TWI372859B - Method for manufacturing an electron tomography specimen with fiducial markers and method for constructing 3d image - Google Patents

Method for manufacturing an electron tomography specimen with fiducial markers and method for constructing 3d image

Info

Publication number
TWI372859B
TWI372859B TW097138142A TW97138142A TWI372859B TW I372859 B TWI372859 B TW I372859B TW 097138142 A TW097138142 A TW 097138142A TW 97138142 A TW97138142 A TW 97138142A TW I372859 B TWI372859 B TW I372859B
Authority
TW
Taiwan
Prior art keywords
constructing
image
manufacturing
fiducial markers
electron tomography
Prior art date
Application number
TW097138142A
Other languages
English (en)
Other versions
TW201015057A (en
Inventor
Jian Shing Luo
Chia Chi Huang
Original Assignee
Inotera Memories Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inotera Memories Inc filed Critical Inotera Memories Inc
Priority to TW097138142A priority Critical patent/TWI372859B/zh
Priority to US12/471,734 priority patent/US7939906B2/en
Publication of TW201015057A publication Critical patent/TW201015057A/zh
Application granted granted Critical
Publication of TWI372859B publication Critical patent/TWI372859B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2202—Preparing specimens therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
TW097138142A 2008-10-03 2008-10-03 Method for manufacturing an electron tomography specimen with fiducial markers and method for constructing 3d image TWI372859B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW097138142A TWI372859B (en) 2008-10-03 2008-10-03 Method for manufacturing an electron tomography specimen with fiducial markers and method for constructing 3d image
US12/471,734 US7939906B2 (en) 2008-10-03 2009-05-26 Preparation method for an electron tomography sample with embedded markers and a method for reconstructing a three-dimensional image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW097138142A TWI372859B (en) 2008-10-03 2008-10-03 Method for manufacturing an electron tomography specimen with fiducial markers and method for constructing 3d image

Publications (2)

Publication Number Publication Date
TW201015057A TW201015057A (en) 2010-04-16
TWI372859B true TWI372859B (en) 2012-09-21

Family

ID=42075050

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097138142A TWI372859B (en) 2008-10-03 2008-10-03 Method for manufacturing an electron tomography specimen with fiducial markers and method for constructing 3d image

Country Status (2)

Country Link
US (1) US7939906B2 (zh)
TW (1) TWI372859B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI761016B (zh) * 2020-01-05 2022-04-11 捷絡生物科技股份有限公司 組織切片的製備方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5321918B2 (ja) * 2010-06-15 2013-10-23 独立行政法人産業技術総合研究所 電子顕微鏡用試料作製方法
US20130107006A1 (en) * 2011-10-28 2013-05-02 New York University Constructing a 3-dimensional image from a 2-dimensional image and compressing a 3-dimensional image to a 2-dimensional image
US9295431B2 (en) * 2011-10-28 2016-03-29 New York University Constructing a 3-dimensional image from a 2-dimensional image and compressing a 3-dimensional image to a 2-dimensional image
US8502172B1 (en) * 2012-06-26 2013-08-06 Fei Company Three dimensional fiducial
EP3069367B1 (en) 2013-11-11 2019-01-09 Howard Hughes Medical Institute Workpiece transport and positioning apparatus
KR101534839B1 (ko) * 2013-11-18 2015-07-09 한국지질자원연구원 전자 단층촬영을 이용한 다공성 지오폴리머의 3차원 측정방법
US10048259B2 (en) 2013-11-19 2018-08-14 National Tsing Hua University Portable fluorescence detection system
TWI560437B (en) 2013-11-19 2016-12-01 Univ Nat Tsing Hua Fluorescence excitation device and portable fluorescence analysis system with the same
JP6385899B2 (ja) 2014-07-21 2018-09-05 エフ・イ−・アイ・カンパニー Ｔｅｍ試料取付け構造
US9627176B2 (en) * 2015-07-23 2017-04-18 Fei Company Fiducial formation for TEM/STEM tomography tilt-series acquisition and alignment
US10887580B2 (en) * 2016-10-07 2021-01-05 Kla-Tencor Corporation Three-dimensional imaging for semiconductor wafer inspection
US10252350B1 (en) 2018-06-17 2019-04-09 Arevo, Inc. Fiducial marks for articles of manufacture with non-trivial dimensional variations
CN114428180B (zh) * 2022-01-17 2024-01-30 中国科学院物理研究所 一种二维纳米材料的stem样品的制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4698144B2 (ja) * 2003-07-31 2011-06-08 富士通セミコンダクター株式会社 半導体装置の製造方法
JP2005277338A (ja) * 2004-03-26 2005-10-06 Nec Electronics Corp 半導体装置及びその検査方法
TW200813418A (en) * 2006-09-06 2008-03-16 Inotera Memories Inc Method of fabricating sample membrane for transmission electron microscopy analysis

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI761016B (zh) * 2020-01-05 2022-04-11 捷絡生物科技股份有限公司 組織切片的製備方法

Also Published As

Publication number Publication date
TW201015057A (en) 2010-04-16
US7939906B2 (en) 2011-05-10
US20100084555A1 (en) 2010-04-08

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