TWI511630B - High temperature resistance and high reflectivity for printed circuit boards covered with protective film - Google Patents
High temperature resistance and high reflectivity for printed circuit boards covered with protective film Download PDFInfo
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本發明係關於一種印刷電路板用覆蓋保護膠片,尤指一種具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片。The invention relates to a cover protection film for a printed circuit board, in particular to a cover protection film for a printed circuit board having high temperature resistance and high reflectivity.
現有技術之電子產品的光源模組,為了達到特定的光傳遞及光分佈之效果,係需藉由二次光學元件的使用。但當光源模組之光源元件所產生之光線經過二次光學元件時,會有如光吸收及光散射等光損失發生,除了造成光線被浪費掉而無法有效利用外,亦會影響該電子產品整體的出光效率及光演色性;再加上,光源模組之光源元件所產生之光線於經過二次光學元件後,其發光強度係隨傳遞距離的增長而衰減,則需要提高光源模組之光源的發光強度以確保電子產品的出光效率。舉例來說,顯示器之背光模組中,可透過導光板來達到面光源及勻光之效果,但導光板之光吸收及光散射會造成光損失。In order to achieve a specific light transmission and light distribution effect, the light source module of the prior art electronic product needs to be used by a secondary optical component. However, when the light generated by the light source component of the light source module passes through the secondary optical component, light loss such as light absorption and light scattering occurs, and the light is wasted and cannot be effectively utilized, and the overall electronic product is also affected. The light-emitting efficiency and the light color rendering property; in addition, after the light generated by the light source component of the light source module passes through the secondary optical component, the light-emitting intensity is attenuated as the transmission distance increases, and the light source of the light source module needs to be improved. The luminous intensity to ensure the light output efficiency of electronic products. For example, in the backlight module of the display, the surface light source and the uniform light effect can be achieved through the light guide plate, but the light absorption and light scattering of the light guide plate cause light loss.
請參閱圖10所示,為降低二次光學元件所造成的光損失,現有技術提供一種具有反射油墨層的印刷電路板供電子產品的光源模組之光源元件使用,該反射油墨層81係以油墨印刷成形於印刷電路板82之一表面上,光源模組之光源元件83則經由表面黏著(SMT,Surface Mount Technology)製程設置於該表面上;光源模組之光源元件83朝印刷電路板82之表面方向的散射光線可被該反射油墨層81反射,並朝向遠離印刷電路板82的方向前進,藉此提升電子產品的出光效率及光演色性。Referring to FIG. 10, in order to reduce the light loss caused by the secondary optical component, the prior art provides a printed circuit board having a reflective ink layer for use in a light source component of a light source module of an electronic product, the reflective ink layer 81 being The ink is printed on one surface of the printed circuit board 82, and the light source element 83 of the light source module is adhered via the surface (SMT, Surface Mount) The process is disposed on the surface; the scattered light of the light source element 83 of the light source module toward the surface of the printed circuit board 82 can be reflected by the reflective ink layer 81 and proceed toward the direction away from the printed circuit board 82, thereby lifting Light output efficiency and light color rendering of electronic products.
惟現有技術之反射油墨層81係具有以下缺點:However, the prior art reflective ink layer 81 has the following disadvantages:
1、於經光源元件83表面黏著製程後,由於表面黏著製程之操作溫度介於160至320℃之間,使得以油墨印刷成形的反射油墨層81會發生黃變(Yellowing),因而降低反射油墨層之反射率(Reflection)。1. After the surface of the light source component 83 is adhered, since the operating temperature of the surface adhesion process is between 160 and 320 ° C, the reflective ink layer 81 formed by ink printing will yellow, thereby reducing the reflective ink. The reflectivity of the layer (Reflection).
2、當藉由增加印刷成形的反射層之厚度以提高其反射率,當印刷之反射層厚度增厚後,在反射層無使用基材支撐之狀況下,油墨於成型裁切製程及印刷電路板撓折應用(R角小於0.5mm)時,反射層容易發生脆裂。2. When the thickness of the reflective layer formed by printing is increased to increase the reflectance thereof, after the thickness of the printed reflective layer is thickened, the ink is formed in the cutting process and the printed circuit without using the substrate to support the reflective layer. When the plate is flexed (when the R angle is less than 0.5 mm), the reflective layer is prone to brittle fracture.
鑒於上述現有技術之缺點,本發明之目的在於提供一種具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片,其於表面黏著製程後不產生黃變,並仍具有高反射率,且具有較佳結構強度則不易脆裂。In view of the above-mentioned shortcomings of the prior art, an object of the present invention is to provide a cover protective film for a printed circuit board having high temperature resistance and high reflectivity, which does not cause yellowing after the surface adhesion process, and still has high reflectance, and It has less structural strength and is less prone to brittle fracture.
為了達成前述之發明目的,本發明所採取的技術手段係令該具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片,包含:一耐高溫高分子膜,其厚度介於2至125微米(μm)之間,其熔點大於260℃,且其具有二側面;一高反射高分子複合材料層,係設置於該耐高溫高分子膜之一側面上,其厚度介於2至30微米之間,其中包含 有一第一反光色料,該第一反光色料的折射率大於1;一黏著層,其設置於該耐高溫高分子膜遠離該高反射高分子複合材料層之另一側面上,其厚度介於10至75微米之間;其中,於具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片整體之反射率大於89%之波段,該耐高溫高分子薄膜之吸收率小於35%。In order to achieve the foregoing object, the technical means adopted by the present invention is to cover the protective film for a printed circuit board having high temperature resistance and high reflectivity, comprising: a high temperature resistant polymer film having a thickness of 2 to 125 Between micrometers (μm), the melting point is greater than 260 ° C, and has two sides; a highly reflective polymer composite layer is disposed on one side of the high temperature resistant polymer film, the thickness of which is between 2 and 30 microns Between, which contains a first reflective coloring material, the first reflective coloring material has a refractive index greater than 1; an adhesive layer disposed on the other side of the high-temperature resistant polymer composite layer, the thickness of which is The light-resistant polymer film has an absorption rate of less than 35% in a wavelength range of greater than 89% for the entire protective cover film for a printed circuit board having high temperature resistance and high reflectance.
依據本發明,所述耐高溫性係指能經過製程溫度介於160至320之間且製程時間為10至180秒的表面黏著製程而不產生黃變及脫層現象。According to the present invention, the high temperature resistance refers to a surface adhesion process capable of passing a process temperature of between 160 and 320 and a process time of 10 to 180 seconds without causing yellowing and delamination.
依據本發明,所述高反射率,係於波長介於415至700奈米之波段,反射率介於89%至100%之間。較佳的,於415至700奈米之波段,該具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片整體之反射率為89%至100%之間。According to the invention, the high reflectivity is in the wavelength range from 415 to 700 nm and the reflectance is between 89% and 100%. Preferably, in the wavelength range of 415 to 700 nm, the overall coverage of the cover film for the high temperature resistance and high reflectivity of the printed circuit board is between 89% and 100%.
