TWI323391B - Remover solution composition and use thereof - Google Patents
Remover solution composition and use thereof Download PDFInfo
- Publication number
- TWI323391B TWI323391B TW095109685A TW95109685A TWI323391B TW I323391 B TWI323391 B TW I323391B TW 095109685 A TW095109685 A TW 095109685A TW 95109685 A TW95109685 A TW 95109685A TW I323391 B TWI323391 B TW I323391B
- Authority
- TW
- Taiwan
- Prior art keywords
- weight
- cleaning liquid
- cleaning
- photoresist
- liquid composition
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims description 23
- 238000004140 cleaning Methods 0.000 claims description 37
- 229920002120 photoresistant polymer Polymers 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 20
- 239000007788 liquid Substances 0.000 claims description 19
- 239000002904 solvent Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 12
- -1 alcohol amine compound Chemical class 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 7
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 5
- 150000007514 bases Chemical class 0.000 claims description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 4
- 239000002736 nonionic surfactant Substances 0.000 claims description 4
- 238000012360 testing method Methods 0.000 claims description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 3
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 3
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 claims description 2
- GIAFURWZWWWBQT-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO GIAFURWZWWWBQT-UHFFFAOYSA-N 0.000 claims description 2
- LJDSTRZHPWMDPG-UHFFFAOYSA-N 2-(butylamino)ethanol Chemical compound CCCCNCCO LJDSTRZHPWMDPG-UHFFFAOYSA-N 0.000 claims description 2
- MIJDSYMOBYNHOT-UHFFFAOYSA-N 2-(ethylamino)ethanol Chemical compound CCNCCO MIJDSYMOBYNHOT-UHFFFAOYSA-N 0.000 claims description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 2
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 claims description 2
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 claims 1
- INSRQEMEVAMETL-UHFFFAOYSA-N decane-1,1-diol Chemical compound CCCCCCCCCC(O)O INSRQEMEVAMETL-UHFFFAOYSA-N 0.000 claims 1
- 239000012530 fluid Substances 0.000 claims 1
- 239000004575 stone Substances 0.000 claims 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000908 ammonium hydroxide Substances 0.000 description 3
- 229940043379 ammonium hydroxide Drugs 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 239000013504 Triton X-100 Substances 0.000 description 2
