TWI301515B - Surface treating agent of metal - Google Patents

Surface treating agent of metal Download PDF

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Publication number
TWI301515B
TWI301515B TW094106391A TW94106391A TWI301515B TW I301515 B TWI301515 B TW I301515B TW 094106391 A TW094106391 A TW 094106391A TW 94106391 A TW94106391 A TW 94106391A TW I301515 B TWI301515 B TW I301515B
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Taiwan
Prior art keywords
surface treatment
salt
molecule
treatment agent
metal
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TW094106391A
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Chinese (zh)
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TW200533783A (en
Inventor
Takashi Ouchi
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Nippon Mining Co
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/06Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
    • C23C22/48Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates
    • C23C22/58Treatment of other metallic material
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof
    • H05K3/3478Applying solder preforms; Transferring prefabricated solder patterns

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroplating Methods And Accessories (AREA)

Description

1301515 九、發明說明: 【發明所屬之技術領域】 ^本發明係關於金屬、尤其是Sn及如合金之表面處理 劑,及使用該表面處理劑之表面處理方法。再者,本發明 係關於經該表面處理方法處料之電子零件、基板、焊錫 求(solder ball)、知錫粉(sc>ider pGwder),及使用該焊 錫球之球栅陣列⑽:ball grid町㈣、使用該焊錫粉 之知錫1¾、使用该荨表面處理劑之安裝品。 【先前技術】 烊接係使用炫點較低之物質而使物體間接合之技 術’而在現代產業中’廣泛使用於電子機器的接合、组菜 等。-:所使用之焊錫為㈣合金,其共晶組成(s/ 至叫之融點低至靴,故其焊接係在220 =C下貫施’故對於電子零件或基板,幾乎不會造成 熱相%。而且,Sn-Pb入+新目女> # D σ金所具有之特徵係焊接性良好, •r=:tr即凝固,而於谭接部即使施加振動,亦很 難造成龜裂或剝離之優點。 一以外框或基板等之合成樹腊與導體 ”忙海而形成,廢棄處理 幾乎全部埋入地下。近年來,卩备卜人允处枉,叩 心"、迎年工降至地面之雨有顯示酸性之 侦向(S文雨),會使埋入地 染地下水而形成問題。因此,特:::的谭錫溶出,使污 in隹S釦τ人 寸另J在电子機器業界中,正 遠;^朝不含錯之焊錫(無Μ錫)的替代趨勢。 在琶子零件之外部導線端子 m為犍升其焊錫浸潤 316814 5 1301515 性與咖性,主要實施焊錫電鑛(Sn 9〇%,其餘為此), 並期目分能達到無錯化。無錯焊錫電鑛之候選材料大致上雖 可區分為純 Sn、Sn-Ag(CU)系、、Sn_Zn 系、 各有其優缺點,至今尚未達可完全取代合金。 、純Sn電鍍,就成本或電鍍的作業性等综合上來看, 以無錯電鑛為最佳。但Sn電鑛層因表面之氧化或鹿 力’容易產生金屬(錫)鬚外,且焊錫浸潤性易隨時間而〜劣 化’針對此課題乃強烈要求其改善。 由於Sn-Zn系合金與以往之Sn,系合金的融點相 i,在不須改變目前設備或製程之點上為有利。又,恭鲈 被膜之機械強度優異’在成本上亦優。但,Zn為活性:: 屬’故易氧化’由於Sn-Zn系合金之焊接浸潤性極差,因 此,認為就目前而言,被實用化之可能性最低。 焊錫膏係被使用來將電子零件表面安裝於基板,近年 來其使用量大增。焊錫膏一般係以焊錫合金粉末作為主 體’再加上含有粘著劑、活性劑、搖變劑、界面活性劑、 冷劑寺之助焊劑者。就焊錫膏之無鉛化而言,雖就% /CIO系合金、Sn-Zn系合金、Sn_Bi系合金加以研究,但 =-曰Zn系合金係如前述般5由於接近以往Sn_pi〇系焊錫的 共晶溫度,故成為取代之最佳的候選材料。但,如前述般, Zn易被氧化,故使用Sn_Zn系合金作為焊錫粉之焊錫膏係 與助焊劑所含有之活性劑產生氧化反應,焊錫浸潤性、保 存女疋性會明嘁變差,因此便產生回焊時必具有惰性氣體 之缺點。 ”版 316814 6 1301515 t · 對應此等之問題 特願 2002-304554 號 於.具有一個或二個 其鹽。 ,本發明人等於專利文獻(日本專利 )中提出一種表面處理劑,其特徵在 之飽和或不飽和烷基的酸性磷酸酯及 提出ί獻2(日本專利特開平7-188942號公報)中, 酸二苯基醋所構成。 由a-本基s曰及/或亞磷 度術中之磷酸㈣㈣酸3旨係經由受較高溫 分的抗氧化效果。因此,在上述技術中,一般要^ 溫度比以往還高之i ^焊 、干接 乃很困難。 錫對應的^Sn合金材之氧化 專利文獻1 : 專利文獻2 : 【發明内容】 日本專利特願2002-304554號 曰本專利特開平7-188942號公報 I日狀目的在於提供—種對金屬、尤其是%及如 …r予耐氧化性,改善焊錫浸潤性之表面處理劑。進一 步’本發明之目的在於提供—種可抑制%及 屬鬚發生的表面處理劑。 口孟之金 本舍明人等對於金屬、尤其是%及如合金表 氧化,經專心研究結果,發現以含有在—分子内具有2個 以上的膦酸基且於分子内不含醋鍵之化合物及/或其鹽中 1種或2種以上且该化合物及/或其鹽之含量總計為 0.01g/L以上的表面處理劑進行表面處理,可賦予耐氧化 316814 1301515 入=料錫浸潤性。Λ,可見到含有經此表面處理之 口_=錫粉的焊錫膏在保存安定性方面明顯改善 經此表面處理之Sn及Sn合金,金屬鬚的發生受到大幅:制。 亦即,本發明係如下所述。 (!) 一種金屬表面處理劑,其特徵在於:含有於一八 有2個以上的膦酸基且於分子内不含賴之化合: 入/ J、皿中之1種或2種以上,且該化合物及/或其鹽之 含量總計為0.01g/L以上。 孤之 (2) —種金屬表面處理劑,其特徵在於:含有於一分 :内具有2個以上的膦酸基且於分子内不含g旨鍵之化合物 :/曰或其鹽中之!種或2種以上,且該化合物及/或其鹽之 3里、”心δ十為〇. 01g/L以上;以及將該金屬表面處理劑溶液 之pH調整至5以下。 (3) 如上述(2)記載之金屬的表面處理劑,其中,進 一步含有界面活性劑〇. Olg/L至1〇g/L。 (4) 如如述(1)至(3)中任一項之金屬的表面處理劑, 其特徵在於:於上述一分子内具有2個以上的膦酸基、且 於分子内不含酯鍵之化合物、及/或其鹽為以下述式(j)、 (II)或(III)所示之化合物、及/或其鹼金屬鹽、銨鹽、 或與胺化合物所成之鹽: Ν 1 Γ X丨C丨γ ί ΟΠΝΡ丨ο ι Ηο Η Η)Ηο ο I Η I Η ΟΜΠΡ丨ο οπρ1ο X2—c—γ2χ3—C—γ3 8 316814 1301515 (式(I)中,^至)^及丫:至^可相同或相異,各表示氫 原子、或碳數1至5的低級烷基); R1 R3 (Π) r2^>N-[CH2 ~CH2~N]ft~R4 (式(I I )中,R〗、}^及R4可相同或相異,各表示以下之 基(A),R3表示以下之基(A)或碳數1至5低級烷基;n 為1至3的整數;該基(a )為:1301515 IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a surface treatment agent for metals, particularly Sn and alloys, and a surface treatment method using the surface treatment agent. Furthermore, the present invention relates to an electronic component, a substrate, a solder ball, a solder powder (sc> ider pGwder), and a ball grid array (10) using the solder ball by the surface treatment method: a ball grid Machi (4), the use of the solder powder, the tin 13b, and the use of the surface treatment agent. [Prior Art] The splicing system is a technique for joining objects between objects with low smudges, and is widely used in the art of joining and grouping of electronic machines in the modern industry. -: The solder used is (4) alloy, its eutectic composition (s/ to the melting point is as low as the boot, so the welding system is applied under 220 = C), so it will hardly cause heat for electronic parts or substrates. In addition, Sn-Pb is in + new mesh female># D σ金 has the characteristics of good weldability, • r=:tr is solidified, and even if vibration is applied to the tan joint, it is difficult to cause turtles. The advantages of cracking or peeling. A synthetic tree wax and a conductor such as a frame or a substrate are formed by the busy sea, and almost all of the waste disposal is buried underground. In recent years, the 卩 卩 人 允 允 允 允 允 允 、 、 、 、 、 、 、 、 、 When the rain drops to the ground, it shows the detection of acidity (S Wenyu), which will cause problems in the groundwater staining. Therefore, the special::: Tan Xi dissolves, so that the pollution in隹S deducts τ people J is in the electronic equipment industry, Zhengyuan; ^ instead of the wrong solder (no antimony tin) replacement trend. The external wire terminal m of the tweezers parts is soaring its solder infiltration 316814 5 1301515 sex and coffee, mainly The implementation of soldering iron ore (Sn 9〇%, the rest for this), and the goal can be achieved without error. No error soldering iron ore Although the candidate materials can be roughly classified into pure Sn, Sn-Ag (CU), and Sn_Zn, each has its advantages and disadvantages, and has not yet completely replaced the alloy. Pure Sn plating, cost or plating workability, etc. On the whole, it is best to use the error-free electric ore. However, the Sn electric ore layer is easy to produce metal (tin) due to surface oxidation or deer force, and the solder wettability is easy to deteriorate with time. It is strongly demanded to improve. Because of the melting point of the Sn-Zn alloy and the conventional Sn, the alloy is advantageous in that it does not need to change the current equipment or process. Also, the mechanical strength of the film is excellent. Zn is also active. However, Zn is active:: It is easy to oxidize. Because Sn-Zn alloy has poor weld wettability, it is considered to be the least likely to be put into practical use at present. Solder paste is Used to mount the surface of electronic parts on the substrate, its use has increased greatly in recent years. Solder pastes are generally based on solder alloy powders, plus additives, active agents, shakers, surfactants, refrigerants. Temple fluxer. Solder In the lead-free solder paste, the %/CIO-based alloy, the Sn-Zn-based alloy, and the Sn_Bi-based alloy were studied. However, the =-曰Zn-based alloy was as described above because of the eutectic near the conventional Sn_pi-based solder. The temperature is the best candidate for substitution. However, as described above, since Zn is easily oxidized, the Sn_Zn-based alloy is used as the solder paste of the solder powder and the active agent contained in the flux generates an oxidation reaction, and the solder wettability is obtained. The preservation of the virginity will be abrupt, so there will be a disadvantage of inert gas when reflowing." 316814 6 1301515 t · Corresponding to these problems, the special wish 2002-304554 has one or two of its salt. The inventors of the present invention have a surface treatment agent which is characterized in that it is characterized by an acid phosphate of a saturated or unsaturated alkyl group and a proposal 2 (Japanese Patent Laid-Open No. Hei 7-189942). It is composed of acid diphenyl vinegar. The phosphoric acid (tetra)(tetra)acid 3 in the a-base s and/or phosphorous is intended to pass the antioxidant effect of the higher temperature. Therefore, in the above technique, it is generally difficult to heat and dry the solder which is higher than the conventional one. Oxidation of a tin-corresponding material of a tin-based alloy material Patent Document 2: Patent Document 2: [Patent Document 2] Japanese Patent Application No. 2002-304554, Japanese Patent Application No. Hei No. 7-188942 In particular, % and such surface treatment agents which are resistant to oxidation and improve solder wettability. Further, the object of the present invention is to provide a surface treatment agent which suppresses % and the occurrence of whiskers. Mouth Mengjin, Jinben, and others, for the oxidation of metals, especially % and alloys, have been concentrating on the results and found that they contain more than two phosphonic acid groups in the molecule and do not contain vinegar bonds in the molecule. A surface treatment agent containing one or more of the compound and/or a salt thereof and having a total content of the compound and/or a salt thereof of 0.01 g/L or more is subjected to surface treatment to impart oxidation resistance to 316814 1301515. . Λ, it can be seen that the solder paste containing the surface treated _= tin powder is significantly improved in terms of preservation stability. The surface treatment of Sn and Sn alloys, the occurrence of metal whiskers is greatly affected: system. That is, the present invention is as follows. (!) A metal surface treatment agent which contains one or more of two or more phosphonic acid groups in a molecule and which does not contain a molecule in the molecule: The content of the compound and/or its salt is 0.01 g/L or more in total. (2) A metal surface treatment agent characterized by containing a compound having two or more phosphonic acid groups in the molecule and containing no g bond in the molecule: /曰 or its salt! 2 or more, and 3 of the compound and/or its salt, "heart δ ten is 〇. 01g / L or more; and the pH of the metal surface treatment agent solution is adjusted to 5 or less. (3) (2) The surface treatment agent of the metal according to any one of (1) to (3), wherein the surface treatment agent of the metal is further contained in the range of (1) to (3). A surface treatment agent which has two or more phosphonic acid groups in the above-mentioned molecule and which does not contain an ester bond in the molecule, and/or a salt thereof is represented by the following formula (j), (II) or a compound represented by (III), and/or an alkali metal salt thereof, an ammonium salt, or a salt with an amine compound: Ν 1 Γ X丨C丨γ ί ΟΠΝΡ丨ο ι Ηο Η Η)Ηο ο I Η I Η ο οπρ1ο X2—c—γ2χ3—C—γ3 8 316814 1301515 (in the formula (I), ^ to) ^ and 丫: to ^ may be the same or different, each represents a hydrogen atom, or a carbon number of 1 to 5 Lower alkyl); R1 R3 (Π) r2^>N-[CH2 ~CH2~N]ft~R4 (in formula (II), R, }, and R4 may be the same or different, each representing the following Based on (A), R3 represents the following group (A) or carbon 1-5 lower alkyl group; n is an integer of 1 to 3; the group (a) is:

