TWI508786B - Coating device - Google Patents

Coating device Download PDF

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TWI508786B
TWI508786B TW099102820A TW99102820A TWI508786B TW I508786 B TWI508786 B TW I508786B TW 099102820 A TW099102820 A TW 099102820A TW 99102820 A TW99102820 A TW 99102820A TW I508786 B TWI508786 B TW I508786B
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coating
collision
foreign matter
unit
substrate
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TW099102820A
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Chinese (zh)
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TW201036704A (en
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Genshin Nakazawa
Nobuo Horiuchi
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Toray Eng Co Ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975Assembly, maintenance, transport or storage of apparatus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67288Monitoring of warpage, curvature, damage, defects or the like

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  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Coating Apparatus (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

塗佈裝置Coating device

本發明是關於塗佈塗佈液至基板(substrate)上之塗佈裝置(coating machine)。The present invention relates to a coating machine for applying a coating liquid onto a substrate.

在液晶顯示器(liquid crystal display)或電漿顯示器(plasma display)等的平面面板顯示器(flat panel display)使用有塗佈有光阻(resist)液的玻璃基板(glass substrate)(以下也稱為塗佈基板)。而且,該塗佈基板是使用均勻地塗佈光阻液至玻璃基板上之塗佈裝置而被製作。In a flat panel display such as a liquid crystal display or a plasma display, a glass substrate coated with a resist liquid (hereinafter also referred to as a coating) is used. Cloth substrate). Further, the coated substrate was produced by using a coating device that uniformly applied a photoresist to a glass substrate.

這種塗佈裝置在以下的專利文獻1揭示有如下者:包含:保持基板之基板保持盤;配置於被保持在基板保持盤的基板的上方,由下端部的噴嘴流出光阻液之塗佈頭(塗佈部);對基板保持盤相對地使塗佈頭水平地移動之相對移動手段,其中一邊對基板保持盤相對地使塗佈頭水平地移動,一邊由塗佈頭流出塗佈液,塗佈光阻液至基板保持盤上的基板。In the following Patent Document 1, there is disclosed a coating apparatus comprising: a substrate holding tray that holds a substrate; and a coating that is disposed above the substrate held by the substrate holding tray and that is discharged from the nozzle at the lower end portion. a head (coating portion); a relative moving means for moving the coating head horizontally with respect to the substrate holding tray, wherein the coating head flows out from the coating head while the coating head is horizontally moved relative to the substrate holding tray Applying a photoresist solution to the substrate on the substrate holding tray.

而且,因基板的頂面與塗佈頭的噴嘴(nozzle)之間通常只有數十μm~一百數十μm的一點點的間隙,故若由於在基板上存在異物,或在基板保持盤上存在異物而使基板浮起來 的話,則有塗佈頭的噴嘴碰撞異物或基板,使噴嘴或基板損傷之虞。Moreover, since there is usually only a slight gap between several tens of μm and one hundred tens of μm between the top surface of the substrate and the nozzle of the coating head, if there is foreign matter on the substrate or on the substrate holding tray Foreign matter exists to float the substrate In this case, the nozzle of the coating head collides with the foreign matter or the substrate to damage the nozzle or the substrate.

因此,專利文獻1的塗佈裝置如圖6所示,不在塗佈頭122的噴嘴144而在對基板保持盤114的相對移動方向X1的那邊側中包含:用以碰撞異物P而配設之板狀構件(碰撞部)150;檢測該板狀構件150的振動之振動感測器(vibration sensor)151;在藉由該振動感測器151檢測出振動時使塗佈頭122的相對移動強制停止之控制手段。而且,該塗佈裝置透過使板狀構件150碰撞基板112上的異物P,透過藉由振動感測器151檢測出該碰撞造成的振動,根據該檢測信號使塗佈頭122之朝X1方向的移動強制停止,以防止塗佈頭122的噴嘴144碰撞異物P於未然而構成。Therefore, as shown in FIG. 6, the coating apparatus of Patent Document 1 does not include the nozzle 144 of the coating head 122 and the side opposite to the moving direction X1 of the substrate holding tray 114 for colliding with the foreign matter P. a plate-shaped member (collision portion) 150; a vibration sensor 151 that detects vibration of the plate-like member 150; and a relative movement of the coating head 122 when vibration is detected by the vibration sensor 151 Control means for forced stop. Further, the coating device transmits the foreign matter P on the substrate 112 by the plate member 150, transmits the vibration caused by the collision by the vibration sensor 151, and causes the coating head 122 to face the X1 direction according to the detection signal. The movement is forcibly stopped to prevent the nozzle 144 of the coating head 122 from colliding with the foreign matter P.

[專利文獻1]日本國特許第3653688號公報[Patent Document 1] Japanese Patent No. 3653688

在專利文獻1的塗佈裝置中,因在振動感測器151檢測出振動後到實際上塗佈頭122的相對移動停止為止會花時間,故必須空出塗佈頭122的噴嘴144與板狀構件150的間隔L僅該時間的塗佈頭122的移動距離(停止距離)的部分。In the coating apparatus of Patent Document 1, since it takes time until the relative movement of the coating head 122 is stopped after the vibration sensor 151 detects the vibration, it is necessary to vacate the nozzle 144 and the plate of the coating head 122. The interval L of the member 150 is only a portion of the moving distance (stop distance) of the coating head 122 at that time.

另一方面,伴隨近年來的光阻液等的塗佈性能的提高,塗佈頭122對基板保持盤114的相對移動速度具有高速化的傾向。因此,塗佈頭122的停止距離也變長,產生更拉長塗佈頭122的噴嘴144與板狀構件150的間隔L的必要。但是,若拉長塗佈頭122與板狀構件150的間隔L,則有裝置大型 化的問題。而且,由於與異物P的碰撞以外的因素使得塗佈頭122以其重心位置為中心振動的情形,因該振動造成的位移越離開塗佈頭122的重心位置越大,故若拉長塗佈頭122與板狀構件150(振動感測器151)的間隔L,則也有容易誤檢測出與異物的碰撞以外的振動的問題。On the other hand, with the improvement of the coating performance of the photoresist liquid etc. in recent years, the relative movement speed of the coating head 122 to the substrate holding disk 114 tends to increase. Therefore, the stopping distance of the coating head 122 also becomes long, which makes it necessary to elongate the interval L between the nozzle 144 of the coating head 122 and the plate-like member 150. However, if the distance L between the coating head 122 and the plate member 150 is elongated, there is a large device. Problem. Further, since the coating head 122 vibrates centering on the position of its center of gravity due to factors other than the collision with the foreign matter P, the displacement due to the vibration is larger as the position of the center of gravity of the coating head 122 is larger, so if the coating is elongated The distance L between the head 122 and the plate-like member 150 (vibration sensor 151) also has a problem that it is easy to erroneously detect vibration other than the collision with the foreign matter.

