TWI291182B - Conductive film for touch panel and method for manufacturing - Google Patents

Conductive film for touch panel and method for manufacturing Download PDF

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Publication number
TWI291182B
TWI291182B TW094114821A TW94114821A TWI291182B TW I291182 B TWI291182 B TW I291182B TW 094114821 A TW094114821 A TW 094114821A TW 94114821 A TW94114821 A TW 94114821A TW I291182 B TWI291182 B TW I291182B
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Taiwan
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film
conductive film
layer
hardened
substrate
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TW094114821A
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Chinese (zh)
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TW200537529A (en
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Hironobu Shinohara
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Hs Planning Ltd
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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/048Interaction techniques based on graphical user interfaces [GUI]
    • G06F3/0487Interaction techniques based on graphical user interfaces [GUI] using specific features provided by the input device, e.g. functions controlled by the rotation of a mouse with dual sensing arrangements, or of the nature of the input device, e.g. tap gestures based on pressure sensed by a digitiser
    • G06F3/0488Interaction techniques based on graphical user interfaces [GUI] using specific features provided by the input device, e.g. functions controlled by the rotation of a mouse with dual sensing arrangements, or of the nature of the input device, e.g. tap gestures based on pressure sensed by a digitiser using a touch-screen or digitiser, e.g. input of commands through traced gestures
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/086Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Human Computer Interaction (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)
  • Position Input By Displaying (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

The goal of this invention is to utilize a conductive polyethylene terephthalate (PET) film for touch panels that is small in shrinkage and dimensional change conductive film. The change conductive film of touching panel possesses the excellent high-temperature resistance and markedly excellent sliding resistance. This invention provides a conductive film for touch panels, its characteristic is that a base with at least a layer composed PET and a cured layer obtained by curing a crosslinkable substance and a conductive film formed on the base. The shrinkage of the base after heating at 150 DEG C for 1 hour is not more than 0.5% in both longitudinal direction (MD) and transverse direction (TD). Particularly, it is a conductive film for touch panels. The touch panel is obtained by attaching a transparent conductive film to a PET film base. The PET film has a shrinkage of not more than 0.5%, It is obtained by curing a crosslinkable substance on a PET film at 100 DEG C to 180 DEG C before attaching an inorganic transparent conductive film such as an ITO film to the PET film base by sputtering, etc.

Description