X1 〇 I II (A)X1 〇 I II (A)

一C—P—OH I I Y1 OH 基(A)巾’ X】及γ!係與通式⑴中之定義相同); 0X0A C—P—OH I I Y1 OH group (A) towel 'X】 and γ! is the same as defined in the general formula (1); 0X0

II I II (III)II I II (III)

卜f—C一P—OH I I I卜 f—C—P—OH I I I

HO Y OH :—(1 )巾X表7F氫原子或碳數1至5的低級燒基 , 氫原子、碳數1至5的低級燒基、經基或胺基)。 (5)上述(1)至 南I甘 中任一項之金屬的表面處理 W,八中,上述金屬為Sn或Sn合金。 ^ 一種表面處理方法,其係以上述⑴至(5) 壬項之金屬表面處理劑進行。 其(:)一種電子零件或基板’其特徵在於:於電子裳 件或基板_接端子部㈣ ^ ⑴二處理方法進行表面處理。 )種烊錫球或焊錫粉,立 "其扣被在於··使用以上 316814 9 1301515 述(6 ) έ己載之表面處 r _ 万去進行表面處理之Sn合金。 载之丈曰錫^1球拇陣列’其特徵在於:使用上述(8)記 戰之坏錫球作為電連接構件。 (10) —種安奘口 .+ 女忒°σ,其特徵在於:將上述(8)記載 之^錫球㈣於電切件,再連接於電路絲。 载之焊錫粉。〒錫月’其特徵在於:使用上述(8)記 載之種安裂品’其特徵在於:使用上述⑻記 【實施方式】 以下詳述有關本發明《表面處理劑 、以本發明之表面處理劑所處理之金屬係可列舉如: 6辦 Nl Co、Cr、Cu、Zn、Sn、Al、Mg、ΤΙ、Ag、Au 等, 此寻可為合金。尤官主 U且為Sn及Sn合金,Sn合金係就環境污 _問題而言,更宜不含鉛之Sn合金。不含鉛之如合 金係可列舉如:於Sn中含有Zn、Bi、Cu、In、Ag、Sb之 任者或二者以上的焊錫合金等。 A ^以含有一分子内具有2個以上的膦酸基且於分子内不 含酯鍵之化合物及/或其鹽且該化合物及/或其鹽之含量總 十為0· 01 g/L以上的表面處理劑進行表面處理,可對處理 材表面賦予耐氧化性、改善焊錫浸潤性。 一分子内具有2個以上的膦酸基、且於分子内不含酯 鍵之化合物、及/或其鹽之量若不足〇· Olg/L·時,其效果报 小。反之,即使添加量過多,由於特性不會劣化,而添加 316814 1301515 5量=上限’但因成本上的問題,添加量宜為ο. (η至 50〇g/L,更宜為 〇.!至 1〇〇g/L。 又’本發明之表面處理劑係使用分子内不含醋鍵之^ =H❹處理而所產生之s旨鍵的分解,即使在比輕 進打熱處理,亦可得到充分的抗氧化效果。因此, 焊接溫度比以往較高的無錯焊錫所對應的如及 Sn& ^才,亦可賦?充分的耐氧化性。 -分子内具有2個以上膦酸基之化 :膦=為一個的化合物,在詳細機制方面=二 可知耐氧化性能優異。一分子 面而言宜為2至6。 …夂基之數目就成本方 泣於一分子内具有2個以上的膦酸基且於分子内不人妒 -之化合物及/或其鹽,可舉例如以下述 3 -曰 或(⑴)所示之化合物及/或其鹼 、:)、(11) 化合物之鹽: 1 叙鹽、或與胺 φ N 1 13 X丨c丨γ ! οηπριο I Η ο Η Η Η ο ο 一 Η I Η ΟΗΡ丨ο οηπρIο 2 一 2 3 一 3 xlc—γ xlc—γ (式(I)中,至P及MP可相同或相異 原子、或碳數1至5的低級烷基); 又不HO Y OH :—(1 ) towel X Table 7F hydrogen atom or a lower alkyl group having 1 to 5 carbon atoms, a hydrogen atom, a lower alkyl group having a carbon number of 1 to 5, a trans group or an amine group). (5) Surface treatment of a metal according to any one of the above (1) to (N), wherein the metal is Sn or a Sn alloy. A surface treatment method which is carried out by the metal surface treatment agent of the above (1) to (5). The (:) electronic component or substrate is characterized in that it is surface-treated in an electronic dressing or substrate_terminal portion (four) ^ (1). ) 烊 烊 solder ball or solder powder, stand " Its buckle is used ··· Use 316814 9 1301515 (6) 表面 载 载 载 载 载 载 έ έ 去 去 去 去 去 去 去 去 去 去 去 去 去 去 去 去 去 去 去 去The 拇 曰 tin ^ 1 ball thumb array ‘ is characterized in that the bad solder ball of the above (8) is used as the electrical connection member. (10) - An 奘 . + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + Solder powder. 〒 月 ' ' 其 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 使用 ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' The metal to be treated may be, for example, 6 Nl Co, Cr, Cu, Zn, Sn, Al, Mg, yttrium, Ag, Au, etc., which may be an alloy. The main official U is Sn and Sn alloy, and the Sn alloy is more suitable for environmental pollution. Examples of the alloy containing no lead include, for example, a solder alloy containing Zn, Bi, Cu, In, Ag, Sb or more in Sn. A ^ contains a compound having two or more phosphonic acid groups in one molecule and having no ester bond in the molecule, and/or a salt thereof, and the total content of the compound and/or its salt is 0.01 g/L or more. The surface treatment agent is subjected to surface treatment to impart oxidation resistance to the surface of the treated material and to improve solder wettability. When the amount of the compound having two or more phosphonic acid groups in one molecule and the ester bond is not contained in the molecule, and/or the salt thereof is less than 〇· Olg/L·, the effect is small. On the other hand, even if the amount added is too large, since the characteristics are not deteriorated, the amount of 316814 1301515 5 = upper limit is added, but the amount of addition is preferably ο. (η to 50〇g/L, more preferably 〇. Further, the surface treatment agent of the present invention is obtained by the treatment of the s key generated by the treatment of the ^=H❹ in the molecule without the vinegar bond, even if it is heat-treated by light weighting. It has a sufficient anti-oxidation effect. Therefore, the welding temperature is higher than that of the conventional high-error-free solder, such as Sn& ^, and it can also impart sufficient oxidation resistance. - There are two or more phosphonic acid groups in the molecule. : phosphine = one compound, excellent in oxidation resistance in terms of detailed mechanism = 2. It is preferably from 2 to 6 in one molecule. The number of sulfhydryl groups is more than two phosphines in one molecule. Examples of the compound and/or a salt thereof which are acid-based and intrinsic in the molecule include a compound represented by the following 3-indene or ((1)) and/or a base thereof: a salt of the compound: (11): 1 salt, or with amine φ N 1 13 X丨c丨γ ! οηπριο I Η ο Η Η Η ο ο 一Η I Η ΟΗΡ丨ο οηπρIο 2 - 2 3 - 3 xlc - γ xlc - γ (in the formula (I), the P or MP may be the same or a different atom, or a lower alkyl group having a carbon number of 1 to 5);

Ri f -[CH2 - CH2 - N]n-R4 316814 11 (II) 1301515 (式(II)中,R1、RlV可相同或相異,各表示以下之 基(A);R3係表示以下之基(A)或碳數i至5的低級烷基; η為1至3的整數;該基(幻為 Η? Ηο= ρ 1 ο X1— c —γ1Ri f -[CH2 - CH2 - N]n-R4 316814 11 (II) 1301515 (In the formula (II), R1 and RlV may be the same or different and each represents the following group (A); R3 represents the following group (A) or a lower alkyl group having a carbon number of i to 5; η is an integer of 1 to 3; the base (phantom is Η? Ηο= ρ 1 ο X1 - c - γ1

A 基(A)中’ χι及γι係與通式(u中之定義相同 ο Η Ηοί Η ο = Ρ 丨 ο I X — CIY I ΟμηρIn the base A (A), the 'χι and γι lines are the same as the formula (as defined in u) ο Η Ηοί Η ο = Ρ 丨 ο I X — CIY I Ομηρ

