TWI349582B - Slit coater having nozzle lip cleaner - Google Patents

Slit coater having nozzle lip cleaner

Info

Publication number
TWI349582B
TWI349582B TW098108735A TW98108735A TWI349582B TW I349582 B TWI349582 B TW I349582B TW 098108735 A TW098108735 A TW 098108735A TW 98108735 A TW98108735 A TW 98108735A TW I349582 B TWI349582 B TW I349582B
Authority
TW
Taiwan
Prior art keywords
slit coater
nozzle lip
lip cleaner
cleaner
nozzle
Prior art date
Application number
TW098108735A
Other languages
English (en)
Other versions
TW201000219A (en
Inventor
Sang-Su Lee
Sang-Taek Oh
Original Assignee
Dms Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dms Co Ltd filed Critical Dms Co Ltd
Publication of TW201000219A publication Critical patent/TW201000219A/zh
Application granted granted Critical
Publication of TWI349582B publication Critical patent/TWI349582B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
TW098108735A 2008-06-27 2009-03-18 Slit coater having nozzle lip cleaner TWI349582B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080061927A KR100975129B1 (ko) 2008-06-27 2008-06-27 노즐 립 클리너를 구비한 슬릿 코터

Publications (2)

Publication Number Publication Date
TW201000219A TW201000219A (en) 2010-01-01
TWI349582B true TWI349582B (en) 2011-10-01

Family

ID=41494666

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098108735A TWI349582B (en) 2008-06-27 2009-03-18 Slit coater having nozzle lip cleaner

Country Status (3)

Country Link
KR (1) KR100975129B1 (zh)
CN (1) CN101614960B (zh)
TW (1) TWI349582B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5258811B2 (ja) * 2010-02-17 2013-08-07 東京エレクトロン株式会社 スリットノズル洗浄装置及び塗布装置
JP5819123B2 (ja) * 2011-07-12 2015-11-18 東レ株式会社 口金洗浄方法
KR101578368B1 (ko) * 2014-12-04 2015-12-18 주식회사 디엠에스 노즐립 클리너 및 이를 이용한 슬릿 코터
KR102324882B1 (ko) * 2014-12-08 2021-11-12 주식회사 디엠에스 노즐립 클리너 세정유닛
WO2017203721A1 (ja) * 2016-05-24 2017-11-30 株式会社タツノ ガス充填装置
CN108878325B (zh) * 2018-06-27 2021-03-26 云谷（固安）科技有限公司 涂布机及其涂液输出装置
CN110237971A (zh) * 2019-05-31 2019-09-17 溧阳嘉拓智能设备有限公司 锂电池狭缝挤压式涂布模头在线全自动清洁装置及方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100586239B1 (ko) * 2002-04-19 2006-06-02 주식회사 디엠에스 평판 디스플레이 세정용 유체 혼합 분사 장치
JP4298384B2 (ja) * 2003-06-04 2009-07-15 大日本スクリーン製造株式会社 液供給装置および基板処理装置
JP4451175B2 (ja) * 2004-03-19 2010-04-14 大日本スクリーン製造株式会社 ノズル洗浄装置および基板処理装置
KR100666347B1 (ko) 2004-10-15 2007-01-11 세메스 주식회사 슬릿 노즐 클리닝 장치
KR101097519B1 (ko) * 2005-06-25 2011-12-22 엘지디스플레이 주식회사 도포액 도포장치 및 이를 이용한 도포막의 형성방법
JP2007160206A (ja) * 2005-12-13 2007-06-28 Seiko Epson Corp 塗布装置
KR100688142B1 (ko) 2006-05-02 2007-03-02 주식회사 케이씨텍 노즐 세정장치 및 방법
KR100876377B1 (ko) * 2006-06-16 2008-12-29 세메스 주식회사 노즐 세정 기구 및 이를 포함하는 기판 처리 장치
KR101234216B1 (ko) * 2006-06-26 2013-02-18 엘지디스플레이 주식회사 슬릿코터
CN101135855B (zh) * 2006-08-31 2010-12-15 显示器生产服务株式会社 狭缝式涂敷装置
TWI316000B (en) * 2006-11-15 2009-10-21 Chugai Ro Kogyo Kaisha Ltd Discharge nozzle washing apparatus

Also Published As

Publication number Publication date
TW201000219A (en) 2010-01-01
KR20100001850A (ko) 2010-01-06
CN101614960A (zh) 2009-12-30
CN101614960B (zh) 2012-05-16
KR100975129B1 (ko) 2010-08-11

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