TWI482244B - Heat exchanger and semiconductor module - Google Patents

Heat exchanger and semiconductor module Download PDF

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Publication number
TWI482244B
TWI482244B TW101143144A TW101143144A TWI482244B TW I482244 B TWI482244 B TW I482244B TW 101143144 A TW101143144 A TW 101143144A TW 101143144 A TW101143144 A TW 101143144A TW I482244 B TWI482244 B TW I482244B
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Taiwan
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heat exchanger
flow
chamber
heat
heat dissipation
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TW101143144A
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Chinese (zh)
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TW201421622A (en
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Shu Jung Yang
Yu Lin Chao
Chun Kai Liu
Chi Chuan Wang
Kun Ying Liou
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Ind Tech Res Inst
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Priority to TW101143144A priority Critical patent/TWI482244B/en
Priority to US13/853,073 priority patent/US20140138075A1/en
Publication of TW201421622A publication Critical patent/TW201421622A/en
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Publication of TWI482244B publication Critical patent/TWI482244B/en

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28FDETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F3/00Plate-like or laminated elements; Assemblies of plate-like or laminated elements
    • F28F3/02Elements or assemblies thereof with means for increasing heat-transfer area, e.g. with fins, with recesses, with corrugations
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28DHEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • F28D15/02Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
    • F28D15/0233Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes the conduits having a particular shape, e.g. non-circular cross-section, annular
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28FDETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F3/00Plate-like or laminated elements; Assemblies of plate-like or laminated elements
    • F28F3/12Elements constructed in the shape of a hollow panel, e.g. with channels
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3735Laminates or multilayers, e.g. direct bond copper ceramic substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/42Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
    • H01L23/427Cooling by change of state, e.g. use of heat pipes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/46Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids
    • H01L23/473Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids by flowing liquids
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28DHEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D21/00Heat-exchange apparatus not covered by any of the groups F28D1/00 - F28D20/00
    • F28D2021/0019Other heat exchangers for particular applications; Heat exchange systems not otherwise provided for
    • F28D2021/0028Other heat exchangers for particular applications; Heat exchange systems not otherwise provided for for cooling heat generating elements, e.g. for cooling electronic components or electric devices
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28FDETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F2250/00Arrangements for modifying the flow of the heat exchange media, e.g. flow guiding means; Particular flow patterns
    • F28F2250/06Derivation channels, e.g. bypass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48111Disposition the wire connector extending above another semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
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  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)

Description

熱交換器以及半導體模組Heat exchanger and semiconductor module

本申請是有關於一種熱交換器及應用此熱交換器,以達到良好散熱效果的半導體模組。The present application relates to a heat exchanger and a semiconductor module using the same to achieve a good heat dissipation effect.

近年來,積體電路(Integrated Circuit,IC)的製程技術發展迅速,使得電子元件的功能大幅提昇。然而,伴隨著電子元件的處理速度和效能的提升,電子元件運作時的發熱量也隨之上昇。若不能有效將廢熱排除,電子元件便有可能失效或無法達到最佳的效能。In recent years, the process technology of Integrated Circuit (IC) has developed rapidly, which has greatly improved the functions of electronic components. However, as the processing speed and performance of electronic components increase, the amount of heat generated when the electronic components operate increases. If the waste heat is not effectively removed, the electronic components may fail or fail to achieve optimum performance.

功率電子元件,如絕緣閘雙極電晶體(Insulated Gate Bipolar Transistor,IGBT)被廣泛應用於電動車輛中。電動車輛的發展講求輕量與體積的降低,並節省電力消耗。達到上述目標的關鍵點之一即在於IGBT功率模組的運作效能。由於IGBT功率模組長時間受到高溫、振動、潮濕及灰塵污染的環境影響,再加上IGBT功率模組本身為高壓大電流之模組,因此散熱良窳一直左右其運作效能。Power electronic components, such as Insulated Gate Bipolar Transistors (IGBTs), are widely used in electric vehicles. The development of electric vehicles emphasizes lightness and volume reduction and saves power consumption. One of the key points to achieve the above goals lies in the operational efficiency of the IGBT power module. Since the IGBT power module is affected by the environment of high temperature, vibration, humidity and dust pollution for a long time, and the IGBT power module itself is a high-voltage and high-current module, the heat dissipation has always been related to its operational efficiency.

傳統的IGBT功率模組包括IGBT晶片、二極體(Diode)晶片、驅動晶片、直接覆銅(Direct Bond Copper,DBC)基板、底座等,並且搭配散熱片(heat-sink)等冷卻模組。所述IGBT晶片與二極體晶片在運作時產生的熱量是先傳遞至DBC基板,熱量在DBC基板上擴散(spreading)後,再傳遞至底座。底座透過導熱膏(thermal grease)接著至散熱片等 散熱模組,以藉由散熱片將熱量散逸到外界。換言之,與IGBT功率模組接觸的散熱片、IGBT功率模組與散熱片接著處的導熱膏,以及底座上皆會產生顯著的熱阻,以至於IGBT功率模組的散熱效能受到限制。The conventional IGBT power module includes an IGBT chip, a diode (Diode) chip, a driver chip, a direct bond copper (DBC) substrate, a base, and the like, and is equipped with a cooling module such as a heat-sink. The heat generated during operation of the IGBT wafer and the diode wafer is first transferred to the DBC substrate, and the heat is spread on the DBC substrate and then transferred to the substrate. The base passes through thermal grease and then to the heat sink The heat dissipation module is configured to dissipate heat to the outside through the heat sink. In other words, the heat sink that is in contact with the IGBT power module, the IGBT power module and the thermal paste at the heat sink, and the base will have significant thermal resistance, so that the heat dissipation performance of the IGBT power module is limited.

另一方面,由於IGBT功率模組的發熱功率相當高,因此已知也有採用液冷式散熱器來對IGBT功率模組進行散熱的設計。然而,此類設計除了同樣具有前述的熱阻問題外,還需額外耗費幫浦功率(pumping power)來推動液冷式散熱器中的工作流體,增加整體系統的耗能。例如,當此類型的IGBT功率被應用於電動車輛時,會增加電動車輛的電力消耗,縮短電動車的行駛時間與距離。On the other hand, since the heating power of the IGBT power module is relatively high, it is known that a liquid-cooled heat sink is used to dissipate heat from the IGBT power module. However, in addition to the aforementioned thermal resistance problems, such designs require additional pumping power to drive the working fluid in the liquid-cooled heat sink, increasing the energy consumption of the overall system. For example, when this type of IGBT power is applied to an electric vehicle, the power consumption of the electric vehicle is increased, and the travel time and distance of the electric vehicle are shortened.

