TWI460032B - Device for treating a band-shaped substrate with a liquid - Google Patents

Device for treating a band-shaped substrate with a liquid Download PDF

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TWI460032B
TWI460032B TW097105788A TW97105788A TWI460032B TW I460032 B TWI460032 B TW I460032B TW 097105788 A TW097105788 A TW 097105788A TW 97105788 A TW97105788 A TW 97105788A TW I460032 B TWI460032 B TW I460032B
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winding
pulley
strip substrate
pulley mechanism
strip
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TW097105788A
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TW200906509A (en
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Peter Jacobus Gerardus Loermans
Peter Johannes Maria Huvenaars
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Meco Equip Eng
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21CMANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES OR PROFILES, OTHERWISE THAN BY ROLLING; AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL
    • B21C47/00Winding-up, coiling or winding-off metal wire, metal band or other flexible metal material characterised by features relevant to metal processing only
    • B21C47/26Special arrangements with regard to simultaneous or subsequent treatment of the material
    • B21C47/265"helicofil" systems
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

A device for treating a band-shaped substrate with a liquid, including: a conveying system including a winding system guiding the band-shaped substrate in a spiral path around the winding system with at least one winding; a first pulley rotatable about a first axis of rotation guiding the at least one winding of the band-shaped substrate through a first angle of deflection around part of the circumference of the first pulley, and a second pulley guiding the at least one winding of the band-shaped substrate through a second angle of deflection around part of the circumference of the second pulley, which is rotatable about a second axis of rotation, for each winding; and a bath of the liquid. The band-shaped substrate extends through the liquid over at least part of the length of the at least one winding. The second axis of rotation of each second pulley makes an angle alpha with the first axis of rotation.

Description

以液體處理帶形基板的裝置Device for processing a strip substrate with a liquid

本發明係有關一以液體處理帶形基板的裝置,該裝置包括一用來運送帶形基板之運送系統,該運送系統包括一捲繞系統,用來藉至少一捲繞,繞運送系統,將帶形基板導入一螺旋路徑,該捲繞系統包括:第1帶輪機構,其可繞一第1旋轉軸旋轉,繞第1帶輪機構之圓周的一部分,成一第1偏轉角度導引帶形基板之該至少一捲繞繞經第1帶輪機構之圓周的一部分;以及第2帶輪機構,用來繞第2帶輪機構之圓周的一部分,成一第2偏轉角度,導引帶形基板之該至少一捲繞繞經第2帶輪機構之圓周的一部分;該第2帶輪機構包括一第2帶輪,其可對每一捲繞,繞一第1旋轉軸旋轉;該裝置進一步包括一液槽,其中,帶形基板延伸通過液槽中的液體達該至少一捲繞之長度的至少一部分。The present invention relates to a device for processing a tape-shaped substrate in a liquid, the device comprising a transport system for transporting a strip-shaped substrate, the transport system comprising a winding system for winding at least one winding, around the transport system, The strip substrate is introduced into a spiral path, and the winding system includes: a first pulley mechanism rotatable about a first rotating shaft, and a portion of the circumference of the first pulley mechanism is guided by a first deflection angle The at least one winding of the substrate is wound around a portion of the circumference of the first pulley mechanism; and the second pulley mechanism is configured to guide the strip substrate around a portion of the circumference of the second pulley mechanism to a second deflection angle At least one winding around a portion of a circumference of the second pulley mechanism; the second pulley mechanism includes a second pulley that is rotatable about a first rotation axis for each winding; the device further A liquid bath is included wherein the ribbon substrate extends through the liquid in the liquid reservoir for at least a portion of the length of the at least one winding.

德國早期公開文獻DE 20 34 751揭示一種用於電鍍金屬線之裝置。於該裝置中,金屬線繞一驅動滾輪及一配置於該驅動滾輪下方之下滾輪,被導入導入一螺旋路徑。驅動滾輪設有一用於每一捲繞之周槽,而下滾輪則包括一用於每一捲繞之可獨立旋轉導輪,諸導輪同樣各設有一用於一金屬線捲繞之周槽。驅動滾輪及下滾輪(並因此諸導輪)之中心軸水平定向並相互平行。下滾輪配置於一流電 液槽中。或多或少,於DE 20 34 751中附帶提及系爭裝置亦適用於處理帶形材料。惟,一重要缺點在於,於帶形基板轉送至驅動滾輪與下滾輪間之螺旋形狀內的次一溝槽造成,於帶形材料之處理期間內,較高應力可能橫向產生於帶形材料中。該應力可能導致起皺,或者,甚至於更糟的是,導致裂痕形成於帶形材料中,這可能對電鍍處理產生極大負面效果。使用習知裝置之另一缺點在於,此裝置不適合於帶形基板一側電鍍。由於在帶形基板延伸於液槽的液體中而不接觸下滾輪下,帶形基板二側均處理,惟在帶形基板於液槽中與下滾輪接觸下,即實質上於一側,亦即外側處理,因此,事實上,此裝置不太適合於帶形基板兩側電鍍。受處理內側因帶形基板與下滾輪監間的該接觸而有損壞之虞,復由於帶形基板會因以上理由而易於位移越過下滾輪之表面,因此,情況更糟。基於甚多理由,結果導致沉積於帶形基板之外側及內側之諸層彼此不同。German Patent Publication No. DE 20 34 751 discloses an apparatus for electroplating metal wires. In the device, the metal wire is guided around a driving roller and a roller disposed below the driving roller, and is introduced into a spiral path. The drive roller is provided with a circumferential groove for each winding, and the lower roller includes an independently rotatable guide wheel for each winding, and the guide wheels are also each provided with a circumferential groove for a wire winding. . The central axes of the drive roller and the lower roller (and therefore the guide wheels) are oriented horizontally and parallel to each other. The lower roller is configured for first-class power In the tank. More or less, it is mentioned in DE 20 34 751 that the device is also suitable for processing strip materials. However, an important disadvantage is that during the processing of the strip material, the higher stress may be generated laterally in the strip material during the processing of the strip substrate to the next groove in the spiral shape between the drive roller and the lower roller. . This stress may cause wrinkling or, even worse, cause cracks to form in the strip material, which may have a very negative effect on the plating process. Another disadvantage of using conventional devices is that the device is not suitable for plating on one side of the strip substrate. Since the strip substrate extends in the liquid in the liquid tank without contacting the lower roller, the strip substrate is processed on both sides, but the strip substrate is in contact with the lower roller in the liquid tank, that is, substantially on one side, That is, the outer treatment, therefore, in fact, this device is not suitable for electroplating on both sides of the strip substrate. The inner side of the process is damaged by the contact between the strip substrate and the lower roller, and the strip substrate is more likely to be displaced over the surface of the lower roller due to the above reasons, and thus the situation is even worse. For many reasons, the results result in layers deposited on the outside and inside of the strip substrate being different from each other.

西方電技術文摘1970年10月第20號,XP002453277 XP001333208之伯考斯基等人之“多通道電線處理設備”亦揭示一種連續螺旋地捲繞於一接觸滾筒、一第1組槽輪之槽輪及一第2組槽輪之槽輪之電線處理裝置。各組槽輪之槽輪可同軸繞一相對於接觸滾筒之旋轉軸歪斜之共軸旋轉。各組槽輪之槽輪具有不同直徑。Western Electric Technology Digest, No. 20, October 1970, XP002453277 XP001333208, "Multi-channel wire processing equipment" by Berkowski et al. also discloses a continuous spirally wound groove in a contact roller and a first group of sheaves. A wire processing device for a wheel of a second set of sheaves. The sheaves of each set of sheaves can be coaxially rotated about a common axis with respect to the axis of rotation of the contact roller. The sheaves of each set of sheaves have different diameters.

美國專利US 2,682,335揭示一種帶處理設備,其使用二個具有相等直徑及長度之圓筒,一帶材螺旋地繞其捲繞。一圓筒之軸相對於另一圓筒之軸成角度位移。U.S. Patent No. 2,682,335 discloses a tape processing apparatus which uses two cylinders of equal diameter and length around which a strip is helically wound. The axis of one cylinder is angularly displaced relative to the axis of the other cylinder.

本發明之目的在於提供一種如於前言中所指之裝置,藉此可使用一液體,以極小型方式,處理一帶形基板,為達到此目的,帶形基板於一螺旋輸送路徑中移動,且其中發生於帶形基板的應力受到限制,俾將帶形基板發生起皺或裂痕之風險減至最小。為達到此目的,各第2帶輪之第2旋轉軸與第1旋轉軸成一角度α。這導致以下極重大優點,即帶形基板僅須繞一中立線扭轉有限程度,亦依材料性質及帶形基板的尺寸而定,帶形基板在橫切縱向之方向發生的拉力及壓力將低到起皺或裂痕之風險最小,或甚至可全部排除。除此,可防止帶形基板於第1帶輪機構或第2帶輪機構上橫向位移的傾向,此傾向會導致帶形基板之縱緣額外負載,而這可能因以液體處理帶形基板而造成沉積於其上之材料的損壞。It is an object of the present invention to provide a device as referred to in the preamble whereby a strip substrate can be processed in a very small manner using a liquid, for which purpose the strip substrate moves in a helical transport path, and The stress occurring in the strip substrate is limited, and the risk of wrinkling or cracking of the strip substrate is minimized. To achieve this, the second rotation axis of each of the second pulleys is at an angle α with the first rotation axis. This leads to the following great advantage, that is, the strip substrate only has to be twisted around a neutral wire to a limited extent, and depending on the nature of the material and the size of the strip substrate, the tensile force and pressure of the strip substrate in the transverse direction of the longitudinal direction will be low. The risk of wrinkling or cracking is minimal, or even all can be ruled out. In addition, the tendency of the strip substrate to laterally displace on the first pulley mechanism or the second pulley mechanism can be prevented, which tends to cause an extra load on the longitudinal edge of the strip substrate, which may be due to the liquid processing of the strip substrate. Causes damage to the material deposited thereon.

