TWI524111B - Manufacture of liquid crystal panels - Google Patents

Manufacture of liquid crystal panels Download PDF

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TWI524111B
TWI524111B TW103113060A TW103113060A TWI524111B TW I524111 B TWI524111 B TW I524111B TW 103113060 A TW103113060 A TW 103113060A TW 103113060 A TW103113060 A TW 103113060A TW I524111 B TWI524111 B TW I524111B
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liquid crystal
substrate
conductive layer
mother
crystal panel
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TW103113060A
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TW201502651A (en
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Azusa Ikeda
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Japan Display Inc
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Description

液晶面板之製造方法 Liquid crystal panel manufacturing method 【相關申請案】[related application]

本申請案係以日本專利申請案2013-142624號(申請日:2013年7月8日)為基礎並自該申請案享有優先之權利。本申請案係藉由參照該等申請案而包含該申請案之全部內容。 This application is based on Japanese Patent Application No. 2013-142624 (Application Date: July 8, 2013) and has priority from the application. This application contains the entire contents of this application by reference to the application.

本發明係關於一種液晶面板之製造方法者。 The present invention relates to a method of manufacturing a liquid crystal panel.

於液晶面板之陣列基板上,以矩陣狀形成有包含像素電極之TFT(Thin Film Transistor:薄膜電晶體),進而為了防止短路而形成有保護電路或短路環。因此,藉由該等構造,於對陣列基板給予摩擦處理產生之摩擦或剝離帶電之情形時,亦可進行除電。 A TFT (Thin Film Transistor) including a pixel electrode is formed in a matrix on the array substrate of the liquid crystal panel, and a protection circuit or a short-circuit ring is formed to prevent short-circuiting. Therefore, with such a configuration, it is possible to perform static elimination when the array substrate is subjected to friction or peeling electrification due to rubbing treatment.

例如,於專利文獻1中,提出有如下方法:於使用以形成複數個單片之陣列基板之母基板(以下稱為「母陣列基板」)自製造步驟所使用之載物台分離時,使接觸端子與設置於母陣列基板之虛設配線接觸,而於母陣列基板對帶電之靜電進行除電。 For example, Patent Document 1 proposes a method in which a mother substrate (hereinafter referred to as a "mother array substrate") for forming a plurality of individual array substrates is separated from a stage used in a manufacturing step, The contact terminals are in contact with the dummy wirings disposed on the mother substrate, and the charged static electricity is removed from the mother array substrate.

然而,專利文獻1所示之除電方法係與母陣列基板對應者,並非於對向基板對帶電之靜電進行除電者。又,於利用液晶分子之橫向電場之IPS(In Plane Switching:橫向電場效應)方式等中,於用以形成複數個單片之對向基板之母基板(以下稱為「母對向基板」)上無像素電極等導電性之構造物。因此,對母對向基板藉由摩擦處理給予摩擦或剝離帶電時產生之電荷係於與母陣列基板貼合之後及分別分斷為液晶 面板之後,該電荷亦繼續殘存,妨礙由電壓施加引起之液晶分子之行為,而有成為燒印不良之問題點。 However, the static elimination method shown in Patent Document 1 corresponds to the mother array substrate, and the static electricity that is charged on the opposite substrate is not removed. Further, in the IPS (In Plane Switching) method using a lateral electric field of liquid crystal molecules, the mother substrate (hereinafter referred to as "mother opposite substrate") for forming a plurality of individual wafers of opposite substrates There is no conductive structure such as a pixel electrode. Therefore, the charge generated when the parent opposing substrate is rubbed or stripped by the rubbing treatment is attached to the mother substrate and then separated into liquid crystals. After the panel, the electric charge also continues to remain, hindering the behavior of the liquid crystal molecules caused by the voltage application, and has a problem of poor printing.