- 229920004890 Triton X-100 Polymers 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 231100000053 low toxicity Toxicity 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 2
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- IDOQDZANRZQBTP-UHFFFAOYSA-N 2-[2-(2,4,4-trimethylpentan-2-yl)phenoxy]ethanol Chemical compound CC(C)(C)CC(C)(C)C1=CC=CC=C1OCCO IDOQDZANRZQBTP-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920001214 Polysorbate 60 Polymers 0.000 description 1
- 229920004929 Triton X-114 Polymers 0.000 description 1
- 229920004896 Triton X-405 Polymers 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 1
- 229940043276 diisopropanolamine Drugs 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- CUCATGLPPHFLIZ-UHFFFAOYSA-M hydrogen peroxide;tetramethylazanium;hydroxide Chemical compound [OH-].OO.C[N+](C)(C)C CUCATGLPPHFLIZ-UHFFFAOYSA-M 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/044—Hydroxides or bases
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/10—Carbonates ; Bicarbonates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- C11D2111/22—
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
Description
1323391 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種清洗液組成物,其可用於清洗顯示器 面板或彩色濾光片基板週邊不必要的光阻劑或n 料β '化材 【先前技術】 一般而言,光阻劑或熱硬化材欲塗佈於矽晶圓或者玻璃 基板上時,通常係以迴轉的方式,藉由離心力使光阻劑擴 散而塗佈在基板的表面,而在塗佈後,基板的頂面、周邊j 側緣、背面皆附著有光阻劑。其中,位在基板頂面之中心 部的塗佈層厚度較均一,但頂面周邊則會形成一周邊突起 部,且在基板側緣及背面會各別附著形成一側緣附著部或 -背面附著部。就光阻劑功用而言,該周邊突起部、側緣 附著部以及背面附著部並非預期形成之塗佈部位,此等部 位之光阻劑在預烤熱處理後會變脆,容易在基板搬運過程 剝離成小片狀’上述剝離之小片光阻劑將成為裝置内含里 物之原因’並導致咖製造上良率下降,且有時於曝光過 程中,會沾附於光罩上,使光罩之清洗頻率提高,而降低 產能。若此材料為有顏色者,更會造成因材料遮蓋住對位 記號(aIignment mark),而在曝光或其他後製程時’產生盈 法對位之情形。 … 般為了改善前述缺失,在光阻劑塗佈後,曝光成像 或/、他後製程之前皆會先將基板周邊之突起部清除。為了 清除周邊突起部、侧緣附著部及背面附著部等不要的光阻 109023Moc 1323391 JP 63-69563及JP 2950407揭露可使用溶劑加以清除, 前述之溶劑可單獨或合併使用。 但是前述溶劑對於光阻劑或熱硬化材料的洗淨效果不 佳,谷易生成殘渣,其中有些溶劑更有毒性、環境污染及 閃火點偏低等問題。又此溶劑型清洗液在洗邊後,常會造 成清洗界面異常突起之情形,而造成後製程之良率降低。 目刖業界的解決方法是利用水來作為分散媒,&中華民國 專利公告第574604號所揭示,此類水性清洗液具有低毒 性、不具引火性,以及管理容易、廢液處理簡便及成本低 廉等優點,但針對某些光阻劑或平坦化材料,此類水性清 洗液會造成界面膨潤及造成突起,而此突起在顯影階段無 法元王去除,會造成殘留,因而造成產品良率下降。 由於清洗液在液晶面板製程或彩色濾光片製程中扮演重 要角色’上述清洗液雖然可提供某些效果,但卻未能完全 滿足所需之各項要求。為獲得一種可有效清洗顯示器面板 或彩色濾光片基板周邊不必要的光阻劑或平坦化材料之清 洗液,本案發明人經廣泛研究後發現,於清洗液組成物中 選用與水相容性高的溶劑與水相混合以作為分散媒,不會 造成顯影殘留現像,且此部份水及部份溶劑之系統,比純 溶劑系統清洗效果更佳,且可節省原料成本,可實現本發 明之上述目的。 【發明内容】 本發明之目的係在提供一種清洗液組成物,其包括: (A)〇〜25重量%之鹼性化合物; I09023.doc 1323391 (B)O.l〜20重量%之醇胺化合物; ((:)0.5〜20重量%之界面活性劑; (D) 3〜80重量%之溶劑;及 (E) 水 本發明組成物具有洗淨效果佳、殘渣少、毒性低、對環 境污染少的優點。 