本發明是為了解決這種問題所進行的創作,其目的為提供一種塗佈裝置,即使不拉長在異物檢測部檢測出異物後噴嘴到異物等的距離,也能避免噴嘴與異物等的碰撞,可抑制裝置的大型化。The present invention has been made to solve such a problem, and an object of the invention is to provide a coating apparatus capable of avoiding collision of a nozzle with a foreign object or the like even if the distance between the nozzle and the foreign matter is not increased after the foreign matter detecting unit detects the foreign matter. It can suppress the enlargement of the device.

(1)、本發明的塗佈裝置其特徵包含:水平地保持基板之保持台;具有流出塗佈液到前述保持台上的前述基板的噴嘴之塗佈部;使前述塗佈部相對於前述保持台行走(running)於水平方向之行走機構;使前述塗佈部升降於上下方向之升降機構;在為了塗佈塗佈液至前述基板而藉由前述行走機構使前述塗佈部行走時,檢測存在於不在前述噴嘴而在行走方向的那邊側的異物之異物檢測部;在藉由前述異物檢測部檢測出異物時,控制前述升降機構,俾使前述塗佈部退避到上方之退避控制部,前述異物檢測部包含:配設於不在前述塗佈部的噴嘴而在行走方向的那邊側,於可在該基板上或該保持台上有異物的情形下碰撞前述基板的表面而被配設之碰撞部;以及檢測起因於與前述異物或前述基板表面的碰撞的前述碰撞部的高度的變化之碰撞檢測部,前述碰撞部能與前述塗佈部一起升降而一體地配設於前述塗佈部,更包含:檢測前述塗佈部的高度之高度檢測部; 根據前述高度檢測部的檢測結果控制前述塗佈部的高度於規定值之升降控制部,前述高度檢測部兼作前述碰撞檢測部,在前述碰撞部中的行走方向的那邊側的下部形成有越往同方向的那邊側位置越高而傾斜的傾斜面。(1) The coating apparatus of the present invention, comprising: a holding stage for holding a substrate horizontally; a coating portion having a nozzle for discharging the coating liquid onto the substrate on the holding stage; and the coating portion being opposite to the foregoing a traveling mechanism that keeps the running in the horizontal direction; a lifting mechanism that raises and lowers the coating portion in the vertical direction; and when the coating portion is moved by the traveling mechanism to apply the coating liquid to the substrate, a foreign matter detecting unit that detects a foreign object that is not in the traveling direction on the side of the nozzle; and when the foreign object detecting unit detects a foreign object, the lifting mechanism is controlled to retract the coating unit to the upper retreat control The foreign matter detecting unit includes: a side disposed in the traveling direction of the nozzle that is not in the coating unit, and is capable of colliding with the surface of the substrate when the substrate or the holding table has foreign matter a collision detecting portion disposed; and a collision detecting portion for detecting a change in height of the collision portion due to collision with the foreign matter or the surface of the substrate, wherein the collision portion can be Coated with the lifting portion integrally disposed in the coating unit, further comprising: a detection unit detecting the height of the height of the coated portion; The elevation control unit that controls the height of the application unit to a predetermined value is controlled by the detection result of the height detection unit, and the height detection unit also serves as the collision detection unit, and the lower portion of the collision portion is formed on the lower side in the traveling direction. The inclined side with a higher position on the side in the same direction.

因本發明的塗佈裝置一藉由異物檢測部檢測出異物,升降機構就藉由退避控制部控制,俾使塗佈部退避到上方,故為了對應塗佈部的行走速度的高速化等,即使不拉長在異物檢測部檢測出異物後噴嘴到異物的距離(異物檢測部到噴嘴的間隔),也能避免噴嘴與異物等的碰撞,可抑制裝置的大型化。In the coating apparatus of the present invention, the foreign matter detecting unit detects the foreign matter, and the elevating mechanism is controlled by the retracting control unit to retract the coating unit to the upper side. Therefore, in order to speed up the traveling speed of the application unit, Even if the distance from the nozzle to the foreign matter (the interval between the foreign matter detecting portion and the nozzle) after the foreign matter detecting unit detects the foreign matter is not elongated, collision between the nozzle and the foreign matter can be avoided, and the size of the device can be suppressed.

依照該構成,因碰撞檢測部檢測起因於與異物或基板表面(以下也稱為異物等)的碰撞的碰撞部的高度的變化,故與藉由振動感測器檢測起因於該碰撞的振動的情形比較,可減少誤檢測,提高檢測精度。亦即,藉由振動感測器檢測碰撞部的振動的情形,也會不小心檢測出起因於碰撞部與異物等的碰撞以外而產生的振動,例如起因於在塗佈動作的開始時或結束時塗佈部進行加速、減速之行走方向的振動,惟如本發明,檢測碰撞部的高度的變化的情形幾乎不產生這種問題,可正確地檢測碰撞部與異物等的碰撞。According to this configuration, the collision detecting unit detects a change in the height of the collision portion caused by the collision with the foreign matter or the surface of the substrate (hereinafter also referred to as a foreign matter), and thus detects the vibration caused by the collision by the vibration sensor. Comparison of the situation can reduce false detection and improve detection accuracy. In other words, when the vibration sensor detects the vibration of the collision portion, the vibration caused by the collision between the collision portion and the foreign matter or the like is inadvertently detected, for example, at the beginning or the end of the coating operation. In the present invention, when the height of the collision portion is detected, the problem is almost impossible, and the collision between the collision portion and the foreign matter can be accurately detected.

依照該構成,因為了塗佈部的高度控制而被使用的高度檢測部也為了檢測起因於與異物等的碰撞的碰撞部的高度的變化而被使用,故無須為了檢測碰撞部的高度的變化而另外配設感測器。因此,零件件數的削減為可能,可抑制製造成本。According to this configuration, the height detecting unit used for the height control of the application portion is also used to detect a change in the height of the collision portion caused by the collision with the foreign matter or the like. Therefore, it is not necessary to detect the change in the height of the collision portion. In addition, a sensor is provided. Therefore, it is possible to reduce the number of parts and to suppress the manufacturing cost.

