JP2012247852A - Transparent conductive structure applicable to touch panel, and manufacturing method for the structure - Google Patents

Transparent conductive structure applicable to touch panel, and manufacturing method for the structure Download PDF

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JP2012247852A
JP2012247852A JP2011117163A JP2011117163A JP2012247852A JP 2012247852 A JP2012247852 A JP 2012247852A JP 2011117163 A JP2011117163 A JP 2011117163A JP 2011117163 A JP2011117163 A JP 2011117163A JP 2012247852 A JP2012247852 A JP 2012247852A
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transparent conductive
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Choketsu Shu
兆杰 朱
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Innovation and Infinity Global Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a transparent conductive structure applicable to a touch panel and a manufacturing method for the structure.SOLUTION: A transparent conductive structure comprises: a substrate unit having at least one transparent substrate; a first coating unit having at least one first coating layer formed on an upper surface of the at least one transparent substrate; a transparent conductive unit having at least one transparent conductive layer formed on an upper surface of the at least one first coating layer, and having a plurality of conductive circuits arranged in a predetermined circuit pattern on the at least one transparent conductive layer; and a second coating unit having at least one second coating layer formed on an upper surface of the at least one transparent conductive layer from a mixture of silicon oxide, aluminum oxide, lithium oxide, and Teflon (Registered trademark), and having a touch surface that can be touched by an operator (for example, a finger of a user or any kind of touch pen) at an apex of the at least one second coating layer.

Description

本発明は、透明導電構造及びその製造方法に関し、特にタッチパネルに適用される透明導電構造及びその製造方法に関するものである。   The present invention relates to a transparent conductive structure and a manufacturing method thereof, and particularly relates to a transparent conductive structure applied to a touch panel and a manufacturing method thereof.

一般的にタッチパネルは、その検出原理によって電気抵抗型、容量型、圧電型、赤外線型、超音波型に大別され、このうち、容量型のタッチパネルは、ガラス表面に透明導電材料膜がインナーリード線としてメッキされ、ガラス周縁の金属リード線を介して信号を外部のフレキシブル板又はリジッド板上の集積回路(IC)に伝送するタッチセンサー(touch sensor)と呼ばれる構造がある。その構造に外部の回路板及び最上方の保護カバーをさらに貼り付けるとタッチパネルとなる。使用時において、電界が均一であるガラス表面をユーザが指先でタッチすると、静電気が発生し、指と電界との間に容量の変化が生じ、この変化に基づいて入力点位置の座標を位置決めすることができる。   In general, touch panels are roughly classified into electric resistance type, capacitive type, piezoelectric type, infrared type, and ultrasonic type according to the detection principle. Among these, capacitive type touch panels have a transparent conductive material film on the glass surface as an inner lead. There is a structure called a touch sensor that is plated as a wire and transmits a signal to an integrated circuit (IC) on an external flexible plate or a rigid plate through a metal lead wire around the glass. When an external circuit board and the uppermost protective cover are further attached to the structure, a touch panel is obtained. In use, when a user touches a glass surface with a uniform electric field with a fingertip, static electricity is generated, and a capacitance change occurs between the finger and the electric field, and the coordinates of the input point position are positioned based on this change. be able to.

図1は、タッチパネルに適用される透明導電構造の周知技術を開示しており、その構造は、PET基板1aと、PET基板1aの上表面に形成された硬質コーティング2aと、PET基板1aの下表面に形成された複数の導電回路3aと、前記複数の導電回路3aの保護のために前記複数の導電回路3aを被覆するための保護層4aとを備える。しかしながら、上述した構造において前記複数の導電回路3aが硬質コーティング2aの上表面20a(即ちユーザがタッチパネルを操作する場合に接触する接触表面)よりかなり離れているため、前記複数の導電回路3aは、電気伝導度(導電範囲)が0.3オーム/平方(Ω/□)よりも低い超低導電材料を利用する必要がある。   FIG. 1 discloses a well-known technique of a transparent conductive structure applied to a touch panel. The structure includes a PET substrate 1a, a hard coating 2a formed on the upper surface of the PET substrate 1a, and a bottom of the PET substrate 1a. A plurality of conductive circuits 3a formed on the surface, and a protective layer 4a for covering the plurality of conductive circuits 3a to protect the plurality of conductive circuits 3a. However, in the above-described structure, the plurality of conductive circuits 3a are considerably separated from the upper surface 20a of the hard coating 2a (that is, the contact surface that is contacted when the user operates the touch panel). It is necessary to use an ultra-low conductivity material having an electrical conductivity (conducting range) lower than 0.3 ohm / square (Ω / □).

本発明は、タッチパネルに適用される透明導電構造及びその製造方法を提供することを目的とする。   An object of this invention is to provide the transparent conductive structure applied to a touchscreen, and its manufacturing method.

本発明は、少なくとも1つの透明基板を有する基板ユニットと、前記少なくとも1つの透明基板の上表面に形成された少なくとも1つの第1の被覆層を有する第1の被覆ユニットと、前記少なくとも1つの第1の被覆層の上表面に形成された少なくとも1つの透明導電層を有し、前記少なくとも1つの透明導電層に所定の回路パターンに配列形成された複数の導電回路が設けられた透明導電ユニットと、前記少なくとも1つの透明導電層の上表面に形成されるとともに酸化シリコンと酸化アルミニウムと酸化リチウムとテフロン(登録商標)(Teflon)とが相互に混合されて成る少なくとも1つの第2の被覆層を有し、前記少なくとも1つの第2の被覆層の頂端に操作子(例えばユーザの指又は如何なる他のタッチペン等)がタッチ可能なタッチ表面が設けられた第2の被覆ユニットと、を備えることを特徴とするタッチパネルに適用される透明導電構造を提供する。   The present invention includes a substrate unit having at least one transparent substrate, a first covering unit having at least one first covering layer formed on an upper surface of the at least one transparent substrate, and the at least one first substrate. A transparent conductive unit having at least one transparent conductive layer formed on an upper surface of one coating layer, and provided with a plurality of conductive circuits arranged in a predetermined circuit pattern on the at least one transparent conductive layer; And at least one second coating layer formed on the upper surface of the at least one transparent conductive layer and formed by mixing silicon oxide, aluminum oxide, lithium oxide, and Teflon (Teflon) with each other. And an operator (for example, a user's finger or any other touch pen) can be touched on the top end of the at least one second covering layer. Providing a second coating unit which touch surface is provided, such a transparent conductive structure applied to a touch panel, characterized in that it comprises a.

また、本発明は、まず、少なくとも1つの透明基板を有する基板ユニットを用意する工程と、次に、前記少なくとも1つの透明基板の上表面に、少なくとも1つの第1の被覆層を形成する工程と、そして、前記少なくとも1つの第1の被覆層の上表面に、所定の回路パターンに配列形成された複数の導電回路が設けられた少なくとも1つの透明導電層を形成する工程と、最後に、前記少なくとも1つの透明導電層の上表面に、頂端に操作子がタッチ可能なタッチ表面が設けられるとともに酸化シリコンと酸化アルミニウムと酸化リチウムとテフロン(登録商標)(登録商標)とが相互に混合されてなる少なくとも1つの第2の被覆層を形成する工程と、を備えることを特徴とするタッチパネルに適用される透明導電構造の製造方法を提供する。   The present invention also includes a step of first preparing a substrate unit having at least one transparent substrate, and a step of forming at least one first covering layer on the upper surface of the at least one transparent substrate. And forming at least one transparent conductive layer provided with a plurality of conductive circuits arranged in a predetermined circuit pattern on the upper surface of the at least one first covering layer, and finally, At least one transparent conductive layer is provided with a touch surface on the top end to which an operator can touch, and silicon oxide, aluminum oxide, lithium oxide, and Teflon (registered trademark) are mixed with each other. Forming a transparent conductive structure applied to a touch panel, comprising: forming at least one second covering layer.

上述のように、本発明に係る透明導電構造及びその製造方法は、操作子がタッチ可能なタッチ表面と前記所定の回路パターンとの距離を近接させるように構成されているため、前記複数の導電回路を超低導電材料で製造する必要がなく、導電範囲が0.8〜3オーム/平方である回路パターンを得ることができ、タッチパネルに適用することができる。さらに、前記少なくとも1つの第2の被覆層は、酸化シリコンと酸化アルミニウムと酸化リチウムとテフロン(登録商標)(登録商標)とが相互に混合され、磨耗性が高く摩擦係数が低い特徴を有する硬質保護層が形成される。   As described above, the transparent conductive structure and the manufacturing method thereof according to the present invention are configured so that the distance between the touch surface that can be touched by the operator and the predetermined circuit pattern is close to each other. There is no need to manufacture the circuit with an ultra-low conductive material, and a circuit pattern with a conductive range of 0.8 to 3 ohm / square can be obtained and applied to a touch panel. Furthermore, the at least one second coating layer is a hard material having a feature of high wear resistance and low friction coefficient, in which silicon oxide, aluminum oxide, lithium oxide, and Teflon (registered trademark) are mixed with each other. A protective layer is formed.

従来のタッチパネルに適用される透明導電構造の側面断面模式図を示す。The side surface cross-section schematic diagram of the transparent conductive structure applied to the conventional touch panel is shown. 本発明に係る第1の実施形態のフローを示す。The flow of 1st Embodiment which concerns on this invention is shown. (a)ステップS100乃至ステップS102が完了した本発明に係る第1の実施形態の側面断面模式図を示す。(b)ステップS104が完了した本発明に係る第1の実施形態の側面断面模式図を示す。(c)ステップS106が完了した本発明に係る第1の実施形態の側面断面模式図を示す。(A) The side surface cross-section schematic diagram of 1st Embodiment which concerns on this invention which completed step S100 thru | or step S102 is shown. (B) The side surface cross-section schematic diagram of 1st Embodiment which concerns on this invention which completed step S104 is shown. (C) The side surface cross-section schematic diagram of 1st Embodiment which concerns on this invention which completed step S106 is shown. 本発明に係る第1の実施形態の複数の導電回路のレイアウト方法の上面模式図を示す。1 is a schematic top view of a layout method for a plurality of conductive circuits according to a first embodiment of the present invention. 本発明に係る第2の実施形態の側面断面模式図を示す。The side surface cross-sectional schematic diagram of 2nd Embodiment which concerns on this invention is shown. 本発明に係る第3の実施形態の側面断面模式図を示す。The side surface cross-section schematic diagram of 3rd Embodiment which concerns on this invention is shown. 本発明に係る第4の実施形態の側面断面模式図を示す。The side surface cross-sectional schematic diagram of 4th Embodiment which concerns on this invention is shown.