基於上述,透過含有第一反光色料的高反射高分子複合材料層之使用,提高光源元件之光線被高反射高分子複合材料層反射之比例,降低光源元件之光線穿透高反射高分子複合材料層之比例;藉由於具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片整體之反射率大於89%之波段,具有35%以下的吸收率之耐高溫高分子薄膜之使用,使得該波段之穿透光被吸收的情形降低並能進行多重反射,則能達到增加電子產品之整體出光強度、減少電子產品之光源元件之功率並提升電子產品之光演色性。其中,且耐高溫高分子膜之熔點係大於260℃,從而本發明 之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片,於進行表面黏著製程後,能具有不產生黃變及脫層現象之優點。Based on the above, the use of the highly reflective polymer composite layer containing the first reflective colorant improves the ratio of the light of the light source component to the high-reflection polymer composite layer, and reduces the light-transmitting high-reflection polymer composite of the light source component. The ratio of the material layer; the use of a high-temperature resistant polymer film having an absorption ratio of 35% or less by using a high-reflectivity-resistant and high-reflectance printed circuit board covering a protective film with a reflectance of more than 89% as a whole When the transmitted light of the band is absorbed and the multiple reflections are performed, the overall light output intensity of the electronic product can be increased, the power of the light source component of the electronic product can be reduced, and the light color rendering property of the electronic product can be improved. Wherein, the melting point of the high temperature resistant polymer film is greater than 260 ° C, thereby the present invention Covering protective film for printed circuit boards with high temperature resistance and high reflectivity can have the advantages of no yellowing and delamination after the surface adhesion process.
另外,藉由該耐高溫高分子薄膜之設置,係能支撐高反射高分子複合材料層,使得所述具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片於撓折或裁切製程中,具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片不易發生脆裂。In addition, by providing the high-temperature resistant polymer film, the high-reflection polymer composite material layer can be supported, so that the printed circuit board with high temperature resistance and high reflectivity is covered by the protective film for the flexing or cutting process. In the case of high temperature resistance and high reflectivity, the cover film for the printed circuit board is less prone to brittle cracking.
此外,藉由令該黏著層之厚度介於10至75微米間,係能夠達到覆蓋印刷電路板上之線路間隙之功效。In addition, by making the thickness of the adhesive layer between 10 and 75 microns, it is possible to achieve the effect of covering the line gap on the printed circuit board.
較佳者,該高反射高分子複合材料層之厚度的公差為+2/-2微米,係具有良好的厚度均勻性,相對於現有技術之反射油墨而言,更可進一步提升其對於光線的反射均勻性。Preferably, the high-reflection polymer composite layer has a thickness tolerance of +2/-2 micrometers, which has good thickness uniformity, and can further enhance the light for the reflective ink of the prior art. Reflection uniformity.
較佳的,該黏著層包含有一第二反光色料,該耐高溫高分子膜包含有一第三反光色料。Preferably, the adhesive layer comprises a second reflective coloring material, and the high temperature resistant polymer film comprises a third reflective coloring material.
較佳的,該第二反光色料之折射率大於1,該第三反光色料之折射率大於1。Preferably, the second reflective pigment has a refractive index greater than 1, and the third reflective pigment has a refractive index greater than 1.
較佳的,該第一反光色料佔該高反射高分子複合材料層整體之20至70體積百分比,該第二反光色料佔該黏著層整體之10至50體積百分比,該第三反光色料佔該耐高溫高分子膜整體之1至20體積百分比。Preferably, the first reflective colorant accounts for 20 to 70 volume percent of the entire high reflection polymer composite material layer, and the second reflective color pigment accounts for 10 to 50 volume percent of the entire adhesive layer, the third reflective color. The material accounts for 1 to 20% by volume of the entire high temperature resistant polymer film.
較佳的,該第一反光色料係包含至少一選自於二氧化鈦(titanium dioxide)、硫酸鋇(barium sulfate)、硫酸鍶(strontium sulfate)、氧化鋁(aluminium oxide)、氧化鋯 (zirconium dioxide)、氧化鋅(zinc oxide)、氧化鎂(magnesium oxide)、氧化鈣(calcium oxide)、氮化硼(boron nitride)、氮化鋁(aluminium nitride)、碳酸鈣(calcium carbonate)、氫氧化鋁(aluminium hydroxide)及氫氧化鎂(magnesium hydroxide)所構成的群組中之物質。Preferably, the first reflective colorant comprises at least one selected from the group consisting of titanium dioxide, barium sulfate, strontium sulfate, aluminum oxide, and zirconia. (zirconium dioxide), zinc oxide, magnesium oxide, calcium oxide, boron nitride, aluminum nitride, calcium carbonate, hydrogen a substance in a group consisting of aluminum hydroxide and magnesium hydroxide.
較佳的,該第二反光色料係包含至少一選自於二氧化鈦、硫酸鋇、硫酸鍶、氧化鋁、氧化鋯、氧化鋅、氧化鎂、氧化鈣、氮化硼、氮化鋁、碳酸鈣、氫氧化鋁及氫氧化鎂所構成的群組中之物質。Preferably, the second reflective colorant comprises at least one selected from the group consisting of titanium dioxide, barium sulfate, barium sulfate, aluminum oxide, zirconium oxide, zinc oxide, magnesium oxide, calcium oxide, boron nitride, aluminum nitride, calcium carbonate. a substance in a group consisting of aluminum hydroxide and magnesium hydroxide.
較佳的,該第三反光色料係包含至少一選自於二氧化鈦、硫酸鋇、硫酸鍶、氧化鋁、氧化鋯、氧化鋅、氧化鎂、氧化鈣、氮化硼、氮化鋁、碳酸鈣、氫氧化鋁及氫氧化鎂所構成的群組中之物質。Preferably, the third reflective colorant comprises at least one selected from the group consisting of titanium dioxide, barium sulfate, barium sulfate, aluminum oxide, zirconium oxide, zinc oxide, magnesium oxide, calcium oxide, boron nitride, aluminum nitride, calcium carbonate. a substance in a group consisting of aluminum hydroxide and magnesium hydroxide.
依據本發明,所述具耐高溫及高反射率的印刷電路板用覆蓋保護膠片除了具有於表面黏著製程後不產生黃變並具有高反射率,及具有較佳結構強度之特點外,亦具有低厚度之特點,係能符合產業上輕薄之趨勢。較佳的,該耐高溫高分子膜之厚度介於6至25微米之間,該高反射高分子複合材料層之厚度介於6至20微米之間,該黏著層之厚度介於10至35微米之間。更佳的,該耐高溫高分子膜之厚度介於6至12微米之間。According to the present invention, the cover protective film for a printed circuit board having high temperature resistance and high reflectivity has the characteristics of not having yellowing after surface adhesion process and having high reflectivity, and having better structural strength, and also having The characteristics of low thickness can meet the trend of thin industry. Preferably, the high temperature resistant polymer film has a thickness of between 6 and 25 microns, the high reflective polymer composite layer has a thickness of between 6 and 20 microns, and the adhesive layer has a thickness of between 10 and 35 Between microns. More preferably, the high temperature resistant polymer film has a thickness of between 6 and 12 microns.
依據本發明,該高反射高分子複合材料層包含一第一具反應性官能基樹酯及一第一交聯劑。該第一具反應性官能基樹酯之反應性官能基係包含至少一選自於由羧基(carboxy group)、胺基(amine group)、環氧基(epoxy group)、羥基(hydroxy group)及雙鍵(double bond)所構成的群組中之官能基。該第一交聯劑係含有兩個以上交聯反應性官能基之芳香族化合物或脂肪族化合物,該第一交聯劑之交聯反應性官能基係包含至少一選自於由羧基(carboxy group)、酸酐(anhydride group)、胺基(amine group)、羥基、環氧基(epoxy group)、異氰酸基(isocyanate)及雙鍵(double bond)所構成的群組中之官能基。According to the invention, the highly reflective polymer composite layer comprises a first reactive functional resin and a first crosslinking agent. The reactive functional group of the first reactive functional resin comprises at least one selected from the group consisting of a carboxy group, an amine group, and an epoxy group. Group), a functional group in a group consisting of a hydroxy group and a double bond. The first crosslinking agent is an aromatic compound or an aliphatic compound containing two or more crosslinking reactive functional groups, and the crosslinking reactive functional group of the first crosslinking agent comprises at least one selected from the group consisting of a carboxyl group (carboxyl) Group), an anhydride group, an amine group, a hydroxyl group, an epoxy group, an isocyanate group, and a double bond.
