JPH01202833A - Accurate xy stage device - Google Patents

Accurate xy stage device

Info

Publication number
JPH01202833A
JPH01202833A JP63026489A JP2648988A JPH01202833A JP H01202833 A JPH01202833 A JP H01202833A JP 63026489 A JP63026489 A JP 63026489A JP 2648988 A JP2648988 A JP 2648988A JP H01202833 A JPH01202833 A JP H01202833A
Authority
JP
Japan
Prior art keywords
stage
stages
variation
interferometers
angle error
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63026489A
Inventor
Nobutaka Kikuiri
Noboru Yamada
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP63026489A priority Critical patent/JPH01202833A/en
Publication of JPH01202833A publication Critical patent/JPH01202833A/en
Application status is Pending legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers

Abstract

PURPOSE: To eliminate a decrease in a throughput and to decrease the working accuracy of a guide by measuring a pitch angle error, a rolling angle error, and a yawing angle error at the positions of a stage, and so controlling the stage that the angle variation values become zero.
CONSTITUTION: Stages 1, 2 are driven perpendicularly by a motor 8 and feed threads 9, and the position of a wafer stage is measured by a laser interferometer 7. The pitching variation upon movement of the stages 1, 2 is detected by the difference of the stage positions measured by laser interferometers 7a, 7b, the rolling variation is detected by the difference of the stage positions measured by lease interferometers 7c, 7d, and yawing variation is detected by the difference of the stage positions measured by laser interferometers 7d, 7e. Angle error correcting stages 4-6 are provided on the stages 1, 2, thereby correcting the pitching, rolling and yawing errors obtained by the interferometers. Accordingly, an influence to be made on the alignment can be set to substantially zero. Thus, the working accuracy of a guide is decreased, and a decrease in its throughput is prevented.
COPYRIGHT: (C)1989,JPO&Japio
JP63026489A 1988-02-09 1988-02-09 Accurate xy stage device Pending JPH01202833A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63026489A JPH01202833A (en) 1988-02-09 1988-02-09 Accurate xy stage device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63026489A JPH01202833A (en) 1988-02-09 1988-02-09 Accurate xy stage device

Publications (1)

Publication Number Publication Date
JPH01202833A true JPH01202833A (en) 1989-08-15

Family

ID=12194914

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63026489A Pending JPH01202833A (en) 1988-02-09 1988-02-09 Accurate xy stage device

Country Status (1)

Country Link
JP (1) JPH01202833A (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05226223A (en) * 1992-02-18 1993-09-03 Canon Inc Aligner
JPH06151277A (en) * 1992-10-30 1994-05-31 Canon Inc Aligner
US6498352B1 (en) 1993-02-26 2002-12-24 Nikon Corporation Method of exposing and apparatus therefor
JP2007109861A (en) * 2005-10-13 2007-04-26 Tokyo Seimitsu Co Ltd Prober and rotation/transfer control method in prober
JP2008091785A (en) * 2006-10-04 2008-04-17 Dainippon Screen Mfg Co Ltd Substrate moving apparatus
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05226223A (en) * 1992-02-18 1993-09-03 Canon Inc Aligner
JPH06151277A (en) * 1992-10-30 1994-05-31 Canon Inc Aligner
US6498352B1 (en) 1993-02-26 2002-12-24 Nikon Corporation Method of exposing and apparatus therefor
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2007109861A (en) * 2005-10-13 2007-04-26 Tokyo Seimitsu Co Ltd Prober and rotation/transfer control method in prober
JP2008091785A (en) * 2006-10-04 2008-04-17 Dainippon Screen Mfg Co Ltd Substrate moving apparatus
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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