TWI439982B - Pixel array substrate and reflective display panel - Google Patents
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本發明是有關於一種畫素陣列基板及反射式顯示面板,且特別是有關於一種具有擋牆結構的畫素陣列基板及反射式顯示面板。 The present invention relates to a pixel array substrate and a reflective display panel, and more particularly to a pixel array substrate having a barrier structure and a reflective display panel.
近年來,由於各種顯示技術不斷蓬勃發展,在經過持續的開發研究後,如電泳顯示器、液晶顯示器、電漿顯示器、有機發光二極體顯示器等產品,已逐漸地商業化並應用於各種尺寸的顯示裝置中。隨著可攜式電子產品的日益普及,可撓性顯示器(如電子紙(e-paper)、電子書(e-book)等)已逐漸受到市場的關注。 In recent years, as various display technologies continue to flourish, after continuous development research, products such as electrophoretic displays, liquid crystal displays, plasma displays, and organic light-emitting diode displays have been gradually commercialized and applied to various sizes. In the display device. With the increasing popularity of portable electronic products, flexible displays (such as e-paper, e-books, etc.) have gradually gained market attention.
一般而言,電子紙(e-paper)以及電子書(e-book)係採用電泳顯示技術來達到顯示之目的。以顯示黑白的電子書為例,其所使用的電泳顯示器主要包括薄膜電晶體陣列基板、擋牆結構以及容置於擋牆結構中的電泳顯示介質。電泳顯示介質主要是由黑色電泳液以及摻於黑色電泳液中的白色帶電粒子所構成,透過施加電壓的方式可以驅動白色帶電粒子移動而反射外界光線,進而使電泳顯示器顯示各種不同的畫面。 In general, e-paper and e-book use electrophoretic display technology to achieve display. Taking an electronic book showing black and white as an example, the electrophoretic display used mainly includes a thin film transistor array substrate, a retaining wall structure, and an electrophoretic display medium accommodated in the retaining wall structure. The electrophoretic display medium is mainly composed of a black electrophoresis liquid and white charged particles doped in a black electrophoresis liquid. By applying a voltage, the white charged particles can be moved to reflect external light, thereby causing the electrophoretic display to display various different images.
然而,電泳顯示器中的黑色電泳液無法完全吸收外界光線,因此有部分外界光線會穿過電泳顯示介質,而進入薄膜電晶體陣列基板中。如此一來,這些光線便會被薄膜 電晶體陣列基板中的薄膜電晶體或其他金屬走線所反射,而使得電泳顯示器的對比率(contrast ratio)下降。因此,有人提出在薄膜電晶體陣列基板與擋牆結構間製作一黑色吸光層,藉以減少外界光源被反射的機率。然而,此黑色吸光層需額外增加一道光罩,耗費製作成本及時間。此外,黑色吸光層與擋牆結構在製程上易有對位(alignment)不良的問題,且當黑色吸光層與擋牆結構之間的附著力不足時,擋牆結構易於後續製程或信賴性測試中發生剝離(peeling)的狀況。 However, the black electrophoresis liquid in the electrophoretic display cannot completely absorb the external light, so some external light passes through the electrophoretic display medium and enters the thin film transistor array substrate. In this way, the light will be covered by the film. The thin film transistor or other metal traces in the transistor array substrate are reflected, causing the contrast ratio of the electrophoretic display to decrease. Therefore, it has been proposed to make a black light absorbing layer between the thin film transistor array substrate and the retaining wall structure, thereby reducing the probability of the external light source being reflected. However, this black light absorbing layer requires an additional reticle, which is costly and time consuming. In addition, the black light absorbing layer and the retaining wall structure tend to have poor alignment problems in the process, and when the adhesion between the black light absorbing layer and the retaining wall structure is insufficient, the retaining wall structure is easy to follow the process or the reliability test. A situation in which peeling occurs.
有鑑於此,本發明提供一種畫素陣列基板及反射式顯示面板,其可改善傳統畫素陣列基板及反射式顯示面板中擋牆結構易自底層剝離的問題。此外,本發明之畫素陣列基板及反射式顯示面板亦可解決擋牆結構與底層對位不良的問題。 In view of the above, the present invention provides a pixel array substrate and a reflective display panel, which can improve the problem that the retaining wall structure of the conventional pixel array substrate and the reflective display panel is easily peeled off from the bottom layer. In addition, the pixel array substrate and the reflective display panel of the present invention can also solve the problem of poor alignment between the retaining wall structure and the bottom layer.
本發明提供一種畫素陣列基板,此畫素陣列基板包括基底、元件陣列、光吸收層以及擋牆結構。基底具有多個陣列排列的畫素區與擋牆區。擋牆區位於任兩相鄰畫素區之間,並環繞於這些畫素區的最外圍。元件陣列具有多個分別位於這些畫素區的元件。光吸收層覆蓋元件陣列、基底的畫素區以及擋牆區。擋牆結構位於光吸收層上,且於各畫素區中圍出容納開口,其中光吸收層與擋牆結構為一體成形。 The invention provides a pixel array substrate comprising a substrate, an element array, a light absorbing layer and a retaining wall structure. The substrate has a plurality of pixel regions and a barrier region arranged in an array. The wall area is located between any two adjacent pixel areas and surrounds the outermost periphery of these pixel areas. The array of elements has a plurality of elements located in the respective pixel regions. The light absorbing layer covers the array of elements, the pixel area of the substrate, and the wall area. The retaining wall structure is located on the light absorbing layer, and surrounds the receiving opening in each pixel area, wherein the light absorbing layer and the retaining wall structure are integrally formed.
本發明提供一種反射式顯示面板包括上述之畫素陣列基板、對向基板以及顯示介質。對向基板對向於畫素陣列基板,並與擋牆結構連接以封閉容納開口。顯示介質位於容置開口。 The present invention provides a reflective display panel including the above-described pixel array substrate, a counter substrate, and a display medium. The opposite substrate is opposite to the pixel array substrate and connected to the retaining wall structure to close the receiving opening. The display medium is located in the receiving opening.
在本發明之一實施例中,上述之光吸收層與擋牆結構的材料相同。 In an embodiment of the invention, the light absorbing layer is the same material as the retaining wall structure.
在本發明之一實施例中,上述之光吸收層與擋牆結構包括黑色光吸收層。 In an embodiment of the invention, the light absorbing layer and the retaining wall structure comprise a black light absorbing layer.
在本發明之一實施例中,上述之光吸收層與擋牆結構之材料包括黑色樹脂。 In an embodiment of the invention, the material of the light absorbing layer and the retaining wall structure comprises a black resin.
在本發明之一實施例中,上述之光吸收層係全面性覆蓋元件陣列、基底的畫素區以及擋牆區。 In one embodiment of the invention, the light absorbing layer described above comprehensively covers the array of elements, the pixel regions of the substrate, and the wall regions.
在本發明之一實施例中,上述之基底更具有環繞於畫素區外圍的周邊區,而光吸收層與擋牆結構暴露出此周邊區。 In an embodiment of the invention, the substrate further has a peripheral region surrounding the periphery of the pixel region, and the light absorbing layer and the barrier structure expose the peripheral region.
在本發明之一實施例中,上述之元件包括主動元件以及畫素電極,而畫素電極與主動元件電性連接。 In an embodiment of the invention, the component comprises an active component and a pixel electrode, and the pixel electrode is electrically connected to the active component.
在本發明之一實施例中,上述之對向基板可進一步包括共同電極。 In an embodiment of the invention, the opposite substrate may further include a common electrode.
基於上述,在本發明之畫素陣列基板及反射式顯示面板中,由於光吸收層與擋牆結構是一體成形的,具有較高的機械強度,因此可避免擋牆結構自光吸收層剝離。此外,由於光吸收層與擋牆結構是一併製成的,因此擋牆結構與光吸收層之間不會產生對位不良的問題。 Based on the above, in the pixel array substrate and the reflective display panel of the present invention, since the light absorbing layer and the retaining wall structure are integrally formed and have high mechanical strength, peeling of the retaining wall structure from the light absorbing layer can be avoided. In addition, since the light absorbing layer and the retaining wall structure are formed together, there is no problem of poor alignment between the retaining wall structure and the light absorbing layer.
為讓本發明之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the present invention will be more apparent from the following description.
