1335906 P51950162TW 22515twf.doc/n 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種模造玻璃(press-molding glass)技 術，且特別是有關於一種應用於模造玻璃之模仁(die)及其 去膜方法(stripping method)。 【先前技術】1335906 P51950162TW 22515twf.doc/n IX. Description of the Invention: [Technical Field] The present invention relates to a press-molding glass technique, and in particular to a mold for molding a glass (die) And its stripping method. [Prior Art]
近年來數位相機等光學產品的市場迅速發展，客戶對 成像品質的要求也逐漸提ifj，300萬以上晝素已是必備的 需求，而預計手機相機對晝素的要求也將提高至百萬晝素 以上’ 一般塑膠射出的光學鏡片無法達到這樣的成像品 質，必須使用玻璃鏡片，而由於這些產品的發展趨勢走向 輕薄短小’相對地對鏡片的尺寸要求也很小，對於非球面 的小尺寸玻璃鏡片，以拋光研磨的加工方式製造不僅難度 尚且速度慢’不符合經濟效益’因此以模造的方式生產非 球面的小尺寸玻璃鏡片已是現在及未來必然發展的趨勢。 而模造玻璃技術中，模仁壽命的長短關係著一對模仁 可壓鑄的鏡片數目多寡，模造玻璃鏡片的成本是否能降低 的關鍵就在於此。要提昇模仁壽命主要的方法就是在模仁 底材表面進行硬膜(hard coating)披覆的表面改質技術，而 目前玻璃模造產業廣為使用的硬膜為貴金屬，因其具有高 化學穩定性、耐腐蝕性、高離模性和高溫穩定性等^點问 可使模仁避免與玻璃產生反應和黏附現象，亦可提供足夠 之硬度和機械強度維持模仁本身之品質，及提升模仁之耐 5 1335906 P51950162TW 22515tw£doc/n 熱衝擊性，延長模仁使用壽命。 但經過多次高溫模造後，貴金屬保護膜層亦會有相冬 損壞，如何在保護膜層受損後，去除這受損的膜層後二 可維持模仁的鏡面精度，將是生產線上一大成本考量。在 貴金屬保護膜層硬膜方面，目前都是以鑽石切削方式去 除。此方法除了有費時的鏡面切削成本外，也會消耗模仁 底材，減少模仁底材的壽命，無形中增加模仁的耗材成本。In recent years, the market for optical products such as digital cameras has developed rapidly, and customers' requirements for image quality have gradually increased. If more than 3 million elements are necessary, it is expected that the demand for mobile phones will increase to millions. Ordinary plastic lenses that can't achieve such image quality can't achieve such image quality. Glass lenses must be used, and the development trend of these products is slim and short. 'The size requirements of the lenses are relatively small. For small aspherical glasses. Lenses, which are manufactured by polishing and grinding, are not only difficult but also slow to 'not meet economic benefits'. Therefore, the production of aspherical small-sized glass lenses by means of molding has become an inevitable trend now and in the future. In the mold glass technology, the length of the mold life is related to the number of lenses that can be die-cast in a pair of molds. The key to the cost reduction of the molded glass lens is this. The main method to improve the life of the mold is to perform hard coating coating on the surface of the mold substrate. Currently, the hard film used in the glass mold industry is noble metal because of its high chemical stability. Properties, corrosion resistance, high mold release and high temperature stability can help the mold to avoid reaction and adhesion with the glass, and also provide sufficient hardness and mechanical strength to maintain the quality of the mold itself, and lift the mold. Renzhi 5 1335906 P51950162TW 22515tw£doc/n Thermal shock resistance, extending the life of the mold. However, after many high-temperature molding, the precious metal protective film layer will also have winter damage. How to remove the damaged film layer after the protective film layer is damaged, the mirror precision of the mold core can be maintained, and it will be a production line. Big cost considerations. In the hard film of precious metal protective film, it is currently removed by diamond cutting. In addition to the time-consuming cost of mirror cutting, this method also consumes the matrix of the mold, reduces the life of the mold base, and virtually increases the cost of the mold.
【發明内容】 本發明提供一種應用於模造玻璃之模仁，以解決模仁 壽命不夠長的問題。 、、一 本發明再提供一種模造玻璃之模仁的去膜方法， 幅降低模仁的耗材成本。 本發明另提供一種應用於模造玻璃之模仁，可改盖模 仁底材與保護膜層之間的附著性。 、SUMMARY OF THE INVENTION The present invention provides a mold for molding a glass to solve the problem that the life of the mold is not long enough. Further, the present invention further provides a method for removing a mold of a molded glass, which reduces the cost of consumables of the mold. The present invention further provides a mold core for molding glass which can change the adhesion between the mold base material and the protective film layer. ,
本發明又提供一種模造玻璃之模仁的去膜方法，可方 便快速地去膜。 本發明提出一種應用於模造玻璃之模仁，包括一底 材、一去膜層及-保護膜層’其中底材的材料為碳化嫣 (wc)。去膜相位於底材上，且去膜㈣ (WN)或化合物，其中添加的Me包括至少種^ 素，且Me是指過渡金屬（transition metal)。而保謹膜声a 位於去膜層上，其中保護膜層的材料是選自包括銀⑻^ ㈣、鉑(Pt)、鈀(Pd)、铑_、餓(〇s)、釕(RU)、鎢(w)及 P51950162TW 22515twf.doc/n 钽(Ta)中的兩種或兩種以上材料之合金。 本發明再提出一種模造玻璃之模仁的去膜方法，包括 提供一個如上述的模造玻璃之模仁。然後，使用離子轟擊 去除保護膜層，再以一種去膜溶液反應蝕刻移除上述去膜 層。 在本發明之一實施例中，上述保護膜層的材料為銥鍊 合金。而且，其中的銥原子百分比約為1〇%〜9〇%;銖原子 百分比約為10%〜90%。 在本發明之一實施例中，上述去膜層的厚度在〇 3μιη 〜3μιη之間’且保護膜層的厚度在〇1μπι〜3μπι之間。 在本發明之一實施例中，上述去膜層中的氮原子百分 比為9%〜60%、Me原子百分比大於〇且小於3〇%，以及 鎢原子百分比為39%〜90%。 在本發明之一實施例中，上述去膜溶液的成份是濃度 10%〜40%的氫氧化鉀溶液。 在本發明之一實施例中，上述去膜溶液的成份是濃度 10%〜30%的氫氧化鈉與濃度1%〜10%的鐵說化钟 (K3[Fe(CN)6])或亞鐵氰化鉀(K4[Fe(CN)6])。 本發明另提出一種應用於模造玻璃之模仁，包括—底 材、一去膜層、一中間層及一保護膜層，其中底材的材料 為碳化嫣。去膜層則位於底材上，且去膜層的材料為氮化 鎢(WN)或W-Me-N化合物，其中添加的Me包括至少一種 元素’且Me是指過渡金屬。而中間層是位於去膜層上， 中間層的材料包括鉻、銥-銖-鉻合金、鉻加銥-鍊_鉻合金其 1335906 P51950162TW 22515twf.doc/n 中之-。賴膜層則位於t間層上，其令保護膜層的材料 是選自包括銥(Ir)、銖(Re)、鉑(pt)、鈀(Pd)、铑(Rh)、餓(〇s)、 釕(Ru)、鶴(W)及组(Ta)中的兩種或兩種以上材料之合金。 本發明又提出一種模造玻璃之模仁的去膜方法，包括 提供一個如上述有中間層的模造玻璃之模仁。然後，使用 離子轟擊去除紐麟和巾間層，再以—種絲溶液反應 蝕刻移除上述去膜層。 在本發明之另一實施例中，上述去膜溶液的成份是濃 度10%〜40%的氮氧化卸溶液。 在本發明之另一實施例中，上述去膜溶液的成份是濃 度10%〜30%的氫氧化鈉與濃度1%〜10%的鐵氰化鉀或亞 鐵氰化钟。 在本發明之另一實施例中，上述保護膜層的材料為銥 銖合金。而且，其中的銥原子百分比約為1〇%〜9〇%及鍊原 子百分比約為10%〜90%。 在本發明之另一實施例中，上述去膜層的厚度在 0·3μιη〜3μπι之間、中間層的厚度在〇 〇5μιη〜1μιη之間， 以及保護膜層的厚度在〇 lpm〜之間。 在本發明之另一實施例中，上述去膜層中的氮原子百 分比為9°/。〜60%、Me原子百分比大於〇且小於3〇%，以 及鶴原子百分比為39%〜90%。 在本發明之另一實施例中，當上述中間層為銥-鍊-鉻 合金時，其中的銥原子百分比為9%〜9〇%、銖原子百分比 為9%〜90% ’以及鉻原子百分比大於〇且小於5〇0/〇。 8 P51950162TW 22515twf.doc/n 本發明在模仁底材與保護膜層間或底材與中間層間 形成一層去膜層，因此不但可增加模仁底材與保護膜層之 間的附著性，而且在保護膜層損壞之後，能以不會傷1模 仁底材且方便快速的方式進行去膜，故可大幅降低模仁的 耗材成本。 為讓本發明之上述特徵和優點能更明顯易懂，下文特 舉較佳實施例，並配合所附圖式，作詳細說明如下。 【實施方式】 第一實施例 圖1疋依照本發明之第一貫施例的一種應用於模造破 璃之模仁的剖面示意圖。 請參照圖1，此模造玻璃鏡片之模仁是至少包括底材 10、保護膜層12和去膜層14之組合結構。圖i的模仁之 製作方式例如是先將底材10的表面研磨拋光，其中底讨 10的材料為碳化鎢(WC) ’ J05是其材料代號。然後，町利 用真空濺鍍法在底材10上鍍製去膜層14，其材料包括氮 化鎢(_)或W_Me-N化合物，在本實施例中是以氮化鎢為 例。上述W-Me-N化合物中添加的Me包括至少一種元素’ 且Me是指過渡金屬（transiti〇n metai)，其中去膜層14中的 氮原子百分比約為9%〜60%、Me原子百分比大於〇且約小 於30% ’以及鎢原子百分比約為39%〜90%。又，去膳層 14的厚度約在〇 3μιη〜3μιη之間，在本實施例中是以 1·5μπι 為例。 1335906 P51950162TW 22515twf.doc/n 請繼續參照圖1，之後在去膜層14上鑛製保護膜層 I2 ’其材料是選自包括銀(Ir)、銖(Re)、銘(Pt)、把(Pd)、錄 (Rh) '餓(〇s)、釕(RU)、鎢(W)及鈕(Ta)中的兩種或兩種以 上材料之合金，而在本實施例中是以銥銖合金(IrRe)為例， 其中的銥原子百分比約為10%〜90%;鍊原子百分比約為 10%〜90%。此外，保護膜層12的厚度約在O.lpm〜3μιη 之間’而在本實施例中是以〇.3μηι為例。在上述保護膜声The invention further provides a method for removing the mold of the molded glass, which can be easily removed quickly. The present invention provides a mold for a molded glass comprising a substrate, a release layer and a protective film layer wherein the material of the substrate is tantalum carbide (WC). The film removal phase is on the substrate and the film (4) (WN) or compound is removed, wherein the added Me includes at least a species, and Me refers to a transition metal. The film A is located on the de-filming layer, wherein the material of the protective film layer is selected from the group consisting of silver (8)^(4), platinum (Pt), palladium (Pd), 铑_, hungry (〇s), 钌 (RU). , tungsten (w) and P51950162TW 22515twf.doc / n 钽 (Ta) alloy of two or more materials. The present invention further provides a method of removing a mold for a molded glass, comprising providing a mold core of the molded glass as described above. Then, the protective film layer is removed by ion bombardment, and the above-mentioned film-removing layer is removed by reactive etching with a film-removing solution. In an embodiment of the invention, the material of the protective film layer is an iridium chain alloy. Moreover, the percentage of germanium atoms is about 1% to 9% by weight; the percentage of germanium atoms is about 10% to 90%. In one embodiment of the invention, the thickness of the stripping layer is between 〇 3 μm and 3 μm and the thickness of the protective film layer is between μ1 μm and 3 μm. In one embodiment of the invention, the percentage of nitrogen atoms in the stripping layer is 9% to 60%, the atomic percentage of Me is more than 〇 and less than 3%, and the percentage of tungsten atoms is 39% to 90%. In one embodiment of the invention, the composition of the stripping solution is a potassium hydroxide solution having a concentration of 10% to 40%. In one embodiment of the present invention, the composition of the above-mentioned film-removing solution is a concentration of 10% to 30% of sodium hydroxide and a concentration of 1% to 10% of iron (K3[Fe(CN)6)) or sub Potassium ferricyanide (K4[Fe(CN)6]). The invention further provides a mold for molding glass, comprising: a substrate, a stripping layer, an intermediate layer and a protective film layer, wherein the material of the substrate is tantalum carbide. The stripping layer is then on the substrate, and the material of the stripping layer is a tungsten nitride (WN) or W-Me-N compound, wherein the added Me includes at least one element ' and Me means a transition metal. The intermediate layer is located on the de-filming layer, and the material of the intermediate layer includes chromium, bismuth-tellurium-chromium alloy, chromium-ruthenium-chain-chromium alloy, which is 1335906 P51950162TW 22515twf.doc/n. The film layer is located on the t-th layer, and the material of the protective film layer is selected from the group consisting of iridium (Ir), ruthenium (Re), platinum (pt), palladium (Pd), ruthenium (Rh), and hungry (〇s ), an alloy of two or more materials in ruthenium (Ru), crane (W), and group (Ta). The present invention further provides a method of removing a mold for a molded glass, comprising providing a mold core of a molded glass having an intermediate layer as described above. Then, the lining and the interlining layer were removed by ion bombardment, and the above-mentioned delaminated layer was removed by reactive etching with a silk solution. In another embodiment of the invention, the composition of the stripping solution is a nitrogen oxidizing solution having a concentration of 10% to 40%. In another embodiment of the invention, the composition of the stripping solution is 10% to 30% sodium hydroxide and 1% to 10% potassium ferricyanide or ferrocyanide. In another embodiment of the invention, the material of the protective film layer is an antimony-bismuth alloy. Moreover, the percentage of germanium atoms is about 1% to 9〇% and the percentage of chain atoms is about 10% to 90%. In another embodiment of the present invention, the thickness of the stripping layer is between 0. 3 μm and 3 μm, the thickness of the intermediate layer is between 〇〇5 μm and 1 μm, and the thickness of the protective layer is between 〇lpm and . In another embodiment of the invention, the percentage of nitrogen atoms in the stripping layer is 9°/. ～60%, Me atomic percentage is greater than 〇 and less than 3%, and the percentage of crane atoms is 39% to 90%. In another embodiment of the present invention, when the intermediate layer is a bismuth-chain-chromium alloy, the percentage of germanium atoms therein is 9% to 9% by weight, the percentage of germanium atoms is 9% to 90%, and the percentage of chromium atoms Greater than 〇 and less than 5〇0/〇. 8 P51950162TW 22515twf.doc/n The invention forms a film-removing layer between the substrate of the mold core and the protective film or between the substrate and the intermediate layer, thereby not only increasing the adhesion between the substrate of the mold and the protective film layer, but also After the protective film layer is damaged, the film can be removed in a convenient and rapid manner without damaging the mold base material, so that the cost of the mold core can be greatly reduced. The above described features and advantages of the present invention will become more apparent from the following description. [Embodiment] FIG. 1 is a schematic cross-sectional view showing a mold core used for molding a glass according to a first embodiment of the present invention. Referring to Fig. 1, the mold core of the molded glass lens is a combination structure including at least a substrate 10, a protective film layer 12 and a film removing layer 14. The mold core of Fig. i is produced by, for example, grinding and polishing the surface of the substrate 10, wherein the material of the substrate 10 is tungsten carbide (WC) 'J05 is its material code. Then, the mold removes the film-removed layer 14 on the substrate 10 by vacuum sputtering, and the material thereof includes tungsten nitride (-) or W_Me-N compound, which is exemplified by tungsten nitride in this embodiment. Me added in the above W-Me-N compound includes at least one element ' and Me means a transition metal (transiti〇n metai), wherein the percentage of nitrogen atoms in the de-filming layer 14 is about 9% to 60%, Me atomic percentage It is larger than 〇 and is less than about 30% 'and the percentage of tungsten atoms is about 39% to 90%. Further, the thickness of the stripping layer 14 is approximately between 〇3μιη and 3μιη, and in the present embodiment, it is 1·5μπι as an example. 1335906 P51950162TW 22515twf.doc/n Please continue to refer to FIG. 1, after which the protective film layer I2 of the mineral layer on the stripping layer 14 is selected from the group consisting of silver (Ir), yttrium (Re), Ming (Pt), and Pd), recorded (Rh) alloys of two or more materials of 'hungry (〇s), 钌 (RU), tungsten (W) and button (Ta), and in this embodiment is 铱铢The alloy (IrRe) is exemplified, wherein the percentage of germanium atoms is about 10% to 90%; the percentage of chain atoms is about 10% to 90%. Further, the thickness of the protective film layer 12 is approximately between 0.1 nm and 3 μm, and in the present embodiment, 〇.3μηι is exemplified. In the above protective film sound
12上具有模造面，以此模造面所形成的模造凹槽可作為模 造玻璃之用。 ' 圖2則是第一實施例的模仁經高溫壓模後所得的高溫 壓模時數與模造後玻璃鏡面表面粗糙度之曲線圖。⑴ 皿 5月參照圖2，當向溫壓模的條件是在控制氮氣的氣氛 下，以L-BSL7玻璃，壓模溫度為58(rc時，由圖2結果顯 示’此模仁結構之壓模時間在45〇小時(hr)内，玻璃表面 粗糙度皆小於l〇nm，因此符合模造玻璃表面粗糙度規格要The mold has a molded surface, and the molded groove formed by the molded surface can be used as a mold glass. Fig. 2 is a graph showing the high temperature stamping time obtained by the high temperature stamping of the mold core of the first embodiment and the surface roughness of the mirror surface after molding. (1) The dish is referred to Figure 2 in May. When the condition of the temperature-pressing mold is under the atmosphere of controlling nitrogen, with L-BSL7 glass, the mold temperature is 58 (rc, the result of Figure 2 shows the pressure of the mold structure) The mold time is within 45 hrs (hr), the surface roughness of the glass is less than l〇nm, so it meets the surface roughness specification of the molded glass.
求。以每次壓模時間80秒計算，模造次數可高達2〇〇〇〇 次。 >經多次高溫壓模後，模仁上貴金屬保護膜層12產 損壞或沾黏玻璃時，可利用本發明之兩段式⑽手段進 去膜，如圖3所示。 圖3是第一實施例的模仁的去膜步驟圖。 請參照圖3，在步驟3〇〇 +，提供一個如上述第一 施例的模造玻璃之模仁。_，進行步驟31() 鮮去除保賴層u;舉例來說，可㈣2 45GHz的電 10 P51950162TW 22515twf.doc/n 迴旋共振功率的Kaufman形式離子源，通入氬氣產生電毁 轟擊模仁’去除銥銖合金之保護膜層。待裸露出氮化鎢之 去膜層14後，再進行步驟320，以一種去膜溶液反應蝕刻 將其移除。上述去膜溶液的成份例如是濃度10%〜40%的氫 氧化鉀溶液或者濃度10%〜30%的氫氧化鈉與濃度 1°/〇〜10%的鐵氰化鉀（K3[Fe(CN)6])或亞鐵氰化鉀 (K：4[Fe(CN)6])。在此一實施例中是以濃度12〇/。的氫氧化鉀 溶液與濃度2.4%的鐵氰化鉀（或亞鐵氰化鉀）為例。 表一是未鑛膜模仁底材和去膜後之表面粗糖度比較之 結果。由表一結果顯示，本發明所提出之去膜方法完全不 損傷模仁表面，表面粗糙度仍符合規格。 樣 品 模仁結構begging. The number of moldings can be as high as 2 以 times with 80 seconds of each molding time. > After a plurality of high temperature stamping, when the noble metal protective film layer 12 on the mold core is damaged or adhered to the glass, the film can be removed by the two-stage (10) method of the present invention, as shown in FIG. Fig. 3 is a view showing the step of removing the mold of the mold of the first embodiment. Referring to Fig. 3, in step 3 〇〇 +, a mold core of molded glass as in the first embodiment described above is provided. _, proceed to step 31 () fresh removal of the layer u; for example, (4) 2 45 GHz electricity 10 P51950162TW 22515twf.doc / n cyclone resonance power of the Kaufman form ion source, argon gas to generate electric destruction bombardment The protective film layer of the niobium alloy is removed. After the tungsten nitride stripping layer 14 is exposed, step 320 is performed and removed by a stripping solution reactive etching. The composition of the above-mentioned membrane removal solution is, for example, a potassium hydroxide solution having a concentration of 10% to 40% or a sodium hydroxide having a concentration of 10% to 30% and a potassium ferricyanide having a concentration of 1°/〇 10% (K3[Fe(CN) ) 6]) or potassium ferrocyanide (K: 4 [Fe (CN) 6]). In this embodiment, the concentration is 12 〇 /. For example, a potassium hydroxide solution and a concentration of 2.4% potassium ferricyanide (or potassium ferrocyanide). Table 1 shows the results of comparison of the surface roughness of the uncoated film matrix substrate and the film removal. From the results of Table 1, it is shown that the film removal method proposed by the present invention does not damage the surface of the mold core at all, and the surface roughness still conforms to the specifications. Sample mold structure
IrRe/WN/WC 2 TrRe/WN/WC 未鑛膜模仁表面 粗糖度(Ra，nm) 3.6 *3^9 去膜後模仁表面 粗縫度(Ra，nm) _ 3.8 3^9 第二實施例 圖4是依照本發明之第二貫施例的一種應用於模造玻 璃之模仁的剖面示意圖。 請參照圖4，此模造玻璃鏡片之模仁是至少包括底材 1〇、保護膜層12、去膜層Η和中間層16之組合結構。而 且第二實施例的模仁t之各層的形成方式可參照第一實施 例所述。至於第一實施例中沒有的中間層16，則是被鍍製 在去膜層14上，其中中間層16的材料包括鉻、銥銶_絡 1335906 P51950162TW 22515twf.doc/n 合金或鉻加銥-銖-鉻合金，而在本實施例中是以鉻(Cr)為 例。此外，當上述中間層16為銀_銖_鉻合金時，其中的銥 原子百分比為9%〜90%、銖原子百分比為9%〜9〇%，以及 鉻原子百分比大於〇且小於5〇%。而中間層16的厚度約 在〇.〇5μπι〜1μΐη之間，在本實施例中是以〇1μιη為例。 ^經多次高溫壓模後，第二實施例之模仁上的貴金屬保 遵膜層Π產生損壞或轉玻璃時，需以本發明之兩段式姓 亥J手段進行去膜，如圖5的步驟圖所示，先進行步驟5丨〇， 使用離子絲去除賴膜層12和巾間層16，再進行步驟 520，以去膜溶液反應蝕刻移除上述去膜層14，其中去膜 溶液的成份可以是濃度10%〜4〇%的氫氧化鉀溶液；或者濃 度，〜30%的氫氧化納與濃度1%〜1〇%的鐵氛化卸或亞 鐵鼠化_。至於詳細去膜制可參照第-實關的描述。 第三實施例 發γϊ第三實施例是採用和第二實施例的模仁相似 鋏”欲，f異在於中間層16是先形成鉻⑼層，再 $成銀·銶鉻合金層，兩層厚度皆為〇._。 a金糾制複合辆仁，在雜與責金屬 口金保4麟之間設置—層去 護膜層損壞後，可採用分段㈣如=貝金屬口金保 子:Α墼方&㈣技巧，先使用物理性的離 》矛'保濩膜層或保護臈層加中間層，再以化庳 情況下去除槿來’可在完全不損傷模仁的 '上的各膜層，以使模仁能被重複再利用， 12 1335906 P51950162TW 22515twf.d〇c/n 進而減少模仁的耗材成本。 雖然本發明已以較佳實施例揭露如上，然其 士双_____ 外用 限定本發明，任何所屬技術領域中具有通常知識 脫離本發明之精神和範#可作些許之絲 不 因此本發明之保魏圍當視後附之巾請專利範圍所界 為準 定者 【圖式簡單說明】 璃之第一實施例的-種應用於模造玻 溫壓之實施_模仁經高溫壓模後所得的高 、.一模造後玻璃鏡面表面粗糙度之曲線圖。 圖3是第—實施例的模仁的麵步驟圖。 壤之I:::,第二實施例的-種應用於模造破 圖5是第二實施例的模仁的去膜步驟圖。 【主要元件符號說明】 10 底材 12 保護膜層 14 去膜層 16 中間層 300〜320、500〜520 :步驟 13IrRe/WN/WC 2 TrRe/WN/WC Uncoated film surface roughness (Ra, nm) 3.6 *3^9 After the film is removed, the surface roughness (Ra, nm) _ 3.8 3^9 Embodiment FIG. 4 is a schematic cross-sectional view showing a mold core applied to a molded glass according to a second embodiment of the present invention. Referring to Fig. 4, the mold core of the molded glass lens is a combination structure including at least a substrate 1 , a protective film layer 12, a release layer and an intermediate layer 16. Further, the formation of the layers of the mold core t of the second embodiment can be referred to the first embodiment. As for the intermediate layer 16 which is not in the first embodiment, it is plated on the stripping layer 14, wherein the material of the intermediate layer 16 comprises chromium, 铱銶_络 1335906 P51950162TW 22515twf.doc/n alloy or chrome-twisted- It is a bismuth-chromium alloy, and in the present embodiment, chromium (Cr) is exemplified. In addition, when the intermediate layer 16 is a silver-cerium-chromium alloy, the percentage of germanium atoms is 9% to 90%, the percentage of germanium atoms is 9% to 9%, and the percentage of chromium atoms is greater than 〇 and less than 5%. . The thickness of the intermediate layer 16 is between about μ5μπι and 1μΐη, which is exemplified by 〇1μηη in this embodiment. ^ After repeated high-temperature compression molding, when the precious metal on the mold core of the second embodiment is damaged or transferred to the glass, the two-stage type of the method of the present invention is required to remove the film, as shown in FIG. 5. In the step diagram, step 5 is performed first, and the membrane layer 12 and the inter-sheet layer 16 are removed by using an ion filament, and then step 520 is performed to remove the above-mentioned stripping layer 14 by a stripping solution reaction etching, wherein the stripping solution is removed. The composition may be a concentration of 10% to 4% by weight of a potassium hydroxide solution; or a concentration of ~30% sodium hydroxide with a concentration of 1% to 1% of iron or ferrous iron. As for the detailed film removal system, refer to the description of the first-real. The third embodiment is the same as the third embodiment. The third embodiment is similar to the mold of the second embodiment. The difference is that the intermediate layer 16 is formed of a chromium (9) layer, and then a silver/germanium chromium alloy layer, two layers. The thickness is 〇._. A gold rectification compound car, set between the miscellaneous and responsible metal mouth Jinbao 4 Lin - layer to remove the film layer damage, can be used segmentation (four) such as = shell metal mouth Jin Baozi: Α墼Fang & (4) skills, first use the physical separation of the "spear" to protect the film layer or protect the layer of the layer plus the middle layer, and then remove the film in the case of pupation, 'can not damage the mold' Layer, so that the mold can be reused repeatedly, 12 1335906 P51950162TW 22515twf.d〇c / n and thus reduce the cost of consumables of the mold. Although the invention has been disclosed in the preferred embodiment as above, but the double _____ external use limit The present invention has any general knowledge in the art and can be deviated from the spirit and scope of the present invention. Therefore, the invention is not limited by the patent scope of the invention. Description] The first embodiment of the glass is applied to the molded glass temperature The graph of the surface roughness of the mirror surface of the high-molded glass after the high-temperature stamping of the mold is shown in Fig. 3. Fig. 3 is a surface step diagram of the mold core of the first embodiment. I:::, second of the soil Figure 5 is a view of the film removal step of the mold of the second embodiment. [Description of main components] 10 substrate 12 protective film layer 14 film removal layer 16 intermediate layers 300 to 320, 500 ~520: Step 13