TWI352915B - Adaptive metrology sampling methods - Google Patents

Adaptive metrology sampling methods Download PDF

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Publication number
TWI352915B
TWI352915B TW093122493A TW93122493A TWI352915B TW I352915 B TWI352915 B TW I352915B TW 093122493 A TW093122493 A TW 093122493A TW 93122493 A TW93122493 A TW 93122493A TW I352915 B TWI352915 B TW I352915B
Authority
TW
Taiwan
Prior art keywords
sampling
metric
adaptive
rules
value
Prior art date
Application number
TW093122493A
Other languages
English (en)
Chinese (zh)
Other versions
TW200516469A (en
Inventor
Matthew A Prudy
Original Assignee
Advanced Micro Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc filed Critical Advanced Micro Devices Inc
Publication of TW200516469A publication Critical patent/TW200516469A/zh
Application granted granted Critical
Publication of TWI352915B publication Critical patent/TWI352915B/zh

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Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Program-control systems
    • G05B19/02—Program-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • General Factory Administration (AREA)
  • Measurement Of Mechanical Vibrations Or Ultrasonic Waves (AREA)
  • Complex Calculations (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Calibration Of Command Recording Devices (AREA)
TW093122493A 2003-08-04 2004-07-28 Adaptive metrology sampling methods TWI352915B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/634,013 US6988045B2 (en) 2003-08-04 2003-08-04 Dynamic metrology sampling methods, and system for performing same

Publications (2)

Publication Number Publication Date
TW200516469A TW200516469A (en) 2005-05-16
TWI352915B true TWI352915B (en) 2011-11-21

Family

ID=34115962

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093122493A TWI352915B (en) 2003-08-04 2004-07-28 Adaptive metrology sampling methods

Country Status (7)

Country Link
US (1) US6988045B2 (https=)
EP (1) EP1654756A2 (https=)
JP (1) JP2007501517A (https=)
KR (1) KR101069932B1 (https=)
CN (1) CN100373572C (https=)
TW (1) TWI352915B (https=)
WO (1) WO2005017981A2 (https=)