依照本申請的一實施例,所述熱交換器包括一底板(base plate)、一蓋板、多個第一散熱鰭片、多個第二散熱鰭片以及一工作流體。底板具有一承載面以及相對於承載面的一背側,其中承載面用以承載一熱源,例如一電子元件。蓋板配置於底板的背側,且蓋板與底板共同形成一腔室。所述腔室具有一入口以及一出口,位於腔室的同一側。第一散熱鰭片並排設置於底板與蓋板之間,用以在腔室內形成相互平行的多個第一流道以及一旁通流道(bypass channel)。各第一流道以及旁通流道由入口延伸至腔室內的一混流區,且旁通流道的寬度大於各第一流道的寬度。旁通流道的寬度與第一流道的寬度的比值例如是小於或等於 9。第二散熱鰭片並排設置於底板與蓋板之間,用以在腔室內形成相互平行的多個第二流道。各第二流道由混流區延伸至出口,且旁通流道的寬度大於各第二流道的寬度。工作流體適於由入口進入腔室,其中一部分的工作流體通過第一流道,另一部分的工作流體通過旁通流道,並且該部分的工作流體以及該另一部分的工作流體在混流區混合後,進入第二流道中,再由出口離開腔室。According to an embodiment of the present application, the heat exchanger includes a base plate, a cover plate, a plurality of first heat dissipation fins, a plurality of second heat dissipation fins, and a working fluid. The bottom plate has a bearing surface and a back side opposite to the bearing surface, wherein the bearing surface is for carrying a heat source, such as an electronic component. The cover plate is disposed on the back side of the bottom plate, and the cover plate and the bottom plate together form a cavity. The chamber has an inlet and an outlet on the same side of the chamber. The first heat dissipation fins are disposed side by side between the bottom plate and the cover plate to form a plurality of first flow channels and a bypass channel parallel to each other in the chamber. Each of the first flow passages and the bypass flow passages extend from the inlet to a mixed flow zone in the chamber, and the width of the bypass flow passages is greater than the width of each of the first flow passages. The ratio of the width of the bypass flow path to the width of the first flow path is, for example, less than or equal to 9. The second heat dissipation fins are disposed side by side between the bottom plate and the cover plate to form a plurality of second flow paths parallel to each other in the chamber. Each of the second flow passages extends from the mixed flow region to the outlet, and the width of the bypass flow passage is greater than the width of each of the second flow passages. The working fluid is adapted to enter the chamber from the inlet, wherein a portion of the working fluid passes through the first flow passage and another portion of the working fluid passes through the bypass flow passage, and the portion of the working fluid and the other portion of the working fluid are mixed in the mixed flow region, Enter the second flow path and exit the chamber from the outlet.

為讓本申請之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above-described features and advantages of the present application will become more apparent and understood.

首先說明的是,本申請的熱交換器可應用於各種相容的半導體模組中,以將半導體模組內的電子元件在運作時所產生的熱量傳遞到外界。下文僅以本申請的熱交換器應用於IGBT功率模組的架構為例來進行說明,然本申請並不限於此。First, the heat exchanger of the present application can be applied to various compatible semiconductor modules to transfer heat generated by the electronic components in the semiconductor module to the outside. Hereinafter, only the architecture of the heat exchanger of the present application applied to the IGBT power module will be described as an example, but the application is not limited thereto.

依據本申請之熱交換器的設計,吾人可以將IGBT功率模組的底座與熱交換器予以整合,亦即省略了原有IGBT功率模組的底座,而將承載電子元件的承載基板直接接合至熱交換器的頂部。如此,電子元件運作時所產生的熱量只需透過承載基板,便可傳遞至熱交換器,以藉由熱交換器將熱量散逸到外界。由於整合了IGBT功率模組的底座與熱交換器,省略了原有IGBT功率模組的底座,因此可減少元件間的界面數量,降低元件之間的界面所產生的熱 阻,有助於改善熱傳效率,提升散熱效果。According to the design of the heat exchanger of the present application, the base of the IGBT power module can be integrated with the heat exchanger, that is, the base of the original IGBT power module is omitted, and the carrier substrate carrying the electronic component is directly bonded to The top of the heat exchanger. In this way, the heat generated by the operation of the electronic component can be transmitted to the heat exchanger only through the carrier substrate to dissipate heat to the outside through the heat exchanger. Since the base of the IGBT power module and the heat exchanger are integrated, the base of the original IGBT power module is omitted, thereby reducing the number of interfaces between components and reducing the heat generated by the interface between components. Resistance helps to improve heat transfer efficiency and improve heat dissipation.

圖1A繪示依照本申請之一實施例的半導體模組。半導體模組100包括熱交換器110、承載基板120以及電子元件132與134。電子元件132與134例如分別是二極體晶片(Diode)以及絕緣閘雙極電晶體(Insulated Gate Bipolar Transistor,IGBT)晶片,分別配置於承載基板120上。所述承載基板120例如是直接覆銅(Direct Bond Copper,DBC)基板、直接鍍銅基板(Direct Plated Copper,DPC)等陶瓷金屬化基板,即包含陶瓷核心層122以及雙面之覆銅層124與126的複合基板。所述陶瓷核心層122的材質例如是氧化鋁(Al2 O3 )、氮化鋁(AlN)或,鋁碳化矽(AlSiC)等。電子元件132與134藉由第一銲料層142接合至覆銅層124,而覆銅層124可被圖案化為表層線路124a,以提供電子元件132與134連接到外部的線路。本實施例的電子元件132與134藉由銲線192相互電性連接,且電子元件132藉由銲線194電性連接到覆銅層124所形成的表層線路124a。FIG. 1A illustrates a semiconductor module in accordance with an embodiment of the present application. The semiconductor module 100 includes a heat exchanger 110, a carrier substrate 120, and electronic components 132 and 134. The electronic components 132 and 134 are, for example, a diode wafer and an insulated gate bipolar transistor (IGBT) wafer, respectively, and are disposed on the carrier substrate 120. The carrier substrate 120 is a ceramic metallization substrate such as a direct bond copper (DBC) substrate or a direct copper plated substrate (DPC), that is, a ceramic core layer 122 and a double-sided copper layer 124. Composite substrate with 126. The material of the ceramic core layer 122 is, for example, alumina (Al 2 O 3 ), aluminum nitride (AlN), or aluminum lanthanum carbide (AlSiC). The electronic components 132 and 134 are bonded to the copper clad layer 124 by the first solder layer 142, and the copper clad layer 124 can be patterned into the surface wiring 124a to provide circuitry for connecting the electronic components 132 and 134 to the outside. The electronic components 132 and 134 of the present embodiment are electrically connected to each other by a bonding wire 192, and the electronic component 132 is electrically connected to the surface wiring 124a formed by the copper-clad layer 124 by a bonding wire 194.

