200821270 P51950131TW 22000twf.doc/t 九、發明說明： 【發明所屬之技術領域】 本毛明疋有關於—種(press_moldi i 1=)關於—種模造麵模仁㈣的去膜方法㈣卯4 【先前技術】 近年來數位域等光學產品的 成，品質的要求也逐漸提高，300萬以上書：是;:： 需f，而預計手機相機對晝素的要求也將 ;必;=:的光侧無法達到這樣的成像at 壤 、、 、兄片。由於适些產品的發展趨勢走向輕 ’，丑…'〜、減少鏡片數量使用非球面的玻璃鏡片。 而以模造的方式生產非球面玻璃鏡 來必然發展的趨勢。在模迻玻 =見在及未 仕衩1^玻璃技術中，模仁壽命的長短 Μ係者-對杈仁可壓鑄的鏡片數目多寡，模造玻 成本是否能降低的關鍵就在於此。其中 七备八 主要的方法狀在壯底材表 误1〒 覆的表面改皙枯分-ι 硬_ardC(?atmg^ = : = =且，最近以氮化鎢⑽)為主的保護 :ΐ材的模造面上披覆硬膜的條件：⑴ :性、(3)足夠的硬度及機械強度和(物 性溶：去:前f，:對以氮化鵠為主的保護層使用驗 “夜作去無°如此一來’將因為這層氮化鎢系列硬膜必 5 200821270 P51950131TW 22000twf.doc/t 清除’而影響這種破璃模造模仁的應用。 統的供—麵造麵扯的切方法，以免除傳 本發明另提供-種模造破璃模仁的 模造玻璃鏡片的製作成本。 降低200821270 P51950131TW 22000twf.doc/t IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to the method of removing the film (press_moldi i 1=) about the mold-forming mold core (4) (4) 卯 4 Technology] In recent years, the production of optical products such as digital fields has gradually improved, and the requirements for quality have gradually increased. More than 3 million books: Yes;:: Need f, and the demand for mobile phones for mobile phones is expected to be; It is impossible to achieve such imaging at the soil, , and brother films. Since the development trend of suitable products is going to lighter, ugly...'~, reduce the number of lenses using aspherical glass lenses. The inevitable development of the production of aspherical glass mirrors by means of molding. In the mold shift glass = see the length and length of the mold, the length of life of the mold is the key to the number of lenses that can be die-casted, and the key to the cost of mold glass can be reduced. Among them, the main method of the seven preparations is in the case of a strong substrate. The surface of the sturdy substrate is changed to dry - _ hard _ardC (?atmg^ = : = = and, recently, tungsten nitride (10)): Conditions for coating the hard film on the molded surface of the coffin: (1): Sex, (3) Sufficient hardness and mechanical strength and (physical solubility: go: before f,: use of a protective layer based on tantalum nitride) Night work to go without such a 'will be because this layer of tungsten nitride series hard film must be 5 200821270 P51950131TW 22000twf.doc / t clear 'and affect the application of this broken glass mold. The cutting method is omitted to avoid the production cost of the molded glass lens of the mold-making method.
2解決上述問題’本發明提出—種模造玻璃模仁的去 膜方法，包減供-麵錄_由—個碳化絲材及— 層保護膜層構成賴造玻魏仁巾的上述賴膜層，以去 除這層保護膜層。這層保護膜層的材料為氮θ化鶴或 W-Me-N化合物，其中添加的Me包括至少一種元素，且 Me包括鋁或過渡金屬。而上述鹼性溶液包括體積百分比濃 度為10%〜40%的氫氧化物溶液以及體積百分比濃度為 1%〜10%的鐵氰化鉀（K3[Fe(CN)6])或亞鐵氰^鉀 (K4[Fe(CN)6])溶液。 在本發明之一實施例中，上述氫氧化物溶液包括氳氧 化鉀溶液或氫氧化鈉溶液。 在本發明之一實施例中，上述氫氧化物溶液的體積百 分比濃度為10%〜20%。 在本發明之一實施例中，上述鐵氰化鉀或亞鐵氰化鉀 溶液的體積百分比濃度為1%〜5%。 在本發明之一實施例中’上述模造玻璃模仁中的保護 膜層的厚度在〇·3μιη〜3μηι之間。 在本發明之一實施例中，當模造玻璃模仁中的保護膜 6 200821270 P51950131TW 22000twf.d〇c/t ==分=:氮原子百㈣ '‘“ 。°，MeS子百分比大於0且小於30% . .鎢原子百分比為39%〜7G%。 供一另提出一麵造破璃模仁的去膜方法，包括提 =31，層之間的一層中間層所構成的模造 、 呆濩膜層與中間層，以去除這層保護膜 二_ 4雜_層的材料包括氮化鎢或;^ m:層的材料包括w_Me_N化合物、鎢、鉻或 二' 保護膜層與中間層的材料中添加的Me ^丨=—種7^素，且Me是馳或過渡金屬。而 二性冷液則G括.體積百分比濃度為1G%〜4()%的氳氧化钟 浴液或體積百分比漠产】〇0/ qn()/ h ^ 、 〇 H =度°〜30%風氧化納；以及體積百分 ,tb浪度為1/0〜10/。的鐵氰化鉀或亞鐵氛化鉀溶液混合而 . 成。 百八=!之另一實施例中，上述氫氧化鉀溶液的體積 百分比濃度為10%〜20%。 石八Γ之另—貫施例中，上述氫氧化納溶液的體積 百分比浪度為10%〜15%。 在本發明之另一實施例中，上述鐵氰化鉀或亞鐵氰化 鉀溶液的體積百分比濃度為1%〜5%。 ^賴祕 7 200821270 P51950131TW 22000twf.doc/t ^在本發明之另一實施例中，上述模造玻璃模仁中的保 護膜層與中間層的總厚度在0·3μηι〜3μιη之間。 ★在本發明之另一實施例中，當模造玻璃模仁中的保護 膜層的材料為氮化鎢，則保護膜層中的氮原子百分比為 2〇%〜60°/g以及鎢原子百分比為40%〜80%。 ^ 在本發明之另一實施例中，當模造玻璃模仁中的中間 . 層的材料為W_Me-N化合物，則中間層中的氮原子百分比 Ο 為2〇%〜6〇%;尬原子百分比大於0且小於30%;以及鎢 原子百分比為39%〜70%。 ^在本發明之另一實施例中，當模造玻璃模仁中的保罐 膜層的材料為化合物，則保護膜層中的氮原子^ 分比為20〇/〇〜60〇/〇 ; Me原子百分比大於〇且小於3〇% ;以 及鎢原子百分比為39%〜70%。 本發明因針對以氮化鎢為主的保護層及中間層採 屛白=性溶液，以達到完全清除玻璃模造模仁底材表面膜 C; = ^果’且模仁鏡面表面仍可維持祕度在IGnm以下 ' 姑先予品質。因此模仁不需要重新加工，即可重覆使用。 Ϊ得在模造玻璃鏡片的量產製作上，減少模仁的使用數 里，而降低模造玻璃鏡片的製作成本。 為讓本發明之上述特徵和優點能 ，實施例，並配合所附圖式，作詳細說二:文特 【貫施方式】 第一實施例 圖1為依照本發明ϋ施綱祕溶液所針對的 8 200821270 刪_TW 22000twf.d〇c/t 模造玻璃模仁的剖面示意圖。 玻璃^ ’這個實施例中所要進行去膜處理的模造 ί ^構^魏鶴(WC)底材1G與底材1G頂面的保護膜 成之紐合結構。其中，保護膜層12的材料可為 ==_)或者一種w_Me_N化合物，其中添加的咖包 、^凡素，且Me是指銘或過渡金屬（transition me a )，過渡金屬例如鉻(Cr)、鈦(Ti)、錯㈣、釩⑺、铲 Ο2 Solving the above problems' The present invention proposes a method for removing a film-molding mold, a package-reducing-reporting--a carbonized wire and a protective film layer to form the above-mentioned film layer of the glass-making fabric To remove this protective film layer. The material of this protective film layer is a nitrogen θ-grown crane or a W-Me-N compound in which the added Me includes at least one element, and Me includes aluminum or a transition metal. The above alkaline solution includes a hydroxide solution having a volume percentage concentration of 10% to 40% and potassium ferricyanide (K3[Fe(CN)6]) or ferrocyanide at a concentration of 1% to 10% by volume. Potassium (K4[Fe(CN)6)) solution. In an embodiment of the invention, the hydroxide solution comprises a potassium hydride solution or a sodium hydroxide solution. In one embodiment of the invention, the hydroxide solution has a volume percent concentration of from 10% to 20%. In one embodiment of the invention, the above potassium ferricyanide or potassium ferrocyanide solution has a volume percentage concentration of from 1% to 5%. In one embodiment of the present invention, the thickness of the protective film layer in the above-mentioned molded glass mold is between 〇3 μm and 3 μm. In an embodiment of the present invention, when the protective film 6 in the molded glass mold core is 200821270 P51950131TW 22000 twf.d〇c/t == minutes =: nitrogen atom hundred (four) ''". °, the MeS sub-percent is greater than 0 and less than 30%. The percentage of tungsten atoms is 39%~7G%. A method for removing the glass mold kernel is provided, including a mold layer formed by an intermediate layer between layers, and a film is deposited. The layer and the intermediate layer are used to remove the protective film of the second layer of the material including tungsten nitride or the material of the layer: m_Me_N compound, tungsten, chromium or two 'protective film layer and the middle layer of the material Added Me ^ 丨 = - 7 素, and Me is a chiral or transition metal. And the amphoteric chiller is G. The volume percentage concentration is 1G% ~ 4 ()% of the yttrium oxide bell bath or volume percent desert Production] 〇0 / qn () / h ^, 〇 H = degree ° ~ 30% wind oxide nano; and volume percent, tb wave is 1 / 0 ~ 10 /. potassium ferricyanide or ferrous solution The potassium solution is mixed and formed. In another embodiment, the volume percentage concentration of the above potassium hydroxide solution is 10% to 20%. In the other embodiment of the stone gossip, the above sodium hydroxide solution The volume percentage of the liquid is from 10% to 15%. In another embodiment of the present invention, the volume concentration of the potassium ferricyanide or potassium ferrocyanide solution is from 1% to 5%. 200821270 P51950131TW 22000twf.doc/t ^ In another embodiment of the present invention, the total thickness of the protective film layer and the intermediate layer in the molded glass mold is between 0·3μηι and 3μιη. In the embodiment, when the material of the protective film layer in the molded glass mold is tungsten nitride, the percentage of nitrogen atoms in the protective film layer is 2% to 60°/g and the percentage of tungsten atoms is 40% to 80%. In another embodiment of the present invention, when the material of the intermediate layer in the molded glass mold is W_Me-N compound, the percentage of nitrogen atoms in the intermediate layer is 2% to 6〇%; More than 0 and less than 30%; and the percentage of tungsten atoms is 39% to 70%. ^ In another embodiment of the present invention, when the material of the canned film layer in the molded glass mold is a compound, the protective film layer The nitrogen atom ratio is 20〇/〇~60〇/〇; the Me atomic percentage is greater than 〇 and less than 3〇%; And the percentage of tungsten atoms is 39%~70%. The invention is directed to the protective layer of tungsten nitride as the main layer and the white layer of the intermediate layer, so as to completely remove the surface film C of the glass mold base; The result is that the surface of the mirror surface can still maintain the secretness below IGnm. Therefore, the mold can be reused without reprocessing. ΪIn the mass production of molded glass lens, the mold is reduced. The use of a few, while reducing the cost of manufacturing molded glass lenses. In order to make the above-mentioned features and advantages of the present invention, the embodiments, and the accompanying drawings, the detailed description of the second embodiment: the first embodiment, FIG. 1 is directed to the solution according to the present invention. 8 200821270 Delete _TW 22000twf.d〇c/t Schematic diagram of the mold glass mold. The glass ^' is subjected to a film-removing process in which the film is removed, and the WC substrate 1G and the protective film of the top surface of the substrate 1G are joined together. The material of the protective film layer 12 may be ==_) or a compound of w_Me_N, wherein the coffee bag is added, and the Me is a transition or a transition metal such as chromium (Cr). , titanium (Ti), wrong (four), vanadium (7), shovel
(Nb)…等。其中當保護膜層12的材料為氮化鎢時，則)发中匕 的亂原子百纽約為2〇%〜6()%以及_子 ㈣ 概〜嶋；另一方面，當保護膜層12的材料為w_Mj 化合物，則其中的氮原子百分比約為20%〜60%、Me原子 百分比大於〇且小於30%，而鎢原子百分比約為39%〜7〇%。 而圖1中的模造玻璃模仁之製作方法是先將碳化鎢底 材10的表面研磨拋光，接著以離子餘輔助濺鍍法形成保護 膜層12，其厚度可在〇·3μπ!〜3μιη之間，而在第一實施例 中則以1·5μηι為例。其中保護膜層12上具有模造面，以 此模造面形成模造凹槽，以作為模造玻璃之用。 圖2則是依照本發明之第一實施例的模造玻璃模仁的 去膜步驟圖。 第一實施例的鹼性溶液是一種混合溶液，其中包括體 積百分比濃度為10%〜40%的氫氧化物溶液及體積百分比 濃度為1 %〜10%的鐵氰化鉀％[Fe(CN)6])或亞鐵氰化卸 (K4[Fe(CN)6])溶液。前述氫氧化物溶液例如氫氧化鉀溶液 或氫氧化鈉溶液。而且，氫氧化物溶液的體積百分比濃度 9 200821270 P51950131TW 22000twf.d〇c/t 車ϋ10/〇20/〇、鐵氰化鉀或亞鐵氰化鉀溶液的體積百分 比濃度較佳為1%〜5%。 :以氮化纟|為保護膜層的材料之玻璃模造模仁，且高 酿:L板的^件疋在控制氮氣的氣氛下，以L_BSL7為測試 玻离K皿度為58〇。〇經4〇小時(亦即模擬已使用過牝 • 怖的玻璃模造模仁)後，把玻璃模造模仁浸泡在第一實施 • 2之n#液中。結果顯示於表-，玻璃模造模仁浸泡驗 Γ生溶液後保護膜層12剝落，而量測到的玻璃模造模 粗糙度皆小於l〇llm。 表·玻璃板造模仁浸泡鹼性溶液前後之表面粗链度比 較(Nb)...etc. Wherein, when the material of the protective film layer 12 is tungsten nitride, then the disordered atom of the germanium is about 2% to 6 (%) and the _ (four) is about 嶋; on the other hand, when the protective film layer 12 The material is a w_Mj compound, wherein the nitrogen atom percentage is about 20% to 60%, the Me atomic percentage is greater than 〇 and less than 30%, and the tungsten atomic percentage is about 39% to 7〇%. The mold glass mold core of FIG. 1 is prepared by first grinding and polishing the surface of the tungsten carbide substrate 10, and then forming the protective film layer 12 by ion-assisted sputtering, and the thickness thereof can be between 〇·3μπ!~3μιη. In the first embodiment, 1·5 μηι is taken as an example. The protective film layer 12 has a molding surface, and the molding surface is used to form a molding groove for use as a mold glass. Fig. 2 is a view showing a step of removing a film of a molded glass mold according to a first embodiment of the present invention. The alkaline solution of the first embodiment is a mixed solution comprising a hydroxide solution having a volume percentage concentration of 10% to 40% and a potassium ferricyanide% [Fe(CN) having a volume percentage concentration of 1% to 10%). 6]) or ferrocyanide unloading (K4[Fe(CN)6]) solution. The aforementioned hydroxide solution is, for example, a potassium hydroxide solution or a sodium hydroxide solution. Moreover, the volume percentage concentration of the hydroxide solution is 9200821270 P51950131TW 22000twf.d〇c/t The volume percentage concentration of the ruthenium 10/〇20/〇, potassium ferricyanide or potassium ferrocyanide solution is preferably 1%~5. %. : The glass mold is made of tantalum nitride|the material of the protective film layer, and the high-strength: L-plate is controlled under a nitrogen atmosphere, and L_BSL7 is used as a test. After 4 hours of simmering (that is, simulating the glass molds that have been used), the glass mold dies are immersed in the first embodiment. The results are shown in Table - After the glass mold was immersed in the test solution, the protective film layer 12 was peeled off, and the measured glass mold roughness was less than l〇llm. Table·Compared with the surface thick chain of the glass plate before and after soaking the alkaline solution
模造玻璃 ~wwwc 浸泡前表面粗 糙度(nm) 3.5 4.9 浸泡後表面粗 —糙度(nm)ίό ^ 第二實施例 ϋ 4圖3為依照本發明之第二實施例的驗性溶液所針 模造玻璃模仁的剖面示意圖。 請參照圖3，這個實施例中所要進行去膜處理的模造 破璃模仁除了第-實施射的碳化鎢底材1G與保護膜層 12外，還有一層位在碳化鎢底材1〇與保護膜層^之門曰的 中^層14,其可增加保護膜層12與石炭化鎢底材1〇之^的 附著性，並可避免碳化鎢底材W成分4里易擴散的物質擴散 到表面影響模造玻璃的品質。前述中間層]4的材料可為 鵝、鉻(Cr)或氮化鋁鉻(Cr-A】-N)或一種w_Me_N化合物’、、'， 200821270 P51950131TW 22000twf.doc/t 其中添加的Me包括至少一種元素，且Me是指銘或過渡 金屬，例如鉻(Cr)、鈦(Ti)、鍅(Zr)、釩(V)、鈮(Nb)…等。 而且，當中間層14的材料是w_Me-N化合物時，其中的 氮原子百分比約為20%〜60%、Me原子百分比大於〇且約 小於30%以及鎢原子百分比約為39%〜7〇%。保護膜層12 的材料範圍則與第一實施例相同。 fMolded glass ~wwwc Surface roughness (nm) before immersion 3.5 4.9 Surface roughness after immersion - Roughness (nm) ό ^ Second embodiment ϋ 4 Fig. 3 is a needle molding of an experimental solution according to a second embodiment of the present invention Schematic diagram of the cross section of the glass mold. Referring to FIG. 3, in addition to the first-implemented tungsten carbide substrate 1G and the protective film layer 12, the molded glass mold core to be subjected to the film removal treatment in this embodiment has a layer of tungsten carbide substrate 1 and The middle layer 14 of the protective film layer can increase the adhesion of the protective film layer 12 and the carbonized tungsten substrate, and can prevent the diffusion of the easily diffused substance in the W component of the tungsten carbide substrate The surface affects the quality of the molded glass. The material of the foregoing intermediate layer 4 may be goose, chromium (Cr) or aluminum nitride chromium (Cr-A]-N) or a w_Me_N compound ',, ', 200821270 P51950131TW 22000twf.doc/t wherein the added Me includes at least An element, and Me means a metal or a transition metal such as chromium (Cr), titanium (Ti), lanthanum (Zr), vanadium (V), niobium (Nb), and the like. Moreover, when the material of the intermediate layer 14 is a w_Me-N compound, the nitrogen atom percentage thereof is about 20% to 60%, the Me atomic percentage is larger than 〇 and about 30%, and the tungsten atom percentage is about 39% to 7〇%. . The material range of the protective film layer 12 is the same as that of the first embodiment. f
而圖2中的模造玻璃模仁之製作方法是先將碳化鎢底 材10的表面研磨拋光，再以離子鎗輔助濺鍍法形成中間層 層14 ’其厚度比保護膜層12薄，約為〇1μιη。最後再以 離子鎗辅助濺鍍法形成保護膜層12。在第二實施例中的保 護膜層12與中間層μ的總厚度約在〇·3μηι〜3μιη之間， 而保護膜層12本身的厚度約為15μιη。 圖4為依照本發明之第二實施例的模造玻璃模仁的去 膜步驟圖。 第二實施例的驗性溶液是一種混合溶液，其中包括體 =分比濃度為10%〜概的氫氧化鉀溶液紐積百分比 j 〜30%氫氧化鈉；以及體積百分比濃度為1%〜1〇% t鐵亂化鉀或亞鐵·鉀溶液。其巾 積百分比濃度較佳為1〇%〜2G%、^ L祕心狀_ m〇/ 虱虱化鈉溶液的體積百分 液的體積百姐濃度難為1%〜5yf化鉀或賴祕钾溶 、、當高溫壓模的條件是在控制氮氣 為測試玻璃，測試溫度為58(rc铖 、刀 仁浸泡在第二實施例之祕溶;=[模造f离模 备敬體積百分比濃度為 11 200821270 P51950131TW 22000twf.doc/t 10%〜20%的氫氧化鉀溶液及體積百分比濃度為1%—5%的 鐵氰化鉀或亞鐵氰化鉀溶液所得的混合溶液）中。結果顯示 於表二中，模造玻璃模仁浸泡鹼性溶液後保護膜層剝落， 量測模造玻璃模仁表面粗糙度皆小於1〇nm。 表二：模造玻璃模仁浸泡鹼性溶液後之表面粗糙度 樣品 椒造玻璃模仁材質 表面粗糙度 (保護膜層/中間層/底材） (nm) 3 __ W-A1-N/WN/WC 6.1 4 — WN/W/WC 7.7 ___^ WN/W-Cr^N/WT —:----1 5.9 a 第三實施例 o 這個實施例中所要進行去膜處理的模造玻璃模仁如圖 2所示，其中以氮化鉻鎢(w_Cr_N)為保護膜層12的材料、 鉻為中間層14的材料。並且使用第二實施例的驗性洛液與 去膜方法，其中唯一不同的是用體積百 10%〜、抓的氫氧化鈉溶液取代氫氧化卸溶液。