1373565 第095107150號專利申請案 1〇1年5月17日修正替換頁 九、發明說明： 【發明所屬之技術領域】 本發明係關於-種真空排氣系統，尤其有關將半導體 製造製程或液晶製造製程等所使用的真空處理室，排氣成 真空的真空排氣系統者。 【先前技術】 以往，在半導體製造製程或液晶製造製程等作業中， 使用將真空處理室排氣成真空的真空排氣系統。此種真空 排氣系統中，係將真空泵依一定的常規運轉，而無關半導 體製造製程或液晶製造製程等的狀況。但是，將真空泵連 .續依一定的常規運轉而無關製程狀態時，隨著真空泵移送 的氣體量(氣體負載)增多，施加在真空泵的負載亦增大。 因此，有真空排氣系統效率變差，真空泵壽命變短的問題。 而且，真空排氣系統係藉由冷卻水將真空泵予以冷 卻’但該冷卻水亦經常以—定量供給到真空泵，而無關製 程狀態。因此，負載小時會供給超過需要的冷卻水，而有 浪費過多冷卻水的問題。 _ #者’根據導人真空泵内部的製程氣體種類，而有反 應田J生成物固化在真空泵内部的情形。此種反應副生成物 係混入在泵轉子的轴承或潤滑油，而有縮短真空果壽命之 虞’因此在真空泵的軸承部分導入氮氣(軸密封氣體），用 於防止反應副生成物混入的情形。 先刖的真空排氣系統中，係經常導入一定量的轴密封氣 體而無關製程狀態’但導人大量軸㈣氣體時，會對無負 317886修正本 5 1373565 ·* 「 第095107150號專利申請案 •料^之到賴力造成料，因此有 讀乳體置之情形。但是’減少轴密封氣體量時，會有反 應副生成物混入泵轉子的軸承或潤滑油，而使真空果停止 .的問題。 【發明内容】 [發明所欲解決的問題] 本發明係鑑於此種先前技術之問題而研發者，其目的 在於提供-種真空排m可在製程狀態以最佳狀態運 轉’以提高真空排氣系統的效率。 [解決問題的手段] 本發明的第1態様係提供一種真空排氣系統，可對製 ^狀態以最適當的流量將冷卻水供給到真空泵，以提高真 空排氣系統的效率，並避免浪費冷卻水。該真空排氣系統 係具備：至少-個真空栗；設置在上述真空排氣系統中的 真空區域之壓力感測器；及用於將冷卻水供給到上述至少 一個真空泵的冷卻水系統。上述真空泵係具備：用以移送 氣體的一對轉子；用以使上述一對轉子旋轉的電動機；及 -用以使上述一對轉子同步的時序齒輪。上述真空排氣系統 復具備控制部，根據上述壓力感測器所檢測出的壓力，控 制流通在上述冷卻水系統的冷卻水流量。上述控制部係在 由上述壓力感測器所檢測出的壓力大於預定値時，增加流 通在上述冷卻水系統的冷卻水流量為佳。上述真空排氣系 統又包含前段真空泵和設置於該前段真空泵之後段之後段 真空栗的兩個上述真空菜’且上述冷卻水系統係以對上述 317886修正本 二 第095107150號專利申請案 .錢給冷卻 述後段真气内：：係以對上述前段真空泵供給流動於上 曼段真^内之冷卻水的方式構成為佳 :=t终段部設置有溫度感測器為佳。在二 '、統之上述轉子最終段部的上游側 :闕連接有將冷卻水-於該轉子最終段二 ^發明㈣2態㈣提供-種真轉氣线，可對製 以最適當的流量將軸密封氣體供給 =排氣系統的效率，並防止反應副生成物混!於= 栗的軸承部分。該真空減系婦、具備：至少__個真 述真空排氣系統中的真空區域之屋力感測及 用以將軸密封氣體供給到上述至少一個真 統。上述真空栗係具傷：用以移送氣體的一對轉子1用= 旋轉的電動機；及用於使上述-對轉子同 步㈣序齒輪。上述真空排氣系統復具備控制部，根據由 感測器所？測出的壓力’控制流通在上述氣體系 所檢測出的塵力大於預定力感测器 ® "翌刀九;^預疋値時，增加流通在上述氣體 的轴密封氣體流量為佳。上述真空排氣系統又包含前段真 j和設置於該前段真空泵之後段之後段真空泵的兩個前 述真空栗’且前述氣體系統具有通常線和增量線，且以對 f述前段真空栗及前述後段真空系供給軸密封氣體的方式 構成為佳。上述控制部係藉由控制上述增量線之流量而個 317886修正本 7 1373565 第 095107150 號專利 卜心月π曰修= 別地控制對上述前段真空泵及上述後段 封氣體的流量為佳。上述增量線係以對上述前段真空泵供 給之軸密封氣體的流量比對上述後段真空泵供.給之軸密封 氣體的流量還少的方式構成為佳。上述增量線僅連接於上 述前段真空泵之低壓側及高壓側、以及上述後段真空泵之 低壓側。上述控制部在由上述壓力感測器所檢測出=壓力 大於預定值時，開啟設置於上述增量線的開關為佳。上 述壓力感測器設置於連接上述前段真空泵與上述後段真空 泵的連接管為佳。 本發明的第3態様係提供一種真空排氣系統，可對製 程狀態以最適當的流量將冷卻水供給到真空果，以提高真 空排氣系統的效率，並避免浪費冷卻水。該真空排氣系統 係具備：至少-個真空栗；及用以將冷卻水供給到上述至 少一個真空泵的冷卻水系統。上述真空泵係具備：用以移 送氣體的一對轉子；用以使上述一對轉子旋轉的電動機； =用=使上述-對轉子同步的時序齒輪。上述真空排氣系 統设具備控制部，根據表示連接有上述至少—個真空果的 工處理至中之製程狀態的信號，控制流通在上述冷卻水 系統的冷卻水流量。 本發月的第4態様係提供—種真空排氣系統，可對製 適#的流量將軸密封氣體供給到真空栗，以提 Ϊ的統的效率’並防止反應副生成物混入於真空 =軸承Μ。該真空排氣系統係具備：至少 及用以將轴密封氣體供給到上述至少一個真空系的氣體系 317886修正本 Ϊ373565 第095107150號專利申請案 101年5月Π a修正替換1 • 统。上述真空泵係具備：用以移送氣體的一對轉子；用以 使上述一對轉子旋轉的電動機；及用以使上述一對轉子同 步的時序齒輪。上述真空排氣系統復具備控制部，根據表 .不連接有上述至少一個真空泵的真空處理室中之製程狀態 •的信號’控制流通在上述氣體系統的軸密封氣體流量❶ [發明之效果] 根據本發明的第1及第3態樣，由於可根據壓力感測 器檢測出真空排氣系統中的真空區域之壓力，且根據檢測 虽J的壓力或根據表示製程狀態的信號，控制供給到真空泵 的冷卻水流量，因此可將供給到真空泵的冷卻水流量，調 整成最適於製程狀態之量。因而，可提高真空排氣系統的 效率’且可避免浪費冷卻水。 根據本發明的第2及第4態様，由於可根據壓力感測 器檢，出真空棑氣系統十的真空區域之壓力，且根據檢測 出的壓力或根據表示製程狀態的信號，控制供給到真空泵 的，密封氣體流量，因此可將供給到真空栗的轴密封氣體 流量，調整成最適於製程狀態之量。因而，可提高真空排 .氣系統的效率，以會對無負載時的栗之到達堡力造成影 響，並防止反應副生成物混入於真空泵的軸承部分。 【實施方式】 以下，參照第1圖至第8圖詳細説明本發明之真空排 氣系統的實施形態。此外’在第！圖至第8圖中，對=同 或相當之構成元件，賦予相同符號而省略重覆説明。 第1圖係表示本發明的第】實施形態中的真空排氣系 317886修正本 9 1373565 第095107150號專利申請案 統10之模式圖。如笙！ 飞圖如第1圖所示，該真空排氣系統10係用 =將"體製造製程或液晶製造製程等所使用的真空處理 室12排氣成真空者，此真空排氣系統具備:2台真空泵20、· 30,用以連接前段真空泵2〇和後段真空泵3〇的連接管 40 ’用以檢測連接管4〇内部壓力的麼力感測器5〇 ;及用 以控制真空栗20、30的控制部60。壓力感測器5〇係檢測 出屬於真空區域之連接管4〇内的氣體壓力，且將檢測到的 壓力値信號傳送到控制部6〇。壓力感測器5〇亦可安裝在 真空區域之任何位置。例如，亦可將壓力感測器5〇安裝在 真空處理室12和前段真空泵2〇之間。 刖段真空泵20係具備：用以收容一對轉子的外殼2丄、 用以使轉子旋轉的電動機定子22、用以收容使一對轉子同 步旋轉的時序齒輪之齒輪蓋23、配置在外殼21和電動機 定子22之間的第1侧蓋24、配置在外殼21和齒輪蓋23 之間的第2侧蓋25、用以控制電動機定子22旋轉速度的 驅動器26。驅動器26係接受來自控制部60的信號而以預 定之旋轉速度使電動機旋轉。 在前段真空泵20中，驅動電動機定子22時，一對轉 子係於外殼21内面及轉子彼此之間保持微小間隙，不接觸 且朝反方向旋轉。隨著一對轉子之旋轉，吸入側的氣體係 封閉在轉子和外殼21之間而移送到送出側的連接管4〇。 後段真空泵3 0係具備：用以收容一對轉子的外殼31、 用以收容使轉子旋轉的電動機之電動機定子32、用以收容 使一對轉子同步旋轉的時序齒輪之齒輪蓋33、配置在外殼 317886修正本 10 31和齒輪蓋33之間的侧蓋35、及用以控告 ㈣速度的驅動器36。驅動器％係接受來自 信號而以預定之旋轉速度使電動機旋轉。.. 的 在後段真空泵3〇中，驅動電動機定子犯時，一對轉 子係於外殼31内面及轉子彼此之間保持微小間隙，不接觸 且朝反方向旋轉。隨著一對轉子之旋轉，吸入侧的連接管 40内的氣體封閉係在轉子和外殼以之間而移送到送出側。 在此’真空泵20、30移送的氣體量（氣體負載）變多 施加在真空栗20、3〇的負載亦增大，連接管4〇内的 氣體壓力亦上升。因而，本實施形態中’藉由壓力感測器 50檢測出連接官内的氣體壓力，且在檢測出的壓力值 超過預定之設定值時’從控制部60將指令（信號）傳送到 驅動器26及/或驅動器36,使前段真空果20及/或後段真 二泵30的旋轉速度降低。藉由此種方式，在移送的氣體量 變多時減輕對真空泵20、3〇的負载。 而且，根據由壓力感測器50所檢測出的壓力值，可掌 握真工處理至12 #製程狀態。例如，根據由壓力感測器 50所檢測到的壓力值，可檢測真空處理室12中的半導體 製造製程或液晶製造製程之停止及開始。因而，亦可從壓 力感測器50所檢測出的壓力值掌握真空處理室12的製程 狀態’且控制前段真空泵20及/或後段真空泵3〇的旋轉速 度’以成為適於該製程狀態之旋轉逮度。 例如，製程停止時’如第2圖（a)所示，可先降低前 段真空泵20的旋轉速度，再降低後段真空泵3〇的旋轉速 317886修正本 11 1373565 第095107150號專利申請案 1〇1年5月17曰修正替換頁 度。而且’製程開始時’如第2圖⑴戶 段真空泵30的旋轉速度’再提高前段真空泵2〇的旋轉速 度。後段真空泵30對真空排氣系統.1〇的排氣性能影響很 大。例如，降低旋轉速度後，再度提高旋轉速度時，由於 發熱量不會立即變大，可將後段真空泵3〇的旋轉速度保持 不變，以使因熱膨脹造成的轉子和外殼31之間的間隙保持 疋且考慮對反應副生成物的因應措施時，可將後段真 空泵30的旋轉速度保持成一定，以維持溫度。 ’ 第3圖係表示本發明的第2實施形態中的真空排氣系 統11 〇之模式圖。如第3圖所示，該真空排氣系統i丨〇係 除了第1實施形態的構成之外，復具備用以將冷卻水供給 到前段真空泵20和後段真空泵30的冷卻水系統17(^該 冷卻水系統170係使冷卻水從導入口 171通過後段真空泵 30的電動機定子32、外殼31的轉子最終段部131、齒輪 蓋33 ’再通過刖段真空栗2〇的齒輪蓋23、電動機定子22 之後，從排出口 172排出，而將後段真空泵3〇及前段真空 泵2 0予以冷卻者。 在冷卻水系統170的後段真空泵30上游侧，設有通常 線173和增量線174。流通在通常線173内的冷卻水流量 例如為11/min，流通在增量線174内的冷卻水流量例如為 51/min。在增量線174設有電磁閥Π5。 本實施形態中’利用由壓力感測器5〇所檢測出的壓力 值掌握真空處理室12的製程狀態，而調整流通在冷卻水系 统170的冷卻水’以成為適於製程狀態的流量。亦即，由 317886修正本 12 1373565 第095107150號專利申請案 1〇1年5月17日修正替換頁 壓力感測益5 0所檢測出的壓力值超過預定的設定值時，打 開增量線17 4的電磁閥17 5 ’以增加流通在冷卻水系統17 〇 的冷卻水量。如此，可將流通在冷卻水系統17〇的冷卻水 量調整成對應製程狀態的適當量，因此不會浪費冷卻水， 且可有效地冷卻真空泵20、30。 而且’亦可取代此種通常線173和增量線174 ,而在 導入口 171附近裝設電磁閥176 ’藉由開閉該電磁閥176 的方式調整冷卻水系統170的全部流量。再者，亦可取代 設置在連接管40的壓力感測器5〇 ’而在連接前段真空栗 2〇和真空處理室12的連接管13裝設壓力感測器17'7 =根 據由該壓力感測器177所檢測出的壓力值’控制流通在冷 卻水系統17 0的冷卻水量。 在此，外殼31的轉子最終段部131變成大氣壓侧，因 此發熱里變大。因而，本實施形態中，係使冷卻水系統 通過外殼31的轉子最終段部131，藉由冷卻水冷卻轉子最 終段部13卜然而’使轉子最終段部131過度冷卻時，會 有氣體固化而固著在外殼31之虞。因此，本實施形態中， f轉子最、、X段部131裝設溫度感測器132，測量轉子最終 =。卩131的溫度，而將轉子最終段部丨31維持在適當的高 胍:此外，如第3圖所*，在轉子最終段部ΐ3ι上游侧的 >部水系統170裝设三通閥178，在該三通閥⑺安裝有 連接在轉子最終段部131.下游侧的旁通管179。 ^圖係表示本發明的第3實施形態中的真空排氣系 之模式圖。如第4圖所示，該真空排氣系統210係 317886修正本 13 1373565 第095107150號專利申請案 年5月17日修正替換百 除了第1實施形態的構成之外，復具備 '以供給在前段真空泵20和後段真空泵30當作軸密封氣體 之氮氣。該氮氣系統270係將氣.氣從導入口 .271.供給到各 •前段真空泵2〇的第1側蓋24、第2側蓋25、後段真空栗 30的外殼31中的軸密封部231a、側蓋35,且防止反應副 生成物混入於前段真空泵20和後段真空泵3〇的軸承部分。 氣氣系統270係由通常線273和增量線274所構成， 在增量線274設有電磁閥275。本實施形態中，利用由壓 力感測器50所檢測出的壓力值掌握真空處理室（未圖示） 的製程狀態，且調整流通在氮氣系統27〇的氮氣，以成為 適於製程狀態的流量。亦即，壓力檢測器5〇所檢測出的壓 力值超過預定的設定值時，打開增量線274的電磁閥275, 4加通在氮氣系統270的氮氣量。如此，可將流通在氮 氣系統270的氮氣量調整成對應製程狀態之適當量，因此 不會對無負載時的泵之到達壓力造成影響，而可防止反應 田1J生成物混入於真空栗20、30的軸承部分。 此外，因為前段真空泵2〇降低位於上流的真空處理室 的到達壓力，因此通過增量線274a流入前段真空泵2〇的 •氮氣，量，係比通過增量線274b流入後段真空泵30的氮 軋流I少。而且，亦可在對氮氣系統27〇的前段真空泵2〇 及後段真空泵30的供給部，分別裝設電磁閥（例如符號 276、277所示），個別地控制供給到各部之氮氣量。 第5圖係表示本發明的第4實施形態中的真空排氣系 統310之模式圖。如第5圖所示，該真空排氣系統31〇係 317886修正本 1373565 第095107150號專利申請案 101年5月17日修正替換頁 於第1圖所不之第1實施形態的真空排氣系統10中，取代 使用壓力感測器50 ’而將表示製程狀態的外部輸入信號 370輸入到控制部6〇，且根據該外部輸入信號37〇，調整 則段真空栗20及後段真空栗30的旋轉速度。關於其他各 點，與上述第1實施形態同様。 第6圖係表示本發明的第5實施形態中的真空排氣系 統410之模式圖。如第6圖所示，該真空排氣系統41〇係 於第3圖所示之第2實施形態中的真空排氣系统ιι〇，取 代使用壓力感測器5〇,而將表示製程狀態的外部輸入信號 370輸入到控制部6〇，且根據該外部輸入信號37〇，調整 供給到前段真空泵2〇及後段真空泵3〇的冷卻水流量。關 於其他各點，與上述第2實施形態同様。 第7圖係表示本發明的第6實施形態中的真空排氣系 統510之模式圖。如第7圖所示，該真空排氣系統510係 於第4圖所示之第3實施形態的真空排氣系統210中，取 代使用壓力感測器5〇,而將表示製程狀態的外部輸入信號 370輸入到控制部6〇，根據該外部輸入信號"ο，調整供 給到前段真空栗20及後段真空泵3〇的氣氣流量。關於； 他各點，與上述第3實施形態同様。 第8圖係表示本發明的第7實施形態中的真空排氣系 統610之模式圖。該真空排氣系統61〇係組合上述第1至 第6實施形態者。此時，亦可根據由壓力感測$ 50所檢測 出的壓力値’調整前段真空泵20及後段真空泵30的旋轉 速度、供給到前段真空$ 20及後段真空果30 _冷卻水流 317886修正本 15 1373565 ， ·' 第095107150號專利申請案 101年5月17曰修正替換頁 量、及供給到前段真空泵20及後段真空泵30的氮氣流量， ' 或亦可將表示製程狀態的外部輸入信號370輸入到控制部 60 ’而根據該外部輸入信號370，調整前段真空泵20及後 . 段真空泵30之旋轉速度、供給到前段真空泵20及後段真 空果30的冷卻水流量、及供給到前段真空泵2〇及後段真 空泵30的氮氣流量。 在此，外部輸入信號370係表示製程之停止及開始的 信號，且係較壓力感測器50的檢測値更適當地表示製程狀 癌之資訊。因而’可使用外部輸入信號37〇時，未必要使 用壓力感測器50。而且’若能在比實際製程時間更早將製 程之停止或開始當作外部輸入信號37〇輸入到控制部6〇， 則可將前段真空泵2〇及後段真空泵3〇設定在最適當狀態 後’停止或開始製程。 至此已説明關於本發明之—實施形態，但本發明不限 於上述實施形態，當然亦可在其技術的思想範圍内以各種 不同的形態實施。 【圖式簡單說明】 第1圖係表示本發明的第丨實施形態中的真空排氣系 統之模式圖。 第圖（a)及（b)係表示本發明的第1實施形態中 的旋轉速度變化之曲線圖。 ， =圖係表示本發明的第2實施形態中的真 統之模式圖。 第4圖係表示本發明的第3實施形態中的真空排氣系 317886修正本 1373565 統之模式圖。 第5圖係表示本發明的第 統之模式圖。 第6圖係表示本發明 統之模式圖。 第7圖係表示本發明 統之模式圖。 第095107150號專利申請案 1〇1年5月17日修正替換頁 4實施形態中的真空排氣系 的第5實施形態中的真空排氣系 的第6實施形態中的真空排氣系 第8圖係表示本發明的第7實施形態中 統之模式圖。 〜 【主要元件符號說明】 的真空排氣系 10 、 110 、 12 21 ' 31 23、33 26、36 50 、 177 131 171 174 ' 274 270 40 60 170 173 、 273 175 、 176 、 370 510 、 610 20、30 22、32 24 、 25 、 35 210、310、410、 真空處理室 外殼 齒輪蓋 驅動器 壓力感測器 最終段部 導入口 增量線 氮氣系統 真空排氣系統 真空泵 電動機定子 側蓋 連接管 控制部 冷卻水系統 通常線 275電磁閥 外部輸入信號 317886修正本1373565 Patent Application No. 095,107,150, filed on May 17, 2011, the entire disclosure of the present invention is hereby incorporated by reference. The vacuum processing chamber used in the process, etc., is a vacuum evacuation system that is evacuated to a vacuum. [Prior Art] Conventionally, in a semiconductor manufacturing process or a liquid crystal manufacturing process, a vacuum exhaust system that evacuates a vacuum processing chamber to a vacuum is used. In such a vacuum exhaust system, the vacuum pump is operated according to a certain routine, regardless of the conditions of the semiconductor manufacturing process or the liquid crystal manufacturing process. However, when the vacuum pump is connected and the continuous operation is continued regardless of the process state, as the amount of gas (gas