1291182 · j 玖、發明說明: 【發明所屬之技術領域】 本發明係㈣作為觸控面板㈣ϋ之透明導電性膜所使 用之觸控面板用導電性膜,及其製造方法。詳細而言,有 關即使高溫仍技,且滑動所造成之劣化小之觸控面㈣ 導電性膜及其製造方法。 【先前技術】 透明導電性膜係作為觸控面板(以下可能稱為τρ)之電 極、液晶顯示器之電極、電致發光顯示器之電極等光學異頁 7器^電極而使用。例如:於電阻膜方式之觸控面板,一 般@ 5 ’透日月導電玻璃板及透明導電性膜係作為電極,經 .Μ隔物而對向地制’其中該透明導電玻璃板係氧油 錫(以下亦可能稱為ΙΤ0)以濺鍍等方法附著,該透明導 電性膜係ΙΤΟ以濺鍍等方法,附著於聚對苯二甲酸乙二醋 膜等塑膠膜(以下亦可能稱為ΡΕΤ膜)等塑膠膜。 • 冑控面板廣泛地被使用,其配置於CRT^LCD等顯示裝 置上’藉由一面觀看顯不,一面以手指或筆等按壓,可輸 、 人資料或指示、命令。在用於觸控面板之透明導電性膜’ ’ 需要圖案化或使銀糊硬化之工序,為了此硬化,必須以120 C至170 C之溫度,保持數分鐘至數小時。然而,pET膜之 炫點雖在3GGT:以上,但玻璃轉移溫度卻低至对。c,且由 T為結晶性樹脂’多被延伸’ ^施以上述溫度之後,再冷 卟至至溫,具有膜會大幅收縮的問題。因此,於導電性膜 翹曲或對向電極為附ITO之玻璃之情況,與由於熱膨脹係 5 1291182 數小’即使加熱仍幾乎不會有尺寸變化之附汀〇之玻璃間 ,將產生圖案化電極之位置偏差的問題。又,觸控面板亦 使用於車内等高溫環境,因此PET膜具有由於每次重複膨 脹收縮而產生皺紋,或產生波浪紋的問題。近年來,觸控 面板亦傾向大型化,由於此類溫度變化,亦具有在尺寸發 生紊亂,或產生電極間之位置偏差的問題。 另一方面,提高透明導電性膜之耐滑動性,亦成為重大 的課題。觸控面板有僅感測手指觸碰之開啟—關閉即可之 數位方式,及能以筆等輸入圖像或文字之m比方式。其中 特別是在類比方式,由於直接以筆等,在透明導電性膜上 輸入,因此每次輸入時,具有彈力之PET膜挽曲,故應力 施加於附著在其表面之IT0。通常,以250g程度之荷重, 實施10萬次以上之直線書寫或文字書寫之滑動測試,於 ITO之密接性不佳之情況,由於重複筆輸人,於產生細 錄縫或剝離,具有電阻值大幅上升,導電機能消失的問 題又,於松接性良好之情況,由於重複滑動所造成之應 力,亦可能於rn&gt;產生相同問題。近年來,此滑動性係要 求以5〇〇g之荷重,進行3〇萬次測試合格,再者,更加要求 滑動特性優異之透明導電性膜。 為了改善此附IT〇之PET膜之滑動特性,係進行各種檢討 。例如.於曰本專利公報第2667680號,以 厚125# m程度之ΡΕτ膜.戶^ ^ ° 又々以丨膜及厚乃“茁程度之附ιτ〇2ρΕ 丁膜, 於較厚之PET膜上’利用勒菩卞丨 W用黏者剤之綾衝性,吸收以筆輸入 時之施力,使!TO不至受損’改善滑動特性。然而,於此 6 4 1291182 方弋夕數仍未必符合以500g荷重,進行3〇萬次的筆滑動 /、、下問題·在黏著層剝離,黏著劑偏黃地著色的問 =由於Ιέ著劑之耐熱性或吸濕性不佳,在嚴苛的環境下 义貝的問題,及相較於未進行而直接於PET附著ΙΤΟ之單片 構成之ITO膜,構成較複雜,因此製造工序複雜,變得昂 貴的問題。 並且,為了改善滑動性,嘗試使IT〇變得緻密且高強度 此方法係以濺鍍法,在ΡΕΤ膜附加非晶質之後,以 * C程度之溫度,進行數小時至數十小時之退火,使非晶質 ΙΤΟ成為結晶化ΙΤ0。相較於附著有非晶性ιτ〇之透明導電 ί·生膜,附著有此結晶化ΙΤΟ之透明導電膜係滑動性較佳, 但作為筆輸入之ΤΡ,並未符合所有條件。又,由於需要長 時間的退火,具有透明性將受損或偏黃地著色,變得昂貴 的問題。又,於ΡΕΤ膜形成ΙΤ〇層之後,如此地以15(^附 近之溫度進行退火處理,可使難及⑸方向之熱收縮率為 0^5%以下,但於此情況,IT〇層本身雖成為結晶性,變得 高強度,但由於重複的滑動,ΙΤ〇層可能從ρΕτ膜剝離,或 視情況,可能產生細微裂縫。 , 如此,關於耐滑動性優異之透明導電性膜,雖已進行各 . 種檢討,但不僅未必會符合所要求之耐滑動型,而且以^ 的構造複雜,或者製造工序複雜,因此具有犧牲滑動特性 以外的光學特性,或成本上升的缺陷。 並且,ΤΡ之導電性膜有必須防止筆或手指摩擦而損傷、 防止圖像偏差或防止發生牛頓環之情況。又,為了使圖像 7 1291182 4 Λ /月晰或明亮,亦要求高透光率。 再者,於TP用導電性膜,自以往 PEThM 為了防止表面損傷,於 ㈣化樹但此紫外線硬化樹脂 ;作1 提尚表面硬度之防止損傷層而設置,並未檢 改善基體之熱安定性,或改善作為導電性膜之滑動 【發明内容】 本發明之課題在於完全解決前述以往之諸問題,達成以 y的。亦即’本發明之目的在於提供—種即使在嚴苛環 t下,尺寸變化仍小,且滑動特性特別優異之觸控面板用 ¥電性膜,以及其製造方法。 為了解決前述課題而進行銳意檢討,發現—種導電性膜 係一次解決前述問題’且成為滑動特性特別優異之觸控面 板用導電性膜;其中該導電性膜係於至少具有由PET膜所 形成之層,及架橋性物質已硬化成膜之硬化層之基體上, 形成導電膜而成;且前述基體在以1501加熱i小時之後之 長度方向(MD)及寬度方向(TD) &lt;收縮率均為〇5%以 下。 方P 發明者设想在PET膜所組成之透明導電性膜,於 加熱之情況,線膨脹係數相較於有機物之PET膜遠遠較小 之1丁〇等無機氧化物,作為導電膜附著於表面,因此不僅 於用於銀糊硬化之1 5 〇 °C程度之加熱工序後或高溫環境之 使用日守’此等無機氧化物與PET膜之間之熱所造成之膨脹 率或收縮率之不同,將成為導電性膜翹曲或產生皺紋之原 8 ;1291182 ,* 因,而且由於此熱所造成之膨脹率或收縮率之不同,成為 , 導電膜從膜剝落或於導電膜產生裂縫的主要原因,引起導 電性降低或作為電極無法作用之狀態。又,即使於導電膜 , 未從PET膜剝離或未產生裂缝之情況,仍設想由於上述高 熱處理或條件,於ITO等無機化合物或PET膜之界面會殘= * 應力,利用於觸控面板之情況,若重複利用筆之滑動,會 產生剝離或裂缝。此類現象可能對於耐滑動性造成不良影 響。根據此設想,獲得新的酌見,其係抑制基體之熱所造 • 成之收縮率及尺寸變化,藉由硬化層使基體安定’將顯著 改善對於觸控面板之透明導電性膜所特別要求之滑動特性 ’並終至完成本發明。 亦即,用以解決前述課題之方法係如下。 〈1〉一種觸控面板用導電性膜,其特徵在於:在至少具 有由聚對苯二甲酸乙二酯膜所形成之層,及架橋性物質已 被硬化成膜之硬化層之基體上,形成導電膜而成;前述基 體在以150°c加熱1小時之後之長度方向(MD)及寬度方向 鲁 (TD)之收縮率均為0.5%以下。 〈2〉如前述〈丨〉所記載之觸控面板用導電性膜,其中 - 作為硬化層者,基體係具有熱架橋性物質已硬化成膜之硬 化層。 〈3〉如丽述〈2〉所記載之觸控面板用導電性膜,其中 基體係進一步具有:藉由光或電子線之架橋性物質已硬化 成膜之硬化層。 〈4〉如鈿述〈3〉所記載之觸控面板用導電性膜,其中 9 4 1291182 . 4 基體係於PET膜層之兩侧,具有藉由光或電子線之架橋性 物質已硬化成膜之硬化層。 〈5〉如前述⑴至〈4〉中任一項所記載之觸控面板用 導電性膜,其中導電膜為非晶性打0(氧化銦錫)。 〈6〉如前述⑴至⑸中任一項所記載之觸控面板用 . 導電性膜,其藉由預先在處理成以15〇t加熱丨小時之後之 長度方向(MD)及寬度方向(TD)之收縮率均為〇5%以 下之基體,使導電膜附著所獲得。 鲁 〈7〉如前述〈6〉所記載之觸控面板用導電性膜,其中 至少1層之硬化層係在以1〇〇它至180。(:間之溫度,將pET膜 進行熱處理之同時,或以loot:至18(rc間之溫度,將ΡΕΤ 膜進行熱處理之後,使架橋性物質在前述ΡΕΤ膜之至少一 面硬化所獲得。 〈8〉如前述〈7〉所記載之觸控面板用導電性膜,其中 至少1層之硬化層係在以100。(:至180。(::間之溫度,將1^丁膜 進行熱處理之同時,或以l〇〇°c至18〇cc間之溫度,將ρΕτ 籲 膜進行熱處理之後,且前述PET膜冷卻至室溫之前,使架 橋性物質在前述PET膜之至少一面硬化所獲得。 