TWI407230B - Electrophoretic display panel and fabricating method of the same - Google Patents

Abstract

An electrophoretic display panel including an array substrate, a light shielding layer, an opposite substrate and an electrophoretic display medium is provided. The light shielding layer is disposed on the array substrate and has an optical density larger than 1.5. The opposite substrate is disposed above the array substrate. The electrophoretic display medium is disposed between the light shielding layer and the opposite substrate.

Description

Electrophoretic display panel and method of manufacturing same

The present invention relates to a display panel and a method of fabricating the same, and more particularly to an electrophoretic display panel and a method of fabricating the same.

In recent years, as various display technologies continue to flourish, after continuous research and development, products such as electrophoretic displays, liquid crystal displays, plasma displays, and organic light-emitting diode displays have been gradually commercialized and applied to various sizes. And display devices of various sizes. With the increasing popularity of portable electronic products, flexible displays (such as e-paper, e-books, etc.) have gradually gained market attention. In general, e-paper and e-book use electrophoretic display technology to achieve display. Taking an e-book showing black and white as an example, the sub-pixel is mainly composed of a black electrophoresis liquid and white charged particles doped in a black electrophoresis liquid, and the white charged particles can be driven by applying a voltage to make each pixel Display black, white, or gray with different tones.

In the prior art, the electrophoretic display mostly uses the reflection of the external light source to achieve the purpose of display, and the white charged particles doped in the electrophoresis liquid by the voltage driving can make each sub-pixel display the desired gray scale. In general, an electrophoretic display is mainly composed of a thin film transistor array substrate, an electrophoretic display medium and an adhesive layer, wherein the electrophoretic display medium comprises a patterned dielectric layer defining a microcup structure, and a microcup structure (micro- Cups) and electrophoresis liquid and charged particles in the microcup structure, the adhesive layer is used to bond the thin film transistor array substrate and the electrophoretic display medium. In an electrophoretic display, although the electrophoretic liquid can generally absorb the external light source to prevent the external light source from entering the thin film transistor array substrate, the electrophoretic liquid cannot completely absorb the external light source, and thus some external light sources can pass through the patterned medium in the electrophoretic display medium. The electric layer or the electrophoresis liquid is irradiated onto the thin film transistor on the thin film transistor array substrate. As a result, the electrophoretic display has a poor contrast ratio, and causes the photo transistor to generate a photo current, which affects the characteristics of the device, thereby causing poor display quality of the electrophoretic display.

Therefore, it has been proposed to use a dark-curable adhesive such as cyanoacrylate glue to bond a thin film transistor array substrate and an electrophoretic display medium to withstand an external light source. However, dark heat-curing adhesives such as cyanoacrylate adhesives have a transmittance of about 30% and a thickness of 4 um (micrometers) or more. Therefore, it is necessary to increase the thickness of the rubber to increase the optical density. As a result, the selectivity of the adhesive material is limited and the overall thickness of the electrophoretic display is increased, and the use of these adhesive materials still fails to achieve a satisfactory light-shielding effect.

Therefore, how to reduce the poor contrast and photocurrent caused by external light sources has become one of the urgent problems in this field.

The invention provides an electrophoretic display panel and a forming method thereof, which can improve contrast and have better display quality.

The invention provides an electrophoretic display panel comprising an array substrate, a light shielding layer, a pair of substrates and an electrophoretic display medium. The light shielding layer is disposed on the array substrate, and the optical density of the light shielding layer is higher than 1.5. The opposite substrate is disposed above the array substrate. The electrophoretic display medium is disposed between the light shielding layer and the opposite substrate.

The invention further provides a method for manufacturing an electrophoretic display panel, comprising the following steps. An array substrate is provided. A light shielding layer is formed on the array substrate. A pair of substrates is provided, and the opposite substrate includes a common electrode. An electrophoretic display medium is formed on the opposite substrate. The light shielding layer is adhered to the electrophoretic display medium by an adhesive layer, wherein the electrophoretic display medium is located between the light shielding layer and the opposite substrate.

The present invention provides another method of manufacturing an electrophoretic display panel, comprising the following steps. An array substrate is provided. A light shielding layer and an electrophoretic display medium are sequentially formed on the array substrate. A pair of substrates is provided, and the opposite substrate includes a common electrode. The opposite substrate is adhered to the electrophoretic display medium by an adhesive layer, wherein the electrophoretic display medium is located between the array substrate and the opposite substrate.

Based on the above, the electrophoretic display panel of the present invention includes a light shielding layer that blocks an external light source from entering the array substrate. In this way, the electrophoretic display panel has better contrast and can avoid the problem of light leakage current of the array substrate, so as to improve the display quality of the electrophoretic display panel.

The above described features and advantages of the present invention will be more apparent from the following description.

1 is a schematic cross-sectional view of an electrophoretic display panel according to an embodiment of the present invention. Referring to FIG. 1 , the electrophoretic display panel 100 includes an array substrate 110 , a light shielding layer 130 , a pair of substrates 140 , and an electrophoretic display medium 150 . In the present embodiment, the array substrate 110 and the counter substrate 140 are, for example, flexible substrates, and thus the electrophoretic display panel 100 is, for example, a flexible display panel. The array substrate 110 is, for example, an active device array substrate, and includes a substrate 112 and a plurality of active elements 114 and a plurality of pixel electrodes 128 disposed on the substrate 112, and the pixel electrodes 128 are electrically connected to the active elements 114. The active device 114 is, for example, a thin film transistor, and the active device 114 is mainly composed of a gate 116, a gate insulating layer 118 covering the gate 116, a channel layer 120 above the gate 116, a source 122S and a drain 122D, An insulating layer 124 covering the source 122S and the drain 122D and a protective layer 126, wherein the gate 116 and the source 122S are electrically connected to scan lines (not shown) and data lines (not shown), respectively. The pixel electrode 128 is electrically connected to the drain 122D through the opening of the insulating layer 124 and the protective layer 128.

The light shielding layer 130 is disposed on the array substrate 110 , and the light shielding layer 130 covers the array substrate 110 in a comprehensive manner. In the present embodiment, the light shielding layer 130 includes, for example, a black matrix layer, and the material thereof includes, for example, a photocurable resin, a metal, or a combination thereof. It is to be noted that the photocurable resin is, for example, a light-shielding dye carrier added to a photosensitive polymer resin having a reactive substituent such as a hydroxyl group, a carboxyl group or an amine group, or a reactive substituent such as an aldehyde group or an epoxy group. A (meth)acrylic compound or a polymer resin having a photocrosslinkable group such as a methacrylic acid group or a styrene group, wherein the light-shielding pigment carrier is an organic or inorganic pigment, for example, carbon black. A mixture of aniline black, lanthanum black pigment, lanthanide black pigment, and the like. In another embodiment, the aforementioned metal is, for example, chromium. The optical density of the light shielding layer 130 is, for example, higher than 1.5, and the thickness of the light shielding layer 130 is, for example, less than 4 um. In the present embodiment, the transmittance of the light shielding layer 130 is, for example, less than 3%, that is, the light shielding layer 130 has a high light shielding property, thereby effectively blocking the external light source from entering the array substrate 110.

The electrophoretic display medium 150 is disposed between the light shielding layer 130 and the opposite substrate 140. In the present embodiment, the electrophoretic display medium 150 includes, for example, a microcup structure 152, an electrophoretic fluid 154, a plurality of charged particles 156, and a tie layer 158. Electrophoresis fluid 154 is located within microcup structure 152. Charged particles 156 are distributed in the electrophoresis fluid 154. The sealing layer 158 is bonded to the microcup structure 152 to seal the electrophoretic fluid 154 and charged particles 156 within the microcup structure 152. In the present embodiment, the material of the microcup structure 152 is, for example, a dielectric material. The material of the sealing layer 158 is, for example, an epoxy resin. The electrophoresis liquid 154 is, for example, a black electrophoresis liquid, and the charged particles 156 are, for example, white charged particles. Of course, in other embodiments, the electrophoresis liquid 154 and the charged particles 156 may have other colors. It is to be noted that although the electrophoretic display medium 150 has the structure shown in FIG. 1 as an example in the present embodiment, the electrophoretic display medium 150 in the electrophoretic display panel 100 may have other structures. Moreover, although FIG. 1 illustrates the active element 114 and the microcup structure 152 as a one-to-one combination, the substantially dynamic element 114 and the microcup structure 152 may be in a many-to-one combination. In other words, the present invention does not limit the electrophoretic display medium 150 in the electrophoretic display panel 100. The electrophoretic display medium 150 can be any electrophoretic display medium suitable for an electrophoretic display panel.