圖1為本發明一實施例之畫素陣列基板剖面示意圖,圖2為本發明一實施例之畫素陣列基板上視示意圖,其中圖1是對應圖2之剖面線A-A’所繪的剖面圖。請同時參照圖1及圖2,本實施例之畫素陣列基板100包括基底102、元件陣列104、光吸收層106以及擋牆結構108。 1 is a schematic cross-sectional view of a pixel array substrate according to an embodiment of the present invention, and FIG. 2 is a schematic top view of a pixel array substrate according to an embodiment of the present invention, wherein FIG. 1 is a cross-sectional line A-A' corresponding to FIG. Sectional view. Referring to FIG. 1 and FIG. 2 simultaneously, the pixel array substrate 100 of the present embodiment includes a substrate 102, an element array 104, a light absorbing layer 106, and a retaining wall structure 108.
本實施例之基底102具有多個陣列排列的畫素區P與擋牆區W,擋牆區W位於任兩相鄰畫素區P之間並環繞於畫素區P的最外圍。舉例而言,多個畫素區P可為多個陣列排列的矩形區域,而擋牆區W可為環繞這些畫素區P的網狀區域,但本發明不以上述為限。此外,本實施例之基底102更具周邊區K,周邊區K環繞於擋牆區W的外圍,且在周邊區K上並未形成光吸收層106與擋牆結構108,換言之,光吸收層106與擋牆結構108暴露出基底102的周邊區K。在本實施例中,基底102主要是用來承載畫素陣列基板100之元件,其材質可為玻璃、石英、有機聚合物、或是不透光材料(例如:導電材料、晶圓、陶瓷等)。 The substrate 102 of the present embodiment has a plurality of arrays of pixel regions P and a barrier wall region W, and the barrier region W is located between any two adjacent pixel regions P and surrounds the outermost periphery of the pixel region P. For example, the plurality of pixel regions P may be rectangular regions in which a plurality of arrays are arranged, and the barrier region W may be a mesh region surrounding the pixel regions P, but the present invention is not limited thereto. In addition, the substrate 102 of the present embodiment has a peripheral region K, and the peripheral region K surrounds the periphery of the retaining wall region W, and the light absorbing layer 106 and the retaining wall structure 108 are not formed on the peripheral region K, in other words, the light absorbing layer The 106 and retaining wall structure 108 exposes the peripheral zone K of the substrate 102. In this embodiment, the substrate 102 is mainly used to carry the components of the pixel array substrate 100, and the material thereof may be glass, quartz, organic polymer, or opaque material (for example, conductive materials, wafers, ceramics, etc.) ).
本實施例之元件陣列104具有多個元件104a分別位於畫素區P。在本實施中,元件104a包括主動元件T以及畫素電極PX,畫素電極PX與主動元件T電性連接。在本 實施例中,主動元件T例如為薄膜電晶體(thin film transistor,TFT)、畫素電極PX例如為導電電極,其材質包括金屬、金屬氧化物(例如銦錫氧化物、銦鋅氧化物、鋁錫氧化物、鋁鋅氧化物、銦鍺鋅氧化物、或其它合適的氧化物、或者是上述至少二者之堆疊層)。 The element array 104 of the present embodiment has a plurality of elements 104a located in the pixel area P, respectively. In the present embodiment, the element 104a includes an active element T and a pixel electrode PX, and the pixel electrode PX is electrically connected to the active element T. In this In the embodiment, the active device T is, for example, a thin film transistor (TFT), and the pixel electrode PX is, for example, a conductive electrode, and the material thereof includes a metal, a metal oxide (eg, indium tin oxide, indium zinc oxide, aluminum). Tin oxide, aluminum zinc oxide, indium antimony zinc oxide, or other suitable oxide, or a stacked layer of at least two of the foregoing.
本實施例之光吸收層106覆蓋元件陣列104、基底的畫素區P以及擋牆區W。進一步地說,光吸收層106可全面性地覆蓋畫素區P以及擋牆區W,藉此可以充分地吸收自外界入射的光線,進而減少光線被主動元件T或其他金屬走線反射的機率。這樣一來,採用本實施例之畫素陣列基板100的反射式顯示面板可以大幅地降低發生暗態漏光的機率,進而提升此反射式顯示面板的對比(contrast ratio)。在本實施例中,光吸收層106可為黑色光吸收層,其材料例如為黑色樹脂。 The light absorbing layer 106 of the present embodiment covers the element array 104, the pixel region P of the substrate, and the barrier region W. Further, the light absorbing layer 106 can comprehensively cover the pixel area P and the wall area W, thereby sufficiently absorbing light incident from the outside, thereby reducing the probability of light being reflected by the active element T or other metal traces. . In this way, the reflective display panel using the pixel array substrate 100 of the present embodiment can greatly reduce the probability of occurrence of dark state light leakage, thereby improving the contrast ratio of the reflective display panel. In the present embodiment, the light absorbing layer 106 may be a black light absorbing layer, the material of which is, for example, a black resin.
