TWI365227B - - Google Patents

Info

Publication number
TWI365227B
TWI365227B TW093125032A TW93125032A TWI365227B TW I365227 B TWI365227 B TW I365227B TW 093125032 A TW093125032 A TW 093125032A TW 93125032 A TW93125032 A TW 93125032A TW I365227 B TWI365227 B TW I365227B
Authority
TW
Taiwan
Application number
TW093125032A
Other languages
Chinese (zh)
Other versions
TW200508407A (en
Inventor
Akifumi Mishima
Shozo Komiyama
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of TW200508407A publication Critical patent/TW200508407A/en
Application granted granted Critical
Publication of TWI365227B publication Critical patent/TWI365227B/zh

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/266—Sputtering or spin-coating layers
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/06—Alloys based on silver
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
TW093125032A 2003-08-20 2004-08-19 Reflection film optical recording medium and silver alloy sputtering target for forming reflection film TW200508407A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003208018 2003-08-20
JP2004235189A JP4379602B2 (en) 2003-08-20 2004-08-12 Optical recording medium having translucent reflective film or reflective film as constituent layer, and Ag alloy sputtering target used for forming said reflective film

Publications (2)

Publication Number Publication Date
TW200508407A TW200508407A (en) 2005-03-01
TWI365227B true TWI365227B (en) 2012-06-01

Family

ID=34220638

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093125032A TW200508407A (en) 2003-08-20 2004-08-19 Reflection film optical recording medium and silver alloy sputtering target for forming reflection film

Country Status (3)

Country Link
JP (1) JP4379602B2 (en)
TW (1) TW200508407A (en)
WO (1) WO2005020222A1 (en)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006132416A1 (en) * 2005-06-10 2006-12-14 Tanaka Kikinzoku Kogyo K.K. Silver alloy excellent in reflectance/transmittance maintaining characteristics
JP4864538B2 (en) * 2006-05-19 2012-02-01 三菱マテリアル株式会社 Translucent reflective film for optical recording medium and Ag alloy sputtering target for forming the translucent reflective film
CN101942644B (en) * 2005-12-29 2013-01-02 三菱麻铁里亚尔株式会社 Translucent reflective film and reflective film for optical recording medium, and ag alloy sputtering target for forming such translucent reflective film and reflective film
JP4553149B2 (en) * 2005-12-29 2010-09-29 三菱マテリアル株式会社 Translucent reflective film and reflective film for optical recording medium, and Ag alloy sputtering target for forming these translucent reflective film and reflective film
GB2438198A (en) * 2006-05-16 2007-11-21 Andrew Hermiston Hooper Silver alloys
US7833604B2 (en) * 2006-12-01 2010-11-16 Kobe Steel, Ltd. Ag alloy reflective layer for optical information recording medium, optical information recording medium, and sputtering target for forming Ag alloy reflective layer for optical information recording medium
JP2009187642A (en) * 2008-02-08 2009-08-20 Kobe Steel Ltd Reflective film and semi-transmissive reflective film of optical information recording medium, sputtering target for producing the films, and optical information recording medium
JP5533545B2 (en) * 2010-01-12 2014-06-25 三菱マテリアル株式会社 Silver alloy target for forming reflective electrode film of organic EL element and method for producing the same
JP5428990B2 (en) * 2010-03-25 2014-02-26 三菱マテリアル株式会社 Deposition material for reflective film formation
SE536911C2 (en) * 2011-02-09 2014-10-28 Impact Coatings Ab Material for providing an electrically conductive contact layer, a contact element with such layer, method for providing the contact element, and use of the material
JP5669015B2 (en) * 2011-04-06 2015-02-12 三菱マテリアル株式会社 Silver alloy sputtering target for forming conductive film and method for producing the same
JP5720816B2 (en) * 2011-06-24 2015-05-20 三菱マテリアル株式会社 Conductive film
JP2013077547A (en) * 2011-09-15 2013-04-25 Mitsubishi Materials Corp Conductive film and manufacturing method thereof, and silver alloy sputtering target for conductive film formation and manufacturing method thereof
JP5806653B2 (en) * 2011-12-27 2015-11-10 株式会社神戸製鋼所 Ag alloy film for reflective electrode, reflective electrode, and Ag alloy sputtering target
JP5927744B2 (en) * 2012-06-25 2016-06-01 三菱マテリアル株式会社 Ag alloy conductive film and sputtering target for film formation
JP2014196562A (en) * 2012-12-21 2014-10-16 三菱マテリアル株式会社 Ag alloy sputtering target
JP5612147B2 (en) * 2013-03-11 2014-10-22 三菱マテリアル株式会社 Silver alloy sputtering target for forming conductive film and method for producing the same
KR101764053B1 (en) * 2013-06-26 2017-08-01 가부시키가이샤 고베 세이코쇼 Ag alloy film for reflecting electrode or wiring electrode, reflecting electrode or wiring electrode, and ag alloy sputtering target
JP6384147B2 (en) * 2013-07-11 2018-09-05 三菱マテリアル株式会社 Translucent Ag alloy film
JP5850077B2 (en) * 2014-04-09 2016-02-03 三菱マテリアル株式会社 Ag alloy film and sputtering target for forming Ag alloy film
JP6350223B2 (en) * 2014-11-04 2018-07-04 三菱マテリアル株式会社 Ag alloy sputtering target
KR101688920B1 (en) * 2016-11-01 2016-12-22 희성금속 주식회사 Silver alloy composition forming conductive membrane and manufacturing method of it
KR101710196B1 (en) * 2016-11-04 2017-02-24 희성금속 주식회사 Silver alloy composition forming conductive membrane and manufacturing method of it
KR101959865B1 (en) * 2016-11-18 2019-03-20 엘티메탈 주식회사 Silver alloy composition forming conductive membrane and manufacturing method of it
KR101759152B1 (en) * 2016-12-21 2017-07-18 희성금속 주식회사 Silver alloy composition forming conductive membrane and manufacturing method of it
US10760156B2 (en) 2017-10-13 2020-09-01 Honeywell International Inc. Copper manganese sputtering target
US11035036B2 (en) 2018-02-01 2021-06-15 Honeywell International Inc. Method of forming copper alloy sputtering targets with refined shape and microstructure
JP6908164B2 (en) * 2019-12-02 2021-07-21 三菱マテリアル株式会社 Ag alloy film
CN114761608A (en) * 2019-12-02 2022-07-15 三菱综合材料株式会社 Ag alloy film and Ag alloy sputtering target
CN112226643B (en) * 2020-09-18 2022-03-11 国金黄金股份有限公司 Precious metal silver material, preparation method thereof and silverware
CN113564554A (en) * 2021-08-09 2021-10-29 芜湖映日科技股份有限公司 Ag alloy target material for OLED and preparation method thereof
CN114015989A (en) * 2021-10-11 2022-02-08 芜湖映日科技股份有限公司 Silver-scandium alloy sputtering target material and preparation method thereof
CN114395749B (en) * 2021-11-13 2023-06-02 丰联科光电(洛阳)股份有限公司 Preparation method of large-size and multi-element Ag-based alloy sputtering target material

