TWI372271B - Optical element unit, optical element holder, method of manufacturing an optical element holder, optical element module, optical exposure apparatus, and method of manufacturing a semiconductor device - Google Patents

Optical element unit, optical element holder, method of manufacturing an optical element holder, optical element module, optical exposure apparatus, and method of manufacturing a semiconductor device

Info

Publication number
TWI372271B
TWI372271B TW095131738A TW95131738A TWI372271B TW I372271 B TWI372271 B TW I372271B TW 095131738 A TW095131738 A TW 095131738A TW 95131738 A TW95131738 A TW 95131738A TW I372271 B TWI372271 B TW I372271B
Authority
TW
Taiwan
Prior art keywords
optical element
manufacturing
optical
holder
element holder
Prior art date
Application number
TW095131738A
Other languages
English (en)
Other versions
TW200717058A (en
Inventor
Armin Schoppach
Johannes Rau
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Publication of TW200717058A publication Critical patent/TW200717058A/zh
Application granted granted Critical
Publication of TWI372271B publication Critical patent/TWI372271B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
TW095131738A 2005-09-13 2006-08-29 Optical element unit, optical element holder, method of manufacturing an optical element holder, optical element module, optical exposure apparatus, and method of manufacturing a semiconductor device TWI372271B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US71661905P 2005-09-13 2005-09-13

Publications (2)

Publication Number Publication Date
TW200717058A TW200717058A (en) 2007-05-01
TWI372271B true TWI372271B (en) 2012-09-11

Family

ID=37307279

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095131738A TWI372271B (en) 2005-09-13 2006-08-29 Optical element unit, optical element holder, method of manufacturing an optical element holder, optical element module, optical exposure apparatus, and method of manufacturing a semiconductor device

Country Status (4)

Country Link
US (1) US7729065B2 (zh)
JP (2) JP2009508344A (zh)
TW (1) TWI372271B (zh)
WO (1) WO2007031412A1 (zh)

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DE102005049731A1 (de) * 2005-10-14 2007-04-19 Cube Optics Ag Optischer Aufbau mit elastischer Aufhängung und Verfahren zur Herstellung eines solchen
EP2444829A1 (en) * 2006-09-14 2012-04-25 Carl Zeiss SMT GmbH Optical element unit and method of supporting an optical element
DE102007047109A1 (de) * 2007-10-01 2009-04-09 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv der Mikrolithographie
DE102007047186B4 (de) * 2007-10-02 2014-01-09 Carl Zeiss Sms Gmbh Aufnahmevorrichtung zur Aufnahme einer Photolithographiemaske
US20090219497A1 (en) * 2008-02-28 2009-09-03 Carl Zeiss Smt Ag Optical device with stiff housing
NL1036701A1 (nl) * 2008-04-15 2009-10-19 Asml Holding Nv Apparatus for supporting an optical element, and method of making same.
JP5317624B2 (ja) * 2008-10-17 2013-10-16 キヤノン株式会社 保持装置、望遠鏡および光学装置
DE102009005954B4 (de) * 2009-01-20 2010-10-21 Carl Zeiss Smt Ag Dämpfungsvorrichtung
JP5458246B2 (ja) * 2009-06-11 2014-04-02 富士フイルム株式会社 光学部品保持部材およびその作製方法
JP5271820B2 (ja) * 2009-06-11 2013-08-21 富士フイルム株式会社 光学部品保持部材およびその作製方法
DE102009045163B4 (de) * 2009-09-30 2017-04-06 Carl Zeiss Smt Gmbh Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage
DE102011087331A1 (de) * 2011-11-29 2013-01-10 Carl Zeiss Smt Gmbh Temperaturempfindliches optisches Element aus SiSiC-Verbund und Halterung hierfür sowie Verfahren zu seiner Herstellung
DE102012202170A1 (de) * 2012-02-14 2013-06-13 Carl Zeiss Smt Gmbh Positionsmanipulator für ein optisches Bauelement
DE102012218769B4 (de) 2012-10-15 2018-09-06 Trumpf Laser Gmbh Optikanordnung
DE102013109185B3 (de) * 2013-08-23 2014-05-22 Jenoptik Optical Systems Gmbh Optische Baugruppe mit einer Fassung mit Verbindungseinheiten gerichteter Nachgiebigkeit
US11204559B2 (en) 2018-05-16 2021-12-21 Asml Holdings N.V. High stability collimator assembly, lithographic apparatus, and method
DE102019112224A1 (de) * 2019-05-10 2020-11-12 Carl Zeiss Smt Gmbh Abstützung eines optischen Elements

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KR101209540B1 (ko) * 2003-07-09 2012-12-07 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4237755B2 (ja) * 2003-10-02 2009-03-11 カール・ツァイス・エスエムティー・アーゲー 半導体リソグラフィにおける光学的半組立品及び投射対物レンズ

Also Published As

Publication number Publication date
TW200717058A (en) 2007-05-01
US7729065B2 (en) 2010-06-01
US20080218721A1 (en) 2008-09-11
JP2009508344A (ja) 2009-02-26
JP2013145892A (ja) 2013-07-25
WO2007031412A1 (en) 2007-03-22

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