TWI485589B - Touch panel and manufacturing method thereof - Google Patents

Touch panel and manufacturing method thereof Download PDF

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TWI485589B
TWI485589B TW101147918A TW101147918A TWI485589B TW I485589 B TWI485589 B TW I485589B TW 101147918 A TW101147918 A TW 101147918A TW 101147918 A TW101147918 A TW 101147918A TW I485589 B TWI485589 B TW I485589B
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metal
touch panel
buffer layer
substrate
layer
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TW101147918A
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Chinese (zh)
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TW201426424A (en
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Leng Chieh Lin
Ming Tzu Tu
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Unidisplay Inc
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觸控面板及其製造方法Touch panel and method of manufacturing same

本發明是有關於一種面板及其製造方法,且特別是關於一種觸控面板及其製造方法。The present invention relates to a panel and a method of fabricating the same, and more particularly to a touch panel and a method of fabricating the same.

隨著資訊技術、無線行動通訊和資訊家電的快速發展與應用,為了達到攜帶便利、體積輕巧化以及操作人性化的目的,許多資訊產品已由傳統之鍵盤或滑鼠等輸入裝置,轉變為使用觸碰面板作為輸入裝置。With the rapid development and application of information technology, wireless mobile communication and information appliances, many information products have been transformed from traditional keyboards or mouse input devices to use for the convenience of portability, light weight and user-friendly operation. Touch the panel as an input device.

目前,觸控面板大致可區分為電阻式、電容式、紅外線式及超音波式等觸控面板,其中以電阻式觸控面板與電容式觸控面板為最常見的產品。就電容式觸控面板而言,可多點觸控的特性提供更人性化的操作模式而使得電容式觸控面板受到市場的青睞。Currently, touch panels can be roughly classified into resistive, capacitive, infrared, and ultrasonic touch panels. Among them, resistive touch panels and capacitive touch panels are the most common products. In the case of a capacitive touch panel, the multi-touch feature provides a more user-friendly operation mode, and the capacitive touch panel is favored by the market.

一般而言,電容式觸控面板是藉由使用者透過手指或導電物件觸碰電容式觸控面板所造成之電容值的改變去偵測手指或導電物件的觸碰位置。進一步而言,電容式觸控面板通常具有彼此電性絕緣的雙層導電層。在使用者未觸碰觸控面板下,雙層導電層之間具有一電容初始值。而當使用者觸碰觸控面板時,雙層導電層之間會產生電容值的改變,因而改變原本的電容初始值。此時,則能藉由判別改變的電容值之位置去判定使用者觸碰的位置。In general, a capacitive touch panel detects a touch position of a finger or a conductive object by a change in a capacitance value caused by a user touching a capacitive touch panel through a finger or a conductive object. Further, capacitive touch panels typically have a two-layer conductive layer that is electrically insulated from each other. When the user does not touch the touch panel, there is an initial value of capacitance between the two layers of conductive layers. When the user touches the touch panel, a change in the capacitance value occurs between the two layers of the conductive layer, thereby changing the original initial value of the capacitor. At this time, it is possible to determine the position touched by the user by discriminating the position of the changed capacitance value.

隨著觸控面板的發展漸趨成熟,以及使用者對於資訊 產品輕薄短小的訴求,觸控面板被要求進一步地縮減其厚度,因而發展出一種單層觸控面板。此單層觸控面板因僅具有單層基板以及單層導電層,因此大大地縮減了觸控面板的厚度。然而,在導電層與基板的材質不同下,導電層與基板的接面會存在高接觸阻值,且導電層與基板間的附著力也受到了影響,進而降低了觸控面板的觸控靈敏度及信賴性。As the development of touch panels matures, and users The product is light and thin, and the touch panel is required to further reduce its thickness, thus developing a single-layer touch panel. Since the single-layer touch panel has only a single-layer substrate and a single-layer conductive layer, the thickness of the touch panel is greatly reduced. However, under the different materials of the conductive layer and the substrate, the contact surface between the conductive layer and the substrate may have a high contact resistance value, and the adhesion between the conductive layer and the substrate is also affected, thereby reducing the touch sensitivity of the touch panel and Trustworthiness.