〜 〈9〉如前述〈7〉所記載之觸控面板用導電性膜,其中 • 至少1層之硬化層係在以120°C至180°C間之溫度,將pET膜[Technical Field] The present invention is a conductive film for a touch panel used as a transparent conductive film of a touch panel (4), and a method for producing the same. Specifically, it relates to a touch surface (four) conductive film which is low in temperature even if it is high in temperature, and a method of manufacturing the same. [Prior Art] The transparent conductive film is used as an optical electrode of a touch panel (hereinafter may be referred to as τρ), an electrode of a liquid crystal display, or an electrode of an electroluminescence display. For example, in the touch panel of the resistive film type, generally, the @5' transparent solar conductive glass plate and the transparent conductive film are used as electrodes, and the transparent conductive glass plate is made of oxygen oil through the spacer. Tin (hereinafter also referred to as ΙΤ0) is adhered by sputtering or the like, and the transparent conductive film is adhered to a plastic film such as polyethylene terephthalate film by sputtering or the like (hereinafter may also be referred to as ΡΕΤ). Plastic film such as film). • The control panel is widely used, and it is placed on a display device such as a CRT^LCD. By pressing it on one side, it can be pressed with a finger or a pen, and can be used to input information, instructions, and commands. The step of patterning or hardening the silver paste is required for the transparent conductive film '' for the touch panel, and for this hardening, it must be maintained at a temperature of 120 C to 170 C for several minutes to several hours. However, although the bright point of the pET film is above 3GGT: the glass transition temperature is as low as right. c, and T is a crystalline resin, which is "extended". After the above temperature is applied, it is cooled to a temperature, and there is a problem that the film shrinks greatly. Therefore, in the case where the conductive film is warped or the counter electrode is ITO-attached glass, patterning occurs between the glass which is small in number due to the thermal expansion system 5 1291182, and which hardly changes in size even if heated. The problem of positional deviation of the electrodes. Further, since the touch panel is also used in a high-temperature environment such as in a car, the PET film has a problem of wrinkles or waviness due to repeated expansion and contraction. In recent years, touch panels have also been expected to increase in size, and due to such temperature changes, there have been problems in that the size is disordered or the positional deviation between the electrodes occurs. On the other hand, increasing the sliding resistance of the transparent conductive film has also become a major issue. The touch panel has a digital mode that only senses the opening of the finger touch-off, and can input the image or the text in a pen ratio such as a pen. In particular, in the analog method, since the input is made directly on the transparent conductive film by a pen or the like, the PET film having the elastic force is bent every time the input is performed, so the stress is applied to the IT0 attached to the surface thereof. Usually, a sliding test of more than 100,000 times of straight-line writing or writing is performed with a load of about 250 g. In the case of poor adhesion of ITO, due to repeated pen input, fine recording or peeling occurs, and the resistance value is large. The problem of the rise of the conductive function disappears, and in the case of good looseness, the stress caused by repeated sliding may also cause the same problem in rn&gt;. In recent years, this slidability is required to be tested at a load of 5 〇〇g, and is required to pass a test of 30,000 times. Further, a transparent conductive film having excellent sliding properties is required. In order to improve the sliding characteristics of this PET film with IT, various reviews were conducted. For example, in the Japanese Patent Laid-Open No. 2667680, the thickness of the film is 125# m. The film is ^ ^ ° and the film is thick and the thickness is "the degree of ι 之 ι Ε , , , , , , , , , , , , , , , On the 'Ultra Bodhisattva W's use of the squeaky squeaky, absorb the force applied by the pen input, so that !TO is not damaged' to improve the sliding characteristics. However, this 6 4 1291182 It does not necessarily meet the pen sliding of 300,000 times with a load of 500g, the next problem, the peeling of the adhesive layer, and the yellowing of the adhesive. The heat resistance or hygroscopicity of the adhesive is not good. The problem of the yttrium in a harsh environment and the ITO film which is formed as a single piece directly attached to the PET without being formed is complicated, and therefore the manufacturing process is complicated and expensive. Moreover, in order to improve the slidability Attempts to make IT〇 dense and high-strength. This method is performed by sputtering, after the amorphous film is added to the ruthenium film, and annealing is performed at a temperature of *C for several hours to several tens of hours to make the amorphous yttrium. It becomes crystallization ΙΤ0. Compared with the transparent conductive with amorphous ιτ〇 attached ί·film, the transparent conductive film to which the crystallization enthalpy adhered is preferred, but it does not meet all the conditions as a pen input. Moreover, since long-time annealing is required, transparency may be impaired or It is a problem that it is yellowish and becomes expensive. Moreover, after the ruthenium film is formed into a ruthenium layer, annealing at a temperature of around 15 (^) can make the heat shrinkage rate in the (5) direction 0^5%. In the following case, the IT layer itself becomes crystalline and has high strength. However, due to repeated sliding, the layer of tantalum may be peeled off from the ρΕτ film or, depending on the case, fine cracks may occur. Although the transparent conductive film having excellent slidability has been subjected to various reviews, it does not necessarily conform to the required sliding resistance type, and has a complicated structure or a complicated manufacturing process, and therefore has optical properties other than sacrificial sliding characteristics. Or a defect in which the cost rises. Moreover, the conductive film of the crucible must be prevented from being damaged by rubbing with a pen or a finger, preventing image deviation or preventing the occurrence of a Newton's ring. Like 7 1291182 4 Λ / month is clear or bright, also requires high light transmittance. In addition, the conductive film for TP, from the previous PEThM in order to prevent surface damage, in (4) the tree but this ultraviolet curing resin; The surface hardness is provided to prevent damage to the layer, and the thermal stability of the substrate is not improved, or the sliding of the conductive film is improved. SUMMARY OF THE INVENTION The object of the present invention is to completely solve the above-mentioned problems and achieve y. In other words, the object of the present invention is to provide a photovoltaic film for a touch panel which has a small dimensional change and excellent sliding characteristics even under a severe ring t, and a method for producing the same. In review, it has been found that a conductive film is a conductive film for a touch panel