在此,電子元件132與134的種類、數量以及連接方式僅是作為舉例之用。實際上,隨著實際需求,本申請之其他實施例的電子元件的數量可能為一個或三個以上,而電子元件132與134的種類也不限於二極體晶片或IGBT晶片。電子元件132與134可以透過承載基板120對外連接,也可以藉由其他電路元件或直接與外界連接。此外,本實施例的電子元件132與134共用一個承載基板120,然在其他實施例中,亦可以是被設置於相獨立的兩個承載 基板上,或是被設置於其他可能類型的中介基板上。Here, the types, numbers, and connections of the electronic components 132 and 134 are for illustrative purposes only. In fact, the number of electronic components of other embodiments of the present application may be one or more than the actual demand, and the types of electronic components 132 and 134 are not limited to diode chips or IGBT chips. The electronic components 132 and 134 may be externally connected through the carrier substrate 120, or may be connected to the outside by other circuit components. In addition, the electronic components 132 and 134 of the present embodiment share a carrier substrate 120. However, in other embodiments, the two components may be disposed independently of each other. On the substrate, or on other possible types of interposer substrates.

電子元件132與134藉由承載基板120設置於熱交換器110的底板112上。承載基板120與熱交換器110之間例如是藉由第二銲料層144相互接合。The electronic components 132 and 134 are disposed on the bottom plate 112 of the heat exchanger 110 by the carrier substrate 120. The carrier substrate 120 and the heat exchanger 110 are bonded to each other by, for example, the second solder layer 144.

以下進一步說明熱交換器110的結構。The structure of the heat exchanger 110 will be further described below.

圖1B為熱交換器110的底視圖,其中為清楚表達熱交換器110的內部結構,圖1B省略了蓋板114。圖1C為圖1B之結構的立體圖。圖1D為圖1B之區域A的放大圖。1B is a bottom view of the heat exchanger 110, in which the cover 114 is omitted to clearly illustrate the internal structure of the heat exchanger 110. 1C is a perspective view of the structure of FIG. 1B. Fig. 1D is an enlarged view of a region A of Fig. 1B.

請同時參考圖1A~1D,熱交換器110的板112具有承載面112a以及相對於承載面112a的背側112b,而承載基板120配置於底板112的承載面112a。蓋板114配置於底板112的背側112b,並且接合至底板112,以形成腔室119。底板112與蓋板114之間設置多個第一散熱鰭片116以及多個第二散熱鰭片118,以在底板112與蓋板114之間形成多個流道。此外,殼體150配置於熱交換器110的底板112上,以覆蓋電子元件132、134以及承載基板120。表層線路124a藉由導線182a、182b連接到殼體150表面的接點184a、184b。Referring to FIGS. 1A to 1D simultaneously, the plate 112 of the heat exchanger 110 has a bearing surface 112a and a back side 112b with respect to the bearing surface 112a, and the carrier substrate 120 is disposed on the bearing surface 112a of the bottom plate 112. The cover plate 114 is disposed on the back side 112b of the bottom plate 112 and is coupled to the bottom plate 112 to form a chamber 119. A plurality of first heat dissipation fins 116 and a plurality of second heat dissipation fins 118 are disposed between the bottom plate 112 and the cover plate 114 to form a plurality of flow paths between the bottom plate 112 and the cover plate 114. In addition, the housing 150 is disposed on the bottom plate 112 of the heat exchanger 110 to cover the electronic components 132, 134 and the carrier substrate 120. The surface line 124a is connected to the contacts 184a, 184b on the surface of the housing 150 by wires 182a, 182b.

由蓋板114與底板112共同形成的腔室119具有一入口119a以及一出口119b。本實施例考量系統組裝時進出口由單一邊進出的設計限制,因此將入口119a與出口119b設置於鄰近腔室119的同一側,且經由腔室119側邊進出。The chamber 119 formed by the cover plate 114 and the bottom plate 112 has an inlet 119a and an outlet 119b. In this embodiment, the design of the inlet and outlet is limited by the design of the single side inlet and outlet. Therefore, the inlet 119a and the outlet 119b are disposed on the same side adjacent to the chamber 119, and enter and exit via the side of the chamber 119.

在本申請其他實施例中,作為入口119a與出口119b的開孔也可以被選擇形成於蓋板114或底板112上。例如, 圖1E便繪示了本申請將入口119a與出口119b設置於底板112上的另一種結構。In other embodiments of the present application, the openings as the inlet 119a and the outlet 119b may also be selectively formed on the cover plate 114 or the bottom plate 112. E.g, FIG. 1E illustrates another configuration in which the present application places the inlet 119a and the outlet 119b on the bottom plate 112.

鑒於本實施例的入口119a與出口119b位於腔室119同一側的設計,第一散熱鰭片116以及第二散熱鰭片118在腔室119內形成多個U型流道。更詳細而言,第一散熱鰭片116並排設置於底板112與蓋板114之間,用以在腔室119內形成相互平行的多個第一流道162以及一旁通流道164。各第一流道162以及旁通流道164由入口119a延伸至腔室119內的一混流區166,且旁通流道164的寬度W1大於各第一流道162的寬度W2。具體而言,旁通流道流道164的寬度W1與第一流道162的寬度W2的比值例如是小於或等於9,以在散熱與降低流阻的效果之間取得良好的平衡。In view of the design in which the inlet 119a and the outlet 119b of the present embodiment are located on the same side of the chamber 119, the first heat radiation fins 116 and the second heat radiation fins 118 form a plurality of U-shaped flow passages in the chamber 119. In more detail, the first heat dissipation fins 116 are disposed side by side between the bottom plate 112 and the cover plate 114 to form a plurality of first flow channels 162 and a bypass flow path 164 that are parallel to each other in the chamber 119. Each of the first flow passage 162 and the bypass flow passage 164 extends from the inlet 119a to a mixed flow region 166 in the chamber 119, and the width W1 of the bypass flow passage 164 is greater than the width W2 of each of the first flow passages 162. Specifically, the ratio of the width W1 of the bypass flow path 164 to the width W2 of the first flow path 162 is, for example, less than or equal to 9, to achieve a good balance between the heat dissipation and the effect of reducing the flow resistance.

另一方面,在本實施例中為了使流體於流道中分布均勻,第一散熱鰭片116與第二散熱鰭片118的高度可以有變化,並且可在其間形成不同深度的流道,使流體進入時產生不同阻抗,達到更均勻之流體流動分布。On the other hand, in the embodiment, in order to distribute the fluid uniformly in the flow channel, the heights of the first heat dissipation fins 116 and the second heat dissipation fins 118 may be varied, and flow paths of different depths may be formed therebetween to make the fluid Different impedances are created upon entry to achieve a more uniform fluid flow distribution.

