TWI412428B - - Google Patents
Info
- Publication number
- TWI412428B TWI412428B TW098137727A TW98137727A TWI412428B TW I412428 B TWI412428 B TW I412428B TW 098137727 A TW098137727 A TW 098137727A TW 98137727 A TW98137727 A TW 98137727A TW I412428 B TWI412428 B TW I412428B
- Authority
- TW
- Taiwan
- Prior art keywords
- dresser
- pad
- rpm
- pressure
- combination
- Prior art date
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/346,264 US7749050B2 (en) | 2006-02-06 | 2008-12-30 | Pad conditioner dresser |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201024029A TW201024029A (en) | 2010-07-01 |
TWI412428B true TWI412428B (zh) | 2013-10-21 |
Family
ID=42500494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW098137727A TW201024029A (en) | 2008-12-30 | 2009-11-06 | Pad conditioner dresser |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN101767315B (zh) |
TW (1) | TW201024029A (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102343562A (zh) * | 2011-08-14 | 2012-02-08 | 上海合晶硅材料有限公司 | 延长抛光布垫使用寿命的方法 |
CN104742008B (zh) * | 2013-12-27 | 2017-03-22 | 中芯国际集成电路制造(上海)有限公司 | 化学机械研磨方法及化学机械研磨装置 |
KR102581481B1 (ko) * | 2016-10-18 | 2023-09-21 | 삼성전자주식회사 | 화학적 기계적 연마 방법, 반도체 소자의 제조 방법, 및 반도체 제조 장치 |
TWI716207B (zh) * | 2019-11-27 | 2021-01-11 | 國家中山科學研究院 | 多震動源研磨腔體 |
CN113547449B (zh) * | 2021-07-30 | 2022-06-10 | 河南科技学院 | 一种具有自退让性的固结磨粒化学机械抛光垫及其制备方法和应用 |
CN114734372A (zh) * | 2022-03-28 | 2022-07-12 | 北京烁科精微电子装备有限公司 | 一种晶圆研磨方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010000753A1 (en) * | 1997-09-02 | 2001-05-03 | Matsushita Electronics Corporation | Apparatus and method for chemical/mechanical polishing |
TW200641986A (en) * | 2005-05-26 | 2006-12-01 | Applied Materials Inc | Smart conditioner rinse station |
-
2009
- 2009-11-06 TW TW098137727A patent/TW201024029A/zh unknown
- 2009-11-19 CN CN2009102226209A patent/CN101767315B/zh not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010000753A1 (en) * | 1997-09-02 | 2001-05-03 | Matsushita Electronics Corporation | Apparatus and method for chemical/mechanical polishing |
TW200641986A (en) * | 2005-05-26 | 2006-12-01 | Applied Materials Inc | Smart conditioner rinse station |
Also Published As
Publication number | Publication date |
---|---|
CN101767315B (zh) | 2012-07-04 |
CN101767315A (zh) | 2010-07-07 |
TW201024029A (en) | 2010-07-01 |
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