本發明提供一種觸控面板,其具有良好的觸控靈敏度及信賴性。The invention provides a touch panel with good touch sensitivity and reliability.

本發明提供觸控面板的製造方法,其可製作出具有良好的觸控靈敏度及信賴性的觸控面板。The invention provides a method for manufacturing a touch panel, which can produce a touch panel with good touch sensitivity and reliability.

本發明之一實施例提供一種觸控面板,包括基板、金屬層以及金屬緩衝層。金屬層配置於基板上。金屬緩衝層與金屬層疊置,且位於金屬層與基板之間。One embodiment of the present invention provides a touch panel including a substrate, a metal layer, and a metal buffer layer. The metal layer is disposed on the substrate. The metal buffer layer is laminated with the metal and is located between the metal layer and the substrate.

在本發明之一實施例中,前述之金屬緩衝層的輪廓與金屬層的輪廓實質上相同。In an embodiment of the invention, the profile of the metal buffer layer is substantially the same as the profile of the metal layer.

在本發明之一實施例中,前述之金屬層的材質包括銅、鋁、銀、金、鎳金、鎳銅或鋁鎳金。In an embodiment of the invention, the material of the metal layer comprises copper, aluminum, silver, gold, nickel gold, nickel copper or aluminum nickel gold.

在本發明之一實施例中,前述之金屬層包括網格狀的金屬電極(metal mesh)。In an embodiment of the invention, the metal layer comprises a mesh metal mesh.

在本發明之一實施例中,前述之金屬電極的線寬小於7微米。In an embodiment of the invention, the metal electrode has a line width of less than 7 microns.

在本發明之一實施例中,前述之金屬緩衝層的材質包括鈀(Palladium)、鉑(Platinum)、銠(Rhodium)、鎘(Cadmium)、鈷(Cobalt)、銥(Iridium)或鑭系(Lanthanide series)金屬。In an embodiment of the invention, the material of the metal buffer layer comprises Palladium, Platinum, Rhodium, Cadmium, Cobalt, Iridium or Lanthanum. Lanthanide series) metal.

在本發明之一實施例中,前述之金屬緩衝層的厚度小於0.5微米。In an embodiment of the invention, the metal buffer layer has a thickness of less than 0.5 micrometers.

本發明之一實施例提供一種觸控面板的製造方法,包括以下步驟。於基板上形成金屬緩衝層。於基板上形成金屬層,其中金屬緩衝層位於金屬層與基板之間。One embodiment of the present invention provides a method of manufacturing a touch panel, including the following steps. A metal buffer layer is formed on the substrate. A metal layer is formed on the substrate, wherein the metal buffer layer is located between the metal layer and the substrate.

在本發明之一實施例中,前述之金屬緩衝層的輪廓與該金屬層的輪廓實質上相同。In an embodiment of the invention, the profile of the metal buffer layer is substantially the same as the profile of the metal layer.

在本發明之一實施例中,前述之金屬層的材質包括銅、鋁、銀、金、鎳金、鎳銅或鋁鎳金。In an embodiment of the invention, the material of the metal layer comprises copper, aluminum, silver, gold, nickel gold, nickel copper or aluminum nickel gold.

在本發明之一實施例中,前述之金屬層包括網格狀的金屬電極。In an embodiment of the invention, the metal layer comprises a grid-shaped metal electrode.

在本發明之一實施例中,前述之金屬電極的線寬小於7微米。In an embodiment of the invention, the metal electrode has a line width of less than 7 microns.

在本發明之一實施例中,前述形成金屬緩衝層的方法包括網版印刷(screen priting)、噴墨印刷(inkjet priting)、濺鍍、蒸鍍、浸泡、滾輪塗佈或旋轉塗佈。In an embodiment of the invention, the aforementioned method of forming a metal buffer layer comprises screen priting, inkjet priting, sputtering, evaporation, dipping, roller coating or spin coating.

在本發明之一實施例中,前述之金屬緩衝層的材質包括鈀、鉑、銠、鎘、鈷、銥或鑭系金屬。In an embodiment of the invention, the material of the metal buffer layer comprises palladium, platinum, rhodium, cadmium, cobalt, ruthenium or lanthanide metal.

在本發明之一實施例中,前述之金屬緩衝層的厚度小於0.5微米。In an embodiment of the invention, the metal buffer layer has a thickness of less than 0.5 micrometers.

基於上述,本發明可利用在金屬層與基板之間形成金屬緩衝層,來降低金屬層與基板的接面的接觸阻值,且增加金屬層與基板間的附著力。如此,使觸控面板具有良好的觸控靈敏度及信賴性。Based on the above, the present invention can utilize a metal buffer layer between the metal layer and the substrate to reduce the contact resistance between the metal layer and the substrate, and increase the adhesion between the metal layer and the substrate. In this way, the touch panel has good touch sensitivity and reliability.

為讓本發明之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the present invention will be more apparent from the following description.

圖1為本發明一實施例之觸控面板的剖面示意圖。圖2為圖1之之觸控面板的上視示意圖。請參照圖1及圖2,本實施例之觸控面板100的製造方法例如是相繼地於基板110上形成金屬緩衝層120以及金屬層130,其中金屬緩衝層120與金屬層130疊置,金屬緩衝層120並位於金屬層130與基板110之間。FIG. 1 is a cross-sectional view of a touch panel according to an embodiment of the invention. 2 is a top plan view of the touch panel of FIG. 1. Referring to FIG. 1 and FIG. 2 , the manufacturing method of the touch panel 100 of the present embodiment is, for example, sequentially forming a metal buffer layer 120 and a metal layer 130 on the substrate 110 , wherein the metal buffer layer 120 and the metal layer 130 are stacked, and the metal The buffer layer 120 is located between the metal layer 130 and the substrate 110.

在本實施例中,基板110的材質例如為透明材質。此處,透明材質泛指一般具備高穿透率之材質,而非用以限定穿透率為100%之材質。此外,基板110可以是可撓基板。詳言之,基板110的材質可以是高分子材質。所述高分子材質例如是聚乙烯(PE)、聚丙烯(PP)、聚苯乙烯(PS)、聚甲基丙烯酸甲酯(PMMA)、聚氯乙烯(PVC)、尼龍(Nylon)、聚碳酸酯(PC)、聚氨酯(PU)、聚四氟乙烯(PTFE)、聚對苯二甲酸乙二酯(PET)、聚醯亞胺(Polyimide,PI)、丙烯酸樹酯(acrylic resin)或聚甲基丙烯酸甲酯與聚碳酸酯的混合材料等材質。應用所述可撓基 板所形成之觸控面板可具有撓曲性,因而適於包覆在撓曲表面或是任何需要觸控功能的可撓曲物件上,例如是顯示面板。在其他實施例中,基板110也可選用硬質基板,其中硬質基板的材質可以是玻璃、石英或其它合適的材質。In the present embodiment, the material of the substrate 110 is, for example, a transparent material. Here, a transparent material generally refers to a material that generally has a high transmittance, and is not a material that defines a transmittance of 100%. Further, the substrate 110 may be a flexible substrate. In detail, the material of the substrate 110 may be a polymer material. The polymer material is, for example, polyethylene (PE), polypropylene (PP), polystyrene (PS), polymethyl methacrylate (PMMA), polyvinyl chloride (PVC), nylon (Nylon), polycarbonate. Ester (PC), polyurethane (PU), polytetrafluoroethylene (PTFE), polyethylene terephthalate (PET), polyimide (PI), acrylic resin or polymethyl A material such as a mixture of methyl acrylate and polycarbonate. Applying the flexible base The touch panel formed by the board can be flexible and thus suitable for being wrapped on a flexible surface or any flexible object that requires a touch function, such as a display panel. In other embodiments, the substrate 110 may also be a rigid substrate, wherein the hard substrate may be made of glass, quartz or other suitable materials.

