TWI485530B - 用於微影系統的圖案數據轉換器 - Google Patents

用於微影系統的圖案數據轉換器 Download PDF

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Publication number
TWI485530B
TWI485530B TW099115882A TW99115882A TWI485530B TW I485530 B TWI485530 B TW I485530B TW 099115882 A TW099115882 A TW 099115882A TW 99115882 A TW99115882 A TW 99115882A TW I485530 B TWI485530 B TW I485530B
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TW
Taiwan
Prior art keywords
pattern data
data
pixel
output
array
Prior art date
Application number
TW099115882A
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English (en)
Chinese (zh)
Other versions
TW201107897A (en
Inventor
Marco Jan-Jaco Wieland
De Peut Teunis Van
Original Assignee
Mapper Lithography Ip Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mapper Lithography Ip Bv filed Critical Mapper Lithography Ip Bv
Publication of TW201107897A publication Critical patent/TW201107897A/zh
Application granted granted Critical
Publication of TWI485530B publication Critical patent/TWI485530B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW099115882A 2009-05-20 2010-05-19 用於微影系統的圖案數據轉換器 TWI485530B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17976509P 2009-05-20 2009-05-20
US17976009P 2009-05-20 2009-05-20
US25712209P 2009-11-02 2009-11-02

Publications (2)

Publication Number Publication Date
TW201107897A TW201107897A (en) 2011-03-01
TWI485530B true TWI485530B (zh) 2015-05-21

Family

ID=43126596

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099115882A TWI485530B (zh) 2009-05-20 2010-05-19 用於微影系統的圖案數據轉換器

Country Status (7)

Country Link
US (1) US8710465B2 (enExample)
EP (1) EP2443647B1 (enExample)
JP (1) JP5801289B2 (enExample)
KR (1) KR101614460B1 (enExample)
CN (1) CN102460633B (enExample)
TW (1) TWI485530B (enExample)
WO (1) WO2010134018A2 (enExample)

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CN102956420B (zh) * 2012-10-30 2016-11-16 中国科学院上海应用物理研究所 电子射线源产生装置及产生低剂量率电子射线的方法
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JP2014204012A (ja) * 2013-04-05 2014-10-27 キヤノン株式会社 描画装置、及び物品の製造方法
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Also Published As

Publication number Publication date
EP2443647B1 (en) 2016-10-05
WO2010134018A3 (en) 2011-06-23
WO2010134018A2 (en) 2010-11-25
WO2010134018A4 (en) 2011-08-25
EP2443647A2 (en) 2012-04-25
KR20120030438A (ko) 2012-03-28
TW201107897A (en) 2011-03-01
CN102460633B (zh) 2014-12-17
US8710465B2 (en) 2014-04-29
JP5801289B2 (ja) 2015-10-28
US20120286173A1 (en) 2012-11-15
JP2012527765A (ja) 2012-11-08
CN102460633A (zh) 2012-05-16
KR101614460B1 (ko) 2016-04-21

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