本實施例之擋牆結構108位於光吸收層106上,擋牆結構108於各畫素區P中圍出容納開口H。換言之,本實施例之擋牆結構108位於呈網狀分佈的擋牆區W上並實質上與其重合,使得擋牆結構108的各容納開口H正好暴露出各畫素區P上方的光吸收層106,以讓擋牆結構108在各畫素區P上與光吸收層106共同圍繞出容納開口H,用以在後續製程中充填顯示介質。換言之,當畫素陣列基板100組成反射式顯示面板後,這些填充了顯示介質的容置空間即為顯示單元的位置,而各容納開口H例如為矩形框。 The retaining wall structure 108 of the present embodiment is located on the light absorbing layer 106, and the retaining wall structure 108 encloses the receiving opening H in each of the pixel regions P. In other words, the retaining wall structure 108 of the present embodiment is located on and substantially coincides with the retaining wall region W distributed in a mesh shape, so that the receiving openings H of the retaining wall structure 108 just expose the light absorbing layer above each pixel region P. 106, so that the retaining wall structure 108 surrounds the receiving opening H together with the light absorbing layer 106 on each of the pixel areas P for filling the display medium in a subsequent process. In other words, when the pixel array substrate 100 constitutes a reflective display panel, the accommodating spaces filled with the display medium are the positions of the display unit, and each of the accommodating openings H is, for example, a rectangular frame.
值得一提的是,光吸收層106與擋牆結構108係為一 體成形。換言之,光吸收層106與擋牆結構108是一併製作的。舉例而言,可於基板102上塗佈一層黑色光吸收層110(如圖3A所示),之後再利用半調式(half tone)或灰調式(gray tone)光罩M,如圖3B所示,其中光罩M上具有穿透區R1、半穿透區R2以及遮光區R3所構成的圖案,藉此光罩M對黑色光吸收層110進行黃光製程,以在元件陣列104上同時形成具有不同厚度光吸收層106、擋牆結構108,並且同時移除周邊區K上的黑色光吸收層110,以暴露出基底102的周邊區K。 It is worth mentioning that the light absorbing layer 106 and the retaining wall structure 108 are one. Body shaping. In other words, the light absorbing layer 106 is fabricated together with the retaining wall structure 108. For example, a black light absorbing layer 110 (shown in FIG. 3A) may be coated on the substrate 102, and then a half tone or gray tone mask M may be used, as shown in FIG. 3B. The mask M has a pattern of a penetrating region R1, a semi-transmissive region R2, and a light-shielding region R3, whereby the mask M performs a yellow light process on the black light absorbing layer 110 to simultaneously form on the element array 104. The light absorbing layer 106 having different thicknesses, the barrier structure 108, and the black light absorbing layer 110 on the peripheral region K are simultaneously removed to expose the peripheral region K of the substrate 102.
舉例而言,本實施例之黑色光吸收層110例如為負型的黑色光阻,穿過光罩M之穿透區R1的光線照射於黑色光阻上,以使對應穿透區R1之黑色光阻聚合硬化,顯影之後則形成厚度D1較厚的區域,對應地構成光吸收層106與擋牆結構108的疊層;另一方面,穿過光罩M之半穿透區R2的光線照射於黑色光阻上,以使對應穿透區R1之部分黑色光阻聚合硬化,顯影之後則於光吸收層106上形成厚度D2較薄的區域,對應地構成光吸收層106;此外,位於光罩M之遮光區R3下方的黑色光阻由於未被光線照射,在顯影之後則完全被移除,以暴露出基底的周邊區K。由於黑色光吸收層110在圖案化之後具有不同厚度,因此在厚度D2較薄的區域會構成多個容納開口H(如圖3B所示)。此具有多個容納開口H的黑色光吸收層110即為上述之光吸收層106及擋牆結構108。 For example, the black light absorbing layer 110 of the embodiment is, for example, a negative black photoresist, and the light passing through the penetration region R1 of the reticle M is irradiated onto the black photoresist so that the corresponding penetration region R1 is black. The photoresist is cured by hardening, and after development, a region having a thick thickness D1 is formed, correspondingly constituting a laminate of the light absorbing layer 106 and the retaining wall structure 108; on the other hand, light passing through the semi-transmissive region R2 of the mask M is irradiated On the black photoresist, a portion of the black photoresist corresponding to the transmissive region R1 is polymerized and hardened, and after development, a region having a thin thickness D2 is formed on the light absorbing layer 106, correspondingly constituting the light absorbing layer 106; The black photoresist under the light-shielding region R3 of the cover M is completely removed after development due to the absence of light to expose the peripheral region K of the substrate. Since the black light absorbing layer 110 has different thicknesses after patterning, a plurality of receiving openings H (shown in FIG. 3B) are formed in a region where the thickness D2 is thin. The black light absorbing layer 110 having a plurality of receiving openings H is the light absorbing layer 106 and the retaining wall structure 108 described above.