在本實施例中,入口119a與出口119b位於腔室119的第一側S1,而混流區166位於腔室119的第二側S2。各第一散熱鰭片116例如為L形,且各第一散熱鰭片116包括第一部分116a以及第二部分116b。第一部分116a由第一側S1沿一第一方向D1延伸至第二側S2,而第二部分116b連接第一部分116a,並且沿一第二方向D2延伸至混流區166。第一方向D1與第二方向D2相交,例如相互 垂直。此外,旁通流道164的位置可隨需求調整,例如本實施例選擇將旁通流道164設置於第一流道162的最外側,且鄰近於腔室119的內壁。In the present embodiment, the inlet 119a and the outlet 119b are located on the first side S1 of the chamber 119, and the mixed flow zone 166 is located on the second side S2 of the chamber 119. Each of the first heat dissipation fins 116 is, for example, L-shaped, and each of the first heat dissipation fins 116 includes a first portion 116a and a second portion 116b. The first portion 116a extends from the first side S1 in a first direction D1 to the second side S2, while the second portion 116b connects the first portion 116a and extends in a second direction D2 to the mixed flow region 166. The first direction D1 intersects the second direction D2, such as each other vertical. In addition, the position of the bypass flow path 164 can be adjusted as needed. For example, the present embodiment selects the bypass flow path 164 to be disposed at the outermost side of the first flow path 162 and adjacent to the inner wall of the chamber 119.

第二散熱鰭片118並排設置於底板112與蓋板114之間,用以在腔室119內形成相互平行的多個第二流道168。各第二流道168由混流區166延伸至出口119b,且旁通流道164的寬度W1大於各第二流道168的寬度W3。The second heat dissipation fins 118 are disposed side by side between the bottom plate 112 and the cover plate 114 to form a plurality of second flow paths 168 parallel to each other in the chamber 119. Each of the second flow passages 168 extends from the mixed flow region 166 to the outlet 119b, and the width W1 of the bypass flow passage 164 is greater than the width W3 of each of the second flow passages 168.

在本實施例中,各第二散熱鰭片118為與第一散熱鰭片116鏡向設置的L形,且各第二散熱鰭片118包括第三部分118a以及第四部分118b。第三部分118a由第一側S1沿第一方向D1延伸至第二側S2,而第四部分118b連接第三部分118a,並且沿第三方向D3延伸至混流區166。所述第三方向D3與第二方向D2相反。In this embodiment, each of the second heat dissipation fins 118 is L-shaped mirrored to the first heat dissipation fins 116 , and each of the second heat dissipation fins 118 includes a third portion 118 a and a fourth portion 118 b . The third portion 118a extends from the first side S1 in the first direction D1 to the second side S2, while the fourth portion 118b connects the third portion 118a and extends in the third direction D3 to the mixed flow region 166. The third direction D3 is opposite to the second direction D2.

工作流體170適於由入口119a進入腔室119,其中第一部分的工作流體172通過第一流道162,第二部分的工作流體174通過旁通流道164,之後第一部分的工作流體172與第二部分的工作流體174在混流區166混合後,進入第二流道168中,再由出口119b離開腔室119。The working fluid 170 is adapted to enter the chamber 119 from the inlet 119a, wherein the first portion of the working fluid 172 passes through the first flow passage 162 and the second portion of the working fluid 174 passes through the bypass flow passage 164, after which the first portion of the working fluid 172 and the second portion A portion of the working fluid 174, after mixing in the mixed flow zone 166, enters the second flow channel 168 and exits the chamber 119 from the outlet 119b.

承上述,由於旁通流道164的寬度W1大於各第一流道162的寬度W2,因此第二部分的工作流體174在旁通流道164內流動時受到的流阻會小於第一部分的工作流體172在第一流道162內流動時受到的流阻,亦即,第二部分的工作流體174在旁通流道164內的壓損會小於第一部分的工作流體172在第一流道162內的壓損。當電子元件 132與134運作時所產生的熱量透過承載基板120傳遞至熱交換器110時,可藉由底板112、蓋板114、第一散熱鰭片116以及第二散熱鰭片118來與工作流體170進行熱交換,以藉由工作流體170將熱量帶走。In view of the above, since the width W1 of the bypass flow passage 164 is larger than the width W2 of each of the first flow passages 162, the flow resistance of the second portion of the working fluid 174 flowing in the bypass flow passage 164 is smaller than that of the first partial working fluid. The flow resistance experienced by the 172 flowing in the first flow passage 162, that is, the pressure loss of the second portion of the working fluid 174 in the bypass flow passage 164 may be less than the pressure of the first portion of the working fluid 172 in the first flow passage 162. damage. Electronic component When the heat generated by the operation of the 132 and 134 is transmitted to the heat exchanger 110 through the carrier substrate 120, the heat can be generated by the bottom plate 112, the cover plate 114, the first heat dissipation fins 116, and the second heat dissipation fins 118. Heat exchange to carry heat away by working fluid 170.

此外,由於第一部分的工作流體174在旁通流道164內的壓損較小,流速較快,因此通過旁通流道164的第一部分的工作流體174的溫度會低於通過第一流道162的第二部分的工作流體172的溫度,且兩者在混流區166混和後進入第二流道168時的入口溫度,會比無此旁通流道164設計的結構具有較低的入口溫度,使得工作流體170在第二流道168中可以提供較好的熱交換效果。Moreover, since the first portion of the working fluid 174 has a smaller pressure loss in the bypass flow passage 164 and the flow rate is faster, the temperature of the working fluid 174 passing through the first portion of the bypass flow passage 164 may be lower than the passage through the first flow passage 162. The temperature of the second portion of the working fluid 172, and the inlet temperature when the two enter the second flow passage 168 after mixing in the mixed flow zone 166, will have a lower inlet temperature than the structure designed without the bypass flow passage 164. The working fluid 170 is provided in the second flow path 168 to provide a better heat exchange effect.

換言之,藉由本實施例的旁通流道164可降低工作流體170在流道內的壓損,可有效降低推動工作流體170流動之流阻,減少推動系統所需的幫浦功率(pumping power);或是,在相同的幫浦功率消耗下,提供較已知設計更大的液體流量與熱傳輸量,達到較佳的散熱效果。此外,將本實施例的半導體模組100作為電動車輛的IGBT功率模組時,可使得電動車輛消耗的功率降低,延長電動車的行駛時間與距離。In other words, the bypass flow path 164 of the present embodiment can reduce the pressure loss of the working fluid 170 in the flow channel, can effectively reduce the flow resistance of the flow of the working fluid 170, and reduce the pumping power required to push the system. Or, at the same pump power consumption, provide greater liquid flow and heat transfer than known designs for better heat dissipation. Further, when the semiconductor module 100 of the present embodiment is used as an IGBT power module of an electric vehicle, the power consumed by the electric vehicle can be reduced, and the travel time and distance of the electric vehicle can be prolonged.

