TWI445058B - A gasification supply device for a raw material - Google Patents

A gasification supply device for a raw material Download PDF

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Publication number
TWI445058B
TWI445058B TW101108841A TW101108841A TWI445058B TW I445058 B TWI445058 B TW I445058B TW 101108841 A TW101108841 A TW 101108841A TW 101108841 A TW101108841 A TW 101108841A TW I445058 B TWI445058 B TW I445058B
Authority
TW
Taiwan
Prior art keywords
pressure
raw material
flow rate
mixed gas
flow
Prior art date
Application number
TW101108841A
Other languages
English (en)
Chinese (zh)
Other versions
TW201303970A (zh
Inventor
日高敦志
平田薰
永瀨正明
土肥亮介
西野功二
池田信一
Original Assignee
富士金股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士金股份有限公司 filed Critical 富士金股份有限公司
Publication of TW201303970A publication Critical patent/TW201303970A/zh
Application granted granted Critical
Publication of TWI445058B publication Critical patent/TWI445058B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45512—Premixing before introduction in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45557—Pulsed pressure or control pressure
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/7722—Line condition change responsive valves
    • Y10T137/7837—Direct response valves [i.e., check valve type]

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
TW101108841A 2011-04-28 2012-03-15 A gasification supply device for a raw material TWI445058B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011100446A JP5703114B2 (ja) 2011-04-28 2011-04-28 原料の気化供給装置

Publications (2)

Publication Number Publication Date
TW201303970A TW201303970A (zh) 2013-01-16
TWI445058B true TWI445058B (zh) 2014-07-11

Family

ID=47071787

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101108841A TWI445058B (zh) 2011-04-28 2012-03-15 A gasification supply device for a raw material

Country Status (6)

Country Link
US (1) US20140124064A1 (https=)
JP (1) JP5703114B2 (https=)
KR (1) KR101483472B1 (https=)
CN (1) CN103493181B (https=)
TW (1) TWI445058B (https=)
WO (1) WO2012147251A1 (https=)

