TW201205176A - Electrophoretic display panel and fabricating method of the same - Google Patents

Electrophoretic display panel and fabricating method of the same Download PDF

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TW201205176A
TW201205176A TW99125130A TW99125130A TW201205176A TW 201205176 A TW201205176 A TW 201205176A TW 99125130 A TW99125130 A TW 99125130A TW 99125130 A TW99125130 A TW 99125130A TW 201205176 A TW201205176 A TW 201205176A
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electrophoretic display
display panel
light shielding
shielding layer
layer
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TW99125130A
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Chinese (zh)
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TWI407230B (en
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Yen-Shih Lin
Chia-Chiang Hsiao
Chih-Wen Chen
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Au Optronics Corp
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Abstract

An electrophoretic display panel including an array substrate, a light shielding layer, an opposite substrate and an electrophoretic display medium is provided. The light shielding layer is disposed on the array substrate and has an optical density larger than 1.5. The opposite substrate is disposed above the array substrate. The electrophoretic display medium is disposed between the light shielding layer and the opposite substrate.

Description

201205176201205176

AU0912128 34652twf.doc/I 六、發明說明: 【發明所屬之技術領域】 本發明是有關於一種顯示面板及其製造方法,且特別是 有關於一種電泳顯示面板及其製造方法。 【先前技術】 近年來,由於各種顯示技術不斷地蓬勃發展,在經過持 續地研究開發之後,如電泳顯示器、液晶顯示器、電漿顯示 器、有機發光二極體顯示器等產品,已逐漸地商業化並應用 於各種尺寸以及各種面積的顯示裝置。隨著可攜式電子^品 的曰益普及,可撓性顯示器(如電子紙(e_paper)、電子書 (e_bo〇k)等)已逐漸受到市場的關注。一般而言,電子紙 (_e-paper)以及電子書(e_b00k)係採用電泳顯示技^來達到顯 不之目的。以顯示黑白的電子書為例,其子畫素主要是由奪 色電泳液以及摻於黑色電泳液中的白色帶電粒子所構^^ 過施加電壓的方式可以驅動白色帶電粒子移動,以使各個晝 素分別顯示黑色、白色或是不同階調的灰色。 在現有技術中,電泳顯示衫半是_外界光源的反射 來達成顯示之目的,而透過電壓驅動摻於電泳液中的白色帶 電粒子可以使各個子畫素顯示出所需的灰階。一般而古,電 冰顯示器主要是由一薄膜電晶體陣列基板'一電泳顯;介質 以及一點著層所構成,其中電泳顯示介質包括定義出微杯妗 構的圖案化介電層、微杯結構(micro-cups)以及位於微杯辞& 201205176AU0912128 34652twf.doc/I VI. Description of the Invention: [Technical Field] The present invention relates to a display panel and a method of fabricating the same, and more particularly to an electrophoretic display panel and a method of fabricating the same. [Prior Art] In recent years, as various display technologies continue to flourish, products such as electrophoretic displays, liquid crystal displays, plasma displays, and organic light-emitting diode displays have been gradually commercialized after continuous research and development. It is applied to display devices of various sizes and various areas. With the popularity of portable electronic products, flexible displays (such as e-paper, e_bo〇k, etc.) have gradually gained market attention. In general, electronic paper (_e-paper) and e-book (e_b00k) use electrophoretic display technology to achieve the purpose. Taking an e-book showing black and white as an example, the sub-pixels are mainly driven by the color-retaining electrophoresis liquid and the white charged particles doped in the black electrophoresis liquid to drive the white charged particles to move. The alizarin shows black, white, or gray of different tones. In the prior art, the electrophoretic display half is the reflection of the external light source for the purpose of display, and the white charged particles doped by the electrophoresis liquid by the voltage driving can cause the respective sub-pixels to display the desired gray scale. Generally, the electric ice display is mainly composed of a thin film transistor array substrate, an electrophoretic display, a medium and a layer, wherein the electrophoretic display medium comprises a patterned dielectric layer defining a microcup structure and a microcup structure. (micro-cups) and located in the micro-cups & 201205176

AU0912128 34652twf.doc/IAU0912128 34652twf.doc/I

中的電泳液與帶電粒子,黏著相以接合賴電晶體陣列基 板與電泳顯示介質。在電泳顯示H中,雑電泳液通常可以 吸收外界光源以避免外界光源進入薄膜電晶體陣列基板,然 而電泳液無法完全地吸收外界先源,因而有部分外界光源會 穿過電泳顯示介質中的圖案化介電層或電泳液而照射於薄 膜電晶體陣列基板上之薄膜電晶體上。如此一來,使得電泳 顯不器具有較差的對比度,且致使薄膜電晶體產生光電流 (photo current)而影響元件特性,進而導致電泳顯示器的顯示 品質不佳。 因此,有人提出使用諸如氰基丙烯酸酯膠等深色熱固化 (thenn〇-curable)黏膠來接合薄膜電晶體陣列基板與電泳顯示 介質,以抵擋外界光源。然而,氰基丙烯酸酯膠等深色熱固 化黏膠的穿透率約30%、厚度為4um(微米)以上,因此要提升 光學密度(optical density)需再增加膠材厚度。如此一來,限 制了黏膠材料的選擇,!·生並導致電泳顯示器的整體厚度^ =,且這些黏膠材料的使用仍未能達到令人滿意的遮光^ ’如何降低外界光源所導致的對比度不良以及光 已成為此領域亟待解決的問題之一。 因此 流問題, 【發明内容】 本發明提供一種電泳顯示面板及其形成方 比度且具有較佳的顯示品f。 4升對 本發明提出一種電泳顯示面板,其包括一陣列基板、 5 201205176The electrophoresis fluid and the charged particles are adhered to each other to bond the Lai transistor array substrate to the electrophoretic display medium. In the electrophoretic display H, the bismuth electrophoresis liquid can usually absorb the external light source to prevent the external light source from entering the thin film transistor array substrate. However, the electrophoresis liquid cannot completely absorb the external source, and thus some external light sources can pass through the pattern in the electrophoretic display medium. The dielectric layer or the electrophoresis liquid is irradiated onto the thin film transistor on the thin film transistor array substrate. As a result, the electrophoretic display has poor contrast and causes the photo transistor to generate a photo current which affects the characteristics of the device, resulting in poor display quality of the electrophoretic display. Therefore, it has been proposed to use a dark-curable adhesive such as cyanoacrylate glue to bond a thin film transistor array substrate and an electrophoretic display medium to withstand an external light source. However, a dark thermosetting adhesive such as a cyanoacrylate adhesive has a transmittance of about 30% and a thickness of 4 μm or more. Therefore, it is necessary to increase the thickness of the adhesive to increase the optical density. As a result, the choice of adhesive materials is limited, and the overall thickness of the electrophoretic display is reduced, and the use of these adhesive materials still fails to achieve satisfactory shading. 'How to reduce the external light source Poor contrast and light have become one of the problems in this area. Therefore, the flow problem, the present invention provides an electrophoretic display panel and a form thereof, and has a preferred display article f. 4 liter pair The present invention provides an electrophoretic display panel comprising an array substrate, 5 201205176

AU0912128 34652twf.doc/I 遮光層、一對向基板以及一電泳顯示介質。遮光層配置於陣 列基板上’且遮光層的光學密度(0ptical density)高於1.5。對 向基板配置於陣列基板上方。電泳顯示介質配置於遮光層與 對向基板之間。 、 本發明另提出一種電泳顯示面板的製造方法,包括以下 步驟。提供一陣列基板。於陣列基板上形成一遮光層。提供 一對向基板,對向基板包括一共通電極。形成一電泳顯示介 ^於對向基板上。利用一黏著層使遮光層與電泳顯示介質黏 著’其中電泳顯示介質位於遮光層與對向基板之間。 本發明提出另一種電泳顯示面板的製造方法,包括以下 步驟。提供一陣列基板。於陣列基板上依序形成一遮光層以 及電泳顯示介質。提供一對向基板’對向基板包括一共通 電極。利用一黏著層使對向基板與電泳顯示介質黏著,其中 電泳顯示介質位於陣列基板與對向基板之間。 基於上述’本發明之電泳顯示面板包括遮光層,遮光層 能阻擋外界光源進入陣列基板。如此一來,電泳顯示面板具 有較佳的對比度且能避免陣列基板發生光漏電流問題,以提 升電泳顯示面板的顯示品質。 為讓本發明之上述特徵和優點能更明顯易懂,下文特舉 實施例,並配合所附圖式作詳細說明如下。 【實施方式】 圖1為本發明之一實施例的一種電泳顯示面板的剖面示 意圖。請參照圖1,電泳顯示面板1〇〇包括一陣列基板11〇 ' 201205176AU0912128 34652twf.doc/I Light shielding layer, a pair of substrates and an electrophoretic display medium. The light shielding layer is disposed on the array substrate' and the optical density of the light shielding layer is higher than 1.5. The opposite substrate is disposed above the array substrate. The electrophoretic display medium is disposed between the light shielding layer and the opposite substrate. The invention further provides a method for manufacturing an electrophoretic display panel, comprising the following steps. An array substrate is provided. A light shielding layer is formed on the array substrate. A pair of substrates is provided, and the opposite substrate includes a common electrode. An electrophoretic display is formed on the opposite substrate. The light shielding layer is adhered to the electrophoretic display medium by an adhesive layer, wherein the electrophoretic display medium is located between the light shielding layer and the opposite substrate. The present invention proposes another method of manufacturing an electrophoretic display panel, comprising the following steps. An array substrate is provided. A light shielding layer and an electrophoretic display medium are sequentially formed on the array substrate. Providing a pair of substrates 'opposing substrates includes a common electrode. The opposite substrate is adhered to the electrophoretic display medium by an adhesive layer, wherein the electrophoretic display medium is located between the array substrate and the opposite substrate. The electrophoretic display panel based on the above invention comprises a light shielding layer which blocks an external light source from entering the array substrate. In this way, the electrophoretic display panel has better contrast and can avoid the problem of light leakage current of the array substrate, so as to improve the display quality of the electrophoretic display panel. The above described features and advantages of the invention will be apparent from the following description. [Embodiment] FIG. 1 is a cross-sectional view showing an electrophoretic display panel according to an embodiment of the present invention. Referring to FIG. 1, the electrophoretic display panel 1 includes an array substrate 11 ' 201205176

AU0912128 34652twf.doc/I 一遮光層130、一對向基板140以及一電泳顯示介質150。在 本實施例中,陣列基板110與對向基140板例如是可撓性基 板,因此電泳顯示面板100例如是可撓性顯示面板。陣列基 板110例如是主動元件陣列基板,其包括基板112以及配置於 基板112上的多個主動元件114與多個晝素電極128,且畫素 電極128與主動元件114電性連接。主動元件114例如是薄膜 電晶體,且主動元件114主要是由閘極116、一覆蓋閘極116 •的閘絕緣層118、一位於閘極116上方之通道層120、源極122S 與汲極122D、一覆蓋源極122S與汲極122D的絕緣層124以及 一保護層126所構成’其中閘極116以及源極1225分別與掃描 線(未繪示)以及資料線(未繪示)電性連接,晝素電極128透過 絕緣層124與保護層128的開口與汲極122D電性連接》 遮光層130配置於陣列基板11〇上,且遮光層13〇例如是 全面性覆蓋於陣列基板11〇上。在本實施例中,遮光層13〇例 如是包括一黑矩陣層,其材料例如是包括光固化型樹脂、金 • 屬或上述之組合。值得注意的是,前述之光固化型樹脂例如 為具有羥基、羧基、胺基等反應性取代基之感光性高分子樹 脂添加遮光色素載體,或具有齡基、環氧基等反應性取代基 之(曱基)_酸化合物或具有雜酸反應之曱基丙婦酿基、 苯乙婦基等歧雜基之高分子樹脂添加遮光色素載體,其 中遮光色素載體騎機或無機顏料,例如為碳黑、苯胺黑、 該系f色顏料、花系黑色顏料等混和物。在另-實施例 中,而則述之金屬例如為鉻。遮光層130的光學密度例如是 201205176AU0912128 34652twf.doc/I A light shielding layer 130, a pair of substrates 140, and an electrophoretic display medium 150. In the present embodiment, the array substrate 110 and the opposite substrate 140 are, for example, flexible substrates, and thus the electrophoretic display panel 100 is, for example, a flexible display panel. The array substrate 110 is, for example, an active device array substrate, and includes a substrate 112 and a plurality of active elements 114 and a plurality of halogen electrodes 128 disposed on the substrate 112, and the pixel electrodes 128 are electrically connected to the active elements 114. The active device 114 is, for example, a thin film transistor, and the active device 114 is mainly composed of a gate 116, a gate insulating layer 118 covering the gate 116, a channel layer 120 above the gate 116, a source 122S and a drain 122D. An insulating layer 124 covering the source 122S and the drain 122D and a protective layer 126 are formed. The gate 116 and the source 1225 are respectively electrically connected to a scan line (not shown) and a data line (not shown). The halogen electrode 128 is electrically connected to the opening of the protective layer 128 and the gate 122D through the insulating layer 124. The light shielding layer 130 is disposed on the array substrate 11A, and the light shielding layer 13 is covered on the array substrate 11 for example. . In the present embodiment, the light shielding layer 13 includes, for example, a black matrix layer, and the material thereof includes, for example, a photocurable resin, a metal, or a combination thereof. It is to be noted that the photocurable resin is, for example, a light-shielding dye carrier added to a photosensitive polymer resin having a reactive substituent such as a hydroxyl group, a carboxyl group or an amine group, or a reactive substituent such as an alkali group or an epoxy group. (曱基)_ an acid compound or a polymer resin having a hetero acid-reactive sulfhydryl-glycolyl group, a phenethyl group or the like, and a light-shielding pigment carrier, wherein the light-shielding pigment carrier rides or an inorganic pigment such as carbon A mixture of black, aniline black, the f-color pigment, and the black pigment of the flower. In another embodiment, the metal described is, for example, chromium. The optical density of the light shielding layer 130 is, for example, 201205176

AU0912128 34652twf.doc/I 高於1.5,且遮光層130之厚度例如是小於4um。在本實施例 中,遮光層130的穿透率例如是低於3%,也就是說遮光層130 具有高遮光特性,因而能有效阻擋外界光源進入陣列基板 110。 電泳顯示介質150配置於遮光層130與對向基板140之 間。在本實施例中,電泳顯示介質15〇例如是包括一微杯結 構152、一電泳液154、多個帶電粒子156以及一封合層158。 電泳液154位於微杯結構152内。帶電粒子156分佈於電泳液 154中。封合層158與微杯結構152接合,以將電泳液154與帶 電粒子156封合於微杯結構152内。在本實施例中,微杯結構 152的材料例如是介電材料。封合層158的材料例如是環氧樹 脂。電泳液154例如是黑色電泳液,帶電粒子156例如是白色 帶電粒子,當然,在其他實施例中,電泳液154與帶電粒子 156也可以具有其他顏色。特別注意的是,雖然在本實施例 =是以電減示介質15G具有絲的結構為例,但電泳顯 示面板1GG巾的f泳顯示介質15〇可以具有其他結構'再者, 雖然圖1是將主動元件114與微杯結構152㈣為—對一的搭 配形式,但實質上動元件114與微杯結構152可能為多對一的 搭配形式。H本發縣對電賴*面板刚中的電泳 f示介f 15G加錄制,奴_介質是任何適用於 電泳顯不面板的電泳顯示介質。 對向基板140配置於陣列基板11〇上方。在本實施例中, 對向基板140包括一基板142斑 'a j. 双%輿一共通電極144。基板142例如 201205176AU0912128 34652twf.doc/I is higher than 1.5, and the thickness of the light shielding layer 130 is, for example, less than 4 um. In the present embodiment, the transmittance of the light shielding layer 130 is, for example, less than 3%, that is, the light shielding layer 130 has a high light shielding property, thereby effectively blocking the external light source from entering the array substrate 110. The electrophoretic display medium 150 is disposed between the light shielding layer 130 and the opposite substrate 140. In the present embodiment, the electrophoretic display medium 15 includes, for example, a microcup structure 152, an electrophoretic fluid 154, a plurality of charged particles 156, and a tie layer 158. Electrophoresis fluid 154 is located within microcup structure 152. Charged particles 156 are distributed in the electrophoresis fluid 154. Sealing layer 158 is bonded to microcup structure 152 to seal electrophoretic fluid 154 and charged particles 156 within microcup structure 152. In the present embodiment, the material of the microcup structure 152 is, for example, a dielectric material. The material of the sealing layer 158 is, for example, an epoxy resin. The electrophoresis liquid 154 is, for example, a black electrophoresis liquid, and the charged particles 156 are, for example, white charged particles. Of course, in other embodiments, the electrophoresis liquid 154 and the charged particles 156 may have other colors. It is to be noted that although in the present embodiment, the structure in which the electro-deduction medium 15G has a filament is taken as an example, the f-swivel display medium 15 of the electrophoretic display panel 1GG may have other structures 'again, although FIG. 1 is The active element 114 and the microcup structure 152(4) are in the form of a one-to-one combination, but substantially the dynamic element 114 and the microcup structure 152 may be in a many-to-one combination. H Benfa County's electrophoresis in the panel of the electric Lai* panel f 15G plus recording, slave_media is any electrophoretic display medium suitable for electrophoretic display panel. The counter substrate 140 is disposed above the array substrate 11A. In the present embodiment, the opposite substrate 140 includes a substrate 142 spot 'a j. double % 舆 a common electrode 144. Substrate 142 such as 201205176