依照該構成,若在基板等存在異物,則形成有傾斜面的碰撞部的底面碰撞異物等,伴隨該碰撞包含朝上成分的反作用力作用於碰撞部。因此,碰撞部由於與異物等的碰撞使得高度容易變化,可更提高異物的檢測精度。According to this configuration, when a foreign matter is present on the substrate or the like, the bottom surface of the collision portion on which the inclined surface is formed collides with a foreign object or the like, and the collision force including the upward component acts on the collision portion. Therefore, the collision portion is easily changed in height due to collision with foreign matter or the like, and the detection accuracy of the foreign matter can be further improved.

本發明的塗佈裝置,在檢測出基板上或保持台上的異物的情形下,藉由使塗佈部朝上方退避,無須拉長在異物檢測部檢測出異物後噴嘴到異物等的距離,可抑制裝置的大型化。In the coating apparatus of the present invention, when the foreign matter on the substrate or the holding table is detected, the coating portion is retracted upward, and the distance from the nozzle to the foreign matter or the like after the foreign matter detecting portion detects the foreign matter is not required to be elongated. The size of the device can be suppressed.

接著,針對為了實施本發明的形態,參照圖面說明。Next, the form for carrying out the invention will be described with reference to the drawings.

圖1是顯示與本發明的實施形態有關的塗佈裝置11之斜視圖,圖2是擴大顯示該塗佈裝置11中的塗佈單元15的單元支撐部23附近之前視圖。如圖1及圖2所示,塗佈裝置11是塗佈藥液或光阻等的液狀物(以下也稱為塗佈液)至被供給的薄板狀的基板12。該塗佈裝置11包含:基台13;為了承載基板12的平台(stage)(保持台)14;對該平台14可移動於特定方向而構成之塗佈單元(coating unit)15。1 is a perspective view showing a coating device 11 according to an embodiment of the present invention, and FIG. 2 is a front view showing an enlarged vicinity of a unit supporting portion 23 of the coating unit 15 in the coating device 11. As shown in FIG. 1 and FIG. 2, the coating device 11 is a liquid material (hereinafter also referred to as a coating liquid) such as a chemical solution or a photoresist, which is applied to the supplied thin plate-shaped substrate 12. The coating device 11 includes a base 13 , a stage (holding stage) 14 for carrying the substrate 12 , and a coating unit 15 configured to move the platform 14 in a specific direction.

此外,在以下的說明中是以塗佈單元15移動的方向為X軸方向,以與X軸方向在水平面上正交的方向為Y軸方向,以正交於X軸方向及Y軸方向之雙方的上下方向為Z 軸方向。In the following description, the direction in which the coating unit 15 moves is the X-axis direction, and the direction orthogonal to the horizontal plane in the X-axis direction is the Y-axis direction, and is orthogonal to the X-axis direction and the Y-axis direction. The up and down direction of both sides is Z Axis direction.

在基台13承載有平台14,在該平台14的Y軸方向的兩側配設有滑軌(slide rail)17。而且,在該滑軌17承載有塗佈單元15。A platform 14 is carried on the base 13 and a slide rail 17 is disposed on both sides of the platform 14 in the Y-axis direction. Moreover, the coating unit 15 is carried on the slide rail 17.

平台14是將被搬進的基板12承載保持於其頂面。在平台14的表面形成有複數個吸引孔(圖示省略),在該等吸引孔連接有真空泵(vacuum pump)(圖示省略)。而且,若使真空泵動作,則藉由負壓使基板12被吸引到平台14的表面,被保持於該表面上。而且,在平台14配設有使基板12進行升降動作的基板升降機構(圖示省略)。The platform 14 carries and holds the substrate 12 carried in on its top surface. A plurality of suction holes (not shown) are formed on the surface of the stage 14, and a vacuum pump (not shown) is connected to the suction holes. Further, when the vacuum pump is operated, the substrate 12 is attracted to the surface of the stage 14 by the negative pressure, and is held on the surface. Further, a substrate elevating mechanism (not shown) for moving the substrate 12 up and down is disposed on the stage 14.

滑軌17是導引塗佈單元15的行走,延伸配設於X軸方向。滑軌17在垂直於Z軸方向的方向與垂直於Y軸方向具有平坦且平滑的導面(guide face)19。該導面19與後述的塗佈單元15的空氣軸承(air bearing)20對向。The slide rail 17 guides the traveling of the coating unit 15 and is disposed to extend in the X-axis direction. The slide rail 17 has a flat and smooth guide face 19 in a direction perpendicular to the Z-axis direction and perpendicular to the Y-axis direction. This guide surface 19 opposes the air bearing 20 of the coating unit 15 mentioned later.

塗佈單元15是為了塗佈塗佈液至被承載於平台14的基板12,包含:沿著Y軸方向延伸,流出塗佈液之開縫噴嘴部(slit nozzle part)(塗佈部)22;配設於該開縫噴嘴部22的兩端部分之單元支撐部23。The coating unit 15 is for applying the coating liquid to the substrate 12 carried on the stage 14, and includes: a slit nozzle part (coating part) 22 that extends in the Y-axis direction and flows out of the coating liquid. The unit support portion 23 disposed at both end portions of the slit nozzle portion 22.

單元支撐部23是為了使開縫噴嘴部22升降於Z軸方向,並使該開縫噴嘴部22行走於X軸方向。亦即,該單元支撐部23具有:使開縫噴嘴部22升降於Z軸方向之升降機構24;使開縫噴嘴部22行走於X軸方向之行走機構25。而且,升降機構24及行走機構25藉由控制裝置26(參照圖4)進行動作控制。此外,控制裝置26是由包含如下構件的電 腦構成:由CPU構成的運算手段;記憶程式或資料(data)的ROM(Read-Only Memory:唯讀記憶體)、RAM(Random Access Memory:隨機存取記憶體)、HDD(Hard Disk:硬碟)等的記憶手段;為了輸入/輸出對外部的信號之輸入/輸出介面等,運算手段執行被記憶於記憶手段的各種程式而構成。The unit support portion 23 is for moving the slit nozzle portion 22 up and down in the Z-axis direction, and the slit nozzle portion 22 is moved in the X-axis direction. In other words, the unit support portion 23 has a lifting mechanism 24 that raises and lowers the slit nozzle portion 22 in the Z-axis direction, and a traveling mechanism 25 that moves the slit nozzle portion 22 in the X-axis direction. Further, the elevating mechanism 24 and the traveling mechanism 25 are controlled by the control device 26 (see FIG. 4). Further, the control device 26 is made of electricity including the following components Brain composition: calculation means composed of CPU; ROM (Read-Only Memory), RAM (Random Access Memory), HDD (Hard Disk: Hard) for memory program or data (data) A memory means such as a disc; in order to input/output an input/output interface to an external signal, etc., the arithmetic means is configured to execute various programs stored in the memory means.

