TWI500166B - Integrated pmos transistor and schottky diode and charging switch circuit employing the integrated device - Google Patents

Integrated pmos transistor and schottky diode and charging switch circuit employing the integrated device Download PDF

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TWI500166B
TWI500166B TW098133905A TW98133905A TWI500166B TW I500166 B TWI500166 B TW I500166B TW 098133905 A TW098133905 A TW 098133905A TW 98133905 A TW98133905 A TW 98133905A TW I500166 B TWI500166 B TW I500166B
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transistor
drain
source
pmos transistor
gate
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TW098133905A
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TW201036173A (en
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Kuo Chin Chiu
Chih Feng Huang
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Richpower Microelectronics
Richtek Technology Corp
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Description

PMOS電晶體與蕭特基二極體之整合元件,及使用該整合元件之充電開關電路Integrated component of PMOS transistor and Schottky diode, and charging switch circuit using the integrated component

本發明係有關一種PMOS電晶體與蕭特基二極體(Schottky Diode)之整合元件,以及使用該整合元件之充電開關電路。The present invention relates to an integrated component of a PMOS transistor and a Schottky Diode, and a charging switch circuit using the integrated component.

電源控制電路中經常需要使用到由獨立的PMOS電晶體與獨立的蕭特基二極體構成之功率開關元件。請參閱第1圖,PMOS電晶體14與蕭特基二極體12串連作為功率開關元件,PMOS電晶體14中包含寄生二極體14D,形成於PMOS電晶體14的汲極和通道區之間。控制電路10控制PMOS電晶體14的閘極,以將輸入電壓Vin轉換成輸出電壓Vo。蕭特基二極體12的作用是在輸出電壓Vo高於輸入電壓Vin的情況下,防止電流經寄生二極體14D逆流,損及輸入電壓Vin。Power switching elements consisting of separate PMOS transistors and separate Schottky diodes are often required in power control circuits. Referring to FIG. 1, the PMOS transistor 14 and the Schottky diode 12 are connected in series as a power switching element, and the PMOS transistor 14 includes a parasitic diode 14D formed in the drain and channel regions of the PMOS transistor 14. between. The control circuit 10 controls the gate of the PMOS transistor 14 to convert the input voltage Vin into an output voltage Vo. The function of the Schottky diode 12 is to prevent the current from flowing back through the parasitic diode 14D and the input voltage Vin is damaged when the output voltage Vo is higher than the input voltage Vin.

上述先前技術的缺點是,獨立的PMOS電晶體與獨立的蕭特基二極體相當佔據面積,且串連後增加輸入電壓Vin至輸出電壓Vo之間的導通電阻(Ron),在大電流流量下,由該導通電阻所致之壓降可高達0.8V甚至更高,造成極大的功率耗損。A disadvantage of the prior art described above is that the independent PMOS transistor occupies a considerable area with the independent Schottky diode, and increases the on-resistance (Ron) between the input voltage Vin and the output voltage Vo in series, at a large current flow. The voltage drop caused by the on-resistance can be as high as 0.8V or higher, resulting in great power consumption.

有鑑於此,本發明即針對上述先前技術之不足,提出一種PMOS電晶體與蕭特基二極體之整合元件,以減少功率開關元件的面積並降低其導通電阻。此外,本發明也提出一種應用此整合元件而構成之充電開關電路。In view of the above, the present invention is directed to the above-mentioned deficiencies of the prior art, and proposes an integrated component of a PMOS transistor and a Schottky diode to reduce the area of the power switching element and reduce its on-resistance. Furthermore, the present invention also proposes a charging switch circuit constructed using the integrated component.

本發明目的之一在提供一種PMOS電晶體與蕭特基二極體之整合元件,此整合元件可為平面式或溝漕式。One of the objects of the present invention is to provide an integrated component of a PMOS transistor and a Schottky diode, which can be planar or gully.

本發明的另一目的是提供一種以上述整合元件構成之充電開關電路,而得以減少充電時不必要的功率耗損。Another object of the present invention is to provide a charging switch circuit constructed by the above-described integrated components, thereby reducing unnecessary power consumption during charging.

為達上述之目的,就其中一個觀點言,本發明提供了一種PMOS電晶體與蕭特基二極體之整合元件,包含:一個PMOS電晶體,其包括閘極、源極、汲極與源汲極間之通道區,該源極、汲極及通道區位於一基體內,且在該汲極與該通道區間形成寄生二極體;以及一個與該寄生二極體反向串連的蕭特基二極體,該蕭特基二極體位於該基體內,其一端與該寄生二極體連接,另一端與該源極連接。In order to achieve the above object, in one aspect, the present invention provides an integrated component of a PMOS transistor and a Schottky diode, comprising: a PMOS transistor including a gate, a source, a drain and a source a channel region between the drains, the source, the drain and the channel region are located in a matrix, and a parasitic diode is formed between the drain and the channel; and a reverse connection with the parasitic diode A stellate diode, the Schottky diode is located in the substrate, one end of which is connected to the parasitic diode, and the other end is connected to the source.

在一較佳實施型態中,該蕭特基二極體包括與該通道區相同傳導型態而無歐姆接觸的一部份井區。In a preferred embodiment, the Schottky diode includes a portion of the well region that is in the same conductivity profile as the channel region without ohmic contact.

在一較佳實施型態中,該蕭特基二極體更包含與該通道區不同傳導型態的摻雜區。In a preferred embodiment, the Schottky diode further comprises a doped region of a different conductivity type than the channel region.

就其中一個半導體結構觀點言,本發明所提出之一種PMOS電晶體與蕭特基二極體之整合元件,包含:基體;位於該基體上之導體層,構成該PMOS電晶體之閘極;位於該基體內之N型第一井區,其一部分構成該PMOS電晶體之通道區;位於該第一井區內之第一P型摻雜區,構成該PMOS電晶體之汲極,其中該汲極與該通道區間形成寄生二極體;位於該第一井區內之第二P型摻雜區,構成該PMOS電晶體之源極;以及由該第一井區之另一部分所構成之蕭特基二極體,與該寄生二極體反向串連,在第一井區之該另一部分內不具有N型之歐姆接觸。In view of one of the semiconductor structures, the integrated component of the PMOS transistor and the Schottky diode of the present invention comprises: a substrate; a conductor layer on the substrate, forming a gate of the PMOS transistor; An N-type first well region in the substrate, a portion of which constitutes a channel region of the PMOS transistor; a first P-type doped region located in the first well region constituting a drain of the PMOS transistor, wherein the 汲a pole and a channel region form a parasitic diode; a second P-type doped region located in the first well region constitutes a source of the PMOS transistor; and a portion formed by another portion of the first well region The special base diode is reversely connected in series with the parasitic diode and does not have an N-type ohmic contact in the other portion of the first well region.

在一較佳實施型態中,在第一井區之該另一部分內更包含第三P型摻雜區。In a preferred embodiment, the third P-type doped region is further included in the other portion of the first well region.

就另一個半導體結構觀點言,本發明所提出之一種PMOS電晶體與蕭特基二極體之整合元件,包含:一個P型基體,構成該PMOS電晶體的汲極;位於該基體內之兩個填入的導體,構成該PMOS電晶體的閘極;位於該兩導體間之N型井區,其一部分構成該PMOS電晶體的通道區,其中在該汲極與該通道區間形成寄生二極體;位於該N型井區上方之P型摻雜區,構成該PMOS電晶體的源極;以及由該第一井區之另一部分所構成之蕭特基二極體,與該寄生二極體反向串連,在第一井區之該另一部分內不具有N型之歐姆接觸。In view of another semiconductor structure, the integrated component of the PMOS transistor and the Schottky diode of the present invention comprises: a P-type substrate constituting a drain of the PMOS transistor; and two of the PMOS transistors; a filled conductor constituting a gate of the PMOS transistor; an N-type well region between the two conductors, a portion of which forms a channel region of the PMOS transistor, wherein a parasitic diode is formed between the drain and the channel region a P-type doped region above the N-type well region, constituting a source of the PMOS transistor; and a Schottky diode formed by another portion of the first well region, and the parasitic diode The body is reversely connected in series and does not have an N-type ohmic contact in the other portion of the first well region.

在一較佳實施型態中,在該N型井區上方宜設有至少兩個P型摻雜區。In a preferred embodiment, at least two P-type doped regions are preferably provided above the N-well region.

在一較佳實施型態中,該基體宜包含較高濃度的本體與位於本體上方之較低濃度的磊晶生長區。In a preferred embodiment, the substrate preferably comprises a relatively high concentration of the body and a lower concentration of epitaxial growth regions above the body.

就再另一個觀點言,本發明提供了一種充電開關電路,可供耦接於電源與待充電之電池間,此充電開關電路包含:第一與第二整合元件,及控制第一整合元件之電晶體,其中每一整合元件各包括:一個PMOS電晶體,其包括閘極、源極、汲極與源汲極間之通道區,該源極、汲極及通道區位於一基體內,且在該汲極與該通道區間形成寄生二極體;以及一個與該寄生二極體反向串連的蕭特基二極體,該蕭特基二極體位於該基體內,其一端與該寄生二極體連接,另一端與該源極連接;其中,第一整合元件耦接於電源與電池之間,其源極與電源耦接,汲極與電池耦接;第二整合元件耦接於第一整合元件的閘極和汲極之間,其源極與第一整合元件的閘極耦接,汲極與第一整合元件的閘極耦接,閘極受控於電源;控制第一整合元件之電晶體的第一端受控於電源,第二端接收控制第一整合元件之控制訊號,第三端控制第一整合元件的閘極。In another aspect, the present invention provides a charging switch circuit for coupling between a power source and a battery to be charged, the charging switch circuit comprising: first and second integrated components, and controlling the first integrated component a transistor, wherein each integrated component comprises: a PMOS transistor comprising a gate region between a gate, a source, a drain and a source drain, the source, drain and channel regions being located in a substrate; Forming a parasitic diode between the drain and the channel; and a Schottky diode in reverse series with the parasitic diode, the Schottky diode being located in the substrate, one end of the body a parasitic diode is connected, and the other end is connected to the source; wherein the first integrated component is coupled between the power source and the battery, the source is coupled to the power source, the drain is coupled to the battery, and the second integrated component is coupled Between the gate and the drain of the first integrated component, the source is coupled to the gate of the first integrated component, the drain is coupled to the gate of the first integrated component, and the gate is controlled by the power supply; The first end of the transistor of an integrated component is controlled by a power supply, The second end receives the control signal for controlling the first integrated component, and the third end controls the gate of the first integrated component.

上述充電開關電路中,控制第一整合元件之電晶體可為MOS電晶體或雙載子電晶體。當其為MOS電晶體時,以側向擴散電晶體(LDMOS)為佳;當其為雙載子電晶體時,以側向雙載子NPN電晶體(Lnpn)為佳。In the above charging switch circuit, the transistor for controlling the first integrated component may be a MOS transistor or a bipolar transistor. When it is a MOS transistor, a lateral diffusion transistor (LDMOS) is preferred; when it is a bipolar transistor, a lateral bi-carrier NPN transistor (Lnpn) is preferred.