為增加能力,較佳地,第2帶輪機構具有許多第2帶輪。In order to increase the capacity, preferably, the second pulley mechanism has a plurality of second pulleys.

而且,諸第2帶輪以具有相等直徑較佳。這提供以下優點,即於捲繞系統僅包括第1帶輪機構及第2帶輪機構,且不包括諸如後面將說明之一較佳實施例中之第3帶輪機構之任何額外帶輪機構情形下,第2帶輪之例如180度之極精確偏轉角度可達成帶形基板對抗相關帶輪機構的極佳控制之軸承。結果,這導致作用於帶形基板上的最小機械負載。Moreover, the second pulleys are preferably of equal diameter. This provides the advantage that the winding system includes only the first pulley mechanism and the second pulley mechanism, and does not include any additional pulley mechanism such as the third pulley mechanism in a preferred embodiment to be described later. In this case, an extremely precise deflection angle of, for example, 180 degrees of the second pulley can achieve a bearing with excellent control of the strip substrate against the associated pulley mechanism. As a result, this results in a minimum mechanical load acting on the strip substrate.

基於構造簡單性的理由,較佳係與諸個別第2帶輪有關的第2旋轉軸相互平行延伸。因此,該較佳實施例排除與諸個別第2帶輪有關的第2旋轉軸相互成一直線的可能性,此可能性會導致在防止帶形基板之內部(橫向)應力方面,帶形基板材料的導引低於最佳狀況。For the reason of the structural simplicity, it is preferable that the second rotation axes associated with the individual second pulleys extend in parallel with each other. Therefore, the preferred embodiment eliminates the possibility that the second rotating shafts associated with the individual second pulleys are in line with each other, which may result in a strip substrate material in terms of preventing internal (lateral) stress of the strip substrate. The guidance is lower than the best.

而且,為提高以上優點,較佳係第1帶輪機構於該至少一捲繞被第1帶輪機構導引處具有第1直徑D1,各第2帶輪於一捲繞被第1帶輪所導引之相關位置具有第2直徑D2,其中第2直徑D2大於第1直徑D1,且其中進一步較佳的是第2直徑D2之尺寸等於被cos(α)所分之第1直徑D1的尺寸。Further, in order to improve the above advantages, it is preferable that the first pulley mechanism has the first diameter D1 at the position where the at least one winding is guided by the first pulley mechanism, and each of the second pulleys is wound by the first pulley. The guided position has a second diameter D2, wherein the second diameter D2 is larger than the first diameter D1, and it is further preferable that the size of the second diameter D2 is equal to the first diameter D1 divided by cos(α) size.

根據一極有利較佳實施例,特別是採取捲繞系統僅包括第1帶輪機構及第2帶輪機構,且不包括諸如後面將說明之一較佳實施例中之第3帶輪機構之任何額外帶輪機構,第1偏轉角度及第2偏轉角度均為180度,因為這可以簡單方式達成帶形基板自第1帶輪機構接近第2帶輪機構的方向平行於帶形基板沿第1帶輪機構之方向離開第2帶輪機構的方向,雖則位於次一捲繞的高度。According to a preferred embodiment of the invention, in particular the winding system comprises only the first pulley mechanism and the second pulley mechanism, and does not comprise a third pulley mechanism, such as in a preferred embodiment, which will be described later. For any additional pulley mechanism, the first deflection angle and the second deflection angle are both 180 degrees, because this can be achieved in a simple manner. The direction of the strip substrate from the first pulley mechanism to the second pulley mechanism is parallel to the strip substrate. The direction of the pulley mechanism is away from the direction of the second pulley mechanism, although it is located at the height of the next winding.

為可實現本發明裝置之小型構造,有利的是捲繞系統包括第3帶輪機構,其用來繞第3帶輪機構之圓周的一部分,成一第3偏轉角度,導引帶形基板之該至少一捲繞,該第3帶輪機構包括一用於各捲繞,可繞一第3旋轉軸旋轉之第3帶輪,各第3帶輪平行於一相關第2帶輪延伸,其中進一步較佳的是第1偏轉角度與第2偏轉角度的總和 為180度,及/或其中第2帶輪機構及第3帶輪機構均與第1帶輪機構隔相同距離。In order to achieve a compact construction of the apparatus of the present invention, it is advantageous for the winding system to include a third pulley mechanism for guiding a portion of the circumference of the third pulley mechanism to a third deflection angle for guiding the strip substrate At least one winding, the third pulley mechanism includes a third pulley for each winding that is rotatable about a third rotation axis, and each of the third pulleys extends parallel to an associated second pulley, wherein further Preferably, the sum of the first deflection angle and the second deflection angle The angle is 180 degrees, and/or the second pulley mechanism and the third pulley mechanism are both at the same distance from the first pulley mechanism.

依本發明之用途而定,可能非常有利是液槽設於第1帶輪機構與第2帶輪機構之間,其中基板材料直線延伸於液槽中,且該基板材料可藉液槽中的液體多側處理。Depending on the application of the present invention, it may be highly advantageous that the liquid bath is disposed between the first pulley mechanism and the second pulley mechanism, wherein the substrate material extends linearly in the liquid tank, and the substrate material can be borrowed from the liquid tank. Multi-side treatment of liquids.

替代地,且特別是於帶形基板僅在一側處理情況下,有利的是,液槽沿第1偏轉角的一部分延伸於第1帶輪機構之外側上。Alternatively, and particularly where the strip substrate is only treated on one side, it is advantageous if the liquid bath extends over a portion of the first deflection angle on the outer side of the first pulley mechanism.

精確地說,為於一側處理帶形基板,在此方面較佳的是,第1帶輪機構於液槽中對面朝第1帶輪機構之帶形基板側形成一掩模,俾帶形基板藉液體,僅在遠離第1帶輪機構的一側處理帶形基板。To be precise, in order to process the strip substrate on one side, it is preferable that the first pulley mechanism forms a mask in the liquid tank facing the strip substrate side of the first pulley mechanism in the liquid tank. The substrate is made of a liquid, and the strip substrate is processed only on the side away from the first pulley mechanism.

帶形基板與第1帶輪機構的良好連接可以有利的方式連接實現,即第1帶輪機構包括一用於各捲繞之接觸表面,此接觸表面於帶形基板之縱緣向上傾斜。確保縱緣適當地抵接接觸表面的向上傾斜部分,因液槽之液體之液壓而施加於帶形基板上的壓力及帶形基板中的拉伸應力有助於此種抵接,俾可保證液密密封。A good connection of the strip substrate to the first pulley mechanism can be achieved in an advantageous manner, ie the first pulley mechanism comprises a contact surface for each winding, the contact surface being inclined upwards on the longitudinal edge of the strip substrate. It is ensured that the longitudinal edge appropriately abuts the upwardly inclined portion of the contact surface, and the pressure applied to the strip substrate by the hydraulic pressure of the liquid of the liquid tank and the tensile stress in the strip substrate contribute to such abutment, and the guarantee is ensured. Liquid tight seal.

特別是為了以液體電化學地處理帶形基板,較佳係第1帶輪機構包括一溝槽,其具有一底部及二個連結該底部,用於各捲繞之直立緣,其中帶形基板抵接底部,且帶形基板之縱緣較佳地不接觸諸直立緣。諸直立緣依次有助於內有電化學處理發生之電場的均一化。In particular, in order to electrochemically process the strip substrate with a liquid, it is preferred that the first pulley mechanism includes a groove having a bottom portion and two bottom portions for the winding upright edges, wherein the strip substrate The bottom is abutted and the longitudinal edges of the strip substrate preferably do not contact the upstanding edges. The erect edges in turn contribute to the homogenization of the electric field within which electrochemical treatment occurs.

為有助於該電場的均一化,較佳地,於帶形基板之縱 緣與溝槽之直立緣間有最大1mm的間隙。To facilitate the uniformization of the electric field, preferably in the longitudinal direction of the strip substrate There is a gap of up to 1 mm between the edge and the upright edge of the groove.