因此,本發明係鑑於上述問題點,目的在於提供一種液晶面板之製造方法,於該液晶面板之製造方法係中,於藉由摩擦處理時之摩擦或剝離帶電而於不具有導電性之對向基板產生電荷之情形時,亦不會產生燒印不良等。 Accordingly, the present invention has been made in view of the above problems, and an object of the invention is to provide a method for manufacturing a liquid crystal panel in which the opposite direction of non-conductivity is caused by friction or peeling electrification during rubbing treatment. When the substrate generates an electric charge, there is no occurrence of poor printing or the like.

本發明係一種液晶面板之製造方法,其係介隔液晶層貼合有陣列基板與對向基板者,且包含:導電層形成步驟,其係沿著向上述液晶面板之分斷前母對向基板之至少外周區域而形成導電層;及除電步驟,其係使接觸端子與上述導電層接觸而進行除電。 The present invention relates to a method for fabricating a liquid crystal panel, in which a liquid crystal layer is bonded to an array substrate and a counter substrate, and includes a conductive layer forming step, which is performed along a front side of the liquid crystal panel. a conductive layer is formed on at least an outer peripheral region of the substrate; and a step of removing electricity, wherein the contact terminal is in contact with the conductive layer to perform static elimination.

根據本發明,藉由沿著母對向基板之至少外周區域形成導電層,可對摩擦處理時之摩擦或來自載物台之剝離帶電所產生之電荷進行除電。 According to the present invention, by forming a conductive layer along at least the outer peripheral region of the mother opposing substrate, the friction generated during the rubbing treatment or the electric charge generated by the stripping electrification from the stage can be neutralized.

10‧‧‧液晶面板 10‧‧‧LCD panel

12‧‧‧陣列基板 12‧‧‧Array substrate

14‧‧‧對向基板 14‧‧‧ Alignment substrate

16‧‧‧外周區域 16‧‧‧peripheral area

18‧‧‧外周區域 18‧‧‧peripheral area

20‧‧‧陣列側形成層 20‧‧‧Array side formation

22‧‧‧對向側形成層 22‧‧‧ opposite side formation

24‧‧‧導電層 24‧‧‧ Conductive layer

26‧‧‧密封構件 26‧‧‧ Sealing members

28‧‧‧間隙區域 28‧‧‧Gap area

30‧‧‧測試圖案 30‧‧‧ test pattern

100‧‧‧玻璃基板 100‧‧‧ glass substrate

110‧‧‧玻璃基板 110‧‧‧ glass substrate

120‧‧‧母陣列基板 120‧‧‧ mother array substrate

140‧‧‧母對向基板 140‧‧‧Female counter substrate

圖1係本發明之實施形態1之液晶面板之縱剖面圖。 Fig. 1 is a longitudinal sectional view showing a liquid crystal panel according to a first embodiment of the present invention.

圖2係實施形態1之母對向基板之俯視圖。 Fig. 2 is a plan view showing a mother opposing substrate of the first embodiment.

圖3係實施形態2之母對向基板之俯視圖。 Fig. 3 is a plan view showing a mother opposing substrate of the second embodiment.

圖4係實施形態3之液晶面板之縱剖面圖。 Fig. 4 is a longitudinal sectional view showing a liquid crystal panel of a third embodiment.

以下,基於圖式對本發明之一實施形態之液晶面板10之製造方法進行說明。 Hereinafter, a method of manufacturing the liquid crystal panel 10 according to an embodiment of the present invention will be described based on the drawings.

[實施形態1] [Embodiment 1]

基於圖1與圖2對本發明之實施形態1之液晶面板10之製造方法進行說明。 A method of manufacturing the liquid crystal panel 10 according to the first embodiment of the present invention will be described with reference to FIGS. 1 and 2.

