TWI303354B - - Google Patents

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Publication number
TWI303354B
TWI303354B TW095101066A TW95101066A TWI303354B TW I303354 B TWI303354 B TW I303354B TW 095101066 A TW095101066 A TW 095101066A TW 95101066 A TW95101066 A TW 95101066A TW I303354 B TWI303354 B TW I303354B
Authority
TW
Taiwan
Prior art keywords
photosensitive resin
compound
group
coating film
resin composition
Prior art date
Application number
TW095101066A
Other languages
English (en)
Chinese (zh)
Other versions
TW200636385A (en
Inventor
Masaki Sasaki
Masao Arima
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Publication of TW200636385A publication Critical patent/TW200636385A/zh
Application granted granted Critical
Publication of TWI303354B publication Critical patent/TWI303354B/zh

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02F—DREDGING; SOIL-SHIFTING
    • E02F7/00—Equipment for conveying or separating excavated material
    • E02F7/06—Delivery chutes or screening plants or mixing plants mounted on dredgers or excavators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03B—SEPARATING SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS
    • B03B5/00—Washing granular, powdered or lumpy materials; Wet separating
    • B03B5/62—Washing granular, powdered or lumpy materials; Wet separating by hydraulic classifiers, e.g. of launder, tank, spiral or helical chute concentrator type
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F11/00—Treatment of sludge; Devices therefor
    • C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
    • C02F11/121—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering
    • C02F11/125—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering using screw filters
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F11/00—Treatment of sludge; Devices therefor
    • C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
    • C02F11/121—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering
    • C02F11/127—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering by centrifugation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/007—Contaminated open waterways, rivers, lakes or ponds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/008—Mobile apparatus and plants, e.g. mounted on a vehicle

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mining & Mineral Resources (AREA)
  • Water Supply & Treatment (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Civil Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
TW095101066A 2005-02-09 2006-01-11 Photosensitive resin composition for display panel, its hardened material, and spacer for display panel TW200636385A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005032642A JP2006220790A (ja) 2005-02-09 2005-02-09 表示パネル用感光性樹脂組成物、及びその硬化物並びに表示パネル用スペーサー

Publications (2)

Publication Number Publication Date
TW200636385A TW200636385A (en) 2006-10-16
TWI303354B true TWI303354B (fr) 2008-11-21

Family

ID=36918838

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095101066A TW200636385A (en) 2005-02-09 2006-01-11 Photosensitive resin composition for display panel, its hardened material, and spacer for display panel

Country Status (4)

Country Link
JP (1) JP2006220790A (fr)
KR (1) KR100736295B1 (fr)
CN (1) CN100582937C (fr)
TW (1) TW200636385A (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100741297B1 (ko) * 2005-09-30 2007-07-20 주식회사 동진쎄미켐 감광성 수지 조성물
JP5002479B2 (ja) * 2007-02-16 2012-08-15 太陽ホールディングス株式会社 硬化皮膜パターン形成用組成物及びそれを用いた硬化皮膜パターン作製方法
JP5050693B2 (ja) * 2007-07-10 2012-10-17 日立化成工業株式会社 感光性樹脂組成物及び感光性フィルム、並びに、永久マスクレジスト及びその製造方法
JP2010002886A (ja) * 2008-05-21 2010-01-07 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
KR101121038B1 (ko) 2008-07-01 2012-03-15 주식회사 엘지화학 복수의 광개시제를 포함한 감광성 수지 조성물, 이를 이용한 투명 박막층 및 액정 표시 장치
WO2010002129A2 (fr) * 2008-07-01 2010-01-07 주식회사 엘지화학 Composition de résine photosensible contenant plusieurs photoinitiateurs, et couche de film mince transparente et afficheur à cristaux liquides l'utilisant
SG174576A1 (en) * 2009-04-14 2011-10-28 Sumitomo Bakelite Co Photosensitive resin composition, adhesive film, and light receiving device
KR101495533B1 (ko) * 2010-12-21 2015-02-25 동우 화인켐 주식회사 스페이서 형성용 감광성 수지 조성물, 이를 이용하여 제조된 표시 장치용 스페이서 및 이를 포함하는 표시 장치
JP6084353B2 (ja) * 2010-12-28 2017-02-22 太陽インキ製造株式会社 光硬化性樹脂組成物の製造方法、ドライフィルムの製造方法、硬化物の製造方法およびプリント配線板の製造方法
JP5196063B2 (ja) * 2012-07-26 2013-05-15 日立化成株式会社 感光性樹脂組成物及び感光性フィルム、並びに、永久マスクレジスト及びその製造方法
KR101992866B1 (ko) * 2013-02-06 2019-06-25 동우 화인켐 주식회사 착색 감광성 수지 조성물
JP2013140379A (ja) * 2013-02-07 2013-07-18 Hitachi Chemical Co Ltd 感光性樹脂組成物、感光性フィルム、永久マスクレジストの製造方法及び永久マスクレジスト
JP7495272B2 (ja) * 2020-04-30 2024-06-04 サカタインクス株式会社 ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05281728A (ja) * 1992-04-01 1993-10-29 Fuji Photo Film Co Ltd 光重合性組成物
WO2003072614A2 (fr) * 2002-02-28 2003-09-04 Showa Denko K.K. Compose thiol, composition d'initiateur de photopolymerisation et composition photosensible
JP2003345015A (ja) * 2002-05-29 2003-12-03 Sumitomo Chem Co Ltd 感光性樹脂組成物
JP2004177498A (ja) * 2002-11-25 2004-06-24 Nippon Shokubai Co Ltd 光硬化性樹脂組成物およびその用途
JP2004302049A (ja) * 2003-03-31 2004-10-28 Hodogaya Chem Co Ltd 感光性樹脂組成物
JP4345348B2 (ja) * 2003-05-09 2009-10-14 Ｊｓｒ株式会社 垂直配向型液晶表示素子用の突起および垂直配向型液晶表示素子用のスペーサーの形成方法
WO2004109403A1 (fr) 2003-06-02 2004-12-16 Toray Industries, Inc. Composition de resine photosensible, et composant electronique et affichage comportant une telle composition

Also Published As

Publication number Publication date
KR20060090605A (ko) 2006-08-14
CN100582937C (zh) 2010-01-20
KR100736295B1 (ko) 2007-07-06
CN1818780A (zh) 2006-08-16
JP2006220790A (ja) 2006-08-24
TW200636385A (en) 2006-10-16

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