特別是若帶形基板之供應以帶形基板之橫向垂直定向之方式發生,該方式例如係帶形基板自一具有垂直旋轉軸之滾筒解捲實例,較佳即係第1旋轉軸具有一垂直定向或一最大偏離10度的定向。另一重要優點在於,由於,至少實質上由於第1旋轉軸,且較佳地亦包含第2旋轉軸之垂直定向,諸捲繞會延伸於彼此上方,且為保養工作,例如為更換電解液槽中的陽極材料,容易進出諸捲繞之內側或外側上的空間。In particular, if the supply of the strip substrate occurs in a laterally perpendicular orientation of the strip substrate, for example, the strip substrate is unwound from a roller having a vertical axis of rotation, preferably the first axis has a vertical Orientation or an orientation that deviates by a maximum of 10 degrees. Another important advantage is that, because at least substantially due to the first axis of rotation, and preferably also the vertical orientation of the second axis of rotation, the windings will extend above each other and for maintenance work, such as replacing the electrolyte The anode material in the tank is easy to enter and exit the space on the inside or outside of the winding.

惟,替代地,若第1旋轉軸具有水平定向,即亦可能非常有利,於此情況下,帶形基板可自上方導入導出液槽,俾於帶形基板進入及離開液槽之位置不需要任何設施來密封液槽,液槽可為簡單構造。However, alternatively, if the first rotating shaft has a horizontal orientation, it may be very advantageous. In this case, the strip-shaped substrate can be introduced into the lead-out liquid tank from above, and the strip-shaped substrate does not need to enter or leave the liquid tank. Any facility to seal the tank, the tank can be of simple construction.

特別是於第1旋轉軸具有至少實質上垂直定向情況下,較佳係至少一通道設在液槽之至少一壁上,帶形基板可通過該通道,而且,較佳地,配置該通道以容許帶形基板通過而不與其接觸。此後一態樣具有帶形基板經由液槽之一壁上之通道通過,不會負面影響以液體對帶形基板所作處理之優點。Particularly in the case where the first rotating shaft has at least a substantially vertical orientation, preferably at least one channel is disposed on at least one wall of the liquid tank, the strip substrate can pass through the passage, and, preferably, the passage is configured The strip substrate is allowed to pass without being in contact therewith. The latter aspect has the advantage that the strip substrate passes through the passage on one of the walls of the liquid tank without adversely affecting the treatment of the strip substrate by the liquid.

較佳地,本裝置設置一滴盤於該通道遠離液槽內部之一側上。Preferably, the device is provided with a drop of disc on the side of the passage away from the interior of the tank.

又較佳地,設置一循環機構,與此一滴盤組合,使進入滴盤之液體經由一通道回到液槽,俾液體可盡可能有效率地處理。Still preferably, a circulation mechanism is provided which, in combination with the drop tray, returns the liquid entering the drip tray back to the tank via a passage, and the liquid can be treated as efficiently as possible.

根據本發明之一極重要較佳實施例,配置捲繞系統,俾以許多捲繞,繞捲繞系統,將帶形基板導入一螺旋路徑中,其中,配置第1帶輪機構及第2帶輪機構,以導引於許多相鄰位置隔開一間距的許多捲繞。因此,以液體對帶形基板所作處理可以極小型方式發生,惟,發生於帶形基板之應力最小。According to a very important preferred embodiment of the invention, the winding system is arranged, and the strip substrate is introduced into a spiral path by a plurality of windings, around the winding system, wherein the first pulley mechanism and the second belt are arranged The wheel mechanism is configured to guide a plurality of windings spaced apart by a plurality of adjacent locations. Therefore, the treatment of the strip substrate with liquid can occur in a very small manner, but the stress occurring on the strip substrate is minimal.

角度α以在2度與30度之間較佳,其中最佳角度亦依材料性質及帶形基板之尺寸而定。The angle α is preferably between 2 and 30 degrees, wherein the optimum angle is also dependent on the nature of the material and the size of the strip substrate.

又,為盡可能減少拉伸應力及帶形基板中滑動的發生,一般而言,較佳係第1帶輪機構包括一1帶輪機構,其可對各捲繞,繞一第1旋轉軸旋轉,其中,個別第1旋轉軸同軸。許多個別第1帶輪機構之使用的優點在於其等無須正好等角速度,俾無須對當帶形基板沿帶形基板之縱向滑過第1帶輪機構時發生之帶形基板的延長予以補償。Further, in order to minimize the tensile stress and the occurrence of sliding in the strip substrate, it is generally preferred that the first pulley mechanism includes a one pulley mechanism that can be wound around each of the first rotating shafts. Rotation, wherein the individual first rotating shafts are coaxial. The advantage of the use of many individual first pulley mechanisms is that they do not have to be exactly angular velocity, and there is no need to compensate for the extension of the ribbon substrate that occurs when the strip substrate slides through the first pulley mechanism in the longitudinal direction of the strip substrate.

又,為達成以上優點,較佳亦係運送機構包括一驅動機構,用來可旋轉驅動一單一第1帶輪,又,較佳地,單一第1帶輪係一最外面第1帶輪。當第1旋轉軸具有,至少實質上具有垂直定向時,此一最外面第1帶輪由第1帶輪機構之最下面帶輪或最上面帶輪形成。Further, in order to achieve the above advantages, preferably, the transport mechanism includes a drive mechanism for rotatably driving a single first pulley, and preferably, the single first pulley is an outermost first pulley. When the first rotating shaft has at least substantially vertical orientation, the outermost first pulley is formed by the lowermost pulley or the uppermost pulley of the first pulley mechanism.

特別是若帶形基板僅於一側以液體處理,較佳即係帶形基板僅在捲繞系統內之一側上與形成該捲繞系統之一部分之該帶輪機構接觸。於此情況下,以液體處理之一側位於外側,而帶形基板則以內側抵接捲繞系統之帶輪機構。業已以液體處理之帶形基板之外側不會因帶形基板與帶輪 機構之接觸而負載。In particular, if the strip substrate is treated with liquid only on one side, preferably the strip substrate is in contact with the pulley mechanism forming part of the winding system only on one side of the winding system. In this case, one side of the liquid treatment is located on the outer side, and the strip-shaped substrate abuts the pulley mechanism of the winding system on the inner side. The outer side of the strip substrate that has been treated with liquid will not be affected by the strip substrate and the pulley The contact of the organization is loaded.

本發明之優點特別是應用於有關帶形基板之流電處理。於此架構中,另一較佳實施例之特徵在於液槽為一流電液槽。The advantages of the present invention are particularly applicable to galvanic treatment of strip substrates. In this architecture, another preferred embodiment is characterized in that the liquid bath is a first-class electro-hydraulic tank.

本發明亦有關二個上述本發明之連續裝置之組合,其中,從平行於有關個別裝置之第1旋轉軸之方向看來,帶形基板沿相反方向移動。以此方式,可沿一進給方向,將帶形基板進給至組合中的第1裝置,其中該第1方向與該第2方向相互成一直線,這使得該組合極適合併入生產線中。The invention also relates to a combination of two of the above-described continuous devices of the invention wherein the strip substrate moves in the opposite direction as viewed parallel to the direction of the first axis of rotation of the individual device. In this manner, the strip substrate can be fed to the first device in the combination in a feed direction, wherein the first direction and the second direction are in line with each other, which makes the combination extremely suitable for incorporation into the production line.

根據本發明之另一態樣,本發明提供一種以液體處理帶形基板的方法,包括藉一運送系統,將帶形基板運送通過一液槽之步驟,該運送系統包括一捲繞系統,用來以至少一捲繞,繞捲繞系統,將帶形基板導入一螺旋路徑中,該捲繞系統包括:一第1帶輪機構,其可繞一第1旋轉軸旋轉,用來繞第1帶輪機構之圓周的一部分,成一第1偏轉角度導引帶形基板之至少一捲繞,以及一第2帶輪機構,用來繞第2帶輪機構之圓周的一部分,成一第2偏轉角度導引帶形基板之至少一捲繞,該第2帶輪機構包括一第2帶輪,其可對各捲繞,繞一第2旋轉軸旋轉,該裝置進一步包括一液槽,其中帶形基板通過液槽中之液體,延伸越過該至少一捲繞之長度的至少一部分,且其中,各第2帶輪之第2旋轉軸與第1旋轉軸成一角度α。使用此一裝置所取得優點業已解釋於以上本發明之說明中。According to another aspect of the present invention, there is provided a method of processing a strip substrate in a liquid comprising the steps of transporting a strip substrate through a liquid bath by a transport system comprising a winding system for Introducing the strip substrate into a spiral path by winding at least one winding system, the winding system comprising: a first pulley mechanism rotatable about a first rotation axis for winding the first a portion of the circumference of the pulley mechanism guides at least one winding of the strip substrate at a first deflection angle, and a second pulley mechanism for forming a second deflection angle around a portion of the circumference of the second pulley mechanism At least one winding of the guiding strip substrate, the second pulley mechanism comprising a second pulley that is rotatable about a second rotating shaft for each winding, the device further comprising a liquid tank, wherein the strip shape The substrate passes through the liquid in the liquid bath and extends over at least a portion of the length of the at least one winding, and wherein the second rotating shaft of each of the second pulleys forms an angle a with the first rotating shaft. The advantages obtained with this device have been explained in the above description of the invention.

為盡可能有效率地利用可用空間,較佳係帶形基板繞具有許多捲繞之捲繞系統,被導入一螺旋路徑中。In order to utilize the available space as efficiently as possible, the preferred tape-shaped substrate is introduced into a spiral path around a winding system having a plurality of windings.

