TWI369414B - Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel - Google Patents
Splashguard and inlet diffuser for high vacuum, high flow bubbler vesselInfo
- Publication number
- TWI369414B TWI369414B TW096147313A TW96147313A TWI369414B TW I369414 B TWI369414 B TW I369414B TW 096147313 A TW096147313 A TW 096147313A TW 96147313 A TW96147313 A TW 96147313A TW I369414 B TWI369414 B TW I369414B
- Authority
- TW
- Taiwan
- Prior art keywords
- splashguard
- inlet diffuser
- high vacuum
- bubbler vessel
- high flow
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US87520006P | 2006-12-15 | 2006-12-15 | |
US90837607P | 2007-03-27 | 2007-03-27 | |
US11/939,109 US8708320B2 (en) | 2006-12-15 | 2007-11-13 | Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200829715A TW200829715A (en) | 2008-07-16 |
TWI369414B true TWI369414B (en) | 2012-08-01 |
Family
ID=39110552
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096147313A TWI369414B (en) | 2006-12-15 | 2007-12-11 | Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel |
Country Status (6)
Country | Link |
---|---|
US (3) | US8708320B2 (zh) |
EP (1) | EP1932942B1 (zh) |
JP (1) | JP4787230B2 (zh) |
KR (1) | KR100996344B1 (zh) |
CN (1) | CN101205604B (zh) |
TW (1) | TWI369414B (zh) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6921062B2 (en) | 2002-07-23 | 2005-07-26 | Advanced Technology Materials, Inc. | Vaporizer delivery ampoule |
GB2432371B (en) * | 2005-11-17 | 2011-06-15 | Epichem Ltd | Improved bubbler for the transportation of substances by a carrier gas |
US20080241805A1 (en) | 2006-08-31 | 2008-10-02 | Q-Track Corporation | System and method for simulated dosimetry using a real time locating system |
US8708320B2 (en) * | 2006-12-15 | 2014-04-29 | Air Products And Chemicals, Inc. | Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel |
US20100119734A1 (en) * | 2008-11-07 | 2010-05-13 | Applied Materials, Inc. | Laminar flow in a precursor source canister |
US8348248B2 (en) * | 2009-03-11 | 2013-01-08 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Bubbling supply system for stable precursor supply |
US8944420B2 (en) | 2009-03-19 | 2015-02-03 | Air Products And Chemicals, Inc. | Splashguard for high flow vacuum bubbler vessel |
US8162296B2 (en) * | 2009-03-19 | 2012-04-24 | Air Products And Chemicals, Inc. | Splashguard for high flow vacuum bubbler vessel |
CN102597310B (zh) | 2009-11-02 | 2015-02-04 | 西格玛-奥吉奇有限责任公司 | 固态前体输送组件以及相关方法 |
CN102092962A (zh) * | 2011-01-05 | 2011-06-15 | 成都中住光纤有限公司 | 光纤涂覆涂料填充装置 |
TWI480418B (zh) * | 2012-01-16 | 2015-04-11 | Air Prod & Chem | 用於高流量真空氣泡器容器的防濺器 |
US9598766B2 (en) * | 2012-05-27 | 2017-03-21 | Air Products And Chemicals, Inc. | Vessel with filter |
CN104487608A (zh) | 2012-05-31 | 2015-04-01 | 高级技术材料公司 | 基于源试剂的用于批量沉积的高物质通量流体的输送 |
US9957612B2 (en) * | 2014-01-17 | 2018-05-01 | Ceres Technologies, Inc. | Delivery device, methods of manufacture thereof and articles comprising the same |
US9964332B2 (en) * | 2014-03-27 | 2018-05-08 | Lam Research Corporation | Systems and methods for bulk vaporization of precursor |