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10143917A (en) * 1996-11-08 1998-05-29 Kao Corp Optical recording medium
JP2003006928A (en) * 2001-06-26 2003-01-10 Ricoh Co Ltd Optical recording medium
JP2003006925A (en) * 2001-06-26 2003-01-10 Ricoh Co Ltd Optical recording medium
JP2003022570A (en) * 2001-07-10 2003-01-24 Ricoh Co Ltd Optical recording medium and manufacturing method therefor
JP2004002929A (en) * 2001-08-03 2004-01-08 Furuya Kinzoku:Kk Silver alloy, sputtering target, reflector for reflection lcd, reflection wiring electrode, thin film, manufacturing method therefor, optical recording medium, electro magnetic wave shield, metal material for electronic part, wiring material, electronic part, electronic appliance, processing method of metal film, electron optical part, laminate, and glass of building material
JP3915114B2 (en) * 2001-11-26 2007-05-16 三菱マテリアル株式会社 Silver alloy sputtering target for reflection film formation of optical recording media
JP2003160860A (en) * 2001-11-27 2003-06-06 Mitsubishi Materials Corp Silver alloy sputtering target for forming reflection coat on optical recording medium
JP4357169B2 (en) * 2001-11-27 2009-11-04 株式会社リコー Information recording medium
JP3770156B2 (en) * 2001-12-26 2006-04-26 三菱マテリアル株式会社 Silver alloy sputtering target for reflecting film formation of optical recording medium and reflecting film formed using this target
JP2004192702A (en) * 2002-12-10 2004-07-08 Tanaka Kikinzoku Kogyo Kk Silver alloy for reflection film of optical recording medium

Also Published As

Publication number Publication date
WO2005020222A1 (en) 2005-03-03
JP2005100604A (en) 2005-04-14
JP4379602B2 (en) 2009-12-09
TW200508407A (en) 2005-03-01

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MM4A Annulment or lapse of patent due to non-payment of fees