TWI442178B - Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element - Google Patents

Curable composition, color filter using the same and manufacturing method therefor, and solid image pickup element Download PDF

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TWI442178B
TWI442178B TW097101296A TW97101296A TWI442178B TW I442178 B TWI442178 B TW I442178B TW 097101296 A TW097101296 A TW 097101296A TW 97101296 A TW97101296 A TW 97101296A TW I442178 B TWI442178 B TW I442178B
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compound
curable composition
pigment
color filter
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TW200903153A (en
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Taeko Nakashima
Yushi Kaneko
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Fujifilm Corp
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/112Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/12Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
    • C07D295/135Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0048Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
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  • Optical Filters (AREA)

Description

硬化性組成物、使用該硬化性組成物之彩色濾光片及其製造方法、及固態攝影元件Curable composition, color filter using the same, method for producing the same, and solid-state imaging element

本發明關於一種適合用於製造用於液晶顯示元件(LCD)、固態攝影元件(如CCD與CMOS)等之彩色濾光片的硬化性組成物,一種由此硬化性組成物形成之彩色濾光片,及其製造方法。The present invention relates to a curable composition suitable for use in the manufacture of color filters for liquid crystal display elements (LCDs), solid state photographic elements (such as CCDs and CMOS), and a color filter formed by the curable composition. Sheet, and its manufacturing method.

彩色濾光片為用於液晶顯示器或固態攝影元件之重要組成零件。Color filters are important components for liquid crystal displays or solid-state imaging components.

由於液晶顯示器相較於廣泛地作為顯示裝置之CRT為輕巧且具有相等或更佳之性能,其正取代CRT作為電視螢幕、個人電腦螢幕、及其他顯示裝置。此外近年來,液晶顯示器之發展趨勢已由相當小螢幕之習知監視器應用變成具有大螢幕及高影像品質之電視應用。Liquid crystal displays are replacing CRTs as television screens, personal computer screens, and other display devices because they are lightweight and have equal or better performance than CRTs that are widely used as display devices. In addition, in recent years, the trend of liquid crystal displays has changed from a relatively small screen of conventional monitor applications to a television application with large screen and high image quality.

至於液晶顯示器(LCD)用彩色濾光片,基板大小因製造大型電視機而加大。對於用於使用此大基板之彩色濾光片製造的應用之硬化性組成物,生產力改良需要低能量硬化力。As for color filters for liquid crystal displays (LCDs), the substrate size is increased by the manufacture of large television sets. For the hardenable composition of the application for the manufacture of the color filter using this large substrate, productivity improvement requires a low energy hardening force.

此外相較於監視器應用,其對用於TV應用之液晶顯示器要求更高之影像品質,即對比及顏色純度之改良。In addition, compared to monitor applications, it requires higher image quality, that is, contrast and color purity improvement for liquid crystal displays for TV applications.

對於用於彩色濾光片製造之應用的硬化性組成物,為了改良對比之目的,其要求使用具有更精細粒度之著色劑(有機顏料等)(參見例如日本專利申請案公開(JP-A)第2006-30541號)。For the curable composition for use in the manufacture of color filters, for the purpose of improving the comparison, it is required to use a coloring agent (organic pigment or the like) having a finer particle size (see, for example, Japanese Patent Application Laid-Open (JP-A) No. 2006-30541).

然而在硬化性組成物中含粒度小之顏料時,如果為了改良分散液安定性之目的而改良分散劑之顏料吸收性質,則由於顏料因分散劑交聯,其促進顏料凝集使得儲存安定性(如分散液安定性)降低,或在使用硬化性組成物形成圖案時顯影力趨於降低。However, when the curable composition contains a pigment having a small particle size, if the pigment absorption property of the dispersant is improved for the purpose of improving the stability of the dispersion, since the pigment is crosslinked by the dispersant, it promotes pigment aggregation to make storage stability ( The developing power tends to decrease as the dispersion stability is lowered, or when a pattern is formed using the curable composition.

此外在使用更精細顏料之情形,由於其表面積增加,使用更精細顏料趨於在硬化性組成物中增加用於分散顏料之分散劑的加入量。Further, in the case of using a finer pigment, the use of a finer pigment tends to increase the amount of the dispersant added for dispersing the pigment in the hardenable composition due to an increase in its surface area.

此外如果在分散時改良加入之樹脂的酸值以確保顯影力,則因酸性基間之交互作用(如氫鍵)而趨於促進顏料凝集。Further, if the acid value of the added resin is improved at the time of dispersion to secure the developing power, the pigment aggregation tends to be promoted due to the interaction between the acidic groups (e.g., hydrogen bonding).

如果欲藉由在分散顏料後將樹脂加入硬化性組成物以得到顯影力,則應加入大量樹脂。If a developing force is to be obtained by adding a resin to the curable composition after dispersing the pigment, a large amount of the resin should be added.

此外為了改良顏色純度之目的,其在用於製造彩色濾光片之硬化性組成物中要求固體成分中為更高含量比例之著色劑(有機顏料)。然而在著色劑以高濃度含於硬化性組成物時,硬化性組成物中光聚合引發劑與光聚合性單體之含量比例降低,及雖然硬化性組成物因此需要為可以低能量硬化,曝光部分得到硬化力之困難成問題。Further, for the purpose of improving the color purity, a coloring agent (organic pigment) having a higher content ratio in the solid content is required in the curable composition for producing a color filter. However, when the coloring agent is contained in the curable composition at a high concentration, the content ratio of the photopolymerization initiator to the photopolymerizable monomer in the curable composition is lowered, and although the curable composition is required to be hardened by low energy, exposure is required. Part of the difficulty of obtaining hardening power is a problem.

另一方面,對於用於固態攝影元件用彩色濾光片製造之應用的硬化性組成物,其亦需要低能量硬化力。此外對於固態攝影元件用彩色濾光片,其促進更薄著色圖案薄膜之發展,因而增加組成物中之顏料濃度。On the other hand, for a hardenable composition for use in the manufacture of a color filter for solid-state imaging elements, a low energy hardening force is also required. Furthermore, for color filters for solid-state photographic elements, it promotes the development of thinner colored pattern films, thereby increasing the pigment concentration in the composition.

此外在顏料為主彩色濾光片中,隨更細顏料以降低因 顏料為相當粗顆粒導致之顏色不規則性的趨勢,硬化性組成物中顏料分散劑之含量比例趨於增加。類似用於LCD製造目的之硬化性組成物,硬化性組成物中顏料分散劑之含量比例增加趨於降低儲存安定性(如分散液安定性),趨於在使用硬化性組成物形成圖案時降低顯影力,而且難以得到硬化力而成問題。In addition, in the pigment-based color filter, the finer pigment is used to reduce the cause. The pigment is a tendency of color irregularities caused by relatively coarse particles, and the proportion of the pigment dispersant in the hardenable composition tends to increase. Similar to the curable composition for LCD manufacturing purposes, an increase in the proportion of the pigment dispersant in the curable composition tends to lower the storage stability (e.g., dispersion stability), and tends to decrease when the curable composition is used to form a pattern. The developing power is difficult to obtain a hardening force.

此外為了解決如所形成著色圖案中顏色不規則性之問題,其已提議一種使用有機溶劑可溶性染料代替顏料作為著色劑之技術(參見例如JP-A第2-127602號專利)。然而對於染料為主彩色濾光片,染料濃度增加附帶儲存安定性下降之問題,如源自染料之聚合抑制效應,而且染料沉澱明顯。Further, in order to solve the problem of color irregularity in the colored pattern formed, there has been proposed a technique of using an organic solvent-soluble dye instead of a pigment as a coloring agent (see, for example, JP-A No. 2-127602). However, for dye-based color filters, the increase in dye concentration is accompanied by a problem of reduced storage stability, such as polymerization inhibition effects derived from dyes, and dye precipitation is remarkable.

如上所述,依照用於彩色濾光片製造之應用的硬化性組成物,不論是在液晶顯示裝置用之情形或固態攝影裝置用之情形,由於光聚合引發劑與光聚合性單體(用於將硬化性組成物硬化之重要成分)之含量有限,此外著色劑濃度高,其因低敏感度無法得到充分之硬化力,對基板之黏著性不足,未曝光部分之顯影速率降低或產生殘渣,極難形成所需圖案,在著色劑為染料之情形分散液安定性及顯影力退化,在著色劑為染料之情形儲存安定性低(如染料沉澱)等,而引起各種問題。As described above, the curable composition for use in the manufacture of color filters, whether in the case of a liquid crystal display device or a solid-state image pickup device, is a photopolymerization initiator and a photopolymerizable monomer. The content of the important component for hardening the hardenable composition is limited, and the concentration of the colorant is high, the hardening force cannot be obtained due to low sensitivity, the adhesion to the substrate is insufficient, and the development rate of the unexposed portion is lowered or residue is generated. It is extremely difficult to form a desired pattern, and in the case where the colorant is a dye, the stability of the dispersion and the deterioration of the developing power are degraded, and when the coloring agent is a dye, the storage stability is low (such as dye precipitation) and the like, causing various problems.

為了解決這些問題,其已討論藉由對習知引入以提供薄膜形成性質、顯影力等之樹脂提供可聚合性質而改良敏忋度(參見例如JP-A第2000-321763及2003-029018號專 利)。此外此技術示於”Color Filter Latest Technique Trend”(Johokiko Co.,Ltd.出版)第85至87欄、”Process Technique and Chemicals for Latest Color Filter”(CMC Publishing Co.,Ltd.出版)第129至150欄等。然而即使是在使用這些樹脂之情形,其仍未得到令人滿意之曝光敏感度。此外由於曝光敏感度不足,基板界面附近等之深入部分的硬化不足,使得亦涉及基板黏附性質不良之問題。In order to solve these problems, it has been discussed to improve the sensitivity by providing a polymerizable property to a resin which is conventionally introduced to provide film forming properties, developing power and the like (see, for example, JP-A Nos. 2000-321763 and 2003-029018) Lee). Further, this technique is shown in the "Color Filter Latest Technique Trend" (published by Johokiko Co., Ltd.) columns 85 to 87, "Process Technique and Chemicals for Latest Color Filter" (published by CMC Publishing Co., Ltd.), 129th to 150 columns and so on. However, even in the case of using these resins, satisfactory exposure sensitivity has not been obtained. In addition, due to insufficient exposure sensitivity, insufficient hardening of the deep portion near the interface of the substrate causes a problem of poor adhesion of the substrate.

本發明之一個目的為提供一種以極高之敏感性硬化,具有較佳儲存安定性的硬化性組成物。It is an object of the present invention to provide a hardenable composition which is hardened with extremely high sensitivity and which has better storage stability.

此外本發明之另一個目的為提供一種使用上述硬化性組成物形成之彩色濾光片,其具有高敏感性,極少之未曝光部分顯影殘渣,優良之對基板硬化部分的黏附性質,及具高解析度與所需橫切面形狀之著色圖案。Further, another object of the present invention is to provide a color filter formed using the above-described hardenable composition, which has high sensitivity, few unexposed portions of development residue, excellent adhesion property to a hardened portion of a substrate, and high The color pattern of the resolution and the desired cross-sectional shape.

此外本發明之又一個目的為提供一種以優良之生產力製造上述彩色濾光片之方法,及一種具有藉此製造方法製造之上述彩色濾光片的固態攝影元件。Further, it is still another object of the present invention to provide a method of manufacturing the above color filter with excellent productivity, and a solid-state photographic element having the above-described color filter manufactured by the manufacturing method.

依照關於上述情況之詳盡研究,發明人已發現上述問題可解決而完成本發明。In light of the detailed study on the above, the inventors have found that the above problems can be solved to complete the present invention.

本發明係關於以上情況而完成,及提供一種硬化性組成物、一種使用其之彩色濾光片及其製造、及一種固態攝影元件。The present invention has been accomplished in view of the above circumstances, and provides a hardenable composition, a color filter using the same, and a solid-state imaging element thereof.

本發明之第一態樣提供 <1>一種硬化性組成物,其含一種樹脂、一種含乙烯 不飽和雙鍵之化合物、及一種光聚合引發劑,其中樹脂係藉由聚合至少一種偶極矩為2.0或更大之單體作為共聚合成分而製造。The first aspect of the invention provides <1> A curable composition comprising a resin, an ethylene-containing A compound of an unsaturated double bond, and a photopolymerization initiator, wherein the resin is produced by polymerizing at least one monomer having a dipole moment of 2.0 or more as a copolymerization component.

本發明之第二態樣提供 <2>一種彩色濾光片,其具有以第一態樣之硬化性組成物形成之著色圖案,進一步含一種著色劑或敏化劑。The second aspect of the invention provides <2> A color filter having a colored pattern formed of a hardenable composition of a first aspect, further comprising a coloring agent or a sensitizer.

本發明之第三態樣提供 <3>一種製造彩色濾光片之方法,其包括:藉由將第一態樣之硬化性組成物(進一步含一種著色劑)塗布在撐體上而形成硬化性組成物製之著色層,將著色層經光罩曝光,及在曝光後藉由將著色層顯影而形成著色圖案。The third aspect of the invention provides <3> A method of producing a color filter, comprising: forming a coloring layer made of a curable composition by coating a first aspect of a curable composition (further containing a coloring agent) on a support; The colored layer is exposed through a photomask, and after the exposure, the colored layer is developed by developing the colored layer.

本發明之第四態樣提供 <4>一種固態攝影元件,其包括藉依照第三態樣之彩色濾光片製造方法製造之彩色濾光片。A fourth aspect of the invention provides <4> A solid-state photographic element comprising a color filter manufactured by a color filter manufacturing method according to a third aspect.

依照本發明,即使是在以高濃度含著色劑之情形,其可提供一種具有較佳儲存安定性(如分散液安定性),藉曝光以高敏感度硬化,在對硬化區域之基板表面具有高黏附性質,及可形成未硬化區域之未硬化部分去除性質優良的圖案之硬化性組成物。According to the present invention, even in the case of containing a coloring agent at a high concentration, it can provide a storage stability (e.g., dispersion stability), hardening by exposure with high sensitivity, and having a surface on the substrate of the hardened region. A highly adherent property, and a curable composition which can form a pattern having an unhardened portion of an uncured region and having excellent removal properties.

此外依照本發明,其可提供一種具有具優良解析度及撐體黏附性質之著色圖案,使用本發明之硬化性組成物形成之彩色濾光片,及一種用於以高生產力形成彩色濾光片之製造方法。Further, according to the present invention, it is possible to provide a coloring pattern having excellent resolution and support adhesion properties, a color filter formed using the hardenable composition of the present invention, and a color filter for forming a color filter with high productivity. Manufacturing method.

以下,本發明之硬化性組成物含一種樹脂、一種含乙烯不飽和雙鍵之化合物、及一種光聚合引發劑,其中樹脂係藉由聚合至少一種偶極矩為2.0或更大之單體作為共聚合成分而製造。Hereinafter, the curable composition of the present invention contains a resin, a compound containing an ethylenically unsaturated double bond, and a photopolymerization initiator, wherein the resin is polymerized by at least one monomer having a dipole moment of 2.0 or more. It is produced by copolymerizing components.

此外較佳為樹脂在側鏈中具有乙烯不飽和雙鍵。Further preferably, the resin has an ethylenically unsaturated double bond in the side chain.

此外較佳為本發明之硬化性組成物進一步含一種著色劑。Further preferably, the curable composition of the present invention further comprises a color former.

以下連續地解釋含於本發明硬化性組成物之各成分。The components contained in the curable composition of the present invention are continuously explained below.

<樹脂(A)> 本發明之樹脂為一種藉由聚合至少一種偶極矩為2.0或更大之單體作為共聚合成分而製造之樹脂。較佳為本發明之樹脂在側鏈中具有乙烯不飽和雙鍵。<Resin (A)> The resin of the present invention is a resin produced by polymerizing at least one monomer having a dipole moment of 2.0 or more as a copolymerization component. Preferably, the resin of the present invention has an ethylenically unsaturated double bond in the side chain.

較佳為上述樹脂為一種在側鏈中具有由下式(1)至(3)表示之基作為上述乙烯不飽和雙鍵的聚合物。It is preferable that the above resin is a polymer having a group represented by the following formulas (1) to (3) in the side chain as the above-mentioned ethylenically unsaturated double bond.

在式中,R1 至R11 各獨立地表示氫原子或單價有機基。X、Y各獨立地表示氧原子、硫原子或-N-R12 ,及Z表示氧原子、硫原子、-N-R12 、或伸苯基。R12 表示氫原子或單價有機基。In the formula, R 1 to R 11 each independently represent a hydrogen atom or a monovalent organic group. X and Y each independently represent an oxygen atom, a sulfur atom or -N-R 12 , and Z represents an oxygen atom, a sulfur atom, -N-R 12 or a phenyl group. R 12 represents a hydrogen atom or a monovalent organic group.

在上述式(1)中,R1 至R3 各獨立地表示單價有機基。 至於R1 ,其可提出氫原子或烷基(可具有取代基)、烷氧基、烷氧基羰基等。特別地,其較佳為氫原子、甲基、甲基烷氧基、與甲酯基。此外R2 與R3 各獨立地表示氫原子、鹵素原子、胺基、二烷基、羧基、烷氧基羰基、硫醯基、硝基、氰基、烷基(可具有取代基)、芳基(可具有取代基)、烷氧基(可具有取代基)、芳氧基(可具有取代基)、烷基胺基(可具有取代基)、芳基胺基(可具有取代基)、烷基磺醯基(可具有取代基)、芳基磺醯基(可具有取代基)等。特佳為氫原子、羧基、烷氧基羰基、烷基(可具有取代基)、與芳基(可具有取代基)。In the above formula (1), R 1 to R 3 each independently represent a monovalent organic group. As R 1 , it may be a hydrogen atom or an alkyl group (which may have a substituent), an alkoxy group, an alkoxycarbonyl group or the like. Particularly, it is preferably a hydrogen atom, a methyl group, a methyl alkoxy group, and a methyl ester group. Further, R 2 and R 3 each independently represent a hydrogen atom, a halogen atom, an amine group, a dialkyl group, a carboxyl group, an alkoxycarbonyl group, a thiol group, a nitro group, a cyano group, an alkyl group (which may have a substituent), and an aromatic group. a group (which may have a substituent), an alkoxy group (which may have a substituent), an aryloxy group (which may have a substituent), an alkylamino group (which may have a substituent), an arylamine group (which may have a substituent), An alkylsulfonyl group (which may have a substituent), an arylsulfonyl group (which may have a substituent), and the like. Particularly preferred are a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, an alkyl group (which may have a substituent), and an aryl group (which may have a substituent).

在此至於引入之取代基,其可提出甲氧基羰基、乙氧基羰基、異丙氧基羰基、甲基、乙基、苯基等。Here, as the substituent to be introduced, a methoxycarbonyl group, an ethoxycarbonyl group, an isopropoxycarbonyl group, a methyl group, an ethyl group, a phenyl group or the like can be proposed.

X表示氧原子、硫原子或-N-R12 。在此至於R12 ,其可提出烷基(可具有取代基)等。X represents an oxygen atom, a sulfur atom or -N-R 12 . Here, as for R 12 , it may be mentioned that an alkyl group (which may have a substituent) or the like.

在式(1)中,至於烷基,其可提出具有1至30個碳之線形或環形烷基。其較佳為具有1至20個碳原子之烷基,而且特佳為具有1至10個碳原子之烷基。In the formula (1), as for the alkyl group, it may be a linear or cyclic alkyl group having 1 to 30 carbons. It is preferably an alkyl group having 1 to 20 carbon atoms, and particularly preferably an alkyl group having 1 to 10 carbon atoms.

在式(1)中,至於芳基,其可提出具有6至30個碳原子者。其較佳為具有6至20個碳原子者,而且特佳為具有6至10個碳原子者。In the formula (1), as the aryl group, it may be proposed to have 6 to 30 carbon atoms. It is preferably one having 6 to 20 carbon atoms, and particularly preferably having 6 to 10 carbon atoms.

在上述式(2)中,R4 至R8 各獨立地表示單價有機基。至於R4 至R8 ,其可提出例如氫原子、鹵素原子、胺基、二烷基、羧基、烷氧基羰基、硫醯基、硝基、氰基、烷基(可具有取代基)、芳基(可具有取代基)、烷氧基(可 具有取代基)、芳氧基(可具有取代基)、烷基胺基(可具有取代基)、芳基胺基(可具有取代基)、烷基磺醯基(可具有取代基)、芳基磺醯基(可具有取代基)等。特佳為氫原子、羧基、烷氧基羰基、烷基(可具有取代基)、與芳基(可具有取代基)。至於引入之取代基,其可提出對式(1)提出者。Y表示氧原子、硫原子或-N-R12 。至於R12 ,其可提出對式(1)提出者。在式(2)中,至於烷基與芳基,其可提出對式(1)提出者,而且亦可應用相同之較佳實例。In the above formula (2), R 4 to R 8 each independently represent a monovalent organic group. R 4 to R 8 may, for example, be a hydrogen atom, a halogen atom, an amine group, a dialkyl group, a carboxyl group, an alkoxycarbonyl group, a thiol group, a nitro group, a cyano group, an alkyl group (which may have a substituent), An aryl group (which may have a substituent), an alkoxy group (which may have a substituent), an aryloxy group (which may have a substituent), an alkylamino group (which may have a substituent), an arylamine group (which may have a substituent) An alkylsulfonyl group (which may have a substituent), an arylsulfonyl group (which may have a substituent), and the like. Particularly preferred are a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, an alkyl group (which may have a substituent), and an aryl group (which may have a substituent). As for the introduced substituent, it can be proposed to the formula (1). Y represents an oxygen atom, a sulfur atom or -N-R 12 . As for R 12 , it can be proposed to the formula (1). In the formula (2), as for the alkyl group and the aryl group, it can be proposed to the formula (1), and the same preferred examples can be applied.

在上述式(3)中,R9 至R11 各獨立地表示單價有機基。至於有機基,其可特別地表示例如氫原子、鹵素原子、胺基、二烷基、羧基、烷氧基羰基、硫醯基、硝基、氰基、烷基(可具有取代基)、芳基(可具有取代基)、烷氧基(可具有取代基)、芳氧基(可具有取代基)、烷基胺基(可具有取代基)、芳基胺基(可具有取代基)、烷基磺醯基(可具有取代基)、芳基磺醯基(可具有取代基)等。特佳為氫原子、羧基、烷氧基羰基、烷基(可具有取代基)、與芳基(可具有取代基)。In the above formula (3), R 9 to R 11 each independently represent a monovalent organic group. As the organic group, it may specifically represent, for example, a hydrogen atom, a halogen atom, an amine group, a dialkyl group, a carboxyl group, an alkoxycarbonyl group, a thiol group, a nitro group, a cyano group, an alkyl group (which may have a substituent), and an aromatic group. a group (which may have a substituent), an alkoxy group (which may have a substituent), an aryloxy group (which may have a substituent), an alkylamino group (which may have a substituent), an arylamine group (which may have a substituent), An alkylsulfonyl group (which may have a substituent), an arylsulfonyl group (which may have a substituent), and the like. Particularly preferred are a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, an alkyl group (which may have a substituent), and an aryl group (which may have a substituent).

至於引入之取代基,其可以相同之方式提出對式(1)提出者。As for the introduced substituent, it can be proposed to the formula (1) in the same manner.

Z表示氧原子、硫原子、-N-R12 、或伸苯基。至於R12 ,其可提出對式(1)提出者。Z represents an oxygen atom, a sulfur atom, -N-R 12 or a phenyl group. As for R 12 , it can be proposed to the formula (1).

在式(3)中,至於烷基與芳基,其可提出對式(1)提出者,而且亦可應用相同之較佳實例。In the formula (3), as for the alkyl group and the aryl group, it can be proposed for the formula (1), and the same preferred examples can be applied.

在本發明之樹脂中,具有由式(1)表示之基的聚合物化合物可藉以下合成方法1)、2)至少之一製造。合成方法1)In the resin of the present invention, the polymer compound having a group represented by the formula (1) can be produced by at least one of the following synthesis methods 1) and 2). Synthesis method 1)

一種藉由合成聚合物化合物而得到所需聚合物化合物之方法,其係藉由共聚合一或多種由下式(12)表示之自由基聚合性化合物與後述指定單體,及使用鹼取出一個質子以分離Z。A method for obtaining a desired polymer compound by synthesizing a polymer compound by copolymerizing one or more radical polymerizable compounds represented by the following formula (12) with a specified monomer described later, and taking out a base using a base Protons to separate Z.

在式(12)中,R1 至R3 及X係與式(1)中相同,而且亦可應用相同之較佳實例。In the formula (12), R 1 to R 3 and X are the same as those in the formula (1), and the same preferred examples can be applied.

在式(12)中,Z表示陰離子性脫離基。Q表示氧原子、-NH-或-NR14 -(在此R14 表示烷基(可具有取代基))。至於R13 ,其可提出氫原子、烷基(可具有取代基)等。其特佳為氫原子、甲基、甲基烷氧基、與甲酯基。A表示二價有機鍵聯基。至於作為A之二價有機鍵聯基並未特別地限制,而且其可提出具有總共1至30個原子之伸烷基(例如亞甲基、伸乙基、環伸己基)及具有總共6至30個原子之伸芳基(例如伸苯基、三氟乙烯(trilene)、伸萘基)。其特佳為具有總共1至10個原子之伸烷基及具有總共6至 15個原子之伸芳基。In the formula (12), Z represents an anionic leaving group. Q represents an oxygen atom, -NH- or -NR 14 - (wherein R 14 represents an alkyl group (which may have a substituent)). As R 13 , a hydrogen atom, an alkyl group (which may have a substituent), or the like can be proposed. Particularly preferred are a hydrogen atom, a methyl group, a methyl alkoxy group, and a methyl ester group. A represents a divalent organic bond group. The divalent organic linking group as A is not particularly limited, and it may be proposed to have an alkyl group having a total of 1 to 30 atoms (for example, a methylene group, an exoethyl group, a cyclohexyl group) and have a total of 6 to An aryl group of 30 atoms (for example, a phenyl group, a trilene, a naphthyl group). It is particularly preferably an alkylene group having a total of 1 to 10 atoms and an extended aryl group having a total of 6 to 15 atoms.

在式(13)中,R1 至R3 係與式(1)中相同,而且亦可應用相同之較佳實例。In the formula (13), same as (1) the lines R 1 to R 3 in the formula, and the same preferred examples can also be applied.

合成方法2) 一種藉由合成幹聚合物化合物(包括主鏈之聚合物化合物)而得到所需聚合物化合物之方法,其係藉由共聚合一或多種具有官能基之自由基聚合性化合物與後述指定單體,及反應上述幹聚合物(stem polymer)化合物之側鏈官能基與具有由下式(13)表示之結構的化合物。Synthesis method 2) A method for obtaining a desired polymer compound by synthesizing a dry polymer compound (including a polymer compound of a main chain) by copolymerizing one or more radical polymerizable compounds having a functional group and a specified monomer described later And a side chain functional group of the above stem polymer compound and a compound having a structure represented by the following formula (13).

至於由式(12)表示之自由基聚合性化合物,其可提出以下化合物作為實例,然而不受其限制。As for the radically polymerizable compound represented by the formula (12), the following compounds can be cited as examples, but are not limited thereto.

由式(12)表示之自由基聚合性化合物易如市售產品或藉後述合成例中所示之合成方法而得。The radically polymerizable compound represented by the formula (12) is easily obtained as a commercially available product or a synthesis method shown in the synthesis examples described later.

由式(1)表示之基可藉由以用於合成聚合物化合物之一般自由基聚合方法聚合一或多種這些自由基聚合性化合物及後述指定單體,如果必要及其他自由基聚合性化合物,在用於進行反應之冷卻或加熱條件下將所需量之鹼滴入聚合物溶液中,如果必要及以酸進行中和法而引入。對於聚合物化合物之製造,其可使用已知之懸浮液聚合法或溶 液聚合法等。The group represented by the formula (1) can be obtained by polymerizing one or more of these radically polymerizable compounds and a specified monomer described later, if necessary, and other radical polymerizable compounds, by a general radical polymerization method for synthesizing a polymer compound. The desired amount of the base is dropped into the polymer solution under cooling or heating conditions for carrying out the reaction, if necessary and introduced by neutralization with an acid. For the manufacture of polymer compounds, it can be used by known suspension polymerization or dissolution. Liquid polymerization method, etc.

至於鹼,其可使用無機化合物或有機化合物。至於較佳之無機鹼,其可提出氫氧化鈉、氫氧化鋰、碳酸鈉、碳酸氫鈉、碳酸鉀、碳酸氫鉀等。至於有機鹼,其可提出金屬烷氧化物,如甲氧鈉、乙氧鈉與第三丁氧鉀,有機胺化合物,如三乙胺、吡啶與二異丙基乙胺等。As the base, an inorganic compound or an organic compound can be used. As a preferred inorganic base, sodium hydroxide, lithium hydroxide, sodium carbonate, sodium hydrogencarbonate, potassium carbonate, potassium hydrogencarbonate or the like can be mentioned. As the organic base, metal alkoxides such as sodium methoxide, sodium ethoxide and potassium t-butoxide, organic amine compounds such as triethylamine, pyridine and diisopropylethylamine, and the like can be proposed.

在合成方法2)中,至於用於幹聚合性化合物合成之具有官能基之自由基聚合性化合物的官能基之實例,其可提出羥基、羧基、鹵化羧酸基、羧酸酐基、胺基、鹵化烷基、異氰酸基、環氧基等。至於具有此官能基之自由基聚合性化合物,其可提出丙烯酸2-羥基乙酯、甲基丙烯酸2-羥基乙酯、丙烯酸4-羥基丁酯、甲基丙烯酸4-羥基丁酯、丙烯酸、甲基丙烯酸、丙烯酸氯、甲基丙烯酸氯、甲基丙烯酸酐、甲基丙烯酸N,N-二甲基-2-胺基乙酯、甲基丙烯酸2-氯乙酯、2-乙基異氰酸酯甲基丙烯酸酯、丙烯酸環氧丙酯、甲基丙烯酸環氧丙酯等。In the synthesis method 2), as an example of a functional group of a radically polymerizable compound having a functional group for synthesis of a dry polymerizable compound, a hydroxyl group, a carboxyl group, a halogenated carboxylic acid group, a carboxylic anhydride group, an amine group, A halogenated alkyl group, an isocyanate group, an epoxy group or the like. As the radical polymerizable compound having such a functional group, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, acrylic acid, and A can be proposed. Acrylic acid, acrylic acid chloride, methacrylic acid chloride, methacrylic anhydride, N,N-dimethyl-2-aminoethyl methacrylate, 2-chloroethyl methacrylate, 2-ethyl isocyanate methyl Acrylate, glycidyl acrylate, glycidyl methacrylate, and the like.

所需聚合物化合物可藉由聚合一或多種這些自由基聚合性化合物與後述指定單體,如果必要及共聚合其他幹聚何物化合物合成用自由基聚合性化合物,及反應具有由式(13)表示之基的化合物而得到。The desired polymer compound can be obtained by polymerizing one or more of these radically polymerizable compounds with a specified monomer described later, if necessary and copolymerizing other dry polymer compounds for synthesizing a radically polymerizable compound, and having a reaction formula (13) ) is obtained as a compound based on the group.

在此至於具有由式(13)表示之基的化合物之實例,其可提出作為上述自由基聚合性化合物之實例而提出之化合物。Here, as an example of the compound having a group represented by the formula (13), a compound proposed as an example of the above radical polymerizable compound can be proposed.

在本發明中,上述具有由式(2)表示之基的化合物可藉 下示合成方法3)及4)至少之一製造。In the present invention, the above compound having a group represented by the formula (2) may be borrowed At least one of the synthesis methods 3) and 4) is shown below.

合成方法3) 一種藉由聚合一或多種具有由式(2)表示之不飽和基及加成聚合性質高於不飽和基之乙烯不飽和基的自由基聚合性化合物、後述指定單體,如果必要及其他自由基聚合性化合物而得到聚合物化合物之方法。此方法係利用一種分子中具有多個加成聚合性質不同之乙烯不飽和基的化合物,如甲基丙烯酸烯丙酯。Synthesis method 3) A radically polymerizable compound which polymerizes one or more ethylenically unsaturated groups having an unsaturated group represented by the formula (2) and having an addition polymerization property higher than that of an unsaturated group, a specified monomer described later, if necessary, and other freedoms A method of obtaining a polymer compound by polymerizing a compound. This method utilizes a compound having a plurality of ethylenically unsaturated groups having different addition polymerization properties in the molecule, such as allyl methacrylate.

