TWI399448B - Aparatus and method of sputtering deposition - Google Patents

Description

Sputter coating device and coating method

The invention relates to a coating device and a coating method, in particular to a sputtering coating device and a coating method using the sputtering coating device.

Sputtering is the use of ions generated by plasma to strike the cathode target, and the atoms in the target are knocked out and deposited on the surface of the substrate to form a film layer. Since sputtering can achieve better deposition efficiency, precise control composition, and lower manufacturing cost, it is widely used in industry.

The application of current mobile digital camera lenses has become increasingly popular, so it is necessary to improve the manufacturing technology of its key components to effectively reduce its manufacturing costs and increase its yield. The lens module, which is one of the key components of the camera lens, usually includes a lens holder, a lens barrel, and a lens, a spacer, an aperture, an IR-cut filter, and the like housed in the lens barrel. For the design method of the lens, please refer to the paper Aspheric lens design published by Chao et al. in the 2000 IEEE Ultrasonics Symposium.

During the assembly of the lens module, components such as a lens, a spacer, an aperture, an infrared cut filter, and the like are usually loaded into the lens barrel in a certain order, and then the lens barrel is screwed into the lens holder to assemble a complete lens module. . As shown in FIG. 1 , in order to reduce the degree of electromagnetic interference of the lens module, an electromagnetic interference (EMI) film is generally sputtered on the outer circumferential surface 20a of the lens holder 2a before assembling the lens module. Layer to improve the ability of the assembled lens module to resist electromagnetic interference. After coating, the product needs to do a lot of environmental tests, such as high temperature and high pressure test, thermal shock test, corrosion test, etc. If the coated film is not uniform, it is easy to fall off, and The thinner region of the film has a higher resistance value, and the effect of preventing electromagnetic interference (EMI) is not good. Therefore, the uniformity of the film thickness is very important.

In the prior art, when the film layer of the outer circumferential surface 20a of the lens holder 2a is prepared by sputtering, the lens holder 2a maintains a certain speed below the target to travel in the direction in which the target extends downward, and during the traveling, outside the lens holder 2a. In terms of the circumferential surface, the geometrical positions of the different portions 20b, 20c with respect to the target are inconsistent, and the ranges of the target beams 1b, 1c plated thereon are also inconsistent, which is likely to cause uneven thickness of the film during coating, in order to improve the The thickness uniformity of the film layer is generally much larger than that of the lens holder, and the target beam is dispersed. Therefore, the target material is consumed more, and the uniformity of the coating film is not ideal to some extent.

In view of the above, it is necessary to provide a sputtering type coating apparatus and a coating method which can further improve the uniformity of a film layer and improve the utilization ratio of a target compared with the prior art.

Hereinafter, a sputtering type plating apparatus and a coating method which can improve the uniformity of a film layer and can improve the utilization ratio of a target will be described by way of examples.

The present invention provides a sputter coating apparatus comprising a coating working chamber; at least one target disposed in the coating working chamber for coating the workpiece; and a carrier device along the coating working chamber The extending direction of the bottom portion is linearly moved. The carrying device comprises a fixing frame and at least one bearing shaft for fixing the at least one bearing shaft, the at least one bearing shaft for carrying the workpiece and driving the workpiece around the At least one load bearing shaft rotates. The sputter coating apparatus may further comprise an independently controlled auxiliary device movable relative to the transport direction to assist in rotation of the at least one load bearing shaft about its central axis.

And a sputtering coating method using the above-described sputtering coating apparatus, comprising the steps of: (1) providing a sputtering coating apparatus as described; (2) the at least one bearing shaft is close to the at least The direction of a target is linearly moved; in addition, the auxiliary unit assists the at least one load bearing shaft to rotate about its central axis; and (3) the workpiece along with the at least one load bearing shaft is disposed in a direction close to the at least one target Linearly moving and rotating about the at least one load bearing shaft; (4) the at least one target coating the workpiece.

In contrast to the prior art, the sputter coating apparatus and the coating method provide a carrier that can move linearly along the coating working chamber, and set at least one carrying shaft of the carrying device to be rotatable about a central axis thereof. The workpiece carried by the at least one bearing shaft can be sequentially coated by the carrying device, so that the continuous operation of the coating can be realized; on the other hand, at least one bearing shaft drives the workpiece to rotate around the axis thereof to improve the uniformity of the thickness of the coating layer. And thus improve the yield.

20‧‧‧Sputter coating device

2a‧‧ ‧Mirror holder

21, 61‧‧‧ coating studio

20a‧‧‧ outer circumferential surface

22‧‧‧ Carrier

20b, 20c‧‧‧ the outer circumferential surface

23‧‧‧ Targets

1b, 1c‧‧‧ target beam

30‧‧‧Mirror seat

24‧‧‧ Vacuuming device

30a‧‧‧Base

60‧‧‧Sputter coating device

30b‧‧‧Cylindrical structure

62‧‧‧Loading room

300b‧‧‧ outer circumferential surface

63‧‧‧ Unloading room

221‧‧‧Transportation device

64‧‧‧heating room

222‧‧‧ fixed frame

65‧‧‧cleaning room

223‧‧‧bearing shaft

210‧‧‧ bottom

224‧‧‧Auxiliary unit

230‧‧‧ target electrode

40‧‧‧First position

224a, 224b‧‧‧ slats

41‧‧‧second position

223a, 223b‧‧‧ toothed parts

222a, 222b‧‧‧ fixed ring

Fig. 1 is a schematic view showing the coating of a lens holder by a sputtering method.

2 is a schematic view of a sputter coating apparatus according to a first embodiment of the present invention.

Figure 3 is a schematic view of the structure of the lens holder.

4 is a perspective enlarged view of the carrier of the sputter coating device shown in FIG. 2.

Fig. 5 is a schematic view showing the sputtering of the outer circumferential surface of the lens holder by the sputtering type plating apparatus shown in Fig. 2.

Fig. 6 is a schematic view showing a sputtering type plating apparatus shown in a second embodiment of the present invention.

The invention will now be further described in detail in conjunction with the drawings.

Referring to FIG. 2 , a sputter coating apparatus 20 is provided in a first embodiment of the present invention. The sputter coating apparatus 20 includes a coating working chamber 21 , a carrier 22 and a target 23 .

The coating working chamber 21 is used to provide a vacuum sputtering environment. Typically, the coating working chamber 21 includes a gas inlet (not shown) in communication with the coating working chamber 21 and a gas outlet (not shown). its The gas inlet is used to introduce a discharge gas such as argon gas, nitrogen gas or the like into the coating working chamber 21, and the gas outlet is used to maintain a certain degree of vacuum during the working of the coating working chamber 21. The gas outlet is typically connected to a vacuuming device 24, which may be a molecular pump, a Lotz vacuum pump or a dry mechanical vacuum pump.

The target 23 is disposed in the coating working chamber 21. In the embodiment, the target 23 is a copper target, and the number thereof can be set to three, and the three targets are distributed along the direction of the straight arrow in FIG. In addition, the three targets 23 can be respectively loaded on the three target electrodes 230, and the three target electrodes 230 can be plate electrodes, which generally serve as cathodes during the sputtering process and their switching states can be independently controlled. The surface to be coated 300b of the mirror holder 30 shown in Fig. 3 can be coated by bombarding the target 23. The lens holder 30 generally includes a base 30a and a cylindrical structure 30b extending from the base 30a. The electromagnetic interference preventing film layer is formed on the outer circumferential surface 300b of the cylindrical structure 30b.

