TWI503899B - 結合金屬鍺矽材料之基板 - Google Patents
結合金屬鍺矽材料之基板 Download PDFInfo
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- TWI503899B TWI503899B TW098145607A TW98145607A TWI503899B TW I503899 B TWI503899 B TW I503899B TW 098145607 A TW098145607 A TW 098145607A TW 98145607 A TW98145607 A TW 98145607A TW I503899 B TWI503899 B TW I503899B
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- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
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- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8338—Bonding interfaces outside the semiconductor or solid-state body
- H01L2224/83399—Material
- H01L2224/834—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/83463—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/83484—Tungsten [W] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/83801—Soldering or alloying
- H01L2224/83805—Soldering or alloying involving forming a eutectic alloy at the bonding interface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/03—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10157—Shape being other than a cuboid at the active surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15158—Shape the die mounting substrate being other than a cuboid
- H01L2924/15159—Side view
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/163—Connection portion, e.g. seal
- H01L2924/164—Material
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Micromachines (AREA)
- Pressure Sensors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/356,939 US8058143B2 (en) | 2009-01-21 | 2009-01-21 | Substrate bonding with metal germanium silicon material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201034091A TW201034091A (en) | 2010-09-16 |
| TWI503899B true TWI503899B (zh) | 2015-10-11 |
Family
ID=42336272
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098145607A TWI503899B (zh) | 2009-01-21 | 2009-12-29 | 結合金屬鍺矽材料之基板 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US8058143B2 (enExample) |
| EP (1) | EP2389337A4 (enExample) |
| JP (1) | JP5679996B2 (enExample) |
| CN (1) | CN102292280B (enExample) |
| TW (1) | TWI503899B (enExample) |
| WO (1) | WO2010090798A2 (enExample) |
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| SE537499C2 (sv) * | 2009-04-30 | 2015-05-26 | Silex Microsystems Ab | Bondningsmaterialstruktur och process med bondningsmaterialstruktur |
| DE102009026628A1 (de) * | 2009-06-02 | 2010-12-09 | Robert Bosch Gmbh | Mikromechanisches Bauelement und Verfahren zum Herstellen eines mikromechanischen Bauelements |
| US8378490B2 (en) * | 2011-03-15 | 2013-02-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor apparatus including a metal alloy between a first contact and a second contact |
| US8652865B2 (en) * | 2011-08-16 | 2014-02-18 | Freescale Semiconductor, Inc. | Attaching a MEMS to a bonding wafer |
| ITTO20110995A1 (it) * | 2011-10-31 | 2013-05-01 | St Microelectronics Srl | Dispositivo micro-elettro-meccanico dotato di regioni conduttive sepolte e relativo procedimento di fabbricazione |
| US8633088B2 (en) | 2012-04-30 | 2014-01-21 | Freescale Semiconductor, Inc. | Glass frit wafer bond protective structure |
| US8749036B2 (en) | 2012-11-09 | 2014-06-10 | Analog Devices, Inc. | Microchip with blocking apparatus and method of fabricating microchip |
| US10160638B2 (en) | 2013-01-04 | 2018-12-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for a semiconductor structure |
| DE102014210852B4 (de) * | 2014-06-06 | 2022-10-06 | Robert Bosch Gmbh | Bauteil mit zwei Halbleiter-Bauelementen, die über eine strukturierte Bond-Verbindungsschicht miteinander verbunden sind, und Verfahren zum Herstellen eines solchen Bauteils |
