1354348 九、發明說明： 【發明所屬之技術領域】 • 本發明有關於使基板移動之基板移動裝置。 ✓ 【先如技術】 在先前技術中，在對半導體基板或玻璃基板等（以下稱 為「基板」）描繪圖案之描繪裝置使載置有基板之載 物σ移動，對基板全體進行描緣。例如’在日本專利特開 籲2005-221596號公報所揭示之技術中，經由具有多個開口 之光罩，使光照射在基板上之感光材料，並且經由使基板 和載物台一起移動，用來在基板上之感光材料描繪條帶狀 之圖案。 在此種描繪裝置中，由於用來將載物台向移動方向導引 之導引器之製作誤差等，會從載物台之移動轴產生猶微地 偏Τ或稍微地旋轉。所提案之技術是在描繪微細圖案之情 況時，此種偏移或旋轉對描緣造成之影響是不能忽視的， 鲁所以計測移動中之載物台之位置或方向，並校正描繪位 置，以良好之精確度描繪圖案。 :測移動中之載物台之位置或方向之技術，例如，被揭 2005'90983 載物台鏡照射雷射光，根據來自載物 口鏡之反射光和原來之雷射光之干涉，而計測载 動方：之位置或载物台之偏轉(yawing)角度。° 但是’在描綠震置中，當基板被載置在載物 對基板開始描繪之前，& λ ° τ，在 J進订基板之位置調整。用以進行基 312XP/發明說明書(補件)/96.11/961298〇7 板之大致之位置調整（所謂之 機構，習知之構造是利用氣^Mhgn細t))之 載物台上之基板之側面，用：=補 是’當使基板在載物台上移動^ ㈣°但 擦，或氣紅和基板之接觸，會#其1^板和載物台之摩 問題。 會使基板抽傷和產生微粒為其 方式，在寺開2〇G5'9()983號公報之基板移動裝置之 以i裁wi/使賴纟移動和旋狀機構之裝置中，可 =置有基板之載物台移動和旋轉而進行基 但是因為載物台鏡和載物台—起旋轉，所以在位置 :時當載物台之旋轉角度很大之情況，會造成來自載物 口鏡之反射光會脫離受光部，變成不能計測移動中之載物 台之位置或偏轉。 【發明内容】 本發明針對使基板移動之基板移動裝置，其目的是在調 整基板之旋轉位置之後，確實接受來自平面鏡之雷射光之 反射光。 該基板移動裝置具備有載物台，用來保持基板；載物台 移動機構，用來在與上述載物台平行之指定之移動方向， 使上述載物台直線地移動；平面鏡，被安裝在上述載物 台’具有與上述移動方向垂直之反射面；干涉式之雷射測 長器’從上述載物台外朝向上述平面鏡射出雷射光，接受 上述雷射光之反射光’用來取得上述載物台在上述移動方 向之移動位置；載物台旋轉機構，以垂直於上述載物台之 312ΧΡ/發明說明書(補件)/96-11/96129807 7 作為中心，使上述载物台旋轉;攝影部，用來 影部之:出進調整部’根據來自上述攝 機構，藉此=载物台移動機構和上述載物台旋轉 _ .. ^調正上述基板之移動位置和旋轉位置；平面於 轉^構，以平行於上述第1旋轉轴之第2旋轉軸作為中兄 述平面鏡對上述載物台進行相對旋轉；和平面鏡 角度調整部，在^十，#^ 々卞由鏡 % 述平面鏡r鐘 旋轉方向之相反方向，使上 轉’精此維持上述雷射測長器之上述反射光之 又光。依照本發明日年，太 確實地接旋轉位置之後，可以 妾又來自平面鏡之雷射光之反射光。 右在二f明之一較佳實施形態中，基板移動裝置更且備 ?=“固干涉式之雷射測長器，從來自上述雷射： 台平行方向遠離之上述平面鏡上之：：置二:上述載物 射出雷射光，並接受上述雷射光之反射光' ::物台外 部，根據來自卜先之反射先，偏轉角度取得 器之輪出，測長器和上述另外1個之雷射測長 △之偏韓自庚件月向上述移動方向之移動途中之上述載物 偏轉校正部，根據上述偏轉角度控制上 =::=::一上_方向二 角佳實施形態中’使由利用上述平面鏡 整^上'面鏡之旋轉，與利用上述基板位置調 Η之上摘物台之旋轉同步地進行1外 述平面鏡角度調整部之上述平面鏡之旋轉角度，與利用上 312ΧΡ/發明說明書(補件y96_!】/961298〇7 〇 1354348 述基板位置調整部之上述載物台之旋轉角度成為相等。 在本發明之更另一實施形態中，基板移動裝 另外1個之载物台移動機構，其係與上述载物 二 且朝向上述移動方向之垂直方向，使上述载物：直：地 動。基板移動裝置還更具備有解析度較上述攝影 另外1個之攝影部；使上述基板位置調整部根據來自: =個之攝影部之輸出’控制上述旋轉機構，藉此使： α 土板位於移動開始時之旋轉位置。利用此種方 簡化’並且可以使基板以良好之精確度而位 於移動開始時之旋轉位置。 明之更另一態樣中，基板移動裝置具備有··載物 :用來保持基板；载物台移動機構’用來在與 之指定之移動方向，使上述載物台直線地移動载2 口凝轉機構，以垂直於上述載物台之第i旋轉軸作為中 :有：3載物台旋轉；平面鏡，被安裝在上述載物台， 方㈣直之反射面；干涉式之—對雷射測 排之=述平面鏡上之在與上述載物台平行之方向並 ®位置’從上述载物台外射出雷射光，並接受上述 雷射光，反射光；偏轉角度取得部，根據來自上述一對雷 之輸出，求得朝向上述移動方向之移動途中之上 2=!?度;偏轉校正部’根據上述偏轉角度控 =，载物台旋轉機構’藉此校正朝向上述移動方向之移 =里S載物台之偏轉；攝影部’用來對上述基板進 灯攝衫，基板位置調整部，根據來自上述攝影部之輸出， 312XP/發明說明書(補件)/96-11/96129807 9 1354348 控制上述載物台移動機構和上述載物台旋轉機 整上述基板之移動位置和旋轉位置；平面鏡旋轉機；，二 平行於上述第1旋轉軸之第2旋轉軸作為中心，使 面鏡對上述載物台進行相對旋轉；和平面鏡角心平 =上繼台之旋轉方向之相反方向，使上述平：鏡旋 轉，错此維持上述一對雷射測長器之上述反射光之為 光。 又 上述之目的和其他之目的、特徵、態樣和優點，經由以 下參照附圖進行之本發明之詳細說明可以更加 【實施方式】 ° 圖1和圖2是表示本發明之—實施形態之圖案描繪裝置 之構造之侧面圖和平面圖。圖案描繪裝置i是將光 在液晶顯示裝置用之玻璃基板9(以下簡稱為「基板9:、、)， 用=在基板9上之感光材料描繪圖案之裝置。描綠有圖案 之基板9經由後續之別的步驟，最後成為液晶顯 組建零件之彩色濾波器基板。 κ 在圖案描繪裝置1經由使光照射在被設於基板9上之 型（亦即，顯像時曝光部份殘留在基板上之 料之彩色抗_上，用來静B / 光材 圖素圖案（亦即副圖素之集合）。v益基板上之 =圖1和圖2所示，圖案描緣震置i具備有：載物台3， 在基台Η上，用來使物㈣機構2,被設 D 3移動和旋轉；框架12，以 跨越載物台3和載物台驅動機構2之方式，被固定在基台 312^P/發明說明書(補件)/96.11/96129807 U，光照射部4，被 9上，·計” S Π 用來使光照射在基板 1攝影部二摄:？載物台3之位置和方向;和第 9進行攝影對載物台3上之基板 起移動之A柘铱:壯^ 八有使基板9和載物台3一 勒之基板移動裝置之功能。 圖案描繪裝置丨a 部。圖3是方塊圖，用凌—一控制Μ等之構造之控制 此孑甘仙 回’來一起表示該控制部7所趣斑夕从 犯和其他之構造。控制只現之功 接有咖、_、_、㈣磁碟樣地’成為連 如圖3所示，且備右其 ‘…、邛和輪入部之構造， 一備有基板位置調整部71、 整部72、偏轉角度取得部73和偏轉校正部^面^角度調 繪裝置1，利用控制部7控制载物台 2案描 測部5、第1攝影部61和第2攝影：二:=射 來自计測部5、第！攝影部61和第2攝影 =卜 發送到控制部7。 之輪出被 傷如圖1和圖2所示，载物台驅動機 2卜以可旋轉之方式支持載物台3 ^備^支持板 在支持板21上，以垂直於載物台冓22’ 之載物台旋轉軸221作為中心，使载物台3旋轉二轉軸 機構23，使載物台3和支持板21 _起在圖2 4知描 (以下稱為「副掃描方向」）移動；基座板2之X方向 描機構23而支持支持板21 ;和主掃描機構25 =由副掃 3和支持板21及基座板24 —起在圖2中之 載物台 稱為「主掃描方向」）移動。 方向（以下 312ΧΡ/發明說明書(補件y96-l 1/96129807 丄獨 3 轉機構22如圖1所示’具備有被設在載物台 性馬達222，線性馬達222具備有被固定 ^物。3之⑼側之側面之移動件，和被設在支持板 21之上面之固定件。在載物台旋轉機#22，線性馬達如 =件沿著固定件之溝，在U向移動，用來使圖& =2Γ二Τ3/被設在支持板21上之载物台旋 轉軸2 21作為t心，在指定之角度範圍内進行旋轉。 田1J知描機構23具備有：線性馬達23卜在支持板2 :::，(_Z)側)，與載物台3之主面平行，而且在垂 2:在 =方:广副掃描方向延伸；和-對線性導引器 23在線性馬達231之⑻側和⑼側，在副掃描 延神。線性馬達231具備有被固定在支持板21之下面之 移料，和被設在基座板24之上面之固定件，該移動件 定件^掃描方向移動，用來使支持板21和载物 3起石著線性馬達231和線性導引器232在副掃描方 向直線式地進行移動。 主掃描機構25具備有：線性馬達251在基座板24之 侧且在平行於載物台3之主面之主掃描 方向延伸；和— 對现動，動器252，在線性馬達251之（+χ)側和㈠）側， 且在主掃描方向延伸。線性馬達251具備有被固定在義座 板24之下面之移動件，和被設在基台11之上面之固定 件，.二由使„亥移動件沿著固定件在主掃描方向移動， = 24和支持板21及載物台3 一起沿著線性馬達 氣動滑動器252在主掃描方向直線式地移動。在圖 312XP/發明說明書(補件1/96129807 12 1354348 二主掃描機構25和副掃描機構23分別成為 °直線式地移動之載物台移動機構。 如圖2所示’光照射部4具備有多個之光學頭4卜儿 :副掃描方向以等間距(在本實施形態 ： 排列，被安裝在框架丨2。另外，光照射部4如圖mV 具備有連接到各個光學頭41之照明光學系統^，和作為 =源之雷射振in 43和雷射驅動部44。在光照射部4經 =動各㈣射驅動部44，用來從雷射振1器43射出脈 波以以下_為「光」），經由照明光學系統4" 引到各個光學頭41。 '、 各個光學頭41具備有：射㈣45，使來 43之光朝向:方射出；隸單元46，將來自射出部μ 光部份地遮敝；和光學系統47，將通過孔徑單元46之光 導引到被設在基板9上之感光材料上。 圖4是平面圖’用來表示孔徑單元抚之一部份。如圖 4所示，孔徑單元4 6具備有：第i孔徑板4 6 i，具有多個 之矩形形狀之透光部；-㈣持部462，從（+χ)側和（_χ) 侧保持第1孔徑板46卜和位置調整機構備，用來調整 第1孔徑板461在主掃描方向和副掃描方向之位置。在第 1孔徑板461分別沿著副掃描方向（亦即，χ方向）以等間 距排列有多個大小不同之3種之透光部4611、4612、 4613。在本實施形態中，透光部46U之間距、透光部4612 之間距和透光部4613之間距互不相同。在圖4中，為著 容易理解在第1孔徑板461之除了透光部461卜4613外之 312ΧΡ/發明說明書(補件)/96-11/96129807 13 區域（亦即遮光部）附加有平行斜線。 第mu 463具備有：第1調整機構464，用來使 動；-針和Γ對保持部462 —起在主掃描方向移 且在副m %态465 ’在第1調整機構464之下側’ 孔徑;和第2調整機構466’用來使第1 性導引器465及第1調整機構464 一起沿著線 線性以m 一掃描方向移動。在本實施形態中，利用 作為第1調整機構樹和第2調整機構偏。 邱二：：面圖’用來表示與孔徑單元46在圖4所示之 口P份光學式地重義夕£ 且之另一 #伤。如圖5所示，孔徑單元 ^更具備有··第2孔徑板樹，具有多個之矩形形狀之透 W ; -對保持部468’從（+γ)側和⑼側保持第2孔徑 板術；和第3調整機構使第2孔徑板467和一對 保持部468 -起在副掃描方向移動。在本實施形態中利 用線性馬達作為第3調整機構469。 第*2孔徑板467、保持部468和第3調整機構469被配 置在第1孔徑板46卜保持部462(參照圖4)和位置調整 機構463之上側’被固定在位置調整機構偏之第（調整 機構464上。第1孔徑板461和第2孔徑板467被配置在 光學式之共軛位置。在第2孔徑板467，以分別對應到第 1孔徑板461之多個之透光部461卜4613，分別沿著副掃 描方向（亦即，X方向）以等間距排列多個之大小不同之3 種之透光部4671、4672、4673。在圖5中，為著容易理 解該圖，以虛線描繪位置調整機構463,和第丨孔徑板 312XP/發明說明書(補件)/96-11/96129807 14 1354348 之透光部461卜4613。另外，第2孔徑板467之除了透光 部4671~4673外之區域附加有平行斜線。 • 如圖5所示，在從雷射振盪器43經由射出部45(參照 ▲圖丨）射出之光之照射區域451(在圖5中以二點鏈線表 示），當配置有第2孔徑板467之透光部4673,和盥透光 部4673部份重疊之第（孔徑板461之透光部4613之情況 時，來自射出部45之光只透過透光部4673和透光部4613 之重疊區域（以下稱A「光罩組透光部」），經由光學系統 47’如圖6所示，被導引到基板9上之多個矩形形狀之照 射區域93卜在以下之說明中，將該多個之照射區域931 總稱為「照射區域93」。 在圖案描繪裝置1 ’經由調整在副掃描方向之第2孔俨 板467對第}孔徑板461之相對位置，用來變更被導引^ 基板9上之光在副掃描方向之幅度（亦即，多個照射區域 931之各個之幅度）。另外，使第i孔徑板461和第2孔 #徑板467在主掃描方向移動，經由在來自射出部45之光 之照射區域451配置透光部46u、4671，或透光部we、 4672,可以變更基板9上之照射區域931之大小或°間距等。 在圖1所示之圖案描繪震置1中，利用控制部7控制載 物台驅動機構2和光照射部4,用來使基板9和载物A 3 -起在⑼方向移動，對移動中之基板9之所該描心域 (以下稱為「描繪區域」）進行光之照射。換言之，沿 板9之描繪區域，使照射區域93對基板9上 :ς 在⑼方向相對移動’並且對該照射區域93進== 312ΧΡ/發明說明書(補件)/96·11/96129807 1354348 射。利用此種方式，在感光材料上描繪 延伸之條帶狀之圖案。 方向平行 當載物台3之在主掃描方向之！次之移 之照射為停止之狀態，基板9和载物台龀寺二在光 向移動指定之距離(在本實施形態為二)後，在 之^描之相反方向（亦即，（_γ)方向）使基板9移動^ 且對照射區域93進行光之照射。在本實施形態中 間包爽有副掃描，經由進行4次之主掃描，ί 基板9之感光材料上，只對與圖相案對應之部份進 ，照射，用來描綠圖素圖案，在以後之步驟經由施加顯像 Ϊ理i只有感光材料之曝光部份殘留在基板上，形成彩色 濾波益基板之多個之副圖素。 圖7和圖8是表示使計測部5之近旁擴大之平面圖和正 面圖。計測部5具備有：平面鏡5卜被安裝在載物台3 之（-Y)側之侧面’和具有垂直於主掃描方向之反射面（亦 即’（-Y)側之面）；雷射光源52，在载物台之（_γ)侧，被 固^在基台11;安裝台53,上端位於與平面鏡51大致相 同问度之位置’分光益（Aplitter)54(參照圖，被設在 雷射光源52和安裝台53之間；第^線性干涉系統551和 第1接收器552，被安裝在安裝台53之上端之（_χ)侧； 和第2線性干涉系統561和第2接收器562，被安裝在安 裝台53之上端之（ + χ)側。在圖8中，在圖示之情況，載 物口 3之厚度被描繪成比實際之厚度大，另外，在載物台 3和基台11之間之支持板21、副掃描機構23、基座板24 312ΧΡ/發明說明書(補件)/96-11/96129807 丄：>：)斗：)46 和主掃描機構25之圖示被省略。 ，9疋概&圖’用來說明計測部5之計測之原理。在圖 田射光之光路以箭頭表示。如圖9所示，在計測部 雷射光源52射出之雷射光被分光器54分割成為2 方之部份經由第1線性干涉系統551射入到平面 =51 ’來自平面鏡51之反射光被第1線性干涉系統551 =作為參考光’與原來之雷射光之―部份干涉，而以第 + r收益552受光。然後，根據來自第1接收器552之輸 =即，反射光和參考光之干涉後之強度變化)，利用被 圖不之專用之演算電路，以良好之精確度 3在主掃描方向之位置(亦即，載物台3在移動方向之； 以下稱為「移動位置」）。另外，來自第i接收器552 $輸出被發送到控制部7之偏⑽度取得部73(參照圖 攸雷射光源52所射出之被分光器54分割之另外一 雷射光之-部份，在安1台53之内部，從圖g中之右侧 =向f:，，經由第2線性干涉系請射入到平面鏡 =來自第2線性干涉系統561之雷射光，射入到從第】 線性干涉系統551之雷射光所照射之平面鏡Η上的位置 = 行方向(亦即，副掃描方向)離開之平面鏡 涉系請與原來之雷射光之一部份==線性干 ^ , 1仿十涉’利用第2接收 器562受光，來自第2接收器咖之輸出（亦即，第2線 性干涉系統561和平面鏡51在主掃描方向之距離）被發送 312XP/發明說明書(補件)/96-11/96129807 17 1354348 到偏轉角度取得部73。 在計测部5、雷射光源52、第1 ;接；器552(更包含演算電路)成為干干;c 咨，該雷射測長器從载物台3 7式之雷射測長 雷射光，並接受雷射光之反射光，鏡射出 位置，另外’雷射光源52、第2線性干；口 3之移動 ::器562(不需要設有演算電路)成為二、式之：:了 2 之田射测長器，該雷射測長器從 卜1個 鏡W射出雷射光，並接受雷0卜，向平面 從被配置在載物台3之外部部5， :鏡51上之在載物台3之平行方向排 =千 射出雷射光。 似之位置， 在控制部7之偏轉角度取得部73,根據 雷射測長器之輸出，求得朝向主掃播方向之移動途； 物台3之偏轉角度（亦即，載物台3之對主掃描方向之方載 轉角度）。具體的說，根據從2個之雷射測長器射 = 射光在平面鏡51上之照射位置間之副掃描方向 田 離，和該2個照射位置之主掃描方向之位置之差^，长， 載物台3之偏轉角度。