TWI477819B - 用於快速改變焦距的偵測系統與方法 - Google Patents

用於快速改變焦距的偵測系統與方法 Download PDF

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Publication number
TWI477819B
TWI477819B TW100132244A TW100132244A TWI477819B TW I477819 B TWI477819 B TW I477819B TW 100132244 A TW100132244 A TW 100132244A TW 100132244 A TW100132244 A TW 100132244A TW I477819 B TWI477819 B TW I477819B
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TW
Taiwan
Prior art keywords
core
electric field
along
electrodes
magnitude
Prior art date
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TW100132244A
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English (en)
Chinese (zh)
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TW201224519A (en
Inventor
費德曼海姆
摩根斯坦波利斯
巴爾艾登
奈迪斯羅曼
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應用材料以色列公司
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Publication of TW201224519A publication Critical patent/TW201224519A/zh
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Publication of TWI477819B publication Critical patent/TWI477819B/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N21/00—Selective content distribution, e.g. interactive television or video on demand [VOD]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/11—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • G02F1/294—Variable focal length devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Multimedia (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Automatic Focus Adjustment (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
TW100132244A 2010-10-10 2011-09-07 用於快速改變焦距的偵測系統與方法 TWI477819B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US39167210P 2010-10-10 2010-10-10

Publications (2)

Publication Number Publication Date
TW201224519A TW201224519A (en) 2012-06-16
TWI477819B true TWI477819B (zh) 2015-03-21

Family

ID=45924889

Family Applications (2)

Application Number Title Priority Date Filing Date
TW100132244A TWI477819B (zh) 2010-10-10 2011-09-07 用於快速改變焦距的偵測系統與方法
TW103123473A TWI497120B (zh) 2010-10-10 2011-09-07 用於快速改變焦距的偵測系統與方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW103123473A TWI497120B (zh) 2010-10-10 2011-09-07 用於快速改變焦距的偵測系統與方法

Country Status (4)

Country Link
US (2) US8488117B2 (https=)
JP (2) JP5844114B2 (https=)
KR (2) KR101485069B1 (https=)
TW (2) TWI477819B (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8488117B2 (en) 2010-10-10 2013-07-16 Applied Materials Israel, Ltd. Inspection system and method for fast changes of focus
US9784689B2 (en) * 2015-07-10 2017-10-10 Applied Materials Israel Ltd. Method and system for inspecting an object with an array of beams
US9535014B1 (en) * 2015-07-15 2017-01-03 Applied Materials Israel Ltd. Systems and methods for inspecting an object
TWI662262B (zh) * 2018-04-20 2019-06-11 國立臺灣大學 具等向性轉換函數之量化差分相位對比顯微系統
WO2020200530A1 (en) * 2019-03-29 2020-10-08 Mycronic AB Long sweep length duv microlithographic beam scanning acousto-optical deflector and optics design
KR102358454B1 (ko) * 2020-07-27 2022-02-07 엘아이지넥스원 주식회사 레이저 위치 추적 시스템 및 그 운용 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003202217A (ja) * 2002-01-09 2003-07-18 Hitachi High-Technologies Corp パターン欠陥検査方法及びパターン欠陥検査装置
CN1591086A (zh) * 2001-06-15 2005-03-09 株式会社半导体能源研究所 激光照射台、激光照射装置以及制造半导体装置的方法
TWI325996B (https=) * 2006-02-28 2010-06-11 Toshiba Kk

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117448A (en) * 1977-03-23 1978-10-13 Canon Inc Modulating optical system
JPH04264420A (ja) * 1991-02-19 1992-09-21 Ricoh Co Ltd 光走査装置
US5619369A (en) * 1992-07-16 1997-04-08 Matsushita Electric Industrial Co., Ltd. Diffracting device having distributed bragg reflector and wavelength changing device having optical waveguide with periodically inverted-polarization layers
JPH0654124A (ja) * 1992-07-28 1994-02-25 Nikon Corp 画像読取装置および画像読取装置に用いる変倍・焦点検出用チャート
JP3453406B2 (ja) * 1993-07-23 2003-10-06 三菱電機株式会社 光変調器
JPH10289475A (ja) * 1997-04-16 1998-10-27 Sony Corp 露光装置
JP4311905B2 (ja) * 2002-02-05 2009-08-12 オリンパス株式会社 光学系
US6809808B2 (en) * 2002-03-22 2004-10-26 Applied Materials, Inc. Wafer defect detection system with traveling lens multi-beam scanner
KR20060013007A (ko) * 2004-08-05 2006-02-09 동부아남반도체 주식회사 목적물 결함 검사 방법 및 장치
KR20060053541A (ko) * 2004-11-17 2006-05-22 삼성에스디아이 주식회사 음극선관용 전자총
JP2006284183A (ja) 2005-03-31 2006-10-19 Toshiba Corp 検査装置及び撮像装置
KR20060119636A (ko) * 2005-05-21 2006-11-24 삼성테크윈 주식회사 포커싱이 수행되는 디지털 영상 처리 장치의 주밍 방법
CA2829445C (en) * 2005-06-20 2016-05-03 Nippon Telegraph And Telephone Corporation Electrooptic device
KR101384260B1 (ko) * 2005-12-05 2014-04-11 전자빔기술센터 주식회사 전자칼럼의 전자빔 포커싱 방법
KR100662238B1 (ko) * 2006-08-08 2006-12-28 주식회사 디오스텍 구동 수단을 구비한 렌즈 조립체 및 이를 포함하는 자동초점 조절 장치
JP4945343B2 (ja) * 2007-06-29 2012-06-06 パナソニック電工Ｓｕｎｘ株式会社 焦点距離調整装置、レーザ加工装置、レーザ変位計及び電気光学素子
JP5130810B2 (ja) * 2007-07-13 2013-01-30 沖電気工業株式会社 光偏向器
KR101442615B1 (ko) * 2008-07-31 2014-09-23 삼성전자주식회사 포커스 렌즈의 제어 방법, 상기 방법에 따라 작동하는포커스 렌즈의 제어 장치, 및 상기 방법을 기록한 기록매체
US8488117B2 (en) 2010-10-10 2013-07-16 Applied Materials Israel, Ltd. Inspection system and method for fast changes of focus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1591086A (zh) * 2001-06-15 2005-03-09 株式会社半导体能源研究所 激光照射台、激光照射装置以及制造半导体装置的方法
JP2003202217A (ja) * 2002-01-09 2003-07-18 Hitachi High-Technologies Corp パターン欠陥検査方法及びパターン欠陥検査装置
TWI325996B (https=) * 2006-02-28 2010-06-11 Toshiba Kk

Also Published As

Publication number Publication date
JP2015017987A (ja) 2015-01-29
KR101455049B1 (ko) 2014-10-28
JP5844114B2 (ja) 2016-01-13
TW201443485A (zh) 2014-11-16
US8488117B2 (en) 2013-07-16
US20120086937A1 (en) 2012-04-12
JP5945303B2 (ja) 2016-07-05
JP2012108488A (ja) 2012-06-07
KR101485069B1 (ko) 2015-01-21
US20130342893A1 (en) 2013-12-26
TW201224519A (en) 2012-06-16
US8659754B2 (en) 2014-02-25
KR20120036756A (ko) 2012-04-18
KR20140076542A (ko) 2014-06-20
TWI497120B (zh) 2015-08-21

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