在製程上,可以採用機械加工以及銲接(welding)、機械密封等技術來製作所述熱交換器110。首先,例如是以CNC(Computer Numerical Control)機械加工方式在金屬板上製作第一流道162、旁通流道164、混流區166、第二流道168以及相應的第一散熱鰭片116與第二散熱鰭片118 等。亦即,底板112、第一散熱鰭片116以及第二散熱鰭片118是採一體成型的方式製作。此外,再將另外以機械加工製作的蓋板114,經由銲接、機械密封等方式結合到底板112,以形成熱交換器110。在本實施例中,選用的金屬板可以是銅板或是其他具有良好導熱效果的金屬材質。此外,也可以選用複合板材來取代金屬板,進行熱交換器110的製作。In the process, the heat exchanger 110 can be fabricated by techniques such as machining, welding, mechanical sealing, and the like. First, for example, a first flow path 162, a bypass flow path 164, a mixed flow area 166, a second flow path 168, and corresponding first heat dissipation fins 116 and a first surface are formed on a metal plate by a CNC (Computer Numerical Control) machining method. Two heat sink fins 118 Wait. That is, the bottom plate 112, the first heat dissipation fins 116, and the second heat dissipation fins 118 are integrally formed. Further, a cover plate 114 which is additionally machined is joined to the bottom plate 112 via welding, mechanical sealing or the like to form the heat exchanger 110. In this embodiment, the selected metal plate may be a copper plate or other metal material having a good thermal conductivity. In addition, a composite plate may be used instead of the metal plate to fabricate the heat exchanger 110.

下文更以多個實施例來說明本申請之半導體模組及其熱交換器可能的變化例,其中省略前述實施例已說明的部分,就主要差異進行描述,並以相同或類似的元件符號來表示類似的元件。The possible variations of the semiconductor module and its heat exchanger of the present application are described in more detail below, in which the parts already described in the foregoing embodiments are omitted, the main differences are described, and the same or similar component symbols are used. Represents similar components.

圖2繪示依照本申請之另一實施例的熱交換器。圖2省略了蓋板,以清楚表達熱交換器的內部結構。2 illustrates a heat exchanger in accordance with another embodiment of the present application. Figure 2 omits the cover to clearly express the internal structure of the heat exchanger.

如圖2所示,本實施例的熱交換器210與圖1B所示的熱交換器110類似,兩者的主要差異在於:本實施例改變第二散熱鰭片218的結構來調整混流區266的形狀。更具體而言,本實施例省略了前述實施例之熱交換器110的第二散熱鰭片118的第四部分118b(如圖1B所示),以將原先設置第四部分118b的區域留空,擴大本實施例的混流區266。各第二散熱鰭片218為直線形,並且由第一側S1沿第一方向D1延伸至混流區266。As shown in FIG. 2, the heat exchanger 210 of the present embodiment is similar to the heat exchanger 110 shown in FIG. 1B. The main difference between the two is that the structure of the second heat dissipation fin 218 is changed to adjust the mixed flow region 266. shape. More specifically, the present embodiment omits the fourth portion 118b of the second heat dissipation fin 118 of the heat exchanger 110 of the foregoing embodiment (as shown in FIG. 1B) to leave the area where the fourth portion 118b is originally disposed. The flow area 266 of the present embodiment is enlarged. Each of the second heat dissipation fins 218 is linear and extends from the first side S1 in the first direction D1 to the mixed flow region 266.

當然,此混流區266的形狀、大小、位置可隨實際需求來進行調整。因應混流區266的設計,第一散熱鰭片216與第二散熱鰭片218的結構也可做相應的改變。Of course, the shape, size, and position of the mixed flow zone 266 can be adjusted according to actual needs. The structure of the first heat dissipation fin 216 and the second heat dissipation fin 218 can also be changed correspondingly according to the design of the mixed flow area 266.

另一方面,本申請可以選擇在混流區內設置額外的擾流結構,以提高工作流體在混流區內的混合效果。如圖3所示之本申請之另一實施例的熱交換器310,即繪示了在混流區366內額外設置混流件367的設計。在此,混流件367例如是隔板,其與第一散熱鰭片316以及第二散熱鰭片318相互分離,並且橫亙於工作流體370的移動路徑上。此外,本申請並不限定混流件367的數量、形狀、位置與高度,在其他實施例中,可藉由改變混流件367的數量、形狀、位置、高度,來得到期望的混流效果。On the other hand, the present application may choose to provide an additional spoiler structure in the mixed flow zone to improve the mixing effect of the working fluid in the mixed flow zone. The heat exchanger 310 of another embodiment of the present application, as shown in FIG. 3, depicts the design of an additional flow 363 disposed within the mixed flow zone 366. Here, the flow absorbing member 367 is, for example, a spacer which is separated from the first heat radiation fin 316 and the second heat radiation fin 318 and traverses the moving path of the working fluid 370. Moreover, the present application does not limit the number, shape, position and height of the flow mixing members 367. In other embodiments, the desired mixed flow effect can be obtained by changing the number, shape, position and height of the flow mixing members 367.

圖4繪示依照本申請之另一實施例的半導體模組。如圖4所示,本實施例的半導體模組400與圖1A所示的半導體模組100類似,兩者的主要差異在於:本實施例的底板412為均熱板(vapor chamber)。亦即,在底板412內部形成具毛細結構490的低真空度的腔體412a,當熱量由熱源傳導至底板412時,腔體412a裡面的液相工質會吸收熱量並且在低真空度的環境中汽化。此時,工質吸收熱能並且潛變汽化,汽相的工質會很快充滿整個腔體412a。當汽相工質接觸到溫度較低的區域時會產生冷凝的現象,以藉由冷凝的現象釋放出在汽化時吸收的熱量。凝結後的液相工質會藉由毛細結構的毛細作用再回到蒸發處。如此,週而復始,可將熱源產生的熱量迅速轉移到底板412的各個部分。換言之,本實施例的底板412為具有良好的兩相流特性之平板式熱管架構,可提供極佳之二維橫向導熱效果,即使承載工作溫度極高的分散式熱源,也能快速的將 熱源產生的熱量擴散開來,避免在局部區域形成熱點(hot spot),以延長產品使用壽命。FIG. 4 illustrates a semiconductor module in accordance with another embodiment of the present application. As shown in FIG. 4, the semiconductor module 400 of the present embodiment is similar to the semiconductor module 100 shown in FIG. 1A. The main difference between the two is that the bottom plate 412 of the present embodiment is a vapor chamber. That is, a low-vacuum cavity 412a having a capillary structure 490 is formed inside the bottom plate 412. When heat is conducted from the heat source to the bottom plate 412, the liquid phase in the cavity 412a absorbs heat and is in a low vacuum environment. China vaporization. At this time, the working medium absorbs thermal energy and vaporizes, and the working fluid of the vapor phase quickly fills the entire cavity 412a. Condensation occurs when the vapor phase medium contacts a lower temperature region to release heat absorbed during vaporization by condensation. The condensed liquid phase will return to the evaporation by the capillary action of the capillary structure. In this way, the heat generated by the heat source can be quickly transferred to various portions of the bottom plate 412. In other words, the bottom plate 412 of the present embodiment is a flat-plate heat pipe structure with good two-phase flow characteristics, and can provide an excellent two-dimensional lateral heat conduction effect, and can even quickly carry a distributed heat source with extremely high operating temperature. The heat generated by the heat source spreads out to avoid the formation of hot spots in local areas to extend the life of the product.