依據本發明,該黏著層包含一包含一第二具反應性官能基樹酯及一第二交聯劑,該第二具反應性官能基樹酯之反應性官能基係包含至少一選自於由羧基、胺基、環氧基及羥基所構成的群組中之官能基。該第二交聯劑係含有兩個以上交聯反應性官能基之芳香族化合物或脂肪族化合物,該第二交聯劑之交聯反應性官能基係包含至少一選自於由羧基、酸酐、胺基、羥基、環氧基及異氰酸基所構成的群組中之官能基。According to the present invention, the adhesive layer comprises a second reactive functional resin and a second crosslinking agent, and the reactive functional group of the second reactive functional resin comprises at least one selected from the group consisting of a carboxyl group. a functional group in the group consisting of an amine group, an epoxy group, and a hydroxyl group. The second crosslinking agent is an aromatic compound or an aliphatic compound containing two or more crosslinking reactive functional groups, and the crosslinking reactive functional group of the second crosslinking agent comprises at least one selected from the group consisting of a carboxyl group and an acid anhydride. a functional group in the group consisting of an amine group, a hydroxyl group, an epoxy group, and an isocyanate group.
較佳的,該耐高溫高分子膜包含至少一選自由聚苯硫醚(polyphenylene sulfide)、聚萘二甲酸乙二醇酯(polyethylene naphthalate)及聚醚醚酮(poly(ether ether ketone))所構成的群組中的高分子薄膜。Preferably, the high temperature resistant polymer film comprises at least one selected from the group consisting of polyphenylene sulfide, polyethylene naphthalate, and poly(ether ether ketone). A polymer film in a group formed.
依據本發明,該具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片可包含有一離型層,該離型層設於該黏著層遠離該耐高溫高分子膜之一側面上,該離型層包含塑膠離型膜或離型紙等離型材,但不以此為限。According to the present invention, the cover protective film for a printed circuit board having high temperature resistance and high reflectivity may include a release layer disposed on a side of the adhesive layer away from the high temperature resistant polymer film. The release layer comprises a plastic release film or a release paper release profile, but is not limited thereto.
依據本發明,該具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片之可同時應用於硬式電路板及軟式 電路板。According to the present invention, the cover film for the high temperature resistance and high reflectivity of the printed circuit board can be simultaneously applied to the hard circuit board and the soft type. Circuit board.
10、10A‧‧‧印刷電路板用覆蓋保護膠片10, 10A‧‧‧ Covered protective film for printed circuit boards
11、11A‧‧‧耐高溫高分子膜11, 11A‧‧‧High temperature resistant polymer film
12‧‧‧高反射高分子複合材料層12‧‧‧High-reflection polymer composite layer
13、13A‧‧‧黏著層13, 13A‧‧‧ adhesive layer
20、20A‧‧‧印刷電路板20, 20A‧‧‧ Printed circuit board
30、30A‧‧‧第一樣品30, 30A‧‧‧ first sample
40、40A‧‧‧光源元件40, 40A‧‧‧Light source components
50‧‧‧印刷電路板50‧‧‧Printed circuit board
60‧‧‧反射油墨層60‧‧‧Reflective ink layer
70‧‧‧光源元件70‧‧‧Light source components
81‧‧‧反射油墨層81‧‧‧Reflective ink layer
82‧‧‧印刷電路板82‧‧‧Printed circuit board
83‧‧‧光源元件83‧‧‧Light source components
圖1為本發明之具耐高溫性及高反射率的印刷電路板用覆蓋保護膠片的剖面側視示意圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional side elevational view of a cover protective film for a printed circuit board having high temperature resistance and high reflectance according to the present invention.
圖2為本發明之實施例1至11之具耐高溫性及高反射率的印刷電路板用覆蓋保護膠片貼合於印刷電路板上進行反射率檢測之剖面側視示意圖。2 is a cross-sectional side elevational view showing the reflectance detection of a printed circuit board with high temperature resistance and high reflectance according to Embodiments 1 to 11 of the present invention, which is attached to a printed circuit board.
圖3為本發明之實施例4至11之具耐高溫性及高反射率的印刷電路板用覆蓋保護膠片進行表面黏著製程之部分剖面側視示意圖。Fig. 3 is a partial cross-sectional side elevational view showing the surface adhesion process of the printed circuit board with high temperature resistance and high reflectance according to Examples 4 to 11 of the present invention.
圖4為本發明之實施例4至7之具耐高溫性及高反射率的印刷電路板用覆蓋保護膠片之反射光譜圖。圖中分別以符號「■」標示實施例4、符號「●」標示實施例5、符號「▲」標示實施例6、符號「▼」標示實施例7。4 is a reflection spectrum diagram of a cover protective film for a printed circuit board having high temperature resistance and high reflectance according to Examples 4 to 7 of the present invention. In the figure, the symbol "" is used to indicate the embodiment 4, the symbol "●" is used to indicate the embodiment 5, the symbol "▲" is used to indicate the embodiment 6, and the symbol "▼" is used to indicate the embodiment 7.
圖5為本發明之實施例4至6及實施例8至11之具耐高溫性及高反射率的印刷電路板用覆蓋保護膠片之耐高溫高分子膜之吸收光譜圖。圖中分別以符號「●」標示使用50微米PET之實施例8、符號「■」標示使用125微米PET之實施例9、符號「◆」標示使用50微米PPS之實施例10、符號「▲」標示使用12.5微米polyimide之實施例4至6、符號「▼」標示使用12.5微米PEEK之實施例11。5 is an absorption spectrum diagram of a high temperature resistant polymer film for a protective film for a printed circuit board having high temperature resistance and high reflectance according to Examples 4 to 6 and Examples 8 to 11 of the present invention. In the figure, the symbol "●" indicates the embodiment 8 using 50 micron PET, the symbol "■" indicates the embodiment 9 using 125 micron PET, the symbol "◆" indicates the embodiment 10 using the 50 micron PPS, and the symbol "▲". Examples 4 through 6 using the 12.5 micron polyimide designation and "▼" are used to indicate Example 11 using 12.5 micron PEEK.
圖6為本發明之實施例6及實施例11之具耐高溫性及高反射率的印刷電路板用覆蓋保護膠片之耐高溫高分子膜之反射光譜圖。圖中以符號「■」標示實施例11並以符號 「▲」標示實施例6。Fig. 6 is a reflection spectrum diagram of a high temperature resistant polymer film for a protective film for a printed circuit board having high temperature resistance and high reflectance according to Example 6 and Example 11 of the present invention. In the figure, the symbol "" is used to indicate the embodiment 11 and is symbolized. "▲" indicates Example 6.
圖7為本發明之實施例8至10之具耐高溫性及高反射率的印刷電路板用覆蓋保護膠片之耐高溫高分子膜之反射光譜圖。圖中分別以符號「■」標示實施例10、符號「▲」標示實施例8、符號「●」標示實施例9。Fig. 7 is a reflection spectrum diagram of a high temperature resistant polymer film for a protective film for a printed circuit board having high temperature resistance and high reflectance according to Examples 8 to 10 of the present invention. In the figure, the symbol "" is used to designate the embodiment 10, the symbol "▲" is used to indicate the embodiment 8, and the symbol "●" is used to indicate the embodiment 9.
圖8為本發明之對照例1之具有反射油墨層的印刷電路板的部分剖面側視示意圖。Figure 8 is a partially cross-sectional side elevational view showing a printed circuit board having a reflective ink layer of Comparative Example 1 of the present invention.
圖9為本發明之對照例1及2之具有反射油墨層的印刷電路板之反射光譜圖。圖中分別以符號「▲」標示進行耐熱性檢測前之對照例1、符號「▼」標示進行耐熱性檢測後之對照例1、符號「■」標示進行耐熱性檢測前之對照例2、符號「●」標示進行耐熱性檢測後之對照例2。Fig. 9 is a reflection spectrum diagram of a printed circuit board having a reflective ink layer of Comparative Examples 1 and 2 of the present invention. In the figure, the control example 1 before the heat resistance test is indicated by the symbol "▲", the symbol "▼" indicates the control example after the heat resistance test, the symbol "■" indicates the control example 2 before the heat resistance test, and the symbol "●" indicates Comparative Example 2 after heat resistance test.
圖10為現有技術之具有反射油墨層的印刷電路板之部分剖面側視示意圖。Figure 10 is a partial cross-sectional side elevational view of a prior art printed circuit board having a reflective ink layer.
實施例1Example 1
請參閱圖1所示,於本實施例中,本發明之具耐高溫性及高反射率的印刷電路板用覆蓋保護膠片10,係包含有一耐高溫高分子膜11、一高反射高分子複合材料層12、一黏著層13及一離型層。該耐高溫高分子膜11具有相對應之二側面,該高反射高分子複合材料層12及該黏著層13分別設於該耐高溫高分子膜11之二側面上,該離型層設於該黏著層13遠離該耐高溫高分子膜11之一側面上。Referring to FIG. 1 , in the embodiment, the cover protection film 10 for a printed circuit board having high temperature resistance and high reflectivity comprises a high temperature resistant polymer film 11 and a high reflection polymer composite. The material layer 12, an adhesive layer 13 and a release layer. The high-temperature resistant polymer film 11 has two corresponding side surfaces, and the high-reflection polymer composite material layer 12 and the adhesive layer 13 are respectively disposed on two sides of the high-temperature resistant polymer film 11, and the release layer is disposed on the side The adhesive layer 13 is away from one side of the high temperature resistant polymer film 11.
於本實施例中,所述具耐高溫及高反射率的印刷電路板用覆蓋保護膠片10之製備方法,包含: 提供該耐高溫高分子膜11;設置該高反射高分子複合材料層12於該耐高溫高分子膜11之一側面上,包含:先將一第一具反應性官能基樹酯、一第一交聯劑及一催化劑混合形成一第一混合溶液;將一第一反光色料藉由物理分散技術分散於該第一混合溶液中而形成一預高反射高分子複合材料溶液;藉由表面塗膜技術將該預高反射高分子複合材料溶液披覆於該耐高溫高分子薄膜之一側面上形成一預高反射高分子複合材料層12;對該預高反射高分子複合材料層12加熱,使得該第一具反應性官能基樹酯及該第一交聯劑進行交聯反應而固化,形成該高反射高分子複合材料層12;設置該黏著層13於該耐高溫高分子膜11遠離該高反射高分子複合材料層12之一側面上,包含:先將一第二具反應性官能基樹酯及一第二交聯劑混合形成一第二混合溶液;將一第二反光色料藉由物理分散技術分散於該第二混合溶液中而形成一黏著液;藉由表面塗膜技術將該黏著液披覆於該耐高溫高分子薄膜之一側面上以形成該黏著層13;以及貼附該離型層於該黏著層13遠離該耐高溫高分子膜11之一側面上;其中,該耐高溫高分子膜11為聚醯亞胺(polyimide)膜,其厚度為12.5微米,且其熔點大於260℃。該第一具反應性官能基樹酯為具烴基(hydroxy group)的聚酯-聚醇樹酯共聚物(polyester-polyol copolymer)。該第一交聯劑為聚異氰酸酯(HDI polyisocyanate),該第一反光色料(reflected pigment)為折射率(reflection index)大於1的二氧化鈦(TiO2 )粉體,該高反射高分子複合材料層12之厚度為20微米,該高反射高分子複合材料層12中所含有的該二氧化鈦粉體為20體積百分比(vol%)。該第二具反應性官能基樹酯為具環氧基(epoxy group)之環氧樹脂,該第二交聯劑為具有兩個胺基(amine group)之雙胺(diamine),該第二反光色料為折射率大於1的碳酸鈣(calcium carbonate)粉體,該黏著層13可採用約25微米之厚度,何如在相關工藝中可接受之諸如正負2微米之差距而在23微米至27微米之厚度。本實施例中所採用該黏著層13之厚度為25微米,該黏著層13中所含有的該碳酸鈣粉體為10體積百分比,該離形層可為塑膠離型膜或離型紙等離型材。於本實施例中係採用離型紙作為該離形層。In the present embodiment, the method for manufacturing the cover protective film 10 for a printed circuit board having high temperature resistance and high reflectivity comprises: providing the high temperature resistant polymer film 11; and providing the high reflective polymer composite material layer 12 One side of the high temperature resistant polymer film 11 comprises: first mixing a first reactive functional resin, a first crosslinking agent and a catalyst to form a first mixed solution; and using a first reflective coloring material Forming a pre-high-reflection polymer composite solution by dispersing in the first mixed solution by physical dispersion technology; coating the pre-high-reflection polymer composite solution on the high-temperature resistant polymer film by surface coating technology Forming a pre-high-reflection polymer composite layer 12 on one side; heating the pre-high-reflection polymer composite layer 12 to crosslink the first reactive functional resin and the first crosslinking agent And forming the high-reflection polymer composite layer 12; the adhesive layer 13 is disposed on a side of the high-temperature resistant polymer film 11 away from the high-reflection polymer composite layer 12, comprising: first The two reactive functional resin and a second crosslinking agent are mixed to form a second mixed solution; a second reflective color is dispersed in the second mixed solution by a physical dispersion technique to form an adhesive; Surface coating technology coating the adhesive on one side of the high temperature resistant polymer film to form the adhesive layer 13; and attaching the release layer to the adhesive layer 13 away from the high temperature resistant polymer film 11 On the side surface, the high temperature resistant polymer film 11 is a polyimide film having a thickness of 12.5 micrometers and a melting point of more than 260 °C. The first reactive functional resin is a polyester-polyol copolymer having a hydroxy group. The first crosslinking agent is a polyisocyanate (HDI polyisocyanate), and the first reflective pigment is a titanium dioxide (TiO 2 ) powder having a refractive index greater than 1, and the highly reflective polymer composite layer The thickness of 12 is 20 μm, and the titanium dioxide powder contained in the highly reflective polymer composite layer 12 is 20% by volume (vol%). The second reactive functional resin is an epoxy group having an epoxy group, and the second crosslinking agent is a diamine having two amine groups, the second reflective The colorant is a calcium carbonate powder having a refractive index greater than 1, and the adhesive layer 13 can have a thickness of about 25 microns, such as a difference of plus or minus 2 micrometers in the relevant process, and between 23 micrometers and 27 micrometers. The thickness. The thickness of the adhesive layer 13 used in the embodiment is 25 micrometers, and the calcium carbonate powder contained in the adhesive layer 13 is 10 volume percent, and the release layer can be a plastic release film or a release paper release profile. . In the present embodiment, a release paper is used as the release layer.
