TWI474017B - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit Download PDF

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TWI474017B
TWI474017B TW95149311A TW95149311A TWI474017B TW I474017 B TWI474017 B TW I474017B TW 95149311 A TW95149311 A TW 95149311A TW 95149311 A TW95149311 A TW 95149311A TW I474017 B TWI474017 B TW I474017B
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input
flip
signal
output
terminal
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TW95149311A
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TW200739103A (en
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Koichi Kumagai
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Liquid Design Systems Inc
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/04Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
    • G11C29/08Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
    • G11C29/48Arrangements in static stores specially adapted for testing by means external to the store, e.g. using direct memory access [DMA] or using auxiliary access paths
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/317Testing of digital circuits
    • G01R31/31712Input or output aspects
    • G01R31/31713Input or output interfaces for test, e.g. test pins, buffers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/04Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
    • G11C29/08Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
    • G11C29/12Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details
    • G11C29/1201Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details comprising I/O circuitry
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

半導體積體電路Semiconductor integrated circuit

本發明係關於一種半導體晶片及半導體積體電路,尤其係關於一種可安裝於中介層之半導體晶片及使用該半導體晶片之半導體積體電路。The present invention relates to a semiconductor wafer and a semiconductor integrated circuit, and more particularly to a semiconductor wafer mountable to an interposer and a semiconductor integrated circuit using the same.

先前提供有一種半導體積體電路,其係積體有微處理器、晶片組、視訊晶片、DRAM等計算機之任意主要電路之晶片(SOC:系統單晶片)。該半導體積體電路,可以相當大幅地縮小安裝所需之面積,且與藉由具有同等電路之複數晶片所形成之系統相比較,可以大幅抑制消耗電力。另外,前述半導體積體電路在出廠前,通常要進行各主要電路之動作、主要電路之端子間之連接關係等之試驗。A semiconductor integrated circuit has been previously provided, which is a wafer (SOC: system single chip) of any main circuit of a computer such as a microprocessor, a chipset, a video chip, or a DRAM. The semiconductor integrated circuit can considerably reduce the area required for mounting, and can greatly suppress power consumption as compared with a system formed by a plurality of wafers having the same circuit. Further, before the shipment of the semiconductor integrated circuit, it is usually necessary to perform tests such as the operation of each main circuit and the connection relationship between the terminals of the main circuit.

專利文獻1揭示有一種凸塊檢查裝置,其對藉由凸塊結合所安裝之半導體積體電路,藉由使用X射線之透視來檢查隱藏於晶片下之凸塊之狀態。專利文獻1之技術,使用X射線檢出凸塊之中心位置,根據該中心位置設定基準凸塊,藉由比較基準凸塊與成為檢查對象之凸塊形狀來判定凸塊形狀之良否。Patent Document 1 discloses a bump inspection apparatus which checks a state of a bump hidden under a wafer by using X-ray fluoroscopy on a semiconductor integrated circuit mounted by bump bonding. According to the technique of Patent Document 1, the center position of the bump is detected by X-rays, and the reference bump is set based on the center position, and the shape of the bump is determined by comparing the reference bump with the shape of the bump to be inspected.

另外,專利文獻2揭示有一種進行安裝於印刷電路板之第1半導體積體電路裝置之端子與第2半導體積體電路裝置之端子之間之連接試驗之技術。專利文獻2之技術,係該第2半導體積體電路裝置具備取入並保持從第1半導體積體電路裝置所輸出之測試資料之測試資料取入保持機構,確 認測試資料取入保持機構之輸出是否成為特定之值後,進行該第1及第2半導體積體電路裝置之端子間之連接試驗。Further, Patent Document 2 discloses a technique for performing a connection test between a terminal of a first semiconductor integrated circuit device mounted on a printed circuit board and a terminal of the second semiconductor integrated circuit device. According to the technique of Patent Document 2, the second semiconductor integrated circuit device includes a test data take-in holding mechanism that takes in and holds test data output from the first semiconductor integrated circuit device, and After the test data is taken into consideration of whether or not the output of the holding mechanism is a specific value, the connection test between the terminals of the first and second semiconductor integrated circuit devices is performed.

再者,專利文獻3揭示有一種搭載MPU之印刷電路板用試驗裝置,其可進行包含MPU之印刷電路板之所有匯流排及其他功能之整體之試驗,且可以容易地判別最終之故障部位。專利文獻3之技術,包含:連接於外部機器連接機構之印刷電路板連接機構、記憶有試驗用測試程式之測試用ROM、執行MPU之試驗用控制程式之試驗執行機構、及根據控制程式經由印刷電路板連接機構進行MPU動作控制之試驗控制機構,並藉由使MPU執行測試程式,經由外部機器連接機構進行印刷電路板之試驗。Further, Patent Document 3 discloses a test apparatus for a printed circuit board on which an MPU is mounted, which can perform an overall test of all the bus bars and other functions of the printed circuit board including the MPU, and can easily determine the final faulty portion. The technique of Patent Document 3 includes a printed circuit board connection mechanism connected to an external device connection mechanism, a test ROM in which a test test program is stored, a test actuator that executes a test program for the MPU, and a print program according to the control program. The board connection mechanism performs a test control mechanism for the MPU operation control, and performs a test of the printed circuit board via an external machine connection mechanism by causing the MPU to execute a test program.

另外,專利文獻4揭示有一種印刷電路板之試驗方法,其對安裝有複數之連接器及電子元件之印刷電路板進行品質試驗。專利文獻4之技術,係向應做試驗之印刷電路板之連接器插入介面板後,將印刷電路板連接於試驗機本體,且將印刷電路板之連接內容自動地分配、設計後顯示於試驗機本體。然後,由顯示之畫面輸入印刷電路板連接內容之修正、變更、或追加等試驗資訊時,則試驗機本體由印刷電路板之電路網圖案讀取試驗電路程式,製作符合試驗資訊之取得整合性之試驗電路及試驗程式,且執行試驗程式,進行印刷電路板之試驗。Further, Patent Document 4 discloses a test method for a printed circuit board in which a quality test is performed on a printed circuit board on which a plurality of connectors and electronic components are mounted. According to the technique of Patent Document 4, after the connector of the printed circuit board to be tested is inserted into the interface panel, the printed circuit board is connected to the test machine body, and the connection contents of the printed circuit board are automatically distributed, designed, and displayed in the test. Machine body. Then, when the test information such as the correction, the change, or the addition of the printed circuit board connection content is input from the display screen, the test machine body reads the test circuit program from the circuit mesh pattern of the printed circuit board, and the integration of the test information is made. Test circuit and test program, and execute the test program to test the printed circuit board.

[專利文獻1]日本特開平5-251535號公報[Patent Document 1] Japanese Patent Laid-Open No. Hei 5-251535

[專利文獻2]日本特開平6-279919號公報[Patent Document 2] Japanese Patent Laid-Open No. Hei 6-279919

[專利文獻3]日本特開平10-55287號公報[Patent Document 3] Japanese Patent Laid-Open No. Hei 10-55287

[專利文獻4]日本特開2002-71756號公報[Patent Document 4] Japanese Patent Laid-Open Publication No. 2002-71756

隨著半導體積體電路之大規模化、高積體化之進展,半導體積體電路之電極之間隔要求到100μm以下。其結果係形成有非常多之電極(例如微凸塊)。With the progress of large-scale and high-integration of semiconductor integrated circuits, the interval between the electrodes of the semiconductor integrated circuits is required to be 100 μm or less. As a result, a very large number of electrodes (for example, microbumps) are formed.

於是,可考慮在檢查半導體積體電路時,在微凸塊形成之前使探針接觸於半導體晶片,進行檢查。但,有因探針卡之針而對凸塊形成用金屬墊造成損傷之問題。Therefore, it is considered that when the semiconductor integrated circuit is inspected, the probe is brought into contact with the semiconductor wafer before the formation of the microbumps, and inspection is performed. However, there is a problem that the metal pad for bump formation is damaged by the needle of the probe card.

對此,專利文獻1之技術,雖可以判定凸塊形狀之良否,但有實際上不能確認主要電路是否正確地動作之問題。專利文獻2之技術,需要在安裝於印刷電路板上之第1半導體積體電路裝置內設置生成連接試驗用之測試資料之測試資料生成機構,有妨礙高積體化之問題。On the other hand, in the technique of Patent Document 1, although it is possible to determine whether or not the shape of the bump is good, there is a problem that it is practically impossible to confirm whether or not the main circuit is operating correctly. According to the technique of Patent Document 2, it is necessary to provide a test data generating mechanism for generating test data for connection test in the first semiconductor integrated circuit device mounted on the printed circuit board, which has a problem of hindering high integration.

另外,半導體積體電路之檢查裝置之信號接腳,現實係需要控制在512接腳以下。例如,假定具有256位元之位元寬度之記憶體晶片,則僅輸入輸出之位元用就需要512接腳。其他若考慮到位址端子、模式控制端子,則會超過512接腳之限制。In addition, the signal pin of the inspection device of the semiconductor integrated circuit needs to be controlled below the 512 pin. For example, assuming a memory chip with a bit width of 256 bits, only 512 pins are needed for input and output bits. Others that take into account the address terminal and mode control terminal will exceed the limit of 512 pins.

對此,專利文獻3及4之技術,需要將印刷電路板連接於外部機器。然而,如果半導體積體電路高積體化為例如512位元以上,則電極成為512根以上,事實上不可能將此等之所有電極連接於外部機器。In this regard, the techniques of Patent Documents 3 and 4 require the connection of a printed circuit board to an external device. However, if the semiconductor integrated circuit is highly integrated into, for example, 512 bits or more, the number of electrodes becomes 512 or more, and it is virtually impossible to connect all of the electrodes to an external device.

本發明係用於解決上述之問題而提出者,其目的在於提 供一種可以對高積體化之半導體積體電路進行有效率且確實地檢查之半導體晶片及半導體積體電路。The present invention has been made to solve the above problems, and its purpose is to provide A semiconductor wafer and a semiconductor integrated circuit capable of efficiently and reliably inspecting a highly integrated semiconductor integrated circuit.

本發明之半導體晶片,其係可安裝於中介層者,包含:複數之電極,其係最小間距為100μm以下、連接前述中介層內之佈線與前述半導體晶片內之佈線者;複數之探針電極,其係連接於前述複數之電極之一部分者;分割機構,其係將輸入至前述探針電極之測試信號分割,並供給於作為前述半導體晶片內之佈線之連接於前述複數電極之佈線者;及信號處理機構,其係根據藉由前述分割機構所分割之測試信號進行特定之信號處理者。The semiconductor wafer of the present invention can be mounted on an interposer, and includes: a plurality of electrodes having a minimum pitch of 100 μm or less, a wiring connecting the interposer and a wiring in the semiconductor wafer; and a plurality of probe electrodes Connected to one of the plurality of electrodes; a dividing mechanism that divides a test signal input to the probe electrode and supplies it to a wiring connected to the plurality of electrodes as a wiring in the semiconductor wafer; And a signal processing unit that performs a specific signal processor based on the test signal divided by the dividing mechanism.

半導體晶片經由最小間距為100μm以下之電極安裝於中介層。探針電極連接於該電極之一部分。而且,分割機構將輸入至探針電極之測試信號分割,並供給於作為半導體晶片內之佈線之連接於複數電極之佈線。然後,信號處理機構,根據分割之測試信號進行特定之信號處理。The semiconductor wafer is mounted on the interposer via electrodes having a minimum pitch of 100 μm or less. The probe electrode is attached to a portion of the electrode. Further, the dividing means divides the test signal input to the probe electrode and supplies it to the wiring connected to the plurality of electrodes as the wiring in the semiconductor wafer. Then, the signal processing mechanism performs specific signal processing based on the divided test signals.

因此,上述發明,即使係具有多位元寬度之電極之情形,亦可向連接於各電極之佈線供給測試信號,故可以有效率且確實地進行檢查。Therefore, in the above invention, even in the case of an electrode having a multi-bit width, a test signal can be supplied to the wiring connected to each electrode, so that the inspection can be performed efficiently and surely.

本發明之半導體晶片,其係可安裝於中介層者,包含:信號處理機構,其係進行特定之信號處理者;複數之電極,其係最小間距為100μm以下、連接連接於前述信號處理機構之佈線與前述中介層內之佈線者;演算處理機構,其係根據來自分別連接於前述複數電極之佈線之測試信 號,進行特定之演算處理者;及探針電極,其係輸出前述演算處理機構之演算結果者。The semiconductor wafer of the present invention can be mounted on an interposer, and includes a signal processing mechanism for performing a specific signal processor, and a plurality of electrodes having a minimum pitch of 100 μm or less and connected to the signal processing mechanism. Wiring and wiring in the interposer; calculation processing mechanism based on test signals from wirings respectively connected to the plurality of electrodes No., a specific calculation processor; and a probe electrode that outputs the calculation result of the calculation processing mechanism.

因此,上述發明,即使係具有多位元寬度之電極之情形,亦可使用來自連接於各電極之佈線之測試信號進行特定之演算,故可以有效率且確實地進行檢查。Therefore, in the above-described invention, even in the case of an electrode having a multi-bit width, a specific calculation can be performed using a test signal from a wiring connected to each electrode, so that the inspection can be performed efficiently and surely.

本發明之半導體積體電路,其特徵在於其係第1及第2半導體晶片經由最小間距為100μm以下之電極安裝於中介層者,且前述第1半導體晶片包含:輸入信號之輸入機構;將輸入至前述輸入機構之信號經由前述間距之電極向第2半導體晶片傳輸之第1傳輸機構;接收從前述第2半導體晶片所傳輸之信號之第1接收機構;及輸出藉由前述接收機構所接收之信號之輸出電極;前述第2半導體晶片包含:接收從前述第1半導體晶片所傳輸之信號之第2接收機構;及將藉由前述第2接收機構所接收之信號經由前述間距之電極向前述第1半導體晶片傳輸之第2傳輸機構。The semiconductor integrated circuit of the present invention is characterized in that the first and second semiconductor wafers are mounted on the interposer via electrodes having a minimum pitch of 100 μm or less, and the first semiconductor wafer includes an input signal input means; a first transmission mechanism that transmits a signal to the input mechanism to the second semiconductor wafer via the electrode of the pitch; a first receiving mechanism that receives a signal transmitted from the second semiconductor wafer; and an output that is received by the receiving mechanism An output electrode of the signal; the second semiconductor wafer includes: a second receiving unit that receives a signal transmitted from the first semiconductor wafer; and a signal received by the second receiving unit through the electrode of the pitch to the second 1 second transmission mechanism for semiconductor wafer transmission.

因此,上述發明係將輸入至第1半導體晶片之信號,從第1半導體晶片經由電極向第2半導體晶片傳輸,並從第2半導體晶片經由電極向第1半導體晶片傳輸後,從輸出電極輸出,故可以有效率且確實地檢查第1及第2半導體晶片內之佈線狀況、及電極間之佈線狀況。Therefore, in the above invention, the signal input to the first semiconductor wafer is transferred from the first semiconductor wafer to the second semiconductor wafer via the electrode, and is transmitted from the second semiconductor wafer to the first semiconductor wafer via the electrode, and then output from the output electrode. Therefore, it is possible to efficiently and reliably check the wiring conditions in the first and second semiconductor wafers and the wiring conditions between the electrodes.

本發明係對具有多位元寬度之電極之半導體積體電路有效率且確實地進行檢查。The present invention efficiently and reliably inspects a semiconductor integrated circuit having electrodes having a multi-bit width.

以下,參照圖面對本發明之較佳實施形態進行詳細說明。並且,對相同構成之電路賦予相同符號(數字),再根據需要附加字(字母)。另外,以下之實施形態不過是本發明之一例,於不脫離發明之範圍內,可適宜地進行設計變更。Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. Further, the same symbol (number) is given to the circuit of the same configuration, and a word (letter) is added as needed. Further, the following embodiments are merely examples of the present invention, and design changes can be appropriately made without departing from the scope of the invention.

[第1實施形態][First Embodiment]

圖1係半導體積體電路之平面圖。半導體積體電路包含中介層1、安裝於該中介層1上之記憶體晶片10及ASIC晶片80。在中介層1上設置有複數之探針墊2。Figure 1 is a plan view of a semiconductor integrated circuit. The semiconductor integrated circuit includes an interposer 1, a memory chip 10 and an ASIC wafer 80 mounted on the interposer 1. A plurality of probe pads 2 are disposed on the interposer 1.

記憶體晶片10包含:後述之DRAM21、連接記憶體晶片10內之佈線與中介層1之佈線且以100μm以下之最小間距配置之複數之微凸塊11、及複數之探針墊12。The memory wafer 10 includes a DRAM 21 to be described later, a plurality of microbumps 11 that are connected to the wiring in the memory wafer 10 and the wiring of the interposer 1 and arranged at a minimum pitch of 100 μm or less, and a plurality of probe pads 12.

ASIC晶片80包含:未圖示之ASIC(特定用邏輯電路)、連接ASIC晶片80內之佈線與中介層1之佈線且以100μm以下之最小間距配置之複數之微凸塊81、及複數之探針墊82。The ASIC chip 80 includes an ASIC (specific logic circuit) not shown, a plurality of microbumps 81 connected to the wiring in the ASIC wafer 80 and the wiring of the interposer 1 and arranged at a minimum pitch of 100 μm or less, and a complex number. Pin cushion 82.

圖2係圖1之I-I間之剖面圖。在中介層1之上面(與記憶體晶片10、ASIC晶片80相對之面),形成有包含金屬膜3及阻障金屬膜4之金屬佈線圖案5。Figure 2 is a cross-sectional view taken along line I-I of Figure 1. On the upper surface of the interposer 1 (the surface facing the memory chip 10 and the ASIC wafer 80), a metal wiring pattern 5 including the metal film 3 and the barrier metal film 4 is formed.

另一方面,在記憶體晶片10及ASIC晶片80之下面(與中介層1相對之面),分別形成有金屬佈線圖案13及83。記憶體晶片10之金屬佈線圖案13,經由微凸塊11連接於中介層1之金屬佈線圖案3。ASIC晶片80之金屬佈線圖案83,經由微凸塊81連接於中介層(interposer)1之金屬佈線圖案3。如此,記憶體晶片10及ASIC晶片80,分別經由微凸塊11、81 倒裝地安裝於中介層1上。On the other hand, metal wiring patterns 13 and 83 are formed on the lower surface of the memory wafer 10 and the ASIC wafer 80 (the surface facing the interposer 1). The metal wiring pattern 13 of the memory wafer 10 is connected to the metal wiring pattern 3 of the interposer 1 via the micro bumps 11. The metal wiring pattern 83 of the ASIC wafer 80 is connected to the metal wiring pattern 3 of the interposer 1 via the micro bumps 81. Thus, the memory chip 10 and the ASIC chip 80 are respectively via the micro bumps 11 and 81. Mounted on the interposer 1 in a flip-chip manner.

圖3係顯示記憶體晶片10之構成之方塊圖。記憶體晶片10包含:選擇電路14,其選擇微凸塊11及探針墊12中所輸入之信號之任一者輸出;記憶體電路20,其包含DRAM21;及選擇電路15,其將由記憶體電路20所供給之信號之輸出目的地切換為微凸塊11或探針墊12。FIG. 3 is a block diagram showing the configuration of the memory chip 10. The memory chip 10 includes: a selection circuit 14 that selects one of the signals input from the microbumps 11 and the probe pads 12; a memory circuit 20 that includes the DRAM 21; and a selection circuit 15 that will be used by the memory The output destination of the signal supplied from the circuit 20 is switched to the microbump 11 or the probe pad 12.

選擇電路14,於測試啟動信號TEN為L位準時選擇向微凸塊11輸入之信號,測試啟動信號TEN為H位準時選擇向探針墊12輸入之測試信號。並且,圖3所示之A區域之選擇電路14連接於1個微凸塊11,B區域之選擇電路14連接於複數之微凸塊11。The selection circuit 14 selects the signal input to the microbump 11 when the test enable signal TEN is at the L level, and selects the test signal input to the probe pad 12 when the test enable signal TEN is at the H level. Further, the selection circuit 14 of the A region shown in FIG. 3 is connected to one microbump 11, and the selection circuit 14 of the B region is connected to the plurality of microbumps 11.

選擇電路15,於測試啟動信號TEN為L位準時選擇微凸塊11作為信號之輸出目的地,測試啟動信號TEN為H位準時選擇探針墊12作為信號之輸出目的地。並且,圖3所示之C區域之選擇電路15連接於1個微凸塊11,D區域之選擇電路15連接於複數之微凸塊11。The selection circuit 15 selects the microbump 11 as the output destination of the signal when the test enable signal TEN is at the L level, and selects the probe pad 12 as the output destination of the signal when the test enable signal TEN is at the H level. Further, the selection circuit 15 of the C area shown in FIG. 3 is connected to one microbump 11, and the selection circuit 15 of the D area is connected to the plurality of microbumps 11.

[輸入側之構成例1:平行模式][Configuration Example 1 of Input Side: Parallel Mode]

圖4係顯示記憶體晶片10之輸入側之構成圖。記憶體晶片10包含:鎖存電路22A~22N,其係鎖存經由微凸塊11Ain ~11Nin 所輸入之信號者;鎖存電路22X,其係鎖存經由微凸塊11SDATA 所輸入之測試信號者;緩衝電路23,其係緩衝測試啟動信號TEN者;選擇器24A,其係選擇測試信號者;選擇器27A~27N,其係選擇經由微凸塊11所輸入之信號或測試信號者;及緩衝電路28A~28N。4 is a view showing the configuration of the input side of the memory chip 10. 10 memory chips comprising: latch circuits 22A ~ 22N, which via the micro-bump line 11A in the latch signal inputted by the ~ 11N in; a latch circuit 22X, which latches the input lines via the micro bumps 11 SDATA Test signal; buffer circuit 23, which buffers test enable signal TEN; selector 24A, which selects test signal; selectors 27A-27N, which select signals or test signals input via microbumps 11 And buffer circuits 28A~28N.