load) transferred by the vacuum pump increases, the load applied to the vacuum pump also increases. Therefore, there is a problem that the efficiency of the vacuum exhaust system is deteriorated and the life of the vacuum pump is shortened. Moreover, the vacuum exhaust system cools the vacuum pump by means of cooling water 'but the cooling water is also often supplied to the vacuum pump in a quantitative manner regardless of the process state. Therefore, the load will supply more cooling water than necessary, and there is a problem of wasting excessive cooling water. _#者' is based on the type of process gas inside the vacuum pump, and there is a case where the reaction product J is solidified inside the vacuum pump. This reaction by-product is mixed with the bearing or the lubricating oil of the pump rotor, and the life of the vacuum is shortened. Therefore, nitrogen gas (shaft sealing gas) is introduced into the bearing portion of the vacuum pump to prevent the reaction product from entering. . In the first-hand vacuum exhaust system, a certain amount of shaft sealing gas is often introduced regardless of the process state. However, when a large number of shaft (four) gases are introduced, there will be no negative 317886 correction. 5 1373565 ·* "Patent No. 095107150 Patent Application • The material is applied to the material, so there is a case where the milk is read. However, when the amount of the shaft sealing gas is reduced, there is a bearing or lubricating oil in which the reaction by-product is mixed into the pump rotor, and the vacuum is stopped. [Problem to be Solved by the Invention] The present invention has been made in view of the problems of the prior art, and an object thereof is to provide a vacuum row m which can be operated in an optimum state in a process state to increase vacuum. The efficiency of the exhaust system. [Means for Solving the Problem] The first aspect of the present invention provides a vacuum exhaust system that supplies cooling water to a vacuum pump at an optimum flow rate to improve the vacuum exhaust system. Efficiency and avoid waste of cooling water. The vacuum exhaust system is provided with: at least one vacuum pump; a pressure sensor disposed in a vacuum region of the vacuum exhaust system; Cooling water is supplied to the cooling water system of the at least one vacuum pump. The vacuum pump includes: a pair of rotors for transferring gas; a motor for rotating the pair of rotors; and - for synchronizing the pair of rotors The timing gear includes a control unit that controls a flow rate of cooling water flowing through the cooling water system based on a pressure detected by the pressure sensor. The control unit is detected by the pressure sensor. When the pressure is greater than the predetermined enthalpy, it is preferable to increase the flow rate of the cooling water flowing through the cooling water system. The vacuum venting system further includes a front vacuum pump and two vacuum dishes of the vacuum pump disposed after the anterior vacuum pump. And the above-mentioned cooling water system is modified by the above-mentioned 317,886, the patent application of the Japanese Patent No. 095107150. The money is supplied to the cooling section in the latter part of the air: the method of supplying the cooling water flowing in the upper section of the vacuum pump to the front section The composition is better: = t is provided at the end of the section with a temperature sensor. In the second section of the rotor Side: 阙 connection with cooling water - in the final section of the rotor II invention (four) 2 state (four) provides a kind of true gas line, can supply the shaft sealing gas to the most appropriate flow rate = exhaust system efficiency, and prevent The reaction by-products are mixed in the bearing portion of the pumping unit. The vacuum-reducing system has at least: a house force sensing in a vacuum region in a vacuum exhaust system and a supply of the shaft sealing gas to the above At least one of the above-mentioned vacuum chests is inflicted with: a pair of rotors 1 for transferring gas with a motor for rotation; and a synchronous gear for synchronizing the above-mentioned rotors. The vacuum exhaust system is provided with a control unit. According to the pressure measured by the sensor, the dust force detected in the gas system is greater