TWI460051B - 化學機械研磨墊製造組合件及製造化學機械研磨墊的方法 - Google Patents

化學機械研磨墊製造組合件及製造化學機械研磨墊的方法 Download PDF

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Publication number
TWI460051B
TWI460051B TW098123013A TW98123013A TWI460051B TW I460051 B TWI460051 B TW I460051B TW 098123013 A TW098123013 A TW 098123013A TW 98123013 A TW98123013 A TW 98123013A TW I460051 B TWI460051 B TW I460051B
Authority
TW
Taiwan
Prior art keywords
layer
support plate
chemical mechanical
mechanical polishing
sensitive adhesive
Prior art date
Application number
TW098123013A
Other languages
English (en)
Chinese (zh)
Other versions
TW201006608A (en
Inventor
米雪爾 傑森
約翰 吉佛德 挪蘭
布達 哈丁
卡爾 卡達
Original Assignee
羅門哈斯電子材料Ｃｍｐ控股公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 羅門哈斯電子材料Ｃｍｐ控股公司 filed Critical 羅門哈斯電子材料Ｃｍｐ控股公司
Publication of TW201006608A publication Critical patent/TW201006608A/zh
Application granted granted Critical
Publication of TWI460051B publication Critical patent/TWI460051B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0045—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for by stacking sheets of abrasive material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0072—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using adhesives for bonding abrasive particles or grinding elements to a support, e.g. by gluing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1089—Methods of surface bonding and/or assembly therefor of discrete laminae to single face of additional lamina
    • Y10T156/1092—All laminae planar and face to face
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2848—Three or more layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW098123013A 2008-07-18 2009-07-08 化學機械研磨墊製造組合件及製造化學機械研磨墊的方法 TWI460051B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/175,965 US7645186B1 (en) 2008-07-18 2008-07-18 Chemical mechanical polishing pad manufacturing assembly

Publications (2)

Publication Number Publication Date
TW201006608A TW201006608A (en) 2010-02-16
TWI460051B true TWI460051B (zh) 2014-11-11

Family

ID=41259313

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098123013A TWI460051B (zh) 2008-07-18 2009-07-08 化學機械研磨墊製造組合件及製造化學機械研磨墊的方法

Country Status (6)

Country Link
US (2) US7645186B1 (enExample)
EP (1) EP2145731B1 (enExample)
JP (1) JP5457093B2 (enExample)
KR (1) KR101650195B1 (enExample)
CN (1) CN101628395B (enExample)
TW (1) TWI460051B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI607499B (zh) * 2013-01-31 2017-12-01 Ebara Corp Polishing device, polishing pad attachment method, and polishing pad replacement method
WO2015120216A1 (en) 2014-02-07 2015-08-13 Gojo Industries, Inc. Compositions and methods with efficacy against spores and other organisms
US20160144477A1 (en) * 2014-11-21 2016-05-26 Diane Scott Coated compressive subpad for chemical mechanical polishing

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW332162B (en) * 1996-02-01 1998-05-21 Yanase Kk The rotary grinding tool composed by central & grinding component, and by screw or other fastening device to hold component with central component together.
TW200510114A (en) * 2003-01-10 2005-03-16 3M Innovative Properties Co Pad constructions for chemical mechanical planarization applications
TW200523066A (en) * 2003-09-26 2005-07-16 Rohm & Haas Elect Mat Resilient polishing pad for chemical mechanical polishing
TW200533466A (en) * 2004-01-09 2005-10-16 Mipox Internat Corp Layered support and method for laminating CMP pads
US20060135051A1 (en) * 2004-12-20 2006-06-22 Cabot Microelectronics Corporation Polishing pad with removal features

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2644280A (en) * 1950-09-13 1953-07-07 Carborundum Co Sanding disk accessory
US4263755A (en) * 1979-10-12 1981-04-28 Jack Globus Abrasive product
US4728552A (en) * 1984-07-06 1988-03-01 Rodel, Inc. Substrate containing fibers of predetermined orientation and process of making the same
US4932163A (en) * 1989-08-29 1990-06-12 Chilton Douglas L Dust control system for an abrasive grinder
US5257478A (en) * 1990-03-22 1993-11-02 Rodel, Inc. Apparatus for interlayer planarization of semiconductor material
US5222331A (en) * 1990-04-10 1993-06-29 Minnesota Mining And Manufacturing Company Abrading assembly
US5507906A (en) * 1990-04-13 1996-04-16 M. J. Woods, Inc. Method for making multilayer pad
US5692950A (en) 1996-08-08 1997-12-02 Minnesota Mining And Manufacturing Company Abrasive construction for semiconductor wafer modification
US6224474B1 (en) * 1999-01-06 2001-05-01 Buehler, Ltd. Magnetic disc system for grinding or polishing specimens
US6699104B1 (en) * 1999-09-15 2004-03-02 Rodel Holdings, Inc. Elimination of trapped air under polishing pads
US7077721B2 (en) 2000-02-17 2006-07-18 Applied Materials, Inc. Pad assembly for electrochemical mechanical processing
US7077733B1 (en) * 2000-08-31 2006-07-18 Micron Technology, Inc. Subpad support with a releasable subpad securing element and polishing apparatus including the subpad support
US6616519B2 (en) * 2001-09-14 2003-09-09 Saint-Gobain Abrasives Technology Company Sanding system
US6884156B2 (en) * 2003-06-17 2005-04-26 Cabot Microelectronics Corporation Multi-layer polishing pad material for CMP
US7549914B2 (en) * 2005-09-28 2009-06-23 Diamex International Corporation Polishing system
JP2007203394A (ja) * 2006-01-31 2007-08-16 Nitta Haas Inc 研磨パッド

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW332162B (en) * 1996-02-01 1998-05-21 Yanase Kk The rotary grinding tool composed by central & grinding component, and by screw or other fastening device to hold component with central component together.
TW200510114A (en) * 2003-01-10 2005-03-16 3M Innovative Properties Co Pad constructions for chemical mechanical planarization applications
TW200523066A (en) * 2003-09-26 2005-07-16 Rohm & Haas Elect Mat Resilient polishing pad for chemical mechanical polishing
TW200533466A (en) * 2004-01-09 2005-10-16 Mipox Internat Corp Layered support and method for laminating CMP pads
JP2007518277A (ja) * 2004-01-09 2007-07-05 マイポックス インターナショナル コーポレーション Ｃｍｐパッドをラミネートする層状支持体及び方法
US20060135051A1 (en) * 2004-12-20 2006-06-22 Cabot Microelectronics Corporation Polishing pad with removal features

Also Published As

Publication number Publication date
EP2145731A1 (en) 2010-01-20
KR20100009505A (ko) 2010-01-27
KR101650195B1 (ko) 2016-08-22
TW201006608A (en) 2010-02-16
US7645186B1 (en) 2010-01-12
US7794562B2 (en) 2010-09-14
CN101628395A (zh) 2010-01-20
US20100051198A1 (en) 2010-03-04
JP5457093B2 (ja) 2014-04-02
US20100015902A1 (en) 2010-01-21
EP2145731B1 (en) 2012-02-29
CN101628395B (zh) 2012-01-11
JP2010028112A (ja) 2010-02-04

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