US9682393B2 (en) * | 2015-03-17 | 2017-06-20 | Ecolab Usa Inc. | Fitment splash guard |
US10443128B2 (en) * | 2015-04-18 | 2019-10-15 | Versum Materials Us, Llc | Vessel and method for delivery of precursor materials |
US11926894B2 (en) * | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
KR102344996B1 (ko) | 2017-08-18 | 2021-12-30 | 삼성전자주식회사 | 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법 |
KR20200130121A (ko) * | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 딥 튜브가 있는 화학물질 공급원 용기 |
US20220145456A1 (en) * | 2020-11-09 | 2022-05-12 | Applied Materials, Inc. | Refillable large volume solid precursor sublimation vessel |
Family Cites Families (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1339609A (en) * | 1917-07-02 | 1920-05-11 | Stinson Tractor Company | Dust-collector for carbureters |
US1756204A (en) * | 1926-12-16 | 1930-04-29 | William F Rawlings | Vacuum-cleaner apparatus |
US1912439A (en) * | 1932-03-29 | 1933-06-06 | Feller Maximilian | Beverage manufacture |
US1994766A (en) * | 1934-06-25 | 1935-03-19 | George L Heglar | Air cleaner and washer |
US2405494A (en) * | 1944-03-29 | 1946-08-06 | Cedar Corp N O | Air treating apparatus |
US2742886A (en) * | 1954-11-01 | 1956-04-24 | Solomon P Scholl | Fuel generator for internal combustion engines |
US3542524A (en) * | 1967-10-10 | 1970-11-24 | Harry E Kimble | Oxygen generating apparatus for aquariums and other oxygen requirement systems |
US4350505A (en) * | 1976-12-17 | 1982-09-21 | Loffland Brothers Company | Device for reduction of oxygen content in drilling fluid |
US4140735A (en) * | 1977-08-15 | 1979-02-20 | J. C. Schumacher Co. | Process and apparatus for bubbling gas through a high purity liquid |
US4493637A (en) * | 1978-02-15 | 1985-01-15 | Thermics Corporation Liquidating Trust | Fossil fuel catalyst generator |
US4251485A (en) * | 1978-03-28 | 1981-02-17 | Schauer John M | Apparatus for cleansing noxious constituents from gas streams |
JPS6231121Y2 (zh) * | 1978-06-30 | 1987-08-10 | ||
NL8102105A (nl) | 1981-04-29 | 1982-11-16 | Philips Nv | Inrichting en werkwijze voor het verzadigen van een gas met de damp van een vloeistof. |
JPS60111417A (ja) * | 1983-11-22 | 1985-06-17 | Mitsubishi Electric Corp | 液体のバブリングによる気化装置 |
JPS6283400A (ja) * | 1985-10-02 | 1987-04-16 | Toyo Sutoufuaa Chem:Kk | 有機金属気相成長用シリンダ−の改良法 |
JPS6311598A (ja) * | 1986-07-03 | 1988-01-19 | Toyo Sutoufuaa Chem:Kk | 有機金属気相成長用シリンダ− |
JPS63149521A (ja) | 1986-12-12 | 1988-06-22 | Fuji Electric Co Ltd | 固体溶解液収容槽の液位測定装置 |
DE3708967A1 (de) * | 1987-03-19 | 1988-10-06 | Merck Patent Gmbh | Vorrichtung zur erzeugung eines gasgemisches nach dem saettigungsverfahren |
JPS63149521U (zh) * | 1987-03-20 | 1988-10-03 | ||
KR890004163A (ko) * | 1987-08-12 | 1989-04-20 | 고마쯔 신 | 유중용존 가스측정장치 |
DE69027496T2 (de) | 1989-09-26 | 1996-10-31 | Canon Kk | Gasversorgungsvorrichtung und ihre Verwendung für eine Filmabscheidungsanlage |
JPH04356915A (ja) | 1991-06-03 | 1992-12-10 | Nissin Electric Co Ltd | ガスソースセル |
EP0555614A1 (en) | 1992-02-13 | 1993-08-18 | International Business Machines Corporation | Metal-organic gas supply for MOVPE and MOMBE |
JPH05335243A (ja) | 1992-06-03 | 1993-12-17 | Mitsubishi Electric Corp | 液体バブリング装置 |
US5199963A (en) * | 1992-07-30 | 1993-04-06 | Scarp Arcoline J | Dual filtering vacuum system |
JP2000252269A (ja) * | 1992-09-21 | 2000-09-14 | Mitsubishi Electric Corp | 液体気化装置及び液体気化方法 |
JPH06295862A (ja) * | 1992-11-20 | 1994-10-21 | Mitsubishi Electric Corp | 化合物半導体製造装置及び有機金属材料容器 |
JPH06196419A (ja) | 1992-12-24 | 1994-07-15 | Canon Inc | 化学気相堆積装置及びそれによる半導体装置の製造方法 |
JPH06241132A (ja) | 1993-02-19 | 1994-08-30 | Aqueous Res:Kk | 水素添加システム及びその運転方法 |
JPH06283400A (ja) | 1993-03-26 | 1994-10-07 | Nikon Corp | 間隙計測装置 |
DE69738136T2 (de) * | 1996-12-17 | 2008-06-12 | Advanced Technology Materials, Inc., Danbury | Reagenzzuführbehälter für cvd |
US6544522B1 (en) | 1998-12-30 | 2003-04-08 | Corixa Corporation | Fusion proteins of mycobacterium tuberculosis antigens and their uses |
WO1999016929A1 (en) | 1997-09-26 | 1999-04-08 | Advanced Technology Materials, Inc. | Liquid reagent delivery system |
US6220091B1 (en) | 1997-11-24 | 2001-04-24 | Applied Materials, Inc. | Liquid level pressure sensor and method |
US6520218B1 (en) * | 1998-09-03 | 2003-02-18 | Advanced Technology Materials, Inc. | Container chemical guard |
US6444038B1 (en) * | 1999-12-27 | 2002-09-03 | Morton International, Inc. | Dual fritted bubbler |
AU8000700A (en) * | 1999-10-07 | 2001-05-10 | Peletex, Inc. | Method and means for filtering an air stream with an aqueous froth |
US6500244B2 (en) * | 1999-12-30 | 2002-12-31 | Angelo Sanchez | Liquid spray absorbing |
JP2001313288A (ja) | 2000-04-28 | 2001-11-09 | Ebara Corp | 原料ガス供給装置 |
EP1329540A3 (en) | 2000-07-03 | 2003-11-05 | Epichem Limited | An apparatus for the delivery of precursors in the vapour phase to epitaxial reactor sites |
US6736154B2 (en) * | 2001-01-26 | 2004-05-18 | American Air Liquide, Inc. | Pressure vessel systems and methods for dispensing liquid chemical compositions |
US6561498B2 (en) * | 2001-04-09 | 2003-05-13 | Lorex Industries, Inc. | Bubbler for use in vapor generation systems |
US20030042630A1 (en) * | 2001-09-05 | 2003-03-06 | Babcoke Jason E. | Bubbler for gas delivery |
TW200300701A (en) * | 2001-11-30 | 2003-06-16 | Asml Us Inc | High flow rate bubbler system and method |
US7186385B2 (en) * | 2002-07-17 | 2007-03-06 | Applied Materials, Inc. | Apparatus for providing gas to a processing chamber |
US7077388B2 (en) * | 2002-07-19 | 2006-07-18 | Asm America, Inc. | Bubbler for substrate processing |
US7300038B2 (en) * | 2002-07-23 | 2007-11-27 | Advanced Technology Materials, Inc. | Method and apparatus to help promote contact of gas with vaporized material |
US7011299B2 (en) * | 2002-09-16 | 2006-03-14 | Matheson Tri-Gas, Inc. | Liquid vapor delivery system and method of maintaining a constant level of fluid therein |
US7124913B2 (en) * | 2003-06-24 | 2006-10-24 | Air Products And Chemicals, Inc. | High purity chemical container with diptube and level sensor terminating in lowest most point of concave floor |