than the predetermined force sensor® "翌刀九;^疋値疋値, increasing the circulation of the gas in the axis The sealing gas flow rate is preferred. The vacuum exhaust system further includes a front section and a plurality of the aforementioned vacuum pumps disposed in the vacuum pump after the front section of the vacuum pump, and the gas system has a normal line and an incremental line, and the front section of the vacuum pump and the aforementioned It is preferable that the rear vacuum is supplied to the shaft to seal the gas. The above-mentioned control unit corrects the flow rate by controlling the flow rate of the above-mentioned incremental line. The method of the above-mentioned vacuum pump and the above-mentioned rear-seal gas is preferably controlled. Preferably, the incremental line is configured such that the flow rate of the shaft seal gas supplied to the front stage vacuum pump is smaller than the flow rate of the shaft seal gas supplied to the rear stage vacuum pump. The incremental line is connected only to the low pressure side and the high pressure side of the front stage vacuum pump and the low pressure side of the rear stage vacuum pump. Preferably, when the pressure sensor detects that the pressure is greater than a predetermined value, the control unit opens the switch provided on the incremental line. Preferably, the pressure sensor is disposed on a connecting pipe connecting the front stage vacuum pump and the rear stage vacuum pump. The third aspect of the present invention provides a vacuum exhaust system for supplying cooling water to a vacuum at an optimum flow rate in a process state to improve the efficiency of the vacuum exhaust system and to avoid wasting cooling water. The vacuum exhaust system is provided with: at least one vacuum pump; and a cooling water system for supplying cooling water to the at least one vacuum pump. The vacuum pump includes a pair of rotors for transferring gas, a motor for rotating the pair of rotors, and a timing gear for synchronizing the rotors with the above-mentioned rotors. The vacuum exhaust system is provided with a control unit that controls the flow rate of the cooling water flowing through the cooling water system based on a signal indicating a process state in which the at least one vacuum is connected to the process. The fourth state of the month provides a vacuum exhaust system that supplies the shaft seal gas to the vacuum pump for the flow rate of the system to improve the efficiency of the reactor and prevent the reaction by-products from being mixed into the vacuum. Bearing Μ. The vacuum exhaust system is provided with: at least a gas system for supplying a shaft seal gas to the at least one vacuum system. 317886 Amendment Ϊ 373565 Patent Application No. 095107150 May 2011 Π a Correction Replacement 1 • System. The vacuum pump includes a pair of rotors for transferring gas, a motor for rotating the pair of rotors, and a timing gear for synchronizing the pair of rotors. The vacuum exhaust system further includes a control unit that controls a flow rate of the shaft seal gas flowing through the gas system according to a signal of a process state in the vacuum processing chamber in which the at least one vacuum pump is not connected. [Effect of the invention] According to the first and third aspects of the present invention, the pressure in the vacuum region in the vacuum exhaust system can be detected based on the pressure sensor, and the supply to the vacuum pump can be controlled based on the pressure of the detection J or the signal indicating the state of the process. The flow rate of the cooling water can therefore adjust the flow rate of the cooling water supplied to the vacuum pump to the amount most suitable for the process state. Thus, the efficiency of the vacuum exhaust system can be improved and waste of cooling water can be avoided. According to the second and fourth aspects of the present invention, since the pressure of the vacuum region of the vacuum helium system 10 can be detected according to the pressure sensor, and the supply to the vacuum pump is controlled based on the detected pressure or a signal indicating the state of the process. The gas flow rate is sealed, so that the flow rate of the shaft sealing gas supplied to the vacuum pump can be adjusted to the optimum amount for the process state. Therefore, the