The opposite substrate 140 is disposed above the array substrate 110. In the embodiment, the opposite substrate 140 includes a substrate 142 and a common electrode 144. The substrate 142 is, for example, flexible, and is, for example, a polycarbonate (PC) substrate or a polyester (PET) substrate. The material of the common electrode 144 is, for example, a transparent metal such as indium tin oxide.

In the embodiment, the electrophoretic display panel 100 further includes an adhesive layer 160. The adhesive layer 160 is adhered between the light shielding layer 130 and the electrophoretic display medium 150, and is particularly adhered between the light shielding layer 130 and the sealing layer 158 to bond the array substrate 110 and the electrophoretic display medium 150. In other words, the array substrate 110 and the electrophoretic display medium 150 are bonded to each other by the adhesive layer 160. In the present embodiment, the adhesive layer 160 is, for example, a transparent material or an opaque material, wherein the transparent material includes a material such as polyacrylate. In particular, the thickness of the adhesive layer 160 is, for example, 2 um.

In the present embodiment, the electrophoretic display panel 100 includes a light shielding layer 130 disposed between the array substrate 110 and the electrophoretic display medium 150 to block an external light source from entering the array substrate 110 via the electrophoretic display medium 150. In this way, the problem that the external light source is irradiated onto the active device 114 of the array substrate 110 to cause light leakage current and the like can be avoided, so that the active device 114 has better component characteristics. Moreover, since the light shielding layer 130 can effectively block the external light source, the dark state light absorption efficiency can be increased to greatly improve the contrast of the electrophoretic display panel 100. In addition, since the electrophoretic display panel 100 is a film layer mainly blocking the external light source, the light shielding property is not an important factor in material selection of the adhesive layer 160, so the adhesive layer 160 may be a transparent material and may have a small thickness. The thickness, in other words, the placement of the light-shielding layer 130 increases the selectivity of the material of the adhesive layer 160 and substantially reduces the thickness of the adhesive layer 160. In particular, since the light shielding layer 130 generally has a large optical density, a good light shielding effect and a small transmittance can be achieved at a small thickness. Therefore, the electrophoretic display panel of the present embodiment has good display quality and has a small overall thickness to meet the requirements of the consumer for the display panel.

FIG. 2 is a schematic diagram of a method for manufacturing an electrophoretic display panel according to an embodiment of the present invention. The components and materials of the electrophoretic display panel can be referred to the previous embodiment, and are not described in detail herein. Referring to FIG. 2A, first, an array substrate 110 is provided. Next, a light shielding layer 130 is formed on the array substrate 110. In the present embodiment, the array substrate 110 is, for example, an active device array substrate, and its detailed structure can be referred to FIG. 1 and its related description. The light shielding layer 130 is, for example, a black matrix layer, and is formed by, for example, forming a whole layer of a black matrix material layer (not shown) on the pixel electrode 128 of the array substrate 110 by spin coating to cover the array substrate 110. Then, the black matrix material layer is irradiated with light such as ultraviolet light to be cured into the light shielding layer 130. The material of the light shielding layer 130 includes, for example, a photocurable resin, a metal, or a combination thereof. It is to be noted that the photocurable resin is, for example, a light-shielding dye carrier added to a photosensitive polymer resin having a reactive substituent such as a hydroxyl group, a carboxyl group or an amine group, or a reactive substituent such as an aldehyde group or an epoxy group. A (meth)acrylic compound or a polymer resin having a photocrosslinkable group such as a methacrylic acid group or a styrene group, wherein the light-shielding pigment carrier is an organic or inorganic pigment, for example, carbon black. A mixture of aniline black, an anthraquinone black pigment, a lanthanide black pigment, and the like, and the aforementioned metal is, for example, chromium. The optical density of the light shielding layer 130 is, for example, higher than 1.5. In the present embodiment, the thickness of the light shielding layer 130 is, for example, less than 4 um, and the transmittance of the light shielding layer 130 is, for example, less than 3%.