圖5A繪示依照本申請之又一實施例的半導體模組。圖5B為圖5A之熱交換器的底視圖,其中為清楚表達熱交換器的內部結構,圖5B省略了蓋板。圖5C為圖5B之區域B的放大圖。如圖5A~5C所示,本實施例的半導體模組500與圖1A~1D所示的半導體模組100類似,兩者的主要差異在於:本實施例將電子元件532以及534分別設置在第一承載基板520a以及第二承載基板520b上;以及本實施例選擇在第一散熱鰭片516的表面、第二散熱鰭片518的表面或腔室519的內壁形成多個凹洞502。更具體而言,本實施例的電子元件532與534例如分別是IGBT晶片以及二極體晶片,可藉由前述實施例所介紹的方式或是已知可行的方式連接到外部電路。凹洞502可以在製作熱交換器510的同時,藉由例如機械加工的方式被選擇形成在底板512、蓋板514、第一散熱鰭片516或第二散熱鰭片518的表面,且凹洞520較佳之位置是位於工作流體570進入散熱鰭片較前邊處。如此,凹洞502可以改變工作流體570在腔室519內的層流流動特性,因凹洞可將原有的熱邊界層與流場的邊界層在流過凹洞時出現『下沉』的現象,因此熱邊界與流場邊界層化出現變薄的現象。熱邊界層變薄,熱傳效果自然就改善(熱阻變小)。流場邊界層變薄,就不容易出現分離的現象,使得工作流體570阻力縮小,更強化其散熱能力。FIG. 5A illustrates a semiconductor module in accordance with yet another embodiment of the present application. Figure 5B is a bottom plan view of the heat exchanger of Figure 5A with the cover plate omitted for clarity of the internal structure of the heat exchanger. Fig. 5C is an enlarged view of a region B of Fig. 5B. As shown in FIGS. 5A to 5C, the semiconductor module 500 of the present embodiment is similar to the semiconductor module 100 shown in FIGS. 1A to 1D. The main difference between the two is that the electronic components 532 and 534 are respectively disposed in the first embodiment. A carrier substrate 520a and a second carrier substrate 520b are disposed; and the embodiment selectively forms a plurality of recesses 502 on the surface of the first heat dissipation fin 516, the surface of the second heat dissipation fin 518, or the inner wall of the chamber 519. More specifically, the electronic components 532 and 534 of the present embodiment are, for example, IGBT wafers and diode wafers, respectively, and can be connected to an external circuit by the manner described in the foregoing embodiments or in a known manner. The cavity 502 may be selectively formed on the surface of the bottom plate 512, the cover 514, the first heat dissipation fin 516 or the second heat dissipation fin 518 by, for example, machining, while forming the heat exchanger 510, and the cavity The preferred location of 520 is at the front of the working fluid 570 that enters the fins. As such, the cavity 502 can change the laminar flow characteristics of the working fluid 570 in the chamber 519, because the recess can cause the boundary layer of the original thermal boundary layer and the flow field to "sink" when flowing through the cavity. Phenomenon, therefore, the thermal boundary and the flow field boundary stratification appear thin. The thermal boundary layer is thinned, and the heat transfer effect is naturally improved (the thermal resistance becomes small). When the boundary layer of the flow field is thinned, it is not easy to separate, which makes the working fluid 570 reduce the resistance and strengthen its heat dissipation capability.

圖6繪示依照本申請之再一實施例的半導體模組。如 圖6所示,本實施例的半導體模組600與圖5A所示的半導體模組500類似,兩者的主要差異在於:本實施例選擇將凹洞602形成在對應於熱源(電子元件632與634)的位置,並且使凹洞602貫穿底板612,以連接熱源的底部。更具體而言,所述凹洞602可貫穿底板612,直達承載基板620a與620b的底部,如此可使得工作流體直接冷卻位於電子元件632與634下方的承載基板620a與620b,提高散熱效果。另一方面,若承載基板620a與620b藉由銲料層644與底板612相接合,其接著面上可能會產生氣孔,而此氣孔製程中可由凹洞602被排出,提高承載基板620a與620b與底板612之間的接著的可靠度與散熱能力。當然,本實施例也可以結合如圖5A~5C所示實施例的凹洞502設計,亦即,可以在熱交換器610的底板612、蓋板614、散熱鰭片616的表面上形成可能的凹洞。FIG. 6 illustrates a semiconductor module in accordance with still another embodiment of the present application. Such as As shown in FIG. 6, the semiconductor module 600 of the present embodiment is similar to the semiconductor module 500 shown in FIG. 5A. The main difference between the two is that the present embodiment selects the recess 602 to be formed corresponding to the heat source (the electronic component 632 and The position of 634) and the recess 602 is passed through the bottom plate 612 to connect the bottom of the heat source. More specifically, the recess 602 can extend through the bottom plate 612 to the bottom of the carrier substrates 620a and 620b, so that the working fluid directly cools the carrier substrates 620a and 620b under the electronic components 632 and 634 to improve the heat dissipation effect. On the other hand, if the carrier substrates 620a and 620b are bonded to the bottom plate 612 by the solder layer 644, air holes may be formed on the subsequent surfaces thereof, and the holes may be discharged by the recesses 602 to improve the carrier substrates 620a and 620b and the bottom plate. Subsequent reliability and heat dissipation between 612. Of course, this embodiment can also be combined with the design of the cavity 502 of the embodiment shown in FIGS. 5A to 5C, that is, the surface of the bottom plate 612, the cover 614, and the heat dissipation fin 616 of the heat exchanger 610 can be formed. pit.

雖然本申請已以實施例揭露如上,然其並非用以限定本申請,任何所屬技術領域中具有通常知識者,在不脫離本申請之精神和範圍內,當可作些許之更動與潤飾,故本申請之保護範圍當視後附之申請專利範圍所界定者為準。Although the present application has been disclosed in the above embodiments, it is not intended to limit the present application, and any person skilled in the art can make some changes and refinements without departing from the spirit and scope of the present application. The scope of protection of this application is subject to the definition of the scope of the patent application.

100‧‧‧半導體模組100‧‧‧Semiconductor Module

110‧‧‧熱交換器110‧‧‧ heat exchanger

112‧‧‧底板112‧‧‧floor

112a‧‧‧底板的承載面112a‧‧‧ bearing surface of the bottom plate

112b‧‧‧底板的背側112b‧‧‧Back side of the bottom plate

114‧‧‧蓋板114‧‧‧ Cover

116‧‧‧第一散熱鰭片116‧‧‧First heat sink fin

116a‧‧‧第一散熱鰭片的第一部分116a‧‧‧The first part of the first fin

116b‧‧‧第一散熱鰭片的第二部分116b‧‧‧The second part of the first fin

118‧‧‧第二散熱鰭片118‧‧‧Second heat sink fins

118a‧‧‧第二散熱鰭片的第三部分118a‧‧‧The third part of the second heat sink fin

118b‧‧‧第二散熱鰭片的第四部分118b‧‧‧The fourth part of the second heat sink fin

119‧‧‧腔室119‧‧‧ chamber

119a‧‧‧腔室的入口119a‧‧‧ entrance to the chamber

119b‧‧‧腔室的出口119b‧‧‧Export of the chamber

120‧‧‧承載基板120‧‧‧bearing substrate

122‧‧‧陶瓷核心層122‧‧‧Ceramic core layer

124、126‧‧‧覆銅層124, 126‧‧‧ copper layer

124a‧‧‧表層線路124a‧‧‧ surface line

132、134‧‧‧電子元件132, 134‧‧‧ Electronic components

142‧‧‧第一銲料層142‧‧‧First solder layer

144‧‧‧第二銲料層144‧‧‧Second solder layer

150‧‧‧殼體150‧‧‧shell

162‧‧‧第一流道162‧‧‧First runner

164‧‧‧旁通流道164‧‧‧ bypass flow passage

166‧‧‧混流區166‧‧‧ mixed flow area

168‧‧‧第二流道168‧‧‧Second runner

170、172、174‧‧‧工作流體170, 172, 174‧‧ working fluids

182a、182b‧‧‧導線182a, 182b‧‧‧ wires

184a、184b‧‧‧接點184a, 184b‧‧‧ joints

192、194‧‧‧銲線192,194‧‧‧welding line

D1‧‧‧第一方向D1‧‧‧ first direction

D2‧‧‧第二方向D2‧‧‧ second direction

D3‧‧‧第三方向D3‧‧‧ third direction

S1‧‧‧腔室的第一側First side of the S1‧‧ ‧ chamber

S2‧‧‧腔室的第二側Second side of the S2‧‧ ‧ chamber

W1‧‧‧旁通流道的寬度W1‧‧‧ width of bypass flow channel

W2‧‧‧第一流道的寬度W2‧‧‧ width of the first runner

W3‧‧‧第二流道的寬度W3‧‧‧ width of the second runner

210‧‧‧熱交換器210‧‧‧ heat exchanger

216‧‧‧第一散熱鰭片216‧‧‧First heat sink fin

218‧‧‧第二散熱鰭片218‧‧‧Second heat sink fins

266‧‧‧混流區266‧‧‧ mixed flow area

310‧‧‧熱交換器310‧‧‧ heat exchanger

316‧‧‧第一散熱鰭片316‧‧‧First heat sink fin

318‧‧‧第二散熱鰭片318‧‧‧Second heat sink fins

366‧‧‧混流區366‧‧‧ mixed flow area

367‧‧‧混流件367‧‧‧Breaker

370‧‧‧工作流體370‧‧‧Working fluid

400‧‧‧半導體模組400‧‧‧Semiconductor Module

412‧‧‧底板412‧‧‧floor

412a‧‧‧腔體412a‧‧‧ cavity

490‧‧‧毛細結構490‧‧‧Capillary structure

500‧‧‧半導體模組500‧‧‧Semiconductor Module

502‧‧‧凹洞502‧‧‧

510‧‧‧熱交換器510‧‧‧ heat exchanger

512‧‧‧底板512‧‧‧floor

514‧‧‧蓋板514‧‧‧ Cover

516‧‧‧第一散熱鰭片516‧‧‧First heat sink fin

518‧‧‧第二散熱鰭片518‧‧‧Second heat sink fins

519‧‧‧腔室519‧‧‧室

520a‧‧‧第一承載基板520a‧‧‧First carrier substrate

520b‧‧‧第二承載基板520b‧‧‧second carrier substrate

532、534‧‧‧電子元件532, 534‧‧‧ Electronic components

570‧‧‧工作流體570‧‧‧Working fluid

600‧‧‧半導體模組600‧‧‧Semiconductor Module

602‧‧‧凹洞602‧‧‧Deep

610‧‧‧熱交換器610‧‧‧ heat exchanger

612‧‧‧底板612‧‧‧floor

614‧‧‧蓋板614‧‧‧ Cover

616‧‧‧散熱鰭片616‧‧‧heat fins

620a‧‧‧第一承載基板620a‧‧‧First carrier substrate

620b‧‧‧第二承載基板620b‧‧‧second carrier substrate

632、634‧‧‧電子元件632, 634‧‧ Electronic components

644‧‧‧銲料層644‧‧‧ solder layer

圖1A繪示依照本申請之一實施例的半導體模組。FIG. 1A illustrates a semiconductor module in accordance with an embodiment of the present application.

圖1B為圖1A之熱交換器的底視圖。Figure 1B is a bottom view of the heat exchanger of Figure 1A.

圖1C為圖1B之結構的立體圖。1C is a perspective view of the structure of FIG. 1B.

圖1D為圖1B之區域A的放大圖。Fig. 1D is an enlarged view of a region A of Fig. 1B.

圖1E為本申請之另一實施例的熱交換器的立體圖。1E is a perspective view of a heat exchanger according to another embodiment of the present application.

圖2繪示依照本申請之另一實施例的熱交換器。2 illustrates a heat exchanger in accordance with another embodiment of the present application.

圖3繪示依照本申請之又一實施例的熱交換器。FIG. 3 illustrates a heat exchanger in accordance with yet another embodiment of the present application.

圖4繪示依照本申請之另一實施例的半導體模組。FIG. 4 illustrates a semiconductor module in accordance with another embodiment of the present application.

圖5A繪示依照本申請之又一實施例的半導體模組。FIG. 5A illustrates a semiconductor module in accordance with yet another embodiment of the present application.

圖5B為圖5A之熱交換器的底視圖。Figure 5B is a bottom view of the heat exchanger of Figure 5A.

圖5C為圖5B之區域B的放大圖。Fig. 5C is an enlarged view of a region B of Fig. 5B.

圖6繪示依照本申請之再一實施例的半導體模組。FIG. 6 illustrates a semiconductor module in accordance with still another embodiment of the present application.

110‧‧‧熱交換器110‧‧‧ heat exchanger

112‧‧‧底板112‧‧‧floor

116‧‧‧第一散熱鰭片116‧‧‧First heat sink fin

116a‧‧‧第一散熱鰭片的第一部分116a‧‧‧The first part of the first fin

116b‧‧‧第一散熱鰭片的第二部分116b‧‧‧The second part of the first fin

118‧‧‧第二散熱鰭片118‧‧‧Second heat sink fins

118a‧‧‧第二散熱鰭片的第三部分118a‧‧‧The third part of the second heat sink fin

118b‧‧‧第二散熱鰭片的第四部分118b‧‧‧The fourth part of the second heat sink fin

119‧‧‧腔室119‧‧‧ chamber

119a‧‧‧腔室的入口119a‧‧‧ entrance to the chamber

119b‧‧‧腔室的出口119b‧‧‧Export of the chamber

162‧‧‧第一流道162‧‧‧First runner

164‧‧‧旁通流道164‧‧‧ bypass flow passage

166‧‧‧混流區166‧‧‧ mixed flow area

168‧‧‧第二流道168‧‧‧Second runner

170、172、174‧‧‧工作流體170, 172, 174‧‧ working fluids

D1‧‧‧第一方向D1‧‧‧ first direction

D2‧‧‧第二方向D2‧‧‧ second direction

D3‧‧‧第三方向D3‧‧‧ third direction

S1‧‧‧腔室的第一側First side of the S1‧‧ ‧ chamber

S2‧‧‧腔室的第二側Second side of the S2‧‧ ‧ chamber

W3‧‧‧第二流道的寬度W3‧‧‧ width of the second runner

Claims (13)