efficiency of the vacuum exhaust gas system can be improved to affect the arrival force of the pump at the time of no load, and to prevent the reaction by-product from being mixed into the bearing portion of the vacuum pump. [Embodiment] Hereinafter, embodiments of the vacuum exhaust system of the present invention will be described in detail with reference to Figs. 1 to 8 . Also' in the first! In the drawings, the same or equivalent components are denoted by the same reference numerals, and the repeated description is omitted. Fig. 1 is a schematic view showing a vacuum exhaust system 317 886 in the first embodiment of the present invention. Such as 笙! As shown in Fig. 1, the vacuum exhaust system 10 is configured to evacuate a vacuum processing chamber 12 used in a body manufacturing process or a liquid crystal manufacturing process, and the vacuum exhaust system has: 2 a vacuum pump 20, · 30, for connecting the front vacuum pump 2 〇 and the rear section vacuum pump 3 〇 connecting pipe 40 ′ for detecting the internal pressure of the connecting pipe 4 的 force sensor 5 〇; and for controlling the vacuum pump 20 Control unit 60 of 30. The pressure sensor 5 detects the gas pressure in the connecting pipe 4〇 belonging to the vacuum region, and transmits the detected pressure 値 signal to the control unit 6〇. The pressure sensor 5〇 can also be mounted anywhere in the vacuum zone. For example, the pressure sensor 5A can also be installed between the vacuum processing chamber 12 and the front vacuum pump 2A. The vacuum pump 20 includes a casing 2 for accommodating a pair of rotors, a motor stator 22 for rotating the rotor, a gear cover 23 for accommodating a timing gear for rotating a pair of rotors, and a casing 21 and The first side cover 24 between the motor stators 22, the second side cover 25 disposed between the outer casing 21 and the gear cover 23, and the driver 26 for controlling the rotational speed of the motor stator 22. The driver 26 receives a signal from the control unit 60 and rotates the motor at a predetermined rotational speed. In the front stage vacuum pump 20, when the motor stator 22 is driven, the pair of rotors are kept in a small gap between the inner surface of the outer casing 21 and the rotor, and are rotated in the opposite direction without contact. As the pair of rotors rotate, the gas system on the suction side is closed between the rotor and the outer casing 21 and transferred to the connecting pipe 4' on the delivery side. The rear stage vacuum pump 30 includes a casing 31 for accommodating a pair of rotors, a motor stator 32 for accommodating a motor for rotating the rotor, and a gear cover 33 for accommodating a timing gear for synchronously rotating the pair of rotors, and is disposed in the casing. 317886 modifies the side cover 35 between the present 10 31 and the gear cover 33, and the driver 36 for accusing the (four) speed. The driver % receives the signal and rotates the motor at a predetermined rotational speed. In the rear stage vacuum pump 3, when the motor stator is driven, the pair of rotors are kept in a small gap between the inner surface of the outer casing 31 and the rotor, and are not contacted and rotate in the opposite direction. As the pair of rotors rotate, the gas in the connecting pipe 40 on the suction side is closed between the rotor and the casing and transferred to the delivery side. Here, the amount of gas (gas load) transferred by the vacuum pumps 20 and 30 is increased. The load applied to the vacuum pumps 20 and 3 is also increased, and the pressure of the gas in the connecting pipe 4 is also increased. Therefore, in the present embodiment, 'the gas pressure in the connection officer is detected by the pressure sensor 50, and the command (signal) is transmitted from the control unit 60 to the driver 26 when the detected pressure value exceeds a predetermined set value. And/or the driver 36 reduces the rotational speed of the front vacuum fruit 20 and/or the rear true two pump 30. In this manner, the load on the vacuum pumps 20, 3〇 is reduced when the amount of gas to be transferred is increased. Moreover, according to the pressure value detected by the pressure sensor 50, the real processing can be grasped to the 12 #process state. For example, based on the pressure value detected by the pressure sensor 50, the semiconductor manufacturing