TWI341253B - Method for providing a substrate with a printed pattern - Google Patents

Method for providing a substrate with a printed pattern

Info

Publication number
TWI341253B
TWI341253B TW094110512A TW94110512A TWI341253B TW I341253 B TWI341253 B TW I341253B TW 094110512 A TW094110512 A TW 094110512A TW 94110512 A TW94110512 A TW 94110512A TW I341253 B TWI341253 B TW I341253B
Authority
TW
Taiwan
Prior art keywords
substrate
cover plate
machine
pattern
print head
Prior art date
Application number
TW094110512A
Other languages
English (en)
Other versions
TW200602197A (en
Inventor
Dam Dirkjan Bernhard Van
Kasteren Adrianus Cornelius Van
Richard Joseph Marinus Schroeders
Original Assignee
Chimei Innolux Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chimei Innolux Corp filed Critical Chimei Innolux Corp
Publication of TW200602197A publication Critical patent/TW200602197A/zh
Application granted granted Critical
Publication of TWI341253B publication Critical patent/TWI341253B/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/08—Treatments involving gases
    • H05K2203/088—Using a vapour or mist, e.g. cleaning using water vapor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Ink Jet (AREA)
  • Screen Printers (AREA)
TW094110512A 2004-04-05 2005-04-01 Method for providing a substrate with a printed pattern TWI341253B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP04101402 2004-04-05

Publications (2)

Publication Number Publication Date
TW200602197A TW200602197A (en) 2006-01-16
TWI341253B true TWI341253B (en) 2011-05-01

Family

ID=34962082

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094110512A TWI341253B (en) 2004-04-05 2005-04-01 Method for providing a substrate with a printed pattern

Country Status (7)

Country Link
US (2) US8016399B2 (zh)
EP (1) EP1735853B1 (zh)
JP (1) JP5033939B2 (zh)
CN (1) CN1938878B (zh)
AT (1) ATE510308T1 (zh)
TW (1) TWI341253B (zh)
WO (1) WO2005098993A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107201504B (zh) * 2017-05-19 2019-04-05 京东方科技集团股份有限公司 真空干燥膜层的方法和显示器件

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2112182C (en) * 1992-12-25 2000-06-27 Masami Ikeda Detachable ink jet unit and ink jet apparatus
US6390618B1 (en) * 2000-01-07 2002-05-21 Hewlett-Packard Company Method and apparatus for ink-jet print zone drying
GB2360489A (en) * 2000-03-23 2001-09-26 Seiko Epson Corp Deposition of soluble materials
JP2001341296A (ja) * 2000-03-31 2001-12-11 Seiko Epson Corp インクジェット法による薄膜形成方法、インクジェット装置、有機ｅｌ素子の製造方法、有機ｅｌ素子
JP2002103598A (ja) * 2000-07-26 2002-04-09 Olympus Optical Co Ltd プリンタ
JP3922517B2 (ja) * 2000-10-17 2007-05-30 セイコーエプソン株式会社 機能性液体付与基板の製造方法、電気光学装置の製造方法、及び機能性液体付与基板の製造装置
JP3628997B2 (ja) 2000-11-27 2005-03-16 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置の製造方法
JP2003022892A (ja) * 2001-07-06 2003-01-24 Semiconductor Energy Lab Co Ltd 発光装置の製造方法
TW512242B (en) * 2001-08-08 2002-12-01 Ind Tech Res Inst Manufacturing process and apparatus for ink injecting method of color filter
JP2003063033A (ja) * 2001-08-24 2003-03-05 Hitachi Koki Co Ltd 液滴吐出印字装置の印字ヘッドリフレッシュ方法
JP4138434B2 (ja) 2001-10-10 2008-08-27 セイコーエプソン株式会社 薄膜の形成方法、電子デバイスの形成方法
US6808749B2 (en) * 2001-10-10 2004-10-26 Seiko Epson Corporation Thin film forming method, solution and apparatus for use in the method, and electronic device fabricating method
US6810919B2 (en) * 2002-01-11 2004-11-02 Seiko Epson Corporation Manufacturing method for display device, display device, manufacturing method for electronic apparatus, and electronic apparatus
JP3985545B2 (ja) 2002-02-22 2007-10-03 セイコーエプソン株式会社 薄膜形成装置と薄膜形成方法、液晶装置の製造装置と液晶装置の製造方法と液晶装置、及び薄膜構造体の製造装置と薄膜構造体の製造方法と薄膜構造体、及び電子機器

Also Published As

Publication number Publication date
EP1735853B1 (en) 2011-05-18
JP5033939B2 (ja) 2012-09-26
US20070216914A1 (en) 2007-09-20
TW200602197A (en) 2006-01-16
WO2005098993A1 (en) 2005-10-20
CN1938878A (zh) 2007-03-28
ATE510308T1 (de) 2011-06-15
US20110304669A1 (en) 2011-12-15
CN1938878B (zh) 2010-05-12
JP2007535395A (ja) 2007-12-06
EP1735853A1 (en) 2006-12-27
US8016399B2 (en) 2011-09-13

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees