TWI326274B - Scribing apparatus and method, and multi-breaking system - Google Patents

Scribing apparatus and method, and multi-breaking system Download PDF

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Publication number
TWI326274B
TWI326274B TW95125018A TW95125018A TWI326274B TW I326274 B TWI326274 B TW I326274B TW 95125018 A TW95125018 A TW 95125018A TW 95125018 A TW95125018 A TW 95125018A TW I326274 B TWI326274 B TW I326274B
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Taiwan
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substrate
split
head
scribing
module
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TW95125018A
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Chinese (zh)
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TW200706506A (en
Inventor
Sang-Kyong Kim
Gang-Hee Lee
Sang-Tae Park
Byeong-Chang Park
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Sfa Engineering Corp
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Priority claimed from KR1020050065812A external-priority patent/KR100681828B1/en
Priority claimed from KR1020050065816A external-priority patent/KR100674017B1/en
Application filed by Sfa Engineering Corp filed Critical Sfa Engineering Corp
Publication of TW200706506A publication Critical patent/TW200706506A/en
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Publication of TWI326274B publication Critical patent/TWI326274B/en

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  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Description

1326274 21226pif.doc 九、發明說明: 【發明所屬之技術領域】1326274 21226pif.doc IX. Description of the invention: [Technical field to which the invention pertains]

本發明是有關於一種劃線設備和方法以及一種多分 裂系統,且更明確地說是有關於一種劃線設備和方法以及 種夕为裂糸統,其可在單個設備内同時執行在基底上形 成切劃線和沿著切劃線分裂基底,從而可縮短處理時間, 可減少工作空間,透過一次處理將基底分裂成多個單片, 並在基底上形成具有統一深度的切劃線。 【先前技術】 劃線設備用來切割或分裂基底。基底是指相對較大且 具有狀厚度的板’且其包含半導體、平板顯示器、平板 玻璃或壓克力板。明確地說’由於例如主要由玻璃形成的 液晶顯示器(LCD)、電漿顯示器面板(pDp)和有機發 光二極體(OLED)的基底需要精確姆卜所以使用以 劃線設備。The present invention relates to a scribing apparatus and method, and a multi-split system, and more particularly to a scribing apparatus and method, and a cleavage system that can be simultaneously performed on a substrate in a single device. The scribe line is formed and the substrate is split along the scribe line, thereby shortening the processing time, reducing the working space, splitting the substrate into a plurality of single sheets by one treatment, and forming a scribe line having a uniform depth on the substrate. [Prior Art] A scribing device is used to cut or split a substrate. The substrate refers to a relatively large and has a thickness of the plate' and it comprises a semiconductor, flat panel display, flat glass or acrylic sheet. Specifically, the use of a scribing apparatus is required because the substrate of, for example, a liquid crystal display (LCD), a plasma display panel (pDp), and an organic light-emitting diode (OLED) mainly formed of glass requires an accurate Mb.

為了切割基底,預先在基底表面上形成切劃線,且基 底^著切劃線分裂。也就是說,如圖丨所示,當由顯示出 較高硬度的材料(例如’鑽石)形成的切割器Μ動並按 壓基底G表面時,基底w社產生在厚度額上延伸的In order to cut the substrate, a scribe line is formed in advance on the surface of the substrate, and the substrate is split by a scribe line. That is, as shown in Fig. ,, when a cutter formed of a material exhibiting a higher hardness (e.g., 'diamond) is swayed and pressed against the surface of the substrate G, the substrate w is extended in thickness.

3裂if。在此狀態下,當切割器1沿著基底G表面移 2所示,基底G表面上形成連續的切割線S。 之後,透過沿著切劃線8施加力 可使基底G分裂。 參看圖3’將基底〇裝載於預定的工作台上(S10)。 7 21226pif.doc 動地完成或使_加的㈣機構自動完成。 的位置⑽)。接著,具有圖^^工^上的精確 器1的劃線頭移動到期望的位置,且設^宝'·。/的^割 (劃線頭設定步驟S3〇)。透過“===度 ==(:):,:在基底。上形=時: 基底G移動到對切· S執行分裂的位置,, 底G (S50)。在此步驟中,可進一 + 、土 位置的對準步驟。接著’執行沿著切“的 裂(S60)。 #叫線S對基底G的分 八在上述傳統技術中,形成切劃線S的步驟,和 切劃線S的基底G的步驟由單獨的設備執二 此外,由於透過適當設備進㈣移動、裝載和對準丁 的步驟重複,所以設備變得複雜,處理時 土 _ ,:物_加。尤其是當要將單個基广:分裂; =:由於需要重複圖3的上述步驟,所以無= 另外,由於是在基底G的—個表面固定到工作 3執:劃線,所以難以應對工作台或基底G本身:不; 坦性。因此’難⑽成具枝定深度的切劃線。 【發明内容】 為了解決上述和/或其他問題,本發明提供··_種气線 設備和料’討在單舰備㈣時騎在絲上形成切 21226pif.doc 劃線和沿著切舰分錄底,從而可縮短處 所述劃線⑽簡化所以可減少工作空間,透過= „成多個單片,並在所述基底上形成:J 的切劃線;和一種多分裂系統。 冰度 根據本發明的-方面,一種多分裂系統包括 其裝載有經受純底;乡齡》 乍°恭 定的切劃線來分裂所絲底;配置池,如^ 間隔配置所述分裂模組;和水平移純組,其二 模组在與所述分__崎方向交又的方向上移=配置 ϋ所述工作台t的所述基底的上表面和下表面 所述工作台包括:框,其形成外側;多個支八 其耗合到所述框,支撐所述基底,具有預定的桿形^ 彼此分離以便形成供分㈣組穿過的預定的分㈣組 路徑;和m定部分,其形成於所述支撑部分的每—者上a 以便透過吸住基底的下表面來固定所述基底。 所述支撐部分耦合到所述框從而能夠在至少一個方向 上移動,以便調節所述支撐部分之間的間隔。 σ 所述固定部分是多個真空吸孔,其沿著所述支樓部分 的縱向方向提供,以便制預定的真空吸力來_所述基 底。 土 所述分裂模組包括:上部分裂模組,其在所述基底的 上表面上形成切劃線並分裂基底;和下部分裂模組,其在 所述基底的下表面上形成切劃線並分裂基底,且其中所述 上部和下部分裂模組配置成利賴述水平移_組而經過 1326274 2I226pif.doc 相同的移動路徑。 戶^^部和下部分裂模組中的每一者均包括:劃線 頭:在基底表面上形成切劃線;和反向頭(⑽愈 ea ’、目對於插人於其與所㈣線頭之間的所述基底 述劃線頭相反的-側,反向頭並透過按壓所述 基底來A者所述切劃線分裂所述基底。3 crack if. In this state, as the cutter 1 is moved 2 along the surface of the substrate G, a continuous cutting line S is formed on the surface of the substrate G. Thereafter, the substrate G is split by applying a force along the scribe line 8. The substrate stack is loaded onto a predetermined table (Fig. 3') (S10). 7 21226pif.doc Completed or automatically completed the _plus (4) organization. Position (10)). Next, the scribing head having the accumulator 1 on the drawing is moved to the desired position, and the setting is set. / ^ cut (marking head setting step S3 〇). Through "===degree==(:):,: on the base. Upper form = time: the base G moves to the position where the split S performs the split, the bottom G (S50). In this step, you can enter a + The alignment step of the soil position. Then 'execute the crack along the cut (S60). #分线S to base G divided into eight In the above conventional technique, the step of forming the scribe line S, and the step of dicing the base G of the scribe line S are performed by a separate device, in addition, due to the movement through the appropriate device (4), The steps of loading and aligning are repeated, so the equipment becomes complicated, and the soil _ , : _ is added when processing. Especially when it is necessary to divide a single base: split; =: Since it is necessary to repeat the above steps of Fig. 3, there is no = In addition, since it is fixed on the surface of the substrate G to the work 3: scribing, it is difficult to cope with the workbench Or the base G itself: no; frank. Therefore, it is difficult (10) to form a cut line with a depth of branching. SUMMARY OF THE INVENTION In order to solve the above and/or other problems, the present invention provides a gas line device and a material to be placed on a wire to form a cut 21226pif.doc line and along the cut ship. Recording the bottom, so that the scribe line (10) can be shortened so that the working space can be reduced, the transmission is made into a plurality of single sheets, and a scribe line of J is formed on the substrate; and a multi-split system. According to an aspect of the invention, a multi-split system includes a shredded line that is loaded with a pure bottom; a mother-in-law; a split line to split the bottom; a configuration pool, such as a split configuration of the splitting module; Moving the pure group horizontally, the two modules are moved in the direction opposite to the direction of the sub-sakis; the upper surface and the lower surface of the substrate disposed on the table t include: a frame, Forming the outer side; a plurality of branches occluding the frame, supporting the substrate, having a predetermined rod shape separated from each other to form a predetermined sub-group path for the sub-group to pass through; and a m-shaped portion, Formed on each of the support portions to pass through the substrate a surface to fix the substrate. The support portion is coupled to the frame to be movable in at least one direction to adjust an interval between the support portions. σ The fixed portion is a plurality of vacuum suction holes along which Providing a longitudinal direction of the portion of the branch to provide a predetermined vacuum suction to the substrate. The splitting module includes: an upper splitting module that forms a scribe line on the upper surface of the substrate and a split substrate; and a lower splitting module that forms a scribe line on the lower surface of the substrate and splits the substrate, and wherein the upper and lower splitting modules are configured to facilitate the horizontal shifting group by 1326274 2I226pif. Doc The same moving path. Each of the unit and the lower splitting module includes: a scribing head: a scribing line is formed on the surface of the substrate; and a reverse head ((10) is more ea', for the purpose of inserting The substrate is split by the scribed line by pressing the substrate with the opposite side of the scribe line between the line head and the line head.

所述多分裂系統進一步包括連接所述劃線頭與所述反 向頭的連接料,射水平㈣部純合_述連接部分 接部分在水平方向上移動,從而使劃線頭和反 向頭在水平方向上移動。 所述反向頭包括.基底接觸部分,其接觸所述基底的 ^表面;和賴部分,其朝著騎基録純按壓所述 基底接觸部分。 所述基底接觸部分具有可旋轉滾筒結構,且在盘所述 基底的另-表面接觸而旋轉的同時按壓所述基底。The multi-split system further includes a connecting material connecting the scribing head and the reverse head, and the shooting level (four) is homozygous, and the connecting portion is moved in a horizontal direction, thereby causing the scribing head and the reverse head Move in the horizontal direction. The reverse head includes a substrate contact portion that contacts a surface of the substrate, and a lands portion that presses the substrate contact portion toward the base. The substrate contact portion has a rotatable drum structure and is pressed while the other surface of the disc is rotated in contact with the substrate.

所述基底接觸部分具有雙滾筒結構,其中所述雙滾筒 結構具有以預㈣間隔分離的中心區域,且割線頭的中心 部分配置於所述中邮域中,與所^心區域對應。 所述反向頭進-步包括愿力調節部分,所述壓力調節 部分位於基底制部分與部分之間,且當按壓部分向 基底接觸部分施加預定的壓力時透過吸收壓力來調節施加 到基底接觸部分的壓力。 所述壓力調節部分包括:汽缸,其透過按壓所述按壓 部分來向基底麵部分施加壓力;和荷重計,其測量按壓 1326274 21226pif.doc 部分所施加的壓力。 所述反向頭進-步包括止動器,所述止動 接觸部分在上下方向上的移動範圍。 。义土― 所述上部和下部分裂模組巾的每—者均包括:劃線 輪’其在所*基底上形成切劃線;和按壓切部分,其在 切劃線形成步驟中按壓並支撐基底的另—表面^其/中所 述劃線輪和所述按壓支撐部分由附加的驅動設備齡,並 面向相同方向。The substrate contact portion has a double roller structure, wherein the double roller structure has a central region separated by a pre-four interval, and a central portion of the secant head is disposed in the middle mail region corresponding to the center region. The reverse head advancement step includes a force adjustment portion located between the base portion and the portion, and adjusts the application to the substrate contact by absorbing pressure when the pressing portion applies a predetermined pressure to the substrate contact portion Part of the pressure. The pressure regulating portion includes a cylinder that applies pressure to the base surface portion by pressing the pressing portion, and a load meter that measures a pressure applied by pressing the portion 1326274 21226pif.doc. The reverse head advance step includes a stopper, a range of movement of the stopper contact portion in the up and down direction. . The soil - each of the upper and lower splitting module towels comprises: a scribing wheel 'which forms a scribe line on the substrate; and a press-cut portion that is pressed and supported during the scribe line forming step The other surface of the substrate, the scribing wheel and the pressing support portion, are aged by an additional driving device and face in the same direction.

且所述按壓支揮部分於所述 壓並支撐形成有所述切劃線 所述劃線輪位於中心處, 劃線輪的兩侧呈對稱,以便按 的位置附近的兩側。 所述劃線輪配置成比所述按壓支禮部分相對更接近所 述基底。 所述按壓支撑部分具有可補料結構,且在與所述 基底的另一表面接觸而旋轉的同時按愿所硫萁佐And the pressing portion is formed on the pressing portion and is formed by the scribe line. The scribing wheel is located at the center, and both sides of the scribing wheel are symmetrical so as to be adjacent to both sides of the position. The scribing wheel is configured to be relatively closer to the substrate than the pressing portion. The pressing support portion has a feedable structure and is rotated while being in contact with the other surface of the substrate.

所述按壓支撐部分具有雙賴結構,所^雙滾筒結構 具有以預定的間隔分離的中心區域,且所述劃線輪的中心 部分配置於所述中心區域中,與所述中心區域對應。 所述配置模組包括:上部配置模組,所述上部分裂模 組以預定的間隔分離配置於其中;和下部配置模組,所述 下部分裂模組以預定的間隔分離配置於其中。 所述多分裂系統進一步包括分裂模組移動單元,所述 为裂模組移動單元使所述上部和下部分裂模組在配置模組 上以水平方向移動。 1326274 21226pif.doc 所述多为裂系統進一步包括對準單元,所述對準單元 對準裝載於工作台上部上的基底的位置。 所述多分裂系統進一步包括相機模組,所述相機模組 獲得裝載於工作台上的基底的位置的資訊,並將所述資訊 - 提供給所述對準單元。 根據本發明的另一方面,一種劃線設備包括:劃線頭, 其在基底表面上形成預定的切劃線;反向頭,其相對於基 底位於與劃線頭相反的一側,並按壓所述基底;和水平$ 動部分,其使劃線頭和反向頭在水平方向上移動。 所述劃線設備進-步包括連接劃線頭與反向頭的連接 部分,其中所述水平移動部分耗合到所述連接部分並使所 - 述連接部分在水平方向上移動,從而使劃線頭和反向頭在 . 水平方向上移動。 ' 户斤述反向頭包括:基底接觸部分,其接觸所述基底的 另-表面;和按壓部分,其朝著基底推動並按壓基底 部分。 一 • 戶斤述基底接觸部分具有可旋轉滾筒結構,且在與基底 的另一表面接觸而旋轉的同時按壓所述基底。 一 所述基底接觸部分具有雙滾筒結構,所述雙滾筒結構 .具有以預定的間隔分離的中心區域,且所述劃線頭的中心 , 部分配置於所述中心區域中,與所述中心區域對應。 - 所述反向頭進一步包括壓力調節部分,所述壓力調節 部分位於基底接觸部分與按壓部分之間,且當按壓部分向 基底接觸部分施加預定的壓力時,透過吸收壓力來調節施 12 21226pif.doc 加到基底接觸部分的壓力β 邱八力料部分包括n其透過按墨所述按壓 賴料施加壓力;和射計,其測量按壓 部分所施加的壓力。 接縮向輕—步包括止動11,所述止_限制基底 接觸‘在上下方向上的移動範圍。The pressing support portion has a double-dip structure having a central portion separated at a predetermined interval, and a central portion of the scribing wheel is disposed in the central region, corresponding to the central region. The configuration module includes: an upper configuration module, wherein the upper split module is separately disposed at a predetermined interval; and a lower configuration module, wherein the lower split module is separately disposed at a predetermined interval. The multi-split system further includes a split module moving unit, and the split module moving unit moves the upper and lower split modules in a horizontal direction on the configuration module. 1326274 21226pif.doc The multi-split system further includes an alignment unit that aligns the position of the substrate loaded on the upper portion of the table. The multi-split system further includes a camera module that obtains information of the position of the substrate loaded on the workbench and provides the information to the alignment unit. According to another aspect of the present invention, a scribing apparatus includes: a scribing head that forms a predetermined scribe line on a surface of a substrate; a reverse head that is located on a side opposite to the scribing head with respect to the substrate, and is pressed The substrate; and a horizontal moving portion that moves the scribing head and the reverse head in a horizontal direction. The scribe device further includes a connecting portion connecting the scribe head and the reverse head, wherein the horizontal moving portion is consuming to the connecting portion and moving the connecting portion in a horizontal direction, thereby causing The thread head and the reverse head move in the horizontal direction. The reverse head includes: a substrate contact portion that contacts the other surface of the substrate; and a pressing portion that pushes and presses the substrate portion toward the substrate. A base contact portion has a rotatable drum structure and is pressed while being rotated in contact with the other surface of the substrate. One of the substrate contact portions has a double roller structure having a central region separated at a predetermined interval, and a center of the scribing head is partially disposed in the central region, and the central region correspond. The reverse head further includes a pressure regulating portion located between the substrate contact portion and the pressing portion, and adjusting the application 12 21226 pif by absorbing pressure when the pressing portion applies a predetermined pressure to the substrate contact portion. Doc The pressure β applied to the contact portion of the substrate includes a pressure applied by pressing the ink according to the ink; and a ray meter that measures the pressure applied by the pressing portion. The splicing to the light-step includes a stop 11, which limits the extent of movement of the substrate in the up and down direction.

根據本發明的又—方面,—種齡方法包括:將基底 △所述基底處執行形成切劃線的劃線工作)裝載於工作 σ上’將£]線頭移動到基底表面上的劃線丄作位置;使用 ^定的觀料,在狀_力下漏職賴述割線工 ^置的基底的另-表面;和實質上在相同方向上以相同 速度移動劃線頭和反向頭並執行劃線工作。 同時執行劃線頭的移動和對基底另—表面上的位置的 按壓。According to still another aspect of the present invention, the method of ageing includes: loading a substrate Δ at the substrate to perform a scribe line forming a scribe line) loading a scribe line on the work σ to move the line head to the surface of the substrate Positioning; using a fixed viewing, under the force _ force to the other surface of the base of the secant; and moving the scribe and the reverse at substantially the same speed in the same direction Perform a scribing job. At the same time, the movement of the scribing head and the pressing of the position on the other surface of the substrate are performed.

在劃線頭和反向頭的移動過程中,按壓部件按壓劃線 頭揸擊的基底的另-表面上的位朗對應的—位置的左右 ,側’且同日德彳了在所述基底上形成㈣線的劃線工作, 和沿著切劃線分裂基底的分裂工作。 為讓本發明之上述和其他目的、概和優點能更明顯 懂’下文特舉較佳實施例,並配合_圖式作詳細說 明如下。 【實施方式】 為了獲彳讀本發明、其優點和透過實施本發明而實現 的目的充分理解’參看說明本發明哺佳實施例的附圖。 13 1326274 21226pif.doc ,下文中,將透過參看附圖解釋本發明的較佳實施例來 詳細描述本發明。附圖中相同參考標號表示相同元件。 以下描述中,認為基底包含半導體,包含液晶顯示器 (LCD)、電漿顯示器面.板(pDp)和有機發光二極體 - (OLED)的平板顯示器,或平板玻璃和壓克力板。 β圖4是說明根據本發明實施例的多分裂系統的圖。圖 5疋圖4的多分裂系統$的I作台的前視圖。圖6是圖* ❹分㈣統的簡化圖。圖7是展示圖4的多分裂系統中 的分裂模組的結構的圖。圖8是圖7的主要部分的放大圖。 圖9A至圖9C是展示分裂基底的步驟的圖。 參看圖4、圖5、圖6、圖7、圖8和圖9A至圖9C, 但主要參看圖4,根據本發明實施例的多分裂系統包含: .玉作台3〇〇’其裝载有待分裂的基底G;多個分裂模組B, /、在裝載於I作台300上的基底g的上表面和下表面上, 各形成預定的切劃線S並分裂基底G ;配置模組4〇〇,1 =預定的分離_配置分組B;和水平移動模組5〇〇、, •,、使配置模組4〇〇沿著切劃線S移動。 二工作台300是裝載有基底G的部分。基底G裝載於工 作口 300,的上表面上從而使基底G的位置被固定。當在基 f G上形成切劃線S,和沿著㈣線S對基底G執行分裂 且土氐G不可在工作台300的上表面上任意地移動。當 =底G的位置移動時,不僅難以以魅的雜形式在基底 上屯成切劃線S ’而且難以精確地分裂基底G。因此, 一旦裝載於工作台3GG上,基底G必須固定於其上。 14 13262/4 21226pif.doc ,達到此目的,如圖5中所展示,工作台3〇〇包含多 固310、形成於個別支擇部分31〇之間的分裂模 =移動路32〇、提供於每—支撐部分31G的多個固定部 刀330 ’和支掉部分310與之耦合的框340。 支標。(5刀310形成為長桿形狀且基底G裝載於其上 並與所述上表面接觸。在本實施例中’支#部分310 預定的間隔分離。每—支撑部分3 支Γ分3_合到框34G的方式為使之能夠 心粹邱八^在一方向上水平移動。因此’可容易地調 =卜π ίοm㈣隔。為達到此 進一步包含細部分⑽在框-二多 刀驅動農置(未圖示)。因為支撐部分310允 並分裂具有不同規格和尺寸的多種 ㈣撐部分310之間的分裂模組移動路徑320是 二=支,分310之間的空間。如稍後所描述, 她例中’由於不僅在基底G的上表面上而且在且下表面上 所以分裂模組㈣相對於農載於工作台3〇〇 太眚2由的上S面和下表面兩者接近或後退。因此,在 、W,形成了分裂模⑽動路經 =在:门近,上表面和下表面並水平 基底的同時域切劃線S。分裂模_動路 足以使分裂模組B可穿過的尺寸。㈣路仏320具有 固定部分330形成於支樓部分31〇上以便透過吸住基 15 21226pif.doc 底G的下表面來固定裝載於支撐部分310上的基底G。也 就是說,固定部分330固定基底G,以便在將基底G分裂 成期望的尺寸的過程期間不允許基底G的位置移動。 在本實施例中,固定部分330是多個真空吸孔,其使 用真空吸力來固定基底G。真空吸孔33〇在支撐部分3⑺ 的厚度方向上穿透支樓部分31〇,並沿著支禮部分31〇的 縱向方向均勻地形成。儘管附圖中未展示,但連接到外部 真空泵(未圖示)的連接管(未圖示)耦合到真空吸孔33〇°。 因此,隨著透過真空栗的吸力將外部空氣吸收穿過 孔330,可吸住並固定基底g。 、二 進-步在工作自3〇〇 ±提供用來對準裳載於 △ 3〇〇上的基底G的位置的對準單元(未圖示) : 控制工作台300的位置、裝载於工作台3 位置和對準狀態。 上的基底G的 在本實施例中,手動地或使用附加的機械 自動地將基底G裝載於工作台3〇〇上。然 ♦ 〇) 裝載於正確位置時,盔法勃〜 虽土底Θ未 下,基底上 使用對準單元錢變基底叫位置 f °透過 方向上移動—並使工作台^ 分裂模組Β在基底G的上表 S,並透過沿著劃線s按麼基底來分裂基底劃線 中’如圖6所示’分裂模組6包含上部分裂模組二 1326274 21226pif.doc 部分裂模組B2。 上部分裂模組Bi在基底G的上表面上形成切割線s 以便分裂基底G。下部分裂模組B2在基底G的下表面上 形成切劃線S以便分裂基底G。水平移動模組5〇〇使上部 和下部分龍組B1和B2在水平方向上(即,在沿著切割 線s的方向上)移動。當被水平移動模組5〇〇移動時,上 部和下部分裂模組B1和B2是配置成沿著相同的 路徑經過。 初 因此,由於根據本實施例的多分裂系統麵 分裂同時形成於基底G的上表面和下表面上的切割線8, 僅可獲得非常良好的分裂表面,而且可大大縮短工 作柃間,因此顯著縮短稼動時間(tacttime)。 土如圖7所示,上部和下部分裂模組m和B2中的每一 m劃線頭刚和反向頭細。劃線頭酬和反 由連接部分(未圖示)連接,當連接部分被 動 =分(未圖示)水平移動時執行分裂,下文將對此進行= 劃令_ 100在基底G的表面上形成切劃線s =上形成切劃線s。劃線頭1〇〇包含振動產生部: 供庫- it部分120、轴130、高度調節單元140、預壓 供應早兀150、主板和上/下移動部分17〇。 122 UG產生預定的振動力以振動切割考 2。振動產生部分UG包含致動器必致動器托架⑴、 17 1326274 21226pif.doc 下致動态板116和上致動器板ns。施加的電力使致動器 112自行振動並提供振動力。在本實施例中,致動器 是平行預受應力致動器。 致動恭托架114將致動器112和軸13〇 _合到主板 160。致動器Π2的下端固定到致動器拕架114。致動器托 架1H透過致動器Π2的振動而允許軸13〇執行線性運 動。也就是說,軸130透過嵌入於形成於致動器托架ιΐ4During the movement of the scribing head and the reverse head, the pressing member presses the position on the other surface of the base slammed by the scribing head to correspond to the position of the left and right sides, and the same day is on the substrate. The scribing work of the (four) line is formed, and the splitting work of the split base along the scribe line is performed. The above and other objects, advantages and advantages of the present invention will become more apparent <RTIgt; [Embodiment] The present invention, its advantages, and the objects achieved by the practice of the present invention are fully understood. 13 1326274 21226pif.doc, the invention will be described in detail below by explaining preferred embodiments of the invention with reference to the attached drawings. The same reference numerals in the drawings denote the same elements. In the following description, the substrate is considered to comprise a semiconductor, a flat panel display including a liquid crystal display (LCD), a plasma display panel (pDp), and an organic light emitting diode (OLED), or a flat glass and an acrylic plate. FIG. 4 is a diagram illustrating a multi-split system according to an embodiment of the present invention. Figure 5 is a front elevational view of the I of the multi-split system $ of Figure 4. Figure 6 is a simplified diagram of Figure 4 (4). Figure 7 is a diagram showing the structure of a splitting module in the multi-split system of Figure 4. Fig. 8 is an enlarged view of a main part of Fig. 7. 9A to 9C are diagrams showing a step of splitting a substrate. Referring to Figures 4, 5, 6, 7, 8 and 9A to 9C, but mainly referring to Figure 4, a multi-split system according to an embodiment of the present invention comprises: . a substrate G to be split; a plurality of split modules B, /, on the upper surface and the lower surface of the substrate g loaded on the I-stage 300, each forming a predetermined scribe line S and splitting the substrate G; 4〇〇, 1 = predetermined separation_configuration group B; and the horizontal movement module 5〇〇,, •,, and the configuration module 4〇〇 is moved along the scribe line S. The second stage 300 is a portion loaded with a substrate G. The substrate G is loaded on the upper surface of the working port 300 so that the position of the substrate G is fixed. When the scribe line S is formed on the base f G, and the base G is split along the (four) line S, the soil G cannot be arbitrarily moved on the upper surface of the table 300. When the position of the bottom G is moved, it is not only difficult to form a scribe line S ′ on the substrate in a miscellaneous form, and it is difficult to accurately split the substrate G. Therefore, once loaded on the table 3GG, the substrate G must be fixed thereto. 14 13262/4 21226pif.doc , for this purpose, as shown in FIG. 5, the table 3 includes a multi-solid 310, a split mode formed between the individual support portions 31〇 = a moving path 32〇, provided Each of the plurality of fixed portion knives 330' of the support portion 31G and the frame 340 to which the branch portion 310 is coupled. Brace. (5 knives 310 are formed in a long rod shape and the base G is loaded thereon and in contact with the upper surface. In the present embodiment, the 'branch # portion 310 is separated by a predetermined interval. Each of the support portions 3 is divided into 3 _ The way to the frame 34G is to enable it to move horizontally in one direction. Therefore, 'can be easily adjusted = π ί ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο Not shown). Because the support portion 310 allows and splits the split module movement path 320 between the plurality of (four) support portions 310 having different specifications and sizes, the space between the two branches and the points 310. As will be described later, In her example, the splitting module (4) approaches or retreats with respect to both the upper S surface and the lower surface of the table 3 due to the fact that not only on the upper surface of the substrate G but also on the lower surface. Therefore, at W, the split mode (10) is formed. The gate is slashed at the same time as the gate, the upper surface and the lower surface and the horizontal substrate. The split mode _ the path is sufficient for the split module B to be worn. The size of the passage (320) has a fixed portion 330 formed in the branch portion 31 Up to fix the substrate G loaded on the support portion 310 by sucking the lower surface of the base 15 21226pif.doc. That is, the fixing portion 330 fixes the substrate G so as to split the substrate G into a desired size. The positional movement of the substrate G is not allowed during the period. In the present embodiment, the fixed portion 330 is a plurality of vacuum suction holes that use vacuum suction to fix the substrate G. The vacuum suction holes 33 穿透 penetrate the support in the thickness direction of the support portion 3 (7) The floor portion 31 is uniformly formed along the longitudinal direction of the slab portion 31. Although not shown in the drawings, a connecting pipe (not shown) connected to an external vacuum pump (not shown) is coupled to the vacuum vent hole. Therefore, as the external air is absorbed through the hole 330 through the suction force of the vacuum pump, the base g can be sucked and fixed. The second-step is provided at work from 3〇〇± Alignment unit (not shown) of the position of the base G on the Δ 3 : : control the position of the table 300, the position of the table 3 and the alignment state. In the present embodiment, Manually or using an attached machine The base G is automatically loaded on the table 3 。. ♦ 〇 时) When loading in the correct position, the helmet Fabo ~ Although the soil bottom is not lowered, the alignment unit is used on the substrate to change the base position f ° transmission direction Move up - and cause the workbench ^ splitting module to lie on the upper surface S of the base G, and split the base scribe line by pressing the base along the scribe line s 'as shown in Fig. 6 'the split module 6 contains the upper split Module 2 1326274 21226pif.doc Partially split module B2. The upper splitting module Bi forms a cutting line s on the upper surface of the substrate G so as to split the substrate G. The lower splitting module B2 forms a scribe line S on the lower surface of the substrate G to split the substrate G. The horizontal movement module 5 moves the upper and lower partial dragon groups B1 and B2 in the horizontal direction (i.e., in the direction along the cutting line s). When moved by the horizontal movement module 5, the upper and lower split modules B1 and B2 are configured to pass along the same path. Initially, since the multi-split system face splitting according to the present embodiment is simultaneously formed on the upper and lower surfaces of the substrate G, only a very good splitting surface can be obtained, and the working time can be greatly shortened, so that significant Shorten the tact time. As shown in Fig. 7, each of the upper and lower split modules m and B2 is just thinner than the reverse head. The scribing head and the counter are connected by a connecting portion (not shown), and the splitting is performed when the connecting portion is passively moved (not shown) horizontally, which will be hereinafter referred to as = 划 100 forming a cut on the surface of the substrate G A scribe line s is formed on the scribe line s. The scribing head 1〇〇 includes a vibration generating portion: a reservoir-it portion 120, a shaft 130, a height adjusting unit 140, a preload supply early 150, a main board, and an upper/lower moving portion 17〇. 122 UG generates a predetermined vibration force to vibrate the cutting test 2 . The vibration generating portion UG includes an actuator necessary actuator bracket (1), 17 1326274 21226pif.doc, a dynamic plate 116 and an upper actuator plate ns. The applied power causes the actuator 112 to vibrate itself and provide a vibratory force. In this embodiment, the actuator is a parallel pre-stressed actuator. Actuator bracket 114 actuates actuator 112 and shaft 13 to the main board 160. The lower end of the actuator Π 2 is fixed to the actuator truss 114. The actuator holder 1H allows the shaft 13〇 to perform linear motion by the vibration of the actuator Π2. That is, the shaft 130 is embedded in the actuator bracket ι 4

中的圓環形通孔(未圖示)中而耦合到致動器托架 以便沿著通孔執行線性運動。 下致動器板116搞合到致動器112的下端和致動哭托 架114 ’從而允許致動器112可拆卸。上致動器板^ 合到致動态112的上端和軸13〇,從而允許致動器可拆卸。 致動态112的下端固定到致動器托架114。The annular through hole (not shown) is coupled to the actuator bracket to perform linear motion along the through hole. The lower actuator plate 116 engages the lower end of the actuator 112 and actuates the crying bracket 114' to allow the actuator 112 to be detachable. The upper actuator plate is coupled to the upper end of the dynamics 112 and the shaft 13 〇 to allow the actuator to be detachable. The lower end of the dynamics 112 is fixed to the actuator bracket 114.

可進-步在致動器托帛1M接觸#由13〇的部分處提供 襯套(未圖示)。所述襯套不僅引導軸13〇的線性運動,、 而且防止由於在軸130的線性往復運動期間產生的摩擦 切割器122的直線性(straight職)的相應提高而毁療 130。因此,襯套較佳的是,錄^出較高抗摩擦力的材料 形成。在本實施例中,使用線性金屬襯套作為概套。 儘管附圖中未展示,但振動產生部分11〇可進一 +勺 含致動器冷卻部分’以便在致動n 112振動的過程中= 致動器m的溫度升高。僅在安騎向致動$山施 力的電極的部分處S&amp;置致動器冷卻部分,便可有利 系統結構。劾ϋ冷卻部分可進—步包含用於調節提供給 18 1326274 21226pif.doc 致動器冷卻部分的壓力或冷卻劑的 示)。 切割器部分120包含122 觸,並在基底G的(上)表面卜带士― 縫C (參看圖。。因此/切割:二士:的A bushing (not shown) may be provided at the portion of the actuator tray 1M contact #13. The bushing not only guides the linear movement of the shaft 13〇, but also prevents the treatment 130 from being degraded due to a corresponding increase in the straightness of the friction cutter 122 generated during the linear reciprocating motion of the shaft 130. Therefore, the bushing is preferably formed by recording a material having a higher friction resistance. In the present embodiment, a linear metal bushing is used as an outline. Although not shown in the drawings, the vibration generating portion 11 can further include an actuator cooling portion 'in order to increase the temperature of the actuator m during the vibration of the actuation n 112 . The system structure can be facilitated only by the S&amp; cooling section of the S&amp; The enthalpy cooling section may include instructions for adjusting the pressure or coolant supplied to the 18 1326274 21226 pif.doc actuator cooling section. The cutter portion 120 contains 122 touches and is on the (upper) surface of the base G. The tape is slit-C (see Fig.. Therefore/cut: two:

由:基底G的材料形成。在本實施例中,切割器122 田鑽石形成。 切割器把柄124固定地輕合到切割器122,且同時允 許切割器m耗合到軸130。具有圓柱形狀的車由13〇的一 端可嵌入於形成於切割器把柄124 _合凹口 124a中。因 =切割器122麵合的凹口(未圖示)形成於㈣器把柄 :外部上端處,所以切割器122可固定地耦合 态把柄124。Formed by: material of the substrate G. In the present embodiment, the cutter 122 is formed of diamonds. The cutter handle 124 is fixedly coupled to the cutter 122 and at the same time allows the cutter m to be consuming to the shaft 130. A car having a cylindrical shape can be embedded in the cutter handle 124-closed recess 124a by one end of the 13 turns. Since the notch (not shown) facing the cutter 122 is formed at the (4) handle: the outer upper end, the cutter 122 can be fixedly coupled to the handle 124.

量的調節單元(未圖 在本實施例中,_器122酉己置成稍許與切割器把柄 4的中心線偏離。當切割器把柄124旋轉時,切割器m 沿著與切割器把柄124的中心線相符的路徑,在切割器把 柄124的中心線略後方移動。因此,由切割器122形成的 切』線S的直線性得以改進。並且,在本實施例中,可進 步提供固定支架(未圖示),其將搞合到切割器把柄124 的切割器122 m定住’使其不會脫離切割器把柄124。 切剎益把柄124能夠在耗合到軸13〇的狀態下進行樞 轴轉,。如上所述,此是為了允許切割器122在水平移動 時,藉由切割器122的偏離結構而始終沿著與切割器把柄 19 1326274 21226pif.doc 124的中心線相同的路徑移動。 綠錢了 田切割器把柄124 祕3,,由於難以對切割器122的 以切割斋把柄124需要在胃# &amp; Α ώ 工 本實施例t,切除預=度内進行樞轴轉動。在 除凹口(夫III -、 職部分以形成切 、 θ不)。在切割器把柄124的側壁的對岸於所 述切除凹口的部分中,在厚度方m應^所 楔狀物(未圖示)嵌入於诵料廿门—成通孔(未圖不)。 ㈣i 巾顧^其巾,從而使楔The amount of adjustment unit (not shown in the present embodiment, the _122 is already slightly offset from the center line of the cutter handle 4. When the cutter handle 124 is rotated, the cutter m is along the cutter handle 124 The path of the center line coincides slightly behind the center line of the cutter handle 124. Therefore, the linearity of the cut line S formed by the cutter 122 is improved. Also, in the present embodiment, the fixing bracket can be improved ( Not shown), it will engage the cutter 122 m of the cutter handle 124 so that it does not disengage from the cutter handle 124. The brake lever handle 124 can be pivoted in a state of being engaged to the shaft 13 〇 Turning, as described above, this is to allow the cutter 122 to always move along the same path as the centerline of the cutter handle 19 1326274 21226pif.doc 124 by the offset structure of the cutter 122 when moving horizontally. The money field cutter handle 124 secret 3, because it is difficult to cut the cutter 122, the handle 124 needs to be in the stomach # &amp; Α ώ 实施 实施 实施 , , , , , , , 。 。 。 。 。 。 。 。 (Fu III -, Department Divided into a cut, θ not.) In the portion of the side wall of the cutter handle 124 opposite the cut-out recess, a wedge (not shown) is embedded in the pick-up door at a thickness m. Through the hole (not shown). (4) i towel Gu ^ its towel, so that the wedge

狀物&amp;接觸切_σ。楔狀物—端 二從而使得切割器把柄124可在預定的角度二= 軸130位於振動產生部分U0與切割器部分120之 間,並傳遞振動產生部分110的振動。 “高度調節單元140提供於振動產生部分110上方,並 沿著基底G的不平坦處調節切割器部分12〇的高度。大體 而言,待分裂的基底G表面被處理成平坦的。然而,基底The object &amp; contact cut _σ. The wedge-end 2 is such that the cutter handle 124 is positionable between the vibration generating portion U0 and the cutter portion 120 at a predetermined angle 2 and transmits the vibration of the vibration generating portion 110. "The height adjustment unit 140 is provided above the vibration generating portion 110 and adjusts the height of the cutter portion 12A along the unevenness of the substrate G. In general, the surface of the substrate G to be split is processed to be flat. However, the substrate

G表面上可能形成有許多細微的不平坦處’且表面可能局 部平坦但總體上不平坦。 因此,需要透過沿著基底G的不平坦表面調節切割器 部分120的高度來改進基底G上所形成的切劃線s的直線 性。因此’在本實施例中’提供高度調節單元14〇,其檢 測基底G的不平坦性’並即時地反映所檢測到的不平坦 性’以便調節切割器部分120的高度。高度調節單元14〇 可為荷重計’當對其施加的負荷重量不大於預定值時其長 度擴展’而當對其施加的負荷重量不小於預定值時其長度 20 1326274 21226pifdoc 收縮。 預壓供應單元150提供於高度調節單元140上方,並 向切割器部分120供應預壓。預壓是指用來以軸向方向壓 迫切割器部分120的一個方向上的力(壓力)。因此,當 切割器122透過接觸基底G而形成切劃線s時,預壓供應 單元150以軸向方向壓迫切割器122,以便在厚度方向上 向基,G施加衝擊。在本實施例中,預壓供應單元15〇是 透過氣壓來產生壓力的汽缸,明確地說,是微速汽缸。 主板160耦合到切割器部分12〇、振動產生部分 和預壓供應單元】5〇,並使切割器部分120、振動產生部分 110、高度調節單元14〇和預壓供應單元15〇的中心線固定 成依次位於-條直線上。另外,域_續_器部分 120振動產生部分m、尚度調節單元和預壓供應單 兀150,以使它們可在上下方向和水平方向上移動。 上/下移動部分170耦合到主板16〇並在上/下方向上 驅動主板160。上/下移動部分17〇 &amp;含側基座172、提供 於主板160上的馬達174、滾珠螺桿Π6和可移動塊178。 ^馬達I74 &amp;供主板16〇上/下移動所需的動力。在本實 化例中,使用飼服馬達作為馬達174來精確地控制主板⑽ 的上/下移動。 滾珠螺桿176耦合到馬達ι74並在馬達174上旋轉, 且在其外表面上具有職。滾_桿176搞合到固定至主 ,16〇的可移動塊178。因此,具有使滾珠螺桿 176從中 牙過的尺寸的内螺旋孔(未圖示)形成於可移動塊178中。 1326274 21226pif.doc 與滾珠螺桿176的螺旋匹g2)的内螺旋形成於㈣旋孔的内 部表面上。因此,當馬達174轉動滾珠螺桿176時,可移 動塊178可上下移動。 儘管附圖中未展示’但上/下移動部分17〇進一步包括 用來引導主板160的線性運動的線性塊和線性引導器。線 性塊耦合到主板160並引導主板16〇的線性運動。線性引 導器耦合到線性塊並引導線性塊的運動方向。 參看圖7和圖8,反向頭200相對於基底G而配置在 與劃線頭100相反的一側,並在劃線頭1〇〇形成切劃線s 的同時支撐基底G的另一表面(下表面)。也就是說,當 劃線頭100在水平方向上移動並在基底〇表面上連續地; 成切劃線S時,反向頭200與劃線頭100同時地在水平方 向上移動並支撐基底G的下表面,以便透過向基底G施加 相同的力來形成恆定的切劃線S。 反向頭200包含基底接觸部分21〇和按壓部分220。 基底接觸部分210接觸基底G的另一表面並按壓基底G。 在本實施例中,基底接觸部分21〇具有可旋轉滾筒結構, 在所述結構中滾筒212與基底G的另一表面接觸而旋轉並 按壓基底G。明確地說,在本實施例中,如圖8所示,基 底接觸部分210具有雙滾筒結構,當兩個滾筒212以預定 的間隔分離時,所述雙滾筒結構具有中心區域214。中心 區域214位於與劃線頭1〇〇的切割器122對應的位置處。 因此,切割器122按壓的部分實際上並不由滾筒212支撐, 且與滾筒212按壓的部分相鄰的中心區域214由切割器 22 1326274 21226pif.doc 122按壓。 按壓部分220透過朝著基底g按壓基底接觸部分210 來按壓基底接觸部分210。按壓部分220耦合到基底接觸 部分210的另一端’並朝著基底G推動基底接觸部分210。 基底接觸部分210和按壓部分220耦合到單個導板230, 從而使其中心線維持成彼此匹配。基底接觸部分21〇可透 過耦合並使用導板230、線性引導器和線性塊來確保精確 的線性運動。 反向頭200進一步包括壓力調節部分24〇,壓力調節 部分240提供於基底接觸部分210與按壓部分22〇之間, 且當按壓部分220向基底接觸部分210施加超過預定量的 力時吸收所述力。There may be many fine unevennesses on the surface of G and the surface may be flat but generally uneven. Therefore, it is necessary to improve the linearity of the scribe line s formed on the substrate G by adjusting the height of the cutter portion 120 along the uneven surface of the substrate G. Therefore, in the present embodiment, the height adjusting unit 14 is provided which detects the unevenness of the substrate G and immediately reflects the detected unevenness to adjust the height of the cutter portion 120. The height adjusting unit 14A may be a load meter 'when the load weight applied thereto is not larger than a predetermined value, its length is expanded' and its length 20 1326274 21226pifdoc is contracted when the load weight applied thereto is not less than a predetermined value. The preload supply unit 150 is provided above the height adjustment unit 140 and supplies a preload to the cutter portion 120. The preload refers to a force (pressure) in one direction for pressing the cutter portion 120 in the axial direction. Therefore, when the cutter 122 forms the scribe line s by contacting the substrate G, the pre-pressure supply unit 150 presses the cutter 122 in the axial direction to apply an impact to the base, G in the thickness direction. In the present embodiment, the preload supply unit 15 is a cylinder that generates pressure through air pressure, specifically, a micro speed cylinder. The main plate 160 is coupled to the cutter portion 12, the vibration generating portion, and the preload supply unit 5〇, and fixes the center line of the cutter portion 120, the vibration generating portion 110, the height adjusting unit 14〇, and the preloading supply unit 15〇. The order is on the straight line. Further, the domain_continuation unit 120 vibrates the portion m, the adjustment unit and the preload supply unit 150 so that they can move in the up and down direction and the horizontal direction. The up/down moving portion 170 is coupled to the main board 16A and drives the main board 160 upward/lower. The upper/lower moving portion 17A &amp; includes a side base 172, a motor 174 provided on the main board 160, a ball screw 6 and a movable block 178. ^Motor I74 &amp; The power required to move the main board 16 up/down. In the present embodiment, the feeding motor is used as the motor 174 to precisely control the up/down movement of the main board (10). Ball screw 176 is coupled to motor ι 74 and rotates on motor 174 and has a position on its outer surface. Roller_bar 176 engages to a movable block 178 that is fixed to the main, 16 turns. Therefore, an inner spiral hole (not shown) having a size for passing the ball screw 176 from the middle tooth is formed in the movable block 178. 1326274 21226pif.doc The inner helix of the helix g2) with the ball screw 176 is formed on the inner surface of the (four) screw hole. Therefore, when the motor 174 rotates the ball screw 176, the movable block 178 can move up and down. Although not shown in the drawings, the upper/lower moving portion 17 further includes linear blocks and linear guides for guiding the linear motion of the main board 160. The linear block is coupled to the motherboard 160 and directs linear motion of the motherboard 16A. A linear guide is coupled to the linear block and directs the direction of motion of the linear block. Referring to FIGS. 7 and 8, the reverse head 200 is disposed on the opposite side of the scribing head 100 with respect to the substrate G, and supports the other surface of the substrate G while the scribing head 1 is formed with the scribe line s. (lower surface). That is, when the scribing head 100 moves in the horizontal direction and continuously on the surface of the substrate crucible; when the scribing line S is formed, the reverse head 200 moves in the horizontal direction and supports the substrate G simultaneously with the scribing head 100. The lower surface is formed to form a constant scribe line S by applying the same force to the substrate G. The reverse head 200 includes a substrate contact portion 21A and a pressing portion 220. The substrate contact portion 210 contacts the other surface of the substrate G and presses the substrate G. In the present embodiment, the substrate contact portion 21A has a rotatable drum structure in which the drum 212 comes into contact with the other surface of the substrate G to rotate and press the substrate G. Specifically, in the present embodiment, as shown in Fig. 8, the base contact portion 210 has a double roller structure having a central portion 214 when the two rollers 212 are separated at predetermined intervals. The central region 214 is located at a position corresponding to the cutter 122 of the scribing head 1〇〇. Therefore, the portion pressed by the cutter 122 is not actually supported by the drum 212, and the central region 214 adjacent to the portion pressed by the drum 212 is pressed by the cutter 22 1326274 21226pif.doc 122. The pressing portion 220 presses the substrate contact portion 210 by pressing the substrate contact portion 210 toward the substrate g. The pressing portion 220 is coupled to the other end ' of the substrate contact portion 210 and pushes the substrate contact portion 210 toward the substrate G. The base contact portion 210 and the pressing portion 220 are coupled to a single guide 230 such that their centerlines are maintained to match each other. The substrate contact portion 21 is permeable to coupling and uses the guide 230, linear guide and linear block to ensure accurate linear motion. The reverse head 200 further includes a pressure regulating portion 24 that is provided between the substrate contact portion 210 and the pressing portion 22A, and absorbs when the pressing portion 220 applies a predetermined amount of force to the substrate contact portion 210. force.

由於待由根據本發明的分裂系統1〇〇〇分裂的基底G 的厚度非常薄且硬度非常低’所以當施加過大的力時,基 底G可能毀壞。因此,壓力調節部分24〇控制施加到基底 G的壓力,使其不超過預先設定的水平。此外,壓力調節 部分240使施加到基底G的壓力始終恆定,從而可形成統 —的切劃線S。在本實施例中,使用荷重計作為壓力調節 部分240。 反向頭200進一步包含止動器250,其界定基底接觸 部分210的移動上限和移動下限。止動器25〇防止基底接 觸部分210過份地朝著基底移動而彎曲或毀壞基底G。止 動器250配置在基底接觸部分21〇周圍。 儘管附圖中未展示,但連接部分連接劃線頭1〇〇與反 23 1326274 21226pif.doc 向頭200。在本實施例中,劃線頭100和反向頭200彼此 連接並同時—起移動。因此,反向頭200直接按壓基底〇 的一部分,其中劃線頭1〇〇在所述部分處形成切劃線S。 水平移動部分使劃線頭1〇〇和反向頭2〇〇在水平方向 上移動。在本實施例中,由於連接部分連接劃線頭1〇〇與 反向頭200 ’所以較佳的是,水平移動部分柄合到連接部 分’以便水平地移動連接部分。當水平移動部分水平地移 動連接部分時,劃線頭1〇〇和反向頭200可在相同方向上 以相同的速度移動。 上部和下部分裂模組B1和B2中的每一者均包含上述 劃線頭100和反向頭200。然而’劃線頭1〇〇和反向頭2〇〇 的配置彼此不同。也就是說,如圖6所示,在上部分裂模 組B1中’劃線頭i〇〇a配置在基底g的上側處且反向頭 200a配置在下側處,而在下部分裂模組B2中,劃線頭1 〇〇b 配置在基底G的下側處且反向頭200b配置在上側處。 再次參看圖4 ’配置模組400包含以恆定的間隔配置 的多個分裂模組B。分裂模組B經配置而能夠在配置模組 400上移動。為了參考,分裂模組b的數目和尺寸根據所 需要的設計而變化。分裂模組B的安裝間隔可調節,從而 可相應地調節配置模組400。Since the thickness of the substrate G to be split by the splitting system 1 according to the present invention is very thin and the hardness is very low', the base G may be destroyed when an excessive force is applied. Therefore, the pressure adjusting portion 24 controls the pressure applied to the substrate G so as not to exceed a predetermined level. Further, the pressure regulating portion 240 makes the pressure applied to the substrate G constant at all times, so that a scribed line S can be formed. In the present embodiment, a load cell is used as the pressure adjusting portion 240. The reverse head 200 further includes a stopper 250 that defines an upper limit of movement and a lower limit of movement of the substrate contact portion 210. The stopper 25 prevents the substrate contact portion 210 from excessively moving toward the substrate to bend or destroy the substrate G. The stopper 250 is disposed around the substrate contact portion 21A. Although not shown in the drawings, the connecting portion connects the scribing head 1 〇〇 and the reverse 23 1326274 21226 pif. doc to the head 200. In the present embodiment, the scribing head 100 and the reverse head 200 are connected to each other and simultaneously moved. Therefore, the reverse head 200 directly presses a portion of the substrate ,, wherein the scribe head 1 形成 forms a scribe line S at the portion. The horizontal moving portion moves the scribing head 1〇〇 and the reverse head 2〇〇 in the horizontal direction. In the present embodiment, since the connecting portion connects the scribing head 1〇〇 and the reverse head 200', it is preferable that the horizontal moving portion is stalked to the connecting portion' to horizontally move the connecting portion. When the horizontal moving portion moves the connecting portion horizontally, the scribe head 1 〇〇 and the reverse head 200 can move at the same speed in the same direction. Each of the upper and lower split modules B1 and B2 includes the above-described scribing head 100 and reverse head 200. However, the configurations of the scribe head 1 〇〇 and the reverse head 2 彼此 are different from each other. That is, as shown in FIG. 6, in the upper split module B1, the 'scribe head i〇〇a is disposed at the upper side of the base g and the reverse head 200a is disposed at the lower side, and in the lower split module B2. The scribing head 1 〇〇b is disposed at the lower side of the substrate G and the reverse head 200b is disposed at the upper side. Referring again to Figure 4, the configuration module 400 includes a plurality of splitting modules B arranged at constant intervals. Split module B is configured to move over configuration module 400. For reference, the number and size of split modules b vary depending on the desired design. The installation interval of the split module B can be adjusted so that the configuration module 400 can be adjusted accordingly.

儘管附圖中未展示’但配置模組400包含上部配置模 組,和下部配置模組。在上部配置模組中,上部分裂模組 B1是以預定間隔分離配置。在下部配置模組中,下部分裂 模組B2是以預定間隔分離配置。並且,由於分裂模組B 24 1326274 21226pif.doc 可在配置模組400上水平移動,所以較佳的是,在上部和 下部分裂模組B1*B2中的每一者上進一步提供使每一分 裂模,.且B在配置模組4〇〇上以水平方向移動的模組移動單 元(未圖示)。 水平移動模組500使配置模組400在與分裂模組B的 配置方向垂直的方向上(即,在沿著切劃線S的方向上) =平移動。在本實施例中,在上部分裂模組B1和下部分 f模組B2 #合到配置模組働之後,水平移動模組500 使配置換組400在水平方向上移動。因此,耗合到配置模 400的刀雀模組b具有實質上相同的速度且可在相 向上移動。 另外,根據本實施例的多分裂系統1〇〇〇,進一步包含 =4所示的相機模組刪。相機模組_精確地測量1 提供^^⑼上的基底G的位置’並將關於位置的資訊 組基底G被狀時,域模 相攝丞底G的預定位置上的記號,且基於 記號來判定,底G的位置。將此資訊提供給對準單元,從 而可由對準單元來精轉地調節基底G的位置。 所述㈣置的乡分㈣、統丨_的 上的所需的尺寸和分裂規格來設定工作! 來調;^組B的位置。基於基底G的規袼和分裂規格 也作台_上的支撑部分31G之_間隔。 也調即分裂模組B的間隔。 接著’如圖9A所示,將基底〇定位於工作台3〇〇上。 25 1326274 2l226pif.doc 相機模組600使用先前在基底G的特定部分上 ^ 號來檢查基底G的位置。當基底G的位置= 對準單元將基底G移動到精確的位置。 在本實施射,由於上部和下部分裂模纟且bi和彼 此平打地配置在前後方向上,所轉基底G定位框 =離預定的距離。所述分離距離經設物模組 B可進入。Although not shown in the drawings, the configuration module 400 includes an upper configuration module and a lower configuration module. In the upper configuration module, the upper splitting module B1 is disposed at a predetermined interval. In the lower configuration module, the lower split module B2 is disposed at a predetermined interval. Moreover, since the splitting module B 24 1326274 21226pif.doc can be horizontally moved on the configuration module 400, it is preferable to further provide each split on each of the upper and lower splitting modules B1*B2. A module moving unit (not shown) that moves in the horizontal direction on the configuration module 4A. The horizontal movement module 500 causes the configuration module 400 to move in a direction perpendicular to the arrangement direction of the split module B (i.e., in the direction along the scribe line S). In the present embodiment, after the upper split module B1 and the lower portion f module B2 # are coupled to the configuration module 水平, the horizontal movement module 500 moves the configuration swap group 400 in the horizontal direction. Therefore, the finches module b that is consuming to the configuration die 400 has substantially the same speed and is movable in the direction of the direction. Further, according to the multi-split system 1 of the present embodiment, the camera module shown in Fig. 4 is further deleted. The camera module _ accurately measures 1 to provide the position of the base G on the ^^(9) and to form a mark on the predetermined position of the bottom G, when the information group base G on the position is shaped, and based on the mark Determine the position of the bottom G. This information is supplied to the aligning unit so that the position of the substrate G can be finely adjusted by the aligning unit. Set the required size and splitting specifications on the (4) set of the township (4), the rectification _ to set the work! To adjust; ^ group B position. The gauge and split specifications based on the base G are also used as the interval of the support portion 31G on the stage. Also adjust the interval of the split module B. Next, as shown in Fig. 9A, the substrate 〇 is positioned on the table 3A. 25 1326274 2l226pif.doc The camera module 600 uses the previous number on a particular portion of the substrate G to check the position of the substrate G. When the position of the substrate G = the alignment unit moves the substrate G to a precise position. In the present embodiment, the base G positioning frame is rotated by a predetermined distance due to the upper and lower split molds and bi and the flat arrangement in the front-rear direction. The separation distance can be entered via the module B.