一種熱交換器,包括:一底板(base plate),具有一承載面以及相對於該承載面的一背側,其中該承載面用以承載一熱源;一蓋板,配置於該底板的該背側,該蓋板與該底板共同形成一腔室,且該腔室具有一入口以及一出口,位於該腔室的同一側;多個第一散熱鰭片,並排設置於該底板與該蓋板之間,用以在該腔室內形成相互平行的多個第一流道以及一旁通流道(bypass channel),其中各該第一流道以及該旁通流道由該入口延伸至該腔室內的一混流區,且該旁通流道的寬度大於各該第一流道的寬度;多個第二散熱鰭片,並排設置於該底板與該蓋板之間,用以在該腔室內形成相互平行的多個第二流道,各該第二流道由該混流區延伸至該出口,且該旁通流道的寬度大於各該第二流道的寬度;以及一工作流體,適於由該入口進入該腔室,其中一部分的該工作流體通過該些第一流道,另一部分的該工作流體通過該旁通流道,並且該一部分的工作流體以及該另一部分的工作流體在該混流區混合後,進入該些第二流道中,再由該出口離開該腔室。A heat exchanger comprising: a base plate having a bearing surface and a back side opposite to the bearing surface, wherein the bearing surface is for carrying a heat source; and a cover plate disposed on the back of the bottom plate a side surface, the cover plate and the bottom plate together form a chamber, and the chamber has an inlet and an outlet on the same side of the chamber; a plurality of first heat dissipation fins are arranged side by side on the bottom plate and the cover plate Between the plurality of first flow channels and a bypass channel formed in the chamber, wherein each of the first flow channels and the bypass flow path extend from the inlet to the chamber a mixed flow zone, wherein the width of the bypass flow channel is greater than a width of each of the first flow channels; a plurality of second heat dissipation fins are disposed side by side between the bottom plate and the cover plate for forming parallel to each other in the cavity a plurality of second flow passages each extending from the mixed flow region to the outlet, wherein a width of the bypass flow passage is greater than a width of each of the second flow passages; and a working fluid adapted to be accessed by the inlet Entering the chamber, a portion of the working fluid is passed Passing through the first flow passages, another portion of the working fluid passes through the bypass flow passages, and the working fluid of the portion and the working fluid of the other portion are mixed in the mixed flow region, enter the second flow passages, and then The outlet exits the chamber. 如申請專利範圍第1項所述之熱交換器,其中該些第一流道中的該工作流體之流阻大於該些旁通流道中的該另一部分的工作流體之流阻。The heat exchanger of claim 1, wherein the flow resistance of the working fluid in the first flow passages is greater than the flow resistance of the other portion of the bypass flow passages. 如申請專利範圍第1項所述之熱交換器,其中該腔室具有相對的一第一側以及一第二側,該入口與該出口位於該第一側,該混流區位於該第二側。 The heat exchanger of claim 1, wherein the chamber has an opposite first side and a second side, the inlet and the outlet are located on the first side, and the mixed flow area is located on the second side . 如申請專利範圍第3項所述之熱交換器,其中各該第一散熱鰭片為L形,且各該第一散熱鰭片包括:一第一部分,由該第一側沿一第一方向延伸至該第二側;以及一第二部分,連接該第一部分,並且沿一第二方向延伸至該混流區,該第一方向與該第二方向相交。 The heat exchanger of claim 3, wherein each of the first heat dissipation fins has an L shape, and each of the first heat dissipation fins comprises: a first portion, the first side being along a first direction Extending to the second side; and a second portion connecting the first portion and extending in a second direction to the mixed flow region, the first direction intersecting the second direction. 如申請專利範圍第4項所述之熱交換器,其中各該第二散熱鰭片為L形,且各該第二散熱鰭片包括:一第三部分,由該第一側沿該第一方向延伸至該第二側;以及一第四部分,連接該第三部分,並且沿一第三方向延伸至該混流區,該第三方向與該第二方向相反。 The heat exchanger of claim 4, wherein each of the second heat dissipation fins is L-shaped, and each of the second heat dissipation fins comprises: a third portion, the first side being along the first a direction extending to the second side; and a fourth portion connecting the third portion and extending in a third direction to the mixed flow region, the third direction being opposite the second direction. 如申請專利範圍第4項所述之熱交換器,其中各該第二散熱鰭片為直線形,並且由該第一側沿該第一方向延伸至該混流區。 The heat exchanger of claim 4, wherein each of the second heat dissipation fins is linear and extends from the first side in the first direction to the mixed flow region. 如申請專利範圍第1項所述之熱交換器,更包括一混流件,設置於該混流區內,並且與該些第一散熱鰭片以及該些第二散熱鰭片相互分離。 The heat exchanger of claim 1, further comprising a flow mixing member disposed in the mixed flow region and separated from the first heat dissipation fins and the second heat dissipation fins. 如申請專利範圍第7項所述之熱交換器,其中該混流件包括一隔板,橫亙於該工作流體的移動路徑上。 The heat exchanger of claim 7, wherein the flow mixing member comprises a partition traversing the moving path of the working fluid. 如申請專利範圍第1項所述之熱交換器,其中該旁 通流道位於該些第一流道的最外側,且鄰近於該腔室的內壁。 The heat exchanger according to claim 1, wherein the side is The flow passage is located at an outermost side of the first flow passages and adjacent to an inner wall of the chamber. 如申請專利範圍第1項所述之熱交換器,其中該底板包括一均熱板(vapor chamber)。 The heat exchanger of claim 1, wherein the bottom plate comprises a vapor chamber. 如申請專利範圍第1項所述之熱交換器,其中該些第一散熱鰭片的表面、該些第二散熱鰭片的表面以及該腔室的內壁中的至少一個具有多個凹洞。 The heat exchanger of claim 1, wherein at least one of a surface of the first heat dissipation fins, a surface of the second heat dissipation fins, and an inner wall of the chamber has a plurality of recesses . 如申請專利範圍第11項所述之熱交換器,其中該些凹洞對應於該熱源的位置,並且貫穿該底板,以連接該熱源的底部。 The heat exchanger of claim 11, wherein the recesses correspond to the location of the heat source and extend through the bottom plate to connect the bottom of the heat source. 如申請專利範圍第1項所述之熱交換器,其中該底板的材質包括金屬或複合材料。 The heat exchanger of claim 1, wherein the material of the bottom plate comprises a metal or a composite material.
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