TWI500699B - Thermal curing resin, cured film, color filter, liquid crystal display device, solid photographic device and led luminous body - Google Patents
Thermal curing resin, cured film, color filter, liquid crystal display device, solid photographic device and led luminous body Download PDFInfo
- Publication number
- TWI500699B TWI500699B TW101106634A TW101106634A TWI500699B TW I500699 B TWI500699 B TW I500699B TW 101106634 A TW101106634 A TW 101106634A TW 101106634 A TW101106634 A TW 101106634A TW I500699 B TWI500699 B TW I500699B
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- Taiwan
- Prior art keywords
- resin composition
- thermosetting resin
- acrylate
- weight
- epoxy resin
- Prior art date
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- 239000004973 liquid crystal related substance Substances 0.000 title claims description 11
- 239000007787 solid Substances 0.000 title description 10
- 229920005989 resin Polymers 0.000 title description 5
- 239000011347 resin Substances 0.000 title description 5
- 238000001029 thermal curing Methods 0.000 title 1
- 239000003822 epoxy resin Substances 0.000 claims description 93
- 229920000647 polyepoxide Polymers 0.000 claims description 93
- 239000011342 resin composition Substances 0.000 claims description 73
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims description 70
- 229920000728 polyester Polymers 0.000 claims description 63
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 60
- 229920001187 thermosetting polymer Polymers 0.000 claims description 58
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 54
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 46
- 239000002904 solvent Substances 0.000 claims description 39
- 239000002994 raw material Substances 0.000 claims description 33
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 claims description 30
- 150000004985 diamines Chemical class 0.000 claims description 30
- 150000002440 hydroxy compounds Chemical class 0.000 claims description 30
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 28
- 239000004593 Epoxy Substances 0.000 claims description 26
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 22
- 239000003795 chemical substances by application Substances 0.000 claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 20
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 19
- ONIBWKKTOPOVIA-BYPYZUCNSA-N L-Proline Chemical compound OC(=O)[C@@H]1CCCN1 ONIBWKKTOPOVIA-BYPYZUCNSA-N 0.000 claims description 18
- ONIBWKKTOPOVIA-UHFFFAOYSA-N Proline Natural products OC(=O)C1CCCN1 ONIBWKKTOPOVIA-UHFFFAOYSA-N 0.000 claims description 18
- 230000001588 bifunctional effect Effects 0.000 claims description 18
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims description 18
- 230000001681 protective effect Effects 0.000 claims description 18
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 15
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 claims description 13
- 229920000147 Styrene maleic anhydride Polymers 0.000 claims description 13
- 239000004848 polyfunctional curative Substances 0.000 claims description 13
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 12
- -1 3,4-dicarboxyphenyl Chemical group 0.000 claims description 11
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 claims description 11
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 claims description 11
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 claims description 11
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 9
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 claims description 8
- 239000007795 chemical reaction product Substances 0.000 claims description 8
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 claims description 6
- VDYWHVQKENANGY-UHFFFAOYSA-N 1,3-Butyleneglycol dimethacrylate Chemical compound CC(=C)C(=O)OC(C)CCOC(=O)C(C)=C VDYWHVQKENANGY-UHFFFAOYSA-N 0.000 claims description 5
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 claims description 5
- 235000013922 glutamic acid Nutrition 0.000 claims description 5
- 239000004220 glutamic acid Substances 0.000 claims description 5
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 claims description 5
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 claims description 4
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 claims description 4
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 claims description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims description 4
- 150000008064 anhydrides Chemical class 0.000 claims description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 4
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 claims description 4
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 claims description 3
- 239000004472 Lysine Substances 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 3
- 125000004427 diamine group Chemical group 0.000 claims description 3
- SXCBDZAEHILGLM-UHFFFAOYSA-N heptane-1,7-diol Chemical compound OCCCCCCCO SXCBDZAEHILGLM-UHFFFAOYSA-N 0.000 claims description 3
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 claims description 3
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 claims description 3
- DOKHEARVIDLSFF-UHFFFAOYSA-N prop-1-en-1-ol Chemical compound CC=CO DOKHEARVIDLSFF-UHFFFAOYSA-N 0.000 claims description 3
- 150000000000 tetracarboxylic acids Chemical class 0.000 claims description 3
- STHLKDCSDYFCCW-UHFFFAOYSA-N 2-(3-ethyloxiran-2-yl)ethanol Chemical compound CCC1OC1CCO STHLKDCSDYFCCW-UHFFFAOYSA-N 0.000 claims description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 2
- 239000005977 Ethylene Substances 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 150000003505 terpenes Chemical class 0.000 claims description 2
- 235000007586 terpenes Nutrition 0.000 claims description 2
- 125000005591 trimellitate group Chemical group 0.000 claims description 2
- 238000003786 synthesis reaction Methods 0.000 description 52
- 230000015572 biosynthetic process Effects 0.000 description 50
- 239000000126 substance Substances 0.000 description 29
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 28
- 238000000576 coating method Methods 0.000 description 28
- 239000011248 coating agent Substances 0.000 description 26
- 238000001723 curing Methods 0.000 description 24
- 238000010438 heat treatment Methods 0.000 description 18
- 238000006116 polymerization reaction Methods 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 16
- 239000000203 mixture Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- 238000011156 evaluation Methods 0.000 description 14
- 229910052757 nitrogen Inorganic materials 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- 239000002253 acid Substances 0.000 description 13
- 239000004793 Polystyrene Substances 0.000 description 12
- 229920002223 polystyrene Polymers 0.000 description 12
- 238000005227 gel permeation chromatography Methods 0.000 description 11
- 239000007788 liquid Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 238000003303 reheating Methods 0.000 description 10
- 238000011282 treatment Methods 0.000 description 10
- 239000012295 chemical reaction liquid Substances 0.000 description 9
- 238000002834 transmittance Methods 0.000 description 9
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 8
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 8
- WVDDGKGOMKODPV-UHFFFAOYSA-N hydroxymethyl benzene Natural products OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- 239000003505 polymerization initiator Substances 0.000 description 8
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 8
- 150000003254 radicals Chemical class 0.000 description 8
- 229910052707 ruthenium Inorganic materials 0.000 description 8
- 238000001816 cooling Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 6
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 6
- MFAWEYJGIGIYFH-UHFFFAOYSA-N 2-[4-(trimethoxymethyl)dodecoxymethyl]oxirane Chemical compound C(C1CO1)OCCCC(C(OC)(OC)OC)CCCCCCCC MFAWEYJGIGIYFH-UHFFFAOYSA-N 0.000 description 6
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 6
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 5
- 125000004018 acid anhydride group Chemical group 0.000 description 5
- 239000003513 alkali Substances 0.000 description 5
- 239000007822 coupling agent Substances 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- SXPGQGNWEWPWQZ-UHFFFAOYSA-N 4-(triethoxymethyl)dodecan-1-amine Chemical compound NCCCC(C(OCC)(OCC)OCC)CCCCCCCC SXPGQGNWEWPWQZ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000007810 chemical reaction solvent Substances 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229940043375 1,5-pentanediol Drugs 0.000 description 3
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- 230000003078 antioxidant effect Effects 0.000 description 3
- 235000019445 benzyl alcohol Nutrition 0.000 description 3
- 235000019437 butane-1,3-diol Nutrition 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Chemical compound CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 2
- HXWQJYVUJPBQEW-VAWYXSNFSA-N 1-phenyl-4-[(e)-2-(4-phenylphenyl)ethenyl]benzene Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1/C=C/C(C=C1)=CC=C1C1=CC=CC=C1 HXWQJYVUJPBQEW-VAWYXSNFSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- KGHAVABFNCVIRU-UHFFFAOYSA-N 2-(oxiran-2-yl)butan-1-ol Chemical compound OCC(C1CO1)CC KGHAVABFNCVIRU-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- XPCTZQVDEJYUGT-UHFFFAOYSA-N 3-hydroxy-2-methyl-4-pyrone Chemical compound CC=1OC=CC(=O)C=1O XPCTZQVDEJYUGT-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KZSNJWFQEVHDMF-BYPYZUCNSA-N L-valine Chemical compound CC(C)[C@H](N)C(O)=O KZSNJWFQEVHDMF-BYPYZUCNSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- HBFZXXRVKBPZMP-UHFFFAOYSA-N NC1=CC=C(C=C1)C(C(OC)(OC)OC)CCCCCCCC Chemical compound NC1=CC=C(C=C1)C(C(OC)(OC)OC)CCCCCCCC HBFZXXRVKBPZMP-UHFFFAOYSA-N 0.000 description 2
- XJDCHDFUMGSEHD-UHFFFAOYSA-N NCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCCC(C(OC)(OC)OC)CCCCCCCC XJDCHDFUMGSEHD-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- KZSNJWFQEVHDMF-UHFFFAOYSA-N Valine Natural products CC(C)C(N)C(O)=O KZSNJWFQEVHDMF-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000010779 crude oil Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- GHLKSLMMWAKNBM-UHFFFAOYSA-N dodecane-1,12-diol Chemical compound OCCCCCCCCCCCCO GHLKSLMMWAKNBM-UHFFFAOYSA-N 0.000 description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 2
- 229940116333 ethyl lactate Drugs 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- 239000004474 valine Substances 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical compound C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- REPVLJRCJUVQFA-UHFFFAOYSA-N (-)-isopinocampheol Natural products C1C(O)C(C)C2C(C)(C)C1C2 REPVLJRCJUVQFA-UHFFFAOYSA-N 0.000 description 1
- 239000001490 (3R)-3,7-dimethylocta-1,6-dien-3-ol Substances 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- CDOSHBSSFJOMGT-JTQLQIEISA-N (R)-linalool Natural products CC(C)=CCC[C@@](C)(O)C=C CDOSHBSSFJOMGT-JTQLQIEISA-N 0.000 description 1
- ZWVMLYRJXORSEP-UHFFFAOYSA-N 1,2,6-Hexanetriol Chemical compound OCCCCC(O)CO ZWVMLYRJXORSEP-UHFFFAOYSA-N 0.000 description 1
- 229940015975 1,2-hexanediol Drugs 0.000 description 1
- 229940031723 1,2-octanediol Drugs 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- HSOOIVBINKDISP-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CCC)OC(=O)C(C)=C HSOOIVBINKDISP-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- VXXDXJJJTYQHPX-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;2-ethyl-2-(hydroxymethyl)propane-1,3-diol Chemical compound CCC(CO)(CO)CO.OCC(CO)(CO)CO VXXDXJJJTYQHPX-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- VFBJXXJYHWLXRM-UHFFFAOYSA-N 2-[2-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]ethylsulfanyl]ethyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCCSCCOC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 VFBJXXJYHWLXRM-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 1
- VKEIPALYOJMDAC-UHFFFAOYSA-N 3,3,3-trichloroprop-1-ene Chemical compound ClC(Cl)(Cl)C=C VKEIPALYOJMDAC-UHFFFAOYSA-N 0.000 description 1
- OLQWMCSSZKNOLQ-UHFFFAOYSA-N 3-(2,5-dioxooxolan-3-yl)oxolane-2,5-dione Chemical compound O=C1OC(=O)CC1C1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- LBIHNTAFJVHBLJ-UHFFFAOYSA-N 3-(triethoxymethyl)undec-1-ene Chemical compound C(=C)C(C(OCC)(OCC)OCC)CCCCCCCC LBIHNTAFJVHBLJ-UHFFFAOYSA-N 0.000 description 1
- MEJQNPUKRTVBDA-UHFFFAOYSA-N 3-methylcyclobutane-1,1,2,2-tetracarboxylic acid Chemical compound CC1CC(C(O)=O)(C(O)=O)C1(C(O)=O)C(O)=O MEJQNPUKRTVBDA-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- FXPCFGZWQHOKJF-UHFFFAOYSA-N 4-(1,1-diethoxyethyl)dodecan-1-amine Chemical compound NCCCC(C(OCC)(OCC)C)CCCCCCCC FXPCFGZWQHOKJF-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- YGYCECQIOXZODZ-UHFFFAOYSA-N 4415-87-6 Chemical compound O=C1OC(=O)C2C1C1C(=O)OC(=O)C12 YGYCECQIOXZODZ-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- JZHKIUBMQMDQRG-UHFFFAOYSA-N C(=C)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(=C)C(C(OC)(OC)OC)CCCCCCCC JZHKIUBMQMDQRG-UHFFFAOYSA-N 0.000 description 1
- MZBYOUKMBZWAEL-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OCC)(C)C)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OCC)(C)C)CCCCCCCC MZBYOUKMBZWAEL-UHFFFAOYSA-N 0.000 description 1
- XYSNGNNDJGSUMY-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OCC)(OCC)C)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OCC)(OCC)C)CCCCCCCC XYSNGNNDJGSUMY-UHFFFAOYSA-N 0.000 description 1
- MTDLVDBRMBSPBJ-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OCC)(OCC)OCC)CCCCCCCC MTDLVDBRMBSPBJ-UHFFFAOYSA-N 0.000 description 1
- VPLKXGORNUYFBO-UHFFFAOYSA-N C1(CC2C(CC1)O2)CCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C1(CC2C(CC1)O2)CCC(C(OC)(OC)OC)CCCCCCCC VPLKXGORNUYFBO-UHFFFAOYSA-N 0.000 description 1
- QHJSCTNRFWNYID-UHFFFAOYSA-N CCC=COCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound CCC=COCCCC(C(OC)(OC)OC)CCCCCCCC QHJSCTNRFWNYID-UHFFFAOYSA-N 0.000 description 1
- PLUCVADMZSFTFU-UHFFFAOYSA-N COCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound COCCCC(C(OCC)(OCC)OCC)CCCCCCCC PLUCVADMZSFTFU-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- HYMLWHLQFGRFIY-UHFFFAOYSA-N Maltol Natural products CC1OC=CC(=O)C1=O HYMLWHLQFGRFIY-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- VPYJVMSRUQPHLA-UHFFFAOYSA-N NC1=CC=C(C=C1)C(C(OC)(OC)C)CCCCCCCC Chemical compound NC1=CC=C(C=C1)C(C(OC)(OC)C)CCCCCCCC VPYJVMSRUQPHLA-UHFFFAOYSA-N 0.000 description 1
- AARBEGLOCQPFFN-UHFFFAOYSA-N NC1=CC=C(C=C1)C(C(OCC)(OCC)C)CCCCCCCC Chemical compound NC1=CC=C(C=C1)C(C(OCC)(OCC)C)CCCCCCCC AARBEGLOCQPFFN-UHFFFAOYSA-N 0.000 description 1
- BFVFLIHGBZUOGS-UHFFFAOYSA-N NC1=CC=C(C=C1)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound NC1=CC=C(C=C1)C(C(OCC)(OCC)OCC)CCCCCCCC BFVFLIHGBZUOGS-UHFFFAOYSA-N 0.000 description 1
- YUUJFSGNWOKCBQ-UHFFFAOYSA-N NC1=CC=C(OC2=CC=C(C=C2)C2=C(C3=CC4=CC=CC=C4C=C3C=C2)C2=CC(=CC=C2)OC2=CC=C(C=C2)N)C=C1 Chemical compound NC1=CC=C(OC2=CC=C(C=C2)C2=C(C3=CC4=CC=CC=C4C=C3C=C2)C2=CC(=CC=C2)OC2=CC=C(C=C2)N)C=C1 YUUJFSGNWOKCBQ-UHFFFAOYSA-N 0.000 description 1
- XKWIZSBPRYNVCL-UHFFFAOYSA-N NC1=CC=C(OC2=CC=C(C=C2)C2=C(NC3=CC=CC=C23)C2=CC=C(C=C2)OC2=CC=C(C=C2)N)C=C1 Chemical compound NC1=CC=C(OC2=CC=C(C=C2)C2=C(NC3=CC=CC=C23)C2=CC=C(C=C2)OC2=CC=C(C=C2)N)C=C1 XKWIZSBPRYNVCL-UHFFFAOYSA-N 0.000 description 1
- VGALUHHYJOKVDP-UHFFFAOYSA-N NC1=CC=C(OC=2C=C(C=CC2)C=2C3=CC=CC=C3C(=C3C=CC=CC23)C2=CC(=CC=C2)OC2=CC=C(C=C2)N)C=C1 Chemical compound NC1=CC=C(OC=2C=C(C=CC2)C=2C3=CC=CC=C3C(=C3C=CC=CC23)C2=CC(=CC=C2)OC2=CC=C(C=C2)N)C=C1 VGALUHHYJOKVDP-UHFFFAOYSA-N 0.000 description 1
- CEXAUEGEXJQTFI-UHFFFAOYSA-N NC=1C=C(C=CC1)C(C(OC)(OC)OC)CCCCCCCC Chemical compound NC=1C=C(C=CC1)C(C(OC)(OC)OC)CCCCCCCC CEXAUEGEXJQTFI-UHFFFAOYSA-N 0.000 description 1
- MRMKEFXPVOEOHN-UHFFFAOYSA-N NC=1C=C(C=CC1)CC(CCCCCCCCC)(OCC)OCC Chemical compound NC=1C=C(C=CC1)CC(CCCCCCCCC)(OCC)OCC MRMKEFXPVOEOHN-UHFFFAOYSA-N 0.000 description 1
- ZFSOPQVERQADDC-UHFFFAOYSA-N NC=1C=C(OC2=CC=C(C=C2)C2=C(C3=CC4=CC=CC=C4C=C3C=C2)C2=CC(=CC=C2)OC2=CC=C(C=C2)N)C=CC1 Chemical compound NC=1C=C(OC2=CC=C(C=C2)C2=C(C3=CC4=CC=CC=C4C=C3C=C2)C2=CC(=CC=C2)OC2=CC=C(C=C2)N)C=CC1 ZFSOPQVERQADDC-UHFFFAOYSA-N 0.000 description 1
- KTOCBFNKHFGAPK-UHFFFAOYSA-N NC=1C=C(OC2=CC=C(C=C2)C2=C(NC3=CC=CC=C23)C2=CC=C(C=C2)OC2=CC(=CC=C2)N)C=CC1 Chemical compound NC=1C=C(OC2=CC=C(C=C2)C2=C(NC3=CC=CC=C23)C2=CC=C(C=C2)OC2=CC(=CC=C2)N)C=CC1 KTOCBFNKHFGAPK-UHFFFAOYSA-N 0.000 description 1
- SCECHYBTQMOHQK-UHFFFAOYSA-N NC=1C=C(OC2=CC=C(C=C2)C=2C3=CC=CC=C3C(=C3C=CC=CC23)C2=CC=C(C=C2)OC2=CC(=CC=C2)N)C=CC1 Chemical compound NC=1C=C(OC2=CC=C(C=C2)C=2C3=CC=CC=C3C(=C3C=CC=CC23)C2=CC=C(C=C2)OC2=CC(=CC=C2)N)C=CC1 SCECHYBTQMOHQK-UHFFFAOYSA-N 0.000 description 1
- USKPMDLTXLCVDH-UHFFFAOYSA-N NCCCC(CCCCCCCCC)(OC)C Chemical compound NCCCC(CCCCCCCCC)(OC)C USKPMDLTXLCVDH-UHFFFAOYSA-N 0.000 description 1
- VCQGMBONFCXDIJ-UHFFFAOYSA-N NCCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCCCC(C(OC)(OC)OC)CCCCCCCC VCQGMBONFCXDIJ-UHFFFAOYSA-N 0.000 description 1
- GKCODXAKDPZJOQ-UHFFFAOYSA-N NCCCCC(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound NCCCCC(C(OCC)(OCC)OCC)CCCCCCCC GKCODXAKDPZJOQ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- QVHMSMOUDQXMRS-UHFFFAOYSA-N PPG n4 Chemical compound CC(O)COC(C)COC(C)COC(C)CO QVHMSMOUDQXMRS-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ULQMPOIOSDXIGC-UHFFFAOYSA-N [2,2-dimethyl-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(C)COC(=O)C(C)=C ULQMPOIOSDXIGC-UHFFFAOYSA-N 0.000 description 1
- KVXNKFYSHAUJIA-UHFFFAOYSA-N acetic acid;ethoxyethane Chemical compound CC(O)=O.CCOCC KVXNKFYSHAUJIA-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229940116229 borneol Drugs 0.000 description 1
- CKDOCTFBFTVPSN-UHFFFAOYSA-N borneol Natural products C1CC2(C)C(C)CC1C2(C)C CKDOCTFBFTVPSN-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- BMRWNKZVCUKKSR-UHFFFAOYSA-N butane-1,2-diol Chemical compound CCC(O)CO BMRWNKZVCUKKSR-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- RZIPTXDCNDIINL-UHFFFAOYSA-N cyclohexane-1,1,2,2-tetracarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCCCC1(C(O)=O)C(O)=O RZIPTXDCNDIINL-UHFFFAOYSA-N 0.000 description 1
- STZIXLPVKZUAMV-UHFFFAOYSA-N cyclopentane-1,1,2,2-tetracarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCCC1(C(O)=O)C(O)=O STZIXLPVKZUAMV-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- FOTKYAAJKYLFFN-UHFFFAOYSA-N decane-1,10-diol Chemical compound OCCCCCCCCCCO FOTKYAAJKYLFFN-UHFFFAOYSA-N 0.000 description 1
- YSRSBDQINUMTIF-UHFFFAOYSA-N decane-1,2-diol Chemical compound CCCCCCCCC(O)CO YSRSBDQINUMTIF-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- TWXWPPKDQOWNSX-UHFFFAOYSA-N dicyclohexylmethanone Chemical compound C1CCCCC1C(=O)C1CCCCC1 TWXWPPKDQOWNSX-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- XMQYIPNJVLNWOE-UHFFFAOYSA-N dioctyl hydrogen phosphite Chemical compound CCCCCCCCOP(O)OCCCCCCCC XMQYIPNJVLNWOE-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- DTGKSKDOIYIVQL-UHFFFAOYSA-N dl-isoborneol Natural products C1CC2(C)C(O)CC1C2(C)C DTGKSKDOIYIVQL-UHFFFAOYSA-N 0.000 description 1
- ZITKDVFRMRXIJQ-UHFFFAOYSA-N dodecane-1,2-diol Chemical compound CCCCCCCCCCC(O)CO ZITKDVFRMRXIJQ-UHFFFAOYSA-N 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- HFKBPAKZRASAGX-UHFFFAOYSA-N ethane-1,1,1,2-tetracarboxylic acid Chemical compound OC(=O)CC(C(O)=O)(C(O)=O)C(O)=O HFKBPAKZRASAGX-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- WOLATMHLPFJRGC-UHFFFAOYSA-N furan-2,5-dione;styrene Chemical compound O=C1OC(=O)C=C1.C=CC1=CC=CC=C1 WOLATMHLPFJRGC-UHFFFAOYSA-N 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- MHIBEGOZTWERHF-UHFFFAOYSA-N heptane-1,1-diol Chemical compound CCCCCCC(O)O MHIBEGOZTWERHF-UHFFFAOYSA-N 0.000 description 1
- CTRCJSPDRXFNNN-UHFFFAOYSA-N heptane-1,2,7-triol Chemical compound OCCCCCC(O)CO CTRCJSPDRXFNNN-UHFFFAOYSA-N 0.000 description 1
- GCXZDAKFJKCPGK-UHFFFAOYSA-N heptane-1,2-diol Chemical compound CCCCCC(O)CO GCXZDAKFJKCPGK-UHFFFAOYSA-N 0.000 description 1
- FHKSXSQHXQEMOK-UHFFFAOYSA-N hexane-1,2-diol Chemical compound CCCCC(O)CO FHKSXSQHXQEMOK-UHFFFAOYSA-N 0.000 description 1
- OHMBHFSEKCCCBW-UHFFFAOYSA-N hexane-2,5-diol Chemical compound CC(O)CCC(C)O OHMBHFSEKCCCBW-UHFFFAOYSA-N 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229930007744 linalool Natural products 0.000 description 1
- 238000013035 low temperature curing Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 229940043353 maltol Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- CUUVVDHSUIKLPH-UHFFFAOYSA-N nonane-1,2,9-triol Chemical compound OCCCCCCCC(O)CO CUUVVDHSUIKLPH-UHFFFAOYSA-N 0.000 description 1
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- GKCGJDQACNSNBB-UHFFFAOYSA-N octane-1,2,8-triol Chemical compound OCCCCCCC(O)CO GKCGJDQACNSNBB-UHFFFAOYSA-N 0.000 description 1
- AEIJTFQOBWATKX-UHFFFAOYSA-N octane-1,2-diol Chemical compound CCCCCCC(O)CO AEIJTFQOBWATKX-UHFFFAOYSA-N 0.000 description 1
- BCKOQWWRTRBSGR-UHFFFAOYSA-N octane-3,6-diol Chemical compound CCC(O)CCC(O)CC BCKOQWWRTRBSGR-UHFFFAOYSA-N 0.000 description 1
- MBAUOPQYSQVYJV-UHFFFAOYSA-N octyl 3-[4-hydroxy-3,5-di(propan-2-yl)phenyl]propanoate Chemical compound OC1=C(C=C(C=C1C(C)C)CCC(=O)OCCCCCCCC)C(C)C MBAUOPQYSQVYJV-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- WEAYWASEBDOLRG-UHFFFAOYSA-N pentane-1,2,5-triol Chemical compound OCCCC(O)CO WEAYWASEBDOLRG-UHFFFAOYSA-N 0.000 description 1
- WCVRQHFDJLLWFE-UHFFFAOYSA-N pentane-1,2-diol Chemical compound CCCC(O)CO WCVRQHFDJLLWFE-UHFFFAOYSA-N 0.000 description 1
- GTCCGKPBSJZVRZ-UHFFFAOYSA-N pentane-2,4-diol Chemical compound CC(O)CC(C)O GTCCGKPBSJZVRZ-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229960003742 phenol Drugs 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
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- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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Description
本發明是有關於一種熱硬化性樹脂組成物,藉由對其進行加熱、硬化而獲得之硬化膜。The present invention relates to a cured film obtained by heating and hardening a thermosetting resin composition.
於液晶顯示元件等元件之製造步驟中,進行有機溶劑、酸、鹼溶液等各種化學處理,或者藉由濺鍍而成膜配線電極時,存在表面被局部地加熱為高溫之現象。因此,存在以防止各種元件之表面劣化、損傷、變質之目的而設置表面保護膜之情形。對該些保護膜要求可耐受如上所述之製造步驟中之各種處理的諸特性。具體而言要求耐熱性、耐溶劑性、耐酸性、耐鹼性等耐化學品性、耐水性、對玻璃等基底基板之密接性、透明性、耐劃傷性、塗佈性、平坦性、耐光性等。而且,於液晶顯示元件之高視角化、高速響應化、高精細化等高性能化之發展中,作為彩色濾光片保護膜而使用之情形時,期望平坦化特性得到提高之材料。關於耐光性,迄今為止重要的是為了保護膜之表面清洗而進行紫外線臭氧處理。然而,特別是於近年來,於橫電場模式用彩色濾光片保護膜中,為了提高感光性間隔件之塗佈性,必需更高能量之紫外線臭氧處理,而且,聚合物安定配向(polymer sustained alignment,PSA)模式等之光聚合步驟或配向膜之光配向步驟等紫外線曝光步驟增加,耐光性變為非常重要之特性。In the manufacturing steps of an element such as a liquid crystal display element, various chemical treatments such as an organic solvent, an acid, and an alkali solution are carried out, or when a wiring electrode is formed by sputtering, the surface is locally heated to a high temperature. Therefore, there is a case where the surface protective film is provided for the purpose of preventing surface deterioration, damage, and deterioration of various elements. The protective films are required to withstand various characteristics of the various processes in the manufacturing steps as described above. Specifically, chemical resistance such as heat resistance, solvent resistance, acid resistance, and alkali resistance, water resistance, adhesion to a base substrate such as glass, transparency, scratch resistance, coating property, and flatness are required. Light resistance and the like. Further, in the development of high performance such as high viewing angle, high-speed response, and high definition of a liquid crystal display element, when it is used as a color filter protective film, a material having improved planarization characteristics is desired. Regarding the light resistance, it has heretofore been important to perform ultraviolet ozone treatment for the surface cleaning of the protective film. However, in recent years, in the color filter protective film for a transverse electric field mode, in order to improve the coating property of the photosensitive spacer, a higher energy ultraviolet ozone treatment is required, and the polymer is stable. The ultraviolet light exposure step such as the photopolymerization step of the alignment or PSA) mode or the photoalignment step of the alignment film is increased, and the light resistance becomes a very important characteristic.
作為具有該些優異特性之保護膜材料,存在有含有矽之聚醯胺酸組成物(參照專利文件1)、聚酯醯胺酸組成物(參照專利文獻2、3)。含有矽之聚醯胺酸組成物是關於平坦性而言為非常優異之材料,但存在耐熱性並不充分,耐鹼性差之缺點。專利文獻2之聚酯醯胺酸組成物具有平坦性及耐熱性並不充分之缺點。專利文獻3之聚酯醯胺酸組成物是平坦性、耐熱性及耐化學品性非常優異之材料,但存在耐光性並不充分,且於紫外線臭氧處理或紫外線曝光步驟中透明性降低之缺點。因此,任意材料均不是作為保護膜材料而充分滿足耐光性、平坦性、耐熱性、耐化學品性、及其他諸特性者。As a protective film material having such excellent properties, there are a polyaminic acid composition containing ruthenium (see Patent Document 1) and a polyester phthalic acid composition (see Patent Documents 2 and 3). The polyamine composition containing ruthenium is a material which is excellent in flatness, but has a disadvantage that heat resistance is not sufficient and alkali resistance is poor. The polyester phthalic acid composition of Patent Document 2 has disadvantages in that flatness and heat resistance are insufficient. The polyester phthalic acid composition of Patent Document 3 is a material excellent in flatness, heat resistance, and chemical resistance, but has insufficient light resistance and is disadvantageous in transparency in ultraviolet ozone treatment or ultraviolet exposure step. . Therefore, any material does not sufficiently satisfy light resistance, flatness, heat resistance, chemical resistance, and other characteristics as a protective film material.
[先前技術文獻][Previous Technical Literature]
[專利文獻][Patent Literature]
專利文件1:日本專利特開平9-291150號公報Patent Document 1: Japanese Patent Laid-Open No. Hei 9-291150
專利文獻2:日本專利特開2005-105264號公報Patent Document 2: Japanese Patent Laid-Open Publication No. 2005-105264
專利文獻3:日本專利特開2008-156546號公報Patent Document 3: Japanese Patent Laid-Open Publication No. 2008-156546
於上述狀況下,需求例如耐熱性、耐溶劑性、耐酸性、耐鹼性等耐化學品性、耐水性、對玻璃等基底基板之密接性、透明性、耐劃傷性、塗佈性優異之樹脂組成物。另外,特別是需求平坦性、耐光性優異之硬化膜及賦予該硬化膜之樹脂組成物。Under the above circumstances, it is required to have chemical resistance such as heat resistance, solvent resistance, acid resistance, and alkali resistance, water resistance, adhesion to a base substrate such as glass, transparency, scratch resistance, and coating property. The resin composition. Further, in particular, a cured film which is excellent in flatness and light resistance and a resin composition which imparts the cured film are required.
本發明者等人為了解決上述問題點而進行各種研究,結果發現藉由包含聚酯醯胺酸(所述聚酯醯胺酸是藉由包含四羧酸二酐、二胺及多元羥基化合物之化合物反應而獲得之聚酯醯胺酸)、環氧樹脂(所述環氧樹脂是藉由以(甲基)丙烯酸縮水甘油酯與2官能(甲基)丙烯酸酯為必需原料成分進行反應而獲得的環氧樹脂)、及環氧硬化劑之樹脂組成物、及該樹脂組成物硬化而獲得之硬化膜,可達成上述目的,從而完成本發明。The inventors of the present invention conducted various studies in order to solve the above problems, and as a result, found that by including a polyester phthalic acid (the polyester phthalic acid is composed of a tetracarboxylic dianhydride, a diamine, and a polyvalent hydroxy compound) a polyester phthalic acid obtained by reacting a compound, an epoxy resin obtained by reacting glycidyl (meth)acrylate with a bifunctional (meth) acrylate as an essential raw material component The epoxy resin), the resin composition of the epoxy curing agent, and the cured film obtained by curing the resin composition can achieve the above object, and the present invention has been completed.
本發明具有以下之構成。The present invention has the following constitution.
[1] 一種熱硬化性樹脂組成物,其是包含聚酯醯胺酸、環氧樹脂、及環氧硬化劑之樹脂組成物,其特徵在於:聚酯醯胺酸是藉由以四羧酸二酐、二胺、及多元羥基化合物為必需之原料成分進行反應而獲得,藉由使X莫耳之四羧酸二酐、Y莫耳之二胺及Z莫耳之多元羥基化合物以下述式(1)及式(2)之關係成立之比率進行反應而獲得之聚酯醯胺酸,[1] A thermosetting resin composition which is a resin composition comprising a polyester phthalic acid, an epoxy resin, and an epoxy hardener, characterized in that the polyester phthalic acid is a tetracarboxylic acid The dianhydride, the diamine, and the polyvalent hydroxy compound are obtained by reacting the essential raw material components, and the X-molar tetracarboxylic dianhydride, the Y-mole diamine, and the Z-mole polyhydroxy compound are represented by the following formula: (1) a polyester phthalic acid obtained by reacting a ratio of the relationship of the formula (2),
0.2≦Z/Y≦8.0 ……(1)0.2≦Z/Y≦8.0 ......(1)
0.2≦(Y+Z)/X≦1.5 ……(2)0.2≦(Y+Z)/X≦1.5 ......(2)
環氧樹脂是藉由以(甲基)丙烯酸縮水甘油酯與2官能(甲基)丙烯酸酯為必需之原料成分進行反應而獲得之重量平均分子量為1,000~50,000之環氧樹脂,相對於聚酯醯胺酸100重量份而言,環氧樹脂為20重量份~400重量份,相對於環氧樹脂100重量份而言,環氧硬化劑為0重量份~60重量份。The epoxy resin is an epoxy resin having a weight average molecular weight of 1,000 to 50,000 obtained by reacting glycidyl (meth)acrylate with a bifunctional (meth) acrylate as an essential raw material component, relative to the polyester. The epoxy resin is 20 parts by weight to 400 parts by weight based on 100 parts by weight of the lysine, and the epoxy curing agent is 0 parts by weight to 60 parts by weight based on 100 parts by weight of the epoxy resin.
[2] 如[1]所述之熱硬化性樹脂組成物,其中,所述聚酯醯胺酸是藉由以四羧酸二酐、二胺、多元羥基化合物及1元醇為必需之原料成分進行反應而獲得之反應生成物。[2] The thermosetting resin composition according to [1], wherein the polyester proline is made of a tetracarboxylic dianhydride, a diamine, a polyvalent hydroxy compound, and a monohydric alcohol. A reaction product obtained by reacting a component.
[3] 如[2]所述之熱硬化性樹脂組成物,其中,所述1元醇是選自異丙醇、丙烯醇、苯甲醇、甲基丙烯酸羥基乙酯、丙二醇單乙醚及3-乙基-3-羥基甲基環氧丙烷之1種以上。[3] The thermosetting resin composition according to [2], wherein the monohydric alcohol is selected from the group consisting of isopropanol, propenol, benzyl alcohol, hydroxyethyl methacrylate, propylene glycol monoethyl ether, and 3- One or more kinds of ethyl-3-hydroxymethyl propylene oxide.
[4] 如[1]~[3]中任一項所述之熱硬化性樹脂組成物,其中,所述聚酯醯胺酸是進一步添加苯乙烯-馬來酸酐共聚物作為原料成分進行反應而獲得之聚酯醯胺酸。[4] The thermosetting resin composition according to any one of [1], wherein the polyester proline is further reacted by adding a styrene-maleic anhydride copolymer as a raw material component. And the polyester proline obtained.
[5] 如[1]~[4]中任一項所述之熱硬化性樹脂組成物,其中,所述聚酯醯胺酸具有下述通式(3)及通式(4)所表示之結構單元;[5] The thermosetting resin composition according to any one of [1] to [4] wherein the polyester phthalic acid has the following formula (3) and formula (4) Structural unit;
此處,R1 是四羧酸二酐殘基,R2 是二胺殘基,R3 是多元羥基化合物殘基。Here, R 1 is a tetracarboxylic dianhydride residue, R 2 is a diamine residue, and R 3 is a polyvalent hydroxy compound residue.
[6] 如[1]~[5]中任一項所述之熱硬化性樹脂組成物,其中,所述聚酯醯胺酸之重量平均分子量為1,000~200,000。[6] The thermosetting resin composition according to any one of [1] to [5] wherein the polyester glutamic acid has a weight average molecular weight of 1,000 to 200,000.
[7] 如[1]~[6]中任一項所述之熱硬化性樹脂組成物,其中,所述四羧酸二酐是選自3,3',4,4'-二苯基碸四甲酸二酐、3,3',4,4'-二苯基醚四甲酸二酐、2,2-[雙(3,4-二羧基苯基)]六氟丙烷二酐及乙二醇雙(脫水偏苯三酸酯)之1種以上。[7] The thermosetting resin composition according to any one of [1], wherein the tetracarboxylic dianhydride is selected from 3,3',4,4'-diphenyl groups. Terpene tetracarboxylic acid dianhydride, 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride, 2,2-[bis(3,4-dicarboxyphenyl)]hexafluoropropane dianhydride and ethylene One or more types of alcohol bis (dehydrated trimellitate).
[8] 如[1]~[7]中任一項所述之熱硬化性樹脂組成物,其中,所述二胺是選自3,3'-二胺基二苯基碸及雙[4-(3-胺基苯氧基)苯基]碸之1種以上。[8] The thermosetting resin composition according to any one of [1], wherein the diamine is selected from the group consisting of 3,3'-diaminodiphenylphosphonium and bis[4] One or more kinds of -(3-aminophenoxy)phenyl]anthracene.
[9] 如[1]~[8]中任一項所述之熱硬化性樹脂組成物,其中,所述多元羥基化合物是選自乙二醇、丙二醇、1,4-丁二醇、1,5-戊二醇、1,6-己二醇、1,7-庚二醇及1,8-辛二醇之1種以上。[9] The thermosetting resin composition according to any one of [1], wherein the polyvalent hydroxy compound is selected from the group consisting of ethylene glycol, propylene glycol, and 1,4-butanediol. One or more of 5-pentanediol, 1,6-hexanediol, 1,7-heptanediol, and 1,8-octanediol.
[10] 如[1]~[9]中任一項所述之熱硬化性樹脂組成物,其中,所述2官能(甲基)丙烯酸酯是選自乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,3-丁二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯之1種以上。[10] The thermosetting resin composition according to any one of [1], wherein the bifunctional (meth) acrylate is selected from ethylene glycol di(meth)acrylate , diethylene glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,3-butanediol di(meth)acrylate, neopentyl glycol di(a) One or more of acrylate and tricyclodecane dimethanol di(meth)acrylate.
[11] 如[1]~[10]中任一項所述之熱硬化性樹脂組成物,其中,所述環氧硬化劑是選自偏苯三酸酐及六氫偏苯三酸酐之1種以上。[1] The thermosetting resin composition according to any one of [1] to [10] wherein the epoxy curing agent is one or more selected from the group consisting of trimellitic anhydride and hexahydrotrimellitic anhydride.
[12] 如[1]所述之熱硬化性樹脂組成物,其中,所述四羧酸二酐是3,3',4,4'-二苯基醚四甲酸二酐,所述二胺是3,3'-二胺基二苯基碸,所述多元羥基化合物是1,4-丁二醇,所述環氧樹脂是甲基丙烯酸縮水甘油酯與1,4-丁二醇二甲基丙烯酸脂或1,3-丁二醇二甲基丙烯酸脂之重量平均分子量為1,000~50,000之共聚物,所述環氧硬化劑是偏苯三酸酐,進一步含有3-甲氧基丙酸甲酯作為溶劑。[12] The thermosetting resin composition according to [1], wherein the tetracarboxylic dianhydride is 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride, the diamine Is 3,3'-diaminodiphenylanthracene, the polyvalent hydroxy compound is 1,4-butanediol, and the epoxy resin is glycidyl methacrylate and 1,4-butanediol a acrylate or 1,3-butanediol dimethacrylate having a weight average molecular weight of 1,000 to 50,000, the epoxy hardener being trimellitic anhydride, and further containing methyl 3-methoxypropionate as a solvent .
[13] 如[2]所述之熱硬化性樹脂組成物,其中,所述四羧酸二酐是3,3',4,4'-二苯基醚四甲酸二酐,所述二胺是3,3'-二胺基二苯基碸,所述多元羥基化合物是1,4-丁二醇,所述1元醇是苯甲醇,所述環氧樹脂是甲基丙烯酸縮水甘油酯與1,4-丁二醇二甲基丙烯酸脂或1,3-丁二醇二甲基丙烯酸脂之重量平均分子量為1,000~50,000之共聚物,所述環氧硬化劑是偏苯三酸酐,進一步含有3-甲氧基丙酸甲酯作為溶劑。[13] The thermosetting resin composition according to [2], wherein the tetracarboxylic dianhydride is 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride, the diamine Is 3,3'-diaminodiphenylanthracene, the polyhydric hydroxy compound is 1,4-butanediol, the monohydric alcohol is benzyl alcohol, and the epoxy resin is glycidyl methacrylate and a copolymer of 1,4-butanediol dimethacrylate or 1,3-butanediol dimethacrylate having a weight average molecular weight of 1,000 to 50,000, said epoxy hardener being trimellitic anhydride, further containing 3- Methyl methoxypropionate is used as a solvent.
[14] 一種硬化膜,其是由如[1]~[13]中任一項所述之熱硬化性樹脂組成物而獲得。[14] A cured film obtained by the thermosetting resin composition according to any one of [1] to [13].
[15] 一種彩色濾光片,其使用如[14]所述之硬化膜作為保護膜。[15] A color filter using the cured film as described in [14] as a protective film.
[16] 一種液晶顯示元件,其使用如[15]所述之彩色濾光片。[16] A liquid crystal display element using the color filter as described in [15].
[17] 一種固體攝影元件,其使用如[15]所述之彩色濾光片。[17] A solid-state imaging element using the color filter according to [15].
[18] 一種液晶顯示元件,其使用如上述[14]所述之硬化膜作為TFT與透明電極間所形成之透明絕緣膜。[18] A liquid crystal display element using the cured film as described in [14] above as a transparent insulating film formed between a TFT and a transparent electrode.
[19] 一種液晶顯示元件,其使用如上述[14]所述之硬化膜作為透明電極與配向膜間所形成之透明絕緣膜。[19] A liquid crystal display element using the cured film according to [14] above as a transparent insulating film formed between the transparent electrode and the alignment film.
[20] 一種LED發光體,其使用如上述[14]所述之硬化膜作為保護膜。[20] An LED light-emitting body using the cured film according to [14] above as a protective film.
[發明的效果][Effects of the Invention]
本發明之較佳態樣之熱硬化性樹脂組成物是於平坦性及耐光性中特別優異之材料,於作為彩色液晶顯示元件之彩色濾光片保護膜而使用之情形時,可使顯示品質及可靠性提高。而且,藉由對本發明之較佳態樣之熱硬化性樹脂組成物進行加熱而獲得之硬化膜是於透明性、耐化學品性、密接性及耐濺鍍性中亦獲得平衡者,是實用性非常高者。特別是可用作藉由染色法、顏料分散法、電鍍法及印刷法而製造之彩色濾光片之保護膜。而且,亦可用作各種光學材料之保護膜及透明絕緣膜。The thermosetting resin composition of the preferred embodiment of the present invention is a material which is particularly excellent in flatness and light resistance, and can be used in a case where it is used as a color filter protective film for a color liquid crystal display element. And reliability is improved. Further, the cured film obtained by heating the thermosetting resin composition of the preferred embodiment of the present invention is balanced in transparency, chemical resistance, adhesion, and splash resistance, and is practical. Very very high. In particular, it can be used as a protective film for a color filter manufactured by a dyeing method, a pigment dispersion method, an electroplating method, and a printing method. Moreover, it can also be used as a protective film of various optical materials and a transparent insulating film.
1.熱硬化性樹脂組成物Thermosetting resin composition
本發明之熱硬化性樹脂組成物是包含聚酯醯胺酸、環氧樹脂、及環氧硬化劑的樹脂組成物,所述聚酯醯胺酸是藉由以四羧酸二酐、二胺、及多元羥基化合物為必需之原料成分進行反應而獲得之聚酯醯胺酸,所述環氧樹脂是藉由以(甲基)丙烯酸縮水甘油酯與2官能(甲基)丙烯酸酯為必需之原料成分進行反應而獲得之環氧樹脂,該熱硬化性樹脂組成物之特徵在於:相對於聚酯醯胺酸100重量份而言,環氧樹脂為20重量份~400重量份,相對於環氧樹脂100重量份而言,環氧硬化劑為0重量份~60重量份。The thermosetting resin composition of the present invention is a resin composition comprising a polyester phthalic acid, an epoxy resin, and an epoxy hardener, which is obtained by using a tetracarboxylic dianhydride or a diamine. And a polyester phthalic acid obtained by reacting a polyvalent hydroxy compound as a necessary raw material component, which is necessary by using glycidyl (meth) acrylate and a bifunctional (meth) acrylate. An epoxy resin obtained by reacting a raw material component, wherein the thermosetting resin composition is characterized in that the epoxy resin is 20 parts by weight to 400 parts by weight relative to 100 parts by weight of the polyester phthalic acid, relative to the ring The epoxy hardener is 0 to 60 parts by weight based on 100 parts by weight of the oxygen resin.
1-1.聚酯醯胺酸1-1. Polyester proline
該聚酯醯胺酸藉由以四羧酸二酐、二胺、及多元羥基化合物為必需之原料成分進行反應而獲得。更詳細而言,藉由使X莫耳之四羧酸二酐、Y莫耳之二胺及Z莫耳之多元羥基化合物以下述式(1)及式(2)之關係成立之比率進行反應而獲得。The polyester phthalic acid is obtained by reacting a tetracarboxylic dianhydride, a diamine, and a polyvalent hydroxy compound as essential raw material components. More specifically, the reaction is carried out at a ratio in which the relationship between the following formula (1) and formula (2) is satisfied by the X-molar tetracarboxylic dianhydride, the Y-mole diamine, and the Z-mole polyvalent hydroxy compound. And get.
0.2≦Z/Y≦8.0 ……(1)0.2≦Z/Y≦8.0 ......(1)
0.2≦(Y+Z)/X≦1.5 ……(2)0.2≦(Y+Z)/X≦1.5 ......(2)
於聚酯醯胺酸之合成中至少必需使用溶劑,可使該溶劑保持殘留而製成考慮了操作性等之液狀或凝膠狀之熱硬化性樹脂組成物,亦可將該溶劑除去而製成考慮了搬運性等之固形狀之組成物。而且,於聚酯醯胺酸之合成中,亦可視需要而包含選自1元醇、及苯乙烯-馬來酸酐共聚物之1種以上原料作為原料,其中較佳的是包含1元醇。而且,於聚酯醯胺酸之合成中,亦可於不損及本發明之目的之範圍內視需要包含上述以外之其他原料作為原料。作為此種其他原料之例,可列舉含有矽之單胺。In the synthesis of the polyester lysine, it is necessary to use at least a solvent, and the solvent can be left as a thermosetting resin composition in the form of a liquid or a gel in consideration of workability, etc., and the solvent can be removed. A composition having a solid shape in consideration of handling properties and the like is produced. Further, in the synthesis of the polyester phthalic acid, one or more kinds of raw materials selected from the group consisting of a monohydric alcohol and a styrene-maleic anhydride copolymer may be contained as a raw material, and among them, a monohydric alcohol is preferable. Further, in the synthesis of the polyester proline, a raw material other than the above may be contained as a raw material as needed within the range not impairing the object of the present invention. As an example of such another raw material, a monoamine containing a hydrazine is mentioned.
1-1-1. 四羧酸二酐1-1-1. Tetracarboxylic dianhydride
本發明中所使用之四羧酸二酐之具體例可列舉以下者:芳香族四羧酸二酐,例如3,3',4,4'-二苯甲酮四甲酸二酐、2,2',3,3'-二苯甲酮四甲酸二酐、2,3,3',4'-二苯甲酮四甲酸二酐、3,3',4,4'-二苯基碸四甲酸二酐、2,2',3,3'-二苯基碸四甲酸二酐、2,3,3',4'-二苯基碸四甲酸二酐、3,3',4,4'-二苯基醚四甲酸二酐、2,2',3,3'-二苯基醚四甲酸二酐、2,3,3',4'-二苯基醚四甲酸二酐、2,2-[雙(3,4-二羧基苯基)]六氟丙烷二酐、及乙二醇雙(脫水偏苯三酸酯)(商品名為TMEG-100、新日本理化股份有限公司);脂環族四羧酸二酐,例如環丁烷四甲酸二酐、甲基環丁烷四甲酸二酐、環戊烷四甲酸二酐、及環己烷四甲酸二酐等;脂肪族四羧酸二酐,例如乙烷四甲酸二酐、及丁烷四甲酸二酐。Specific examples of the tetracarboxylic dianhydride used in the present invention include the following: aromatic tetracarboxylic dianhydride, for example, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 2,2 ',3,3'-benzophenonetetracarboxylic dianhydride, 2,3,3',4'-benzophenonetetracarboxylic dianhydride, 3,3',4,4'-diphenylfluorene Formic acid dianhydride, 2,2',3,3'-diphenylstilbene tetracarboxylic dianhydride, 2,3,3',4'-diphenylstilbene tetracarboxylic dianhydride, 3,3',4,4 '-Diphenyl ether tetracarboxylic dianhydride, 2,2',3,3'-diphenyl ether tetracarboxylic dianhydride, 2,3,3',4'-diphenyl ether tetracarboxylic dianhydride, 2 ,2-[bis(3,4-dicarboxyphenyl)]hexafluoropropane dianhydride, and ethylene glycol bis(dehydrated trimellitate) (trade name: TMEG-100, New Japan Physical and Chemical Co., Ltd.) Cycloaliphatic tetracarboxylic dianhydride, such as cyclobutane tetracarboxylic dianhydride, methylcyclobutane tetracarboxylic dianhydride, cyclopentane tetracarboxylic dianhydride, and cyclohexane tetracarboxylic dianhydride; aliphatic four A carboxylic acid dianhydride such as ethane tetracarboxylic dianhydride and butane tetracarboxylic dianhydride.
該些化合物中較佳的是可賦予透明性良好之樹脂的3,3',4,4'-二苯基碸四甲酸二酐、3,3',4,4'-二苯基醚四甲酸二酐、2,2-[雙(3,4-二羧基苯基)]六氟丙烷二酐、乙二醇雙(脫水偏苯三酸酯)(商品名為TMEG-100、新日本理化股份有限公司),特佳的是3,3',4,4'-二苯基醚四甲酸二酐、3,3',4,4'-二苯基碸四甲酸二酐。Preferred among these compounds are 3,3',4,4'-diphenylstilbene tetracarboxylic dianhydride and 3,3',4,4'-diphenyl ether tetra which can impart a resin having good transparency. Formic acid dianhydride, 2,2-[bis(3,4-dicarboxyphenyl)]hexafluoropropane dianhydride, ethylene glycol bis(hydrogen trimellitate) (trade name TMEG-100, new Japanese physicochemical) Co., Ltd.), particularly preferred are 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride, 3,3',4,4'-diphenylstilbene tetracarboxylic dianhydride.
1-1-2. 二胺1-1-2. Diamine
本發明中所使用之二胺之具體例可列舉4,4'-二胺基二苯基碸、3,3'-二胺基二苯基碸、3,4'-二胺基二苯基碸、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、雙[3-(4-胺基苯氧基)苯基]碸、[4-(4-胺基苯氧基)苯基][3-(4-胺基苯氧基)苯基]碸、[4-(3-胺基苯氧基)苯基][3-(4-胺基苯氧基)苯基]碸、及2,2-雙[4-(4-胺基苯氧基)苯基]六氟丙烷。Specific examples of the diamine used in the present invention include 4,4'-diaminodiphenyl fluorene, 3,3'-diaminodiphenyl fluorene, and 3,4'-diaminodiphenyl. Bismuth, bis[4-(4-aminophenoxy)phenyl]indole, bis[4-(3-aminophenoxy)phenyl]indole, bis[3-(4-aminophenoxy) Phenyl]anthracene, [4-(4-aminophenoxy)phenyl][3-(4-aminophenoxy)phenyl]anthracene, [4-(3-aminophenoxy) Phenyl][3-(4-aminophenoxy)phenyl]anthracene, and 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane.