另外’因為求得該2個照射位置2 主掃描方向之位置之差分，因此在第2線性干涉系統56ι 和第2接收器562，不一定要求得平面鏡51和第2線性 干涉系統5 61之間之在主掃描方向之距離。 57 如圖7和圖8所示，計測部5更具備有平面鏡旋轉機構 ’以與載物台3垂直之載物台旋轉軸221(參照圖ι和 312XP/發明說明書(補件)/96-11/96129807 18 圖2)平行之第2旋轉轴 使平面鏡51對載物台3相對旋轉轴571作為中心’ 圖10和圖11是將羊 示之平面圖和側面圖轉機構57之-部份擴大顯 請，在载物台3之(千：疑轉機構57具備有··支持 保持部573(參照圖7和 二來支持平面鏡51;第1 旋轉軸571上，用來保：支持板:2二之平面鏡 第1保持部573之㈠）伽十面田鏡/1，4 2保持部別’在 576，在上部安裝有 肖來保持平面鏡51 ;滑動部 支持板572上之線性導主：可以沿著固定在 簧577，用來連社#在主掃描方向移動；彈 f 、’°支持板572和滑動部576 ;和線性氣缸 向。 將固疋在支持板572之滑動部576壓向（+γ)方 如圖10和圖]彳张- 576 5762朝向（仏丨 到（-Χ)侧之突出部5762。突出部 朝向(-Ζ)側延伸成板狀，在⑼側之 長狀態之彈箬ς77 + , 、 ^ ^ 之連桿5781。 ’ (~Υ)側之侧面抵接有線性氣缸578 在：：鏡旋轉機構57 ’使線性氣虹578之連桿5781伸 式，平面二吏f動部576朝向⑻方向移動，利用此種方 鏡51以平面鏡旋轉軸571作為中心，在圖1〇之 A q針方向（亦即，使平面鏡51之（-X)側之端部接近載物 =方向)進行旋轉。另外，當線性氣…連桿= 、利用彈簧577之收縮力，使滑動部576朝向（_γ) 3讀發明說明書(補件)/96_ιι/96_ 1354348 方向移動，利用此種方式，平面 叫參照圖7和圖8)作為中心，在圖===轉轴 行旋轉。 口 iU之順捋針方向進 =和圖2所示之第！攝影部61具備有“固 其被配置在載物台3所保持之基板9之(:) 攝影機621 W上方’冑2攝料62具備有4個之對準 琳如機621 ’其被配置在基板9之4 半 ^攝=ίΓ攝影機⑵被固定在圖示所省略= 準攝之可攝影範圍(亦即，視野)大於對 準攝影機611。 ’對準攝影機621之解析度高於預對 ::欠說明利用圖案描緣裝置i進行之 之流程。圖12表示圖素圖宰描綸 掏、曰 圖案時，首先，將在主面塗布 載置在載物么3上"有負感材料之基板9 川)在載物口 3上，且破吸著並保持在載物台％步驟 然後，利用控制部7押岳I丨笛1 Μ ^ Λ 6π， 標記(圖示省略)t之(-”側 ：:部近旁之對準 押制都7々H 爛之2個進订攝影。然後，利用 之基板位置調整部7卜根據來自第！攝影部61 之輸出，控制载物台驅動機構2(亦即，載物台旋轉機構 二主掃描機構25及副掃描機構23)，用來使載物台3 描方向和副掃描方向移動，和以载物台旋轉軸22ι 作為中心妨_。制此财式，進行 312XP/發明說明書(補件)/96_丨1/961298〇7 20 ^54348 方向之位置和在副掃描方向之位置（以下將該等之位置分 別稱為「移動位置」），和以載物台旋轉轴221作為中心 =方向之位置(亦即’基板9之方向’以下稱為「旋 置」）之大致調整（所謂之預對準），使基板9上之4 固之對準標記分別位於4個之對準攝影機62 = 驟叫在載物台3之旋轉中，利用編碼= m物台3之旋轉角度(亦即，對主掃描方向之傾斜 =)’並將其發送到控制部7之平面鏡角度調整部72。 1圖案騎裝置卜與利用基板位置調整部 二之旋轉同步’利用控制部7之平面鏡角度調整：7物2 鏡旋轉機構57，用來使平面鏡51在載物台3之 ^轉方向之相反方向進行旋轉（步驟su)。利用 -調整部72之平面鏡51之旋轉角度之大 ： 器連續送至丨丨承而扭么* 寻4文編碼 ”之栽1二 度調整部72之利用基板位置調整部1354348 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a substrate moving device for moving a substrate. In the prior art, the drawing device that draws a pattern on a semiconductor substrate or a glass substrate (hereinafter referred to as "substrate") moves the carrier σ on which the substrate is placed, and traces the entire substrate. For example, in the technique disclosed in Japanese Laid-Open Patent Publication No. 2005-221596, a light ray having a plurality of openings is used to illuminate the photosensitive material on the substrate, and the substrate and the stage are moved together. The photosensitive material on the substrate is drawn in a strip-like pattern. In such a drawing device, due to a manufacturing error or the like of the guide for guiding the stage in the moving direction, it is slightly deflected or slightly rotated from the moving axis of the stage. The proposed technique is that when the fine pattern is drawn, the influence of such offset or rotation on the stroke cannot be ignored. Therefore, the position or direction of the stage in the movement is measured, and the drawing position is corrected. Good precision to draw patterns. : Techniques for measuring the position or orientation of the stage in motion, for example, the exposed 2005'90983 stage mirror illuminates the laser light, and measures the interference based on the interference from the reflected light from the mirror and the original laser light. Dynamic: The position or the yaw angle of the stage. ° However, in the greening, the substrate is adjusted at the position of the J-substrate before the substrate is placed on the substrate and the substrate is drawn. The side of the substrate on the stage for the basic position adjustment of the base 312XP/invention specification (supplement)/96.11/961298〇7 plate (so-called mechanism, the conventional structure is the use of gas ^Mhgn fine t) , use: = complement is 'When the substrate is moved on the stage ^ (four) ° but rub, or gas red and the substrate contact, will be #1^ board and the stage of the problem. The method of causing the substrate to be scratched and generating particles, in the device of the substrate moving device of the G5'9 () 983 publication, i can be used to move and rotate the mechanism. The stage with the substrate moves and rotates to perform the base. However, since the stage mirror and the stage rotate, the position of the stage is large when the rotation angle of the stage is large. The reflected light is separated from the light receiving portion, and the position or deflection of the moving stage cannot be measured. SUMMARY OF THE INVENTION The present invention is directed to a substrate moving apparatus for moving a substrate, and an object thereof is to reliably receive reflected light from a laser beam of a plane mirror after adjusting a rotational position of the substrate. The substrate moving device includes a stage for holding the substrate, and a stage moving mechanism for linearly moving the stage in a predetermined moving direction parallel to the stage; the plane mirror is mounted on The stage 'has a reflecting surface perpendicular to the moving direction; the interferometric laser length measuring device ' emits laser light from the outside of the stage toward the plane mirror, and receives the reflected light of the laser light' to obtain the load a moving position of the stage in the moving direction; the stage rotating mechanism rotates the stage with the 312ΧΡ/invention specification (supplement)/96-11/96129807 7 perpendicular to the stage; For the shadow portion: the entrance and exit adjustment unit 'according to the above-mentioned camera mechanism, whereby the stage movement mechanism and the stage rotation _.. ^ adjust the movement position and the rotation position of the substrate; In the rotation structure, the second rotation axis parallel to the first rotation axis is used as a middle mirror to rotate the stage relative to each other; and the plane mirror angle adjustment unit is in the ^10, #^ 々卞 by the mirror % A mirror opposite to the direction r of rotation of the bell, the upper switch 'to maintain this fine above the reflection light of the laser and the optical length measuring machine. According to the day of the present invention, after the rotation position is too surely received, the reflected light from the laser beam of the plane mirror can be removed. In a preferred embodiment of the second embodiment, the substrate moving device is further provided with a "solid interference type laser length measuring device" from the above-mentioned plane mirror from the above-mentioned laser: the parallel direction of the table: : the above-mentioned load emits laser light and receives the reflected light of the above-mentioned laser light. :: The external part of the object, according to the reflection from the first, the deflection of the deflection angle take-up, the length measuring device and the other one of the above lasers The above-described load deflection correcting unit during the movement of the measuring length Δ from the month of the Hg to the moving direction is controlled according to the above-described yaw angle =::=:: one upper _ direction two corners are better in the embodiment The plane mirror is rotated by the mirror, and the rotation angle of the plane mirror of the plane mirror angle adjustment unit is performed in synchronization with the rotation of the workpiece above the substrate position adjustment, and the use of the above 312 ΧΡ / invention manual (complement) Y96_!]