、接著,如圖9B戶斤示,將分裂模組B移動到開始位置, 以供進灯分裂並接著騎奴。也就是說,將分裂模组B 移動到供分縣底G賴始位置之前的位置,並進行: 以維持在分裂·Β可接觸基底的高度處。:完 ,設定了分龍組B時’如圖9C所示,操作水平移^模 ,,且500來水平地移動分裂模組B,且執行分裂。 、 參看圖12詳細描述上述操作。首先,將基底g裝載Next, as shown in Fig. 9B, the splitting module B is moved to the starting position for the splitting of the lights and then the slave. That is to say, the splitting module B is moved to a position before the bottom position of the branch base G, and is performed: to maintain the height at which the splitting/contacting substrate can be contacted. : End, when the split dragon group B is set' As shown in Fig. 9C, the horizontal shift mode is operated, and 500 is used to horizontally move the split module B, and splitting is performed. The above operation will be described in detail with reference to FIG. First, load the substrate g

底=H300上(SU〇)。校正基底〇的位置,從而將基 精確的位置(S12G)。基底G的位置是相對於 ’中斤展不的劃線頭100和反向頭200的相對位置。因 此’可透過在基底G固朗工作台的同時紅作台3〇〇 ^移動基底G或移動王作台本身來調節基底G的位 置。 …接著’ 1GG移動卵制始位置以執行劃線 疋步驟(S130)從而為劃線/分裂工作作準備。在此步 ’,在將劃線頭100移動到劃線開始位置之後,降低書j 線頭觸的高度以便接觸基底G的表^ 降低里1 26 1326274 21226pif.do&lt; 接=,將反向頭·移動到與劃線開始位置對應的位 (S140)。在此步驟中’在移動到與設定有劃線頭⑽ 的位置對應的位置之後,反向頭綱按壓基底G的割 面的相對表面的對應於劃線開始位置的部分。較佳的是,: 不是按壓對應於劃線開始點的單個點,而是按壓1於I應 於劃線開始點的點的兩側處的兩個點。因此,有利地減^ 施加到基底G的負荷,且透過按壓形成有切劃線s的基底 G的兩側來同時執行分裂。在此期間,可同時執行步驟si3〇 和 140。 接著,在移動劃線頭1〇〇和反向頭2⑻的同時,執行 劃線和分裂(S150)。在此步驟中,當劃線頭1〇〇和反向 頭200在相同方向上以相同的速度移動時,同時地執行切 劃線S的形成和沿著切劃線S對基底G的分裂。 根據本實施例,由於可在單個設備内同時執行切劃線 S的形成和切劃線S的分裂,所以可縮短處理時間,且因 為設備的結構簡化,所以可減少工作空間。並且,可透過 一次處理將基底(3分裂成多個單片。此外,可在基底G上 形成具有統一深度的切劃線S。 圖10是說明根據本發明另一實施例的多分裂系統的 圖。圖11是圖10的主要部分的放大圖。如圖1〇和圖11 中所示’根據本發明另一實施例的多分裂系統2000具有與 上述多分裂系統1000相同的結構和形狀。然而,上部分裂 模組2100和下部分裂模組2200不同於上述多分裂系統 1000的上部和下部分裂模組。因此,不再重複對於其他組 27 1326274 21226pif.doc 成元件的描述’且此處僅描述上部分裂模組2100和下部分 裂模組2200。 在本實施例中,上部分裂模組2100和下部分裂模組 2200包含經配置而面向相同方向的劃線輪211〇和2210, 以及按壓支撐部分2120和2220。劃線輪2110和2210是 用來在基底G上形成切劃線S’且按壓支撐輪2120和2220 是用來在切劃線形成步驟期間按壓並支撐基底〇的另一表 面。 在本實施例中,由於劃線輪2110和2210以及按壓支 撐部分2120和2220配置在相同方向上,所以劃線輪2110 和2210提供於中心處,且按壓支撐部分2120和2220對稱 地提供於劃線輪2110和2210的兩側。因此,按壓支樓部 分2120和2220按壓並支撐由劃線輪2110和2210形成切 劃線S的位置兩側。 在本實施例中,較佳的是,劃線輪2110和2210以及 按壓支撐部分2120和2220由附加的驅動設備在上/下方向 上操作。劃線輪2110和2210在基底G上形成切劃線S, 與按壓支撐部分2120和2220在切劃線形成步驟中支撐基 底G,需要不同的力和不同的工作高度。較佳的是,,劃 線輪2110和2210以及按壓支撐部分2120和2220由不同 的驅動設備單獨操作並被獨立地控制,而不是同時操作。 明確地說,由於劃線輪2110和2210是透過穿透基底 G的上表面來形成切劃線s,所以較佳的是’將劃線輪2110 和2210配置成進一步朝著基底G突出。也就是說,當按 28 1326274 21226pif.docBottom = H300 (SU〇). Correct the position of the substrate , so that the base is accurately positioned (S12G). The position of the substrate G is relative to the position of the scribing head 100 and the reverse head 200 which are not shown. Therefore, the position of the substrate G can be adjusted by moving the substrate G or moving the substrate G itself while the base G is solidifying the table. ... then '1GG moves the egg start position to perform the scribing step (S130) to prepare for the scribing/split work. In this step, after moving the scribing head 100 to the scribing start position, the height of the head of the book j line is lowered to contact the surface of the base G. 1 26 1326274 21226pif.do&lt; • Move to the bit corresponding to the start position of the scribing (S140). In this step, after moving to a position corresponding to the position at which the scribing head (10) is set, the reverse head presses a portion of the opposite surface of the cut surface of the base G corresponding to the start position of the scribing. Preferably, instead of pressing a single point corresponding to the start point of the scribe line, two points at both sides of the point where I should be at the start point of the scribe line are pressed. Therefore, the load applied to the substrate G is advantageously reduced, and the splitting is simultaneously performed by pressing both sides of the substrate G on which the scribe lines s are formed. During this time, steps si3 and 140 can be performed simultaneously. Next, while moving the scribing head 1〇〇 and the reverse head 2 (8), scribing and splitting are performed (S150). In this step, when the scribing head 1 〇〇 and the reverse head 200 are moved at the same speed in the same direction, the formation of the scribe line S and the splitting of the substrate G along the scribe line S are simultaneously performed. According to the present embodiment, since the formation of the scribe line S and the splitting of the scribe line S can be simultaneously performed in a single device, the processing time can be shortened, and since the structure of the device is simplified, the work space can be reduced. Also, the substrate (3 may be split into a plurality of single sheets by one treatment. Further, a scribe line S having a uniform depth may be formed on the substrate G. Fig. 10 is a view illustrating a multi-splitting system according to another embodiment of the present invention. Figure 11 is an enlarged view of a main portion of Figure 10. As shown in Figures 1 and 11, a multi-split system 2000 according to another embodiment of the present invention has the same structure and shape as the multi-split system 1000 described above. However, the upper splitting module 2100 and the lower splitting module 2200 are different from the upper and lower splitting modules of the multi-split system 1000 described above. Therefore, the description of the other components 27 1326274 21226pif.doc is not repeated 'and only The upper splitting module 2100 and the lower splitting module 2200 are described. In the present embodiment, the upper splitting module 2100 and the lower splitting module 2200 include scribing wheels 211 and 2210 that are configured to face the same direction, and a pressing support portion. 2120 and 2220. The scribing wheels 2110 and 2210 are for forming a scribe line S' on the substrate G and the pressing support wheels 2120 and 2220 are for pressing and supporting the substrate during the scribe line forming step. In the present embodiment, since the scribing wheels 2110 and 2210 and the pressing support portions 2120 and 2220 are disposed in the same direction, the scribing wheels 2110 and 2210 are provided at the center, and the pressing support portions 2120 and 2220 are symmetric. The ground portions are provided on both sides of the scribing wheels 2110 and 2210. Therefore, the pressing branch portions 2120 and 2220 press and support both sides of the position where the scribing wheels 2110 and 2210 form the scribe line S. In this embodiment, it is preferable The scribing wheels 2110 and 2210 and the pressing support portions 2120 and 2220 are operated upward/downward by an additional driving device. The scribing wheels 2110 and 2210 form a scribe line S on the base G, and the pressing support portion 2120 and 2220 supports the substrate G in the scribe line forming step, requiring different forces and different working heights. Preferably, the scribing wheels 2110 and 2210 and the pressing support portions 2120 and 2220 are separately operated by different driving devices and are Controlled independently, rather than simultaneously. Specifically, since the scribing wheels 2110 and 2210 penetrate the upper surface of the substrate G to form the scribe lines s, it is preferable to 'match the scribing wheels 2110 and 2210 To further protrude toward the base G. That is, when the press 28 1326274 21226pif.doc