AU0912128 34652twf.doc/I 是具有可撓性,其例如是一聚碳酸醋(p〇lyCarb〇nate,pc)基 板或是一聚酯(polyester,PET)基板《共通電極144的材料 例如是透明金屬,諸如銦錫氧化物。 在本實施例中,電泳顯示面板100更包括一黏著層16(^ 黏著層160例如是黏著於遮光層13〇與電泳顯示介質15〇之 間,且特別是黏著於遮光層130與封合層158之間,以接合陣 列基板110與電泳顯示介質150。換言之,陣列基板11〇與電 • 泳顯示介質150藉由黏著層160彼此接合。在本實施例中,黏 著層160例如是透明材料或不透明材料,其中透明材料包括 諸如聚丙烯酸酯等材料。特別是,黏著層16〇的厚度例如是 2um 〇 在本實施例中,電泳顯示面板1〇〇包括遮光層13〇,遮光 層130配置於陣列基板11〇與電泳顯示介質15〇之間,以阻擒 外界光源經由電泳顯示介質150進入陣列基板丨1〇 ^如此一 來,能避免外界光源照射於陣列基板110之主動元件114上而 φ 發生光漏電流等問題使得主動元件Π4具有較佳的元件特 性。再者,由於遮光層130能有效地阻擋外界光源,因此可 增加暗態吸光效率而大幅提高電泳顯示面板1〇〇的對比度。 此外,由於電泳顯示面板100是以遮光層13〇作為主要阻g外 界光源的膜層,因此遮光性不是黏著層16〇在材料選擇^的 重要考量因素,故黏著層160可以是透明材料且可以具有較 小的厚度’換言之’遮光層U0的設置增力口了黏著層⑽ 料的可選擇性且大幅縮減黏著層160的厚度。特別是,由於 201205176AU0912128 34652twf.doc/I is flexible, such as a polycarbonate (PC) substrate or a polyester (PET) substrate. The material of the common electrode 144 is, for example, a transparent metal. , such as indium tin oxide. In this embodiment, the electrophoretic display panel 100 further includes an adhesive layer 16 (eg, the adhesive layer 160 is adhered between the light shielding layer 13 〇 and the electrophoretic display medium 15 ,, and particularly adhered to the light shielding layer 130 and the sealing layer. Between the 158, the array substrate 110 and the electrophoretic display medium 150 are bonded. In other words, the array substrate 11 and the electrophoretic display medium 150 are bonded to each other by the adhesive layer 160. In the embodiment, the adhesive layer 160 is, for example, a transparent material or An opaque material, wherein the transparent material comprises a material such as polyacrylate. In particular, the thickness of the adhesive layer 16 is, for example, 2 um. In the present embodiment, the electrophoretic display panel 1 〇〇 includes a light shielding layer 13 〇, and the light shielding layer 130 is disposed at Between the array substrate 11A and the electrophoretic display medium 15〇, the external light source is prevented from entering the array substrate via the electrophoretic display medium 150, so that the external light source can be prevented from being irradiated onto the active device 114 of the array substrate 110. Problems such as occurrence of light leakage current cause the active element Π 4 to have better element characteristics. Furthermore, since the light shielding layer 130 can effectively block external light sources, it can be increased. The state of light absorption efficiency greatly improves the contrast of the electrophoretic display panel. Further, since the electrophoretic display panel 100 is a film layer which is mainly used to block the external light source, the light shielding property is not the adhesive layer 16〇 in the material selection^ An important consideration is that the adhesive layer 160 can be a transparent material and can have a small thickness. In other words, the setting of the light-shielding layer U0 enhances the thickness of the adhesive layer (10) and selectively reduces the thickness of the adhesive layer 160. Yes, due to 201205176

AU0912128 34652twf.doc^I 遮光層130通常具有較大的光學密度,因此在較小的厚度下 就能達到良好的遮光效果與較小的穿透率。因此,本實施例 之電泳顯示面板具有良好的顯示品質且具有較小的整體厚 度,以符合消費者對於顯示面板之要求。 圖2A至圖2C為本發明之一實施例的一種電泳顯示面板 的製造方法的流程示意圖,其中電泳顯示面板的構件及材料 可以參照前一實施例中所述,於此不詳述。請參照圖2A,首 先,提供一陣列基板110〇接著,於陣列基板11〇上形成一遮 光層130。在本實施例中,陣列基板11〇例如是一主動元件陣 列基板,其詳細結構可以參照圖丨及其相關敘述。遮光層13〇 例如疋一黑矩陣層,其形成方法例如是先以旋塗法於陣列基 板110的晝素電極128上形成一整層的黑矩陣材料層(未繪 示)’以覆蓋陣列基板110,再以諸如紫外光等光線照射黑矩 陣材料層,使其固化成遮光層130。其中,遮光層13〇的材料 ,如是包括光固化型樹脂、金屬或上述之組合。值得注意的 是’前述之光固化型樹脂例如為具有羥基、羧基、胺基等反 應性取代基之感光性高分子樹脂添加遮光色素載體,或具有 搭基、環氧基等反應性取代基之(曱基)丙絲化合物或具有 肉桂酸反應之曱基丙烯醯基、笨乙烯基等光交聯性基之高分 子樹脂添加遮光色素紐,其巾遮光色素載體為有機或益機 顏料’例如為碳黑、笨胺黑、蒽_'黑色顏料1系黑色顏 料等混和物,而前述之金屬例如為絡。遮光層⑽的光學密 度例如是高於1.5。在本實施例中,遮光層⑽之厚度例如是 201205176AU0912128 34652twf.doc^I The light-shielding layer 130 generally has a large optical density, so that a good light-shielding effect and a small transmittance can be achieved at a small thickness. Therefore, the electrophoretic display panel of the present embodiment has good display quality and a small overall thickness to meet the requirements of the consumer for the display panel. 2A to 2C are schematic flowcharts of a method for manufacturing an electrophoretic display panel according to an embodiment of the present invention. The components and materials of the electrophoretic display panel can be referred to in the previous embodiment, and are not described in detail herein. Referring to FIG. 2A, first, an array substrate 110 is provided, and then a light shielding layer 130 is formed on the array substrate 11A. In the present embodiment, the array substrate 11 is, for example, an active device array substrate, and its detailed structure can be referred to the drawings and related descriptions. The light shielding layer 13 is formed, for example, by a black matrix layer, and is formed by, for example, forming a whole layer of a black matrix material layer (not shown) on the halogen electrode 128 of the array substrate 110 by spin coating to cover the array substrate. 110. The black matrix material layer is irradiated with light such as ultraviolet light to form a light shielding layer 130. The material of the light shielding layer 13 is, for example, a photocurable resin, a metal or a combination thereof. It is to be noted that the photocurable resin described above is, for example, a light-shielding dye carrier added to a photosensitive polymer resin having a reactive substituent such as a hydroxyl group, a carboxyl group or an amine group, or a reactive substituent such as a substituent or an epoxy group. (a mercapto group) or a polymer resin having a photocrosslinkable group such as a mercaptopropene group having a cinnamic acid reaction or a photocrosslinkable group such as a styryl group, and a shading pigment carrier is used as an organic or probiotic pigment. It is a mixture of carbon black, stupid amine black, 蒽_'black pigment 1 black pigment, and the like, and the aforementioned metal is, for example, a complex. The optical density of the light shielding layer (10) is, for example, higher than 1.5. In this embodiment, the thickness of the light shielding layer (10) is, for example, 201205176.

