TWI506304B - 用於極紫外光微影之投影曝光裝置之照明光學件的場組合反射鏡 - Google Patents

用於極紫外光微影之投影曝光裝置之照明光學件的場組合反射鏡 Download PDF

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Publication number
TWI506304B
TWI506304B TW098130332A TW98130332A TWI506304B TW I506304 B TWI506304 B TW I506304B TW 098130332 A TW098130332 A TW 098130332A TW 98130332 A TW98130332 A TW 98130332A TW I506304 B TWI506304 B TW I506304B
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Taiwan
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field
scene
scenes
mirror
combination mirror
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TW098130332A
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English (en)
Chinese (zh)
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TW201017231A (en
Inventor
艾得萊恩 史戴庫
馬丁 安德烈斯
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卡爾蔡司Ｓｍｔ有限公司
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70083—Non-homogeneous intensity distribution in the mask plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • H10P76/00—
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
    • G02B5/0875—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising two or more metallic layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49826—Assembling or joining

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lenses (AREA)
TW098130332A 2008-09-30 2009-09-09 用於極紫外光微影之投影曝光裝置之照明光學件的場組合反射鏡 TWI506304B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10144508P 2008-09-30 2008-09-30
DE102008049586A DE102008049586A1 (de) 2008-09-30 2008-09-30 Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie

Publications (2)

Publication Number Publication Date
TW201017231A TW201017231A (en) 2010-05-01
TWI506304B true TWI506304B (zh) 2015-11-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW098130332A TWI506304B (zh) 2008-09-30 2009-09-09 用於極紫外光微影之投影曝光裝置之照明光學件的場組合反射鏡

Country Status (7)

Country Link
US (2) US8717541B2 (enExample)
JP (2) JP5603868B2 (enExample)
KR (1) KR101645049B1 (enExample)
CN (1) CN102171616B (enExample)
DE (1) DE102008049586A1 (enExample)
TW (1) TWI506304B (enExample)
WO (1) WO2010037453A1 (enExample)

Families Citing this family (29)

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DE102008049586A1 (de) 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Mikrolithographie
CN102203675B (zh) * 2008-10-31 2014-02-26 卡尔蔡司Smt有限责任公司 用于euv微光刻的照明光学部件
DE102010003169A1 (de) 2010-03-23 2011-02-10 Carl Zeiss Smt Ag Feldfacettenspiegel zum Einsetzen einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Projektions-Lithografie
DE102010062779A1 (de) 2010-12-10 2012-06-14 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102011076145B4 (de) 2011-05-19 2013-04-11 Carl Zeiss Smt Gmbh Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik
DE102012204273B4 (de) 2012-03-19 2015-08-13 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102012208064A1 (de) 2012-05-15 2013-11-21 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithographie
WO2014000763A1 (en) 2012-06-25 2014-01-03 Carl Zeiss Smt Gmbh Method for designing an illumination optics and illumination optics
DE102012220596A1 (de) 2012-11-13 2014-05-15 Carl Zeiss Smt Gmbh Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik
DE102013206981A1 (de) 2013-04-18 2013-12-24 Carl Zeiss Smt Gmbh Facettenspiegel mit im Krümmungsradius einstellbaren Spiegel-Facetten und Verfahren hierzu
DE102014208770A1 (de) * 2013-07-29 2015-01-29 Carl Zeiss Smt Gmbh Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik
DE102013218131A1 (de) * 2013-09-11 2015-03-12 Carl Zeiss Smt Gmbh Beleuchtungsoptik sowie Beleuchtungssystem für die EUV-Projektionslithographie
DE102013218749A1 (de) 2013-09-18 2015-03-19 Carl Zeiss Smt Gmbh Beleuchtungssystem sowie Beleuchtungsoptik für die EUV-Projektionslithografie
CN103869633B (zh) * 2014-04-11 2015-08-05 哈尔滨工业大学 极紫外光刻光源收集及照明系统
DE102014215452A1 (de) * 2014-08-05 2016-04-07 Carl Zeiss Smt Gmbh Verkippen eines optischen Elements
DE102014216801A1 (de) * 2014-08-25 2016-02-25 Carl Zeiss Smt Gmbh Facettenspiegel für eine Beleuchtungsoptik für die Projektionslithographie
DE102014217612A1 (de) * 2014-09-03 2016-03-03 Carl Zeiss Smt Gmbh Beleuchtungoptik für die Projektonslithograpfie
DE102014217608A1 (de) 2014-09-03 2014-11-20 Carl Zeiss Smt Gmbh Verfahren zum Zuordnen einer zweiten Facette eines im Strahlengang zweiten facettierten Elements einer Beleuchtungsoptik
KR20170086559A (ko) * 2014-11-18 2017-07-26 칼 짜이스 에스엠티 게엠베하 투영 리소그라피를 위한 광학 서브시스템 및 투영 리소그라피를 위한 조명 광학 유닛
US9541840B2 (en) * 2014-12-18 2017-01-10 Asml Netherlands B.V. Faceted EUV optical element
DE102015208514A1 (de) * 2015-05-07 2016-11-10 Carl Zeiss Smt Gmbh Facettenspiegel für die EUV-Projektionslithografie sowie Beleuchtungsoptik mit einem derartigen Facettenspiegel
DE102016205624B4 (de) 2016-04-05 2017-12-28 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie, Beleuchtungssystem, Projektionsbelichtungsanlage und Verfahren zur Projektionsbelichtung
DE102018217707A1 (de) 2018-10-16 2018-12-27 Carl Zeiss Smt Gmbh Feldfacettenspiegel zum Einsatz in einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die EUV-Projektonslithographie
DE102020116091A1 (de) * 2019-10-30 2021-05-06 Taiwan Semiconductor Manufacturing Co., Ltd. Abstimmbare beleuchtungsvorrichtung fürlithographiesysteme
US11543753B2 (en) * 2019-10-30 2023-01-03 Taiwan Semiconductor Manufacturing Co., Ltd. Tunable illuminator for lithography systems
DE102020200158A1 (de) * 2020-01-09 2021-07-15 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102020205123A1 (de) 2020-04-23 2021-10-28 Carl Zeiss Smt Gmbh Facetten-Baugruppe für einen Facettenspiegel
DE102020210771A1 (de) 2020-08-26 2021-08-19 Carl Zeiss Smt Gmbh Facettenspiegel für eine projektionsbelichtungsanlage und projektionsbelichtungsanlage mit entsprechendem facettenspiegel sowie verfahren zum betrieb derselben
US11796917B2 (en) 2021-05-07 2023-10-24 Taiwan Semiconductor Manufacturing Company, Ltd. Width adjustment of EUV radiation beam

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US20080123807A1 (en) * 2006-11-28 2008-05-29 Carl Zeiss Smt Ag Illumination optics for projection microlithography

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DE102006031654A1 (de) * 2006-04-24 2007-10-25 Carl Zeiss Smt Ag Facettenspiegel mit einer Vielzahl von Spiegelsegmenten
US20080123807A1 (en) * 2006-11-28 2008-05-29 Carl Zeiss Smt Ag Illumination optics for projection microlithography

Also Published As

Publication number Publication date
US20110164233A1 (en) 2011-07-07
CN102171616A (zh) 2011-08-31
KR101645049B1 (ko) 2016-08-12
DE102008049586A1 (de) 2010-04-08
JP5603868B2 (ja) 2014-10-08
KR20110059745A (ko) 2011-06-03
US9304406B2 (en) 2016-04-05
WO2010037453A1 (en) 2010-04-08
JP2014197706A (ja) 2014-10-16
US8717541B2 (en) 2014-05-06
JP6280827B2 (ja) 2018-02-14
US20140218709A1 (en) 2014-08-07
TW201017231A (en) 2010-05-01
WO2010037453A8 (en) 2010-09-16
JP2012504321A (ja) 2012-02-16
WO2010037453A9 (en) 2010-07-01
CN102171616B (zh) 2013-08-28

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