Referring to FIG. 4, the carrier 22 includes a transport device 221, a mounting bracket 222, at least one load bearing shaft 223, and an independently controlled auxiliary unit 224. The transporting device 221 is disposed at the bottom of the coating working chamber 21 and is linearly movable in the extending direction of the bottom (in the direction indicated by the arrow in FIG. 2). Preferably, the transmission device 221 can be a transmission belt. The mounting bracket 222 is disposed on the transporting device 221 and is driven by the transporting device 221. The at least one carrying axle 223 is disposed on the mounting bracket 221 and rotatable about a central axis thereof.

Specifically, the two ends of the at least one bearing shaft 223 are sleeved in the two fixing rings 222a and 221b of the fixing frame 222, and the at least one bearing shaft 223 is driven by the transmission device 221 along with the fixing frame 222. The at least one carrier shaft 223 is movable along the fixed frame 222 and rotatable about its central axis. Specifically, the at least one bearing shaft 223 can be rotated by an auxiliary unit 224. Preferably, the auxiliary unit 224 includes two strips 224a, 224b, wherein the strips 224a, 224b respectively have a tooth-shaped contact surface, the board One of the toothed contact faces of the strips 224a, 224b is mechanically engaged with the toothed portions 223a, 223b of the at least one load bearing shaft, respectively, and the auxiliary unit 224 is movable relative to the transport device 221 The at least one load bearing shaft 223 is rotated about its central axis. Specifically, the slats 224a, 224b are moved from the first position 40 to the second position 41 to drive the at least one load bearing shaft 223 to rotate about its central axis. Of course, the auxiliary unit 224 may also include only one slat, such as a slat 224a disposed at one end of the carrier shaft 223, which is movable relative to the transport device 221 and can also rotate 223 about its central axis.

The at least one bearing shaft 223 is configured to carry the lens holder 30, and the two ends thereof pass through two fixing rings 222a and 222b disposed on the fixing frame 222, and linearly move along the direction of the fixing frame 222 toward the target. Specifically, the at least one carrier shaft 223 may be made of a conductive material such as metal such as iron or aluminum, which serves as an anode during the sputtering process.

Referring to FIG. 2, FIG. 4 and FIG. 5, a method for forming an anti-electromagnetic interference film on the outer circumferential surface 300b of the lens holder 30 by using the sputter coating device 20 provided by the first embodiment of the present invention will be briefly described below. A sputter coating method comprising the following steps:

(1) The workpiece 30 to be coated is loaded on the at least one carrier shaft 223.

As shown in FIG. 4, the lens holder 30 is fixed to the at least one bearing shaft 223, and is coaxial with the at least one bearing shaft, and is capable of being rotated by the at least one bearing shaft 223 about its own central axis.

(2) The at least one carrier shaft 223 linearly moves in a direction close to the at least one target 23 and rotates about its central axis.

The two ends of the at least one carrying shaft 223 are sleeved on the fixing ring 222 of the fixing frame 222 and can be rotated around the central axis thereof, and will be along with the fixing frame 222 along the moving direction of the transmission device 221 along the transmission device 221 (eg The direction shown by the horizontal arrow in Fig. 5 moves and approaches the target 23. In addition, the auxiliary unit 224 drives the at least one bearing shaft 223 to rotate about its central axis, so that the workpiece 30 sleeved on the at least one bearing shaft 223 also rotates about its central axis. Specifically, the two slats 224a, 224b of the auxiliary unit 224 are movable relative to the transport device 221, wherein the slats 224a, 224b respectively have a tooth-shaped contact surface, and one of the slats 224a, 224b is in tooth contact. Face and at least one bearing shaft The two end tooth portions 223a, 223b are mechanically engaged, and the auxiliary unit 224 moves relative to the transport device 221 to drive at least one load bearing shaft 223 to rotate.

It can be understood that when the fixing frame 222 enters the coating working chamber 21 by the conveying device 221, the coating working chamber 21 can be evacuated to a predetermined pressure via the vacuuming device 24 communicating with the coating working chamber 21. In a vacuum state, a discharge gas such as argon gas or the like is supplied to the coating working chamber 21 via a gas inlet communicating with the coating working chamber 21.

(3) The at least one target 23 coats the workpiece 30.

The at least one target 23 can be disposed as needed, for example, generally coated with an electromagnetic radiation prevention film, and the required target is divided into two regions, the first region is a copper target, the second region is a stainless steel target, and each region can be composed of three. The target composition, the number of control targets can be plated with different thicknesses, for example, a layer of copper is first coated (the thickness of the copper film layer is less than 2 μm), and after the plating is completed, the lens holder 30 is sent to the second region, further to the lens holder. A copper film layer of 30 outer circumferential surface 300b is sputtered with a stainless steel film layer (the thickness of the stainless steel film layer is within about 0.5 μm).

As shown in FIG. 5, when the lens holder 30 is moved directly under the at least one target 23, a negative voltage can be applied to the target electrode 230 by an external power source (not shown), and at least one of the carrier shafts 223 is grounded (not shown). , causing the discharge gas on the surface of the copper target 23 to ionize and generate a plasma, and the ions or ions are struck on the copper target 23 by the ions of the plasma, and the atomic group is deposited on the outer circumferential surface 300b of the film to be coated, A film layer may be formed on the outer circumferential surface 300b.

It can be understood that when the lens holder 30 is moved to oppose the copper target 23, the lens holder 30 rotates about its own central axis, and the geometrical position of any portion on the outer circumferential surface 300b of the lens holder 30 is consistent with respect to the copper target 23. Therefore, the thickness of the film layer formed on the outer circumferential surface 300b is uniform. A suitable film thickness can be obtained by controlling the rotational speed. Further, in the sputtering type plating apparatus of the present invention, since it is not necessary to provide a large target and the target beam does not need to be dispersed, the utilization ratio of the target can be improved, and the cost reduction effect can be achieved.

Referring to FIG. 6, a sputtering type coating apparatus 60 according to a second embodiment of the present invention is basically the same as the sputtering type coating apparatus 20 provided by the first embodiment of the present invention, and the difference is that the sputtering type coating is provided. The device 60 further includes a loading chamber 62, an unloading chamber 63, a heating chamber 64, and a cleaning chamber 65. The transmission device 221 is disposed in the loading chamber 62, the heating chamber 64, the cleaning chamber 65, the coating working chamber 61, and The bottom portion 210 of the unloading chamber 63 is communicated with the loading chamber 62, the heating chamber 64, the cleaning chamber 65, and the unloading chamber 63 through an exhaust pipe, respectively.

Specifically, the loading chamber 62, the heating chamber 64, the cleaning chamber 65, the coating working chamber 61, and the unloading chamber 63 are sequentially disposed adjacent to each other. The loading chamber 62 is configured to receive a mirror holder 30 to be coated, and the unloading chamber 63 is configured to receive the mirrored lens holder 30.

The heating chamber 64 is configured to receive and heat the lens holder 30 before the plasma holder 30 to be coated into the cleaning chamber 65 for plasma cleaning, to dry the lens holder 30, and lift the lens holder 30. The coating working chamber 61 performs the coating quality at the time of coating.

The cleaning chamber 65 is used for plasma cleaning of the outer circumferential surface 300b of the mirror holder 30 before the mirror holder 30 is sent to the coating working chamber 2161 for coating, so that the mirror holder 30 is to be treated. The outer circumferential surface 300b of the coating is kept clean, so that a preferable coating effect is obtained in the coating working chamber 61.

The transport device 221 is disposed at the bottom of the loading chamber 62, the heating chamber 64, the cleaning chamber 65, the coating working chamber 61, and the unloading chamber 63, so that the mirror holder 30 can be driven in the loading chamber 62 and the heating chamber 64, respectively. The cleaning chamber 65, the coating working chamber 61, and the unloading chamber 63 perform linear motion.