AU0912128 34652twf.doc/I 小羚4um,且遮光層i3〇的穿透率例如是低於3% β 請參照圖2Β,然後,提供一對向基板14〇,對向基板14〇 包括一共通電極144。在本實施例中,對向基板14〇的製作方 法例如是在基板142上形成共通電極144。其中,基板ία的 材料例如是聚酯,共通電極144的材料例如是透明金屬,例 如如銦錫氧化物。 而後,形成一電泳顯示介質150於對向基板14〇上。在本 實施例中’電泳顯示介質150例如是形成於共通電極144上, 且其形成步驟如下。首先,形成一微杯結構152於共通電極 144上,此步驟例如是於共通電極144上形成一介電材料層(未 繪示)’然後對介電材料層進行微影蝕刻製程以將介電材料層 圖案化成微杯結構152。接著,填充電泳液154於微杯結構152 内,電泳液154例如是黑色電泳液。然後,分佈多個帶電粒 子156於電泳液154中,帶電粒子156例如是白色帶電粒子。 接著,利用一封合層158將電泳液154與帶電粒子156封合於 微杯結構152内。其中’封合層158的紂料例如是環氧 , 其形成方法例如是光固化或熱固化。 6奮參照圖2C,然後,利用一黏著層160使遮光層與電 泳顯示介質150黏著,其中電泳顯示介質15〇位於遮光層'13〇 與對向基板140之間。換言之,在本實施例中,藉由黏著層 160使圖2Α之位於陣列基板11〇上的遮光層13〇與圖2Β之位二 對向基板140上的電泳顯示介質150接合,以接合陣列基板 110與對向基板14〇並形成電泳顯示面板1〇〇。黏著層16〇例如 201205176AU0912128 34652twf.doc/I The gazelle 4um, and the transmittance of the light-shielding layer i3〇 is, for example, less than 3% β. Referring to FIG. 2Β, then, the opposite substrate 14〇 is provided, and the opposite substrate 14 includes a common electrode. 144. In the present embodiment, the counter substrate 14 is formed by, for example, forming a common electrode 144 on the substrate 142. The material of the substrate ία is, for example, polyester, and the material of the common electrode 144 is, for example, a transparent metal such as, for example, indium tin oxide. Then, an electrophoretic display medium 150 is formed on the opposite substrate 14 . In the present embodiment, the electrophoretic display medium 150 is formed, for example, on the common electrode 144, and its formation step is as follows. First, a microcup structure 152 is formed on the common electrode 144. For example, a dielectric material layer (not shown) is formed on the common electrode 144. Then, a dielectric etching process is performed on the dielectric material layer to dielectrically. The material layer is patterned into a microcup structure 152. Next, the electrophoresis liquid 154 is filled in the microcup structure 152, and the electrophoresis liquid 154 is, for example, a black electrophoresis liquid. Then, a plurality of charged particles 156 are distributed in the electrophoresis liquid 154, and the charged particles 156 are, for example, white charged particles. Next, the electrophoretic fluid 154 and the charged particles 156 are sealed in the microcup structure 152 by a layer 158. The material of the 'sealing layer 158' is, for example, an epoxy, which is formed, for example, by photocuring or heat curing. Referring to Figure 2C, the light-shielding layer is then adhered to the electrophoretic display medium 150 by an adhesive layer 160, wherein the electrophoretic display medium 15 is positioned between the light-shielding layer '13' and the opposite substrate 140. In other words, in the present embodiment, the light shielding layer 13 on the array substrate 11A of FIG. 2 is bonded to the electrophoretic display medium 150 on the opposite substrate 140 of FIG. 2 by the adhesive layer 160 to bond the array substrate. 110 and the opposite substrate 14 are formed and an electrophoretic display panel 1 is formed. Adhesive layer 16 such as 201205176

AU0912128 34652twf.doc/I 是包括諸如聚丙婦酸醋等透明材料,其形成方法例如是以加 熱並滾壓的方式貼合,且其厚度例如是2um。特別注意的 是’雖然在本實施例中是以電泳顯示介質15〇具有圖2B所示 的結構為例,但電泳顯示面板1〇〇中的電泳顯示介質15〇可以 具有其他結構。 在本實施例中’是先於對向基板140上形成電泳顯示介 質150,再利用黏著層160接合陣列基板11〇與電泳顯示介質 150 ’以形成電泳顯示面板100。特別是,在接合陣列基板ιι〇 # 與電泳顯示介質150以前,已於陣列基板11〇上形成"遮光層 1一30。因此’在電泳顯示面板100中,陣列基板11〇與電泳顯 示介質150之間配置有遮光層130 ’以有效地阻擋外界光源經 由電泳顯示介質150進入陣列基板11(^如此一來,能避免外 界光源照射於陣列基板110之主動元件114上而發生光漏電 流等問題,使得主動元件114具有較佳的元件特性。再者, 由於遮光層130能有效地阻擋外界光源,因此可增加暗態吸 光效率而大幅提高電泳顯示:面板100的辦比度。此外,=於 電泳顯示面板100是以遮光層130作為主要阻擋外界光源=· 膜層,因此遮光性不是黏著層160在材料選擇上的重要考量 因素,故黏著層160可以是透明材料且可以具有較小的= 度,換言之,遮光層130的設置增加了黏著層16〇之材料的可 選擇性且大幅縮減黏著層16〇的厚度。特別是’由於遮 130通常具有較大的光學紐,@此錄小的厚度下就能^ 到良好的遮光效果與較小的穿透率。因此,本實施例之=泳 12 201205176AU0912128 34652twf.doc/I is a transparent material including, for example, polyacrylic acid vinegar, which is formed by, for example, heating and rolling, and has a thickness of, for example, 2 μm. It is to be noted that although the electrophoretic display medium 15 has the structure shown in Fig. 2B as an example in the present embodiment, the electrophoretic display medium 15 in the electrophoretic display panel 1 can have other structures. In the present embodiment, the electrophoretic display medium 150 is formed on the opposite substrate 140, and the array substrate 11 and the electrophoretic display medium 150' are bonded by the adhesive layer 160 to form the electrophoretic display panel 100. In particular, before the array substrate ιι〇 # and the electrophoretic display medium 150 are bonded, the "shading layer 1-30 is formed on the array substrate 11'. Therefore, in the electrophoretic display panel 100, a light shielding layer 130' is disposed between the array substrate 11A and the electrophoretic display medium 150 to effectively block the external light source from entering the array substrate 11 via the electrophoretic display medium 150 (^ such that the outside can be avoided The light source is irradiated on the active device 114 of the array substrate 110 to cause problems such as light leakage current, so that the active device 114 has better component characteristics. Furthermore, since the light shielding layer 130 can effectively block the external light source, the dark state light absorption can be increased. The efficiency of the electrophoretic display is greatly improved: the ratio of the panel 100. In addition, in the electrophoretic display panel 100, the light shielding layer 130 is used as a main blocking external light source = film layer, so the light shielding property is not important for the material selection of the adhesive layer 160. Considering the factors, the adhesive layer 160 may be a transparent material and may have a small degree. In other words, the arrangement of the light shielding layer 130 increases the selectivity of the material of the adhesive layer 16〇 and greatly reduces the thickness of the adhesive layer 16〇. It is 'Because the cover 130 usually has a large optical button, @ this record can achieve a good shading effect and a small penetration. Therefore, the present embodiment of the swimming = 12,201,205,176