合成方法4) 一種藉由共聚合一或多種具有官能基之自由基聚合性化合物與用於合成聚合物化合物之後述指定單體,及反應側鏈官能基與具有由下式(14)表示之結構的化合物,而引入由式(2)表示之基的方法。Synthesis method 4) A method of copolymerizing one or more radically polymerizable compounds having a functional group with a specified monomer described later for synthesizing a polymer compound, and a reactive side chain functional group and a compound having a structure represented by the following formula (14), A method of introducing the basis represented by the formula (2) is introduced.

在式(14)中,R4 至R8 係與式(2)中相同,而且亦應用相同之較佳實例。In the formula (14), R 4 to R 8 are the same as those in the formula (2), and the same preferred examples are also applied.

至於具有由式(2)表示之不飽和基及加成聚合性質高於不飽和基之乙烯不飽和基的自由基聚合性化合物,其可提出丙烯酸烯丙酯、甲基丙烯酸烯丙酯、丙烯酸2-烯丙氧基乙酯、甲基丙烯酸2-烯丙氧基乙酯、丙烯酸炔丙酯、甲基丙烯酸炔丙酯、丙烯酸烯丙酯、甲基丙烯酸烯丙酯、丙烯酸二烯丙酯、甲基丙烯酸二烯丙酯、N-烯丙基丙烯醯胺 、N-烯丙基甲基丙烯醯胺等作為實例。As the radically polymerizable compound having an unsaturated group represented by the formula (2) and an ethylenically unsaturated group having an addition polymerization property higher than that of the unsaturated group, it may be mentioned that allyl acrylate, allyl methacrylate, acrylic acid 2-allyloxyethyl ester, 2-allyloxyethyl methacrylate, propargyl acrylate, propargyl methacrylate, allyl acrylate, allyl methacrylate, diallyl acrylate , diallyl methacrylate, N-allyl acrylamide N-allylmethacrylamide or the like is exemplified.

此外至於藉由聚合一或多種具有官能基之自由基聚合性化合物而得之聚合物化合物的實例,其可提出上述合成方法2)中所示之實例。Further, as an example of a polymer compound obtained by polymerizing one or more radically polymerizable compounds having a functional group, an example shown in the above synthesis method 2) can be proposed.

具有由式(14)表示之結構的化合物之實例包括烯丙醇、烯丙胺、二烯丙胺、2-烯丙氧基乙醇、2-氯-1-丁烯、與異氰酸烯丙酯。Examples of the compound having a structure represented by the formula (14) include allyl alcohol, allylamine, diallylamine, 2-allyloxyethanol, 2-chloro-1-butene, and allyl isocyanate.

上述依照本發明具有由式(3)表示之基的聚合物化合物可藉下示合成方法5)及6)至少之一製造。The above polymer compound having a group represented by the formula (3) according to the present invention can be produced by at least one of the following synthesis methods 5) and 6).

合成方法5) 一種藉由共聚合一或多種具有由式(3)表示之不飽和基及加成聚合性質高於不飽和基之乙烯不飽和基的自由基聚合性化合物、與後述指定單體,如果必要則共聚合其他自由基聚合性化合物而得到聚合物化合物之方法。Synthesis method 5) A radically polymerizable compound which copolymerizes one or more ethylenically unsaturated groups having an unsaturated group represented by the formula (3) and having an addition polymerization property higher than that of an unsaturated group, and a monomer specified later, if necessary A method of copolymerizing other radically polymerizable compounds to obtain a polymer compound.

合成方法6) 一種在藉由共聚合一或多種具有官能基之自由基聚合性化合物與後述指定單體而合成聚合性化合物後,反應及引入具有由式(15)表示之結構的化合物與側鏈官能基之方法。Synthesis method 6) After synthesizing a polymerizable compound by copolymerizing one or more radically polymerizable compounds having a functional group and a specified monomer described later, reacting and introducing a compound having a structure represented by formula (15) and a side chain functional group method.

至於具有由式(3)表示之不飽和基及加成聚合性質高於不飽和基之乙烯不飽和基的自由基聚合性化合物,其可 提出丙烯酸乙烯酯、甲基丙烯酸乙烯酯、丙烯酸2-苯基乙烯酯、甲基丙烯酸2-苯基乙烯酯、丙烯酸1-丙烯酯、甲基丙烯酸1-丙烯酯、乙烯基丙烯醯胺、乙烯基甲基丙烯醯胺等作為實例。a radically polymerizable compound having an unsaturated group represented by the formula (3) and an ethylenically unsaturated group having an addition polymerization property higher than that of the unsaturated group, which may be Proposed vinyl acrylate, vinyl methacrylate, 2-phenylvinyl acrylate, 2-phenylvinyl methacrylate, 1-propenyl acrylate, 1-propenyl methacrylate, vinyl acrylamide, ethylene A methacrylamide or the like is exemplified.

至於藉共聚合而得之聚合物化合物,其可得到如上述合成方法2)之實例所提出者。As the polymer compound obtained by copolymerization, it can be obtained as an example of the above synthesis method 2).

在式(15)中,R9 至R11 係與式(3)中相同,而且亦應用相同之較佳實例。In the formula (15), R 9 to R 11 are the same as those in the formula (3), and the same preferred examples are also applied.

至於具有由式(15)表示之結構的化合物,其可提出2-羥基乙基一乙烯基醚、4-羥基丁基一乙烯基醚、二乙二醇一乙烯基醚、4-氯甲基苯乙烯等作為實例。As the compound having a structure represented by the formula (15), it may be proposed as 2-hydroxyethyl monovinyl ether, 4-hydroxybutyl monovinyl ether, diethylene glycol monovinyl ether, 4-chloromethyl group. Styrene and the like are exemplified.

亦較佳為一種在上述合成方法1)中使用至少一種下式(4)及(5)代替用於上述合成方法1)中之式(12)的合成方法。It is also preferred to use at least one of the following formulas (4) and (5) in the above synthesis method 1) instead of the synthesis method of the formula (12) used in the above synthesis method 1).

在式(4)或(5)中,R5 、R6 、R7 表示氫或單價有機基,A2 表示氧原子、硫原子或-NR8 -,G1 表示有機鍵聯基,R8 表示氫或單價有機基,及n表示1至10之整數。R1 至R3 係與式(12)中相同,A1 係與式(1)中之X相同,及X1 係與式(12)中之Z相同。In the formula (4) or (5), R 5 , R 6 , R 7 represent hydrogen or a monovalent organic group, A 2 represents an oxygen atom, a sulfur atom or -NR 8 -, and G 1 represents an organic bonding group, and R 8 Represents hydrogen or a monovalent organic group, and n represents an integer from 1 to 10. R 1 to R 3 are the same as in the formula (12), the A 1 is the same as X in the formula (1), and the X 1 is the same as Z in the formula (12).

R9 至R13 表示氧或單價有機基,其至少之一為由下式(6)表示之基。R14 至R16 表示氫或單價有機基。R 9 to R 13 represent an oxygen or a monovalent organic group, at least one of which is a group represented by the following formula (6). R 14 to R 16 represent hydrogen or a monovalent organic group.

在式(4)或(5)中,單價有機基係與式(1)中之單價有機基相同,而且亦應用相同之較佳實例。In the formula (4) or (5), the monovalent organic group is the same as the monovalent organic group in the formula (1), and the same preferred examples are also applied.

在式(6)中,G2 表示有機鍵聯基,及m表示1至10之整數。R1 至R3 、A1 、X1 係與式(4)中相同。In the formula (6), G 2 represents an organic bonding group, and m represents an integer of 1 to 10. R 1 to R 3 , A 1 and X 1 are the same as those in the formula (4).

至於由上述式(4)或(5)表示之化合物的較佳指定實例,其可提出以下(i-1至i-60)。As a preferred designated example of the compound represented by the above formula (4) or (5), the following (i-1 to i-60) can be proposed.

在使用上述式(4)或(5)合成具有由式(1)表示之基的化合物(以下亦稱為「聚乙烯基為主聚合物化合物」)時,藉上述脫去反應進一步共聚合其他一般自由基聚合性化合物與具有雙鍵之化合物亦為本發明之一個具體實施例。When a compound having a group represented by the formula (1) (hereinafter also referred to as "polyvinyl group-based polymer compound") is synthesized by using the above formula (4) or (5), further depolymerization is carried out by the above-mentioned de-reaction reaction. Generally, a radically polymerizable compound and a compound having a double bond are also a specific embodiment of the present invention.

在上述合成方法1)至6)中,如上所述,如果必要則可共聚合其他一般自由基聚合性化合物。在本發明中共聚合之一般自由基聚合性化合物可提出例如選自丙烯酸酯、甲基丙烯酸酯、N,N-二取代丙烯醯胺、N,N-二取代甲基丙烯醯胺、苯乙烯、丙烯腈、甲基丙烯腈等之自由基聚合性化合物。In the above synthesis methods 1) to 6), as described above, other general radical polymerizable compounds may be copolymerized if necessary. The general radical polymerizable compound copolymerized in the present invention may, for example, be selected from the group consisting of acrylates, methacrylates, N,N-disubstituted acrylamides, N,N-disubstituted methacrylamides, styrene, A radically polymerizable compound such as acrylonitrile or methacrylonitrile.

指定實例包括丙烯酸酯,如丙烯酸烷酯(烷基之碳原子數量較佳為1至20個)(特別是例如丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸丁酯、丙烯酸戊酯、丙烯酸乙基己酯、丙烯酸辛酯、丙烯酸第三辛酯、丙烯酸氯乙酯、丙烯酸2,2-二甲基羥基丙酯、丙烯酸5-羥基戊酯、三羥甲基丙烷單丙烯酸酯、新戊四醇單丙烯酸酯、丙烯酸環氧丙酯、丙烯酸苄酯、丙烯酸甲氧基苄酯、丙烯酸呋喃酯、丙烯酸四氫呋喃酯等)、丙烯酸芳酯(例如丙烯酸苯酯等),甲基丙烯酸酯,如甲基丙烯酸烷酯(烷基之碳原子數量較佳為1至20個)(特別是例如甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸異丙酯、甲基丙烯酸戊酯、甲基丙烯酸環己酯、甲基丙烯酸苄酯、甲基丙烯酸氯苄酯、甲基丙烯酸辛酯、甲基丙烯酸4-羥基丁酯、甲基丙烯酸5-羥基戊酯、甲基丙烯酸2,2-二甲基-3-羥基丙 酯、三羥甲基丙烷單甲基丙烯酸酯、新戊四醇單甲基丙烯酸酯、甲基丙烯酸環氧丙酯、甲基丙烯酸呋喃酯、甲基丙烯酸四氫呋喃酯等)、甲基丙烯酸芳酯(例如甲基丙烯酸苯酯、甲基丙烯酸甲苯酯、甲基丙烯酸萘酯等),苯乙烯,如苯乙烯與烷基苯乙烯(如甲基苯乙烯、二甲基苯乙烯、三甲基苯乙烯、乙基苯乙烯、二乙基苯乙烯、異丙基苯乙烯、丁基苯乙烯、己基苯乙烯、環己基苯乙烯、癸基苯乙烯、苄基苯乙烯、氯甲基苯乙烯、三氟甲基苯乙烯、乙氧基甲基苯乙烯、與乙醯氧基甲基苯乙烯)、烷氧基苯乙烯(如甲氧基苯乙烯、4-甲氧基-3-甲基苯乙烯與二甲氧基苯乙烯)、鹵素苯乙烯(如氯苯乙烯、二氯苯乙烯、三氯苯乙烯、四氯苯乙烯、五氯苯乙烯、溴苯乙烯、二溴苯乙烯、碘苯乙烯、氟苯乙烯、三氟苯乙烯、2-溴-4-三氟甲基苯乙烯、與4-氟-3-三氟甲基苯乙烯)、丙烯腈、甲基丙烯腈等。Specific examples include acrylates such as alkyl acrylates (the number of carbon atoms of the alkyl group is preferably from 1 to 20) (particularly, for example, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, acrylic acid) Ethylhexyl ester, octyl acrylate, trioctyl acrylate, chloroethyl acrylate, 2,2-dimethylhydroxypropyl acrylate, 5-hydroxypentyl acrylate, trimethylolpropane monoacrylate, neopentyl Tetraol monoacrylate, propylene acrylate, benzyl acrylate, methoxybenzyl acrylate, furan acrylate, tetrahydrofurfuryl acrylate, etc.), aryl acrylate (such as phenyl acrylate, etc.), methacrylate, such as An alkyl methacrylate (the number of carbon atoms of the alkyl group is preferably from 1 to 20) (particularly, for example, methyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, A Amyl acrylate, cyclohexyl methacrylate, benzyl methacrylate, benzyl chloride methacrylate, octyl methacrylate, 4-hydroxybutyl methacrylate, 5-hydroxypentyl methacrylate, A Acrylic acid 2 ,2-dimethyl-3-hydroxypropane Esters, trimethylolpropane monomethacrylate, pentaerythritol monomethacrylate, glycidyl methacrylate, furyl methacrylate, tetrahydrofurfuryl methacrylate, etc.), aryl methacrylate (such as phenyl methacrylate, toluene methacrylate, naphthyl methacrylate, etc.), styrene, such as styrene and alkyl styrene (such as methyl styrene, dimethyl styrene, trimethyl benzene) Ethylene, ethyl styrene, diethyl styrene, isopropyl styrene, butyl styrene, hexyl styrene, cyclohexyl styrene, mercapto styrene, benzyl styrene, chloromethyl styrene, three Fluoromethylstyrene, ethoxymethylstyrene, with ethoxymethylstyrene), alkoxystyrene (such as methoxystyrene, 4-methoxy-3-methylstyrene) With dimethoxystyrene), halogen styrene (such as chlorostyrene, dichlorostyrene, trichlorostyrene, tetrachlorostyrene, pentachlorostyrene, bromostyrene, dibromostyrene, iodine styrene Fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoromethylstyrene, and 4-fluoro-3- Fluoro-methyl styrene), acrylonitrile, methacrylonitrile and the like.

至於含羧酸之自由基聚合性化合物,其可提出例如丙烯酸、甲基丙烯酸、伊康酸、巴豆酸、異巴豆酸、順丁烯二酸、對羧基苯乙烯等。As the carboxylic acid-containing radically polymerizable compound, for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, p-carboxystyrene or the like can be mentioned.

此外至於合成上述聚乙烯基為主聚合物化合物時使用之溶劑,其可提出例如二氯乙烷、環己酮、甲乙酮、丙酮、甲醇、乙醇、丙醇、丁醇、乙二醇一甲醚、乙二醇一乙醚、乙酸2-甲氧基乙酯、1-甲氧基-2-丙醇、乙酸1-甲氧基-2-丙酯、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、二甲基亞碸、甲苯、乙酸乙酯、乳酸甲酯、乳酸乙酯、1-甲基-2- 吡咯啶酮等。Further, as for the solvent used in the synthesis of the above polyvinyl group-based polymer compound, for example, dichloroethane, cyclohexanone, methyl ethyl ketone, acetone, methanol, ethanol, propanol, butanol, ethylene glycol monomethyl ether may be mentioned. , ethylene glycol monoethyl ether, 2-methoxyethyl acetate, 1-methoxy-2-propanol, 1-methoxy-2-propyl acetate, N,N-dimethylformamide, N,N-dimethylacetamide, dimethyl hydrazine, toluene, ethyl acetate, methyl lactate, ethyl lactate, 1-methyl-2- Pyrrolidone and the like.

這些溶劑可單獨或如二或更多種之混合物而使用。These solvents may be used singly or as a mixture of two or more.

在本發明中作為上述共聚物之樹脂為一種藉由聚合至少一種偶極矩為2.0或更大之偶極單體(以下亦稱為「指定單體」)作為共聚合成分而製造之樹脂。「指定單體」在此為一種後述含鹼溶性基單體以外之單體。In the present invention, the resin as the copolymer is a resin produced by polymerizing at least one dipolar monomer having a dipole moment of 2.0 or more (hereinafter also referred to as "designated monomer") as a copolymerization component. The "designated monomer" is herein a monomer other than the alkali-soluble monomer described later.

至於上述偶極矩,其使用藉以下計算方法計算而得之數值。As for the dipole moment described above, it is calculated using the following calculation method.

即偶極矩係使用CAChe6.1(Fujitsu Corp.製造)藉計算方法AM1,計算將所得上述指定單體之結構最適化後之最適結構。That is, the dipole moment is calculated by using CAChe 6.1 (manufactured by Fujitsu Corp.) by the calculation method AM1, and the optimum structure obtained by optimizing the structure of the above-mentioned designated monomer is calculated.

依照作為本發明樹脂之共聚合成分的指定單體,雖然其不限制結構,只要藉上述計算方法計算之偶極矩為2.0或更大。特別是關於敏感度及儲存安定性,偶極矩值較佳為2.5或更大,更佳為2.5或更大及15或更小,進一步較佳為3.0或更大及10或更小,特佳為3.5或更大及9.0或更小,而最佳為3.5或更大及8.0或更小。According to the specified monomer which is a copolymerization component of the resin of the present invention, although it does not limit the structure, the dipole moment calculated by the above calculation method is 2.0 or more. Particularly with respect to sensitivity and storage stability, the dipole moment value is preferably 2.5 or more, more preferably 2.5 or more and 15 or less, further preferably 3.0 or more and 10 or less. Preferably, it is 3.5 or more and 9.0 or less, and most preferably 3.5 or more and 8.0 or less.

由於上述指定單體之偶極矩為2.5或更大及15或更小之範圍,其關於樹脂合成之方便性、含樹脂之硬化性組成物的敏感度、顯影性質、及儲存安定性為較佳。Since the dipole moment of the above specified monomer is in the range of 2.5 or more and 15 or less, the convenience of resin synthesis, the sensitivity of the resin-containing hardenable composition, the developing property, and the storage stability are compared. good.

上述實例中,指定單體特佳為具有至少一個選自醚基、氰基、磷酸基、內酯基、胺基甲酸酯基、碳酸基、與縮醛基之基。In the above examples, the specified monomer is particularly preferably one having at least one selected from the group consisting of an ether group, a cyano group, a phosphoric acid group, a lactone group, a urethane group, a carbonate group, and an acetal group.

含於指定單體之醚基較佳為具有2至30個碳原子之線 形、分支或環形醚基,而且特佳為具有2至15個碳原子之線形、分支或環形醚基。至於醚基之實例,其可提出2-甲氧基乙基醚、2-乙氧基乙基醚、MeOCH2 CH2 OCH2 CH2 -、MeO(CH2 CH2 O)2 CH2 CH2 -、氧雜環丁烷-2-基、氧雜環丁烷-3-基、四氫呋喃-2-基、四氫呋喃-3-基、四氫-2H-吡喃-2-基、八氫-1H-異氯烴(isochlomene)-3-基、氨甲酸苄苯(oxylane)-2-基等。The ether group contained in the specified monomer is preferably a linear, branched or cyclic ether group having 2 to 30 carbon atoms, and particularly preferably a linear, branched or cyclic ether group having 2 to 15 carbon atoms. As an example of the ether group, it is possible to propose 2-methoxyethyl ether, 2-ethoxyethyl ether, MeOCH 2 CH 2 OCH 2 CH 2 -, MeO(CH 2 CH 2 O) 2 CH 2 CH 2 - oxetan-2-yl, oxetan-3-yl, tetrahydrofuran-2-yl, tetrahydrofuran-3-yl, tetrahydro-2H-pyran-2-yl, octahydro-1H - Isochlomene-3-yl, oxylane-2-yl and the like.

含於指定單體之內酯基較佳為具有3至30個碳原子之內酯基,而且更佳為具有5至20個碳原子之內酯基。至於內酯基之實例,其可提出以下結構。在以下結構中,R表示氫原子、烷基、環烷基、或芳基,其中烷基、環烷基或芳基各獨立地具有1至20個碳原子。The lactone group contained in the specified monomer is preferably a lactone group having 3 to 30 carbon atoms, and more preferably a lactone group having 5 to 20 carbon atoms. As for the example of the lactone group, the following structure can be proposed. In the following structure, R represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group, wherein the alkyl group, the cycloalkyl group or the aryl group each independently has 1 to 20 carbon atoms.

含於指定單體之胺基甲酸酯基較佳為具有1至30個碳原子之線形或環形胺基甲酸酯基,而且較佳為具有1至20個碳原子之線形或環形胺基甲酸酯基。The urethane group contained in the specified monomer is preferably a linear or cyclic urethane group having 1 to 30 carbon atoms, and is preferably a linear or cyclic amino group having 1 to 20 carbon atoms. Formate group.

至於胺基甲酸酯基之實例,其可提出以下結構,然而不受其限制。在以下結構中,R表示氫原子、烷基、環烷基、或芳基,其中烷基、環烷基或芳基各獨立地具有1至20個碳原子。As for the example of the urethane group, the following structure can be proposed, but is not limited thereto. In the following structure, R represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group, wherein the alkyl group, the cycloalkyl group or the aryl group each independently has 1 to 20 carbon atoms.

含於指定單體之碳酸基較佳為具有1至30個碳原子之線形或環形碳酸基,而且較佳為具有1至20個碳原子之線形或環形碳酸基。The carbonic acid group contained in the specified monomer is preferably a linear or cyclic carbonic acid group having 1 to 30 carbon atoms, and is preferably a linear or cyclic carbonic acid group having 1 to 20 carbon atoms.

至於碳酸酯基之實例,其可提出以下結構,然而不受其限制。As for the example of the carbonate group, the following structure can be proposed, but is not limited thereto.

含於指定單體之縮醛基較佳為具有1至30個碳原子之線形或環形縮醛基,而且較佳為具有1至20個碳原子之線形或環形縮醛基。至於縮醛基之實例,其可提出以下結構,然而不受其限制。在以下結構中,R表示氫原子、烷基、環烷基、或芳基,其中烷基、環烷基或芳基各獨立地具有1至20個碳原子。The acetal group contained in the specified monomer is preferably a linear or cyclic acetal group having 1 to 30 carbon atoms, and is preferably a linear or cyclic acetal group having 1 to 20 carbon atoms. As for the example of the acetal group, the following structure can be proposed, but is not limited thereto. In the following structure, R represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group, wherein the alkyl group, the cycloalkyl group or the aryl group each independently has 1 to 20 carbon atoms.

含於指定單體之磷酸基較佳為具有1至30個碳原子之線形或環形磷酸基,而且較佳為具有1至20個碳原子之線形或環形磷酸基。至於磷酸基之實例,其可提出以下結構,然而不受其限制。The phosphate group contained in the specified monomer is preferably a linear or cyclic phosphate group having 1 to 30 carbon atoms, and is preferably a linear or cyclic phosphate group having 1 to 20 carbon atoms. As for the example of the phosphate group, the following structure can be proposed, but is not limited thereto.

至於上述單體之指定實例,其可較佳地使用以下化合物,然而不受其限制。As the specified examples of the above monomers, the following compounds can be preferably used, but are not limited thereto.

[表1] [Table 1]

本發明之樹脂為一種藉由共聚合上述指定單體作為共聚合成分而製造之樹脂,而且較佳為一種藉由共聚合具有可為樹脂側鏈之乙烯不飽和雙鍵的部分結構之成分(以下亦稱為「提供樹脂雙鍵之共聚合成分」)與上述指定單體而製造之樹脂。The resin of the present invention is a resin produced by copolymerizing the above-mentioned specified monomer as a copolymerization component, and is preferably a component having a partial structure having an ethylenically unsaturated double bond which may be a resin side chain by copolymerization ( Hereinafter, it is also referred to as "a copolymer component which provides a resin double bond") and a resin produced by the above specified monomer.

至於提供本發明樹脂之共聚合成分的組合,即「指定單體」與「提供樹脂雙鍵之共聚合成分」的組合,其較佳為任何M-1、M-8、i-1、i-7、i-8、i-10、i-16、及i-49與任何M-9A、M-11A、M-12A、M-13A、M-14A、M-15A、M-9MA、M-11MA、M-12MA、M-13MA、M-14MA、M-15MA、及M-16MA之組合,更佳為任何M-1、i-1、i-10、i-16、及i-49與任何M-11A、M-13A、M-14A、M-11MA、M-13MA、及M-14MA之組合,而且特佳為實例化合物i-1與實例化合物M-14MA之組合、實例化合物i-1與實例化合物M-11MA之組合、實例化合物i-1與實例化合物M-13MA之組合、實例化合物M-1與實例化合物M-14MA之組合、實例化合物M-1與實例化合物M-11MA之組合、及實例化合物M-1與實例化合物M-13MA之組合。The combination of the copolymerizable component of the resin of the present invention, that is, the combination of "designated monomer" and "copolymerized component providing a resin double bond" is preferably any of M-1, M-8, i-1, i. -7, i-8, i-10, i-16, and i-49 with any M-9A, M-11A, M-12A, M-13A, M-14A, M-15A, M-9MA, M Combination of -11MA, M-12MA, M-13MA, M-14MA, M-15MA, and M-16MA, more preferably any M-1, i-1, i-10, i-16, and i-49 Combination with any of M-11A, M-13A, M-14A, M-11MA, M-13MA, and M-14MA, and particularly preferred combination of example compound i-1 with the example compound M-14MA, example compound i -1 in combination with the example compound M-11MA, the combination of the example compound i-1 with the example compound M-13MA, the combination of the example compound M-1 with the example compound M-14MA, the example compound M-1 and the example compound M-11MA Combinations, and combinations of the example compound M-1 with the exemplified compound M-13MA.

上述組合關於樹脂合成容易性、含樹脂之硬化性組成物的敏感度與顯影力、及儲存安定性較佳。The above combination is preferable in terms of easiness of resin synthesis, sensitivity to a resin-containing curable composition, developing power, and storage stability.

本發明樹脂作為共聚物之組態可為嵌段共聚物、無規共聚物、接枝共聚物等。其關於樹脂合成容易性特佳為嵌段共聚物。The configuration of the resin of the present invention as a copolymer may be a block copolymer, a random copolymer, a graft copolymer or the like. It is particularly preferred to be a block copolymer with respect to ease of resin synthesis.

提供上述本發明樹脂雙鍵之共聚物成分的含量較佳為 0.1莫耳%至95莫耳%,更佳為1莫耳%至85莫耳%,而且特佳為5莫耳%至75莫耳%。The content of the copolymer component which provides the above resin double bond of the present invention is preferably 0.1 mol% to 95 mol%, more preferably 1 mol% to 85 mol%, and particularly preferably 5 mol% to 75 mol%.

上述「提供樹脂雙鍵之共聚合成分的含量」在此特別地表示以下。The above "the content of the copolymerization component which provides a resin double bond" is specifically shown below.

即在上述合成方法1)中,其表示「在由式(12)表示之自由基聚合性化合物的共聚物中之含量」,在上述合成方法2)、4)及6)中,其表示「在共聚合具有官能基之自由基聚合性化合物後,官能基與任何式(13)、(14)及(15)之反應後在作為共聚合成分之共聚物中之含量」,及在合成方法3或5)中,其表示「具有由式(2)或(3)表示之不飽和基及加成聚合性質高於不飽和基之乙烯不飽和基的自由基聚合性化合物之共聚物中之含量」。In the above-mentioned synthesis method 1), it means "the content in the copolymer of the radically polymerizable compound represented by the formula (12)", and in the above synthesis methods 2), 4) and 6), it means " After copolymerizing a radically polymerizable compound having a functional group, the content of the functional group in any of the copolymers of the formula (13), (14) and (15) in the copolymer as a copolymerization component, and in the synthesis method In 3 or 5), it means "in a copolymer of a radically polymerizable compound having an unsaturated group represented by the formula (2) or (3) and an addition polymerization property higher than an ethylenically unsaturated group of an unsaturated group; content".

由於提供上述樹脂雙鍵之共聚合成分的含量為上述範圍,其改良敏感度且對於基板之黏附性質較佳,因此較佳。Since the content of the copolymerization component which provides the above double bond of the resin is in the above range, the sensitivity is improved and the adhesion property to the substrate is preferable, which is preferable.

在本發明之樹脂中,作為共聚合成分之上述指定單體的含量較佳為1莫耳%至90莫耳%,更佳為3莫耳%至70莫耳%,而且特佳為5莫耳%至50莫耳%。In the resin of the present invention, the content of the above specified monomer as a copolymerization component is preferably from 1 mol% to 90 mol%, more preferably from 3 mol% to 70 mol%, and particularly preferably 5 mol%. Ear to 50% by mole.

由於上述指定單體之含量為上述範圍,其改良敏感度且對於基板之黏附性質較佳,因此較佳。Since the content of the above specified monomer is in the above range, the sensitivity is improved and the adhesion property to the substrate is preferred, which is preferable.

上述樹脂中「上述指定單體之含量」之莫耳比例(組成成分比例)及上述樹脂中「上述提供樹脂雙鍵之共聚合成分的含量」較佳為100:1至1:100,更佳為50:1至1:50,而且特佳為10:1至1:10。The molar ratio (composition ratio) of the "content of the above-mentioned specified monomer" in the resin and the "content of the copolymerized component of the resin double bond provided above" in the resin are preferably from 100:1 to 1:100, more preferably It is 50:1 to 1:50, and it is especially good for 10:1 to 1:10.

由於上述指定單體及上述提供樹脂雙鍵之共聚合成分的組成成分比例為上述範圍,其改良敏感度且對於基板之黏附性質較佳,因此較佳。Since the ratio of the composition of the above-mentioned designated monomer and the above-mentioned copolymerized component which provides the double bond of the resin is in the above range, the sensitivity is improved and the adhesion property to the substrate is preferable, which is preferable.

本發明之樹脂可為-種藉由聚合含鹼溶性基之單體作為共聚合成分而製造之樹脂。「鹼溶性基」在此表示在形成圖案時被使用之顯影溶液解離而改良對顯影溶液(鹼性水溶液)之溶解度的官能基。鹼溶性基較佳為一種在25℃水中之pKa為11或更小之官能基。至於官能基,其可提出例如羧基、硫醯基、碸醯胺基、磷酸基、酚型羥基等。其特佳為羧基。The resin of the present invention may be a resin produced by polymerizing an alkali-soluble group-containing monomer as a copolymerization component. The "alkali-soluble group" here means a functional group which is dissociated by the developing solution used when forming a pattern to improve the solubility of the developing solution (basic aqueous solution). The alkali-soluble group is preferably a functional group having a pKa of 11 or less in water at 25 °C. As the functional group, for example, a carboxyl group, a thiol group, a decylamino group, a phosphoric acid group, a phenol type hydroxyl group or the like can be proposed. It is particularly preferably a carboxyl group.

作為共聚合成分之上述含鹼溶性基單體的含量較佳為1莫耳%至90莫耳%,更佳為3莫耳%至70莫耳%,而且特佳為5莫耳%至50莫耳%。The content of the above alkali-soluble group-containing monomer as a copolymerization component is preferably from 1 mol% to 90 mol%, more preferably from 3 mol% to 70 mol%, and particularly preferably from 5 mol% to 50%. Moer%.

由於作為共聚合成分之上述含鹼溶性基單體的含量為上述範圍,其改良敏感度且對於基板之黏附性質較佳,因此較佳。Since the content of the above-mentioned alkali-soluble group-containing monomer as a copolymerization component is in the above range, the sensitivity is improved and the adhesion property to the substrate is preferable, which is preferable.

重量平均分子量(GPC測量中之聚苯乙烯當量值)較佳為500至100,000,進一步較佳為1,000至50,000,特佳為1,000至30,000。樹脂之分子量分布(重量平均分子量與數量平均分子量之比例)較佳為3.0或更小,而且更佳為2.0或更小。The weight average molecular weight (polystyrene equivalent value in GPC measurement) is preferably from 500 to 100,000, further preferably from 1,000 to 50,000, particularly preferably from 1,000 to 30,000. The molecular weight distribution (ratio of the weight average molecular weight to the number average molecular weight) of the resin is preferably 3.0 or less, and more preferably 2.0 or less.

以下提出本發明樹脂之指定實例及其重量平均分子量,然而本發明不受其限制。Designated examples of the resin of the present invention and its weight average molecular weight are set forth below, but the present invention is not limited thereto.

