TWI507119B - Flexible printed circuit board and method for manufacturing the same - Google Patents
Flexible printed circuit board and method for manufacturing the same Download PDFInfo
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Description
本發明涉及電路板技術,特別涉及一種柔性電路板及其製作方法。 The present invention relates to circuit board technology, and in particular to a flexible circuit board and a method of fabricating the same.
隨著折疊手機與滑蓋手機等可折疊數位產品不斷發展,具有輕、薄、短、小以及可彎折特點之柔性印刷電路板(Flexible Printed Circuit Board,FPCB)被廣泛應用於數位產品,以實現不同電路間之電性連接。隨著消費性數位產品功能日益強大,提升柔性電路板之電磁遮罩性能成為目前電路板技術領域研究之重要課題之一。 With the development of foldable digital products such as folding mobile phones and slider phones, the Flexible Printed Circuit Board (FPCB), which is light, thin, short, small and bendable, is widely used in digital products. Realize the electrical connection between different circuits. With the increasingly powerful functions of consumer digital products, improving the electromagnetic shielding performance of flexible circuit boards has become one of the important research topics in the field of circuit board technology.
柔性電路板通常於導電圖形遠離絕緣層之一側形成用於保護導電圖形之覆蓋層。一種常用避免電磁干擾之方法為藉由印刷方式於所述覆蓋層上形成一層導電油墨(如,銀漿油墨)層,並使該導電油墨層填充覆蓋層中之開口,從而電連接於導電圖形之接地線。惟,藉由印刷方式形成之導電油墨層之厚度範圍通常為8-15μm,一方面,引發電磁干擾之高頻電流具有集膚效應,使得電流僅作用於導電油墨層表面極淺約零點幾微米之厚度,如此,大量導電油墨將被浪費;另一方面,該導電油墨層之厚度較大導致其耐折性不佳,於進行折疊組裝時,即,使柔性電路板之撓折部進 行彎折以將該柔性電路板安裝於數位裝置,會出現龜裂現象,致使該導電油墨層不能有效地遮罩電磁干擾。為解決上述問題,出現一種可藉由壓合結合於柔性電路板之電磁波防護膜,其包括依次堆疊之導電黏接層、金屬遮罩層與基底膜層。該電磁波防護膜之金屬遮罩層藉由導電黏接層與柔性電路板之導電圖形之接地線電連接。惟,貼附該電磁波防護膜對柔性電路板之製作工藝要求較高。不同型號之電磁波防護膜之壓合該防護膜之溫度、壓力等參數直接關係到導電黏接層之導電粒子之破裂狀況及其與接地線間之接觸面積,若壓合參數控制不當,該電磁波防護膜難以起到預期之電磁遮罩效果。 The flexible circuit board typically forms a cover layer for protecting the conductive pattern from one side of the conductive pattern away from the insulating layer. A common method for avoiding electromagnetic interference is to form a layer of conductive ink (eg, silver paste ink) on the cover layer by printing, and fill the opening in the cover layer with the conductive ink layer to electrically connect to the conductive pattern. Ground wire. However, the thickness of the conductive ink layer formed by printing is usually in the range of 8-15 μm. On the one hand, the high-frequency current that induces electromagnetic interference has a skin effect, so that the current acts only on the surface of the conductive ink layer to be extremely shallow at a few micrometers. The thickness, as such, a large amount of conductive ink will be wasted; on the other hand, the thickness of the conductive ink layer is large, resulting in poor folding resistance, when folding assembly, that is, the flexible portion of the flexible circuit board When the bending is performed to mount the flexible circuit board to the digital device, cracking may occur, so that the conductive ink layer cannot effectively shield electromagnetic interference. In order to solve the above problems, there is an electromagnetic wave shielding film which can be bonded to a flexible circuit board by press-bonding, which comprises a conductive adhesive layer, a metal mask layer and a base film layer which are sequentially stacked. The metal mask layer of the electromagnetic wave shielding film is electrically connected to the grounding line of the conductive pattern of the flexible circuit board by the conductive adhesive layer. However, attaching the electromagnetic wave shielding film has high requirements on the manufacturing process of the flexible circuit board. The parameters such as the temperature and pressure of the electromagnetic wave protective film of different types of the protective film are directly related to the rupture condition of the conductive particles of the conductive adhesive layer and the contact area with the grounding wire. If the pressing parameter is improperly controlled, the electromagnetic wave The protective film is difficult to achieve the desired electromagnetic shielding effect.