本發明之方法特別適合用於製造太陽能面板。習知技術通常使用矽面板作為基板材料。惟,替代地,亦可使用由諸如特別是銅及不銹鋼之金屬製成,其上至少沉積一銦、硒或鎵層的帶形基板。特別是於此架構中,較佳係帶形基板經過流電處理,帶形基板由不銹鋼或銅製成,及/或於液槽中銦、硒或鎵層沉積於帶形基板上。The method of the invention is particularly suitable for use in the manufacture of solar panels. Conventional techniques typically use a tantalum panel as the substrate material. Alternatively, a strip-shaped substrate made of a metal such as copper or stainless steel, on which at least one layer of indium, selenium or gallium is deposited, may alternatively be used. In particular, in this architecture, the preferred strip-shaped substrate is subjected to a galvanic treatment, the strip-shaped substrate is made of stainless steel or copper, and/or a layer of indium, selenium or gallium is deposited on the strip substrate in the liquid bath.

一般而言,較佳係帶形基板以每分2米的速度通過液槽。In general, a preferred tape-shaped substrate passes through the liquid bath at a rate of 2 meters per minute.

現在將藉參考以下圖式所作本發明裝置之二較佳實施例之說明,更詳細解釋本發明。The invention will now be explained in more detail by way of the following description of a preferred embodiment of the apparatus of the invention.

圖1a及1b示意顯示一生產線1,其用來電解地/流電地電鍍一可撓帶形基板2。帶形基板2在藉生產線1,以電解液處理後,被自供應側3供至生產線1,並於排出側4自生產線1排出。於供應側3,帶形基板2可例如自一供應捲軸(未圖示)解捲,而帶形基板2則於排出側4捲至一貯存捲軸(未圖示)。帶形基板2於生產線1之供應側、排出側及中央的以9標示之部分相互成一直線。帶形基板2定向成帶形基板2之橫向沿垂直方向於供應側3及排出側4的位置延伸。Figures 1a and 1b show schematically a production line 1 for electrolytically/currently electroplating a flexible strip substrate 2. The strip-shaped substrate 2 is supplied to the production line 1 from the supply side 3 after being treated with the electrolytic solution by the production line 1, and is discharged from the production line 1 on the discharge side 4. On the supply side 3, the strip substrate 2 can be unwound, for example, from a supply spool (not shown), and the strip substrate 2 is wound on the discharge side 4 to a storage reel (not shown). The strip-shaped substrate 2 is aligned with each other on the supply side, the discharge side, and the center of the line 1, indicated by 9. The strip substrate 2 is oriented such that the lateral direction of the strip substrate 2 extends in the vertical direction at the supply side 3 and the discharge side 4.

生產線1包括四個連續流電生產單元,其均被視為本 發明裝置之較佳實施例。最先二個生產單元5,6係本裝置第1型之較佳實施例,而最後二個生產單元7,8係本裝置第2型之較佳實施例。後面將分別參考圖2,3及圖4-11,更詳細說明第1型生產單元5,6及第2型生產單元7,8。Production line 1 consists of four continuous galvanic production units, which are considered to be A preferred embodiment of the inventive device. The first two production units 5, 6 are preferred embodiments of the first type of the apparatus, and the last two production units 7, 8 are preferred embodiments of the second type of the apparatus. The first type production unit 5, 6 and the second type production unit 7, 8 will be described in more detail later with reference to Figs. 2, 3 and Figs. 4-11, respectively.

生產單元5包含一捲繞系統11,該系統包括一第1帶輪機構12及一第2帶輪機構13。第1帶輪機構12包括五個具有相同直徑D1之第1帶輪14,其等之中心軸定向成同軸且垂直。第2帶輪機構13包括五個同樣具有相同直徑D2之第2帶輪15。如圖3所示,諸第2帶輪15直接配置於彼此上方,惟各具有一與垂直線成一角度α之中心軸16。與第2帶輪15有關之諸中心軸16相互平行延伸。諸第2帶輪15可自由繞其等之中心軸16旋轉,為此,第2帶輪15可旋轉安裝於一固定配置之轂構件19,該轂構件19具有一垂直中心軸。The production unit 5 comprises a winding system 11 comprising a first pulley mechanism 12 and a second pulley mechanism 13. The first pulley mechanism 12 includes five first pulleys 14 having the same diameter D1, and the central axes thereof are oriented coaxially and vertically. The second pulley mechanism 13 includes five second pulleys 15 which also have the same diameter D2. As shown in Fig. 3, the second pulleys 15 are disposed directly above each other, but each has a central axis 16 at an angle a to the vertical. The central shafts 16 associated with the second pulley 15 extend parallel to each other. The second pulleys 15 are free to rotate about their central axis 16. For this purpose, the second pulley 15 is rotatably mounted to a fixedly disposed hub member 19 having a vertical central axis.

帶形基板2依次分別越過第1帶輪機構12及第2帶輪機構13之帶輪14,15,繞諸第1帶輪14及繞諸第2帶輪15之偏轉角15為180度。帶輪14及15之相對位置經過選擇,俾偏轉角始於一第2帶輪15上之入口21(圖1c)點之位置位於與帶形基板2離開帶輪14之位置相同的垂直高度。進一步選擇角度α及直徑D2,俾(D2=D1/cos(α))若成上述偏轉角,位於第2帶輪15之偏轉角端部的出口點22即處在和位於上方的帶輪14(圖1c中之14’)相同之垂直高度。結果,帶形基板2只要延伸於連續帶輪14,15間,即僅繞帶形基板之中立線成一角度 α扭轉,惟該中立線持續正好水平延伸。於本較佳實施例中,角度α之大小為3度。最佳角度部分取決於材料性質及帶形基板2之尺寸。明確地說,由於第2帶輪15之偏轉角為180度,因此,儘管第2帶輪15傾斜定向,帶形基板2仍不僅正好沿水平方向接近第2帶輪15,且在偏轉180度之後,正好沿水平方向離開第2帶輪15。The strip-shaped substrate 2 sequentially passes over the pulleys 14, 15 of the first pulley mechanism 12 and the second pulley mechanism 13, respectively, and the deflection angle 15 around the first pulleys 14 and the second pulleys 15 is 180 degrees. The relative positions of the pulleys 14 and 15 are selected such that the position at which the yaw deflection angle starts at the point of the entrance 21 (Fig. 1c) on the second pulley 15 is at the same vertical height as the position at which the strip substrate 2 leaves the pulley 14. Further, the angle α and the diameter D2 are further selected, and if 俾(D2=D1/cos(α)) is the above-described deflection angle, the exit point 22 located at the end of the deflection angle of the second pulley 15 is the pulley 14 located above and above. (14' in Figure 1c) the same vertical height. As a result, the strip-shaped substrate 2 only extends between the continuous pulleys 14, 15, that is, only at an angle to the vertical line of the strip-shaped substrate. α is reversed, but the neutral line continues to extend exactly horizontally. In the preferred embodiment, the angle α is 3 degrees. The optimum angle depends in part on the nature of the material and the size of the strip substrate 2. Specifically, since the deflection angle of the second pulley 15 is 180 degrees, the strip substrate 2 is not only approaching the second pulley 15 in the horizontal direction but also deflecting 180 degrees, although the second pulley 15 is obliquely oriented. Thereafter, the second pulley 15 is just separated in the horizontal direction.

如以上說明選擇尺寸及方位之重要優點在於,除了沿帶形基板2之縱向略微承受拉力外,僅於帶輪14,15間承受扭力。更具體而言,無力量橫向作用於帶形基板2的平面中,該力量可能導致帶形基板2於其垂直於帶形基板2之縱向的平面中移動越過帶輪14,15,這導致帶形基板2的高度穩定導引,並顯著減少或者甚至於排除起皺的任何傾向。An important advantage of selecting the size and orientation as described above is that, except for slightly pulling the tensile force along the longitudinal direction of the strip-shaped substrate 2, only the pulleys 14, 15 are subjected to the torsion. More specifically, no force acts laterally on the plane of the strip substrate 2, which force may cause the strip substrate 2 to move across the pulleys 14, 15 in a plane perpendicular to the longitudinal direction of the strip substrate 2, which results in a belt The height of the shaped substrate 2 is stably guided and significantly reduces or even eliminates any tendency to wrinkle.

驅動機構25設在第1帶輪機構12下方以驅動帶形基板2,該驅動機構僅旋轉第1帶輪機構12之最上位帶輪14。一方面,帶輪14,15好比是被帶形基板2拉動,該帶形基板2藉某些拉力越過個別帶輪14,15,另一方面,其等被帶輪14,15間的有限磨擦驅動。由於帶形基板2不可避免地拉長,因此,各種帶輪14,15不會以相同角速度移動,俾大體上,無需帶形基板2與帶輪14,15間的滑動。因此,此種滑動儘管達到極有限程度,卻發生於相鄰帶輪14,15間。The drive mechanism 25 is provided below the first pulley mechanism 12 to drive the strip substrate 2, and the drive mechanism rotates only the uppermost pulley 14 of the first pulley mechanism 12. On the one hand, the pulleys 14, 15 are like being pulled by the strip-shaped substrate 2, the strip-shaped substrate 2 being over the individual pulleys 14, 15 by some pulling force, and on the other hand, the limited friction between the pulleys 14, 15 drive. Since the strip-shaped substrate 2 is inevitably elongated, the various pulleys 14, 15 are not moved at the same angular velocity, and substantially no sliding between the strip-shaped substrate 2 and the pulleys 14, 15 is required. Therefore, such sliding occurs to a very limited extent, but occurs between adjacent pulleys 14,15.