依照本發明之樹脂,指定單體與提供上述樹脂雙鍵之共聚合成分的總含量(莫耳%)較佳為2莫耳%至98莫耳%,更佳為5莫耳%至90莫耳%,而且特佳為10莫耳%至80莫耳%。The total content (% by mole) of the copolymerizable component of the specified monomer and the double bond of the above resin is preferably from 2 mol% to 98 mol%, more preferably from 5 mol% to 90 mol, in accordance with the resin of the present invention. Ear %, and particularly preferably from 10 mol% to 80 mol%.

由於上述總含量為上述範圍,其改良敏感度且對於基板之黏附性質較佳,因此較佳。Since the above total content is in the above range, the sensitivity is improved and the adhesion property to the substrate is better, which is preferable.

上述樹脂之含量相對本發明硬化性組成物之總固體成分較佳為0.1質量%至75質量%,更佳為1質量%至50質量%,而且特佳為2質量%至40質量%。依照此範圍可得到較佳之敏感度及圖案形成性質。The content of the above resin is preferably from 0.1% by mass to 75% by mass, more preferably from 1% by mass to 50% by mass, and particularly preferably from 2% by mass to 40% by mass, based on the total solid content of the curable composition of the present invention. According to this range, better sensitivity and pattern formation properties can be obtained.

<光聚合引發劑> 本發明之硬化性組成物含用於改良敏感度及圖案形成性質之光聚合引發劑(B)。<Photopolymerization initiator> The curable composition of the present invention contains a photopolymerization initiator (B) for improving sensitivity and pattern forming properties.

本發明之光聚合引發劑為一種見光分解,用於引發及促進本發明聚合性成分之聚合的化合物,其較佳為在300至500奈米波長之區域具有吸收。此外光聚合引發劑可單獨或以二或更多種之組合使用。The photopolymerization initiator of the present invention is a compound which is photodegradable and which is used for initiating and promoting the polymerization of the polymerizable component of the present invention, and preferably has an absorption in a region of a wavelength of from 300 to 500 nm. Further, the photopolymerization initiator may be used singly or in combination of two or more.

至於光聚合引發劑,其可提出例如有機鹵化物化合物、氧二唑化合物、羰基化合物、縮酮化合物、安息香化合物、吖啶化合物、有機過氧化物化合物、偶氮化合物、薰草素化合物、疊氮化合物、金屬芳香類化合物、六芳基二咪唑化合物、有機硼酸化合物、二磺酸酯化合物、肟酯化合物、鎓鹽化合物、醯基膦(氧化物)化合物、烷基胺化合物等。As the photopolymerization initiator, for example, an organic halide compound, an oxadiazole compound, a carbonyl compound, a ketal compound, a benzoin compound, an acridine compound, an organic peroxide compound, an azo compound, a xanthan compound, or a stack can be proposed. A nitrogen compound, a metal aromatic compound, a hexaaryldiimidazole compound, an organic boronic acid compound, a disulfonate compound, an oxime ester compound, a phosphonium salt compound, a mercaptophosphine (oxide) compound, an alkylamine compound, or the like.

以下詳述各化合物。Each compound is described in detail below.

至於有機鹵化物化合物,其可提出Wakabayashi等人之”Bull Chem.Soc Japan”42,2924(1969)、美國專利第3,905,815號的說明書、日本專利申請案公告(JP-B)第 46-4605號、JP-A第48-36281、55-32070、60-239736、61-169835號、61-169837、62-58241號、62-212401、63-70243、63-298339號專利、M.P.Hutt之”Journal of Heterocyclic Chemistry”1(No 3),(1970)等揭示之化合物。特別是可提出經三鹵甲基取代噁唑化合物及s-三化合物。As for the organic halide compound, it can be proposed by Wakabayashi et al., "Bull Chem. Soc Japan" 42, 2924 (1969), US Patent No. 3,905,815, Japanese Patent Application Publication (JP-B) No. 46-4605 , JP-A Nos. 48-36281, 55-32070, 60-239736, 61-169835, 61-169837, 62-58241, 62-212401, 63-70243, 63-298339, MP Hutt" Journal of Heterocyclic Chemistry" 1 (No. 3), (1970) and the like. In particular, trihalomethyl substituted oxazole compounds and s-three can be proposed. Compound.

至於s-三化合物,其更佳為其中將至少一個經單、二或三鹵素取代甲基鍵結s-三環之s-三衍生物,更特別是可提出例如2,4,6-参(單氯甲基)-s-三、2,4,6-參(二氯甲基)-s-三、2,4,6-参(三氯甲基)-s-三、2-甲基-4,6-貳(三氯甲基)-s-三、2-正丙基-4,6-貳(三氯甲基)-s-三、2-(α,α,β-三氯乙基)-4,6-貳(三氯甲基)-s-三、2-苯基-4,6-貳(三氯甲基)-s-三、2-(對甲氧基苯基)-4,6-貳(三氯甲基)-s-三、2-(3,4-環氧基苯基)-4,6-貳(三氯甲基)-s-三、2-(對氯苯基)-4,6-貳(三氯甲基)-s-三、2-[1-(對甲氧基苯基)-2,4-丁二烯基]-4,6-貳(三氯甲基)-s-三、2-苯乙烯基-4,6-貳(三氯甲基)-s-三、2-(對甲氧基苯乙烯基)-4,6-貳(三氯甲基)-s-三、2-(對異丙氧基苯乙烯基)-4,6-貳(三氯甲基)-s-三、2-(對甲苯基)-4,6-貳(三氯甲基)-s-三、2-(4-萘氧基萘基)-4,6-貳(三氯甲基)-s-三、2-苯硫基-4,6-貳(三氯甲基)-s-三、2-苄硫基-4,6-貳(三氯甲基)-s-三、2,4,6-参(二溴甲基)-s-三、2,4,6-参(三溴甲基)-s-三、2-甲基-4,6-貳(三溴甲基)-s-三、2-甲氧基-4,6-貳(三溴甲基)-s-三等。As for s-three a compound, more preferably wherein at least one of the mono-, di- or tri-halogen-substituted methyl-bonded s-three Ring s-three Derivatives, more particularly, can be proposed, for example, 2,4,6-paran (monochloromethyl)-s-three , 2,4,6-gin (dichloromethyl)-s-three , 2,4,6-para (trichloromethyl)-s-three 2-methyl-4,6-anthracene (trichloromethyl)-s-three 2-n-propyl-4,6-fluorene (trichloromethyl)-s-three , 2-(α,α,β-trichloroethyl)-4,6-indole (trichloromethyl)-s-three 2-phenyl-4,6-fluorene (trichloromethyl)-s-three , 2-(p-methoxyphenyl)-4,6-fluorene (trichloromethyl)-s-three , 2-(3,4-epoxyphenyl)-4,6-fluorene (trichloromethyl)-s-three , 2-(p-chlorophenyl)-4,6-fluorene (trichloromethyl)-s-three ,2-[1-(p-methoxyphenyl)-2,4-butadienyl]-4,6-fluorene (trichloromethyl)-s-three 2-styryl-4,6-fluorene (trichloromethyl)-s-three , 2-(p-methoxystyryl)-4,6-fluorene (trichloromethyl)-s-three , 2-(p-isopropoxystyryl)-4,6-fluorene (trichloromethyl)-s-three , 2-(p-tolyl)-4,6-indole (trichloromethyl)-s-three , 2-(4-naphthyloxynaphthyl)-4,6-fluorene (trichloromethyl)-s-three 2-phenylthio-4,6-indole (trichloromethyl)-s-three 2-Benzylthio-4,6-indole (trichloromethyl)-s-three , 2,4,6-parade (dibromomethyl)-s-three , 2,4,6-parade (tribromomethyl)-s-three 2-methyl-4,6-anthracene (tribromomethyl)-s-three 2-methoxy-4,6-indole (tribromomethyl)-s-three Wait.

至於氧二唑化合物,其可提出2-三氯甲基-5-苯乙烯基-1,3,4-噁二唑、2-三氯甲基-5-(氰基苯乙烯基)-1,3,4-噁二唑、2-三氯甲基-5-(萘-1-基)-1,3,4-噁二唑、2-三氯甲基-5-(4-苯乙烯基)苯乙烯基-1,3,4-噁二唑等。As the oxadiazole compound, it is possible to propose 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5-(cyanostyryl)-1 , 3,4-oxadiazole, 2-trichloromethyl-5-(naphthalen-1-yl)-1,3,4-oxadiazole, 2-trichloromethyl-5-(4-styrene Styryl-1,3,4-oxadiazole and the like.

至於羰基化合物,其可提出二苯基酮衍生物,如二苯基酮、米其酮、2-甲基二苯基酮、3-甲基二苯基酮、4-甲基二苯基酮、2-氯二苯基酮、4-溴二苯基酮、與2-羧基二苯基酮,苯乙酮衍生物,如2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基苯基苯乙酮、1-羥基環己基苯基酮、α-羥基-2-甲基苯基丙酮、1-羥基-1-甲基乙基-(對異丙基苯基)酮、1-羥基-1-(對十二碳基苯基)酮、2-甲基-(4’-(甲硫基)苯基)-2-嗎啉-1-丙酮、1,1,1-三氯甲基-(對丁基苯基)酮、與2-苄基-2-二甲胺基-4-嗎啉苯丁酮,硫衍生物,如硫、2-乙基硫、2-異丙基硫、2-氯硫、2,4-二甲基硫、2,4-二乙基硫、與2,4-二異丙基硫,苯甲酸酯衍生物,如對二甲胺基苯甲酸乙酯與對二乙胺基苯甲酸乙酯等。As for the carbonyl compound, it may be proposed as a diphenyl ketone derivative such as diphenyl ketone, benzyl ketone, 2-methyl diphenyl ketone, 3-methyl diphenyl ketone or 4-methyl diphenyl ketone. , 2-chlorodiphenyl ketone, 4-bromodiphenyl ketone, and 2-carboxydiphenyl ketone, acetophenone derivatives, such as 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyphenylacetophenone, 1-hydroxycyclohexyl phenyl ketone, α-hydroxy-2-methylphenylacetone, 1-hydroxy-1-methylethyl-(p-isopropyl Phenyl phenyl ketone, 1-hydroxy-1-(p-dodecylphenyl) ketone, 2-methyl-(4'-(methylthio)phenyl)-2-morpholine-1-propanone, 1,1,1-trichloromethyl-(p-butylphenyl)one, and 2-benzyl-2-dimethylamino-4-morpholinone, sulfur Derivatives such as sulfur 2-ethylsulfide 2-isopropylsulfur 2-chlorosulfur 2,4-dimethylsulfur 2,4-diethyl sulphide And 2,4-diisopropyl sulfide a benzoate derivative such as ethyl p-dimethylaminobenzoate and ethyl p-diethylaminobenzoate.

至於縮酮化合物,其可提出苄基甲基縮酮、苄基-β-甲氧基乙基乙基乙縮酮等。As the ketal compound, a benzyl methyl ketal, a benzyl-β-methoxyethyl ethyl ketal or the like can be mentioned.

至於安息香化合物,其可提出間安息香異丙基醚、安息香異丁基醚、安息香甲基醚、鄰苯甲醯基苯甲酸甲酯等。As the benzoin compound, it may be mentioned that benzoin isopropyl ether, benzoin isobutyl ether, benzoin methyl ether, methyl o-besylbenzoate, and the like.

至於吖啶化合物,其可提出9-苯基吖啶、1,7-貳(9-吖啶基)庚烷等。As the acridine compound, it may be mentioned that 9-phenyl acridine, 1,7-fluorene (9-acridinyl) heptane or the like.

至於有機過氧化物化合物,其可提出例如三甲基環己烷過氧化物、乙醯基丙酮過氧化物、1,1-貳(第三丁基過氧基)-3,3,5-三甲基環己烷、1,1-貳(第三丁基過氧基)環己烷、2,2-貳(第三丁基過氧基)丁烷、氫過氧化第三丁基、氫過氧化異丙苯、氫過氧化二異丙基苯、2,5-二甲基己烷-2,5-二氫過氧化物、氫過氧化1,1,3,3-四甲基丁基、過氧化第三丁基異丙苯基、過氧化二異丙苯基、2,5-二甲基-2,5-二(第三丁基過氧基)己烷、過氧化2,5-含氧氰基(oxanoyl)、過氧化琥珀醯基、過氧化苯甲醯基、過氧化2,4-二氯苯甲醯基、過氧基二碳酸二異丙酯、過氧基二碳酸二-2-乙基己酯、過氧基二碳酸二-2-乙氧基乙酯、過氧基碳酸二甲氧基異丙酯、過氧基二碳酸二(3-甲基-3-甲氧基丁酯)、過氧基乙酸第三丁酯、過氧基三甲基乙酸第三丁酯、過氧基新癸酸第三丁酯、過氧基辛酸第三丁酯、過氧基月桂酸第三丁酯、聯三基(tercyl)碳酸酯、3,3’,4,4’-四(第三丁基過氧基羰基)二苯基酮、3,3’,4,4’-四(第三己基過氧基羰基)二苯基酮、3,3’,4,4’-四(對異丙基異丙苯基過氧基羰基)二苯基酮、羰基二(第三丁基過氧基二氫二酞酸酯)、羰基二(第三己基過氧基二氫二酞酸酯)等。As the organic peroxide compound, for example, trimethylcyclohexane peroxide, acetylacetone peroxide, 1,1-anthracene (t-butylperoxy)-3,3,5- Trimethylcyclohexane, 1,1-anthracene (t-butylperoxy)cyclohexane, 2,2-anthracene (t-butylperoxy)butane, tert-butyl hydroperoxide, Cumene hydroperoxide, diisopropylbenzene hydroperoxide, 2,5-dimethylhexane-2,5-dihydroperoxide, 1,1,3,3-tetramethyl hydroperoxide Butyl, tributyl cumyl peroxide, dicumyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, peroxide 2 , 5-oxoyl, oxidized amber thiol, benzammonium peroxide, 2,4-dichlorobenzhydryl peroxide, diisopropyl peroxydicarbonate, peroxy Di-2-ethylhexyl dicarbonate, di-2-ethoxyethyl peroxydicarbonate, dimethoxyisopropyl peroxydicarbonate, di(3-methyl-peroxydicarbonate) 3-methoxybutyl ester), tert-butyl peroxyacetate, tert-butyl peroxytrimethylacetate, tert-butyl peroxy neodecanoate , tert-butyl peroxyoctanoate, tert-butyl peroxy laurate, tercyl carbonate, 3,3',4,4'-tetra (t-butylperoxycarbonyl) Diphenyl ketone, 3,3',4,4'-tetrakis(trihexylperoxycarbonyl)diphenyl ketone, 3,3',4,4'-tetra(p-isopropyl cumyl) Peroxycarbonyl)diphenyl ketone, carbonyl bis(t-butylperoxydihydrodicaprate), carbonyldi(t-hexylperoxydihydrodicaprate) and the like.

至於偶氮化合物,其可提出例如JP-A第8-108621號專利所述之偶氮化合物等。As the azo compound, for example, an azo compound or the like described in JP-A No. 8-108621 can be proposed.

至於薰草素化合物,其可提出例如3-甲基-5-胺基((s-三-2-基)胺基)-3-苯基異丙苯、3-氯-5-二乙胺基((s-三-2-基)胺基)-3-苯基異丙苯、3-丁基-5-二乙胺基( (s-三-2-基)胺基)-3-苯基異丙苯等。As for the kaempferol compound, it can be proposed, for example, 3-methyl-5-amino group ((s-three) -2-yl)amino)-3-phenylcumene, 3-chloro-5-diethylamino ((s-three) -2-yl)amino)-3-phenylcumene, 3-butyl-5-diethylamino ((s-three) -2-yl)amino)-3-phenylcumene and the like.

至於疊氮化合物,其可提出美國專利第2,848,328、2,852,379及2,940,853號所述之有機疊氮化合物、2,6-貳(疊氮亞苄基)-4-乙基環己酮(BAC-E)等。As for the azide compound, the organic azide compound described in U.S. Patent Nos. 2,848,328, 2,852,379 and 2,940,853, 2,6-fluorene (azidobenzylidene)-4-ethylcyclohexanone (BAC-E) can be proposed. Wait.

至於金屬芳香頪化合物,其可提出JP-A第59-152396、61-151197、63-41484、2-249、2-4705、及5-83588號專利所述之各種二茂鈦化合物,如二環戊二烯基-Ti-貳苯基、二環戊二烯基-Ti-貳-2,6-二氟苯-1-基、二環戊二烯基-Ti-貳-2,4-二氟苯-1-基、二環戊二烯基-Ti-貳-2,4,6-三氟苯-1-基、二環戊二烯基-Ti-貳-2,3,5,6-四氟苯-1-基、二環戊二烯基-Ti-貳-2,3,4,5,6-五氟苯-1-基、二甲基環戊二烯基-Ti-貳-2,6-二氟苯-1-基、二甲基環戊二烯基-Ti-貳-2,4,6-三氟苯-1-基、二甲基環戊二烯基-Ti-貳-2,3,5,6-四氟苯-1-基、二甲基環戊二烯基-Ti-貳-2,3,4,5,6-五氟苯-1-基、JP-A第1-304453及1-152109號專利所述之鐵-芳烴錯合物等。As the metal aromatic hydrazine compound, various titanocene compounds described in JP-A Nos. 59-152396, 61-151197, 63-41484, 2-249, 2-4705, and 5-83588 can be proposed, such as two. Cyclopentadienyl-Ti-fluorenylphenyl, dicyclopentadienyl-Ti-贰-2,6-difluorophenyl-1-yl, dicyclopentadienyl-Ti-贰-2,4- Difluorophenyl-1-yl, dicyclopentadienyl-Ti-indole-2,4,6-trifluorophenyl-1-yl, dicyclopentadienyl-Ti-贰-2,3,5, 6-tetrafluorophenyl-1-yl, dicyclopentadienyl-Ti-贰-2,3,4,5,6-pentafluorophenyl-1-yl, dimethylcyclopentadienyl-Ti- Indole-2,6-difluorophenyl-1-yl, dimethylcyclopentadienyl-Ti-indole-2,4,6-trifluorophenyl-1-yl, dimethylcyclopentadienyl- Ti-贰-2,3,5,6-tetrafluorophenyl-1-yl, dimethylcyclopentadienyl-Ti-贰-2,3,4,5,6-pentafluorophenyl-1-yl An iron-aromatic hydrocarbon complex or the like described in JP-A Nos. 1-104453 and 1-152109.

至於六芳基二咪唑化合物,其可提出例如JP-B-6-29285號專利、美國專利第3,479,185、4,311,783、4,622,286號等所述之各種化合物,特別是2,2’-貳(鄰氯苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-貳(鄰溴苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-貳(鄰,對-二氯苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-貳(鄰氯苯基)-4,4’,5,5’-四(間甲氧基苯基)二咪唑、2,2’-貳(鄰,鄰’-二氯苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-貳(鄰硝基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-貳(鄰甲基苯基)-4,4’,5,5’- 四苯基二咪唑、2,2’-貳(鄰三氟甲基苯基)-4,4’,5,5’-四苯基二咪唑等。As for the hexaaryldiimidazole compound, various compounds such as those described in JP-B-6-29285, U.S. Patent Nos. 3,479,185, 4,311,783, 4,622,286, etc., especially 2,2'-fluorene (o-chlorobenzene) can be proposed. -4,4',5,5'-tetraphenyldiimidazole, 2,2'-indole (o-bromophenyl)-4,4',5,5'-tetraphenyldiimidazole, 2, 2'-贰(o-, p-dichlorophenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-fluorene (o-chlorophenyl)-4,4',5 , 5'-tetrakis (m-methoxyphenyl) diimidazole, 2,2'-fluorene (o-, o-'-dichlorophenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-贰(o-nitrophenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-fluorene (o-methylphenyl)-4,4',5 , 5'- Tetraphenyldiimidazole, 2,2'-fluorene (o-trifluoromethylphenyl)-4,4',5,5'-tetraphenyldiimidazole, and the like.

至於有機硼酸化合物,其可提出例如JP-A第62-143044、62-150242、9-188685、9-188686、9-188710、2000-131837、及2002-107916號專利、日本專利第2,764,769號、JP-A第2002-116539號專利等、及Kunz,Martin之”Rad Tech ’98.Proceeding April 19-22,1998,Chicago”等所述之有機硼酸酯,JP-A第6-157623、6-175564及6-175561號專利所述之有機硼鋶錯合物或有機氧鋶錯合物,JP-A第6-175554及6-175553號專利揭示之有機硼錪錯合物,JP-A第9-188710號專利揭示之有機硼鏻錯合物,JP-A第6-348011、7-128785、7-140589、7-306527、及7-292014號專利之有機硼過渡金屬配位錯合物等作為指定實例。As for the organic boronic acid compound, for example, JP-A Nos. 62-143044, 62-150242, 9-188685, 9-188686, 9-188710, 2000-131837, and 2002-107916, and Japanese Patent No. 2,764,769, JP-A No. 2002-116539, et al., and organic borate esters described by Kunz, Martin, "Rad Tech '98. Proceeding April 19-22, 1998, Chicago", JP-A No. 6-157623, 6 -Organic borofluorene complex or organooxo-inclusion complex as described in JP-A No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The organoboron ruthenium complex disclosed in Japanese Patent No. 9-188710, the organoboron transition metal coordination of JP-A Nos. 6-348011, 7-128785, 7-140589, 7-306527, and 7-292014 Things etc. are specified examples.

至於二磺酸化合物,其可提出JP-A第61-166544號、JP-A第2002-328465號專利之說明書所述之化合物等。As the disulfonic acid compound, a compound described in the specification of JP-A No. 61-166544, JP-A No. 2002-328465, and the like can be proposed.

至於肟酯化合物,其可提出J.C.S.Perkin II(1979)1653-1660、J.C.S.Perkin II(1979)156-162、Journal of Photopolymer Science and Technology(1995)202-232、及JP-A第2000-66385號所述之化合物、JP-A第2000-80068號專利及日本專利申請案國際公告第2004-534797號所述之化合物等。As the oxime ester compound, it can be proposed by JCS Perkin II (1979) 1653-1660, JCS Perkin II (1979) 156-162, Journal of Photopolymer Science and Technology (1995) 202-232, and JP-A No. 2000-66385. The compound, the compound described in JP-A No. 2000-80068, and the Japanese Patent Application Publication No. 2004-534797.

至於鎓鹽化合物,其可提出例如S.I.Schlesinger之Photogr.Sci.Eng.,18,387(1974)、及T.S.Bal等人之 Polymer,21,423(1980)揭示之重氮鹽,美國專利第4,069,055號之說明書及JP-A第4-365049號專利揭示之銨鹽,美國專利第4,069,055及4,069,056號專利揭示之鏻鹽,歐洲專利第104,143號、美國專利第339,049及410,201號、及JP-A第2-150848及2-296514號專利敘述之錪鹽等。As the onium salt compound, it can be proposed, for example, by S.I. Schlesinger, Photogr. Sci. Eng., 18, 387 (1974), and T. S. Bal et al. The diazonium salt disclosed in Polymer, 21, 423 (1980), the specification of U.S. Patent No. 4,069,055, and the ammonium salt disclosed in JP-A No. 4-365049, the bismuth salt disclosed in U.S. Patent Nos. 4,069,055 and 4,069,056, European Patent No. Anthraquinone salts and the like described in U.S. Patent Nos. 339,049 and 410,201, and JP-A Nos. 2-150848 and 2-296514.

較佳地用於本發明之錪鹽為二芳基錪鹽。由安定性之觀點,其較佳為經2或更多個給電子基取代,如烷基、烷氧基與芳氧基。The onium salt which is preferably used in the present invention is a diarylsulfonium salt. From the viewpoint of stability, it is preferably substituted with 2 or more electron-donating groups such as an alkyl group, an alkoxy group and an aryloxy group.

至於較佳地用於本發明之鋶鹽,其可提出歐洲專利第370,693、390,214、233,567、297,443、及297,442號、美國專利第4,933,377、161,811、410,201、339,049、4,760,013,4,734,444、及2,833,827號、及德國專利第2,904,626、3,604,580及3,604,581號揭示之鋶鹽。由敏感度之觀點,其較佳為經吸電子基取代。較佳為吸電子基具有大於0之Hammett值。至於吸電子基,其可提出鹵素原子、羧酸等。As for the onium salt which is preferably used in the present invention, it is possible to provide European Patent Nos. 370,693, 390,214, 233,567, 297,443, and 297,442, and U.S. Patent Nos. 4,933,377, 161,811, 410,201, 339,049, 4,760,013, 4,734,444, and 2,833,827, and The onium salts disclosed in German Patent Nos. 2,904,626, 3,604,580 and 3,604,581. From the standpoint of sensitivity, it is preferably substituted by an electron withdrawing group. Preferably, the electron withdrawing group has a Hammett value greater than zero. As the electron withdrawing group, a halogen atom, a carboxylic acid or the like can be proposed.

此外至於其他較佳鋶鹽,其可提出在300奈米或更大具有吸收之鋶鹽,三芳基鋶鹽之取代基之一具有闊馬靈、蒽醌結構。此外至於其他較佳鋶鹽,其可提出在300奈米或更大具有吸收之鋶鹽,以具有烯丙氧基、芳硫基之三芳基鋶鹽作為取代基。Further, as for other preferred onium salts, one may have an absorption of an onium salt of 300 nm or more, and one of the substituents of the triarylsulfonium salt has a broad gelatin and an anthracene structure. Further, as for other preferred onium salts, an onium salt having an absorption of 300 nm or more may be proposed, and a triarylsulfonium salt having an allyloxy group or an arylthio group may be used as a substituent.

此外至於鎓鹽化合物,其可提出J.V.Crivello等人之Macromolecules,10(6),1307(1977)、J.V.Crivello等人之 J.Polymer Sci.,Polymer Chem.Ed.,17,1047(1979)所述之硒鎓鹽,及C.S.Wen等人之Tech,Proc.Conf.Rad.Curing ASIA,p 478 Tokyo,Oct(1988)所述之胂鹽等。Further, as for the onium salt compound, it can be proposed by J. V. Crivello et al., Macromolecules, 10 (6), 1307 (1977), J. V. Crivello et al. Selenium salts described by J. Polymer Sci., Polymer Chem. Ed., 17, 1047 (1979), and Tech by CWen et al., Proc. Conf. Rad. Curing ASIA, p 478 Tokyo, Oct (1988) Said strontium salt and the like.

至於醯基膦(氧化物)化合物,其可提出Ciba Speciality Chemicals Corp.製造之IRUGACURE 819、DAROCURE 4265、DAROCURE TPO等。As the mercaptophosphine (oxide) compound, it can be proposed as IRUGACURE 819, DAROCURE 4265, DAROCURE TPO, and the like manufactured by Ciba Speciality Chemicals Corp.

至於烷基胺基化合物,其可提出例如具有二烷基胺基苯基的化合物、或JP-A第9-281698號專利之第[0047]段、JP-A第6-19240及6-19249專利揭示之及烷基胺化合物。特別地,至於具有二烷基胺基苯基之化合物,其可提出如對二甲胺基苯甲酸乙酯之化合物,及二烷基胺基苯基羰甲醛,如對二乙胺基苯并羰甲醛與9-咯基(julolidyl)羰甲醛,而且至於烷基胺化合物,其可提出三乙醇胺、二乙醇胺、三乙胺等。As the alkylamino group-based compound, for example, a compound having a dialkylaminophenyl group, or JP-A No. 9-281698, paragraph [0047], JP-A Nos. 6-19240 and 6-19249 The patent discloses an alkylamine compound. In particular, as for the compound having a dialkylaminophenyl group, it may be a compound such as ethyl p-dimethylaminobenzoate, and a dialkylaminophenylcarboxaldehyde such as p-diethylaminobenzoate. Carboxaldehyde and 9- Further, as the alkylamine compound, triethanolamine, diethanolamine, triethylamine or the like can be mentioned.

<光聚合引發劑(B)> 由曝光敏感度之觀點,用於本發明之光聚合抑制劑(B)較佳為一種選自三為主化合物、烷基胺基化合物、苄基二甲基縮酮化合物、α-羥基酮化合物、α-胺基酮化合物、醯基膦為主化合物、氧化膦為主化合物、金屬芳香頪化合物、肟為主化合物、二咪唑為主化合物、鎓為主化合物、苯并噻唑為主化合物、二苯基酮化合物為主化合物、苯乙酮為主化合物與其衍生物、環戊二烯-苯-鐵錯合物與其鹽、鹵甲基噁二唑化合物、及經3-芳基取代薰草素化合物之化合物。<Photopolymerization Initiator (B)> The photopolymerization inhibitor (B) used in the present invention is preferably one selected from three from the viewpoint of exposure sensitivity. a main compound, an alkylamino compound, a benzyldimethylketal compound, an α-hydroxyketone compound, an α-aminoketone compound, a mercaptophosphine main compound, a phosphine oxide-based compound, a metal aromatic quinone compound,肟 main compound, diimidazole-based compound, ruthenium-based compound, benzothiazole-based compound, diphenyl ketone compound as main compound, acetophenone-based compound and its derivative, cyclopentadiene-benzene-iron A complex compound and a salt thereof, a halomethyl oxadiazole compound, and a compound substituted with a 3-aryl-substituted oxacin compound.

其更佳為三為主化合物、烷基胺基化合物、α-胺基酮化合物、醯基膦為主化合物、氧化膦為主化合物、肟為主化合物、二咪唑為主化合物、鎓為主化合物、二苯基酮為主化合物、或苯乙酮為主化合物。進一步較佳為至少一種選自三為主化合物、烷基胺基化合物、肟為主化合物、與二咪唑為主化合物之化合物。It is better for three Main compound, alkylamine based compound, α-amino ketone compound, decyl phosphine-based compound, phosphine oxide-based compound, ruthenium-based compound, diimidazole-based compound, ruthenium-based compound, diphenyl ketone The main compound or acetophenone is the main compound. Further preferably, at least one selected from the group consisting of three A main compound, an alkylamino compound, a ruthenium-based compound, and a compound mainly composed of diimidazole.

光聚合引發劑(B)之含量相對本發明硬化性組成物之總固體含量較佳為0.1質量%至50質量%,更佳為0.5質量%至30質量%,而且特佳為1質量%至20質量%。依照此範圍可得到較佳之敏感度及圖案形成性質。The content of the photopolymerization initiator (B) is preferably from 0.1% by mass to 50% by mass, more preferably from 0.5% by mass to 30% by mass, and particularly preferably from 1% by mass to the total solid content of the curable composition of the present invention. 20% by mass. According to this range, better sensitivity and pattern formation properties can be obtained.

<含乙烯不飽和雙鍵之化合物(C)> 除了上述樹脂,本發明之硬化性組成物可含一種含乙烯不飽和雙鍵之化合物(以下可簡稱為「含乙烯不飽和雙鍵化合物」)。<Compound (C) containing ethylenically unsaturated double bond> In addition to the above resin, the curable composition of the present invention may contain a compound containing an ethylenically unsaturated double bond (hereinafter may be simply referred to as "ethylene-containing unsaturated double bond compound").