有鑑於此,提供一種柔性電路板及其製作方法,以於不影響柔性電路板之撓折性之情況下提高柔性電路板之電磁遮罩性能實屬必要。 In view of the above, it is necessary to provide a flexible circuit board and a manufacturing method thereof for improving the electromagnetic shielding performance of the flexible circuit board without affecting the flexibility of the flexible circuit board.
一種柔性電路板,包括絕緣層、形成於絕緣層之導電圖形、覆蓋導電圖形之覆蓋層與連續之金屬濺鍍層。所述導電圖形包括接地線與訊號傳輸線。所述覆蓋層具有通孔,用於暴露至少部分接地線。所述金屬濺鍍層藉由濺鍍形成於覆蓋層遠離導電圖形之表面、通孔之孔壁以及從通孔露出之接地線之表面,從而與所述接地線電性連接。 A flexible circuit board comprising an insulating layer, a conductive pattern formed on the insulating layer, a cover layer covering the conductive pattern, and a continuous metal sputter layer. The conductive pattern includes a ground line and a signal transmission line. The cover layer has a through hole for exposing at least a portion of the ground line. The metal sputter layer is formed by sputtering on a surface of the cover layer away from the conductive pattern, a hole wall of the through hole, and a surface of the ground line exposed from the through hole, thereby being electrically connected to the ground line.
一種柔性電路板之製作方法,包括步驟:提供柔性覆銅板,其包括絕緣層與貼合於所述絕緣層之導電層;將所述導電層製成導電圖形,所述導電圖形包括接地線與訊號傳輸線;形成覆蓋所述導電圖形之覆蓋層,所述覆蓋層具有通孔,所述接地線至少部分暴 露於所述通孔;以及藉由濺鍍於所述覆蓋層遠離導電圖形之表面、通孔之孔壁以及從通孔露出之接地線之表面形成連續之金屬濺鍍層,所述金屬濺鍍層與所述接地線電性連接。 A method for fabricating a flexible circuit board, comprising the steps of: providing a flexible copper clad plate comprising an insulating layer and a conductive layer attached to the insulating layer; forming the conductive layer into a conductive pattern, the conductive pattern comprising a ground line and a signal transmission line; forming a cover layer covering the conductive pattern, the cover layer having a through hole, the ground line being at least partially violent Exposing the via hole; and forming a continuous metal sputter layer by sputtering a surface of the cap layer away from the conductive pattern, a hole wall of the via hole, and a surface of the ground line exposed from the via hole, the metal sputter layer Electrically connected to the ground line.
本技術方案提供之柔性電路板之製作方法於柔性覆銅板上製作導電圖案並形成覆蓋膜以保護所述導電圖案,再藉由低溫真空濺鍍於所述覆蓋膜上形成電性連接於導電圖案之接地線之金屬濺鍍層。所述金屬濺鍍層厚度小、節省原材料,而且與柔性電路板之間附著力強,不易發生龜裂,有利於提高柔性電路板之電磁遮罩性能。 The manufacturing method of the flexible circuit board provided by the technical solution forms a conductive pattern on the flexible copper clad plate and forms a cover film to protect the conductive pattern, and then is electrically connected to the conductive pattern by low temperature vacuum sputtering on the cover film. The metal sputter of the ground wire. The metal sputtering layer has small thickness, saves raw materials, and has strong adhesion with the flexible circuit board, is less prone to cracking, and is beneficial to improving electromagnetic shielding performance of the flexible circuit board.
10‧‧‧柔性覆銅板 10‧‧‧Flexible CCL
11‧‧‧絕緣層 11‧‧‧Insulation
12‧‧‧導電層 12‧‧‧ Conductive layer
120‧‧‧導電圖形 120‧‧‧Electrical graphics
121‧‧‧接地線 121‧‧‧ Grounding wire
122‧‧‧訊號傳輸線 122‧‧‧Signal transmission line
123‧‧‧連接部 123‧‧‧Connecting Department
13‧‧‧覆蓋膜 13‧‧‧ Cover film
130‧‧‧覆蓋層 130‧‧‧ Coverage
131‧‧‧第一表面 131‧‧‧ first surface
132‧‧‧第二表面 132‧‧‧ second surface
133‧‧‧側面 133‧‧‧ side
134‧‧‧第三表面 134‧‧‧ third surface
135‧‧‧通孔 135‧‧‧through hole
136‧‧‧孔壁 136‧‧‧ hole wall
140‧‧‧金屬濺鍍層 140‧‧‧Metal Sputter
15‧‧‧柔性電路板單元 15‧‧‧Flexible circuit board unit
100‧‧‧柔性電路板 100‧‧‧Flexible circuit board
101‧‧‧產品區 101‧‧‧Product Area
200‧‧‧真空濺鍍裝置 200‧‧‧vacuum sputtering device
201‧‧‧陰極 201‧‧‧ cathode
202‧‧‧陽極 202‧‧‧Anode
203‧‧‧鍍膜腔體 203‧‧‧coating cavity
204‧‧‧溫度控制器 204‧‧‧temperature controller
205‧‧‧抽真空裝置 205‧‧‧ Vacuuming device
206‧‧‧供氣裝置 206‧‧‧ gas supply device
圖1為本技術方案第一實施例提供之柔性電路板之部分剖面示意圖。 1 is a partial cross-sectional view of a flexible circuit board according to a first embodiment of the present technical solution.
圖2為本技術方案第二實施例提供之柔性覆銅板之部分結構示意圖。 2 is a partial structural schematic view of a flexible copper clad laminate provided by a second embodiment of the present technical solution.
圖3為於上述柔性覆銅板上形成導電圖案後之部分結構示意圖。 FIG. 3 is a partial structural schematic view showing a conductive pattern formed on the flexible copper clad laminate.
圖4為圖3沿IV-IV線之剖面示意圖。 Figure 4 is a cross-sectional view of Figure 3 taken along line IV-IV.
圖5為將覆蓋膜貼附於所述柔性覆銅板之結構示意圖。 FIG. 5 is a schematic view showing the structure of attaching a cover film to the flexible copper clad laminate.
圖6為形成有覆蓋層之柔性覆銅板之部分剖面示意圖。 Figure 6 is a partial cross-sectional view showing a flexible copper clad laminate formed with a cover layer.
圖7為本技術方案第二提供之真空濺鍍裝置之結構示意圖。 FIG. 7 is a schematic structural view of a vacuum sputtering apparatus according to a second aspect of the present technical solution.
圖8為裁切圖1所示之柔性電路板後所得一柔性電路板單元之剖面示意圖。 FIG. 8 is a cross-sectional view showing a flexible circuit board unit obtained by cutting the flexible circuit board shown in FIG. 1.
下面將結合附圖及複數實施例對本技術方案提供之柔性電路板及其製作方法作進一步詳細說明。 The flexible circuit board provided by the technical solution and the manufacturing method thereof will be further described in detail below with reference to the accompanying drawings and the embodiments.
請參閱圖1,本技術方案第一實施例提供一種柔性電路板100,其包括絕緣層11、導電圖形120、覆蓋層130與金屬濺鍍層140。所述柔性電路板100可包括複數依次排列之柔性電路板單元15。 Referring to FIG. 1 , a first embodiment of the present technology provides a flexible circuit board 100 including an insulating layer 11 , a conductive pattern 120 , a cover layer 130 , and a metal sputter layer 140 . The flexible circuit board 100 may include a plurality of flexible circuit board units 15 arranged in sequence.
所述絕緣層11可為聚酯(PET)薄膜或聚醯亞胺(PI)薄膜。 The insulating layer 11 may be a polyester (PET) film or a polyimide film (PI) film.
所述導電圖形120形成於所述絕緣層11。所述導電圖形120之材質可為銅,其包括接地線121與訊號傳輸線122。本實施例中,所述接地線121與訊號傳輸線122均為長條形,且並排設置。每一接地線121均具有位於其中心處之連接部123。 The conductive pattern 120 is formed on the insulating layer 11. The conductive pattern 120 may be made of copper, and includes a ground line 121 and a signal transmission line 122. In this embodiment, the grounding wire 121 and the signal transmission line 122 are both elongated and arranged side by side. Each of the grounding wires 121 has a connecting portion 123 at its center.
所述覆蓋層130覆蓋所述導電圖形120。所述覆蓋層130具有第一表面131、第二表面132、側面133與第三表面134。所述第一表面131遠離所述絕緣層11。所述第三表面134與所述絕緣層11相接觸。所述第二表面132與側面133均與所述導電圖形120相接觸。所述第二表面132位於所述第一表面131與第三表面134之間,且平行於所述第一表面131。所述側面133連接於所述第二表面132與第三表面134之間。所述覆蓋層130還具有貫穿所述第一表面131與第二表面132之通孔135。所述通孔135具有連接於所述第一表面131與第二表面132之間之孔壁136。所述接地線121部分暴露於所述通孔135。具體地,所述接地線121之連接部123暴露於所述通孔135。 The cover layer 130 covers the conductive pattern 120. The cover layer 130 has a first surface 131, a second surface 132, a side surface 133 and a third surface 134. The first surface 131 is away from the insulating layer 11. The third surface 134 is in contact with the insulating layer 11. The second surface 132 and the side surface 133 are both in contact with the conductive pattern 120. The second surface 132 is located between the first surface 131 and the third surface 134 and is parallel to the first surface 131. The side surface 133 is coupled between the second surface 132 and the third surface 134. The cover layer 130 further has a through hole 135 penetrating the first surface 131 and the second surface 132. The through hole 135 has a hole wall 136 connected between the first surface 131 and the second surface 132. The ground line 121 is partially exposed to the through hole 135. Specifically, the connection portion 123 of the grounding wire 121 is exposed to the through hole 135.
當然,所述通孔135亦可更大,使得所述接地線121全部暴露於所述通孔135,如此,所述覆蓋層130不具有平行於所述第一表面 131且與所述導電圖形120相接觸之第二表面132,所述側面133亦與孔壁136於同一平面上。 Of course, the through hole 135 may also be larger, so that the grounding wire 121 is entirely exposed to the through hole 135, such that the cover layer 130 does not have parallel to the first surface. And a second surface 132 that is in contact with the conductive pattern 120. The side surface 133 is also in the same plane as the hole wall 136.
所述金屬濺鍍層140藉由濺鍍形成於覆蓋層130遠離導電圖形120之表面、通孔135之孔壁136以及從通孔135露出之接地線121之表面,從而與所述接地線121電性連接。所述金屬濺鍍層可為銅、銀、鉻或鋁等導電金屬材質,其厚度範圍為0.3-0.5μm。本實施例中,由於所述金屬濺鍍層之厚度小於所述覆蓋層130之厚度,所述金屬濺鍍層140依次覆蓋所述覆蓋層130之第一表面131、所述孔壁136、所述接地線121之連接部123。 The metal sputter layer 140 is formed on the surface of the cap layer 130 away from the conductive pattern 120, the hole wall 136 of the through hole 135, and the surface of the ground line 121 exposed from the through hole 135 by sputtering, thereby electrically connecting with the ground line 121. Sexual connection. The metal sputter layer may be a conductive metal material such as copper, silver, chromium or aluminum, and has a thickness ranging from 0.3 to 0.5 μm. In this embodiment, since the thickness of the metal sputter layer is less than the thickness of the cover layer 130, the metal sputter layer 140 sequentially covers the first surface 131 of the cover layer 130, the hole wall 136, and the ground. The connection portion 123 of the line 121.
本技術方案第一實施例提供之柔性電路板之金屬濺鍍層厚度小,可節省大量原材料。 The thickness of the metal sputter layer of the flexible circuit board provided by the first embodiment of the present technical solution is small, and a large amount of raw materials can be saved.
本技術方案第二實施例提供一種柔性電路板之製作方法,其包括以下步驟: The second embodiment of the present technical solution provides a method for manufacturing a flexible circuit board, which includes the following steps:
第一步,請參閱圖2,提供柔性覆銅板10,其包括絕緣層11與貼合於所述絕緣層11之導電層12。所述絕緣層11可為聚酯(PET)薄膜或聚醯亞胺(PI)薄膜。所述柔性覆銅板10包括複數依次排列之產品區101。 In a first step, referring to FIG. 2, a flexible copper clad laminate 10 is provided, which includes an insulating layer 11 and a conductive layer 12 attached to the insulating layer 11. The insulating layer 11 may be a polyester (PET) film or a polyimide film (PI) film. The flexible copper clad laminate 10 includes a plurality of product regions 101 arranged in sequence.