就又另一個觀點言,本發明也提供了一種充電開關電路,可供耦接於電源與待充電之電池間,此充電開關電路包含:第一PMOS電晶體,其包括閘極、源極、汲極與源汲極間之通道區,該源極、汲極及通道區位於一基體內,且在該源極與該通道區間形成第一寄生二極體,在該汲極與該通道區間形成第二寄生二極體,第一寄生二極體與第二寄生二極體反向串連;第二PMOS電晶體,其包括閘極、源極、汲極與源汲極間之通道區,該源極、汲極及通道區位於一基體內,且在該源極與該通道區間形成第三寄生二極體,在該汲極與該通道區間形成第四寄生二極體,第三寄生二極體與第四寄生二極體反向串連;以及一個控制第一PMOS電晶體閘極之電晶體;其中,第一PMOS電晶體耦接於電源與電池之間,其源極與電源耦接,汲極與電池耦接;第二PMOS電晶體耦接於第一PMOS電晶體的閘極和汲極之間,其源極與第一PMOS電晶體的閘極耦接,汲極與第一PMOS電晶體的閘極耦接,閘極受控於電源;控制第一PMOS電晶體之電晶體的第一端受控於電源,第二端接收控制第一PMOS電晶體之控制訊號,第三端第一PMOS電晶體的閘極。In another aspect, the present invention also provides a charging switch circuit for coupling between a power source and a battery to be charged. The charging switch circuit includes: a first PMOS transistor including a gate and a source, a channel region between the drain and the source drain, the source, drain and channel regions are located in a substrate, and a first parasitic diode is formed between the source and the channel region, and the drain and the channel region are Forming a second parasitic diode, the first parasitic diode and the second parasitic diode are connected in reverse; the second PMOS transistor includes a channel region between the gate, the source, the drain and the source drain The source, drain and channel regions are located in a substrate, and a third parasitic diode is formed between the source and the channel region, and a fourth parasitic diode is formed between the drain and the channel region, and the third a parasitic diode and a fourth parasitic diode are connected in reverse; and a transistor for controlling the first PMOS transistor gate; wherein the first PMOS transistor is coupled between the power source and the battery, and the source thereof The power supply is coupled, the drain is coupled to the battery, and the second PMOS transistor is coupled to the first PMOS Between the gate and the drain of the crystal, the source is coupled to the gate of the first PMOS transistor, the drain is coupled to the gate of the first PMOS transistor, and the gate is controlled by the power supply; the first PMOS is controlled The first end of the transistor of the transistor is controlled by the power source, the second end receives the control signal for controlling the first PMOS transistor, and the gate of the first PMOS transistor of the third end.

上述充電開關電路中,第一與第三寄生二極體可為一般二極體或蕭特基二極體。In the above charging switch circuit, the first and third parasitic diodes may be a general diode or a Schottky diode.

底下藉由具體實施例詳加說明,當更容易瞭解本發明之目的、技術內容、特點及其所達成之功效。The purpose, technical content, features and effects achieved by the present invention will be more readily understood by the detailed description of the embodiments.

本說明書之圖示均屬示意,其維度並未完全按照比例繪示。The illustrations of the present specification are schematic and their dimensions are not drawn to scale.

請參考第2圖,其中以電路圖形式顯示本發明的一個實施例。如圖所示,本實施例中,蕭特基二極體22並非與PMOS電晶體24串連,而係整合成為PMOS電晶體24的一部分,以構成功率開關元件20。此蕭特基二極體22形成於PMOS電晶體24的半導體基體上,與PMOS電晶體24的寄生二極體24D反向串連;該寄生二極體24D則係形成於PMOS電晶體14的汲極和通道區之間。在此種結構下,輸入電壓Vin與輸出電壓Vo之間僅涉及PMOS電晶體24的導通電阻,而無蕭特基二極體之壓降,因此其功率耗損可大幅降低。Referring to Figure 2, an embodiment of the present invention is shown in circuit diagram form. As shown in the figure, in the present embodiment, the Schottky diode 22 is not connected in series with the PMOS transistor 24, but is integrated into a part of the PMOS transistor 24 to constitute the power switching element 20. The Schottky diode 22 is formed on the semiconductor substrate of the PMOS transistor 24 in reverse series with the parasitic diode 24D of the PMOS transistor 24; the parasitic diode 24D is formed on the PMOS transistor 14. Between the bungee and the channel area. In this configuration, the input voltage Vin and the output voltage Vo relate only to the on-resistance of the PMOS transistor 24, and there is no voltage drop of the Schottky diode, so that the power consumption can be greatly reduced.

以上電路以半導體製作時,其實施型態之一例請參閱第3圖。如圖所示,在基體中形成N型井區201,並在基體上沉積閘極氧化層(未繪示)與閘極層202,再以離子植入方式在基體內形成高濃度的P+型摻雜區203、204,分別作為PMOS電晶體24的汲極與源極。輸入電壓Vin除與PMOS電晶體24之P+型摻雜區204連接外,亦直接與N型井區201連接。由於輸入電壓Vin與N型井區201直接連接處並未提供歐姆接觸(ohmic contact),故該處之導通障礙較高,相等於設置了一個蕭特基二極體,與P+型摻雜區203和N型井區201所構成的寄生二極體反向串連,使電流不易從輸出端Vo經N型井區201逆流回輸入端Vin。此外,在較佳實施方式中,更可在N型井區201內蕭特基二極體的位置另設置高濃度P+摻雜區205,以進一步控制蕭特基二極體的反向漏電流。When the above circuit is fabricated in a semiconductor, please refer to Figure 3 for an example of its implementation. As shown in the figure, an N-type well region 201 is formed in the substrate, and a gate oxide layer (not shown) and a gate layer 202 are deposited on the substrate, and a high concentration P+ type is formed in the matrix by ion implantation. The doped regions 203, 204 are respectively used as the drain and source of the PMOS transistor 24. The input voltage Vin is directly connected to the N-type well region 201 in addition to the P+-type doping region 204 of the PMOS transistor 24. Since the direct connection between the input voltage Vin and the N-type well region 201 does not provide an ohmic contact, the conduction barrier is higher at this point, which is equivalent to the provision of a Schottky diode and a P+ doping region. The parasitic diode formed by the 203 and the N-type well region 201 is reversely connected in series, so that the current is not easily reversed from the output terminal Vo through the N-type well region 201 back to the input terminal Vin. In addition, in a preferred embodiment, a high concentration P+ doping region 205 may be further disposed at the position of the Schottky diode in the N-type well region 201 to further control the reverse leakage current of the Schottky diode. .

由第3圖可知,本發明所佔面積僅相當於單一PMOS電晶體24的面積(或再略微增加P+摻雜區205之面積)而已,遠較先前技術為低。由於整體功率開關元件之單位面積下降,因此在相同的功率開關元件總面積下,因節省了蕭特基二極體的區域,本發明之PMOS電晶體24可以使用較大的面積,使其導通電阻更加下降。更詳言之,若與相同面積的先前技術相比較,本發明之功率開關元件的導通電阻約僅為先前技術的1/4,因本發明在輸入-輸出串連路徑中無蕭特基二極體,且PMOS電晶體24導通電阻約僅為一半。As can be seen from Fig. 3, the area occupied by the present invention is only equivalent to the area of the single PMOS transistor 24 (or slightly increased the area of the P+ doped region 205), which is much lower than in the prior art. Since the unit area of the overall power switching element is reduced, the PMOS transistor 24 of the present invention can be used with a larger area to make it conductive due to the area where the Schottky diode is saved under the same total area of the power switching element. The resistance is even lower. More specifically, the on-resistance of the power switching element of the present invention is about 1/4 of that of the prior art when compared to the prior art of the same area, since the present invention has no Schottky in the input-output series path. The polar body and the PMOS transistor 24 have an on-resistance of only about half.

第4圖顯示本發明的另一個實施例,本實施例中之PMOS電晶體係為溝槽式電晶體。如圖所示,在P型基體210上製作兩溝槽,以熱氧化法或其它方式形成閘極氧化層213,並填入導體214(例如為已摻雜之矽或其他導體),即構成了溝槽式PMOS電晶體的閘極。在兩溝槽間之基體區域中,以離子植入法形成摻雜N型雜質的井區215(此步驟在形成溝槽之前或之後進行皆可),並在N型井區215的表面形成高濃度的P+摻雜區216,即構成溝槽式PMOS電晶體的源極,而以基體的背面為汲極。在較佳實施方式中,為提供較佳之汲極接觸阻值,P型基體210宜包含較高濃度的P+型本體211和P型磊晶生長區212。與前一實施例相似地,輸入電壓Vin除與PMOS電晶體24之P+型摻雜區216連接外,亦直接與N型井區215連接,且輸入電壓Vin與N型井區215直接連接處並未提供歐姆接觸,使該處相等於一個蕭特基二極體。本實施例中,P+型摻雜區216一方面作為PMOS電晶體24的源極,一方面可控制蕭特基二極體的反向漏電流。Fig. 4 shows another embodiment of the present invention. The PMOS electro-crystal system in this embodiment is a trench type transistor. As shown, two trenches are formed on the P-type substrate 210, and the gate oxide layer 213 is formed by thermal oxidation or other methods, and is filled with a conductor 214 (for example, a doped germanium or other conductor). The gate of the trench PMOS transistor. In the substrate region between the two trenches, a well region 215 doped with an N-type impurity is formed by ion implantation (this step is performed before or after the trench is formed), and is formed on the surface of the N-type well region 215. The high concentration P+ doped region 216 constitutes the source of the trench PMOS transistor, and the back side of the substrate is the drain. In a preferred embodiment, to provide a preferred drain contact resistance, the P-type substrate 210 preferably includes a relatively high concentration of the P+ body 211 and the P-type epitaxial growth region 212. Similar to the previous embodiment, the input voltage Vin is directly connected to the N-type well region 215 in addition to the P+-type doping region 216 of the PMOS transistor 24, and the input voltage Vin is directly connected to the N-type well region 215. An ohmic contact is not provided, making it equal to a Schottky diode. In this embodiment, the P+ doping region 216 serves as the source of the PMOS transistor 24 on the one hand, and controls the reverse leakage current of the Schottky diode on the other hand.

本發明的整合功率開關元件可以應用在許多地方,例如可供作為充電開關。請參閱第5圖,自電源VCC對電池Batt充電時,其中一種典型的電路結構如圖所示,控制電路10根據電池電壓Vbat與充電電流而產生訊號Vgate,藉以控制充電開關電路50,其中充電電流可根據電阻Rcs之跨壓而得(充電電流=(Isense-Vbat)/Rcs)。The integrated power switching element of the present invention can be used in many places, for example as a charging switch. Referring to FIG. 5, when the battery Batt is charged from the power source VCC, one of the typical circuit structures is as shown in the figure. The control circuit 10 generates a signal Vgate according to the battery voltage Vbat and the charging current, thereby controlling the charging switch circuit 50, wherein charging The current can be obtained from the voltage across the resistor Rcs (charging current = (Isense-Vbat) / Rcs).

第6圖顯示使用本發明之整合功率開關元件20來構成充電開關電路50的一個實施例,本實施例中充電開關電路50包含兩個整合元件20A與20B,以及一個NMOS電晶體52。第一整合元件20A耦接於電源VCC與電池Batt之間,其源極與電源VCC電連接,汲極電連接於節點Isense。NMOS電晶體52的閘極受控於電源VCC,其源極連接控制電路10之輸出Vgate,汲極控制第一整合元件20A的閘極(後文將參照第8圖,對NMOS電晶體52的源極與汲極連接方向作說明)。第二整合元件20B則耦接於第一整合元件20A的閘極和汲極之間,其閘極則受控於電源VCC。由以上結構可看出,在充電狀態時,自電源VCC至節點Isense僅經過一個PMOS電晶體,故其功率耗損遠較第1圖之先前技術為低。Figure 6 shows an embodiment of the charging switch circuit 50 constructed using the integrated power switching element 20 of the present invention. In this embodiment, the charging switch circuit 50 includes two integrated components 20A and 20B, and an NMOS transistor 52. The first integrated component 20A is coupled between the power source VCC and the battery Batt, and has a source electrically connected to the power source VCC and a drain electrically connected to the node Isense. The gate of the NMOS transistor 52 is controlled by the power source VCC, the source thereof is connected to the output Vgate of the control circuit 10, and the gate of the first integrated component 20A is gated (hereinafter will be referred to FIG. 8 for the NMOS transistor 52). Source and drain connection directions are explained). The second integrated component 20B is coupled between the gate and the drain of the first integrated component 20A, and its gate is controlled by the power source VCC. It can be seen from the above structure that in the state of charge, the power consumption from the power supply VCC to the node Isense passes through only one PMOS transistor, so the power consumption is much lower than that of the prior art of FIG.

構成充電開關電路50的方式不只上述一種,第7圖顯示另一實施例,其中NMOS電晶體52改以雙載子電晶體54來取代。本實施例也同樣可達成與第6圖實施例相同的功能。The manner in which the charge switch circuit 50 is constructed is not limited to the above one, and Fig. 7 shows another embodiment in which the NMOS transistor 52 is replaced with a bipolar transistor 54. Also in this embodiment, the same functions as those of the embodiment of Fig. 6 can be achieved.

以上實施例中,整合元件20A與20B可以為第3圖的平面式或第4圖的溝槽式結構。在其中一個實施形態中,整合元件以採用溝槽式結構為佳,且NMOS電晶體52宜採用側向擴散電晶體(LDMOS),雙載子電晶體54宜採用側向雙載子NPN電晶體(Lnpn)。In the above embodiment, the integrating elements 20A and 20B may be the planar type of Fig. 3 or the grooved structure of Fig. 4. In one embodiment, the integrated component is preferably a trench type structure, and the NMOS transistor 52 is preferably a laterally diffused transistor (LDMOS), and the double carrier transistor 54 is preferably a lateral double-carrier NPN transistor. (Lnpn).

請參閱第8圖,以第6圖實施例為例,說明本發明之充電開關電路50的操作。假設電源VCC為5V而電池充滿時電壓為4.2V:充電狀態時,VCC=5V,Vgate=5V,故Vgate1=5V,第一整合元件20A不導通,I1=0。當控制電路10產生0V的Vgate訊號時,VCC=5V,Vgate=0V,此時Vgate1=0V,第一整合元件20A導通,I1經電阻Rcs對電池Batt充電。Referring to Fig. 8, the operation of the charging switch circuit 50 of the present invention will be described by taking the embodiment of Fig. 6 as an example. Assuming that the power supply VCC is 5V and the battery is full, the voltage is 4.2V: in the charging state, VCC=5V, Vgate=5V, so Vgate1=5V, the first integrated component 20A is not turned on, and I1=0. When the control circuit 10 generates a Vgate signal of 0V, VCC=5V, Vgate=0V, at this time Vgate1=0V, the first integrated component 20A is turned on, and I1 charges the battery Batt via the resistor Rcs.

充電完畢,與電源VCC分離後,VCC=0,Vgate=0,Vbat=4.2V,此時NMOS電晶體52不導通但第二整合元件20B導通,Vgate1=4.2V,第一整合元件20A不導通,故反向電流IR1=IR2~0。此時可看出當使用NMOS電晶體52時,宜將其源極與節點Vgate1耦接,汲極與控制電路10耦接,以避免反向電流IR2經由NMOS電晶體52的本體寄生二極體而流往控制電路10。After the charging is completed, after being separated from the power supply VCC, VCC=0, Vgate=0, Vbat=4.2V, at this time, the NMOS transistor 52 is not turned on but the second integrated component 20B is turned on, Vgate1=4.2V, and the first integrated component 20A is not turned on. Therefore, the reverse current IR1=IR2~0. At this time, it can be seen that when the NMOS transistor 52 is used, its source should be coupled to the node Vgate1, and the drain is coupled to the control circuit 10 to avoid the reverse current IR2 passing through the body parasitic diode of the NMOS transistor 52. It flows to the control circuit 10.

由以上說明可知,本發明之功率耗損甚低,遠優於先前技術。As can be seen from the above description, the power consumption of the present invention is very low, which is far superior to the prior art.

當本發明應用於充電開關電路50時,並不絕對需要在PMOS電晶體中整合蕭特基二極體。參閱第8圖,在充電開關電路50中,僅需要使IR1無法透過PMOS電晶體的本體流通,即可。因此請參閱第9圖,可將蕭特基二極體22改為二極體32D,此時整合元件20改變成為一個具有反向串連之雙重寄生二極體32D,24D的PMOS電晶體30。參閱第10圖,可使用PMOS電晶體30A,30B來取代第6圖中的整合元件20A,20B,仍可構成充電開關電路50而達成類似的功能。當然,第7圖電路也可作相同的代換。When the present invention is applied to the charge switch circuit 50, it is not absolutely necessary to integrate the Schottky diode in the PMOS transistor. Referring to Fig. 8, in the charge switch circuit 50, it is only necessary to make the IR1 unable to pass through the body of the PMOS transistor. Therefore, referring to FIG. 9, the Schottky diode 22 can be changed to the diode 32D, and the integrated component 20 is changed to a double-parasitic diode 32D having a reverse series, the PMOS transistor 30 of 24D. . Referring to Fig. 10, the PMOS transistors 30A, 30B can be used instead of the integrated components 20A, 20B of Fig. 6, and the charge switch circuit 50 can still be constructed to achieve a similar function. Of course, the circuit of Figure 7 can also be used for the same substitution.

PMOS電晶體30之半導體結構與整合元件20十分相似,請參閱第11圖之平面式元件結構與第12圖之溝槽式元件結構。第11圖與第3圖之差異在於僅設有單一P+型摻雜區204,作為元件的源極,且N型井區201為浮接。P+型摻雜區204與N型井區201構成本體寄生二極體,即第9圖中的二極體32D。第12圖與第4圖之差異在於僅設有單一P+型摻雜區216,作為元件的源極,且N型井區215為浮接。P+型摻雜區216與N型井區215構成本體寄生二極體,即第9圖中的二極體32D。The semiconductor structure of PMOS transistor 30 is very similar to integrated component 20, see the planar component structure of Figure 11 and the trench component structure of Figure 12. The difference between Fig. 11 and Fig. 3 is that only a single P+ type doped region 204 is provided as the source of the element, and the N-type well region 201 is floating. The P+ doping region 204 and the N-well region 201 constitute an ontoroidal diode, that is, the diode 32D in FIG. The difference between Fig. 12 and Fig. 4 is that only a single P+ type doped region 216 is provided as the source of the element, and the N-type well region 215 is floating. The P+ doping region 216 and the N-type well region 215 constitute a bulk parasitic diode, that is, the diode 32D in FIG.

以上方式所構成之PMOS電晶體30,皆可用於作為第10圖中之PMOS電晶體30A,30B。當然,在本發明之充電開關電路50中,亦可使用整合元件20與PMOS電晶體30各一,亦即僅以PMOS電晶體30取代第6圖或第7圖中第一與第二整合元件20A與20B之一,亦屬本發明的範圍。The PMOS transistor 30 constructed as described above can be used as the PMOS transistors 30A, 30B in FIG. Of course, in the charging switch circuit 50 of the present invention, the integrated component 20 and the PMOS transistor 30 can also be used, that is, the first and second integrated components in FIG. 6 or FIG. 7 can be replaced only by the PMOS transistor 30. One of 20A and 20B is also within the scope of the invention.

以上已針對較佳實施例來說明本發明,唯以上所述者,僅係為使熟悉本技術者易於了解本發明的內容而已,並非用來限定本發明之權利範圍。在本發明之相同精神下,熟悉本技術者可以思及各種等效變化,均應包含在本發明的範圍之內。The present invention has been described with reference to the preferred embodiments thereof, and the present invention is not intended to limit the scope of the present invention. In the same spirit of the invention, various equivalent changes can be made by those skilled in the art, and are intended to be included within the scope of the invention.

10...控制電路10. . . Control circuit

12...蕭特基二極體12. . . Schottky diode

14...PMOS電晶體14. . . PMOS transistor

14D...寄生二極體14D. . . Parasitic diode

20...整合功率開關元件20. . . Integrated power switching components

20A...第一整合元件20A. . . First integrated component

20B...第二整合元件20B. . . Second integrated component

22...蕭特基二極體twenty two. . . Schottky diode

24...PMOS電晶體twenty four. . . PMOS transistor

24D...寄生二極體24D. . . Parasitic diode

30...PMOS電晶體30. . . PMOS transistor

32D...寄生二極體32D. . . Parasitic diode

50...充電開關電路50. . . Charging switch circuit

52...場效電晶體52. . . Field effect transistor

54‧‧‧雙載子電晶體54‧‧‧Double carrier transistor

201‧‧‧N型井區201‧‧‧N type well area

202‧‧‧閘極202‧‧‧ gate

203‧‧‧P+摻雜區203‧‧‧P+ doped area

204‧‧‧P+摻雜區204‧‧‧P+ doped area

205‧‧‧P+摻雜區205‧‧‧P+ doped area

210‧‧‧P型基體210‧‧‧P type substrate

211‧‧‧P+型本體211‧‧‧P+ type ontology

212‧‧‧P型磊晶生長區212‧‧‧P-type epitaxial growth zone

213‧‧‧閘極氧化層213‧‧‧ gate oxide layer

214‧‧‧閘極214‧‧‧ gate

215‧‧‧N型井區215‧‧‧N type well area

216‧‧‧P+摻雜區216‧‧‧P+ doped area

第1圖示出先前技術之功率開關元件,其中包含獨立的PMOS電晶體與獨立的蕭特基二極體。Figure 1 shows a prior art power switching element comprising a separate PMOS transistor and a separate Schottky diode.

第2圖以電路圖形式示出本發明的一個實施例。Figure 2 shows an embodiment of the invention in circuit diagram form.

第3圖示出本發明以半導體來實現時之其中一個實施例。Figure 3 shows one of the embodiments of the present invention when implemented in a semiconductor.

第4圖示出本發明以半導體來實現時之另一個實施例。Fig. 4 shows another embodiment of the present invention when implemented in a semiconductor.

第5圖示出對電池充電的一種典型電路結構。Fig. 5 shows a typical circuit structure for charging a battery.

第6圖示出使用本發明之整合功率開關元件來構成充電開關電路的一個實施例。Figure 6 illustrates an embodiment of a charge switch circuit constructed using the integrated power switching elements of the present invention.

第7圖示出使用本發明之整合功率開關元件來構成充電開關電路的另一個實施例。Figure 7 illustrates another embodiment of a charge switch circuit constructed using the integrated power switching elements of the present invention.

第8圖說明本發明之充電開關電路僅具有極低之功率耗損。Figure 8 illustrates that the charge switch circuit of the present invention has only very low power consumption.

第9圖示出可用於本發明之充電開關電路中的另一種功率開關元件。Figure 9 shows another power switching element that can be used in the charge switch circuit of the present invention.

第10圖示出本發明之充電開關電路的另一個實施例。Fig. 10 shows another embodiment of the charge switch circuit of the present invention.

第11圖示出第9圖中之PMOS電晶體以半導體來實現時之其中一個實施例。Fig. 11 shows an embodiment in which the PMOS transistor in Fig. 9 is implemented as a semiconductor.

第12圖示出第9圖中之PMOS電晶體以半導體來實現時之另一個實施例。Fig. 12 shows another embodiment in the case where the PMOS transistor in Fig. 9 is implemented as a semiconductor.

10...控制電路10. . . Control circuit

20...整合功率開關元件20. . . Integrated power switching components

22...蕭特基二極體twenty two. . . Schottky diode

24...PMOS電晶體twenty four. . . PMOS transistor

24D...寄生二極體24D. . . Parasitic diode

Claims (12)

一種充電開關電路,可供耦接於電源與待充電之電池間,此充電開關電路包含:第一與第二整合元件,及控制第一整合元件之電晶體,其中每一整合元件各包括:一個PMOS電晶體,其包括閘極、源極、汲極與源汲極間之通道區,該源極、汲極及通道區位於一基體內,且在該汲極與該通道區間形成寄生二極體;以及一個與該寄生二極體反向串連的蕭特基二極體,該蕭特基二極體位於該基體內,其一端與該寄生二極體連接,另一端與該源極連接;其中,第一整合元件耦接於電源與電池之間,其源極與電源耦接,汲極與電池耦接;第二整合元件耦接於第一整合元件的閘極和汲極之間,其源極與第一整合元件的閘極耦接,汲極與第一整合元件的汲極耦接,閘極受控於電源;控制第一整合元件之電晶體的第一端受控於電源,第二端接收控制第一整合元件之控制訊號,第三端控制第一整合元件的閘極。 A charging switch circuit is coupled between a power source and a battery to be charged, the charging switch circuit comprising: first and second integrated components, and a transistor for controlling the first integrated component, wherein each integrated component comprises: a PMOS transistor comprising a gate region between a gate, a source, a drain and a source drain, the source, the drain and the channel region being located in a substrate, and a parasitic region is formed between the drain and the channel a polar body; and a Schottky diode in reverse series with the parasitic diode, the Schottky diode being located in the substrate, one end of which is connected to the parasitic diode, and the other end is connected to the source The first integrated component is coupled between the power source and the battery, the source is coupled to the power source, the drain is coupled to the battery, and the second integrated component is coupled to the gate and the drain of the first integrated component The source is coupled to the gate of the first integrated component, the drain is coupled to the drain of the first integrated component, the gate is controlled by the power source, and the first end of the transistor controlling the first integrated component is Controlled by the power supply, the second end receives control of the control of the first integrated component The third end controls the gate of the first integrated component. 如申請專利範圍第1項所述之充電開關電路,其中該控制第一整合元件之電晶體為NMOS電晶體,其閘極受控於電源,源極接收控制第一整合元件之控制訊號,汲極控制第一整合元件的閘極。 The charging switch circuit of claim 1, wherein the transistor for controlling the first integrated component is an NMOS transistor, the gate thereof is controlled by the power source, and the source receives the control signal for controlling the first integrated component, The pole controls the gate of the first integrated component. 如申請專利範圍第2項所述之充電開關電路,其中該NMOS電晶體為側向擴散電晶體(LDMOS)。 The charging switch circuit of claim 2, wherein the NMOS transistor is a lateral diffusion transistor (LDMOS). 如申請專利範圍第1項所述之充電開關電路,其中該控制第一整合元件之電晶體為雙載子電晶體,其基極受控於電源, 集極接收控制第一整合元件之控制訊號,射極控制第一整合元件的閘極。 The charging switch circuit of claim 1, wherein the transistor for controlling the first integrated component is a bipolar transistor, the base of which is controlled by a power source, The collector receives the control signal of the first integrated component, and the emitter controls the gate of the first integrated component. 如申請專利範圍第4項所述之充電開關電路,其中該雙載子電晶體為側向雙載子NPN電晶體(Lnpn)。 The charging switch circuit of claim 4, wherein the bipolar transistor is a lateral bipolar NPN transistor (Lnpn). 如申請專利範圍第1項所述之充電開關電路,其中該第一與第二整合元件為溝槽式結構。 The charging switch circuit of claim 1, wherein the first and second integrated components are of a trench structure. 一種充電開關電路,可供耦接於電源與待充電之電池間,此充電開關電路包含:第一PMOS電晶體,其包括閘極、源極、汲極與源汲極間之通道區,該源極、汲極及通道區位於一基體內,且在該源極與該通道區間形成第一寄生二極體,在該汲極與該通道區間形成第二寄生二極體,第一寄生二極體與第二寄生二極體反向串連;第二PMOS電晶體,其包括閘極、源極、汲極與源汲極間之通道區,該源極、汲極及通道區位於一基體內,且在該源極與該通道區間形成第三寄生二極體,在該汲極與該通道區間形成第四寄生二極體,第三寄生二極體與第四寄生二極體反向串連;以及一個控制第一PMOS電晶體閘極之電晶體;其中,第一PMOS電晶體耦接於電源與電池之間,其源極與電源耦接,汲極與電池耦接;第二PMOS電晶體耦接於第一PMOS電晶體的閘極和汲極之間,其源極與第一PMOS電晶體的閘極耦接,汲極與第一PMOS電晶體的汲極耦接,閘極受控於電源;控制第一PMOS電晶體之電晶體的第一端受控於電源,第二端接收控制第一PMOS電晶體之控制訊號, 第三端控制第一PMOS電晶體的閘極。 A charging switch circuit is configured to be coupled between a power source and a battery to be charged, the charging switch circuit comprising: a first PMOS transistor comprising a channel region between the gate, the source, the drain and the source drain, The source, the drain and the channel region are located in a substrate, and a first parasitic diode is formed between the source and the channel region, and a second parasitic diode is formed between the drain and the channel region, and the first parasitic two The pole body is reversely connected in series with the second parasitic diode; the second PMOS transistor includes a channel region between the gate, the source, the drain and the source drain, and the source, the drain and the channel region are located at a third parasitic diode is formed in the base body and the channel region, and a fourth parasitic diode is formed between the drain and the channel region, and the third parasitic diode and the fourth parasitic diode are opposite And a transistor for controlling the first PMOS transistor gate; wherein, the first PMOS transistor is coupled between the power source and the battery, the source is coupled to the power source, and the drain is coupled to the battery; The second PMOS transistor is coupled between the gate and the drain of the first PMOS transistor, and the source thereof a gate of the PMOS transistor is coupled, the drain is coupled to the drain of the first PMOS transistor, the gate is controlled by the power source; and the first end of the transistor controlling the first PMOS transistor is controlled by the power source, The second end receives the control signal for controlling the first PMOS transistor, The third end controls the gate of the first PMOS transistor. 如申請專利範圍第7項所述之充電開關電路,其中該控制第一PMOS電晶體之電晶體為NMOS電晶體,其閘極受控於電源,源極接收控制第一PMOS電晶體之控制訊號,汲極控制第一PMOS電晶體的閘極。 The charging switch circuit of claim 7, wherein the transistor for controlling the first PMOS transistor is an NMOS transistor, the gate thereof is controlled by the power source, and the source receives the control signal for controlling the first PMOS transistor. The drain controls the gate of the first PMOS transistor. 如申請專利範圍第8項所述之充電開關電路,其中該NMOS電晶體為側向擴散電晶體(LDMOS)。 The charging switch circuit of claim 8, wherein the NMOS transistor is a lateral diffusion transistor (LDMOS). 如申請專利範圍第7項所述之充電開關電路,其中該控制第一PMOS電晶體之電晶體為雙載子電晶體,其基極受控於電源,集極接收控制第一PMOS電晶體之控制訊號,射極控制第一PMOS電晶體的閘極。 The charging switch circuit of claim 7, wherein the transistor for controlling the first PMOS transistor is a bipolar transistor, the base of the transistor is controlled by a power source, and the collector receives and controls the first PMOS transistor. The control signal, the emitter controls the gate of the first PMOS transistor. 如申請專利範圍第10項所述之充電開關電路,其中該雙載子電晶體為側向雙載子NPN電晶體(Lnpn)。 The charging switch circuit of claim 10, wherein the bipolar transistor is a lateral bipolar NPN transistor (Lnpn). 如申請專利範圍第7項所述之充電開關電路,其中該第一與第二PMOS電晶體為溝槽式結構。 The charging switch circuit of claim 7, wherein the first and second PMOS transistors are of a trench structure.
TW098133905A 2009-03-23 2009-10-06 Integrated pmos transistor and schottky diode and charging switch circuit employing the integrated device TWI500166B (en)

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TW349273B (en) * 1994-08-01 1999-01-01 Nippon Electric Co Fabrication method of semiconductor device containing N- and P-channel MOSFETS
TWI221033B (en) * 2003-09-01 2004-09-11 Advanced Power Electronics Cor A method for manufacturing a trench power MOSFET with a Schottky diode

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Publication number Priority date Publication date Assignee Title
TW349273B (en) * 1994-08-01 1999-01-01 Nippon Electric Co Fabrication method of semiconductor device containing N- and P-channel MOSFETS
TWI221033B (en) * 2003-09-01 2004-09-11 Advanced Power Electronics Cor A method for manufacturing a trench power MOSFET with a Schottky diode

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