[第1の実施形態]
本発明に係る第1の実施形態のタッチパネルに適用される透明導電構造の製造方法は、少なくとも以下のステップ(図2に示すステップS100乃至ステップS106参照)を有する。
[First Embodiment]
The manufacturing method of the transparent conductive structure applied to the touch panel of the first embodiment according to the present invention includes at least the following steps (see steps S100 to S106 shown in FIG. 2).

図2及び図3(a)に示すように、ステップS100において、少なくともつの透明基板10を有する基板ユニット1を用意する。前記少なくとも1つの透明基板10は、例えば、ポリエチレンテレフタレート(polyethylene Terephthalate、PET)、ポリカーボネート(Poly Carbonate、PC)、ポリエチレン(polyethylene、PE)、ポリ塩化ビニル(Poly Vinyl Chloride、PVC)、ポリプロピレン(Poly Propylene、PP)、ポリスチレン(Poly Styrene、PS)、又はポリメタクリル酸メチル(Polymethylmethacrylate、PMMA)のいずれから選択され、厚さは、50μm〜125μmであってよい。言い換えれば、設計者は、異なる需要に応じて、異なる材料を利用して前記少なくとも1つの透明基板10を製造することができる。透明基板10の製造材料には制限がなく、透明基板10を製造可能な材料(例えばプラスチック、ガラス等)であれば、いずれも本発明に適用することができる。   As shown in FIGS. 2 and 3A, in step S100, a substrate unit 1 having at least one transparent substrate 10 is prepared. The at least one transparent substrate 10 is made of, for example, polyethylene terephthalate (PET), polycarbonate (Poly Carbonate, PC), polyethylene (Polyethylene, PE), polyvinyl chloride (Poly Vinyl Chloride (PVC)), polypropylene (Poly Propylene). , PP), polystyrene (Poly Styrene, PS), or polymethylmethacrylate (PMMA), and the thickness may be 50 μm to 125 μm. In other words, the designer can manufacture the at least one transparent substrate 10 using different materials according to different demands. There are no limitations on the material for manufacturing the transparent substrate 10, and any material that can manufacture the transparent substrate 10 (for example, plastic, glass, etc.) can be applied to the present invention.

ステップS102において、少なくとも1つの第1の被覆層20を前記少なくとも1つの透明基板10の上表面に形成する。前記少なくとも1つの第1の被覆層20は、例えば、硬質材料からなる硬質被覆層であってもよい。言い換えれば、設計者は、異なる需要に応じて、異なる硬質材料を利用して前記少なくとも1つの第1の被覆層20を製造することができる。例えば、硬質材料が紫外線硬化材料である場合、該硬質被覆層は、紫外線硬化被覆層となる。しかしながら、第1の被覆層20の製造材料には制限がなく、第1の被覆層20を製造可能な材料であれば、いずれも本発明に適用することができる。   In step S <b> 102, at least one first covering layer 20 is formed on the upper surface of the at least one transparent substrate 10. The at least one first covering layer 20 may be a hard covering layer made of a hard material, for example. In other words, the designer can manufacture the at least one first covering layer 20 using different hard materials according to different demands. For example, when the hard material is an ultraviolet curable material, the hard coating layer is an ultraviolet curable coating layer. However, there are no restrictions on the manufacturing material of the first coating layer 20, and any material that can manufacture the first coating layer 20 can be applied to the present invention.

図2及び図3(b)に示すように、ステップS104において、前記少なくとも1つの第1の被覆層20の上表面に、所定の回路パターンPに配列形成された複数の導電回路300が設けられた少なくとも1つの透明導電層30を形成する。前記透明導電ユニット3は、例えば、酸化インジウム錫(ITO)導電層であり、前記導電回路300は、前記少なくとも1つの透明導電層30の上表面に形成されてもよい。異なる需要に応じて、前記複数の導電回路300は、銀材料からなる銀回路、アルミニウム材料からなるアルミニウム回路、銅材料からなる銅回路、又は如何なる導電材料からなる導電回路であってもよい。また、前記複数の導電回路300は、超低導電材料で製造する必要がなく、導電範囲(電気伝導度)が0.8〜3オーム/平方である前記所定の回路パターンPを得ることができる。言い換えれば、設計者は、所定の回路パターンP及び所定の導電範囲に応じて、複数の導電回路300を前記少なくとも1つの透明導電層30の上表面に製造することができる。   As shown in FIGS. 2 and 3B, in step S104, a plurality of conductive circuits 300 arranged in a predetermined circuit pattern P are provided on the upper surface of the at least one first covering layer 20. At least one transparent conductive layer 30 is formed. The transparent conductive unit 3 may be, for example, an indium tin oxide (ITO) conductive layer, and the conductive circuit 300 may be formed on the upper surface of the at least one transparent conductive layer 30. Depending on different demands, the plurality of conductive circuits 300 may be silver circuits made of silver material, aluminum circuits made of aluminum material, copper circuits made of copper material, or conductive circuits made of any conductive material. Further, the plurality of conductive circuits 300 do not need to be manufactured with an ultra-low conductive material, and the predetermined circuit pattern P having a conductive range (electrical conductivity) of 0.8 to 3 ohm / square can be obtained. . In other words, the designer can manufacture a plurality of conductive circuits 300 on the upper surface of the at least one transparent conductive layer 30 according to a predetermined circuit pattern P and a predetermined conductive range.

さらに、図3(b)及び図4に示すように、前記複数の導電回路300は、例えば、横向きに延伸する複数のX軸方向軌跡回路300Xと、縦向き(前記横向きとは互いに略直交する)に延伸するとともに前記複数のX軸方向軌跡回路300Xと互いに絶縁され且つ略直交する複数のY軸方向軌跡回路300Yとから成り、厚さH(図3(b)参照)は、3000Å〜5000Åであり、前記X軸方向軌跡回路300Xは、幅W1が3000Å〜5000Åであり、前記X軸方向軌跡回路300X同士間の距離D1は、10μm〜20μmであり、前記複数のY軸方向軌跡回路300Yは、幅W2が1000Å〜2000Åであり、前記Y軸方向軌跡回路300Y同士間の距離D2は、5μm〜15μmである。しかしながら、上述した複数の導電回路300は、例示に過ぎず、本発明を限定するものではない。   Further, as shown in FIGS. 3B and 4, the plurality of conductive circuits 300 include, for example, a plurality of X-axis direction trajectory circuits 300 </ b> X extending in the horizontal direction and a vertical direction (the horizontal direction is substantially orthogonal to each other). ) And a plurality of Y-axis direction trajectory circuits 300Y that are insulated from and substantially orthogonal to the plurality of X-axis direction trajectory circuits 300X, and the thickness H (see FIG. 3B) is 3000 to 5000 mm. The X-axis direction trajectory circuit 300X has a width W1 of 3000 mm to 5000 mm, a distance D1 between the X-axis direction trajectory circuits 300X is 10 μm to 20 μm, and the plurality of Y-axis direction trajectory circuits 300Y. The width W2 is 1000 to 2000 mm, and the distance D2 between the Y-axis direction trajectory circuits 300Y is 5 to 15 μm. However, the plurality of conductive circuits 300 described above are merely examples, and do not limit the present invention.

図2及び図3(c)に示すように、ステップS106において、前記少なくとも1つの透明導電層30の上表面に、頂端に操作子(例えばユーザの指F又は如何なるタッチペン等)がタッチ可能なタッチ表面400が設けられた少なくとも1つの第2の被覆層40を形成する。前記複数の導電回路300は、前記少なくとも1つの透明導電層30の上表面に形成されているため、前記少なくとも1つの第2の被覆層40に被覆される。また、前記少なくとも1つの第2の被覆層40は、例えば、硬質材料からなる硬質保護層であり、例えば、少なくとも酸化シリコン(例えば二酸化シリコン(SiO))と酸化アルミニウム(例えばアルミナ(Al))と酸化リチウムとテフロン(登録商標)(登録商標)とが相互に混合されてなり、前記酸化シリコンの第2の被覆層40に対する重量%は、60%〜95%であり、酸化アルミニウムの第2の被覆層40に対する重量%は、20%〜25%であり、酸化リチウムの第2の被覆層40に対する重量%は、5%〜10%であり、テフロン(登録商標)(登録商標)の第2の被覆層40に対する重量%は、5%〜10%である。 As shown in FIG. 2 and FIG. 3C, in step S106, an operation element (for example, a user's finger F or any touch pen) can be touched on the top surface of the at least one transparent conductive layer 30 at the top end. At least one second covering layer 40 provided with a surface 400 is formed. Since the plurality of conductive circuits 300 are formed on the upper surface of the at least one transparent conductive layer 30, the plurality of conductive circuits 300 are covered with the at least one second covering layer 40. The at least one second covering layer 40 is, for example, a hard protective layer made of a hard material. For example, at least silicon oxide (for example, silicon dioxide (SiO 2 )) and aluminum oxide (for example, alumina (Al 2 O) 3 )), lithium oxide and Teflon (registered trademark) are mixed with each other, and the weight percent of the silicon oxide with respect to the second coating layer 40 is 60% to 95%. Aluminum oxide % Of the second coating layer 40 is 20% to 25%, and the weight percent of the lithium oxide to the second coating layer 40 is 5% to 10%. Teflon (registered trademark) ) To the second coating layer 40 is 5% to 10%.

図3(c)及び図4を参照して、ステップS100〜ステップS106が完了した後、本発明の第1の実施形態は、少なくとも1つの透明基板を有する基板ユニット1と、前記少なくとも1つの透明基板10の上表面に形成された少なくとも1つの第1の被覆層20を有する第1の被覆ユニット2と、前記少なくとも1つの第1の被覆層20の上表面に形成された少なくとも1つの透明導電層30を有し、前記少なくとも1つの透明導電層に所定の回路パターンPに配列形成された複数の導電回路300が設けられた透明導電ユニット3と、前記少なくとも1つの透明導電層30の上表面に形成されるとともに酸化シリコンと酸化アルミニウムと酸化リチウムとテフロン(登録商標)(登録商標)とが相互に混合されてなる少なくとも1つの第2の被覆層40を有し、前記少なくとも1つの第2の被覆層40の頂端に操作子(例えばユーザの指又は如何なる他のタッチペン等)がタッチ可能なタッチ表面が設けられた第2の被覆ユニット4と、を備えることを特徴とするタッチパネルに適用される透明導電構造を提供する。   Referring to FIG. 3C and FIG. 4, after step S100 to step S106 are completed, the first embodiment of the present invention includes a substrate unit 1 having at least one transparent substrate and the at least one transparent substrate. A first coating unit 2 having at least one first coating layer 20 formed on the upper surface of the substrate 10, and at least one transparent conductive material formed on the upper surface of the at least one first coating layer 20 A transparent conductive unit 3 including a plurality of conductive circuits 300 arranged in a predetermined circuit pattern P on the at least one transparent conductive layer, and an upper surface of the at least one transparent conductive layer 30. And at least one of silicon oxide, aluminum oxide, lithium oxide, and Teflon (registered trademark) mixed with each other A second covering layer 40 having a touch surface to which an operating element (for example, a user's finger or any other touch pen) can be touched at the top end of the at least one second covering layer 40 A transparent conductive structure applied to a touch panel including the unit 4 is provided.