第二步,請一併參閱圖3與圖4,將所述導電層12製成導電圖形120,所述導電圖形120包括接地線121與訊號傳輸線122。本實施例中,所述導電圖形120於每一產品區101中均包括一根接地線121與兩根訊號傳輸線122,每一接地線121均具有位於其中心處之連接部123。具體地,可先於所述導電層12上形成光致抗蝕劑層,再經曝光、顯影、蝕刻等工藝去除所述導電層12之部分導電 材料,剩餘部分導電材料即形成導電圖形120。 In the second step, referring to FIG. 3 and FIG. 4 , the conductive layer 12 is formed into a conductive pattern 120 , and the conductive pattern 120 includes a ground line 121 and a signal transmission line 122 . In this embodiment, the conductive pattern 120 includes a grounding wire 121 and two signal transmission lines 122 in each product area 101. Each of the grounding lines 121 has a connecting portion 123 at a center thereof. Specifically, a photoresist layer may be formed on the conductive layer 12, and a portion of the conductive layer 12 may be removed by exposure, development, etching, or the like. The material, the remaining portion of the conductive material, forms the conductive pattern 120.
第三步,請一併參閱圖5與圖6,形成覆蓋所述導電圖形120之覆蓋層130,所述覆蓋層130具有通孔135,所述接地線121至少部分暴露於所述通孔135。具體地,可採取以下步驟: In the third step, referring to FIG. 5 and FIG. 6 , a cover layer 130 covering the conductive pattern 120 is formed. The cover layer 130 has a through hole 135 , and the ground line 121 is at least partially exposed to the through hole 135 . . Specifically, the following steps can be taken:
首先,提供覆蓋膜13,所述覆蓋膜13可包括膠黏層與絕緣膜層,其具有相對之第一表面131與第二表面132。 First, a cover film 13 is provided, which may include an adhesive layer and an insulating film layer having opposite first and second surfaces 131 and 132.
其次,藉由鑽孔或沖孔方式於覆蓋膜13中形成貫穿所述第一表面131與第二表面132之通孔135。所述通孔135之數量及位置均與所述接地線121之連接部123相對應,大小與所述接地線121之連接部123相對應。每一通孔135均具有連接於所述第一表面131與第二表面132之間之孔壁136。 Next, a through hole 135 penetrating the first surface 131 and the second surface 132 is formed in the cover film 13 by drilling or punching. The number and position of the through holes 135 correspond to the connecting portion 123 of the grounding wire 121, and the size corresponds to the connecting portion 123 of the grounding wire 121. Each of the through holes 135 has a hole wall 136 connected between the first surface 131 and the second surface 132.
最後,使所述第二表面132靠近所述導電圖形120,將通孔135對準所述接地線121之連接部123,將所述覆蓋膜13壓合於所述柔性覆銅板10之導電圖形120之一側,即於所述柔性覆銅板10上形成一覆蓋層130。先使覆蓋膜13之膠黏層之一側靠近所述柔性覆銅板10,並使所述複數通孔135與所述多根接地線121之連接部123相對,將所述覆蓋膜13貼附於所述柔性覆銅板10得到堆疊板,再將上述堆疊板放至壓合機內進行壓合。壓合時,覆蓋膜13受熱發生流動,填充導電圖形120中之空隙,形成與所述絕緣層11相接觸之第三表面134,以及連接於所述第二表面132與第三表面134之間之側面133。 Finally, the second surface 132 is brought close to the conductive pattern 120, the through hole 135 is aligned with the connecting portion 123 of the grounding line 121, and the cover film 13 is pressed against the conductive pattern of the flexible copper clad laminate 10. On one side of the 120, a cover layer 130 is formed on the flexible copper clad laminate 10. First, one side of the adhesive layer of the cover film 13 is brought close to the flexible copper clad laminate 10, and the plurality of through holes 135 are opposed to the connecting portion 123 of the plurality of grounding wires 121, and the cover film 13 is attached. A stacked plate is obtained on the flexible copper clad laminate 10, and the stacked plate is placed in a press machine for pressing. When pressed, the cover film 13 is heated to flow, filling the gaps in the conductive pattern 120, forming a third surface 134 in contact with the insulating layer 11, and being connected between the second surface 132 and the third surface 134. Side 133.
第四步,請一併參閱圖1與圖7,藉由濺鍍於所述覆蓋層130遠離導電圖形120之表面、通孔135之孔壁136以及從通孔135露出之接 地線121之表面形成金屬濺鍍層140,所述金屬濺鍍層140與所述接地線121電性連接。 The fourth step, please refer to FIG. 1 and FIG. 7 together, by sputtering the surface of the cover layer 130 away from the conductive pattern 120, the hole wall 136 of the through hole 135, and the connection from the through hole 135. A metal sputter layer 140 is formed on the surface of the ground line 121, and the metal sputter layer 140 is electrically connected to the ground line 121.
具體地,可包括以下步驟: Specifically, the following steps may be included:
首先,提供真空濺鍍裝置200與金屬靶材。所述真空濺鍍裝置200包括相對設置之陰極201與陽極202。所述真空濺鍍裝置200還包括鍍膜腔體203、溫度控制器204、抽真空裝置205與供氣裝置206。所述金屬靶材可為高熔點之金屬、合金或金屬氧化物。本實施例中,所述金屬靶材之材質為銀。 First, a vacuum sputtering apparatus 200 and a metal target are provided. The vacuum sputtering apparatus 200 includes a cathode 201 and an anode 202 disposed opposite each other. The vacuum sputtering apparatus 200 further includes a coating chamber 203, a temperature controller 204, a vacuuming device 205, and a gas supply device 206. The metal target may be a high melting point metal, alloy or metal oxide. In this embodiment, the material of the metal target is silver.
其次,將所述金屬靶材設置於所述真空濺鍍裝置200之陰極201。使所述柔性覆銅板10之覆蓋層130與陰極201相對,將所述柔性覆銅板10設置於所述真空濺鍍裝置200之陽極202。 Next, the metal target is placed on the cathode 201 of the vacuum sputtering apparatus 200. The cover layer 130 of the flexible copper clad laminate 10 is opposed to the cathode 201, and the flexible copper clad laminate 10 is disposed on the anode 202 of the vacuum sputtering apparatus 200.
再次,對所述真空濺鍍裝置200抽真空並預熱,充入惰性氣體後,於所述陰極201與陽極202之間施加高壓直流電,以於所述柔性覆銅板10靠近覆蓋層130之一側形成與所述接地線121電性連接之金屬濺鍍層140。本實施例中,藉由抽真空裝置205對鍍膜腔體203抽真空至壓強約為1.3×10-3Pa,藉由溫度控制器204預熱至溫度約為60℃。藉由供氣裝置206往鍍膜腔體203內充入氬氣後,由於輝光放電(glow discharge)產生之數位激發氬氣,產生等離子體,等離子體將金屬靶材之原子轟出,沈積於所述柔性覆銅板10靠近覆蓋層130之一側,直至沈積於所述柔性覆銅板10之原子之厚度達到0.3-0.5μm時,停止施加電壓,得到如圖1所示之柔性電路板100。金屬靶材之原子於等離子體之轟擊下,自金屬靶材之表面向各個方向濺射出來,從而所得之柔性覆銅板10上,即使覆蓋膜13之通孔135之孔壁136及其與所述接地線121之連接處均 可均勻之沈積上一層銀原子。由於引起電磁干擾之高頻電流具有集膚效應,厚度為0.3-0.5μm之金屬濺鍍層140即可實現遮罩電磁干擾。藉由低溫真空濺鍍形成之所述金屬濺鍍層140不僅厚度小、節省原材料,而且與柔性電路板100間附著力強,不易發生龜裂,有利於提高柔性電路板100之電磁遮罩性能。 Again, the vacuum sputtering apparatus 200 is evacuated and preheated, and after being filled with an inert gas, a high voltage direct current is applied between the cathode 201 and the anode 202 to bring the flexible copper clad laminate 10 close to one of the cover layers 130. A metal sputter layer 140 electrically connected to the ground line 121 is formed on the side. In this embodiment, the coating chamber 203 is evacuated by a vacuuming device 205 to a pressure of about 1.3×10 −3 Pa, and preheated by the temperature controller 204 to a temperature of about 60° C. After the argon gas is filled into the coating chamber 203 by the gas supply device 206, the argon gas is excited by the digital discharge generated by the glow discharge, and the plasma is generated, and the plasma blasts the atoms of the metal target and deposits them in the chamber. The flexible copper clad laminate 10 is adjacent to one side of the cover layer 130 until the thickness of the atoms deposited on the flexible copper clad laminate 10 reaches 0.3-0.5 μm, and the application of voltage is stopped to obtain the flexible circuit board 100 as shown in FIG. The atoms of the metal target are sputtered from the surface of the metal target in various directions under the bombardment of the plasma, so that the obtained flexible copper clad plate 10, even the hole wall 136 of the through hole 135 of the cover film 13 and the same A layer of silver atoms can be uniformly deposited at the junction of the ground line 121. Since the high-frequency current causing electromagnetic interference has a skin effect, the metal sputter layer 140 having a thickness of 0.3-0.5 μm can achieve electromagnetic interference of the mask. The metal sputter layer 140 formed by low-temperature vacuum sputtering not only has a small thickness, saves raw materials, but also has strong adhesion to the flexible circuit board 100 and is less prone to cracking, which is advantageous for improving the electromagnetic shielding performance of the flexible circuit board 100.