除了上述樹脂,用於本發明含乙烯不飽和雙鍵化合物可選自具有至少一個乙烯不飽和雙鍵之加成聚合化合物,其具有至少一個,較佳為二或更多個末端乙烯不飽和鍵。此化合物群組在此業界領域廣為熟知,因此其可用於本發明而無任何限制。其具有例如單體、預聚物(具有即二聚物或三聚物之寡聚物)、其混合物、及其共聚物之化學具體實施例。至於單體及其共聚物之實例,其可提出不飽和羧酸(如丙烯酸、甲基丙烯酸、伊康酸、巴豆酸、異巴豆酸、與順丁烯二酸)、其酯及其醯胺。其可較佳地使用不飽和羧酸與脂族多羥基醇化合物之酯、及不飽和羧酸與脂族多 價胺化合物之醯胺。此外亦可較佳地使用具有親核性取代基(如羥基、胺基及巰基)之不飽和羧酸酯或醯胺、與單官能基或多官能基異氰酸酯或環氧基之加成反應產物,或與單官能基或多官能基羧酸等之脫水縮合反應產物。此外亦較佳為具有親電子性取代基(如異氰酸基及環氧基)之不飽和羧酸酯或醯胺、與單官能基或多官能基醇、胺或硫醇的加成反應產物,此外及具有脫去取代基(如鹵素基及甲苯磺醯氧基)之不飽和羧酸酯或醯胺、與單官能基或多官能基醇、胺或硫醇的取代反應產物。此外至於其他實例,其亦可使用將上述不飽和羧酸以不飽和膦酸、苯乙烯、乙烯基醚等代替之化合物基。In addition to the above resins, the ethylene-containing unsaturated double bond compound used in the present invention may be selected from an addition polymerization compound having at least one ethylenically unsaturated double bond having at least one, preferably two or more terminal ethylenically unsaturated bonds. . This group of compounds is well known in the art and therefore can be used in the present invention without any limitation. It has chemical specific examples of, for example, monomers, prepolymers (having oligomers of dimers or trimers), mixtures thereof, and copolymers thereof. As examples of the monomer and its copolymer, it is possible to propose an unsaturated carboxylic acid (such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, and maleic acid), an ester thereof, and a guanamine thereof. . It is preferred to use an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, and an unsaturated carboxylic acid and an aliphatic group. An amine of a valence amine compound. Further, it is also preferred to use an addition reaction product of an unsaturated carboxylic acid ester or decylamine having a nucleophilic substituent such as a hydroxyl group, an amine group and a mercapto group, and a monofunctional or polyfunctional isocyanate or epoxy group. Or a dehydration condensation reaction product with a monofunctional or polyfunctional carboxylic acid or the like. Further preferred is an addition reaction of an unsaturated carboxylic acid ester or decylamine having an electrophilic substituent such as an isocyanato group and an epoxy group with a monofunctional or polyfunctional alcohol, an amine or a thiol. The product, in addition to the substitution reaction product of an unsaturated carboxylic acid ester or decylamine having a de-substituted substituent such as a halogen group and a tosyloxy group, with a monofunctional or polyfunctional alcohol, an amine or a thiol. Further, as for other examples, a compound group in which the above unsaturated carboxylic acid is replaced with an unsaturated phosphonic acid, styrene, vinyl ether or the like can also be used.

至於脂族多羥基醇化合物與不飽和羧酸之酯的單體之指定實例,其為丙烯酸酯,如乙二醇二丙烯酸酯、三乙二醇二丙烯酸酯、1,3-丁二醇二丙烯酸酯、伸丁二醇二丙烯酸酯、丙二醇二丙烯酸酯、新戊二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷三(丙烯醯氧基丙基)醚、三羥甲基乙烷三丙烯酸酯、己二醇二丙烯酸酯、1,4-環己二醇二丙烯酸酯、四乙二醇二丙烯酸酯、新戊四醇二丙烯酸酯、新戊四醇三丙烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇二丙烯酸酯、二新戊四醇六丙烯酸酯、山梨醇三丙烯酸酯、山梨醇四丙烯酸酯、山梨醇五丙烯酸酯、山梨醇六丙烯酸酯、異三聚氰酸三(丙烯醯氧基乙酯)、聚酯丙烯酸酯寡聚物、與異三聚氰酸經EO修改三丙烯酸酯。A specified example of a monomer of an ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid, which is an acrylate such as ethylene glycol diacrylate, triethylene glycol diacrylate, or 1,3-butylene glycol Acrylate, butanediol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tris(propylene methoxypropyl) ether, three Hydroxymethylethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate, tetraethylene glycol diacrylate, neopentyl alcohol diacrylate, neopentyl alcohol triacrylate Ester, neopentyl alcohol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate Ester, tris(methacryloxyethyl) cyanide, polyester acrylate oligomer, and trisuccinate with EO modified triacrylate.

其有甲基丙烯酸酯,如伸丁二醇二甲基丙烯酸酯、三 乙二醇二甲基丙烯酸酯、新戊二醇二甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、三羥甲基乙烷三甲基丙烯酸酯、乙二醇二甲基丙烯酸酯、1,3-丁二醇二甲基丙烯酸酯、己二醇二甲基丙烯酸酯、新戊四醇二甲基丙烯酸酯、新戊四醇三甲基丙烯酸酯、新戊四醇四甲基丙烯酸酯、二新戊四醇二甲基丙烯酸酯、二新戊四醇六甲基丙烯酸酯、山梨醇三甲基丙烯酸酯、山梨醇四甲基丙烯酸酯、貳[對-(3-甲基丙烯氧基-2-羥基丙氧基)苯基]二甲基甲烷、與貳[對(甲基丙烯氧基乙氧基)苯基]二甲基甲烷。It has methacrylates such as butanediol dimethacrylate, three Ethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate , 1,3-butanediol dimethacrylate, hexanediol dimethacrylate, neopentyl alcohol dimethacrylate, neopentyl alcohol trimethacrylate, neopentyl alcohol tetramethyl Acrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, hydrazine [p-(3-methyl) Propenyloxy-2-hydroxypropoxy)phenyl]dimethylmethane, and hydrazine [p-(methacryloxyethoxy)phenyl]dimethylmethane.

其有伊康酸酯,如乙二醇二伊康酸酯、丙二醇二伊康酸酯、1,3-丁二醇二伊康酸酯、1,4-丁二醇二伊康酸酯、伸丁二醇二伊康酸酯、新戊四醇二伊康酸酯、與山梨醇四伊康酸酯。其有巴豆酸酯,如乙二醇二巴豆酸酯、伸丁二醇二巴豆酸酯與新戊四醇二巴豆酸酯。其有異巴豆酸酯,如乙二醇二異巴豆酸酯、新戊四醇二異巴豆酸酯、與山梨醇二巴豆酸酯。其有順丁烯二酸酯,如乙二醇二順丁烯二酸酯、三乙二醇二順丁烯二酸酯、新戊四醇二順丁烯二酸酯、與山梨醇四順丁烯二酸酯。It has an itaconate such as ethylene glycol diconconate, propylene glycol diconconate, 1,3-butanediol diconcanate, 1,4-butanediol diconcanate, Butanediol diconconate, pentaerythritol diconconate, and sorbitol tetraconcanate. It has a crotonate such as ethylene glycol dicrotonate, butanediol dicrotonate and pentaerythritol dicrotonate. It has isocrotonate such as ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol dicrotonate. It has a maleic acid ester such as ethylene glycol dimaleate, triethylene glycol dimaleate, neopentyl alcohol dimaleate, and sorbitol tetras Butenediates.

至於其他酯之實例,亦較佳為使用例如JP-B第51-47334號及JP-A第57-196231號專利所述之脂族醇為主酯,JP-A第59-5240號、JP-A第59-5241號及JP-A第2-226149號專利所述具有芳族骨架之酯,及JP-A第1-165613號專利所述之含胺基之酯。此外上述酯單體亦可如混合物而使用。As an example of the other ester, it is also preferred to use an aliphatic alcohol-based ester as described in JP-B No. 51-47334 and JP-A No. 57-196231, JP-A No. 59-5240, JP. An ester having an aromatic skeleton as described in JP-A No. 59-5241 and JP-A No. 2-226149, and an amine group-containing ester described in JP-A No. 1-156613. Further, the above ester monomers may also be used as a mixture.

此外至於脂族多羥基胺化合物與不飽和羧酸之醯胺的單體之指定實例,其為亞甲基貳丙烯醯胺、亞甲基貳甲基丙烯醯胺、1,6-伸己基貳丙烯醯胺、1,6-伸己基貳甲基丙烯醯胺、二伸乙三胺参丙烯醯胺、二甲苯貳丙烯醯胺、與二甲苯貳甲基丙烯醯胺。其他較佳醯胺為主單體之實例包括JP-B第54-21726號專利所述具有環伸己基結構之單體。Further, as a specific example of a monomer of an aliphatic polyhydroxyamine compound and a decylamine of an unsaturated carboxylic acid, it is methylene fluorenyl decylamine, methylene hydrazine methacrylamide, 1,6-extension hydrazine. Acrylamide, 1,6-extended decyl methacrylamide, diethylenediamine propylene amide, xylene propylene amide, and xylene methacrylamide. Other examples of preferred guanamine-based monomers include monomers having a cyclohexene structure as described in JP-B No. 54-21726.

此外亦較佳為胺基甲酸酯為主加成聚合化合物,其係使用異氰酸酯與羥基之加成反應製造。至於其指定實例,其可提出例如一種分子中含二或更多個聚合性乙烯基之乙烯基胺基甲酸酯化合物,其係將由下式(A)表示之化合物中含羥基之乙烯基單體加入JP-B第48-41708號專利等所述之分子中具有二或更多個異氰酸基之多異氰酸化合物。Further, a urethane-based addition polymerization compound is preferably used, which is produced by an addition reaction of an isocyanate and a hydroxyl group. As a specific example thereof, there may be mentioned, for example, a vinyl urethane compound containing two or more polymerizable vinyl groups in a molecule, which is a vinyl group having a hydroxyl group in a compound represented by the following formula (A). The polyisocyanate compound having two or more isocyanate groups in the molecule described in JP-B No. 48-41708 or the like is added.

CH2 =C(R10 )COOCH2 CH(R11 )OH 式(A)CH 2 =C(R 10 )COOCH 2 CH(R 11 )OH Formula (A)

(其中R10 與R11 表示H或CH3 。)(wherein R 10 and R 11 represent H or CH 3 .)

此外亦較佳為JP-A第51-37193號、JP-B第2-32293號及JP-B第2-16765號專利所述之胺基甲酸酯丙烯酸酯,及JP-B第58-49860號、JP-B第56-17654號、JP-B第62-39417號、及JP-B第62-39418號專利所述之具有環氧乙烷為主骨架的胺基甲酸酯化合物。此外使用JP-A第63-277653號、JP-A第63-260909號及JP-A第1-105238號專利所述之分子中具有胺基結構或硫化物結構的加成聚合化合物,可得到感光速度非常優良之光聚合性組成物。Further preferred are urethane acrylates described in JP-A No. 51-37193, JP-B No. 2-32293, and JP-B No. 2-16765, and JP-B No. 58- A urethane compound having an ethylene oxide-based skeleton as described in JP-A No. 49,860, JP-B No. 56-17654, JP-B No. 62-39417, and JP-B No. 62-39418. Further, an addition polymerization compound having an amine structure or a sulfide structure in a molecule described in JP-A No. 63-277653, JP-A No. 63-260909, and JP-A No. 1-105238 can be used. A photopolymerizable composition having a very excellent photospeed.

其他實例包括多官能基丙烯酸酯與甲基丙烯酸酯,如聚酯丙烯酸酯,及JP-A第48-64183號、JP-B第49-43191 號及JP-B第52-30490號專利之各公報所述之藉環氧樹脂與(甲基)丙烯酸酯的反應得到之環氧基丙烯酸酯。此外實例包括JP-B第46-43946號、JP-B第1-40337號及JP-B第1-40336號專利所述之指定不飽和化合物,及JP-A第2-25493號專利所述之乙烯基膦酸為主化合物。在某些情形,其較佳為使用JP-A第61-22048號專利所述之含全氟烷基結構。此外亦可使用Journal of Adhesion Society of Japan,第20卷,第7期,第300-308頁(1984)之引入作為光硬化性單體與寡聚物的化合物。Other examples include polyfunctional acrylates and methacrylates such as polyester acrylates, and JP-A No. 48-64183, JP-B No. 49-43191 The epoxy acrylate obtained by the reaction of an epoxy resin with a (meth) acrylate as described in each of JP-B No. 52-30490. Further examples include the specified unsaturated compounds described in JP-B No. 46-43946, JP-B No. 1-40337, and JP-B No. 1-40336, and JP-A No. 2-25493 The vinylphosphonic acid is the main compound. In some cases, it is preferred to use the perfluoroalkyl-containing structure described in JP-A No. 61-22048. Further, a compound which is a photocurable monomer and an oligomer can be used as disclosed in Journal of Adhesion Society of Japan, Vol. 20, No. 7, pp. 300-308 (1984).

這些加成聚合化合物之結構(單獨或組合使用)、加入量等可視情況地依照硬化性組成物之性能設計而設定。例如其可選自以下之觀點。The structure (individually or in combination), the amount of addition, and the like of these addition polymerization compounds can be set as desired depending on the performance of the curable composition. For example, it may be selected from the following points.

關於敏感度,其較佳為一種每個分子具大量不飽和基之結構。在許多情形,其較佳為二或更多官能基者。此外為了改良影像部分(即硬化薄膜)之強度,其較佳為三或更多官能基者。此外藉由組合使用不同數量之官能基及不同聚合性基(如丙烯酸酯、甲基丙烯酸酯、苯乙烯為主化合物、乙烯醚為主化合物)而調節敏感度與強度之方法亦有效。由硬化敏感度之觀點,其較佳為使用一種含二或更多個(甲基)丙烯酸酯結構之化合物,更佳為使用一種含三或更多個(甲基)丙烯酸酯結構之化合物,而且最佳為使用一種含四或更多個(甲基)丙烯酸酯結構之化合物。此外由硬化敏感度及未曝光部分之顯影力的觀點,其較佳為含經EO修改物質。此外由硬化敏感度及曝光部分強度 之觀點,其較佳為含胺基甲酸酯鍵。Regarding the sensitivity, it is preferably a structure having a large amount of unsaturated groups per molecule. In many cases, it is preferably one or more functional groups. Further, in order to improve the strength of the image portion (i.e., the cured film), it is preferably one or more functional groups. In addition, a method of adjusting sensitivity and strength by using a different amount of functional groups and different polymerizable groups (such as acrylate, methacrylate, styrene-based compound, and vinyl ether as a main compound) is also effective. From the viewpoint of hardening sensitivity, it is preferred to use a compound having two or more (meth) acrylate structures, more preferably a compound having three or more (meth) acrylate structures. It is also preferred to use a compound containing four or more (meth) acrylate structures. Further, from the viewpoint of the hardening sensitivity and the developing power of the unexposed portion, it is preferably an EO-modified substance. In addition to the hardening sensitivity and the intensity of the exposed portion From the viewpoint, it is preferably a urethane-containing bond.

此外亦關於與硬化性組成物中其他成分(如樹脂、光聚合引發劑與顏料)之相容性及分散性質,加成聚合化合物之選擇及用法為重要因素。例如使用低純度化合物或組合使用二或更多種可改良相容性。此外為了改良基板黏附性質等之目的,其可選擇指定結構。Further, regarding the compatibility and dispersion properties of other components (such as a resin, a photopolymerization initiator, and a pigment) in the curable composition, the selection and usage of the addition polymerization compound are important factors. For example, the use of low purity compounds or a combination of two or more may improve compatibility. Further, in order to improve the adhesion properties of the substrate, etc., it is possible to select a specific structure.

由上述觀點,其可提出聯酚A二丙烯酸酯、經EO修改聯酚A二丙烯酸酯物質、三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷三(丙烯醯氧基丙基)醚、三羥甲基乙烷三丙烯酸酯、四乙二醇二丙烯酸酯、新戊四醇二丙烯酸酯、新戊四醇三丙烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇四丙烯酸酯、二新戊四醇五丙烯酸酯、二新戊四醇六丙烯酸酯、山梨醇三丙烯酸酯、山梨醇四丙烯酸酯、山梨醇五丙烯酸酯、山梨醇六丙烯酸酯、異三聚氰酸三(丙烯醯氧基乙酯)、經EO修改新戊四醇四丙烯酸酯物質、經EO修改二新戊四醇六丙烯酸酯物質等作為較佳實例。此外至於市售產品,其較佳為胺基甲酸酯寡聚物UAS-10、UAB-140(Sanyo-Kokusaku Pulp Corp.製造)、DPHA-40H(Nippon Kayaku Co.,Ltd.製造)、UA-306H、UA-306T、UA-306I、AH-600、T-600、AI-600(Kyoeisha Chemical Co.,Ltd.製造)、及UA-7200(Shin-Nakamura Chemical Co.,Ltd.製造)。From the above point of view, it may be proposed to be a biphenol A diacrylate, an EO modified biphenol A diacrylate material, trimethylolpropane triacrylate, trimethylolpropane tris(propylene oxypropyl) ether, Trimethylolethane triacrylate, tetraethylene glycol diacrylate, neopentyl alcohol diacrylate, neopentyl alcohol triacrylate, neopentyl alcohol tetraacrylate, dipentaerythritol tetraacrylate , dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, iso-cyanuric acid A preferred example is propylene methoxyethyl ester), EO modified neopentyl alcohol tetraacrylate material, EO modified dipentaerythritol hexaacrylate material and the like. Further, as for the commercially available product, it is preferably a urethane oligomer UAS-10, UAB-140 (manufactured by Sanyo-Kokusaku Pulp Corp.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA. -306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoeisha Chemical Co., Ltd.), and UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.).

其中更佳為經EO修改聯酚A二丙烯酸酯、新戊四醇三丙烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇五丙烯酸酯、二新戊四醇六丙烯酸酯、異三聚氰酸三(丙烯醯氧基 乙酯)、經EO修改新戊四醇四丙烯酸酯、與經EO修改二新戊四醇六丙烯酸酯。至於市售產品,其更佳為DPHA-40H(Nippon Kayaku Co.,Ltd.製造)、UA-306H、UA-306T、UA-306I、AH-600、T-600、與AI-600(Kyoeisha Chemical Co.,Ltd.製造)。More preferably, it is modified by EO, bisphenol A diacrylate, neopentyl alcohol triacrylate, neopentyl alcohol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, different three Cyanuric acid Ethyl ester), neopentyltetraol tetraacrylate modified by EO, and neopentyltetraol hexaacrylate modified by EO. As for the commercially available product, it is more preferably DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, and AI-600 (Kyoeisha Chemical) Co., Ltd. manufacture).

本發明中樹脂(C)以外之含乙烯不飽和雙鍵之化合物;本發明硬化性組成物之固體成分中之上述樹脂(A)的含量較佳為1質量%至90質量%,更佳為5質量%至80質量%,而且進一步較佳為10質量%至70質量%。In the present invention, the compound containing an ethylenically unsaturated double bond other than the resin (C); the content of the above resin (A) in the solid content of the curable composition of the present invention is preferably from 1% by mass to 90% by mass, more preferably 5% by mass to 80% by mass, and further preferably 10% by mass to 70% by mass.

特別地,在將本發明之硬化性組成物用於形成彩色濾光片之著色圖案的情形,樹脂(C)以外之含乙烯不飽和雙鍵之化合物的含量較佳為上述範圍中之5質量%至50質量%,更佳為7質量%至40質量%,而且進一步較佳為10質量%至35質量%。In particular, in the case where the curable composition of the present invention is used to form a colored pattern of a color filter, the content of the compound containing an ethylenically unsaturated double bond other than the resin (C) is preferably 5 in the above range. From 5% to 50% by mass, more preferably from 7% by mass to 40% by mass, and further preferably from 10% by mass to 35% by mass.

此外由敏感度及未曝光部分之消除力(顯影力)的觀點,上述樹脂(A)與(C);樹脂(A)以外之含乙烯不飽和雙鍵之化合物的含量比例(質量比例)(A)/(C)較佳為0.001至100,更佳為0.005至50,而且進一步較佳為0.01至10。Further, the content ratio (mass ratio) of the compound containing the ethylenically unsaturated double bond other than the above-mentioned resins (A) and (C) and the resin (A) from the viewpoints of the sensitivity and the elimination force (developing power) of the unexposed portion ( A)/(C) is preferably from 0.001 to 100, more preferably from 0.005 to 50, and further preferably from 0.01 to 10.

<著色劑(D)> 較佳為本發明之硬化性組成物含著色劑(D)。<Colorant (D)> It is preferred that the curable composition of the present invention contains a coloring agent (D).

含於本發明硬化性組成物之著色劑並未特別地限制,而且各種習知染料及顏料可以一種或如二或更多種之混合物使用。由耐久性(耐熱性及耐光性)之觀點,著色劑較佳為顏料。The coloring agent contained in the curable composition of the present invention is not particularly limited, and various conventional dyes and pigments may be used alone or as a mixture of two or more. The colorant is preferably a pigment from the viewpoint of durability (heat resistance and light resistance).

至於含於本發明硬化性組成物之顏料,其可使用各種習知無機顏料或有機顏料,而且其較佳為具高穿透率者。As the pigment contained in the curable composition of the present invention, various conventional inorganic pigments or organic pigments can be used, and it is preferred to have a high transmittance.

至於無機顏料,其可提出金屬化合物,如金屬氧化物、金屬錯合物鹽等。特別是可提出鐵、鈷、鋁、鎘、鉛、銅、鈦、鎂、鉻、鋅、與銻等之金屬氧化物,及上述金屬之複合氧化物。As the inorganic pigment, a metal compound such as a metal oxide, a metal complex salt or the like can be proposed. In particular, metal oxides of iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, zinc, and antimony, and composite oxides of the above metals can be proposed.

至於有機顏料,其可提出例如:C.I.顏料黃11、24、31、53、83、93、99、108、109、110、138、139、147、150、151、154、155、167、180、185、199;C.I.顏料橙36、38、43、71;C.I.顏料紅81、105、122、149、150、155、171、175、176、177、209、220、224、242、254、255、264、270;C.I.顏料紫19、23、32、39;C.I.顏料藍1、2、15、15:1、15:3、15:6、16、22、60、66;C.I.顏料綠7、36、37;C.I.顏料棕25、28;C.I.顏料黑1、7;碳黑等。As for the organic pigment, it may be proposed, for example, CI Pigment Yellow 11, 24, 31, 53, 83, 93, 99, 108, 109, 110, 138, 139, 147, 150, 151, 154, 155, 167, 180, 185, 199; CI Pigment Orange 36, 38, 43, 71; CI Pigment Red 81, 105, 122, 149, 150, 155, 171, 175, 176, 177, 209, 220, 224, 242, 254, 255, 264, 270; CI Pigment Violet 19, 23, 32, 39; CI Pigment Blue 1, 2, 15, 15:1, 15:3, 15:6, 16, 22, 60, 66; CI Pigment Green 7, 36 37; CI pigment brown 25, 28; CI pigment black 1, 7; carbon black and the like.

在本發明中,其可特佳地使用顏料之結構式中具有鹼性N原子者。具有鹼性N原子之顏料在本發明之組成物中呈現優良之分散性質。雖然其原因不完全了解,其推論感 光性聚合成分與顏料之良好親和力有影響。In the present invention, it is particularly preferable to use a compound having a basic N atom in the structural formula of the pigment. A pigment having a basic N atom exhibits excellent dispersing properties in the composition of the present invention. Although the reason is not fully understood, its inference The photopolymerization component has an influence on the good affinity of the pigment.

至於較佳地用於本發明之顏料,其可提出以下。然而本發明不受其限制:C.I.顏料黃11、24、108、109、110、138、139、150、151、154、167、180、185;C.I.顏料橙36、71;C.I.顏料紅122、150、171、175、177、209、224、242、254、255、264;C.I.顏料紫19、23、32;C.I.顏料藍15;1、15:3、15:6、16、22、60、66;C.I.顏料黑1。As the pigment which is preferably used in the present invention, it can be proposed as follows. However, the invention is not limited thereto: CI Pigment Yellow 11, 24, 108, 109, 110, 138, 139, 150, 151, 154, 167, 180, 185; CI Pigment Orange 36, 71; CI Pigment Red 122, 150 , 171, 175, 177, 209, 224, 242, 254, 255, 264; CI Pigment Violet 19, 23, 32; CI Pigment Blue 15; 1, 15:3, 15:6, 16, 22, 60, 66 ; CI Pigment Black 1.

這些有機顏料可單獨使用,或者將其組合以增強顏色純度。以下顯示組合之實例。例如可使用蒽醌為主顏料、苝為主顏料或二酮吡咯基吡咯為主顏料單獨作為紅色顏料,或者其至少一種與重氮為主黃色顏料、異吲哚啉為主黃色顏料、喹酞酮為主黃色顏料、或苝為主紅色顏料之混合物。例如蒽醌為主顏料包括C.I.顏料紅177,苝為主顏料包括C.I.顏料紅155與C.I.顏料紅224,及二酮吡咯基吡咯為主顏料包括C.I.顏料紅254。由顏色再現力之觀點,其較佳為具C.I.顏料黃139之混合物。紅色顏料與黃色顏料間之質量比例較佳為100:5至100:50。在此比例為100:4或更小時,其難以抑制400奈米至500奈米之透光率,而且在某些情形無法增強顏色純度。此外在此比例為100:51或更大時,主波長朝向短波長,而且在某些情形對NTSC目標 色調之偏差變大。特別地,此質量比例最適為100:10至100:30之範圍。在組合紅色顏料之情形,此比例可順應色度而調整。These organic pigments may be used singly or in combination to enhance color purity. An example of a combination is shown below. For example, a ruthenium-based main pigment, a ruthenium-based pigment or a diketopyrrolopyrrole as a main pigment may be used as a red pigment alone, or at least one of them may be a diazo-based yellow pigment, an iso-porphyrin as a main yellow pigment, or a quinone. The ketone is a yellow pigment or a mixture of ruthenium as the main red pigment. For example, ruthenium-based pigments include C.I. Pigment Red 177, ruthenium-based pigments include C.I. Pigment Red 155 and C.I. Pigment Red 224, and diketopyrrolopyrrole-based pigments include C.I. Pigment Red 254. From the viewpoint of color reproducibility, it is preferably a mixture of C.I. Pigment Yellow 139. The mass ratio between the red pigment and the yellow pigment is preferably from 100:5 to 100:50. In the case where the ratio is 100:4 or less, it is difficult to suppress the light transmittance of 400 nm to 500 nm, and in some cases, the color purity cannot be enhanced. In addition, when the ratio is 100:51 or more, the dominant wavelength is toward a short wavelength, and in some cases, the NTSC target The deviation of the hue becomes larger. In particular, this mass ratio is optimally in the range of 100:10 to 100:30. In the case of combining red pigments, this ratio can be adjusted in accordance with the chromaticity.

此外至於綠色顏料,其可單獨使用鹵化酞青為主顏料,或者其與重氮為主黃色顏料、喹酞酮為主黃色顏料、偶氮次甲基為主黃色顏料、或異吲哚啉為主黃色顏料之混合物。至於其實例,其較佳為例如C.I.顏料綠7、36、37及C.I.顏料黃83、C.I.顏料黃138、C.I.顏料黃139、C.I.顏料黃150、C.I.顏料黃180、或C.I.顏料黃185之混合物。綠色顏料與黃色顏料之質量比例較佳為100:5至100:150。上述質量比例特佳為100:30至100:120之範圍。In addition, as for the green pigment, the halogenated phthalocyanine-based pigment may be used alone, or the diazonium-based yellow pigment, the quinacridone-based yellow pigment, the azomethine-based yellow pigment, or the isoporphyrin may be used. A mixture of primary yellow pigments. As examples thereof, it is preferably a mixture of, for example, CI Pigment Green 7, 36, 37 and CI Pigment Yellow 83, CI Pigment Yellow 138, CI Pigment Yellow 139, CI Pigment Yellow 150, CI Pigment Yellow 180, or CI Pigment Yellow 185. . The mass ratio of the green pigment to the yellow pigment is preferably from 100:5 to 100:150. The above mass ratio is particularly preferably in the range of 100:30 to 100:120.

至於藍色顏料,其可單獨使用酞青為主顏料,或者其與二噁為主紫色顏料之混合物。其較佳為例如C.I.顏料藍15:6與C.I.顏料紫23之混合物。藍色顏料與黃色顏料之質量比例較佳為100:0至100:30,更佳為100:10或更小。As for the blue pigment, it can be used alone as the main pigment, or its dioxin A mixture of predominantly purple pigments. It is preferably, for example, a mixture of CI Pigment Blue 15:6 and CI Pigment Violet 23. The mass ratio of the blue pigment to the yellow pigment is preferably from 100:0 to 100:30, more preferably 100:10 or less.

此外至於黑矩陣用顏料,其單獨使用碳、鈦碳、氧化鐵、與氧化鈦,或使用其混合物。其較佳為碳與鈦碳之組合。碳與鈦之質量比例較佳為100:0至100:60之範圍。Further, as for the pigment for the black matrix, carbon, titanium carbon, iron oxide, titanium oxide, or a mixture thereof is used alone. It is preferably a combination of carbon and titanium carbon. The mass ratio of carbon to titanium is preferably in the range of from 100:0 to 100:60.

在將其用於彩色濾光片之情形,由顏色不規則性及對比之觀點,顏料之平均粒徑較佳為100奈米或更小,此外由分散液安定性之觀點,更佳為5奈米或更小。顏料之平均粒徑更佳為5至75奈米,進一步較佳為5至55奈米,而且特佳為5至35奈米。In the case of using it for a color filter, the average particle diameter of the pigment is preferably 100 nm or less from the viewpoint of color irregularity and contrast, and more preferably 5 from the viewpoint of dispersion stability. Nano or smaller. The average particle diameter of the pigment is more preferably from 5 to 75 nm, further preferably from 5 to 55 nm, and particularly preferably from 5 to 35 nm.

顏料之平均粒徑可藉已知方法測定,如電子顯微鏡。The average particle diameter of the pigment can be determined by a known method such as an electron microscope.

顏料特佳為一種選自蒽醌系列、偶氮次甲基系列、亞苄基系列、花青系列、二酮吡咯基吡咯系列、與酞青系列之顏料。The pigment is particularly preferably a pigment selected from the group consisting of hydrazine series, azo methine series, benzylidene series, cyanine series, diketopyrrolopyrrole series, and indigo series.

此外在將本發明之組成物用於彩色濾光片之情形,由顏色不規則性及對比的觀點,其較佳為使用一種均勻地溶於組成物之染料。Further, in the case where the composition of the present invention is used for a color filter, it is preferred to use a dye which is uniformly dissolved in the composition from the viewpoint of color irregularity and contrast.

作為含於本發明硬化性組成物之著色劑的染料並未特別地限制,而且彩色濾光片用染料可使用習知者。例如其可使用JP-A第64-90403、64-91102、1-94301、及6-11614號專利、日本專利登記第2,592,207號、美國專利第4,808,501、5,667,920及5,059,500號之說明書、JP-A第5-333207、6-35183、6-51115、6-194828、8-211599、4-249549、10-123316、11-302283、7-286107、2001-4823、8-15522、8-29771、8-146215、11-343437、8-62416、2002-14220、2002-14221、2002-14222、2002-14223、8-302224、8-73758、8-179120、及8-151531號專利等揭示之顏料。The dye which is a coloring agent contained in the curable composition of the present invention is not particularly limited, and a dye for a color filter can be used. For example, JP-A Nos. 64-90403, 64-91102, 1-94301, and 6-11614, Japanese Patent Registration No. 2,592,207, U.S. Patent Nos. 4,808,501, 5,667,920 and 5,059,500, JP-A No. 5-333207, 6-35183, 6-51115, 6-194828, 8-211599, 4-249549, 10-123316, 11-302283, 7-286107, 2001-4823, 8-15522, 8-29771, 8- Pigments disclosed in 146215, 11-343437, 8-62416, 2002-14220, 2002-14221, 2002-14222, 2002-14223, 8-302224, 8-73758, 8-179120, and 8-151531.

至於化學結構,其可使用吡唑基偶氮系列、苯胺基偶氮系列、三苯基甲烷系列、蒽醌系列、蒽吡啶酮系列、亞苄基系列、氧雜菁(oxonol)系列、吡唑基三唑系列、吡啶酮偶氮系列、花青系列、酚噻系列、吡咯基吡唑偶氮次甲基系列、系列、酞青系列、苯并哌喃系列、與靛系列之染料。As for the chemical structure, a pyrazolyl azo series, an anilino azo series, a triphenylmethane series, a hydrazine series, an anthrapyridone series, a benzylidene series, an oxonol series, and a pyrazole can be used. Triazole series, pyridone azo series, cyanine series, phenol thiophene Series, pyrrolylpyrazole azo methine series, Series, indigo series, benzopyran series, and bismuth series of dyes.

此外在硬化性組成物之圖案曝光及曝光部分硬化後, 其將未曝光部分以水或鹼顯影去除而形成圖案,例如在形成光阻或彩色濾光片之著色圖案時,由完全地去除顯影生成之光未照射部分處黏合劑與染料的觀點,在某些情形可適當地使用酸染料及/或其衍生物。Further, after the pattern exposure of the curable composition and the hardening of the exposed portion, It forms a pattern by removing the unexposed portion by water or alkali development, for example, when forming a color pattern of a photoresist or a color filter, by completely removing the viewpoint of the binder and the dye at the unirradiated portion of the light generated by the development, In some cases, acid dyes and/or derivatives thereof may be suitably used.

此外亦可有用地使用直接染料、鹼性染料、媒染劑染料、酸性染料、偶氮染料、分散染料、油溶性染料、食品染料及/或其衍生物。Further, direct dyes, basic dyes, mordant dyes, acid dyes, azo dyes, disperse dyes, oil-soluble dyes, food dyes and/or derivatives thereof can also be used usefully.