前記少なくとも1つの透明基板10は、例えば、ポリエチレンテレフタレート(polyethylene Terephthalate、PET)、ポリカーボネート(Poly Carbonate、PC)、ポリエチレン(polyethylene、PE)、ポリ塩化ビニル(Poly Vinyl Chloride、PVC)、ポリプロピレン(Poly Propylene、PP)、ポリスチレン(Poly Styrene、PS)、又はポリメタクリル酸メチル(Polymethylmethacrylate、PMMA)のいずれから選択され、厚さは、50μm〜125μmであってもよい。また、前記少なくとも1つの第1の被覆層20は、硬質被覆層であり、該硬質被覆層は、紫外線硬化被覆層であってよい。前記複数の導電回路300は、銀回路、アルミニウム回路、銅回路又は如何なる導電回路であり、前記所定の回路パターンPは、導電範囲が0.8〜3オーム/平方であってもよい。   The at least one transparent substrate 10 is made of, for example, polyethylene terephthalate (PET), polycarbonate (Poly Carbonate, PC), polyethylene (Polyethylene, PE), polyvinyl chloride (Poly Vinyl Chloride (PVC)), polypropylene (Poly Propylene). , PP), polystyrene (Poly Styrene, PS), or polymethylmethacrylate (PMMA), and the thickness may be 50 μm to 125 μm. The at least one first coating layer 20 may be a hard coating layer, and the hard coating layer may be an ultraviolet curable coating layer. The plurality of conductive circuits 300 may be silver circuits, aluminum circuits, copper circuits, or any conductive circuits, and the predetermined circuit pattern P may have a conductive range of 0.8 to 3 ohms / square.

さらに、前記複数の導電回路300(図4参照)は、横向きに延伸する複数のX軸方向軌跡回路300Xと、縦向きに延伸するとともに前記複数のX軸方向軌跡回路300Xと互いに絶縁され且つ直交する複数のY軸方向軌跡回路300Yとから成り、厚さHは、3000Å〜5000Åであり、前記複数のX軸方向軌跡回路300Xは、幅W1が3000Å〜5000Åであり、前記X軸方向軌跡回路300X同士間の距離D1は、10μm〜20μmであり、前記複数のY軸方向軌跡回路300Yは、幅W2が1000Å〜2000Åであり、前記Y軸方向軌跡回路300Y同士間の距離D2は、5μm〜15μmであってもよい。また、前記複数の導電回路300は、前記少なくとも1つの透明導電層30の上表面に形成されるとともに前記少なくとも1つの第2の被覆層40に被覆される。前記少なくとも1つの第2の被覆層40は、硬質材料からなる硬質保護層であってもよい。   Further, the plurality of conductive circuits 300 (see FIG. 4) include a plurality of X-axis direction trajectory circuits 300 </ b> X extending in the horizontal direction, and extending in the vertical direction and insulated from and orthogonal to the plurality of X-axis direction trajectory circuits 300 </ b> X. A plurality of Y-axis direction trajectory circuits 300Y having a thickness H of 3000 mm to 5000 mm, and the plurality of X-axis direction trajectory circuits 300X having a width W1 of 3000 mm to 5000 mm. The distance D1 between 300X is 10 μm to 20 μm, the plurality of Y-axis direction trajectory circuits 300Y have a width W2 of 1000 to 2000 mm, and the distance D2 between the Y-axis direction trajectory circuits 300Y is 5 μm to It may be 15 μm. The plurality of conductive circuits 300 are formed on the upper surface of the at least one transparent conductive layer 30 and are covered with the at least one second covering layer 40. The at least one second covering layer 40 may be a hard protective layer made of a hard material.

[第2の実施形態]
図5を参照して、本発明に係る第2の実施形態は、基板ユニット1と、第1の被覆ユニット2と、透明導電ユニット3と、第2の被覆ユニット4とを備えるタッチパネルに適用される透明導電構造を提供する。図5と図3(c)との比較から、第2の実施形態と第1の実施形態との最大の相違点は、第2の実施形態においては、前記複数の導電回路300を前記少なくとも1つの透明導電層30の内部に嵌め込むことにより複数の嵌め込み型導電回路300を形成する点である。前記複数の導電回路300は、例えば、上表面が前記少なくとも1つの第2の被覆層40に被覆されるように上表面が露出し、且つ前記少なくとも1つの透明導電層30の上表面と面一となっている。言い換えれば、設計者は、所定の回路パターンP及び所定の導電範囲に応じて、複数の導電回路300を前記少なくとも1つの透明導電層30内(例えば前記複数の導電回路300をロールプレスすることにより前記少なくとも1つの透明導電層30内に埋め込む)に埋め込むことができる。
[Second Embodiment]
Referring to FIG. 5, the second embodiment according to the present invention is applied to a touch panel including a substrate unit 1, a first covering unit 2, a transparent conductive unit 3, and a second covering unit 4. A transparent conductive structure is provided. From the comparison between FIG. 5 and FIG. 3C, the biggest difference between the second embodiment and the first embodiment is that in the second embodiment, the plurality of conductive circuits 300 are replaced with the at least one conductive circuit 300. A plurality of fitting type conductive circuits 300 are formed by fitting into one transparent conductive layer 30. For example, the plurality of conductive circuits 300 have their upper surfaces exposed such that their upper surfaces are covered with the at least one second covering layer 40 and are flush with the upper surface of the at least one transparent conductive layer 30. It has become. In other words, the designer places a plurality of conductive circuits 300 in the at least one transparent conductive layer 30 (for example, by roll pressing the plurality of conductive circuits 300 according to a predetermined circuit pattern P and a predetermined conductive range. Embedded in the at least one transparent conductive layer 30).