請參閱圖1及2所示,於本實施例中,係將所述具耐高溫及高反射率的印刷電路板用覆蓋保護膠片10之離型層剝離,得到一剝離離型層後之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片10,再將該剝離離型層後之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片10經壓合製程後,透過該黏著層13貼附於一印刷電路板20之一側面上,再進行熱固化製程以令該黏著層13行交聯反應而固化,得到一第一樣品30,以該第一樣品30進行反射率檢測。Referring to FIG. 1 and FIG. 2, in the embodiment, the printed circuit board with high temperature resistance and high reflectivity is peeled off from the release layer of the cover protective film 10 to obtain a peeling release layer. The printed circuit board for high temperature resistance and high reflectivity is covered with the protective film 10, and then the printed circuit board with high temperature resistance and high reflectivity after peeling off the release layer is subjected to a pressing process by the cover protective film 10, and the adhesive film is passed through the adhesive. The layer 13 is attached to one side of a printed circuit board 20, and then subjected to a thermal curing process to cure the adhesive layer 13 by cross-linking reaction to obtain a first sample 30, which is reflected by the first sample 30. Rate detection.
於本實施例中,所述之反射率檢測,其所使用的設備為日立U-4100光譜儀(Hitachi U-4100spectrometer),所使用之標準試片為日立原廠硫酸鋇標準 片(反射率為100%),反射率檢測值為於波長為550奈米,量測所述具耐高溫及高反射率的印刷電路板用覆蓋保護膠片整體之反射率相對於標準片之相對比較值。測試結果示於表1中。In the present embodiment, the reflectivity detection is performed by using a Hitachi U-4100 spectrometer (Hitachi U-4100 spectrometer), and the standard test piece used is Hitachi original barium sulfate standard. The sheet (reflectance is 100%), and the reflectance detection value is 550 nm at a wavelength, and the reflectance of the entire cover protective film for the printed circuit board having high temperature resistance and high reflectance is measured relative to the standard sheet. Compare values. The test results are shown in Table 1.
實施例2Example 2
本實施例概同於實施例1,其區別在於:該高反射高分子複合材料層中所含有作為第一反光色料的二氧化鈦粉體為30體積百分比。本實施例之測試結果示於表1。This embodiment is the same as Embodiment 1, except that the titanium dioxide powder as the first reflective coloring material in the highly reflective polymer composite material layer is 30% by volume. The test results of this example are shown in Table 1.
實施例3Example 3
本實施例概同於實施例1,其區別在於:該高反射高分子複合材料層中所含有作為第一反光色料的二氧化鈦粉體為60體積百分比。本實施例之測試結果示於表1。This embodiment is the same as Embodiment 1, except that the titanium dioxide powder as the first reflective coloring material in the highly reflective polymer composite material layer is 60% by volume. The test results of this example are shown in Table 1.
實施例4Example 4
請參閱圖3所示,本實施例概同於實施例1,其區別在於:所述具耐高溫及高反射率的印刷電路板用覆蓋保護膠片10A之高反射高分子複合材料層12之厚度為13微米。於本實施例中,所述之反射率檢測,係於波長介於400至700奈米,量測所述具耐高溫及高反射率的印刷 電路板用覆蓋保護膠片整體之反射率。Referring to FIG. 3, this embodiment is similar to Embodiment 1, except that the thickness of the highly reflective polymer composite material layer 12 covering the protective film 10A for the printed circuit board having high temperature resistance and high reflectivity is different. It is 13 microns. In the embodiment, the reflectance detection is performed at a wavelength of 400 to 700 nm, and the printing with high temperature resistance and high reflectance is measured. The board covers the overall reflectivity of the protective film.
此外,請參閱圖3所示,於本實施例中,另進行耐高溫檢測,其係令第一樣品30A進行表面黏著製程,以使一光源元件40A與該黏著層13A位於該印刷電路板20A之同一側面上。所述之表面黏著製程,其製程溫度為300℃,其製程時間為30秒。In addition, referring to FIG. 3, in the embodiment, the high temperature detection is performed, and the first sample 30A is subjected to a surface adhesion process so that a light source component 40A and the adhesive layer 13A are located on the printed circuit board. On the same side of 20A. The surface adhesion process has a process temperature of 300 ° C and a process time of 30 seconds.
另外,於本實施例中,另對該耐高溫高分子膜11A以日立U-4100光譜儀(Hitachi U-4100 spectrometer)進行吸收率量測,本實施例之耐高溫高分子膜11A為聚醯亞胺膜。In addition, in the present embodiment, the high-temperature resistant polymer film 11A is subjected to absorption measurement by a Hitachi U-4100 spectrometer (Hitachi U-4100 spectrometer), and the high temperature resistant polymer film 11A of the present embodiment is a polyaluminum. Amine film.
另外,於本實施例中,依據日本工業標準(Japanese Industry Standard,JIS)之JIS-K7105規範,測試具耐高溫性及高反射率之印刷電路板用覆蓋保護膠片整體經300℃耐高溫檢測後是否黃變,且依據CIE 1976(Lab)之NBS色差單位與感覺色差關係,△E值小於1.5為極微至輕微感覺色差。In addition, in the present embodiment, according to the Japanese Industrial Standard (JIS) JIS-K7105 specification, the cover protective film for a printed circuit board having high temperature resistance and high reflectance is tested after being subjected to high temperature resistance at 300 ° C. Whether it is yellow or not, and according to the NBS color difference unit of CIE 1976 (Lab) and the perceived color difference, the △E value is less than 1.5 for a slight to slight perceived chromatic aberration.
本實施例之測試結果示於表2、圖4及圖5中。The test results of this example are shown in Table 2, Figure 4 and Figure 5.
實施例5Example 5
本實施例概同於實施例4,其區別在於:該高反射高分子複合材料層之厚度為20微米。本實施例之測試結果示於表2、圖4及圖5中。This embodiment is similar to Embodiment 4 except that the thickness of the highly reflective polymer composite layer is 20 μm. The test results of this example are shown in Table 2, Figure 4 and Figure 5.
實施例6Example 6
本實施例概同於實施例4,其區別在於:該高反射高分子複合材料層之厚度為29微米。本實施例之測試結果示於表2及圖4至6中。This embodiment is similar to Embodiment 4 except that the thickness of the highly reflective polymer composite layer is 29 μm. The test results of this example are shown in Table 2 and Figures 4 to 6.
實施例7Example 7
本實施例概同於實施例4,其區別在於:該高反射高分子複合材料層之厚度為32微米。本實施例之測試結果示於表2、圖4及圖5中。This embodiment is similar to Embodiment 4 except that the thickness of the highly reflective polymer composite layer is 32 μm. The test results of this example are shown in Table 2, Figure 4 and Figure 5.
實施例8Example 8
本實施例概同於實施例4,其區別在於:該耐高溫高分子膜為聚對苯二甲酸乙二醇酯(polyethylene terephthalate,PET)膜,該聚對苯二甲酸乙二醇酯膜之厚度為50微米,且該高反射高分子複合材料層之厚度為29微米。本實施例之測試結果示於表3、圖5及圖7中。This embodiment is similar to Embodiment 4, and the difference is that the high temperature resistant polymer film is polyethylene terephthalate (polyethylene). Terephthalate, PET) film, the polyethylene terephthalate film has a thickness of 50 μm, and the high-reflection polymer composite layer has a thickness of 29 μm. The test results of this example are shown in Table 3, Figure 5 and Figure 7.
實施例9Example 9
本實施例概同於實施例8,其區別在於:該作為耐高溫高分子膜之聚對苯二甲酸乙二醇酯膜之厚度為125微米。本實施例之測試結果示於表3、圖5及圖7中。This embodiment is the same as Embodiment 8, except that the polyethylene terephthalate film as a high temperature resistant polymer film has a thickness of 125 μm. The test results of this example are shown in Table 3, Figure 5 and Figure 7.