如圖1及圖2所示,升降機構24具有:延伸於Z軸方向的導軌(guide rail)28;與開縫噴嘴部22連結的滑件(slider)29。在該導軌28,滑件29沿著導軌28滑動自如地被安裝。圖3是升降機構24的概略圖,升降機構24具有:作為驅動體的伺服馬達(servo motor)30;藉由該伺服馬達30驅動的滾珠螺桿機構(ball screw mechanism)31,在該滾珠螺桿機構31連結有滑件29或開縫噴嘴部22。控制裝置26是將驅動控制伺服馬達30的升降控制部32當作一功能部而具備(也參照圖4),升降控制部32控制伺服馬達30並使開縫噴嘴部22升降於Z軸方向,並且在任意的位置使其停止而構成。As shown in FIGS. 1 and 2, the elevating mechanism 24 has a guide rail 28 extending in the Z-axis direction, and a slider 29 coupled to the slit nozzle portion 22. On the guide rail 28, the slider 29 is slidably mounted along the guide rail 28. 3 is a schematic view of a lifting mechanism 24 having a servo motor 30 as a driving body and a ball screw mechanism 31 driven by the servo motor 30, in which the ball screw mechanism is used. 31 is connected to the slider 29 or the slit nozzle portion 22. The control device 26 includes the elevation control unit 32 that drives the servo motor 30 as a functional unit (see also FIG. 4), and the elevation control unit 32 controls the servo motor 30 to raise and lower the slit nozzle unit 22 in the Z-axis direction. And it is configured to stop at an arbitrary position.

而且,升降機構24包含檢測開縫噴嘴部22的上下方向的位移之高度檢測部33。該高度檢測部33由光學式或磁性式等的光學尺(linear scale)構成,包含:並設於開縫噴嘴部22的第一刻度尺(scale)34;配設於對向於該第一刻度尺34的位置,與開縫噴嘴部22一起昇降於上下方向之第一讀取部35。而且,高度檢測部33是透過以第一讀取部35讀取第一刻度尺34,檢測開縫噴嘴部22的高度而構成。藉由第一讀取部35檢測的信號被輸入到控制裝置26的升降控制 部32,依照該輸入的信號,伺服馬達30藉由升降控制部32控制。Further, the elevating mechanism 24 includes a height detecting unit 33 that detects displacement of the slit nozzle portion 22 in the vertical direction. The height detecting unit 33 is formed of an optical scale such as an optical type or a magnetic type, and includes a first scale 34 provided on the slit nozzle unit 22, and is disposed on the opposite side. The position of the scale 34 is raised and lowered with the slit nozzle portion 22 in the first reading portion 35 in the vertical direction. Further, the height detecting unit 33 is configured to read the first scale 34 by the first reading unit 35 and detect the height of the slit nozzle unit 22. The signal detected by the first reading unit 35 is input to the lifting control of the control device 26 The portion 32 controls the servo motor 30 by the elevation control unit 32 in accordance with the input signal.

如圖1及圖2所示,行走機構25是為了使開縫噴嘴部22行走於X軸方向,包含:滑動支撐部36與線性馬達(linear motor)37。As shown in FIGS. 1 and 2, the traveling mechanism 25 includes a slide support portion 36 and a linear motor 37 in order to cause the slit nozzle portion 22 to travel in the X-axis direction.

該滑動支撐部36藉由配設於與滑軌17之間的空氣軸承20而被支撐於滑軌17上。然後,透過控制裝置26驅動控制線性馬達37,使滑動支撐部36移動於X軸方向。具體上在配設於滑動支撐部36的空氣軸承20透過管路連接有壓縮機(compressor)(圖示省略),藉由該壓縮機的動作空氣被由空氣軸承20供給到導面19。然後,藉由在空氣軸承20與導面19之間供給空氣,滑動支撐部36由導面19浮起,透過在該狀態下驅動線性馬達37,使滑動支撐部36移動於X軸方向。The slide support portion 36 is supported by the slide rail 17 by an air bearing 20 disposed between the slide rails 17. Then, the linear motor 37 is driven and controlled by the control device 26 to move the slide support portion 36 in the X-axis direction. Specifically, a compressor (not shown) is connected to the air bearing 20 disposed in the slide support portion 36 through a pipe, and the operating air of the compressor is supplied to the guide surface 19 by the air bearing 20. Then, by supplying air between the air bearing 20 and the guide surface 19, the slide support portion 36 is floated by the guide surface 19, and the linear motor 37 is driven in this state to move the slide support portion 36 in the X-axis direction.

如圖4所示,控制裝置26是將控制線性馬達37的行走控制部39當作一功能部而具備,該行走控制部39是控制線性馬達37並使開縫噴嘴部22行走於X軸方向,並且在任意的位置使其停止而構成。As shown in FIG. 4, the control device 26 includes a travel control unit 39 that controls the linear motor 37 as a functional unit that controls the linear motor 37 and causes the slit nozzle unit 22 to travel in the X-axis direction. And it is constructed by stopping it at an arbitrary position.

而且,在滑動支撐部36配設有檢測塗佈單元15的X軸方向中的位置之行走位置檢測部40。該行走位置檢測部40如圖1及圖2所示包含:在滑軌17上沿著導面19配設的第二刻度尺41;配設於與該第二刻度尺41對向的位置之第二讀取部42,透過以該第二讀取部42讀取第二刻度尺41,檢測塗佈單元15的行走位置。藉由第二讀取部42檢測 的信號被輸入到行走控制部39,行走控制部39依照輸入的信號控制線性馬達37。而且,行走控制部39具有根據輸入的信號運算塗佈單元15的行走速度之功能。Further, the slide support portion 36 is provided with a travel position detecting portion 40 that detects a position in the X-axis direction of the coating unit 15. As shown in FIGS. 1 and 2, the travel position detecting unit 40 includes a second scale 41 disposed on the slide rail 17 along the guide surface 19, and is disposed at a position facing the second scale 41. The second reading unit 42 transmits the second scale 41 by the second reading unit 42 to detect the traveling position of the coating unit 15. Detected by the second reading unit 42 The signal is input to the travel control unit 39, and the travel control unit 39 controls the linear motor 37 in accordance with the input signal. Further, the travel control unit 39 has a function of calculating the traveling speed of the coating unit 15 based on the input signal.

如圖1及圖2所示,開縫噴嘴部22是塗佈塗佈液至被保持在平台14上的基板12的頂面。該開縫噴嘴部22是具有延伸於Y軸方向的形狀之柱狀構件,具備流出塗佈液至與平台14的表面對向的側之噴嘴44。該噴嘴44朝平台14的表面側突出,在該突出的部分形成有延伸於Y軸方向的形狀的開縫(slit),透過該開縫使被供給至開縫噴嘴部22的塗佈液流出到基板12的表面。As shown in FIGS. 1 and 2, the slit nozzle portion 22 is a top surface of the substrate 12 coated with the coating liquid to be held on the stage 14. The slit nozzle portion 22 is a columnar member having a shape extending in the Y-axis direction, and includes a nozzle 44 that flows out of the coating liquid to the side facing the surface of the stage 14. The nozzle 44 protrudes toward the surface side of the stage 14, and a slit extending in the Y-axis direction is formed in the protruding portion, and the coating liquid supplied to the slit nozzle portion 22 flows out through the slit. To the surface of the substrate 12.

開縫噴嘴部22透過以行走控制部39控制線性馬達37,一邊由配置於平台14的X軸方向的端部側的狀態行走於箭頭X1方向,一邊塗佈塗佈液至基板12的表面。The slit nozzle unit 22 passes the coating control unit 39 to control the linear motor 37, and applies the coating liquid to the surface of the substrate 12 while traveling in the direction of the arrow X1 while being placed on the end side of the stage 14 in the X-axis direction.

而且,在塗佈塗佈液至基板12的表面時,開縫噴嘴部22的高度被設定,俾噴嘴44與基板12的表面的間隙成約數十μm~一百數十μm之間的規定值。具體上當塗佈塗佈液時,開縫噴嘴部22的高度始終藉由高度檢測部33(參照圖3)檢測,該檢測信號被輸入到控制裝置26的升降控制部32。然後,伺服馬達30藉由升降控制部32回饋控制(feedback control),俾開縫噴嘴部22被維持於規定的高度。Further, when the coating liquid is applied to the surface of the substrate 12, the height of the slit nozzle portion 22 is set, and the gap between the 俾 nozzle 44 and the surface of the substrate 12 is a predetermined value between about several tens of μm and one hundred tens of μm. . Specifically, when the coating liquid is applied, the height of the slit nozzle portion 22 is always detected by the height detecting portion 33 (see FIG. 3), and the detection signal is input to the elevation control portion 32 of the control device 26. Then, the servo motor 30 is subjected to feedback control by the elevation control unit 32, and the slit nozzle unit 22 is maintained at a predetermined height.

如圖3所示,在開縫噴嘴部22的底面配設有碰撞部45。該碰撞部45與開縫噴嘴部22一樣延伸於Y軸方向,正交於該Y軸方向的剖面形狀形成略L字形狀。而且,碰撞部 45配置於開縫噴嘴部22的行走方向X1的那邊側,且對噴嘴44在同方向空出規定的間隔L的位置。而且,碰撞部45與開縫噴嘴部22一體地被固定,與開縫噴嘴部22一起進行上下升降及水平移動而構成。碰撞部45的下端位置被設定於與噴嘴44的尖端大致相同或稍低的高度。As shown in FIG. 3, the collision part 45 is arrange|positioned in the bottom surface of the slit nozzle part 22. The collision portion 45 extends in the Y-axis direction like the slit nozzle portion 22, and has a substantially L-shaped cross-sectional shape orthogonal to the Y-axis direction. Moreover, the collision department 45 is disposed on the side of the running direction X1 of the slit nozzle portion 22, and is vacant at a predetermined interval L in the same direction with respect to the nozzle 44. Further, the collision portion 45 is integrally fixed to the slit nozzle portion 22, and is configured to be vertically moved up and down and horizontally moved together with the slit nozzle portion 22. The lower end position of the collision portion 45 is set to be substantially the same as or slightly lower than the tip end of the nozzle 44.

當塗佈塗佈液時,若在基板12上存在異物P,則行走於箭頭X1方向的開縫噴嘴部22的碰撞部45碰撞該異物P。而且,若異物P存在於平台14上,則放在其上的基板12部分地浮起,碰撞部45碰撞基板12的表面。然後,若該等碰撞發生,則開縫噴嘴部22被抬到上方(Z軸方向)而急遽地位移。該位移是透過高度檢測部33的第一讀取部35讀取第一刻度尺34而被檢測出,該檢測信號被輸入到控制裝置26。When the coating liquid is applied, if the foreign matter P is present on the substrate 12, the collision portion 45 of the slit nozzle portion 22 traveling in the direction of the arrow X1 collides with the foreign matter P. Further, if the foreign matter P exists on the stage 14, the substrate 12 placed thereon partially floats, and the collision portion 45 collides with the surface of the substrate 12. Then, when the collision occurs, the slit nozzle portion 22 is lifted upward (in the Z-axis direction) and is suddenly displaced. This displacement is detected by reading the first scale 34 by the first reading unit 35 of the height detecting unit 33, and the detection signal is input to the control device 26.

如此,由於碰撞部45碰撞異物P等而產生的開縫噴嘴部22的位移比由於開縫噴嘴部22的通常的行走而產生的微小的上下運動大,兩者可明確地區別。因此,控制裝置26在藉由第一讀取部35檢測的位移為規定的臨界值(threshold value)以上的情形下,判別該位移為起因於與異物P等的碰撞。In this way, the displacement of the slit nozzle portion 22 caused by the collision portion 45 colliding with the foreign matter P or the like is larger than the slight vertical movement caused by the normal running of the slit nozzle portion 22, and the two can be clearly distinguished. Therefore, when the displacement detected by the first reading unit 35 is equal to or greater than a predetermined threshold value (threshold value), the control device 26 determines that the displacement is caused by a collision with the foreign matter P or the like.

而且,如圖4所示,控制裝置26的升降控制部32根據起因於與異物P等的碰撞的位移的檢測信號(碰撞信號)控制伺服馬達30,俾使開縫噴嘴部22上升。然後,透過該開縫噴嘴部22的上升使噴嘴44對異物P的碰撞被避免。Further, as shown in FIG. 4, the elevation control unit 32 of the control device 26 controls the servo motor 30 based on a detection signal (collision signal) caused by a displacement of a collision with the foreign matter P or the like, and raises the slit nozzle portion 22. Then, the collision of the nozzle 44 with the foreign matter P is prevented by the rise of the slit nozzle portion 22.