AU0912128 34652twf.doc/I 顯示面板具有良好的顯示品質且能夠具有較小的整體厚 度’以符合消費者對於顯示面板之要求。 圖3為本發明之-實施觸-種電泳顯示面板的剖面示 意圖,其中圖3之電泳顯示面板100&的構件與圖〖之電泳顯示 面板10G⑽件大致㈣’目此町針對€泳顯示面板隐 之構件的配置方式來說明,至於構件的材料則可泉昭前一實 施例中所述,於此不贅述。請參照圖3 ’電泳顯示面板應 包括一陣列基板110、一遮光層130、一電泳顯示介質15〇、 一對向基板140以及一黏著層16〇。遮光層13〇配置於陣列基 板110上。對向基板140配置於陣列基板11〇上方。電泳顯示 介質150配置於遮光層130與對向基板140之間。黏著層16〇例 如是黏著於對向基板140與電泳顯示介質150之間。其中,陣 列基板110與對向基板140的結構可以參照前一實^例中所 述’於此不贅述。 在本實施例中’電泳顯示介質150例如是包括一微杯結 構152、位於微杯結構.15.2内的一電泳液1.54、分佈於電泳液 154中的多個帶電粒子156以及一封合層158。其中,微杯結 構152的開口例如是朝向對向基板14〇,因此封合層158例如 是配置於黏著層160與微杯結構152之間,以與微杯結構152 接合,並將電泳液154與帶電粒子156封合於微杯結構152 内。也就是說’在本實施例中,微杯結構152與封合層158例 如是依序且直接地配置於遮光層130上’使遮光層130與微杯 結構152直接接觸。此外,黏著層160例如是黏著於對向基板 13 201205176AU0912128 34652twf.doc/I The display panel has good display quality and can have a small overall thickness to meet consumer requirements for display panels. 3 is a schematic cross-sectional view of a touch-type electrophoretic display panel of the present invention, wherein the components of the electrophoretic display panel 100 of FIG. 3 and the electrophoretic display panel 10G (10) of the figure are substantially (four)' The arrangement of the components will be described. The material of the components can be described in the previous embodiment, and will not be described herein. Referring to FIG. 3, the electrophoretic display panel should include an array substrate 110, a light shielding layer 130, an electrophoretic display medium 15A, a pair of substrates 140, and an adhesive layer 16A. The light shielding layer 13 is disposed on the array substrate 110. The counter substrate 140 is disposed above the array substrate 11A. The electrophoretic display medium 150 is disposed between the light shielding layer 130 and the opposite substrate 140. The adhesive layer 16 is, for example, adhered between the opposite substrate 140 and the electrophoretic display medium 150. The structure of the array substrate 110 and the opposite substrate 140 can be referred to in the previous embodiment, and will not be described herein. In the present embodiment, the electrophoretic display medium 150 includes, for example, a microcup structure 152, an electrophoresis liquid 1.54 located in the microcup structure. 15.2, a plurality of charged particles 156 distributed in the electrophoresis liquid 154, and a layer 158. . The opening of the microcup structure 152 is, for example, facing the opposite substrate 14 , so that the sealing layer 158 is disposed between the adhesive layer 160 and the microcup structure 152, for example, to engage with the microcup structure 152, and the electrophoresis liquid 154 The charged particles 156 are enclosed within the microcup structure 152. That is, in the present embodiment, the microcup structure 152 and the sealing layer 158 are disposed, for example, sequentially and directly on the light shielding layer 130, so that the light shielding layer 130 is in direct contact with the microcup structure 152. In addition, the adhesive layer 160 is adhered, for example, to the opposite substrate 13 201205176

AU0912128 34652twfdoc/I HO與封合層158之間,以接合對向基板140與電泳顯示介質 150,進而接合對向基板14〇與陣列基板11〇。黏著層16〇例如 是包括透明材料,諸如聚丙烯酸酯,其厚度例如是2um。特 別注意的是,雖然在本實施例中是以具有如圖3所示之結構 的電泳顯示介質150為例,但電泳顯示介質150可以具有其他 結構,本發明未加以限制。 在本實施例中’遮光層130配置於陣列基板11〇上’且遮 光層130例如是全面性覆蓋於陣列基板11〇上。在本實施例 中,遮光層130例如是包括一黑矩陣層,其材料例如是包括 光固化型樹脂、金屬或包含上述兩者之混合物。值得注意的 是,前述之光固化型樹脂例如為具有羥基、羧基、胺基等反 應性取代基之感光性高分子樹脂添加遮光色素載體,或具有 醛基、環氧基等反應性取代基之(甲基)丙烯酸化合物或具有 肉桂酸反應之曱基丙烯醯基、苯乙烯基等光交聯性基之高分 子樹脂添加遮光色素載體’其中遮光色素載體為有機或無機 顏料,例如為碳黑、笨胺黑、蒽醌系黑色顏料、茈系黑色顏 料等混和物,而前述之金屬例如為鉻。遮光層13〇的光學密 度例如是高於1.5,且遮光層130之厚度例如是小於4um。在 本貫施例中,遮光層130的穿透率例如是低於3% ,也就是説 遮光層130具有高遮光特性’因而能有效阻擋外界光源進入 陣列基板110。 在本貫施例中’電泳顯示面板100a包括遮光層130,遮 光層130配置於陣列基板110與電泳顯示介質15〇之間,以阻 14 201205176Between the AU0912128 34652twfdoc/I HO and the sealing layer 158, the counter substrate 140 and the electrophoretic display medium 150 are bonded, and the counter substrate 14A and the array substrate 11 are bonded. The adhesive layer 16 is, for example, comprised of a transparent material such as a polyacrylate having a thickness of, for example, 2 um. It is to be noted that although the electrophoretic display medium 150 having the structure shown in Fig. 3 is taken as an example in the present embodiment, the electrophoretic display medium 150 may have other structures, which are not limited in the present invention. In the present embodiment, the light shielding layer 130 is disposed on the array substrate 11', and the light shielding layer 130 is entirely covered on the array substrate 11A, for example. In the present embodiment, the light shielding layer 130 includes, for example, a black matrix layer, and the material thereof includes, for example, a photocurable resin, a metal, or a mixture comprising the above. It is to be noted that the photocurable resin is, for example, a light-shielding dye carrier added to a photosensitive polymer resin having a reactive substituent such as a hydroxyl group, a carboxyl group or an amine group, or a reactive substituent such as an aldehyde group or an epoxy group. a (meth)acrylic compound or a polymer resin having a photocrosslinkable group such as a mercaptopropenyl group or a styryl group which is reacted with cinnamic acid, wherein a light-shielding pigment carrier is added, wherein the light-shielding pigment carrier is an organic or inorganic pigment, for example, carbon black A mixture of stupid amine black, anthraquinone black pigment, an anthraquinone black pigment, and the like, and the aforementioned metal is, for example, chromium. The optical density of the light shielding layer 13 is, for example, higher than 1.5, and the thickness of the light shielding layer 130 is, for example, less than 4 μm. In the present embodiment, the transmittance of the light shielding layer 130 is, for example, less than 3%, that is, the light shielding layer 130 has a high light shielding property', thereby effectively blocking the external light source from entering the array substrate 110. In the present embodiment, the electrophoretic display panel 100a includes a light shielding layer 130 disposed between the array substrate 110 and the electrophoretic display medium 15〇 to block 14 201205176

AU0912128 34652twf.doc/I 擋外界光源經由電泳顯示介質15〇進入陣列基板11(^如此一 來’能避免外界光源照射於陣列基板11〇之主動元件114上而 發生光漏電流等問題,使得主動元件114具有較佳的元件特 性。再者,由於遮光層130能有效地阻擋外界光源,因此可 增加暗態吸光效率而大幅提高電泳顯示面板1〇〇3的對比度。 此外,在本實施例中,可將電泳顯示介質15〇直接配置於遮 光層130上,而無需額外使用黏著層來進行接合,因而能縮 減電泳顯示面板100a的整體厚度。特別是,由於遮光層 通常具有較大的光學密度,因此在較小的厚度下就能達到良 好的遮光效果與較小的穿透率。因此,本實施例之電泳顯示 面板具有良好的顯示品質且具有較小的整體厚度,以符合消 費者對於顯示面板之要求》 圖4A至圖4C為本發明之一實施例的一種電泳顯示面板 的製造方法的流程不意圖,其中電泳顯示面板的構件可以參 照刖一實施例中所述,於此不詳述。請參昭圖4A,首先,提 供-陣列基板11〇。接著於陣列基二:序形成= 層130/及-電泳顯示介質15()()在本實施例中,陣列基板ιι〇 例如疋一主動元件陣列基板,其詳細結構可以參照圖1及其 相關敘述。遮光層13G例如是-黑矩陣層,其形成方法例如 是先以旋塗祕_基板11G的晝素電極128上形成一整層 的黑矩陣材料層(未、㈣),以覆鱗列基板UG,再以諸如紫 外光等光線照射黑矩陣材料層’使其固化成遮光層13〇。其 中’遮光層130的材料例如是包括光固化型樹脂、金屬或上 15 201205176 AU0912128 34652twf.doc/l 述之組合。值得注意的是,前述之光固化型樹脂例如為具有 羥基、羧基、胺基等反應性取代基之感光性高分子樹脂添加 遮光色素載體,或具有醛基、環氧基等反應性取代基之(曱基) 丙烯酸化合物或具有肉桂酸反應之曱基丙烯醯基、笨乙烯基 等光交聯性基之高分子樹脂添加遮光色素載體,其中遮光色 素载體為有機或無機顏料,例如為碳黑、笨胺黑、蒽醌系黑 色顏料、茈系黑色顏料等混和物,而前述之金屬例如為鉻。 且遮光層130的光學密度例如是高於15。在本實施例中,遮 光層130之厚度例如是小於4um,且遮光層13〇的穿透率例如 是低於3%。 、,在本實施例中,電泳顯示介質150例如是直接形成於遮 光層上,且其形成步驟如下。首先,形成一微杯結構152 ,遮光層130上,此步驟例如是於遮光屠13()上形成_介電材 料層(未繪示),然後對介電材料層進行微影蝕刻製程以將介 電材料層冑案化成微杯結構152,使得介電材料層具有多個 開口以形成微杯結構152。接著,填充電泳液154於微杯結構 52内電泳液154例如是黑色電泳液。然後,分佈多個帶電 粒子15^於電泳液154中,帶電粒子156例如是白色帶電粒 :。接著,利用一封合層158將電泳液154與帶電粒子156封 :於微杯、.^構^]内》其中,封合層158的材料例如是環氧樹 脂,其形成方法例如是光固化或熱固化。 請參照圖4B,然後’提供一對向基板140,對向基板14〇 包括-共通電極144。在本實施射,對向基板14()的製作方 16 201205176AU0912128 34652twf.doc/I The external light source enters the array substrate 11 via the electrophoretic display medium 15 (which can prevent the external light source from being irradiated onto the active device 114 of the array substrate 11 and cause light leakage current, etc., so that the active The component 114 has better component characteristics. Further, since the light shielding layer 130 can effectively block the external light source, the dark state light absorption efficiency can be increased to greatly improve the contrast of the electrophoretic display panel 1〇〇3. Further, in this embodiment The electrophoretic display medium 15〇 can be directly disposed on the light shielding layer 130 without additional use of an adhesive layer for bonding, thereby reducing the overall thickness of the electrophoretic display panel 100a. In particular, since the light shielding layer generally has a large optical density. Therefore, a good light-shielding effect and a small transmittance can be achieved at a small thickness. Therefore, the electrophoretic display panel of the embodiment has good display quality and has a small overall thickness to conform to the consumer's FIG. 4A to FIG. 4C are diagrams showing a method of manufacturing an electrophoretic display panel according to an embodiment of the present invention; It is not intended that the components of the electrophoretic display panel can be referred to in the first embodiment, which will not be described in detail herein. Referring to FIG. 4A, firstly, the array substrate 11 is provided. Layer 130 / and - electrophoretic display medium 15 () () In this embodiment, the array substrate ιι, such as an active device array substrate, the detailed structure of which can be referred to Figure 1 and its related description. The light shielding layer 13G is, for example, - black The matrix layer is formed by, for example, forming a whole layer of a black matrix material layer (not (4)) on the halogen electrode 128 of the spin-coated substrate 11G to cover the scale substrate UG, such as ultraviolet light. The light illuminates the black matrix material layer to cure it into the light shielding layer 13 〇. The material of the 'light shielding layer 130 </ RTI> includes, for example, a photocurable resin, a metal or a combination of the above 15 201205176 AU0912128 34652 twf.doc/l. The photocurable resin is, for example, a light-shielding dye carrier added to a photosensitive polymer resin having a reactive substituent such as a hydroxyl group, a carboxyl group or an amine group, or a reactive substituent such as an aldehyde group or an epoxy group. Propylene A light-shielding pigment carrier is added to an acid compound or a polymer resin having a photocrosslinkable group such as a mercaptopropenyl group or a strepto vinyl group which is reacted with cinnamic acid, wherein the light-shielding pigment carrier is an organic or inorganic pigment such as carbon black or anthranamine. A mixture of black, anthraquinone black pigment, lanthanide black pigment, and the like, and the foregoing metal is, for example, chromium. The optical density of the light shielding layer 130 is, for example, higher than 15. In the present embodiment, the thickness of the light shielding layer 130 is, for example, The transmittance of the light shielding layer 13 is, for example, less than 3%. In the present embodiment, the electrophoretic display medium 150 is directly formed on the light shielding layer, for example, and the forming step is as follows. First, a The microcup structure 152 is disposed on the light shielding layer 130. This step is, for example, forming a dielectric material layer (not shown) on the light shielding layer 13 (), and then performing a photolithography etching process on the dielectric material layer to laminate the dielectric material layer. The microcup structure 152 is formed into a pattern such that the dielectric material layer has a plurality of openings to form the microcup structure 152. Next, the electrophoresis liquid 154 filled in the microcup structure 52 is, for example, a black electrophoresis liquid. Then, a plurality of charged particles 15 are distributed in the electrophoresis liquid 154, and the charged particles 156 are, for example, white charged particles: Next, the electrophoresis liquid 154 and the charged particles 156 are sealed by a bonding layer 158: in the microcup, the material of the sealing layer 158 is, for example, an epoxy resin, and the forming method is, for example, photocuring. Or heat curing. Referring to FIG. 4B, then a pair of substrates 140 are provided, and the counter substrate 14 includes a common electrode 144. In this embodiment, the opposite substrate 14 () is produced 16 201205176

AU0912128 34652twf.doc/I 法例如是在基板142上形成共通電極144。其中,基板i42的 材料例如是聚醋,共通電極144的材料例如是透明金屬,例 如如鋼錫氧化物。。 請參照圖4C,接著,利用一黏著層16〇使對向基板14〇 與電泳顯示介質150黏著,其中電泳顯示介質15〇位於陣列基 板110與對向基板140之間。換言之在本實施例中,藉由黏 著層160使圖4A之位於陣列基板11〇上的電泳顯示介質15〇與 圖4B之對向基板14〇接合,以形成電泳顯示面板1〇〇&amp;。其中, 黏者層160例如是包括諸如聚丙烯酸酯等透明材料,其形成 方法例如是以加熱並滾壓的方式貼合》特別注意的是,雖然 在本實施例中是以電泳顯示介質150具有圖4A所示的結構為 例’但電泳顯示面板l〇〇a中的電泳顯示介質150可以具有其他 結構。 在本實施例中’是先於陣列基板110上依序形成遮光層 130與電泳顯示介質150,再利用黏著層160接合位於陣列板 110上的電泳顯示介質15〇與對向基板14〇,以形成電泳顯示 面板100a。因此’在電泳顯示面板10〇3中,陣列基板11〇與電 泳顯示介質150之間配置有遮光層π〇,以有效地阻擋外界光 源經由電泳顯示介質150進入陣列基板110〇如此一來,能避 免外界光源照射於陣列基板11〇之主動元件114上而發生光 漏電流等問題,使得主動元件114具有較佳的元件特性。再 者,由於遮光層130能有效地阻擋外界光源,因此可增加暗 態吸光效率而大幅提高電泳顯示面板100&amp;的對比度。此外, 17 201205176The AU0912128 34652twf.doc/I method is, for example, forming a common electrode 144 on the substrate 142. The material of the substrate i42 is, for example, polyester, and the material of the common electrode 144 is, for example, a transparent metal such as, for example, steel tin oxide. . Referring to FIG. 4C, the opposite substrate 14A is adhered to the electrophoretic display medium 150 by an adhesive layer 16A, wherein the electrophoretic display medium 15 is located between the array substrate 110 and the opposite substrate 140. In other words, in the present embodiment, the electrophoretic display medium 15A on the array substrate 11A of Fig. 4A is bonded to the opposite substrate 14 of Fig. 4B by the adhesive layer 160 to form an electrophoretic display panel 1 &amp; Wherein, the adhesive layer 160 is, for example, a transparent material such as polyacrylate, and is formed by, for example, heating and rolling. Special attention is given to the fact that, in the present embodiment, the electrophoretic display medium 150 has The structure shown in FIG. 4A is an example 'but the electrophoretic display medium 150 in the electrophoretic display panel 10a may have other structures. In the present embodiment, the light-shielding layer 130 and the electrophoretic display medium 150 are sequentially formed on the array substrate 110, and the electrophoretic display medium 15〇 and the opposite substrate 14 on the array board 110 are bonded by the adhesive layer 160 to The electrophoretic display panel 100a is formed. Therefore, in the electrophoretic display panel 10〇3, a light shielding layer π〇 is disposed between the array substrate 11〇 and the electrophoretic display medium 150 to effectively block the external light source from entering the array substrate 110 via the electrophoretic display medium 150. The problem that the external light source is irradiated onto the active device 114 of the array substrate 11 to cause a light leakage current or the like causes the active device 114 to have better component characteristics. Moreover, since the light shielding layer 130 can effectively block the external light source, the dark state light absorption efficiency can be increased to greatly increase the contrast of the electrophoretic display panel 100&amp; In addition, 17 201205176