實施例10Example 10
本實施例概同於實施例1,其區別在於:該耐高溫高分子膜為聚苯硫醚(poly(p-phenylene sulfide), PPS),該聚苯硫醚膜之厚度為50微米,且其熔點大於260℃。該高反射高分子複合材料層之厚度為29微米。該黏著層係以該第二混合溶液直接作為該黏著液,並藉由溼式塗佈方式將該黏著液披覆於該耐高溫高分子薄膜之一側面上而成形,該黏著層中所含有的第二反光色料為0體積百分比,亦即該黏著層不含第二反光色料。This embodiment is the same as Embodiment 1, except that the high temperature resistant polymer film is poly(p-phenylene sulfide). PPS), the polyphenylene sulfide film has a thickness of 50 μm and a melting point of more than 260 °C. The highly reflective polymer composite layer has a thickness of 29 microns. The adhesive layer is formed by directly applying the second mixed solution as the adhesive solution, and coating the adhesive on one side of the high temperature resistant polymer film by wet coating, and the adhesive layer is contained therein. The second reflective colorant is 0 volume percent, that is, the adhesive layer does not contain the second reflective colorant.
於本實施例中,所述之反射率檢測,係於400至700奈米之波段,量測所述具耐高溫及高反射率的印刷電路板用覆蓋保護膠片整體之反射率。且本實施例亦對該聚苯硫醚膜進行所述之反射率檢測。此外,於本實施例中,亦進行如實施例4所述之耐高溫檢測,亦對該聚苯硫醚膜進行如實施例4所述之吸收率檢測。本實施例之測試結果示於表4、圖5及圖7中。In the embodiment, the reflectance detection is performed in a wavelength range of 400 to 700 nm, and the reflectivity of the cover protective film for the printed circuit board having high temperature resistance and high reflectivity is measured. In this embodiment, the polyphenylene sulfide film is also subjected to the reflectance detection. Further, in the present example, the high temperature resistance test as described in Example 4 was also carried out, and the polyphenylene sulfide film was also subjected to the absorption rate detection as described in Example 4. The test results of this example are shown in Table 4, Figure 5 and Figure 7.
實施例11Example 11
本實施例概同於實施例10,其區別在於:該耐高溫高分子膜為聚醚醚酮(poly(ether ether ketone),PEEK)膜,該聚醚醚酮膜之熔點大於260℃。本實施例之測試結果示於表4、圖5及圖6中。This embodiment is similar to the embodiment 10 except that the high temperature resistant polymer film is a poly(ether ether ketone) (PEEK) film having a melting point of more than 260 ° C. The test results of this example are shown in Table 4, Figure 5 and Figure 6.
對照例1Comparative Example 1
請參閱圖8所示,於本對照例提供一具有反射油墨層的印刷電路板,係於一印刷電路板50之一側面上以油墨(冠品油墨,型號T-75)印刷成形一反射油墨層60。Referring to FIG. 8 , a printed circuit board having a reflective ink layer is provided on one side of a printed circuit board 50 by ink (crown ink, model T-75) to form a reflective ink. Layer 60.
於本對照例中,係令該具有反射油墨層的印刷電路板直接進行反射率檢測。再令該具有反射油墨層的印刷電路板進行耐高溫檢測:透過表面黏著製程,使一光源元件70與該反射油墨層60位於該印刷電路板50之同一側面上(如圖8所示)。而於該具有反射油墨層的印刷電路板進行耐高溫檢測之後,再次進行反射率檢測,並以JIS-K7105檢測是否黃變。In this comparative example, the printed circuit board having the reflective ink layer was directly subjected to reflectance detection. The printed circuit board having the reflective ink layer is further subjected to high temperature detection: a light source component 70 and the reflective ink layer 60 are disposed on the same side of the printed circuit board 50 (as shown in FIG. 8) through the surface adhesion process. After the high-temperature detection of the printed circuit board having the reflective ink layer, the reflectance detection was performed again, and the yellowing was detected by JIS-K7105.
於本對照例中,所述之反射率檢測,其入射光為可見光,其波長介於415至700奈米。所述之表面黏著製程,其製程溫度為288℃,其製程時間為10秒。本對照例之測試結果示於圖9及表5中。In the comparative example, the reflectance is detected, and the incident light is visible light, and the wavelength thereof is between 415 and 700 nm. The surface adhesion process has a process temperature of 288 ° C and a process time of 10 seconds. The test results of this comparative example are shown in Fig. 9 and Table 5.
對照例2Comparative Example 2
本對照例與對照例1之區別在於:所使用的油 墨為太陽油墨,其型號為PSR-4000。本對照例之測試結果示於圖9及表5中。The difference between this comparative example and Comparative Example 1 is that the oil used The ink is a solar ink and its model number is PSR-4000. The test results of this comparative example are shown in Fig. 9 and Table 5.
如圖9所示,於進行耐高溫檢測前,於415至700奈米之波段,對照例1及2之最高反射率皆為80%以下。而於耐高溫檢測後,於415至700奈米之波段,對照例1及2之最高反射率皆降至77%以下。如表5所示,於經耐高溫檢測後,對照例1及2之△E值分別為3.8及2.6,係皆大於1.5,則對照例1及2產生黃變;推知,經耐高溫檢測後,由於對照例1及2產生黃變而使其反射率降低。As shown in Fig. 9, before the high temperature resistance test, the highest reflectances of Comparative Examples 1 and 2 were 80% or less in the wavelength range of 415 to 700 nm. After the high temperature resistance test, the highest reflectance of Comparative Examples 1 and 2 fell below 77% in the band of 415 to 700 nm. As shown in Table 5, after the high temperature resistance test, the ΔE values of Comparative Examples 1 and 2 were 3.8 and 2.6, respectively, and all of them were greater than 1.5, and yellowing was observed in Comparative Examples 1 and 2; it was inferred that after high temperature detection Since the yellowing of Comparative Examples 1 and 2 caused yellowing, the reflectance was lowered.
由表1至5、圖4至7及9可知,當波長為550奈米時,實施例1至3及實施例5至11之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片的反射率皆達到89%以上,而對照例1及2之具有反射油墨層的印刷電路板反射率係低於80%,則實施例1至11之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片係具有較對照例1及2之具有反射油墨層的印刷電路板為佳的反射率。經耐高溫檢測後,實施例4至11之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片之△E值均小於1.5,則均未產生黃變。且對照例1及2之反射油墨層的厚度的公差為+15/-15微米,而實施例1至11之高反射高分子複合材料層的厚度的公差為+2/-2微米,顯示對照例1及2的反射油墨層之厚度均勻性較實施例1至11為差,則實施例1至11具有較對照例1及2為佳的厚度均勻性。It can be seen from Tables 1 to 5 and Figures 4 to 7 and that the printed circuit boards with high temperature resistance and high reflectivity of Examples 1 to 3 and Examples 5 to 11 are covered with protective film when the wavelength is 550 nm. The reflectances were all above 89%, and the reflectance of the printed circuit board having the reflective ink layer of Comparative Examples 1 and 2 was less than 80%, and the printed circuit boards having high temperature resistance and high reflectance of Examples 1 to 11 were used. The cover protective film has better reflectance than the printed circuit board having the reflective ink layer of Comparative Examples 1 and 2. After the high temperature resistance test, the ΔE values of the cover protective film for the high temperature resistant and high reflectance printed circuit boards of Examples 4 to 11 were less than 1.5, and no yellowing occurred. And the thickness of the reflective ink layer of Comparative Examples 1 and 2 has a tolerance of +15/-15 μm, and the thickness of the highly reflective polymer composite layer of Examples 1 to 11 has a tolerance of +2/-2 μm, showing a comparison. The thickness uniformity of the reflective ink layers of Examples 1 and 2 was inferior to those of Examples 1 to 11, and Examples 1 to 11 had better thickness uniformity than Comparative Examples 1 and 2.