In addition, the vacuuming device 24 can independently vacuum the loading chamber 62, the heating chamber 64, the cleaning chamber 65, the coating working chamber 61 and the unloading chamber 63, and the loading chamber 62, the heating chamber 64, the cleaning chamber 65, The degree of vacuum of the coating working chamber 2161 and the unloading chamber 63 can be adjusted according to the operation needs.

Sputter coating apparatus 20, 60 provided by the first embodiment and the second embodiment of the present invention, respectively By providing a carrier 22 that can move linearly along the coating working chambers 21, 61 and arranging at least one carrier shaft 223 of the carrier 22 to be rotatable about its central axis, the carrier 22 can be used to drive the at least one The bearing shaft 223 and the mirror holder 30 carried thereon are sequentially coated, so that the continuous operation of the coating can be realized; and the at least one bearing shaft 223 and the mirror holder 30 carried thereon are driven around the center thereof through an independently controlled auxiliary unit. The shaft is rotated, thereby achieving a uniform film layer on the outer circumferential surface 300b of the mirror holder 30 to be coated.

In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

20‧‧‧Sputter coating device

21‧‧‧ Coating Studio

22‧‧‧ Carrier

23‧‧‧ Targets

221‧‧‧Transportation device

Claims (10)

A sputter coating apparatus comprising: a coating working chamber; a carrying device, the carrying device comprising a conveying device, a fixing frame and at least one carrying shaft, the conveying device is disposed at the bottom of the working chamber, and The linear movement can be performed along the extending direction of the bottom of the working chamber. The fixing frame is disposed on the conveying device, and the transmission device drives the linear movement along the extending direction of the bottom of the coating working chamber. The at least one bearing shaft is disposed. On the mounting frame, and for carrying the workpiece, and driving the workpiece to rotate around; and at least one target disposed in the coating working chamber for coating the workpiece. The sputter coating apparatus of claim 1, wherein the carrier further comprises an auxiliary unit coupled to the at least one carrying shaft to rotate the at least one carrying shaft about its central axis. The sputter coating apparatus of claim 2, wherein the at least one load bearing shaft has a gear at one end, the auxiliary unit comprises at least one plate member having a sawtooth surface, the at least one tooth surface and the at least one sawtooth surface A gear at one end of the load bearing shaft mechanically engages, and when the at least one plate member moves relative to the fixed frame, the at least one load bearing shaft is rotatable about its central axis. The sputter coating apparatus according to claim 1, wherein the transport device is a transport belt. The sputter coating apparatus according to claim 1, wherein the sputter coating apparatus further comprises a cleaning chamber disposed adjacent to the coating working chamber for accommodating and cleaning the workpiece. The sputter coating apparatus of claim 5, wherein the sputter coating apparatus further comprises a heating chamber disposed adjacent to the cleaning chamber for receiving and The workpiece is dried. The sputter coating apparatus of claim 6, wherein the sputter coating apparatus further comprises a loading chamber and an unloading chamber, the loading chamber being disposed adjacent to the heating chamber, the unloading chamber and the The coating chambers are disposed adjacent to each other, and the loading chamber is for receiving a workpiece to be coated, and the unloading chamber is for accommodating the coated workpiece. The sputter coating apparatus of claim 7, wherein the sputter coating apparatus further comprises a vacuuming device, the vacuuming device is respectively connected to the loading chamber, the heating chamber, and the The cleaning chamber, the coating working chamber, and the unloading chamber are in communication to independently evacuate the loading chamber, the heating chamber, the cleaning chamber, the coating working chamber, and the unloading chamber. The sputter coating apparatus according to claim 1, wherein the sputter coating apparatus further comprises at least one target electrode disposed in the working chamber, wherein each of the target electrodes respectively loads each target. A sputter coating method comprising the steps of: (1) providing a sputter coating apparatus according to claim 1; (2) at least one workpiece on the at least one load bearing shaft; The transport device drives the at least one load bearing shaft to move linearly in a direction close to the at least one target, and the at least one load bearing shaft rotates about the central axis thereof; and (3) bombard the at least one target material to the at least one The workpiece is coated.