TWI511827B - Active soft solder filler composition - Google Patents

Active soft solder filler composition Download PDF

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TWI511827B
TWI511827B TW100118555A TW100118555A TWI511827B TW I511827 B TWI511827 B TW I511827B TW 100118555 A TW100118555 A TW 100118555A TW 100118555 A TW100118555 A TW 100118555A TW I511827 B TWI511827 B TW I511827B
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active
target
filler
bonding
solder
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TW201247353A (en
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Lung Chuan Tsao
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Univ Nat Yunlin Sci & Tech
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Description

活性軟銲填料之組成物 Active solder filler composition

本發明係為一種活性軟銲填料,其可在大氣環境下直接進行接合,且可對潤濕性低之靶材與金屬進行接合。 The present invention is an active solder filler which can be directly bonded in an atmosphere and can be bonded to a metal having a low wettability.

濺鍍主要是在真空中利用輝光放電(glow discharge)的原理,將等離子體高速撞擊靶材表面,靶材的原子受到衝擊後彈出,沈積在基板表面,形成了薄膜,該方法可用於塑膠、金屬、玻璃、布或複合材料的刻蝕與鍍膜,具有高品質,附著力佳,製程穩定性優良等優點。 Sputtering mainly uses the principle of glow discharge in vacuum to impact the plasma on the surface of the target at high speed. The atoms of the target are ejected and then ejected on the surface of the substrate to form a film. The method can be applied to plastics. The etching and coating of metal, glass, cloth or composite materials have the advantages of high quality, good adhesion and excellent process stability.

在一般典型的濺鍍操作過程中,靶材側會通入電流形成負電極,在濺鍍真空腔體中,被激發而帶有正電荷的惰性氣體離子,會跟靶材碰撞,而將靶材轟擊成原子粒子,飛濺沈積於基材上。由於這過程會使靶材產生大量的熱,為了冷卻靶材,通常利用水冷的方式,冷卻與靶材接合的背板為之。若是靶材跟背板的接合強度不佳,或是界面之導熱性能不良時,於濺鍍操作過程中靶材溫度會迅速升高,而產生脫銲、熔化或設備過熱等問題。 During a typical sputtering operation, a current is formed on the target side to form a negative electrode. In the sputtering vacuum chamber, an inert gas ion excited with a positive charge collides with the target, and the target is collided. The material is bombarded into atomic particles and splashed onto the substrate. Since this process causes the target to generate a large amount of heat, in order to cool the target, the backing plate joined to the target is usually cooled by means of water cooling. If the bonding strength between the target and the backing plate is not good, or the thermal conductivity of the interface is poor, the target temperature will rise rapidly during the sputtering operation, causing problems such as desoldering, melting, or overheating of the device.

靶材與背板的接合上,不僅要兼顧強度、導熱性及耐溫性等,還必須考量到背板回收之重工性接合的操作便利性,以及成本。考慮接合溫度跟操作溫度及導熱性的需求時,通常以銦作為靶材跟背板的接合材料。在大部分金屬靶材的接合應用上,因銦能在熔化時跟金屬靶材產生良好的潤濕性,得以順利完成接合。 The bonding of the target and the backing plate requires not only strength, thermal conductivity, temperature resistance, etc., but also the operational convenience and cost of the heavy-duty joint recovered by the back sheet. In consideration of the bonding temperature and the requirements of the operating temperature and thermal conductivity, indium is usually used as a bonding material for the target and the back sheet. In the bonding application of most metal targets, since indium can produce good wettability with the metal target during melting, the bonding can be smoothly completed.

然而近來,陶瓷與金屬的接合為各界所矚目,由於陶瓷與金屬所製成之複合構件,能充分發揮各自性能上的優點,亦能彌補自身材料性能上的不足,故將兩者接合實為重點研究方向,但由於陶瓷與金屬本身的鏈結方式不同,使得兩者的物理及化學性質差異大,造成兩者在接合加工上的困難。由於陶瓷靶材為潤濕性低之材料,通常為使陶瓷表面能產生與金屬反應鍵結的能力,常須在待接合的陶瓷表面預先施以金屬化的處理。陶瓷金屬化的主要方法有蒸鍍、濺鍍等之真空鍍膜方式、化學氣相沈積、離子注入法或化學鍍等薄膜工藝,或以燒結金屬粉末亦或披覆活性硬銲填料之厚膜工藝等。待金屬化之後再以銦來接合,但如此之程序需要花費高成本,以及具有繁瑣的製程。 Recently, however, the joining of ceramics and metals has attracted attention from all walks of life. Because the composite members made of ceramics and metals can fully exploit their respective performance advantages, they can also make up for the shortcomings of their own material properties. Focus on research direction, but due to the different ways of linking the ceramics and the metal itself, the physical and chemical properties of the two are greatly different, which makes the two joints difficult to process. Since the ceramic target is a material having low wettability, the ceramic surface is usually capable of reacting with a metal to bond, and it is often necessary to apply a metallization treatment to the ceramic surface to be joined. The main methods of ceramic metallization include vacuum coating methods such as evaporation and sputtering, thin film processes such as chemical vapor deposition, ion implantation or electroless plating, or thick film processes using sintered metal powder or coated active brazing filler. Wait. After the metallization, the indium is used for bonding, but such a process requires a high cost and a cumbersome process.

在台灣發明專利公開案第I321159號中,提供一焊料合金,用以接合靶材與銅或銅合金製背板的接合,其特徵為:由包含重量百分比3-9%的鋅,以及剩餘部份為錫與不可避免之雜質組成。惟該技術特徵中,僅能使用於易於潤濕之易銲靶材,對於潤濕性低之靶材如陶瓷材質等,則沒有述及解決方法。 In Japanese Patent Laid-Open Publication No. I321159, a solder alloy is provided for bonding a target to a backing plate made of copper or a copper alloy, characterized by comprising zinc containing 3-9% by weight, and the remainder The composition is composed of tin and unavoidable impurities. However, in this technical feature, only a solderable target which is easy to wet can be used, and a target having a low wettability such as a ceramic material or the like is not mentioned.

而在台灣發明專利公開案第201026741號中,揭露了在陶瓷濺鍍靶材的表面,進行純鉻或鉻合金鍍膜處理而形成一界面層,接著將背板的銲料層與靶材上的界面層進行軟銲接,最後將界面層進行退火處理,使該界面層與軟銲料層之間能易於接合。該發明提供了接合潤濕性低之靶材接合方式,惟該技術特徵中,需要在靶材表面鍍上界面層以便於軟銲,如此方式不僅在鍍膜的製程需要花費高成本,亦使得接合的程序繁複,多出了退火處理等程序,且多層金屬的接合界面也會影響接合性能。 In Taiwan Patent Publication No. 201026741, it is disclosed that a surface of a ceramic sputtering target is subjected to a pure chromium or chromium alloy plating treatment to form an interface layer, and then the interface between the solder layer of the backing plate and the target is formed. The layer is soft soldered, and finally the interface layer is annealed so that the interface layer and the soft solder layer can be easily joined. The invention provides a joint joining method with low joint wettability, but in this technical feature, an interface layer needs to be plated on the surface of the target to facilitate soldering, which not only requires high cost in the coating process but also makes the joint The procedures are complicated, and more procedures such as annealing are performed, and the bonding interface of the multilayer metal also affects the bonding performance.

如此,有必要研發新技術,克服上述缺失。本發明人將目標 放在潤濕性低之靶材上,如陶瓷、鋁、鋁合金等材質,有鑑於前案之方式有增加成本與製程繁瑣等問題,故經過研究與實驗之後,終於產生此製作活性軟銲填料以及使用該填料接合靶材跟背板的方法。 In this way, it is necessary to develop new technologies to overcome the above shortcomings. The inventor will target It is placed on a target with low wettability, such as ceramics, aluminum, aluminum alloy, etc. In view of the problems of increasing cost and complicated process in the previous method, after the research and experiment, the active soldering is finally produced. A filler and a method of joining the target to the backing plate using the filler.

本發明之主要目的,在於提供一種活性軟銲填料,其藉由一活性軟銲填料,可以直接將一潤濕性低之靶材與一背板接合,而不需要對靶材表面作鍍膜處理。 The main object of the present invention is to provide an active soldering filler which can directly bond a target with low wettability to a backing plate by using an active solder filler, without coating the surface of the target. .

本發明之次要目的,在於提供一種活性軟銲填料,工作人員不需要任何防護設備,就可以直接進行該靶材與背板的接合操作。 A secondary object of the present invention is to provide an active solder filler, which can be directly engaged by the worker without any protective equipment.

本發明之另一目的,在於提供一種活性軟銲填料,其具有優秀的潤濕性,適用於潤濕性低之靶材與背板接合,可簡化加工步驟可省下加工時間與成本。 Another object of the present invention is to provide an active soldering filler which has excellent wettability and is suitable for bonding a target having low wettability to a backing plate, which simplifies the processing step and can save processing time and cost.

本發明之另一目的,在於提供一種活性軟銲填料,其在於該靶材與該背板接合時,係使用低溫之操作溫度,除了操作起來較為安全外,尚可以解決界面熱應力的問題,增加接合強度。 Another object of the present invention is to provide an active soldering filler, wherein when the target is bonded to the backing plate, a low temperature operating temperature is used, and in addition to being safe to operate, the problem of interface thermal stress can be solved. Increase the joint strength.

本發明之另一目的,在於提供一種活性軟銲填料,其金屬基材材質之一為鋅,延展性較一般無鉛焊料佳,接合溫度亦低,在靶材與背板接合上,亦可減少熱應力的問題,讓接合強度較為堅固。 Another object of the present invention is to provide an active soldering filler, wherein one of the metal substrate materials is zinc, the ductility is better than that of general lead-free solder, and the bonding temperature is also low, and the target and the backing plate can also be reduced. The problem of thermal stress makes the joint strength stronger.

本發明係提供一種活性軟銲填料,其可於大氣環境下直接接合潤濕性低之靶材與背板,係包括一活性物,成份為鈦加上稀土元素或鎂;一金屬基材,係為錫鋅合金,另包含特定量之鉍,銦 ,銀,銅。該活性軟銲填料之主要接合溫度介於150℃至200℃,介於低溫焊料與高溫焊料之間,如此之操作溫度在無鉛銲料之中屬於低溫,故可以減少接合界面熱應力的產生,其中接合操作溫度需要在150℃以上,不然在濺鍍操作時靶材會與背板分離。而製造該活性軟銲填料時,溫度為200℃以下,比起一般商用無鉛焊料所需溫度來的低,製作時更加方便快速,也更安全。 The present invention provides an active soldering filler which can directly join a target having a low wettability and a back sheet in an atmospheric environment, and includes an active material having a composition of titanium plus rare earth element or magnesium; a metal substrate; It is a tin-zinc alloy and contains a specific amount of niobium, indium. , silver, copper. The active bonding temperature of the active solder filler is between 150 ° C and 200 ° C, between the low temperature solder and the high temperature solder. The operating temperature is low in the lead-free solder, so the thermal stress at the joint interface can be reduced. The bonding operation temperature needs to be above 150 ° C, otherwise the target will be separated from the backing plate during the sputtering operation. When the active solder filler is manufactured, the temperature is 200 ° C or less, which is lower than the temperature required for the general commercial lead-free solder, and is more convenient, faster, and safer to manufacture.

本發明所開發出之活性軟銲填料,對於難以溼潤以致接合不易之潤濕性低之靶材的接合操作上,有著技術上的突破,由於該銲料中含有之活性元素,藉此可以直接接合潤濕性低之靶材與背板,節省了成本與時間,還可增進接合效果,並且,該活性軟銲填料中,其金屬基材係以錫鋅合金為主,其延展性佳能減少熱應力的問題。 The active soldering filler developed by the present invention has a technical breakthrough in the joining operation of a target which is difficult to wet so as to have low wettability which is difficult to bond, and can be directly bonded by the active element contained in the solder. The low wettability target and the back sheet save cost and time, and can also improve the bonding effect. Moreover, in the active solder filler, the metal substrate is mainly tin-zinc alloy, and the ductility of the solder reduces heat. The problem of stress.

10‧‧‧活性軟銲填料 10‧‧‧Active soft solder filler

20‧‧‧第一接合物 20‧‧‧First joint

21‧‧‧第一接合面 21‧‧‧First joint

30‧‧‧第二接合物 30‧‧‧Second joint

21‧‧‧第二接合面 21‧‧‧Second joint

第1圖為本發明之接合物與活性軟銲填料接合之示意圖;及第2圖為本發明之活性軟銲填料之使用過程示意圖。 1 is a schematic view showing the bonding of the joint of the present invention to the active solder filler; and FIG. 2 is a schematic view showing the use of the active solder filler of the present invention.

茲為使 貴審查委員對本發明之結構特徵及所達成之功效更有進一步之瞭解與認識,謹佐以較佳之實施例圖及配合詳細之說明,說明如後:本發明係為一種『活性軟銲填料之組成物』,其係利用該活性軟銲填料於大氣環境下直接接合潤濕性低之靶材與背板,而不需要防護設備。 In order to provide a better understanding and understanding of the structural features and the achievable effects of the present invention, the preferred embodiments and the detailed description are as follows: The present invention is a kind of "active soft" The composition of the solder filler uses the active solder filler to directly join the target and the back sheet having low wettability in an atmospheric environment without requiring protective equipment.

請同時參閱第1圖及表1,其係為本發明之一較佳第一實施例之結構示意圖及合金成分表;如圖所示,本發明之一活性軟銲填 料10係包括:一活性物與一金屬基材;其中該活性物,係為鈦及稀土元素,該稀土元素係選自於鑭(La)、鈰(Ce)、鏷(Pr)、釹(Nd)、鉅(Pm)、釤(Sm)、銪(Eu)、釓(Gd)、鋱(Tb)、鏑(Dy)、鈥(Ho)、鉺(Er)、銩(Tm)、鐿(Yb)、鎦(Lu)、釔(y)、鈧(Sc)及上述任意組合之其中之一者。,且該金屬基材,係以錫鋅合金為主要成份。 Please refer to FIG. 1 and Table 1 respectively, which is a structural schematic diagram and an alloy composition table of a preferred first embodiment of the present invention; as shown in the figure, one of the active soft solder fills of the present invention The material 10 includes: an active material and a metal substrate; wherein the active material is titanium and a rare earth element selected from the group consisting of La, La, Pr, and Nd), giant (Pm), strontium (Sm), europium (Eu), strontium (Gd), strontium (Tb), strontium (Dy), strontium (Ho), strontium (Er), strontium (Tm), sputum ( Yb), 镏 (Lu), 钇 (y), 钪 (Sc), and any combination of the above. And the metal substrate is mainly composed of a tin-zinc alloy.

再者,該活性軟銲填料10之主要接合溫度介於150℃至200℃,且更進一步包含了一添加物,其係選自於鉍、銦、銀及銅之其中之一者或上述之任意組合,至少具有下列表1之數種比例組合: Furthermore, the active solder filler 10 has a main bonding temperature of 150 ° C to 200 ° C, and further includes an additive selected from one of bismuth, indium, silver, and copper or the above. Any combination, at least with the following proportional combinations of the list 1:

活性軟銲填料10能夠在大氣環境中,直接將一第一接合物20及第二接合物30接合,是因為在該活性軟銲填料10中,具有活性元素鈦及稀土元素,分別與第一接合物20及第二接合物30之表面起反應,產生了鍵結,第一結合物20與活性軟銲填料10產生了第一接合面21,第二結合物30與活性軟銲填料10產生了第二接合面31。 The active solder filler 10 can directly bond a first bonding material 20 and a second bonding material 30 in an atmospheric environment because the active solder filler 10 has an active element titanium and a rare earth element, respectively, and the first The surfaces of the bond 20 and the second bond 30 react to form a bond, and the first bond 20 and the active solder filler 10 create a first joint surface 21, and the second bond 30 and the active solder filler 10 are produced. The second joint surface 31 is formed.

該第一接合物20係選自於金屬、陶瓷其中一種;該第二接合物30係選自於金屬、陶瓷其中一種。 The first bonding material 20 is selected from one of a metal and a ceramic; the second bonding material 30 is selected from one of a metal and a ceramic.

在第一實施例中,該活性軟銲填料10能夠直接接合第一接合物20及第二接合物30是因為活性金屬法的應用,活性金屬法係在一般金屬焊料中添加活性元素,促使金屬能與陶瓷等潤濕性低之靶材發生反應及潤濕,以便於接合操作。而往使用該活性金屬法得到的焊料合金,其操作之接合溫度高達800℃至1000℃,存有熱應力及高溫製程等問題,本發明開發出以添加活性元素鈦及微量稀土元素之活性軟銲填料10,可於150℃至200℃直接進行接合操作,該溫度範圍有最佳之表現,操作者可根據作業上的需要自行調整。 In the first embodiment, the active solder filler 10 is capable of directly bonding the first bond 20 and the second bond 30. Because of the application of the active metal method, the active metal method adds active elements to the general metal solder to promote the metal. It can react and wet with targets with low wettability such as ceramics to facilitate the bonding operation. However, the solder alloy obtained by using the active metal method has a bonding temperature of 800 ° C to 1000 ° C, and has problems such as thermal stress and high temperature process. The present invention develops active softness by adding active element titanium and trace rare earth elements. The solder packing 10 can be directly joined at 150 ° C to 200 ° C. This temperature range has the best performance and can be adjusted by the operator according to the needs of the operation.

其中,由於稀土元素具有相當高的親和力,在大氣之下能使活性軟銲填料潤濕陶瓷等潤濕性低之靶材,可在不使用助銲劑的情形下直接結合靶材與背板,且根據實驗結果顯示,接合操作溫度最低需高於150℃,如此溫度之上,才可讓靶材與背板接合,而濺鍍操作時不會分離。 Among them, because the rare earth element has a relatively high affinity, under the atmosphere, the active soldering filler can wet the target with low wettability such as ceramic, and can directly combine the target and the back plate without using a flux. According to the experimental results, the bonding operation temperature needs to be higher than 150 ° C, so that the target can be bonded to the back plate without being separated during the sputtering operation.

如第2圖所示,本發明之活性軟銲填料之第一實施例,於大氣環境下接合潤濕性低之靶材與背板之方法:係如下列步驟: As shown in Fig. 2, in the first embodiment of the active solder filler of the present invention, a method of joining a target having a low wettability and a backing plate in an atmospheric environment is as follows:

步驟S40:預先將填料合金及活性元素,以預定之重量百分比準備好,以真空電弧熔煉爐來融製,抽真空至10-2~10-3torr以上,通入氬氣做為保護氣氛,之後得到活性軟銲填料10; Step S40: Prepare the filler alloy and the active element in a predetermined weight percentage in advance, melt it in a vacuum arc melting furnace, evacuate to a temperature of 10 -2 to 10 -3 torr or more, and pass argon gas as a protective atmosphere. Afterwards, the active solder filler 10 is obtained;

步驟S42:接合前,第一、第二接合物20與30之表面以砂紙研磨,再置於丙酮中以超音波震盪清洗以去除表面油漬。 Step S42: Before joining, the surfaces of the first and second joints 20 and 30 are ground with sandpaper, and then placed in acetone to be ultrasonically oscillated to remove surface oil stains.

步驟S44:以機械活化方式促使活性軟銲填料10與第一、第二接合物20與30產生潤濕。 Step S44: causing the active solder filler 10 to wet with the first and second joints 20 and 30 in a mechanically activated manner.

步驟S46:當活性軟銲填料10能完全潤濕並均勻塗佈於接合材料表面,再將第一、第二接合物20與30相互疊合,利用摩擦的方式將氣孔排出並使活性軟銲填料10表面氧化物破裂,提升接合效果達到緊密接合。 Step S46: When the active solder filler 10 can be completely wetted and uniformly coated on the surface of the bonding material, the first and second bonding materials 20 and 30 are superposed on each other, and the air holes are discharged by friction and the active soldering is performed. The surface oxide of the filler 10 is broken, and the bonding effect is improved to achieve close bonding.

第一實施例係以稀土元素作為活性金屬法的活性元素,但因稀土元素產量少,價格高昂,集中於少數國家,原料取得上較難掌握,故本發明同時開發了添加活性元素鎂之活性軟銲填料,如第二實施例。請同時參閱第1圖及表2,其係為本發明之另一較佳實施例之結構示意圖及合金成份表;本發明之一該活性軟銲填料10係包括一活性物與一金屬基材;其中該活性物,係為鎂或鎂合金,且該金屬基材,係以錫鋅合金為主要成份。 In the first embodiment, the rare earth element is used as the active element of the active metal method. However, since the rare earth element has low yield and high price, and is concentrated in a few countries, the raw material is difficult to grasp, so the present invention simultaneously develops the activity of adding the active element magnesium. A solder filler, as in the second embodiment. Please refer to FIG. 1 and Table 2, which are schematic structural diagrams and alloy composition tables according to another preferred embodiment of the present invention. The active solder filler 10 of the present invention comprises an active material and a metal substrate. Wherein the active material is magnesium or a magnesium alloy, and the metal substrate is mainly composed of a tin-zinc alloy.

該活性軟銲填料10之主要接合溫度介於150℃至200℃,且更進一步包含了一添加物,其係選自於鉍、銦、銀及銅之其中之一者或上述之任意組合,至少具有下列表2數種比例組合: The active solder filler 10 has a main bonding temperature of 150 ° C to 200 ° C, and further includes an additive selected from one of yttrium, indium, silver, and copper, or any combination thereof. At least there are several ratio combinations in the following list:

活性軟銲填料10能夠在大氣環境中,直接將一第一接合物20及第二接合物30接合,是因為在該活性軟銲填料10中,具有活性 元素鎂,分別與第一接合物20及第二接合物30之表面起反應,產生了鍵結,第一結合物20與活性軟銲填料10產生了第一接合面21,第二結合物30與活性軟銲填料10產生了第二接合面31。 The active solder filler 10 is capable of directly bonding a first bond 20 and a second bond 30 in an atmospheric environment because of active activity in the active solder fill filler 10. The elemental magnesium reacts with the surfaces of the first conjugate 20 and the second conjugate 30, respectively, to form a bond, and the first conjugate 20 and the active solder filler 10 create a first joint surface 21, and the second conjugate 30 A second joint surface 31 is created with the active solder filler 10.

該第一接合物20係選自於金屬、陶瓷其中一種;該第二接合物30係選自於金屬、陶瓷其中一種。 The first bonding material 20 is selected from one of a metal and a ceramic; the second bonding material 30 is selected from one of a metal and a ceramic.

在第一實施例中,該活性軟銲填料10能夠直接接合第一接合物20及第二接合物30是因為活性金屬法的應用,活性金屬法係在一般金屬焊料中添加活性元素,促使金屬能與陶瓷等潤濕性低之靶材發生反應及潤濕,以便於接合操作。而往使用該活性金屬法得到的焊料合金,其操作之接合溫度高達800℃至1000℃,存有熱應力及高溫製程等問題,本發明開發出添加活性元素鎂之活性軟銲填料,不僅可大幅降低成本支出,且亦能促進潤濕性低之靶材表面的潤濕性,在接合操作上相當優良,可媲美添加了活性元素鈦及微量稀土元素之活性軟銲填料。 In the first embodiment, the active solder filler 10 is capable of directly bonding the first bond 20 and the second bond 30. Because of the application of the active metal method, the active metal method adds active elements to the general metal solder to promote the metal. It can react and wet with targets with low wettability such as ceramics to facilitate the bonding operation. The solder alloy obtained by using the active metal method has a bonding temperature of 800 ° C to 1000 ° C, and has problems such as thermal stress and high temperature process. The present invention develops an active solder filler containing active element magnesium, which can be used not only Significantly reduce the cost, and also promote the wettability of the surface of the target with low wettability, and is excellent in the joining operation, comparable to the active solder filler with the active element titanium and trace rare earth elements.

