TW201139589A - Coverlay film and circuit board - Google Patents

Coverlay film and circuit board Download PDF

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Publication number
TW201139589A
TW201139589A TW99131415A TW99131415A TW201139589A TW 201139589 A TW201139589 A TW 201139589A TW 99131415 A TW99131415 A TW 99131415A TW 99131415 A TW99131415 A TW 99131415A TW 201139589 A TW201139589 A TW 201139589A
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Taiwan
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group
value
diamine
resin composition
adhesive resin
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TW99131415A
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Chinese (zh)
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TWI482830B (en
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Akira Mori
Yoshiki Suto
Koji Nakamura
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Nippon Steel Chemical Co
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/106Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42Block-or graft-polymers containing polysiloxane sequences
    • C08G77/452Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
    • C08G77/455Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences containing polyamide, polyesteramide or polyimide sequences
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J179/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
    • C09J179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09J179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J183/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
    • C09J183/10Block or graft copolymers containing polysiloxane sequences
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/281Applying non-metallic protective coatings by means of a preformed insulating foil

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

This invention provides an adhesive resin composition which contains a polyimide resin having a group Ar (tetravalent aromatic group), a group R1 (divalent diaminosiloxane residual group), a group R2 (divalent aromatic diamine residual group), and a value of an index P of 0.7 or less, the index P representing the amount of polar groups contained in the composition calculated from the following formula (i) P value = {(A1+A2) / (B1+B2)} x 100...(i) wherein A1 = (number of the polar groups in group Ar) x (number of moles of group Ar), A2 = (number of the polar groups in group R2) x (number of moles of group R2), B1 = (molecular weight of group Ar) x (number of moles of group Ar), B2 = (molecular weight of group R2) x (number of moles of group R2), and wherein The numbers of the polar groups are: one for each of -X (hologen), -OH, -SH, -O-, -S-, -SO-, -NH-, -CO-, -CN-, -P=O, -OP-; two for each of -SO2-, -CONH-; and three for -SO3H.

Description

201139589 六、發明說明: 【發明所屬之技術領域】 本發明是關於在軟性印刷配線板(flexible printed circui t)等的電路基板上做為接著劑而有用的接著劑樹脂 組成物及其之利用。 【先前技術】 近年來,隨著電子機器的小型化、輕量化、省空間化 的進展,對於薄而輕量,具有可折彎性,反覆折彎也有優 良的财久性的軟性印刷配線板(FPC,flexible printed c i rui ts)的需求正在增加。由於FPC在有限的空間也可做 立體性的且高密度的組裝,因而不只是在例如HDD、DVD、 行動電話等的電子機器的可動部分配線,在電纜線、連結 器等的零件上之用途,也在持續擴大中。 FPC在保護配線部分的目的下而使用覆蓋膜。覆蓋膜 是由聚醯亞胺樹脂等合成樹脂製的覆蓋用膜材與接著劑層 積層而形成。在FPC的製造中,例如用熱壓等的方法在電 路基板上經由接著劑層將覆蓋膜材黏貼。接著劑層是,對 銅配線等的電路配線圖案與覆蓋用膜材的雙方,需要有高 接著性。作為這種覆蓋膜用的接著劑者,在比較低溫的熱 壓條件下可以加工,有優良的耐熱性等的特性,而有提案 一種印刷基板用接著劑樹脂組成物(例如,專利文獻1), 係在具有矽氧烷單元的聚醯亞胺與環氧樹脂的混合樹脂 中,將由磷酸酯系、鄰苯二甲酸酯系、聚酯系及脂肪酸酯 系所選的1種以上的可塑劑配合而成。 4 322367 201139589 專利文獻 專利文獻1 :特開平10-212468號公報 【發明内容】 [發明要解決的課題] 可是,在汽車使用FPC的車載用電子機器,由於重複 處在150°C左右的高溫環境中,在長時間使用中FPC的覆 蓋膜與配線的接著力會降低,而產生配線保護功能大幅降 低的問題。隨著FPC的用途擴大,可以預料不只是車載電 子機器,今後在同樣的嚴苛的溫度環境中使用FPC的情形 會增加。因此在高溫環境中使用的FPC,強烈要求講究對 覆蓋膜接著力降低的對策。 因此,本發明的課題是,提供一種接著劑樹脂組成物, 可以形成接著劑層,在反覆處在高溫環境中,也不會降低 配線層與覆蓋膜的接著力。 [解決課題的手段] 本發明人等,查明上述問題的原因的結果,注意到在 反覆高溫的環境中由於長時間的使用,有銅配線中的銅向 覆蓋膜的接著劑層擴散的現象。並且,這個銅的擴散是成 為接著力降低的主因,並發現藉由抑制銅擴散,在高溫環 境中也可長時間維持優良的接著性,而完成本發明。即, 本發明的接著劑樹脂組成物含有一種聚醯亞胺,該聚醯亞 胺含有以下述一般式(1)及(2)表示的構成單元。 5 322367 201139589 R1R2J i ΟΛΥΟ ΟΛΥΟ 、'ArAr ΟΛΥΟ ΟΛΥΟ Ν Ν L式中 Γ表示由芳香族四羧酸酐衍生的4價芳香族基 為二胺基錢烧衍生的2價的二胺基魏燒基,R2^ f香族二贿生的2價的芳香族二胺基,m、n表示各構; 單凡的存在莫耳比,0 75至丨Q的範圍内, 0. 25的範圍内]。 」 又,本接著劑樹脂組成物的p值在〇. 7以下。p ,示組成物中所含極性基之㈣指標,而根據下述數妨 异出· P^ = {(AHA2)/(B1+B2)}x1〇〇 "、 [此處’ Al = (Ar基中的極性基的個數)x(Ar基的 A2=(RZ基中的極性基的個數)X(R2基的莫耳數)、[Technical Field] The present invention relates to an adhesive resin composition useful as an adhesive on a circuit board such as a flexible printed wiring board and the like. [Prior Art] In recent years, with the progress of miniaturization, weight reduction, and space saving of electronic equipment, it is a flexible printed wiring board that is thin and lightweight, has bendability, and has excellent durability for repeated bending. The demand for (FPC, flexible printed ci rui ts) is increasing. Since FPC can be assembled in a space with a high degree of density in a limited space, it is not only used for wiring of movable parts of electronic equipment such as HDDs, DVDs, and mobile phones, but also for components such as cables and connectors. It is also continuing to expand. The FPC uses a cover film for the purpose of protecting the wiring portion. The cover film is formed by laminating a film for covering made of a synthetic resin such as a polyimide resin with an adhesive. In the production of the FPC, the cover film is adhered to the circuit board via an adhesive layer by, for example, hot pressing. In the subsequent layer, it is necessary to have high reproducibility for both the circuit wiring pattern and the covering film for copper wiring. As an adhesive for the cover film, it can be processed under a relatively low temperature hot pressing condition, and has excellent heat resistance and the like, and an adhesive resin composition for a printed circuit board is proposed (for example, Patent Document 1) In a mixed resin of a polyimine and an epoxy resin having a siloxane unit, one or more selected from the group consisting of a phosphate ester, a phthalate, a polyester, and a fatty acid ester A combination of plasticizers. In the case of an in-vehicle electronic device using an FPC in an automobile, it is repeated at a high temperature environment of about 150 ° C in a high-temperature environment of about 150 ° C. In the long-term use, the adhesion of the cover film and the wiring of the FPC is lowered, and the problem that the wiring protection function is greatly reduced is caused. With the expansion of the use of FPC, it is expected that not only in-vehicle electronic equipment will be used, but the use of FPC in the same severe temperature environment will increase in the future. Therefore, the FPC used in a high-temperature environment is strongly required to pay attention to the countermeasure against the reduction of the adhesion of the cover film. Accordingly, an object of the present invention is to provide an adhesive resin composition which can form an adhesive layer without deteriorating the adhesion between the wiring layer and the cover film in a high temperature environment. [Means for Solving the Problems] As a result of ascertaining the cause of the above problems, the present inventors have noticed that copper in the copper wiring diffuses into the adhesive layer of the cover film due to long-term use in a high-temperature environment. . Further, this copper diffusion is the main cause of the decrease in the adhesion force, and it has been found that the present invention can be completed by suppressing the diffusion of copper and maintaining good adhesion for a long period of time in a high temperature environment. That is, the adhesive resin composition of the present invention contains a polyimine which contains a constituent unit represented by the following general formulas (1) and (2). 5 322367 201139589 R1R2J i ΟΛΥΟ 、 , 'ArAr ΟΛΥΟ ΟΛΥΟ Ν Ν L Γ Γ Γ Γ 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 式 , , , , , , , , , , , , , , R2^f is a divalent aromatic diamine group of the genus, and m and n represent the respective structures; the molar ratio of the individual is in the range of 0 75 to 丨Q, and in the range of 0.25. Further, the p-value of the present adhesive resin composition is not more than 7.7. p , indicating the (4) index of the polar group contained in the composition, and according to the following number, P^ = {(AHA2)/(B1+B2)}x1〇〇", [here 'Al = ( The number of polar groups in the Ar group) x (A2 of the Ar group = (the number of polar groups in the RZ group) X (the number of moles of the R2 group),

Bl = (Ar基的分子量)x(Ar基的莫耳數) B2=(R2基的分子量)X(R2基的莫耳數) 前述極性基的個數是: -X(X 表示齒原子)、-OH、-SH、-〇-、〜s__ -CO CN---P=〇、-P〇-分別當做 1 個, _S〇2-、-C0NH-分別當做2個, -S〇3H-當做3個,而計算]。 NH- ~S0- ' _ 322367 6 201139589 本發明的接著劑樹脂組成物的前述聚醯亞胺樹脂,係 以使用P值均在1.G以下的前述芳香族四細綺及前述芳 香族二胺作為補而合成者為佳。p值是表示分子中所含 的極性基之量的指數,是根據下列數式⑴)及(iii)算出。 芳香族四羧酸酐的P值= (Α1/β1)χ1〇〇 …(ii) 芳香族二胺的 P 值= (A2/B2)xl〇〇 ...(ii〇 [此處’ A卜A2、m、B2表示與前述同樣的意義]。 在本發明的接著劑樹脂組成物中,前述芳香族二胺的 P值以在〇· 7以下較佳。 、在本發明的接著劑樹脂組成物中,前述聚酿亞胺是以 下述一般式(3)表示的二胺基矽氧烷作為原料而合成者為Bl = (molecular weight of Ar group) x (molar number of Ar group) B2 = (molecular weight of R2 group) X (molar number of R2 group) The number of the aforementioned polar groups is: -X (X represents a tooth atom) , -OH, -SH, -〇-, ~s__ -CO CN---P=〇, -P〇- respectively as one, _S〇2-, -C0NH- as two, -S〇3H- As 3, and calculate]. NH-~S0- ' _ 322367 6 201139589 The above-mentioned polyimine resin of the adhesive resin composition of the present invention is obtained by using the above aromatic tetrafine and the above aromatic diamine having a P value of 1. G or less. It is better to be a supplement. The p value is an index indicating the amount of the polar group contained in the molecule, and is calculated from the following formulas (1)) and (iii). P value of aromatic tetracarboxylic anhydride = (Α1/β1)χ1〇〇...(ii) P value of aromatic diamine = (A2/B2)xl〇〇...(ii〇[here 'A Bu A2 m and B2 have the same meanings as described above. In the adhesive resin composition of the present invention, the P value of the aromatic diamine is preferably 7% or less. The adhesive resin composition of the present invention. In the above, the above-mentioned polyiminoimine is synthesized by using a diamine sulfoxane represented by the following general formula (3) as a raw material.

Rs r7 •(3) h2n—r3~_^ 一 0_^丨卜 r「NH2 R6 Rg [式中’R4R4別表示亦可含有氧原子的2價有機基,L 至匕分別表示碳數丨至6的烴基,平均反覆數 20] 〇 主 胺成分中 8〇莫耳% 本發明的接著劑樹脂組成物中,原料的全二 的前述一般式(3)的二胺基矽氧烷的莫耳比以在 以上為佳。 本發明的接著劑樹脂組成物是復含有可塑劑,表示組 成物所含的極性基之量的指數p值以在〇 7以下為佳。、且 值是根據以下述式(iv)算出。 ’。 322367 7 201139589 P 值={(A1+A2+A3)/(B1+B2+B3)}xl00 …(iv) [此處,A1、A2、B1、B2表示與前述同樣的意義。 A3=(可塑劑中的極性基的個數)x(可塑劑的莫耳數) B3二(可塑劑的分子量)x(可塑劑的莫耳數),極性基的個數 是與前述同樣計算]。 本發明的接著劑樹脂組成物是以使用可做為保護電路 基板配線部之覆蓋膜用的接著劑為佳。 本發明.的覆蓋膜是積層接著劑層與覆蓋用膜材層的覆 蓋膜,並且前述接著劑層是使用上述任何一種接著劑樹脂 組成物而形成者。 本發明的電路基板是,具備基材,與在該基材上形成 的配線層,與覆蓋該配線層的上述覆蓋膜。本電路基板在 大氣中,150°C,1000小時的長期耐熱性試驗後之前述配 線層與前述覆蓋膜材層的剝離強度以在0.2kN/m以上為 佳。 [發明的效果] 本發明的接著劑樹脂組成物藉由根據數式(i)算出的 表示極性基量的P值是在0. 7以下,即使處在反覆高溫環 境中,也可以形成,不會降低與金屬配線層的接著力的接 著劑層。因此,由本發明的接著劑樹脂組成物可提高所形 成的接著層之覆蓋膜的剝離強度,可提高使用該覆蓋膜的 電路基板的信賴性。 【實施方式】 [實施發明之形態] 8 322367 201139589 本發㈣接著賴脂組成蚊含有聚醯亞贿脂,該 聚知亞胺樹脂含有,上述-般式⑴及⑵所示的構成單 70。該聚醯亞胺樹脂是熱可塑性樹脂,一般式⑴及⑵中 的Ar基是由芳香族__衍生的4價芳香族基,R】基是 由二胺基石夕氧炫衍生的2價二胺基石夕氧燒基,匕基是由芳 香族二,衍生的2價芳香族二胺基。在樹脂中的式⑴表示 的構成單元的存在量是在75莫和至⑽莫耳⑽範圍内, 理,的疋在80莫耳%至⑽莫耳%的範圍内。二胺基石夕氧烧 基是有由二胺基矽氧烷除掉胺基的矽氧烷鍵結(Si-0-Si) 的基,藉由增加此石夕氧燒鍵結的比率,則不摻配可塑劑也 可賦予接著劑層充分的柔軟性,可抑制覆蓋膜的趣彎。又 在可塑劑中因為含有多量極性基,所以不摻配可塑劑的利 點’可列舉抑制接著劑樹脂組成物中所含的極性基之量, 可以降低P值。因此’在本發明中,式⑴中的值設在 0.75以上:m值未達〇 75則不能充分得到抑制翹彎的效 果。又,藉由增加矽氧烷鍵結,由減少聚醯亞胺樹脂的亞 胺鍵結部位’也認定可能有降低硬化收縮之效果。由於這 些事實,將式(2)的n值設在〇至0 25,理想的是在〇至 〇. 2的範圍。 本發明的接著劑樹脂組成物在使用於覆蓋膜等的接著 劑時,為了處於反覆高溫環境中也可維持接著力,含有上 述一般式(1)、(2)所示的構成單元的聚醯亞胺樹脂,根據 下述數式(i)算出的Ρ值有〇. 7以下,理想的是在〇. 6以下。 P 值={(Al+A2)/(Bl+B2)}xl〇〇 • · · (i) 322367 9 201139589 [此處,Rs r7 •(3) h2n—r3~_^ A 0_^丨卜r “NH2 R6 Rg [wherein R4R4 represents a divalent organic group which may also contain an oxygen atom, and L to 匕 respectively represent a carbon number of 丨 to 6 The hydrocarbon group, the average number of repetitions is 20%, and 8 mole % of the ruthenium main component. In the adhesive resin composition of the present invention, the molar ratio of the diamine sulfoxane of the above general formula (3) of all the raw materials is The adhesive resin composition of the present invention is a compound containing a plasticizer, and the index p value indicating the amount of the polar group contained in the composition is preferably 〇7 or less, and the value is based on the following formula: (iv) Calculated. '. 322367 7 201139589 P value={(A1+A2+A3)/(B1+B2+B3)}xl00 (iv) [here, A1, A2, B1, B2 are the same as above The meaning of A3 = (the number of polar groups in the plasticizer) x (the molar number of the plasticizer) B3 two (the molecular weight of the plasticizer) x (the molar number of the plasticizer), the number of polar groups is The adhesive resin composition of the present invention is preferably an adhesive for use as a cover film for protecting a wiring portion of a circuit board. The cover film of the present invention is laminated. a coating film for a coating layer and a coating film layer, and the adhesive layer is formed by using any of the above-described adhesive resin compositions. The circuit substrate of the present invention comprises a substrate and is formed on the substrate. The wiring layer and the cover film covering the wiring layer. The peel strength of the wiring layer and the cover film layer after the long-term heat resistance test at 150 ° C for 1000 hours in the air is 0.2 kN. [Effect of the invention] The adhesive resin composition of the present invention has a P value indicating a polar basis amount calculated by the formula (i) of 0.7 or less, even in a high temperature environment. It is also possible to form an adhesive layer which does not lower the adhesion to the metal wiring layer. Therefore, the adhesive resin composition of the present invention can improve the peeling strength of the formed cover film of the adhesive layer, and can improve the use of the cover film. [Embodiment] [Formation of the Invention] 8 322367 201139589 The present invention (4) is followed by a lyophilized mosquito comprising a polypyrene resin, the polyimine resin contained, The constituting sheet 70 represented by the general formulas (1) and (2). The polyimine resin is a thermoplastic resin, and the Ar group in the general formulae (1) and (2) is a tetravalent aromatic group derived from an aromatic __, R] group. It is a divalent diamine fluorenyl group derived from a diamine oxime, and a fluorenyl group is a divalent aromatic diamine group derived from an aromatic di. The presence of a constituent unit represented by the formula (1) in the resin The amount is in the range of 75 moles to (10) moles (10), and the enthalpy is in the range of 80 mole% to (10) mole%. The diamine oxime is removed by the diamine oxirane. The base of the amine-based oxime-bonded (Si-0-Si), by increasing the ratio of the oxy-oxygen bonding, the plasticizer can also impart sufficient flexibility to the adhesive layer without inhibiting the bonding. Cover the film's interesting bend. Further, since the plasticizer contains a large amount of polar groups, the advantage of not blending the plasticizer is exemplified by suppressing the amount of the polar group contained in the adhesive resin composition, and the P value can be lowered. Therefore, in the present invention, the value in the formula (1) is set to 0.75 or more: when the m value is less than 〇75, the effect of suppressing warpage cannot be sufficiently obtained. Further, by increasing the siloxane coupling, it is also believed that the effect of reducing the hardening shrinkage by reducing the imine bonding site of the polyimide resin. Due to these facts, the value of n of the formula (2) is set to 0 to 0 25 , and it is desirable to be in the range of 〇 to 〇 2. When the adhesive resin composition of the present invention is used as an adhesive for a cover film or the like, it is capable of maintaining an adhesive force in a high-temperature environment, and contains a polymerized unit represented by the above general formulas (1) and (2). The imine resin has a enthalpy value calculated according to the following formula (i): 7% or less, and preferably 〇. 6 or less. P value={(Al+A2)/(Bl+B2)}xl〇〇 • · · (i) 322367 9 201139589 [here,

Al = (Ar基中的極性基的個數)x(Ar基的莫耳數) A2=(R2基中的極性基的個數)x(R2基的莫耳數)Al = (the number of polar groups in the Ar group) x (the number of moles of the Ar group) A2 = (the number of polar groups in the R2 group) x (the number of moles of the R2 group)

Bl = (Af基的分子量)x(Ar基的莫耳數) B2=(R2基分子量)x(R2基的莫耳數)]。 此P值表示在聚醯亞胺樹脂的組成物中所含的極性基 之量的指標,P值越大,表示含有聚醯亞胺樹脂的組成物 中所含的極性基之量越大。做為覆蓋膜等的接著劑使用 時,搂著劑層中所含的極性基是成為誘發銅由銅配線的擴 散原因。也即是說,接著劑層中含有多量極性基時,在反 覆加熱中銅由銅配線向接著劑層中廣範圍地擴散。其結 果,接著劑層的接著力減弱,覆蓋膜可能變成容易剝離。 在本發明的接著劑樹脂組成物中藉由將,P值設在0.7以 下(理想的是在0. 6以下),俾降低組成物中所含的極性基 之量,而抑制接著力的降低。 成為算出上述P值的基準之極性基,由電偶極矩的大 小而分成3階級。第1個階級是-X(在這裏是指鹵原子)、 -OH、-SH、-0---S---SO---NH---CO---CN、-P=0、-P0-, 這些分別做為極性基1個計算。第2個階級是-S〇2-、 -C0NH-,這些分別做為極性基2個計算。第3個階級是 -S〇3-,這是做為極性基3個計算。然後,如數式(i)所示, 由聚醯亞胺樹脂中的芳香族四羧酸酐基及芳香族二胺基的 莫耳數及分子量,與在這些基中所含的上述極性基的個數 可決定P值。 10 322367 201139589 • 在本發明的接著劑樹脂組成物中,p值的計算以含有 _ 上述一般式(1)、(2)表示構成單元的聚醯亞胺樹脂的Ar基 (芳香族四羧酸酐基)及R2基(芳香族二胺基)中所含的極性 基作為基準的理由,是由於這些Ar基中及R2基中所含的極 性基之量,大約決定接著劑主要成分的聚醯亞胺樹脂全體 之極性的緣故。因此,有關R!基的二胺基矽氧烷基中所含 的極性基及醯亞胺鍵結的極性基,在算出P值上並不加以 考慮。 站在上述P值的規定上,做為Ar基者,可舉例如下述 的式(4)或式(5)所示的基。Bl = (molecular weight of Af group) x (molar number of Ar group) B2 = (R2 based molecular weight) x (molar number of R2 group)]. This P value indicates an index of the amount of the polar group contained in the composition of the polyimide resin. The larger the P value, the larger the amount of the polar group contained in the composition containing the polyimide resin. When used as an adhesive for a cover film or the like, the polar group contained in the ruthenium layer serves to induce diffusion of copper from the copper wiring. That is, when a large amount of polar groups are contained in the adhesive layer, copper is widely diffused from the copper wiring into the adhesive layer in the reverse heating. As a result, the adhesion of the adhesive layer is weakened, and the cover film may become easily peeled off. In the adhesive resin composition of the present invention, by setting the P value to 0.7 or less (preferably 0.6 or less), the amount of the polar group contained in the composition is lowered to suppress the decrease in the adhesion force. . The polar group which is the basis for calculating the above P value is divided into three classes by the size of the electric dipole moment. The first class is -X (herein referred to as a halogen atom), -OH, -SH, -0---S---SO---NH---CO---CN, -P=0, -P0-, These are calculated as one polarity base. The second class is -S〇2-, -C0NH-, which are calculated as two polar groups. The third class is -S〇3-, which is calculated as a polar base. Then, as shown in the formula (i), the molar number and molecular weight of the aromatic tetracarboxylic anhydride group and the aromatic diamine group in the polyimine resin, and the above-mentioned polar groups contained in these groups The number can determine the P value. 10 322367 201139589 • In the adhesive resin composition of the present invention, the p value is calculated by containing the above-mentioned general formula (1), (2), the Ar group of the polyimine resin which constitutes the unit (aromatic tetracarboxylic anhydride) The reason why the polar group contained in the group (2) and the R2 group (aromatic diamine group) is used as a standard is that the amount of the polar group contained in the R group and the R2 group is approximately determined by the aggregation of the main component of the binder. The reason for the polarity of the entire imine resin. Therefore, the polar group contained in the R-group-containing diaminophosphonyl group and the polar group bonded to the quinone imine are not considered in calculating the P value. In the case of the above-mentioned P value, as the Ar group, for example, a group represented by the following formula (4) or formula (5) can be given.

[式(5)中,W表示選有單鍵結、碳數1至15的2價烴基、 _0_、_S-、-CO-、-S0_、_S02_、_NH_ 或- C0NH_ 的 2 價之基]。 特別是,做為Ar基者,為了壓低P值,式(4),或式 (5)中的W為單鍵結、碳數1至15的2價烴基、-S-、 -C0-所示的基為佳,式(4),或式(5)中的W為單鍵結、碳 數1至15的2價烴基、-C0-所示的基為更佳。 又,上述一般式(1)及(2)所示的構成單元,可存在於 單獨聚合物中,也可成為共聚物的構成單元而存在。具有 複數構成單元的共聚物時,可以嵌段共聚物存在,也可以 成為隨機共聚物存在。 聚醯亞胺樹脂,一般,係由酸酐與二胺反應而製造, 所以藉由酸酐及二胺的說明,可理解聚醯亞胺樹脂的具體 11 322367 201139589 例。在上述一般式(1)及(2)中’ Ar基可說是酸野的基,Ri 基及R2基可說是二胺的基,所以理想的聚醯亞胺樹脂可由 酸酐及二胺來說明。但,聚醯亞胺樹脂並不限定於在此說 明的由酸酐及二胺而得者。 具有Ar基的酸酐者,例如可列舉:笨四甲酸針 (pyromellitic anhydride)、3’3’’4,4’~聯笨四叛酸二針 (3,3’,4,4’-biphenyl tetracarboxylic dianhydride)、 3, 3’,4, 4’ -二苯颯四羧酸二酐(3, 3’,4, 4,〜(iiphenyl sulfone tetracarboxyl ic dianhydride)、4, 4,-氧二鄰苯 二甲酸酐(4,4’-oxydiphthalic anhydride)為佳。又,做 為酸酐者,可舉 2, 2,,3, 3’-、2, 3, 3’,4’-或 3, 3,,4, 4, _ 二苯甲酮四甲酸二酐(2, 2’,3, 3’-、2, 3,3’,4,-〇!· 3, 3’,4, 4’-Benzophenone tetracarboxy1ic dianhydride)、2, 3’,3, 4’ -聯苯四羧酸二酐、2, 2’,3, 3,-聯苯四竣酸二酐、2, 3’,3, 4’ -二苯趟四魏酸二針、雙(2, 3-二缓基苯基)趟二酐(bis(2, 3-dicarboxypheny 1)ether dianhydride)、3, 3’ ’,4, 4’ ’ -、2, 3, 3’ ’,4’ ’ -或 2, 2’ ’,3, 3’ ’ -對三聯苯四羧酸二酐(3, 3’ ’,4, 4’ ’ -、 2, 3, 3’ ’,4’,-or 2, 2’,,3, 3’,-p- terpheylcarboxylic dianhydride)、2, 2-雙(2, 3-或 3, 4-二羧基苯基)-丙烷二 酐、雙(2, 3-或3, 4-二羧基苯基)甲烷二酐、雙(2, 3-或3, 4-二羧基苯基)砜二酐、1,1-雙(2, 3-或3, 4-二羧基苯基)乙 烷二酐,例如 1,2, 7, 8-、1,2, 6, 7-或 1,2, 9, 10-菲四羧酸 二酐、2, 3, 6, 7-蒽四羧酸二酐、2, 2-雙(3, 4-二羧基苯基) 12 322367 201139589 四氟丙烷二酐、2, 3, 5, 6-環己二酐、2, 3, 6, 7-萘四羧酸二 酐、1,2, 5, 6-萘四羧酸二酐、丨,4, 5, 8_萘四羧酸二酐、4, 8_ 二曱基-1,2, 3, 5, 6, 7-六氫萘_1,2, 5, 6-四羧酸二酐、2, 6-或 2’ 7-二氣萘-1,4, 5, 8-四羧酸二酐、2, 3, 6, 7-(或 1,4’5, 8-)四氣萘-1,4, 5,8-(或 2, 3, 6, 7-)四羧酸二酐、 2, 3, 8, 9-、3’ 4, 9’ 10-、4, 5, 10, 11-或 5, 6, 11,12-茈四羧 酸二酐、環戊烷-1,2, 3, 4-四羧酸二酐、吡嗪-2, 3, 5, 6-四 羧酸二酐、吡咯啶-2, 3, 4, 5-四羧酸二酐、噻吩—2, 3, 4, 5- 四羧酸二酐、4, 4’ -雙(2, 3-二羧基苯氧基)二苯基曱烷二酐 等。 又,作為R2基者,例如,可列舉下述的式(6)至式(8) 所示的基。[In the formula (5), W represents a 2-valent hydrocarbon group selected from a single bond, a divalent hydrocarbon group having 1 to 15 carbon atoms, _0_, _S-, -CO-, -S0_, _S02_, _NH_ or -C0NH_]. In particular, as the Ar group, in order to depress the P value, W in the formula (4) or the formula (5) is a single bond, a divalent hydrocarbon group having 1 to 15 carbon atoms, -S-, -C0- The group represented by the formula (4) or the formula (5) is preferably a single bond, a divalent hydrocarbon group having 1 to 15 carbon atoms, or a group represented by -C0-. Further, the constituent units represented by the above general formulas (1) and (2) may be present in a single polymer or may be a constituent unit of the copolymer. When a copolymer having a plurality of constituent units is present, it may be present as a block copolymer or as a random copolymer. The polyimine resin is generally produced by reacting an acid anhydride with a diamine. Therefore, the specific 11 322367 201139589 example of the polyimide resin can be understood by the description of the acid anhydride and the diamine. In the above general formulas (1) and (2), the 'Ar group can be said to be the base of the acid field, and the Ri group and the R2 group can be said to be the base of the diamine. Therefore, the ideal polyimine resin can be derived from an acid anhydride and a diamine. Description. However, the polyimine resin is not limited to those derived from an acid anhydride and a diamine as described herein. Examples of the anhydride having an Ar group include, for example, pyromellitic anhydride, 3'3''4,4'~2,3',4,4'-biphenyl tetracarboxylic. Dianhydride), 3, 3', 4, 4'-diphenylphosphonium tetracarboxylic dianhydride (3, 3', 4, 4, ~ (iiphenyl sulfone tetracarboxyl ic dianhydride), 4, 4,-oxydi-benzene 4,4'-oxydiphthalic anhydride is preferred. Also, as an acid anhydride, 2, 2, 3, 3'-, 2, 3, 3', 4'- or 3, 3, 4, 4, _ benzophenone tetracarboxylic dianhydride (2, 2', 3, 3'-, 2, 3, 3', 4, -〇!· 3, 3', 4, 4'-Benzophenone tetracarboxy1ic Dianhydride), 2, 3', 3, 4'-biphenyltetracarboxylic dianhydride, 2, 2', 3, 3,-biphenyltetracarboxylic dianhydride, 2, 3', 3, 4' - Benzoic acid, bis(2,3-dicarboxypheny 1)ether dianhydride, 3, 3' ', 4, 4' '-, 2, 3, 3' ', 4' ' - or 2, 2' ', 3, 3' ' - p-terphenyl tetracarboxylic dianhydride (3, 3' ', 4, 4' ' -, 2, 3 , 3' ',4',-or 2, 2 ,,3,3',-p- terpheylcarboxylic dianhydride), 2,2-bis(2,3- or 3,4-dicarboxyphenyl)-propane dianhydride, bis (2, 3- or 3, 4- Dicarboxyphenyl)methane dianhydride, bis(2,3- or 3,4-dicarboxyphenyl)sulfone dianhydride, 1,1-bis(2,3- or 3,4-dicarboxyphenyl)B Alkane dianhydride, for example 1,2, 7, 8-, 1,2, 6, 7- or 1,2, 9, 10-phenanthrenecarboxylic acid dianhydride, 2, 3, 6, 7-nonanedicarboxylic acid Dihydride, 2,2-bis(3,4-dicarboxyphenyl) 12 322367 201139589 tetrafluoropropane dianhydride, 2, 3, 5, 6-cyclohexanedihydride, 2, 3, 6, 7-naphthalene Carboxylic dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, hydrazine, 4,5,8-naphthalenetetracarboxylic dianhydride, 4,8-dimercapto-1,2,3,5, 6, 7-hexahydronaphthalene_1,2,5,6-tetracarboxylic dianhydride, 2,6- or 2' 7-di-naphthalene-1,4,5, 8-tetracarboxylic dianhydride, 2 , 3, 6, 7-(or 1,4'5, 8-) tetra-naphthalene-1,4,5,8-(or 2,3, 6, 7-)tetracarboxylic dianhydride, 2, 3 , 8, 9-, 3' 4, 9' 10-, 4, 5, 10, 11- or 5, 6, 11, 12-fluorene tetracarboxylic dianhydride, cyclopentane-1, 2, 3, 4 -tetracarboxylic dianhydride, pyrazine-2,3,5,6-tetracarboxylic dianhydride, pyrrolidine-2,3,4,5-tetracarboxylic dianhydride Thiophene -2, 3, 4, 5-tetracarboxylic dianhydride, 4,4 '- bis (2,3-dicarboxy phenoxy) diphenyl dianhydride Yue dioxane. In addition, examples of the R2 group include the groups represented by the following formulas (6) to (8).

|在式其(6)至式⑻中,R9是各自獨立,表示碳數丨至6的i 烧乳基’ z表示由單鍵結、碳數i至i5的2價的 烴基、-0-、-S-、-、μ -2 r ^ ^ S〇2-、~ΝΗ—或-CONH-所選 的2饧的基,川表不各自獨立之〇至4的整數 特別作為R2基者,為了壓低p 。 結、=5: 一是。的基= 〃有作為1基的二胺者,例如可舉“,、二胺基二苯 322367 13 201139589 鍵、2’ —曱氧基一4, 4’ 一二胺基苯甲醯苯胺(2,1咐卿-4’4’-diamin〇benZanilide)、if雙(4_胺基苯氧基)苯、 雙⑷胺基苯氧基)苯、2,2,_雙[4_(4_胺基苯氧基)苯 基]丙烷、2, 2’-二甲基-4,4’-二胺基聯苯、3, 3, 一二羥基 _4,4’-二胺基聯苯、4,4’-二胺基苯甲醯苯胺、2,2一雙 [4-(3-胺基苯氧基)笨基]丙燒、冑[4_(4_胺基苯氧基)苯基] 颯、雙[4-(3-胺基苯氧基)苯基]硬、雙[4_(4_胺基笨氧基)] 聯苯、雙[4_(3_胺基笨氧基)]聯苯、雙[卜⑷胺基苯氧基)] 聯苯、雙[1-(3-胺基苯氧基)]聯苯、雙[4_(4_胺基苯氧基) 苯基]甲烷、雙[4-(3-胺基笨氧基)苯基]甲烷、雙[4_(4一 胺基苯氧基)苯基]醚、雙[4_(3_胺基苯氧基)苯基]醚、雙 [4-(4-胺基苯氧基)]二苯甲酮、雙[4_(3_胺基苯氧基二 苯甲酮、雙[4, 4’-(4-胺基苯氧基)]苯甲醯苯胺、雙[4,4,一 (3-胺基苯氧基)]苯甲醯苯胺、9,9_雙[4_(4_胺基苯氧基) 苯基]荞、9, 9-雙[4-(3-胺基苯氧基)苯基]荞、2, 2-雙-[4- (4-胺基本氧基)苯基]六氟丙烧、2,2-雙-[4-(3-胺基苯氧 基)苯基]六氟丙烧、4, 4’_亞甲基二鄰甲基苯胺、4, 4,-亞 曱基-2’6-二甲基苯胺、4, 4,-亞甲基-2, 6-二乙基苯胺、 4, 4’ -二胺基二苯基丙烷、3, 3’ -二胺基二苯基丙烷、4, 4’ - 二胺基二苯基乙烷、3, 3,-二胺基二苯基乙烷、4, 4,-二胺 基二苯基甲烷、3, 3,-二胺基二苯基甲烷、4, 4,-二胺基二 苯硫醚、3, 3’ -二胺基二苯硫醚、4, 4’ -二胺基二苯砜、3, 3,-一胺基二苯石風、4, 4’ -二胺基二苯驗' 3, 3’ -二胺基二苯趟、 3, 4’ -二胺基二苯醚、聯苯胺(benzidine)、3, 3’ -二胺基聯 14 322367 201139589 苯、3, 3’ -二甲基-4, 4’ -二胺基聯苯、3, 3,-二甲氧基聯苯 胺、4-4’ 二胺基對三聯苯、3, 3,,_二胺基對三聯苯、間 苯二胺、對苯二胺、2, 6-二胺。比啶、1,4-雙(4-胺基苯氧基) 苯、1’3-雙(4-胺基苯氧基)笨、4,4,-[l,4-伸苯基雙(l- 又'基例如舉下述的式(3a)所示的基 甲基伸乙基)]雙苯胺、4,4’-[l,3-伸苯基雙(l-甲基伸乙 基)]雙苯胺、雙(對胺基環己基)甲烷 '雙(對—卢一胺基三級 丁基苯基)_、雙(對-石-甲基一占一胺节基)苯、對雙曱 基-4-胺苄基)苯、對雙(Μ_二甲基_5_胺苄基)苯、丨,5一 一胺萘、2, 6-二胺萘、2, 4-雙(万-胺基三級丁基)曱苯、2, 4一 二胺基甲苯、間二甲苯基一2,5_二胺、對二甲苯基_2,5_二 胺、間二甲苯基二胺、對二甲苯基二胺、2, 6_二胺基吡啶、 2’ 5 一胺基比咬、2, 5-二胺基3, 4_噁二唑、派嗪等。 气丨 〇一W S丨丨一 R4— . _ (3 a) •R3 R6 Re 中^ K4分職示可以含錢原子的2财機基,Ri H刀別表示碳數1至6的煙基,平均反覆次數的 T是作為Rl基者,為了要賦予聚 式㈤中的mR4分別為 J W生 1至6的烴基,平均反覆的二基,R5至“別為碳數 Atm 覆數的以5至15的基為佳。 -番二 低接著劑樹脂組成物的P值,則做為;f料的 方麵續料及芳香族二胺者以使用極性基少的 322367 15 201139589 因此,做為芳香族讀酸酐及芳香族二胺者以使用p值在 1· 0以下的為佳。P值為表示分子内所含極性基之量的扑 標,係根據以下述數式(⑴及(iii)算出。特別是,芳香^ 二胺的P值是在0.7以下較佳,在0 6以下更佳。 芳香族四羧酸酐的P值= (Α1/Β1)χ1〇〇 …(ii) 芳香族二胺的 P 值= (A2/B2)xl〇〇 ...(iii) [在此’ A卜A2、B卜B2是與前述聲樣的意義]。 站在上述P值的規定上,作為可適合使用於聚醯亞胺 樹脂的前驅物之調製中的芳香族四羧酸酐者,例如可舉 3,3’,4’4’ -聯苯四羧酸二酐(BPDA)、3,3,,4,4,_二苯甲酮 四羧酸二酐(BTDA)、3,3,,4,4,-二苯砜四羧酸二酐 (DSDA)、苯四甲酸二酐(PMDA)等。其中特別理想的酸酐者, 可列舉 3, 3’,4, 4’ -聯苯四叛酸二酐(bpda)、3, 3,,4, 4, -二 笨甲酮四羧酸二酐(BTDA)等。這些芳香族四羧酸酐也可以 組合2種以上而配合。 又,站在上述P值的規定上,可適合使用於聚醯亞胺 树脂則驅物之調製的芳香族二胺者,例如可舉2, 2-雙[4-知基本乳基本基]丙院(BAPP)、2, 2’-二乙烤基-4,4,-二胺 基聯苯(VAB)、2, 2’ -二曱基-4, 4,-二胺基聯苯(m-TB)、 2, 2’ -二乙基-4, 4’ -二胺基聯苯、2, 2,,6, 6, _四甲基-4, 4’ -二胺基聯苯、2, 2’ -二苯基-4, 4,-二胺基聯苯、9, 9’ _雙(4-胺基苯基)菲等。其中尤為理想的二胺成分者,可列舉2, 2-雙(4-胺基苯氧基笨基)丙烷(BAPP)、2 2,_二乙烯基_4,4’-一胺基聯苯(VAB)、2, 2’ -二甲基一4, 4’ -二胺基聯苯(m-TB) ]6 322367 201139589 等。這些芳香族二胺可以組合2種以上而配合。 又,在聚醯亞胺樹脂前驅物的調製中,做為原料之一 使用的二胺基矽氧烷者,可列舉上述的一般式(3)所示的二 胺基石夕氧烧。使用二胺基石夕氧院而在聚醯亞胺樹脂中導入 矽氧烷骨幹,可在本發明的接著劑樹脂組成物中賦予加熱 壓著時的流動性,可提高印刷電路配線上的充填性。一般 式(3)表示的二胺基矽氧烷的具體例者,以下述的式(9)至 式(13)表示的二胺基矽氧烷為佳,其中又以式(9)或式(10) 表示的脂肪族的二胺基矽氧烷較佳。這些二胺基矽氧烷可 以組合2種以上配合。又,要將2種以上的二胺基矽氧烷 組合配合時,將式(9)或式(10)表示的脂肪族的二胺基矽氧 烷對全部矽氧烷二胺100重量份,配合90重量份以上為 佳。又,在式(3)、式(9)至式(13)中,平均反覆次數的mi 在1至20的範圍内,理想的是5至15的範圍内。mi比1 小則做為接著劑時的充填性降低,超過20則接著性降低。In the formulae (6) to (8), R9 is independently, and the i-calcinyl group 'z having a carbon number of 丨 to 6' represents a divalent hydrocarbon group having a single bond, carbon number i to i5, -0- , -S-, -, μ -2 r ^ ^ S〇2-, ~ΝΗ- or -CONH- the selected 2饧 group, the integers of the Sichuan table are not independent of each other, especially as the R2 base, In order to drive down p. Knot, =5: One is. The base = 〃 as a 1 group of diamine, for example, ",, diaminodiphenyl 322367 13 201139589 bond, 2' - methoxy- 4, 4'-diaminobenzimidil (2 ,1咐4'4'-diamin〇benZanilide), if bis(4_aminophenoxy)benzene, bis(4)aminophenoxy)benzene, 2,2,_bis[4_(4_amine Phenyloxy)phenyl]propane, 2,2'-dimethyl-4,4'-diaminobiphenyl, 3,3, monodihydroxy-4,4'-diaminobiphenyl, 4 , 4'-diaminobenzimidamide, 2,2-bis[4-(3-aminophenoxy)phenyl]propane, oxime [4_(4-aminophenoxy)phenyl] Bismuth, bis[4-(3-aminophenoxy)phenyl] hard, bis[4_(4-aminophenyloxy)]biphenyl, bis[4_(3-aminophenoxy)] Benzene, bis[(4)aminophenoxy)]biphenyl, bis[1-(3-aminophenoxy)]biphenyl, bis[4_(4-aminophenoxy)phenyl]methane, Bis[4-(3-aminophenyloxy)phenyl]methane, bis[4-(4-aminophenoxy)phenyl]ether, bis[4-(3-aminophenoxy)phenyl] Ether, bis[4-(4-aminophenoxy)]benzophenone, bis[4_(3-aminophenoxybenzophenone, bis[4,4'-(4-aminobenzene) Benzoquinone, bis[4,4, mono(3-aminophenoxy)]benzamide, 9,9-bis[4_(4-aminophenoxy)phenyl]indole 9,9-bis[4-(3-aminophenoxy)phenyl]indole, 2,2-bis-[4-(4-amine basic oxy)phenyl]hexafluoropropane, 2, 2-bis-[4-(3-aminophenoxy)phenyl]hexafluoropropane, 4,4'-methylenedi-o-methylaniline, 4,4,-arylene-2'6 - dimethylaniline, 4, 4,-methylene-2,6-diethylaniline, 4,4'-diaminodiphenylpropane, 3,3'-diaminodiphenylpropane, 4, 4'-diaminodiphenylethane, 3,3,-diaminodiphenylethane, 4,4,-diaminodiphenylmethane, 3,3,-diaminodi Phenylmethane, 4,4,-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfone, 3,3,-amino group Diphenyl stone, 4, 4'-diaminodiphenyl test '3, 3'-diaminodiphenyl hydrazine, 3, 4'-diaminodiphenyl ether, benzidine, 3, 3 '-Diamine linkage 14 322367 201139589 Benzene, 3, 3'-dimethyl-4,4'-diaminobiphenyl, 3,3,-dimethoxybenzidine, 4-4' diamine Correct Biphenyl, 3, 3,, -diamino-p-terphenyl, m-phenylenediamine, p-phenylenediamine, 2,6-diamine, pyridinium, 1,4-bis(4-aminophenoxy) Benzene, 1'3-bis(4-aminophenoxy) stupid, 4,4,-[l,4-phenylene bis(l- again' group is represented by the following formula (3a) Methyl ethyl) ethyl diphenylamine, 4,4'-[l,3-phenylene bis(l-methylethylidene)]diphenylamine, bis(p-aminocyclohexyl)methane double —-Lu-Amino-tert-butylphenyl)-, bis(p-stone-methyl-mono-amino-benzyl)benzene, p-bis-decyl-4-aminebenzyl)benzene, p-pair (Μ_ Dimethyl-5-amine benzyl)benzene, anthracene, 5-monoamine naphthalene, 2,6-diamine naphthalene, 2,4-bis(wan-aminotributyl) benzene, 2, 4 Diaminotoluene, m-xylylene-2,5-diamine, p-xylylene-2,5-diamine, m-xylylenediamine, p-xylylenediamine, 2,6-diamino Pyridine, 2' 5-monoamine ratio bit, 2, 5-diamino 3,4-oxadiazole, pyrazine, and the like.丨〇 丨〇 丨丨 R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R R K K K K K K K K K K K K K K K K K K The average number of times of repetition T is the base of R1, in order to give the mR4 in the poly(5) a hydrocarbon group of 1 to 6 for JW, the average repeating diradical, R5 to "the carbon number of Atm is 5 to The basis of 15 is better. - The P value of the resin composition of the second low-adhesive agent is used as the material of the material and the aromatic diamine is used for the 322367 15 201139589. The acid anhydride and the aromatic diamine are preferably used at a p value of 1.0 or less. The P value is a value indicating the amount of a polar group contained in the molecule, and is calculated according to the following formula ((1) and (iii)). In particular, the P value of the aromatic diamine is preferably 0.7 or less, more preferably 0.6 or less. The P value of the aromatic tetracarboxylic anhydride = (Α1/Β1) χ1〇〇 (ii) The aromatic diamine P value = (A2/B2)xl〇〇...(iii) [herein 'A Bu A2, B Bu B2 is the meaning of the above sound sample>.) Standing on the above P value, as suitable for use Polyimine resin Examples of the aromatic tetracarboxylic anhydride in the preparation of the precursor include 3,3',4'4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3,4,4,_benzol Ketone tetracarboxylic dianhydride (BTDA), 3,3,4,4,-diphenyl sulfone tetracarboxylic dianhydride (DSDA), pyromellitic dianhydride (PMDA), etc. Among them, particularly desirable acid anhydrides, List 3, 3', 4, 4'-biphenyltetrahydro acid dianhydride (bpda), 3, 3, 4, 4, - dimercapto ketone tetracarboxylic dianhydride (BTDA), etc. These aromatic four The carboxylic acid anhydride may be used in combination of two or more kinds thereof. Further, the above-mentioned P value may be suitably used for the aromatic diamine prepared by the polyimine resin, for example, 2, 2- Double [4-known basic milk base] Bingyuan (BAPP), 2, 2'-diethyl bake-4,4,-diaminobiphenyl (VAB), 2, 2'-dimercapto-4 , 4,-diaminobiphenyl (m-TB), 2, 2'-diethyl-4,4'-diaminobiphenyl, 2, 2,6,6, _tetramethyl-4 , 4'-diaminobiphenyl, 2, 2'-diphenyl-4,4,-diaminobiphenyl, 9,9'-bis(4-aminophenyl)phenanthrene, etc. For the diamine component, 2, 2-bis (4- Benzooxyphenyl)propane (BAPP), 2 2,divinyl-4,4'-monoaminobiphenyl (VAB), 2, 2'-dimethyl-4,4'-diamine Base benzene (m-TB)] 6 322367 201139589, etc. These aromatic diamines can be combined in combination of 2 or more types. In the preparation of the polyimine resin precursor, the diamine oxime used as one of the raw materials is exemplified by the above-described diamine-based oxyhydrogenation represented by the general formula (3). By introducing a oxoxane backbone into a polyimide resin using a diamine oxime, it is possible to impart fluidity at the time of heating and pressing in the adhesive resin composition of the present invention, and it is possible to improve the filling property on the printed circuit wiring. . Specific examples of the diamino sulfoxane represented by the general formula (3) are preferably a diamine oxirane represented by the following formulas (9) to (13), wherein the formula (9) or formula is further The aliphatic diamine oxirane represented by (10) is preferred. These diaminopyridoxane may be used in combination of two or more kinds. In addition, when two or more kinds of diamine oxiranes are combined, 100 parts by weight of the aliphatic diamine oxirane represented by the formula (9) or the formula (10) is used for all of the oxane diamines. It is preferable to mix 90 parts by weight or more. Further, in the formulas (3) and (9) to (13), the mi of the average number of repetitions is in the range of 1 to 20, preferably in the range of 5 to 15. When mi is less than 1, the filling property is lowered as an adhesive, and if it exceeds 20, the adhesion is lowered.