US7722720B2 (en) | 2004-12-08 | 2010-05-25 | Rohm And Haas Electronic Materials Llc | Delivery device |
US7464917B2 (en) * | 2005-10-07 | 2008-12-16 | Appiled Materials, Inc. | Ampoule splash guard apparatus |
US8708320B2 (en) * | 2006-12-15 | 2014-04-29 | Air Products And Chemicals, Inc. | Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel |
US8162296B2 (en) * | 2009-03-19 | 2012-04-24 | Air Products And Chemicals, Inc. | Splashguard for high flow vacuum bubbler vessel |
US8944420B2 (en) * | 2009-03-19 | 2015-02-03 | Air Products And Chemicals, Inc. | Splashguard for high flow vacuum bubbler vessel |
-
2007
- 2007-11-13 US US11/939,109 patent/US8708320B2/en active Active
- 2007-12-10 KR KR1020070127377A patent/KR100996344B1/ko active IP Right Grant
- 2007-12-11 TW TW096147313A patent/TWI369414B/zh active
- 2007-12-11 JP JP2007319061A patent/JP4787230B2/ja active Active
- 2007-12-14 EP EP07123198.9A patent/EP1932942B1/en active Active
- 2007-12-14 CN CN2007103009366A patent/CN101205604B/zh active Active
-
2014
- 2014-03-12 US US14/205,786 patent/US9435027B2/en active Active
- 2014-03-12 US US14/205,601 patent/US20140193578A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20080143002A1 (en) | 2008-06-19 |
CN101205604B (zh) | 2012-07-04 |
KR100996344B1 (ko) | 2010-11-25 |
EP1932942A3 (en) | 2011-05-11 |
JP4787230B2 (ja) | 2011-10-05 |
US20140191423A1 (en) | 2014-07-10 |
US8708320B2 (en) | 2014-04-29 |
TW200829715A (en) | 2008-07-16 |
EP1932942B1 (en) | 2018-05-16 |
JP2008150709A (ja) | 2008-07-03 |
US9435027B2 (en) | 2016-09-06 |
EP1932942A2 (en) | 2008-06-18 |
KR20080055644A (ko) | 2008-06-19 |
US20140193578A1 (en) | 2014-07-10 |
CN101205604A (zh) | 2008-06-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI369414B (en) | Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel | |
EP2356672A4 (en) | Chemical vapor deposition flow inlet elements and methods | |
SI2029222T1 (sl) | Naprava za izboljšan krvni tok | |
EP1992852A4 (en) | CONSTANT FLOW VALVE | |
EP1996274A4 (en) | ANTICONTAMINATION COVER FOR FLUID COMPOUNDS | |
ZA200801211B (en) | Liquid natural gas processing | |
IL196240A0 (en) | Fluid flow labyrinth | |
EP2002700A4 (en) | IMPROVEMENTS IN INPUT / OUTPUT SIZE FOR ELECTRONIC CHASSIS | |
ZA200709134B (en) | Fuel tank inlet device | |
GB2440964B (en) | Flow meter | |
EP2101160A4 (en) | ULTRASOUND FLOWMETER | |
EG26002A (en) | Pre-mixed mixture to prepare absorption agent to remove acid gases from fluid currents | |
GB0713082D0 (en) | Quick draining air valve | |
GB0613012D0 (en) | Axial flow impeller | |
GB2442011B (en) | Fluid conveying conduit | |
EP2019153A4 (en) | GAS SUPPLY HOSE FOR PLASMA PROCESSING | |
EP2009406A4 (en) | EXPLOSION-PROOF AND HIGH-TEMPERATURE-COMPATIBLE MULTI-FLOW GAUGE | |
IL179892A0 (en) | Flow redirector for compressor inlet | |
EP2069618A4 (en) | EXHAUST GAS FLOW EQUALIZER | |
GB0806560D0 (en) | Flow in fluid conduits | |
GB0709095D0 (en) | Gas flow indicator | |
EP2121462A4 (en) | INPUT FOR A PUMP | |
GB0624374D0 (en) | Improved flow reactor | |
GB0603917D0 (en) | Gas retention vessel | |
GB0508898D0 (en) | Fuel tank inlet device |