process in the vacuum processing chamber 12 or the stop and start of the liquid crystal manufacturing process can be detected. Therefore, the process state of the vacuum processing chamber 12 can be grasped from the pressure value detected by the pressure sensor 50 and the rotational speed of the front stage vacuum pump 20 and/or the rear stage vacuum pump 3〇 can be controlled to become a rotation suitable for the process state. Caught. For example, when the process is stopped, as shown in Fig. 2(a), the rotation speed of the front stage vacuum pump 20 can be lowered first, and then the rotation speed of the rear stage vacuum pump 3 can be reduced. 317886 Amendment 11 1373565 Patent No. 095107150 Patent Application 1〇1 May 17th revised the replacement page. Further, at the start of the process, the rotational speed of the vacuum pump 30 of the first stage (1) is increased by the rotational speed of the vacuum pump 30. The rear vacuum pump 30 has a great influence on the exhaust performance of the vacuum exhaust system. For example, when the rotation speed is decreased and the rotation speed is increased again, since the heat generation does not become large immediately, the rotation speed of the rear stage vacuum pump 3〇 can be kept constant, so that the gap between the rotor and the outer casing 31 due to thermal expansion is maintained. When the countermeasure for the reaction by-product is considered, the rotation speed of the rear vacuum pump 30 can be kept constant to maintain the temperature. Fig. 3 is a schematic view showing a vacuum exhaust system 11 in the second embodiment of the present invention. As shown in Fig. 3, the vacuum exhaust system i is provided with a cooling water system 17 for supplying cooling water to the front stage vacuum pump 20 and the rear stage vacuum pump 30 in addition to the configuration of the first embodiment. The cooling water system 170 is such that the cooling water passes through the inlet 171 through the motor stator 32 of the rear vacuum pump 30, the rotor final section 131 of the outer casing 31, the gear cover 33', and the gear cover 23 of the vacuum pump 2, the motor stator 22 Thereafter, it is discharged from the discharge port 172, and the rear stage vacuum pump 3〇 and the front stage vacuum pump 20 are cooled. On the upstream side of the rear stage vacuum pump 30 of the cooling water system 170, a normal line 173 and an incremental line 174 are provided. The flow rate of the cooling water in the 173 is, for example, 11/min, and the flow rate of the cooling water flowing through the incremental line 174 is, for example, 51/min. The electromagnetic valve Π5 is provided on the incremental line 174. In the present embodiment, the pressure sensing is used. The pressure value detected by the device 5 is grasped by the process state of the vacuum processing chamber 12, and the cooling water flowing through the cooling water system 170 is adjusted to become a flow rate suitable for the process state. That is, the 312886 is modified to be 12 1373565. Patent Application No. 95107150, May 17, 2011 Correction of Replacement Page Pressure Sensing Benefits 50 When the pressure value detected exceeds a predetermined set value, the solenoid valve 17 5 ' of the incremental line 17 4 is opened to increase circulation. The amount of cooling water in the cooling water system 17 is thus adjusted to an appropriate amount corresponding to the process state, so that the cooling water is not wasted and the vacuum pumps 20, 30 can be effectively cooled. Further, 'the normal line 173 and the incremental line 174 may be replaced, and the electromagnetic valve 176' may be installed in the vicinity of the introduction port 171 to adjust the entire flow rate of the cooling water system 170 by opening and closing the electromagnetic valve 176. Instead of the pressure sensor 5' disposed in the connecting pipe 40, the pressure sensor 17'7 is installed in the connecting pipe 13 connecting the front vacuum pump 2 and the vacuum processing chamber 12 = according to the pressure sensor 177 The detected pressure value 'controls the amount of cooling water flowing through the cooling water system 170. Here, the final stage portion 131 of the outer casing 31 becomes the atmospheric pressure side, so that the heat is increased. Therefore, in the present embodiment, the cooling