該些化合物中較佳的是可賦予透明性良好之樹脂的3,3'-二胺基二苯基碸、及雙[4-(3-胺基苯氧基)苯基]碸,特佳的是3,3'-二胺基二苯基碸。Preferred among these compounds are 3,3'-diaminodiphenylanthracene and bis[4-(3-aminophenoxy)phenyl]anthracene which impart a good transparency. It is 3,3'-diaminodiphenylanthracene.
1-1-3. 多元羥基化合物1-1-3. Polyols
本發明中所使用之多元羥基化合物之具體例可列舉:乙二醇、二乙二醇、三乙二醇、四乙二醇、重量平均分子量為1,000以下之聚乙二醇、丙二醇、二丙二醇、三丙二醇、四丙二醇、重量平均分子量為1,000以下之聚丙二醇、1,2-丁二醇、1,3-丁二醇、1,4-丁二醇、1,2-戊二醇、1,5-戊二醇、2,4-戊二醇、1,2,5-戊三醇、1,2-己二醇、1,6-己二醇、2,5-己二醇、1,2,6-己三醇、1,2-庚二醇、1,7-庚二醇、1,2,7-庚三醇、1,2-辛二醇、1,8-辛二醇、3,6-辛二醇、1,2,8-辛三醇、1,2-壬二醇、1,9-壬二醇、1,2,9-壬三醇、1,2-癸二醇、1,10-癸二醇、1,2,10-癸三醇、1,2-十二烷二醇、1,12-十二烷二醇、丙三醇、三羥甲基丙烷、季戊四醇、二季戊四醇、雙酚A(商品名)、雙酚S(商品名)、雙酚F(商品名)、二乙醇胺、及三乙醇胺。Specific examples of the polyvalent hydroxy compound used in the present invention include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol having a weight average molecular weight of 1,000 or less, propylene glycol, and dipropylene glycol. , tripropylene glycol, tetrapropylene glycol, polypropylene glycol having a weight average molecular weight of 1,000 or less, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 1,2-pentanediol, 1 , 5-pentanediol, 2,4-pentanediol, 1,2,5-pentanetriol, 1,2-hexanediol, 1,6-hexanediol, 2,5-hexanediol, 1 , 2,6-hexanetriol, 1,2-heptanediol, 1,7-heptanediol, 1,2,7-heptanetriol, 1,2-octanediol, 1,8-octanediol , 3,6-octanediol, 1,2,8-octanetriol, 1,2-decanediol, 1,9-nonanediol, 1,2,9-nonanetriol, 1,2-anthracene Glycol, 1,10-decanediol, 1,2,10-triol, 1,2-dodecanediol, 1,12-dodecanediol, glycerol, trimethylolpropane Pentaerythritol, dipentaerythritol, bisphenol A (trade name), bisphenol S (trade name), bisphenol F (trade name), diethanolamine, and triethanolamine.
該些化合物中較佳的是於溶劑中之溶解性良好之乙二醇、丙二醇、1,4-丁二醇、1,5-戊二醇、1,6-己二醇、1,7-庚二醇、及1,8-辛二醇,特佳的是1,4-丁二醇、1,5-戊二醇、及1,6-己二醇。Preferred among these compounds are ethylene glycol, propylene glycol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, 1,7- which have good solubility in a solvent. Heptanediol and 1,8-octanediol are particularly preferred are 1,4-butanediol, 1,5-pentanediol, and 1,6-hexanediol.
1-1-4. 1元醇1-1-4. 1 alcohol
本發明中所使用之1元醇之具體例可列舉:甲醇、乙醇、1-丙醇、異丙醇、丙烯醇、苯甲醇、甲基丙烯酸羥基乙酯、丙二醇單乙醚、丙二醇單甲醚、二丙二醇單乙醚、.二丙二醇單甲醚、乙二醇單乙醚、乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單乙醚、苯酚、冰片、麥芽醇、芳樟醇、松脂醇、二甲基苄基甲醇、3-乙基-3-羥基甲基環氧丙烷。Specific examples of the monohydric alcohol used in the present invention include methanol, ethanol, 1-propanol, isopropanol, propenol, benzyl alcohol, hydroxyethyl methacrylate, propylene glycol monoethyl ether, and propylene glycol monomethyl ether. Dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monoethyl ether, phenol, borneol, maltol, linalool , rosinol, dimethylbenzyl methanol, 3-ethyl-3-hydroxymethyl propylene oxide.
該些化合物中較佳的是異丙醇、丙烯醇、苯甲醇、甲基丙烯酸羥基乙酯、丙二醇單乙醚、3-乙基-3-羥基甲基環氧丙烷。若考慮將使用該些化合物而成之聚酯醯胺酸與環氧樹脂及環氧硬化劑混合之情形時之相溶性、或者作為最終產品之熱硬化性樹脂組成物於彩色濾光片上之塗佈性,則更佳的是1元醇使用苯甲醇。Preferred among these compounds are isopropyl alcohol, propylene alcohol, benzyl alcohol, hydroxyethyl methacrylate, propylene glycol monoethyl ether, and 3-ethyl-3-hydroxymethyl propylene oxide. Consider the compatibility in the case where the polyester phthalic acid obtained by using these compounds is mixed with an epoxy resin and an epoxy hardener, or the thermosetting resin composition as a final product on a color filter. More preferably, the coating property is benzyl alcohol using a monohydric alcohol.
1元醇較佳的是相對於四羧酸二酐、二胺、及多元羥基化合物之合計量100重量份而言含有2重量份~300重量份。更佳的是5重量份~200重量份。The monohydric alcohol is preferably contained in an amount of from 2 parts by weight to 300 parts by weight per 100 parts by weight of the total of the tetracarboxylic dianhydride, the diamine, and the polyvalent hydroxy compound. More preferably, it is 5 parts by weight to 200 parts by weight.
1-1-5. 苯乙烯-馬來酸酐共聚物1-1-5. Styrene-maleic anhydride copolymer
而且,本發明中所使用之聚酯醯胺酸亦可添加具有3個以上酸酐基之化合物而進行合成反應。作為具有3個以上酸酐基之化合物之具體例,可列舉苯乙烯-馬來酸酐共聚物。關於構成苯乙烯-馬來酸酐共聚物之各成分之比率,苯乙烯/馬來酸酐之莫耳比為0.5~4,較佳的是1~3,具體而言更佳的是約1、約2或約3,進一步更佳的是約1或約2,特佳的是約1。Further, the polyester phthalic acid used in the present invention may be subjected to a synthesis reaction by adding a compound having three or more acid anhydride groups. Specific examples of the compound having three or more acid anhydride groups include a styrene-maleic anhydride copolymer. With respect to the ratio of the components constituting the styrene-maleic anhydride copolymer, the molar ratio of styrene/maleic anhydride is from 0.5 to 4, preferably from 1 to 3, and more preferably about 1, about 2 or about 3, still more preferably about 1 or about 2, and particularly preferably about 1.
作為苯乙烯-馬來酸酐共聚物之具體例,可列舉川原油化股份有限公司之SMA3000P、SMA2000P、SMA1000P等市售品。該些中特佳的是耐熱性及耐鹼性良好之SMA1000P。Specific examples of the styrene-maleic anhydride copolymer include commercially available products such as SMA3000P, SMA2000P, and SMA1000P of Chuan crude oil processing company. Among these, the SMA1000P is excellent in heat resistance and alkali resistance.
苯乙烯-馬來酸酐共聚物相對於四羧酸二酐、二胺、及多元羥基化合物之合計量100重量份而言較佳的是含有0重量份~500重量份。更佳的是10重量份~300重量份。The styrene-maleic anhydride copolymer preferably contains 0 parts by weight to 500 parts by weight based on 100 parts by weight of the total of the tetracarboxylic dianhydride, the diamine, and the polyvalent hydroxy compound. More preferably, it is 10 parts by weight to 300 parts by weight.
1-1-6. 含有矽之單胺1-1-6. Monoamine containing hydrazine
於聚酯醯胺酸之合成中,亦可於不損及本發明之目的之範圍內視需要包含上述以外之其他原料作為原料,作為此種其他原料之例,可列舉含有矽之單胺。In the synthesis of the polyester valine acid, other raw materials other than the above may be contained as a raw material as needed within the range not impairing the object of the present invention. Examples of such other raw materials include monoamines containing ruthenium.
本發明中所使用之含有矽之單胺之具體例可列舉:3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-胺基丙基甲基二甲氧基矽烷、3-胺基丙基甲基二乙氧基矽烷、4-胺基丁基三甲氧基矽烷、4-胺基丁基三乙氧基矽烷、4-胺基丁基甲基二乙氧基矽烷、對胺基苯基三甲氧基矽烷、對胺基苯基三乙氧基矽烷、對胺基苯基甲基二甲氧基矽烷、對胺基苯基甲基二乙氧基矽烷、間胺基苯基三甲氧基矽烷、及間胺基苯基甲基二乙氧基矽烷。Specific examples of the monoamine containing ruthenium used in the present invention include 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, and 3-aminopropylmethylmethyl Oxydecane, 3-aminopropylmethyldiethoxydecane, 4-aminobutyltrimethoxydecane, 4-aminobutyltriethoxydecane, 4-aminobutylmethyldiethoxylate Base decane, p-aminophenyl trimethoxy decane, p-aminophenyl triethoxy decane, p-aminophenyl methyl dimethoxy decane, p-aminophenyl methyl diethoxy decane, M-aminophenyltrimethoxydecane, and m-aminophenylmethyldiethoxydecane.
該些化合物中較佳的是塗膜之耐酸性良好之3-胺基丙基三乙氧基矽烷、及對胺基苯基三甲氧基矽烷,自耐酸性、相溶性之觀點考慮特佳的是3-胺基丙基三乙氧基矽烷。Preferred among these compounds are 3-aminopropyltriethoxydecane having good acid resistance of the coating film, and p-aminophenyltrimethoxydecane, which is particularly preferable from the viewpoints of acid resistance and compatibility. It is 3-aminopropyltriethoxydecane.
含有矽之單胺相對於四羧酸二酐、二胺、及多元羥基化合物之合計量100重量份而言較佳的是含有0重量份~300重量份。更佳的是5重量份~200重量份。The monoamine containing ruthenium preferably contains 0 parts by weight to 300 parts by weight based on 100 parts by weight of the total of the tetracarboxylic dianhydride, the diamine, and the polyvalent hydroxy compound. More preferably, it is 5 parts by weight to 200 parts by weight.
1-1-7. 聚酯醯胺酸之合成反應中所使用之溶劑1-1-7. Solvent used in the synthesis of polyester proline
用以獲得聚酯醯胺酸之合成反應中所使用之溶劑之具體例可列舉:二乙二醇二甲醚、二乙二醇甲基乙基醚、二乙二醇二乙醚、二乙二醇單乙醚乙酸酯、乙二醇單乙醚乙酸酯、丙二醇單甲醚乙酸酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乳酸乙酯、環己酮、N-甲基-2-吡咯啶酮、及N,N-二甲基乙醯胺。Specific examples of the solvent used in the synthesis reaction for obtaining polyester proline include diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, and diethylene glycol. Alcohol monoethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, ethyl lactate, cyclohexane Ketone, N-methyl-2-pyrrolidone, and N,N-dimethylacetamide.
該些溶劑中較佳的是丙二醇單甲醚乙酸酯、3-甲氧基丙酸甲酯、及二乙二醇甲基乙基醚。Preferred among these solvents are propylene glycol monomethyl ether acetate, methyl 3-methoxypropionate, and diethylene glycol methyl ethyl ether.
該些溶劑可單獨使用或者製成2種以上之混合溶劑而使用。而且,若為30 wt%以下之比例,則亦可混合上述溶劑以外之其他溶劑而使用。These solvents may be used singly or in combination of two or more kinds. Further, when the ratio is 30% by weight or less, other solvents than the above solvents may be used in combination.
1-1-8. 聚酯醯胺酸之合成方法1-1-8. Synthesis method of polyester proline
本發明中所使用之聚酯醯胺酸之合成方法可使四羧酸二酐X莫耳、二胺Y莫耳、及多元羥基化合物Z莫耳於上述溶劑中反應。此時,X、Y及Z較佳的是定為於該些之間使下述式(1)及式(2)之關係成立之比例。若為該範圍,則聚酯醯胺酸於溶劑中之溶解性高,因此組成物之塗佈性提高,結果可獲得平坦性優異之硬化膜。The method for synthesizing the polyester phthalic acid used in the present invention can be carried out by reacting a tetracarboxylic dianhydride X-mole, a diamine Y-mole, and a polyvalent hydroxy compound Z-mol in the above solvent. In this case, it is preferable that X, Y, and Z are ratios at which the relationship between the following formulas (1) and (2) is established. When it is this range, since the solubility of a polyester valine acid in a solvent is high, the coating property of a composition improves, and it is set as the hardening film which is excellent in planarity.
0.2≦Z/Y≦8.0 ……(1)0.2≦Z/Y≦8.0 ......(1)
0.2≦(Y+Z)/X≦1.5 ……(2)0.2≦(Y+Z)/X≦1.5 ......(2)
(1)式之關係較佳的是0.7≦Z/Y≦7.0,更佳的是1.3≦Z/Y≦7.0。而且,(2)式之關係較佳的是0.5≦(Y+Z)/X≦0.9,更佳的是0.7≦(Y+Z)/X≦0.8。The relationship of the formula (1) is preferably 0.7 ≦ Z / Y ≦ 7.0, more preferably 1.3 ≦ Z / Y ≦ 7.0. Further, the relationship of the formula (2) is preferably 0.5 ≦ (Y + Z) / X ≦ 0.9, more preferably 0.7 ≦ (Y + Z) / X ≦ 0.8.
於本發明中所使用之聚酯醯胺酸於分子末端具有酸酐基之情形時,可視需要添加上述1元醇而進行反應。藉由添加1元醇進行反應而獲得之聚酯醯胺酸可改善與環氧樹脂及環氧硬化劑之相溶性,且可改善包含該些化合物之本發明之熱硬化性樹脂組成物之塗佈性。When the polyester glutamic acid used in the present invention has an acid anhydride group at the molecular terminal, the above-mentioned monohydric alcohol may be added as needed to carry out the reaction. The polyester phthalic acid obtained by the reaction of adding a monohydric alcohol can improve the compatibility with the epoxy resin and the epoxy hardener, and can improve the coating of the thermosetting resin composition of the present invention containing the compounds. Cloth.
而且,於使上述之含有矽之單胺與分子末端具有酸酐基之聚酯醯胺酸反應之情形時,所得之塗膜之耐酸性得到改善。另外,亦可使1元醇與含有矽之單胺同時與聚酯醯胺酸反應。Further, in the case where the above monoamine containing ruthenium is reacted with a polyester phthalic acid having an acid anhydride group at the molecular terminal, the acid resistance of the obtained coating film is improved. Alternatively, the monohydric alcohol may be reacted with the polyester proline at the same time as the monoamine containing hydrazine.
反應溶劑若相對於四羧酸二酐、二胺及多元羥基化合物之合計100重量份而使用100重量份以上,則反應順利地進行,因此較佳。反應較佳的是於40℃~200℃下反應0.2小時~20小時。於使含有矽之單胺反應之情形時,於四羧酸二酐與二胺及多元羥基化合物之反應結束後,將反應液冷卻至40℃以下後,添加含有矽之單胺,於10℃~40℃下進行0.1小時~6小時之反應即可。而且,1元醇可於反應之任意時間點添加。When the reaction solvent is used in an amount of 100 parts by weight or more based on 100 parts by weight of the total of the tetracarboxylic dianhydride, the diamine and the polyvalent hydroxy compound, the reaction proceeds smoothly, which is preferable. The reaction is preferably carried out at 40 ° C to 200 ° C for 0.2 to 20 hours. When the reaction of the monoamine containing ruthenium is carried out, after the reaction of the tetracarboxylic dianhydride with the diamine and the polyvalent hydroxy compound is completed, the reaction solution is cooled to 40 ° C or lower, and then the monoamine containing ruthenium is added at 10 ° C. The reaction may be carried out at -40 ° C for 0.1 to 6 hours. Moreover, the monohydric alcohol can be added at any point in the reaction.
作為反應原料於反應系中之添加順序,並無特別限定。亦即,可使用將四羧酸二酐與二胺及多元羥基化合物同時添加於反應溶劑中;使二胺及多元羥基化合物溶解於反應溶劑中之後,添加四羧酸二酐;使四羧酸二酐與多元羥基化合物預先反應後,於其反應生成物中添加二胺;或者使四羧酸二酐與二胺預先反應後,於其反應生成物中添加多元羥基化合物等任意方法。The order of addition of the reaction raw material to the reaction system is not particularly limited. That is, tetracarboxylic dianhydride, a diamine, and a polyhydric hydroxy compound may be simultaneously added to the reaction solvent; after dissolving the diamine and the polyhydric hydroxy compound in the reaction solvent, tetracarboxylic dianhydride is added; After the dianhydride and the polyvalent hydroxy compound are reacted in advance, a diamine is added to the reaction product, or a tetracarboxylic dianhydride and a diamine are previously reacted, and then a method such as a polyvalent hydroxy compound is added to the reaction product.
較佳的是如此而合成之聚酯醯胺酸包含由所述通式(3)及通式(4)所構成之結構單元,其末端是源自作為原料之四羧酸二酐、二胺或多元羥基化合物之酸酐基、胺基或羥基基,或者該些化合物以外之添加物構成其末端。於通式(3)及通式(4)中,R1 是四羧酸二酐殘基,較佳的是碳數為2~30之有機基。R2 是二胺殘基,較佳的是碳數為2~30之有機基。R3 是多元羥基化合物殘基,較佳的是碳數為2~20之有機基。Preferably, the polyester phthalic acid thus synthesized comprises a structural unit composed of the general formula (3) and the general formula (4), and the terminal is derived from a tetracarboxylic dianhydride or a diamine as a raw material. Or an acid anhydride group, an amine group or a hydroxyl group of a polyvalent hydroxy compound, or an additive other than the compounds, constitutes the terminal. In the general formula (3) and the general formula (4), R 1 is a tetracarboxylic dianhydride residue, and preferably an organic group having 2 to 30 carbon atoms. R 2 is a diamine residue, preferably an organic group having 2 to 30 carbon atoms. R 3 is a residue of a polyvalent hydroxy compound, preferably an organic group having 2 to 20 carbon atoms.
所得之聚酯醯胺酸之重量平均分子量較佳的是1,000~200,000,更佳的是3,000~50,000。若為該些範圍內,則平坦性及耐熱性變良好。The weight average molecular weight of the obtained polyester glutamic acid is preferably from 1,000 to 200,000, more preferably from 3,000 to 50,000. If it is in these ranges, flatness and heat resistance will become favorable.
本說明書中之重量平均分子量是藉由凝膠滲透層析(gel permeation chromatography,GPC)法(管柱溫度為35℃、流速為1 ml/min)而求出之聚苯乙烯換算之值。標準聚苯乙烯使用分子量為645~132900之聚苯乙烯(例如VARIAN公司之聚苯乙烯校準套組PL2010-0102),管柱使用PLgel MIXED-D(VARIAN公司),流動相使用四氫呋喃(THF)而進行測定。另外,本說明書中之市售品之重量平均分子量是目錄刊登值。The weight average molecular weight in the present specification is a value obtained by a gel permeation chromatography (GPC) method (column temperature: 35 ° C, flow rate: 1 ml/min). Standard polystyrene uses polystyrene with a molecular weight of 645 to 132,900 (for example, VARIAN polystyrene calibration kit PL2010-0102), column for PLgel MIXED-D (VARIAN), and mobile phase for tetrahydrofuran (THF). The measurement was carried out. In addition, the weight average molecular weight of the commercial item in this specification is a catalogue value.
1-2. 環氧樹脂1-2. Epoxy resin
本發明中所使用之環氧樹脂可藉由以(甲基)丙烯酸縮水甘油酯與2官能(甲基)丙烯酸酯為必需之原料成分進行反應而獲得。環氧樹脂若與形成本發明之熱硬化性樹脂組成物之其他成分之相溶性良好則並無特別限定。而且,與(甲基)丙烯酸縮水甘油酯反應之2官能(甲基)丙烯酸酯可為1種亦可為2種以上。The epoxy resin used in the present invention can be obtained by reacting a glycidyl (meth)acrylate with a bifunctional (meth) acrylate as a raw material component. The epoxy resin is not particularly limited as long as it has good compatibility with the other components forming the thermosetting resin composition of the present invention. Further, the bifunctional (meth) acrylate which is reacted with glycidyl (meth)acrylate may be one type or two or more types.
使用藉由使(甲基)丙烯酸縮水甘油酯與其他自由基聚合性單體反應而獲得之環氧樹脂,由熱硬化性樹脂組成物獲得之硬化膜之透明性變高,可抑制於紫外線臭氧處理步驟或紫外線曝光步驟中之透明性降低,因此較佳。自平坦性、耐熱性、耐化學品性之觀點考慮,較佳的是(甲基)丙烯酸縮水甘油酯於構成環氧樹脂之所有單體中含有50 wt%~99 wt%。When an epoxy resin obtained by reacting glycidyl (meth)acrylate with another radical polymerizable monomer is used, the transparency of the cured film obtained from the thermosetting resin composition becomes high, and it can be suppressed to ultraviolet ozone. The transparency in the treatment step or the ultraviolet exposure step is lowered, and therefore it is preferred. From the viewpoints of flatness, heat resistance, and chemical resistance, it is preferred that glycidyl (meth)acrylate contains 50 wt% to 99 wt% of all monomers constituting the epoxy resin.
作為其他自由基聚合性單體,若使用單官能(甲基)丙烯酸酯,則由熱硬化性樹脂組成物獲得之硬化膜之耐熱性、耐化學品性不足,若使用3官能以上之多官能(甲基)丙烯酸酯,則平坦性不足,與聚酯醯胺酸之相溶性變差,因此較佳的是2官能(甲基)丙烯酸酯。When a monofunctional (meth) acrylate is used as the other radical polymerizable monomer, the heat-resistant film and the chemical resistance of the cured film obtained from the thermosetting resin composition are insufficient, and a trifunctional or higher polyfunctional group is used. When (meth) acrylate is insufficient in flatness and the compatibility with polyester phthalic acid is deteriorated, a bifunctional (meth) acrylate is preferable.
2官能(甲基)丙烯酸酯之較佳例可列舉:乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,3-丁二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯。該些化合物與藉由與(甲基)丙烯酸縮水甘油酯反應而獲得之環氧樹脂之聚酯醯胺酸的相溶性變良好,因此較佳。自平坦性、耐熱性、耐化學品性之觀點考慮,較佳的是2官能(甲基)丙烯酸酯於構成環氧樹脂之所有單體中含有1 wt%~30 wt%。Preferable examples of the bifunctional (meth) acrylate include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, and 1,4-butanediol di(methyl). Acrylate, 1,3-butanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate. These compounds are preferred because they have good compatibility with the polyester phthalic acid of the epoxy resin obtained by the reaction with glycidyl (meth)acrylate. From the viewpoint of flatness, heat resistance, and chemical resistance, it is preferred that the bifunctional (meth) acrylate contains 1 wt% to 30 wt% of all the monomers constituting the epoxy resin.
所述環氧樹脂亦可包含(甲基)丙烯酸縮水甘油酯與2官能(甲基)丙烯酸酯以外之自由基聚合性單體作為原料成分。自不損及本發明之效果地表現所述其他自由基聚合性單體之特性的觀點考慮,較佳的是此種其他之自由基聚合性單體含有0 wt%~20 wt%。The epoxy resin may further contain, as a raw material component, a glycidyl (meth)acrylate and a radical polymerizable monomer other than a bifunctional (meth) acrylate. From the viewpoint of exhibiting the characteristics of the other radical polymerizable monomer without impairing the effects of the present invention, it is preferred that the other radical polymerizable monomer contains 0 wt% to 20 wt%.
藉由以(甲基)丙烯酸縮水甘油酯與2官能(甲基)丙烯酸酯為必需之原料成分進行反應而獲得之環氧樹脂之重量平均分子量較佳的是1,000~50,000,更佳的是3,000~20,000。若分子量處於該些範圍內,則獲得充分之平坦性、耐熱性、耐化學品性。The weight average molecular weight of the epoxy resin obtained by reacting glycidyl (meth)acrylate with a bifunctional (meth) acrylate as an essential raw material component is preferably 1,000 to 50,000, more preferably 3,000. ~20,000. When the molecular weight is within these ranges, sufficient flatness, heat resistance, and chemical resistance are obtained.
1-2-1. 環氧樹脂之合成反應中所使用之溶劑1-2-1. Solvent used in the synthesis of epoxy resin
於環氧樹脂之合成中至少必需使用溶劑。It is necessary to use at least a solvent in the synthesis of the epoxy resin.
用以獲得環氧樹脂之聚合反應中所使用之溶劑之具體例可列舉:二乙二醇二甲醚、二乙二醇甲基乙基醚、二乙二醇二乙醚、二乙二醇單乙醚乙酸酯、乙二醇單乙醚乙酸酯、丙二醇單甲醚乙酸酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乳酸乙酯、環己酮、N-甲基-2-吡咯啶酮、及N,N-二甲基乙醯胺。Specific examples of the solvent used in the polymerization reaction for obtaining an epoxy resin include diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, and diethylene glycol single. Ethyl acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, ethyl lactate, cyclohexanone, N-methyl-2-pyrrolidone, and N,N-dimethylacetamide.
該些溶劑中較佳的是丙二醇單甲醚乙酸酯、3-甲氧基丙酸甲酯、及二乙二醇甲基乙基醚。Preferred among these solvents are propylene glycol monomethyl ether acetate, methyl 3-methoxypropionate, and diethylene glycol methyl ethyl ether.
該些溶劑可單獨使用,或者製成2種以上之混合溶劑而使用。而且,若為30 wt%以下之比例,則可混合上述溶劑以外之其他溶劑而使用。These solvents may be used singly or in combination of two or more kinds. Further, when the ratio is 30% by weight or less, a solvent other than the above solvent may be used in combination.
1-2-2. 環氧樹脂之合成方法1-2-2. Synthesis method of epoxy resin
本發明中所使用之環氧樹脂之合成方法並無特別限制,較佳的是於使用溶劑之溶液中之自由基聚合。如果反應溶劑相對於(甲基)丙烯酸縮水甘油酯、2官能(甲基)丙烯酸酯、及其他自由基聚合性單體之合計100重量份而言使用100重量份以上,則反應順利地進行,因此較佳。聚合溫度若為由所使用之聚合起始劑充分產生自由基之溫度則並無特別限定,通常為50℃~150℃之範圍。聚合時間亦無特別限定,通常為1小時~24小時之範圍。而且,該聚合可於加壓、減壓或大氣壓之任意壓力下進行。The method for synthesizing the epoxy resin used in the present invention is not particularly limited, and is preferably a radical polymerization in a solution using a solvent. When the reaction solvent is used in an amount of 100 parts by weight or more based on 100 parts by weight of the total of the glycidyl (meth)acrylate, the bifunctional (meth) acrylate, and the other radical polymerizable monomer, the reaction proceeds smoothly. Therefore, it is preferred. The polymerization temperature is not particularly limited as long as the radical is sufficiently generated by the polymerization initiator to be used, and is usually in the range of 50 ° C to 150 ° C. The polymerization time is also not particularly limited, but is usually in the range of from 1 hour to 24 hours. Moreover, the polymerization can be carried out under any pressure of pressure, reduced pressure or atmospheric pressure.
環氧樹脂之合成中可使用公知之聚合起始劑。所述聚合起始劑可列舉:由於熱而產生自由基之化合物、偶氮雙異丁腈等偶氮系起始劑、及過氧化苯甲醯等過氧化物系起始劑。於所述自由基聚合反應中,為了調節所生成之共聚物之分子量,亦可適宜添加硫代乙醇酸等鏈轉移劑。A known polymerization initiator can be used in the synthesis of the epoxy resin. Examples of the polymerization initiator include a compound which generates a radical due to heat, an azo initiator such as azobisisobutyronitrile, and a peroxide initiator such as benzophenone peroxide. In the radical polymerization reaction, a chain transfer agent such as thioglycolic acid may be appropriately added in order to adjust the molecular weight of the copolymer to be produced.
本發明中所使用之環氧樹脂可使合成中所使用之溶劑保持殘留而製成考慮了操作性等之環氧樹脂溶液,亦可將該溶劑除去而製成考慮了搬運性等之固形狀之環氧樹脂。The epoxy resin used in the present invention can be used to form an epoxy resin solution in consideration of operability and the like, and the solvent can be removed to obtain a solid shape in consideration of handling properties and the like. Epoxy resin.
1-3. 環氧硬化劑1-3. Epoxy hardener
於本發明之熱硬化性樹脂組成物中,為了使平坦性、耐化學品性提高,亦可添加環氧硬化劑。環氧硬化劑存在有酸酐系硬化劑、胺系硬化劑、酚系硬化劑、及觸媒型硬化劑等,自著色及耐熱性之方面考慮,較佳的是酸酐系硬化劑。In the thermosetting resin composition of the present invention, an epoxy curing agent may be added in order to improve flatness and chemical resistance. The epoxy resin is an acid anhydride-based curing agent, an amine-based curing agent, a phenol-based curing agent, and a catalyst-type curing agent. From the viewpoint of coloring and heat resistance, an acid anhydride-based curing agent is preferred.
酸酐系硬化劑之具體例可列舉以下者:脂肪族二羧酸酐,例如馬來酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、六氫偏苯三酸酐;芳香族多元羧酸酐,例如鄰苯二甲酸酐、偏苯三酸酐;苯乙烯-馬來酸酐共聚物。自耐熱性與對溶劑之溶解性之平衡之方面而言,該些化合物中特佳的是偏苯三酸酐、六氫偏苯三酸酐。Specific examples of the acid anhydride-based curing agent include aliphatic dicarboxylic anhydrides such as maleic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, and six. Hydrogen trimellitic anhydride; aromatic polycarboxylic acid anhydrides such as phthalic anhydride, trimellitic anhydride; styrene-maleic anhydride copolymers. Particularly preferred among these compounds are trimellitic anhydride and hexahydrotrimellitic anhydride in terms of the balance between heat resistance and solubility in a solvent.
1-4. 聚酯醯胺酸、環氧樹脂、環氧硬化劑之比例1-4. Proportion of polyester proline, epoxy resin and epoxy hardener
於本發明之熱硬化性樹脂組成物中,環氧樹脂相對於聚酯醯胺酸100重量份之比例為20重量份~400重量份。若環氧樹脂之比例為該範圍,則平坦性、耐熱性、耐化學品性、密接性之平衡良好。更佳的是環氧樹脂為50重量份~300重量份之範圍。In the thermosetting resin composition of the present invention, the ratio of the epoxy resin to 100 parts by weight of the polyester phthalic acid is 20 parts by weight to 400 parts by weight. When the ratio of the epoxy resin is in this range, the balance between flatness, heat resistance, chemical resistance, and adhesion is good. More preferably, the epoxy resin is in the range of 50 parts by weight to 300 parts by weight.
於以平坦性、耐化學品性之提高為目的而添加環氧硬化劑之情形時,作為環氧樹脂與環氧硬化劑之比例,相對於環氧樹脂100重量份而言,環氧硬化劑為0重量份~60重量份。關於環氧硬化劑之添加量,更詳細而言,較佳的是以相對於環氧基而言環氧硬化劑中之羧酸酐基或羧基成為0.1倍當量~1.5倍當量之方式進行添加。此時,羧酸酐基以2價進行計算。若以羧酸酐基或羧基成為0.15倍當量~0.8倍當量之方式進行添加,則耐化學品性進一步提高,因此更佳。In the case where an epoxy curing agent is added for the purpose of improving flatness and chemical resistance, the ratio of the epoxy resin to the epoxy curing agent is an epoxy curing agent relative to 100 parts by weight of the epoxy resin. It is 0 parts by weight to 60 parts by weight. More specifically, the amount of the epoxy curing agent to be added is preferably 0.1 to 1.5 equivalents per equivalent of the carboxylic anhydride group or the carboxyl group in the epoxy curing agent with respect to the epoxy group. At this time, the carboxylic anhydride group was calculated at a divalent value. When the carboxylic anhydride group or the carboxyl group is added in an amount of from 0.15 equivalents to 0.8 equivalents, the chemical resistance is further improved, which is more preferable.
1-5. 熱硬化性樹脂組成物之其他構成材料1-5. Other constituent materials of the thermosetting resin composition
作為本發明之樹脂組成物中所使用之溶劑,可直接使用於合成聚酯醯胺酸、及環氧樹脂時之聚合反應中所使用之溶劑。上述熱硬化性樹脂組成物之固形物濃度可根據塗膜之膜厚而選擇,一般情況下於該樹脂組成物100重量份中包含5重量份~50重量份之範圍。另外,溶劑之量可與樹脂組成物之操作等問題相關聯地適宜決定。亦可視情況例如為自樹脂組成物中除去溶劑而成為固形狀態之樹脂組成物。The solvent used in the resin composition of the present invention can be used as it is in the polymerization reaction for synthesizing polyester phthalic acid and epoxy resin. The solid content concentration of the thermosetting resin composition can be selected according to the film thickness of the coating film, and is usually in the range of 5 parts by weight to 50 parts by weight based on 100 parts by weight of the resin composition. Further, the amount of the solvent can be appropriately determined in association with problems such as the operation of the resin composition. In some cases, for example, a resin composition in which a solvent is removed from the resin composition to form a solid state may be used.
本發明之熱硬化性樹脂組成物可於不損及本發明之目的之範圍內視需要含有上述以外之其他成分。此種其他成分可列舉:偶合劑、界面活性劑、抗氧化劑、硬化促進劑、熱敏性酸產生劑等。而且,於聚酯醯胺酸並不含有苯乙烯-馬來酸酐共聚物作為原料之情形時,亦可添加苯乙烯-馬來酸酐共聚物作為其他成分。The thermosetting resin composition of the present invention may contain other components than those described above as needed within the range not impairing the object of the present invention. Examples of such other components include a coupling agent, a surfactant, an antioxidant, a curing accelerator, and a heat-sensitive acid generator. Further, when the polyester phthalic acid does not contain a styrene-maleic anhydride copolymer as a raw material, a styrene-maleic anhydride copolymer may be added as another component.
偶合劑是用以使與基板之密接性提高者,相對於上述熱硬化性樹脂組成物之固形物100重量份(自該樹脂組成物中除去溶劑之剩餘成分)而言添加10重量份以下而使用。The coupling agent is used to increase the adhesion to the substrate, and is added in an amount of 10 parts by weight or less based on 100 parts by weight of the solid matter of the thermosetting resin composition (remaining component from which the solvent is removed from the resin composition). use.
偶合劑可使用矽烷系、鋁系及鈦酸酯系之化合物。As the coupling agent, a compound of a decane type, an aluminum type, and a titanate type can be used.
具體而言可列舉:乙烯基三氯矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、3-縮水甘油氧基丙基二甲基乙氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、及3-甲基丙烯醯氧基丙基三乙氧基矽烷等矽烷系,乙醯基烷氧基二異丙醇鋁等鋁系,以及四異丙基雙(二辛基亞磷酸酯)鈦酸酯等鈦酸酯系。於該些偶合劑中,3-縮水甘油氧基丙基三甲氧基矽烷之使密接性提高之效果大,因此較佳。Specific examples thereof include vinyl trichloromethane, vinyl trimethoxy decane, vinyl triethoxy decane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxy decane, and 3-condensed water. Glycidoxypropyl dimethyl ethoxy decane, 3-glycidoxy propyl methyl diethoxy decane, 3-glycidoxy propyl triethoxy decane, 3-glycidoxy propyl Trimethoxy decane, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-methylpropenyloxypropyltrimethoxydecane, and 3-methylpropene a decane system such as methoxypropyltriethoxy decane, an aluminum system such as acetamino alkoxydiisopropyl aluminum or a titanate such as tetraisopropylbis(dioctylphosphite) titanate system. Among these coupling agents, 3-glycidoxypropyltrimethoxydecane is preferred because it has a large effect of improving the adhesion.
界面活性劑是用以使對基底基板之濕潤性、勻化性、或塗佈性提高者,相對於上述熱硬化性樹脂組成物100重量份而言,添加0.01重量份~1重量份而使用。The surfactant is used to increase the wettability, the homogenization property, or the coating property of the base substrate, and is added in an amount of 0.01 part by weight to 1 part by weight based on 100 parts by weight of the thermosetting resin composition. .
此種界面活性劑可列舉:Polyflow No.45、Polyflow KL-245、Polyflow No.75、Polyflow No.90、Polyflow No.95(以上均為商品名、共榮社化學股份有限公司)、Disperbyk 161、Disperbyk 162、Disperbyk 163、Disperbyk 164、Disperbyk 166、Disperbyk 170、Disperbyk 180、Disperbyk 181、Disperbyk 182、BYK-300、BYK-306、BYK-310、BYK-320、BYK-330、BYK-344、BYK-346、BYK-UV3500、BYK-UV3570(以上均為商品名、BYK-CHEMIE JAPAN K.K.)、KP-341、KP-358、KP-368、KF-96-50CS、KF-50-100CS(以上均為商品名、信越化學工業股份有限公司)、Surflon SC-101、Surflon KH-40(以上均為商品名、AGC清美化學股份有限公司)、Ftergent 222F、Ftergent 251、FTX-218(以上均為商品名、Neos股份有限公司)、EFTOP EF-351、EFTOP EF-352、EFTOP EF-601、EFTOP EF-801、EFTOP EF-802(以上均為商品名、三菱綜合材料股份有限公司)、Megafac F-410、Megafac F-430、Megafac F-444、Megafac F-472SF、Megafac F-475、Megafac F-477、Megafac F-552、Megafac F-553、Megafac F-554、Megafac F-555、Megafac F-556、Megafac F-558、Megafac R-94、Megafac RS-75、Megafac RS-72-K(以上均為商品名、DIC股份有限公司)、TEGO Rad 2200N、TEGO Rad 2250N(以上均為商品名、Evonik Degussa Japan Co.,Ltd.)。Examples of such a surfactant include Polyflow No. 45, Polyflow KL-245, Polyflow No. 75, Polyflow No. 90, and Polyflow No. 95 (all of which are trade names, Kyoeisha Chemical Co., Ltd.), and Disperbyk 161. , Disperbyk 162, Disperbyk 163, Disperbyk 164, Disperbyk 166, Disperbyk 170, Disperbyk 180, Disperbyk 181, Disperbyk 182, BYK-300, BYK-306, BYK-310, BYK-320, BYK-330, BYK-344, BYK -346, BYK-UV3500, BYK-UV3570 (all of which are trade names, BYK-CHEMIE JAPAN KK), KP-341, KP-358, KP-368, KF-96-50CS, KF-50-100CS (above For the trade name, Shin-Etsu Chemical Co., Ltd.), Surflon SC-101, Surflon KH-40 (all of which are trade names, AGC Qingmei Chemical Co., Ltd.), Ftergent 222F, Ftergent 251, FTX-218 (all of which are commodities) Name, Neos Co., Ltd.), EFTOP EF-351, EFTOP EF-352, EFTOP EF-601, EFTOP EF-801, EFTOP EF-802 (all of which are trade names, Mitsubishi Materials Co., Ltd.), Megafac F- 410, Megafac F-430, Megafac F-444, Megafac F-472SF, Megafac F-475, Megafac F-477, Meg Afac F-552, Megafac F-553, Megafac F-554, Megafac F-555, Megafac F-556, Megafac F-558, Megafac R-94, Megafac RS-75, Megafac RS-72-K (all above Trade name, DIC Co., Ltd.), TEGO Rad 2200N, TEGO Rad 2250N (all of which are trade names, Evonik Degussa Japan Co., Ltd.).
本發明中所使用之界面活性劑可為1種化合物,亦可為2種以上化合物之混合物。The surfactant used in the present invention may be one type of compound or a mixture of two or more types of compounds.
抗氧化劑是用以使透明性提高,防止硬化膜暴露於高溫下之情形時之黃化者,相對於上述熱硬化性樹脂組成物之固形物100重量份(自該樹脂組成物中除去溶劑後之殘留成分)而言,添加0.1重量份~5重量份而使用。The antioxidant is used to improve the transparency and prevent yellowing of the cured film when exposed to a high temperature, and 100 parts by weight of the solid matter of the thermosetting resin composition (after removing the solvent from the resin composition) The residual component) is used by adding 0.1 part by weight to 5 parts by weight.
作為抗氧化劑,可使用受阻胺系、受阻酚系等。具體而言可列舉:IRGAFOS XP40、IRGAFOS XP60、IRGANOX 1010、IRGANOX 1035、IRGANOX 1076、IRGANOX 1135、IRGANOX 1520L(商品名;BASF Japan股份有限公司)等。As the antioxidant, a hindered amine system, a hindered phenol system or the like can be used. Specific examples include IRGAFOS XP40, IRGAFOS XP60, IRGANOX 1010, IRGANOX 1035, IRGANOX 1076, IRGANOX 1135, IRGANOX 1520L (trade name; BASF Japan Co., Ltd.) and the like.
硬化促進劑是用以促進環氧樹脂與環氧硬化劑之反應,提高硬化膜之耐熱性、耐化學品性者,相對於上述熱硬化性樹脂組成物之固形物100重量份(自該樹脂組成物中除去溶劑後之殘留成分)而言,添加0.01重量份~5重量份而使用。The curing accelerator is used to promote the reaction between the epoxy resin and the epoxy curing agent, and to improve the heat resistance and chemical resistance of the cured film, and 100 parts by weight of the solid matter of the thermosetting resin composition (from the resin) The residual component after removing the solvent in the composition is added in an amount of 0.01 part by weight to 5 parts by weight.
作為硬化促進劑,若為具有促進環氧樹脂與環氧硬化劑之反應的功能之硬化促進劑,則可使用任意種,可列舉咪唑系硬化促進劑、膦系硬化促進劑、銨系硬化促進劑、路易士酸系硬化促進劑等作為其例。Any curing agent which has a function of promoting the reaction between the epoxy resin and the epoxy curing agent can be used as the curing accelerator, and examples thereof include an imidazole curing accelerator, a phosphine curing accelerator, and an ammonium hardening accelerator. A reagent, a Lewis acid hardening accelerator, and the like are exemplified.
熱敏性酸產生劑是即使於不足200℃之低溫硬化條件下使用本發明之熱硬化性樹脂組成物之情形時,亦可賦予硬化膜充分之硬度與耐化學品性者,相對於上述熱硬化性樹脂組成物之固形物100重量份(自該樹脂組成物中除去溶劑後之殘留成分)而言,添加0.001重量份~3重量份而使用。In the case where the thermosetting resin composition of the present invention is used under low-temperature curing conditions of less than 200 ° C, the heat-sensitive acid generator can impart sufficient hardness and chemical resistance to the cured film, and the above-mentioned thermosetting property. 100 parts by weight of the solid content of the resin composition (residual component obtained by removing the solvent from the resin composition) is used by adding 0.001 part by weight to 3 parts by weight.
熱敏性酸產生劑可列舉鋶鹽、苯并噻唑啉鹽、銨鹽、鏻鹽等作為其例。Examples of the heat-sensitive acid generator include an onium salt, a benzothiazoline salt, an ammonium salt, a phosphonium salt and the like.
2. 由熱硬化性樹脂組成物獲得之硬化膜2. A cured film obtained from a thermosetting resin composition
本發明之熱硬化性樹脂組成物可藉由將聚酯醯胺酸及環氧樹脂加以混合,根據目標特性而進一步視需要選擇添加溶劑、環氧硬化劑、偶合劑、界面活性劑、及其他添加劑,使該些化合物均勻地混合溶解而獲得。The thermosetting resin composition of the present invention can be further selected by adding a solvent, an epoxy hardener, a coupling agent, a surfactant, and the like according to a target characteristic by mixing a polyester phthalic acid and an epoxy resin. An additive is obtained by uniformly mixing and dissolving the compounds.
將如上所述而調製之熱硬化性樹脂組成物(於無溶劑之固形狀態之情形時使其溶解於溶劑中之後)塗佈於基板表面上,藉由例如加熱等而將溶劑除去,則可形成塗膜。於基板表面之熱硬化性樹脂組成物之塗佈可藉由旋塗法、輥塗法、浸鍍法、及狹縫塗佈法等自先前公知之方法而形成塗膜。其次,藉由加熱板或烘箱等對該塗膜進行加熱(預烘烤)。加熱條件因各成分之種類及調配比例而異,通常於70℃~150℃下,若為烘箱則進行5分鐘~15分鐘,若為加熱板則進行1分鐘~5分鐘。其後,為了使塗膜硬化,於180℃~250℃、較佳的是200℃~250℃下,若為烘箱則進行30分鐘~90分鐘之加熱處理,若為加熱板,則進行5分鐘~30分鐘之加熱處理,藉此可獲得硬化膜。The thermosetting resin composition prepared as described above (after being dissolved in a solvent in a solid state without a solvent) is applied onto the surface of the substrate, and the solvent is removed by, for example, heating. A coating film is formed. The coating of the thermosetting resin composition on the surface of the substrate can be formed by a conventionally known method such as a spin coating method, a roll coating method, a dip plating method, or a slit coating method. Next, the coating film is heated (prebaked) by a hot plate or an oven or the like. The heating conditions vary depending on the type of each component and the blending ratio, and are usually from 70 ° C to 150 ° C for 5 minutes to 15 minutes in the case of an oven, and from 1 minute to 5 minutes in the case of a hot plate. Thereafter, in order to cure the coating film, at 180 ° C to 250 ° C, preferably 200 ° C to 250 ° C, if it is an oven, heat treatment is performed for 30 minutes to 90 minutes, and if it is a hot plate, it is performed for 5 minutes. Heat treatment for ~30 minutes, whereby a cured film can be obtained.
如此而獲得之硬化膜於加熱時,1)聚酯醯胺酸之聚醯胺酸部分脫水環化而形成醯亞胺鍵,2)聚酯醯胺酸之羧酸與環氧樹脂反應而高分子量化、及3)環氧樹脂硬化而高分子量化,因此非常強韌,且透明性、耐熱性、耐化學品性、平坦性、密接性、耐光性、及耐濺鍍性優異。因此,本發明之硬化膜可有效地用作彩色濾光片用保護膜,可使用該彩色濾光片而製造液晶顯示元件或固體攝影元件。而且,本發明之硬化膜除了彩色濾光片用保護膜以外,可有效地用作TFT與透明電極間所形成之透明絕緣膜或透明電極與配向膜間所形成之透明絕緣膜。另外,本發明之硬化膜亦有效地用作LED發光體之保護膜。When the cured film thus obtained is heated, 1) the polyamic acid of the polyester phthalic acid is partially dehydrated and cyclized to form a quinone bond, and 2) the carboxylic acid of the polyester phthalic acid is reacted with the epoxy resin and is high. Since the molecular weight is increased, and 3) the epoxy resin is cured and polymerized, it is very strong, and is excellent in transparency, heat resistance, chemical resistance, flatness, adhesion, light resistance, and sputtering resistance. Therefore, the cured film of the present invention can be effectively used as a protective film for a color filter, and a color filter can be used to manufacture a liquid crystal display element or a solid-state imaging element. Further, the cured film of the present invention can be effectively used as a transparent insulating film formed between a TFT and a transparent electrode or a transparent insulating film formed between a transparent electrode and an alignment film, in addition to a protective film for a color filter. Further, the cured film of the present invention is also effectively used as a protective film for an LED illuminator.
[實例][Example]
其次,藉由合成例、實例及比較例對本發明加以具體說明,但本發明並不受該些實例任何限定。Next, the present invention will be specifically described by way of Synthesis Examples, Examples and Comparative Examples, but the present invention is not limited by the examples.
首先,以如下所示之方式合成包含四羧酸二酐、二胺、多元羥基化合物之反應生成物的聚酯醯胺酸溶液(合成例1、合成例2,表1)。First, a polyester proline solution containing a reaction product of tetracarboxylic dianhydride, diamine, and a polyvalent hydroxy compound was synthesized as follows (Synthesis Example 1, Synthesis Example 2, Table 1).
[合成例1]聚酯醯胺酸溶液(A1)之合成[Synthesis Example 1] Synthesis of polyester proline solution (A1)
於具有溫度計、攪拌機、原料投入口及氮氣導入口之1000 ml之四口燒瓶中裝入脫水純化之3-甲氧基丙酸甲酯(以下簡稱為「MMP」)446.96 g、1,4-丁二醇31.93 g、苯甲醇25.54 g、3,3',4,4'-二苯基醚四甲酸二酐(以下簡稱為「ODPA」)183.20 g,於乾燥氮氣流下、130℃下攪拌3小時。其後,將反應液冷卻至25℃,投入3,3'-二胺基二苯基碸(以下簡稱為「DDS」)29.33 g、MMP 183.04 g,於20℃~30℃下攪拌2小時後,於115℃下攪拌1小時,冷卻至30℃以下,藉此而獲得淡黃色透明之聚酯醯胺酸之30 wt%溶液(A1)。The dehydrated purified methyl 3-methoxypropionate (hereinafter referred to as "MMP") was charged into a four-necked flask of 1000 ml having a thermometer, a stirrer, a raw material inlet, and a nitrogen inlet, and 446.96 g, 1,4- 31.93 g of butanediol, 25.54 g of benzyl alcohol, 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride (hereinafter referred to as "ODPA") 183.20 g, stirred under a dry nitrogen stream at 130 ° C 3 hour. Thereafter, the reaction liquid was cooled to 25 ° C, and 29.3 g of 3,3'-diaminodiphenyl hydrazine (hereinafter abbreviated as "DDS") and 183.04 g of MMP were charged, and the mixture was stirred at 20 ° C to 30 ° C for 2 hours. The mixture was stirred at 115 ° C for 1 hour and cooled to 30 ° C or lower, whereby a 30 wt% solution (A1) of pale yellow transparent polyester phthalic acid was obtained.
該溶液之旋轉黏度為28.5 mPa‧s。而且,藉由GPC而測定之重量平均分子量為4,200(聚苯乙烯換算)。The solution has a rotational viscosity of 28.5 mPa ‧ s. Further, the weight average molecular weight measured by GPC was 4,200 (in terms of polystyrene).
此處,本說明書中之旋轉黏度是使用E型黏度計(商品名為VISCONIC END、東京計器股份有限公司)而於25℃下測定之黏度。Here, the rotational viscosity in the present specification is a viscosity measured at 25 ° C using an E-type viscometer (trade name: VISCONIC END, Tokyo Keiki Co., Ltd.).
[合成例2]聚酯醯胺酸溶液(A2)之合成[Synthesis Example 2] Synthesis of polyester proline solution (A2)
於具有溫度計、攪拌機、原料投入口及氮氣導入口之1000 ml之四口燒瓶中依序裝入脫水純化之丙二醇單甲醚乙酸酯(以下簡稱為「PGMEA」)504.00 g、ODPA 47.68 g、SMA1000P(商品名;苯乙烯-馬來酸酐共聚物、川原油化股份有限公司)144.97 g、苯甲醇55.40 g、1,4-丁二醇9.23 g、脫水純化之二乙二醇甲基乙基醚(以下簡稱為「EDM」)96.32 g,於乾燥氮氣流下、130℃下攪拌3小時。其後,將反應液冷卻至25℃,投入DDS 12.72 g、EDM 29.68 g,於20℃~30℃下攪拌2小時後,於115℃下攪拌1小時,冷卻至30℃以下,藉此獲得淡黃色透明之聚酯醯胺酸之30 wt%溶液(A2)。Dehydrated and purified propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA") 504.00 g, ODPA 47.68 g, was placed in a 1000 ml four-necked flask equipped with a thermometer, a stirrer, a raw material inlet, and a nitrogen inlet. SMA1000P (trade name; styrene-maleic anhydride copolymer, Sichuan Crude Oil Co., Ltd.) 144.97 g, benzyl alcohol 55.40 g, 1,4-butanediol 9.23 g, dehydrated purified diethylene glycol methyl ethyl Ether (hereinafter abbreviated as "EDM") 96.32 g was stirred at 130 ° C for 3 hours under a stream of dry nitrogen. Thereafter, the reaction liquid was cooled to 25 ° C, and 12.72 g of DDS and 29.68 g of EDM were charged, and the mixture was stirred at 20 ° C to 30 ° C for 2 hours, and then stirred at 115 ° C for 1 hour, and cooled to 30 ° C or lower. A 30 wt% solution of yellow transparent polyester proline (A2).
該溶液之旋轉黏度為36.2 mPa‧s,藉由GPC而測定之重量平均分子量為21,000(聚苯乙烯換算)。The rotary viscosity of this solution was 36.2 mPa·s, and the weight average molecular weight measured by GPC was 21,000 (in terms of polystyrene).
MMP:3-甲氧基丙酸甲酯MMP: methyl 3-methoxypropionate
ODPA:3,3',4,4'-二苯基醚四甲酸二酐ODPA: 3,3',4,4'-diphenyl ether tetracarboxylic dianhydride
DDS:3,3'-二胺基二苯基碸DDS: 3,3'-diaminodiphenylanthracene
PGMEA:丙二醇單甲醚乙酸酯PGMEA: propylene glycol monomethyl ether acetate
SMA1000P:苯乙烯-馬來酸酐共聚物(川原油化股份有限公司)SMA1000P: styrene-maleic anhydride copolymer (Chuan crude oil company)
EDM:二乙二醇甲基乙基醚EDM: diethylene glycol methyl ethyl ether
其次,以如下所示之方式而合成包含(甲基)丙烯酸縮水甘油酯與2官能(甲基)丙烯酸酯之反應生成物的環氧樹脂溶液(合成例3、合成例4、合成例5、合成例6、合成例7,表2)。Next, an epoxy resin solution containing a reaction product of glycidyl (meth)acrylate and a bifunctional (meth)acrylate was synthesized as follows (Synthesis Example 3, Synthesis Example 4, Synthesis Example 5, Synthesis Example 6, Synthesis Example 7, Table 2).
[合成例3]環氧樹脂溶液(B1)之合成[Synthesis Example 3] Synthesis of epoxy resin solution (B1)
於具有溫度計、攪拌機、原料投入口及氮氣導入口之1000 ml之四口燒瓶中裝入脫水純化之MMP 300.00 g、甲基丙烯酸縮水甘油酯(以下簡稱為「GMA」)180.00 g、1,4-丁二醇二甲基丙烯酸脂20.00 g、作為聚合起始劑之2,2'-偶氮雙(2,4-二甲基戊腈) 20.00 g,於90℃之聚合溫度下進行2小時之加熱而進行聚合。藉由將反應液冷卻至30℃以下而獲得環氧樹脂之40 wt%溶液(B1)。該溶液之藉由GPC而測定之重量平均分子量為12,000(聚苯乙烯換算)。The dehydrated MMP 300.00 g, glycidyl methacrylate (hereinafter referred to as "GMA") 180.00 g, 1, 4 was placed in a 1000 ml four-necked flask equipped with a thermometer, a stirrer, a raw material inlet, and a nitrogen inlet. 20.00 g of butanediol dimethacrylate, 20.00 g of 2,2'-azobis(2,4-dimethylvaleronitrile) as a polymerization initiator, and carried out at a polymerization temperature of 90 ° C for 2 hours The polymerization is carried out by heating. A 40 wt% solution (B1) of the epoxy resin was obtained by cooling the reaction liquid to below 30 °C. The weight average molecular weight of this solution measured by GPC was 12,000 (in terms of polystyrene).
[合成例4]環氧樹脂溶液(B2)之合成[Synthesis Example 4] Synthesis of epoxy resin solution (B2)
於具有溫度計、攪拌機、原料投入口及氮氣導入口之1000 ml之四口燒瓶中裝入脫水純化之MMP 300.00 g、GMA 180.00 g、1,3-丁二醇二甲基丙烯酸脂20.00 g、作為聚合起始劑之2,2'-偶氮雙(2,4-二甲基戊腈) 20.00 g,於90℃之聚合溫度下進行2小時之加熱而進行聚合。藉由將反應液冷卻至30℃以下而獲得環氧樹脂之40 wt%溶液(B2)。該溶液之藉由GPC而測定之重量平均分子量為12,000(聚苯乙烯換算)。A 1000 ml four-necked flask equipped with a thermometer, a stirrer, a raw material inlet and a nitrogen inlet was charged with dehydrated and purified MMP 300.00 g, GMA 180.00 g, and 1,3-butylene glycol dimethacrylate 20.00 g. 20.00 g of 2,2'-azobis(2,4-dimethylvaleronitrile) as a polymerization initiator was heated at a polymerization temperature of 90 ° C for 2 hours to carry out polymerization. A 40 wt% solution (B2) of the epoxy resin was obtained by cooling the reaction liquid to below 30 °C. The weight average molecular weight of this solution measured by GPC was 12,000 (in terms of polystyrene).
[合成例5]環氧樹脂溶液(B3)之合成[Synthesis Example 5] Synthesis of epoxy resin solution (B3)
於具有溫度計、攪拌機、原料投入口及氮氣導入口之1000 ml之四口燒瓶中裝入脫水純化之MMP 300.00 g、GMA 180.00 g、新戊二醇二甲基丙烯酸脂20.00 g、作為聚合起始劑之2,2'-偶氮雙(2,4-二甲基戊腈) 20.00 g,於90℃之聚合溫度下進行2小時之加熱而進行聚合。藉由將反應液冷卻至30℃以下而獲得環氧樹脂之40 wt%溶液(B3)。該溶液之藉由GPC而測定之重量平均分子量為11,000(聚苯乙烯換算)。A 1000 ml four-necked flask equipped with a thermometer, a stirrer, a raw material inlet and a nitrogen inlet was charged with dehydrated purified MMP 300.00 g, GMA 180.00 g, and neopentyl glycol dimethacrylate 20.00 g as a polymerization initiation. 20.00 g of 2,2'-azobis(2,4-dimethylvaleronitrile) was polymerized by heating at a polymerization temperature of 90 ° C for 2 hours. A 40 wt% solution (B3) of the epoxy resin was obtained by cooling the reaction liquid to below 30 °C. The weight average molecular weight of this solution measured by GPC was 11,000 (in terms of polystyrene).
[合成例6]環氧樹脂溶液(B4)之合成[Synthesis Example 6] Synthesis of epoxy resin solution (B4)
於具有溫度計、攪拌機、原料投入口及氮氣導入口之1000 ml之四口燒瓶中裝入脫水純化之MMP 300.00 g、GMA 160.00 g、1,4-丁二醇二甲基丙烯酸脂40.00 g、作為聚合起始劑之2,2'-偶氮雙(2,4-二甲基戊腈) 30.00 g,於90℃之聚合溫度下進行2小時之加熱而進行聚合。藉由將反應液冷卻至30℃以下而獲得環氧樹脂之40 wt%溶液(B4)。該溶液之藉由GPC而測定之重量平均分子量為18,000(聚苯乙烯換算)。Dehydrated and purified MMP 300.00 g, GMA 160.00 g, and 1,4-butanediol dimethacrylate 40.00 g were placed in a 1000 ml four-necked flask equipped with a thermometer, a stirrer, a raw material inlet, and a nitrogen inlet. 30.00 g of 2,2'-azobis(2,4-dimethylvaleronitrile) as a polymerization initiator was heated at a polymerization temperature of 90 ° C for 2 hours to carry out polymerization. A 40 wt% solution (B4) of an epoxy resin was obtained by cooling the reaction liquid to below 30 °C. The weight average molecular weight of this solution as measured by GPC was 18,000 (in terms of polystyrene).
[合成例7]環氧樹脂溶液(B5)之合成[Synthesis Example 7] Synthesis of epoxy resin solution (B5)
於具有溫度計、攪拌機、原料投入口及氮氣導入口之1000 ml之四口燒瓶中裝入脫水純化之MMP 300.00 g、GMA 180.00 g、二乙二醇二甲基丙烯酸酯20.00 g、作為聚合起始劑之2,2'-偶氮雙(2,4-二甲基戊腈) 20.00 g,於90℃之聚合溫度下進行2小時之加熱而進行聚合。藉由將反應液冷卻至30℃以下而獲得環氧樹脂之40 wt%溶液(B5)。該溶液之藉由GPC而測定之重量平均分子量為11,000(聚苯乙烯換算)。A 1000 ml four-necked flask equipped with a thermometer, a stirrer, a raw material inlet and a nitrogen inlet was charged with dehydrated purified MMP 300.00 g, GMA 180.00 g, and diethylene glycol dimethacrylate 20.00 g as a polymerization initiation. 20.00 g of 2,2'-azobis(2,4-dimethylvaleronitrile) was polymerized by heating at a polymerization temperature of 90 ° C for 2 hours. A 40 wt% solution (B5) of an epoxy resin was obtained by cooling the reaction liquid to below 30 °C. The weight average molecular weight of this solution measured by GPC was 11,000 (in terms of polystyrene).
GMA:甲基丙烯酸縮水甘油酯GMA: glycidyl methacrylate
MMP:3-甲氧基丙酸甲酯MMP: methyl 3-methoxypropionate
其次,藉由如下所示之方式而合成包含(甲基)丙烯酸縮水甘油酯與單官能(甲基)丙烯酸酯之反應生成物的環氧樹脂溶液(比較合成例1,表3)。Next, an epoxy resin solution containing a reaction product of glycidyl (meth)acrylate and a monofunctional (meth) acrylate was synthesized by the following method (Comparative Synthesis Example 1, Table 3).
[比較合成例1]環氧樹脂溶液(C1)之合成[Comparative Synthesis Example 1] Synthesis of Epoxy Resin Solution (C1)
於具有溫度計、攪拌機、原料投入口及氮氣導入口之1000 ml之四口燒瓶中裝入脫水純化之MMP 300.00 g、GMA 180.00 g、甲基丙烯酸甲酯20.00 g、作為聚合起始劑之2,2'-偶氮雙(2,4-二甲基戊腈) 8.00 g,於90℃之聚合溫度下進行2小時之加熱而進行聚合。藉由將反應液冷卻至30℃以下而獲得環氧樹脂之40 wt%溶液(C1)。該溶液之藉由GPC而測定之重量平均分子量為15,000(聚苯乙烯換算)。A 1000 ml four-necked flask equipped with a thermometer, a stirrer, a raw material inlet and a nitrogen inlet was charged with dehydrated and purified MMP 300.00 g, GMA 180.00 g, methyl methacrylate 20.00 g, and 2 as a polymerization initiator. 2'-Azobis(2,4-dimethylvaleronitrile) 8.00 g, and polymerization was carried out by heating at a polymerization temperature of 90 ° C for 2 hours. A 40 wt% solution (C1) of the epoxy resin was obtained by cooling the reaction liquid to below 30 °C. The weight average molecular weight of this solution measured by GPC was 15,000 (in terms of polystyrene).
其次,藉由如下所示之方式而合成包含(甲基)丙烯酸縮水甘油酯與2官能(甲基)丙烯酸酯之反應生成物(重量平均分子量為20,000以上)的環氧樹脂溶液(比較合成例2,表3)。Next, an epoxy resin solution containing a reaction product of glycidyl (meth)acrylate and a bifunctional (meth) acrylate (weight average molecular weight: 20,000 or more) was synthesized by the following method (Comparative Synthesis Example) 2, Table 3).
[比較合成例2]環氧樹脂溶液(C2)之合成[Comparative Synthesis Example 2] Synthesis of Epoxy Resin Solution (C2)
於具有溫度計、攪拌機、原料投入口及氮氣導入口之1000 ml之四口燒瓶中裝入脫水純化之MMP 300.00 g、GMA 180.00 g、1,4-丁二醇二甲基丙烯酸脂20.00 g、作為聚合起始劑之2,2'-偶氮雙(2,4-二甲基戊腈) 13.00 g,於90℃之聚合溫度下進行2小時之加熱而進行聚合。藉由將反應液冷卻至30℃以下而獲得環氧樹脂之40 wt%溶液(C1)。該溶液之藉由GPC而測定之重量平均分子量為58,000(聚苯乙烯換算)。Dehydrated and purified MMP 300.00 g, GMA 180.00 g, and 1,4-butanediol dimethacrylate 20.00 g were placed in a 1000 ml four-necked flask equipped with a thermometer, a stirrer, a raw material inlet, and a nitrogen inlet. Polymerization initiator 2,2'-azobis(2,4-dimethylvaleronitrile) 13.00 g was polymerized by heating at a polymerization temperature of 90 ° C for 2 hours. A 40 wt% solution (C1) of the epoxy resin was obtained by cooling the reaction liquid to below 30 °C. The weight average molecular weight of the solution as measured by GPC was 58,000 (in terms of polystyrene).
GMA:甲基丙烯酸縮水甘油酯GMA: glycidyl methacrylate
MMP:3-甲氧基丙酸甲酯MMP: methyl 3-methoxypropionate
其次,使用合成例1、合成例2中所得之聚酯醯胺酸(A1、A2)、合成例3、合成例4、合成例5、合成例6、合成例7中所得之環氧樹脂(B1、B2、B3、B4、B5)、比較合成例1、比較合成例2中所得之環氧樹脂(C1、C2)、及市售之多官能且重量平均分子量不足3,000之環氧樹脂,以如下所示之方式調製熱硬化性樹脂組成物,由該熱硬化性樹脂組成物獲得硬化膜,進行該硬化膜之評價(實例1~實例6、比較例1、比較例2、比較例3,表4~表6及表7)。Next, the epoxy resins obtained in the synthetic liminic acid (A1, A2) obtained in Synthesis Example 1, Synthesis Example 2, Synthesis Example 3, Synthesis Example 4, Synthesis Example 5, Synthesis Example 6, and Synthesis Example 7 were used ( B1, B2, B3, B4, B5), Comparative Synthesis Example 1, epoxy resin (C1, C2) obtained in Comparative Synthesis Example 2, and commercially available polyfunctional epoxy resin having a weight average molecular weight of less than 3,000, The thermosetting resin composition was prepared as follows, and a cured film was obtained from the thermosetting resin composition, and the cured film was evaluated (Examples 1 to 6, Comparative Example 1, Comparative Example 2, and Comparative Example 3, Table 4 to Table 6 and Table 7).
[實例1][Example 1]
對附有攪拌翼之500 ml之可分離式燒瓶進行氮氣置換,於該燒瓶中裝入合成例1中所得之聚酯醯胺酸溶液(A1)100 g、合成例3中所得之環氧樹脂溶液(B1)150 g、偏苯三酸酐6 g、3-縮水甘油氧基丙基三甲氧基矽烷4.8 g、IRGANOX 1010(商品名;BASF Japan股份有限公司)0.50 g、脫水純化之MMP 160.8 g,於室溫下進行5小時之攪拌,使其均勻地溶解。其次,投入BYK-344(商品名、BYK-CHEMIE JAPAN K.K.)0.42 g,於室溫下進行1小時之攪拌,藉由孔徑為0.2 μm之薄膜過濾器進行過濾而調製塗佈液。A 500 ml separable flask equipped with a stirring blade was purged with nitrogen, and 100 g of the polyester glutamic acid solution (A1) obtained in Synthesis Example 1 and the epoxy resin obtained in Synthesis Example 3 were placed in the flask. 150 g of solution (B1), 6 g of trimellitic anhydride, 4.8 g of 3-glycidoxypropyltrimethoxydecane, 0.50 g of IRGANOX 1010 (trade name; BASF Japan Co., Ltd.), and 160.8 g of dehydrated purified MMP Stir for 5 hours at a temperature to dissolve it evenly. Next, 0.42 g of BYK-344 (trade name, BYK-CHEMIE JAPAN K.K.) was charged, and the mixture was stirred at room temperature for 1 hour, and filtered by a membrane filter having a pore size of 0.2 μm to prepare a coating liquid.
其次,將該塗佈液以800 rpm而旋塗於玻璃基板上及彩色濾光片基板上10秒之後,於加熱板上、80℃下進行3分鐘之預烘烤而形成塗膜。其後,於烘箱中、230℃下進行30分鐘之加熱,藉此使塗膜硬化,獲得膜厚為1.5 μm之硬化膜。Next, the coating liquid was spin-coated on a glass substrate and a color filter substrate at 800 rpm for 10 seconds, and then prebaked on a hot plate at 80 ° C for 3 minutes to form a coating film. Thereafter, the coating film was cured by heating in an oven at 230 ° C for 30 minutes to obtain a cured film having a film thickness of 1.5 μm.
關於如此而獲得之硬化膜,對透明性、耐光性、平坦性、耐熱性、及耐化學品性而進行特性評價。將該些之評價結果示於表7中。The cured film obtained in this manner was evaluated for its properties in terms of transparency, light resistance, flatness, heat resistance, and chemical resistance. The evaluation results of these are shown in Table 7.
[透明性之評價方法][Evaluation method of transparency]
於所得之附有硬化膜之玻璃基板中,藉由紫外可見近紅外分光光度計(商品名為V-670、日本分光股份有限公司)而測定僅硬化膜之於光之波長為400 nm下之透射率。將透射率為97%以上之情形作為○,將不足97%之情形作為×。In the obtained glass substrate with a cured film, the ultraviolet light-visible near-infrared spectrophotometer (trade name: V-670, Japan Spectrophotometry Co., Ltd.) was used to measure only the cured film at a wavelength of 400 nm. Transmittance. The case where the transmittance was 97% or more was taken as ○, and the case where the transmittance was less than 97% was taken as ×.
[耐光性之評價方法][Evaluation method of light resistance]
藉由紫外線臭氧清洗裝置(商品名為PL2003N-12、光源為低壓水銀燈、SEN LIGHTS Co.,Ltd.),對於所述[透明性之評價方法]中評價了透明性之後的附有硬化膜之玻璃基板進行3 J/cm2 (254 nm換算)之紫外線臭氧處理後,藉由紫外可見近紅外分光光度計(商品名為V-670、日本分光股份有限公司)而測定僅硬化膜之於光之波長為400 nm下之透射率。將透射率為96%以上之情形作為○,將不足96%之情形作為×。By the ultraviolet ozone cleaning device (trade name: PL2003N-12, the light source is a low-pressure mercury lamp, SEN LIGHTS Co., Ltd.), the cured film is evaluated for the transparency in the evaluation method of [transparency]. After the glass substrate was subjected to ultraviolet ozone treatment at 3 J/cm 2 (254 nm conversion), only the cured film was measured by ultraviolet-visible near-infrared spectrophotometer (trade name: V-670, Japan Optical Co., Ltd.). The wavelength is the transmittance at 400 nm. The case where the transmittance is 96% or more is ○, and the case where the transmittance is less than 96% is ×.
[平坦性之評價方法][Evaluation method of flatness]
使用階差、表面粗糙度、微細形狀測定裝置(商品名為P-15、KLA TENCOR股份有限公司)而測定所得之附有硬化膜之彩色濾光片基板之硬化膜表面之階差。將包含黑色矩陣之R、G、B畫素間之階差之最大值(以下簡稱為最大階差)不足0.2 μm之情形作為○,將0.2 μm以上之情形作為×。而且,所使用之彩色濾光片基板是使用最大階差約為1.1 μm之樹脂黑色矩陣之顏料分散彩色濾光片(以下簡稱為CF)。The step of the surface of the cured film of the obtained color filter substrate with a cured film was measured using a step, a surface roughness, and a fine shape measuring device (trade name: P-15, KLA TENCOR Co., Ltd.). The case where the maximum value of the step difference between the R, G, and B pixels of the black matrix (hereinafter referred to as the maximum step) is less than 0.2 μm is taken as ○, and the case where 0.2 μm or more is used is ×. Further, the color filter substrate used was a pigment dispersion color filter (hereinafter abbreviated as CF) using a resin black matrix having a maximum step difference of about 1.1 μm.
[耐熱性之評價方法][Evaluation method of heat resistance]
將所得之附有硬化膜之玻璃基板於250℃下進行1小時之再加熱後,測定加熱前之膜厚及加熱後之膜厚,藉由下述計算式而算出殘膜率。將加熱後之殘膜率為95%以上之情形作為○,將加熱後之殘膜率不足95%之情形作為×。The obtained glass substrate with a cured film was reheated at 250 ° C for 1 hour, and then the film thickness before heating and the film thickness after heating were measured, and the residual film ratio was calculated by the following calculation formula. The case where the residual film ratio after heating was 95% or more was taken as ○, and the case where the residual film ratio after heating was less than 95% was taken as ×.
殘膜率=(加熱後之膜厚/加熱前之膜厚)×100Residual film rate = (film thickness after heating / film thickness before heating) × 100
[耐化學品性之評價方法][Method for evaluating chemical resistance]
將所得之附有硬化膜之玻璃基板,於5 wt%氫氧化鈉水溶液中、60℃下實施10分鐘之浸漬處理(以下簡稱為NaOH處理),於包含36%鹽酸/60%硝酸/水=40/20/40之混合液(重量比)中、50℃下實施3分鐘之浸漬處理(以下簡稱為酸處理),於N-甲基-2-吡咯啶酮中、50℃下實施30分鐘之浸漬處理(以下簡稱為NMP處理),然後於230℃下進行1小時之再加熱。測定再加熱後之殘膜率及再加熱後之透射率。將再加熱後之殘膜率為95%以上且再加熱後之於400 nm下之透射率為95%以上之情形作為○。將再加熱後之殘膜率不足95%或再加熱後之透射率不足95%之情形作為×。The obtained glass substrate with the cured film was immersed in a 5 wt% aqueous sodium hydroxide solution at 60 ° C for 10 minutes (hereinafter referred to as NaOH treatment), and contained 36% hydrochloric acid / 60% nitric acid / water = In a 40/20/40 mixture (weight ratio), immersion treatment (hereinafter abbreviated as acid treatment) at 50 ° C for 3 minutes, and 30 minutes at 50 ° C in N-methyl-2-pyrrolidone The immersion treatment (hereinafter referred to as NMP treatment) was carried out, and then reheating was performed at 230 ° C for 1 hour. The residual film ratio after reheating and the transmittance after reheating were measured. The residual film ratio after reheating was 95% or more, and the transmittance at 400 nm after reheating was 95% or more as ○. The case where the residual film ratio after reheating is less than 95% or the transmittance after reheating is less than 95% is taken as ×.
再加熱後之殘膜率=(再加熱後之膜厚/再加熱前之膜厚)×100Remaining film rate after reheating = (film thickness after reheating / film thickness before reheating) × 100
[實例2][Example 2]
對附有攪拌翼之500 ml之可分離式燒瓶進行氮氣置換,於該燒瓶中裝入合成例2中所得之聚酯醯胺酸溶液(A2)100 g、合成例3中所得之環氧樹脂溶液(B1)150 g、偏苯三酸酐6 g、3-縮水甘油氧基丙基三甲氧基矽烷4.8 g、IRGANOX 1010(商品名;BASF Japan股份有限公司)0.50 g、脫水純化之MMP 160.8 g,於室溫下進行5小時之攪拌,使其均勻地溶解。其次,投入BYK-344(商品名、BYK-CHEMIE JAPAN K.K.)0.42 g,於室溫下進行1小時之攪拌,藉由孔徑為0.2 μm之薄膜過濾器進行過濾而調製塗佈液。A 500 ml separable flask equipped with a stirring blade was purged with nitrogen, and 100 g of the polyester phthalic acid solution (A2) obtained in Synthesis Example 2 and the epoxy resin obtained in Synthesis Example 3 were placed in the flask. 150 g of solution (B1), 6 g of trimellitic anhydride, 4.8 g of 3-glycidoxypropyltrimethoxydecane, 0.50 g of IRGANOX 1010 (trade name; BASF Japan Co., Ltd.), and 160.8 g of dehydrated purified MMP Stir for 5 hours at a temperature to dissolve it evenly. Next, 0.42 g of BYK-344 (trade name, BYK-CHEMIE JAPAN K.K.) was charged, and the mixture was stirred at room temperature for 1 hour, and filtered by a membrane filter having a pore size of 0.2 μm to prepare a coating liquid.
與實例1同樣地對透明性、耐光性、平坦性、耐熱性、及耐化學品性進行特性評價。將該些之評價結果示於表7中。The properties of transparency, light resistance, flatness, heat resistance, and chemical resistance were evaluated in the same manner as in Example 1. The evaluation results of these are shown in Table 7.
[實例3][Example 3]
將環氧樹脂溶液(B1)變更為環氧樹脂溶液(B2),除此以外藉由與實例1同樣之方法而調製塗佈液。The coating liquid was prepared in the same manner as in Example 1 except that the epoxy resin solution (B1) was changed to the epoxy resin solution (B2).
與實例1同樣地對透明性、耐光性、平坦性、耐熱性、及耐化學品性進行特性評價。將該些之評價結果示於表7中。The properties of transparency, light resistance, flatness, heat resistance, and chemical resistance were evaluated in the same manner as in Example 1. The evaluation results of these are shown in Table 7.
[實例4][Example 4]
將環氧樹脂溶液(B1)變更為環氧樹脂溶液(B3),除此以外藉由與實例1同樣之方法而調製塗佈液。The coating liquid was prepared in the same manner as in Example 1 except that the epoxy resin solution (B1) was changed to the epoxy resin solution (B3).
與實例1同樣地對透明性、耐光性、平坦性、耐熱性、及耐化學品性進行特性評價。將該些之評價結果示於表7中。The properties of transparency, light resistance, flatness, heat resistance, and chemical resistance were evaluated in the same manner as in Example 1. The evaluation results of these are shown in Table 7.
[實例5][Example 5]
將環氧樹脂溶液(B1)變更為環氧樹脂溶液(B4),除此以外藉由與實例1同樣之方法而調製塗佈液。The coating liquid was prepared in the same manner as in Example 1 except that the epoxy resin solution (B1) was changed to the epoxy resin solution (B4).
與實例1同樣地對透明性、耐光性、平坦性、耐熱性、及耐化學品性進行特性評價。將該些之評價結果示於表7中。The properties of transparency, light resistance, flatness, heat resistance, and chemical resistance were evaluated in the same manner as in Example 1. The evaluation results of these are shown in Table 7.
[實例6][Example 6]
將環氧樹脂溶液(B1)變更為環氧樹脂溶液(B5),除此以外藉由與實例1同樣之方法而調製塗佈液。The coating liquid was prepared in the same manner as in Example 1 except that the epoxy resin solution (B1) was changed to the epoxy resin solution (B5).
與實例1同樣地對透明性、耐光性、平坦性、耐熱性、及耐化學品性進行特性評價。將該些之評價結果示於表7中。The properties of transparency, light resistance, flatness, heat resistance, and chemical resistance were evaluated in the same manner as in Example 1. The evaluation results of these are shown in Table 7.
[比較例1][Comparative Example 1]
將環氧樹脂溶液(B1)變更為環氧樹脂溶液(C1),除此以外藉由與實例1同樣之方法而調製塗佈液。The coating liquid was prepared in the same manner as in Example 1 except that the epoxy resin solution (B1) was changed to the epoxy resin solution (C1).
與實例1同樣地對透明性、耐光性、平坦性、耐熱性、及耐化學品性進行特性評價。將該些之評價結果示於表7中。The properties of transparency, light resistance, flatness, heat resistance, and chemical resistance were evaluated in the same manner as in Example 1. The evaluation results of these are shown in Table 7.
[比較例2][Comparative Example 2]
將環氧樹脂溶液(B1)變更為環氧樹脂溶液(C2),除此以外藉由與實例1同樣之方法而調製塗佈液。The coating liquid was prepared in the same manner as in Example 1 except that the epoxy resin solution (B1) was changed to the epoxy resin solution (C2).
與實例1同樣地對透明性、耐光性、平坦性、耐熱性、及耐化學品性進行特性評價。將該些之評價結果示於表7中。The properties of transparency, light resistance, flatness, heat resistance, and chemical resistance were evaluated in the same manner as in Example 1. The evaluation results of these are shown in Table 7.
[比較例3][Comparative Example 3]
對附有攪拌翼之500 ml之可分離式燒瓶進行氮氣置換,於該燒瓶中裝入合成例1中所得之聚酯醯胺酸溶液(A1)100 g、多官能且重量平均分子量不足3,000之環氧樹脂TECHMORE VG3101L(商品名;PRINTEC,INC.)60 g、偏苯三酸酐6 g、3-縮水甘油氧基丙基三甲氧基矽烷4.8 g、IRGANOX 1010(商品名;BASF Japan股份有限公司)0.50 g、脫水純化之MMP 250.8 g,於室溫下進行5小時之攪拌,使其均勻溶解。其次,投入BYK-344(商品名、BYK-CHEMIE JAPAN K.K.)0.42 g,於室溫下進行1小時之攪拌,藉由孔徑為0.2 μm之薄膜過濾器進行過濾而調製塗佈液。A 500 ml separable flask equipped with a stirring blade was purged with nitrogen, and 100 g of the polyester phthalic acid solution (A1) obtained in Synthesis Example 1 was charged in the flask, and the polyfunctional weight average molecular weight was less than 3,000. Epoxy resin TECHMORE VG3101L (trade name; PRINTEC, INC.) 60 g, trimellitic anhydride 6 g, 3-glycidoxypropyl trimethoxy decane 4.8 g, IRGANOX 1010 (trade name; BASF Japan Co., Ltd.) 0.50 g 250.8 g of dehydrated and purified MMP was stirred at room temperature for 5 hours to be uniformly dissolved. Next, 0.42 g of BYK-344 (trade name, BYK-CHEMIE JAPAN K.K.) was charged, and the mixture was stirred at room temperature for 1 hour, and filtered by a membrane filter having a pore size of 0.2 μm to prepare a coating liquid.
與實例1同樣地對透明性、耐光性、平坦性、耐熱性、及耐化學品性進行特性評價。將該些之評價結果示於表7中。The properties of transparency, light resistance, flatness, heat resistance, and chemical resistance were evaluated in the same manner as in Example 1. The evaluation results of these are shown in Table 7.
TECHMORE VG3101L:PRINTEC,INC.TECHMORE VG3101L: PRINTEC, INC.
3-GPMS:3-縮水甘油氧基丙基三甲氧基矽烷3-GPMS: 3-glycidoxypropyltrimethoxydecane
IRGANOX1010:BASF Japan股份有限公司IRGANOX1010: BASF Japan Corporation
MMP:3-甲氧基丙酸甲酯MMP: methyl 3-methoxypropionate
BYK-344:BYK-CHEMIE JAPAN K.K.BYK-344: BYK-CHEMIE JAPAN K.K.
根據表7中所示之結果可知:實例1~實例6之硬化膜之耐光性、平坦性優異,進一步於透明性、耐熱性、及耐化學品性之所有方面中獲得平衡。另一方面,比較例1之使用藉由使甲基丙烯酸縮水甘油酯與單官能甲基丙烯酸酯反應而獲得之環氧樹脂的硬化膜雖然耐光性、平坦性優異,但耐熱性、耐化學品性差。比較例2之使用具有50,000以上之分子量之環氧樹脂(藉由使甲基丙烯酸縮水甘油酯與2官能甲基丙烯酸酯反應而獲得之環氧樹脂)的硬化膜之平坦性差。而且,比較例3之使用多官能且重量平均分子量不足3,000之環氧樹脂的硬化膜之耐光性差。如上所述,僅僅於使用藉由使甲基丙烯酸縮水甘油酯與2官能甲基丙烯酸酯反應而獲得之環氧樹脂(重量平均分子量為1,000~50,000)之情形時滿足所有特性。According to the results shown in Table 7, the cured films of Examples 1 to 6 were excellent in light resistance and flatness, and further balanced in all aspects of transparency, heat resistance, and chemical resistance. On the other hand, in the comparative example 1, the cured film of the epoxy resin obtained by reacting glycidyl methacrylate with a monofunctional methacrylate has excellent light resistance and flatness, but heat resistance and chemical resistance. Poor sex. The cured film of Comparative Example 2 using an epoxy resin having a molecular weight of 50,000 or more (an epoxy resin obtained by reacting glycidyl methacrylate with a bifunctional methacrylate) was inferior in flatness. Further, the cured film of the epoxy resin of Comparative Example 3 using a polyfunctional epoxy resin having a weight average molecular weight of less than 3,000 was inferior in light resistance. As described above, all the characteristics are satisfied only in the case where an epoxy resin obtained by reacting glycidyl methacrylate with a bifunctional methacrylate (weight average molecular weight: 1,000 to 50,000) is used.
[產業上之可利用性][Industrial availability]
藉由本發明之熱硬化樹脂組成物而獲得之硬化膜於透明性、耐光性、及耐濺鍍性等作為光學材料之特性方面亦優異,自此方面考慮,可用作彩色濾光片、LED發光元件及光接收元件等各種光學材料等之保護膜、以及TFT與透明電極間及透明電極與配向膜間所形成之透明絕緣膜。The cured film obtained by the thermosetting resin composition of the present invention is excellent in transparency, light resistance, sputtering resistance, and the like as an optical material. From this point of view, it can be used as a color filter or an LED. A protective film of various optical materials such as a light-emitting element and a light-receiving element, and a transparent insulating film formed between the TFT and the transparent electrode and between the transparent electrode and the alignment film.
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KR102273808B1 (en) * | 2015-06-11 | 2021-07-06 | 주식회사 케이씨씨 | Polyamide curing agent with ring-opening product of acid anhydride by alcohol |
TWI746707B (en) * | 2017-01-31 | 2021-11-21 | 日商日本化藥股份有限公司 | Reactive polycarboxylic acid compound, active energy ray curable resin composition using the same, cured article of the composition and use of the cured article |
CN109401605A (en) * | 2017-08-16 | 2019-03-01 | 捷恩智株式会社 | Thermosetting composition, cured film and colored filter |
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JP2006131867A (en) * | 2004-10-08 | 2006-05-25 | Hitachi Chem Co Ltd | Resin composition, optical part produced by using the same and method for producing the part |
JP5298428B2 (en) * | 2006-12-26 | 2013-09-25 | Jnc株式会社 | Thermosetting resin composition and cured film |
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JP2012193339A (en) | 2012-10-11 |
TW201237098A (en) | 2012-09-16 |
KR20120100721A (en) | 2012-09-12 |
JP5929170B2 (en) | 2016-06-01 |
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