壓支撐部分2120和2220透過接觸基底G的表面而支撐基 底G時’由於劃線輪2110和2210需要透過進一步突進基 底G表面中來在基底G上形成凹槽,所以劃線輪2110和 2210配置成比按壓支撐部分2120和2220更接近基底G。 按壓支撐部分2120和2220具有可旋轉滾筒結構,以 便在與基底G的另一表面接觸而旋轉的同時按壓基底g。 按壓支撐部分2120和2220具有雙滾筒結構,所述雙滾筒 結構具有以預定的間隔與兩側分離的中心區域。中心區域 疋與s!l線輪2110和2210中的每一者的中心部分對應的位 置:因此,由於雙滾筒結構的緣故,可更加平穩地按壓並 支撐基底G而不會防礙劃線輪211〇和221〇的操作。 雖然已參看本發明的較佳實施例特定展示並描述_ ^發明’但所屬領域的技術人員將瞭解,在不偏離本發日\ =精神和範圍的前提下可對其進行形式和細節上的各種髮 ’其中本發明的精神和範圍由_的申請專利範圍限定 如上所述’轉本發明,由於可在單個設備内 ίΐ刀劃線S,的形成和切劃線S的分裂,所以可縮短處理挺 二且因為設備的結構簡化’所以可減少工作空間。並且 °透過一次處理將基底G分裂成多個單片。 ,財發明已以健實施賴露如上,财並非 又又本發明,任何熟習此技藝 和範圍内,當可作此許之_:2不:離本發明之精神 2虽視後附之中請專利範圍所 之保4 【圖式簡單說明】 + 29 1326274 21226pif.doc 透過參看附圖詳細描述本發明的較佳實施例’將更容 易瞭解本發a月的上述和其他特徵及優點,附圖中: 圖1是說明傳統分裂系統的圖。 圖2是圖1的基底的平面圖。 •圖3是解釋圖1的分裂系統的流程圖。 圖4是說明根據本發明實施例的多分裂系統的圖。 圖5是圖4的多分裂系統中的工作台的前視圖。 圖6是圖4的多分裂系統的簡化圖。 圖7是展示圖4的多分裂系統中的分裂模組的結構的 圖。 圖8是圖7的主要部分的放大圖。 圖9A至圖9C是展示分裂基底的步驟的圖。 圖1〇是說明根據本發明另一實施例的多分裂系統的 8 〇 圖11是圖10的主要部分的放大圖。 圖12疋解釋根據本發明實施例的劃線方法的流程圖。 【主要元件符號說明】 1:切割器 100 :劃線頭 100a :劃線頭 l〇〇b :劃線頭 110 :振動產生部分 112:致動器 114 :致動器托架 30 1326274 21226pif.doc 116 : 118 : 120 : 122 : ' 124 : 124a 130 140 •150 160 170 172 174 176 178 200 • 200a 200b 210 212 . 214 . 220 230 240 下致動器板 上致動器板 切割器部分 振動切割器 切割器把柄 :耦合凹口 軸 高度調節單元 預壓供應單元 主板 上/下移動部分 側基座 馬達 滾珠螺桿 可移動塊 反向頭 :反向頭 :反向頭 基底接觸部分 滚筒 中心區域 按壓部分 導板 壓力調節部分 31 1326274 21226pif.doc 250:止動器 300:工作台 310:支撐部分 320 :分裂模組移動路徑 330:真空吸孔 340 :框 400:配置模組 500:水平移動模組When the pressing support portions 2120 and 2220 support the substrate G by contacting the surface of the substrate G, 'the scribing wheels 2110 and 2210 are configured because the scribing wheels 2110 and 2210 need to penetrate into the surface of the substrate G to form grooves on the substrate G. The ratio of the pressing support portions 2120 and 2220 is closer to the substrate G. The pressing support portions 2120 and 2220 have a rotatable roller structure to press the substrate g while rotating in contact with the other surface of the substrate G. The pressing support portions 2120 and 2220 have a double roller structure having a central region separated from both sides at a predetermined interval. The central region 位置 corresponds to the central portion of each of the s!l reels 2110 and 2210: therefore, due to the double drum structure, the base G can be pressed and supported more smoothly without hindering the scribing wheel 211〇 and 221〇 operations. Although the invention has been particularly shown and described with reference to the preferred embodiments of the present invention, it will be understood by those skilled in the art that the form and details can be carried out without departing from the spirit and scope of the present invention. Various inventions, wherein the spirit and scope of the present invention is defined by the scope of the patent application as described above, the invention can be shortened by the formation of the scribe line S and the division of the scribe line S in a single device. The processing is quite good and because the structure of the device is simplified, the workspace can be reduced. And the substrate G is split into a plurality of single sheets by one treatment. The invention has been implemented in the above-mentioned way, and the financials are not the same as the invention. Anyone who is familiar with this skill and scope can make this _: 2: not from the spirit of the invention 2 The above-mentioned and other features and advantages of the present invention will be more readily understood by the following description of the preferred embodiments of the invention. Medium: Figure 1 is a diagram illustrating a conventional splitting system. Figure 2 is a plan view of the substrate of Figure 1. • Figure 3 is a flow chart for explaining the splitting system of Figure 1. 4 is a diagram illustrating a multi-split system in accordance with an embodiment of the present invention. Figure 5 is a front elevational view of the table in the multi-split system of Figure 4. Figure 6 is a simplified diagram of the multi-split system of Figure 4. Figure 7 is a diagram showing the structure of a splitting module in the multi-split system of Figure 4. Fig. 8 is an enlarged view of a main part of Fig. 7. 9A to 9C are diagrams showing a step of splitting a substrate. 1A is an illustration of a multi-split system according to another embodiment of the present invention. FIG. 11 is an enlarged view of a main portion of FIG. Figure 12A is a flow chart for explaining a scribing method according to an embodiment of the present invention. [Description of main component symbols] 1: Cutter 100: Scriber head 100a: Scriber head l〇〇b: Scriber head 110: Vibration generating portion 112: Actuator 114: Actuator bracket 30 1326274 21226pif.doc 116 : 118 : 120 : 122 : ' 124 : 124a 130 140 • 150 160 170 172 174 176 178 200 • 200a 200b 210 212 . 214 . 220 230 240 Lower Actuator Plate Actuator Plate Cutter Part Vibration Cutter Cutter handle: coupling notch shaft height adjustment unit pre-pressure supply unit main board upper/lower moving part side base motor ball screw movable block reverse head: reverse head: reverse head base contact part roller center area pressing part guide Plate pressure adjusting portion 31 1326274 21226pif.doc 250: stopper 300: table 310: support portion 320: split module moving path 330: vacuum suction hole 340: frame 400: configuration module 500: horizontal moving module

600:相機模組 1000:多分裂系統 2000:多分裂系統 2100:上部分裂模組 2110 :劃線輪 2120 :支撐部分 2200:下部分裂模組 2210 :劃線輪600: Camera module 1000: Multi-split system 2000: Multi-split system 2100: Upper splitting module 2110: Scribing wheel 2120: Supporting part 2200: Lower splitting module 2210: Dashing wheel

2220:支撐部分 B:分裂模組 B1 :上部分裂模組 B2:下部分裂模組 C :裂縫 G ·基底 S :切劃線 322220: Support part B: Split module B1: Upper split module B2: Lower split module C: Crack G · Base S: Cut line 32

Claims (1)

/4 2l226pif 為第95125018號中文專利範圍無劃線修正本修正日期:邱年1 〇月n ; fr'r tc. 本年月曰 十、申請專利範圍: Η充 1.-種多分裂系統,包括: 了工=台,裝載有待分裂的基底; ^個分裂H透過在㈣於所述作台上的所述基 底的每一上表面和下表面所形成的預定切劃線,來分裂所 述基底; 配置模组’以預定的分離間隔配置所述分裂模組; 以及 一水平移動模組’使所述配置模組在與所述分裂模組 的配置方向交叉的方向上移動, 其中所述工作台包括: 一樞,形成外側; 多個支撐部分,耦合到所述框,且支撐所述基底, 該些支撐部分具有預定的桿形狀 ,並彼此分離,以便 形成供所述分裂模組穿過的預定分裂模組穿過路徑; 以及 一固定部分,形成於每一個所述支撐部分上,以 便透過吸住所述基底的所述下表面來固定所述基底。 2·如申請專利範圍第1項所述的多分裂系統,其中所 述支撐部分耦合到所述框,從而能夠在至少一個方向上移 動’以便調節所述支撐部分之間的間隔。 3.如申請專利範圍第1項所述的多分裂系統,其中所 述固定部分是多個真空吸孔,位於所述支撐部分的縱向方 向上’以便使用一預定真空吸力來固定所述基底。 33 1326274 21226pif 4.如申請專利範圍第1 述分裂模組包括: 項所述的多分裂系統,其中所 上部分裂模組,在所述基底的所述上表面上,形成 所述切劃線,並分裂所述基底;以及 一下部分裂模組,在所述基底的所述下表面上,形成 所述切劃線,並分裂所述基底,/4 2l226pif is the Chinese patent scope of No. 95125518. There is no slash correction. The date of this amendment: Qiu Nian 1 〇月n ; fr'r tc. This year's 曰10, the scope of application for patent: 11.- Multi-split system, The method includes: a work station, loading a substrate to be split; and a split H splitting through a predetermined scribe line formed on each of the upper and lower surfaces of the substrate on the stage a base module; a configuration module 'configuring the split module at a predetermined separation interval; and a horizontal movement module 'moving the configuration module in a direction crossing a configuration direction of the split module, wherein the The workbench includes: a pivot forming an outer side; a plurality of support portions coupled to the frame and supporting the base, the support portions having a predetermined rod shape and separated from each other to form a split module for wearing The predetermined splitting module passes through the path; and a fixing portion is formed on each of the supporting portions to fix the substrate by sucking the lower surface of the substrate. 2. The multi-split system of claim 1, wherein the support portion is coupled to the frame so as to be movable in at least one direction to adjust an interval between the support portions. 3. The multi-split system of claim 1, wherein the fixed portion is a plurality of vacuum suction holes located in a longitudinal direction of the support portion to secure the substrate using a predetermined vacuum suction. 33 1326274 21226pif 4. The splitting module of claim 1, comprising: the multi-split system of the item, wherein the upper splitting module forms the scribe line on the upper surface of the substrate, And splitting the substrate; and a partial splitting module, forming the undercut on the lower surface of the substrate, and splitting the substrate, 其中所述上部和下部分裂模組配置成利用所述水平移 動模組而穿過相同的移動路徑。 5. 如申請專利範圍第4項所述的多分裂系統,其中每 一所述上部和下部分裂模組包括: 一劃線頭,在所述基底的表面上形成所述切劃線;和 一反向頭,相對於插入於反向頭與所述劃線頭之間的 所述基底’位於與所述劃線頭相反的一側,反向頭並透過 按壓所述基底來沿著所述切劃線分裂所述基底。 6. 如申請專利範圍第5項所述的多分裂系統,更包括 一連接部分,連接所述劃線頭與所述反向頭,Wherein the upper and lower split modules are configured to traverse the same travel path using the horizontally moving module. 5. The multi-split system of claim 4, wherein each of the upper and lower split modules comprises: a scribing head forming the undercut on a surface of the substrate; and a reverse head, on a side opposite to the scribing head, with respect to the substrate inserted between the reverse head and the scribing head, a reverse head and by pressing the substrate to follow the The undercut is split to the substrate. 6. The multi-split system of claim 5, further comprising a connecting portion connecting the scribe head and the reverse head, 其中所述水平移動部分鶴合到所述連接部分,並使所 述連接部分在水平方向上移動,從而使所述劃線頭和所述 反向頭在所述水平方向上移動。 7. 如申請專利範圍第5項所述的多分裂系統,其中所 述反向頭包括: 一基底接觸部分,接觸所述基底的另一表面;以及 一按壓部分’朝著所述基底推動並按壓所述基底接觸 部分。 34 1326274 21226pif 8. 如申請專利範圍第7項所述的多分裂系統,其中所 述基底接觸部分具有可旋轉滚筒結構,且在與所述基底的 所述另一表面接觸而旋轉的同時按壓所述基底。 9. 如申請專利範圍第8項所述的多分裂系統,其中所 述基底接觸部分具有雙滚筒結構’所述雙滾筒結構具有以 預定間隔分離的中心區域,且所述劃線頭的中心部分配置 於所述中心區域中,與所述中心區域對應。 10. 如申請專利範圍第7項所述的多分裂系統,其中所 述反向頭更包括一壓力調節部分,位於所述基底接觸部分 與所述按壓部分之間,且當所述按壓部分向所述基底接觸 部分施加預定壓力時’透過吸收壓力來調節施加到所述基 底接觸部分的所述壓力。 11. 如申請專利範圍第10項所述的多分裂系統,其中 所述壓力調節部分包括: 一;α缸,透過按壓所述按壓部分來向所述基底接觸部 分施加壓力;以及 一荷重計,測量所述按壓部分施加的所述壓力。 12. 如申請專利範圍第1〇項所述的多分裂系統,其中 所述反向頭更包括止動器,限制所述基底接觸部分在上下 方向的移動範圍。 一 如申請專利範圍第4項所述的多分裂系統,其中每 一所述上部和下部分裂模組包括: 一劃線輪,在所述基底上形成所述切劃線;以及 一按壓支撐部分,在切劃線形成步驟中,按壓並支撐 35 1326274 2l226pif 所述基底的所述另一表面, 。其中所述劃線輪和所述按Μ支樓部分由附加的驅動設 備操作,並面向相同方向。 14·如申印專利範圍第13項所述的多分裂系統,其中 所述劃線輪位於巾心處,且所述祕支料分於所述劃線 輪的兩侧呈對稱’以便按壓並支獅成有崎蝴線的位 置附近兩侧。Wherein the horizontal moving portion is hung to the connecting portion, and the connecting portion is moved in a horizontal direction, thereby moving the scribing head and the reverse head in the horizontal direction. 7. The multi-split system of claim 5, wherein the reverse head comprises: a substrate contact portion contacting another surface of the substrate; and a pressing portion 'promoting toward the substrate The substrate contact portion is pressed. The multi-split system of claim 7, wherein the substrate contact portion has a rotatable drum structure and is pressed while being in contact with the other surface of the substrate to rotate Said substrate. 9. The multi-split system of claim 8, wherein the base contact portion has a double drum structure 'the double drum structure has a central portion separated at a predetermined interval, and a central portion of the scribing head It is disposed in the central area and corresponds to the central area. 10. The multi-split system of claim 7, wherein the reverse head further comprises a pressure regulating portion between the substrate contact portion and the pressing portion, and when the pressing portion is The substrate contact portion adjusts the pressure applied to the substrate contact portion by absorption pressure when a predetermined pressure is applied. 11. The multi-split system of claim 10, wherein the pressure regulating portion comprises: an alpha cylinder that applies pressure to the substrate contact portion by pressing the pressing portion; and a load meter, measuring The pressure applied by the pressing portion. 12. The multi-split system of claim 1, wherein the reverse head further comprises a stopper that limits a range of movement of the substrate contact portion in the up and down direction. The multi-split system of claim 4, wherein each of the upper and lower split modules comprises: a scribing wheel forming the scribe line on the substrate; and a pressing support portion In the scribe line forming step, the other surface of the substrate is pressed and supported by 35 1326274 2l226pif. Wherein the scribing wheel and the button portion are operated by an additional drive device and face in the same direction. 14. The multi-split system of claim 13, wherein the scribing wheel is located at the center of the towel, and the secret material is symmetrical on both sides of the scribing wheel for pressing The lion is in the vicinity of the position with the sakura line. 15·如申請專利範圍第14項所述的多分裂系統,其中 所述劃線輪配置成比所述按壓支撐部分更接近所述基底。 16.如申請專利範圍第15項所述的多分裂系統,其中 所述按壓支撐部分具有可旋轉滾筒結構,且在與所述基底 的所述另一表面接觸而旋轉的同時按壓所述基底。The multi-split system of claim 14, wherein the scribing wheel is disposed closer to the substrate than the pressing support portion. 16. The multi-split system of claim 15, wherein the press support portion has a rotatable drum structure and presses the substrate while rotating in contact with the other surface of the substrate. 17.如申s青專利範圍第16項所述的多分裂系統,其中 所述按壓支撐部分具有雙滾筒結構,所述雙滚筒結構具有 以預定間隔分離的中心區域,且所述劃線輪的中心部分配 置於所述中心區域中,與所述中心區域對應。 18·如申請專利範圍第5項所述的多分裂系統,其中所 述配置模組包括: 一上部配置模組,所述上部分裂模組以預定的間隔分 離而配置於其中;以及 一下部配置模組,所述下部分裂模組以預定的間隔分 離而配置於其中。 19.如申請專利範圍第18項所述的多分裂系統,更包 括分裂模組移動單元,所述分裂模組移動單元使所述上部 36 1326274 2l226pif 和下部分裂模組在所述—切 乂0.如申請專利範圍第!項所述的多動。 對準單元’所述對準單元鱗裝载’更包括 所述基底的位置。 、斤述工作口的上部的 21. 如申請專利範圍第丨項所述的多分 -相機模組,獲得裝載於所述工作台上的所^基底的j 的貧訊,並將所述資訊提供給所述對 '置17. The multi-split system of claim 16, wherein the press support portion has a double drum structure having a central region separated at predetermined intervals, and the scribing wheel The central portion is disposed in the central region and corresponds to the central region. The multi-split system of claim 5, wherein the configuration module comprises: an upper configuration module, wherein the upper split module is separated and disposed at a predetermined interval; and a lower configuration The module, the lower splitting module is disposed at a predetermined interval and disposed therein. 19. The multi-split system of claim 18, further comprising a splitting module moving unit, wherein the splitting module moving unit causes the upper portion 36 1326274 2l226pif and the lower splitting module to be in the Such as the scope of patent application! Hyperactivity as described in the item. The alignment unit 'the alignment unit scale loading&apos; further includes the location of the substrate. 21. The upper part of the working port 21. As described in the scope of the patent application, the multi-point-camera module obtains the poor information of the substrate loaded on the workbench and provides the information. Give the pair 22. -種劃線設備,包括:于準早兀 一劃線頭,在基底表面上形成預定的切劃線; 一反向頭,相對於所述基底位於與所述劃線頭相反 一側,並按壓所述基底;以及 一水平移動部分,使所述劃線頭和所述反向頭在水平 方向上移動, 其中所述反向頭包括: 一基底接觸部分,接觸所述基底的另一表面;以 及22. A scribing apparatus comprising: forming a predetermined scribe line on a surface of a substrate at a premature scribe line; a reverse head positioned on an opposite side of the scribe line relative to the substrate And pressing the substrate; and a horizontal moving portion to move the scribe head and the reverse head in a horizontal direction, wherein the reverse head comprises: a substrate contact portion contacting another of the substrate a surface; 一按壓部分,朝.著所述基底推動並按壓所述基底 接觸部分, 其中所述基底接觸部分具有可旋轉雙滾筒結構,且在 與所述基底的所述另一表面接觸而旋轉的同時按壓所述基 底,所述雙滚筒結構具有以預定的間隔分離的中心區域, 且所述劃線頭的中心部分配置於所述中心區域中,與所述 中心區域對應。 23.如申請專利範圍第22項所述的劃線設備,更包括 37 1326274 21226pif 一連接部分’連接所述劃線頭與所述反向頭’ 其中所述水平移動部分耦合到所述連接部分並使所述 連接部分在水平方向上移動,從而使所述劃線頭和所述反 向頭在所述水平方向上移動。a pressing portion that pushes and presses the substrate contact portion toward the substrate, wherein the substrate contact portion has a rotatable double roller structure and is pressed while being in contact with the other surface of the substrate to rotate The substrate, the double drum structure has a central area separated at a predetermined interval, and a central portion of the scribing head is disposed in the central area, corresponding to the central area. 23. The scribing apparatus of claim 22, further comprising 37 1326274 21226pif a connecting portion 'connecting the scribing head and the reverse head' wherein the horizontal moving portion is coupled to the connecting portion And moving the connecting portion in a horizontal direction to move the scribing head and the reverse head in the horizontal direction. 24.如申請專利範圍第22項所述的劃線設備,其中所 述反向頭更包括一壓力調節部分,位於所述基底接觸部分 與所述按壓部分之間,且當所述按壓部分向所述基底接觸 部分施加預定壓力時’透過吸收壓力來調節施加到所述基 底接觸部分的所述壓力。 25·如申請專利範圍第24項所述的劃線設備,其中所 述壓力調節部分包括: 一A缸’透過按壓所述按壓部分來向所述基底接觸部 分施加壓力;以及 一荷重計’測量所述按壓部分施加的所述壓力。 26.如申凊專利範圍第22項所述的劃線設備,其中所24. The scribing apparatus of claim 22, wherein the reverse head further comprises a pressure adjusting portion between the base contact portion and the pressing portion, and when the pressing portion is directed The substrate contact portion adjusts the pressure applied to the substrate contact portion by absorption pressure when a predetermined pressure is applied. The scribing apparatus of claim 24, wherein the pressure regulating portion comprises: an A-cylinder 'applying pressure to the base contact portion by pressing the pressing portion; and a load meter' measuring station The pressure applied by the pressing portion. 26. The scribing apparatus of claim 22, wherein 述反向頭更包括一止動器,限制所述基底接觸部分在上下 方向的移動範圍。 38 1326274 爲第95125018號中文圖式無劃線修正本修正日期:97年9月17日 Μ年A 更)正本 J - — »· -· ·» Λ I — r &lt; Tt—1 G C U _)_\_3_,The reverse head further includes a stopper that limits the range of movement of the substrate contact portion in the up and down direction. 38 1326274 For the Chinese pattern No. 95125518, there is no slash correction. This revision date: September 17, 1997, year A, the original version J - — »· -· ·» Λ I — r &lt; Tt—1 GCU _) _\_3_, § 1326274§ 1326274 1326274 S10—~- 裝載基底 S20-— 對準基底 S30—— 設定劃線頭 S40—一執行劃線1326274 S10—~- Loading substrate S20-—Aligning the substrate S30——Setting the scribing head S40—Perform a scribing line S50·一~- 移動到分裂工作位置 S60-^-執行分裂S50·一~- Move to split working position S60-^- Perform splitting 3 1326274 600 \xwx^ 400 盤 敵3 1326274 600 \xwx^ 400 臺I 4 1326274 300Taiwan I 4 1326274 300 13262741326274 10001000 13262741326274 13262741326274 8 13262748 1326274 參 S 9A 1326274Reference S 9A 1326274 圖9B 1326274Figure 9B 1326274 圖9C 1326274 2000Figure 9C 1326274 2000 2100 22002100 2200 圖10 1326274Figure 10 1326274 2100 2200 1326274 $110 一'—裝載基底 S120 '^-對準基底 S130 設定劃線頭2100 2200 1326274 $110 One'—Loading the substrate S120 '^-Aligning the substrate S130 Setting the scribe head S140 一一 設定反向頭 S150 一〜 執行劃線/分裂S140 one by one set reverse head S150 one ~ perform scribing / split 圖12Figure 12
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US5785225A (en) * 1991-12-06 1998-07-28 Loomis Industries, Inc. Frangible semiconductor wafer dicing apparatus which employs scribing and breaking
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JP2001235733A (en) * 2000-02-22 2001-08-31 Matsushita Electric Ind Co Ltd Method for cutting liquid crystal display panel
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