酸性染料並未特別地限制,只要其具有酸性基,如磺酸與羧酸,但是其可考量必要性能而選擇,如對有機溶劑或顯影溶液之溶解性質、與鹼性化合物之鹽形成性質、吸光程度、與組成物中其他成分之相互反應、整體耐光及耐熱性。The acid dye is not particularly limited as long as it has an acidic group such as a sulfonic acid and a carboxylic acid, but it may be selected in consideration of necessary properties such as a solubility property to an organic solvent or a developing solution, a salt forming property with a basic compound, The degree of light absorption, interaction with other components in the composition, overall light resistance and heat resistance.

以下為酸性染料之實例,然而本發明不受其限制。實例包括:酸茜素紫N;酸黑1、2、24、48;酸藍1、7、9、15、18、23、25、27、29、40、42、45、51、62、70、74、80、83、86、87、90、92、96、103、112、113、120、129、138、147、150、158、171、182、192、210、242、243、256、259、267、278、280、285、290、296、315、324:1、335、340;酸鉻紫K;酸品紅;酸綠1、3、5、9、16、25、27、50、58、63、65、80、104 、105、106、109;酸橙6、7、8、10、12、26、50、51、52、56、62、63、64、74、75、94、95、107、108、169、173;酸紅1、4、8、14、17、18、26、27、29、31、34、35、37、42、44、50、51、52、57、66、73、80、87、88、91、92、94、97、103、111、114、129、133、134、138、143、145、150、151、158、176、182、183、198、206、211、215、216、217、227、228、249、252、257、258、260、261、266、268、270、274、277、280、281、195、308、312、315、316、339、341、345、346、349、382、383、394、401、412、417、418、422、426;酸紫6B、7、9、17、19;酸黃1、3、7、9、11、17、23、25、29、34、36、38、40、42、54、65、72、73、76、79、98、99、111、112、113、114、116、119、123、128、134、135、138、139、140、144、150、155、157、160、161、163、168、169、172、177、178、179、184、190、193、196、197、199、202、203、204、205、207、212、214、220、221、228、230、232、235、238、240、242、243、251;直接黃2、33、34、35、38、39、43、47、50、54、58、68、69、70、71、86、93、94、95、98、102、108、109、129、136、138、141;直接橙34、39、41、46、50、52、56、57、61、64、65、68、70、96、97、106、107; 直接紅79、82、83、84、91、92、96、97、98、99、105、106、107、172、173、176、177、179、181、182、184、204、207、211、213、218、220、221、222、232、233、234、241、243、246、250;直接紫47、52、54、59、60、65、66、79、80、81、82、84、89、90、93、95、96、103、104;直接藍57、77、80、81、84、85、86、90、93、94、95、97、98、99、100、101、106、107、108、109、113、114、115、117、119、137、149、150、153、155、156、158、159、160、161、162、163、164、166、167、170、171、172、173、188、189、190、192、193、194、196、198、199、200、207、209、210、212、213、214、222、228、229、237、238、242、243、244、245、247、248、250、251、252、256、257、259、260、268、274、275、293;直接綠25、27、31、32、34、37、63、65、66、67、68、69、72、77、79、82;媒染劑黃5、8、10、16、20、26、30、31、33、42、43、45、56、50、61、62、65;媒染劑橙3、4、5、8、12、13、14、20、21、23、24、28、29、32、34、35、36、37、42、43、47、48;媒染劑紅1、2、3、4、9、11、12、14、17、18、19、22、23、24、25、26、30、32、33、36、37、38、39、41、43、45、46、48、53、56、63、71、74、85、86、88、90 、94、95;媒染劑紫2、4、5、7、14、22、24、30、31、32、37、40、41、44、45、47、48、53、58;媒染劑藍2、3、7、8、9、12、13、15、16、19、20、21、22、23、24、26、30、31、32、39、40、41、43、44、48、49、53、61、74、77、83、84;媒染劑綠1、3、4、5、10、15、19、26、29、33、34、35、41、43、53;食品黃3;及這些染料之衍生物。The following are examples of acid dyes, however the invention is not limited thereto. Examples include: acid violet N; acid black 1, 2, 24, 48; acid blue 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 42, 45, 51, 62, 70 , 74, 80, 83, 86, 87, 90, 92, 96, 103, 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259 , 267, 278, 280, 285, 290, 296, 315, 324: 1, 335, 340; acid chrome purple K; acid magenta; acid green 1, 3, 5, 9, 16, 25, 27, 50, 58, 63, 65, 80, 104 , 105, 106, 109; limes 6, 7, 8, 10, 12, 26, 50, 51, 52, 56, 62, 63, 64, 74, 75, 94, 95, 107, 108, 169, 173 Acid red 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 80, 87, 88 , 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158, 176, 182, 183, 198, 206, 211, 215, 216, 217 , 227, 228, 249, 252, 257, 258, 260, 261, 266, 268, 270, 274, 277, 280, 281, 195, 308, 312, 315, 316, 339, 341, 345, 346, 349 , 382, 383, 394, 401, 412, 417, 418, 422, 426; sour purple 6B, 7, 9, 17, 19; sour yellow 1, 3, 7, 9, 11, 17, 23, 25, 29 , 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139 , 140, 144, 150, 155, 157, 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207 , 212, 214, 220, 221, 228, 2 30, 232, 235, 238, 240, 242, 243, 251; direct yellow 2, 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, 102, 108, 109, 129, 136, 138, 141; direct orange 34, 39, 41, 46, 50, 52, 56, 57, 61, 64, 65, 68, 70, 96, 97, 106, 107; Direct red 79, 82, 83, 84, 91, 92, 96, 97, 98, 99, 105, 106, 107, 172, 173, 176, 177, 179, 181, 182, 184, 204, 207, 211, 213, 218, 220, 221, 222, 232, 233, 234, 241, 243, 246, 250; direct purple 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103, 104; direct blue 57, 77, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113, 114, 115, 117, 119, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 166, 167, 170, 171, 172, 173, 188, 189, 190, 192, 193, 194, 196, 198, 199, 200, 207, 209, 210, 212, 213, 214, 222, 228, 229, 237, 238, 242, 243, 244, 245, 247, 248, 250, 251, 252, 256, 257, 259, 260, 268, 274, 275, 293; direct green 25, 27, 31, 32, 34, 37, 63, 65, 66, 67, 68, 69, 72, 77, 79, 82; mordant yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 50, 61, 62, 65 Mordant Orange 3, 4, 5, 8, 12, 13, 14, 20, 21, 23, 24, 28, 29, 32, 34, 35, 36, 37, 42, 43, 47, 48; mordant red 1, 2,3,4,9,11,12,14,17,18,19,22,23,24,25,26,30,32,33,36,37,38,39,41,43,45, 46, 48, 53, 56, 63, 71, 74, 85, 86, 88, 90 , 94, 95; mordant violet 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58; mordant blue 2 , 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43, 44, 48, 49 , 53, 61, 74, 77, 83, 84; mordant green 1, 3, 4, 5, 10, 15, 19, 26, 29, 33, 34, 35, 41, 43, 53; food yellow 3; And derivatives of these dyes.

以上酸染料中較佳為如酸黑24;酸藍23、25、29、62、80、86、87、92、138、158、182、243、324:1;酸橙8、51、56、74、63;酸紅1、4、8、34、37、42、52、57、80、97、114、143、145、151、183、217、249;酸紫7;酸黃17、25、29、34、42、72、76、99、111、112、114、116、134、155、169、172、184、220、228、230、232、243;酸綠25之染料,及這些染料之衍生物。Preferred among the above acid dyes are acid black 24; acid blue 23, 25, 29, 62, 80, 86, 87, 92, 138, 158, 182, 243, 324:1; lime orange 8, 51, 56, 74, 63; acid red 1, 4, 8, 34, 37, 42, 52, 57, 80, 97, 114, 143, 145, 151, 183, 217, 249; acid purple 7; acid yellow 17, 25, 29, 34, 42, 72, 76, 99, 111, 112, 114, 116, 134, 155, 169, 172, 184, 220, 228, 230, 232, 243; acid green 25 dye, and these dyes derivative.

除了以上染料,亦較佳為偶氮系列、系列與酞青系列之酸染料,而且亦較佳為使用如C.I.溶劑藍44、38;C.I.溶劑橙45;玫瑰紅B與玫瑰紅110之酸染料,及這些 染料之衍生物。In addition to the above dyes, it is preferably an azo series, The acid dyes of the series and the indigo series are also preferably used as acid dyes such as CI Solvent Blue 44, 38; CI Solvent Orange 45; Rose Red B and Rose Red 110, and derivatives of these dyes.

其中著色劑(D)較佳為一種選自三烯丙基甲烷系列、蒽醌系列、偶氮次甲基系列、亞苄基系列、氧雜菁系列、花青系列、酚噻系列、吡咯基吡唑偶氮次甲基系列、系列、酞青系列、苯并哌喃系列、靛系列、吡唑基偶氮系列、苯胺基偶氮系列、吡唑基三唑偶氮系列、吡啶酮偶氮系列、與蒽吡啶酮系列之著色劑。Wherein the coloring agent (D) is preferably one selected from the group consisting of triallyl methane series, hydrazine series, azo methine series, benzylidene series, oxaphthalocyanine series, cyanine series, phenol thiophene series Series, pyrrolylpyrazole azo methine series, Series, indigo series, benzopyran series, anthraquinone series, pyrazolyl azo series, anilino azo series, pyrazolyl triazole azo series, pyridone azo series, coloration with anthraquinone series Agent.

包括形成彩色濾光片之著色圖案的情形,著色劑在本發明硬化性組成物中之含量較佳為30質量%至85質量%,更佳為40質量%至80質量%,而且最佳為50質量%至75質量%之範圍。In the case of forming the colored pattern of the color filter, the content of the colorant in the curable composition of the present invention is preferably from 30% by mass to 85% by mass, more preferably from 40% by mass to 80% by mass, and most preferably A range of 50% by mass to 75% by mass.

<黏合劑聚合物(E)> 為了改良塗膜等之目的,本發明可含不退化本發明效果之範圍內的黏合劑聚合物(E)。<Binder Polymer (E)> For the purpose of improving the coating film and the like, the present invention may contain the binder polymer (E) which does not degrade the effects of the present invention.

其較佳為使用線形有機聚合物作為黏合劑聚合物。至於此「線形有機聚合物」,其可視情況地使用習知者。為了可水顯影或弱鹼水顯影,其較佳為選擇在水或弱鹼水中可溶解或可膨脹之線形有機聚合物。線形有機聚合物係依照不僅作為薄膜形成劑,亦及水、弱鹼水或有機溶劑顯影劑之應用而選擇。例如使用水溶性有機聚合物可進行水顯影。至於此線形有機聚合物,其可提出在側鏈中具有羧酸基之自由基聚合產物,如藉由聚合或共聚合具有羧基之單體而得之樹脂、將藉由同元聚合或共聚合具有酸酐之單體而製造之酸酐單元水解、半酯化或半醯胺化而得之樹脂、藉 由以不飽和單羧酸與酸酐修改環氧樹脂而得之環氧基丙烯酸酯,例如JP-A第59-44615號、JP-B第54-34327、58-12577及54-25957號、JP-A第54-92723、59-53836及59-71048號專利所述。至於具有羧酸基之單體,其可提出丙烯酸、甲基丙烯酸、伊康酸、巴豆酸、順丁烯二酸、反丁烯二酸、4-羧基苯乙烯等。至於具有酸酐之單體,其可提出順丁烯二酸酐等。It is preferred to use a linear organic polymer as the binder polymer. As for the "linear organic polymer", it is possible to use a conventional person as the case may be. For water-developable or weakly alkaline water development, it is preferred to select a linear organic polymer which is soluble or swellable in water or weakly alkaline water. The linear organic polymer is selected in accordance with not only a film forming agent but also a water, weak alkaline water or organic solvent developer. For example, water development can be carried out using a water-soluble organic polymer. As for the linear organic polymer, it may be a radical polymerization product having a carboxylic acid group in a side chain, such as a resin obtained by polymerizing or copolymerizing a monomer having a carboxyl group, which will be polymerized or copolymerized by the same element. A resin obtained by hydrolysis, semi-esterification or semi-deuteration of an acid anhydride unit produced by an acid anhydride monomer, borrowed An epoxy acrylate obtained by modifying an epoxy resin with an unsaturated monocarboxylic acid and an acid anhydride, for example, JP-A No. 59-44615, JP-B Nos. 54-34327, 58-12577, and 54-25957, JP -A is described in the patents Nos. 54-92723, 59-53836 and 59-71048. As the monomer having a carboxylic acid group, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, 4-carboxystyrene or the like can be mentioned. As the monomer having an acid anhydride, maleic anhydride or the like can be proposed.

此外類似地有在側鏈中具有羧酸基之酸性纖維素衍生物。此外亦可使用將環形酸酐加入具有羥基之聚合物者。Further, there are similarly acidic cellulose derivatives having a carboxylic acid group in a side chain. Further, it is also possible to use a cyclic acid anhydride added to a polymer having a hydroxyl group.

在使用上述黏合劑聚合物作為鹼溶性共聚物之情形,至於欲共聚合之化合物,其亦可使用上述以外之單體。其他單體之實例包括以下化合物(1)至(12):(1)具有脂族羥基之丙烯酸酯與甲基丙烯酸酯,如丙烯酸2-羥基乙酯、丙烯酸2-羥基丙酯、丙烯酸3-羥基丙酯、丙烯酸4-羥基丁酯、甲基丙烯酸2-羥基乙酯、甲基丙烯酸2-羥基丙酯、甲基丙烯酸3-羥基丙酯、與甲基丙烯酸4-羥基丁酯。In the case where the above binder polymer is used as the alkali-soluble copolymer, as the compound to be copolymerized, a monomer other than the above may be used. Examples of the other monomer include the following compounds (1) to (12): (1) an acrylate having an aliphatic hydroxyl group and a methacrylate such as 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, acrylic acid 3- Hydroxypropyl ester, 4-hydroxybutyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl methacrylate, and 4-hydroxybutyl methacrylate.

(2)丙烯酸烷酯,如丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸丁酯、丙烯酸異丁酯、丙烯酸戊酯、丙烯酸己酯、丙烯酸2-乙基己酯、丙烯酸辛酯、丙烯酸苄酯、丙烯酸2-氯乙酯、丙烯酸環氧丙酯、丙烯酸3,4-環氧基環己基甲酯、丙烯酸乙烯酯、丙烯酸2-苯基乙烯酯、丙烯酸1-丙烯酯、丙烯酸烯丙酯、丙烯酸2-烯丙氧基乙酯、與丙烯酸炔丙酯。(2) alkyl acrylates such as methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, isobutyl acrylate, amyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, octyl acrylate, acrylic acid Benzyl ester, 2-chloroethyl acrylate, glycidyl acrylate, 3,4-epoxycyclohexylmethyl acrylate, vinyl acrylate, 2-phenylvinyl acrylate, 1-propenyl acrylate, acryl allyl Ester, 2-allyloxyethyl acrylate, and propargyl acrylate.

(3)甲基丙烯酸烷酯,如甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸丁酯、甲基丙烯酸異丁酯、甲基丙烯酸戊酯、甲基丙烯酸己酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸環己酯、甲基丙烯酸苄酯、甲基丙烯酸2-氯乙酯、甲基丙烯酸環氧丙酯、甲基丙烯酸3,4-環氧基環己基甲酯、甲基丙烯酸乙烯酯、甲基丙烯酸2-苯基乙烯酯、甲基丙烯酸1-丙烯酯、甲基丙烯酸烯丙酯、甲基丙烯酸2-烯丙氧基乙酯、與甲基丙烯酸炔丙酯。(3) alkyl methacrylate such as methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, isobutyl methacrylate, amyl methacrylate, methacrylic acid Hexyl ester, 2-ethylhexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-chloroethyl methacrylate, glycidyl methacrylate, methacrylic acid 3,4- Epoxycyclohexylmethyl ester, vinyl methacrylate, 2-phenylvinyl methacrylate, 1-propenyl methacrylate, allyl methacrylate, 2-allyloxyethyl methacrylate And propargyl methacrylate.

(4)丙烯醯胺或甲基丙烯醯胺,如丙烯醯胺、甲基丙烯醯胺、N-羥甲基丙烯醯胺、N-乙基丙烯醯胺、N-己基甲基丙烯醯胺、N-環己基丙烯醯胺、N-羥基乙基丙烯醯胺、N-苯基丙烯醯胺、N-硝基苯基丙烯醯胺、N-乙基-N-苯基丙烯醯胺、乙烯基丙烯醯胺、乙烯基甲基丙烯醯胺、N,N-二烯丙基丙烯醯胺、N,N-二烯丙基甲基丙烯醯胺、烯丙基丙烯醯胺、與烯丙基甲基丙烯醯胺。(4) acrylamide or methacrylamide, such as acrylamide, methacrylamide, N-methylol acrylamide, N-ethyl acrylamide, N-hexyl methacrylamide, N-cyclohexyl acrylamide, N-hydroxyethyl acrylamide, N-phenyl acrylamide, N-nitrophenyl acrylamide, N-ethyl-N-phenyl acrylamide, vinyl Acrylamide, vinyl methacrylamide, N,N-diallyl acrylamide, N,N-diallyl methacrylamide, allyl acrylamide, and allyl Acrylamide.

(5)乙烯基醚,如乙基乙烯基醚、2-氯乙基乙烯基醚、羥基乙基乙烯基醚、丙基乙烯基醚、丁基乙烯基醚、辛基乙烯基醚、與苯基乙烯基醚。(5) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, and benzene Vinyl ether.

(6)乙烯酯,如乙酸乙烯酯、氯乙酸乙烯酯、丁酸乙烯酯、與苯甲酸乙烯酯。(6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, and vinyl benzoate.

(7)苯乙烯,如苯乙烯、α-甲基苯乙烯、甲基苯乙烯、氯甲基苯乙烯、與對乙醯氧基苯乙烯。(7) Styrene such as styrene, α-methylstyrene, methylstyrene, chloromethylstyrene, and p-ethoxylated styrene.

(8)乙烯基酮,如甲基乙烯基酮、乙基乙烯基酮、丙基乙 烯基酮、與苯基乙烯基酮。(8) vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl propyl Alkenyl ketone, and phenyl vinyl ketone.

(9)烯烴,如乙烯、丙烯、異丁烯、丁二烯、與異戊二烯。(9) Olefins such as ethylene, propylene, isobutylene, butadiene, and isoprene.

(10)N-乙烯基吡咯啶酮、丙烯腈、甲基丙烯腈等。(10) N-vinylpyrrolidone, acrylonitrile, methacrylonitrile, and the like.

(11)不飽和醯亞胺,如順丁烯二醯亞胺、N-丙烯醯基丙烯醯胺、N-乙醯基甲基丙烯醯胺、N-丙醯基甲基丙烯醯胺、與N-(對氯苯甲醯基)甲基丙烯醯胺。(11) an unsaturated quinoid imine such as maleimide, N-propylene decyl acrylamide, N-ethyl methacryl decylamine, N-propyl methacryl decylamine, and N-(p-chlorobenzoyl)methacrylamide.

(12)雜原子鍵結α-位置之甲基丙烯酸為主單體,如JP-A第2002-309057及2002-311569號專利所述之化合物。(12) A hetero atom-bonded α-position of methacrylic acid as a main monomer, such as a compound described in JP-A Nos. 2002-309057 and 2002-311569.

這些實例中,在側鏈中具有烯丙基或乙烯酯基與羧基之(甲基)丙烯酸樹脂、JP-A第2000-187322及2002-62698號專利所述在側鏈中具有雙鍵之鹼溶性樹脂、及JP-A第2001-242612號專利所述在側鏈中具有醯胺基之鹼溶性樹脂因薄膜強度、敏感度與顯影力之優良平衡而較佳。In these examples, a (meth)acrylic resin having an allyl group or a vinyl ester group and a carboxyl group in a side chain, a base having a double bond in a side chain as described in JP-A No. 2000-187322 and No. 2002-62698 The solvent-soluble resin and the alkali-soluble resin having a guanamine group in the side chain as described in JP-A No. 2001-242612 are preferred because of an excellent balance of film strength, sensitivity, and developing power.

此外JP-B第7-12004號、JP-B第7-120041號、JP-B第7-120042號、JP-B第8-12424號、JP-A第63-287944號、JP-A第63-287947號、JP-A第1-271741號專利、及日本專利申請案第10-116232號所述之具有酸基的胺基甲酸酯為主黏合劑聚合物、及JP-A第2002-107918號專利所述之在側鏈中具有酸基與雙鍵的胺基甲酸酯為主黏合劑聚合物之強度非常優良,因此因低曝光適用性而有利。In addition, JP-B No. 7-12004, JP-B No. 7-120041, JP-B No. 7-120042, JP-B No. 8-12424, JP-A No. 63-287944, JP-A No. The urethane-based binder polymer having an acid group described in JP-A No. 1-271741, JP-A No. 1-271741, and Japanese Patent Application No. 10-116232, and JP-A No. 2002 The urethane-based binder polymer having an acid group and a double bond in the side chain described in the '107 patent is excellent in strength, and thus is advantageous for low exposure suitability.

歐洲專利第993966號、歐洲專利第1204000號及JP-A第2001-318463號專利所述之具有酸基的經縮醛修改聚乙烯醇為主黏合劑聚合物的薄膜強度與顯影力間平衡優良而 適合。The acetal modified polyvinyl alcohol-based adhesive polymer having an acid group as described in the European Patent No. 993, 966, the European Patent No. PCT No. and Suitable for.

此外至於水溶性線形有機聚合物,其可使用聚乙烯基吡咯啶酮與聚環氧乙烷。此外為了增強硬化薄膜之強度,亦可使用醇溶性耐綸、及2,2-貳(4-羥基苯基)丙烷與表氯醇之多醚。Further, as for the water-soluble linear organic polymer, polyvinylpyrrolidone and polyethylene oxide can be used. Further, in order to enhance the strength of the cured film, an alcohol-soluble nylon and a polyether of 2,2-indole (4-hydroxyphenyl)propane and epichlorohydrin may also be used.

黏合劑聚合物(E)之重量平均分子量較佳為3,000或更大,進一步較佳為5,000至300,000之範圍。數量平均分子量較佳為1,000或更大,而且進一步較佳為2,000至250,000之範圍。多分散性(重量平均分子量/數量平均分子量)較佳為1或更大,而且進一步較佳為1.1至10之範圍。The weight average molecular weight of the binder polymer (E) is preferably 3,000 or more, and more preferably in the range of 5,000 to 300,000. The number average molecular weight is preferably 1,000 or more, and further preferably in the range of 2,000 to 250,000. The polydispersity (weight average molecular weight / number average molecular weight) is preferably 1 or more, and further preferably in the range of 1.1 to 10.

這些黏合劑聚合物可為無規聚合物、嵌段聚合物、接枝聚合物等。These binder polymers may be random polymers, block polymers, graft polymers, and the like.

黏合劑聚合物(E)可藉習知方法合成。至於合成時使用之溶劑,其可提出例如四氫呋喃、二氯乙烷、環己酮、甲乙酮、丙酮、甲醇、乙醇、乙二醇一甲醚、乙二醇一乙醚、乙酸2-甲氧基乙酯、二乙二醇二甲醚、1-甲氧基-2-丙醇、乙酸1-甲氧基-2-丙酯、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、甲苯、乙酸乙酯、乳酸甲酯、乳酸乙酯、二甲基亞碸、水等。這些溶劑可單獨或以二或更多種之混合物使用。The binder polymer (E) can be synthesized by a conventional method. As the solvent to be used in the synthesis, it may, for example, be tetrahydrofuran, dichloroethane, cyclohexanone, methyl ethyl ketone, acetone, methanol, ethanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, acetic acid 2-methoxy B. Ester, diethylene glycol dimethyl ether, 1-methoxy-2-propanol, 1-methoxy-2-propyl acetate, N,N-dimethylformamide, N,N-dimethyl Ethyl amide, toluene, ethyl acetate, methyl lactate, ethyl lactate, dimethyl hydrazine, water, and the like. These solvents may be used singly or in combination of two or more.

至於合成用於本發明之黏合劑聚合物的自由基聚合引發劑,其可提出已知化合物,如偶氮為主引發劑與過氧化物引發劑。As the radical polymerization initiator for synthesizing the binder polymer used in the present invention, a known compound such as an azo-based initiator and a peroxide initiator can be proposed.

由隨時間經過之顏料分散液安定性與顯影力的平衡之 觀點,在將本發明之硬化性組成物用於形成彩色濾光片之著色圖案時,黏合劑聚合物(E)之含量相對本發明硬化性組成物之總固體含量較佳為5質量%至60質量%,更佳為7質量%至50質量%,而且最佳為10質量%至40質量%。Balance of stability and development power of pigment dispersion over time In view of the fact that when the curable composition of the present invention is used to form a colored pattern of a color filter, the content of the binder polymer (E) is preferably 5% by mass relative to the total solid content of the curable composition of the present invention. 60% by mass, more preferably 7% by mass to 50% by mass, and most preferably 10% by mass to 40% by mass.

如果必要,則本發明之硬化性組成物可進一步含詳述之以下成分。If necessary, the curable composition of the present invention may further contain the following components as detailed.

<(F)分散劑> 在本發明之硬化性組成物含顏料作為著色劑(D)之情形,由改良顏料之分散性質的觀點,其較佳為加入(F)分散劑。<(F) Dispersant> In the case where the curable composition of the present invention contains a pigment as the colorant (D), it is preferred to add (F) a dispersant from the viewpoint of improving the dispersion property of the pigment.

至於用於本發明之分散劑(顏料分散劑),其可提出聚合物分散劑[如多醯胺胺與其鹽、多羧酸與其鹽、高分子量不飽和酸酯、經修改聚胺基甲酸酯、經修改聚酯、經修改聚(甲基)丙烯酸酯、(甲基)丙烯酸酯為主共聚物、及萘磺酸-甲醛縮合產物]、及聚氧伸乙基烷基磷酸酯、聚氧伸乙基烷基胺、烷醇胺、顏料衍生物等。As the dispersant (pigment dispersant) used in the present invention, a polymer dispersant can be proposed [e.g., polyamine and its salt, polycarboxylic acid and its salt, high molecular weight unsaturated acid ester, modified polyglycolic acid) Ester, modified polyester, modified poly(meth)acrylate, (meth)acrylate-based copolymer, and naphthalenesulfonic acid-formaldehyde condensation product], and polyoxyalkyleneethyl phosphate, poly Oxygen extended ethyl alkylamine, alkanolamine, pigment derivative, and the like.

聚合物分散劑按結構可進一步分類成線形聚合物、末端修改型聚合物、接枝型聚合物、及嵌段型聚合物。The polymeric dispersants can be further classified into linear polymers, terminal modified polymers, grafted polymers, and block polymers by structure.

聚合物分散劑吸附於顏料表面上防止再凝集。因此可提出具有顏料表面固定位置之未端修改型聚合物、接枝型聚合物及嵌段型聚合物作為較佳結構。另一方面,顏料衍生物提供藉由改良顏料表面而促進聚合物分散劑之吸附的效果。The polymeric dispersant adsorbs on the surface of the pigment to prevent reaggregation. Therefore, a terminal modified polymer having a fixed surface of a pigment, a graft type polymer, and a block type polymer can be proposed as preferred structures. On the other hand, the pigment derivative provides an effect of promoting adsorption of the polymer dispersant by improving the surface of the pigment.

用於本發明之顏料分散劑的指定實例包括BYK Chemie Corp.製造之「Disperbyk-101(聚醯胺基胺磷酸酯)、107(羧酸酯)、110(含酸基之共聚產物)、130(多醯胺)、161、162、163、164、165、166、170(高分子量共聚物)」、「BYK-P104、P105(高分子量不飽和聚羧酸)」;EFKA Corp.製造之「EFKA4047、4050、4010、4165(聚胺基甲酸酯為主)、EFKA4330、4340(嵌段共聚物)、4400、4402(經修改聚丙烯酸酯)、5010(聚酯醯胺)、5765(高分子量聚羧酸)、6220(脂族聚酯)、6745(酞青衍生物)、6750(偶氮顏料衍生物)」、Ajinomoto Fan Techno Co.,Corp.製造之「AJISPER PB-821、PB-822」、Kyoeisha Chemical Co.,Ltd.製造之「FROREN TG-710(胺基甲酸酯寡聚物)」、「POLYFLOW No.50E、No.300(丙烯酸為主共聚物)」、Kusumoto Kasei Corp.製造之「DISPERON KS-860、873SN、874、#2150(脂族多價羧酸)、#7004(多醚酯)、DA-703-50、DA-705、DA-725」、Kao Corp.製造之「DEMOL RN、N(萘磺酸甲醛多縮合產物)、MS、C、SN-B(芳族磺酸甲醛多縮合產物)」、「HOMOGENOL L-18(高分子多羧酸)」、「EMARGEN 920、930、935、985(聚氧伸乙基壬基苯基醚)」、「ACETAMINE 86(硬脂胺乙酸酯)、RUBERESOL Corp.製造之「SOLSPACE 5000(酞青衍生物)、22000(偶氮顏料衍生物)、13240(聚酯胺)、3000、17000、27000(末端具有官能基部分之聚合物)、24000、28000、32000、38500(接枝型聚合物)」、NIKKO CHEMICAL Corp.製造之「NIKKOL T106(聚 氧伸乙基山梨醇酐單油酸酯)、MYS-IEX(聚氧伸乙基單硬脂酸酯)」等。Designated examples of the pigment dispersant used in the present invention include BYK "Disperbyk-101 (polyamidoamine phosphate), 107 (carboxylate), 110 (copolymer containing acid group), 130 (polyamine), 161, 162, 163, 164 manufactured by Chemie Corp. , 165, 166, 170 (high molecular weight copolymer), "BYK-P104, P105 (high molecular weight unsaturated polycarboxylic acid)"; "EFKA 4047, 4050, 4010, 4165 (polyurethane) manufactured by EFKA Corp. Ester-based), EFKA4330, 4340 (block copolymer), 4400, 4402 (modified polyacrylate), 5010 (polyester decylamine), 5765 (high molecular weight polycarboxylic acid), 6220 (aliphatic polyester) , 6745 (indigo derivative), 6750 (azo pigment derivative), Ajinomoto Fan Techno Co., "AJISPER PB-821, PB-822" manufactured by Corp., manufactured by Kyoeisha Chemical Co., Ltd. FROREN TG-710 (urethane oligomer), "POLYFLOW No. 50E, No. 300 (acrylic-based copolymer)", "DISPERON KS-860, 873SN, 874, manufactured by Kusumoto Kasei Corp." #2150(aliphatic polyvalent carboxylic acid), #7004 (polyether ester), DA-703-50, DA-705, DA-725", "DEMOL RN, N (Naphthalenesulfonic acid formaldehyde) manufactured by Kao Corp. Condensation product), MS, C, SN-B (Aromatic condensation product of aromatic sulfonic acid formaldehyde), "HOMOGENOL L-18 (polymer polycarboxylic acid)", "EMARGEN 920, 930, 935, 985 (polyoxyethyl phenyl ether)", " ACETAMINE 86 (stearylamine acetate), "SOLSPACE 5000 (indigo derivative), 22000 (azo pigment derivative), 13240 (polyester amine), 3000, 17000, 27000 manufactured by RUBERESOL Corp. "polymer of functional group portion", 24000, 28000, 32000, 38500 (graft type polymer)", "NIKKOL T106 (polymerized by NIKKO CHEMICAL Corp.) Oxygen-extended ethyl sorbitan monooleate), MYS-IEX (polyoxy-extension ethyl monostearate), and the like.

這些分散劑可單獨或以二或更多種之組合使用。本發明特佳為組合使用顏料衍生物與聚合物分散劑。These dispersants may be used singly or in combination of two or more. It is particularly preferred in the present invention to use a pigment derivative in combination with a polymeric dispersant.

分散劑在本發明中之含量相對顏料較佳為1質量%至100質量%,更佳為3質量%至100質量%,而且進一步較佳為5質量%至80質量%。The content of the dispersant in the present invention is preferably from 1% by mass to 100% by mass, more preferably from 3% by mass to 100% by mass, and further preferably from 5% by mass to 80% by mass, based on the pigment.