| US9418830B2 (en) | 2014-06-27 | 2016-08-16 | Freescale Semiconductor, Inc. | Methods for bonding semiconductor wafers |
| US20170081178A1 (en) * | 2015-09-22 | 2017-03-23 | Freescale Semiconductor, Inc. | Semiconductor device package with seal structure |
| GB2546830B (en) * | 2016-01-29 | 2018-11-14 | Cirrus Logic Int Semiconductor Ltd | Integrated MEMS transducers |
| US10002844B1 (en) * | 2016-12-21 | 2018-06-19 | Invensas Bonding Technologies, Inc. | Bonded structures |
| US10508030B2 (en) | 2017-03-21 | 2019-12-17 | Invensas Bonding Technologies, Inc. | Seal for microelectronic assembly |
| US10793427B2 (en) * | 2017-04-04 | 2020-10-06 | Kionix, Inc. | Eutectic bonding with AlGe |
| US10167191B2 (en) | 2017-04-04 | 2019-01-01 | Kionix, Inc. | Method for manufacturing a micro electro-mechanical system |
| CN109422234B (zh) * | 2017-09-01 | 2021-04-09 | 中芯国际集成电路制造(上海)有限公司 | 测试结构及其制造方法 |
| IT201700103511A1 (it) * | 2017-09-15 | 2019-03-15 | St Microelectronics Srl | Dispositivo microelettronico dotato di connessioni protette e relativo processo di fabbricazione |
| US11380597B2 (en) | 2017-12-22 | 2022-07-05 | Invensas Bonding Technologies, Inc. | Bonded structures |
| CN108203076B (zh) * | 2018-01-03 | 2020-04-14 | 上海华虹宏力半导体制造有限公司 | 晶圆键合方法 |
| US11004757B2 (en) | 2018-05-14 | 2021-05-11 | Invensas Bonding Technologies, Inc. | Bonded structures |
| US11313877B2 (en) | 2018-06-19 | 2022-04-26 | Kionix, Inc. | Near-zero power wakeup electro-mechanical system |
| US12374641B2 (en) | 2019-06-12 | 2025-07-29 | Adeia Semiconductor Bonding Technologies Inc. | Sealed bonded structures and methods for forming the same |
| CN114552378B (zh) | 2020-11-20 | 2023-03-31 | 中国科学院苏州纳米技术与纳米仿生研究所 | 窄线宽激光器 |
| US20240347386A1 (en) * | 2023-04-12 | 2024-10-17 | Honeywell International Inc. | Bonding layer between stacked integrated circuits |
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| JP2002050764A (ja) * | 2000-08-02 | 2002-02-15 | Matsushita Electric Ind Co Ltd | 薄膜トランジスタ、アレイ基板、液晶表示装置、有機el表示装置およびその製造方法 |
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2009
- 2009-01-21 US US12/356,939 patent/US8058143B2/en active Active
- 2009-12-29 TW TW098145607A patent/TWI503899B/zh not_active IP Right Cessation
-
2010
- 2010-01-13 JP JP2011548020A patent/JP5679996B2/ja not_active Expired - Fee Related
- 2010-01-13 CN CN201080005182.1A patent/CN102292280B/zh not_active Expired - Fee Related
- 2010-01-13 EP EP10738898.5A patent/EP2389337A4/en not_active Withdrawn
- 2010-01-13 WO PCT/US2010/020847 patent/WO2010090798A2/en not_active Ceased
-
2011
- 2011-10-14 US US13/273,389 patent/US8592926B2/en active Active
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| TW521395B (en) * | 2000-10-19 | 2003-02-21 | Ibm | A method of preparing a relaxed SiGe layer on an insulator and a SiGe/Si heterostructure and a multiple layer substrate using the method to form |
| TW200531205A (en) * | 2003-09-02 | 2005-09-16 | Soitec Silicon On Insulator | Multifunctional metallic bonding |
| TW200717738A (en) * | 2005-08-31 | 2007-05-01 | Freescale Semiconductor Inc | MEMS package and method of forming the same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102292280A (zh) | 2011-12-21 |
| US20120068325A1 (en) | 2012-03-22 |
| JP2012516055A (ja) | 2012-07-12 |
| EP2389337A4 (en) | 2016-09-07 |
| US8058143B2 (en) | 2011-11-15 |
| WO2010090798A2 (en) | 2010-08-12 |
| WO2010090798A3 (en) | 2010-09-30 |
| CN102292280B (zh) | 2015-09-23 |
| JP5679996B2 (ja) | 2015-03-04 |
| EP2389337A2 (en) | 2011-11-30 |
| US20100181676A1 (en) | 2010-07-22 |
| TW201034091A (en) | 2010-09-16 |
| US8592926B2 (en) | 2013-11-26 |
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