AU0912128 34652twf.doc/I 在本實施例中,可將電泳顯示介質15〇直接配置於遮光層 上,而無需透過額外的黏著層來接合電泳顯示介質i5〇與 光層130’因而能簡化電泳顯示面板1〇〇a的製程步驟並縮減電Λ 泳顯示面板100a的整體厚度。特別是,由於遮光層ΐ3〇通常具 有較大的光學密度’因此在較㈣厚度下觀相良好的遮 光效果與較㈣穿透率。因此,本實施例之電泳顯示面板具 有良好的顯示品質且能夠具有較小的整體厚度,以符合 者對於顯示面板之要求。 特別注意的是’雖然在上述的實施例中是以圖i與圖3所 示之電泳顯示面板100、100a的結構為例,但本發明之電泳顯 示面板也可以具有其他結構,此外,圖2A至圖2C以及圖4a 至圖4C所述之電泳顯示面板的製造方法亦僅為用以製作本 發明之電泳顯示面板的多種流程中的—種,並非用以限制本 發明。 綜上所述’在本實施财,電泳顯示面板包括遮光層, 遮光層配置於_絲魏泳_介質H阻擋外界光 源經由電泳顯示介f進人障列基板。如此—來,能避免外界 光源照/f於陣列基板之主動元件上而發生光漏電流等問 f ’使得主動元件具有較佳的元件特性。再者,由於遮光層 ί有效地阻擋外界絲,因此可增加暗態吸光效率而大幅提 南電泳顯示面板的對比度。 、·此外,由於電泳顯示面板是以遮光層作為主要阻擋外界 光源的膜層,因此遮光性不是黏著層在材料選擇上的重要考 201205176 AU0912128 34652twf.doc^ 量因素,故黏著層可以是透明材料且可以具有較小的厚度, 換言之’遮光層的設置增加了黏著層之材料的可選擇性且大 幅縮減黏著層的厚度。此外,在一實施例中,可將電泳顯示 介質直接配置於遮光層上,而無需透過額外的黏著層來接合 電泳顯示介質與遮光層,因而能簡化電泳顯示面板的製程步 驟並縮減電泳顯示面板的整體厚度。再者,由於遮光層通常 具有較大的光學密度,.因此在較小的厚度下就能逹到良好的 遮光效果與較小的穿透率。因此,本實施例之電泳顯示面板 具有良好的顯示品質且能夠具有較小的整體厚度,以符合消 費者對於顯示面板之要求。 雖然本發明已以實施例揭露如上,然其並非用太 發明’任何所屬技術領域中具有通常知識者,在不脫離本發 明之精神和範圍内,當可作些許之更動與潤飾,故本發明之 保護範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】. 圖1為本發明之一實施例的一種電泳顯示面板的剖面示 意圖。 @2A至圖2C林發明之一實施例的一種電泳顯示面板 的製造方法的流程示意圖。 圖3為本發明之-實施例的-㈣泳顯示面板 示 意圖》 圖4A至圖4C為本發明之-實施例的一種電泳顯示面板 201205176AU0912128 34652twf.doc/I In this embodiment, the electrophoretic display medium 15〇 can be directly disposed on the light shielding layer without splicing the electrophoretic display medium i5〇 and the light layer 130 ′ through an additional adhesive layer, thereby simplifying the electrophoretic display The manufacturing process of the panel 1A reduces the overall thickness of the electrophoretic display panel 100a. In particular, since the light-shielding layer 〇3〇 usually has a large optical density&apos;, a good light-shielding effect and a (four) transmittance are observed at a (four) thickness. Therefore, the electrophoretic display panel of the present embodiment has good display quality and can have a small overall thickness to meet the requirements of the display panel. It is to be noted that although the structure of the electrophoretic display panels 100 and 100a shown in FIGS. 1 and 3 is taken as an example in the above embodiment, the electrophoretic display panel of the present invention may have other structures. In addition, FIG. 2A The method of manufacturing the electrophoretic display panel described in FIG. 2C and FIG. 4a to FIG. 4C is also only one of various processes for fabricating the electrophoretic display panel of the present invention, and is not intended to limit the present invention. In summary, in the implementation, the electrophoretic display panel includes a light shielding layer, and the light shielding layer is disposed on the _ silk Wei _ medium H to block the external light source from entering the barrier substrate via the electrophoretic display. In this way, it is possible to prevent the external light source from being incident on the active elements of the array substrate and causing the light leakage current to cause the active element to have better element characteristics. Moreover, since the light shielding layer ί effectively blocks the external filament, the dark state light absorption efficiency can be increased to greatly increase the contrast of the electrophoretic display panel. In addition, since the electrophoretic display panel is a light-shielding layer as a film layer mainly blocking the external light source, the light-shielding property is not an important factor in the material selection of the adhesive layer, so the adhesive layer may be a transparent material. It can also have a small thickness, in other words, the 'shading layer' arrangement increases the selectivity of the material of the adhesive layer and greatly reduces the thickness of the adhesive layer. In addition, in an embodiment, the electrophoretic display medium can be directly disposed on the light shielding layer without bonding the electrophoretic display medium and the light shielding layer through an additional adhesive layer, thereby simplifying the processing steps of the electrophoretic display panel and reducing the electrophoretic display panel. The overall thickness. Furthermore, since the light-shielding layer usually has a large optical density, a good light-shielding effect and a small transmittance can be obtained at a small thickness. Therefore, the electrophoretic display panel of the present embodiment has good display quality and can have a small overall thickness to meet the consumer's requirements for the display panel. The present invention has been disclosed in the above embodiments, but it is not intended to be a part of the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing an electrophoretic display panel according to an embodiment of the present invention. @2A to Fig. 2C is a flow chart showing a method of manufacturing an electrophoretic display panel according to an embodiment of the invention. 3 is a view showing a - (four) swimming display panel of the present invention - FIG. 4A to FIG. 4C are an electrophoretic display panel according to an embodiment of the present invention 201205176

AU0912128 34652twf.doc/I 的製造方法的流程示意圖。 【主要元件符號說明】 100、100a :電泳顯示面板 110 :陣列基板 112、142 :基板 114 :主動元件 116 :閘極 118 :閘絕緣層 120 :通道層 122D :汲極 122S :源極 124 :絕緣層 126 :保護層 128 :畫素電極 130 :遮光層 140 :對向基板 144 :共通電極 150 :電泳顯示介質 152 :微杯結構 154 :電泳液 156 :帶電粒子 158 :封合廣 160 :黏著層 20Schematic diagram of the manufacturing method of AU0912128 34652twf.doc/I. [Main component symbol description] 100, 100a: electrophoretic display panel 110: array substrate 112, 142: substrate 114: active device 116: gate 118: gate insulating layer 120: channel layer 122D: drain 122S: source 124: insulation Layer 126: protective layer 128: pixel electrode 130: light shielding layer 140: opposite substrate 144: common electrode 150: electrophoretic display medium 152: microcup structure 154: electrophoresis liquid 156: charged particle 158: sealing wide 160: adhesive layer 20

Claims (1)