特別是在使用聚合物分散劑之情形,其使用量相對顏料較佳為5質量%至100質量%之範圍,而且更佳為10質量%至80質量%之範圍。此外在使用顏料衍生物之情形,其使用量相對顏料較佳為1質量%至30質量%之範圍,更佳為3質量%至20質量%之範圍,而且特佳為5質量%至15質量%之範圍。Particularly in the case of using a polymer dispersant, the amount thereof is preferably in the range of from 5% by mass to 100% by mass based on the pigment, and more preferably in the range of from 10% by mass to 80% by mass. Further, in the case of using a pigment derivative, the amount thereof to be used is preferably in the range of 1% by mass to 30% by mass, more preferably in the range of 3% by mass to 20% by mass, and particularly preferably 5% by mass to 15% by mass. The range of %.

在本發明中使用顏料與分散劑之情形,由硬化敏感度及顏色密度之觀點,顏料與分散劑之含量總和相對組成硬化性組成物之總固體含量較佳為35質量%至90質量%,更佳為45質量%至85質量%,而且進一步較佳為50質量%至80質量%。In the case where a pigment and a dispersing agent are used in the present invention, the sum of the content of the pigment and the dispersing agent is preferably from 35% by mass to 90% by mass based on the total solid content of the hardening composition, from the viewpoint of hardening sensitivity and color density. It is more preferably from 45% by mass to 85% by mass, and further preferably from 50% by mass to 80% by mass.

<(G)敏化劑> 為了改良聚合引發劑之自由基產生效率及得到長敏化波長之目的,較佳為本發明之硬化性組成物含(G)敏化劑。至於用於本發明之敏化劑,其較佳為可藉電子轉移機構或能量轉移機構敏化上述光聚合引發劑者。<(G) sensitizer> In order to improve the radical generating efficiency of the polymerization initiator and to obtain a long sensitizing wavelength, it is preferred that the curable composition of the present invention contains a (G) sensitizer. As the sensitizer used in the present invention, it is preferred that the photopolymerization initiator can be sensitized by an electron transfer mechanism or an energy transfer mechanism.

至於用於本發明之敏化劑,其可提出屬於下列之化合 物且在300奈米至450奈米波長範圍具有吸收波長者。As for the sensitizer used in the present invention, it can be proposed to belong to the following combinations And have an absorption wavelength in the wavelength range of 300 nm to 450 nm.

至於較佳敏化劑,其可提出屬於此化合物且在330奈米至450奈米波長範圍具有吸收波長者。As a preferred sensitizer, it can be proposed to belong to this compound and have an absorption wavelength in the wavelength range of 330 nm to 450 nm.

其可提出例如多核芳族基(如菲、蒽、芘、苝、三苯烯、與9,10-二烷氧基蒽)、(如螢光黃、曙紅、赤藻辛、玫瑰紅B、與孟加拉紅)、硫(異丙基硫、二乙基硫、氯硫)、花青(如噻羰花青與噁羰花青)、品花青(如品花青、羰品花青)、酞青、噻(如噻嚀、甲基藍與甲苯胺藍)、吖啶(如吖啶橙、氯黃素與吖啶黃素)、蒽醌(如蒽醌)、異三十烷鎓(squalium)(如異三十烷鎓)、吖啶橙、薰草素(例如7-二乙胺基-4-甲基薰草素)、酮基薰草素、啡噻、啡、苯乙烯基苯、偶氮化合物、二苯基甲烷、三苯基甲烷、二苯乙烯基苯、咔唑、卟啉、螺化合物、喹吖啶、靛、苯乙烯基、吡喃鎓(pyrylium)化合物、吡咯甲川化合物、吡唑基三唑化合物、苯并噻唑化合物、巴比妥酸衍生物、硫巴比妥酸衍生物、苯乙酮、二苯基酮、9-氧硫、芳族酮化合物(如米其勒酮)、雜環化合物(如N-芳氧噁唑啶二酮)等。此外其可提出歐洲專利第568,993號、美國專利第4,508,811及5,227,227號、JP-A第2001-125255及11-271969號專利等所述之化合物。It may, for example, be a polynuclear aromatic group (such as phenanthrene, anthracene, anthracene, anthracene, triphenylene, and 9,10-dialkoxyfluorene), (such as fluorescent yellow, blush, red algae, rose red B, and bengal red), sulfur (isopropyl sulphide Diethyl sulphide Chlorosulfur ), Huaqing (such as thiocarbocyanine and carbocyanine), Pinhuaqing (such as Pinocyanin, Cyclone Cyanine), indigo, thiophene (such as thiazide, methyl blue and toluidine blue), acridine (such as acridine orange, chloroflavin and acridine flavin), hydrazine (such as hydrazine), isosuccinium (squalium) (such as Isobutane oxime), acridine orange, oxacillin (eg 7-diethylamino-4-methylinvalidin), keto-encain, thiophene ,coffee , styrylbenzene, azo compound, diphenylmethane, triphenylmethane, distyrylbenzene, carbazole, porphyrin, spiro compound, quinacridine, anthracene, styryl, pyrylium a compound, a pyrazole compound, a pyrazolyl triazole compound, a benzothiazole compound, a barbituric acid derivative, a thiobarbituric acid derivative, an acetophenone, a diphenyl ketone, a 9-oxosulfur An aromatic ketone compound (such as mazakirone), a heterocyclic compound (such as N-aryloxazolidinedione), and the like. Further, the compounds described in the patents of European Patent No. 568,993, U.S. Patent Nos. 4,508,811 and 5,227,227, JP-A Nos. 2001-125255 and 11-271969 can be cited.

至於進一步較佳敏化劑之實例,其可提出以下由式(i)至(iv)表示之化合物。As an example of a further preferred sensitizer, the following compounds represented by the formulae (i) to (iv) can be proposed.

在式(i)中,A1 為硫原子或NR50 ,R50 為烷基或芳基,L2 為結合相鄰A1 及相鄰碳原子形成顏料之鹼性核的非金屬原子基,及R51 、R52 各獨立地為氫原子或單價非金屬原子基,其可彼此偶合形成顏料之酸性核。W為氧原子或硫原子。至於上述R50 之烷基,其可提出具有1至30個碳原子之烷基,然而較佳為具有1至20個碳原子之烷基,而且最佳為具有1至10個碳原子之烷基。至於上述R50 之芳基,其可提出具有6至30個碳原子之芳基,然而較佳為具有6至20個碳原子之芳基,而且最佳為具有6至10個碳原子之芳基。In the formula (i), A 1 is a sulfur atom or NR 50 , R 50 is an alkyl group or an aryl group, and L 2 is a non-metal atomic group which binds a neighboring A 1 and an adjacent carbon atom to form a basic nucleus of a pigment. And R 51 and R 52 are each independently a hydrogen atom or a monovalent non-metal atom group, which may be coupled to each other to form an acid core of the pigment. W is an oxygen atom or a sulfur atom. As the above alkyl group of R 50 , it may be an alkyl group having 1 to 30 carbon atoms, preferably an alkyl group having 1 to 20 carbon atoms, and most preferably an alkane having 1 to 10 carbon atoms. base. As the aryl group of the above R 50 , it may be an aryl group having 6 to 30 carbon atoms, preferably an aryl group having 6 to 20 carbon atoms, and most preferably an aromatic group having 6 to 10 carbon atoms. base.

在式(ii)中,Ar1 與Ar2 各獨立地為芳基,其經-L3 -鍵鍵聯。在此L3 為-O-或-S-。此外W係與式(i)所示相同。至於上述A1 之芳基,其可提出具有6至30個碳原子之芳基,然而較佳為具有6至20個碳原子之芳基,而且最佳為具 有6至10個碳原子之芳基。至於上述A2 之芳基,其可提出具有6至30個碳原子之芳基,然而較佳為具有6至20個碳原子之芳基,而且最佳為具有6至10個碳原子之芳基。In the formula (ii), Ar 1 and Ar 2 are each independently an aryl group which is bonded via a -L 3 - bond. Here, L 3 is -O- or -S-. Further, the W system is the same as that shown in the formula (i). As the aryl group of the above A 1 , it may be an aryl group having 6 to 30 carbon atoms, preferably an aryl group having 6 to 20 carbon atoms, and most preferably an aromatic group having 6 to 10 carbon atoms. base. As the aryl group of the above A 2 , it may be an aryl group having 6 to 30 carbon atoms, preferably an aryl group having 6 to 20 carbon atoms, and most preferably an aromatic group having 6 to 10 carbon atoms. base.

在式(iii)中,A2 為硫原子或NR59 ,L4 為結合相鄰A2 及碳原子形成染料之鹼性核的非金屬原子基,及R53 、R54 、R55 、R56 、R57 、與R58 各獨立地為單價非金屬原子基,及R59 為烷基或芳基。至於R59 之烷基,其可提出具有1至30個碳原子之烷基,然而較佳為具有1至20個碳原子之烷基,而且最佳為具有1至10個碳原子之烷基。至於R59 之芳基,其可提出具有6至30個碳原子之芳基,然而較佳為具有6至20個碳原子之芳基,而且最佳為具有6至10個碳原子之芳基。In the formula (iii), A 2 is a sulfur atom or NR 59 , and L 4 is a non-metal atomic group which binds a neighboring A 2 and a carbon atom to form a basic nucleus of a dye, and R 53 , R 54 , R 55 , R 56. R 57 and R 58 are each independently a monovalent non-metal atomic group, and R 59 is an alkyl group or an aryl group. As the alkyl group of R 59 , it may be an alkyl group having 1 to 30 carbon atoms, preferably an alkyl group having 1 to 20 carbon atoms, and most preferably an alkyl group having 1 to 10 carbon atoms. . As the aryl group of R 59 , it may be an aryl group having 6 to 30 carbon atoms, preferably an aryl group having 6 to 20 carbon atoms, and most preferably an aryl group having 6 to 10 carbon atoms. .

在式(iv)中,A3 與A4 各獨立地為-S-、-NR62 -或-NR63 -。R62 、R63 各獨立地為經取代或未取代烷基、或經取代或未取代芳基,L5 、L6 各獨立地為結合相鄰A3 與A4 及相鄰碳原子形成染料之鹼性核的非金屬原子基,R60 、R61 各獨立地為單價非金屬原子基,或者其可彼此偶合形成脂環或芳環。至於R62 、R63 之烷基,其可提出具有1至30個碳原子之烷基,然而較佳為具有1至20個碳原子之烷基,而且最佳為具有1至10個碳原子之烷基。至於R62 、R63 之芳基,其可提出具有6至30個碳原子之芳基,然而較佳為具有6至20個碳原子之芳基,而且最佳為具有6至10個碳原子之芳基。至於取代情形之取代基,其較佳為烷基、鹵素原子(氟原子、氯原子、溴原子、碘原子)、烷氧基、烷氧基羰基、醯基、羥基、與胺基。這些取代基之碳原子數量較佳為1至30個,更佳為1至20個,而且最佳為1至10個。In the formula (iv), A 3 and A 4 are each independently -S-, -NR 62 - or -NR 63 -. R 62 and R 63 are each independently a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group, and L 5 and L 6 are each independently a dye formed by bonding adjacent A 3 with A 4 and an adjacent carbon atom. The non-metal atomic group of the basic core, R 60 and R 61 are each independently a monovalent non-metal atomic group, or they may be coupled to each other to form an alicyclic or aromatic ring. As the alkyl group of R 62 and R 63 , it may be an alkyl group having 1 to 30 carbon atoms, preferably an alkyl group having 1 to 20 carbon atoms, and most preferably having 1 to 10 carbon atoms. Alkyl group. As the aryl group of R 62 and R 63 , it may be an aryl group having 6 to 30 carbon atoms, preferably an aryl group having 6 to 20 carbon atoms, and most preferably having 6 to 10 carbon atoms. The aryl group. As the substituent in the case of substitution, it is preferably an alkyl group, a halogen atom (a fluorine atom, a chlorine atom, a bromine atom or an iodine atom), an alkoxy group, an alkoxycarbonyl group, a decyl group, a hydroxyl group, and an amine group. The number of carbon atoms of these substituents is preferably from 1 to 30, more preferably from 1 to 20, and most preferably from 1 to 10.

此外至於含於本發明硬化性組成物之較佳敏化劑,除了上述者,其可提出至少一種選自由下式(IV)至(VI)表示之化合物。其可單獨或以二或更多種之組合使用。Further, as a preferred sensitizer to be contained in the curable composition of the present invention, in addition to the above, at least one compound selected from the following formulas (IV) to (VI) may be mentioned. They may be used singly or in combination of two or more.

在式(IV)或(V)中,R1 與R2 各獨立地為單價取代基,及R3 、R4 、R5 、與R6 各獨立地為氫原子或單價取代基。n為0至5之整數,及n’為0至5之整數,其中n與n’不同時為0。在n為2或更大之情形,以多個存在之R1 可為相同或不同。在n’為2或更大之情形,以多個存在之R2 可為相同或不同。至於上述之單價取代基,其較佳為烷基、鹵素原子(氟原子、氯原子、溴原子、碘原子)、烷氧基、烷氧基羰基、醯基、羥基、與胺基。這些取代基之碳原子數量較佳為1至30個,更佳為1至20個,而且最佳為1至10個。In the formula (IV) or (V), R 1 and R 2 are each independently a monovalent substituent, and R 3 , R 4 , R 5 and R 6 are each independently a hydrogen atom or a monovalent substituent. n is an integer from 0 to 5, and n' is an integer from 0 to 5, where n is not 0 different from n'. In the case where n is 2 or more, R 1 may be the same or different in the presence of a plurality of. In the case where n' is 2 or more, R 2 in the presence of a plurality may be the same or different. As the above monovalent substituent, it is preferably an alkyl group, a halogen atom (a fluorine atom, a chlorine atom, a bromine atom or an iodine atom), an alkoxy group, an alkoxycarbonyl group, a decyl group, a hydroxyl group, and an amine group. The number of carbon atoms of these substituents is preferably from 1 to 30, more preferably from 1 to 20, and most preferably from 1 to 10.

在得到著色劑之情形,由著色性質及敏感度之觀點,由式(IV)表示之化合物較佳為由下式(IV-1)表示之化合物。In the case of obtaining a coloring agent, the compound represented by the formula (IV) is preferably a compound represented by the following formula (IV-1) from the viewpoints of coloring properties and sensitivity.

在式(IV-1)中,R1 與R2 各獨立地為單價取代基。n為0至5之整數,及n’為1至5之整數。在n為2或更大之情形,以多個存在之R1 可為相同或不同。在n’為2或更大之情形,以多個存在之R2 可為相同或不同。In the formula (IV-1), R 1 and R 2 are each independently a monovalent substituent. n is an integer from 0 to 5, and n' is an integer from 1 to 5. In the case where n is 2 or more, R 1 may be the same or different in the presence of a plurality of. In the case where n' is 2 or more, R 2 in the presence of a plurality may be the same or different.

在式(IV-1)中,由R1 與R2 表示之單價取代基係與上述式(IV)中由R1 與R2 表示之單價取代基相同,而且亦應用相同之較佳範圍。In the formula (IV-1), the sum represented by the R 1 and R 2 system and the monovalent substituent in the formula (IV) represented by the sum R 1 and R 2 identical monovalent substituent, and the preferred range is also the same applications.

至於由式(IV)或(V)表示之化合物,其較佳為在365奈米波長之莫耳吸收係數ε為500莫耳-1 .L.公分-1 或更大者,更佳為在365奈米波長之ε為3,000莫耳-1 .L.公分-1 或更大者,而且最佳為在365奈米波長之ε為20,000莫耳-1 .L.公分-1 或更大者。由於在各波長之莫耳吸光係數ε為上述範圍,敏感度改良效果高,其由吸光效率之觀點較佳。As for the compound represented by the formula (IV) or (V), it is preferred that the molar absorption coefficient ε at a wavelength of 365 nm is 500 mol -1 . L. The centimeters -1 or larger, more preferably the ε at 365 nm wavelength is 3,000 m -1 . L. The centimeters are -1 or larger, and the optimum is 20,000 m -1 at 365 nm wavelength. L. Centimeters -1 or greater. Since the Mohr absorption coefficient ε at each wavelength is in the above range, the sensitivity improvement effect is high, which is preferable from the viewpoint of light absorption efficiency.

在此莫耳吸收係數ε可藉由在1-甲氧基-2-丙醇溶液中使用將濃度調整至0.01克/公升之染料溶液的樣本,測量樣品在365奈米之穿透光譜,而由樣品之UV-可見光吸收光譜計算吸收度而得。至於測量設備,其使用Varian Corp.製造之UV-Vis-MR Spectrophotometer Cary5G型光譜光度計。Here, the molar absorption coefficient ε can be measured by using a sample of a dye solution adjusted to a concentration of 0.01 g/liter in a 1-methoxy-2-propanol solution, and the sample is measured at a penetration spectrum of 365 nm. The absorbance was calculated from the UV-visible absorption spectrum of the sample. As for the measuring device, a UV-Vis-MR Spectrophotometer Cary 5G spectrophotometer manufactured by Varian Corp. was used.

以下顯示由式(IV)或(V)表示之化合物的較佳指定實例,但是本發明不受其限制。Preferred examples of the compound represented by the formula (IV) or (V) are shown below, but the invention is not limited thereto.

在此之式可由簡單結構式表示,其中未敘述元素或取代基之實線等表示烴基。此外在以下指定實例中,Me表示甲基,Et表示乙基,Bu表示丁基,n-Bu表示正丁基,及Ph表示苯基。Here, the formula can be represented by a simple structural formula in which a solid line or the like which does not describe an element or a substituent represents a hydrocarbon group. Further, in the following designated examples, Me represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, n-Bu represents an n-butyl group, and Ph represents a phenyl group.

在式(VI)中,A為芳環或雜環,其可具有取代基,X為氧原子、硫原子或-N(R3 )-,Y為氧原子、硫原子或-N(R3 )-。R1 、R2 與R3 各獨立地為氫原子或單價非金屬原子基。A、R1 、R2 、與R3 可彼此偶合形成脂環或芳環。In the formula (VI), A is an aromatic ring or a heterocyclic ring which may have a substituent, X is an oxygen atom, a sulfur atom or -N(R 3 )-, and Y is an oxygen atom, a sulfur atom or -N (R 3 ) )-. R 1 , R 2 and R 3 are each independently a hydrogen atom or a monovalent non-metal atom group. A, R 1 , R 2 , and R 3 may be coupled to each other to form an alicyclic or aromatic ring.

在式(VI)中,在R1 、R2 與R3 為單價非金屬原子之情形,其較佳為經取代或未取代烷基、經取代或未取代芳基、經取代或未取代烯基、經取代或未取代芳族雜環殘基、經取代或未取代烷氧基、經取代或未取代烷硫基、羥基、或鹵素原子。In the formula (VI), in the case where R 1 , R 2 and R 3 are a monovalent non-metal atom, it is preferably a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkene. A substituted or unsubstituted aromatic heterocyclic residue, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted alkylthio group, a hydroxyl group, or a halogen atom.

至於上述烷基,其較佳為具有1至30個碳原子之線形、分支或環形烷基,更佳為具有1至20個碳原子者,而且特佳為具有1至15個碳原子者。其可提出例如甲基、乙基、丙基、異丙基、正丁基、異丁基、第三丁基、正辛基、正十二碳基、環戊基、苄基、雙環[2,2,1]-庚-2-基等。As the above alkyl group, it is preferably a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, and particularly preferably 1 to 15 carbon atoms. It may, for example, be methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-octyl, n-dodecyl, cyclopentyl, benzyl, bicyclo[2 , 2,1]-heptan-2-yl and the like.

至於上述芳基,其較佳為具有6至30個碳原子之芳基,更佳為具有6至20個碳原子者,而且特佳為具有6至15個碳原子者。其可提出例如苯基、萘基等。As the above aryl group, it is preferably an aryl group having 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and particularly preferably 6 to 15 carbon atoms. It may, for example, be a phenyl group, a naphthyl group or the like

至於上述烯基,其較佳為具有1至30個碳原子之線形 、分支或環形烯基,更佳為具有1至20個碳原子者,而且特佳為具有1至15個碳原子者。其可提出例如乙烯基、烯丙基、環己烯基、香葉基等。As the above alkenyl group, it is preferably a linear form having 1 to 30 carbon atoms. Or a branched or cyclic alkenyl group, more preferably having from 1 to 20 carbon atoms, and particularly preferably having from 1 to 15 carbon atoms. It may, for example, be a vinyl group, an allyl group, a cyclohexenyl group, a geranyl group or the like.

上述芳族雜環殘基較佳為5至7員經取代或未取代、飽和或不飽和、芳族或非芳族、單環或縮合環芳族雜環殘基。更佳為芳族雜環殘基具選自碳原子、氮原子與硫原子之環取代基原子,雜原子至少之一為氮原子、氧原子與硫原子。進一步較佳為具有3至30個碳原子之5或6員芳族雜環殘基。其可提出例如2-吡啶基、4-吡啶基、2-嘧啶基、2-苯并噻唑基、咪唑-2-基等。The above aromatic heterocyclic residue is preferably a substituted or unsubstituted, saturated or unsaturated, aromatic or non-aromatic, monocyclic or condensed cyclic aromatic heterocyclic residue of 5 to 7 members. More preferably, the aromatic heterocyclic residue has a ring substituent atom selected from the group consisting of a carbon atom, a nitrogen atom and a sulfur atom, and at least one of the hetero atoms is a nitrogen atom, an oxygen atom and a sulfur atom. Further preferred are 5 or 6 membered aromatic heterocyclic residues having 3 to 30 carbon atoms. It may, for example, be 2-pyridyl, 4-pyridyl, 2-pyrimidinyl, 2-benzothiazolyl, imidazol-2-yl and the like.

至於上述烷氧基,其較佳為具有1至30個碳原子之線形、分支或環形烷氧基,更佳為具有1至20個碳原子者,而且特佳為具有1至10個碳原子者。其可提出例如甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、異丁氧基、第三丁氧基等。As the above alkoxy group, it is preferably a linear, branched or cyclic alkoxy group having 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, and particularly preferably 1 to 10 carbon atoms. By. It may, for example, be a methoxy group, an ethoxy group, a n-propoxy group, an isopropoxy group, a n-butoxy group, an isobutoxy group, a third butoxy group or the like.

至於上述烷硫基,其較佳為具有1至30個碳原子之線形、分支或環形烷硫基,更佳為具有1至20個碳原子者,而且特佳為具有1至10個碳原子者。其可提出例如甲硫基、乙硫基、正癸硫基等。As the above alkylthio group, it is preferably a linear, branched or cyclic alkylthio group having 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, and particularly preferably 1 to 10 carbon atoms. By. It may, for example, be a methylthio group, an ethylthio group, a n-decylthio group or the like.

上述單價非金屬原子基可如上所述經取代。至於取代基,其可提出烷基、烯基、氟原子、氯原子、溴原子、碘原子、烷氧基、烷氧基羰基、醯基、羥基、烷硫基、芳硫基等。在這些取代基具有碳之情形,碳總數較佳為1至30個,進一步較佳為1至20個,而且最佳為1至10個。The above monovalent non-metal atomic group may be substituted as described above. As the substituent, an alkyl group, an alkenyl group, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, an alkoxy group, an alkoxycarbonyl group, a decyl group, a hydroxyl group, an alkylthio group, an arylthio group or the like can be proposed. In the case where these substituents have carbon, the total number of carbons is preferably from 1 to 30, further preferably from 1 to 20, and most preferably from 1 to 10.

由改良光聚合引發劑之分解效率的觀點,在由式(VI)表示之化合物中,Y較佳為氧原子或-N(R3 )-,而且最佳為-N(R3 )-。R3 各獨立地為氫原子或單價非金屬原子基。From the viewpoint of improving the decomposition efficiency of the photopolymerization initiator, in the compound represented by the formula (VI), Y is preferably an oxygen atom or -N(R 3 )-, and most preferably -N(R 3 )-. R 3 is each independently a hydrogen atom or a monovalent non-metal atom group.

以下顯示由式(VI)表示之較佳化合物的指定實例(VI1)至(VI124),然而本發明不受其限制。此外因鍵聯酸性核與鹼性核之雙鍵造成之異構物不明確,而且本發明不限於任何異構物。The specified examples (VI1) to (VI124) of the preferred compounds represented by the formula (VI) are shown below, but the invention is not limited thereto. Further, the isomer caused by the double bond of the bonded acidic core and the basic nucleus is not clear, and the present invention is not limited to any isomer.

依照本發明之由式(VI)表示之化合物可進一步具有各種用於改良硬化性組成物之特性的化學修改。The compound represented by the formula (VI) according to the present invention may further have various chemical modifications for improving the properties of the hardenable composition.

例如藉由將敏化劑(以下稱為「敏化染料」)與加成聚合化合物結構(如丙烯醯基與甲基丙烯醯基)以共價鍵、離子鍵、氫鍵等鍵聯,其可達成高曝光薄膜強度且可限制曝光後敏化染料自薄膜之不必要沉澱。For example, a sensitizer (hereinafter referred to as "sensitizing dye") and an addition polymerization compound structure (such as an acrylonitrile group and a methacryl fluorenyl group) are bonded by a covalent bond, an ionic bond, a hydrogen bond or the like. High exposure film strength can be achieved and unnecessary precipitation of the sensitizing dye from the film after exposure can be limited.

此外敏化染料與上述光聚合引發劑中具有自由基產生能力之部分結構(如還原分解部分,如鹵化烷基、鎓鹽、過氧化物、與二咪唑,及氧化分離部分,如硼酸基、胺、三甲基矽烷基甲基、羧基甲基、羰基、與亞胺)的鍵結明顯地改良感光性質,特別是在低濃度引發系統之狀態。Further, a sensitizing dye and a partial structure having a radical generating ability in the above photopolymerization initiator (such as a reductive decomposition moiety such as a halogenated alkyl group, a phosphonium salt, a peroxide, a diimidazole, and an oxidative separation moiety such as a boronic acid group, The bonding of the amine, trimethyldecylmethyl, carboxymethyl, carbonyl, and imine) significantly improves the photographic properties, particularly at low concentrations in the state of the system.

在本發明之硬化性組成物中,由式(IV)至(VI)表示之化合物可單獨或以二或更多種之組合使用。In the curable composition of the present invention, the compounds represented by the formulae (IV) to (VI) may be used singly or in combination of two or more.

在硬化性組成物中之著色劑濃度極高,使得欲形成著色圖案(感光層)之透光率極低的情形,特別是在未加入敏化染料而形成之感光層在365奈米之透光率為10%或更低之情形,藉由加入由上述式(IV)至(VI)表示之化合物可明顯地顯示改良感光性質之效果。特別是上述式(IV)至(VI)中最佳為由式(VI)表示之化合物。特別地,最佳為(VI56) 至(VI122)之化合物。The concentration of the coloring agent in the curable composition is extremely high, so that the light transmittance of the colored pattern (photosensitive layer) is extremely low, especially in the photosensitive layer formed without adding the sensitizing dye at 365 nm. In the case where the light ratio is 10% or less, the effect of improving the photosensitive property can be remarkably exhibited by adding the compound represented by the above formulas (IV) to (VI). Particularly, the compound represented by the formula (VI) is the most preferable among the above formulae (IV) to (VI). In particular, the best is (VI56) To the compound of (VI122).

敏化劑可單獨或以二或更多種組合使用。The sensitizers may be used singly or in combination of two or more.

由較深部分之吸光效率及起初分解效率的觀點,敏化劑在本發明硬化性組成物中之含量相對硬化性組成物之總固體成分較佳為0.1質量%至20質量%,而且更佳為0.5質量%至15質量%。上述範圍較佳,因為如此造成硬化性組成物之較深部分的吸光效率增加,而且起初分解效率為有利的。The content of the sensitizer in the curable composition of the present invention is preferably from 0.1% by mass to 20% by mass, and more preferably from the viewpoint of the light absorption efficiency of the deep portion and the initial decomposition efficiency, with respect to the total solid content of the curable composition. It is from 0.5% by mass to 15% by mass. The above range is preferred because the light absorption efficiency of the deep portion of the hardenable composition is increased, and the initial decomposition efficiency is advantageous.

<(H)共敏化劑> 本發明之硬化性組成物可含一種共敏化劑。在本發明中,共敏化劑具有進一步改良敏化染料或光聚合引發劑對光似輻射之敏感度,或限制聚合性化合物因氧抑制聚合等之效果。<(H)Cosensitizer> The curable composition of the present invention may contain a co-sensitizer. In the present invention, the co-sensitizer further has an effect of improving the sensitivity of the sensitizing dye or the photopolymerization initiator to light-like radiation, or limiting the polymerization of the polymerizable compound by oxygen.

此共敏化劑之實例包括胺,例如M.R.Sander等人編寫之“Journal of Polymer Society”,第10卷,第3,173頁(1972)、JP-B第44-20189號、JP-A第51-82102、52-134692、59-138205、60-84305、62-18537、64-33104號專利、Research Disclosure No.33825所述之化合物。特別地,其可提出三乙醇胺、對二甲胺基苯甲酸乙酯、對甲醯基二甲基苯胺、對甲基硫二甲基苯胺等。Examples of such co-sensitizers include amines, such as "Journal of Polymer Society" by MRSander et al., Vol. 10, p. 3, 173 (1972), JP-B No. 44-20189, JP-A No. 51- Compounds of 82102, 52-134692, 59-138205, 60-84305, 62-18537, 64-33104, Research Disclosure No. 33825. Specifically, it may be mentioned as triethanolamine, p-dimethylaminobenzoic acid ethyl ester, p-nonyldimethylaniline, p-methylthiodimethylaniline or the like.

共敏化劑之其他實例包括硫醇與硫化物,例如JP-A第53-702號、JP-B第55-500806號及JP-A第5-142772號專利所述之硫醇化合物,及JP-A第56-75643號專利所述之二硫化物化合物,特別是2-巰基苯并噻唑、2-巰基苯并噁 唑、2-巰基苯并咪唑、2-巰基-4(3H)-喹唑啉、與β-巰基萘。Other examples of the co-sensitizer include a mercaptan and a sulfide, such as a thiol compound described in JP-A No. 53-702, JP-B No. 55-500806, and JP-A No. 5-142772, and The disulfide compound described in JP-A No. 56-75643, in particular 2-mercaptobenzothiazole, 2-mercaptobenzopyrene Oxazole, 2-mercaptobenzimidazole, 2-mercapto-4(3H)-quinazoline, and β-mercaptophthalene.

此外共敏化劑之其他實例包括胺基酸化合物(例如N-苯基甘胺酸等)、JP-B第48-42965號專利所述之有機金屬化合物(例如乙酸三丁錫等),JP-B第55-34414號專利所述之予氫化合物,及JP-A第6-308727號專利所述之硫化合物(例如三噻唍等)。Further, other examples of the co-sensitizer include an amino acid compound (for example, N-phenylglycine, etc.), an organometallic compound (for example, tributyltin acetate, etc.) described in JP-B No. 48-42965, JP. -B a hydrogen compound as described in Patent No. 55-34414, and a sulfur compound (for example, trithiazine or the like) described in JP-A No. 6-308727.

由依聚合生長速度與鏈轉移間平衡改良硬化速度之觀點,共敏化劑之含量相對硬化性組成物之總固體成分的質量較佳為0.1質量%至30質量%之範圍,更佳為0.5質量%至25質量%之範圍,而且甚至更佳為1.0質量%至20質量%之範圍。The content of the total sensitizer relative to the total solid content of the hardenable composition is preferably in the range of 0.1% by mass to 30% by mass, more preferably 0.5%, from the viewpoint of improving the curing speed according to the polymerization growth rate and the chain-to-chain transfer balance. It is in the range of % to 25% by mass, and even more preferably in the range of 1.0% by mass to 20% by mass.

<(I)聚合抑制劑> 在本發明中希望加入少量之聚合抑制劑,以在製造或保存硬化性組成物期間抑制具有聚合性乙烯不飽和雙鍵之化合物的不必要熱聚合。<(I) Polymerization inhibitor> It is desirable in the present invention to add a small amount of a polymerization inhibitor to suppress unnecessary thermal polymerization of a compound having a polymerizable ethylenically unsaturated double bond during the manufacture or storage of the curable composition.

至於用於本發明之熱聚合抑制劑,其可提出氫醌、對甲氧基酚、二第三丁基-對甲酚、五倍子酚、第三丁基兒茶酚、苯醌、4,4’-硫貳(3-甲基-6-第三丁基酚)、2,2’-亞甲基貳(4-甲基-6-第三丁基酚)、N-亞硝基苯基羥基胺鈰鹽等。As the thermal polymerization inhibitor used in the present invention, it may be proposed to hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, gallic phenol, tert-butylcatechol, benzoquinone, 4, 4 '-Thionine (3-methyl-6-tert-butylphenol), 2,2'-methylene hydrazine (4-methyl-6-tert-butylphenol), N-nitrosophenyl Hydroxylamine sulfonium salts and the like.

熱聚合抑制劑之加入量相對全部組成物之質量較佳為約0.01質量%至約5質量%。如果需要,為了防止因氧抑制聚合,其可加入高碳脂肪酸衍生物,如蘿酸與蘿酸醯胺 ,而在塗覆後之乾燥程序期間不均勻地分布在感光層表面上。高碳脂肪酸衍生物之加入量較佳為全部組成物之約0.5質量%至約10質量%。The amount of the thermal polymerization inhibitor added is preferably from about 0.01% by mass to about 5% by mass based on the total mass of the entire composition. If necessary, in order to prevent polymerization inhibition by oxygen, it may be added with a high-carbon fatty acid derivative such as rosin and decanoic acid. And unevenly distributed on the surface of the photosensitive layer during the drying process after coating. The high carbon fatty acid derivative is preferably added in an amount of from about 0.5% by mass to about 10% by mass based on the total of the composition.

<其他添加劑> 此外在本發明中可加入已知添加劑,如改良硬化塗膜之物理性質的無機填料、塑性劑、及用於改良感光層表面之吸墨性質的敏化劑、及用於改良基板黏附性質之基板黏附劑。<Other additives> Further, in the present invention, known additives such as an inorganic filler which improves the physical properties of the cured coating film, a plasticizer, a sensitizer for improving the ink absorbing property of the surface of the photosensitive layer, and a modified substrate for improving the adhesion property of the substrate may be added. Substrate adhesion agent.

至於塑性劑,其可提出例如酞酸二辛酯、酞酸二-十二碳酯、三乙二醇二辛酸酯、二甲二醇酞酸酯、三甲苯酚磷酸酯、己二酸二辛酯、癸二酸二丁酯、三乙醯基甘油等。在使用偶合劑之情形,其可加入相對具有乙烯不飽和雙鍵之化合物與偶合劑的總質量為10質量%或更少。 在將本發明之硬化性組成物用於硬材料表面(如基板)之情形,其可加入一種用於改良對硬材料表面之黏附性的添加劑(以下稱為「基板黏附劑」)。As the plasticizer, for example, dioctyl phthalate, di-dodecyl phthalate, triethylene glycol dicaprylate, dimethylene phthalate, tricresol phosphate, dioctyl adipate may be proposed. Ester, dibutyl sebacate, triethylene glyceryl, and the like. In the case where a coupling agent is used, it may be added to the total mass of the compound having a ethylenically unsaturated double bond and the coupling agent of 10% by mass or less. In the case where the curable composition of the present invention is applied to a surface of a hard material such as a substrate, an additive for improving the adhesion to the surface of the hard material (hereinafter referred to as "substrate adhesion agent") may be added.

至於基板黏附劑,其可使用已知材料。其特佳為使用矽烷為主偶合劑、鈦酸酯為主偶合劑或鋁為主偶合劑。As the substrate adhesive, a known material can be used. It is particularly preferred to use a decane-based coupling agent, a titanate-based coupling agent, or an aluminum-based coupling agent.

矽烷偶合劑之實例包括γ-(2-胺基乙基)胺基丙基三甲氧基矽烷、γ-(2-胺基乙基)胺基丙基二甲氧基矽烷、β-(3,4-環氧基環己基)乙基三甲氧基矽烷、γ-胺基丙基三甲氧基矽烷、γ-胺基丙基三乙氧基矽烷、γ-甲基丙烯氧基丙基三甲氧基矽烷、γ-甲基丙烯氧基丙基三乙氧基矽烷、γ-丙烯氧基丙基三甲氧基矽烷、γ-丙烯氧基丙基三乙氧基矽烷、γ- 異氰酸基丙基三甲氧基矽烷、γ-異氰酸基丙基三乙氧基矽烷、N-β-(N-乙烯基苄基胺基乙基)-γ-胺基丙基三甲氧基矽烷.鹽酸鹽、γ-環氧丙基丙基三甲氧基矽烷、γ-環氧丙基丙基三乙氧基矽烷、胺基矽烷、γ-巰基丙基三甲氧基矽烷、γ-巰基丙基三乙氧基矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙烯基三乙醯氧基矽烷、γ-氯丙基三甲氧基矽烷、伸己基二矽氮烷、γ-苯胺基丙基三甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基参(β-甲氧基乙氧基)矽烷、氯化十八碳基二甲基[3-(三甲氧基矽烷基)丙基]銨、γ-氯丙基甲基二甲氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、甲基三氯矽烷、二甲基二氯矽烷、三甲基氯矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、貳烯丙基三甲氧基矽烷、四乙氧基矽烷、貳(三甲氧基矽烷基)己烷、苯基三甲氧基矽烷、N-(3-丙烯氧基-2-羥基丙基)-3-胺基丙基三乙氧基矽烷、N-(3-甲基丙烯氧基-2-羥基丙基)-3-胺基丙基三乙氧基矽烷、(甲基丙烯氧基甲基)甲基二乙氧基矽烷、與(丙烯氧基甲基)甲基二甲氧基矽烷。Examples of the decane coupling agent include γ-(2-aminoethyl)aminopropyltrimethoxydecane, γ-(2-aminoethyl)aminopropyldimethoxydecane, β-(3, 4-epoxycyclohexyl)ethyltrimethoxydecane, γ-aminopropyltrimethoxydecane, γ-aminopropyltriethoxydecane, γ-methylpropoxypropyltrimethoxy矽, γ-methacryloxypropyltriethoxydecane, γ-propyleneoxypropyltrimethoxydecane, γ-acryloxypropyltriethoxydecane, γ- Isocyanatopropyltrimethoxydecane, γ-isocyanatopropyltriethoxydecane, N-β-(N-vinylbenzylaminoethyl)-γ-aminopropyltrimethoxy Base decane. Hydrochloride, γ-glycidylpropyltrimethoxydecane, γ-glycidylpropyltriethoxydecane, aminodecane, γ-mercaptopropyltrimethoxydecane, γ-mercaptopropyl Triethoxy decane, methyltrimethoxy decane, methyl triethoxy decane, vinyl triethoxy decane, γ-chloropropyl trimethoxy decane, hexamethylene diazoxide, γ-aniline Propyl trimethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane, vinyl ginseng (β-methoxyethoxy) decane, octadecyl dimethyl chloride [3- (trimethoxydecyl)propyl]ammonium, γ-chloropropylmethyldimethoxydecane, γ-mercaptopropylmethyldimethoxydecane, methyltrichlorodecane, dimethyldichlorodecane , trimethylchlorodecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, decallyltrimethoxydecane, tetraethoxydecane, anthracene (trimethoxydecyl) Hexane, phenyltrimethoxydecane, N-(3-propenyloxy-2-hydroxypropyl)-3-aminopropyltriethoxydecane, N-(3-methylpropenyloxy-2 -hydroxypropyl 3-aminopropyltriethoxydecane, (methacryloxymethyl)methyldiethoxydecane, and (acryloxymethyl)methyldimethoxydecane.

其特佳為γ-甲基丙烯氧基丙基三甲氧基矽烷、γ-甲基丙烯氧基丙基三乙氧基矽烷、γ-丙烯氧基丙基三甲氧基矽烷、γ-丙烯氧基丙基三乙氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-胺基丙基三乙氧基矽烷、與苯基三甲氧基矽烷,而且最佳為γ-甲基丙烯氧基丙基三甲氧基矽烷。It is particularly preferably γ-methacryloxypropyltrimethoxydecane, γ-methylpropoxypropyltriethoxydecane, γ-acryloxypropyltrimethoxydecane, γ-propyleneoxyl Propyltriethoxydecane, γ-mercaptopropyltrimethoxydecane, γ-aminopropyltriethoxydecane, and phenyltrimethoxydecane, and most preferably γ-methylpropenyloxypropane Trimethoxy decane.

鈦酸酯為主偶合劑之實例包括異丙基三異硬脂醯基鈦 酸酯、異丙基十三碳基苯磺醯基鈦酸酯、異丙基参(二辛基焦磷酸酯)鈦酸酯、四異丙基貳(二辛基亞磷酸酯)鈦酸酯、四辛基貳(二-十三碳基亞磷酸酯)鈦酸酯、四(2,2-二烯丙氧基甲基)貳(二-十三碳基)磷酸酯鈦酸酯、貳(二辛基焦磷酸酯)氧乙酸酯鈦酸酯、貳(二辛基焦磷酸酯)伸乙基鈦酸酯、異丙基三辛醯基鈦酸酯、異丙基二甲基丙烯基異硬脂醯基鈦酸酯、異丙基異硬脂醯基二丙烯基鈦酸酯、三異丙基三(二辛基磷酸酯)鈦酸酯、異丙基三異丙苯基苯基鈦酸酯、異丙基三(N-醯胺基乙基.胺基乙基)鈦酸酯、二異丙苯基苯基氧乙酸酯鈦酸酯、與二異硬脂醯基伸乙基鈦酸酯。Examples of titanate-based coupling agents include isopropyl triisostearate titanium Acid ester, isopropyltridecylbenzenesulfonate titanate, isopropyl ginseng (dioctyl pyrophosphate) titanate, tetraisopropylphosphonium (dioctylphosphite) titanate , tetraoctyl fluorene (di-tridecyl phosphite) titanate, tetrakis(2,2-diallyloxymethyl) ruthenium (di-tridecyl) phosphate titanate, ruthenium (dioctyl pyrophosphate) oxyacetate titanate, bismuth (dioctyl pyrophosphate) extended ethyl titanate, isopropyl trioctadecyl titanate, isopropyl dimethyl propylene Stearic acid based titanate, isopropyl isostearyl decyl bis propylene titanate, triisopropyl tris(dioctyl phosphate) titanate, isopropyl triisopropyl phenyl phenyl titanium Acid ester, isopropyl tris(N-nonylaminoethyl.aminoethyl) titanate, dicumylphenyl oxyacetate titanate, and diisostearate Acid ester.

鋁為主偶合劑之實例包括二異丙化乙醯烷氧基鋁。Examples of the aluminum-based coupling agent include aluminum diisopropylacetate.

在將硬化性組成物曝光之情形,由防止殘渣殘留在未曝光部分上的觀點,基板黏附劑之含量相對本發明硬化性組成物之總固體成分較佳為0.1質量%至30質量%,更佳為0.5質量%至20質量%,而且特佳為1質量%至10質量%。In the case where the curable composition is exposed, the content of the substrate adhesive is preferably from 0.1% by mass to 30% by mass based on the total solid content of the curable composition of the present invention, from the viewpoint of preventing the residue from remaining on the unexposed portion. It is preferably from 0.5% by mass to 20% by mass, and particularly preferably from 1% by mass to 10% by mass.

依照上述組態,本發明之硬化性組成物可硬化而具高敏感度及較佳之儲存安定性。此外本發明之硬化性組成物對所使用材料(如硬材料,如基板)之表面顯示高黏附性質。因此本發明之硬化性組成物可較佳地用於影像形成材料之領域,如三維光裝飾、全像術與彩色濾光片等,或墨水、油漆、黏著劑、塗覆劑等According to the above configuration, the curable composition of the present invention can be hardened with high sensitivity and better storage stability. Further, the curable composition of the present invention exhibits high adhesion properties to the surface of a material to be used such as a hard material such as a substrate. Therefore, the curable composition of the present invention can be preferably used in the field of image forming materials, such as three-dimensional light decoration, hologram and color filter, or ink, paint, adhesive, coating agent, etc.

[彩色濾光片及其製造方法][Color filter and method of manufacturing the same]

以下解釋本發明之彩色濾光片及其製造方法。The color filter of the present invention and a method of manufacturing the same are explained below.

本發明之彩色濾光片特徵為其具有在撐體上使用本發明硬化性組成物之著色圖案。The color filter of the present invention is characterized in that it has a colored pattern using the curable composition of the present invention on a support.

以下參考其製造方法(用於製造本發明彩色濾光片之方法)詳述本發明之彩色濾光片。The color filter of the present invention will be described in detail below with reference to its manufacturing method (method for producing the color filter of the present invention).

本發明彩色濾光片之製造方法包括藉由將本發明之硬化性組成物塗布在撐體構件上而形成硬化性組成物製著色層之著色層形成步驟,使上述著色層經光罩曝光之曝光步驟,及在曝光後藉由將著色層顯影而形成著色圖案之顯影步驟。The method for producing a color filter of the present invention comprises the step of forming a colored layer of a colored layer of a curable composition by applying the curable composition of the present invention to a support member, and exposing the colored layer to a mask. An exposure step, and a development step of forming a colored pattern by developing the colored layer after exposure.

以下解釋本發明製造方法之各步驟。The steps of the manufacturing method of the present invention are explained below.

<著色層形成步驟> 在著色層形成步驟中,其藉由將本發明之硬化性組成物塗布在撐體構件上而形成硬化性組成物製著色層。<Colored layer forming step> In the colored layer forming step, the curable composition is formed by applying the curable composition of the present invention to the support member.

可用於本步驟之撐體的實例包括鈉玻璃、Pyrex(註冊商標)玻璃、石英玻璃、及用於液晶顯示器元件、用於攝影元件之光電轉換元件基板(例如矽基板與互補金屬氧化物薄膜半導體(CMOS))的附有透明感應膜之玻璃。在某些情形,其在這些基板上形成隔離各像素之黑條。Examples of the support which can be used in this step include soda glass, Pyrex (registered trademark) glass, quartz glass, and a photoelectric conversion element substrate for a liquid crystal display element, for a photographic element (for example, a ruthenium substrate and a complementary metal oxide thin film semiconductor) (CMOS)) Glass with a transparent sensing film. In some cases, it forms a black strip separating the pixels on these substrates.

如果必要,則在這些撐體上可設定底塗層以改良對上層之黏附性,防止物質擴散,及使基板表面平坦。If necessary, an undercoat layer may be provided on these supports to improve adhesion to the upper layer, prevent diffusion of substances, and flatten the surface of the substrate.

至於將本發明之硬化性組成物塗覆在撐體構件上之方法,其可使用各種塗布方法,如縫塗、噴墨塗覆、旋塗、流延塗覆、輥塗、及網版塗覆。As for the method of coating the curable composition of the present invention on the support member, various coating methods such as slit coating, inkjet coating, spin coating, cast coating, roll coating, and screen coating can be used. cover.

由塗膜之薄膜均勻性及塗料溶液之乾燥容易性的觀點,硬化性組成物恰在塗覆後之薄膜厚度較佳為0.1至10微米,更佳為0.2至5微米,而且進-步較佳為0.2至3微米之範圍。From the viewpoint of film uniformity of the coating film and ease of drying of the coating solution, the thickness of the film of the curable composition just after coating is preferably from 0.1 to 10 μm, more preferably from 0.2 to 5 μm, and further It is preferably in the range of 0.2 to 3 microns.

塗布在基板上之著色層(硬化性組成物層)可以50至140℃之加熱板、烤箱等乾燥(前烘烤)10至300秒。The coloring layer (curable composition layer) coated on the substrate may be dried (pre-baked) in a hot plate, oven or the like at 50 to 140 ° C for 10 to 300 seconds.

由薄LCD之相容性及確保顏色密度的觀點,作為LCD用彩色濾光片之硬化性組成物在乾燥後之塗膜厚度(以下亦稱為「乾膜厚度」)較佳為0.1微米或更大及小於2.0微米,更佳為0.2微米或更大及小於1.8微米,而且特佳為0.3微米或更大及小於1.75微米。The thickness of the coating film after drying (hereinafter also referred to as "dry film thickness") as a curable composition of a color filter for LCD is preferably 0.1 μm or the viewpoint of the compatibility of the thin LCD and the color density. It is larger and smaller than 2.0 μm, more preferably 0.2 μm or more and less than 1.8 μm, and particularly preferably 0.3 μm or more and less than 1.75 μm.

此外由確保顏色密度,及減少如區域之末端部分與中央間光收集比例之變顯差異的問題之觀點,對於作為IS用彩色濾光片,厚度較佳為0.05微米或更大及小於1.0微米,更佳為0.1微米或更大及0.8微米或更小,而且特佳為0.2微米或更大及0.7微米或更小。Further, from the viewpoint of ensuring the color density and reducing the difference in the light-collecting ratio between the end portion of the region and the center, for the color filter for IS, the thickness is preferably 0.05 μm or more and less than 1.0 μm. More preferably, it is 0.1 μm or more and 0.8 μm or less, and particularly preferably 0.2 μm or more and 0.7 μm or less.

<曝光步驟> 在曝光步驟中,在上述著色層形成步驟中形成之著色層(硬化性組成物層)係經具有預定光罩圖案之光罩曝光。<Exposure step> In the exposure step, the coloring layer (curable composition layer) formed in the above-described colored layer forming step is exposed through a photomask having a predetermined mask pattern.

依照此步驟之曝光,塗膜之圖案曝光可藉由經預定光罩圖案曝光,僅硬化光照射之塗膜部分而進行。至於曝光時使用之輻射,其可較佳地使用如g-線與i-線之紫外線。照射量較佳為5至1,500毫焦耳/平方公分,更佳為10至 1,000毫焦耳/平方公分,而且最佳為10至500毫焦耳/平方公分。According to the exposure of this step, the pattern exposure of the coating film can be performed by exposing through a predetermined mask pattern, and only hardening the portion of the coating film irradiated with light. As for the radiation used in the exposure, it is preferable to use ultraviolet rays such as g-line and i-line. The irradiation amount is preferably 5 to 1,500 mJ/cm 2 , more preferably 10 to 1,000 mJ/cm 2 and most preferably 10 to 500 mJ/cm 2 .

在將本發明之彩色濾光片用於液晶顯示裝置之情形,上述範圍中較佳為5至200毫焦耳/平方公分,更佳為10至150毫焦耳/平方公分,而且最佳為10至100毫焦耳/平方公分。在將本發明之彩色濾光片用於固態攝影元件之情形,上述範圍中較佳為30至1,500毫焦耳/平方公分,更佳為50至1,000毫焦耳/平方公分,而且最佳為80至500毫焦耳/平方公分。In the case where the color filter of the present invention is used for a liquid crystal display device, the above range is preferably 5 to 200 mJ/cm 2 , more preferably 10 to 150 mJ/cm 2 , and most preferably 10 to 100 mJ/cm 2 . In the case where the color filter of the present invention is used for a solid-state photographic element, the above range is preferably 30 to 1,500 mJ/cm 2 , more preferably 50 to 1,000 mJ/cm 2 , and most preferably 80 to 10,000. 500 mJ/cm 2 .

<顯影步驟> 然後藉由進行鹼顯影程序(顯影步驟),僅將光未照射部分溶離於鹼性水溶液而保留上述曝光以光固化。其可藉由以顯影溶液顯影形成具各種顏色(3或4色)之圖案化塗膜而進行。至於顯影溶液,其較佳為一種無損壞基本電路之風險的有機鹼性顯影溶液。顯影溫度通常為20℃至30℃,及顯影時間為20至90秒。<Development step> Then, by performing an alkali developing process (developing step), only the light non-irradiated portion is dissolved in an alkaline aqueous solution to retain the above exposure to photocure. It can be carried out by developing a developing coating solution to form a patterned coating film having various colors (3 or 4 colors). As for the developing solution, it is preferably an organic alkaline developing solution which does not impair the risk of the basic circuit. The development temperature is usually from 20 ° C to 30 ° C, and the development time is from 20 to 90 seconds.

作為顯影溶液之鹼劑的實例包括有機鹼化合物,如氨水、乙胺、二乙胺、二甲基乙醇胺、氫氧化四甲銨、氫氧化四乙銨、膽鹼、吡咯、哌啶、與1,8-二氮二環-[5,4,0]-7-十一烯,及無機化合物,如氫氧化鈉、氫氧化鉀、碳酸氫鈉、與碳酸氫鉀。其可較佳地使用藉由將這些鹼劑稀釋於純水中以具有0.001質量%至10質量%,較佳為0.01質量%至1質量%之濃度而得到鹼性水溶液。在使用此鹼性水溶液製之顯影溶液的情形,其通常在顯影後以純水清洗(沖 洗)。Examples of the alkaline agent as the developing solution include organic base compounds such as ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, piperidine, and , 8-diazabicyclo-[5,4,0]-7-undecene, and inorganic compounds such as sodium hydroxide, potassium hydroxide, sodium hydrogencarbonate, and potassium hydrogencarbonate. It can be preferably used to obtain an alkaline aqueous solution by diluting these alkaline agents in pure water to have a concentration of from 0.001% by mass to 10% by mass, preferably from 0.01% by mass to 1% by mass. In the case of using a developing solution made of this alkaline aqueous solution, it is usually washed with pure water after development (rushing wash).

然後在清洗以去除過量顯影溶液後將其乾燥。It is then dried after washing to remove excess developing solution.

如果必要,則本發明之製造方法在進行上述著色層形成步驟、曝光步驟及顯影步驟後,可包括藉加熱(後烘烤)及/或曝光硬化所形成著色圖案之硬化步驟。If necessary, the manufacturing method of the present invention may include a hardening step of forming a colored pattern by heating (post-baking) and/or exposure hardening after performing the colored layer forming step, the exposing step, and the developing step.

後烘烤為顯影後完成硬化之熱處理,而且其通常實行在100℃至240℃之熱硬化處理。在基板為玻璃基板或矽基板時,其較佳為以上溫度範圍之200℃至240℃。The post-baking is a heat treatment in which hardening is completed after development, and it is usually subjected to a heat hardening treatment at 100 ° C to 240 ° C. When the substrate is a glass substrate or a tantalum substrate, it is preferably from 200 ° C to 240 ° C in the above temperature range.

此後烘烤處理可使用如加熱板、對流烤箱(熱空氣循環乾燥器)、及高頻加熱機之加熱手段,連續地或以分批方式實行,使得顯影後之塗膜處於以上條件下。Thereafter, the baking treatment can be carried out continuously or in a batch manner using a heating means such as a heating plate, a convection oven (hot air circulation dryer), and a high-frequency heating machine, so that the developed coating film is under the above conditions.

藉由按所需色調數量重複以上解釋之著色層形成步驟、曝光步驟及顯影步驟(又若必要則硬化步驟),其可製備具有所需色調之彩色濾光片。The color filter having the desired color tone can be prepared by repeating the above-described coloring layer forming step, exposure step, and development step (and, if necessary, hardening step) in accordance with the desired amount of color tone.

對於本發明硬化性組成物之應用,其已主要關於對彩色濾光片之像素的應用而敘述;然而其亦可明顯地應用於提供在彩色濾光片之像素間的黑矩陣。黑矩陣可以如上述藉圖案曝光,鹼顯影,然後後烘烤以促進薄膜硬化而製造像素之方法的相同方式形成,除了在將其中加入黑色顏劑(如碳黑或鈦黑)之著色劑用於本發明之硬化性組成物。The use of the curable composition of the present invention has been described primarily with respect to the application of pixels to color filters; however, it is also apparently applicable to black matrices provided between pixels of color filters. The black matrix can be formed in the same manner as the above method of exposing the pattern by exposure, alkali development, and then post-baking to promote film hardening to produce pixels, except for the coloring agent to which a black pigment (such as carbon black or titanium black) is added. A curable composition of the present invention.

由於本發明之彩色濾光片係使用具優良曝光敏感度之本發明硬化性組成物製造,曝光部分之硬化組成物具有優良之基板黏附性質及顯影抗性,所形成著色圖案對支撐構件基板具有高黏附性質,此外提供所需橫切面形狀之圖案 具有高解析度。Since the color filter of the present invention is produced using the curable composition of the present invention having excellent exposure sensitivity, the hardened composition of the exposed portion has excellent substrate adhesion properties and development resistance, and the colored pattern formed has a support member substrate High adhesion properties, in addition to providing the desired cross-sectional shape Has a high resolution.

此外本發明之固態攝影元件包括藉上述用於製造本發明彩色濾光片之方法製造之本發明彩色濾光片。Further, the solid-state photographic element of the present invention comprises the color filter of the present invention produced by the above-described method for producing the color filter of the present invention.

因此特別地,本發明之彩色濾光片可較佳地用於固態攝影裝置,如液晶顯示裝置及CCD,特別是其可較佳地用於具超過1,000,000個像素之高解析度CCD元件或CMOS。本發明之彩色濾光片可作為配置於包括CCD元件之各像素的光接收部分與用於光聚焦之微透鏡間的彩色濾光片。Therefore, in particular, the color filter of the present invention can be preferably used for a solid-state imaging device such as a liquid crystal display device and a CCD, and particularly, it can be preferably used for a high-resolution CCD element or CMOS having more than 1,000,000 pixels. . The color filter of the present invention can be used as a color filter disposed between a light receiving portion including each pixel of a CCD element and a microlens for light focusing.

實例Instance

以下參考實例進一步詳細解釋本發明,然而本發明不受其限制。The invention is explained in further detail below with reference to examples, but the invention is not limited thereto.

[合成例1][Synthesis Example 1]

<化合物(i-1)之合成> 將58.6克之丙烯酸2-羥基乙酯置於500毫升三頸燒瓶中且對其加入250毫升之丙酮及攪拌。在加入39.2克之吡啶與0.1克之對甲氧基酚後,將其在具冰水之冰浴中冷卻。在使液體混合物溫度為5℃或更低時,將114.9克之2-溴異丁酸溴化物以滴液漏斗經3小時滴入。在完成滴入作業後,去除冰浴而將其進一步攪拌3小時。在將反應混合物倒入750毫升之水中後將其攪拌1小時。使用分液漏斗將水混合物溶液以500毫升之乙酸乙酯萃取3次。將有機層連續地以500毫升之1M氫氯酸、500毫升之碳酸氫鈉飽和溶液、與500毫升之飽和鹽水溶液清洗。在對有機層加入100克之硫酸鎂進行脫水乾燥後將其過濾。藉真空排除 溶劑得到120.3克之殘渣。<Synthesis of Compound (i-1)> 58.6 g of 2-hydroxyethyl acrylate was placed in a 500 ml three-necked flask and 250 ml of acetone was added thereto and stirred. After adding 39.2 g of pyridine and 0.1 g of p-methoxyphenol, it was cooled in an ice bath with ice water. When the temperature of the liquid mixture was 5 ° C or lower, 114.9 g of 2-bromoisobutyric acid bromide was added dropwise to the dropping funnel over 3 hours. After the completion of the dropping operation, the ice bath was removed and further stirred for 3 hours. After the reaction mixture was poured into 750 ml of water, it was stirred for 1 hour. The aqueous mixture solution was extracted 3 times with 500 ml of ethyl acetate using a separatory funnel. The organic layer was successively washed with 500 ml of 1 M hydrochloric acid, 500 ml of a saturated solution of sodium hydrogencarbonate, and 500 ml of a saturated brine. After the organic layer was added to 100 g of magnesium sulfate for dehydration drying, it was filtered. Vacuum exclusion The solvent gave 120.3 g of a residue.

所得殘渣由1 H NMR、IR及質譜分析證實為化合物(i-1)。此外HPLC純度為95%。The residue obtained was confirmed to be the compound (i-1) by 1 H NMR, IR and mass spectrum analysis. In addition, the HPLC purity was 95%.

(1)樹脂(I)之合成 將置於1,000毫升三頸燒瓶中之86克1-甲基-2-吡咯啶酮在氮氣流下加熱至90℃。將55克之化合物(i-1)、47克之實例化合物M-14MA、13克之甲基丙烯酸、8.2克之2,2’-偶氮貳(2-甲基丙酸酯)(V-601,Wako Pure Chemical Industries,Ltd.製造)、與86克之1-甲基-2-吡咯啶酮經2小時滴入。在完成滴入作業後,將其攪拌又2小時。在將反應溶液冷卻至室溫後,將其倒入7公升之水中以沉澱聚合物化合物。將沉澱聚合物過濾,以水清洗及乾燥而得110克之聚合物化合物。(1) Synthesis of Resin (I) 86 g of 1-methyl-2-pyrrolidone placed in a 1,000 ml three-necked flask was heated to 90 ° C under a nitrogen stream. 55 g of compound (i-1), 47 g of the example compound M-14MA, 13 g of methacrylic acid, 8.2 g of 2,2'-arsenazo (2-methylpropionate) (V-601, Wako Pure) Produced by Chemical Industries, Ltd., and 86 g of 1-methyl-2-pyrrolidone were added dropwise over 2 hours. After the completion of the dropping operation, it was stirred for another 2 hours. After the reaction solution was cooled to room temperature, it was poured into 7 liters of water to precipitate a polymer compound. The precipitated polymer was filtered, washed with water and dried to give 110 g of a polymer compound.

所得聚合物化合物之重量平均分子量係藉凝膠滲透層析法(GPC)使用聚苯乙烯作為參考物質而測量,及其為13,100。此外藉滴定測量酸值而發現其為1.25 meq/克(計算值為1.30 meq/克),因此證實聚合係正常地實行。The weight average molecular weight of the obtained polymer compound was measured by gel permeation chromatography (GPC) using polystyrene as a reference material, and it was 13,100. Further, by measuring the acid value by titration, it was found to be 1.25 meq/g (calculated value was 1.30 meq/g), thus confirming that the polymerization system was normally carried out.

將110克之所得聚合物化合物、0.1克之對甲氧基酚、與470克之1-甲基-2-吡咯啶酮置於1,000毫升三頸燒瓶中,以在具冰水之冰浴中冷卻。在使液體混合物溫度為5℃或更低後,使用滴液漏斗將100克之1,8-二氮雙環[5.4.0]-7-十一烯(DBU)經1小時滴入。在完成滴入作業後去除冰浴而將其攪拌又8小時。在濃氫氯酸加入反應溶液而得pH 7後,將其倒入7公升之水中以沉澱聚合物化合物 之樹脂(I)。藉由將沉澱聚合物化合物過濾,以水清洗及乾燥而得95克之聚合物。110 g of the obtained polymer compound, 0.1 g of p-methoxyphenol, and 470 g of 1-methyl-2-pyrrolidone were placed in a 1,000 ml three-necked flask to be cooled in an ice bath with ice water. After the temperature of the liquid mixture was 5 ° C or lower, 100 g of 1,8-diazabicyclo[5.4.0]-7-undecene (DBU) was added dropwise over 1 hour using a dropping funnel. After the completion of the dropping operation, the ice bath was removed and stirred for another 8 hours. After adding concentrated hydrochloric acid to the reaction solution to obtain pH 7, it is poured into 7 liters of water to precipitate a polymer compound. Resin (I). The precipitated polymer compound was filtered, washed with water and dried to give 95 g of a polymer.

依照所得聚合物化合物之1 H NMR測量,其證實100%之衍生自化合物(i-1)的側鏈基轉化成甲基丙烯酸伸乙酯基。此外藉凝膠滲透層析術(GPC)以聚苯乙烯作為參考物質,重量平均分子量之測量結果為12,100。此外藉滴定測量之酸值為1.45 meq/克(計算值為1.51 meq/克)。According to the 1 H NMR measurement of the obtained polymer compound, it was confirmed that 100% of the side chain group derived from the compound (i-1) was converted into an ethyl methacrylate group. In addition, by gel permeation chromatography (GPC) with polystyrene as a reference material, the weight average molecular weight measurement was 12,100. In addition, the acid value measured by titration was 1.45 meq/g (calculated as 1.51 meq/g).

[實例1][Example 1] [A1.硬化性組成物之製備][A1. Preparation of hardenable composition]

以下解釋製備含顏料之硬化性組成物的實例,其係用於形成用於液晶顯示裝置應用之彩色濾光片。An example of preparing a pigment-containing hardenable composition for forming a color filter for use in a liquid crystal display device will be explained below.