【實施方式】 本發明清洗液組成物所使用之驗性化合物,並無特殊限 制,其係為本發明所屬技術領域中具有通常知識者所熟知 的無機驗,例如:氫氧化卸、氫氧化納、碳酸納、碳酸氫鈉、 碳酸卸或碳酸氫钟;或有機驗,例如四級敍鹽。較佳為四 級銨鹽,例如氫氧化四級敍鹽,其可選自氫氧化四曱銨 (TMAH,tetramethyl ammonium hydroxide)、2-經基-氫氧化 三甲銨(2-hydroxyltrimethyl ammonium hydroxide)、氫氧化 四乙敍(TEAH,tetraethyl ammonium hydroxide)、氫氧化四 丙敍(TPAH,tetrapropyl ammonium hydroxide)或氫氧化四 丁铵(TBAH,tetrabutyl ammonium hydroxide),或此等四級 銨鹽之混合物,較佳為氫氧化四甲銨或2-羥基-氫氧化三甲 銨,更佳為氫氧化四甲敍。 本發明所使用之鹼性化合物,以組成物總重量計,其用 量為0〜25重量%,較佳為0.5〜10重量%,更佳為2〜10重量%。 本發明清洗液組成物中之醇胺類化合物並無特殊限制, 其亦可為本發明所屬技術領域中具有通常知識者所熟知 者,例如:乙醇胺(monoethanolamine,MEA)、二乙醇胺 109023.doc (diethanolamine)、三乙醇胺(triethanolamine)、2-(2-胺基乙 氧基)乙醇(2-(2-aminoethoxy)ethanol)、單異丙.醇胺 (monoisopropanolamine) 、 二異 丙醇胺 (diisopropanolamine)、三異丙醇胺(triisopropanolamine)、 N-乙基乙醇胺(N-ethylethanolamine)或N- 丁基乙醇胺 (N-butyl ethanolamine)或二或多種此等醇胺之混合物。 本發明所使用之醇胺類化合物,以組合物總重量計,其 使用量為0.1〜20重量%,較佳為0.2〜10重量%,更佳為1~8 重量%。 可用於本發明之界面活性劑,係本發明所屬技術領域中 具有通常知識者所熟知者,例如非離子型界面活性劑 (Nonionic surfactants )、陽離子型界面活性劑(Cationic surfactants)、陰離子型界面活性劑(Anionic surfactants)、兩性 界面活性劑(Ampholytic surfactants)等,較佳為非離子型界面 活性劑,例如聚氧乙烯烷基醚、聚氧乙烯烷基芳香醚、山 梨糖醇酐脂肪酸酯 '聚氧乙烯山梨糖醇酐脂肪酸酯、脂肪 酸單甘油酯、氧化乙烯/氧化丙烯共聚物等,市售非離子型 界面活性劑例子包括:由Dow Chemical公司生產、商品名為 TritonX-100®、TritonX-405® 及 TritonX-114® 等界面活性劑。界面活 性劑可防止組成物對液晶的污染,且同時對光阻提供不錯 之濕潤性。根據本發明之具體實施例,以組合物總重量計, 界面活性劑之使用量為0.5〜20重量%。 本發明所使用之溶劑係與水具高相容性者,例如可為N-甲基吡咯酮(NMP)、甲乙酮(MEK )、丙酮、環己酮、二甲 I09023.doc 1323391 基亞硬(DMSO)、乙一醇單曱 (ethyleneglycol monomethyl ether)乙一醇單乙趟、一乙二醇單曱醚(diethyleneglycol monomethyl ether)、二乙二醇單乙醚、二乙二醇丁醚(butyl diglycol)、丙二醇甲醚(pgME)或彼等之組合,較佳為丙二 醇甲醚、二甲基亞砜或其組合,更佳為丙二醇甲醚。本發明 所使用之溶劑,以組成物總重量計,其使用量為3〜8〇重量 %,較佳為10〜60重量%,更佳為1〇〜4〇重量0/〇。 本發明之清洗液可用於清洗顯示器面板或彩色濾光片基 板週邊不必要的光阻劑或平坦化材料,上述光阻劑包含彩 色光阻劑、黑色光阻劑或間隙材光阻劑(ph〇t〇 spacer);上 述平坦化材料可作為彩色濾光片之表面保護層,防止紅、 綠、藍色材間的混色,避免它們在後續的製程中遭到不必 要損傷,同時也兼具著避免此等色材臈與遮光層間的高度 產生落差使其平坦化。該平坦化材料包括熱硬化型樹脂 或感光性樹脂,其中感光性樹脂並無特別的限制,可為正 型或負型之感光性樹脂組成物。一般而言感光性樹脂組成 物包含:鹼可溶性之黏結樹脂(binder resin)、感光性化合 物、光起始劑及溶劑等成份。本發明之清洗液尤適合使用 在清洗多餘的間隙材光阻劑及平坦化材料。 實施例 以下實施例將對本發明做進一步之說明,唯非用以限制 本發明之範圍,任何熟悉本發明技術領域者,在不違背本
發明之精神下所得以達成之修飾及變化,均屬於本發S 範圍。 X 109023.doc 1323391 [清洗液之評價方式i 一、洗淨效果:於玻璃基板上,以旋轉塗佈方式,藉離 心力將光阻劑擴散塗佈後’在基板之邊緣部份以清洗液浸 潰10秒鐘,再以水沖洗,然後以目視觀察基板邊緣之光阻 劑層經過洗淨後是否為直線β 〇 :直線性佳 △:直線性差 X :洗邊不良 一、殘渣.以5 0倍之顯微鏡觀察上述玻璃基板上經邊縫 移除劑(Edge Bead Remover ”EBR")洗淨後之洗淨部位是否 有殘渣;或於曝光顯影製程後以上述方法觀察殘渣狀況。 〇 :無殘渣 X :有殘渣 三、膨潤性:以觸針式段差測定器(Tenc〇F a_5〇〇surfaee scan)測疋,計算其清洗斷面膜厚和内側膜厚之膜厚增加率。 〇 :膜厚增加率< 5 °/。以下 X :膜厚增加率> 5 %以下 [較佳實施例之說明] [實施例1] 在X 10cm之玻璃基板上,以旋轉方式藉離心力將 下述間隙材絲劑塗佈在基板後,以1()·2_真空乾燥Μ 秒後’將此尚未曝光之基材㈣緣料浸潰於清洗液令約 H)秒鐘,以;青洗基板週邊之突起&,然後以水洗淨,洗淨 後之物性如表i所示。