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DE102005032601A1 (de) * 2005-01-07 2006-07-20 Heidelberger Druckmaschinen Ag Druckmaschine
US7769225B2 (en) * 2005-08-02 2010-08-03 Kla-Tencor Technologies Corp. Methods and systems for detecting defects in a reticle design pattern
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US7460968B1 (en) 2005-09-30 2008-12-02 Advanced Micro Devices, Inc. Method and apparatus for selecting wafers for sampling
US7570796B2 (en) * 2005-11-18 2009-08-04 Kla-Tencor Technologies Corp. Methods and systems for utilizing design data in combination with inspection data
US7676077B2 (en) * 2005-11-18 2010-03-09 Kla-Tencor Technologies Corp. Methods and systems for utilizing design data in combination with inspection data
US8041103B2 (en) * 2005-11-18 2011-10-18 Kla-Tencor Technologies Corp. Methods and systems for determining a position of inspection data in design data space
DE102006051495B4 (de) * 2006-10-31 2017-11-02 Globalfoundries Inc. Verfahren und System zur zufälligen Verteilung von Scheiben in einer komplexen Prozesslinie
US7565254B2 (en) * 2006-12-13 2009-07-21 Advanced Micro Devices, Inc. Method and apparatus for metrology sampling using combination sampling rules
WO2008077100A2 (en) 2006-12-19 2008-06-26 Kla-Tencor Corporation Systems and methods for creating inspection recipes
WO2008086282A2 (en) * 2007-01-05 2008-07-17 Kla-Tencor Corporation Methods and systems for using electrical information for a device being fabricated on a wafer to perform one or more defect-related functions
US7962863B2 (en) * 2007-05-07 2011-06-14 Kla-Tencor Corp. Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer
US7738093B2 (en) * 2007-05-07 2010-06-15 Kla-Tencor Corp. Methods for detecting and classifying defects on a reticle
US8213704B2 (en) * 2007-05-09 2012-07-03 Kla-Tencor Corp. Methods and systems for detecting defects in a reticle design pattern
US7907770B2 (en) * 2007-06-15 2011-03-15 United Microelectronics Corp. Method for inspecting photomask and real-time online method for inspecting photomask
US7796804B2 (en) 2007-07-20 2010-09-14 Kla-Tencor Corp. Methods for generating a standard reference die for use in a die to standard reference die inspection and methods for inspecting a wafer
US7711514B2 (en) * 2007-08-10 2010-05-04 Kla-Tencor Technologies Corp. Computer-implemented methods, carrier media, and systems for generating a metrology sampling plan
TWI469235B (zh) * 2007-08-20 2015-01-11 Kla Tencor Corp 決定實際缺陷是潛在系統性缺陷或潛在隨機缺陷之由電腦實施之方法
US7974802B2 (en) * 2008-03-07 2011-07-05 International Business Machines Corporation Photomask image inspection
US8139844B2 (en) * 2008-04-14 2012-03-20 Kla-Tencor Corp. Methods and systems for determining a defect criticality index for defects on wafers
KR101729669B1 (ko) 2008-07-28 2017-04-24 케이엘에이-텐코어 코오포레이션 웨이퍼 상의 메모리 디바이스 영역에서 검출된 결함들을 분류하기 위한 컴퓨터-구현 방법들, 컴퓨터-판독 가능 매체, 및 시스템들
DE102009046751A1 (de) * 2008-12-31 2010-09-09 Advanced Micro Devices, Inc., Sunnyvale Verfahren und System zum Synchronisieren der Prozesskammerabschaltzeiten durch Steuern der Transportreihenfolge in eine Prozessanlage
US8775101B2 (en) 2009-02-13 2014-07-08 Kla-Tencor Corp. Detecting defects on a wafer
US8204297B1 (en) 2009-02-27 2012-06-19 Kla-Tencor Corp. Methods and systems for classifying defects detected on a reticle
US8112241B2 (en) * 2009-03-13 2012-02-07 Kla-Tencor Corp. Methods and systems for generating an inspection process for a wafer
US8108060B2 (en) * 2009-05-13 2012-01-31 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for implementing a wafer acceptance test (“WAT”) advanced process control (“APC”) with novel sampling policy and architecture
CN102156907A (zh) * 2010-02-11 2011-08-17 中国科学院计算技术研究所 面向qa系统的质检方法
US8781781B2 (en) 2010-07-30 2014-07-15 Kla-Tencor Corp. Dynamic care areas
US9170211B2 (en) 2011-03-25 2015-10-27 Kla-Tencor Corp. Design-based inspection using repeating structures
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US9087367B2 (en) 2011-09-13 2015-07-21 Kla-Tencor Corp. Determining design coordinates for wafer defects
US9652729B2 (en) * 2011-10-27 2017-05-16 International Business Machines Corporation Metrology management
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US8831334B2 (en) 2012-01-20 2014-09-09 Kla-Tencor Corp. Segmentation for wafer inspection
US8826200B2 (en) 2012-05-25 2014-09-02 Kla-Tencor Corp. Alteration for wafer inspection
US9189844B2 (en) 2012-10-15 2015-11-17 Kla-Tencor Corp. Detecting defects on a wafer using defect-specific information
US9053527B2 (en) 2013-01-02 2015-06-09 Kla-Tencor Corp. Detecting defects on a wafer
US9134254B2 (en) 2013-01-07 2015-09-15 Kla-Tencor Corp. Determining a position of inspection system output in design data space
US9311698B2 (en) 2013-01-09 2016-04-12 Kla-Tencor Corp. Detecting defects on a wafer using template image matching
US9092846B2 (en) 2013-02-01 2015-07-28 Kla-Tencor Corp. Detecting defects on a wafer using defect-specific and multi-channel information
US9865512B2 (en) 2013-04-08 2018-01-09 Kla-Tencor Corp. Dynamic design attributes for wafer inspection
US9310320B2 (en) 2013-04-15 2016-04-12 Kla-Tencor Corp. Based sampling and binning for yield critical defects
US10133263B1 (en) 2014-08-18 2018-11-20 Kla-Tencor Corporation Process condition based dynamic defect inspection
CN105489520B (zh) * 2014-09-18 2018-06-26 中芯国际集成电路制造(上海)有限公司 一种基于小采样系统的晶圆量测采样方法
US10650508B2 (en) 2014-12-03 2020-05-12 Kla-Tencor Corporation Automatic defect classification without sampling and feature selection
US10754260B2 (en) 2015-06-18 2020-08-25 Kla-Tencor Corporation Method and system for process control with flexible sampling
KR102351636B1 (ko) * 2015-09-21 2022-01-13 케이엘에이 코포레이션 유연적 샘플링을 이용한 공정 제어 방법 및 시스템
US10935962B2 (en) * 2015-11-30 2021-03-02 National Cheng Kung University System and method for identifying root causes of yield loss
CN110174865B (zh) * 2019-05-31 2020-07-03 北京宝兰德软件股份有限公司 一种控制目标信息采集率的方法及装置
CN112347197B (zh) * 2019-10-25 2025-01-14 北京京东拓先科技有限公司 用于输出信息的方法和装置
US11551954B2 (en) 2019-11-21 2023-01-10 Nanya Technology Corporation Advanced process control system

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JP2002076087A (ja) * 2000-08-31 2002-03-15 Mitsubishi Electric Corp 抜き取り検査管理システム
CN1186700C (zh) 2000-09-15 2005-01-26 先进微装置公司 半导体制造中用来改进控制的自调适取样方法

Also Published As

Publication number Publication date
US6988045B2 (en) 2006-01-17
KR20060063929A (ko) 2006-06-12
CN100373572C (zh) 2008-03-05
WO2005017981A3 (en) 2005-03-31
CN1830075A (zh) 2006-09-06
US20050033467A1 (en) 2005-02-10
JP2007501517A (ja) 2007-01-25
KR101069932B1 (ko) 2011-10-05
TW200516469A (en) 2005-05-16
WO2005017981A2 (en) 2005-02-24
EP1654756A2 (en) 2006-05-10

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