TWI357856B - Methods and apparatus for applying patterns of non - Google Patents

Methods and apparatus for applying patterns of non Download PDF

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Publication number
TWI357856B
TWI357856B TW096123897A TW96123897A TWI357856B TW I357856 B TWI357856 B TW I357856B TW 096123897 A TW096123897 A TW 096123897A TW 96123897 A TW96123897 A TW 96123897A TW I357856 B TWI357856 B TW I357856B
Authority
TW
Taiwan
Prior art keywords
features
contiguous
feature
imaging
pattern
Prior art date
Application number
TW096123897A
Other languages
English (en)
Chinese (zh)
Other versions
TW200811484A (en
Inventor
Guy Sirton
Original Assignee
Kodak Graphic Comm Canada Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphic Comm Canada Co filed Critical Kodak Graphic Comm Canada Co
Publication of TW200811484A publication Critical patent/TW200811484A/zh
Application granted granted Critical
Publication of TWI357856B publication Critical patent/TWI357856B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025—Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382—Contact thermal transfer or sublimation processes
    • B41M5/38207—Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
    • B41M5/38221—Apparatus features
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/265—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used for the production of optical filters or electrical components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/02—Dye diffusion thermal transfer printing (D2T2)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/06—Printing methods or features related to printing methods; Location or type of the layers relating to melt (thermal) mass transfer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/52—RGB geometrical arrangements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Electronic Switches (AREA)
  • Facsimile Heads (AREA)
  • Optical Filters (AREA)
  • Image Processing (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Electroluminescent Light Sources (AREA)
  • Color Television Image Signal Generators (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
TW096123897A 2006-06-30 2007-06-29 Methods and apparatus for applying patterns of non TWI357856B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US80645206P 2006-06-30 2006-06-30

Publications (2)

Publication Number Publication Date
TW200811484A TW200811484A (en) 2008-03-01
TWI357856B true TWI357856B (en) 2012-02-11

Family

ID=38894930

Family Applications (2)

Application Number Title Priority Date Filing Date
TW096123897A TWI357856B (en) 2006-06-30 2007-06-29 Methods and apparatus for applying patterns of non
TW096123910A TW200817200A (en) 2006-06-30 2007-06-29 Forming an image with a plurality of imaging heads

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW096123910A TW200817200A (en) 2006-06-30 2007-06-29 Forming an image with a plurality of imaging heads

Country Status (8)

Country Link
US (2) US8305409B2 (enExample)
JP (2) JP2009543110A (enExample)
KR (2) KR20090024205A (enExample)
CN (2) CN101522430A (enExample)
DE (2) DE112007001551T5 (enExample)
GB (2) GB2452192A (enExample)
TW (2) TWI357856B (enExample)
WO (2) WO2008004048A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8305409B2 (en) * 2006-06-30 2012-11-06 Kodak Graphic Communications Canada Company Forming an image with a plurality of imaging heads
WO2008004047A2 (en) * 2006-06-30 2008-01-10 Kodak Graphic Communications Canada Methods and apparatus for selecting and applying non-contiguous features in a pattern
US8233020B2 (en) * 2006-07-28 2012-07-31 Kodak Graphic Communications Canada Company Enhanced imaging of features
US20100128100A1 (en) * 2007-04-26 2010-05-27 Aldo Salvestro Imaging features with a plurality of scans
WO2012012875A1 (en) * 2010-07-26 2012-02-02 Kaleidoflex Technologies Inc. Method, apparatus, and system for forming filter elements on display substrates
US9269149B2 (en) 2014-05-08 2016-02-23 Orbotech Ltd. Calibration of a direct-imaging system
DE102016225484B3 (de) * 2016-12-19 2018-06-07 Carl Zeiss Industrielle Messtechnik Gmbh Verfahren und optischer Sensor zur Bestimmung mindestens einer Koordinate mindestens eines Messobjekts