CH3 H3CCH3 H3C

I. I H2N—(-H2C-3j(-Si-0-)mi Si—(-CH2~)jNH2 …(9) CH3 h3c ch3 h3cI. I H2N—(-H2C-3j(-Si-0-)mi Si—(-CH2~)jNH2 (9) CH3 h3c ch3 h3c

I. I H2N-(-H2C-^-(-Si-0-)^i-Si—(- CH2-)4-NH2 · _ · (10) CH3 H3C ch3 h3cI. I H2N-(-H2C-^-(-Si-0-)^i-Si-(- CH2-)4-NH2 · _ · (10) CH3 H3C ch3 h3c

17 322367 20113958917 322367 201139589

CH3 HsC H2N—0—H2C~(~Si-0 )mi Si—CH2—0~^^~·ΝΗ2 ·.. (12) CH3 h3cCH3 HsC H2N—0—H2C~(~Si-0 )mi Si—CH2—0~^^~·ΝΗ2 ·.. (12) CH3 h3c

H2N—{-H2C-)jf-Si-0 Si—¢-CH2~)^NH2 • (13) ό ό 上述酸酐及二胺分別可以使用僅1種,或也可併用2 種以上。又,也可併用上述以外的酸酐及二胺。 具有一般式(1)及(2)表示的構成單元的聚醯亞胺樹 脂,係將上述芳香族四羧酸酐、二胺基矽氧烷及芳香族二 胺在溶媒中反應,生成前驅物樹脂後藉由加熱閉環而製 造。例如,將酸酐成分與二胺成分以約略等莫耳溶解於有 機溶媒中,在0至100°C的範圍内的溫度攪拌30分鐘至24 小時使其聚合反應而可得聚醯亞胺樹脂的前驅物的聚醯胺 酸。在反應時,將反應成分溶解而使生成的前驅物在有機 溶媒中5至30重量%的範圍内,理想的是在10至20重量% 的範圍内。作為於聚合反應中使用的有機溶媒者,例如可 舉N, N-二曱基曱醯胺、N,N-二甲基乙醯胺(DMAC)、N-曱基 -2-吡咯烷酮、2-丁酮、二曱基亞砜、硫酸二曱酯、環己酮、 二〇惡烧、四氫0夫喃、二甘醇二曱醚(diglyme)、三甘醇二曱 _(triglyme)等。這些溶媒也可以合併2種以上而使用, 亦可以併用如二甲苯、甲苯等的芳香族烴。 所合成的前驅物通常以作成反應溶媒溶液而使用為有 18 322367 201139589 -利,但視需要也可濃縮、稀釋或以其他有機溶媒取代。又, ,前驅物一般都有優良的溶媒可溶性,在使用上有利。將前 驅物醯亞胺化的方法並無特別限制,例如在前述溶媒中, 可以採用在80至400°C的範圍内之溫度,進行1至24小 時加熱的熱處理為合適。 調製本發明的接著劑樹脂組成物時,原料的酸酐成分 及二胺成分的配合比率,只要能將P值控制在〇. 7以下, 則無特別限定,例如,酸酐成分及二胺成分的配合的莫耳 比率是,以聚醯亞胺樹脂的末端取代基設為胺基(即,酸酐 基以二胺基封止),從抑制聚醯亞胺樹脂的極性的觀點而 言,酸酐成分:二胺成分以1. 000 ·· 1. 001至1. 0 : 1. 2為 佳。 又,具有上述式(1)及(2)所示的構成單元的聚醯亞胺 樹脂,係成為將芳香族四羧酸酐、二胺基矽氧烷及芳香族 二胺的反應所得的醯亞胺構造,完全醯亞胺化的構造最為 理想,為了抑制銅擴散的誘發上也是重點。但是,聚醯亞 胺樹脂的一部分也可以成為醯胺酸,這時,未反應的醯胺 酸部位(-CONH-及-COOH)則視為誘發銅的擴散的極性基。 即,1個醯胺酸是當做有極性基4個(-CONH-的2個,-COOH 的2個)的取代基而計算。由如此的事,將醯亞胺化在使組 成物之P值在0· 7以下(理想的是在0. 6以下)的方式完成 為佳。此醯亞胺化率是使用傅立葉轉換紅外線光譜儀(FTIR) (市售品:日本分光公司製FTVIR620),以1次反射ATR法 測定聚醯亞胺薄膜的紅外線吸收光譜,以1015CHT1附近的 19 322367 201139589 苯環吸收物作為基準,由1780CHT1的來自於醯亞胺基的C=0 伸張振動頻率的吸光度算出。 將本發明的接著劑樹脂組成物使用於覆蓋膜的接著劑 層的形成時,為了要發揮特別優越的效果,例如,原料的 酸酐成分及二胺成分是以下列的A至C的組合使用最佳。 A) 芳香族四羧酸: 由3,3’4,4’-聯苯四羧酸二酐(6卩0八)及3,3’4,4’-二 苯基酮四羧酸二酐(BTDA)選擇1種以上; B) 二胺基碎氧烧: 上述式(9)或(10)所示的二胺基矽氧烷(重量平均分子 量在230至1,000的範圍内為佳);及 C) 芳香族二胺: 2, 2-雙(4-胺基苯氧基苯基)丙烷(BAPP)。 又,配合比率是,由聚醯亞胺樹脂的可溶性、覆蓋膜 的低翹彎性、可撓性的賦與觀點而言,相對於A成分100 莫耳%,B成分:C成分設定在75至100莫耳% : 25至0莫 耳%為佳,設在80至90莫耳% : 20至10莫耳%為較佳,設 為80至85莫耳% ·· 20至15莫耳%為理想。 藉由將A至C成分以上述比率摻配,則所得的聚醯亞 胺樹脂做為接著劑層的覆蓋膜的密著性非常優良。更具體 而言,在大氣中、150°C、1000小時的長期耐熱性試驗後 與銅配線層的剝離強度可達0. 20kN/m以上。如此的極高剝 離強度是以往的覆蓋膜不可能達到的,依本發明為首先實 現者。又,對全二胺成分的B成分之配合比率設為75莫耳 20 322367 201139589 /以上,則對聚醯亞胺樹脂可賦予優良的溶媒可溶性,再 者,不配合可塑劑,也可防止覆蓋膜的翹彎。 本發明的接著劑樹脂組成物與上述聚酿亞胺樹脂可以 含有可塑劑。但,可塑劑中含有多量極性基的可塑劑,有 .助長銅由銅配線擴散之慮’所以可塑劑是盡可能不使用為 佳。又,如上述,在本發明的接著劑樹脂組成物中,原料 中的全二胺成分中的-般式⑶的二胺基錢烧的莫耳比 設定在75料%以上,即使不添加可塑劑也可得充分的柔 軟=,可防止覆蓋膜的翹彎。因此,要使用可塑劑時,在 不損傷本發明的效果之範圍内摻配為佳。 在本發明的接著劑樹脂組成物中摻配可塑劑時,要使 表示組成物中所含的極性基之量的指標p值在〇 7以下, ,其在6以下為理想。此時,p值是根據下述的數式(iv) 算出。 Ρ^ = {(ΑΗΑ2+Α3)/(ΒΗΒ2+Β3)}χΐ〇〇 ...〇ν) [此處,Α卜Α2、Β卜Β2與前述同樣的意義, Α3=(可塑劑中的極性基的個數)χ(可塑劑的莫耳數) Β3=(可塑劑的分子量众(可塑劑的莫耳數) 極性基的個數是與前述同樣計算]。 上述的Ρ值只要在0.7以下,即使摻配可塑劑也不損 傷=明的效果。因此’對本發明的接著劑樹脂組成物以 任思成分而摻配可塑劑的種類及量,只要ρ值為& 7以下, 並且與聚醯亞胺_可料合就無限制。作 可塑劑者,例如可制磷酸酯系、鄰苯二酸料、㈣系、 322367 21 201139589 脂肪酸酯系等的可塑劑。例如’在磷酸酯系中’可列舉: 碟酸三曱酯、填酸三乙酯、填酸三丁酯、填酸三2-乙基己 酯、磷酸三丁氧基乙酯、碳酸三油烯酯、磷酸三苯酯、磷 酸三曱苯酯、磷酸三二甲苯酯、磷酸甲酚二苯酯、磷酸(二 曱苯)二笨酯、磷酸(2-乙基己基)二苯酯等。又,在聚酯系 中,可列舉如:己二酸1,3-丁二醇類。又,在鄰苯二酸酯 系中,例如可舉:鄰苯二酸二甲酯、鄰苯二酸二乙酯、鄰 苯二酸二丁酯、鄰苯二酸二庚酯、鄰苯二酸二2-乙基己酯、 鄰苯二酸二正辛酯、鄰苯二酸二異癸酯、鄰苯二酸丁苄酯、 鄰苯二酸二異壬酯、乙基鄰苯二甲醯乙基乙醇酸酯(ethyl phthalyl ethyl glycolate)等。又,脂肪酸酯系中,例如 可舉己二酸二曱酯、己二酸二異丁酯、己二酸二丁酯、己 二酸二2-乙基己酯、己二酸二異癸酯、己二酸二丁二醇酯、 壬二酸二2-乙基己酯、癸二酸二曱酯、癸二酸二丁酯、癸 一酸二2-乙基己醋、乙酿萬麻油酸曱醋(methyl acetyl ricinolate)等。此等可塑劑也可以併用2種以上。 使用可塑劑時的配合量,例如,相對於聚醯亞胺樹脂 100重量份是10重量份以下,例如以2至7重量份程度為 佳。在本發明的接著劑樹脂組成物中,即使使用可塑劑時, 在原料的全二胺成分中的二胺基矽氧烷的莫耳比藉由設定 在75莫耳%以上,比以往就可以將可塑劑的配合量大幅度 降低。 又,本發明的接著劑樹脂組成物中,以p值在〇 7以 下為條件,在上述的聚醯亞胺樹脂,及任意成分的可塑劑 322367 22 201139589 之外,因應需要復可適當摻配環氧樹脂等的其他樹脂成 分、硬化促進劑、輕合劑、充填劑、顏料等。要摻配此等 任意成分時,可由上述數式(iv)變形的下述數式(v),計算 出包含所有任意成分的接著劑組成物全體的P值。 P 值= {(A1+A2+An)/(B1+B2+Bn)}xl00 ...(v) [此處,A1、A2、B1、B2是與前述同樣的意義,H2N-{-H2C-)jf-Si-0 Si-¢-CH2~)^NH2 • (13) ό ό The above acid anhydride and diamine may be used alone or in combination of two or more. Further, an acid anhydride or a diamine other than the above may be used in combination. The polyimine resin having the constituent units represented by the general formulas (1) and (2) is obtained by reacting the above aromatic tetracarboxylic anhydride, diamine sulfoxane and aromatic diamine in a solvent to form a precursor resin. It is then manufactured by heating the closed loop. For example, the acid anhydride component and the diamine component are dissolved in an organic solvent in an approximate molar amount, and stirred at a temperature in the range of 0 to 100 ° C for 30 minutes to 24 hours to be polymerized to obtain a polyimide resin. Precursor poly-proline. At the time of the reaction, the reaction component is dissolved so that the resulting precursor is in the range of 5 to 30% by weight in the organic solvent, desirably in the range of 10 to 20% by weight. Examples of the organic solvent used in the polymerization reaction include N,N-didecylguanamine, N,N-dimethylacetamide (DMAC), N-mercapto-2-pyrrolidone, and 2- Butanone, dimercaptosulfoxide, dinonyl sulfate, cyclohexanone, dioxan, tetrahydrofuran, diglyme, triglyme, and the like. These solvents may be used in combination of two or more kinds, and aromatic hydrocarbons such as xylene or toluene may be used in combination. The precursor to be synthesized is usually used as a reaction solvent solution to have a concentration of 18 322 367 201139589, but may be concentrated, diluted or substituted with other organic solvents as needed. Moreover, the precursors generally have excellent solvent solubility and are advantageous in use. The method of imidizing the precursor hydrazine is not particularly limited. For example, in the above solvent, heat treatment for heating at 1 to 24 hours may be employed at a temperature in the range of 80 to 400 °C. When the adhesive resin composition of the present invention is prepared, the compounding ratio of the acid anhydride component and the diamine component of the raw material is not particularly limited as long as the P value can be controlled to 7% or less. For example, the blending of the acid anhydride component and the diamine component The molar ratio is such that the terminal substituent of the polyimide resin is an amine group (that is, the acid anhydride group is blocked with a diamine group), and from the viewpoint of suppressing the polarity of the polyimide resin, the acid anhydride component: The diamine component is preferably from 1. 000 ·· 1. 001 to 1.0:1.2. Further, the polyimine resin having the constituent units represented by the above formulas (1) and (2) is obtained by reacting an aromatic tetracarboxylic anhydride, a diamine sulfoxane and an aromatic diamine. The structure of the amine, the structure of the complete ruthenium is most ideal, and it is also important to suppress the induction of copper diffusion. However, a part of the polyimide resin may also be a proline acid. In this case, the unreacted guanamine sites (-CONH- and -COOH) are regarded as polar groups which induce the diffusion of copper. That is, one proline is calculated as a substituent having four polar groups (two of -CONH- and two of -COOH). In this case, it is preferred to imidize the hydrazine in such a manner that the P value of the composition is 0.7 or less (preferably 0.6 or less). The ruthenium imidization ratio was measured by Fourier transform infrared spectroscopy (FTIR) (commercial product: FTVIR620 manufactured by JASCO Corporation), and the infrared absorption spectrum of the polyimide film was measured by a single reflection ATR method to 19 322 367 near 1015 CHT1. 201139589 The benzene ring absorber was used as a reference and was calculated from the absorbance of the C=0 stretching vibration frequency of the 1780 CHT1 from the quinone imine group. When the adhesive resin composition of the present invention is used for the formation of an adhesive layer of a cover film, in order to exhibit a particularly advantageous effect, for example, the acid anhydride component and the diamine component of the raw material are used in the following combinations of A to C. good. A) Aromatic tetracarboxylic acid: from 3,3'4,4'-biphenyltetracarboxylic dianhydride (6卩0-8) and 3,3'4,4'-diphenyl ketone tetracarboxylic dianhydride (BTDA) Select one or more; B) Diamine-based oxyhydrogenation: a diamine oxirane represented by the above formula (9) or (10) (the weight average molecular weight is preferably in the range of 230 to 1,000) And C) aromatic diamine: 2, 2-bis(4-aminophenoxyphenyl)propane (BAPP). In addition, the blending ratio is set to 75 in the component B from the viewpoint of the solubility of the polyimide resin, the low warpage property of the cover film, and the flexibility. Up to 100% by mole: 25 to 0% by mole, preferably at 80 to 90% by mole: 20 to 10% by mole is preferably set to 80 to 85% by mole · 20 to 15% by mole Ideal. By blending the components A to C in the above ratio, the resulting polyimide resin is excellent in adhesion as a cover film of the adhesive layer. More specifically, the peel strength of the copper wiring layer after the long-term heat resistance test in the air at 150 ° C for 1000 hours may be 0.20 kN / m or more. Such extremely high peel strength is not possible with conventional cover films and is the first implementation in accordance with the present invention. In addition, when the mixing ratio of the component B of the total diamine component is 75 mol 20 322367 201139589 / or more, the polyimide solvent can be provided with excellent solvent solubility, and further, the plasticizer can be prevented from covering. The warpage of the film. The adhesive resin composition of the present invention and the above-mentioned polyamidene resin may contain a plasticizer. However, plasticizers contain a large amount of a polar group of a plasticizer, which promotes the diffusion of copper from the copper wiring. Therefore, it is preferred that the plasticizer is not used as much as possible. Further, as described above, in the adhesive resin composition of the present invention, the molar ratio of the diamine-based calcination of the general formula (3) in the total diamine component in the raw material is set to 75% by mass or more, even if no plasticity is added. The agent can also obtain sufficient softness = to prevent the film from being warped. Therefore, when a plasticizer is to be used, it is preferred to blend in a range which does not impair the effects of the present invention. When the plasticizer is blended in the adhesive resin composition of the present invention, the index p value indicating the amount of the polar group contained in the composition is 〇 7 or less, and preferably 6 or less. At this time, the p value is calculated based on the following formula (iv). Ρ^ = {(ΑΗΑ2+Α3)/(ΒΗΒ2+Β3)}χΐ〇〇...〇ν) [here, Α卜Α2, Β卜Β2 has the same meaning as before, Α3=(polarity in plasticizer) Number of bases χ (molar number of plasticizer) Β 3 = (molecular weight of plasticizer (molar number of plasticizer) The number of polar groups is calculated as described above.] The above enthalpy value is only 0.7 or less. Even if the plasticizer is blended, the effect of the brightener is not impaired. Therefore, the type and amount of the plasticizer to be blended with the adhesive component of the adhesive resin composition of the present invention are as long as the ρ value is & The imine can be used without any limitation. As a plasticizer, for example, a plasticizer such as a phosphate ester, an phthalic acid material, a (four) system, a 322367 21 201139589 fatty acid ester system, etc., for example, in a phosphate ester system. Among the 'may be listed: tridecyl succinate, triethyl sulphate, tributyl acid ester, triethyl 2-ethylhexyl ester, tributoxyethyl phosphate, trioleyl carbonate, triphenyl phosphate Ester, tridecyl phenyl phosphate, tricresyl phosphate, cresyl diphenyl phosphate, diphenyl phthalate, phosphoric acid (2-ethylhexyl) Further, examples of the polyester system include 1,3-butylene glycol adipate. Further, in the phthalic acid ester system, for example, dimethyl phthalate may be mentioned. Diethyl phthalate, dibutyl phthalate, diheptyl phthalate, di-2-ethylhexyl phthalate, di-n-octyl phthalate, phthalic acid Isodecyl ester, butyl benzyl phthalate, diisononyl phthalate, ethyl phthalyl ethyl glycolate, etc. Further, in fatty acid esters, for example Examples thereof include dinonyl adipate, diisobutyl adipate, dibutyl adipate, di-2-ethylhexyl adipate, diisononyl adipate, dibutylene adipate. Ester, di-2-ethylhexyl sebacate, dinonyl sebacate, dibutyl sebacate, di-2-ethylhexanoic acid, and acetyl ricinolate The plasticizer may be used in combination of two or more kinds. The compounding amount in the case of using a plasticizer is, for example, 10 parts by weight or less, preferably 2 to 7 parts by weight, based on 100 parts by weight of the polyimine resin. Following the invention In the resin composition, even when a plasticizer is used, the molar ratio of the diamine oxirane in the total diamine component of the raw material can be set to be more than 75 mol%, and the plasticizer can be blended more than before. Further, in the adhesive resin composition of the present invention, the p value is 〇7 or less, and the polyimine resin described above and the plasticizer 322367 22 201139589 of any component are required. Other resin components such as an epoxy resin, a curing accelerator, a light-binding agent, a filler, a pigment, etc. may be appropriately blended. When such an optional component is blended, the following formula which is modified by the above formula (iv) ( v) Calculate the P value of the entire composition of the adhesive containing all the optional components. P value = {(A1+A2+An)/(B1+B2+Bn)}xl00 (v) [Here, A1, A2, B1, B2 have the same meaning as described above,

An= (1個任意成分中的極性基的個數)x (任意成分的莫耳 數) 'An= (number of polar groups in one arbitrary component) x (molar number of arbitrary components) '

Bn=(l個任意成分的分子量)χ(任意成分的莫耳數),Bn = (molecular weight of one arbitrary component) χ (the number of moles of any component),