is performed. water system The rotor final segment portion 131 of the outer casing 31 cools the final segment portion 13 of the rotor by cooling water. However, when the final portion 131 of the rotor is excessively cooled, gas is solidified and fixed to the outer casing 31. Therefore, the present embodiment In the form, the f-rotor is the most, and the X-segment 131 is provided with the temperature sensor 132, and the temperature of the rotor finally = 卩131 is measured, and the rotor final section 丨31 is maintained at an appropriate height: in addition, as in the third In the figure, a three-way valve 178 is installed in the water system 170 on the upstream side of the rotor final section ΐ3, and a bypass pipe 179 connected to the downstream side of the final stage portion 131 of the rotor is attached to the three-way valve (7). Fig. 4 is a schematic view showing a vacuum exhaust system in a third embodiment of the present invention. As shown in Fig. 4, the vacuum exhaust system 210 is 317,886, and the first modification is in addition to the configuration of the first embodiment. The vacuum pump 20 and the rear stage vacuum pump 30 serve as a nitrogen gas for the shaft sealing gas. In the nitrogen gas system 270, the gas is supplied from the inlet port 271. to the first side cover 24, the second side cover 25, and the shaft seal portion 231a of the outer casing 31 of the rear vacuum pump 30, The side cover 35 prevents the reaction by-product from being mixed into the bearing portions of the front stage vacuum pump 20 and the rear stage vacuum pump 3''. The gas system 270 is comprised of a generally line 273 and an incremental line 274, and a solenoid valve 275 is provided on the incremental line 274. In the present embodiment, the process state of the vacuum processing chamber (not shown) is grasped by the pressure value detected by the pressure sensor 50, and the nitrogen gas flowing through the nitrogen gas system 27 is adjusted to become a flow rate suitable for the process state. . That is, when the pressure value detected by the pressure detector 5 超过 exceeds a predetermined set value, the solenoid valves 275, 4 of the incremental line 274 are turned on to increase the amount of nitrogen in the nitrogen system 270. In this way, the amount of nitrogen gas flowing through the nitrogen gas system 270 can be adjusted to an appropriate amount corresponding to the process state, so that the pressure of the pump at the time of no load is not affected, and the product of the reaction field 1J can be prevented from being mixed into the vacuum pump 20, 30 bearing parts. Further, since the front stage vacuum pump 2 〇 lowers the arrival pressure of the vacuum processing chamber located in the upper flow, the amount of nitrogen flowing into the front stage vacuum pump 2 through the incremental line 274a is a nitrogen flow flow which flows into the rear stage vacuum pump 30 through the incremental line 274b. I is less. Further, a solenoid valve (shown by symbols 276 and 277) may be separately provided to the supply portions of the front stage vacuum pump 2 and the rear stage vacuum pump 30 of the nitrogen gas system 27, and the amount of nitrogen supplied to each unit may be individually controlled. Fig. 5 is a schematic view showing a vacuum exhaust system 310 in a fourth embodiment of the present invention. As shown in FIG. 5, the vacuum exhaust system 31 is a vacuum exhaust system of the first embodiment which is modified in the first embodiment of the first embodiment of the present invention. In 10, instead of using the pressure sensor 50', an external input signal 370 indicating a process state is input to the control unit 6A, and based on the external input signal 37, the rotation of the vacuum pump 20 and the rear vacuum pump 30 is adjusted. speed. The other points are the same as those of the first embodiment described above. Fig. 6 is a schematic view showing a vacuum exhaust system 410 in a fifth embodiment of the present invention. As shown in Fig. 6, the vacuum exhaust system 41 is attached to the vacuum exhaust system ιι in the second embodiment shown in Fig. 3, and instead of using the pressure sensor 5, the process state is indicated. The external input signal 370 is input to the control unit 6A, and based on the external input signal 37〇, the flow rate of the cooling water supplied to