(I ο Η (式(111)中,χ表示氫原子、或碳數i至5的低級烷基·, Y仏表示氫原子、碳數1至5的低級烷基、羥基或胺基)。 以上述通式(I)所示的化合物中,由於在工業上可 取得氰基三伸曱基膦酸等,故尤佳。 同樣地,以上述通式(II)所示的化合物尤宜為乙二 _胺四伸曱基膦酸、二乙三胺五伸曱基膦酸等。 以上述通式(111 )所示的化合物尤宜為1 —經乙烧 1 > 1 ~'—麟酸等。 上述化合物之鹼金屬鹽宜為鈉鹽、鉀鹽等,與胺化合 物之鹽宜為三乙胺鹽或三乙醇胺鹽等。 本發明之表面處理劑係可使用一分子内具有2個以上 的膦酸基、且於分子内不含酯鍵之化合物、及/或其鹽溶解 於溶劑中者。所使用之溶劑只要可溶即可,並無特別限制。 例士水或醇、乙二醇等之極性溶劑,但若考量溶解度、 成本等,則宜為水。 又 12 316814 1301515 ,系表面處理劑時發現藉由將pH調製至5以下,被 :斜::之:乳化性進一步提高。表面處理劑之pH係有鑑 浐可取二的影響,更宜為PH1至5。PH調整劑係可使用一 叙可取得之酸、鹼。 001至^面處理劑中添加界面活性劑 性會更二提?=、至5以下,被處理表面之雜 進。界面活性劑之添加量不足〇〇lg/升, s P使添加超過1Gg/L’ Φ無法得到耐氧化性 面活性劑之添加量宜為0.〗至1〇g/L。 政果” 界面活性劑係可適當選擇使用市售之陰 子系、崎系、及兩性界面活性劑的-種或2二: 陰離子糸界面活性劑宜為硫酸㈣型、韻 酸醋鹽型、磺基旨型等,陽離子系界面^ ^ :=:鹽型等,非離子系界面活性劑宜為高級= ::==、烧絲環氧乙烧加成物、聚氧乙烯聚氧 丙烯心又“物 '乙二胺之聚氧乙烯聚氧丙烯嵌 物、高級脂肪族胺之環氧乙烧加成物、脂肪族酿胺之縣 乙说加成物寺’兩性界面活性劑宜為胺基酸型、终驗 寻。 使用PH為5以下之範圍時宜適當選擇使用陰 系=離:系的!種或2種以上。其中,非離子系界面活 性费J中尤且為聚乙二醇型’尤其可使用高級醇 成物:,基_氧乙烧加成物、聚氧乙烤聚氧丙烯嵌二; 合物寺’又’陰離子系界面活性劑中尤宜為硫酸赌鹽型、 316814 13 1301515 碟酸I旨鹽型。 又,本發明之表面處理劑在賦予所希望的性能之目的 ^亦可含有不損及原本的性質之範圍的量之添加劑。添加 剤可列舉如:防腐劑、pH緩衝劑等,此等係可使用以往 習知者。 使用本發明之表面處理劑而處理金屬表面係只要於 金屬的表面形成被膜之方法即可,可舉例如: 屬 潰於表面處理劑之方法;使用喷濃、或空氣到塗 塗布機、桿式塗布機、刀式塗布機、凹版塗布機、反向塗 布機、澆鑄機等之裝置而塗布表面處理劑的方法。 • 以本發明之表面處理劑進行表面處理的金屬之形 ^ ’可為線狀、板狀、帶狀、領狀、粒狀、粉末狀等任何 一種形狀,本發明之表面處理劑係可處理電子零件、基板、 燁錫球、焊錫粉等。 土 使用本發明之表面處理劑,於電子零件或基板的連接 籲端子部㈣體表㈣行表面處理、朗其導體表面實施電(I ο Η (In the formula (111), χ represents a hydrogen atom or a lower alkyl group having a carbon number of i to 5, and Y 仏 represents a hydrogen atom, a lower alkyl group having 1 to 5 carbon atoms, a hydroxyl group or an amine group). In the compound represented by the above formula (I), it is particularly preferable because the cyanotrisinosylphosphonic acid or the like can be obtained industrially. Similarly, the compound represented by the above formula (II) is particularly preferably Ethylene diamine tetradecylphosphonic acid, diethylenetriamine pentadecylphosphonic acid, etc. The compound represented by the above formula (111) is particularly preferably 1 - by Ethylene 1 > 1 ~ '- The alkali metal salt of the above compound is preferably a sodium salt or a potassium salt, and the salt of the amine compound is preferably a triethylamine salt or a triethanolamine salt. The surface treating agent of the present invention may have two molecules in one molecule. The above-mentioned phosphonic acid group, a compound having no ester bond in the molecule, and/or a salt thereof are dissolved in a solvent. The solvent to be used is not particularly limited as long as it is soluble. A polar solvent such as a diol, but it is preferably water if the solubility, cost, etc. are considered. 12 316814 1301515, when the surface treatment agent is found to be pH Modulated to 5 or less, is: oblique:: the emulsifying property is further improved. The pH of the surface treating agent is influenced by the effect of the second, preferably PH1 to 5. The pH adjusting agent can use the acid which can be obtained. Adding surfactant to the 001 to ^ surface treatment agent will be more important? =, to 5 or less, the surface to be treated is mixed. The amount of surfactant added is less than lg / liter, s P to add More than 1Gg/L' Φ can not be obtained, the amount of the oxidation-resistant surfactant is preferably from 0. 〗 〖 to 1 〇 g / L. Zhengguo" The surfactant can be appropriately selected using commercially available yin, sashimi, And the amphoteric surfactant-type or 2: anionic 糸 surfactant is preferably sulfuric acid (four) type, rhemic acid vine salt type, sulfo-type, etc., cationic interface ^ ^ : =: salt type, non-ionic The surfactant is preferably high-grade = ::==, burnt epoxy Ethylene burn adduct, polyoxyethylene polyoxypropylene core and "e-ethylenediamine polyoxyethylene polyoxypropylene insert, higher aliphatic amine The epoxy Ethylene burn adduct, the county of the aliphatic amine, B said that the addition of the compound temple 'sexual surfactants should be amino acid type, final inspection When using a pH of 5 or less, it is advisable to appropriately select a type of yin system or two types or more. Among them, the nonionic interface activity fee J is particularly a polyethylene glycol type, in particular, a higher alcohol can be used. Products: base _ oxyethylene sulphide adduct, polyoxyethylene bake polyoxypropylene embedded two; compound temple 'an ' anionic surfactants in the sulphate type, 316814 13 1301515 Further, the surface treating agent of the present invention may contain an additive in an amount that does not impair the original properties for the purpose of imparting desired properties. Examples of the added hydrazine include a preservative, a pH buffering agent, and the like. The method of treating a metal surface using the surface treatment agent of the present invention as long as it forms a film on the surface of the metal may be, for example, a method of damaging the surface treatment agent; Or a method of applying a surface treatment agent to a device such as a coating machine, a bar coater, a knife coater, a gravure coater, a reverse coater, or a casting machine. • The shape of the metal surface-treated with the surface treatment agent of the present invention may be any shape such as a line, a plate, a belt, a collar, a granule, a powder, or the like, and the surface treatment agent of the present invention can be processed. Electronic parts, substrates, tin balls, solder powder, etc. Use the surface treatment agent of the present invention to connect the electronic component or the substrate to the terminal portion (4), the surface of the body (4), and the surface of the conductor.

St::由Ϊ行表面處理便可形崎化性優、焊錫浸潤 f生α改善之電子零件或基板。 I /73 ^本發明之表面處理劑所處理的如合金之焊錫 球,係可良好地使用作為耐氧化性優異、電連接構球 ^列方面,並作為配置於電子零件以連接電路基板之安 亦可使用本發明之表面處理劑處理如合金粉末,再 加入含有招著劑、活性劑、搖變劑、界面活性劑刀、溶劑等 316814 14 1301515 之助焊劑而形成焊錫膏而使用 存安定性上有明顯的改善效果。上述枯二可=其保 實施/面讀別、溶劑方面係可使用以往之習知者。 以下舉出實施例而詳細說明本發明 實施例1至14、及比較例1至5 5周製一分子内具有2個以上的膦酸基、且於分子内 Μ鍵之化合物或其鹽作為有效成分之水溶液15種類(奋 知例1至14、比較例1)。内容呈示於表1中。 、 另外,對銅材(C1020P、l〇mmx 25则lx 0.2tmn〇, 以下之前處理。 丁 鹼電解脫脂(常溫、15A/dm2處理約30秒)〜水洗— 酸浸潰(10%硫酸、常溫、5秒)—水洗—化學研磨(cpB—4〇 常溫、浸潰1分鐘)—水洗—酸浸潰(1 〇%硫酸、常溫、 秒)—水洗 對此基材,進行膜厚約5μπι之Sn電鍵(電鑛浴、St:: Electronic parts or substrates with excellent surface shape and solder infiltration by surface treatment. I / 73 ^ The solder ball of the alloy treated by the surface treatment agent of the present invention can be suitably used as an excellent oxidation resistance, an electrical connection ball, and as an electronic component to be connected to a circuit board. The surface treatment agent of the present invention may also be used to treat, for example, an alloy powder, and then a flux containing a squeegee, an active agent, a shaker, a surfactant knife, a solvent, etc., 316814 14 1301515 may be added to form a solder paste, and the use stability may be used. There is a significant improvement in the effect. The above-mentioned dryness can be used in the past, and it can be used in the past. Hereinafter, the compounds of Examples 1 to 14 and Comparative Examples 1 to 5 of the present invention having two or more phosphonic acid groups in one molecule and having a fluorene bond in the molecule or a salt thereof are effectively described as examples. There are 15 types of aqueous solutions of the components (Finding Examples 1 to 14 and Comparative Example 1). The content is presented in Table 1. In addition, for copper (C1020P, l〇mmx 25 lx 0.2tmn〇, the following before treatment. Butadiene electrolytic degreasing (normal temperature, 15A / dm2 treatment for about 30 seconds) ~ water wash - acid impregnation (10% sulfuric acid, room temperature , 5 seconds) - water washing - chemical grinding (cpB - 4 〇 normal temperature, dipping for 1 minute) - water washing - acid leaching (1 〇% sulfuric acid, room temperature, seconds) - water washing the substrate, the film thickness is about 5μπι Sn electric key (electric mine bath,

Tincoat K (日礦Metalplat ing (股)製)、電鑛條件:险 極電流密度2A/dm2、溫度20°C、液流動及陰極搖動電鑛) 將經實施該Sn電鍍的基材(以下Sn基材),於上述 一分子内具有2個以上的膦酸基、且於分子内不含醋鍵之 化合物或其鹽的溶液中,在浴溫60°C下浸潰10秒鐘後, 以經水洗並乾無者作為試驗基板。 對此等之試驗基板,進行以下之評估。試驗結杲者示 於表1中。 15 316814 1301515 而寸熱氧化性 將此等之試驗基板在保持於2 2 0 °C之電爐中大氣下熱 -處理1小時後,以弧面狀沾錫(Meniscograph)法依據以下 . 之測定條件測定與無鉛焊錫之焊接性(零交叉點時間(zero cross time)) 裝置·· Solder Checker SAT-2000 (Rhesca 製造) 焊錫槽;錫:銀:銅=96· 5 : 3 : 0· 5 (浴溫245°C ) 助焊劑:NA-200 (Tamura化研製造) — 浸潰深度:2mm • 浸潰速度:4mm/秒 • 浸潰時間:5秒 而寸濕氧化性 對此等之試驗基板,實施PCT處理(溫度105°C、濕 度100%之密閉鍋内放置1 6小時)後,以弧面狀沾錫 (Meni scograph)法與耐熱氧化性的項目相同測定無錯焊錫 φ之焊接性(零交叉點時間(zero cross time))。 又,進一步作為比較例,對於上述Sn基材,經以含 十二烷基膦酸lg/L之異丙醇溶液表面處理之基材(但,無 表面處理後之水洗5比較例2)、經以含膦酸二苯基酯ig/L 之水溶液表面處理之基材(比較例3 ),對於無處理之上述 Sn基材(比較例4)、上述Sn基材,使用特開平7-188942 號公報所揭示之表面處理劑(含膦酸二苯基酯0. lg/L之水 溶液),進行處理之基板(比較例5)亦合併評估。合併 試驗結果係呈示於表1中。 16 316814 1301515 (表1) 表1 表面處理劑組成與評估結果(Sn電鍍基材) a 有效成分與其含量(g/L) 界面活丨生劑與其含量(g/L) pH 而才熱 氧^n 耐濕 氧化性 有效成分 含量 界面活性劑 含量 實 施 例 1 氰基三伸曱基膦酸(式(I)) 1 一 0 2 〇 〇 2 二乙三胺5L伸曱基膦酸(式(II)) 1 一 0 2 〇 〇 3 卜總乙烧-1,卜,级式(III)) 1 一 0 2 〇 〇 4 氰基三伸甲基膦酸K鹽 1 一 0 6 〇 Δ 5 二乙三胺五伸甲基膦酸K鹽 1 - 0 8 Δ Δ 6 1-羥基乙烧-1,1-二膦酸K鹽 1 一 0 7 Δ Δ 7 氰基三伸曱基膦酸 1 天然月桂醇環氧丙 烷12莫耳加成物 1 2 ◎ ◎ 8 二乙三胺五伸曱基膦酸 1 壬基酚環氧乙烷 12莫耳加成物 1 2 ◎ ◎ 9 1-羥基乙烧-1,1-二膦酸 1 天然月桂醇環氧 乙烧9莫耳加成物 1 2 ◎ ◎ 10 氰基三伸曱基膦酸K鹽 1 天然油醇環氧乙烷 10莫耳加成物 1 6 〇 〇 11 二乙三胺五伸甲基膦酸K鹽 1 聚氧乙稀聚氧丙 烯嵌段聚合物 (霧點75°C ) 1 8 〇 Δ 12 1-經基乙烧_1,1-二鱗酸K鹽 1 壬基ϊ分環氧乙烷 10莫耳加成物 1 7 〇 〇 13 氰基三伸甲基膦酸 1 天然月桂醇環氧丙 烷12莫耳加成物 20 2 〇 Δ 14 氰基三伸甲基膦酸 1 天然月桂醇環氧丙 烷12莫耳加成物 0.005 2 〇 〇 比 較 例 1 二乙三胺五伸曱基膦酸 0.005 一 0 4 X X 2 十二烷基膦酸 1 一 0 一 Δ X 〇 ύ niU -ιγ/λ 4J· "fr 1— 脚職:一丰制g · 丄 一 r\ U 4 X 4 無處理 一 - - - X X 5 特開平7-188942號 — 一 - 2 Δ Δ ◎=零交叉點時間不足1秒 〇=零交叉點時間1秒以上不足3秒 零交叉點時間3秒以上不足5秒 零交叉點時間5秒以上 17 316814Tincoat K (made by Metalplating Co., Ltd.), electric ore conditions: dangerous current density 2A/dm2, temperature 20 °C, liquid flow and cathode shaking electric ore) The substrate to be plated with Sn (the following Sn) a substrate) is a solution of a compound having two or more phosphonic acid groups in the above molecule and containing no vinegar bond in the molecule or a salt thereof, and after being immersed at a bath temperature of 60 ° C for 10 seconds, It was washed and dried without using it as a test substrate. For the test substrates of these, the following evaluations were performed. The test knots are shown in Table 1. 15 316814 1301515 And the thermal oxidizing properties of the test substrates were heat-treated in an electric furnace maintained at 220 ° C for 1 hour, and then subjected to the following conditions by the Meniscograph method. Solderability measured with lead-free solder (zero cross time) Device · Solder Checker SAT-2000 (manufactured by Rhesca) Solder bath; Tin: Silver: Copper = 96· 5 : 3 : 0· 5 (Bath Temperature 245 ° C) Flux: NA-200 (manufactured by Tamura Chemical Research) — Dipping depth: 2 mm • Immersion speed: 4 mm/sec • Immersion time: 5 seconds and a wet oxidizing test substrate for this. After the PCT treatment (for 16 hours in a sealed pot at a temperature of 105 ° C and a humidity of 100%), the weldability of the error-free solder φ was measured in the same manner as the heat oxidation resistance by the Menis scograph method. Zero cross time). Further, as a comparative example, the substrate of the Sn substrate was surface-treated with an isopropyl alcohol solution containing lg/L of dodecylphosphonic acid (however, there was no surface treatment after washing 5 Comparative Example 2), A substrate surface-treated with an aqueous solution containing diphenylphosphonate ig/L (Comparative Example 3), and the above-mentioned Sn substrate (Comparative Example 4) and the above-mentioned Sn substrate were used for the above-mentioned Sn substrate, and the above-mentioned Sn substrate was used. The surface treatment agent (aqueous solution containing diphenyl phosphonate 0.1 g/L) disclosed in the publication, and the substrate (Comparative Example 5) subjected to the treatment were also evaluated. The combined test results are presented in Table 1. 16 316814 1301515 (Table 1) Table 1 Surface treatment composition and evaluation results (Sn plating substrate) a Active ingredient and its content (g / L) Interface active biocide and its content (g / L) pH and only thermal oxygen ^ n Moisture-resistant oxidizing active ingredient content surfactant content Example 1 Cyanotris-decylphosphonic acid (formula (I)) 1 - 0 2 〇〇 2 Diethylenetriamine 5L hydrazinylphosphonic acid (formula (II) )) 1 0 2 〇〇 3 卜 总乙烧-1, 卜, grade (III)) 1 0 2 〇〇 4 cyanotrisole methylphosphonic acid K salt 1 0 6 〇 Δ 5 2 Triamine pentamethylphosphonic acid K salt 1 - 0 8 Δ Δ 6 1-hydroxyethylidene-1,1-diphosphonic acid K salt 1 - 0 7 Δ Δ 7 Cyanotris-decylphosphonic acid 1 Natural laurel Alcohol propylene oxide 12 molar addition 1 2 ◎ ◎ 8 Diethylene triamine pentadecylphosphonic acid 1 Nonyl phenol ethylene oxide 12 molar addition 1 2 ◎ ◎ 9 1-hydroxyethyl burning - 1,1-diphosphonic acid 1 natural lauryl alcohol Ethylene oxide 9 molar addition 1 2 ◎ ◎ 10 Cyanotrisylphosphonium K salt 1 Natural oleyl alcohol oxide 10 molar addition 1 6 〇〇11 diethylenetriamine pentamethylphosphonic acid K salt 1 polyoxyethylene polyoxypropylene Block polymer (fog point 75 ° C) 1 8 〇Δ 12 1-by keto _1,1-di bis- succinic acid K salt 1 fluorenyl hydrazine ethylene oxide 10 molar addition 1 7 〇 〇13 Cyanotrisole methylphosphonic acid 1 Natural lauryl alcohol propylene oxide 12 molar addition 20 2 〇Δ 14 Cyanotrisole methylphosphonic acid 1 Natural lauryl alcohol propylene oxide 12 molar addition 0.005 2 〇〇Comparative Example 1 Diethylenetriamine pentadecylphosphonic acid 0.005 A 0 4 XX 2 Dodecylphosphonic acid 1 0 0 Δ X 〇ύ niU -ιγ/λ 4J· "fr 1 — Foot :一丰制g · 丄一r\ U 4 X 4 No treatment one - - - XX 5 Special opening 7-188942 - One - 2 Δ Δ ◎ = Zero crossing time less than 1 second 〇 = Zero crossing time 1 Less than 3 seconds in seconds, zero crossing time, 3 seconds or more, less than 5 seconds, zero crossing time, 5 seconds or more, 17 316814