圖2顯示捲繞系統5容納於一箱型容器27中的方式,於該容器27之端面,分別在供應側3及排出側4設置 諸開口28,29,使帶形基板2可通過該等開口28,29,其中帶形基板2於相同垂直平面,延伸於開口28,29中,惟,帶形基板2位於開口29中較開口28更高處。如熟於此技藝人士觀看圖1b當知,此高度的不同於生產單元6中再度完全消除。2 shows the manner in which the winding system 5 is housed in a box type container 27, and the end faces of the container 27 are provided on the supply side 3 and the discharge side 4, respectively. The openings 28, 29 allow the strip substrate 2 to pass through the openings 28, 29, wherein the strip substrate 2 extends in the openings 28, 29 in the same vertical plane, except that the strip substrate 2 is open in the opening 29. 28 higher. As will be appreciated by those skilled in the art, as seen in Figure 1b, this height is again completely eliminated from the production unit 6.

一電解槽30設於箱型容器27之長度的半途,帶輪機構12,13間,於該槽中,在使用時,一電解液達到帶形基板2之最上位捲繞上側之上方的液面31。通道34,35及36,37設在電解槽30之端壁32,33,此等通道於圖2中具有較實務所期望更大的寬度。實務上,選擇通道34-37的寬度,俾帶形基板2可正好通過通道34-37而不會與其等接觸。An electrolytic cell 30 is disposed halfway between the lengths of the box-shaped containers 27, between the pulley mechanisms 12, 13 in which an electrolyte reaches the liquid above the uppermost winding upper side of the strip-shaped substrate 2 in use. Face 31. Channels 34, 35 and 36, 37 are provided at the end walls 32, 33 of the electrolytic cell 30, which have a greater width than would be expected in Figure 2. In practice, the width of the channels 34-37 is selected and the ribbon substrate 2 can pass through the channels 34-37 without being in contact therewith.

滴盤38,39分別設在壁32,33與第1帶輪機構12及第2帶輪機構13間,以承接來自槽30,經由通道34-37而從此槽漏出的液體。藉循環機構(未圖示)使該液體退回至槽30。The drip trays 38, 39 are provided between the walls 32, 33 and the first pulley mechanism 12 and the second pulley mechanism 13, respectively, to receive the liquid leaking from the grooves from the grooves 30 through the passages 34-37. The liquid is returned to the tank 30 by a circulation mechanism (not shown).

鼓風機構40,41設在滴盤38,3中通道34及37之位置,亦即帶形基板2離開槽30以風乾帶形基板2兩側處,俾該帶形基板2在乾燥或至少略微乾燥狀態下,與第1帶輪14或第2帶輪15之一接觸。The air blowing mechanisms 40, 41 are disposed at the positions of the channels 34 and 37 in the drip trays 38, 3, that is, the strip substrate 2 leaves the slot 30 to air dry the strip substrate 2, and the strip substrate 2 is dry or at least slightly In the dry state, it comes into contact with one of the first pulley 14 or the second pulley 15.

熟於此技藝人士當知,使用一第1型生產單元5於一極小型裝置中,可於槽30中,以高生產速率,電化學沉積一層於帶形基板2之任一側。熟於此技藝人士充分熟悉電解處理,並因此無需進一步解釋。縱使沒必要,亦請僅 注意一陽性材料可出現於槽30中,其溶解於液槽之液體中,並沉澱於帶形基板2之諸側上。替代地,陽性材料亦可溶解於槽30外。為刺激陽性材料之沉澱,一負電壓經由可例如構成帶輪14,15之一部分的接觸機構(未圖示)施加於帶形基板2。It is known to those skilled in the art that a first type of production unit 5 can be electrochemically deposited on either side of the strip substrate 2 at a high production rate using a first type of production unit 5 in a very small device. Those skilled in the art are well acquainted with the electrolytic treatment and therefore need no further explanation. Even if it is not necessary, please only Note that a positive material may be present in the tank 30, which dissolves in the liquid in the tank and settles on the sides of the strip substrate 2. Alternatively, the positive material may also dissolve outside of the tank 30. To stimulate precipitation of the positive material, a negative voltage is applied to the strip substrate 2 via a contact mechanism (not shown) that may, for example, form part of the pulleys 14, 15.

生產單元6大部分類似於生產單元5,其不同點在於帶形基板2之行進路徑中的垂直變化發生於個別生產單元5,6之相反方向中,這就是為何於生產單元6中,僅第1帶輪機構12之最下位帶輪14被驅動,而非如於生產單元5實例中最下位帶輪14被驅動的理由。The production unit 6 is mostly similar to the production unit 5, with the difference that the vertical variation in the path of travel of the strip substrate 2 occurs in the opposite direction of the individual production units 5, 6, which is why in the production unit 6, only the The lowermost pulley 14 of the pulley mechanism 12 is driven instead of the reason why the lowermost pulley 14 is driven as in the example of the production unit 5.

圖4-11更詳細顯示第2較佳實施例之一生產單元7。有鑑於生產單元7,8的極大類似性,幾乎無須對業已研讀過生產單元7之說明之熟稔人士解釋生產單元8。Figures 4-11 show in more detail one of the production units 7 of the second preferred embodiment. In view of the great similarities of the production units 7, 8, it is almost unnecessary to explain the production unit 8 to those skilled in the art who have studied the description of the production unit 7.

生產單元7包括一捲繞系統51,該系統包括第1帶輪機構52、第2帶輪機構53及第3帶輪機構54。第1帶輪機構52在包括許多個第1帶輪55,其中心軸同軸且垂直定向的意義上,相當於生產單元5之第1帶輪機構12。僅最上位帶輪55可旋轉地被驅動馬達56驅動。The production unit 7 includes a winding system 51 including a first pulley mechanism 52, a second pulley mechanism 53, and a third pulley mechanism 54. The first pulley mechanism 52 corresponds to the first pulley mechanism 12 of the production unit 5 in the sense that a plurality of first pulleys 55 are included, and the central axis thereof is coaxial and vertically oriented. Only the uppermost pulley 55 is rotatably driven by the drive motor 56.

第2帶輪機構53及第3帶輪機構54依次在其分別各包括許多個第2帶輪57及第3帶輪58,就各帶輪機構53,54而言直接配置於彼此上方的意義上,相當於生產單元5之第2帶輪機構13。與第2帶輪57及第3帶輪58有關的中心軸各與垂直線成約3度的角度α,並相互平行延伸。第2帶輪57及第3帶輪58相對於彼此如此定位,俾 於圖11之視圖中,個別帶輪57,58相互成直線。帶輪57,58進一步設有接觸機構(未圖示),用來將負電壓施加於帶形基板2以進行電鍍處理。The second pulley mechanism 53 and the third pulley mechanism 54 sequentially include a plurality of the second pulleys 57 and the third pulleys 58 in this order, and the respective pulley mechanisms 53 and 54 are directly disposed above each other. The upper portion corresponds to the second pulley mechanism 13 of the production unit 5. The central axes associated with the second pulley 57 and the third pulley 58 each have an angle α of about 3 degrees with respect to the vertical line and extend in parallel with each other. The second pulley 57 and the third pulley 58 are positioned relative to each other, 俾 In the view of Fig. 11, the individual pulleys 57, 58 are in line with each other. The pulleys 57, 58 are further provided with a contact mechanism (not shown) for applying a negative voltage to the strip substrate 2 for plating treatment.

帶形基板2以繞第1帶輪55成180度的偏轉角度及繞第2帶輪57和第3帶輪58成90度的偏轉角度輪流越過個別帶輪機構52,53,54之帶輪55,57,58。因此,第2帶輪57及第3帶輪58的偏轉角度相加成為180度。The strip-shaped substrate 2 alternately passes over the pulleys of the individual pulley mechanisms 52, 53, 54 in a deflection angle of 180 degrees around the first pulley 55 and a deflection angle of 90 degrees around the second pulley 57 and the third pulley 58. 55, 57, 58. Therefore, the deflection angles of the second pulley 57 and the third pulley 58 are added to be 180 degrees.

選擇帶輪55與57的相對位置,俾帶形基板2(之中立線)只要延伸於連續帶輪55,57之間,即正好水平延伸,並僅約成角度α,在此範圍內扭轉。由於連續帶輪57及58相互成直線(圖11),且個別偏轉角度為90度,帶形基板2向上傾斜(無任何扭力)於帶輪57,58之間,隨後再度於帶輪58之90度偏轉角度端部沿正好方向離開帶輪58。因此,事實上,帶輪57,58共同具有與有關生產單元5之帶輪15相同的功能,亦即,將帶形基板2移至更高(或者,對生產單元6,8而言,更低)高度,俾形成次一捲繞,而不會於帶形基板2中醞釀任何橫向力量。相較於一帶輪機構13之使用,二帶輪機構53,54之使用優點特別是在於二帶輪機構53,54之使用需要有限的空間量。The relative positions of the pulleys 55 and 57 are selected, and the ribbon-shaped substrate 2 (the neutral line) extends between the continuous pulleys 55, 57, i.e., just horizontally, and is only about an angle α, and is twisted within this range. Since the continuous pulleys 57 and 58 are in line with each other (Fig. 11), and the individual deflection angles are 90 degrees, the strip substrate 2 is inclined upward (without any torque) between the pulleys 57, 58 and then again to the pulley 58. The 90 degree deflection angle end exits the pulley 58 in the right direction. Thus, in fact, the pulleys 57, 58 together have the same function as the pulley 15 of the associated production unit 5, i.e., moving the strip substrate 2 to a higher level (or, for the production units 6, 8 At a low height, the crucible forms a second winding without any lateral force being brewed in the strip substrate 2. In contrast to the use of a pulley mechanism 13, the use of the two pulley mechanisms 53, 54 is particularly advantageous in that the use of the two pulley mechanisms 53, 54 requires a limited amount of space.

捲繞系統51容納於一方形箱型容器71中。開口61(圖6),62(圖4)相互成直線設於箱型容器71之對置壁中,以容許帶形基板2通過。一至少實質上C形液槽72設在容器71內中央處,對第1帶輪55而言,180°偏轉角度之一部分的外側。第1帶輪機構52之外側形成C形液 槽72內側上之直立壁的一部分,而C形液槽72之外側壁的一部分以參考號碼73標示。C形液槽72之圓周進一步以諸端壁74界定,此等端壁74自第1帶輪機構52延伸並連結外壁73。The winding system 51 is housed in a square box type container 71. Openings 61 (Fig. 6), 62 (Fig. 4) are disposed in line with each other in the opposing wall of the box-shaped container 71 to allow the strip-shaped substrate 2 to pass. An at least substantially C-shaped liquid channel 72 is provided at the center of the container 71, and the first pulley 55 has an outer side of one of the 180° deflection angles. C-shaped liquid is formed on the outer side of the first pulley mechanism 52 A portion of the upstanding wall on the inside of the trough 72, and a portion of the outer side wall of the C-shaped trough 72 is indicated by reference numeral 73. The circumference of the C-shaped reservoir 72 is further defined by end walls 74 that extend from the first pulley mechanism 52 and join the outer wall 73.

於C形液槽72中設置一例如呈球形之陽極籃75,以保持陽極材料。該陽極材料經由陽極連接器76陽極連接。於使用中,C形液槽72注滿電解液至高於帶形基板2之最上面捲繞之高度。於C形液槽72中,沿C形液槽72長度之較大部分延伸之弧曲、水平延伸之諸屏蔽帶77設在距諸帶輪55之外側較短距離,諸屏蔽帶77可通過其間之轉換處。An anode basket 75, for example, spherical, is disposed in the C-shaped liquid tank 72 to hold the anode material. The anode material is anodically connected via an anode connector 76. In use, the C-shaped liquid tank 72 is filled with the electrolyte to a height higher than the uppermost winding of the strip substrate 2. In the C-shaped liquid tank 72, the curved and horizontally extending shielding belts 77 extending along a larger portion of the length of the C-shaped liquid tank 72 are disposed at a shorter distance from the outer sides of the pulleys 55, and the shielding belts 77 can pass through. The transition between them.

如於圖7、9、10中特別顯示,第1帶輪55環周設有諸溝槽79,其等之底部由一彈性、帶形遮罩體80製成,該遮罩體80沿溝槽79之全周延伸。遮罩體80例如由橡膠製成。溝槽79之寬度略大於帶形基板2之寬度,結果,一具有約0.3mm寬度之間隙出現於溝槽79之直立壁與帶形基板2之縱緣間。遮罩體80之與帶形基板2抵接之一側於縱緣具有一向上傾斜部82(參考圖10),該部正好在帶形基板2之寬度內開始,從而確保帶形基板2與遮罩體80之適當抵接,結果,帶形基板2之電解處理僅發生於帶形基板2之外側,於圖7,9,10中帶形基板2遠厚於實際使用者。As particularly shown in Figures 7, 9, and 10, the first pulley 55 is circumferentially provided with grooves 79, the bottom of which is formed of an elastic, band-shaped shield 80 which is along the groove. The groove 79 extends all the way. The mask body 80 is made of, for example, rubber. The width of the groove 79 is slightly larger than the width of the strip substrate 2, and as a result, a gap having a width of about 0.3 mm appears between the upright wall of the groove 79 and the longitudinal edge of the strip substrate 2. One of the mask bodies 80 abutting the strip substrate 2 has an upward inclined portion 82 (refer to FIG. 10) on the longitudinal edge, which starts within the width of the strip substrate 2, thereby ensuring the strip substrate 2 and As a result, the mask body 80 is properly abutted. As a result, the electrolytic treatment of the strip substrate 2 occurs only on the outer side of the strip substrate 2, and the strip substrate 2 is much thicker than the actual user in Figs. 7, 9, and 10.

於遠離C形液槽72之一側,生產單元7設有滴盤91,其事實上於第1帶輪52下方形成一共用滴盤。該滴盤用來從C形液槽72承接經由諸端面壁74之向內定向端與第1帶輪 52之外側間的間隙漏出C形液槽72的液體。該液體藉一循環機構(未圖示)抽回C形液槽72。On the side remote from one side of the C-shaped liquid tank 72, the production unit 7 is provided with a drip pan 91 which in fact forms a common drip tray below the first pulley 52. The drip tray is adapted to receive from the C-shaped liquid channel 72 through the inwardly directed end of the end wall 74 and the first pulley The gap between the outer sides of 52 leaks out of the liquid of the C-shaped liquid tank 72. The liquid is withdrawn into the C-shaped liquid tank 72 by a circulation mechanism (not shown).

諸密封板83設在第1帶輪52之外側上,二者位於圖8,9,10所示諸段部並接近諸端面壁74,帶形基板2可正好通過而不與其接觸。諸密封板83設有伸入溝槽79內之諸突起84。諸密封板83之尺寸及位置定成一小間隙出現於包含帶形基板2與包含諸密封板83之第1帶輪52間。接近諸端面壁74之諸密封板83擬減少自C形液槽72漏洩,而圖8,9,10所示諸密封板83則擬防止撥濺液體自滴盤91通過此等密封。Sealing plates 83 are provided on the outer sides of the first pulley 52, which are located at the segments shown in Figs. 8, 9, and 10 and are adjacent to the end face walls 74, and the strip-shaped substrate 2 can pass therethrough without being in contact therewith. The sealing plates 83 are provided with projections 84 that extend into the grooves 79. The size and position of the sealing plates 83 are defined as a small gap between the strip-shaped substrate 2 and the first pulley 52 including the sealing plates 83. The sealing plates 83 adjacent the end face walls 74 are intended to reduce leakage from the C-shaped liquid channel 72, while the sealing plates 83 shown in Figures 8, 9, 10 are intended to prevent splashing liquid from passing through the drip tray 91 through such seals.

熟稔人士於精研生產單元7之以上說明後,亦瞭解生產單元8之操作及構造。於生產單元8內,帶形基板2回到與帶形基板2接近生產單元7之高度相同之垂直高度。於生產單元8中,最下面第1帶輪55取代最上面第1帶輪55被可旋轉驅動。The skilled person understands the operation and construction of the production unit 8 after the above description of the production unit 7. In the production unit 8, the strip substrate 2 returns to the same vertical height as the strip substrate 2 is close to the height of the production unit 7. In the production unit 8, the lowermost first pulley 55 is rotatably driven in place of the uppermost first pulley 55.

如熟於此技藝人士當知,本發明不限於上述本發明之較佳實施例,惟,本發明之範圍首先由隨附申請專利範圍所決定。替代地,亦可於本發明之架構內例如使用第1、第2及可能的話第3帶輪機構,其等之相關旋轉軸水平而非(實質上)垂直定向。第2旋轉軸(諸軸)及可能的話第3旋轉軸(諸軸)包含一自俯視圖看來,與第1旋轉軸所成角度,第2帶輪機構且可能的話第3帶輪機構以設在第1帶輪機構上方較佳。雖然於較佳實施例之以上說明中一貫地提及一捲繞系統,帶形基板被以許多捲繞,繞該捲 繞系統,導入一螺旋路徑中,惟,替代地,例如(不過,非唯一)為使帶形基板通過一沖洗液槽,亦極可能於本發明之架構內使用一捲繞系統,帶形基板被僅以一捲繞,繞該捲繞系統,導入一螺旋路徑中。The invention is not limited to the preferred embodiments of the invention described above, but the scope of the invention is first determined by the scope of the appended claims. Alternatively, it is also possible to use, for example, the first, second and possibly third pulley mechanisms within the framework of the invention, such that the associated axis of rotation is horizontal rather than (substantially) vertically oriented. The second rotating shaft (the shafts) and, if possible, the third rotating shaft (the shafts) comprise an angle formed by the first rotating shaft from the top view, the second pulley mechanism and possibly the third pulley mechanism It is preferably above the first pulley mechanism. Although a winding system has been consistently mentioned in the above description of the preferred embodiment, the tape substrate is wound in a number of windings around the roll. Around the system, into a spiral path, but alternatively, for example (but not exclusively) to pass the strip substrate through a rinse bath, it is highly likely that a winding system, strip substrate, is used within the architecture of the present invention. It is wound around the winding system and introduced into a spiral path.