the front stage vacuum pump 2〇 and the rear stage vacuum pump 3〇 is adjusted. Regarding other points, the same as the second embodiment described above. Fig. 7 is a schematic view showing a vacuum exhaust system 510 according to a sixth embodiment of the present invention. As shown in Fig. 7, the vacuum exhaust system 510 is incorporated in the vacuum exhaust system 210 of the third embodiment shown in Fig. 4, and instead of using the pressure sensor 5, an external input indicating the process state is input. The signal 370 is input to the control unit 6A, and the flow rate of the air supplied to the front vacuum pump 20 and the rear vacuum pump 3 is adjusted based on the external input signal " Regarding each of his points, he is the same as the third embodiment described above. Fig. 8 is a schematic view showing a vacuum exhaust system 610 in a seventh embodiment of the present invention. The vacuum exhaust system 61 is combined with the first to sixth embodiments described above. At this time, the rotational speed of the front-stage vacuum pump 20 and the rear-stage vacuum pump 30, the supply to the front-stage vacuum $20, and the rear-stage vacuum fruit 30_cooling water flow 317886 may be adjusted according to the pressure 値' detected by the pressure sensing $50. , 'Patent Application No. 095,107,150, May 17, 2011. Correction of the replacement page amount, and the flow rate of nitrogen supplied to the front stage vacuum pump 20 and the rear stage vacuum pump 30, 'or an external input signal 370 indicating the process state may also be input to the control The portion 60' adjusts the rotational speed of the front-stage vacuum pump 20 and the rear-stage vacuum pump 30, the cooling water flow supplied to the front-stage vacuum pump 20 and the rear-stage vacuum pump 30, and the supply to the front-stage vacuum pump 2〇 and the rear-stage vacuum pump according to the external input signal 370. 30 nitrogen flow. Here, the external input signal 370 is a signal indicating the stop and start of the process, and is more appropriately indicative of the information of the process cancer than the detection of the pressure sensor 50. Thus, when the external input signal 37 can be used, it is not necessary to use the pressure sensor 50. Moreover, if the stop or start of the process is input to the control unit 6〇 as an external input signal 37 earlier than the actual process time, the front vacuum pump 2〇 and the rear vacuum pump 3〇 can be set to the most appropriate state. Stop or start the process. Although the present invention has been described above, the present invention is not limited to the above-described embodiments, and it is of course possible to carry out the invention in various different forms within the scope of the technical idea. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing a vacuum exhaust system in a third embodiment of the present invention. Figs. (a) and (b) are graphs showing changes in the rotational speed in the first embodiment of the present invention. The = diagram shows a schematic diagram of the genre in the second embodiment of the present invention. Fig. 4 is a schematic view showing a modification of the vacuum exhaust system 317886 in the third embodiment of the present invention. Fig. 5 is a schematic view showing the principle of the present invention. Fig. 6 is a schematic view showing the system of the present invention. Fig. 7 is a schematic view showing the system of the present invention. In the vacuum exhaust system of the sixth embodiment of the vacuum exhaust system according to the fifth embodiment of the vacuum exhaust system of the embodiment of the present invention, the vacuum exhaust system of the vacuum exhaust system is the eighth. The figure shows a schematic diagram of a system according to a seventh embodiment of the present invention. ~ [Main component symbol description] Vacuum exhaust system 10, 110, 12 21 ' 31 23, 33 26, 36 50, 177 131 171 174 ' 274 270 40 60 170 173 , 273 175 , 176 , 370 510 , 610 20 , 30 22, 32 24, 25, 35 210, 310, 410, vacuum processing chamber housing gear cover drive pressure sensor final section inlet port incremental line nitrogen system vacuum exhaust system vacuum pump motor stator side cover connecting pipe control section Cooling water system usually line 275 solenoid valve external input signal 317886 revision