如表1所示,實施例1之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片,其高反射高分子複合材料 層所含有的二氧化鈦粉體之含量為20體積百分比,且入射光之波長為550奈米時,實施例1之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片對於之反射率為89%以上,而實施例2及3之具耐高溫及高反射率的印刷電路板用覆蓋保護膠高反射高分子複合材料層所含有的二氧化鈦粉體之含量均高於實施例1,分別為30及60體積百分比,但當入射光之波長為550奈米時,實施例2及3之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片之反射率與實施例1之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片相當接近,分別為90.2%及90.5以上;由此可知,高反射高分子複合材料層所含有的二氧化鈦粉體之含量為20體積百分比時,反射率即能達到89%以上。As shown in Table 1, the high-reflection polymer composite material for the printed circuit board with high temperature resistance and high reflectance of Example 1 is covered with a protective film. When the content of the titanium dioxide powder contained in the layer is 20% by volume, and the wavelength of the incident light is 550 nm, the coverage of the protective film for the printed circuit board with high temperature resistance and high reflectance of Example 1 is 89. % or more, and the content of the titanium dioxide powder contained in the high-reflection polymer composite material layer for the printed circuit board with high temperature resistance and high reflectance of Examples 2 and 3 is higher than that of the first embodiment, respectively 30 And 60% by volume, but when the wavelength of the incident light is 550 nm, the reflectance of the cover protective film for the high temperature resistant and high reflectance printed circuit boards of Examples 2 and 3 is higher than that of the first embodiment and the high temperature resistance of the embodiment 1 The high-reflectivity printed circuit board is relatively close to the protective film, which is 90.2% and 90.5 or more respectively. It can be seen that when the content of the titanium dioxide powder contained in the highly reflective polymer composite layer is 20% by volume, the reflectance is Can reach more than 89%.
如表2及圖4所示,於波長介於420至495奈米之波段,實施例4之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片具有89%以上的反射率;於420至600奈米之波段,實施例5之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片具有89%以上的反射率;於420至700奈米之波段,實施例6之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片具有89%以上的反射率;於415至700奈米之波段,實施例7之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片具有89%以上的反射率,而實施例4至7之高反射高分子複合材料層之厚度分別為13微米、20微米、29微米及32微米,且實施例4至7之耐高溫高分子膜皆為厚度為12.5微米的聚醯亞胺膜。As shown in Table 2 and FIG. 4, the cover protective film for the high temperature resistant and high reflectance printed circuit board of Example 4 has a reflectance of 89% or more at a wavelength of 420 to 495 nm; The coverage protective film for the printed circuit board with high temperature resistance and high reflectance of Example 5 has a reflectance of 89% or more, and the high temperature resistance of the embodiment 6 is 620 to 700 nm. And the high-reflectance printed circuit board has a reflectance of 89% or more for the cover film; in the band of 415 to 700 nm, the cover film for the high temperature and high reflectance of the printed circuit board of Embodiment 7 has 89 The reflectance of % or more, and the thickness of the highly reflective polymer composite layers of Examples 4 to 7 are 13 μm, 20 μm, 29 μm, and 32 μm, respectively, and the high temperature resistant polymer films of Examples 4 to 7 are A polyimide film having a thickness of 12.5 microns.
如圖5所示,當入射光之波長介於415至520 奈米之波段時,12.5微米厚的聚醯亞胺膜之吸收率為35%以上。As shown in Figure 5, when the incident light has a wavelength between 415 and 520 In the band of nanometers, the absorption rate of the 12.5 micron thick polyimide film is 35% or more.
由此可知,於420至495奈米之波段,一含有12.5微米厚的聚醯亞胺膜之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片具有89%以上的反射率的條件為:高反射高分子複合材料層之厚度需為30微米以上。進一步可推知,當一具耐高溫及高反射率的印刷電路板用覆蓋保護膠片之高反射高分子複合材料層之厚度為30微米以下時,於415至700奈米之波段,該具耐高溫及高反射率的印刷電路板用覆蓋保護膠片具有89%以上的反射率之條件為:耐高溫高分子膜之吸收率需為35%以下。It can be seen that in the band of 420 to 495 nm, a cover film with a high temperature and high reflectance of a film having a high temperature and high reflectance of 12.5 μm thick has a reflectance of 89% or more. : The thickness of the highly reflective polymer composite layer needs to be 30 microns or more. It can be further inferred that when a high-reflection polymer composite material layer covering a protective film with a high temperature resistance and a high reflectivity has a thickness of 30 μm or less, the high temperature resistance is in the range of 415 to 700 nm. And the high reflectance of the printed circuit board for the printed circuit board has a reflectance of 89% or more. The absorption rate of the high temperature resistant polymer film needs to be 35% or less.
如表3、圖5及圖7所示,實施例8之耐高溫高分子膜之厚度為50微米,實施例9之耐高溫高分子膜之厚度為125微米。而於330至700奈米之波段,實施例8之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片的耐高溫高分子膜之吸收率為35%以下,實施例9之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片的耐高溫高分子膜之吸收率亦為35%以下。且於330至700奈米之波段,實施例8及9之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片之反射率均為89%以上;顯示耐高溫高分子膜之厚度差異不會影響實施例8及9之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片的反射率。As shown in Table 3, FIG. 5 and FIG. 7, the thickness of the high temperature resistant polymer film of Example 8 was 50 μm, and the thickness of the high temperature resistant polymer film of Example 9 was 125 μm. In the wavelength range of 330 to 700 nm, the high temperature resistant and high reflectance printed circuit board of Example 8 has an absorption rate of 35% or less for the high temperature resistant polymer film covering the protective film, and the high temperature resistance of the embodiment 9 is high. The high-reflectance printed circuit board has an absorption rate of a high-temperature resistant polymer film covering the protective film of 35% or less. And in the wavelength range of 330 to 700 nm, the reflectance of the covered protective film for the high temperature resistant and high reflectance printed circuit boards of Examples 8 and 9 is 89% or more; the thickness difference of the high temperature resistant polymer film is not displayed. The reflectance of the cover protective film for the printed circuit board having high temperature resistance and high reflectance of Examples 8 and 9 is affected.
請參閱表3、表4及圖5所示,實施例8之耐高溫高分子膜為50微米厚的聚對苯二甲酸乙二醇酯膜,實施例10之耐高溫高分子膜為50微米厚的聚苯硫醚膜,於 415至700奈米之波段,兩者之吸收率均小於35%。請參閱圖7表3所示,於415至700奈米之波段,實施例8及10之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片之反射率皆為89%以上。於經耐熱性檢測(表面黏著,300℃/30秒)後,發現因實施例8之聚對苯二甲酸乙二醇酯膜耐溫性不足而熱漲冷縮過大,進而使高反射高分子複合材料層與聚對苯二甲酸乙二醇酯膜之間、聚對苯二甲酸乙二醇酯膜與黏著層之間或黏著層與印刷電路板之間剝離而產生脫層現象(de-lamination),而實施例10之聚苯硫醚膜則未發生脫層現象,經比較後得知,係由於聚對苯二甲酸乙二醇酯膜之熔點小於260℃,而聚苯硫醚膜之熔點大於260℃;此可證明,當耐高溫高分子膜之熔點大於260℃時,具耐高溫及高反射率的印刷電路板用覆蓋保護膠片能進行表面黏著製程而不發生脫層現象。Referring to Table 3, Table 4 and FIG. 5, the high temperature resistant polymer film of Example 8 is a 50 μm thick polyethylene terephthalate film, and the high temperature resistant polymer film of Example 10 is 50 μm. Thick polyphenylene sulfide film, In the band of 415 to 700 nm, the absorption rate of both is less than 35%. Referring to Table 3 in Fig. 7, in the wavelength range of 415 to 700 nm, the reflective films of the high temperature resistant and high reflectance printed circuit boards of Examples 8 and 10 have a reflectance of 89% or more. After the heat resistance test (surface adhesion, 300 ° C / 30 seconds), it was found that the polyethylene terephthalate film of Example 8 was insufficient in temperature resistance and the heat expansion and contraction were too large, thereby making the highly reflective polymer Debonding between the composite material layer and the polyethylene terephthalate film, between the polyethylene terephthalate film and the adhesive layer or between the adhesive layer and the printed circuit board (de- Lamination), and the polyphenylene sulfide film of Example 10 did not undergo delamination, and it was found that the melting point of the polyethylene terephthalate film was less than 260 ° C, and the polyphenylene sulfide film was obtained. The melting point is greater than 260 ° C; this can prove that when the melting point of the high temperature resistant polymer film is greater than 260 ° C, the cover film with high temperature resistance and high reflectivity can cover the surface of the protective film without delamination.