鎖存電路22A~22N、22X及緩衝電路23,由未圖示之第1電源電路供給電壓VDDQ。另外,選擇器24A、27A~27N及緩衝電路28A~28N,由未圖示之第2電源電路供給電壓VDD。此處,選擇器24A及27A~27N係相同之構成,故以選擇器24A為例說明其構成。The latch circuits 22A to 22N and 22X and the buffer circuit 23 are supplied with a voltage VDDQ from a first power supply circuit (not shown). Further, the selectors 24A, 27A to 27N and the buffer circuits 28A to 28N are supplied with a voltage VDD from a second power supply circuit (not shown). Here, since the selectors 24A and 27A to 27N have the same configuration, the configuration of the selector 24A will be described as an example.

圖5係顯示選擇器24A之構成之邏輯電路。圖6係顯示選擇器24A之輸入輸出之真值表。選擇器24A,包含3個NAND電路31、32、34及NOT電路33。Fig. 5 is a logic circuit showing the configuration of the selector 24A. Fig. 6 is a table showing the truth value of the input and output of the selector 24A. The selector 24A includes three NAND circuits 31, 32, 34 and a NOT circuit 33.

NAND電路32,演算輸入B端子及S端子之二值資料之NAND(否定積)後,輸出二值資料N2。否定電路33則演算輸入S端子之二值資料之NOT(否定)後,輸出二值資料SB。The NAND circuit 32 calculates the NAND (negative product) of the binary data of the input B terminal and the S terminal, and outputs the binary data N2. The negative circuit 33 calculates the NOT (negative) of the binary data of the input S terminal, and outputs the binary data SB.

NAND電路31,演算輸入A端子之二值資料與二值資料SB之NAND,輸出二值資料N1。NAND電路34,演算二值資料N1及N2之NAND後,從Y端子輸出二值資料。因此,選擇器24A,如圖6所示,輸入S端子之二值資料為L時,將輸入A端子之二值資料原樣輸出;輸入S端子之二值資料為H時,將輸入B端子之二值資料原樣輸出。The NAND circuit 31 calculates the binary data of the input A terminal and the NAND of the binary data SB, and outputs the binary data N1. The NAND circuit 34 calculates the NAND of the binary data N1 and N2, and outputs the binary data from the Y terminal. Therefore, the selector 24A, as shown in FIG. 6, when the binary data of the input S terminal is L, the binary data of the input A terminal is output as it is; when the binary data of the input S terminal is H, the input B terminal is input. The binary data is output as it is.

(通常模式)(normal mode)

在如上構成之記憶體晶片10中,未向微凸塊11TEN-in 、探針墊12TEN-in 中之任一者輸入測試啟動信號TEN之情形時(測試啟動信號TEN為L位準之情形),選擇器24A、27A~27N成為將輸入A端子之信號從Y端子原樣輸出之狀態。因此,輸入各微凸塊11Ain ~11Nin 之信號,經由鎖存電 路22A~22N、選擇器27A~27N、緩衝電路28A~28N,供給於DRAM21之各端子。In the memory wafer 10 configured as above, when the test enable signal TEN is not input to any of the micro bump 11 TEN-in and the probe pad 12 TEN-in (the test enable signal TEN is L level) In other words, the selectors 24A and 27A to 27N are in a state in which the signal input to the A terminal is output as it is from the Y terminal. Therefore, inputs to the micro bumps 11A in ~ 11N in the signal, the latch circuit 22A ~ 22N, selectors 27A ~ 27N, the buffer circuits 28A ~ 28N, supplied to the respective terminals through the DRAM21.

(測試模式)(test mode)

測試模式中,使探針觸及探針墊12TEN-in ,向探針墊12TEN-in 輸入H位準之測試啟動信號TEN。此時,選擇器24A、27A~27N成為將輸入B端子之信號從Y端子原樣輸出之狀態。In the test mode, the probe is brought into contact with the probe pad 12 TEN-in , and the test start signal TEN of the H level is input to the probe pad 12 TEN-in . At this time, the selectors 24A and 27A to 27N are in a state in which the signal of the input B terminal is output as it is from the Y terminal.

然後,若向探針墊12SDATA-in 輸入來自探針之測試信號,則該測試信號經由選擇器24A向各選擇器27A~27N平行分配,並經由各自之緩衝電路28A~28N輸入至DRAM21之各端子。Then, when a test signal from the probe is input to the probe pad 12 SDATA-in , the test signal is distributed in parallel to each of the selectors 27A to 27N via the selector 24A, and is input to the DRAM 21 via the respective buffer circuits 28A to 28N. Each terminal.

因此,記憶體晶片10平行分配測試信號後,向連接於微凸塊11Ain ~11Bin 之佈線供給各測試信號。因此,記憶體晶片10可使輸入到單一探針墊12SDATA-in 之測試信號,同時輸入至DRAM21之各端子。Therefore, after the memory chips 10 are distributed in parallel with the test signals, the test signals are supplied to the wirings connected to the microbumps 11A in to 11B in . Therefore, the memory chip 10 can simultaneously input the test signals input to the single probe pad 12 SDATA-in to the respective terminals of the DRAM 21.

[輸出側之構成例1:平行模式][Configuration Example 1 of Output Side: Parallel Mode]

圖7係顯示記憶體晶片10之輸出側之構成圖。記憶體晶片10包含:緩衝電路61A~61N,其係緩衝從DRAM21之各端子所輸出之信號者;演算電路62,其係根據從各緩衝電路61A~61N所輸出之信號進行特定之演算者;緩衝電路65A~65N,其係緩衝從各緩衝電路61A~61N所輸出之信號者;及緩衝電路65X,其係緩衝從演算電路62所輸出之信號者。Fig. 7 is a view showing the configuration of the output side of the memory chip 10. The memory chip 10 includes buffer circuits 61A to 61N for buffering signals output from respective terminals of the DRAM 21, and an arithmetic circuit 62 for performing specific calculation based on signals output from the respective buffer circuits 61A to 61N; The buffer circuits 65A to 65N buffer the signals output from the buffer circuits 61A to 61N, and the buffer circuit 65X buffer the signals output from the calculation circuit 62.

演算電路62,其係根據從緩衝電路61A~61N所輸出之信 號檢查記憶體晶片10內之電路,例如AND電路、OR電路、XOR(排他性邏輯和)電路等,不作特別限定。The calculation circuit 62 is based on the letters output from the buffer circuits 61A to 61N. The circuit in the memory chip 10 is inspected, for example, an AND circuit, an OR circuit, an XOR (exclusive logic sum) circuit, and the like, and is not particularly limited.

(通常模式)(normal mode)

在如上所構成之記憶體晶片10中,未向微凸塊11TEN-out 、探針墊12TEN-out 中之任一者輸入測試啟動信號TEN之情形時(測試啟動信號TEN為L位準之情形),從DRAM21之各端子所輸出之信號,經由緩衝電路61A~61N、微凸塊11Aout ~11Nout 輸出至中介層1。In the memory wafer 10 constructed as above, when the test enable signal TEN is not input to any of the microbump 11 TEN-out and the probe pad 12 TEN-out (the test enable signal TEN is the L level) In other cases, the signals output from the respective terminals of the DRAM 21 are output to the interposer 1 via the buffer circuits 61A to 61N and the microbumps 11A out to 11N out .

(測試模式)(test mode)

若在輸入側執行測試,則從DRAM21之各端子輸出反映測試信號之信號。此等信號經由各自之緩衝電路61A~61N供給於演算電路62。演算電路62根據由緩衝電路61A~61N所供給之信號進行特定之演算後,將該演算結果經由緩衝電路65X、探針墊12CK1-out (或微凸塊11CK1-out )輸出。When the test is performed on the input side, a signal reflecting the test signal is output from each terminal of the DRAM 21. These signals are supplied to the arithmetic circuit 62 via the respective buffer circuits 61A to 61N. The calculation circuit 62 performs a specific calculation based on the signals supplied from the buffer circuits 61A to 61N, and then outputs the calculation result via the buffer circuit 65X and the probe pad 12 CK1-out (or the microbumps 11 CK1-out ).

因此,記憶體晶片10,僅使探針觸及探針墊12CK1-OUT ,檢查從探針墊12CK1-OUT 所輸出之信號,即可檢查內藏有具有非常多之端子之DRAM21之記憶體晶片10之狀態。Therefore, in the memory chip 10, only the probe is touched to the probe pad 12 CK1-OUT , and the signal output from the probe pad 12 CK1-OUT is checked, and the memory of the DRAM 21 having a very large number of terminals can be inspected. The state of the wafer 10.

[第2實施形態][Second Embodiment]

其次,對本發明之第2實施形態進行說明。並且,對與第1實施形態相同之電路賦予相同符號,主要對與第1實施形態不同之電路進行說明。第2實施形態中,對記憶體晶片10之輸入側及輸出側之其他構成例進行說明。Next, a second embodiment of the present invention will be described. The same reference numerals are given to the same circuits as those of the first embodiment, and a circuit different from the first embodiment will be mainly described. In the second embodiment, another configuration example of the input side and the output side of the memory chip 10 will be described.

[輸入側之構成例2:串列模式][Configuration Example 2 of Input Side: Tandem Mode]

圖8係顯示記憶體晶片10之輸入側之構成圖。記憶體晶 片10在圖4所示之構成上,進一步包含:鎖存電路22Y,其係鎖存經由微凸塊11SCLK-in 所輸入之時脈者;選擇器24B,其係選擇輸入至微凸塊11SCLK-in 之時脈、及輸入至探針墊12SCLK-in 之時脈中之任一者;及正反器電路25A~25N,其係使選擇之測試信號各延遲1個時脈者。FIG. 8 is a view showing the configuration of the input side of the memory chip 10. The memory chip 10 further includes a latch circuit 22Y that latches a clock input via the microbump 11 SCLK-in , and a selector 24B that selects an input to the micro. Any one of the clock of the bump 11 SCLK-in and the clock input to the probe pad 12 SCLK-in ; and the flip-flop circuits 25A-25N, which delay each of the selected test signals by one Pulse.

正反器電路25A~25N串聯連接,且與從選擇器24B所供給之時脈同步。然後,正反器電路25B~25N與該時脈同步後,向選擇器27B~27N供給測試信號,與此同時向下段之正反器電路供給該測試信號。此外,因為正反器電路25A無下段之正反器電路,故與時脈同步後向選擇器27A供給測試信號。The flip-flop circuits 25A to 25N are connected in series and synchronized with the clock supplied from the selector 24B. Then, after the flip-flop circuits 25B to 25N are synchronized with the clock, the test signals are supplied to the selectors 27B to 27N, and at the same time, the test signals are supplied to the flip-flop circuits of the lower stage. Further, since the flip-flop circuit 25A has no flip-flop circuit of the lower stage, the test signal is supplied to the selector 27A in synchronization with the clock.