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4900130A (en) 1988-10-07 1990-02-13 Eastman Kodak Company Method of scanning
US5164742A (en) 1989-12-18 1992-11-17 Eastman Kodak Company Thermal printer
US5278578A (en) 1989-12-18 1994-01-11 Eastman Kodak Company Thermal printer capable of using dummy lines to prevent banding
US5220348A (en) * 1991-08-23 1993-06-15 Eastman Kodak Company Electronic drive circuit for multi-laser thermal printer
US5517359A (en) 1995-01-23 1996-05-14 Gelbart; Daniel Apparatus for imaging light from a laser diode onto a multi-channel linear light valve
US5808655A (en) * 1995-05-12 1998-09-15 Eastman Kodak Company Interleaving thermal printing with discontiguous dye-transfer tracks on an individual multiple-source printhead pass
US5724086A (en) * 1995-05-12 1998-03-03 Eastman Kodak Company Printhead having data channels with revisable addresses for interleaving scan lines
US5691759A (en) * 1996-01-05 1997-11-25 Hewlett-Packard Company Method and apparatus for interleaving raster scan lines in a multi-beam laser imaging device
US6037962A (en) 1998-04-03 2000-03-14 Hewlett-Packard Company Method and apparatus for interleaving raster scan lines in a multi-beam laser imaging device
US6271957B1 (en) * 1998-05-29 2001-08-07 Affymetrix, Inc. Methods involving direct write optical lithography
DE10031915A1 (de) 2000-06-30 2002-01-10 Heidelberger Druckmasch Ag Kompakte Mehrstrahllaserlichtquelle und Interleafrasterscanlinien-Verfahren zur Belichtung von Druckplatten
JP2002103597A (ja) * 2000-07-25 2002-04-09 Sony Corp プリンタ及びプリンタヘッド
DE10108624A1 (de) 2001-02-22 2002-09-05 Heidelberger Druckmasch Ag Banding-reduzierende Bebilderung einer Druckform
US6597388B2 (en) * 2001-06-21 2003-07-22 Kodak Polychrome Graphics, Llc Laser-induced thermal imaging with masking
US6582875B1 (en) * 2002-01-23 2003-06-24 Eastman Kodak Company Using a multichannel linear laser light beam in making OLED devices by thermal transfer
US6900826B2 (en) 2002-02-19 2005-05-31 Presstek, Inc. Multiple resolution helical imaging system and method
JP2003255552A (ja) * 2002-03-06 2003-09-10 Nec Corp レーザ照射装置並びに走査レーザ光を用いた露光方法及び走査レーザ光を用いたカラーフィルタの製造方法
JP4355170B2 (ja) 2002-05-17 2009-10-28 コダック グラフィック コミュニケーションズ カナダ カンパニー 高速フラットベッドスキャナ
JP4280509B2 (ja) * 2003-01-31 2009-06-17 キヤノン株式会社 投影露光用マスク、投影露光用マスクの製造方法、投影露光装置および投影露光方法
TW200537259A (en) * 2004-01-28 2005-11-16 Du Pont Method for imaging regular patterns
WO2008004047A2 (en) * 2006-06-30 2008-01-10 Kodak Graphic Communications Canada Methods and apparatus for selecting and applying non-contiguous features in a pattern
US8305409B2 (en) * 2006-06-30 2012-11-06 Kodak Graphic Communications Canada Company Forming an image with a plurality of imaging heads

Also Published As

Publication number Publication date
TW200817200A (en) 2008-04-16
JP2009543109A (ja) 2009-12-03
WO2008004048A8 (en) 2009-02-05
CN101484320B (zh) 2012-12-05
WO2008004046A3 (en) 2008-03-13
GB2452205B (en) 2011-04-13
KR101405701B1 (ko) 2014-06-10
US8199175B2 (en) 2012-06-12
CN101522430A (zh) 2009-09-02
DE112007001591T5 (de) 2009-05-07
GB0822905D0 (en) 2009-01-21
TW200811484A (en) 2008-03-01
DE112007001551T5 (de) 2009-05-14
KR20090024205A (ko) 2009-03-06
JP5334847B2 (ja) 2013-11-06
GB2452192A (en) 2009-02-25
JP2009543110A (ja) 2009-12-03
WO2008004048A2 (en) 2008-01-10
US8305409B2 (en) 2012-11-06
CN101484320A (zh) 2009-07-15
US20100188472A1 (en) 2010-07-29
GB0822048D0 (en) 2009-01-07
WO2008004048A3 (en) 2008-03-13
GB2452205A (en) 2009-02-25
US20100039490A1 (en) 2010-02-18
WO2008004046A2 (en) 2008-01-10
KR20090024216A (ko) 2009-03-06

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MM4A Annulment or lapse of patent due to non-payment of fees