/961298〇7 〇 1354348 The rotation angles of the stages of the substrate position adjusting unit are equal. In still another embodiment of the present invention, the substrate is moved by another one of the stage moving mechanisms. And the substrate is moved in a direction perpendicular to the moving direction, and the substrate is moved to the ground. The substrate moving device further includes an imaging unit having a resolution higher than that of the imaging; and the substrate position adjusting unit is further provided. Controlling the above-mentioned rotating mechanism based on the output from: = one of the photographing sections, whereby: the α soil plate is located at the rotational position at the start of the movement. This is simplified by the use of the square and the substrate can be moved with good precision. In another aspect of the invention, the substrate moving device is provided with a carrier for holding the substrate, and the stage moving mechanism is for straightening the carrier in a direction of movement specified thereto Move the two-port condensation mechanism to the middle of the i-th rotation axis perpendicular to the above-mentioned stage: there are: 3 stage rotation; the plane mirror is mounted on the stage, square (four) straight reflection surface; The laser is arranged to emit laser light from the outside of the stage and to receive the laser light and reflect the light on the plane mirror in the direction parallel to the stage and in the position ' The rotation angle obtaining unit obtains 2=! degrees above the middle of the movement in the moving direction based on the output from the pair of lightnings; the deflection correcting unit 'controls the deflection angle based on the deflection angle= Correcting the shift toward the moving direction = the deflection of the inner S stage; the photographing portion 'for entering the substrate into the lamp, the substrate position adjusting portion, based on the output from the photographing portion, 312XP / invention manual (supplement) /96-11/96129807 9 1354348 controlling the moving position and the rotational position of the substrate moving mechanism and the above-mentioned stage rotating machine; the plane mirror rotating machine; and the second rotating shaft parallel to the first rotating shaft As a center, the mirror is relatively rotated with respect to the stage; and the plane mirror angle is opposite to the direction of rotation of the successor stage, and the flat: mirror is rotated, thereby maintaining the above-mentioned pair of laser length measuring devices The reflected light is light. The above and other objects, features, aspects and advantages of the present invention will become more <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; A side view and a plan view depicting the construction of the device. The pattern drawing device i is a device that draws light on a glass substrate 9 for a liquid crystal display device (hereinafter simply referred to as "substrate 9:,"), and draws a pattern on a photosensitive material on the substrate 9. The green patterned substrate 9 is passed through The subsequent steps become the color filter substrate of the liquid crystal display component. κ The pattern drawing device 1 is irradiated with light on the substrate 9 (i.e., the exposed portion remains on the substrate during development). The color resistance of the upper material is used to static B / illuminate the pixel pattern (that is, the set of sub-pixels). On the substrate, as shown in Figure 1 and Figure 2, the pattern is set to be shaken. There is: a stage 3, on the abutment, for causing the object (4) mechanism 2 to be moved and rotated by D3; the frame 12 is fixed across the stage 3 and the stage drive mechanism 2 In the base 312^P/invention manual (supplement)/96.11/96129807 U, the light irradiation unit 4 is used to illuminate the substrate 1 in the photographing unit. Position and direction of 3; and ninth photography to move the substrate on the stage 3: A strong ^ Eight to make the substrate 9 and the stage 3 The function of the substrate moving device is a pattern drawing device 丨a. Fig. 3 is a block diagram showing the control unit 7 by the control of the structure of the ling-pong control, etc. The accomplice and other structures. The control only has the function of the coffee, _, _, (4) disk sample land 'to be connected as shown in Figure 3, and the right side of the '..., 邛 and the wheel-in section structure, The substrate position adjusting unit 71, the entire unit 72, the deflection angle acquiring unit 73, and the deflection correcting unit surface angle mapping device 1 control the stage 2 drawing unit 5, the first imaging unit 61, and the first control unit 7 by the control unit 7. 2 photographing: two: = shot from the measuring unit 5, the first photographing unit 61 and the second photographing unit are transmitted to the control unit 7. The rounding is injured as shown in Figs. 1 and 2, and the stage driving machine 2 Supporting the stage 3 in a rotatable manner, the support plate is mounted on the support plate 21 with the rotation axis 221 of the stage perpendicular to the stage 22' as the center, and the stage 3 is rotated by the two-axis mechanism. 23, the stage 3 and the support plate 21 are moved in FIG. 24 (hereinafter referred to as "sub-scanning direction"); the X-direction drawing of the base plate 2 The support 23 is supported by the structure 23; and the main scanning mechanism 25 = moved by the sub-sweep 3 and the support plate 21 and the base plate 24 in the stage shown in Fig. 2 as "main scanning direction". Direction (the following 312 ΧΡ / invention manual (replenishment y96-l 1/96129807 丄 3 3 转 22 22 shown in Fig. 1) is provided in the stage motor 222, and the linear motor 222 is provided with the fixed object. a moving member on the side of the (9) side, and a fixing member provided on the upper side of the supporting plate 21. In the stage rotating machine #22, a linear motor such as a piece moves along the groove of the fixing member in the U direction, The table & = 2 Γ 2 Τ 3 / the stage rotation axis 2 21 provided on the support plate 21 is rotated as a t-center, and is rotated within a specified angle range. The field 1J readable mechanism 23 is provided with a linear motor 23 On the support plate 2 :::, (_Z) side), parallel to the main surface of the stage 3, and in the vertical 2: in the = square: wide sub-scanning direction; and - the linear guide 23 in the linear The (8) side and the (9) side of the motor 231 are extended in the sub-scanning. The linear motor 231 is provided with a material to be fixed under the support plate 21, and a fixing member provided on the base plate 24, the moving member is fixed The scanning direction of the piece is used to linearly advance the support plate 21 and the load 3 from the linear motor 231 and the linear guide 232 in the sub-scanning direction. The main scanning mechanism 25 is provided with a linear motor 251 extending on the side of the base plate 24 and in a main scanning direction parallel to the main surface of the stage 3; and - a pair of actuators 252, in a linear motor The (+χ) side and the (1) side of 251 extend in the main scanning direction. The linear motor 251 is provided with a moving member fixed to the lower surface of the seat plate 24, and a fixing member provided on the upper surface of the base plate 11. The second moving member moves along the fixing member in the main scanning direction. 