如第2圖所示,本發明之活性軟銲填料之第二實施例,於大氣環境下接合潤濕性低之靶材與背板之方法:係如下列步驟: As shown in Fig. 2, a second embodiment of the active solder filler of the present invention is a method of joining a target having a low wettability to a backing plate in an atmospheric environment: as follows:

步驟S40:預先將填料合金及活性元素,以預定之重量百分比準備好,以真空電弧熔煉爐來融製,抽真空至10-2~10-3torr以上,通入氬氣做為保護氣氛,之後得到活性軟銲填料10; Step S40: Prepare the filler alloy and the active element in a predetermined weight percentage in advance, melt it in a vacuum arc melting furnace, evacuate to a temperature of 10 -2 to 10 -3 torr or more, and pass argon gas as a protective atmosphere. Afterwards, the active solder filler 10 is obtained;

步驟S42:接合前,第一、第二接合物20與30之表面以砂紙研磨,再置於丙酮中以超音波震盪清洗以去除表面油漬。 Step S42: Before joining, the surfaces of the first and second joints 20 and 30 are ground with sandpaper, and then placed in acetone to be ultrasonically oscillated to remove surface oil stains.

步驟S44:以機械活化方式促使活性軟銲填料10與第一、第二接合物20與30產生潤濕。 Step S44: causing the active solder filler 10 to wet with the first and second joints 20 and 30 in a mechanically activated manner.

步驟S46:當活性軟銲填料10能完全潤濕並均勻塗佈於接合材料表面,再將第一、第二接合物20與30相互疊合,利用摩擦的方式 將氣孔排出並使活性軟銲填料10表面氧化物破裂,提升接合效果達到緊密接合。 Step S46: when the active solder filler 10 can be completely wetted and uniformly coated on the surface of the bonding material, and then the first and second bonding materials 20 and 30 are superposed on each other, using friction The pores are discharged and the surface oxide of the active solder filler 10 is broken, and the bonding effect is improved to achieve close bonding.

綜上所述,本發明為一種活性軟銲填料以及利用該活性軟銲填料接合靶材跟背板的方法,其係於該活性軟銲填料中添加活性元素,增進靶材表面之潤溼性,讓接合操作可以直接完成,而不需讓靶材表面鍍上金屬層後為之,其優點及功效列舉如下: In summary, the present invention is an active solder filler and a method for bonding a target and a back sheet by using the active solder filler, which is an active element added to the active solder filler to improve the wettability of the surface of the target. The bonding operation can be directly completed without the metal layer being plated on the surface of the target. The advantages and effects are listed as follows:

1.本發明所研發之活性軟銲填料,可於大氣環境中直接接合潤濕性低之靶材與背板,而不需要特別的防護裝置,在使用上相當的方便,也節省了成本與簡化了流程。 1. The active soldering filler developed by the invention can directly join the target and the backing plate with low wettability in the atmospheric environment, without special protection device, and is convenient and convenient to use, and also saves cost and Simplified the process.

2.主要接合溫度在於150℃至200℃之間,此範圍介於一般低溫銲料溫度與高溫銲料溫度之間,可減少熱應力產生的問題,並且該溫度範圍沒有落於以往操作範圍之外,故加工時可直接以原設備進行操作,而不需添購新的設備。 2. The main bonding temperature is between 150 ° C and 200 ° C, which is between the normal low temperature solder temperature and the high temperature solder temperature, which can reduce the problem of thermal stress, and the temperature range does not fall outside the previous operating range. Therefore, it can be directly operated by the original equipment during processing without adding new equipment.