^ 、當高溫壓模的條件是在控制氮氣的氣氛下，以sL7 為測試玻璃，測試溫度為580t^i 4〇小時後，模造破璃模 仁浸泡在前述鹼性溶液中，其結果顯示於表三，模造玻璃 模仁浸泡驗性溶液後保護膜層剝、落，量測模造玻璃模仁表 面粗縫度皆小於1 〇nm。 12 200821270 P51950131TW 22000twf.doc/t 璃模仁金性溶液後之表面粗糙度 樣品 模造玻璃模仁材質 (保護膜層/中間層/底材） 表面粗糙度(nm) 6 L—W-Cr-N/Cr/WC 6.0 7 〇 _W-Cr-N/Cr/WC 5.6 8 ___W-Cr-N/Cr/WC 5.5 紅上所述，本發明針對以氮化鎢為主的保護層及中間 層提出新的鹼性溶液，以達到完全清除玻璃模造模仁底材 表面膜層的效果，使模仁鏡面表面仍可維持粗糙度在l〇nm 以下的光學品質。因此上述玻璃模造模仁將不需要重新加 工，即可重覆使用，進而降低模造玻璃鏡片的製作成本。 雖然本發明已以較佳實施例揭露如上，然其並非用以 限定本發明，任何所屬技術領域中具有通常知識者，在不 脫離本發明之精神和範圍内，#可作些許之更動與潤飾， 因此本發明之保護範圍當視後附之申請專利範圍所界定者 為準。 圖式簡單說明The mold glass mold core of FIG. 2 is produced by first grinding and polishing the surface of the tungsten carbide substrate 10, and then forming an intermediate layer 14' by an ion gun assisted sputtering method. The thickness thereof is thinner than the protective film layer 12, which is about 〇. 1μιη. Finally, the protective film layer 12 is formed by ion gun assisted sputtering. The total thickness of the protective film layer 12 and the intermediate layer μ in the second embodiment is between about 3 μm to 3 μm, and the thickness of the protective film layer 12 itself is about 15 μm. Fig. 4 is a view showing a step of removing a film of a molded glass mold according to a second embodiment of the present invention. The test solution of the second embodiment is a mixed solution, which includes a body = fractional concentration of 10% ~ a typical potassium hydroxide solution inventivity percentage j ~ 30% sodium hydroxide; and a volume percentage concentration of 1% ~ 1 〇% t iron chaotic potassium or ferrous iron solution. The percentage concentration of the towel product is preferably 1%%~2G%, ^L secret shape_m〇/ volume of the sodium bismuth solution, the volume of the liquid is difficult to be 1%~5yf potassium or Lai K Dissolved, when the condition of the high temperature die is controlled by nitrogen as the test glass, the test temperature is 58 (rc 铖, the knife immersed in the second embodiment of the secret solution; = [molding f off-die respect volume percentage concentration of 11 200821270 P51950131TW 22000twf.doc/t 10%~20% potassium hydroxide solution and a concentration solution of 1%-5% potassium ferricyanide or potassium ferrocyanide solution in a mixed solution). The results are shown in Table 2. After the alkaline glass solution was soaked in the mold glass mold, the protective film layer peeled off, and the surface roughness of the glass mold was measured to be less than 1 〇 nm. Table 2: Surface roughness of the molded glass mold core after soaking the alkaline solution. Surface roughness of the glass-made mold core material (protective film layer/intermediate layer/substrate) (nm) 3 __ W-A1-N/WN/ WC 6.1 4 — WN/W/WC 7.7 ___^ WN/W-Cr^N/WT —:----1 5.9 a Third embodiment o The molded glass mold which is to be subjected to the film removal treatment in this embodiment is as 2 shows a material in which chromium nitride tungsten (w_Cr_N) is used as the protective film layer 12 and chromium is used as the intermediate layer 14. Further, the anisotropic liquid and the film removing method of the second embodiment are used, the only difference being that the water-steaming solution is replaced by a sodium hydroxide solution having