24 and the support plate 21 and the stage 3 are linearly moved along the linear motor pneumatic slider 252 in the main scanning direction. In Fig. 312XP / invention specification (supplement 1/96129807 12 1354348 two main scanning mechanism 25 and sub-scanning The mechanism 23 is a stage moving mechanism that moves linearly. The light irradiation unit 4 includes a plurality of optical heads 4: the sub-scanning directions are equally spaced (in this embodiment: The light irradiation unit 4 is provided with an illumination optical system ^ connected to each of the optical heads 41, and a laser oscillation in 43 and a laser drive unit 44 as the source, as shown in Fig. mV. The illuminating unit 4 passes through the respective (four) illuminating unit 44, and emits a pulse wave from the laser illuminator 13 to hereinafter “light”, and is guided to each optical head 41 via the illumination optical system 4". The optical head 41 is provided with: (four) 45, and the light of the 43 is directed toward the square: The unit 46 partially conceals the light from the emitting portion, and the optical system 47 guides the light passing through the aperture unit 46 onto the photosensitive material disposed on the substrate 9. Fig. 4 is a plan view As shown in FIG. 4, the aperture unit 46 is provided with: an i-th aperture plate 4 6 i having a plurality of rectangular shaped light-transmissive portions; and a (four) holding portion 462 from (+χ) The side and (_χ) sides hold the first aperture plate 46 and the position adjustment mechanism for adjusting the positions of the first aperture plate 461 in the main scanning direction and the sub-scanning direction. The first aperture plate 461 is respectively scanned along the sub-scanning. In the direction (that is, the χ direction), a plurality of light-transmitting portions 4611, 4612, and 4613 having three different sizes are arranged at equal intervals. In the present embodiment, the distance between the light-transmitting portions 46U and the distance between the light-transmitting portions 4612 are The distance between the light transmitting portions 4613 is different from each other. In Fig. 4, in order to easily understand the 312 ΧΡ/invention specification (supplement)/96-11/96129807 13 of the first aperture plate 461 except for the light transmitting portion 461 4613 The area (that is, the light shielding portion) is provided with parallel oblique lines. The first mu 463 is provided with: a first adjustment mechanism 464 for making The needle and the pair are held in the main scanning direction and the sub-m% state 465' is on the lower side of the first adjustment mechanism 464' aperture; and the second adjustment mechanism 466' is used to make the first The introducer 465 and the first adjustment mechanism 464 move linearly in the m-scanning direction along the line. In the present embodiment, the first adjustment mechanism tree and the second adjustment mechanism are used as the bias. It is shown that the aperture unit 46 is optically different from the aperture unit 46 shown in FIG. As shown in Fig. 5, the aperture unit further includes a second aperture plate tree having a plurality of rectangular shapes, and a second aperture plate is held from the (+γ) side and the (9) side of the holding portion 468'. And the third adjustment mechanism moves the second aperture plate 467 and the pair of holding portions 468 in the sub-scanning direction. In the present embodiment, a linear motor is used as the third adjustment mechanism 469. The second aperture plate 467, the holding portion 468, and the third adjustment mechanism 469 are disposed on the first aperture plate 46, the holding portion 462 (see FIG. 4), and the upper side of the position adjustment mechanism 463, which are fixed to the position adjustment mechanism. (Adjustment mechanism 464. The first aperture plate 461 and the second aperture plate 467 are disposed at the optical conjugate position. The second aperture plate 467 corresponds to the plurality of light transmission portions of the first aperture plate 461, respectively. 461, 4613, three kinds of light-transmitting portions 4671, 4672, and 4673 having different sizes are arranged at equal intervals along the sub-scanning direction (that is, the X direction). In FIG. 5, the figure is easily understood. The position adjusting mechanism 463 is depicted by a broken line, and the light transmitting portion 461 of the second aperture plate 312XP/invention specification (supplement)/96-11/96129807 14 1354348 is 4613. In addition, the second aperture plate 467 is except for the light transmitting portion. Parallel oblique lines are added to the area other than 4671 to 4673. • As shown in Fig. 5, the irradiation area 451 of the light emitted from the laser oscillator 43 via the emitting portion 45 (see ▲ 图) is two points in Fig. 5 The chain line indicates that the light transmitting portion 4673 of the second aperture plate 467 is partially overlapped with the light transmitting portion 4673. In the case of the light transmitting portion 4613 of the aperture plate 461, the light from the emitting portion 45 passes only through the overlapping region of the light transmitting portion 4673 and the light transmitting portion 4613 (hereinafter referred to as "the mask group light transmitting portion"). As shown in FIG. 6, the optical system 47' is guided to a plurality of rectangular-shaped irradiation regions 93 on the substrate 9. In the following description, the plurality of irradiation regions 931 are collectively referred to as "irradiation regions 93". The pattern drawing device 1' is adapted to change the relative position of the light on the guided substrate 9 in the sub-scanning direction by adjusting the relative position of the second aperture plate 467 in the sub-scanning direction to the first aperture plate 461 (ie, The amplitude of each of the plurality of irradiation regions 931. Further, the i-th aperture plate 461 and the second hole #diameter 467 are moved in the main scanning direction, and the light-transmitting portion 46u is disposed via the irradiation region 451 of the light from the emitting portion 45. 4671 or the light transmitting portions we, 4672 can change the size or pitch of the irradiation region 931 on the substrate 9. In the pattern drawing sensor 1 shown in Fig. 1, the control unit 7 controls the stage driving mechanism. 2 and the light irradiation portion 4 for moving the substrate 9 and the carrier A 3 - in the (9) direction The light-emitting area (hereinafter referred to as "drawing area") of the moving substrate 9 is irradiated with light. In other words, along the drawing area of the board 9, the irradiation area 93 is placed on the substrate 9: ς in the (9) direction Move 'and the illumination area 93 == 312 ΧΡ / invention specification (supplement) / 96·11/96129807 1354348. In this way, an extended strip-like pattern is drawn on the photosensitive material. The stage 3 is in the main scanning direction! The irradiation of the next shift is in a stopped state, and the substrate 9 and the stage 龀 Temple 2 are in the opposite direction (i.e., (_γ) after the distance specified by the light movement (two in the present embodiment). The direction of the substrate 9 is moved and the illumination region 93 is irradiated with light. In the present embodiment, the intermediate package is sub-scanned, and the main material of the substrate is scanned four times, and only the portion corresponding to the image is irradiated on the photosensitive material of the substrate 9 to be used for drawing the green pixel pattern. In the subsequent steps, only the exposed portion of the photosensitive material remains on the substrate by applying the image processing, and a plurality of sub-pixels of the color filter substrate are formed. Fig. 7 and Fig. 8 are a plan view and a front elevational view showing the vicinity of the measuring unit 5. The measuring unit 