A1-1.顏料分散溶液之製備顏料分散液之製備 以球磨機混合及分散40質量份作為顏料之C.I.顏料綠36與C.I.顏料黃219的30/70(質量比例)混合物(平均粒徑為61奈米)、50質量份(按固體成分計為約22.6質量份)作為分散劑之BYK2001(Disperbyk:Bic Chemie(BYK)Corp.製造,固體成分濃度為45.1質量%)、5質量份之上述本發明樹脂(I)、及110質量份作為溶劑之3-乙氧基丙酸乙酯的液體混合物經15小時而製備顏料分散液(P1)。A1-1. Preparation of Pigment Dispersion Solution Preparation of Pigment Dispersion Liquid A mixture of 40 parts by mass of CI Pigment Green 36 and CI Pigment Yellow 219 as a pigment was mixed and dispersed in a ball mill (average particle size was 61 奈50 parts by mass (about 22.6 parts by mass in terms of solid content) BYK2001 (Disperbyk: manufactured by Bic Chemie (BYK) Corp., solid content concentration: 45.1% by mass) as a dispersing agent, and 5 parts by mass of the above invention A pigment dispersion (P1) was prepared by a resin (I), and a liquid mixture of 110 parts by mass of ethyl 3-ethoxypropionate as a solvent over 15 hours.

顏料之平均粒徑係對顏料分散液(P1)使用Microtrac Nanotrac UPA=EX 150(Nikkiso Co.,Ltd.製造)但未進一步稀釋P1而以動態光散射法測量,其為32奈米。The average particle diameter of the pigment was measured by a dynamic light scattering method, which was 32 nm, using a Microtrac Nanotrac UPA=EX 150 (manufactured by Nikkiso Co., Ltd.) for the pigment dispersion (P1) without further diluting P1.

A1-2.硬化性組成物(塗料溶液)之製備 藉由使用上述顏料分散溶液P1以分散液程序攪拌及混合以具有以下組成比例,而製備硬化性組成物溶液。A1-2. Preparation of hardenable composition (coating solution) The curable composition solution was prepared by using the above-described pigment dispersion solution P1 to be stirred and mixed in a dispersion procedure to have the following composition ratio.

[A2.彩色濾光片之製造][A2. Manufacture of color filters]

A2-1.硬化性組成物層之形成 藉由將含上述顏料之硬化性組成物作為光阻溶液而在以下條件下縫塗在550毫米×650毫米之玻璃基板上,將其靜置10分鐘,而且提供真空乾燥及預烘烤(100℃經80秒)而形成硬化性組成物塗膜(硬化性組成物層)。A2-1. Formation of a hardenable composition layer The sclerosing composition containing the above pigment was applied as a photoresist solution to a 550 mm × 650 mm glass substrate under the following conditions, allowed to stand for 10 minutes, and vacuum drying and prebaking were provided (100). The curing film coating film (curable composition layer) was formed at ° C for 80 seconds.

(縫塗條件) (sewing conditions)

A2-2.曝光,顯影 然後使用20微米線寬之測試用光罩,使用2.5仟瓦超高壓汞燈將硬化性組成物塗膜按圖案曝光。在曝光後將塗膜之全部表面覆以有機顯影溶液(商標名:CD,Fuji Film Electronics Material Corp.製造)之10%水溶液,而且將其再靜置60秒。A2-2. Exposure, development The test composition film of the curable composition was then exposed in a pattern using a test mask of 20 micrometers line width using a 2.5 watt ultrahigh pressure mercury lamp. After the exposure, the entire surface of the coating film was coated with a 10% aqueous solution of an organic developing solution (trade name: CD, manufactured by Fuji Film Electronics Material Corp.), and it was allowed to stand for another 60 seconds.

A2-3.熱處理 在靜置後藉由噴射純水(如噴淋)而清洗顯影溶液,使得將施加曝光(光固化)程序與顯影程序之塗膜在220℃烤箱中加熱1小時(後烘烤)。因而得到具在玻璃基板上形成之硬化性組成物塗膜(著色層)的彩色濾光片。A2-3. Heat treatment The developing solution was washed by spraying pure water (e.g., spray) after standing, so that the coating film to which the exposure (photocuring) procedure and the developing procedure were applied was heated in an oven at 220 ° C for 1 hour (post-baking). Thus, a color filter having a coating film (colored layer) of a curable composition formed on a glass substrate was obtained.

[A3.性能評估][A3. Performance Evaluation]

如下評估以上製備之硬化性組成物製成之塗料溶液的儲存安定性,及使用硬化性組成物在玻璃基板上形成之硬 化性組成物塗膜(著色層)的曝光敏感度、基板黏附性質、顯影性質、及圖案橫切面形狀。結果示於表1。The storage stability of the coating solution prepared by the above-prepared hardenable composition was evaluated as follows, and the hardening composition was hard formed on the glass substrate. Exposure sensitivity of the coating film (colored layer) of the composition, substrate adhesion property, development property, and cross-sectional shape of the pattern. The results are shown in Table 1.

A3-1.硬化性組成物之儲存安定性 在將如上所述製備之硬化性組成物(塗料溶液)在室溫儲存1個月後,測量溶液之黏度以依照以下標準評估。A3-1. Storage stability of hardenable composition After the hardening composition (coating solution) prepared as described above was stored at room temperature for 1 month, the viscosity of the solution was measured to be evaluated in accordance with the following criteria.

-測估標準- A:黏度未上升 B:黏度上升5%或更多至小於10% C:黏度上升10%或更多-Measurement criteria - A: Viscosity has not risen B: viscosity increases by 5% or more to less than 10% C: viscosity increased by 10% or more

A3-2.硬化性組成物塗膜(著色層)之曝光敏感度 將硬化性組成物塗膜以10至100毫焦耳/平方公分之各種變化曝光量曝光,以評估得到20微米之後烘烤後圖案線寬的曝光劑量作為曝光敏感度。曝光敏感度值越小則敏感度越高。A3-2. Exposure sensitivity of the coating film (colored layer) of the curable composition The curable composition coating film was exposed at various varying exposure amounts of 10 to 100 mJ/cm 2 to evaluate the exposure dose of the pattern line width after baking to obtain 20 μm as the exposure sensitivity. The smaller the exposure sensitivity value, the higher the sensitivity.

A3-3.顯影力、圖案橫切面形狀、基板黏附性質 藉由以光學顯微鏡及SEM照相觀察,觀察後烘烤後之基板表面及其橫切面形狀,而評估顯影性質、圖案橫切面形狀及基板黏附性質。評估方法之細節及評估標準如下。A3-3. Developing force, pattern cross-section shape, substrate adhesion properties The development properties, the cross-sectional shape of the pattern, and the adhesion property of the substrate were evaluated by observing the surface of the substrate after the post-baking and the cross-sectional shape thereof by optical microscopy and SEM. The details of the assessment method and the evaluation criteria are as follows.

<顯影力> 觀察曝光步驟中無光照射之區域(未曝光部分)中的殘渣存在,以評估顯影力。<developing force> The residue in the region (unexposed portion) where no light was irradiated in the exposure step was observed to evaluate the developing power.

-評估標準- A:證實在未曝光部分無殘渣 B:證實在未曝光部分殘渣為在實際使用不造成問題之些 微程度 C:證實在未曝光部分有明顯之殘渣-Evaluation Criteria- A: Confirm that there is no residue in the unexposed part B: It is confirmed that the unexposed part of the residue is not causing problems in actual use. Micro level C: Confirmed that there is obvious residue in the unexposed part

<圖案橫切面形狀> 觀察所形成圖案之橫切面形狀。圖案橫切面形狀最佳為前傾尖錐,次佳為長方形。倒尖錐不佳。<pattern cross section shape> The cross-sectional shape of the formed pattern was observed. The shape of the cross-section of the pattern is preferably a forward-inclined cone, and the second best is a rectangle. The inverted tip is not good.

<基板黏附性質> 基板黏附性質係依照是否缺少圖案之觀察而評估。評估標準如下。<Substrate adhesion properties> The adhesion properties of the substrate were evaluated in accordance with the observation of whether or not the pattern was missing. The evaluation criteria are as follows.

-評估標準- A:完全未觀察到圖案缺少。 B:幾乎未觀察到圖案缺少,然而在觀察到部分缺少。 C:明顯地觀察到圖案缺少。-Evaluation Criteria- A: No pattern is observed at all. B: Almost no pattern was observed, but a partial lack was observed. C: A lack of pattern was clearly observed.

[比較例1]以如實例1之相同方式製造彩色濾光片,除了在實例1製備之硬化性組成物中不使用樹脂(I),而用於如實例1之相同評估。結果示於表2。[Comparative Example 1] A color filter was produced in the same manner as in Example 1 except that the resin (I) was not used in the hardenable composition prepared in Example 1, and was used for the same evaluation as in Example 1. The results are shown in Table 2.

[實例2至10][Examples 2 to 10]

以如實例1之相同方式製造彩色濾光片,除了使用表2所示樹脂代替實例1製備之硬化性組成物中之樹脂(I),而用於如實例1之相同評估。結果示於表2。A color filter was produced in the same manner as in Example 1 except that the resin shown in Table 2 was used instead of the resin (I) in the hardenable composition prepared in Example 1, and was used for the same evaluation as in Example 1. The results are shown in Table 2.

[實例11,比較例2]以如實例1之相同方式製備彩色濾光片,除了使用以如樹脂(I)之相同方式合成之以下樹脂(II)及(III)代替實例1製備之硬化性組成物中之樹脂(I),而用於如實例1之相同評估。用於樹脂(II)之單體a的偶極矩經計算為2.48。此外用於樹脂(III)之丙烯酸正丁酯的偶極 矩經計算為1.58。結果示於表2。[Example 11, Comparative Example 2] A color filter was prepared in the same manner as in Example 1 except that the following resins (II) and (III) synthesized in the same manner as the resin (I) were used instead of the hardenability prepared in Example 1. The resin (I) in the composition was used for the same evaluation as in Example 1. The dipole moment of the monomer a used for the resin (II) was calculated to be 2.48. In addition, the dipole of n-butyl acrylate for resin (III) The moment is calculated to be 1.58. The results are shown in Table 2.

由表2之結果得知,含本發明樹脂之實例的硬化性組成物在溶液狀態具有優良之儲存安定性。此外得知,相對於未使用本發明樹脂之比較例,在使用硬化性組成物在支撐構件上形成著色圖案之情形得到具有較高曝光敏感度與優異顯影力、及優良之基板黏附性質與圖案橫切面形狀的彩色濾光片。As is apparent from the results of Table 2, the hardenable composition containing the example of the resin of the present invention has excellent storage stability in a solution state. Further, it has been found that, with respect to the comparative example in which the resin of the present invention is not used, the use of the curable composition to form a colored pattern on the support member provides high exposure sensitivity and excellent developing power, and excellent substrate adhesion properties and patterns. A color filter with a cross-sectional shape.

[實例12][Example 12]

以下解釋製備含著色劑(顏料)之硬化性組成物的實例,其係用於形成用於固態攝影元件應用之彩色濾光片。An example of preparing a curable composition containing a colorant (pigment) for forming a color filter for solid-state photographic element application is explained below.

[B1.光阻溶液之製備][B1. Preparation of Photoresist Solution]

混合及溶解以下組成物之成分而製備光阻溶液。A photoresist solution was prepared by mixing and dissolving the components of the following compositions.

<光阻溶液之組成物> <Composition of photoresist solution>

[B2.具基底塗層之矽基板的製造][B2. Manufacture of base substrate with base coating]

在200℃烤箱中對6吋矽晶圓施加熱處理經30分鐘。然後將上述光阻溶液塗布在此矽晶圓上而得1.5微米之乾膜厚度,進一步將其在220℃烤箱中加熱及乾燥1小時以形成基底塗層,而得到具基底塗層之矽晶圓基板。A heat treatment was applied to the 6-inch wafer in a 200 ° C oven for 30 minutes. Then, the photoresist solution was coated on the germanium wafer to obtain a dry film thickness of 1.5 μm, and further heated and dried in a 220 ° C oven for 1 hour to form a base coat layer, thereby obtaining a base coating-coated twin crystal. Round substrate.

[B3.顏料分散液之製備][B3. Preparation of Pigment Dispersion]

以球磨機混合及分散40質量份作為顏料之C.I.顏料綠36與C.I.顏料黃150的30/70(質量比例)混合物(平均粒徑為65奈米)、50質量份(按固體成分計為約22.6質量份)作為分散劑之BYK2001(Disperbyk:BYK Chemie(BYK)Corp.製造,固體成分濃度為45.1質量%)、10質量份之本發明樹脂(I)、及110質量份作為溶劑之丙二醇一甲醚的液體混合物經15小時而製備顏料分散液(P2)。Mixing and dispersing 40 parts by mass of a 30/70 (mass ratio) mixture of CI Pigment Yellow 36 and CI Pigment Yellow 150 as a pigment in a ball mill (average particle diameter of 65 nm), 50 parts by mass (about 22.6 in terms of solid content) Qual.) BYK2001 (Disperbyk: manufactured by BYK Chemie (BYK) Corp., solid content concentration: 45.1% by mass), 10 parts by mass of the resin (I) of the present invention, and 110 parts by mass of propylene glycol-A as a solvent A pigment dispersion (P2) was prepared by a liquid mixture of ether over 15 hours.

顏料之平均粒度係以如實例1之相同方式對顏料分散液(P2)以動態光散射法測量,其為32奈米。The average particle size of the pigment was measured by dynamic light scattering of the pigment dispersion (P2) in the same manner as in Example 1, which was 32 nm.

[B4.硬化性組成物(塗料溶液)之製備][B4. Preparation of hardenable composition (coating solution)]

藉由使用上述顏料分散液P2以分散液程序攪拌及混合以具有以下組成比例,而製備硬化性組成物溶液。The curable composition solution was prepared by stirring and mixing in the dispersion procedure using the above pigment dispersion liquid P2 to have the following composition ratio.

[B5.由硬化性組成物製造彩色濾光片及評估][B5. Fabrication of color filters from hardenable compositions and evaluation]

<圖案形成及敏感度評估> 將如上所述製備之硬化性組成物塗布在上述方法B2所得具基底塗層之矽晶圓的基底塗層上形成著色層(塗膜)。然後使用100℃加熱板進行熱處理(前烘烤)經120秒而得0.7微米之塗膜的乾膜厚度。<pattern formation and sensitivity evaluation> The curable composition prepared as described above was coated on the undercoat layer of the base-coated ruthenium wafer obtained in the above method B2 to form a color layer (coating film). Then, a dry film thickness of a coating film of 0.7 μm was obtained by heat treatment (prebaking) using a hot plate at 100 ° C for 120 seconds.

然後使用i-線步進器曝光裝置FPA-3000i5+(Canon Inc.製造),將其經具2微米正方形圖案之島型圖案光罩對365奈米波長以50至1,200毫焦耳/平方公分之各曝光量曝光。Then, using an i-line stepper exposure apparatus FPA-3000i5+ (manufactured by Canon Inc.), it was passed through an island-type pattern mask having a 2 micrometer square pattern to a wavelength of 365 nm at 50 to 1,200 mJ/cm 2 . Exposure exposure.

然後將形成經照射塗膜之矽晶圓基板置於旋轉噴淋顯影機(DW-30型,Chemitronics Corp.製造)之水平轉動台上,使用CD-2000(Fuji Film Electronics Material Corp.製造)在23℃進行槳式顯影經60秒而在矽晶圓基板上形成著色圖案。Then, the tantalum wafer substrate on which the irradiated coating film was formed was placed on a horizontal rotating table of a rotary spray developing machine (DW-30 type, manufactured by Chemitronics Corp.) using CD-2000 (manufactured by Fuji Film Electronics Material Corp.). A paddle development was performed at 23 ° C for 60 seconds to form a colored pattern on the germanium wafer substrate.

藉真空夾系統將形成著色圖案之矽晶圓固定在上述水平轉動台上,在藉轉動裝置將矽晶圓基板以50 rpm之轉動頻率轉動時,由來自轉動中心上方之噴射噴嘴(如噴淋器)供應純水以進行沖洗程序,然後進行噴灑乾燥。The silicon wafer forming the colored pattern is fixed on the horizontal rotating table by a vacuum clamping system, and when the silicon wafer substrate is rotated by a rotating frequency of 50 rpm by the rotating device, the spraying nozzle from above the rotating center (such as spraying) Pure water is supplied for the rinsing process and then spray dried.

然後使用長度測量SEM“S-9260A”(Hitachi High Technologies Corp.製造)測量著色圖案之大小。評估產生2微米之圖案線寬的曝光量作為曝光敏感度。曝光敏感度值越小則敏感度越高。測量結果示於以下表2。The size of the colored pattern was then measured using a length measurement SEM "S-9260A" (manufactured by Hitachi High Technologies Corp.). An exposure amount which produces a pattern line width of 2 μm was evaluated as exposure sensitivity. The smaller the exposure sensitivity value, the higher the sensitivity. The measurement results are shown in Table 2 below.

<顯影力> 觀察曝光步驟中無光照射之區域(未曝光部分)中的殘渣存在,以評估顯影力。<developing force> The residue in the region (unexposed portion) where no light was irradiated in the exposure step was observed to evaluate the developing power.

-評估標準- A:證實在未曝光部分無殘渣 B:證實在未曝光部分殘渣為在實際使用不造成問題之些微程度 C:證實在未曝光部分有明顯之殘渣-Evaluation Criteria- A: Confirm that there is no residue in the unexposed part B: It is confirmed that the unexposed part of the residue is not slightly affected by the actual use. C: Confirmed that there is obvious residue in the unexposed part

<圖案形成性質> 觀察所形成圖案之橫切面形狀。圖案橫切面形狀最佳為前傾尖錐,次佳為長方形。倒尖錐不佳。<pattern formation properties> The cross-sectional shape of the formed pattern was observed. The shape of the cross-section of the pattern is preferably a forward-inclined cone, and the second best is a rectangle. The inverted tip is not good.

<基板黏附性質> 基板黏附性質係依照是否缺少圖案之觀察而評估。評估標準如下。<Substrate adhesion properties> The adhesion properties of the substrate were evaluated in accordance with the observation of whether or not the pattern was missing. The evaluation criteria are as follows.

-評估標準- A:完全未觀察到圖案缺少。 B:幾乎未觀察到圖案缺少,然而在觀察到部分缺少。 C:明顯地觀察到圖案缺少。-Evaluation Criteria- A: No pattern is observed at all. B: Almost no pattern was observed, but a partial lack was observed. C: A lack of pattern was clearly observed.

<硬化性組成物之儲存安定性> 在將上述步驟B4製備之硬化性組成物(塗料溶液) 在室溫儲存1個月後,測量溶液之黏度以依照以下標準評估。<Storage stability of hardenable composition> The curable composition (coating solution) prepared in the above step B4 After storage for 1 month at room temperature, the viscosity of the solution was measured to evaluate according to the following criteria.

-測估標準- A:黏度未上升 B:黏度上升5%或更多至小於10% C:黏度上升10%或更多-Measurement criteria - A: Viscosity has not risen B: viscosity increases by 5% or more to less than 10% C: viscosity increased by 10% or more

<顏色不規則性> 藉以下方法分析亮度分布以發現偏離佔像素總數之平均值±5%內的像素的比例,而評估顏色不規則性。評估標準如下。<color irregularity> Color irregularities were evaluated by analyzing the luminance distribution by finding the ratio of pixels within ± 5% of the average of the total number of pixels. The evaluation criteria are as follows.

以下解釋測量亮度分布之方法。首先將硬化性組成物塗布在以如上述步驟B2之相同方法所得具基底塗層之玻璃板的基底塗層上形成著色層(塗膜)。然後使用100℃加熱板進行熱處理(前烘烤)經120秒而得0.7微米之塗膜的乾膜厚度。分析以顯微鏡MX-50(Olympus Corp.製造)照相之相片的所塗布玻璃板之亮度分布。The method of measuring the luminance distribution is explained below. First, a curable composition is applied to a base coat layer of a glass plate having a base coat layer obtained by the same method as the above step B2 to form a color layer (coating film). Then, a dry film thickness of a coating film of 0.7 μm was obtained by heat treatment (prebaking) using a hot plate at 100 ° C for 120 seconds. The luminance distribution of the coated glass plate of the photograph taken with a microscope MX-50 (manufactured by Olympus Corp.) was analyzed.

-測估標準- A:偏離平均±5%內之像素佔像素總數之99%或更大 B:偏離平均±5%內之像素佔像素總數之95%或更大及小於99% C:偏離平均±5%內之像素佔像素總數之小於95%-Measurement criteria - A: Deviations from the average of ± 5% of the pixels accounted for 99% or more of the total number of pixels B: pixels out of the mean ± 5% account for 95% or more of the total number of pixels and less than 99% C: pixels out of the mean ± 5% account for less than 95% of the total number of pixels

[比較例3][Comparative Example 3]

以如實例12之相同方式製造形成著色圖案之彩色濾光片,除了在實例12製備之硬化性組成物中不使用樹脂(I) ,而用於如實例12之相同評估。結果示於表3。A color filter forming a colored pattern was produced in the same manner as in Example 12 except that the resin (I) was not used in the hardenable composition prepared in Example 12. And used for the same evaluation as in Example 12. The results are shown in Table 3.

[實例13至22,比較例4]以如實例12之相同方式製造彩色濾光片,除了使用表3所示樹脂代替實例12製備之硬化性組成物中之樹脂(I),而用於如實例12之相同評估。結果示於表3。[Examples 13 to 22, Comparative Example 4] A color filter was produced in the same manner as in Example 12 except that the resin shown in Table 3 was used instead of the resin (I) in the hardenable composition prepared in Example 12, and used for The same evaluation of Example 12. The results are shown in Table 3.

由表3之結果明確可知,含本發明樹脂(用於形成用於固態攝影元件應用之彩色濾光片)之實例的硬化性組成物(顏料為主)在溶液狀態具有優良之儲存安定性。此外明確可知,相較於未使用本發明樹脂之比較例,在使用此硬化性組成物在支撐構件上形成著色圖案時,其得到具有較高之曝光敏感度與優異之顯影力,而且亦具有優良之基板黏著性、圖案橫切面形狀及顏色不規則性的彩色濾光片。As is clear from the results of Table 3, the curable composition (pigment-based) containing the example of the resin of the present invention (for forming a color filter for solid-state image sensor application) has excellent storage stability in a solution state. Further, it is clear that compared with the comparative example in which the resin of the present invention is not used, when the colored composition is formed on the support member using the curable composition, it has high exposure sensitivity and excellent developing power, and also has Excellent color filter for substrate adhesion, cross-sectional shape and color irregularity.

由這些結果明確地可知,實例之硬化性組成物,在製造用於固態攝影元件應用之彩色濾光片時,及在製造用於液晶顯示裝置應用之彩色濾光片時,均得到應良之圖案形成性質。From these results, it is clear that the hard curable composition of the examples is obtained in the production of color filters for solid-state imaging device applications and in the production of color filters for liquid crystal display device applications. Forming properties.

[實例23][Example 23]

以下解釋製備含著色劑(染料)之硬化性組成物的實例,其係用於形成用於固態攝影元件應用之彩色濾光片。An example of preparing a curable composition containing a colorant (dye) for forming a color filter for solid-state photographic element application is explained below.

[C1.光阻溶液之製備及具基底塗層之矽基板的製造][C1. Preparation of Photoresist Solution and Fabrication of Substrate with Substrate Coating]

以如實例12之[B1.光阻溶液之製備]及[B2.具基底塗層之矽基板的製造]的相同方式製造具基底塗層之矽基板。A base substrate having a base coat layer was produced in the same manner as in [Example 12] Preparation of Photoresist Solution of Example 12 and [B2. Fabrication of Substrates with Base Coating].

[C2.硬化性組成物(塗料溶液)之製備][C2. Preparation of hardenable composition (coating solution)]

混合及溶解以下組成物之化合物而製備彩色感光性樹脂組成物。A color photosensitive resin composition was prepared by mixing and dissolving the compound of the following composition.

[C3.由硬化性組成物製造彩色濾光片及評估][C3. Manufacture of color filters from hardenable compositions and evaluation]

以如上述[B5.由硬化性組成物製造彩色濾光片及評估]之相同方式製造及評估彩色濾光片。結果示於表4。The color filter was fabricated and evaluated in the same manner as described above [B5. Color filter produced from the curable composition and evaluated]. The results are shown in Table 4.

[比較例5][Comparative Example 5]

以如實例23之相同方式製造形成著色圖案之彩色濾光片,除了將在實例23製造之硬化性組成物的樹脂(I)改成新戊四醇三丙烯酸酯,而用於如實例23之相同評估。結果示於表4。A color filter forming a colored pattern was produced in the same manner as in Example 23 except that the resin (I) of the curable composition produced in Example 23 was changed to neopentyl alcohol triacrylate, and was used as in Example 23. The same assessment. The results are shown in Table 4.

[實例24至33,比較例6][Examples 24 to 33, Comparative Example 6]

以如實例23之相同方式製造彩色濾光片,除了使用表4所示樹脂代替實例23製備之硬化性組成物中之樹脂(I),而用於如實例23之相同評估。結果示於表4。A color filter was produced in the same manner as in Example 23 except that the resin shown in Table 4 was used instead of the resin (I) in the hardenable composition prepared in Example 23, and was used for the same evaluation as in Example 23. The results are shown in Table 4.

由表4之結果得知,含本發明之一個態樣的樹脂(用於形成用於固態攝影元件應用之彩色濾光片)之硬化性組成物(染料為主)在溶液狀態具有優良之儲存安定性。As is apparent from the results of Table 4, the sclerosing composition (dye-based) containing a resin of one aspect of the present invention (for forming a color filter for solid-state photographic element application) has excellent storage in a solution state. Stability.

此外由使用此硬化性組成物在支撐構件上形成著色圖案之實例的結果得知,相較於比較例,在使用此硬化性組成物在撐體上形成著色圖案時,其在實例中得到具有高曝光敏感度與優異顯影力、及優良之基板黏附性質與圖案橫切面形狀的彩色濾光片。Further, as a result of an example in which a colored pattern was formed on the support member using the curable composition, it was found that, in comparison with the comparative example, when the colored composition was formed on the support using the curable composition, it was obtained in the example. A color filter with high exposure sensitivity and excellent developing power, and excellent substrate adhesion properties and cross-sectional shape of the pattern.

此外由這些結果得知,實例之硬化性組成物在製造用於固態攝影元件應用之彩色濾光片的情形亦如製造用於液晶顯示裝置用於之彩色濾光片的情形,實現優良之圖案形成。Further, from these results, it is known that the hardening composition of the example is used in the case of manufacturing a color filter for solid-state imaging device applications, as in the case of manufacturing a color filter for a liquid crystal display device, and realizing an excellent pattern. form.

以下顯示本發明之某些具體實施例。Some specific embodiments of the invention are shown below.

<1>一種硬化性組成物,其含一種樹脂、一種含乙烯不飽和雙鍵之化合物、及一種光聚合引發劑,其中樹脂係藉由聚合至少一種偶極矩為2.0或更大之單體作為共聚合成分而製造。<1> A curable composition comprising a resin, a compound containing an ethylenically unsaturated double bond, and a photopolymerization initiator, wherein the resin is polymerized by polymerizing at least one monomer having a dipole moment of 2.0 or more It is produced as a copolymerization component.

<2>如<1>之硬化性組成物,其中上述單體為一種偶極矩為至少2.5或更大之單體。<2> A hardenable composition according to <1>, wherein the above monomer is a monomer having a dipole moment of at least 2.5 or more.

<3>如<1>之硬化性組成物,其中上述樹脂在側鏈中具有乙烯不飽和雙鍵,其係藉由聚合至少一種偶極矩為2.5或更大之單體作為共聚合成分而得。<3> The curable composition of <1>, wherein the above resin has an ethylenically unsaturated double bond in a side chain by polymerizing at least one monomer having a dipole moment of 2.5 or more as a copolymerization component. Got it.

<4>如<1>至<3>任一之硬化性組成物,其中上述偶極矩為2.0或更大之單體具有至少一個選自醚基、氰基、磷酸 酯基、內酯基、胺基甲酸酯基、碳酸酯基、與縮醛基之基。<4> The hardenable composition according to any one of <1> to <3> wherein the monomer having a dipole moment of 2.0 or more has at least one selected from the group consisting of an ether group, a cyano group, and a phosphoric acid. An ester group, a lactone group, a urethane group, a carbonate group, and an acetal group.

<5>如<1>至<4>任一之硬化性組成物,其進一步含一種著色劑。<5> The curable composition according to any one of <1> to <4> which further contains a coloring agent.

<6>如<1>至<5>任一之硬化性組成物,其進一步含一種敏化劑。<6> The curable composition according to any one of <1> to <5> which further contains a sensitizer.

<7>一種彩色濾光片,其具有以<5>或<6>之硬化性組成物形成之著色圖案。<7> A color filter having a colored pattern formed of a curable composition of <5> or <6>.

<8>一種製造彩色濾光片之方法,其包括:藉由塗布<5>或<6>之硬化性組成物而形成硬化性組成物製之著色層,將上述著色層經光罩曝光,及在曝光後藉由將著色層顯影而形成著色圖案。<8> A method of producing a color filter, comprising: forming a coloring layer made of a curable composition by coating a curable composition of <5> or <6>, and exposing the colored layer to a mask, And after the exposure, the colored layer is formed by developing the colored layer.

<9>一種固態攝影元件,其包括藉<8>之彩色濾光片製造方法製造之彩色濾光片。<9> A solid-state photographic element comprising a color filter manufactured by the color filter manufacturing method of <8>.

Claims (11)

一種硬化性組成物,其係含一種樹脂、一種含乙烯不飽和雙鍵之化合物、及一種光聚合引發劑,其中樹脂係藉由聚合至少一種偶極矩為2.0或更大之單體作為共聚合成分而製造;其中該偶極矩為2.0或更大之單體具有至少一個基,其係選自由磷酸酯基、內酯基、胺基甲酸酯基、與碳酸酯基所組成之群組。 A curable composition comprising a resin, a compound containing an ethylenically unsaturated double bond, and a photopolymerization initiator, wherein the resin is polymerized by polymerizing at least one monomer having a dipole moment of 2.0 or more Manufactured by polymerizing a component; wherein the monomer having a dipole moment of 2.0 or more has at least one group selected from the group consisting of a phosphate group, a lactone group, a urethane group, and a carbonate group. group. 如申請專利範圍第1項之硬化性組成物,其中偶極矩為2.0或更大之單體係丙烯酸酯。 A sclerosing composition according to claim 1, wherein the dipole moment is 2.0 or greater. 如申請專利範圍第1項之硬化性組成物,其中樹脂在側鏈中具有乙烯不飽和雙鍵,而且係藉由聚合至少一種偶極矩為2.0或更大之單體作為共聚合成分而得。 The sclerosing composition of claim 1, wherein the resin has an ethylenically unsaturated double bond in a side chain, and is obtained by polymerizing at least one monomer having a dipole moment of 2.0 or more as a copolymerization component. . 如申請專利範圍第1項之硬化性組成物,其中樹脂在側鏈中具有乙烯不飽和鍵,且具有下列一般式(1)所表示之基作為該乙烯不飽和鍵, 其中,R1 至R3 各獨立地表示單價有機基。The sclerosing composition of claim 1, wherein the resin has an ethylenically unsaturated bond in a side chain and has a group represented by the following general formula (1) as the ethylenically unsaturated bond, Wherein R 1 to R 3 each independently represent a monovalent organic group. 如申請專利範圍第1項之硬化性組成物,其中該光聚合引發劑係肟為主化合物(oxime-based compound)。 The sclerosing composition of claim 1, wherein the photopolymerization initiator is an oxime-based compound. 如申請專利範圍第1項之硬化性組成物,其中該至少一個基係內酯基。 The sclerosing composition of claim 1, wherein the at least one base is a lactone group. 如申請專利範圍第1項之硬化性組成物,其中進一步含種著色劑。 The sclerosing composition of claim 1, wherein the coloring agent is further included. 如申請專利範圍第1項之硬化性組成物,其中進一步含種敏化劑。 The sclerosing composition of claim 1, wherein the sensitizer is further contained. 一種彩色濾光片,其係具有以申請專利範圍第7項之硬化性組成物形成之著色圖案。 A color filter having a colored pattern formed by the curable composition of claim 7 of the patent application. 一種製造彩色濾光片之方法,其係包括:藉由將申請專利範圍第7項之硬化性組成物塗布在撐體上而形成硬化性組成物製之著色層;將著色層經光罩曝光,及在曝光後藉由將著色層顯影而形成著色圖案。 A method for producing a color filter, comprising: forming a coloring layer made of a curable composition by coating a curable composition of claim 7 on a support; and exposing the colored layer to a mask And forming a colored pattern by developing the colored layer after exposure. 一種固態攝影元件,其係包括藉申請專利範圍第10項之彩色濾光片製造方法製造之彩色濾光片。A solid-state photographic element comprising a color filter manufactured by the color filter manufacturing method of claim 10 of the patent application.
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