a volume of 10%. ^, When the condition of the high temperature die is under the atmosphere of controlling nitrogen, sL7 is used as the test glass, and after the test temperature is 580t^i 4 hrs, the molded glass mold is soaked in the alkaline solution, and the result is shown in In Table 3, after the immersion test solution of the mold glass mold, the protective film layer is peeled and dropped, and the surface roughness of the glass mold core is measured to be less than 1 〇 nm. 12 200821270 P51950131TW 22000twf.doc/t Surface roughness after glass mold gold solution Sample molding glass mold material (protective layer / intermediate layer / substrate) Surface roughness (nm) 6 L-W-Cr-N /Cr/WC 6.0 7 〇_W-Cr-N/Cr/WC 5.6 8 ___W-Cr-N/Cr/WC 5.5 Red, the present invention is directed to a protective layer and an intermediate layer mainly composed of tungsten nitride A new alkaline solution is used to completely remove the surface layer of the glass mold base, so that the mirror surface of the mold can maintain the optical quality of roughness below l〇nm. Therefore, the above glass mold cores can be reused without reworking, thereby reducing the manufacturing cost of the molded glass lens. Although the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims. Simple illustration
圖 為依照本發明之第一實施例的鹼性溶液所斜 模造玻璃模仁的剖面示意圖。 、τ才的 圖2為依照本發明之第一實施例的模造玻螭 膜步驟圖。 的去 圖3為依照本發明之第二實施例的鹼性溶液 模造玻璃模仁的剖面示意圖。 子的 图4為依本發明之第二實施例的模造玻 骐步驟圖。 味1一的去 【主要元件符銳說明】 13 200821270 P51950131TW 22000twf.doc/t io :底材 12 :保護膜層 14 :中間層 200 :提供一種模造玻璃模仁，這種模造玻璃模仁是由 一個碳化鎢底材及一層保護膜層構成的。保護膜層的材料 為鼠化4鳥或化合物。 Γ 210 :提供一種鹼性溶液到模造玻璃模仁的保護膜屑 以去除保護膜層。 、曰， =0 :提供一種模造玻璃模仁，這種模造玻璃模仁是由 一個碳化鎢底材、—層保護膜層及位於底材與保護臈ί之 間的層中間層所構成的。保護膜層的材 醫e-N化合物、中間層的材料包括w 或 鉻或氮化鋁鉻。 口物鶴、 膜層種驗性溶液到模造破璃模仁，《去除保護BRIEF DESCRIPTION OF THE DRAWINGS Fig. is a schematic cross-sectional view showing a glass mold core of an oblique solution of an alkaline solution according to a first embodiment of the present invention. Figure 2 is a step view of a molded glass film according to a first embodiment of the present invention. Figure 3 is a schematic cross-sectional view showing an alkaline solution molded glass mold core according to a second embodiment of the present invention. Fig. 4 is a view showing a step of molding a glass according to a second embodiment of the present invention. Taste 1 to [main components Fu Rui description] 13 200821270 P51950131TW 22000twf.doc/t io: Substrate 12: Protective film layer 14: Intermediate layer 200: Provide a molded glass mold, this molded glass mold is made of A tungsten carbide substrate and a protective film layer. The material of the protective film layer is murine 4 birds or compounds. Γ 210 : An alkaline solution is supplied to the protective film dust of the molded glass mold to remove the protective film layer.曰, =0: A molded glass mold core is provided which is composed of a tungsten carbide substrate, a protective film layer and an intermediate layer between the substrate and the protective layer. The material of the protective film layer e-N compound, the material of the intermediate layer includes w or chromium or aluminum nitride chromium. Mouth crane, membrane test solution to mold glass mold, "removal protection
C 14C 14