TWI458853B - - Google Patents
Info
- Publication number
- TWI458853B TWI458853B TW101151274A TW101151274A TWI458853B TW I458853 B TWI458853 B TW I458853B TW 101151274 A TW101151274 A TW 101151274A TW 101151274 A TW101151274 A TW 101151274A TW I458853 B TWI458853 B TW I458853B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210082876.6A CN102615068B (zh) | 2012-03-26 | 2012-03-26 | Mocvd设备的清洁方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201346059A TW201346059A (zh) | 2013-11-16 |
| TWI458853B true TWI458853B (enExample) | 2014-11-01 |
Family
ID=46555472
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101151274A TW201346059A (zh) | 2012-03-26 | 2012-12-28 | 一種ｍｏｃｖｄ設備的清潔方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102615068B (enExample) |
| TW (1) | TW201346059A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103938177B (zh) * | 2014-05-07 | 2015-12-30 | 南昌黄绿照明有限公司 | 可用氯气在线清洗的非钎焊mocvd喷头 |
| CN105986242B (zh) * | 2015-02-16 | 2018-07-13 | 中微半导体设备(上海)有限公司 | 化学气相沉积装置与基片处理方法 |
| CN114540794A (zh) * | 2017-04-14 | 2022-05-27 | 西安德盟特半导体科技有限公司 | 一种去除cvd反应腔体内壁沉积膜的方法及装置 |
| US20220372613A1 (en) * | 2019-09-27 | 2022-11-24 | Vieworks Co., Ltd. | Substrate fixing device for scintillator deposition, substrate deposition apparatus including the same, and method of depositing a scintillator using the same |
| CN118874932B (zh) * | 2024-08-28 | 2025-03-25 | 江苏凯威特斯半导体科技有限公司 | 一种针对半导体化学气相沉积喷淋头的清洗方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010129292A2 (en) * | 2009-04-28 | 2010-11-11 | Applied Materials, Inc. | Cluster tool for leds |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060130971A1 (en) * | 2004-12-21 | 2006-06-22 | Applied Materials, Inc. | Apparatus for generating plasma by RF power |
| RU2008108010A (ru) * | 2005-08-02 | 2009-09-10 | Массачусетс Инститьют Оф Текнолоджи (Us) | Способ применения фторида серы для удаления поверхностных отложений |
| WO2007016631A1 (en) * | 2005-08-02 | 2007-02-08 | Massachusetts Institute Of Technology | Method of using nf3 for removing surface deposits |
| WO2007045110A2 (en) * | 2005-10-17 | 2007-04-26 | Oc Oerlikon Balzers Ag | Cleaning means for large area pecvd devices using a remote plasma source |
| CN100549226C (zh) * | 2006-04-29 | 2009-10-14 | 联华电子股份有限公司 | 化学气相沉积设备的清洁方法 |
| US20070267143A1 (en) * | 2006-05-16 | 2007-11-22 | Applied Materials, Inc. | In situ cleaning of CVD system exhaust |
| US7790635B2 (en) * | 2006-12-14 | 2010-09-07 | Applied Materials, Inc. | Method to increase the compressive stress of PECVD dielectric films |
-
2012
- 2012-03-26 CN CN201210082876.6A patent/CN102615068B/zh active Active
- 2012-12-28 TW TW101151274A patent/TW201346059A/zh unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010129292A2 (en) * | 2009-04-28 | 2010-11-11 | Applied Materials, Inc. | Cluster tool for leds |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102615068B (zh) | 2015-05-20 |
| TW201346059A (zh) | 2013-11-16 |
| CN102615068A (zh) | 2012-08-01 |