5 includes a side surface 'on which the plane mirror 5 is mounted on the (-Y) side of the stage 3 and a reflecting surface perpendicular to the main scanning direction (that is, a surface on the '(-Y) side); The light source 52 is fixed to the base 11 on the (_γ) side of the stage; the mounting base 53 has an upper end located at substantially the same degree as the plane mirror 51, and the Aplitter 54 (refer to the figure, is set in Between the laser light source 52 and the mounting table 53; the first linear interference system 551 and the first receiver 552 are mounted on the (_χ) side of the upper end of the mounting table 53; and the second linear interference system 561 and the second receiver 562 is mounted on the (+ χ) side of the upper end of the mounting table 53. In Fig. 8, in the illustrated case, the thickness of the load port 3 is depicted as being larger than the actual thickness, and in addition, on the stage 3 Support plate 21, sub-scanning mechanism 23, base plate 24 312 ΧΡ / invention manual (supplement) / 96-11/96129807 丄: >:) bucket:) 46 and main scanning mechanism 25 The illustration is omitted. The outline of the measurement unit 5 is used to explain the principle of measurement by the measuring unit 5. The light path of the light in Tutian is indicated by an arrow. As shown in Fig. 9, the laser light emitted from the laser light source 52 in the measuring unit is divided into two by the beam splitter 54 and is incident on the plane through the first linear interference system 551 = 51 'the reflected light from the plane mirror 51 is 1 Linear Interference System 551 = as a reference light 'partial interference with the original laser light, and received by the + r gain 552. Then, based on the input from the first receiver 552, that is, the intensity change after the interference between the reflected light and the reference light, the position of the main scanning direction with good precision 3 is utilized by the dedicated calculation circuit (not shown). That is, the stage 3 is in the moving direction; hereinafter referred to as the "moving position". Further, the output from the ith receiver 552$ is transmitted to the control unit 7 by the partial (10) degree acquiring unit 73 (see the portion of the other laser light split by the beam splitter 54 emitted by the laser light source 52). From the right side of the unit 53 to the f:, the second linear interference system is incident on the plane mirror = the laser light from the second linear interference system 561 is incident on the linear line The position on the plane mirror 照射 irradiated by the laser light of the interference system 551 = the plane direction of the line direction (ie, the sub-scan direction) is related to the original part of the laser light == linear dry ^, 1 imitation 'The second receiver 562 receives light, and the output from the second receiver (that is, the distance between the second linear interference system 561 and the plane mirror 51 in the main scanning direction) is transmitted 312XP/invention specification (supplement)/96- 11/96129807 17 1354348 to the deflection angle acquisition unit 73. The measurement unit 5, the laser light source 52, the first; the connector 552 (including the calculation circuit) is dry; c, the laser length measuring device The laser of the stage type 7 7 measures the long-range laser light, and receives the reflected light of the laser light, and the mirror shoots out the position, and the other 'Laser light source 52, second linear dry; port 3 movement:: 562 (no need to have a calculation circuit) to become a second type:: 2 field shot length measuring device, the laser length measuring device from A mirror W emits laser light and receives a lightning beam, and the laser beam is emitted from the outer portion 5 of the stage 3 on the mirror 51 in the parallel direction of the stage 3. In the position, the deflection angle acquiring unit 73 of the control unit 7 obtains the movement toward the main sweeping direction based on the output of the laser length measuring device; the deflection angle of the object table 3 (that is, the stage 3) The angle of rotation in the direction of the main scanning direction. Specifically, according to the sub-scanning direction between the irradiation positions of the two laser detectors, the spotlights on the plane mirror 51, and the two irradiation positions The difference between the positions of the main scanning directions, the length, and the deflection angle of the stage 3. In addition, since the difference between the positions of the two scanning positions 2 in the main scanning direction is obtained, the second linear interference system 562 and the second receiving are performed. The 562 does not necessarily require the distance between the plane mirror 51 and the second linear interference system 5 61 in the main scanning direction. As shown in Fig. 7 and Fig. 8, the measuring unit 5 further includes a flat mirror rotating mechanism 'the stage rotating shaft 221 perpendicular to the stage 3 (refer to Figs. 1 and 312XP/invention manual (supplement)/96 -11/96129807 18 Fig. 2) The second rotation axis in parallel makes the plane mirror 51 as the center of the stage 3 with respect to the rotation axis 571. Fig. 10 and Fig. 11 are the plan view of the sheep and the part of the side view rotation mechanism 57. In the case of the stage 3, the support unit 573 is provided in the stage 3 (see FIG. 7 and the second support mirror 51; the first rotary shaft 571 is used to secure the support plate: 2 (2) of the first holding portion 573 of the plane mirror 2, the gamma field mirror / 1, 4 2 holding portion ' at 576, the plane holding mirror 51 is mounted on the upper portion; the linear guide on the sliding portion supporting plate 572: It can be fixed along the spring 577 for moving in the main scanning direction; the bullet f, the '° support plate 572 and the sliding portion 576; and the linear cylinder direction. The sliding portion 576 of the support plate 572 is pressed toward the (+γ) side as shown in Fig. 10 and Fig. 10] 彳 576 5762 is oriented toward the (-Χ) side projection 5762. The projection is oriented (-Ζ The side is extended into a plate shape, and the link 77} of the magazine 77 + , ^ ^ in the long state on the (9) side. The side of the ' (~Υ) side abuts the linear cylinder 578 at: the mirror rotation mechanism 57 ' The linear gas rainbow 578 link 5781 is extended, and the planar two-turn moving portion 576 is moved in the direction of (8). The square mirror 51 is centered on the plane mirror rotating shaft 571, and is in the Aq pin direction of FIG. The end portion of the plane mirror 51 on the (-X) side is rotated close to the load=direction. In addition, when the linear gas...link =, the contraction force of the spring 577 is used, the sliding portion 576 is oriented toward (_γ) 3 (Supplement) /96_ιι/96_ 1354348 Directional movement, in this way, the plane is referred to as Figure 7 and Figure 8) as the center, and the figure === rotation of the axis. The mouth of the iU is in the direction of the needle and the figure shown in Figure 2! The photographing unit 61 is provided with "the camera 621 W that is disposed on the substrate 9 held by the stage 3". The photographing unit 62 has four aligned linings 621. 