Referring to FIG. 2B, then, a pair of substrates 140 are provided, and the opposite substrate 140 includes a common electrode 144. In the present embodiment, the method of fabricating the counter substrate 140 is, for example, forming a common electrode 144 on the substrate 142. The material of the substrate 142 is, for example, polyester, and the material of the common electrode 144 is, for example, a transparent metal such as indium tin oxide.

Then, an electrophoretic display medium 150 is formed on the opposite substrate 140. In the present embodiment, the electrophoretic display medium 150 is formed, for example, on the common electrode 144, and the forming steps thereof are as follows. First, a microcup structure 152 is formed on the common electrode 144. For example, a dielectric material layer (not shown) is formed on the common electrode 144, and then the dielectric material layer is subjected to a photolithography process to dielectrically. The material layer is patterned into a microcup structure 152. Next, the electrophoresis liquid 154 is filled in the microcup structure 152, and the electrophoresis liquid 154 is, for example, a black electrophoresis liquid. Then, a plurality of charged particles 156 are distributed in the electrophoresis liquid 154, and the charged particles 156 are, for example, white charged particles. Next, the electrophoretic fluid 154 and the charged particles 156 are sealed in the microcup structure 152 by a layer 158. The material of the sealing layer 158 is, for example, an epoxy resin, and the forming method thereof is, for example, photocuring or heat curing.

Referring to FIG. 2C, the light shielding layer 130 is adhered to the electrophoretic display medium 150 by an adhesive layer 160, wherein the electrophoretic display medium 150 is located between the light shielding layer 130 and the opposite substrate 140. In other words, in the present embodiment, the light shielding layer 130 on the array substrate 110 of FIG. 2A is bonded to the electrophoretic display medium 150 on the opposite substrate 140 of FIG. 2B by the adhesive layer 160 to bond the array substrate 110 and the pair. The electrophoretic display panel 100 is formed on the substrate 140. The adhesive layer 160 is, for example, a transparent material such as polyacrylate, and is formed by, for example, heating and rolling, and has a thickness of, for example, 2 μm. It is to be noted that although the electrophoretic display medium 150 has the structure shown in FIG. 2B as an example in the present embodiment, the electrophoretic display medium 150 in the electrophoretic display panel 100 may have other structures.

In the present embodiment, the electrophoretic display medium 150 is formed on the opposite substrate 140, and the array substrate 110 and the electrophoretic display medium 150 are bonded by the adhesive layer 160 to form the electrophoretic display panel 100. In particular, the light shielding layer 130 has been formed on the array substrate 110 before the array substrate 110 and the electrophoretic display medium 150 are bonded. Therefore, in the electrophoretic display panel 100, a light shielding layer 130 is disposed between the array substrate 110 and the electrophoretic display medium 150 to effectively block an external light source from entering the array substrate 110 via the electrophoretic display medium 150. In this way, the problem that the external light source is irradiated onto the active device 114 of the array substrate 110 to cause light leakage current and the like can be avoided, so that the active device 114 has better component characteristics. Moreover, since the light shielding layer 130 can effectively block the external light source, the dark state light absorption efficiency can be increased to greatly improve the contrast of the electrophoretic display panel 100. In addition, since the electrophoretic display panel 100 is a film layer mainly blocking the external light source, the light shielding property is not an important factor in material selection of the adhesive layer 160, so the adhesive layer 160 may be a transparent material and may have a small thickness. The thickness, in other words, the placement of the light-shielding layer 130 increases the selectivity of the material of the adhesive layer 160 and substantially reduces the thickness of the adhesive layer 160. In particular, since the light shielding layer 130 generally has a large optical density, a good light shielding effect and a small transmittance can be achieved at a small thickness. Therefore, the electrophoretic display panel of the present embodiment has good display quality and can have a small overall thickness to meet the requirements of the consumer for the display panel.

3 is a schematic cross-sectional view of an electrophoretic display panel according to an embodiment of the present invention. The components of the electrophoretic display panel 100a of FIG. 3 are substantially the same as those of the electrophoretic display panel 100 of FIG. 1. Therefore, the following components are applied to the electrophoretic display panel 100a. The configuration of the components can be referred to as described in the previous embodiment, and the details are not described herein. Referring to FIG. 3 , the electrophoretic display panel 100 a includes an array substrate 110 , a light shielding layer 130 , an electrophoretic display medium 150 , a pair of substrates 140 , and an adhesive layer 160 . The light shielding layer 130 is disposed on the array substrate 110. The opposite substrate 140 is disposed above the array substrate 110. The electrophoretic display medium 150 is disposed between the light shielding layer 130 and the opposite substrate 140. The adhesive layer 160 is adhered, for example, between the opposite substrate 140 and the electrophoretic display medium 150. The structure of the array substrate 110 and the opposite substrate 140 can be referred to in the previous embodiment, and details are not described herein.

In the present embodiment, the electrophoretic display medium 150 includes, for example, a microcup structure 152, an electrophoresis liquid 154 located in the microcup structure 152, a plurality of charged particles 156 distributed in the electrophoresis fluid 154, and a tie layer 158. The opening of the microcup structure 152 is, for example, directed toward the opposite substrate 140. Therefore, the sealing layer 158 is disposed between the adhesive layer 160 and the microcup structure 152, for example, to engage the microcup structure 152, and the electrophoresis liquid 154 is Charged particles 156 are enclosed within microcup structure 152. That is to say, in the present embodiment, the microcup structure 152 and the sealing layer 158 are sequentially and directly disposed on the light shielding layer 130, for example, so that the light shielding layer 130 is in direct contact with the microcup structure 152. In addition, the adhesive layer 160 is adhered between the opposite substrate 140 and the sealing layer 158 to bond the opposite substrate 140 and the electrophoretic display medium 150 to bond the opposite substrate 140 and the array substrate 110. The adhesive layer 160 is, for example, a transparent material such as a polyacrylate having a thickness of, for example, 2 um. It is to be noted that although the electrophoretic display medium 150 having the structure shown in FIG. 3 is taken as an example in the present embodiment, the electrophoretic display medium 150 may have other structures, which are not limited in the present invention.

In this embodiment, the light shielding layer 130 is disposed on the array substrate 110, and the light shielding layer 130 is entirely covered on the array substrate 110, for example. In the present embodiment, the light shielding layer 130 includes, for example, a black matrix layer, and the material thereof includes, for example, a photocurable resin, a metal, or a mixture comprising the two. It is to be noted that the photocurable resin is, for example, a light-shielding dye carrier added to a photosensitive polymer resin having a reactive substituent such as a hydroxyl group, a carboxyl group or an amine group, or a reactive substituent such as an aldehyde group or an epoxy group. A (meth)acrylic compound or a polymer resin having a photocrosslinkable group such as a methacrylic acid group or a styrene group, wherein the light-shielding pigment carrier is an organic or inorganic pigment, for example, carbon black. A mixture of aniline black, an anthraquinone black pigment, a lanthanide black pigment, and the like, and the aforementioned metal is, for example, chromium. The optical density of the light shielding layer 130 is, for example, higher than 1.5, and the thickness of the light shielding layer 130 is, for example, less than 4 um. In the present embodiment, the transmittance of the light shielding layer 130 is, for example, less than 3%, that is, the light shielding layer 130 has a high light shielding property, thereby effectively blocking the external light source from entering the array substrate 110.

In this embodiment, the electrophoretic display panel 100a includes a light shielding layer 130 disposed between the array substrate 110 and the electrophoretic display medium 150 to block an external light source from entering the array substrate 110 via the electrophoretic display medium 150. In this way, the problem that the external light source is irradiated onto the active device 114 of the array substrate 110 to cause light leakage current and the like can be avoided, so that the active device 114 has better component characteristics. Moreover, since the light shielding layer 130 can effectively block the external light source, the dark state light absorption efficiency can be increased to greatly improve the contrast of the electrophoretic display panel 100a. In addition, in the present embodiment, the electrophoretic display medium 150 can be directly disposed on the light shielding layer 130 without additionally using an adhesive layer for bonding, thereby reducing the overall thickness of the electrophoretic display panel 100a. In particular, since the light shielding layer 130 generally has a large optical density, a good light shielding effect and a small transmittance can be achieved at a small thickness. Therefore, the electrophoretic display panel of the present embodiment has good display quality and has a small overall thickness to meet the requirements of the consumer for the display panel.

4A to FIG. 4C are schematic diagrams showing the flow of a method for manufacturing an electrophoretic display panel according to an embodiment of the present invention. The components of the electrophoretic display panel can be referred to the previous embodiment, and are not described in detail herein. Referring to FIG. 4A, first, an array substrate 110 is provided. Next, a light shielding layer 130 and an electrophoretic display medium 150 are sequentially formed on the array substrate 110. In the present embodiment, the array substrate 110 is, for example, an active device array substrate, and its detailed structure can be referred to FIG. 1 and its related description. The light shielding layer 130 is, for example, a black matrix layer, and is formed by, for example, forming a whole layer of a black matrix material layer (not shown) on the pixel electrode 128 of the array substrate 110 by spin coating to cover the array substrate 110. Then, the black matrix material layer is irradiated with light such as ultraviolet light to be cured into the light shielding layer 130. The material of the light shielding layer 130 includes, for example, a photocurable resin, a metal, or a combination thereof. It is to be noted that the photocurable resin is, for example, a light-shielding dye carrier added to a photosensitive polymer resin having a reactive substituent such as a hydroxyl group, a carboxyl group or an amine group, or a reactive substituent such as an aldehyde group or an epoxy group. A (meth)acrylic compound or a polymer resin having a photocrosslinkable group such as a methacrylic acid group or a styrene group, wherein the light-shielding pigment carrier is an organic or inorganic pigment, for example, carbon black. A mixture of aniline black, an anthraquinone black pigment, a lanthanide black pigment, and the like, and the aforementioned metal is, for example, chromium. And the optical density of the light shielding layer 130 is, for example, higher than 1.5. In the present embodiment, the thickness of the light shielding layer 130 is, for example, less than 4 um, and the transmittance of the light shielding layer 130 is, for example, less than 3%.

In the present embodiment, the electrophoretic display medium 150 is formed, for example, directly on the light shielding layer 130, and the forming steps thereof are as follows. First, a microcup structure 152 is formed on the light shielding layer 130. For example, a dielectric material layer (not shown) is formed on the light shielding layer 130, and then the dielectric material layer is subjected to a photolithography etching process to dielectrically. The layer of material is patterned into a microcup structure 152 such that the layer of dielectric material has a plurality of openings to form the microcup structure 152. Next, the electrophoresis liquid 154 is filled in the microcup structure 152, and the electrophoresis liquid 154 is, for example, a black electrophoresis liquid. Then, a plurality of charged particles 156 are distributed in the electrophoresis liquid 154, and the charged particles 156 are, for example, white charged particles. Next, the electrophoretic fluid 154 and the charged particles 156 are sealed in the microcup structure 152 by a layer 158. The material of the sealing layer 158 is, for example, an epoxy resin, and the forming method thereof is, for example, photocuring or heat curing.

Referring to FIG. 4B, then, a pair of substrates 140 are provided, and the opposite substrate 140 includes a common electrode 144. In the present embodiment, the method of fabricating the counter substrate 140 is, for example, forming a common electrode 144 on the substrate 142. The material of the substrate 142 is, for example, polyester, and the material of the common electrode 144 is, for example, a transparent metal such as indium tin oxide. .

Referring to FIG. 4C , the opposite substrate 140 is adhered to the electrophoretic display medium 150 by an adhesive layer 160 , wherein the electrophoretic display medium 150 is located between the array substrate 110 and the opposite substrate 140 . In other words, in the present embodiment, the electrophoretic display medium 150 on the array substrate 110 of FIG. 4A is bonded to the opposite substrate 140 of FIG. 4B by the adhesive layer 160 to form the electrophoretic display panel 100a. Among them, the adhesive layer 160 is, for example, a transparent material such as polyacrylate, and is formed by, for example, heating and rolling. It is to be noted that although the electrophoretic display medium 150 has the structure shown in FIG. 4A as an example in the present embodiment, the electrophoretic display medium 150 in the electrophoretic display panel 100a may have other structures.

In this embodiment, the light shielding layer 130 and the electrophoretic display medium 150 are sequentially formed on the array substrate 110, and the electrophoretic display medium 150 and the opposite substrate 140 on the array plate 110 are bonded by the adhesive layer 160 to form an electrophoresis. The display panel 100a. Therefore, in the electrophoretic display panel 100a, a light shielding layer 130 is disposed between the array substrate 110 and the electrophoretic display medium 150 to effectively block the external light source from entering the array substrate 110 via the electrophoretic display medium 150. In this way, the problem that the external light source is irradiated onto the active device 114 of the array substrate 110 to cause light leakage current and the like can be avoided, so that the active device 114 has better component characteristics. Moreover, since the light shielding layer 130 can effectively block the external light source, the dark state light absorption efficiency can be increased to greatly improve the contrast of the electrophoretic display panel 100a. In addition, in the embodiment, the electrophoretic display medium 150 can be directly disposed on the light shielding layer 130 without bonding the electrophoretic display medium 150 and the light shielding layer 130 through an additional adhesive layer, thereby simplifying the process steps of the electrophoretic display panel 100a. The overall thickness of the electrophoretic display panel 100a is reduced. In particular, since the light shielding layer 130 generally has a large optical density, a good light shielding effect and a small transmittance can be achieved at a small thickness. Therefore, the electrophoretic display panel of the present embodiment has good display quality and can have a small overall thickness to meet the requirements of the consumer for the display panel.

It is to be noted that, in the above embodiment, the structure of the electrophoretic display panels 100 and 100a shown in FIG. 1 and FIG. 3 is taken as an example, but the electrophoretic display panel of the present invention may have other structures. In addition, FIG. 2A The method of manufacturing the electrophoretic display panel described in FIG. 2C and FIG. 4A to FIG. 4C is also only one of various processes for fabricating the electrophoretic display panel of the present invention, and is not intended to limit the present invention.

In summary, in the embodiment, the electrophoretic display panel includes a light shielding layer disposed between the array substrate and the electrophoretic display medium to block the external light source from entering the array substrate via the electrophoretic display medium. In this way, the problem that the external light source is irradiated on the active component of the array substrate to cause light leakage current and the like can be avoided, so that the active component has better component characteristics. Moreover, since the light shielding layer can effectively block the external light source, the dark state light absorption efficiency can be increased to greatly improve the contrast of the electrophoretic display panel.

In addition, since the electrophoretic display panel is a light shielding layer as a film layer mainly blocking the external light source, the light shielding property is not an important consideration factor for the material selection of the adhesive layer, so the adhesive layer may be a transparent material and may have a small thickness, in other words, The arrangement of the light-shielding layer increases the selectivity of the material of the adhesive layer and substantially reduces the thickness of the adhesive layer. In addition, in an embodiment, the electrophoretic display medium can be directly disposed on the light shielding layer without bonding the electrophoretic display medium and the light shielding layer through an additional adhesive layer, thereby simplifying the processing steps of the electrophoretic display panel and reducing the electrophoretic display panel. The overall thickness. Moreover, since the light shielding layer generally has a large optical density, a good light shielding effect and a small transmittance can be achieved at a small thickness. Therefore, the electrophoretic display panel of the present embodiment has good display quality and can have a small overall thickness to meet the requirements of the consumer for the display panel.

Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.