13.01515 進行與實施例1至14、及比較例1至5相同之前處理 的銅材(Cl 020P、1 Ommx 25mmx 0· 2mm),進行膜厚約 5 # m 之Sn-Zn電鍵(電鐘浴:日礦Metal plat ing (股)製造、 • 電鑛條件:陰極電流密度3A/dm2、溫度35°C、pH 4. 0、液 流動及陰極搖動電鍍)。 將矣工戶、施此Sn-Zn電鐘的基材(以下Sn-Zn基材), 在以如述貫施例1至14、比較例1至3及比較例5所調製 φ的'合液中,浴溫60下浸潰1 〇秒鐘後,以經水洗並乾燥 者及無處理者作為試驗基板。 對此等之試驗基板,與前述實施例1至14、及比較例 ^至5相同地進行老化(aging)後,測定焊接性。試驗結果 壬示於表2中。 用進—步作為比較例,對無處理之上述Sn_Zn基材,使 夸願2002 - 304554號所示的表面處理劑(單二(十八烯 赢1^1 Λ酸酿之lwt%異丙醇溶液)’進行處理之基板(比較例 '、a併坪估。試驗結果呈示於表2中。 316814 18 1301515 (表2) 表2 表面處理劑組成與評估結杲(Sn-Zn電鍍基材) 有效成分與其含量(g/L) 界面活性劑與其含量(g/L) pH 耐熱 氧化ί生 而寸濕 氧化14 有效成分 含量 界面活性劑 含量 實 施 例 15 氰基三伸甲基膦酸 1 一 0 2 〇 〇 16 二乙三胺五伸曱基膦酸 1 - 0 2 〇 〇 17 1-羥基乙烧-1,1-二膦酸 1 - 0 2 〇 〇 18 氰基三伸甲基膦酸K鹽 1 一 0 6 Δ Δ 19 二乙三胺五伸曱基膦酸K鹽 1 - 0 8 Δ Δ 20 1-羥基乙烧-1,1-二膦酸K鹽 1 一 0 7 Δ Δ 21 氰基三伸曱基膦酸 1 天然月桂醇環氧丙 烷12莫耳加成物 1 2 ◎ ◎ 22 二乙三胺五伸曱基膦酸 1 壬基驗環氧乙烷 12莫耳加成物 1 2 ◎ ◎ 23 1-羥基乙烧-1,1-二膦酸 1 天然月桂醇環氧 乙烧9莫耳加成物 1 2 ◎ ◎ 24 氰基三伸曱基膦酸K鹽 1 天然油醇環氧乙烷 10莫耳加成物 1 6 Δ 〇 25 二乙三胺五伸曱基膦酸K鹽 1 聚氧乙烯聚氧丙 烯嵌段聚合物 (霧點75°C) 1 8 △ △ 26 1-羥基乙烧-1,1-二膦酸K鹽 1 壬基酚環氧乙烷 10莫耳加成物 1 7 Δ 〇 27 氰基三伸甲基膦酸 1 天然月桂醇環氧丙 烷12莫耳加成物 20 2 Δ △ 28 氰基三伸甲基膦酸 1 天然月桂醇環氧丙 烷12莫耳加成物 0.005 2 〇 〇 比 較 例 6 二乙三胺五伸曱基膦酸 0.005 - 0 4 X X 7 十二烷基膦酸 1 一 0 一 Δ X 〇 0 膦酸二苯基 1 丄 一 r\ υ 4 9 無處理 一 一 — 一 X X 10 特開平7-188942號 - 一 一 2 Δ X 11 特願 2002-304554 號 一 一 一 — X △ 零交叉點時間不足1秒 〇=零交叉點時間1秒以上不足3秒 △=零交叉點時間3秒以上不足5秒 零交叉點時間5秒以上 19 316814 1301515 ^ 攀 實施例29及比較例12 ,在實施例29中,對於Sn電鑛,經表面處理者之 -鬚的產生與未經表面處理者相比,顯示被明顯抑制之結 · _將經過與前述實施例7相同處理之Sn電鑛基板了與。 未經表面處理之基板,在溫度阶、濕度㈣的值^ 環境下放置24小時。其後絲板充分乾職,以掃描刑; 子祕鏡(SEM)進行表面觀察時,未經表面處理者係 鲁察到有許多金屬鬚(比較例12),但經表面處理者則完全 沒見到金屬鬚(實施例29)。 (產業上之可利用性) , II由於—分子内具有2個以上的膦酸基、且於分子内 =含賴之化合物、及/或其鹽之1種或2種以上的總計含 O-Olg/L以上的表面處理劑進行金屬的表面處理,可 ==险、改善焊錫浸潤性。x,藉由表面處理劑之邱調 一以下,進一步藉由含有界面活性劑〇〇1至1〇g/L, 鲁以提高耐氧化性。 使用本發明之表面處理劑而含有施予表面處理之Sn =金焊錫粉的焊錫膏’係可明顯改善其保存安定性。進— 步’猎由使周本發明之表面處理劑處理%及如電鍍合金, 可大幅地抑制金屬鬚的發生。 (本案無圖式) 316814 2013.01515 A copper material (Cl 020P, 1 Ommx 25 mm x 0·2 mm) treated in the same manner as in Examples 1 to 14 and Comparative Examples 1 to 5 was subjected to a Sn-Zn electric bond having a film thickness of about 5 # m (electric clock bath: Manufactured by Meite Mineral Plating, • Electro-minening conditions: cathode current density 3A/dm2, temperature 35°C, pH 4. 0, liquid flow and cathode shaking plating). The substrate of the worker, the Sn-Zn electric clock (hereinafter, the following Sn-Zn substrate) was prepared by the modulation of φ as described in Examples 1 to 14, Comparative Examples 1 to 3, and Comparative Example 5. In the solution, after bathing at a bath temperature of 60 ° for 1 〇 second, the person who washed and dried with water and no treatment was used as a test substrate. The test substrates of the above were subjected to aging in the same manner as in the above Examples 1 to 14 and Comparative Examples ^ to 5, and then the weldability was measured. The test results are shown in Table 2. Using the further step as a comparative example, for the above-mentioned Sn_Zn substrate which is not treated, the surface treatment agent shown in 2002-304554 is exemplified (single two (octadecene win 1^1 citric acid brewed lwt% isopropyl alcohol) Solution) 'Processed substrate (Comparative Example ', a and ping. The test results are shown in Table 2. 316814 18 1301515 (Table 2) Table 2 Surface treatment composition and evaluation of crucible (Sn-Zn plating substrate) Active ingredient and its content (g/L) Surfactant and its content (g/L) pH Heat-resistant oxidation ί raw and wet oxidation 14 Active ingredient content Surfactant content Example 15 Cyanotrisole methylphosphonic acid 1 -0 2 〇〇16 diethylenetriamine penta-decylphosphonic acid 1 - 0 2 〇〇17 1-hydroxyethylidene-1,1-diphosphonic acid 1 - 0 2 〇〇18 Cyanotrisole methylphosphonic acid K Salt 1 - 0 6 Δ Δ 19 Diethylenetriamine pentadecylphosphonic acid K salt 1 - 0 8 Δ Δ 20 1-hydroxyethene-1,1-diphosphonic acid K salt 1 - 0 7 Δ Δ 21 Cyanide Base three exophosphonic acid 1 natural lauryl alcohol propylene oxide 12 molar addition 1 2 ◎ ◎ 22 diethylene triamine pentadecylphosphonic acid 1 壬 base test ethylene oxide 12 molar addition 1 2 ◎ ◎ 23 1-hydroxyethylidene-1,1-diphosphonic acid 1 Natural lauryl alcohol Ethylene oxide 9 molar addition 1 2 ◎ ◎ 24 Cyanotrisylphosphonic acid K salt 1 Natural oleyl alcohol ethylene oxide 10 molar addition 1 6 Δ 〇 25 diethylene triamine pentadecylphosphonic acid K salt 1 polyoxyethylene polyoxypropylene block polymer (fog point 75 ° C) 1 8 △ △ 26 1-hydroxy Burning-1,1-diphosphonic acid K salt 1 nonylphenol ethylene oxide 10 molar addition 1 7 Δ 〇27 cyanotrimethylmethylphosphonic acid 1 natural lauryl alcohol propylene oxide 12 molar addition 20 2 Δ △ 28 cyanotrisole methylphosphonic acid 1 natural lauryl alcohol propylene oxide 12 molar addition 0.005 2 〇〇Comparative Example 6 Diethylenetriamine pentadecylphosphonic acid 0.005 - 0 4 XX 7 Dodecylphosphonic acid 1 0 0 Δ X 〇 0 phosphonic acid diphenyl 1 丄 r r υ 4 9 No treatment one - one XX 10 Special opening 7-188942 - one one 2 Δ X 11 2002-304554 - 11 - X △ Zero crossing time less than 1 second 〇 = zero crossing time 1 second or more less than 3 seconds △ = zero crossing time 3 seconds or more less than 5 seconds zero crossing time 5 seconds or more 19 316814 1301515 ^ Climbing In Example 29 and Comparative Example 12, in Example 29, for the Sn electric ore, the generation of the whisker by the surface treatment agent showed that the knot which was significantly suppressed compared with the one without the surface treatment was passed through with the foregoing implementation. Example 7 was the same treatment of the Sn electrowinning substrate. The substrate which has not been surface-treated is placed in the environment of temperature step and humidity (4) for 24 hours. After that, the silk plate was fully used for scanning, and when the surface was observed by the sub-mirror (SEM), many of the metal whiskers were found without surface treatment (Comparative Example 12), but the surface treatment was completely absent. See metal whiskers (Example 29). (Industrial Applicability) II, a total of O-containing one or more compounds having two or more phosphonic acid groups in the molecule and containing one or more of the compounds in the molecule and/or their salts The surface treatment agent of Olg/L or more is subjected to metal surface treatment, which can reduce the risk of solder wettability. x, by adjusting the surface treatment agent to one or less, further by containing a surfactant 〇〇1 to 1〇g/L, to improve oxidation resistance. The use of the surface treating agent of the present invention and the solder paste containing the surface-treated Sn = gold solder powder can significantly improve the storage stability. The step-by-step hunting can greatly suppress the occurrence of whiskers by treating the surface treatment agent of the present invention with % and such as a plating alloy. (There is no picture in this case) 316814 20

Claims (1)

第94106391號專利申請案 (97年5月6日^ 1301515 十、申請專利範圍: 1· 一種金屬表面處理劑,其係金屬之表面處理劑,其特徵 在於:其有效成分由於一分子内具有2個以上的膦酸基 且於分子内不含酯鍵之化合物及/或其鹽中之1種或2 種以上組成’且該化合物及/或其鹽之含量總計為 〇· Olg/L以上,並進一步含有界面活性劑〇· 〇lg/L至 l〇g/L,其中,被處理金屬為811或311合金。 2· —種金屬表面處理劑,其係金屬之表面處理劑,其特徵 • 在於:其有效成分由於一分子内具有2個以上的膦酸基 且於分子内不含酯鍵之化合物及/或其鹽中之1種或2 種以上組成,且該化合物及/或其鹽之含量總計為 〇· Olg/L以上,並進一步含有界面活性劑〇· 至 10g/L,以及將該金屬表面處理劑溶液之調整至5 以下,其中,被處理金屬為Sn或Sn合金。 3.如申請專利範圍第丨至2項中任一項之金屬表面處理 • 劑,其中,於上述一分子内具有2個以上的膦酸基且於 分子内不含醋鍵之化合物及/或其鹽,為以下述式(1;)、 (II)或(III)所示之化合物及/或其鹼金屬鹽、銨鹽 或與胺化合物所成之鹽: N 1 7 1 xlc1Y I o=pIo ι H o H Η)Η ο ο ϊ -Η ι Η οπηρ丨ο ΟΗΡΙΟ 2 一r23 一Γ3 xlc丨γ ^IcIY (修正本)316814 .1301515 第94106391號專利申請案 (97年5月6曰) (式(I)中,X1至P及¥1至Y3可相同或相異,各表示 氫原子或碳數1至5的低級烷基); (ID R1 R3 R2〉N-[CH2 一CH2 — ilnn —R4 (式(II )中,R1、R2及R4可相同或相異,各表示以下 之基(A) ; R3表示以下之基(a)或碳數1至5的低級 烧基;η為1至3的整數;該基(A)為: on ρ I 0 1 Γ XI c — γ § \—/ Η 基(A)中’ χ!及…係與通式(υ中之定義相同); 0X0 II I II Γ?^ΓΟΗ (ΙΠ) HO Y OH (式(III)中,X表示氫原子或碳數1至5的低級烷 丨基,Y係表示氫原子、碳數1至5的低級烷基、羥基或 胺基)。 4· 一種表面處理方法,係以如申請專利範圍第1至、項中 任一項之金屬表面處理劑進行表面處理者。 種電子令件或基板,其特徵在於:於電子零件或基板 的連接端子部的導體表面、或對其表面實施電鍍後,藉 e如申請專綠㈣4項之表面處理方法進行表面處理。 •種知錫球或焊錫粉,其特徵在於··使用以如申請專利 範圍第4項之表面處理方法進行表面處理之%合金。 (修正本)316814 22 :^01515 第94106391號專利申請案 (97年5月6曰) 7· ’其特徵在於:使用如申請專^範圍第β 、之焊錫球作為電連接構件。 • 種女震品,其特徵在於·骑 焊錫球配置於電子^ ^請專利範圍第6項之 9. -種焊錫膏,其特徵在於於電路基板者。 項之焊錫粉。 、·使“申請專利範圍第6 10· —種安裝品,其特徵在於 項之焊錫膏。 •使用如申請專利範圍第9Patent Application No. 94106391 (June 6, 1997) 1301515 X. Patent Application Range: 1. A metal surface treatment agent, which is a metal surface treatment agent, characterized in that its active ingredient has 2 molecules in one molecule. One or more of the compounds having a phosphonic acid group and no ester bond in the molecule, and/or a salt thereof, and the content of the compound and/or its salt is 〇· Olg/L or more. And further comprising a surfactant 〇· 〇 lg / L to l 〇 g / L, wherein the metal to be treated is 811 or 311 alloy. 2 - a metal surface treatment agent, which is a metal surface treatment agent, its characteristics The active ingredient is one or more of a compound having two or more phosphonic acid groups in one molecule and having no ester bond in the molecule, and/or a salt thereof, and the compound and/or its salt The content is 〇· Olg/L or more in total, and further contains a surfactant 〇· to 10 g/L, and the metal surface treatment agent solution is adjusted to 5 or less, wherein the metal to be treated is Sn or a Sn alloy. If the patent application scope is from the second to the second The metal surface treatment agent of the present invention, wherein the compound having two or more phosphonic acid groups in the above molecule and containing no vinegar bond in the molecule and/or a salt thereof is represented by the following formula (1; Or a compound represented by (III) and/or an alkali metal salt thereof, an ammonium salt or a salt with an amine compound: N 1 7 1 xlc1Y I o=pIo ι H o H Η) Η ο ο ϊ -Η ι ο οπηρ丨ο ΟΗΡΙΟ 2 rr23 Γ3 xlc丨γ ^IcIY (Revised) 316814 .1301515 Patent Application No. 94106391 (May 6, 1997) (in the formula (I), X1 to P and ¥1 to Y3 may be the same or different and each represents a hydrogen atom or a lower alkyl group having 1 to 5 carbon atoms; (ID R1 R3 R2>N-[CH2-CH2-ilnn-R4 (in formula (II), R1, R2 and R4 may be the same or different and each represents the following group (A); R3 represents the following group (a) or a lower alkyl group having a carbon number of 1 to 5; n is an integer of 1 to 3; and the group (A) is: On ρ I 0 1 Γ XI c — γ § \—/ Η In the base (A), 'χ! and ... are the same as the formula (the definition in υ); 0X0 II I II Γ?^ΓΟΗ (ΙΠ) HO Y OH (in formula (III), X represents a hydrogen atom or carbon a lower alkyl alkoxide group of 1 to 5, wherein Y represents a hydrogen atom, a lower alkyl group having 1 to 5 carbon atoms, a hydroxyl group or an amine group.) 4. A surface treatment method as in the first to the following claims Any one of the metal surface treatment agents for surface treatment. An electronic component or substrate characterized in that after the surface of the conductor of the connection terminal portion of the electronic component or the substrate or the surface thereof is plated, the surface treatment is performed by applying a surface treatment method such as applying green (4). • Know the solder ball or solder powder, which is characterized by the use of a % alloy which is surface-treated by the surface treatment method of the fourth application of the patent application. (Revised) 316814 22 : ^01515 Patent Application No. 94106391 (May 6, 1997) 7· ‘It is characterized in that a solder ball as in the application of the scope β is used as an electrical connection member. • Seeding seismic products, which are characterized by the fact that the solder ball is placed on the electronics. ^ Please refer to item 6 of the patent scope. 9. Solder paste, which is characterized by the circuit board. The solder powder of the item. · "Applicable Patent Range No. 6 10·--Installation, which is characterized by the solder paste of the item. (修正本)316814 23(Revised) 316814 23
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JP2007197791A (en) * 2006-01-27 2007-08-09 Daiwa Fine Chemicals Co Ltd (Laboratory) Composition of post-treatment agent for plating
JP5474092B2 (en) 2009-01-14 2014-04-16 アトテツク・ドイチユラント・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング Solution and method for increasing solderability and corrosion resistance of metal or metal alloy surfaces
CN103088333B (en) * 2012-12-13 2015-04-29 苏州新区化工节能设备厂 Water electrolysis pole plate surface treatment liquid
CN104894569B (en) * 2015-06-30 2018-03-02 长沙理工大学 Ni-Pd metal surface treatment agent
CN107326413A (en) * 2017-07-04 2017-11-07 苏州道蒙恩电子科技有限公司 A kind of electrotinning fastness inorganic agent and application method
CN115070259A (en) * 2022-07-15 2022-09-20 深圳市同方电子新材料有限公司 Novel environment-friendly lead-free soldering paste of superfine soldering tin powder

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