並以顯微鏡觀察基板邊緣,可知立 I09023.doc •10· 1323391 洗淨效果佳、無殘渔’且不會在界面位置對光阻劑產生膨 潤’而造成即使在顯影後仍無法去除之情形。之後再將此 材料以曝光機(150mJ/cm2)曝光並以KOH型顯影液顯影60 私之後,以顯微鏡觀察基板上間隙材光阻劑與EBR清洗液 之接觸界面(為未曝光位置),結果並無殘留現象。 [實施例2 ~4及比較例1〜1 0] 同實施例1之操作方式,惟估 八限使用如表1所示具不同組成之 >月洗液,洗淨後之結果載於表丨中。 109023.doc 1323391 ' * 表1:本發明各實施例及比較例之各清洗液的組成與實驗結果 項 目 清洗液組成(重量%) 性能 溶媒 鹼性化 合物1 2 醇胺類 化合物(e) 界面活 性劑3 EBR洗淨 後之殘留 曝光顯影 後之殘渣 膨潤 性 直線 性 有機 溶劑⑻ 水 實 施 例 1 30 51 8 6 5 0 0 0 0 2 50 23 0 15 12 〇 0 〇 〇 3 40 42 12 1 5 〇 0 〇 〇 4 10 64 8 8 10 〇 0 0 0 比 較 例 1 0 74 8 8 10 〇 X X 〇 2 40 47 8 0 5 X 0 0 X 3 40 45 10 5 0 X 0 0 X 4 40 14 8 8 30 〇 X X X 5 40 10 30 10 10 〇 X X X 6 40 10 10 30 10 〇 X X 〇 (a) : PGME(Dow Chemical)
109023.doc -12- 1 : TMAH(多聯科技) 2 : MEA(東聯化學) 3 : Triton X-100(Dow Chemical)
Claims (1)
- 98-12-23 98-12-23 义年a月9曰修正本 十、申請專利範圍 1·一種清洗液組成物,其包括:(A)O.l〜25重量%之 蛉性化合物;(B)〇.l〜20重量%之醇胺類化合物;(C)0.5〜20 重量%之界面活性劑;(D)10-40重量%之可與水互溶之溶 劑;及(E) 40_7〇重量%之水。 2. 如請求項1之清洗液組成物,其中該鹼性化合物 為四級銨鹽。 3. 如請求項2之清洗液組成物,其中該鹼性化合物 為氫氧化四曱錢。 4. 如請求項1之清洗液組成物,其中該驗性化合物 之用里為2至重量%。 5. 如請求項1之清洗液組成物,其中該醇胺類化合 物係選自由乙醇胺、二乙醇胺、三乙醇胺、2 — (2一胺基 乙氧基)乙醇、單異丙醇胺、二異丙醇胺、三異丙醇胺、 正乙基乙醇胺、正丁基乙醇胺及其混合物所構成群組。 6. 如味求項1之清洗液組成物,其中該醇胺類化人 物之用量為1至8重量%。 、 口 其中该界面活性劑 7.如晴求項1之清洗液組成物, 為非離子型界面活性劑。 8.如請求項i之清洗液組㈣’其中該溶劑為n_ 石細' 環己酮、甲基°比咯酮、Ψ 二醇与 醇單乙 1323391 98-12-23 10. —種清洗顯示器用面板或彩色濾光片之基板週 邊不必要的光阻劑或平坦化材料之方法,包括使用如請 求項1之清洗液組成物。 11. 如請求項10之方法,其中光阻劑為間隙材光阻 劑。14
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US7642043B2 (en) * | 2005-11-16 | 2010-01-05 | Shin-Etsu Chemical Co., Ltd. | Rework process for photoresist film |
JP4597844B2 (ja) * | 2005-11-21 | 2010-12-15 | 信越化学工業株式会社 | フォトレジスト膜のリワーク方法 |
KR20110018775A (ko) | 2009-08-18 | 2011-02-24 | 삼성전자주식회사 | 컬러 필터 박리용 조성물 및 이를 이용한 컬러 필터 재생 방법 |
CA2871957C (en) * | 2013-11-25 | 2019-05-07 | Crayola Llc | Marking system |
CN110684602A (zh) * | 2019-09-19 | 2020-01-14 | 江华飞信达科技有限公司 | 一种lcd基板清洗剂及其使用方法 |
TWI749964B (zh) * | 2020-12-24 | 2021-12-11 | 達興材料股份有限公司 | 鹼性清洗組合物、清洗方法和半導體製造方法 |
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US20030138737A1 (en) * | 2001-12-27 | 2003-07-24 | Kazumasa Wakiya | Photoresist stripping solution and a method of stripping photoresists using the same |
JP2004101849A (ja) * | 2002-09-09 | 2004-04-02 | Mitsubishi Gas Chem Co Inc | 洗浄剤組成物 |
US9217929B2 (en) * | 2004-07-22 | 2015-12-22 | Air Products And Chemicals, Inc. | Composition for removing photoresist and/or etching residue from a substrate and use thereof |
US7632796B2 (en) * | 2005-10-28 | 2009-12-15 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
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