1‧‧‧生產線1‧‧‧Production line

2‧‧‧帶形基板2‧‧‧Banded substrate

3‧‧‧供應側3‧‧‧Supply side

4‧‧‧排出側4‧‧‧ discharge side

5,6‧‧‧生產單元5,6‧‧‧Production unit

7,8‧‧‧生產單元7,8‧‧‧Production unit

11‧‧‧捲繞系統11‧‧‧Winding system

12‧‧‧第1帶輪機構12‧‧‧1st pulley mechanism

13‧‧‧第2帶輪機構13‧‧‧2nd pulley mechanism

14‧‧‧第1帶輪14‧‧‧1st pulley

15‧‧‧第2帶輪15‧‧‧2nd pulley

19‧‧‧轂構件19‧‧‧ Hub components

21‧‧‧入口點21‧‧‧ entry point

22‧‧‧出口點22‧‧‧Export point

25‧‧‧驅動機構25‧‧‧ drive mechanism

28,29‧‧‧開口28,29‧‧‧ openings

30‧‧‧電解機構30‧‧‧Electrical institutions

31‧‧‧液面31‧‧‧ liquid level

32,33‧‧‧端壁32,33‧‧‧End wall

34,35‧‧‧通道34, 35‧‧‧ channel

36,37‧‧‧通道36, 37‧‧‧ channel

38,39‧‧‧滴盤38, 39‧‧‧ drip tray

51‧‧‧捲繞系統51‧‧‧Winding system

52‧‧‧第1帶輪機構52‧‧‧1st pulley mechanism

53‧‧‧第2帶輪機構53‧‧‧2nd pulley mechanism

54‧‧‧第3帶輪機構54‧‧‧3rd pulley mechanism

55‧‧‧第1帶輪55‧‧‧1st pulley

56‧‧‧驅動馬達56‧‧‧Drive motor

57‧‧‧第2帶輪57‧‧‧2nd pulley

58‧‧‧第3帶輪58‧‧‧3rd pulley

61,62‧‧‧開口61,62‧‧‧ openings

71‧‧‧箱型容器71‧‧‧Box container

72‧‧‧C形液槽72‧‧‧C-shaped tank

73‧‧‧C形之外側73‧‧‧C-shaped side

74‧‧‧端面壁74‧‧‧ face wall

75‧‧‧陽極籃75‧‧‧Anode basket

77‧‧‧屏蔽帶77‧‧‧Shielding tape

79‧‧‧溝槽79‧‧‧ trench

80‧‧‧遮罩體80‧‧‧ mask body

81‧‧‧間隙81‧‧‧ gap

82‧‧‧傾斜部82‧‧‧ inclined section

83‧‧‧密封板83‧‧‧ Sealing plate

84‧‧‧突起84‧‧‧Protrusion

圖1a及1b分別俯視及側視示意顯示一用來以液體處理帶形基板的生產線,該生產線包括二個本發明之較佳實施例;圖1c係根據二個第1帶輪及一個第2帶輪於圖1b中之箭頭1c之示意、透明視圖;圖2係第1較佳實施例之部分剖開等角視圖;圖3係沿圖2中III-III線之誇大比例之剖視圖;圖4係第2較佳實施例之部分剖開等角視圖;圖5係圖4之俯視圖;圖6係沿圖5中VI-VI線之剖視圖;圖7顯示圖6之細節;圖8係沿圖5中VIII-VIII線之剖視圖;圖9顯示圖8之細節;圖10顯示圖9之細節;以及圖11係沿圖5中XI-XI線之剖視圖。1a and 1b show a production line for treating a tape-shaped substrate with a liquid, respectively, in a plan view and a side view, the production line comprising two preferred embodiments of the invention; Figure 1c is based on two first pulleys and one second 2 is a schematic, transparent view of the arrow 1c in FIG. 1b; FIG. 2 is a partially cutaway isometric view of the first preferred embodiment; FIG. 3 is a cross-sectional view along the line III-III of FIG. 4 is a partially cutaway isometric view of the second preferred embodiment; FIG. 5 is a plan view of FIG. 4; FIG. 6 is a cross-sectional view taken along line VI-VI of FIG. 5; FIG. 7 shows the details of FIG. Figure 5 is a cross-sectional view taken along line VIII-VIII; Figure 9 is a view showing the detail of Figure 8; Figure 10 is a view taken along line XI-XI of Figure 5;

7‧‧‧生產單元7‧‧‧Production unit

51‧‧‧捲繞系統51‧‧‧Winding system

52‧‧‧第1帶輪機構52‧‧‧1st pulley mechanism

53‧‧‧第2帶輪機構53‧‧‧2nd pulley mechanism

62‧‧‧開口62‧‧‧ openings

71‧‧‧箱型容器71‧‧‧Box container

Claims (36)