An及Bn是每1個任意成分分別加入計算。又,任音成八 中的極性基的個數是與前述同樣計算]。 刀 在本發明的接著劑樹脂組成物要摻配任意成分時,例 相對於聚醯亞胺樹脂⑽重量份,將任意成分的合二 量以設在1至1〇重量份的配合量為佳,設在2至 二^ 的配合量為更佳。 垔里知 ,乂上所得之本發明的接著劑樹脂組成物, 2成接_料可成為具有優良㈣軟性及熱可塑性,例 等配結合㈣基板(灿心⑽ Ϊ劑層=盘膜用接著劑之理想特〜^ Μ物 在覆蓋賴㈣單面上將本發明的接著劑 液的狀態塗佈後,例如藉由在13〇线〇。。的 本i明’可以形成具有覆蓋用膜材層與接著劑層的 或物Μ溶液的狀態塗佈,例如在8 0至丨8 〇的溫 322367 23 201139589 度乾燥後浦,形祕著賴,將此接著賴與上述覆蓋 本發明之議。⑽接著劑層的 作為本發明的覆蓋膜的覆蓋用膜材者,雖無限定的音 思,但可額例如㈣亞胺難、聚㈣亞贿脂、㈣ 胺醯亞胺樹脂錢醯亞㈣樹脂膜,或祕㈣樹脂膜, 聚醋系樹脂膜等。在此等中,以使用具有優越的耐熱▲的 聚醯亞胺系樹脂膜為佳。覆蓋用膜材層的厚度並無特別的 限定,但例如以5㈣以上脚m以下為佳。又接著劑 詹的厚度是沒有特別的限定,但例如以心m以上 以下為佳。 又’因將本發明的接著劑樹脂組成物形成膜狀,故也 可利用為例如多層FPC的接著薄片(b_ing sheet)。做為 接著薄片湘時,在㈣的基材膜上,將本發_接著劑 樹脂組成物以溶液的狀態塗佈,例如在8〇至18〇它的溫产 下乾燥後,也可將剝離而得的接著劑膜直接做為接著 使用。也可以將此接著劑膜與任意的基材膜以積層的狀鵰 使用。 又,覆蓋膜或接著薄片也可以,在接著劑面上黏貼離 型材做為有離型材層的形態^離型材的材質只要是不損傷 覆蓋膜或接著薄片的形態而可剝離就沒有特別的限定,可 利用例如聚對苯二甲酸乙二酯(p〇lyethylene terephthalate)、聚乙烯、聚丙烯等的樹脂膜,或將此等 樹脂膜在紙上積層的膜等。 322367 24 201139589 本發明的電路基板是,只要裝備如上所得的覆蓋膜或 接著薄片,對其結構並無特別的限制。例如,本發明的電 路基板的理想形態至少具備基材,在基材上以所規定的圖 案形成的銅等的金屬所成的配線層,及覆蓋該配線層的本 =月的覆蓋膜。作為電路基板的基材者,並無特別限定的 思思’但是為FPC肖,以使用與上述覆蓋用膜材同樣的材 質為佳’使用聚醯亞胺系樹脂的基材為佳。 本發明的電路基板是藉缝財發明㈣蓋膜而在配 ,間充填有優良錄性及熱可塑性的接著縣,而可得 盖膜與配線層_高密著性。又,藉由使用P值在〇.7 :乂 :的接著劑樹脂組成物而形成接著劑層,可抑制銅由鋼配 、,之擴散’故即使在高溫環境下反覆使用 :::的優良密著性。更具體而言,在大氣中二 置、長期耐熱性試驗後,賴量分散型x線⑽X)分析穿 實施例)’向接著層的銅擴散量心 „ ^ 八、,,°果,長期耐熱性試驗後的銅配線層盘 用膜材層的剝離強度可以維持在〇.2kN/m以上盖 =式⑴及⑵中的Ar基,Ri基及R2基的選定; 胺/m以上的極高制離強度。又,將相對 ==錢燒的配合比率設在75莫彻二 翹彎。、了’讀’即使不配合可塑劑也可防止覆蓋膜的 人个赞%的電路基板也可以做成多 構。此日#,θ Φ 殿風夕層電路基板的為 再此吟不僅疋覆蓋胺,Λ垃! , 益膜在接者薄片也可使用本發明白《 322367 25 201139589 接著劑樹脂組成物所得的接著劑膜。 本發明的電路基板的製造,並無特別的限定,但例如 可舉將覆銅積層板等的覆金屬積層板的金屬箔以化學蝕刻 等的方法電路加工成為所定的圖案後,在其電路上的必要 部分積層覆蓋膜,例如使用熱壓裝置等做熱壓黏的方法 等。此時,壓黏條件並無特別限定,但例如以壓黏溫度在 130°C以上200°C以下,壓力在0. IMPa以上4MPa以下為佳。 實施例 以下,以實施例具體說明本發明,但本發明不受這些 實施例任何限定。又,在以下的實施例中,如無特別說明, 各種測定、評估是依據下述方法實行。 [接著強度的測定] 接著強度是,將寬l〇mm、長度100mm的試驗切片的接 著劑面放置於銅箔(厚度35 // m)的光亮面(除去防銹金屬者) 上,以180°C、4MPa、60分鐘的條件下熱壓黏後,使用拉 力試驗機(東洋精機公司製,strograph-Ml),向180°方向 以50mni/分的速度拉伸剝離時的力做為接著強度。在本試 驗中,接著強度為0. 2kN/m以上時判定為「可」,0· 35kN/m 以上時判定為「良」。 [重量平均分子量的測定] 重量平均分子量是以凝膠滲透層析法(使用Tohsoh公 司製、HLC-8220GPC)測定。標準物質是使用聚苯乙烯,展 開溶媒是使用N,N-二曱基乙醯胺。 [銅的擴散量測定] 26 322367 201139589 - 銅的擴散量是’使用能量分散型X線(EDX)分析裝置 '(堀场製作所製)分析。加速電壓為16kV,發射電流為 50. 0//A,收集時間為6〇秒的條件下測定,所得表面濃度 做為向接著層的鋼之擴散量。向接著層的銅之擴散量是將 相對於被檢出的金屬原子的質量之銅原子的質量以百分率 表示的值。 [翹彎的評估法] 翹彎是以下述的方法評估。在厚度25//m的杜邦聚醯 亞胺薄膜(Kapton film)上,將聚醯亞胺接著劑塗佈使其在 乾燥後的厚度為35//m。在此狀態下將Kapt〇n膜向下放 置’測定膜四角輕彎的平均高度,5mm以下判定為「良」, 超過5mm時判'定為「不良」。 在本λ施例令所使用的略號表示以下的化合物。 BPDA · 3,3,4,4’_二笨基四竣酸二酐 (BPDA的極性基:〇,ρ值=〇· 〇〇) ΒΤΜ . 3, 3,4, 4 -二笨曱g同四敌酸二肝 (BTDA的極性基:1,ρ值=〇. 56) DSDA . 3,3,4,4 -二笨基硬四欵酸二野 (DSDA的極性基:2,ρ值=〇· 93) ΒΑΡΡ : 2, 2-雙(4-胺基笨氣基苯基)丙烷 (ΒΑΡΡ的極性基:2,ρ值=〇. 53) ΗΑΒ : 4, 4’ -(3, 3’ _二羥基)二胺基聯笨 (ΗΑΒ的極性基:2,ρ值=〇 98) VAB -2,2-—乙稀基_4, 4’-二胺基聯笨 322367 27 201139589 (VAB的極性基:〇,p值=〇 〇〇) DOS :癸二酸二2-乙基己醋 (DOS的極性基:4) PSX-A :上述式(9)表示的二胺基矽氧烷 (但,mi的數平均值在20之範圍内,重量平均 分子量是740) Ρ 值=1.77) (14) N-12:下式(14)表示的二醯肼(dihydrazide) (N-12的極性基:4 Η2Ν\ Λ λ /νη2 Ν (CH2)i〇 Ν/ Η Η 合成例1 在1000ml的分離式燒瓶中加入1〇 〇249 莫耳)、73. 41g 的 PSX-A(〇. 0992 莫耳)、168g 的 Ν-甲基-2- t各烧酮及112g的二甲苯。再在分離式燒瓶中加36. 46g 的BPDA(0· 1239莫耳),在室溫下授拌2小時,得聚酿胺酸 溶液。將此聚醯胺酸溶液升溫至19(rc,加熱攪拌1〇小時, 得完成醯亞胺化的聚醯亞胺溶液a。此時相對於全二胺成 分的二胺基矽氧烷成分的莫耳%是8〇%(m值=〇 8)。又,「m 值」疋所侍聚酿亞胺樹脂中所含的、上述一般式(1)表示的 構成單元的莫耳比(以下相同)。 合成例2至5 除了原料組成是以表1所示之外,其餘與合成例!同 樣的操作而調製聚醯亞胺溶液b至e。 322367 28 201139589 - [表 1 ] 合成例 聚醞亞胺 四羧酸酐 芳香族二胺 二胺基矽氧烷 m值 P值 溶液 Hw (莫耳) (莫耳) (莫耳) 1 a 27, 863 BPDA (0.1239) BAPP (0.0249) PSX-A (0.0992) 0.8 0. 18 2 b 37, 331 BTDA (0.0610) BPDA (0.0610) BAPP (0.0244) PSX-A (0.0977) 0.8 0. 38 3 c 36,700 BTDA (0. 120) BAPP (0.0241) PSX-A (0.0964) 0.8 0. 55 4 d 21,947 DSDA (0.1163) BAPP (0.0233) PSX-A (0.0940) 0.8 0. 83 5 e 107, 000 BTDA (0.1246) BAPP (0.0374) PSX-A (0.0872) 0.7 0. 55 合成例6 在1000ml的分離式燒瓶中加i2.26g的BAPP(0.0299 莫耳),44. 20g 的 PSX-AC0.0597 莫耳),15.43g 的 N-12 (0. 0597莫耳)’ I68g的N-甲基-2_吡咯烷酮及112g的二 曱苯。再在分離式燒瓶中加48. llg的BTDA(0. 1493莫耳), 在至溫下攪拌2小時,得聚醯胺酸溶液。將此聚醯胺酸溶 液升温至19(TC,加熱攪拌10小時,得完成醯亞胺化的聚 醯亞胺溶液f。此時相對於全二胺成分的二胺矽氧烷成分 的莫耳%是40%(m值=〇. 4)。 合成例7 在1〇〇〇ml的分離式燒瓶中加34. 29g的βΑΡΡ(0. 0835 莫耳)35. 47g 的 PSX-A(0. 0479 莫耳),ΐ· i8g 的 ΗΑΒ(0. 0055 莫耳)’ 168g的Ν-曱基-2·-比錢嗣及112g的二曱苯。再 在分離式燒瓶中加49. 〇6g的Ds_· 1369莫耳),在室溫 322367 29 201139589 下攪拌2小時,得聚醯胺酸溶液。將此聚醯胺酸溶液升溫 至190°C ’加熱攪拌1〇小時,得完成醯亞胺化的聚醯亞胺 溶液g。這時相對於全二胺成分的二胺矽氧烷成分的莫耳% 是 35% (m 值=〇.35)。 合成例8 在1000ml的分離式燒瓶中加34.26g的BAPP(0.〇835 莫耳),35. 48g 的 PSX-AC0. 0479 莫耳),1. 29g 的 VAB(0. 〇〇55 莫耳),168g的N-曱基-2_吡咯烷酮及112g的二曱苯。再 在分離式燒瓶中加49. 02g的DSDA(0. 1368莫耳),在室溫 下攪拌2小時,得聚醯胺酸溶液。將此聚醯胺酸溶液升溫 至190°C,加熱攪拌10小時’得完成醯亞胺化的聚醯亞胺 溶液h。這時相對於全二胺成分的二胺矽氧烷成分的莫耳% 是 35%(m 值=0. 35)。 合成例9 在1000ml的分離式燒瓶中加9. 89g的BAPP(〇. 〇241莫 耳),71.34g 的 PSX-A(0.0964 莫耳),168g 的 N-曱基-2- 吡咯烷酮及112g的二甲苯。再在分離式燒瓶中加35. 3〇g 的BPDA(0.120.莫耳)’在室溫下擾摔2小時,得聚酿胺酸 溶液。將此聚醯胺酸溶液升溫至190°C,加熱授拌1〇小時, 得完成醯亞胺化的聚醯亞胺溶液i。這時相對於全二胺成 分的二胺梦氧烧成分的莫耳%是80%(m值=0.8)。在所得聚 醯亞胺溶液中加入6g的DOS(0. 014莫耳)做為可塑劑。 將合成例6至合成例9整理表示於表2。 322367 30 201139589 [表2_ 合成例 聚醯亞胺 四羧酸酐 芳香族二胺 二胺基矽氡烷 酯化合物 溶液 Mw (莫耳) (莫耳) (莫耳) (莫耳) 0)值 Ρ值 6 f 210,000 BTDA (0.1493) BAPP (0.0299) N-12 (0,0597) PSX - A (0.0597) - 0.4 0. 87 7 g 90, 000 DSDA (0.1369) BAPP (0.0835) HAB CO.0055) PSX-A (0.0479) - 0. 35 0. 73 8 h 88,000 DSDA (0.1368) BAPP (0.0835) VAB (0.0055) PSX-A (0.0478) - 0. 35 0. 71 9 i 36, 700 BPDA (0.120) BAPP (0.0241) PSX-A (0.0964) DOS (0.014) 0.8 0. 31 ---1 — [實施例l] 將合成例1所得的聚醯亞胺溶液a在聚醯亞胺膜(杜邦 么司製.商品名 KaptonENS,長X寬X厚=200mmx300mmx25//m) 的單面上塗佈,在8(TC下乾燥15分鐘,製成接著劑層厚 度35#m的覆蓋膜1。將此覆蓋膜丨的表面置於除去防銹 金屬層的銅箔上,在18〇〇c、壓力4MPa、60分鐘的條件加 壓,得評估樣品1。接著劑層硬化後的覆蓋膜與銅箔的接 著強度為0. 67kN/m。 其次將評估樣品1在烤箱中以15(rc、進行1〇〇〇小時 之熱處理。測定處理後的㈣與覆蓋膜的接著強度時得 〇.54kN/m。將測定膜的諸特性值示於表3。 [實施例2] 除了將實施例1中的聚醯 的聚醯亞胺溶液b代替之外, 而得覆蓋膜2,得評估樣品2。 亞胺溶液a以合成例2所得 其餘與實施例1同樣的操作 接著劑層硬化後的覆蓋臈與 322367 31 201139589 銅箔的接著強度為0. 57kN/m。 其次將評估樣品2在烤箱中以150°C、進行1000小時 之熱處理。測定處理後的銅箔與覆蓋膜的接著強度時得 0. 38kN/m。將測定膜的諸特性值示於表3。 [實施例3] 除了將實施例1中的聚醯亞胺溶液a以合成例3所得 的聚醯亞胺溶液c代替之外,其餘與實施例1同樣的操作 而得覆蓋膜3,得評估樣品3。接著劑層硬化後的覆蓋膜與 銅箔的接著強度為0. 76kN/m。 其次將評估樣品3在烤箱中以150°C、進行1000小時 之熱處理。測定處理後的銅箔與覆蓋膜的接著強度時得 0. 42kN/m。將測定膜的諸特性值示於表3。 [實施例4] 除了將實施例1中的聚醯亞胺溶液a以合成例9所得 的聚醯亞胺溶液i代替之外,其餘與實施例1同樣的操作 而得覆蓋膜4,得評估樣品4。接著劑層硬化後的覆蓋膜與 銅箔的接著強度為0.70kN/m。 其次將評估樣品4在烤箱中以150°C、進行1000小時 之熱處理。測定處理後的銅箔與覆蓋膜的接著強度得 0. 35kN/ni。將測定膜的諸特性值示於表3。 [比較例1 ] 除了將實施例1中的聚醯亞胺溶液a以合成例4所得 的聚醯亞胺溶液d代替之外,其餘與實施例1同樣的操作 而得覆蓋膜,得評估樣品。將測定膜的諸特性值示於表4。 32 322367 201139589 比較例2至5 除了使用表1及表4所示的聚醯亞胺溶 以外’其餘與實施例丨同樣的操作 g、h 將測定臈的諸特性值示於表4。 謂彳估樣品。 的及表4中’接著強度1是表示接著劑層硬化後 =膜與_的接著強度,接著強度2是表示在大氣中 =C。、進行麵小時之熱處理後的㈣與覆蓋臈的接著 [表3]An and Bn are added to each of the arbitrary components. Further, the number of polar groups in Ren Yincheng is calculated in the same manner as described above]. In the case where the adhesive resin composition of the present invention is blended with an optional component, it is preferable to set the combined amount of the optional components in an amount of 1 to 1 part by weight based on the weight of the polyimine resin (10) by weight. It is better to set the amount of 2 to 2^.垔 知 乂 乂 乂 乂 乂 乂 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着 接着An ideal material of the agent can be coated with a film for covering after coating the state of the adhesive liquid of the present invention on one side of the cover layer (4), for example, by a line of 13 〇. The layer is coated with the state of the layer of the adhesive or the solution of the material, for example, after drying at a temperature of 322367 23 201139589 degrees of 80 to 丨8 ,, which is followed by the above-mentioned invention. (10) The film for covering the cover film of the present invention is not limited to the sound, but may be, for example, (IV) imine difficult, poly (tetra) bribe, (iv) amine quinone imine resin (Q) A resin film, a secret (4) resin film, a polyester resin film, etc. In this case, it is preferable to use a polyimine-based resin film having excellent heat resistance ▲. The thickness of the film layer for coating is not particularly limited. Limited, but for example, 5 (four) or more feet below m is preferred. The thickness of the adhesive is not In particular, it is preferable to use a thickness of at least m or less. In addition, since the adhesive resin composition of the present invention is formed into a film shape, it can also be used as, for example, a b-ing sheet of a multilayer FPC. In the case of the base film of (4), the resin composition of the present invention is applied in the form of a solution, for example, after drying at a temperature of 8 to 18 Torr, it may be peeled off. The film may be used as it is. The adhesive film may be used in a layered manner on any of the substrate films. Alternatively, the cover film or the subsequent sheet may be adhered to the adhesive on the adhesive surface. The form of the profile layer is not particularly limited as long as it can be peeled off without damaging the cover film or the form of the sheet, and for example, polyethylene terephthalate (polyethylene terephthalate) or polyethylene can be used. A resin film such as polypropylene, or a film in which such a resin film is laminated on paper, etc. 322367 24 201139589 The circuit board of the present invention is not limited in structure as long as it is equipped with a cover film or a sheet obtained as described above. For example, a preferred embodiment of the circuit board of the present invention includes at least a base material, a wiring layer made of a metal such as copper formed in a predetermined pattern on the base material, and a cover layer covering the wiring layer. The cover film is not particularly limited as the substrate of the circuit board. However, it is FPC Xiao, and it is preferable to use the same material as the above-mentioned cover film. The base material using the polyimide resin is preferable. The circuit board of the present invention is a cover film which is filled with a good recording property and a thermoplasticity by a cover film, and a cover film and a wiring layer are highly dense. Further, by using P The value of the adhesive composition of 〇.7: 乂: forms an adhesive layer, and it is possible to suppress the diffusion of copper from steel, and it is excellent in adhesion even when used in a high-temperature environment. More specifically, after the two-stage, long-term heat resistance test in the atmosphere, the dispersive type x-ray (10) X) is analyzed by the example) 'the amount of copper diffusion to the subsequent layer „ ^ 八,,,°, long-term heat resistance The peeling strength of the film layer for the copper wiring layer after the property test can be maintained at 〇.2 kN/m or more, and the Ar group, the Ri group and the R2 group in the formulas (1) and (2) are selected; the amine/m or higher is extremely high. Separation strength. In addition, the ratio of === money burning is set at 75 Mocher's two-bend bend. And 'read' can prevent the person who covers the film from being able to prevent the circuit board from being able to do it even if it does not match the plasticizer. In this day, #, θ Φ 殿 夕 层 电路 电路 电路 电路 电路 电路 电路 电路 电路 电路 电路 电路 电路 电路 电路 疋 疋 疋 , , , , , , , , , , , , , , , , , 322 322 322 322 322 322 322 322 322 322 322 322 322 322 The production of the circuit board of the present invention is not particularly limited. For example, a metal foil of a metal-clad laminate such as a copper-clad laminate is circuit-processed by chemical etching or the like. After the pattern, a layer of the cover film is laminated on the necessary part of the circuit, for example For example, the pressure-bonding condition is not particularly limited, but the pressure-bonding temperature is 130° C. or higher and 200° C. or lower, and the pressure is 0. IMPa or more and 4 MPa or less. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be specifically described by examples, but the present invention is not limited to these examples. Further, in the following examples, various measurements and evaluations were carried out in accordance with the following methods unless otherwise specified. [Measurement of strength] Next, the adhesive surface of the test piece having a width of 100 mm and a length of 100 mm was placed on a shiny surface of a copper foil (thickness of 35 // m) (excluding rust preventive metal) to 180 After hot-pressing under conditions of °C, 4 MPa, and 60 minutes, a tensile tester (made by Toyo Seiki Co., Ltd., strograph-Ml) was used to stretch the peeling force at a speed of 50 mni/min in the direction of 180° as the strength. In this test, it is judged as "OK" when the intensity is 0. 2kN/m or more, and "good" when it is 0. 35kN/m or more. [Measurement of Weight Average Molecular Weight] The weight average molecular weight was measured by gel permeation chromatography (manufactured by Tohsoh Corporation, HLC-8220GPC). The standard material is polystyrene, and the developing solvent is N,N-dimercaptoacetamide. [Measurement of the amount of diffusion of copper] 26 322367 201139589 - The amount of diffusion of copper is analyzed using an energy dispersive X-ray (EDX) analyzer (manufactured by Horiba, Ltd.). The accelerating voltage was 16 kV, the emission current was 50.0 / A, and the collection time was 6 sec., and the obtained surface concentration was taken as the diffusion amount to the steel of the subsequent layer. The amount of diffusion of copper to the subsequent layer is a value expressed as a percentage of the mass of the copper atom with respect to the mass of the metal atom to be detected. [Evaluation method of warping] The warp is evaluated by the following method. The polyimide polyimide was coated on a Kapton film having a thickness of 25/m to have a thickness of 35/m after drying. In this state, the Kapt〇n film was placed downward. The average height of the four corners of the film was measured, and it was judged as "good" by 5 mm or less, and "bad" when it exceeded 5 mm. The abbreviations used in the present lambda scheme indicate the following compounds. BPDA · 3,3,4,4'_di-p-tetradecanoic acid dianhydride (polar basis of BPDA: 〇, ρ = 〇 · 〇〇) ΒΤΜ . 3, 3, 4, 4 - two clumsy g Dihydrogenated livers of the four enzymes (polar group of BTDA: 1, ρ value = 〇. 56) DSDA. 3,3,4,4 - di-p-styl hard tetradecanoic acid di wild (polar base of DSDA: 2, ρ value = 〇· 93) ΒΑΡΡ : 2, 2-bis(4-amino-p-phenylene)propane (polar group of hydrazine: 2, ρ value = 〇. 53) ΗΑΒ : 4, 4' - (3, 3' _Dihydroxy)diamine-based stupid (ΗΑΒ polar group: 2, ρ value = 〇98) VAB -2,2--diyl _4, 4'-diamine phenyl 322367 27 201139589 (VAB Polar group: 〇, p value = 〇〇〇) DOS: adipic acid di-2-ethylhexanoic acid (polar group of DOS: 4) PSX-A: diamine oxirane represented by the above formula (9) ( However, the average value of mi is in the range of 20, and the weight average molecular weight is 740) Ρ value = 1.77) (14) N-12: dihydrazide represented by the following formula (14) (polarity of N-12) Base: 4 Η2Ν\ Λ λ /νη2 Ν (CH2)i〇Ν/ Η Η Synthesis Example 1 Add 1〇〇249 摩尔 in a 1000ml separation flask, 73.41g PSX-A(〇. 0992 莫Ear), 168g Ν-Methyl-2-t each ketone and 112 g of xylene. Further, 36.46 g of BPDA (0·1239 mol) was added to the separable flask, and the mixture was stirred at room temperature for 2 hours to obtain a polyamic acid solution. The polyamic acid solution was heated to 19 (rc, and stirred under heating for 1 hour to obtain a ruthenium imidized polyimine solution a. At this time, relative to the diamine siloxane component of the whole diamine component The molar percentage is 8 % (m value = 〇 8). Further, the "m value" is the molar ratio of the constituent unit represented by the above general formula (1) contained in the polyamidene resin (hereinafter, The same procedure. Synthetic Examples 2 to 5 The polyimine solution b to e was prepared in the same manner as in the synthesis example except that the raw material composition was as shown in Table 1. 322367 28 201139589 - [Table 1] Synthesis Example酝imine tetracarboxylic anhydride aromatic diamine diamine oxime oxane m value P value solution Hw (mole) (mole) (mole) 1 a 27, 863 BPDA (0.1239) BAPP (0.0249) PSX-A (0.0992) 0.8 0. 18 2 b 37, 331 BTDA (0.0610) BPDA (0.0610) BAPP (0.0244) PSX-A (0.0977) 0.8 0. 38 3 c 36,700 BTDA (0. 120) BAPP (0.0241) PSX-A (0.0964) 0.8 0. 55 4 d 21,947 DSDA (0.1163) BAPP (0.0233) PSX-A (0.0940) 0.8 0. 83 5 e 107, 000 BTDA (0.1246) BAPP (0.0374) PSX-A (0.0872) 0.7 0. 55 Synthesis Example 6 in 1000ml I2.26 g of BAPP (0.0299 mol), 44.20 g of PSX-AC 0.0597 mol, and 15.43 g of N-12 (0.069 mol)' I68 g of N-methyl-2 were added to the flask. _ Pyrrolidone and 112 g of dinonylbenzene. Further, 48.11 g of BTDA (0.1493 mol) was added to the separable flask, and the mixture was stirred at room temperature for 2 hours to obtain a polyamidonic acid solution. The polyamic acid solution was heated to 19 (TC, and stirred under heating for 10 hours to obtain a ruthenium imidized polyimine solution f. At this time, relative to the diamine oxime component of the whole diamine component The % is 40% (m value = 〇. 4). Synthesis Example 7 In a 1 〇〇〇 ml separable flask, 34.29 g of β ΑΡΡ (0. 0835 mol) 35. 47 g of PSX-A (0. 0479 摩尔), ΐ· i8g of ΗΑΒ (0. 0055 莫)' 168g of Ν-曱基-2·- than money 嗣 and 112g of diphenylbenzene. Add 49. 〇6g in the separate flask Ds_·1369 mol), stirred at room temperature 322367 29 201139589 for 2 hours to obtain a polyaminic acid solution. The polyamic acid solution was heated to 190 ° C to heat and stir for 1 hour to obtain a ruthenium imidized polyimine solution g. At this time, the molar % of the diamine oxirane component relative to the total diamine component was 35% (m value = 〇.35). Synthetic Example 8 In a 1000 ml separation flask, 34.26 g of BAPP (0. 〇 835 Mo), 35.48 g of PSX-AC 0. 0479 Mo, and 1. 29 g of VAB (0. 〇〇 55 Mohr) were added. ), 168 g of N-fluorenyl-2-pyrrolidone and 112 g of dinonylbenzene. Further, 49.02 g of DSDA (0.168 mTorr) was added to the separable flask, and the mixture was stirred at room temperature for 2 hours to obtain a polyamic acid solution. The polyamic acid solution was heated to 190 ° C and stirred under heating for 10 hours to obtain a ruthenium imidized polyimine solution h. At this time, the molar % of the diamine oxirane component relative to the total diamine component was 35% (m value = 0.35). Synthesis Example 9 In a 1000 ml separation flask, 9.89 g of BAPP (〇. 〇241 mol), 71.34 g of PSX-A (0.0964 mol), 168 g of N-mercapto-2-pyrrolidone and 112 g were added. Xylene. Further, 35.3 g of BPDA (0.120 ml) was added to the separable flask to disturb the room temperature for 2 hours to obtain a poly-aramidic acid solution. The polyamic acid solution was heated to 190 ° C, and heated and mixed for 1 hour to obtain a ruthenium iodide solution i. At this time, the molar % of the diamine dreaming component relative to the total diamine component was 80% (m value = 0.8). To the obtained polyimine solution, 6 g of DOS (0.014 mol) was added as a plasticizer. Synthesis Example 6 to Synthesis Example 9 are shown in Table 2. 322367 30 201139589 [Table 2_ Synthesis Example Polyiminetetracarboxylic anhydride Aromatic diamine diamine decyl ester compound solution Mw (mole) (mole) (mole) (mole) 0) Value Ρ value 6 f 210,000 BTDA (0.1493) BAPP (0.0299) N-12 (0,0597) PSX - A (0.0597) - 0.4 0. 87 7 g 90, 000 DSDA (0.1369) BAPP (0.0835) HAB CO.0055) PSX- A (0.0479) - 0. 35 0. 73 8 h 88,000 DSDA (0.1368) BAPP (0.0835) VAB (0.0055) PSX-A (0.0478) - 0. 35 0. 71 9 i 36, 700 BPDA (0.120) BAPP ( 0.0241) PSX-A (0.0964) DOS (0.014) 0.8 0. 31 ---1 — [Example 1] The polyimine solution a obtained in Synthesis Example 1 was made on a polyimide film (DuPont M.). The product name KaptonENS, length X width X thickness = 200mmx300mmx25 / / m) is coated on one side, and dried at 8 (TC for 15 minutes to form a cover film 1 having an adhesive layer thickness of 35 #m. The surface was placed on a copper foil from which the rust-preventive metal layer was removed, and pressurized under conditions of 18 〇〇c, pressure of 4 MPa, and 60 minutes, and Sample 1 was evaluated. The adhesive strength of the cover film and the copper foil after the adhesive layer was hardened was 0. 67kN/m. Next will evaluate sample 1 The heat treatment was carried out in an oven at 15 (rc for 1 hour). The adhesion strength between the (four) and the cover film after the treatment was measured to be 54 kN/m. The characteristic values of the measurement film are shown in Table 3. [Examples] 2] The film 2 was obtained except that the polyfluorene polyimide solution b in Example 1 was replaced, and the sample 2 was evaluated. The imine solution a was obtained in the same manner as in Example 1 except for the synthesis example 2. The adhesive strength of the coating layer after hardening of the layer was 527367 31 201139589. The copper foil had a subsequent strength of 0.57 kN/m. Next, the evaluation sample 2 was heat-treated at 150 ° C for 1000 hours in an oven. The treated copper foil was measured. The bonding strength of the cover film was 0.38 kN/m. The characteristic values of the measurement film are shown in Table 3. [Example 3] The polymerization obtained in the synthesis example 3 except the polyimine solution a in Example 1 was obtained. The film of the cover film and the copper foil after the adhesion of the adhesive layer was 0. 76 kN/m. The film was obtained by the same procedure as in Example 1. Next, the evaluation sample 3 was heat-treated at 150 ° C for 1,000 hours in an oven. The measured strength of the copper foil and the cover film after the treatment was 0.42 kN/m. The characteristic values of the measurement film are shown in Table 3. [Example 4] The cover film 4 was obtained in the same manner as in Example 1 except that the polyimine solution a in Example 1 was replaced with the polyimine solution i obtained in Synthesis Example 9. Sample 4. The adhesive strength of the cover film after hardening of the underlayer and the copper foil was 0.70 kN/m. Next, the evaluation sample 4 was heat-treated at 150 ° C for 1,000 hours in an oven. The subsequent strength of the treated copper foil and the cover film was determined to be 0.35 kN/ni. The characteristic values of the measurement film are shown in Table 3. [Comparative Example 1] A cover film was obtained in the same manner as in Example 1 except that the polyimine solution a in Example 1 was replaced with the polyimine solution d obtained in Synthesis Example 4, and an evaluation sample was obtained. . The characteristic values of the measurement film are shown in Table 4. 32 322367 201139589 Comparative Examples 2 to 5 Except that the polyimine dissolved in Tables 1 and 4 was used, the same operations as in Example g were carried out. g, h The characteristic values of the measured enthalpy are shown in Table 4. It is estimated that the sample is evaluated. In Table 4, the following strength 1 indicates the adhesion strength of the film after curing of the adhesive layer, and then the strength 2 indicates that it is in the atmosphere = C. (4) after the heat treatment of the face hour and the cover 臈 [Table 3]