金屬層130的材質包括銅、鋁、銀、金、鎳金、鎳銅、鋁鎳金或其他導電良好的材質。在本實施例中,金屬層130例如包括網格狀的金屬電極E。所述金屬電極E可視為多條金屬走線交錯而成,其中部分的金屬走線沿第一方向X延伸且沿第二方向Y排列,而另一部份的金屬走線沿第二方向Y延伸且沿第一方向X排列。本實施例之第一方向X例如是垂直於第二方向Y,但本發明不用以限定第一方向X必須垂直於第二方向Y,且也不用以限定金屬電極E的形狀。在其他未繪示的實施例中,金屬電極E也可以是蜂巢狀或其他多邊形的金屬電極。The material of the metal layer 130 includes copper, aluminum, silver, gold, nickel gold, nickel copper, aluminum nickel gold or other conductive materials. In the present embodiment, the metal layer 130 includes, for example, a grid-shaped metal electrode E. The metal electrode E can be formed by interlacing a plurality of metal traces, wherein a part of the metal traces extend along the first direction X and are arranged along the second direction Y, and the other part of the metal traces along the second direction Y Extending and aligning in the first direction X. The first direction X of the present embodiment is, for example, perpendicular to the second direction Y, but the present invention does not have to define the first direction X to be perpendicular to the second direction Y, and is not intended to define the shape of the metal electrode E. In other embodiments not shown, the metal electrode E may also be a honeycomb or other polygonal metal electrode.

在本實施例中,金屬電極E雖為透光率低的金屬材質,然而,透過將金屬電極E的線寬L設在低於肉眼可視的寬度下,例如使金屬電極E的線寬L小於7微米,使用者在使用觸控面板100時則不會直接看見金屬電極E。如此,可避免視覺上的干擾且也增加觸控面板100的美觀。In the present embodiment, the metal electrode E is made of a metal material having a low light transmittance. However, by setting the line width L of the metal electrode E to be lower than the width visible to the naked eye, for example, the line width L of the metal electrode E is smaller than At 7 micrometers, the user does not directly see the metal electrode E when using the touch panel 100. In this way, visual interference can be avoided and the aesthetics of the touch panel 100 is also increased.

金屬緩衝層120作為金屬層130的催化劑或是作為金屬層130的觸媒轉換層,而可提升金屬層130的導電性。詳言之,金屬緩衝層120的材質可以是鈀、鉑、銠、鎘、鈷、銥或鑭系金屬其中,金屬緩衝層120的厚度H例如是小於0.5微米。在本實施例中,金屬緩衝層120的厚度例 如是落在0.1微米至0.4微米之間。此外,形成金屬緩衝層120的方法可以包括網版印刷、噴墨印刷、濺鍍、蒸鍍、浸泡、滾輪塗佈或旋轉塗佈。The metal buffer layer 120 serves as a catalyst for the metal layer 130 or as a catalyst conversion layer for the metal layer 130, and the conductivity of the metal layer 130 can be improved. In detail, the material of the metal buffer layer 120 may be palladium, platinum, rhodium, cadmium, cobalt, rhodium or lanthanide metal. The thickness H of the metal buffer layer 120 is, for example, less than 0.5 μm. In the present embodiment, the thickness of the metal buffer layer 120 is as an example. If it falls between 0.1 microns and 0.4 microns. Further, the method of forming the metal buffer layer 120 may include screen printing, inkjet printing, sputtering, evaporation, dipping, roller coating, or spin coating.

作為金屬層130與基板110之間的緩衝層,金屬緩衝層120例如是形成在基板110之欲形成金屬層130的位置上。在本實施例中,金屬緩衝層120的輪廓與金屬層130的輪廓實質上相同。換言之,本實施例在形成金屬層130後,金屬緩衝層120例如是完全地被金屬層130覆蓋。然而,本發明並不用以限定金屬緩衝層120的圖案或是其相對於金屬層130的大小。As a buffer layer between the metal layer 130 and the substrate 110, the metal buffer layer 120 is formed, for example, at a position where the metal layer 130 of the substrate 110 is to be formed. In the present embodiment, the outline of the metal buffer layer 120 is substantially the same as the outline of the metal layer 130. In other words, after the metal layer 130 is formed in the present embodiment, the metal buffer layer 120 is completely covered by the metal layer 130, for example. However, the present invention is not intended to define the pattern of the metal buffer layer 120 or its size relative to the metal layer 130.

習知技術的觸控面板是將透明的金屬氧化層形成於基板上以進行觸控偵測,其中金屬氧化層與基板的接面的接觸阻值一般是大於150歐姆。相較之下,本實施例之觸控面板100透過金屬緩衝層120的設置,可增加金屬層130與基板110間的附著力並降低接觸阻值,例如是將接觸阻值降至20歐姆以下。因此,相較於習知技術的觸控面板,本實施例之觸控面板100可具有較佳之觸控靈敏度以及信賴性。The touch panel of the prior art is formed by forming a transparent metal oxide layer on the substrate for touch detection, wherein the contact resistance between the metal oxide layer and the substrate is generally greater than 150 ohms. In contrast, the touch panel 100 of the present embodiment can increase the adhesion between the metal layer 130 and the substrate 110 and reduce the contact resistance by the arrangement of the metal buffer layer 120, for example, reducing the contact resistance to less than 20 ohms. . Therefore, the touch panel 100 of the present embodiment can have better touch sensitivity and reliability than the touch panel of the prior art.

此外,相較於習知技術的電容式觸控面板藉由一層絕緣層以及彼此電性絕緣的雙層導電層做為其觸控結構,本實施例以金屬層130之金屬電極E做為觸控結構,因此本實施例之觸控面板100可具有相對薄之厚度而更符合使用者對於資訊產品輕薄短小的訴求,且具有較高的結構強度而更適於應用在可撓取的物件上。另外,本實施例之觸控面板100之金屬電極E還具有相對低的阻值以及相對低的 製程成本,因此更具有相對廣的應用範疇及商業競爭力。In addition, the capacitive touch panel of the prior art has a double-layer conductive layer electrically insulated from each other as a touch structure, and the present embodiment uses the metal electrode E of the metal layer 130 as a touch. The touch panel 100 of the present embodiment can have a relatively thin thickness and is more suitable for the user's appeal to the information product, and has a higher structural strength and is more suitable for application on the flexible object. . In addition, the metal electrode E of the touch panel 100 of the present embodiment also has a relatively low resistance value and a relatively low value. Process costs, therefore, have a relatively wide range of applications and commercial competitiveness.

綜上所述,本發明可利用在金屬層與基板之間形成金屬緩衝層,來增加金屬層與基板間的附著力並降低金屬層與基板的接面的接觸阻值。如此,使觸控面板具有良好的信賴性及觸控靈敏度。In summary, the present invention can utilize a metal buffer layer between the metal layer and the substrate to increase the adhesion between the metal layer and the substrate and reduce the contact resistance between the metal layer and the substrate. In this way, the touch panel has good reliability and touch sensitivity.

雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,故本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.

100‧‧‧觸控面板100‧‧‧ touch panel

110‧‧‧基板110‧‧‧Substrate

120‧‧‧金屬緩衝層120‧‧‧Metal buffer layer

130‧‧‧金屬層130‧‧‧metal layer

E‧‧‧金屬電極E‧‧‧Metal electrode

L‧‧‧線寬L‧‧‧ line width

H‧‧‧厚度H‧‧‧thickness

X‧‧‧第一方向X‧‧‧ first direction

Y‧‧‧第二方向Y‧‧‧second direction

圖1為本發明一實施例之觸控面板的剖面示意圖。FIG. 1 is a cross-sectional view of a touch panel according to an embodiment of the invention.

圖2為圖1之之觸控面板的上視示意圖。2 is a top plan view of the touch panel of FIG. 1.