3.可對潤濕性低之靶材與背板進行接合,本發明之活性軟銲填料其重要技術特徵,係在金屬基材中添加特定比例之活性元素,使欲接合之兩者的表面反應,以產生鍵結,而使得潤濕性低之靶材與背板在大氣環境中能有效接合,且不需使用助銲劑,省下了成本與步驟。 3. The target having low wettability and the back sheet can be joined. The important technical feature of the active solder fill filler of the present invention is to add a certain proportion of active elements to the metal substrate to make the surface of the joint to be joined. The reaction is such that a bond is formed, so that the target having low wettability and the back sheet can be effectively joined in the atmosphere, and the flux is not required, thereby saving cost and steps.

4.本發明之活性軟銲填料,其中的金屬基材為錫鋅合金,比起一般銲料更加軟些,如此能減少熱應力的問題,讓接合強度更能提昇。 4. The active solder filler of the present invention, wherein the metal substrate is a tin-zinc alloy, which is softer than a general solder, so that the problem of thermal stress can be reduced, and the joint strength can be further improved.

雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the present invention has been described in its preferred embodiments, the present invention is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application.

10‧‧‧活性軟銲填料 10‧‧‧Active soft solder filler

20‧‧‧第一接合物 20‧‧‧First joint

21‧‧‧第一接合面 21‧‧‧First joint

30‧‧‧第二接合物 30‧‧‧Second joint

31‧‧‧第二接合面 31‧‧‧Second joint

Claims (3)

一種活性軟銲填料之組成物,其包含:一活性物,選自於鈦及稀土元素;以及一金屬基材,包含錫鋅合金,以及一添加物為鉍,其在該活性軟銲填料中之重量百分比介於0.1wt%至10wt%。 A composition of an active solder filler comprising: an active selected from the group consisting of titanium and a rare earth element; and a metal substrate comprising a tin-zinc alloy, and an additive being ruthenium, in the active solder filler The weight percentage ranges from 0.1 wt% to 10 wt%. 如申請專利範圍第1項所述之活性軟銲填料之組成物,其中該稀土元素係選自於鑭(La)、鈰(Ce)、鏷(Pr)、釹(Nd)、鉅(Pm)、釤(Sm)、銪(Eu)、釓(Gd)、鋱(Tb)、鏑(Dy)、鈥(Ho)、鉺(Er)、銩(Tm)、鐿(Yb)、鎦(Lu)、釔(y)、鈧(Sc)及上述任意組合之其中之一者。 The composition of the active solder filler according to claim 1, wherein the rare earth element is selected from the group consisting of lanthanum (La), cerium (Ce), praseodymium (Pr), cerium (Nd), and giant (Pm). , Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu , 钇 (y), 钪 (Sc), and any combination of the above. 一種活性軟銲填料之組成物,其包含:一活性物,選自於鎂;以及一金屬基材,包含錫鋅合金,以及一添加物為鉍,其在該活性軟銲填料中之重量百分比介於0.1wt%至10wt%。 A composition of an active solder filler comprising: an active selected from the group consisting of magnesium; and a metal substrate comprising a tin-zinc alloy, and an additive being ruthenium, the weight percentage of the active solder filler It is between 0.1% by weight and 10% by weight.
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TWI296555B (en) * 2005-12-19 2008-05-11 Liu Chuan Sheng
TWI298658B (en) * 2006-08-10 2008-07-11 Univ Nat Yunlin Sci & Tech
TWI322737B (en) * 2007-06-05 2010-04-01 Univ Nat Yunlin Sci & Tech
TWM389411U (en) * 2010-05-18 2010-09-21 Darfon Electronics Corp Circuit board

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI296555B (en) * 2005-12-19 2008-05-11 Liu Chuan Sheng
TWI298658B (en) * 2006-08-10 2008-07-11 Univ Nat Yunlin Sci & Tech
TWI322737B (en) * 2007-06-05 2010-04-01 Univ Nat Yunlin Sci & Tech
TWM389411U (en) * 2010-05-18 2010-09-21 Darfon Electronics Corp Circuit board

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