液晶面板10係例如IPS方式,該IPS方式並非如TN(Twisted Nematic:扭轉向列)方式或VA(Vertical Alignment:垂直配向)方式般於夾於玻璃基板間之液晶之厚度方向施加電場,而是於陣列基板12之面方向施加電場而使液晶分子於與陣列基板12平行之面內旋轉之橫向電場方式。 The liquid crystal panel 10 is, for example, an IPS method, and the IPS method is not like TN (Twisted). In the Nematic: TW (Vertical Alignment) mode or the VA (Vertical Alignment) method, an electric field is applied in the thickness direction of the liquid crystal sandwiched between the glass substrates, and an electric field is applied in the direction of the surface of the array substrate 12 to make the liquid crystal molecules in the array. A transverse electric field mode in which the substrate 12 rotates in parallel.

液晶面板10係介隔液晶層而貼合陣列基板12與對向基板14者。於陣列基板12,以正交之方式形成有閘極配線與信號配線,且於其交叉部經由TFT形成有像素電極。像素電極由於為IPS方式,故形成為梳齒狀。於對向基板14上,未形成有電極等導電層,於玻璃基板之上表面形成有RGB之彩色濾光片層與黑色矩陣,且於其上形成有保護膜、配向膜。 The liquid crystal panel 10 is bonded to the array substrate 12 and the counter substrate 14 via a liquid crystal layer. A gate wiring and a signal wiring are formed on the array substrate 12 so as to be orthogonal to each other, and a pixel electrode is formed via the TFT at the intersection portion thereof. Since the pixel electrode is in the IPS mode, it is formed in a comb shape. A conductive layer such as an electrode is not formed on the counter substrate 14. A RGB color filter layer and a black matrix are formed on the upper surface of the glass substrate, and a protective film and an alignment film are formed thereon.

圖1係貼合有用以形成複數個單片之陣列基板12之母陣列基板120、與用以形成複數個單片之對向基板14之母對向基板140之狀態之縱剖面圖,其右側為母陣列基板120與母對向基板140之外周區域16、18。圖1之符號20表示包含形成於陣列基板12上之閘極配線、信號線配線、TFT、像素電極、保護膜、配向膜等之陣列側形成層,符號22表示包含形成於對向基板14上之彩色濾光片層、黑色矩陣、保護膜、配向膜之對向側形成層。於本實施形態中,沿著母對向基板140之外周區域18,於對向側形成層22上以透明電極(ITO;Indium Tin Oxide:氧化銦錫)將線狀之導電層24形成為框架狀。該導電層24之線寬係為了可於母對向基板之外周區域、即不形成對向基板單片之區域容易地進行除電步驟、例如接觸接地之端子等處理,較佳為盡可能粗地引繞,例如可設為數百μm~數mm等。導電層24之形成係直接沿用其他步驟中使用之裝置之條件較為簡單,直接利用形成陣列基板之像素電極之步驟之條件之情形時,其膜厚成為例如50nm左右。 1 is a longitudinal cross-sectional view showing a state in which a mother array substrate 120 for forming a plurality of monolithic array substrates 12 and a mother opposing substrate 140 for forming a plurality of individual counter substrates 14 are attached. It is the outer peripheral regions 16, 18 of the mother array substrate 120 and the mother opposing substrate 140. Reference numeral 20 in Fig. 1 denotes an array side forming layer including a gate wiring, a signal line wiring, a TFT, a pixel electrode, a protective film, an alignment film, and the like formed on the array substrate 12, and reference numeral 22 denotes that it is formed on the opposite substrate 14. The color filter layer, the black matrix, the protective film, and the opposite side of the alignment film form a layer. In the present embodiment, the linear conductive layer 24 is formed as a frame on the opposite side forming layer 22 by a transparent electrode (ITO; Indium Tin Oxide) along the outer peripheral region 18 of the mother opposing substrate 140. shape. The line width of the conductive layer 24 is preferably as thick as possible in order to facilitate the process of removing the electricity from the outer peripheral region of the mother substrate, that is, the region where the opposite substrate is not formed, for example, a terminal that contacts the ground. The winding can be, for example, several hundred μm to several mm. The formation of the conductive layer 24 is relatively simple, and the condition of the step of forming the pixel electrode of the array substrate is used as it is, and the film thickness is, for example, about 50 nm.

對液晶面板10之製造方法依序進行說明。 The method of manufacturing the liquid crystal panel 10 will be described in order.

首先,製作母陣列基板120。為此進行向成為母陣列基板120之 玻璃基板100之表面之成膜。於該情形時,金屬膜係以濺鍍法進行,絕緣膜係以CVD(Chemical Vapor Deposition化學氣相沈積)法進行。兩者均於真空腔室內送入氣體而引起物理或化學反應,從而使金屬膜或絕緣膜附著於玻璃基板上。 First, the mother array substrate 120 is fabricated. To this end, the process proceeds to become the mother array substrate 120. Film formation on the surface of the glass substrate 100. In this case, the metal film is formed by a sputtering method, and the insulating film is formed by a CVD (Chemical Vapor Deposition Chemical Vapor Deposition) method. Both of them introduce a gas into the vacuum chamber to cause a physical or chemical reaction, thereby attaching the metal film or the insulating film to the glass substrate.

接著,於形成有金屬膜或絕緣膜之玻璃基板上塗布阻劑,形成阻劑層。 Next, a resist is applied onto the glass substrate on which the metal film or the insulating film is formed to form a resist layer.

接著,對塗布有阻劑層之玻璃基板使用曝光裝置進行曝光,從而進行顯影。即,使用描繪有圖案之掩膜,將圖案燒印於阻劑層。 Next, the glass substrate coated with the resist layer was exposed using an exposure apparatus to perform development. That is, the pattern is burned on the resist layer using a mask in which a pattern is drawn.

接著,使掩膜覆蓋已燒印有圖案之阻劑層,進行濕式蝕刻或乾式蝕刻,去除圖案以外之不必要之阻劑層、金屬膜或絕緣膜。 Next, the mask is covered with the patterned resist layer, and wet etching or dry etching is performed to remove unnecessary resist layers, metal films or insulating films other than the pattern.

接著,自玻璃基板100剝離殘留於形成有圖案之金屬膜或絕緣膜上之不必要之阻劑層,僅留下必要之膜。 Next, an unnecessary resist layer remaining on the metal film or the insulating film on which the pattern is formed is peeled off from the glass substrate 100, leaving only the necessary film.

接著,關於上述各步驟,由於藉由1片掩膜形成1個金屬膜、絕緣膜,故於各個載物台上反復進行複數次該步驟,從而形成陣列側形成層20。又,於此時,於母陣列基板120之外周區域16預先形成步驟管理用之測試圖案30。另,所謂載物台係指為了進行各製造步驟而預先載置母陣列基板120之台,將母陣列基板120於作業前載置於載物台,於作業後剝離。 Then, in each of the above steps, since one metal film or an insulating film is formed by one mask, the steps are repeated a plurality of times on the respective stages to form the array side forming layer 20. Moreover, at this time, the test pattern 30 for step management is formed in advance in the outer peripheral region 16 of the mother array substrate 120. In addition, the stage refers to a stage on which the mother array substrate 120 is placed in advance for each manufacturing step, and the mother array substrate 120 is placed on the stage before the work, and is peeled off after the work.

接著,於對向基板14,亦於成為母對向基板140之玻璃基板110,將包含黑色矩陣及RGB之彩色濾光片層之對向側形成層22,以與陣列基板12之製造步驟相同之方式於各載物台上形成圖案。又,於該製造步驟中,如圖2所示,進行沿著母對向基板140之外周區域藉由ITO形成導電層24之步驟。 Next, on the opposite substrate 14 and also on the glass substrate 110 which becomes the mother opposing substrate 140, the opposite side forming layer 22 including the black matrix and the RGB color filter layer is formed in the same manner as the array substrate 12 The pattern is formed on each stage. Further, in this manufacturing step, as shown in FIG. 2, a step of forming the conductive layer 24 by ITO along the outer peripheral region of the mother opposing substrate 140 is performed.

接著,以輥轉印分別塗布母陣列基板120之配向膜與母對向基板140之配向膜。配向膜係用以使液晶分子之朝向一致。 Next, an alignment film of the alignment film of the mother array substrate 120 and the mother opposing substrate 140 is applied by roll transfer. The alignment film is used to make the orientation of the liquid crystal molecules uniform.

接著,對母陣列基板120之配向膜與母對向基板140之配向膜分 別進行摩擦處理。例如於圓筒上捲繞布,機械摩擦配向膜之表面,從而液晶分子朝向該摩擦之方向。又,亦可藉由光配向處理進行。 Next, the alignment film of the alignment film of the mother array substrate 120 and the mother opposing substrate 140 is divided into Do not rub. For example, the cloth is wound on a cylinder, and the surface of the alignment film is mechanically rubbed so that the liquid crystal molecules face the direction of the rubbing. Moreover, it can also be performed by the optical alignment process.

接著,沿著母對向基板140中之單片之液晶面板10之對向基板14之外周區域將密封構件26分別形成為框架狀。 Next, the sealing members 26 are respectively formed in a frame shape along the outer peripheral region of the counter substrate 14 of the single-piece liquid crystal panel 10 in the mother opposing substrate 140.

接著,使除電裝置之接點端子接觸到形成於母對向基板140之外周區域之導電層24而除電。接點端子係接地,藉由該接點端子之接觸,可自母對向基板140除去因摩擦處理或來自載物台之剝離帶電所產生之電荷。 Next, the contact terminal of the static eliminating device is brought into contact with the conductive layer 24 formed in the outer peripheral region of the mother opposing substrate 140 to be neutralized. The contact terminal is grounded, and by the contact of the contact terminal, the charge generated by the rubbing treatment or the stripping from the stage can be removed from the mother opposing substrate 140.

接著,貼合母陣列基板120與母對向基板140。 Next, the mother array substrate 120 and the mother opposing substrate 140 are bonded.

接著,於所貼合之母陣列基板120與母對向基板140之間,藉由例如液晶滴下注入液晶,而形成液晶層。 Next, a liquid crystal layer is formed by injecting liquid crystal between the mother substrate 120 and the mother opposing substrate 140 to be bonded by, for example, liquid crystal dropping.

接著,對貼合有母陣列基板120與母對向基板140之密封構件26照射UV光而使之硬化。 Next, the sealing member 26 to which the mother array substrate 120 and the mother opposing substrate 140 are bonded is irradiated with UV light to be cured.

接著,於將密封構件26硬化之後,進行劃線斷裂,針對每個單片之液晶面板10進行分斷,而形成1片片之液晶面板10。又,分斷後之不必要之部分之玻璃基板係廢棄。由於該不必要之部分中亦包含形成有導電層24之母對向基板140之外周區域,故於製品後不會殘留導電層24。 Next, after the sealing member 26 is cured, the scribe line is broken, and the liquid crystal panel 10 for each single piece is divided to form a liquid crystal panel 10 of one piece. Moreover, the unnecessary portion of the glass substrate after being separated is discarded. Since the unnecessary portion also includes the outer peripheral region of the mother opposing substrate 140 on which the conductive layer 24 is formed, the conductive layer 24 does not remain after the article.

接著,於各液晶面板10之兩面貼附偏光板,安裝背光,安裝驅動器IC,且安裝框架,從而完成為模組。 Next, a polarizing plate is attached to both surfaces of each liquid crystal panel 10, a backlight is mounted, a driver IC is mounted, and a frame is mounted to complete the module.

根據本實施形態,藉由於母對向基板140之外周區域形成導電層24,於摩擦處理時或由於來自載物台之剝離等而產生帶電之情形時,電荷亦於該導電層24中流動,而可將各液晶面板10之電荷進行除電,而不會對液晶面板10之電工學特性造成影響而引起燒印不良。 According to the present embodiment, when the conductive layer 24 is formed in the outer peripheral region of the mother opposing substrate 140, electric charges are generated in the conductive layer 24 at the time of rubbing treatment or when charging occurs due to peeling from the stage or the like. On the other hand, the electric charge of each liquid crystal panel 10 can be removed without affecting the electrical characteristics of the liquid crystal panel 10, resulting in poor printing.

[實施形態2] [Embodiment 2]

接著,基於圖3對實施形態2之液晶面板10之製造方法進行說 明。 Next, a method of manufacturing the liquid crystal panel 10 of the second embodiment will be described based on FIG. Bright.

於實施形態1中,雖僅沿著母對向基板140之外周區域設置形成於母對向基板140之導電層24,但於本實施形態中,如圖3所示,於設置於鄰接之單片之液晶面板10之間之間隙區域28亦形成導電層24。 In the first embodiment, the conductive layer 24 formed on the mother opposing substrate 140 is provided only in the outer peripheral region of the mother opposing substrate 140. However, in the present embodiment, as shown in FIG. The gap region 28 between the liquid crystal panels 10 of the sheet also forms a conductive layer 24.

藉此,液晶面板10中帶電之電荷更確實地於導電層24流動,而可進行除電。 Thereby, the charged electric charge in the liquid crystal panel 10 flows more reliably on the conductive layer 24, and the static elimination can be performed.

[實施形態3] [Embodiment 3]

接著,基於圖4對實施形態3之液晶面板10之製造方法進行說明。 Next, a method of manufacturing the liquid crystal panel 10 of the third embodiment will be described based on Fig. 4 .

於實施形態1中,雖於母對向基板140之彩色濾光片層或黑色矩陣上形成有導電層24,但除此以外,亦於母對向基板140之玻璃基板之表面直接形成導電層24。 In the first embodiment, the conductive layer 24 is formed on the color filter layer or the black matrix of the mother opposing substrate 140, but a conductive layer is directly formed on the surface of the glass substrate of the mother opposing substrate 140. twenty four.

藉此,由於相對於實施形態1中導電層24僅與彩色濾光片層或黑色矩陣層相接,亦與玻璃基板相接,故可更有效地將玻璃表面側之帶電進行除電。又,即便於外周區域18較窄之情形時,由於可將導電層24形成為更寬,故亦可提高除電效果。 As a result, since the conductive layer 24 is in contact with the color filter layer or the black matrix layer in the first embodiment, and is also in contact with the glass substrate, the charging on the glass surface side can be more effectively performed. Further, even in the case where the outer peripheral region 18 is narrow, since the conductive layer 24 can be formed to be wider, the static eliminating effect can be improved.

[變更例] [Modification]

本實施形態之液晶面板10之製造方法係若為於對向基板14不具有電極之橫向電場方式之液晶面板10,則並不限於IPS方式,於其他模式之液晶面板10中亦可加以應用。 The manufacturing method of the liquid crystal panel 10 of the present embodiment is not limited to the IPS method as long as it is a lateral electric field type liquid crystal panel 10 having no electrodes on the counter substrate 14, and can be applied to the liquid crystal panel 10 of another mode.

本發明並非保持原樣限定於上述實施形態者,於實施階段中於不脫離其主旨之範圍內可使構成要件變化而具體化。又,藉由適當組合上述實施形態所揭示之複數個構成要件,可形成各種發明。例如,亦可自實施形態所示之所有構成要件削除若干個構成要件。再者,亦可適當組合跨不同實施形態之構成要件。 The present invention is not limited to the above-described embodiments, and the constituent elements may be changed and embodied in the implementation stage without departing from the spirit and scope of the invention. Further, various inventions can be formed by appropriately combining a plurality of constituent elements disclosed in the above embodiments. For example, several constituent elements may be eliminated from all of the constituent elements shown in the embodiment. Furthermore, the constituent elements across different embodiments may also be combined as appropriate.

10‧‧‧液晶面板 10‧‧‧LCD panel

12‧‧‧陣列基板 12‧‧‧Array substrate

14‧‧‧對向基板 14‧‧‧ Alignment substrate

16‧‧‧外周區域 16‧‧‧peripheral area

18‧‧‧外周區域 18‧‧‧peripheral area

20‧‧‧陣列側形成層 20‧‧‧Array side formation

22‧‧‧對向側形成層 22‧‧‧ opposite side formation

24‧‧‧導電層 24‧‧‧ Conductive layer

26‧‧‧密封構件 26‧‧‧ Sealing members

30‧‧‧測試圖案 30‧‧‧ test pattern

100‧‧‧玻璃基板 100‧‧‧ glass substrate

110‧‧‧玻璃基板 110‧‧‧ glass substrate

120‧‧‧母陣列基板 120‧‧‧ mother array substrate

140‧‧‧母對向基板 140‧‧‧Female counter substrate

Claims (5)

一種液晶面板之製造方法,該液晶面板係介隔液晶層而貼合有陣列基板與對向基板者,且該方法包含下列步驟:導電層形成步驟,其係沿著製成上述液晶面板之分斷前之母對向基板之至少外周區域而形成導電層;及除電步驟,其係使接觸端子與上述導電層接觸而進行除電。 A method for manufacturing a liquid crystal panel, wherein the liquid crystal panel is bonded to the array substrate and the opposite substrate, and the method comprises the following steps: a conductive layer forming step, which is performed along the liquid crystal panel Forming a conductive layer on at least the outer peripheral region of the mother substrate before the break; and removing the electricity, wherein the contact terminal is in contact with the conductive layer to perform static elimination. 如請求項1之液晶面板之製造方法,其中於上述導電層形成步驟中,除了位於上述母對向基板之外周區域之上述導電層,亦於分斷前之上述液晶面板鄰接之間隙區域形成上述導電層。 The method of manufacturing a liquid crystal panel according to claim 1, wherein in the conductive layer forming step, the conductive layer is formed in a peripheral region of the outer peripheral region of the mother opposing substrate, and the gap region adjacent to the liquid crystal panel before the breaking is formed. Conductive layer. 如請求項1之液晶面板之製造方法,其中於上述導電層形成步驟之後,包含下列步驟:面板貼合步驟,其係於製成上述液晶面板之分斷前之母陣列基板,貼合上述母對向基板;及分斷步驟,其係將所貼合之上述母對向基板與上述母陣列基板,分斷成複數個上述液晶面板與形成有上述導電層之不必要部分。 The method of manufacturing a liquid crystal panel according to claim 1, wherein after the step of forming the conductive layer, the method comprises the steps of: a panel bonding step of bonding the mother substrate before forming the liquid crystal panel, and bonding the mother substrate a counter substrate; and a breaking step of dividing the bonded mother opposing substrate and the mother array substrate into a plurality of the liquid crystal panels and unnecessary portions on which the conductive layer is formed. 如請求項1之液晶面板之製造方法,其中上述導電層係形成於:形成在上述母對向基板之彩色濾光片層上、黑色矩陣層上、或構成上述母對向基板之玻璃基板上。 The method of manufacturing a liquid crystal panel according to claim 1, wherein the conductive layer is formed on a color filter layer of the mother opposing substrate, a black matrix layer, or a glass substrate constituting the mother opposing substrate. . 如請求項1之液晶面板之製造方法,其中上述導電層係以與透明電極相同之材料形成。 The method of manufacturing a liquid crystal panel according to claim 1, wherein the conductive layer is formed of the same material as the transparent electrode.
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