TWI303456B - - Google Patents

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Publication number
TWI303456B
TWI303456B TW91112715A TW91112715A TWI303456B TW I303456 B TWI303456 B TW I303456B TW 91112715 A TW91112715 A TW 91112715A TW 91112715 A TW91112715 A TW 91112715A TW I303456 B TWI303456 B TW I303456B
Authority
TW
Taiwan
Prior art keywords
phase shift
photoresist
layer
transparent substrate
attenuating
Prior art date
Application number
TW91112715A
Other languages
English (en)
Chinese (zh)
Inventor
Jia-Yang Zhang
Tyng Hao Hsu
Johnson Hung
Jin-Xiang Lin
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Priority to TW91112715A priority Critical patent/TWI303456B/zh
Application granted granted Critical
Publication of TWI303456B publication Critical patent/TWI303456B/zh

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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW91112715A 2002-06-11 2002-06-11 TWI303456B (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW91112715A TWI303456B (enExample) 2002-06-11 2002-06-11

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW91112715A TWI303456B (enExample) 2002-06-11 2002-06-11

Publications (1)

Publication Number Publication Date
TWI303456B true TWI303456B (enExample) 2008-11-21

Family

ID=45070718

Family Applications (1)

Application Number Title Priority Date Filing Date
TW91112715A TWI303456B (enExample) 2002-06-11 2002-06-11

Country Status (1)

Country Link
TW (1) TWI303456B (enExample)

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees