3 parts of IRGACURE 184 and 130 parts of 2-butanol were placed to prepare a photocurable composition. The photocurable composition was applied onto a PET film (A4100, manufactured by Toyobo Co., Ltd.) having a thickness of 100 μm using a roll coater, and the organic solvent was evaporated, and then irradiated with 300 mJ/cm 2 in a high-pressure mercury lamp in the air. Light, a transparent conductive film having a thickness of 3 μm was produced. The film was produced after the photocurable composition and after 6 months.

[實施例7][Embodiment 7]

在容器內以相對於100份氧化鈦,全量加入43份之ATO、0.6份之乙醯基乙酸鈦、14.3份之BYK-142、500份之2-丁醇及800份之玻璃珠之量加入全部成分,以手動混合器進行混練7小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入143份之DPHA、7.2份之IRGACURE 184及160份之2-丁醇,製得光硬化性組成物。然後,藉由與實施例6相同的方法,製作厚度3μm之透明導電膜。Adding 43 parts of ATO, 0.6 parts of titanium acetylate, 14.3 parts of BYK-142, 500 parts of 2-butanol and 800 parts of glass beads to 100 parts of titanium oxide in a total amount. All ingredients were mixed in a manual mixer for 7 hours. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 143 parts of DPHA, 7.2 parts of IRGACURE 184 and 160 parts of 2-butanol were added to prepare a photocurable composition. Then, a transparent conductive film having a thickness of 3 μm was produced by the same method as in Example 6.

[實施例8][Embodiment 8]

在容器內以相對於100份ATO,全量加入233份之氧化錫、33份之乙醯基乙酸鋁、880份之2-丁醇及800份之玻璃珠之量,以手動混合器進行混練7小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入143份之DPHA、7.2份之IRGACURE 184及160份之2-丁醇,製得光硬化性組成物。然後,藉由與實施例6相同的方法,製作厚度3μm之透明導電膜。Adding 233 parts of tin oxide, 33 parts of aluminum acetoxyacetate, 880 parts of 2-butanol and 800 parts of glass beads to 100 parts of ATO in a container, and mixing by hand mixer 7 hour. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 143 parts of DPHA, 7.2 parts of IRGACURE 184 and 160 parts of 2-butanol were added to prepare a photocurable composition. Then, a transparent conductive film having a thickness of 3 μm was produced by the same method as in Example 6.

[實施例9][Embodiment 9]

在容器內以相對於100份氧化鈦,全量加入100份之氧化鋅、20份之乙醯基乙酸鋅、500份之2-丁醇及800份之玻璃珠之量,以手動混合器進行混練7小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入86份之DPHA、4.3份之IRGACURE 184及130份之2-丁醇,製得光硬化性組成物。然後,藉由與實施例6相同的方法,製作厚度3μm之透明導電膜。Adding 100 parts of zinc oxide, 20 parts of zinc acetoxyacetate, 500 parts of 2-butanol and 800 parts of glass beads to 100 parts of titanium oxide in a container, and mixing by hand mixer 7 hours. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 86 parts of DPHA, 4.3 parts of IRGACURE 184 and 130 parts of 2-butanol were placed to prepare a photocurable composition. Then, a transparent conductive film having a thickness of 3 μm was produced by the same method as in Example 6.

[實施例10][Embodiment 10]

除添加20份之雙乙醯基乙酸二丁基錫取代20份之乙醯基乙酸鋅外,藉由與實施例9相同的處理,製作厚度為3μm之透明導電膜。A transparent conductive film having a thickness of 3 μm was produced by the same treatment as in Example 9 except that 20 parts of dibutyltin diacetate was substituted for 20 parts of zinc acetoxyacetate.

[實施例11][Example 11]

除添加20份之乙醯基乙酸銦取代20份之乙醯基乙酸鋅外,藉由與實施例9相同的處理,製作厚度為3μm之透明導電膜。A transparent conductive film having a thickness of 3 μm was produced by the same treatment as in Example 9 except that 20 parts of indium phthalate was added in place of 20 parts of zinc acetoxyacetate.

[參考例1][Reference Example 1]

在容器內以相對於100份氧化鋯,全量加入100份之氧化錫、20份之BYK-142、60份之2-丁醇及800份之玻璃珠之量,以手動混合器進行混練7小時。於混練中,分散液產生增黏情形。Add 100 parts of tin oxide, 20 parts of BYK-142, 60 parts of 2-butanol and 800 parts of glass beads to 100 parts of zirconia in a total amount, and mix for 7 hours in a hand mixer. . In the kneading, the dispersion produces a viscosity-increasing condition.

[參考例2][Reference Example 2]

除添加6份之乙醯基丙酮取代6份之乙醯基乙酸鈦外,藉由與實施例7相同的處理,製作厚度為3μm之透明導電膜。A transparent conductive film having a thickness of 3 μm was produced by the same treatment as in Example 7 except that 6 parts of acetaminoacetone was used instead of 6 parts of titanium acetylate.

[參考例3][Reference Example 3]

在容器內全量加入100份氧化錫、10份之乙醯基乙酸鈦、600份之2-丁醇及800份之玻璃珠之量,以手動混合器進行混練7小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入150份之DPHA、5份之IRGACURE 184及100份之2-丁醇,製得光硬化性組成物。然後,藉由與實施例6相同的方法,製作厚度3μm之透明導電膜。The amount of 100 parts of tin oxide, 10 parts of titanium ethoxide, 600 parts of 2-butanol, and 800 parts of glass beads was added in a total amount in a container, and kneaded in a hand mixer for 7 hours. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 150 parts of DPHA, 5 parts of IRGACURE 184 and 100 parts of 2-butanol were added to prepare a photocurable composition. Then, a transparent conductive film having a thickness of 3 μm was produced by the same method as in Example 6.

[參考例4][Reference Example 4]

在容器內全量加入100份氧化鋯、10份之乙醯基乙酸鋯、270份之2-丁醇及400份之玻璃珠之量加入全部成分,以手動混合器進行混練7小時。於混練後,取出玻璃珠,製得分散液。在該分散液中加入43份之DPHA、2.2份之IRGACURE 184及60份之2-丁醇,製得光硬化性組成物。然後,藉由與實施例6相同的方法,製作厚度3μm之透明導電膜。The whole ingredients were added in an amount of 100 parts of zirconia, 10 parts of zirconium ethoxide, 270 parts of 2-butanol, and 400 parts of glass beads in a container, and kneaded in a hand mixer for 7 hours. After the kneading, the glass beads were taken out to prepare a dispersion. To the dispersion, 43 parts of DPHA, 2.2 parts of IRGACURE 184 and 60 parts of 2-butanol were added to prepare a photocurable composition. Then, a transparent conductive film having a thickness of 3 μm was produced by the same method as in Example 6.

[參考例5][Reference Example 5]

除添加40份之單乙醯基乙酸三丁氧基鋯取代40份之乙醯基乙酸鋯外,藉由與實施例6相同的處理,製作厚度為3μm之透明導電膜。A transparent conductive film having a thickness of 3 μm was produced by the same treatment as in Example 6 except that 40 parts of zirconium monobutoxyacetate was added in place of 40 parts of zirconium ethoxide.

[參考例6][Reference Example 6]

除添加40份之單乙醯基乙酸三丁氧基鋯取代40份之乙醯基乙酸鋯,添加90份之水與410份之2-丁醇取代500份之2-丁醇外,藉由與實施例6相同的處理,製作厚度為3μm之透明導電膜。In addition to adding 40 parts of zirconium monobutoxyacetate to replace 40 parts of zirconium ethoxide, by adding 90 parts of water and 410 parts of 2-butanol in place of 500 parts of 2-butanol, The same treatment as in Example 6 was carried out to prepare a transparent conductive film having a thickness of 3 μm.

<評估方法><Evaluation method>

另外,無機微粒子及高折射率微粒子之中徑、透明導電膜之透過率、霾度、表面電阻值、折射率及金屬製容器之腐蝕狀態,與實施例1~6相同地進行。Further, the diameter of the inorganic fine particles and the high refractive index fine particles, the transmittance of the transparent conductive film, the twist, the surface resistance value, the refractive index, and the corrosion state of the metal container were carried out in the same manner as in Examples 1 to 6.

上述之各測定結果、評估結果,與各組成物之組成,皆如表2所示。The above measurement results, evaluation results, and composition of each composition are shown in Table 2.

由表2所示之數據可知,含有金屬錯合物時(實施例6~11),與是否含有分散助劑無關,可得具有優異的保存安定性的分散液,即使保管於金屬製容器時,仍沒有金屬製容器被腐蝕的狀態。另外,塗佈使用實施例6~11所得的分散液之光硬化性組成物所得的透明導電膜,折射率為1.55~1.90、透過率為85%以上、霾度為1.5%以下、表面電阻值為1012Ω/□以下、具有高折射率、高透明性且導電性優異。沒有添加金屬錯合物時(參考例1),分散困難而無法製得均勻的分散液。而且,使添加乙醯基丙酮、經分散的分散液(參考例2)保存於金屬製容器時,確認有顯著的容器腐蝕狀態。沒有添加高折射率微粒子時(參考例3),無法製得滿足高折射率、高透明性及導電性等全部特性之膜。沒有添加導電性微粒子時(參考例4),確認膜不具導電性。含有烷氧化物作為金屬錯合物時(參考例5及6),粒徑經時變大,膜特性亦大為變化。而且,含有很多水時(參考例6),確認粒徑顯著增大。As is clear from the data shown in Table 2, when the metal complex is contained (Examples 6 to 11), regardless of whether or not the dispersing aid is contained, a dispersion having excellent storage stability can be obtained, even when stored in a metal container. There is still no state in which the metal container is corroded. Further, the transparent conductive film obtained by applying the photocurable composition of the dispersion liquids obtained in Examples 6 to 11 had a refractive index of 1.55 to 1.90, a transmittance of 85% or more, a twist of 1.5% or less, and a surface resistance value. It is 10 12 Ω/□ or less, has high refractive index, high transparency, and is excellent in electrical conductivity. When no metal complex was added (Reference Example 1), dispersion was difficult and a uniform dispersion could not be obtained. Further, when the ethyl isopropyl acetal and the dispersed dispersion (Reference Example 2) were added to a metal container, it was confirmed that there was a significant container corrosion state. When the high refractive index fine particles were not added (Reference Example 3), it was not possible to obtain a film satisfying all the characteristics such as high refractive index, high transparency, and electrical conductivity. When no conductive fine particles were added (Reference Example 4), it was confirmed that the film was not electrically conductive. When an alkoxide is contained as a metal complex (Reference Examples 5 and 6), the particle diameter becomes large with time, and the film characteristics also largely change. Further, when a large amount of water was contained (Reference Example 6), it was confirmed that the particle diameter was remarkably increased.

Claims (28)

一種導電性微粒子分散液,其特徵為由導電性微粒子、金屬錯合物及分散媒所成,其中相對於每100質量份導電性微粒子,金屬錯合物之含量為2~45質量份,分散媒之含量為40~1000質量份。 A conductive fine particle dispersion liquid characterized by comprising conductive fine particles, a metal complex, and a dispersion medium, wherein the content of the metal complex is 2 to 45 parts by mass per 100 parts by mass of the conductive fine particles, and is dispersed. The content of the medium is 40 to 1000 parts by mass. 如申請專利範圍第1項之導電性微粒子分散液,其中上述金屬錯合物不含烷氧化物。 The conductive fine particle dispersion according to claim 1, wherein the metal complex does not contain an alkoxide. 如申請專利範圍第1或2項之導電性微粒子分散液,其中導電性微粒子係選自ITO、ATO、氧化錫、氧化鋅、氧化銦、銻酸鋅及五氧化銻所成群中至少1種的金屬氧化物。 The conductive fine particle dispersion according to claim 1 or 2, wherein the conductive fine particles are at least one selected from the group consisting of ITO, ATO, tin oxide, zinc oxide, indium oxide, zinc antimonate, and antimony pentoxide. Metal oxides. 如申請專利範圍第1或2項之導電性微粒子分散液,其中金屬錯合物係由選自鋯、鈦、鉻、錳、鐵、鈷、鎳、銅、釩、鋁、鋅、銦、錫及鉑所成群之金屬,與選自β-二酮所成群的配位子所成。 The conductive fine particle dispersion according to claim 1 or 2, wherein the metal complex is selected from the group consisting of zirconium, titanium, chromium, manganese, iron, cobalt, nickel, copper, vanadium, aluminum, zinc, indium, and tin. And a group of metals in which platinum is formed, and a ligand selected from the group consisting of β-diketones. 如申請專利範圍第1或2項之導電性微粒子分散液,其中金屬錯合物係由選自鋯、鈦、鋁、鋅、銦及錫所成群的金屬,與選自三甲基乙醯基三氟化丙酮、乙醯基丙酮、三氟化乙醯基丙酮及六氟化乙醯基丙酮所成群的配位子所成。 The conductive fine particle dispersion according to claim 1 or 2, wherein the metal complex is a metal selected from the group consisting of zirconium, titanium, aluminum, zinc, indium, and tin, and is selected from the group consisting of trimethyl ethane. A ligand composed of a group of trifluoroacetic acid acetone, ethyl acetonylacetone, ethylene acetonide fluoride, and hexamethylene hexafluoroacetone. 一種含導電性微粒子之光硬化性組成物,其特徵為由導電性微粒子、金屬錯合物、活性能量線硬化性化合物、光聚合引發劑及分散媒所成,其中相對於每100質量份導電性微粒子,金屬錯合物之含量為2~45質量份,分 散媒之含量為40~1000質量份,活性能量線硬化性化合物之含量為10~1000質量份,且相對於每100質量份活性能量線硬化性化合物,光聚合引發劑之含量為0.1~20質量份。 A photocurable composition containing conductive fine particles, which is characterized in that it is composed of conductive fine particles, a metal complex, an active energy ray-curable compound, a photopolymerization initiator, and a dispersion medium, and is electrically conductive per 100 parts by mass. The content of the fine particles and the metal complex is 2 to 45 parts by mass. The content of the dispersing medium is 40 to 1000 parts by mass, the content of the active energy ray-curable compound is 10 to 1000 parts by mass, and the content of the photopolymerization initiator is 0.1 to 20 per 100 parts by mass of the active energy ray-curable compound. Parts by mass. 如申請專利範圍第6項之含導電性微粒子之光硬化性組成物,其中上述金屬錯合物不含烷氧化物。 The photocurable composition containing conductive fine particles according to claim 6, wherein the metal complex does not contain an alkoxide. 如申請專利範圍第6或7項之含導電性微粒子之光硬化性組成物,其中導電性微粒子為選自ITO、ATO、氧化錫、氧化鋅、氧化銦、銻酸鋅及五氧化銻所成群中至少一種的金屬氧化物。 The photocurable composition containing conductive fine particles according to claim 6 or 7, wherein the conductive fine particles are selected from the group consisting of ITO, ATO, tin oxide, zinc oxide, indium oxide, zinc antimonate and antimony pentoxide. At least one metal oxide in the group. 如申請專利範圍第6或7項之含導電性微粒子之光硬化性組成物,其中金屬錯合物為由選自鋯、鈦、鉻、錳、鐵、鈷、鎳、銅、釩、鋁、鋅、銦、錫及鉑所成群之金屬,與選自β-二酮所成群的配位子所成。 The photocurable composition containing conductive fine particles according to claim 6 or 7, wherein the metal complex is selected from the group consisting of zirconium, titanium, chromium, manganese, iron, cobalt, nickel, copper, vanadium, aluminum, A group of metals in which zinc, indium, tin, and platinum are grouped with a ligand selected from the group consisting of β-diketones. 如申請專利範圍第6或7項之含導電性微粒子之光硬化性組成物,其中金屬錯合物係由選自鋯、鈦、鋁、鋅、銦及錫所成群的金屬,與選自三甲基乙醯基三氟化丙酮、乙醯基丙酮、三氟化乙醯基丙酮及六氟化乙醯基丙酮所成群的配位子所成。 The photocurable composition containing conductive fine particles according to claim 6 or 7, wherein the metal complex is a metal selected from the group consisting of zirconium, titanium, aluminum, zinc, indium and tin, and is selected from the group consisting of A group of ligands consisting of trimethylacetamidofluoride, acetone, etidylacetone, etidylacetone trifluoride and etidinyl hexafluoride. 一種含導電性微粒子之硬化膜,其特徵為在基材上塗佈或印刷如申請專利範圍第6或7項之含導電性微粒子之光硬化性組成物,予以硬化所得者。 A cured film containing conductive fine particles, which is characterized in that a photocurable composition containing conductive fine particles according to claim 6 or 7 of the patent application is applied or printed on a substrate and cured. 如申請專利範圍第11項之含導電性微粒子之硬化膜,其中折射率為1.45~1.90,光透過率為75%以上, 霾度為2.0%以下,且表面電阻值為1012Ω/□以下。 A cured film containing conductive fine particles according to claim 11 in which the refractive index is 1.45 to 1.90, the light transmittance is 75% or more, the twist is 2.0% or less, and the surface resistance is 10 12 Ω/□ or less. . 一種導電性防止反射材料,其特徵為在透明樹脂基材具有如申請專利範圍第11或12項之含導電性微粒子之硬化膜。 A conductive anti-reflection material characterized by having a cured film containing conductive fine particles as in the eleventh or twelfth aspect of the patent application. 一種顯示裝置,其特徵為在顯示面具有如申請專利範圍第11或12項之含導電性微粒子之硬化膜。 A display device characterized by having a cured film containing conductive fine particles as in the eleventh or twelfth aspect of the patent application. 一種導電性微粒子分散液,其特徵為由折射率為1.8以上之高折射率微粒子、導電性微粒子、不含烷氧化物之金屬錯合物及分散媒所成,其中相對於每100質量份高折射率微粒子,導電性微粒子之含量為30~900質量份、不含烷氧化物之金屬錯合物之含量為3~450質量份及分散媒之含量為60~9000質量份,且水分為3質量%以下。 A conductive fine particle dispersion liquid characterized by comprising high refractive index fine particles having a refractive index of 1.8 or more, conductive fine particles, a metal complex containing no alkoxide, and a dispersion medium, wherein the content is high per 100 parts by mass. The content of the refractive index fine particles, the conductive fine particles is 30 to 900 parts by mass, the content of the metal complex containing no alkoxide is 3 to 450 parts by mass, and the content of the dispersion medium is 60 to 9000 parts by mass, and the moisture is 3 Below mass%. 如申請專利範圍第15項之導電性微粒子分散液,其中高折射率微粒子為選自氧化鋯、氧化鈦及氧化鈰所成群中至少1種的金屬氧化物。 The conductive fine particle dispersion according to the fifteenth aspect of the invention, wherein the high refractive index fine particles are at least one metal oxide selected from the group consisting of zirconia, titanium oxide and cerium oxide. 如申請專利範圍第15或16項之導電性微粒子分散液,其中導電性微粒子係選自ITO、ATO、氧化錫、氧化鋅、氧化銦、銻酸鋅及五氧化銻所成群中至少1種的金屬氧化物。 The conductive fine particle dispersion according to claim 15 or 16, wherein the conductive fine particles are at least one selected from the group consisting of ITO, ATO, tin oxide, zinc oxide, indium oxide, zinc antimonate, and antimony pentoxide. Metal oxides. 如申請專利範圍第15或16項之導電性微粒子分散液,其中金屬錯合物為由選自鋯、鈦、鉻、錳、鐵、鈷、鎳、銅、釩、鋁、鋅、銦、錫及鉑所成群之金屬,與選自β-二酮所成群的配位子所成。 The conductive fine particle dispersion according to claim 15 or 16, wherein the metal complex is selected from the group consisting of zirconium, titanium, chromium, manganese, iron, cobalt, nickel, copper, vanadium, aluminum, zinc, indium, and tin. And a group of metals in which platinum is formed, and a ligand selected from the group consisting of β-diketones. 如申請專利範圍第15或16項之導電性微粒子分散液,其中金屬錯合物係由選自鋯、鈦、鋁、鋅、銦及錫所成群的金屬,與選自三甲基乙醯基三氟化丙酮、乙醯基丙酮、三氟化乙醯基丙酮及六氟化乙醯基丙酮所成群的配位子所成。 The conductive fine particle dispersion according to claim 15 or 16, wherein the metal complex is a metal selected from the group consisting of zirconium, titanium, aluminum, zinc, indium, and tin, and is selected from the group consisting of trimethyl ethane. A ligand composed of a group of trifluoroacetic acid acetone, ethyl acetonylacetone, ethylene acetonide fluoride, and hexamethylene hexafluoroacetone. 一種透明導電膜形成用之含導電性微粒子之光硬化性組成物,其特徵為由折射率為1.8以上之高折射率微粒子、導電性微粒子、不含烷氧化物之金屬錯合物、活性能量線硬化性化合物、光聚合引發劑及分散媒所成,其中相對於每100質量份高折射率微粒子,導電性微粒子之含量為30~900質量份、不含烷氧化物之金屬錯合物之含量為3~450質量份、分散媒之含量為60~70000質量份及活性能量線硬化性化合物之含量為14~10000質量份,且相對於每100質量份該活性能量線硬化性化合物,光聚合引發劑之含量為0.1~20質量份,且水分為3質量%以下。 