100‧‧‧觸控面板100‧‧‧ touch panel

110‧‧‧基板110‧‧‧Substrate

120‧‧‧金屬緩衝層120‧‧‧Metal buffer layer

130‧‧‧金屬層130‧‧‧metal layer

H‧‧‧厚度H‧‧‧thickness

Claims (13)

一種觸控面板,包括:一基板;一金屬層,配置於該基板上;以及一金屬緩衝層,與該金屬層疊置,且位於該金屬層與該基板之間,其中該金屬緩衝層的輪廓與該金屬層的輪廓實質上相同。 A touch panel includes: a substrate; a metal layer disposed on the substrate; and a metal buffer layer stacked on the metal and located between the metal layer and the substrate, wherein the metal buffer layer is contoured It is substantially the same as the outline of the metal layer. 如申請專利範圍第1項所述之觸控面板,其中該金屬層的材質包括銅、鋁、銀、金、鎳金、鎳銅或鋁鎳金。 The touch panel of claim 1, wherein the metal layer comprises copper, aluminum, silver, gold, nickel gold, nickel copper or aluminum nickel gold. 如申請專利範圍第1項所述之觸控面板,其中該金屬層包括一網格狀的金屬電極。 The touch panel of claim 1, wherein the metal layer comprises a grid-shaped metal electrode. 如申請專利範圍第3項所述之觸控面板,其中該金屬電極的線寬小於7微米。 The touch panel of claim 3, wherein the metal electrode has a line width of less than 7 micrometers. 如申請專利範圍第1項所述之觸控面板,其中該金屬緩衝層的材質包括鈀、鉑、銠、鎘、鈷、銥或鑭系金屬。 The touch panel of claim 1, wherein the material of the metal buffer layer comprises palladium, platinum, rhodium, cadmium, cobalt, ruthenium or lanthanide metal. 如申請專利範圍第1項所述之觸控面板,其中該金屬緩衝層的厚度小於0.5微米。 The touch panel of claim 1, wherein the metal buffer layer has a thickness of less than 0.5 micrometers. 一種觸控面板的製造方法,包括:於一基板上相繼地形成一金屬緩衝層以及一金屬層,其中該金屬緩衝層與該金屬層疊置並位於該金屬層與該基板之間,其中該金屬緩衝層的輪廓與該金屬層的輪廓實質上相同。 A method for manufacturing a touch panel, comprising: sequentially forming a metal buffer layer and a metal layer on a substrate, wherein the metal buffer layer is laminated with the metal and located between the metal layer and the substrate, wherein the metal The outline of the buffer layer is substantially the same as the outline of the metal layer. 如申請專利範圍第7項所述之觸控面板的製造方法,其中該金屬層的材質包括銅、鋁、銀、金、鎳金、鎳 銅或鋁鎳金。 The method for manufacturing a touch panel according to claim 7, wherein the material of the metal layer comprises copper, aluminum, silver, gold, nickel gold, nickel. Copper or aluminum nickel gold. 如申請專利範圍第7項所述之觸控面板的製造方法,其中該金屬層包括一網格狀的金屬電極。 The method of manufacturing a touch panel according to claim 7, wherein the metal layer comprises a grid-shaped metal electrode. 如申請專利範圍第9項所述之觸控面板的製造方法,其中該金屬電極的線寬小於7微米。 The method of manufacturing a touch panel according to claim 9, wherein the metal electrode has a line width of less than 7 micrometers. 如申請專利範圍第7項所述之觸控面板的製造方法,其中形成該金屬緩衝層的方法包括網版印刷、噴墨印刷、濺鍍、蒸鍍、浸泡、滾輪塗佈或旋轉塗佈。 The method of manufacturing the touch panel of claim 7, wherein the method of forming the metal buffer layer comprises screen printing, inkjet printing, sputtering, evaporation, dipping, roller coating or spin coating. 如申請專利範圍第7項所述之觸控面板的製造方法,其中該金屬緩衝層的材質包括鈀、鉑、銠、鎘、鈷、銥或鑭系金屬。 The method for manufacturing a touch panel according to claim 7, wherein the material of the metal buffer layer comprises palladium, platinum, rhodium, cadmium, cobalt, ruthenium or lanthanide metal. 如申請專利範圍第7項所述之觸控面板的製造方法,其中該金屬緩衝層的厚度小於0.5微米。The method of manufacturing a touch panel according to claim 7, wherein the metal buffer layer has a thickness of less than 0.5 μm.
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