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CN102534567B (zh) * 2012-03-21 2014-01-15 中微半导体设备(上海)有限公司 控制化学气相沉积腔室内的基底加热的装置及方法
DE102012210332A1 (de) * 2012-06-19 2013-12-19 Osram Opto Semiconductors Gmbh Ald-beschichtungsanlage
JP5837869B2 (ja) 2012-12-06 2015-12-24 株式会社フジキン 原料気化供給装置
JP2015190035A (ja) * 2014-03-28 2015-11-02 東京エレクトロン株式会社 ガス供給機構およびガス供給方法、ならびにそれを用いた成膜装置および成膜方法
US9951423B2 (en) * 2014-10-07 2018-04-24 Lam Research Corporation Systems and methods for measuring entrained vapor
EP3162914A1 (en) * 2015-11-02 2017-05-03 IMEC vzw Apparatus and method for delivering a gaseous precursor to a reaction chamber
JP6565645B2 (ja) * 2015-12-02 2019-08-28 東京エレクトロン株式会社 原料ガス供給装置、原料ガス供給方法及び記憶媒体
KR102483924B1 (ko) 2016-02-18 2023-01-02 삼성전자주식회사 기화기 및 이를 구비하는 박막 증착 장치
IT201700014505A1 (it) * 2017-02-09 2018-08-09 Eurotecnica Melamine Luxemburg Zweigniederlassung In Ittigen Apparato di cristallizzazione di melammina e impianto di melammina impiegante lo stesso
US10947621B2 (en) * 2017-10-23 2021-03-16 Applied Materials, Inc. Low vapor pressure chemical delivery
JP7027151B2 (ja) * 2017-12-13 2022-03-01 株式会社堀場エステック 濃度制御装置、ガス制御システム、成膜装置、濃度制御方法、及び濃度制御装置用プログラム
CN110957235B (zh) * 2018-09-26 2023-03-21 北京北方华创微电子装备有限公司 工艺气体流量补偿的装置及方法、半导体处理设备
US11519070B2 (en) * 2019-02-13 2022-12-06 Horiba Stec, Co., Ltd. Vaporization device, film formation device, program for a concentration control mechanism, and concentration control method
US11661653B2 (en) 2019-12-18 2023-05-30 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Vapor delivery systems for solid and liquid materials
JP7572168B2 (ja) * 2020-05-29 2024-10-23 大陽日酸株式会社 混合ガス供給装置、金属窒化膜の製造装置、及び金属窒化膜の製造方法
JP7158443B2 (ja) * 2020-09-17 2022-10-21 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法、プログラム、および、基板処理方法
CN114927433B (zh) * 2022-05-16 2024-11-26 北京北方华创微电子装备有限公司 半导体工艺设备及其控制方法
CN114911282B (zh) * 2022-05-31 2024-11-26 北京北方华创微电子装备有限公司 源瓶的温度控制系统及方法
FI131053B1 (en) * 2022-06-03 2024-08-20 Canatu Oy Reagent cartridge and reactor apparatus
CN115182041A (zh) * 2022-06-14 2022-10-14 东莞市天域半导体科技有限公司 管路供应系统
TW202432241A (zh) 2022-10-13 2024-08-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 蒸氣遞送設備、氣相反應器及用於監測及控制蒸氣遞送系統之方法
CN117089818A (zh) * 2023-07-11 2023-11-21 中国科学院半导体研究所 金属有机物mo源输运系统和方法
CN119020757B (zh) * 2024-10-24 2025-01-10 内蒙古工业大学 固态源等离子体增强化学气相沉积设备及方法
KR102881618B1 (ko) * 2024-11-26 2025-11-13 (주)쏠라딘 압력 조절 시스템 및 이를 이용한 압력 조절 방법
CN120232575A (zh) * 2025-05-29 2025-07-01 西安二衍机电科技有限公司 一种单晶炉真空管道压力测量方法及装置

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JP2893148B2 (ja) * 1991-10-08 1999-05-17 東京エレクトロン株式会社 処理装置
US6210482B1 (en) * 1999-04-22 2001-04-03 Fujikin Incorporated Apparatus for feeding gases for use in semiconductor manufacturing
JP2001313288A (ja) * 2000-04-28 2001-11-09 Ebara Corp 原料ガス供給装置
US6443435B1 (en) * 2000-10-23 2002-09-03 Applied Materials, Inc. Vaporization of precursors at point of use
JP2003013233A (ja) * 2001-07-04 2003-01-15 Horiba Ltd 液体原料気化供給装置
US6701066B2 (en) * 2001-10-11 2004-03-02 Micron Technology, Inc. Delivery of solid chemical precursors
JP4082901B2 (ja) * 2001-12-28 2008-04-30 忠弘 大見 圧力センサ、圧力制御装置及び圧力式流量制御装置の温度ドリフト補正装置
JP4605790B2 (ja) * 2006-06-27 2011-01-05 株式会社フジキン 原料の気化供給装置及びこれに用いる圧力自動調整装置。
JP2010153741A (ja) * 2008-12-26 2010-07-08 Hitachi Kokusai Electric Inc 半導体装置の製造方法及び基板処理装置
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JP5562712B2 (ja) * 2010-04-30 2014-07-30 東京エレクトロン株式会社 半導体製造装置用のガス供給装置

Also Published As

Publication number Publication date
CN103493181B (zh) 2016-03-09
CN103493181A (zh) 2014-01-01
US20140124064A1 (en) 2014-05-08
KR20130130061A (ko) 2013-11-29
TW201303970A (zh) 2013-01-16
JP2012234860A (ja) 2012-11-29
KR101483472B1 (ko) 2015-01-16
JP5703114B2 (ja) 2015-04-15
WO2012147251A1 (ja) 2012-11-01

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