而且,控制裝置26的行走控制部39根據輸入的碰撞信 號控制線性馬達37,俾使開縫噴嘴部22的行走停止。然後,透過該開縫噴嘴部22的停止使噴嘴44對異物P的碰撞也被避免。Moreover, the travel control unit 39 of the control device 26 is based on the input collision letter. The linear motor 37 is controlled to stop the travel of the slit nozzle portion 22. Then, the collision of the nozzle 44 with the foreign matter P by the stop of the slit nozzle portion 22 is also avoided.

此處,碰撞部45及高度檢測部33構成檢測存在於基板12上或平台14上的異物P的異物檢測部,控制裝置26的升降控制部32是當作使開縫噴嘴部22由異物P退避到上方的退避控制部而發揮功能,行走控制部39是當作使開縫噴嘴部22停止,俾噴嘴44不碰撞異物P的停止控制部而發揮功能。Here, the collision portion 45 and the height detecting portion 33 constitute a foreign matter detecting portion that detects the foreign matter P existing on the substrate 12 or the stage 14, and the elevation control portion 32 of the control device 26 is configured to make the slit nozzle portion 22 from the foreign matter P. The travel control unit 39 functions as a stop control unit that stops the slit nozzle unit 22 and does not collide with the foreign matter P, and the travel control unit 39 functions as a stop control unit that is retracted to the upper side.

因本實施形態的塗佈裝置11若藉由異物檢測部檢測出基板12上的異物P,則不僅使開縫噴嘴部22停止,也使其退避到上方,故與以往(參照圖6)比較,無須拉長噴嘴44的尖端與碰撞部45的間隔L,可抑制裝置的大型化。When the foreign matter detecting unit detects the foreign matter P on the substrate 12, the coating device 11 of the present embodiment not only stops the slit nozzle portion 22 but also retracts it upward, so that it is compared with the conventional (see FIG. 6). The distance L between the tip end of the nozzle 44 and the collision portion 45 is not required to be elongated, and the size of the apparatus can be suppressed.

亦即,因以往僅能使開縫噴嘴部22的行走停止,故必須使噴嘴44與碰撞部45的間隔L比在檢測出異物P後線性馬達37開始停止動作到實際上開縫噴嘴部22停止為止之間開縫噴嘴部22移動的距離(停止距離)還長,因該停止距離為開縫噴嘴部22的行走速度越快越長,故間隔L也需更拉長,惟在本實施形態中,若使開縫噴嘴部22上升比異物P的高度高一些,則可避免與異物P的碰撞,而且因該上升量遠小於上述停止距離,故無須如以往般拉長噴嘴44與碰撞部45的間隔L。In other words, since the travel of the slit nozzle portion 22 can be stopped only in the related art, the distance L between the nozzle 44 and the collision portion 45 must be made larger than the detection of the foreign matter P, and the linear motor 37 starts to stop until the actual slit nozzle portion 22 is stopped. The distance (stop distance) at which the slit nozzle portion 22 moves between the stops is long, and since the stop distance is as long as the running speed of the slit nozzle portion 22 is longer, the interval L needs to be longer, but in the present embodiment. In the embodiment, when the slit nozzle portion 22 is raised higher than the height of the foreign matter P, collision with the foreign matter P can be avoided, and since the amount of rise is much smaller than the stop distance, it is not necessary to elongate the nozzle 44 and collide as in the past. The interval L of the portion 45.

而且,若噴嘴44與碰撞部45(第一讀取部35)的間隔L長,則在以開縫噴嘴部22的重心位置為中心產生振動的情 形下,第一讀取部35的位置中的振動(上下運動)變大,會產生以起因於與異物P的碰撞的高度變化被誤檢測出的可能性,惟本實施形態的情形因無須那麼拉長噴嘴44與碰撞部45(第一讀取部35)的間隔L,故這種問題也很難產生。When the distance L between the nozzle 44 and the collision portion 45 (the first reading portion 35) is long, vibration is generated around the center of gravity of the slit nozzle portion 22. In the case where the vibration (up and down motion) in the position of the first reading unit 35 is increased, there is a possibility that the height change due to the collision with the foreign object P is erroneously detected, but the case of the present embodiment is unnecessary. Then, the interval L between the elongated nozzle 44 and the collision portion 45 (the first reading portion 35) is also difficult to occur.

而且,在本實施形態中,因藉由使用於開縫噴嘴部22的高度控制的高度檢測部33檢測碰撞部45與異物P等的碰撞,故無須另外配設為了檢測該碰撞的專用的感測器,由零件件數的削減達成的製造成本的抑制為可能。Further, in the present embodiment, since the collision detecting unit 33 detects the collision between the collision portion 45 and the foreign matter P by the height detecting unit 33 used for the height control of the slit nozzle portion 22, it is not necessary to separately provide a dedicated feeling for detecting the collision. In the detector, it is possible to suppress the manufacturing cost achieved by the reduction in the number of parts.

圖5是顯示與本發明的其他的實施形態有關的塗佈裝置的碰撞部之擴大概略圖。在本實施形態的碰撞部45的下部形成有傾斜面45a。具體上該傾斜面45a透過以有關同方向X1的寬度a與高度b對碰撞部45中的行走方向X1的那邊側的角部進行倒角而形成。該寬度a與高度b具有b<a的關係,因此,對水平面的傾斜面45a的傾斜角度θ被設定為0<θ<45°。但是,前述傾斜面45a的傾斜角度θ被設定為45°≦θ<90°也可以。Fig. 5 is an enlarged schematic view showing a collision portion of a coating device according to another embodiment of the present invention. An inclined surface 45a is formed in a lower portion of the collision portion 45 of the present embodiment. Specifically, the inclined surface 45a is formed by chamfering a corner portion on the side in the traveling direction X1 of the collision portion 45 with respect to the width a and the height b in the same direction X1. Since the width a and the height b have a relationship of b < a, the inclination angle θ of the inclined surface 45a of the horizontal plane is set to 0 < θ < 45 °. However, the inclination angle θ of the inclined surface 45a may be set to 45° ≦ θ < 90°.

本實施形態的情形若碰撞部45的傾斜面45a對存在於基板12上的異物P碰撞,則碰撞部45受到包含根據傾斜面45a的傾斜角度θ的向上的成分之反作用力。因此,在本實施形態中,由於與異物P的碰撞使碰撞部45容易位移到上方,可根據該位移提高異物的檢測精度。而且,藉由設傾斜面45a的傾斜角度θ為0<θ<45°,可加大作用於碰撞部45的反作用力的向上成分,可使碰撞部45更容易位移到上方。而且,透過碰撞部45碰撞異物P後朝行走方向X1行走 使得開縫噴嘴部22容易沿著傾斜面45a上升,可更確實地避免異物P與噴嘴44的碰撞。In the case of the present embodiment, when the inclined surface 45a of the collision portion 45 collides with the foreign matter P existing on the substrate 12, the collision portion 45 receives a reaction force including an upward component of the inclination angle θ according to the inclined surface 45a. Therefore, in the present embodiment, the collision portion 45 is easily displaced upward by the collision with the foreign matter P, and the detection accuracy of the foreign matter can be improved based on the displacement. Further, by setting the inclination angle θ of the inclined surface 45a to 0 < θ < 45°, the upward component of the reaction force acting on the collision portion 45 can be increased, and the collision portion 45 can be more easily displaced upward. Further, after the collision portion 45 collides with the foreign matter P, it travels in the traveling direction X1. The slit nozzle portion 22 is easily raised along the inclined surface 45a, and collision of the foreign matter P with the nozzle 44 can be more reliably prevented.

本發明不是被限定於上述實施形態,可適宜進行設計變更。The present invention is not limited to the above embodiment, and design changes can be appropriately made.

例如檢測碰撞部45的高度的變化的碰撞檢測部也可以為檢測至伺服馬達30的供給電流的電流計。若由於碰撞部45碰撞異物P等而使開縫噴嘴部22上升,則伺服馬達30的扭矩(torque)變化,供給電流也變化。因此,若檢測出該供給電流的值的變化,則可檢測出碰撞部45碰撞異物P。For example, the collision detecting unit that detects the change in the height of the collision portion 45 may be an ammeter that detects the supply current to the servo motor 30. When the slit portion 22 is raised by the collision portion 45 colliding with the foreign matter P or the like, the torque of the servo motor 30 changes, and the supply current also changes. Therefore, when the change in the value of the supply current is detected, it is possible to detect that the collision portion 45 collides with the foreign matter P.

在上述實施形態中,雖然碰撞部45是以與開縫噴嘴部22不同的構件形成,藉由固定於開縫噴嘴部22而被一體化,惟藉由加工開縫噴嘴部22自身一體形成碰撞部45也可以。In the above-described embodiment, the collision portion 45 is formed of a member different from the slit nozzle portion 22, and is integrally fixed to the slit nozzle portion 22, but the collision is integrally formed by the machining slit nozzle portion 22 itself. The part 45 is also possible.

而且,碰撞部45為與開縫噴嘴部22另外單獨上下地升降的構造也可以。此情形與高度檢測部33不同,另外具備檢測碰撞部45的高度的碰撞檢測部也可以。Further, the collision portion 45 may have a structure in which the slit nozzle portion 22 is separately moved up and down. In this case, unlike the height detecting unit 33, a collision detecting unit that detects the height of the collision unit 45 may be provided.

本發明的塗佈裝置為了檢測碰撞部45與異物P的碰撞,也可以具備與高度檢測部33不同的感測器。例如與以往(參照圖6)一樣,配設檢測開縫噴嘴部22的振動的振動感測器,藉由該振動感測器的檢測信號使開縫噴嘴部22進行上升動作及停止動作而構成也可以。The coating device of the present invention may include a sensor different from the height detecting unit 33 in order to detect a collision between the collision portion 45 and the foreign matter P. For example, in the same manner as in the related art (see FIG. 6), the vibration sensor that detects the vibration of the slit nozzle unit 22 is configured to cause the slit nozzle unit 22 to perform the ascending operation and the stop operation by the detection signal of the vibration sensor. Also.

但是,即使設置振動感測器俾對Z軸方向的檢測靈敏度(detection sensitivity)成最大,由於如塗佈裝置般在XYZ方向具有驅動部的裝置也檢測出檢測靈敏度成最大的 方向以外的振動,故也有誤檢測出例如在塗佈動作的開始時或結束時伴隨開縫噴嘴部22的加速或減速產生的振動之虞。在該點中,在上述實施形態中因在碰撞部45碰撞異物P等的情形下,藉由高度檢測部33檢測該碰撞部45的高度的變化(Z軸方向的位移),故也幾乎不會在塗佈動作的開始結束時等產生誤檢測。However, even if the vibration sensitivity of the vibration sensor is set to the maximum in the Z-axis direction, since the device having the driving portion in the XYZ direction as in the coating device detects the detection sensitivity to the maximum. Since vibration other than the direction is erroneously detected, for example, vibration due to acceleration or deceleration of the slit nozzle portion 22 at the start or end of the coating operation. In this case, in the case where the collision portion 45 collides with the foreign matter P or the like, the height detecting unit 33 detects the change in the height of the collision portion 45 (displacement in the Z-axis direction), so that it is hardly False detection occurs at the end of the start of the coating operation.

而且,別的感測器也可以使用利用雷射光等的光學的感測器。Moreover, other sensors that use optical sensors such as laser light can also be used.

在上述實施形態中雖然是透過在滑軌17上使塗佈單元15移動,使開縫噴嘴部22對平台14行走於X軸方向,惟透過令塗佈單元15固定,使平台14移動於X軸方向,相對地使開縫噴嘴部22對平台14行走於X軸方向也可以。In the above embodiment, the coating unit 15 is moved on the slide rail 17, and the slit nozzle portion 22 is moved in the X-axis direction with respect to the stage 14, but the coating unit 15 is fixed and the stage 14 is moved to the X. In the axial direction, the slit nozzle portion 22 may be relatively moved in the X-axis direction with respect to the stage 14.

11‧‧‧塗佈裝置11‧‧‧ Coating device

12、112‧‧‧基板12, 112‧‧‧ substrate

13‧‧‧基台13‧‧‧Abutment

14‧‧‧平台(保持台)14‧‧‧ Platform (holding station)

15‧‧‧塗佈單元15‧‧‧ Coating unit

17‧‧‧滑軌17‧‧‧Slide rails

19‧‧‧導面19‧‧‧ Guide

20‧‧‧空氣軸承20‧‧‧Air bearing

22‧‧‧開縫噴嘴部(塗佈部)22‧‧‧Slot nozzle part (coating part)

23‧‧‧單元支撐部23‧‧‧Unit Support

24‧‧‧升降機構24‧‧‧ Lifting mechanism

25‧‧‧行走機構25‧‧‧Traveling agencies

26‧‧‧控制裝置26‧‧‧Control device

28‧‧‧導軌28‧‧‧rails

29‧‧‧滑件29‧‧‧Sliding parts

30‧‧‧伺服馬達30‧‧‧Servo motor

31‧‧‧滾珠螺桿機構31‧‧‧Rolling screw mechanism

32‧‧‧升降控制部(退避控制部)32‧‧‧ Lifting control unit (retraction control unit)