[第3の実施形態]
図6を参照して、本発明に係る第3の実施形態は、基板ユニット1と、第1の被覆ユニット2と、透明導電ユニット3と、第2の被覆ユニット4とを備えるタッチパネルに適用される透明導電構造を提供する。図6と図3(c)との比較から、第3の実施形態と第1の実施形態との最大の相違点は、第3の実施形態においては、前記複数の導電回路300を前記少なくとも1つの透明導電層30の下表面に形成するとともに前記少なくとも1つの第1の被覆層20に嵌め込むことにより複数の嵌め込み型導電回路300を形成する点である。言い換えれば、設計者は、所定の回路パターンP及び所定の導電範囲に応じて、複数の導電回路300を前記少なくとも1つの第1の被覆層20内(例えば前記少なくとも1つの透明導電層30をロールプレスすることにより前記複数の導電回路300を前記少なくとも1つの第1の被覆層20内に埋め込む)に埋め込むことができる。
[Third Embodiment]
Referring to FIG. 6, the third embodiment according to the present invention is applied to a touch panel including a substrate unit 1, a first covering unit 2, a transparent conductive unit 3, and a second covering unit 4. A transparent conductive structure is provided. From the comparison between FIG. 6 and FIG. 3C, the biggest difference between the third embodiment and the first embodiment is that in the third embodiment, the plurality of conductive circuits 300 are replaced with the at least one conductive circuit 300. A plurality of fitting-type conductive circuits 300 are formed by fitting on the lower surfaces of the two transparent conductive layers 30 and fitting them into the at least one first covering layer 20. In other words, the designer rolls a plurality of conductive circuits 300 in the at least one first coating layer 20 (for example, the at least one transparent conductive layer 30 is rolled) according to a predetermined circuit pattern P and a predetermined conductive range. The plurality of conductive circuits 300 can be embedded in the at least one first covering layer 20 by pressing.

[第4の実施形態]
図7を参照して、本発明に係る第4の実施形態は、基板ユニット1と、第1の被覆ユニット2と、透明導電ユニット3と、第2の被覆ユニット4とを備えるタッチパネルに適用される透明導電構造を提供する。図7と図3(c)との比較から、第4の実施形態と第1の実施形態との最大の相違点は、第4の実施形態においては、前記少なくとも1つの透明導電層30は、少なくとも2層の互いに積層された透明導電膜(30A、30B)を有し、前記複数の導電回路300は、前記少なくとも2層の透明導電膜(30A、30B)の間に形成される点である。前記複数の導電回路300は、例えば、同時に一方の透明導電膜30A(即ち第1の透明導電膜)内に嵌め込まれるとともに他方の透明導電膜30B(即ち第第1の透明導電膜に形成された第2の透明導電膜)に接触されてもよい。言い換えれば、設計者は、所定の回路パターンP及び所定の導電範囲に応じて、複数の導電回路300を前記少なくとも2層の透明導電膜(30A、30B)の間(例えば前記少なくとも1つの透明導電層30をロールプレスすることにより前記複数の導電回路300を前記少なくとも2層の透明導電膜(30A、30B)の間に埋め込む)に埋め込むことができる。
[Fourth Embodiment]
Referring to FIG. 7, the fourth embodiment according to the present invention is applied to a touch panel including a substrate unit 1, a first covering unit 2, a transparent conductive unit 3, and a second covering unit 4. A transparent conductive structure is provided. From the comparison between FIG. 7 and FIG. 3 (c), the greatest difference between the fourth embodiment and the first embodiment is that in the fourth embodiment, the at least one transparent conductive layer 30 is It has at least two transparent conductive films (30A, 30B) stacked on each other, and the plurality of conductive circuits 300 are formed between the at least two transparent conductive films (30A, 30B). . The plurality of conductive circuits 300 are, for example, simultaneously inserted into one transparent conductive film 30A (ie, the first transparent conductive film) and formed on the other transparent conductive film 30B (ie, the first transparent conductive film). The second transparent conductive film) may be contacted. In other words, the designer places a plurality of conductive circuits 300 between the at least two transparent conductive films (30A, 30B) (for example, the at least one transparent conductive film) according to a predetermined circuit pattern P and a predetermined conductive range. By rolling the layer 30, the plurality of conductive circuits 300 can be embedded in the at least two transparent conductive films (30 </ b> A, 30 </ b> B).

上述のように、本発明に係る透明導電構造及びその製造方法は、操作子がタッチ可能なタッチ表面と前記所定の回路パターンとの距離を近接させるように構成されているため、前記複数の導電回路を超低導電材料で製造する必要がなく、導電範囲が0.8〜3オーム/平方である回路パターンを得ることができ、タッチパネルに適用することができる。さらに、前記少なくとも1つの第2の被覆層は、酸化シリコンと酸化アルミニウムと酸化リチウムとテフロン(登録商標)(登録商標)とが相互に混合され、磨耗性が高く摩擦係数が低い特徴を有する硬質保護層が形成される。   As described above, the transparent conductive structure and the manufacturing method thereof according to the present invention are configured so that the distance between the touch surface that can be touched by the operator and the predetermined circuit pattern is close to each other. There is no need to manufacture the circuit with an ultra-low conductive material, and a circuit pattern with a conductive range of 0.8 to 3 ohm / square can be obtained and applied to a touch panel. Furthermore, the at least one second coating layer is a hard material having a feature of high wear resistance and low friction coefficient, in which silicon oxide, aluminum oxide, lithium oxide, and Teflon (registered trademark) are mixed with each other. A protective layer is formed.

上述したものは、本発明の好ましい実施例に過ぎず、本発明の特許請求の範囲に記載された構造、特徴及び原理に基づいてなされる均等な変更又は修正は、いずれも本発明の特許請求の範囲内に含まれるものとする。   What has been described above is merely a preferred embodiment of the present invention, and any equivalent changes or modifications made based on the structures, features, and principles described in the claims of the present invention are all claimed in the present invention. It shall be included in the range of.

1 基板ユニット
10 透明基板
2 第1の被覆ユニット
20 第1の被覆層
3 透明導電ユニット
30 透明導電層
30A、30B 透明導電膜
300 導電回路
P 回路パターン
300X X軸方向軌跡回路
300Y Y軸方向軌跡回路
H 厚さ
W1、W2 幅
D1、D2 距離
4 第2の被覆ユニット
40 第2の被覆層
400 タッチ表面
F 指
DESCRIPTION OF SYMBOLS 1 Substrate unit 10 Transparent substrate 2 1st coating unit 20 1st coating layer 3 Transparent conductive unit 30 Transparent conductive layer 30A, 30B Transparent conductive film 300 Conductive circuit P Circuit pattern 300X X-axis direction locus circuit 300Y Y-axis direction locus circuit H Thickness W1, W2 Width D1, D2 Distance 4 Second coating unit 40 Second coating layer 400 Touch surface F Finger

Claims (10)