(通常模式)(normal mode)

如上構成之記憶體晶片10中,未向微凸塊11TEN-in 、探針墊12TEN-in 中之任一者輸入測試啟動信號TEN之情形時(測試啟動信號TEN為L位準之情形),選擇器24A、24B、27A~27N,成為將輸入A端子之信號從Y端子原樣輸出之狀態。因此,輸入各微凸塊11之信號經由鎖存電路22A~22N、選擇器27A~27N、緩衝電路28A~28N,供給於DRAM21之各端子。In the memory wafer 10 configured as above, when the test enable signal TEN is not input to any of the microbump 11 TEN-in and the probe pad 12 TEN-in (the test enable signal TEN is at the L level) The selectors 24A, 24B, and 27A to 27N are in a state in which the signal input to the A terminal is output as it is from the Y terminal. Therefore, the signals input to the respective microbumps 11 are supplied to the respective terminals of the DRAM 21 via the latch circuits 22A to 22N, the selectors 27A to 27N, and the buffer circuits 28A to 28N.

(測試模式)(test mode)

測試模式中,使探針觸及探針墊12TEN-in ,向探針墊12TEN-in 輸入H位準之測試啟動信號TEN。此時,選擇器24A、27A~27N,成為將輸入B端子之信號從Y端子原樣輸出之狀態。In the test mode, the probe is brought into contact with the probe pad 12 TEN-in , and the test start signal TEN of the H level is input to the probe pad 12 TEN-in . At this time, the selectors 24A and 27A to 27N are in a state in which the signal input to the B terminal is output as it is from the Y terminal.

然後,若向探針墊12SDATA-in 輸入來自探針之測試信號,則選擇器24A向正反器電路25N供給測試信號。Then, when a test signal from the probe is input to the probe pad 12 SDATA-in , the selector 24A supplies a test signal to the flip-flop circuit 25N.

正反器電路25N,與經由微凸塊11SCLK-in 、鎖存電路22Y、選擇器24B所供給之時脈同步後,向選擇器27N供給從選擇器24A所供給之測試信號,同時向下段之正反器電路供給該測試信號。同樣,正反器電路25B,與經由微凸塊11SCLK-in 、鎖存電路22Y、選擇器24B所供給之時脈同步後,向選擇器27B供給從前段之正反器電路所供給之測試信號,同時向下段之正反器電路25A供給該測試信號。The flip-flop circuit 25N is synchronized with the clock supplied from the microbump 11 SCLK-in , the latch circuit 22Y, and the selector 24B, and then supplies the test signal supplied from the selector 24A to the selector 27N while being down to the next stage. The flip-flop circuit supplies the test signal. Similarly, the flip-flop circuit 25B is supplied with the test supplied from the front-end flip-flop circuit to the selector 27B in synchronization with the clock supplied from the microbump 11 SCLK-in , the latch circuit 22Y, and the selector 24B. The signal is supplied to the down-segment flip-flop circuit 25A.

其結果,向選擇器27A~27N供給分別延遲各1個時脈之測試信號。此等之測試信號,經由選擇器27A~27N、緩衝電路28A~28N向DRAM21供給。As a result, test signals for delaying each of the respective clocks are supplied to the selectors 27A to 27N. These test signals are supplied to the DRAM 21 via the selectors 27A to 27N and the buffer circuits 28A to 28N.

如上所述,記憶體晶片10,若於探針墊12SDATA-in 輸入測試信號,則將測試信號各錯開1個時脈後,將各錯開1個時脈之測試信號供給至連接於微凸塊11Ain ~11Bin 之各佈線。藉此,記憶體晶片10,藉由僅向單一之探針墊12SDATA-in 輸入測試信號,即可向複數之佈線供給各錯開1個時脈之測試信號。As described above, when the memory chip 10 inputs a test signal to the probe pad 12 SDATA-in , the test signals are shifted by one clock, and the test signals each shifted by one clock are supplied to the micro-convex. Each of the blocks 11A in ~11B in is wired. Thereby, the memory chip 10 can supply a test signal shifted by one clock to a plurality of wirings by inputting a test signal only to the single probe pad 12 SDATA-in .

[輸入側之構成例3:平行/串列並用模式][Configuration Example 3 on the input side: parallel/serial combination mode]

圖9係顯示記憶體晶片10之輸入側之構成圖。記憶體晶片10在圖8所示之構成上,進一步包含:鎖存電路22Z,其係鎖存經由微凸塊11SMODE-in 所輸入之模式信號者;選擇器24C,其係選擇輸入至微凸塊11SMODE-in 之模式信號、及輸入至探針墊12SMODE-in 之模式信號中之任一者;及選擇器 26A~26N,其係根據模式信號切換應輸出之信號者。FIG. 9 is a view showing the configuration of the input side of the memory chip 10. The memory chip 10 further includes a latch circuit 22Z that latches a mode signal input via the microbump 11 SMODE-in , and a selector 24C that selects an input to the micro. The mode signal of the bump 11 SMODE-in and the mode signal input to the probe pad 12 SMODE-in ; and the selectors 26A-26N switch the signal to be output according to the mode signal.

所謂模式信號,係決定向各佈線平行分配測試信號(平行模式),或向各佈線串列分配各錯開1個時脈之測試信號(串列模式)之信號。例如,模式信號為L位準時成為平行模式,模式信號為H位準時成為串列模式。In the mode signal, it is determined that a test signal (parallel mode) is distributed in parallel to each of the wires, or a signal of a test signal (serial mode) in which one clock is shifted by one is assigned to each of the wiring strings. For example, when the mode signal is L-level, it becomes a parallel mode, and when the mode signal is H-bit, it becomes a serial mode.

選擇器26A~26N之A端子,均連接於選擇器24B之Y端子。選擇器26A~26N之B端子,連接於正反器電路25A~25N之輸出端子。選擇器26A~26N之S端子,連接於選擇器24C之Y端子。The A terminals of the selectors 26A to 26N are connected to the Y terminal of the selector 24B. The B terminals of the selectors 26A to 26N are connected to the output terminals of the flip-flop circuits 25A to 25N. The S terminals of the selectors 26A to 26N are connected to the Y terminal of the selector 24C.

(通常模式)(normal mode)

如上構成之記憶體晶片10中,在未向微凸塊11TEN-in 、探針墊12TEN-in 中之任一者輸入測試啟動信號TEN時(測試啟動信號TEN為L位準時),選擇器24A~24C、27A~27N,成為將輸入A端子之信號從Y端子原樣輸出之狀態。因此,輸入各微凸塊11Ain ~11Nin 之信號,經由鎖存電路22A~22N、選擇器27A~27N、緩衝電路28A~28N供給於DRAM21之各端子。In the memory wafer 10 configured as above, when the test enable signal TEN is not input to any of the microbump 11 TEN-in and the probe pad 12 TEN-in (when the test enable signal TEN is at the L level), the selection is made. The devices 24A to 24C and 27A to 27N are in a state in which the signal input to the A terminal is output as it is from the Y terminal. Therefore, inputs to the micro bumps 11A in ~ 11N in the signal, the latch circuit 22A ~ 22N, selectors 27A ~ 27N, the buffer circuits 28A ~ 28N supplied to the respective terminals through the DRAM21.

(測試模式)(test mode)

測試模式中,使探針觸及探針墊12TEN-in ,向探針墊12TEN-in 輸入H位準之測試啟動信號TEN。此時,選擇器24A~24C、27A~27N,成為將輸入B端子之信號從Y端子原樣輸出之狀態。另外,選擇器24C向選擇器26A~26N之各S端子供給輸入至探針墊12SMODE之模式信號。In the test mode, the probe is brought into contact with the probe pad 12 TEN-in , and the test start signal TEN of the H level is input to the probe pad 12 TEN-in . At this time, the selectors 24A to 24C and 27A to 27N are in a state in which the signal input to the B terminal is output as it is from the Y terminal. Further, the selector 24C supplies a mode signal input to the probe pad 12SMODE to each of the S terminals of the selectors 26A to 26N.

此處,模式信號為L位準時,選擇器26A~26N成為將輸 入A端子之信號分別向選擇器27A~27N輸出之狀態。而且,若向探針墊12SDATA-in 輸入來自探針之測試信號,則該測試信號經由選擇器24A平行分配於各選擇器27A~27N,並經由各緩衝電路28A~28N輸入DRAM21之各端子。Here, when the mode signal is at the L level, the selectors 26A to 26N are in a state in which the signals input to the A terminal are output to the selectors 27A to 27N, respectively. Further, when a test signal from the probe is input to the probe pad 12 SDATA-in , the test signal is distributed in parallel to each of the selectors 27A to 27N via the selector 24A, and is input to each terminal of the DRAM 21 via each of the buffer circuits 28A to 28N. .

另一方面,模式信號為L位準時,選擇器26A~26N成為將輸入B端子之信號分別向選擇器27A~27N輸出之狀態。而且,若向探針墊12SDATA-in 輸入來自探針之測試信號,則選擇器24A向正反器電路25N供給測試信號。On the other hand, when the mode signal is at the L level, the selectors 26A to 26N are in a state in which the signals of the input B terminal are output to the selectors 27A to 27N, respectively. Further, when a test signal from the probe is input to the probe pad 12 SDATA-in , the selector 24A supplies a test signal to the flip-flop circuit 25N.

正反器電路25N,與經由微凸塊11SCLK-in 、鎖存電路22Y、選擇器24B所供給之時脈同步後,向選擇器27N供給從選擇器24A所供給之測試信號,且向下段之正反器電路供給該測試信號。同樣,正反器電路25B,與經由微凸塊11SCLK-in 、鎖存電路22Y、選擇器24B所供給之時脈同步後,向選擇器27B供給由前段之正反器電路所供給之測試信號,且向下段之正反器電路25A供給該測試信號。The flip-flop circuit 25N is synchronized with the clock supplied from the microbump 11 SCLK-in , the latch circuit 22Y, and the selector 24B, and then supplies the test signal supplied from the selector 24A to the selector 27N, and the next stage The flip-flop circuit supplies the test signal. Similarly, the flip-flop circuit 25B is synchronized with the clock supplied from the microbump 11 SCLK-in , the latch circuit 22Y, and the selector 24B, and then supplied to the selector 27B by the test supplied from the front-end flip-flop circuit. The signal is supplied to the flip-flop circuit 25A of the lower stage.

其結果,於選擇器27A~27N分別被供給各延遲1個時脈之測試信號。此等之測試信號,經由選擇器27A~27N、緩衝電路28A~28N朝DRAM21供給。As a result, test signals each delayed by one clock are supplied to the selectors 27A to 27N, respectively. These test signals are supplied to the DRAM 21 via the selectors 27A to 27N and the buffer circuits 28A to 28N.

如上所述,記憶體晶片10,可以向連接於各微凸塊11Ain ~11Nin 之各佈線,根據模式信號供給平行分配之測試信號,或供給串列分配之測試信號。As described above, the memory chip 10, to each micro-block 11A can be connected to each wiring in the ~ 11N in accordance with the test signal is supplied in parallel allocated test mode signal, or a signal supplied to the serial dispensing.

[輸出側之構成例2:串列模式][Configuration Example 2 of Output Side: Tandem Mode]

圖10係顯示記憶體晶片10之輸出側之構成圖。記憶體晶 片10包含分別鎖存特定信號之鎖存電路51A、51B、緩衝測試啟動信號TEN之緩衝電路52、及選擇器53A、53B。FIG. 10 is a view showing the configuration of the output side of the memory chip 10. Memory crystal The slice 10 includes latch circuits 51A and 51B for latching specific signals, a buffer circuit 52 for buffering the test enable signal TEN, and selectors 53A and 53B.

鎖存電路51A,鎖存經由微凸塊11SCLK-out 所輸入之時脈後,向選擇器53A之A端子供給該時脈。鎖存電路51B,鎖存經由微凸塊11SMODE-out 所輸入之模式信號後,向選擇器53B之A端子供給該模式信號。緩衝電路52在緩衝輸入於微凸塊11TEN-out 或探針墊12TEN-out 之測試啟動信號TEN後,將該測試啟動信號TEN向選擇器53A、53B之S端子供給。The latch circuit 51A latches the clock input via the microbump 11 SCLK-out , and supplies the clock to the A terminal of the selector 53A. The latch circuit 51B latches the mode signal input via the microbump 11 SMODE-out , and supplies the mode signal to the A terminal of the selector 53B. The buffer circuit 52 supplies the test enable signal TEN to the S terminal of the selectors 53A, 53B after buffering the test enable signal TEN input to the microbump 11 TEN-out or the probe pad 12 TEN-out .

選擇器53A,向正反器電路64A~64N分別供給輸入至A端子或B端子之時脈。選擇器53B,向選擇器63B~64N分別供給輸入至A端子或B端子之模式信號。The selector 53A supplies the clocks input to the A terminal or the B terminal to the flip flop circuits 64A to 64N, respectively. The selector 53B supplies a mode signal input to the A terminal or the B terminal to the selectors 63B to 64N, respectively.

再者,記憶體晶片10包含:緩衝從DRAM21之各端子所輸出之信號之緩衝電路61A~61N;選擇器63B~63N;正反器電路64A~64N;緩衝從各緩衝電路61A~61N所輸出之信號之緩衝電路65A~65N;及緩衝從正反器電路64N所輸出之信號之緩衝電路65Y。Further, the memory chip 10 includes buffer circuits 61A to 61N that buffer signals output from the respective terminals of the DRAM 21, selectors 63B to 63N, and flip-flop circuits 64A to 64N; and buffers are output from the respective buffer circuits 61A to 61N. The signal buffer circuits 65A to 65N; and the buffer circuit 65Y that buffers the signal output from the flip-flop circuit 64N.

選擇器63B之A端子連接於緩衝電路61B,其B端子連接於正反器電路64A之輸出端子,其Y端子連接於正反器電路64B之輸入端子。並且,正反器電路64A之輸入端子連接於緩衝電路61A。The A terminal of the selector 63B is connected to the snubber circuit 61B, the B terminal thereof is connected to the output terminal of the flip flop circuit 64A, and the Y terminal thereof is connected to the input terminal of the flip flop circuit 64B. Further, the input terminal of the flip-flop circuit 64A is connected to the buffer circuit 61A.

同樣,選擇器63N之A端子連接於緩衝電路61N,其B端子連接於正反器電路64N之前段之正反器電路之輸出端子,其Y端子連接於正反器電路64N之輸入端子。並且,正反器電路64A之輸入端子連接於緩衝電路61A。Similarly, the A terminal of the selector 63N is connected to the buffer circuit 61N, the B terminal thereof is connected to the output terminal of the flip-flop circuit of the previous stage of the flip-flop circuit 64N, and the Y terminal thereof is connected to the input terminal of the flip-flop circuit 64N. Further, the input terminal of the flip-flop circuit 64A is connected to the buffer circuit 61A.

藉此,正反器電路64A~64N經由選擇器63B~61N串聯連接。因此,正反器電路64A~64N作為將從緩衝電路61A所輸出之信號各移位1個時脈後,經由緩衝電路65Y、探針墊12CK1-out (或微凸塊11CK1-out )輸出之移位暫存器而起作用(第1~4移位暫存器)。Thereby, the flip-flop circuits 64A to 64N are connected in series via the selectors 63B to 61N. Therefore, the flip-flop circuits 64A to 64N are shifted by one clock from the buffer circuit 61A, and then passed through the buffer circuit 65Y, the probe pad 12 CK1-out (or the microbump 11 CK1-out ). The output shift register functions (1st to 4th shift registers).

(通常模式)(normal mode)

如上構成之記憶體晶片10中,在未向微凸塊11TEN-out 、探針墊12TEN-out 中之任一者輸入測試啟動信號TEN時(測試啟動信號TEN為L位準時),從DRAM21之各端子所輸出之信號經由緩衝電路61A~61N、微凸塊11Aout ~11Nout ,向中介層1輸出。In the memory wafer 10 configured as above, when the test enable signal TEN is not input to any of the microbump 11 TEN-out and the probe pad 12 TEN-out (when the test enable signal TEN is at the L level), The signals output from the respective terminals of the DRAM 21 are output to the interposer 1 via the buffer circuits 61A to 61N and the microbumps 11A out to 11N out .

(測試模式)(test mode)

測試模式中,使探針觸及探針墊12TEN-out ,向探針墊12TEN-out 輸入H位準之測試啟動信號TEN。另外,從DRAM21之各端子輸出反映測試信號之信號。In the test mode, the probe is brought into contact with the probe pad 12 TEN-out , and the test start signal TEN of the H level is input to the probe pad 12 TEN-out . Further, a signal reflecting the test signal is output from each terminal of the DRAM 21.

此時,選擇器53A成為將輸入B端子之時脈從Y端子原樣輸出之狀態。選擇器53B成為將輸入B端子之模式信號從Y端子原樣輸出之狀態。At this time, the selector 53A is in a state in which the clock of the input B terminal is output as it is from the Y terminal. The selector 53B is in a state in which the mode signal of the input B terminal is output as it is from the Y terminal.

此處,模式信號為L位準時,選擇器63B~63N輸出向A端子輸入之信號。因此,在正反器電路64A~64N保持有從緩衝電路61A~61N所輸出之信號。其次,若模式信號成為H位準,則正反器電路64A~64N作為移位暫存器而起作用(第1~4移位暫存器)。因此,保持於正反器電路64A~64N之信號,與時脈同步後經由緩衝電路65Y、探針墊12CK2-out 輸 出。Here, when the mode signal is at the L level, the selectors 63B to 63N output signals input to the A terminal. Therefore, the signals output from the buffer circuits 61A to 61N are held in the flip-flop circuits 64A to 64N. Next, when the mode signal is at the H level, the flip-flop circuits 64A to 64N function as shift registers (first to fourth shift registers). Therefore, the signals held by the flip-flop circuits 64A to 64N are synchronized with the clock and output via the buffer circuit 65Y and the probe pad 12 CK2-out .

如上所述,記憶體晶片10係將從緩衝電路61A~61N所輸出之信號轉換為串列後,經由探針墊12CK2-out 輸出。藉此,僅藉由檢查從探針墊12CK2-out 所輸出之信號,即可容易地檢查具有非常多之端子之DRAM21之狀態。As described above, the memory chip 10 converts the signals output from the buffer circuits 61A to 61N into a series, and outputs them via the probe pads 12 CK2-out . Thereby, the state of the DRAM 21 having a very large number of terminals can be easily inspected only by checking the signal output from the probe pad 12 CK2-out .

[輸出側之構成例2:平行/串列並用模式][Configuration Example 2 of Output Side: Parallel/Parallel Combination Mode]

圖11係顯示記憶體晶片10之輸出側之構成圖。圖11所示之記憶體晶片10係組合圖7及圖10所示之構成者。因此,記憶體晶片10,僅藉由檢查探針墊12CK1-OUT 或從12CK1-OUT 所輸出之信號,即可檢查內藏有具有非常多之端子之DRAM21之記憶體晶片10之狀態。Fig. 11 is a view showing the configuration of the output side of the memory chip 10. The memory chip 10 shown in Fig. 11 is a combination of the components shown in Figs. 7 and 10 . Therefore, the memory chip 10 can check the state of the memory chip 10 in which the DRAM 21 having a very large number of terminals is housed only by inspecting the signal output from the probe pad 12 CK1-OUT or from 12 CK1-OUT .

並且,在第1及第2實施形態中,顯示有記憶體晶片10之輸入側及輸出側之各種構成,但輸入側之構成與輸出側之構成可任意地組合。例如,亦可在輸入側使用構成例1,在輸出側使用構成例2或3。再者,ASIC晶片80之輸入側及輸出側之構成,亦可與第1及第2實施形態同樣設定。Further, in the first and second embodiments, various configurations of the input side and the output side of the memory chip 10 are shown, but the configuration of the input side and the configuration of the output side can be arbitrarily combined. For example, configuration example 1 may be used on the input side, and configuration example 2 or 3 may be used on the output side. Further, the configuration of the input side and the output side of the ASIC chip 80 can be set in the same manner as in the first and second embodiments.

[第3實施形態][Third embodiment]

圖12係顯示本發明之第3實施形態之半導體積體電路之構成圖。半導體積體電路包含中介層100、安裝於中介層100之ASIC晶片200(第1半導體晶片)、及記憶體晶片300(第2半導體晶片)。Fig. 12 is a block diagram showing a semiconductor integrated circuit according to a third embodiment of the present invention. The semiconductor integrated circuit includes an interposer 100, an ASIC wafer 200 (first semiconductor wafer) mounted on the interposer 100, and a memory wafer 300 (second semiconductor wafer).

中介層(interposer)100之各佈線,經由微凸塊101~114連接於ASIC晶片200之各佈線。中介層100之各佈線經由微凸塊121~127連接於記憶體晶片300之各佈線。The wirings of the interposer 100 are connected to the respective wirings of the ASIC wafer 200 via the micro bumps 101 to 114. Each of the wirings of the interposer 100 is connected to each wiring of the memory chip 300 via the micro bumps 121 to 127.

ASIC晶片200包含:鎖存電路201~205、231、241;緩衝電路206~209、211、214、221、224、233、243、246;正反器電路212、222、235、245;及選擇器213、223、232、234、242、244。The ASIC chip 200 includes: latch circuits 201-205, 231, 241; buffer circuits 206-209, 211, 214, 221, 224, 233, 243, 246; flip-flop circuits 212, 222, 235, 245; 213, 223, 232, 234, 242, 244.

記憶體晶片300包含:鎖存電路301~305;選擇器310、320、343、353;緩衝電路311、321、342、344、352、354;及正反器電路312、333、341、351。The memory chip 300 includes latch circuits 301 to 305, selectors 310, 320, 343, and 353, buffer circuits 311, 321, 342, 344, 352, and 354, and flip-flop circuits 312, 333, 341, and 351.

此處,例如如選擇器213,其係具有A及B端子作為輸入端子、具有Y端子作為輸出端子之選擇器,並與圖5同樣地構成。另外,例如如選擇器232,其係具有A端子作為輸入端子、具有Y0及Y1端子作為輸出端子之選擇器,其構成如下。Here, for example, the selector 213 has a connector having an A and a B terminal as an input terminal and a Y terminal as an output terminal, and is configured in the same manner as in FIG. 5 . Further, for example, the selector 232 has a selector terminal 232 as an input terminal and a selector having Y0 and Y1 terminals as output terminals, and is configured as follows.

圖13係顯示選擇器232之構成之邏輯電路。圖14係顯示選擇器232之輸入輸出之真值表。選擇器232包含2個NAND電路35、36,及3個NOT電路37、38、39。FIG. 13 is a logic circuit showing the configuration of the selector 232. Fig. 14 is a table showing the truth value of the input and output of the selector 232. The selector 232 includes two NAND circuits 35, 36, and three NOT circuits 37, 38, 39.

NAND電路36演算輸入A端子及S端子之二值資料之NAND(否定積)後,輸出二值資料N2。否定電路37演算輸入S端子之二值資料之NOT(否定)後,輸出二值資料SR。The NAND circuit 36 calculates the NAND (negative product) of the binary data input to the A terminal and the S terminal, and outputs the binary data N2. The negative circuit 37 calculates the NOT (negative) of the binary data of the input S terminal, and outputs the binary data SR.

NAND電路35演算輸入A端子之二值資料及二值資料SB之NAND,並輸出二值資料N1。NOT電路38演算二值資料N1之NOT,並經由Y0端子輸出二值資料。NOT電路39演算二值資料N2之NOT後,經由Y1端子輸出二值資料。The NAND circuit 35 calculates the binary data of the input A terminal and the NAND of the binary data SB, and outputs the binary data N1. The NOT circuit 38 calculates the NOT of the binary data N1 and outputs the binary data via the Y0 terminal. The NOT circuit 39 calculates the NOT of the binary data N2 and outputs the binary data via the Y1 terminal.

藉此,選擇器232如圖14所示,輸入S端子之二值資料為L時,將輸入A端子之二值資料從Y0端子輸出;輸入S端子 之二值資料為H時,將輸入A端子之二值資料從Y1端子輸出。Thereby, the selector 232 is as shown in FIG. 14, when the binary data of the input S terminal is L, the binary data of the input A terminal is output from the Y0 terminal; the input S terminal When the binary data is H, the binary data input to the A terminal is output from the Y1 terminal.

另外,在圖12所示之中介層100側,微凸塊101(測試信號輸入微凸塊)係輸入測試信號之電極,其經由ASIC晶片200之鎖存電路201連接於正反器電路212之輸入端子。微凸塊102(第1時脈用微凸塊)係輸入邏輯(ASIC晶片200)用時脈之電極,其經由鎖存電路202連接於正反器電路212、222、235、245之時脈輸入端子。微凸塊103(第1模式信號用微凸塊)係輸入邏輯(ASIC晶片200)用模式信號之電極,其經由鎖存電路203連接於選擇器234、244之S端子。Further, on the interposer 100 side shown in FIG. 12, the microbump 101 (test signal input microbump) is an electrode for inputting a test signal, which is connected to the flip-flop circuit 212 via the latch circuit 201 of the ASIC wafer 200. Input terminal. The microbumps 102 (first bumps for the first clock) are electrodes for inputting logic (ASIC wafer 200), which are connected to the clocks of the flip-flop circuits 212, 222, 235, and 245 via the latch circuit 202. Input terminal. The microbump 103 (the first mode signal microbump) is an electrode for inputting a mode signal for the logic (ASIC wafer 200), and is connected to the S terminals of the selectors 234 and 244 via the latch circuit 203.

微凸塊104(第2時脈用微凸塊)係輸入記憶體用時脈之電極,其經由鎖存電路204、緩衝電路209、微凸塊109、123連接於記憶體晶片300。微凸塊105(第2模式信號用微凸塊)係輸入記憶體用模式信號之電極,其經由鎖存電路205、緩衝電路208、微凸塊108、122連接於記憶體晶片300。The microbumps 104 (second bump microbumps) are electrodes for inputting clocks for a memory, and are connected to the memory chip 300 via the latch circuit 204, the buffer circuit 209, and the micro bumps 109 and 123. The microbump 105 (the second mode signal microbump) is an electrode for inputting a mode signal for the memory, and is connected to the memory chip 300 via the latch circuit 205, the buffer circuit 208, and the micro bumps 108 and 122.

微凸塊106係輸入測試啟動信號TEN之電極,其經由緩衝電路206連接於選擇器213、223、232、242之各S端子。再者,微凸塊106,其經由緩衝電路206、207及微凸塊107、121連接於記憶體晶片300。The microbumps 106 are electrodes for inputting the test enable signal TEN, which are connected to the respective S terminals of the selectors 213, 223, 232, 242 via the buffer circuit 206. Furthermore, the microbumps 106 are connected to the memory chip 300 via the buffer circuits 206 and 207 and the micro bumps 107 and 121.

選擇器213之A端子連接於緩衝電路211,其B端子連接於正反器電路212之輸出端子。選擇器213之Y端子,經由緩衝電路214、微凸塊110(複數之第1輸出微凸塊)、124連接於記憶體晶片300。The A terminal of the selector 213 is connected to the buffer circuit 211, and the B terminal thereof is connected to the output terminal of the flip-flop circuit 212. The Y terminal of the selector 213 is connected to the memory chip 300 via the buffer circuit 214, the micro bumps 110 (the first output microbumps), and 124.

選擇器223之A端子連接於緩衝電路221,其B端子連接 於正反器電路222之輸出端子。並且,正反器電路222之輸入端子連接於正反器電路212之輸出端子。另外,選擇器223之Y端子,經由緩衝電路224、微凸塊111(第1輸出微凸塊)、125連接於記憶體晶片300。The A terminal of the selector 223 is connected to the buffer circuit 221, and the B terminal is connected. The output terminal of the flip-flop circuit 222. Further, the input terminal of the flip-flop circuit 222 is connected to the output terminal of the flip-flop circuit 212. Further, the Y terminal of the selector 223 is connected to the memory chip 300 via the buffer circuit 224, the micro bumps 111 (first output micro bumps), and 125.

選擇器232之A端子,經由鎖存電路231、微凸塊112(第1輸入微凸塊)、126連接於記憶體晶片300。選擇器232之Y0端子連接於緩衝電路233,其Y1端子連接於選擇器234之B端子。選擇器234之A端子連接於正反器電路222之輸出端子,其Y端子連接於正反器電路之輸入端子。The A terminal of the selector 232 is connected to the memory chip 300 via the latch circuit 231, the micro bumps 112 (first input microbumps) 126. The Y0 terminal of the selector 232 is connected to the buffer circuit 233, and its Y1 terminal is connected to the B terminal of the selector 234. The A terminal of the selector 234 is connected to the output terminal of the flip flop circuit 222, and the Y terminal thereof is connected to the input terminal of the flip flop circuit.

同樣,選擇器242之A端子,經由鎖存電路241、微凸塊113(第1輸入微凸塊)、127連接於記憶體晶片300。選擇器242之Y0端子連接於緩衝電路243,其Y1端子連接於選擇器244之B端子。選擇器244之A端子連接於前段之正反器電路之輸出端子,其Y端子連接於正反器電路245之輸入端子。正反器電路245之輸出端子,經由緩衝電路246連接於微凸塊114。Similarly, the A terminal of the selector 242 is connected to the memory chip 300 via the latch circuit 241, the micro bumps 113 (first input microbumps), and 127. The Y0 terminal of the selector 242 is connected to the buffer circuit 243, and its Y1 terminal is connected to the B terminal of the selector 244. The A terminal of the selector 244 is connected to the output terminal of the front-end flip-flop circuit, and the Y terminal is connected to the input terminal of the flip-flop circuit 245. The output terminal of the flip-flop circuit 245 is connected to the microbump 114 via the buffer circuit 246.

另一方面,在記,憶體晶片300側,微凸塊121經由鎖存電路301連接於選擇器310、320、343、353之各S端子。微凸塊122經由鎖存電路302連接於正反器電路312、333、341、351之各時脈輸入端子。微凸塊123經由鎖存電路303連接於選擇器322之S端子。On the other hand, on the side of the memory chip 300, the micro bumps 121 are connected to the respective S terminals of the selectors 310, 320, 343, and 353 via the latch circuit 301. The micro bumps 122 are connected to the respective clock input terminals of the flip-flop circuits 312, 333, 341, and 351 via the latch circuit 302. The microbump 123 is connected to the S terminal of the selector 322 via the latch circuit 303.

微凸塊124、125(複數之第2輸入微凸塊)分別經由鎖存電路304、305連接於選擇器310、320之各A端子。微凸塊126、127(複數之第2輸出微凸塊)分別經由緩衝電路344、 354連接於選擇器343、353之各Y端子。The micro bumps 124 and 125 (the second input microbumps of the plurality) are connected to the respective A terminals of the selectors 310 and 320 via the latch circuits 304 and 305, respectively. The micro bumps 126 and 127 (the second output microbumps of the plurality) are respectively passed through the buffer circuit 344, 354 is connected to each Y terminal of the selectors 343, 353.

選擇器310之Y0端子連接於緩衝電路311,其Y1端子連接於正反器電路312之輸入端子。正反器電路312之輸出端子連接於選擇器322之A端子。The Y0 terminal of the selector 310 is connected to the buffer circuit 311, and its Y1 terminal is connected to the input terminal of the flip-flop circuit 312. The output terminal of the flip-flop circuit 312 is connected to the A terminal of the selector 322.

選擇器320之Y0端子連接於緩衝電路321,其Y1端子連接於正反器電路322之輸入端子。正反器電路322之輸出端子連接於正反器電路333之輸入端子。The Y0 terminal of the selector 320 is connected to the buffer circuit 321, and its Y1 terminal is connected to the input terminal of the flip-flop circuit 322. The output terminal of the flip-flop circuit 322 is connected to the input terminal of the flip-flop circuit 333.

選擇器343之A端子連接於緩衝電路342,其B端子連接於正反器電路341之輸出端子。同樣,選擇器353之A端子連接於緩衝電路352,其B端子連接於正反器電路351之輸出端子。The A terminal of the selector 343 is connected to the buffer circuit 342, and the B terminal thereof is connected to the output terminal of the flip-flop circuit 341. Similarly, the A terminal of the selector 353 is connected to the buffer circuit 352, and the B terminal thereof is connected to the output terminal of the flip-flop circuit 351.

(通常模式)(normal mode)

如上構成之半導體積體電路中,在未向微凸塊106輸入測試啟動信號TEN時(測試啟動信號TEN為L位準時),ASIC晶片200之選擇器213、223成為將輸入A端子之信號從Y端子原樣輸出之狀態。另外,選擇器232、242成為將輸入A端子之信號從Y0端子輸出之狀態。同樣,ASIC晶片200之選擇器310、320成為將輸入A端子之信號從Y0端子輸出之狀態。另外,選擇器343、353成為將輸入A端子之信號從Y端子原樣輸出之狀態。In the semiconductor integrated circuit constructed as above, when the test enable signal TEN is not input to the microbump 106 (when the test enable signal TEN is at the L level), the selectors 213 and 223 of the ASIC wafer 200 become signals from the input A terminal. The state of the Y terminal as it is output. Further, the selectors 232 and 242 are in a state in which a signal input to the A terminal is output from the Y0 terminal. Similarly, the selectors 310 and 320 of the ASIC wafer 200 are in a state in which a signal input to the A terminal is output from the Y0 terminal. Further, the selectors 343 and 353 are in a state in which the signal input to the A terminal is output as it is from the Y terminal.