33‧‧‧高度檢測部(異物檢測部)33‧‧‧ Height detection unit (foreign object detection unit)

34‧‧‧第一刻度尺34‧‧‧ first scale

35‧‧‧第一讀取部35‧‧‧First Reading Department

36‧‧‧滑動支撐部36‧‧‧Sliding support

37‧‧‧線性馬達37‧‧‧Linear motor

39‧‧‧行走控制部(停止控制部)39‧‧‧Travel Control Department (Stop Control Department)

40‧‧‧行走位置檢測部40‧‧‧ Walking position detection department

41‧‧‧第二刻度尺41‧‧‧ second scale

42‧‧‧第二讀取部42‧‧‧Second reading department

44、144‧‧‧噴嘴44, 144‧‧‧ nozzle

45‧‧‧碰撞部(異物檢測部)45‧‧‧ Collision Department (foreign object detection department)

45a‧‧‧傾斜面45a‧‧‧ sloped surface

114‧‧‧基板保持盤114‧‧‧Substrate retention disk

122‧‧‧塗佈頭122‧‧‧Coating head

150‧‧‧板狀構件(碰撞部)150‧‧‧ Plate-shaped members (collision parts)

151‧‧‧振動感測器151‧‧‧Vibration sensor

L‧‧‧間隔L‧‧‧ interval

P‧‧‧異物P‧‧‧ Foreign objects

X1‧‧‧行走方向X1‧‧‧ walking direction

圖1是顯示與本發明的實施形態有關的塗佈裝置之斜視圖。Fig. 1 is a perspective view showing a coating apparatus according to an embodiment of the present invention.

圖2是擴大顯示該塗佈裝置中的塗佈單元的單元支撐部附近之前視圖。Fig. 2 is a front elevational view showing the vicinity of a unit supporting portion of the coating unit in the coating device.

圖3是該塗佈裝置中的升降機構之概略圖。Fig. 3 is a schematic view of a lifting mechanism in the coating device.

圖4是顯示該塗佈裝置中的控制裝置的構成之方塊圖。Fig. 4 is a block diagram showing the configuration of a control device in the coating device.

圖5是顯示與本發明的其他的實施形態有關的塗佈裝置的碰撞部之擴大概略圖。Fig. 5 is an enlarged schematic view showing a collision portion of a coating device according to another embodiment of the present invention.

圖6是顯示與習知技術有關的塗佈裝置的塗佈部之概 略圖。Figure 6 is a schematic view showing a coating portion of a coating device related to the prior art. Sketch map.

12‧‧‧基板12‧‧‧Substrate

14‧‧‧平台(保持台)14‧‧‧ Platform (holding station)

22‧‧‧開縫噴嘴部(塗佈部)22‧‧‧Slot nozzle part (coating part)

24‧‧‧升降機構24‧‧‧ Lifting mechanism

26‧‧‧控制裝置26‧‧‧Control device

29‧‧‧滑件29‧‧‧Sliding parts

30‧‧‧伺服馬達30‧‧‧Servo motor

31‧‧‧滾珠螺桿機構31‧‧‧Rolling screw mechanism

32‧‧‧升降控制部(退避控制部)32‧‧‧ Lifting control unit (retraction control unit)

33‧‧‧高度檢測部(異物檢測部)33‧‧‧ Height detection unit (foreign object detection unit)

34‧‧‧第一刻度尺34‧‧‧ first scale

35‧‧‧第一讀取部35‧‧‧First Reading Department

44‧‧‧噴嘴44‧‧‧Nozzles

45‧‧‧碰撞部(異物檢測部)45‧‧‧ Collision Department (foreign object detection department)

L‧‧‧間隔L‧‧‧ interval

P‧‧‧異物P‧‧‧ Foreign objects

X1‧‧‧行走方向X1‧‧‧ walking direction

Claims (1)

一種塗佈裝置,其特徵包含:水平地保持基板之保持台;具備流出塗佈液到該保持台上的該基板的噴嘴之塗佈部;使該塗佈部相對於該保持台行走於水平方向之行走機構;使該塗佈部升降於上下方向之升降機構;在為了塗佈塗佈液至該基板而藉由該行走機構使該塗佈部行走時,檢測存在於不在該噴嘴而在行走方向的那邊側的異物之異物檢測部;以及在藉由該異物檢測部檢測出異物的情形下,控制該升降機構,俾使該塗佈部退避到上方之退避控制部,該異物檢測部包含:配設於不在該塗佈部的噴嘴而在行走方向的那邊側,於可在該基板上或該保持台上有異物的情形下碰撞該基板的表面而被配設之碰撞部;以及檢測起因於與該異物或該基板表面的碰撞的該碰撞部的高度的變化之碰撞檢測部,該碰撞部能與該塗佈部一起升降而一體地配設於該塗佈部,更包含:檢測該塗佈部的高度之高度檢測部;根據該高度檢測部的檢測結果控制該塗佈部的高度於規定值之升降控制部, 該高度檢測部兼作該碰撞檢測部,在該碰撞部中的行走方向的那邊側的下部形成有越往同方向的那邊側位置越高而傾斜的傾斜面。 A coating apparatus comprising: a holding stage for holding a substrate horizontally; a coating portion of a nozzle that flows out of the coating liquid onto the holding table; and the coating portion is horizontally moved relative to the holding table a traveling mechanism for directional direction; an elevating mechanism for elevating and lowering the coating portion in the vertical direction; and when the coating portion is moved by the traveling mechanism for applying the coating liquid to the substrate, detecting that the coating portion is present in the nozzle a foreign matter detecting unit of the foreign object on the side in the traveling direction; and when the foreign object detecting unit detects the foreign matter, the lifting mechanism is controlled to retract the coating unit to the upper retreat control unit, and the foreign matter detecting unit The portion includes: a collision portion that is disposed on a side of the coating portion that is not in the traveling direction, and that is collided with the surface of the substrate when there is a foreign matter on the substrate or the holding table And a collision detecting unit that detects a change in height of the collision portion due to collision with the foreign matter or the surface of the substrate, wherein the collision portion can be lifted and lowered together with the coating portion to be integrally disposed in the coating portion, and Comprising: a detection unit detecting the height of the height of the coated portion; elevation control to a predetermined value based on the detection result of the detecting section controls the height of the height of the coated portion, The height detecting unit also serves as the collision detecting unit, and the lower portion on the side in the traveling direction of the collision portion is formed with an inclined surface that is inclined as the position on the side in the same direction is higher.
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