由於本實施例之光吸收層106與擋牆結構108係為一 體成形的,具有較高的機械強度,因此本實施例之畫素陣列基板100於後續製程或信賴性測試(reliability test)中不易發生光吸收層106與擋牆結構108剝離(peeling)的問題。另外,由於光吸收層106與擋牆結構108是在同一道光罩製程中一併製成的,因此本實施例之畫素陣列基板100亦無傳統畫素陣列基板中光吸收層106與擋牆結構108對位的問題。在本實施例中,光吸收層106與擋牆結構108係採用相同材料(如黑色樹脂)以同一道光罩一起製作的。因此,本實施例之畫素陣列基板100可較傳統畫素陣列基板省去一道光罩的製作成本及時間,進而降低本實施例之畫素陣列基板100的製作成本。 Since the light absorbing layer 106 and the retaining wall structure 108 of the embodiment are one The formed body has a high mechanical strength, so the pixel array substrate 100 of the present embodiment is less prone to peeling of the light absorbing layer 106 and the retaining wall structure 108 in a subsequent process or reliability test. . In addition, since the light absorbing layer 106 and the retaining wall structure 108 are formed together in the same reticle process, the pixel array substrate 100 of the present embodiment also has no light absorbing layer 106 and a retaining wall in the conventional pixel array substrate. The problem of structure 108 alignment. In the present embodiment, the light absorbing layer 106 and the retaining wall structure 108 are made of the same material using the same material (such as black resin). Therefore, the pixel array substrate 100 of the present embodiment can save the manufacturing cost and time of a photomask compared with the conventional pixel array substrate, thereby reducing the manufacturing cost of the pixel array substrate 100 of the embodiment.
圖4為本發明一實施例之反射式顯示面板剖面示意圖。本實施例之反射式顯示面板1000包括上述之畫素陣列基板100、對向基板200以及顯示介質300。對向基板200對向於畫素陣列基板100,並與擋牆結構108連接以封閉這些容納開口H,而顯示介質300係被封存於這些容納開口H中。在本實施例中,對向基板200包括對向基底202及共同電極204,共同電極204位於對向基底202及畫素陣列基板100之間。當共同電極204與畫素電極PX間具有一電位差時,位於容納開口H的顯示介質300會被驅動,進而使本實施例之反射式顯示面板1000可顯示多種畫面。當然,在其他實施例中,對向基板200更可包括一彩色濾光片(color filter)以使反射式顯示面板可顯示彩色畫面。在本實施例中,顯示介質300可為電泳液及帶電反射 粒子的混合物或膽固醇液晶,但本發明不以此為限。 4 is a cross-sectional view of a reflective display panel in accordance with an embodiment of the present invention. The reflective display panel 1000 of the present embodiment includes the above-described pixel array substrate 100, the opposite substrate 200, and the display medium 300. The opposite substrate 200 is opposed to the pixel array substrate 100, and is connected to the retaining wall structure 108 to close the receiving openings H, and the display medium 300 is sealed in the receiving openings H. In the present embodiment, the opposite substrate 200 includes the opposite substrate 202 and the common electrode 204, and the common electrode 204 is located between the opposite substrate 202 and the pixel array substrate 100. When there is a potential difference between the common electrode 204 and the pixel electrode PX, the display medium 300 located at the receiving opening H is driven, so that the reflective display panel 1000 of the present embodiment can display various screens. Of course, in other embodiments, the opposite substrate 200 may further include a color filter to enable the reflective display panel to display a color picture. In this embodiment, the display medium 300 can be an electrophoresis liquid and a charged reflection A mixture of particles or cholesteric liquid crystal, but the invention is not limited thereto.