因此,ASIC晶片200之從未圖示之ASIC所輸出之信號,經由緩衝電路211、選擇器213、緩衝電路214、微凸塊110、124、鎖存電路304、選擇器310、緩衝電路311,供給於記憶體晶片300之未圖示之DRAM。Therefore, the signal output from the ASIC (not shown) of the ASIC chip 200 passes through the buffer circuit 211, the selector 213, the buffer circuit 214, the micro bumps 110, 124, the latch circuit 304, the selector 310, and the buffer circuit 311. A DRAM (not shown) that is supplied to the memory chip 300.

另外,從記憶體晶片300之DRAM所讀出之信號,經由緩衝電路342、選擇器343、緩衝電路344、微凸塊126、112、鎖存電路231、選擇器232、緩衝電路333,供給於ASIC晶片200之ASIC。Further, the signal read from the DRAM of the memory chip 300 is supplied via the buffer circuit 342, the selector 343, the buffer circuit 344, the micro bumps 126 and 112, the latch circuit 231, the selector 232, and the buffer circuit 333. ASIC of ASIC wafer 200.

(測試模式)(test mode)

圖15係顯示測試模式下之測試信號之流圖。測試模式中,向微凸塊106輸入H位準之測試啟動信號TEN。並且,設定向微凸塊102、104供給特定之時脈(第1~2時脈信號)。Figure 15 is a flow chart showing the test signals in the test mode. In the test mode, the H-level test enable signal TEN is input to the microbumps 106. Further, it is set to supply a specific clock (first to second clock signals) to the microbumps 102 and 104.

ASIC晶片200之選擇器213、223成為將輸入B端子之信號從Y端子原樣輸出之狀態。另外,選擇器232、242成為將輸入A端子之信號從Y1端子輸出之狀態。同樣,ASIC晶片200之選擇器310、320成為將輸入A端子之信號從Y1端子輸出之狀態。另外,選擇器343、353成為將輸入B端子之信號從Y端子原樣輸出之狀態。The selectors 213 and 223 of the ASIC chip 200 are in a state in which the signal input to the B terminal is output as it is from the Y terminal. Further, the selectors 232 and 242 are in a state in which a signal input to the A terminal is output from the Y1 terminal. Similarly, the selectors 310 and 320 of the ASIC chip 200 are in a state where the signal of the input A terminal is output from the Y1 terminal. Further, the selectors 343 and 353 are in a state in which the signal input to the B terminal is output as it is from the Y terminal.

然後,若向微凸塊101輸入測試信號,則在正反器電路212、222依次保持有測試信號(箭頭A)。Then, when a test signal is input to the microbump 101, a test signal (arrow A) is sequentially held in the flip-flop circuits 212 and 222.

繼之,若向微凸塊105輸入H位準之記憶體用模式信號,則保持於正反器電路212之測試信號經由選擇器213、微凸塊110、124、選擇器310保持於正反器電路312。同樣,保持於正反器電路222之測試信號,經由選擇器223、微凸塊111、125、選擇器320、322保持於正反器電路333(箭頭B)。Then, if the H-level memory mode signal is input to the microbump 105, the test signal held in the flip-flop circuit 212 is held in the positive and negative directions via the selector 213, the micro bumps 110, 124, and the selector 310. Circuit 312. Similarly, the test signal held in the flip-flop circuit 222 is held in the flip-flop circuit 333 (arrow B) via the selector 223, the micro bumps 111, 125, and the selectors 320, 322.

繼之,若向微凸塊105輸入L位準之記憶體用模式信號,則選擇器322向正反器電路333供給保持於正反器電路312 之測試信號。亦即,保持於正反器電路312、333之測試信號,移位至下個輸出對象之正反器電路(箭頭C)。Then, when the L mode memory mode signal is input to the microbump 105, the selector 322 supplies the flip flop circuit 333 to the flip flop circuit 312. Test signal. That is, the test signals held in the flip-flop circuits 312, 333 are shifted to the flip-flop circuit (arrow C) of the next output object.

繼之,若向微凸塊103輸入H位準之邏輯用模式信號,則例如保持於正反器電路341之測試信號經由選擇器343、微凸塊126、112、選擇器232、234保持於正反器電路235。另外,保持於正反器電路351之測試信號,經由選擇器353、微凸塊127、113、選擇器242、244保持於正反器電路245(箭頭D)。Then, if a logic level mode signal of the H level is input to the microbump 103, for example, the test signal held in the flip flop circuit 341 is held by the selector 343, the micro bumps 126, 112, and the selectors 232, 234. The flip-flop circuit 235. Further, the test signal held in the flip-flop circuit 351 is held in the flip-flop circuit 245 (arrow D) via the selector 353, the micro bumps 127, 113, and the selectors 242, 244.

繼之,若向微凸塊103輸入L位準之邏輯用模式信號,則選擇器234、244成為將輸入A端子之信號從Y端子輸出之狀態。藉此,保持於正反器電路235、245之測試信號,依次移位至下段之正反器電路。其結果,將從正反器電路245所輸出之測試信號,經由緩衝電路246、微凸塊114(測試信號輸出微凸塊)輸出(箭頭E)。Then, when the logic mode signal of the L level is input to the microbump 103, the selectors 234 and 244 are in a state where the signal of the input A terminal is output from the Y terminal. Thereby, the test signals held in the flip-flop circuits 235 and 245 are sequentially shifted to the flip-flop circuits of the lower stage. As a result, the test signal output from the flip-flop circuit 245 is output via the buffer circuit 246 and the microbump 114 (test signal output microbump) (arrow E).

因此,未圖示之檢查裝置藉由調查從微凸塊114所輸出之測試信號,不僅可以檢查ASIC晶片200及記憶體晶片300內之佈線狀況,還可以檢查微凸塊間之佈線狀況。Therefore, the inspection device (not shown) can inspect the wiring conditions in the ASIC wafer 200 and the memory chip 300 by inspecting the test signals outputted from the micro bumps 114, and can also check the wiring condition between the micro bumps.

[其他之構成][Other composition]

圖16係顯示本發明之第3實施形態之半導體積體電路之其他之構成圖。並且,對與圖12相同之電路賦予相同符號,主要對與圖12不同之處進行說明。Fig. 16 is a view showing another configuration of a semiconductor integrated circuit according to a third embodiment of the present invention. The same reference numerals are given to the same circuits as those in Fig. 12, and mainly differences from Fig. 12 will be described.

以中介層100取代圖12所示之微凸塊106,該中介層100具有微凸塊106a、106b。微凸塊106a係輸入記憶體用測試啟動信號TEN之電極,經由鎖存電路210、緩衝電路209、 微凸塊109連接於微凸塊123。微凸塊106b係輸入邏輯用測試啟動信號TEN之電極,經由緩衝電路206連接於選擇器213、223、232、242之各S端子。藉此,圖16所示之ASIC晶片200,與圖12及圖15相比較,雖然輸入之測試啟動信號TEN之數量不同,但其他處理相同。The microbumps 106 shown in FIG. 12 are replaced with an interposer 100 having microbumps 106a, 106b. The microbump 106a is an electrode for inputting the test enable signal TEN for the memory, via the latch circuit 210, the buffer circuit 209, The microbumps 109 are connected to the microbumps 123. The microbumps 106b are electrodes for inputting the logic test enable signal TEN, and are connected to the respective S terminals of the selectors 213, 223, 232, and 242 via the buffer circuit 206. Thereby, the ASIC wafer 200 shown in FIG. 16 is compared with FIGS. 12 and 15, although the number of input test enable signals TEN is different, the other processes are the same.

另一方面,在記憶體晶片300側,微凸塊121經由鎖存電路301連接於選擇器322之S端子。微凸塊123經由緩衝電路307連接於選擇器310、320、343、353之S端子。On the other hand, on the memory chip 300 side, the microbumps 121 are connected to the S terminal of the selector 322 via the latch circuit 301. The microbumps 123 are connected to the S terminals of the selectors 310, 320, 343, 353 via the buffer circuit 307.

(測試模式)(test mode)

若向微凸塊106a輸入H位準之記憶體用測試啟動信號TEN,則選擇器310、320成為將輸入A端子之信號從Y1端子輸出之狀態。另外,選擇器343、353成為將輸入B端子之信號從Y端子輸出之狀態。When the H-level memory test enable signal TEN is input to the microbump 106a, the selectors 310 and 320 are in a state where the signal of the input A terminal is output from the Y1 terminal. Further, the selectors 343 and 353 are in a state in which a signal input to the B terminal is output from the Y terminal.

此時,保持於正反器電路212之測試信號,經由微凸塊110、124及選擇器310保持於正反器電路312。同樣,保持於正反器電路222之測試信號,經由微凸塊111、125保持於正反器電路333。At this time, the test signal held in the flip-flop circuit 212 is held in the flip-flop circuit 312 via the micro bumps 110, 124 and the selector 310. Similarly, the test signal held in the flip-flop circuit 222 is held in the flip-flop circuit 333 via the micro bumps 111, 125.

再者,若向微凸塊105輸入H位準之邏輯用模式信號,則選擇器322成為將輸入B端子之信號輸出之狀態。此時,保持於正反器電路312、333之測試信號移位至下個輸出對象之正反器電路。Further, when the logic level signal of the H level is input to the microbump 105, the selector 322 is in a state of outputting the signal of the input B terminal. At this time, the test signals held in the flip-flop circuits 312, 333 are shifted to the flip-flop circuit of the next output object.

如上所述,ASIC晶片200,依次掃描移位保持於正反器電路之測試信號,掃描移位測試信號後,與圖12及圖15之情形同樣,向ASIC晶片200傳輸測試信號。As described above, the ASIC wafer 200 sequentially scans and shifts the test signal held by the flip-flop circuit, and after scanning the shift test signal, transmits a test signal to the ASIC wafer 200 as in the case of FIGS. 12 and 15.

如上所述,第3實施形態之半導體積體電路,將測試信號在ASIC晶片200內掃描移位,經由微凸塊向記憶體晶片300傳輸。再者,前述半導體積體電路將該測試信號在記憶體晶片300內掃描移位,經由微凸塊向ASIC晶片200傳輸後,在ASIC晶片200內再次掃描移位後,經由微凸塊114向外部輸出。因此,藉由檢查從微凸塊114所輸出之測試信號,可以檢查包含有微凸塊間之連接狀況之整體佈線狀況。As described above, in the semiconductor integrated circuit of the third embodiment, the test signal is scanned and shifted in the ASIC wafer 200, and is transmitted to the memory chip 300 via the micro bumps. Furthermore, the semiconductor integrated circuit scans and shifts the test signal in the memory chip 300, transfers it to the ASIC wafer 200 via the micro bumps, scans and shifts again in the ASIC wafer 200, and then passes through the micro bump 114. External output. Therefore, by examining the test signal output from the microbumps 114, it is possible to check the overall wiring condition including the connection condition between the micro bumps.