A photocurable composition containing conductive fine particles for forming a transparent conductive film, characterized by high refractive index fine particles having a refractive index of 1.8 or more, conductive fine particles, a metal complex containing no alkoxide, and active energy a linear curable compound, a photopolymerization initiator, and a dispersion medium, wherein the content of the conductive fine particles is from 30 to 900 parts by mass per 100 parts by mass of the high refractive index fine particles, and the metal complex containing no alkoxide The content is 3 to 450 parts by mass, the content of the dispersion medium is 60 to 70,000 parts by mass, and the content of the active energy ray-curable compound is 14 to 10,000 parts by mass, and the light is hardened per 100 parts by mass of the active energy ray-curable compound. The content of the polymerization initiator is 0.1 to 20 parts by mass, and the water content is 3% by mass or less. 如申請專利範圍第20項之透明導電膜形成用之含導電性微粒子之光硬化性組成物,其中高折射率微粒子為選自氧化鋯、氧化鈦及氧化鈰所成群中至少1種的金屬氧化物。 The photocurable composition containing conductive fine particles for forming a transparent conductive film according to claim 20, wherein the high refractive index fine particles are at least one selected from the group consisting of zirconia, titanium oxide, and cerium oxide. Oxide. 如申請專利範圍第20或21項之透明導電膜形成用之含導電性微粒子之光硬化性組成物,其中導電性微粒子係選自ITO、ATO、氧化錫、氧化鋅、氧化銦、銻酸鋅及五氧化銻所成群中至少1種以上的金屬氧化物。 The photocurable composition containing conductive fine particles for forming a transparent conductive film according to claim 20 or 21, wherein the conductive fine particles are selected from the group consisting of ITO, ATO, tin oxide, zinc oxide, indium oxide, and zinc antimonate. And at least one metal oxide in the group of pentoxide. 如申請專利範圍第20或21項之透明導電膜形成用之含導電性微粒子之光硬化性組成物,其中金屬錯合物係由選自鋯、鈦、鉻、錳、鐵、鈷、鎳、銅、釩、鋁、鋅、銦、錫及鉑所成群之金屬,與選自β-二酮所成群的配位子所成。 The photocurable composition containing conductive fine particles for forming a transparent conductive film according to claim 20 or 21, wherein the metal complex is selected from the group consisting of zirconium, titanium, chromium, manganese, iron, cobalt, nickel, A metal group of copper, vanadium, aluminum, zinc, indium, tin, and platinum, and a ligand selected from the group consisting of β-diketones. 如申請專利範圍第20或21項之透明導電膜形成用之含導電性微粒子之光硬化性組成物,其中金屬錯合物係由選自鋯、鈦、鋁、鋅、銦及錫所成群的金屬,與選自三甲基乙醯基三氟化丙酮、乙醯基丙酮、三氟化乙醯基丙酮及六氟化乙醯基丙酮所成群的配位子所成。 The photocurable composition containing conductive fine particles for forming a transparent conductive film according to claim 20 or 21, wherein the metal complex is grouped from zirconium, titanium, aluminum, zinc, indium and tin. The metal is formed with a ligand selected from the group consisting of trimethylacetamidofluoride, acetone, acetonylacetone, etidylacetate and hexafluoroacetone. 一種透明導電膜,其特徵為在基材上塗佈或印刷如申請專利範圍第20~24項中任一項之透明導電膜形成用之含導電性微粒子之光硬化性組成物,予以硬化所得者。 A transparent conductive film characterized in that a photocurable composition containing conductive fine particles for forming a transparent conductive film according to any one of claims 20 to 24 is coated or printed on a substrate, and is cured. By. 如申請專利範圍第25項之透明導電膜,其中折射率為1.55~1.90,光透過率為85%以上,霾度為1.5%以下,且表面電阻值為1012Ω/□以下。 The transparent conductive film of claim 25, wherein the refractive index is 1.55 to 1.90, the light transmittance is 85% or more, the twist is 1.5% or less, and the surface resistance is 10 12 Ω/□ or less. 一種導電性防止反射材料,其特徵為在透明樹脂基材具有如申請專利範圍第25或26項之透明導電膜。 A conductive anti-reflective material characterized by having a transparent conductive film as disclosed in claim 25 or 26 on a transparent resin substrate. 一種顯示裝置,其特徵為在顯示面具有如申請專利範圍第25或26項之透明導電膜。 A display device characterized by having a transparent conductive film as disclosed in claim 25 or 26 on the display surface.
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