綜上所述,在本發明之畫素陣列基板及反射式顯示面板中,由於光吸收層與擋牆結構係為一體成形的,因此本發明之畫素陣列基板及反射式顯示面板於製程或信賴性測試中不易發生光吸收層與擋牆結構剝離的問題。另外,由於光吸收層與擋牆結構係為同一道光罩製程中一併製成的,因此本發明之畫素陣列基板及反射式顯示面板亦無傳統畫素陣列基板中光吸收層與擋牆結構對位的問題。 In summary, in the pixel array substrate and the reflective display panel of the present invention, since the light absorbing layer and the retaining wall structure are integrally formed, the pixel array substrate and the reflective display panel of the present invention are in a process or In the reliability test, the problem of peeling off of the light absorbing layer and the retaining wall structure is less likely to occur. In addition, since the light absorbing layer and the retaining wall structure are formed in the same reticle process, the pixel array substrate and the reflective display panel of the present invention also have no light absorbing layer and retaining wall in the conventional pixel array substrate. The problem of structural alignment.
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,故本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.
100‧‧‧陣列基板 100‧‧‧Array substrate
102‧‧‧基底 102‧‧‧Base
104‧‧‧元件陣列 104‧‧‧Component array
104a‧‧‧元件 104a‧‧‧ components
106‧‧‧光吸收層 106‧‧‧Light absorbing layer
108‧‧‧擋牆結構 108‧‧‧Retaining wall structure
110‧‧‧黑色光吸收層 110‧‧‧Black light absorbing layer
200‧‧‧對向基板 200‧‧‧ opposite substrate
202‧‧‧對向基底 202‧‧‧ opposite base
204‧‧‧共同電極 204‧‧‧Common electrode
300‧‧‧顯示介質 300‧‧‧Display media
1000‧‧‧反射式顯示面板 1000‧‧‧reflective display panel
P‧‧‧畫素區 P‧‧‧Photo District
W‧‧‧擋牆區 W‧‧‧Retaining wall area
K‧‧‧周邊區 K‧‧‧ surrounding area
T‧‧‧主動元件 T‧‧‧ active components
PX‧‧‧畫素電極 PX‧‧‧ pixel electrode
H‧‧‧容納開口 H‧‧‧ accommodation opening
R1、R2、R3‧‧‧區域 R1, R2, R3‧‧‧ areas
D1、D2‧‧‧厚度 D1, D2‧‧‧ thickness
M‧‧‧光罩 M‧‧‧Photo Mask
圖1為本發明一實施例之陣列基板剖面示意圖。 1 is a schematic cross-sectional view of an array substrate according to an embodiment of the present invention.
圖2為本發明一實施例之陣列基板上視示意圖。 2 is a schematic top view of an array substrate according to an embodiment of the invention.
圖3A至圖3B示出本發明一實施例之光吸收層與擋牆結構的製造過程。 3A to 3B illustrate a manufacturing process of a light absorbing layer and a retaining wall structure according to an embodiment of the present invention.
圖4為本發明一實施例之反射式顯示面板剖面示意圖。 4 is a cross-sectional view of a reflective display panel in accordance with an embodiment of the present invention.
100‧‧‧陣列基板 100‧‧‧Array substrate
102‧‧‧基底 102‧‧‧Base
104‧‧‧元件陣列 104‧‧‧Component array
104a‧‧‧元件 104a‧‧‧ components
106‧‧‧光吸收層 106‧‧‧Light absorbing layer
108‧‧‧擋牆結構 108‧‧‧Retaining wall structure
P‧‧‧畫素區 P‧‧‧Photo District
W‧‧‧擋牆區 W‧‧‧Retaining wall area
K‧‧‧周邊區 K‧‧‧ surrounding area
T‧‧‧主動元件 T‧‧‧ active components
PX‧‧‧畫素電極 PX‧‧‧ pixel electrodes
H‧‧‧容納開口 H‧‧‧ accommodation opening
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