[表4] 比較例1 比較例2 比較例3 比較例4 比較例5 聚酿亞胺溶液 d e f g h 接著強度l(kN/m) 0. 42 0. 70 0. 45 0. 18 0. 65 接著強度2(kN/m) 0. 17 0. 20 0. 00 0. 00 0. 13 銅的擴散量(%) 3. 2 未測定 未測定 未測定 未測定 翹弩 良 不良 不良 不良 不良 由表3、表4可知,作為接著劑樹脂組成物係使用P 值在0. 6以下的聚醯亞胺溶液a至c、i的實施例1至4中, 33 322367 201139589 =小時之熱處理後銅的擴散量也 2制於低^其結果,在實施例中,由於 Γ離強t的降低少’得到大幅超過〇._的接著強 二。又,覆盖膜的姆也受到抑制。再者,由於使用P值 在〇·7以下的親亞胺溶液i,在配合 ,細接著強度。另一方面,使用p:= 聚酿亞胺减d、f至h的比較例卜3至5中, ,熱處理後的接著強度的膜。又’在使用m值未達:的[Table 4] Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Comparative Example 5 Polyaniline solution defgh Next strength l (kN/m) 0. 42 0. 70 0. 45 0. 18 0. 65 Next strength 2(kN/m) 0. 17 0. 20 0. 00 0. 00 0. 13 Diffusion amount of copper (%) 3. 2 Unmeasured, unmeasured, unmeasured, unmeasured, defective, poor, defective, defective Table 4 shows that, as an adhesive resin composition, in Examples 1 to 4 in which the polypyridamine solutions a to c, i having a P value of 0.6 or less, 33 322367 201139589 = hour after the heat treatment of copper Also, the result is low, and in the embodiment, the decrease in the strength of the strong t is less than the strong second of 〇. Moreover, the thickness of the cover film is also suppressed. Further, since the pro-imine solution i having a P value of 〇·7 or less is used, the strength is finely bonded. On the other hand, a film of the strength after the heat treatment was used in Comparative Examples 3 to 5 in which p:= poly-imine was reduced by d, f to h. Also, the use of m values is not up to:

聚酿亞胺溶液e的比較例2 +,覆蓋膜的㈣ 碼足的膜。 不疋T 以上為就例示本發明的實施形態之目的下而詳細說 明,但本發明並不受上述實施形態的限定。本業者在沒有 聣離本發明的思想及範圍可做許多改變,這些也包含$本 發明的範圍内。例如’在上述實施形態中,做為本發明的 接著劑樹脂組成物的用途者,雖舉例Fpc等的電路基板的 覆蓋膜或接著薄片,但接著劑樹脂組成物也可利用於上述 乂外的用途’例如在捲帶自動結合(tape automated bonding, TAB)、晶片尺寸封裝(chip size package,CSP) 等之中接著用樹脂的形成。 【圖式簡單說明】 無。 【主要元件符號說明】 無。 34 322367Comparative Example 2 + of the brewing imine solution e, film of the (four) code foot of the cover film. The above is a detailed description of the embodiments of the present invention, but the present invention is not limited to the above embodiments. Many changes may be made by those skilled in the art without departing from the scope of the invention, which is also included within the scope of the invention. For example, in the above-described embodiment, the use of the adhesive resin composition of the present invention is a cover film or a sheet of a circuit board such as Fpc, but the adhesive resin composition may be used in the above-mentioned outer layer. For example, the formation of a resin is followed by, for example, tape automated bonding (TAB), chip size package (CSP), and the like. [Simple description of the diagram] None. [Main component symbol description] None. 34 322367

Claims (1)

201139589 七、申請專利範圍: 〇 〇 ,νλαλ ΝγΑ「丫 N—Rl‘ Ο ο I ^種接著劑樹脂組成物,係含有以下述—般式⑴及⑵ 所示構成單元的一種聚醯亞胺: (1) m νΑ ο 〇 ο ΑΓΥΝ· ο (2: η [式中,Ar表不由芳香族四羧酸酐衍生的4價的芳香族 基’ Rl為二絲錢絲生的2價二胺絲氧垸基,R2 為由芳香族二胺衍生的2價芳香族二胺基,队η表示 各構成單㈣存在莫耳比,4 ^至^的範圍内, η在〇至〇. 25的範圍内] 並且,本接著劑樹脂組成物的Ρ值在0.7以下,Ρ值是 =示組成物所含極性基的量的指標,而根據下述數式⑴ 鼻出 · Ρ 值= {(Α1+Α2)/(Β1+Β2)}χ100 …⑴ [此處,AWAr基中的極性基的個數)x(Ar基的莫耳數) A2=(R2基中的極性基的個數)x(R2基的莫耳數) Bl = (Ar基的分子量)x(Ar基的莫耳數) B2=(RZ基的分子量)X(R2基的莫耳數) 前述極性基的個數是: -x(x 表示齒原子)、-OH、_SH、_〇…一s_、_s〇_、__、 322367 1 201139589 ~C0-、-CN-、_P=0、-P〇-分別當作 1 個, -S〇2-、-C0NH-分別當做2個, -SO3H-當做3個,而計算]。 2. 如申請專利範圍第1項所述之接著劑樹脂組成物,其 中’前述聚醯亞胺樹脂之合成是使用p值均在1.0以下 的前述芳香族四羧酸酐及前述芳香族二胺作為原料,p 值是表示分子中所含極性基之量的指標,係根據下列數 式(ii)及(iii)算出, 芳香族四羧酸酐的P值= (A1/B1)xl〇〇 …(ϋ) 芳香族二胺的 P 值= (A2/B2)x100 ...(iii) [此處,A1、A2、B1、B2表示與前述同樣的意義]。 3. 如申請專利範圍第2項所述之接著劑樹脂組成物,其 中’芳香族二胺的P值在〇. 7以下。 4·如申δ青專利範圍第2項或第3項所述之接著劑樹脂組成 物,其中,前述聚醯亞胺是以下述一般式所示的二 胺基矽氧烷作為原料而合成者, Rs R7 H2N-R3—f S丨i一。^^:丨一 R「NH2 …(3) Re R8 [式中’ R3及R4分別表示亦可含有氧原子的2價有機基, Rs至匕分別表示碳數丨至6的烴基,平均反覆數之mi 是1至20]。 5.如申清專利範圍第4項所述之接著劑樹脂組成物,其 中,原料的全二胺成分中的前述一般式(3)的二胺基矽 2 322367 201139589 氧烷的莫耳比在80莫耳%以上。 6.如申請專利範圍第1項至第5項所述之接著劑樹脂組成 物,復含有可塑劑,表示組成物所含的極性基之量的指 標P值在0.7以下,p值是以下述式(iv)算出, P^ = {(Al+A2+A3)/(Bl+B2+B3)}xl〇〇 ...(iv) [此處,A1、A2、B1、B2表示與前述同樣的意義, A3=(可塑劑中的極性基的個數)χ(可塑劑的莫耳數) Β3=(可塑劑的分子量)χ(可塑劑的莫耳數),極性基的個 數是與前述同樣計算]。 7. 如申請專利範圍第丨項至第6項所述之接著劑樹脂組成 物,係做為保護電路基板的配線部之覆蓋臈用接著劑使 用。 8. 一種覆蓋膜,由接著劑層與覆蓋用膜材層積層而成,而 前述接著劑層係使用申請專利範圍第i項至第6項所述 之接著劑樹脂組成物所形成。 9·-種電路基板’具備基材,與在該基材上形成的配線 層,以及覆蓋該配線層的申請專利範圍第8項 蓋膜。 、 1〇.如申請專利範圍第9項所述之電路基板,在大氣中,15〇 C,1000小時的長期耐熱性試驗後,前述配線層與前 述覆盍膜的剝離強度是在0. 2kN/n!以上。 322367 3 201139589 四、指定代表圖:本案無圖式。 (一) 本案指定代表圖為:第( )圖。 (二) 本代表圖之元件符號簡單說明: 五、本案若有化學式時,請揭示最能顯示發明特徵的化學式: R5 R7 I I H2N —R3—(-Si-Ο-ή—-S1-R4-NH2 ---(3) I mi I R6 R8 3 322367201139589 VII. Patent application scope: 〇〇, νλαλ ΝγΑ "丫N-Rl' Ο ο I ^ The adhesive resin composition is a polyimine containing the constituent units represented by the following general formulas (1) and (2): (1) m νΑ ο 〇ο ΑΓΥΝ· ο (2: η [wherein, the Ar table is not a tetravalent aromatic group derived from an aromatic tetracarboxylic anhydride.] Rl is a divalent diamine silk oxygen produced by the second wire. a fluorenyl group, R2 is a divalent aromatic diamine group derived from an aromatic diamine, and a group η represents a molar ratio of each constituent unit (4), in the range of 4^ to ^, and η is in the range of 〇 to 〇. Further, the ruthenium value of the present resin composition is 0.7 or less, and the enthalpy value is an index indicating the amount of the polar group contained in the composition, and according to the following formula (1), the nose Ρ value = {(Α1+Α2) )/(Β1+Β2)}χ100 (1) [here, the number of polar groups in the AWAr group) x (the number of moles of the Ar group) A2 = (the number of polar groups in the R2 group) x (R2) The number of moles of the base) Bl = (molecular weight of the Ar group) x (the number of moles of the Ar group) B2 = (the molecular weight of the RZ group) X (the number of moles of the R2 group) The number of the aforementioned polar groups is: -x (x indicates tooth Atom), -OH, _SH, _〇...a s_, _s〇_, __, 322367 1 201139589 ~C0-, -CN-, _P=0, -P〇- respectively as one, -S〇2- , -C0NH- respectively as 2, -SO3H- as 3, and calculate] 2. The adhesive resin composition as described in claim 1, wherein the synthesis of the aforementioned polyimine resin is used The aromatic tetracarboxylic anhydride and the aromatic diamine having a p value of 1.0 or less are used as a raw material, and the p value is an index indicating the amount of a polar group contained in the molecule, and is calculated based on the following formulas (ii) and (iii). , P value of aromatic tetracarboxylic anhydride = (A1/B1)xl〇〇...(ϋ) P value of aromatic diamine = (A2/B2)x100 ... (iii) [here, A1, A2 B1 and B2 have the same meanings as described above. 3. The adhesive resin composition according to the second aspect of the invention, wherein the P value of the 'aromatic diamine is 〇. 7 or less. The adhesive resin composition according to Item 2 or 3, wherein the polyimine is synthesized by using a diamine siloxane as shown in the following general formula, Rs R7 H2N-R3 —f S丨i一.^^:丨R"NH2 ...(3) Re R8 [wherein R3 and R4 respectively represent a divalent organic group which may also contain an oxygen atom, and Rs to 匕 respectively represent a carbon number of 丨6 The hydrocarbyl group has an average repeat number of mi of 1 to 20]. 5. The adhesive resin composition according to claim 4, wherein the molar ratio of the diamine 矽2 322367 201139589 oxane of the above general formula (3) in the total diamine component of the raw material is 80% or more. 6. The adhesive resin composition according to any one of claims 1 to 5, further comprising a plasticizer, wherein the index P value indicating the amount of the polar group contained in the composition is 0.7 or less, and the p value is as follows. Equation (iv) calculates, P^ = {(Al+A2+A3)/(Bl+B2+B3)}xl〇〇...(iv) [here, A1, A2, B1, B2 are the same as described above The meaning, A3 = (number of polar groups in the plasticizer) χ (molar number of plasticizer) Β 3 = (molecular weight of plasticizer) χ (molar number of plasticizer), the number of polar groups is The same calculations as described above]. 7. The adhesive resin composition as described in the above paragraphs to 6 of the patent application is used as a cover for protecting the wiring portion of the circuit board. A cover film formed by laminating an adhesive layer and a film for covering, wherein the adhesive layer is formed using the adhesive resin composition described in the items i to 6 of the patent application. A circuit board of the invention includes a substrate, a wiring layer formed on the substrate, and a cover film of claim 8 covering the wiring layer. 2kN The peeling strength of the wiring layer and the coating film is 0. 2kN, the peeling strength of the wiring layer and the coating film is 0. 2kN /n! Above. 322367 3 201139589 IV. Designated representative map: There is no schema in this case. (1) The representative representative of the case is: ( ). (2) A brief description of the symbol of the representative figure: 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: R5 R7 II H2N - R3 - (-Si-Ο-ή--S1-R4- NH2 ---(3) I mi I R6 R8 3 322367
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