100, 100a. . . Electrophoretic display panel

110. . . Array substrate

112, 142. . . Substrate

114. . . Active component

116. . . Gate

118. . . Brake insulation

120. . . Channel layer

122D. . . Bungee

122S. . . Source

124. . . Insulation

126. . . The protective layer

128. . . Pixel electrode

130. . . Shading layer

140. . . Counter substrate

144. . . Common electrode

150. . . Electrophoretic display medium

152. . . Microcup structure

154. . . Electrophoresis fluid

156. . . Charged particle

158. . . Sealing layer

160. . . Adhesive layer

1 is a schematic cross-sectional view of an electrophoretic display panel according to an embodiment of the present invention.

2A-2C are schematic flow charts of a method for manufacturing an electrophoretic display panel according to an embodiment of the invention.

3 is a cross-sectional view of an electrophoretic display panel in accordance with an embodiment of the present invention.

4A-4C are schematic flow charts of a method for manufacturing an electrophoretic display panel according to an embodiment of the invention.

100. . . Electrophoretic display panel

110. . . Array substrate

112, 142. . . Substrate

114. . . Active component

116. . . Gate

118. . . Brake insulation

120. . . Channel layer

122D. . . Bungee

122S. . . Source

124. . . Insulation

126. . . The protective layer

128. . . Pixel electrode

130. . . Shading layer

140. . . Counter substrate

144. . . Common electrode

150. . . Electrophoretic display medium

152. . . Microcup structure

154. . . Electrophoresis fluid

156. . . Charged particle

158. . . Sealing layer

160. . . Adhesive layer

Claims (15)

An electrophoretic display panel comprising: an array substrate; a light shielding layer disposed on the array substrate, the optical density of the light shielding layer being higher than 1.5; a pair of substrates disposed above the array substrate; The electrophoretic display medium is disposed between the light shielding layer and the opposite substrate, wherein the electrophoretic display medium comprises a microcup structure, and the light shielding layer is in contact with the microcup structure. The electrophoretic display panel of claim 1, wherein the array substrate and the opposite substrate are flexible substrates. The electrophoretic display panel of claim 1, wherein the array substrate comprises a plurality of active elements and a plurality of pixel electrodes, and the pixel electrodes are electrically connected to the active elements. The electrophoretic display panel of claim 1, wherein the opposite substrate comprises a common electrode. The electrophoretic display panel of claim 1, wherein the light shielding layer comprises a black matrix layer. The electrophoretic display panel of claim 1, wherein the light shielding layer has a transmittance of less than 3%. The electrophoretic display panel of claim 1, wherein the light shielding layer has a thickness of less than 4 um. An electrophoretic display panel according to claim 1, wherein the mask The material of the optical layer includes a photocurable resin, a metal, or a combination thereof. The electrophoretic display panel of claim 1, wherein the electrophoretic display medium further comprises: an electrophoresis liquid located in the microcup structure; a plurality of charged particles distributed in the electrophoresis liquid; and a layer And engaging the microcup structure to seal the electrophoretic liquid and the charged particles in the microcup structure. The electrophoretic display panel of claim 9, further comprising an adhesive layer adhered between the opposite substrate and the sealing layer. The electrophoretic display panel of claim 1, wherein the light shielding layer is entirely covered on the array substrate. A method for manufacturing an electrophoretic display panel, comprising: providing an array substrate; sequentially forming a light shielding layer and an electrophoretic display medium on the array substrate, wherein the electrophoretic display medium comprises a microcup structure, and the light shielding layer and the micro Contacting the cup structure; providing a pair of substrates, the opposite substrate comprising a common electrode; and bonding the opposite substrate to the electrophoretic display medium by using an adhesive layer, wherein the electrophoretic display medium is located on the array substrate and the opposite substrate between. The method for manufacturing an electrophoretic display panel according to claim 12, wherein the step of forming the electrophoretic display medium comprises: forming the microcup structure on the light shielding layer; filling an electrophoresis liquid in the microcup structure; A plurality of charged particles are distributed in the electrophoresis liquid; and the electrophoresis liquid and the charged particles are sealed in the microcup structure by a layer. The method of manufacturing an electrophoretic display panel according to claim 12, wherein the method of forming the microcup structure comprises using a lithography process. The method of manufacturing an electrophoretic display panel according to claim 12, wherein the array substrate comprises a plurality of active elements and a plurality of pixel electrodes, and the pixel electrodes are electrically connected to the active elements.