少なくとも1つの透明基板を有する基板ユニットと、
前記少なくとも1つの透明基板の上表面に形成された少なくとも1つの第1の被覆層を有する第1の被覆ユニットと、
前記少なくとも1つの第1の被覆層の上表面に形成された少なくとも1つの透明導電層を有し、前記少なくとも1つの透明導電層に所定の回路パターンに配列形成された複数の導電回路が設けられた透明導電ユニットと、
前記少なくとも1つの透明導電層の上表面に形成されるとともに酸化シリコンと酸化アルミニウムと酸化リチウムとテフロン(登録商標)(登録商標)とが相互に混合されてなる少なくとも1つの第2の被覆層を有し、前記少なくとも1つの第2の被覆層の頂端に操作子がタッチ可能なタッチ表面が設けられた第2の被覆ユニットと、
を備えることを特徴とするタッチパネルに適用される透明導電構造。
A substrate unit having at least one transparent substrate;
A first coating unit having at least one first coating layer formed on an upper surface of the at least one transparent substrate;
A plurality of conductive circuits having at least one transparent conductive layer formed on an upper surface of the at least one first covering layer, and arranged in a predetermined circuit pattern on the at least one transparent conductive layer; Transparent conductive unit,
And at least one second coating layer formed on the upper surface of the at least one transparent conductive layer and formed by mixing silicon oxide, aluminum oxide, lithium oxide, and Teflon (registered trademark) with each other. A second covering unit provided with a touch surface to which an operator can touch at a top end of the at least one second covering layer;
A transparent conductive structure applied to a touch panel.
前記少なくとも1つの第1の被覆層は、硬質被覆層であり、該硬質被覆層は、紫外線硬化被覆層であり、前記複数の導電回路は、銀回路、アルミニウム回路又は銅回路であり、前記所定の回路パターンは、導電範囲が0.8〜3オーム/平方であり、前記少なくとも1つの第2の被覆層は、硬質材料からなる硬質保護層であることを特徴とする請求項1に記載のタッチパネルに適用される透明導電構造。   The at least one first coating layer is a hard coating layer, the hard coating layer is an ultraviolet-curing coating layer, and the plurality of conductive circuits are a silver circuit, an aluminum circuit, or a copper circuit, and the predetermined circuit 2. The circuit pattern according to claim 1, wherein a conductive range is 0.8 to 3 ohm / square, and the at least one second covering layer is a hard protective layer made of a hard material. Transparent conductive structure applied to touch panels. 前記少なくとも1つの透明基板は、ポリエチレンテレフタレート(polyethylene Terephthalate、PET)、ポリカーボネート(Poly Carbonate、PC)、ポリエチレン(polyethylene、PE)、ポリ塩化ビニル(Poly Vinyl Chloride、PVC)、ポリプロピレン(Poly Propylene、PP)、ポリスチレン(Poly Styrene、PS)、又はポリメタクリル酸メチル(Polymethylmethacrylate、PMMA)のいずれから選択されることを特徴とする請求項1に記載のタッチパネルに適用される透明導電構造。   The at least one transparent substrate may be polyethylene terephthalate (PET), polycarbonate (Poly Carbonate, PC), polyethylene (Polyethylene, PE), polyvinyl chloride (Poly Vinyl Chloride, PVC), polypropylene (Poly Propylene, PP). 2. The transparent conductive structure applied to the touch panel according to claim 1, wherein the transparent conductive structure is selected from any of polystyrene, polystyrene (PS), and polymethylmethacrylate (PMMA). 前記複数の導電回路は、横向きに延伸する複数のX軸方向軌跡回路と、縦向きに延伸するとともに前記複数のX軸方向軌跡回路と互いに絶縁され且つ直交する複数のY軸方向軌跡回路とから成り、厚さは、3000Å〜5000Åであり、前記複数のX軸方向軌跡回路は、幅が3000Å〜5000Åであり、前記X軸方向軌跡回路同士間の距離は、10μm〜20μmであり、前記複数のY軸方向軌跡回路は、幅が1000Å〜2000Åであり、前記Y軸方向軌跡回路同士間の距離は、5μm〜15μmであることを特徴とする請求項1に記載のタッチパネルに適用される透明導電構造。   The plurality of conductive circuits include a plurality of X-axis direction trajectory circuits extending in the horizontal direction and a plurality of Y-axis direction trajectory circuits extending in the vertical direction and insulated from and orthogonal to the plurality of X-axis direction trajectory circuits. The thickness of the plurality of X axis direction trajectory circuits is 3000 mm to 5000 mm, the distance between the X axis direction trajectory circuits is 10 μm to 20 μm, and the plurality of the X axis direction trajectory circuits are 10 μm to 20 μm. The Y-axis direction trajectory circuit has a width of 1000 to 2000 mm, and the distance between the Y-axis direction trajectory circuits is 5 μm to 15 μm. Conductive structure. 前記複数の導電回路は、前記少なくとも1つの透明導電層の上表面に形成されるとともに前記少なくとも1つの第2の被覆層に被覆されることを特徴とする請求項1に記載のタッチパネルに適用される透明導電構造。   2. The touch panel according to claim 1, wherein the plurality of conductive circuits are formed on an upper surface of the at least one transparent conductive layer and are covered with the at least one second covering layer. Transparent conductive structure. 前記複数の導電回路は、前記少なくとも1つの透明導電層の内部に嵌め込まれるとともに前記少なくとも1つの第2の被覆層に被覆されることを特徴とする請求項1に記載のタッチパネルに適用される透明導電構造。   2. The transparent applied to the touch panel according to claim 1, wherein the plurality of conductive circuits are fitted into the at least one transparent conductive layer and are covered with the at least one second cover layer. Conductive structure. 前記複数の導電回路は、前記少なくとも1つの透明導電層の下表面に形成されるとともに前記少なくとも1つの第1の被覆層に嵌め込まれることを特徴とする請求項1に記載のタッチパネルに適用される透明導電構造。   2. The touch panel according to claim 1, wherein the plurality of conductive circuits are formed on a lower surface of the at least one transparent conductive layer and fitted into the at least one first covering layer. Transparent conductive structure. 前記少なくとも1つの導電層は、少なくとも2層の互いに積層された透明導電膜を有し、前記複数の導電回路は、前記少なくとも2層の透明導電膜の間に形成されることを特徴とする請求項1に記載のタッチパネルに適用される透明導電構造。   The at least one conductive layer has at least two transparent conductive films stacked on each other, and the plurality of conductive circuits are formed between the at least two transparent conductive films. Item 2. A transparent conductive structure applied to the touch panel according to Item 1. 前記複数の導電回路は、同時に一方の透明導電膜内に嵌め込まれるとともに他方の透明導電膜に接触されることを特徴とする請求項8に記載のタッチパネルに適用される透明導電構造。   9. The transparent conductive structure applied to a touch panel according to claim 8, wherein the plurality of conductive circuits are simultaneously fitted in one transparent conductive film and are in contact with the other transparent conductive film. 少なくとも1つの透明基板を有する基板ユニットを用意する工程と、
前記少なくとも1つの透明基板の上表面に、少なくとも1つの第1の被覆層を形成する工程と、
前記少なくとも1つの第1の被覆層の上表面に、所定の回路パターンに配列形成された複数の導電回路が設けられた少なくとも1つの透明導電層を形成する工程と、
前記少なくとも1つの透明導電層の上表面に、頂端に操作子がタッチ可能なタッチ表面が設けられるとともに酸化シリコンと酸化アルミニウムと酸化リチウムとテフロン(登録商標)(登録商標)とが相互に混合されてなる少なくとも1つの第2の被覆層を形成する工程と、
を備えることを特徴とするタッチパネルに適用される透明導電構造の製造方法。
Providing a substrate unit having at least one transparent substrate;
Forming at least one first covering layer on an upper surface of the at least one transparent substrate;
Forming at least one transparent conductive layer provided with a plurality of conductive circuits arranged in a predetermined circuit pattern on an upper surface of the at least one first covering layer;
The top surface of the at least one transparent conductive layer is provided with a touch surface to which an operator can touch at the top end, and silicon oxide, aluminum oxide, lithium oxide, and Teflon (registered trademark) are mixed with each other. Forming at least one second coating layer comprising:
A method for producing a transparent conductive structure applied to a touch panel, comprising:
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