如上所述,可以有效率地執行經由中介層藉由微凸塊所連接之半導體晶片之晶圓測試(第1及第2實施形態)、及組裝後之測試(第3實施形態)。特別係可以有效率地測試安裝具有多位元寬度之半導體晶片之半導體積體電路。As described above, the wafer test (the first and second embodiments) of the semiconductor wafer connected via the interposer by the micro bumps and the test after the assembly (the third embodiment) can be efficiently performed. In particular, it is possible to efficiently test a semiconductor integrated circuit in which a semiconductor wafer having a multi-bit width is mounted.

並且,本發明不限定於前述之實施形態,當然亦可適用於在專利申請之範圍所記載之範圍內進行設計上之變更者。Further, the present invention is not limited to the above-described embodiments, and it is of course also applicable to those who have made design changes within the scope described in the scope of the patent application.

例如,第3實施形態中,測試啟動信號TEN、模式信號及時脈輸入於ASIC晶片200,但亦可輸入於記憶體晶片300。For example, in the third embodiment, the test enable signal TEN, the mode signal and the pulse are input to the ASIC wafer 200, but may be input to the memory chip 300.

另外,第1至第3之實施形態中,不特別限定探針墊之數量,只要較微凸塊之數量少即可。Further, in the first to third embodiments, the number of probe pads is not particularly limited as long as the number of the microbumps is small.

1、100‧‧‧中介層1, 100‧‧‧Intermediary

10、300‧‧‧記憶體晶片10, 300‧‧‧ memory chip

11‧‧‧微凸塊11‧‧‧Microbumps

12‧‧‧探針墊12‧‧‧ probe pad

80、200‧‧‧ASIC晶片80,200‧‧‧ASIC chip

圖1係半導體積體電路之平面圖。Figure 1 is a plan view of a semiconductor integrated circuit.

圖2係圖1之I-I間之剖面圖。Figure 2 is a cross-sectional view taken along line I-I of Figure 1.

圖3係顯示記憶體晶片之構成之方塊圖。Figure 3 is a block diagram showing the construction of a memory chip.

圖4係顯示記憶體晶片之輸入側之構成圖。Fig. 4 is a view showing the configuration of the input side of the memory chip.

圖5係顯示選擇器之構成之邏輯電路。Fig. 5 is a logic circuit showing the configuration of a selector.

圖6係顯示選擇器之輸入輸出之真值表。Figure 6 is a table showing the truth values of the input and output of the selector.

圖7係顯示記憶體晶片之輸出側之構成圖。Fig. 7 is a view showing the configuration of the output side of the memory chip.

圖8係顯示記憶體晶片之輸入側之構成圖。Fig. 8 is a view showing the configuration of the input side of the memory chip.

圖9係顯示記憶體晶片之輸入側之構成圖。Fig. 9 is a view showing the configuration of the input side of the memory chip.

圖10係顯示記憶體晶片10之輸出側之構成圖。FIG. 10 is a view showing the configuration of the output side of the memory chip 10.

圖11係顯示記憶體晶片10之輸出側之構成圖。Fig. 11 is a view showing the configuration of the output side of the memory chip 10.

圖12係顯示本發明之第3實施形態之半導體積體電路之構成圖。Fig. 12 is a block diagram showing a semiconductor integrated circuit according to a third embodiment of the present invention.

圖13係顯示選擇器之構成之邏輯電路。Figure 13 is a logic circuit showing the construction of a selector.

圖14係顯示選擇器之輸入輸出之真值表。Figure 14 is a table showing the truth values of the input and output of the selector.

圖15係顯示測試模式下之測試信號之流圖。Figure 15 is a flow chart showing the test signals in the test mode.

圖16係顯示本發明之第3實施形態之半導體積體電路之其他之構成圖。Fig. 16 is a view showing another configuration of a semiconductor integrated circuit according to a third embodiment of the present invention.

10‧‧‧記憶體晶片10‧‧‧ memory chip

11Ain ~11Nin ‧‧‧微凸塊11A in ~11N in ‧‧‧ micro-bumps

11SDATA-in ‧‧‧微凸塊11 SDATA-in ‧‧‧ micro-bumps

11TEN-in ‧‧‧微凸塊11 TEN-in ‧‧‧ micro-bumps

12SDATA-in ‧‧‧探針墊12 SDATA-in ‧‧‧ probe pad

12TEN-in ‧‧‧探針墊12 TEN-in ‧‧‧ probe pad

21‧‧‧DRAM21‧‧‧DRAM

22A~22N‧‧‧鎖存電路22A~22N‧‧‧Latch circuit

22X‧‧‧鎖存電路22X‧‧‧Latch circuit

23‧‧‧緩衝電路23‧‧‧ snubber circuit

24A‧‧‧選擇器24A‧‧‧Selector

27A~27N‧‧‧選擇器27A~27N‧‧‧Selector

28A~28N‧‧‧緩衝電路28A~28N‧‧‧ buffer circuit

VDD‧‧‧第2電源電路供給電壓VDD‧‧‧2nd power supply circuit supply voltage

VDDQ‧‧‧第1電源電路供給電壓VDDQ‧‧‧1st power supply circuit supply voltage

Claims (2)

一種半導體積體電路,其特徵在於:其係於中介層(interposer)倒裝地安裝有各具有以100μm以下之最小間距配置之複數之微凸塊之第1半導體晶片及第2半導體晶片;前述第1半導體晶片包含:測試信號輸入微凸塊,其係輸入測試信號;第1時脈用微凸塊,其係輸入第1時脈信號;第1模式信號用微凸塊,其係輸入第1模式信號;複數之第1輸出微凸塊,其係用於輸出資料;複數之第1輸入微凸塊,其係用於輸入資料;第1移位暫存器,其包含複數之正反器,該等正反器對應於前述第1輸出微凸塊之各個而設置,保持經由前述測試信號輸入微凸塊輸入之測試信號,並將保持之測試信號輸出至各個對應之前述第1輸出微凸塊及下段之正反器,於經由前述第1時脈用微凸塊輸入了第1時脈信號時,將保持之測試信號移位至下段之正反器;第2移位暫存器,其包含複數之正反器,該等正反器對應於前述第1輸入微凸塊之各個而設置,在經由前述第1模式信號用微凸塊輸入了前述第1模式信號之情況時,保持經由各個對應之前述第1輸入微凸塊輸入之測試信號,並將保持之測試信號輸出至下段之正反器,於經由前述第1時脈用微凸塊輸入了第1時脈信 號時,將保持之測試信號移位至下段之正反器;及測試信號輸出微凸塊,其係輸出從前述第2移位暫存器移位後之測試信號;前述第2半導體晶片包含:第2時脈用微凸塊,其係輸入第2時脈信號;第2模式信號用微凸塊,其係輸入第2模式信號;複數之第2輸入微凸塊,其係用於將從前述第1輸出微凸塊之各個輸出之資料經由前述中介層輸入;複數之第2輸出微凸塊,其係用於將資料經由前述中介層輸出至前述第1輸入微凸塊之各個;第3移位暫存器,其包含複數之正反器,該等正反器對應於前述第2輸入微凸塊之各個而設置,在經由前述第2模式信號用微凸塊輸入了第2模式信號之情況時,保持經由各個對應之前述第2輸入微凸塊輸入之測試信號,並將保持之測試信號輸出至下段之正反器,於經由前述第2時脈用微凸塊輸入了第2時脈信號時,將保持之測試信號移位至下段之正反器;及第4移位暫存器,其包含複數之正反器,該等正反器對應於前述第2輸出微凸塊之各個而設置,保持自前述第3移位暫存器移位後之測試信號,並將保持之測試信號輸出至各個對應之前述第2輸出微凸塊及下段之正反器,於經由前述第2時脈用微凸塊輸入了第2時脈信號時,將保持之測試信號移位至下段之正反器;且上述半導體積體電路 可根據自前述測試信號輸出微凸塊輸出之測試信號,檢查佈線連接,該佈線連接包含前述第1輸出微凸塊與前述第2輸入微凸塊之間之連接狀況、及前述第2輸出微凸塊與前述第1輸入微凸塊之間之連接狀況。 A semiconductor integrated circuit characterized in that a first semiconductor wafer and a second semiconductor wafer each having a plurality of micro bumps arranged at a minimum pitch of 100 μm or less are mounted in an interposer; The first semiconductor wafer includes: a test signal input microbump, which inputs a test signal; a first clock microbump, which inputs a first clock signal; and a first mode signal microbump, which is input 1 mode signal; a plurality of first output microbumps for outputting data; a plurality of first input microbumps for inputting data; and a first shift register containing positive and negative of plural numbers And the flip-flops are disposed corresponding to each of the first output microbumps, and maintain a test signal input to the microbump via the test signal, and output the held test signal to each of the corresponding first outputs. The micro bump and the flip-flop of the lower stage shift the held test signal to the flip-flop of the lower stage when the first clock signal is input through the first bump for the first clock; the second shift is temporarily stored a device comprising a plurality of flip-flops, The isolator is provided corresponding to each of the first input microbumps, and when the first mode signal is input via the first mode signal microbump, the first input micro through each of the corresponding first input micro a test signal input by the bump, and outputting the held test signal to the flip-flop of the lower stage, and inputting the first clock signal by using the micro-bump of the first clock And shifting the held test signal to the flip-flop of the lower stage; and the test signal output microbump, which outputs a test signal shifted from the second shift register; the second semiconductor wafer includes : a second bump with a microbump, which inputs a second clock signal; a second mode signal with a microbump, which inputs a second mode signal; and a plurality of second input microbumps, which are used for Data from the respective outputs of the first output microbumps are input via the interposer; a plurality of second output microbumps are used to output data to each of the first input microbumps via the interposer; a third shift register comprising a plurality of flip-flops, wherein the flip-flops are provided corresponding to each of the second input micro-bumps, and the second flip-chip is input via the second mode signal micro-bumps In the case of the mode signal, the test signal input via each of the corresponding second input microbumps is held, and the held test signal is output to the flip-flop of the lower stage, and the micro-bump is input through the second clock. When the 2nd clock signal is shifted, the test signal is kept shifted a flip-flop of the lower stage; and a fourth shift register comprising a plurality of flip-flops, wherein the flip-flops are disposed corresponding to each of the second output micro-bumps, and are retained from the third shift temporarily a test signal after the register is shifted, and the held test signal is output to each of the corresponding second output microbumps and the lower flip-flops, and the second time is input through the second clock microbumps. a pulse signal, shifting the held test signal to the flip-flop of the lower stage; and the above semiconductor integrated circuit The wiring connection may be checked according to a test signal outputting the microbump output from the test signal, and the wiring connection includes a connection state between the first output microbump and the second input microbump, and the second output micro The connection between the bump and the first input microbump. 如請求項1之半導體積體電路,其中倒裝地安裝於前述中介層之前述第1半導體晶片及前述第2半導體晶片係各自為256位元以上之多位元寬度。 The semiconductor integrated circuit of claim 1, wherein each of the first semiconductor wafer and the second semiconductor wafer which are flip-chip mounted on the interposer has a multi-bit width of 256 bits or more.
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