一種以液體處理帶形基板的裝置,該裝置包括一運送系統,用來運送該帶形基板,該運送系統包括一捲繞系統,用來以至少一捲繞,繞該捲繞系統,將該帶形基板導入一螺旋路徑中,該捲繞系統包括:第1帶輪機構,其可繞一第1旋轉軸旋轉,用來繞該第1帶輪機構之圓周的一部分,成一第1偏轉角度導引該帶形基板之該至少一捲繞,以及第2帶輪機構,用來繞該第2帶輪機構之圓周的一部分,成一第2偏轉角度導引該帶形基板之該至少一捲繞,該第2帶輪機構包括一第2帶輪,其可就各捲繞,繞一第2旋轉軸旋轉,該裝置進一步包括一液槽,其中該帶形基板通過該液槽中之液體,延伸越過該至少一捲繞之長度的至少一部分,其特徵在於,各第2帶輪之第2旋轉軸與第1旋轉軸成一角度α。 An apparatus for processing a strip substrate in a liquid, the apparatus including a transport system for transporting the strip substrate, the transport system including a winding system for winding at least one winding around the winding system The strip substrate is introduced into a spiral path, the winding system comprising: a first pulley mechanism rotatable about a first axis of rotation for forming a first deflection angle around a portion of the circumference of the first pulley mechanism Directing the at least one winding of the strip substrate, and the second pulley mechanism for guiding the at least one roll of the strip substrate at a second deflection angle around a portion of the circumference of the second pulley mechanism Winding, the second pulley mechanism includes a second pulley that is rotatable about a second rotating shaft for each winding. The device further includes a liquid tank, wherein the strip substrate passes through the liquid in the liquid tank And extending over at least a portion of the length of the at least one winding, wherein the second rotation axis of each of the second pulleys forms an angle α with the first rotation axis. 如申請專利範圍第1項之裝置,其中,該第2帶輪機構包括許多第2帶輪。 The apparatus of claim 1, wherein the second pulley mechanism includes a plurality of second pulleys. 如申請專利範圍第2項之裝置,其中,該等第2帶輪具有相等直徑。 The device of claim 2, wherein the second pulleys have equal diameters. 如申請專利範圍第1項之裝置,其中,與該等個別第2帶輪有關之第2旋轉軸相互平行延伸。 The apparatus of claim 1, wherein the second rotating shafts associated with the individual second pulleys extend parallel to each other. 如申請專利範圍第1項之裝置,其中,該第1帶輪機構於該至少一捲繞被該第1帶輪機構所導引處具有一第1直徑D1,各該第2帶輪於一捲繞被該第2帶輪所導引之相關位置具有一第2直徑D2,其中第2直徑D2大於第1直徑D1。 The device of claim 1, wherein the first pulley mechanism has a first diameter D1 at which the at least one winding is guided by the first pulley mechanism, and each of the second pulleys The associated position guided by the second pulley has a second diameter D2, wherein the second diameter D2 is greater than the first diameter D1. 如申請專利範圍第5項之裝置,其中,第2直徑D2之尺寸等於被cos(α)所分之第1直徑D1的尺寸。 The apparatus of claim 5, wherein the size of the second diameter D2 is equal to the size of the first diameter D1 divided by cos(α). 如申請專利範圍第1項之裝置,其中,第1偏轉角度及第2偏轉角度均等於180度。 The apparatus of claim 1, wherein the first deflection angle and the second deflection angle are both equal to 180 degrees. 如申請專利範圍第1項之裝置,其中,該捲繞系統包括第3帶輪機構,用來繞第3帶輪機構之圓周的一部分,成一第3偏轉角度導引該帶形基板之該至少一捲繞,該第3帶輪機構包括一用於各捲繞,可繞一第3旋轉軸旋轉之第3帶輪,各該第3帶輪平行於一相關第2帶輪延伸。 The apparatus of claim 1, wherein the winding system includes a third pulley mechanism for guiding the at least a portion of the circumference of the third pulley mechanism to the at least one third deflection angle of the strip substrate Upon winding, the third pulley mechanism includes a third pulley for each winding that is rotatable about a third axis of rotation, each of the third pulleys extending parallel to an associated second pulley. 如申請專利範圍第8項之裝置,其中,第2偏轉角度與第3偏轉角度的總和等於180度。 The apparatus of claim 8, wherein the sum of the second deflection angle and the third deflection angle is equal to 180 degrees. 如申請專利範圍第8項之裝置,其中,該第2帶輪機構及該第3帶輪機構均與該第1帶輪機構隔相同距離。 The apparatus of claim 8, wherein the second pulley mechanism and the third pulley mechanism are both at the same distance from the first pulley mechanism. 如申請專利範圍第1項之裝置,其中,該液槽設於該第1帶輪機構與該第2帶輪機構之間。 The apparatus of claim 1, wherein the liquid tank is provided between the first pulley mechanism and the second pulley mechanism. 如申請專利範圍第1項之裝置,其中,該液槽沿第1偏轉角的一部分延伸於該第1帶輪機構之外側上。 The apparatus of claim 1, wherein the liquid tank extends along a portion of the first deflection angle on an outer side of the first pulley mechanism. 如申請專利範圍第12項之裝置,其中,該第1帶 輪機構於該液槽中對面朝該第1帶輪機構之該帶形基板側形成一掩模,俾該帶形基板藉該液體,僅在遠離該第1帶輪機構的一側處理帶形基板。 Such as the device of claim 12, wherein the first band The wheel mechanism forms a mask on the side of the strip substrate facing the first pulley mechanism in the liquid tank, and the strip substrate borrows the liquid to process the strip shape only on the side away from the first pulley mechanism Substrate. 如申請專利範圍第12項之裝置,其中,該第1帶輪機構包括一用於各捲繞之接觸表面,該接觸表面於該帶形基板之縱緣向上傾斜。 The device of claim 12, wherein the first pulley mechanism includes a contact surface for each winding, the contact surface being inclined upwardly at a longitudinal edge of the strip substrate. 如申請專利範圍第12項之裝置,其中,該第1帶輪機構包括一溝槽,其具有一底部及二個連結該底部,用於各捲繞之直立緣,其中該帶形基板抵接該底部,且該帶形基板之縱緣以不接觸諸直立緣較佳。 The device of claim 12, wherein the first pulley mechanism comprises a groove having a bottom portion and two bottom portions for the winding upright edges, wherein the strip substrate abuts The bottom portion and the vertical edge of the strip substrate are preferably not in contact with the erect edges. 如申請專利範圍第15項之裝置,其中,於該帶形基板之縱緣與該溝槽之直立緣間有最大1mm的間隙。 The device of claim 15 wherein there is a gap of at most 1 mm between the longitudinal edge of the strip substrate and the upstanding edge of the trench. 如申請專利範圍第1項之裝置,其中,該第1旋轉軸具有一垂直定向或一最大偏離10度的定向。 The device of claim 1, wherein the first rotating shaft has a vertical orientation or an orientation that is offset by a maximum of 10 degrees. 如申請專利範圍第1項之裝置,其中,該第1旋轉軸具有一水平定向。 The apparatus of claim 1, wherein the first rotating shaft has a horizontal orientation. 如申請專利範圍第1項之裝置,其中,至少一通道設在該液槽之至少一壁上,該帶形基板可通過該通道。 The device of claim 1, wherein at least one channel is disposed on at least one wall of the liquid tank, and the strip substrate can pass through the channel. 如申請專利範圍第19項之裝置,其中,配置該通道以容許該帶形基板通過而不與其接觸。 The device of claim 19, wherein the channel is configured to allow the strip substrate to pass without being in contact therewith. 如申請專利範圍第19項之裝置,其中,一滴盤設在該通道遠離該液槽內部之一側上。 The device of claim 19, wherein a drop of the disc is disposed on a side of the passage away from the interior of the tank. 如申請專利範圍第21項之裝置,其中,設置一循環機構,俾進入該滴盤之該液體經由一通道回到該液槽。 The apparatus of claim 21, wherein a circulation mechanism is provided, and the liquid entering the drip tray is returned to the liquid tank via a passage. 如申請專利範圍第1項之裝置,其中,配置該捲繞系統,俾以許多捲繞,繞該捲繞系統,將該帶形基板導入一螺旋路徑中,其中,配置該第1帶輪機構及該第2帶輪機構,以導引於許多相鄰位置隔開一間距的許多捲繞。 The apparatus of claim 1, wherein the winding system is disposed, and the plurality of windings are wound around the winding system to introduce the strip substrate into a spiral path, wherein the first pulley mechanism is disposed And the second pulley mechanism is configured to guide a plurality of windings spaced apart by a plurality of adjacent positions. 如申請專利範圍第1項之裝置,其中,該角度α在2與30度間的範圍內。 The device of claim 1, wherein the angle α is in a range between 2 and 30 degrees. 如申請專利範圍第1項之裝置,其中,該第1帶輪機構包括一第1帶輪,其可供各捲繞,繞一第1旋轉軸旋轉,其中,個別之第1旋轉軸同軸。 The apparatus of claim 1, wherein the first pulley mechanism includes a first pulley that is rotatable about each of the first rotating shafts, wherein the respective first rotating shafts are coaxial. 如申請專利範圍第25項之裝置,其中,該運送機構包括一驅動機構,用來可旋轉驅動一單一第1帶輪。 The device of claim 25, wherein the transport mechanism includes a drive mechanism for rotatably driving a single first pulley. 如申請專利範圍第26項之裝置,其中,該單一第1帶輪係一最外面的第1帶輪。 The apparatus of claim 26, wherein the single first pulley is an outermost first pulley. 如申請專利範圍第1項之裝置,其中,該帶形基板僅在該捲繞系統之一側上與形成該捲繞系統之一部分之該該帶輪機構接觸。 The apparatus of claim 1, wherein the strip substrate is in contact with the pulley mechanism forming a portion of the winding system only on one side of the winding system. 如申請專利範圍第1至28項中任一項之裝置,其中,該液槽係流電(galvanic)槽。 The apparatus of any one of claims 1 to 28, wherein the liquid tank is a galvanic tank. 一種二個連續的以液體處理帶形基板之裝置的組合,該裝置係如申請專利範圍第1至29項中任一項之裝置,其特徵在於,從平行於有關個別裝置之第1旋轉軸之方向看來,帶形基板沿相反方向移動。 A combination of two consecutive apparatus for processing a strip-shaped substrate in a liquid, the apparatus of any one of claims 1 to 29, characterized in that it is parallel to the first axis of rotation of the individual device In the direction of the strip, the strip substrate moves in the opposite direction. 一種以液體處理帶形基板的方法,包括藉一運送系統,將帶形基板運送通過一液槽之步驟,該運送系統包 括一捲繞系統,用來以至少一捲繞,繞該捲繞系統,將該帶形基板導入一螺旋路徑中,該捲繞系統包括:第1帶輪機構,其可繞一第1旋轉軸旋轉,用來繞該第1帶輪機構之圓周的一部分,成一第1偏轉角度導引該帶形基板之該至少一捲繞,以及第2帶輪機構,用來繞該第2帶輪機構之圓周的一部分,成一第2偏轉角度導引該帶形基板之該至少一捲繞,該第2帶輪機構包括一第2帶輪,其可供各捲繞,繞一第2旋轉軸旋轉,該裝置進一步包括一液槽,其中該帶形基板通過該液槽中之液體,延伸越過該至少一捲繞之長度的至少一部分,其特徵在於,各第2帶輪之第2旋轉軸與第1旋轉軸成一角度α。 A method of processing a strip substrate in a liquid, comprising the steps of transporting a strip substrate through a liquid bath by a transport system, the transport system package a winding system for winding the strip substrate into a spiral path by winding at least one winding, the winding system comprising: a first pulley mechanism capable of rotating around a first a shaft rotation for guiding the at least one winding of the strip substrate at a first deflection angle around a portion of a circumference of the first pulley mechanism, and a second pulley mechanism for winding the second pulley a portion of the circumference of the mechanism guiding the at least one winding of the strip substrate at a second deflection angle, the second pulley mechanism including a second pulley for each winding, around a second axis of rotation Rotating, the apparatus further includes a liquid tank, wherein the strip-shaped substrate extends through the liquid in the liquid tank and extends over at least a portion of the length of the at least one winding, wherein the second rotating shaft of each of the second pulleys An angle α with the first rotating shaft. 如申請專利範圍第31項之方法,其中,以許多捲繞,繞該捲繞系統,將該帶形基板導入一螺旋路徑中。 The method of claim 31, wherein the strip substrate is introduced into a spiral path around the winding system by a plurality of windings. 如申請專利範圍第32項之方法,其中,該帶形基板經過流電處理。 The method of claim 32, wherein the strip substrate is subjected to a galvanic treatment. 如申請專利範圍第32項之方法,其中,該帶形基板由不銹鋼或銅製成。 The method of claim 32, wherein the strip substrate is made of stainless steel or copper. 如申請專利範圍第32項之方法,其中,於該液槽中,銦、硒或鎵沉積於該帶形基板上。 The method of claim 32, wherein in the liquid bath, indium, selenium or gallium is deposited on the strip substrate. 如申請專利範圍第32至35項中任一項之方法,其中,該帶形基板以每分至少2米的速度移動通過該液槽。 The method of any one of claims 32 to 35, wherein the strip substrate is moved through the liquid bath at a speed of at least 2 meters per minute.
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