請參閱表2及表4所示,實施例6之耐高溫高分子膜為12.5微米的聚醯亞胺膜,實施例11之耐高溫高分子膜為12.5微米的聚醚醚酮膜,該聚醯亞胺膜之熔點小於260℃,且該聚醚醚酮膜之熔點大於260℃。於經耐高溫檢測後,實施例6及11之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片皆未發生脫層現象。然而,請參閱表2、圖5及圖6所示,於415至520奈米之波段,實施例6之耐高溫高分子膜之吸收率大於35%,且於415未滿420奈米之波段,實施例6之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片之反射率未達89%,亦即於415至700奈米之波段,其反射率並非全然為89%以上;請參閱表4、 圖5及圖6所示,於415至700奈米之波段,實施例11之耐高溫高分子膜之吸收率為35%以下,且實施例11之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片之反射率均為89%以上。Referring to Tables 2 and 4, the high temperature resistant polymer film of Example 6 is a 12.5 micron polyimide film, and the high temperature resistant polymer film of Example 11 is a 12.5 micron polyether ether ketone film. The melting point of the quinone imine film is less than 260 ° C, and the melting point of the polyetheretherketone film is greater than 260 ° C. After the high temperature resistance test, the cover film of the high temperature resistant and high reflectance printed circuit boards of Examples 6 and 11 did not delaminate. However, please refer to Table 2, Figure 5 and Figure 6. In the band of 415 to 520 nm, the absorption rate of the high temperature resistant polymer film of Example 6 is more than 35%, and the band of 415 is less than 420 nm. The reflectance of the covered protective film for the printed circuit board with high temperature resistance and high reflectance of Example 6 is less than 89%, that is, in the band of 415 to 700 nm, the reflectance is not completely 89% or more; See Table 4, As shown in FIG. 5 and FIG. 6, the absorption rate of the high temperature resistant polymer film of Example 11 is 35% or less in the wavelength range of 415 to 700 nm, and the printed circuit board having high temperature resistance and high reflectance of Example 11 is obtained. The reflectance of the covered protective film is 89% or more.
請參閱表1至表4所示,實施例1至8之黏著層皆含有10體積百分比之第二反光色料,實施例10及11之黏著層則否。以波長為550奈米為例,實施例1至3及實施例5至8之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片之反射率皆大於89%,實施例10及11之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片之反射率亦大於89%,顯示實施例1至3及實施例5至8之反射率與實施例10及實施例11相當接近之反射率。因此,藉由第二反光色料之使用,可增加本發明之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片之反射率。Referring to Tables 1 to 4, the adhesive layers of Examples 1 to 8 all contain 10 volume percent of the second reflective colorant, and the adhesive layers of Examples 10 and 11 are not. Taking the wavelength of 550 nm as an example, the reflectance of the covered protective film for the high temperature resistant and high reflectance printed circuit boards of Examples 1 to 3 and Examples 5 to 8 is greater than 89%, and Examples 10 and 11 The reflectance of the cover protective film for a printed circuit board having high temperature resistance and high reflectance is also greater than 89%, and the reflectances of Examples 1 to 3 and Examples 5 to 8 are shown to be relatively close to those of Embodiment 10 and Embodiment 11. rate. Therefore, by using the second reflective colorant, the reflectance of the cover protective film for a printed circuit board having high temperature resistance and high reflectance of the present invention can be increased.
基於上述,經反射率檢測及耐高溫檢測證實,相較於對照例1及2,實施例1至3及實施例5至11均具有更佳的反射率及耐高溫性;而藉由實施例1至3及實施例5至11之間的比較後證實,藉由熔點為260℃以上且於415至700奈米之波段具有35%以下的吸收率之耐高溫高分子膜及含有第一反光色料的高反射高分子複合材料層之使用,係令本發明之具耐高溫及高反射率的印刷電路板用覆蓋保護膠片,於波長為415至700奈米之波段,具有89%以上之反射率、以及經表面黏著製程(製程溫度為300℃,製程時間為30秒)而不產生黃變及脫層現象之優點,則能達到增加電子產品之整體出光強度、減少電子產品之光源。Based on the above, it was confirmed by reflectance detection and high temperature resistance detection that Examples 1 to 3 and Examples 5 to 11 had better reflectance and high temperature resistance than Comparative Examples 1 and 2; Comparison between 1 to 3 and Examples 5 to 11 confirmed that the high temperature resistant polymer film having a melting point of 260 ° C or higher and having an absorption ratio of 35% or less in a wavelength range of 415 to 700 nm and containing the first reflection The use of the high-reflection polymer composite material layer of the color material is such that the cover film for the printed circuit board with high temperature resistance and high reflectivity of the present invention has a wavelength of 415 to 700 nm, and has a purity of 89% or more. The reflectivity and the surface adhesion process (process temperature of 300 ° C, process time of 30 seconds) without the advantages of yellowing and delamination, can increase the overall light output of electronic products, reduce the source of electronic products.
10‧‧‧印刷電路板用覆蓋保護膠片10‧‧‧ Covered protective film for printed circuit boards
11‧‧‧耐高溫高分子膜11‧‧‧High temperature resistant polymer film
12‧‧‧高反射高分子複合材料層12‧‧‧High-reflection polymer composite layer
13‧‧‧黏著層13‧‧‧Adhesive layer
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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TW200742520A (en) * | 2005-10-24 | 2007-11-01 | Sumitomo Bakelite Co | Resin composition, resin film, coverlay film, interlayer adhesive, metal clad laminate, and multilayer printer circuit board |
TWM374243U (en) * | 2009-10-12 | 2010-02-11 | Asia Electronic Material Co | Covering film for printed circuit board |
TWI346127B (en) * | 2005-11-30 | 2011-08-01 | Panasonic Elec Works Co Ltd | Halogen-free epoxy resin composition, coverlay film, bonding sheet, prepreg, and laminate for printed wiring board |
TW201139589A (en) * | 2009-10-02 | 2011-11-16 | Nippon Steel Chemical Co | Coverlay film and circuit board |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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TW200742520A (en) * | 2005-10-24 | 2007-11-01 | Sumitomo Bakelite Co | Resin composition, resin film, coverlay film, interlayer adhesive, metal clad laminate, and multilayer printer circuit board |
TWI346127B (en) * | 2005-11-30 | 2011-08-01 | Panasonic Elec Works Co Ltd | Halogen-free epoxy resin composition, coverlay film, bonding sheet, prepreg, and laminate for printed wiring board |
TW201139589A (en) * | 2009-10-02 | 2011-11-16 | Nippon Steel Chemical Co | Coverlay film and circuit board |
TWM374243U (en) * | 2009-10-12 | 2010-02-11 | Asia Electronic Material Co | Covering film for printed circuit board |
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