第五步,裁切所述柔性電路板100,得到複數如圖8所示之柔性電路板單元15。如此,即可使用柔性電路板單元15組裝於數位產品中,以實現數位訊號之傳輸與處理。 In the fifth step, the flexible circuit board 100 is cut to obtain a plurality of flexible circuit board units 15 as shown in FIG. In this way, the flexible circuit board unit 15 can be assembled into the digital product to realize the transmission and processing of the digital signal.
當然,上述第五步亦可於第三步與第四步之間進行,即,於形成覆蓋所述導電圖形120之覆蓋層130之後,先裁切所述柔性覆銅板10得到複數柔性電路板單元15,再將柔性電路板單元15移至真空濺鍍裝置200內進行鍍膜以形成金屬濺鍍層140。 Of course, the fifth step may also be performed between the third step and the fourth step, that is, after forming the cover layer 130 covering the conductive pattern 120, the flexible copper clad laminate 10 is first cut to obtain a plurality of flexible circuit boards. The unit 15 then moves the flexible circuit board unit 15 into the vacuum sputtering apparatus 200 for coating to form a metal sputter layer 140.
本技術方案提供之柔性電路板之製作方法於柔性覆銅板上製作導電圖案並形成覆蓋膜以保護所述導電圖案,再藉由低溫真空濺鍍於所述覆蓋膜上形成金屬濺鍍層。所述金屬濺鍍層厚度小、節省原材料,而且與柔性電路板之間附著力強,不易發生龜裂,有利於提高柔性電路板之電磁遮罩性能。 The manufacturing method of the flexible circuit board provided by the technical solution forms a conductive pattern on the flexible copper clad plate and forms a cover film to protect the conductive pattern, and then forms a metal sputter layer on the cover film by low temperature vacuum sputtering. The metal sputtering layer has small thickness, saves raw materials, and has strong adhesion with the flexible circuit board, is less prone to cracking, and is beneficial to improving electromagnetic shielding performance of the flexible circuit board.
綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。惟,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士爰依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.
11‧‧‧絕緣層 11‧‧‧Insulation
120‧‧‧導電圖形 120‧‧‧Electrical graphics
121‧‧‧接地線 121‧‧‧ Grounding wire
122‧‧‧訊號傳輸線 122‧‧‧Signal transmission line
123‧‧‧連接部 123‧‧‧Connecting Department
130‧‧‧覆蓋層 130‧‧‧ Coverage
131‧‧‧第一表面 131‧‧‧ first surface
132‧‧‧第二表面 132‧‧‧ second surface
133‧‧‧側面 133‧‧‧ side
134‧‧‧第三表面 134‧‧‧ third surface
135‧‧‧通孔 135‧‧‧through hole
136‧‧‧孔壁 136‧‧‧ hole wall
140‧‧‧金屬濺鍍層 140‧‧‧Metal Sputter
15‧‧‧柔性電路板單元 15‧‧‧Flexible circuit board unit
100‧‧‧柔性電路板 100‧‧‧Flexible circuit board
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CN105592620B (en) * | 2014-10-21 | 2018-10-30 | 鹏鼎控股(深圳)股份有限公司 | Circuit board and its preparation method |
CN106376169A (en) * | 2015-07-24 | 2017-02-01 | 宏启胜精密电子(秦皇岛)有限公司 | Circuit board and manufacturing method thereof |
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