4 of the substrate 9 = camera = (2) is fixed in the illustration omitted = the photographic range (i.e., the field of view) of the target is larger than the alignment camera 611. The resolution of the alignment camera 621 is higher than the pre-pair: : The flow of the pattern drawing device i is described. The figure 12 shows that when the pattern is printed on the main surface, the material is coated on the main surface. The substrate 9 is on the load port 3, and is sucked and held in the stage % step, and then the control unit 7 is used to yue I 丨 flute 1 Μ ^ Λ 6π, mark (not shown) t ( - "Side: Two adjacent shots are aligned in the vicinity of the section. Then, the substrate position adjustment unit 7 is used to control the stage drive mechanism based on the output from the first photography unit 61. 2 (that is, the stage rotating mechanism 2 main scanning mechanism 25 and the sub-scanning mechanism 23) for moving the direction of the stage 3 and the sub-scanning direction And the rotation axis 22 of the stage is used as the center. This system is used to make the position of the 312XP/invention manual (supplement)/96_丨1/961298〇7 20^54348 direction and the position in the sub-scanning direction. (hereinafter, these positions are referred to as "moving positions", respectively, and the position where the stage rotation axis 221 is centered = direction (that is, the direction of the 'substrate 9' is hereinafter referred to as "screw") (so-called pre-alignment), the alignment marks on the substrate 9 are respectively located at four alignment cameras 62 = the sudden rotation is in the rotation of the stage 3, and the rotation angle of the code = m stage 3 is utilized. (that is, the tilt in the main scanning direction =) ' is transmitted to the plane mirror angle adjusting portion 72 of the control portion 7. 1 pattern riding device is synchronized with the rotation of the substrate position adjusting portion 2 'planar mirror using the control portion 7 Angle adjustment: 7 object 2 mirror rotation mechanism 57 for rotating the plane mirror 51 in the opposite direction of the rotation direction of the stage 3 (step su). The rotation angle of the plane mirror 51 by the adjustment portion 72 is large: Continuously sent to the 丨丨承 and twisted * 寻4文编码" plant 1 2 The adjusting unit 72 by the substrate position adjusting portion
之相對角度，因為維持在與基LI: 持==之第1接收…W 雷射…反射光之受光(亦即，-對 由=則長益之各個之反射光之受光）。 用79二:=:平面鏡51之角度調整結束時，利 對基板9上之4 j Μ2之4個之料攝影機⑵， 後，利用控制部7之之^準標記（圖示省略）進行攝影。然 摄基板位置調整部71，根據來自第2 攝…之輸出’控制載物台驅動機構2之載物 312XP/發明說明書(補件)/96七細298〇7 ^ =構22 ’用來使載物台3以載物台旋轉軸22i作為中心 而使基板9位於圖1所示之基板9之移動開始 時之鉍轉位置（步騾S14)。 所：圖案描繪裝置卜將根據來自第2攝影部62之輪出 斤士得之載物台3在主掃描方向和副掃描方向之位置偏 播^/己憶在基板位置調整冑7卜然後，利用位置調整 曰3之第2調整機構466，根據在副掃描方向之位置 移里，使第1孔徑板461和第2孔徑板467在副掃描方 向移動，用來使基板9對光照射部4進行相對移動，使盆 ，於，動開始時之在副掃描方向之移動位置。然後，根據 立主掃描方向之位置偏移量，變更來自後面所述之光照射 4 4之光之開始照射之時序，藉以在基板9上之描綠開始 位置，正確地開始描繪。另外，亦可以根據在上述主掃描 3和副掃描方向之位置偏移量，利用主掃描機構25和 釗知描機構23使載物台3移動，用來使基板9位於 鲁開始時之移動位置。 秒動 敕當結束對基板9之比上述預對準更高精確度之位置調 整（所謂之對準）時，利用控制部7控制載物台驅動機構 2 ’開始使載物台3和基板9之朝向（+γ)方向之移動（步驟 • s 15)。然後，利用控制部7控制光照射部4，開始光之照 .射，利用孔徑單元46使該光被部份地遮蔽，而在基板“、9 之感光材料上，將光導引到與光罩組透光部對應之照射 區域93(與圖素圖案之一部份對應之照射區域）（步驟 S16)。然後，照射區域⑽在（_乃方向對感光材料進行相 mxp__ 書(補件)/96 11/9612贿 22 主掃描。用來在基板9上之感光材料描繪條帶狀之圖 ，基板9和載物台3之移動中利用計測部5之雷射測 :相载物台3在主掃描方向之移動位置，和對主掃描 夕二=偏轉角度。然後’根據從計測部5輸出之載物台3 :置’依照需要控制來自光照射部4之光之照射時 測部5 確度之圖案之描緣。另外’根據從計 户’载物口3之偏轉角度，利用控制部γ之偏轉 二二物台旋轉機構22,用來使朝向主掃描方 以校正偏轉。利用此 门疋轉错 描綠精確度。㈣方式了以更進—步地提高圖案之 之V當照射區域93之主掃描到達指定 驟二:f吏=3 =自光照射部4之光之照射(步 結束對基板9上之口感二^第之=亭=驟S18)。當 否繼續對基板9之圖案之描綠（亦即人^^時個判斷是 在有T-個之主掃二= ====移，二: 伸之平面鏡51’即使在载物台3朝二:::描方向延 f自-對雷射光測長器之光確== 當载物台3之朝向副掃描方向之移動結束時，回到步驟 312XP/發明說明書(補件)/96—11/961298〇7 ^ 丄叶J外δ S15’開始載物a q 束位置，停止光之M、S16)。然後，在(-Y)側之移動結 在圖案描綠裳置台3之移動(步驟S17、S18)。 朝向主掃描方向之㈣物台3之 昭鼾F移動（亦即，對基板9上之感光材料之 6 -丨^之主掃描）’以各個主掃描之間包夾有載物台 =朝向副掃描方向移動之方式，重複進行指定之次數（在 ^形態中為4次）（步驟sl5〜sl9、si9i)。然後，當 土板9上之感光材料條帶狀之圖素圖案全部描緣完成 時（步驟S19)，結束利用圖案描繪裝置丨之描繪。另外， ，本實知形態令’所說明者是對在主面上只設置1個描繪 區域之基板9之圖案之描綠，但是亦可以在圖案福緣裝置 1中對在主面上設定有多個之描繪區域（所謂預定採取 之夕面配置方式)之基板進行圖案之描繪。在此種情況， 依照基板上之騎區域之排列，在載物台3之朝向主掃描 方向之移動中，重複進行步驟S16、S17。 如以上所說明之方式，在圖案描㈣置1於計測部5， 經由在基板9之預對準時，在載物台3之旋轉方向之相反 方向使平面鏡51旋轉，用來使平面鏡51之反射面對主掃 .描方向成為垂直。利用此種方式，即使基板9未被正確地 ,載置在載物台3上之情況時，在預對準後（亦即，調整基 板9之旋轉位置之後），亦可以利用雷射測長器之第1接 收器552和第2接收器562確實地接受來自平面鏡51之 雷射光之反射光。其結果是可以確實地而且高精確度地求 312XP/發明說明書(補件)/96-11/96129807 24 :戴物台3在主掃描方向之移動位置 也而且高精確度地求得裁物台 ，亦可以確實 度。 對主知描方向之偏轉角 轉角戶之田+在載物口之移動中進行偏轉校正之情況時，偏 度，所以一般之受光範圍 ^要求具有南解析 1 Ψ , 在本貫施形態之圖案描繪 r，固為利用雷射測長 鏡51之確實地接受來自平面 、偏轉校:之圖二 另外，當載物台亦在垂直於主产> +上 動之情況時，來自計測向之副掃描方向移 置，因π 之雷射光之照射位 以在餘Ϊ 副掃描方向相對地移動，所 i中，二在本實施形態之圖案描繪裝置 方^他用雷射測長器可以確實地接受來自在副掃描 I:;平面鏡51之雷射光之反射光，所以係特別適 σ ;、行载物台之副掃描之圖案描繪裝置。 在计測部5，平面鏡51之旋轉與預對準時之載物台3 之旋轉同步地進行。利用此種方式，在調整基板9之旋轉 位^之期間’可以經常確認雷射測長器之雷射光之反射光 之文光。另外，可以確實防止反射光脫離雷射測長器之第 1接收II 552和第2接收器562(所謂之雷射光之遮斷）。 另外，經由使預對準時之平面鏡51之旋轉角度與載物台 3之旋轉角度成為相等，可以更確實地接受來自平面鏡5ι 312ΧΡ/^0^|^0^^(^ί{：)/96-11/96129807 25 1354348 之反射光。 在圖案描繪褒置i，利用主掃描機構25、 23和載物台旋轉機構2 田機構 行美杯Q夕苑料、隹 1史戰物口 3移動和旋轉，用來 盯基板9之預對準和對準。利用此種方式，經 機構和對準機構之-部份共同化，可預= 置1之構造簡化，並且以良好之精確声择其=案為㈣ 開始位置。 良好之精確度使基板9位於移動 以上已說明本發明之實施形態，但是本發明並不只 為上述貫施形態者，而是可以有各種之變更。 2上！實施形態之圖案描繪裝置1中，係利用線性馬達 乍為主知描機構25或副掃描機構23之驅動源亦 :!二其::構造，例如，利用馬達使滾珠螺桿旋:： 被女裝在《珠螺桿之螺帽—起地使載物台3直 ”。 預對準時之載物台3之旋轉角度之計測，不只限定為利 用編碼ϋ者’例如’亦可以利用與上述計測部5分開; 之-對雷射測長器’對與被固定在載物台3之平面/ 不同之平面鏡，照射2條之雷射光，利用該雷射光^ 計測載物台3之旋轉角度。另外，在利用步進 ^ 物台旋轉機構22之情況’亦可以將該步進馬達之旋2 ^脈波數發送到平面㈣度調整冑72，根據該 巧 整平面鏡51之角度。 筑碼 在圖案描繪裝置1，利用平面鏡角度調整部72之 鏡51之旋轉不-定要與預對準時之載物台3之旋 : 地進行，例如，亦可以在載物台3之旋轉結束後使平= 312ΧΡ/發明說明書(補件)/96-11/96129807 26 丄j:)砰J斗δ 鏡51在與載物台3 台3之— 轉方向之相反方向，旋轉與載物 雷射測長器之平面鐘5…另卜〃要月b夠維持在來自 51之旋缠&疮·兄51之反射光之受光之範圍，平面鏡 々轉角度不-定要等於載物台3之旋轉角度。 9固之平面鏡51者’亦可以設置2個之平面铲， 分別反射來自第】蠄极；、本/ 心十面鏡’ 56i之兩射光| 涉糸統551和第2線性干涉系統 ^ 1 、在此種情況，最好使該2個之平面鏡被固 疋在1片之保持板上，利用平面鏡角度調 體地旋轉。 氐為一 利用載物台驅動機構2之基板9之位置調整， 分成預對準和對準之2個階段進行。在基板9之位 !要未很高之_之情況等，亦可以將第2攝影部二 4略’利用1次之對準使基板9移動到移動開始位置。 在圖案描繪裝置1 ’亦可以利用雷射測長器或破璃尺▲十 鲁測朝向主掃描方向移動途中之载物台3之在 = 之位置，對朝向副掃描方向之位置偏移進行校正〇田σ 在上述實施形態之圖案描繪裝置丨中，亦可以使 上形成有顯像時之曝光部份被除去之正型之咸光面 .基板，對此種基板進行描繪。在此種情況，例如，打2之 應於液晶顯示裝置之液晶定向控制用之突起部之圖^二對 外，感光材料亦可以使用不伴隨顯像步驟之其他種類另 圖案描繪裝置1中，朝向基板9之光束以外用於、者： 源’例如可以使用電子束或離子束。 < 此 312ΧΡ/發明說明書(補件)/96-11/96129807 27 1354348 圖案描繪裝置1亦可以用來對液晶顯示裝置用之 TPTCThin Fi lm Transistor)基板進行圖案之描繪，另外， ，亦可用來對電漿顯示裝置或有機EL顯示裝置等之平面顯 >示裝置用之玻璃基板、半導體基板或印刷佈線基板，或 者，光罩用之玻璃基板等進行圖案之描繪。另外，亦可以 從圖案描繪裝置1將光照射部4省略，對利用載物台驅動 機構2移動之基板9，進行圖案之描繪以外之處理。 φ 上面已詳細描述本發明，但是上述之說明只作舉例用， 並不用來限制本發明。因此，在不脫離本發明之範圍内可 以有多種之變化或態樣宜被理解。 【圖式簡單說明】 圖1是圖案描繪裝置之侧面圖。 圖2是圖案描繪裝置之平面圖。 現之功能和其 圖3是方塊圖，用來表示利用控制部所實 他之構造。 圖4是平面圖，用來表示孔徑單元之一部份。 圖5是平面圖，用來表示孔徑單元之另外： 圖6是平面圖’用來表示基板上之照射區域。 圖 圖7是平面圖’用來表示擴大之計測部之近旁。 圖8是正面圖’用來表示擴大之 固0是計測部之概念圖。 敗方 面鏡旋轉機構之 圖10是平面圖’用來表示擴大之平 部份。 圖 11是侧面圖 用來表示擴大之平The relative angle is maintained by the first reception of the base LI: holding ==...the laser...the received light of the reflected light (i.e., the received light of the reflected light of each of the positive and negative benefits). When the angle adjustment of the plane mirror 51 is completed, the four cameras (2) of 4 j Μ 2 on the substrate 9 are used, and then the image is photographed by the control unit 7 (not shown). The substrate position adjusting unit 71 controls the carrier 312XP/invention specification (supplement)/96 seven 298〇7^=structure 22' based on the output from the second camera. The stage 3 is centered on the stage rotating shaft 22i so that the substrate 9 is positioned at the turning position at the start of the movement of the substrate 9 shown in FIG. 1 (step S14). The pattern drawing device will be biased at the position of the substrate in the main scanning direction and the sub-scanning direction according to the stage 3 from the second imaging unit 62. Then, the substrate position is adjusted. The second adjustment mechanism 466 of the position adjustment 曰3 moves the first aperture plate 461 and the second aperture plate 467 in the sub-scanning direction in accordance with the positional shift in the sub-scanning direction for causing the substrate 9 to face the light irradiation unit 4 The relative movement is performed to cause the basin to move in the sub-scanning direction at the start of the movement. Then, the timing of the start of the irradiation of the light from the light irradiation 44 described later is changed in accordance with the positional shift amount in the vertical scanning direction, whereby the drawing is started correctly at the green starting position on the substrate 9. Further, the stage 3 may be moved by the main scanning mechanism 25 and the scanning mechanism 23 in accordance with the positional shift amount in the main scanning 3 and the sub-scanning direction, so that the substrate 9 is placed at the moving position at the start of the ru. . When the position adjustment (so-called alignment) of the substrate 9 with higher accuracy than the above-described pre-alignment is completed, the control unit 7 controls the stage driving mechanism 2' to start the stage 3 and the substrate 9. Movement in the direction of (+γ) (step • s 15). Then, the light irradiation unit 4 is controlled by the control unit 7, and the light is irradiated, and the light is partially shielded by the aperture unit 46, and the light is guided to the light on the photosensitive material of the substrate "9". The illuminating portion 93 corresponding to the light transmitting portion of the cover group (the illuminating region corresponding to one of the pixel patterns) (step S16). Then, the illuminating region (10) performs the phase mxp__ book (supplement) on the photosensitive material /96 11/9612 Bribe 22 Main scanning. The photosensitive material used for the substrate 9 is drawn in the form of a strip, and the laser of the measuring unit 5 is used for the movement of the substrate 9 and the stage 3: the phase stage 3 The moving position in the main scanning direction, and the main scanning time = the deflection angle. Then, based on the stage 3 of the output from the measuring unit 5, the measuring unit 5 is controlled to control the light from the light irradiation unit 4 as needed. In addition, the deflection of the two-stage rotation mechanism 22 by the control unit γ is used to correct the deflection toward the main scanning unit based on the deflection angle of the load port 3 from the accountant.疋 错 描 绿 绿 绿 。 。 。 。 。 。 。 。 。 。 。 。 错 错 错 错 错V. When the main scan of the irradiation area 93 reaches the designated step 2: f 吏 = 3 = illumination of the light from the light irradiation portion 4 (the end of the step on the substrate 9 is the second impression = kiosk = step S18). The green of the pattern of the substrate 9 (that is, the judgment of the person ^^ is in the presence of T-the main sweep two ===== shift, two: the extended plane mirror 51' even on the stage 3 toward the second:: : The direction of the drawing f is self-aligned with the light of the laser light detector == When the movement of the stage 3 toward the sub-scanning direction is completed, return to step 312XP / invention manual (supplement) / 96-11/961298 〇7 ^ 丄 leaf J outside δ S15' starts to load the aq beam position, stops the light M, S16). Then, the movement on the (-Y) side is in the pattern of the green skirting table 3 (steps S17, S18) The movement of the (four) object table 3 toward the main scanning direction (that is, the main scanning of the photosensitive material on the substrate 9) is carried out with a carrier between each main scan = The number of times of the movement in the sub-scanning direction is repeated (4 times in the shape of the ^) (steps sl5~sl9, si9i). Then, when the strips of the photosensitive material on the soil board 9 are all depicted edge At the time of the completion (step S19), the drawing by the pattern drawing device 结束 is completed. In addition, the description of the present invention is a description of the pattern of the substrate 9 on which only one drawing area is provided on the main surface, but In the pattern edge device 1, the substrate on which the plurality of drawing regions (the so-called predetermined surface arrangement) are set on the main surface may be patterned. In this case, according to the riding region on the substrate. The arrangement is repeated in steps S16 and S17 in the movement of the stage 3 in the main scanning direction. As described above, when the pattern drawing (4) is set to the measuring unit 5 via the pre-alignment on the substrate 9, The plane mirror 51 is rotated in the opposite direction of the rotation direction of the stage 3 for making the reflection of the plane mirror 51 perpendicular to the main scanning direction. In this manner, even when the substrate 9 is not placed correctly on the stage 3, it is possible to use the laser length measurement after the pre-alignment (that is, after adjusting the rotational position of the substrate 9). The first receiver 552 and the second receiver 562 of the device reliably receive the reflected light from the laser beam from the plane mirror 51. As a result, the 312XP/invention specification (supplement)/96-11/96129807 24 can be obtained with certainty and high precision: the stage 3 is moved in the main scanning direction and the cutting stage is obtained with high precision. It can also be true. When the deflection angle of the main direction is the angle of the home, and the deflection correction is performed during the movement of the load port, the general light receiving range is required to have a south resolution of 1 Ψ in the pattern of the present embodiment. Depicting r, it is true that the laser length measuring mirror 51 is used to accept the plane from the plane, and the deflection is shown in Fig. 2. In addition, when the stage is also moving perpendicular to the main production > The sub-scanning direction is displaced, and the irradiation position of the laser light of π is relatively moved in the sub-scanning direction of the ember. In the i, the pattern drawing device of the present embodiment can reliably use the laser length measuring device. It is a pattern drawing device that receives a sub-scan from the sub-station by receiving the reflected light from the sub-scan I:; In the measuring unit 5, the rotation of the plane mirror 51 is performed in synchronization with the rotation of the stage 3 at the time of pre-alignment. In this manner, the illuminating light of the reflected light of the laser light of the laser length measuring device can be often confirmed during the period in which the rotational position of the substrate 9 is adjusted. Further, it is possible to surely prevent the reflected light from coming off the first receiving II 552 of the laser length measuring device and the second receiver 562 (so-called blocking of the laser light). Further, by making the rotation angle of the plane mirror 51 at the time of pre-alignment equal to the rotation angle of the stage 3, it is possible to more reliably accept the plane mirror 5 ι 312 ΧΡ / ^ 0 ^ | ^ 0 ^ ^ (^ ί {:) / 96 -11/96129807 25 1354348 reflected light. In the pattern drawing device i, using the main scanning mechanism 25, 23 and the stage rotating mechanism 2 field mechanism, the United States Cup Q Xiyuan material, 隹 1 history object 3 movement and rotation, used to mark the substrate 9 pre-pair Alignment and alignment. In this way, the structure of the mechanism and the alignment mechanism can be partially combined, and the configuration of the pre-set 1 can be simplified, and the position is (4) the starting position with a good precision. Although the substrate 9 is moved with good precision, the embodiment of the present invention has been described. However, the present invention is not limited to the above-described embodiments, and various modifications are possible. 2 on! In the pattern drawing device 1 of the embodiment, a linear motor 乍 is used as a driving source of the main scanning mechanism 25 or the sub-scanning mechanism 23: a second structure: for example, a ball screw is rotated by a motor: In the "the nut of the bead screw, the stage 3 is straightened." The measurement of the rotation angle of the stage 3 during the pre-alignment is not limited to the use of the code "for example", and the measurement unit 5 can be utilized. Separate; for the laser length measuring device 'toward the plane/fixed plane mirror fixed to the stage 3, irradiate two pieces of laser light, and use the laser light to measure the rotation angle of the stage 3. In the case of using the stepping table rotation mechanism 22, the number of rotations of the stepping motor can also be sent to the plane (four) degree adjustment 胄 72, according to the angle of the sleek plane mirror 51. In the apparatus 1, the rotation of the mirror 51 by the plane mirror angle adjusting portion 72 is not determined to be the rotation of the stage 3 at the time of pre-alignment, for example, it is also possible to make the flat = 312 after the rotation of the stage 3 is completed. /Inventive manual (supplement)/96-11/96129807 26 丄j:)砰J bucket δ mirror 51 in the opposite direction of the 3 stages of the stage 3, rotate the plane clock with the load laser length measuring device 5... Another 〃 〃 b b 够 够 够 够 够 够 够 够 够 51 51 51 51 The range of the reflected light of the reflected light of 51, the angle of rotation of the plane mirror is not determined to be equal to the rotation angle of the stage 3. The plane mirror 51 of the solid plane can also be set with two plane shovel, respectively reflecting from the 蠄 蠄; , / 十 面 镜 ' 56i of the two shots | 糸 551 and the second linear interference system ^ 1 , in this case, it is best to make the two plane mirrors are fixed on a holding plate, Rotating in a plane by the angle of the plane mirror. The position adjustment of the substrate 9 by the stage driving mechanism 2 is divided into two stages of pre-alignment and alignment. The position of the substrate 9 is not high _ In the case of the second imaging unit 2, the substrate 9 may be moved to the movement start position by one alignment. The pattern drawing device 1' may also use a laser length measuring device or a ruler ▲ The position of the stage 3 on the way to the main scanning direction is at the position of =, facing the sub-scanning direction Correcting the offset 〇 σ In the pattern drawing device 上述 of the above-described embodiment, a positive-type salted surface substrate on which the exposed portion is removed during development may be formed, and the substrate may be drawn. In this case, for example, in the case of the protrusion for the liquid crystal orientation control of the liquid crystal display device, the photosensitive material may be used in another type of pattern drawing device 1 which is not accompanied by the development step. For the source other than the light beam of the substrate 9, for example, an electron beam or an ion beam can be used. < 312 ΧΡ / invention specification (supplement) / 96-11/96129807 27 1354348 The pattern drawing device 1 can also be used for The TPTCThin Film Transistor substrate for liquid crystal display device is used for pattern drawing, and can also be used for a flat display device such as a plasma display device or an organic EL display device, a semiconductor substrate or a printed wiring. The substrate or the glass substrate for the photomask is patterned. In addition, the light irradiation unit 4 may be omitted from the pattern drawing device 1, and the substrate 9 moved by the stage driving mechanism 2 may be subjected to processing other than pattern drawing. The invention has been described in detail above, but the above description is by way of example only and is not intended to limit the invention. Therefore, many variations or aspects are possible without departing from the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a side view of a pattern drawing device. 2 is a plan view of a pattern drawing device. The present function and FIG. 3 are block diagrams showing the construction by the control unit. Figure 4 is a plan view showing a portion of the aperture unit. Figure 5 is a plan view showing the additional aperture unit: Figure 6 is a plan view ' used to indicate the illuminated area on the substrate. Figure 7 is a plan view showing the vicinity of the enlarged measuring portion. Fig. 8 is a conceptual view showing a front view ‘ used to indicate that the enlarged solid 0 is a measuring unit. Fig. 10 is a plan view showing the flat portion of the enlargement. Figure 11 is a side view showing the expansion
312XP/發明說明書(補件)/96-11/90129807 28 1354348 部份。 圖12表示圖素圖案之描繪之流程。 【主要元件符號說明】 1 圖案描繪裝置 2 載物台驅動機構 3 載物台 4 光照射部 5 計測部 • 7 控制部 9 基板 11 基台 12 框架 21 支持板 22 載物台旋轉機構 23 副掃描機構 24 基座板 • 25 主掃描機構 41 光學頭 42 照明光學系統 43 雷射振盈器 44 雷射驅動部 45 射出部 46 孔徑單元 47 光學系統 51 平面鏡 312XP/發明說明書(補件)/96-11/96129807 29 1354348 52 雷射光源 53 安裝台 54 分光器 57 平面鏡旋轉機構 61 第1攝影部 62 第2攝影部 71 基板位置調整部 72 平面鏡角度調整部 73 偏轉角度取得部 74 偏轉校正部 93 照射區域 221 載物台旋轉軸 222 線性馬達 231 線性馬達 232 線性導引器 251 線性馬達 252 氣動滑動器 451 照射區域 461 第1孔徑板 462 保持部 463 位置調整機構 464 第1調整機構 465 綠性導引器 466 第2調整機構 467 第2孔徑板 312XP/發明說明書(補件)/96-11/96129807 30 1354348 468 保持部 469 第3調整機構 551 第1線性干涉 552 第1接收器 561 第2線性干涉 562 第2接收器 571 平面鏡旋轉軸 572 支持板 573 第1保持部 574 第2保持部 575 線性導引器 576 滑動部 577 彈簧 578 線性氣缸 611 預對準攝影機 621 對準攝影機 931 照射區域 461卜4613 透光部 4671-4673 透光部 5761 台座 5762 突出部 5781 連桿 312XP/發明說明書(補件)/96-11/96129807 31312XP / invention manual (supplement) / 96-11/90129807 28 1354348 part. Fig. 12 shows the flow of the depiction of the pixel pattern. [Description of main component symbols] 1 Pattern drawing device 2 Stage drive mechanism 3 Stage 4 Light irradiation unit 5 Measurement unit • 7 Control unit 9 Substrate 11 Base 12 Frame 21 Support plate 22 Stage rotation mechanism 23 Sub-scan Mechanism 24 Base plate • 25 Main scanning mechanism 41 Optical head 42 Illumination optical system 43 Laser vibrator 44 Laser drive unit 45 Injection unit 46 Aperture unit 47 Optical system 51 Flat mirror 312XP/Invention manual (supplement)/96- 11/96129807 29 1354348 52 Laser light source 53 Mounting stage 54 Beam splitter 57 Flat mirror rotating mechanism 61 First photographing unit 62 Second photographing unit 71 Substrate position adjustment unit 72 Plane angle adjustment unit 73 Deflection angle acquisition unit 74 Deflection correction unit 93 Irradiation Area 221 Stage rotation axis 222 Linear motor 231 Linear motor 232 Linear guide 251 Linear motor 252 Pneumatic slider 451 Irradiation area 461 First aperture plate 462 Holding portion 463 Position adjustment mechanism 464 First adjustment mechanism 465 Green guidance 466 second adjustment mechanism 467 second aperture plate 312XP / invention manual (supplement) / 96-11 /96129807 30 1354348 468 Holding portion 469 Third adjusting mechanism 551 First linear interference 552 First receiver 561 Second linear interference 562 Second receiver 571 Flat mirror rotating shaft 572 Supporting plate 573 First holding portion 574 Second holding portion 575 Linear guide 576 Slide 577 Spring 578 Linear cylinder 611 Pre-alignment camera 621 Alignment camera 931 Illumination area 461 Bu 4613 Transmissive part 4671-4673 Transmissive part 5761 Pedestal 5762 Projection 5181 Link 312XP / Invention manual Pieces)/96-11/96129807 31