201205176 AU0912128 34652twf.d〇c/I 七、申請專利範圍: 1·一種電泳顯示面板,包括: 一陣列基板; 一遮光層’配置於該陣列基板上,該遮光層的光學密度 (optical density)高於 1.5 ;201205176 AU0912128 34652twf.d〇c/I VII. Patent application scope: 1. An electrophoretic display panel comprising: an array substrate; a light shielding layer disposed on the array substrate, the optical density of the light shielding layer is high At 1.5; 一對向基板,配置於該陣列基板上方;以及 一電泳顯示介質,配置於該遮光層與該對向基板之間。 2. 如申請專利範圍第1項所述之電泳顯示面板’其中該陣 列基板與該對向基板為可撓性基板。 3. 如申請專利範圍第1項所述之電泳顯示面板,其中該陣 列基板包括多個主動元件以及多個畫素電極,且該些晝素電 極與該些主動元件電性連接。 4. 如申請專利範圍第1項所述之電泳顯示面板,其中該對 向基板包括一共通電極。 、* 5.如申請專利範圍第1項所述之電泳顯示面板,其中該遮 光層包括一黑矩陣層。 “ 6.如申請專利範圍第1項所述之電泳顯示面板,其中該遮 光層的穿透率低於3〇/〇。 7.如申請專利範圍第1項所述之電泳顯示面板,其中該遮 光層之厚度小於4um。 8. 如申請專利範圍第旧所述之電泳顯示面板,其中該遮 先層之材料包括光固化型樹脂、金屬或上述之組合。 9. 如申請專利範圍第旧所述之電泳顯示面板,其中該電 21 201205176 AU0912128 34652twf.doc/I 泳顯示介質包括: 一微杯結構; 一電泳液’位於該微杯結構内; 多個帶電粒子,分佈於該電泳液中;以及 一封合層,與該微杯結構接合,以將該電泳液與該些帶 電粒子封合於該微杯結構内。 10. 如申請專利範圍第9項所述之電泳顯示面板,更包括 〜黏著層,黏著於該遮光層與該封合層之間。 馨 11. 如申請專利範圍第9項所述之電泳顯示面板,更包括 黏著層,黏者於該對向基板與該封合層之間,其中該遮光 層與該微杯結構直接接觸。 一 =·如申請專利範圍第1項所述之電泳顯示面板,更包括 一黏著層,黏著於該遮光層與該電泳顯示介質之間。 、I3.如申請專利範圍第:1項所述之電泳顯示面板,其中該 遮光層係全面性覆蓋於該陣列基板上。 14. 一種電泳顯示面板的製造方法,包括: 提供一陣列基板; 籲 於該陣列基板上形成一遮光層; 提供一對向基板,該對向基板包括一共通電極; 形成一電泳顯示介質於該對向基板上;以及 利用-黏著層使該遮光層與該電泳顯示介質黏著,其中 孩電泳顯示介質位於該遮光層與該對向基板之間。 15. 如申請專利範圍第14項所述之電泳顯示面板的製造 22 201205176 AU0912128 34652twf.doc/I 方法,其中形成該電泳顯示介質之該步驟包括·· 形成一微杯結構於該共通電極上; 填充一電泳液於該微杯結構内; 分佈多個帶電粒子於該電泳液中;以及 利用一封合層,將該電泳液與該些帶電粒子封合於該微 杯結構内。 16. 如申請專利範圍第14項所述之電泳顯示面板的製造 方法,其中該陣列基板包括多個主動元件以及多個晝素電 極’且該些畫素電極與該些主動元件電性連接β 17. —種電泳顯示面板的製造方法’包括: 提供一陣列基板; 於該陣列基板上依序形成一遮光層以及一電泳顯示介 質; ^供一對向基板,該對向基板包括一共通電極;以及 利用一黏者層使該對向基板與該電泳顯示介質黏著,其 中該電泳顯示介質位於該陣列基板與該對向基板之間。 18. 如申請專利範圍第π項所述之電泳顯示面板的製造 方法’其中形成該電泳顯示介質之該步驟包括: 形成一微杯結構於該遮光層上; 填充一電泳液於該微杯結構内; 分佈多個帶電粒子於該電泳液中;以及 利用一封合層,將該電泳液與該些帶電粒子封合於該微 杯結構内。 23 201205176 AU0912128 34652twf.doc/I 19. 如申請專利範圍第18項所述之電泳顯示面板的製造 方法,其中形成該微杯結構之方法包括利用微影製程。 20. 如申請專利範圍第17項所述之電泳顯示面板的製造 方法,其中該陣列基板包括多個主動元件以及多個畫素電 極,且該些晝素電極與該些主動元件電性連接。a pair of substrates disposed above the array substrate; and an electrophoretic display medium disposed between the light shielding layer and the opposite substrate. 2. The electrophoretic display panel of claim 1, wherein the array substrate and the counter substrate are flexible substrates. 3. The electrophoretic display panel of claim 1, wherein the array substrate comprises a plurality of active components and a plurality of pixel electrodes, and the halogen electrodes are electrically connected to the active components. 4. The electrophoretic display panel of claim 1, wherein the opposite substrate comprises a common electrode. The electrophoretic display panel of claim 1, wherein the light shielding layer comprises a black matrix layer. 6. The electrophoretic display panel according to claim 1, wherein the light shielding layer has a transmittance of less than 3 Å/〇. 7. The electrophoretic display panel according to claim 1, wherein the The thickness of the light-shielding layer is less than 4 um. 8. The electrophoretic display panel according to the above-mentioned patent application, wherein the material of the mask layer comprises a photocurable resin, a metal or a combination thereof. The electrophoretic display panel, wherein the electric 21 201205176 AU0912128 34652twf.doc/I swimming display medium comprises: a microcup structure; an electrophoresis liquid 'located in the microcup structure; a plurality of charged particles distributed in the electrophoresis liquid; And a layer of the electrode is bonded to the microcup structure to seal the electrophoretic liquid and the charged particles in the microcup structure. 10. The electrophoretic display panel of claim 9 further includes The adhesive layer is adhered between the light shielding layer and the sealing layer. The electrophoretic display panel according to claim 9, further comprising an adhesive layer adhered to the opposite substrate and the sealing layer Floor The electrophoretic display panel of the first aspect of the invention, further comprising an adhesive layer adhered between the light shielding layer and the electrophoretic display medium, wherein the light shielding layer is in direct contact with the microcup structure. The electrophoretic display panel of claim 1, wherein the light shielding layer is comprehensively covered on the array substrate. 14. A method for manufacturing an electrophoretic display panel, comprising: providing an array substrate; Forming a light shielding layer on the array substrate; providing a pair of substrates, the opposite substrate includes a common electrode; forming an electrophoretic display medium on the opposite substrate; and using the adhesive layer to make the light shielding layer and the electrophoretic display The medium is adhered to, wherein the electrophoretic display medium is located between the light shielding layer and the opposite substrate. 15. The method of manufacturing an electrophoretic display panel according to claim 14 of the claim 22 201205176 AU0912128 34652twf.doc/I, wherein the method is formed The step of electrophoretic display medium comprises: forming a microcup structure on the common electrode; filling an electrophoresis liquid in the microcup structure; Storing a plurality of charged particles in the electrophoresis liquid; and sealing the electrophoretic liquid and the charged particles in the microcup structure by using a lamination layer. 16. The electrophoretic display according to claim 14 The manufacturing method of the panel, wherein the array substrate comprises a plurality of active elements and a plurality of halogen electrodes ' and the pixel electrodes are electrically connected to the active elements. 17. The method for manufacturing an electrophoretic display panel includes: providing An array substrate; a light shielding layer and an electrophoretic display medium are sequentially formed on the array substrate; ^ for a pair of substrates, the opposite substrate includes a common electrode; and the opposite substrate is formed by using an adhesive layer The electrophoretic display medium is adhered, wherein the electrophoretic display medium is located between the array substrate and the opposite substrate. 18. The method of manufacturing an electrophoretic display panel as described in claim π, wherein the step of forming the electrophoretic display medium comprises: forming a microcup structure on the light shielding layer; filling an electrophoresis liquid in the microcup structure Distributing a plurality of charged particles in the electrophoresis liquid; and sealing the electrophoretic liquid and the charged particles into the microcup structure by using a layer. 19. The method of manufacturing an electrophoretic display panel according to claim 18, wherein the method of forming the microcup structure comprises using a lithography process. 20. The method of manufacturing an electrophoretic display panel according to claim 17, wherein the array substrate comprises a plurality of active elements and a plurality of pixel electrodes, and the halogen electrodes are electrically connected to the active elements. 24twenty four
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Publication number Priority date Publication date Assignee Title
TWI479249B (en) * 2012-04-25 2015-04-01 Hsiung Kuang Tsai Reflective visual interface apparatus
US9223164B2 (en) 2013-08-02 2015-12-29 Sipix Technology, Inc. Display

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