which is particularly excellent in sliding characteristics, and the conductive film is formed of at least a layer formed of a PET film, and a bridging substance. a conductive film is formed on the substrate of the hardened layer which has been hardened into a film; and the length direction (MD) and the width direction (TD) of the substrate after heating for 150 hours are 150 hours t; shrinkage rates are all below 5%. The inventor of the present invention contemplates a transparent conductive film composed of a PET film. In the case of heating, an inorganic oxide such as a butyl hydride having a linear expansion coefficient which is much smaller than that of an organic PET film is attached as a conductive film to the surface. Therefore, the expansion ratio or shrinkage ratio caused by the heat between the inorganic oxide and the PET film is not only after the heating process for the degree of curing of the silver paste, but also after the heating process of the high temperature environment. It will become the original film of warpage or wrinkles of conductive film 8;1291182,*, and due to the difference in expansion ratio or shrinkage caused by this heat, it becomes the main cause of the peeling of the conductive film from the film or the crack in the conductive film. The reason is that the conductivity is lowered or the electrode is ineffective. Further, even when the conductive film is not peeled off from the PET film or cracks are not generated, it is assumed that the interface between the inorganic compound such as ITO or the PET film may be residual due to the high heat treatment or the above conditions, and is used for the touch panel. In the case, if the sliding of the pen is repeated, peeling or cracking may occur. Such phenomena may have an adverse effect on slip resistance. According to this idea, a new discretion is obtained, which is to suppress the shrinkage and dimensional change caused by the heat of the substrate, and to stabilize the substrate by the hardened layer', which will significantly improve the transparent conductive film for the touch panel. The sliding characteristics 'end to the completion of the present invention. That is, the method for solving the above problems is as follows. <1> A conductive film for a touch panel, comprising: a layer having at least a layer formed of a polyethylene terephthalate film and a hardened layer in which a bridging material has been hardened into a film; The conductive film was formed; the shrinkage ratio in the longitudinal direction (MD) and the width direction (TD) of the substrate after heating at 150 ° C for 1 hour was 0.5% or less. <2> The conductive film for a touch panel according to the above, wherein - as the hardened layer, the base system has a hard layer in which the heat bridge material is hardened into a film. <3> The conductive film for a touch panel according to <2>, wherein the base system further comprises a hardened layer which has been hardened into a film by a bridging material of light or electron wires. <4> The conductive film for a touch panel described in <3>, wherein the base system is hardened into a bridge material by light or electron lines on both sides of the PET film layer. Hardened layer of film. The conductive film for a touch panel according to any one of the above aspects, wherein the conductive film is amorphous (0 indium tin oxide). (6) The conductive film for a touch panel according to any one of the above (1) to (5), wherein the conductive film is processed in a length direction (MD) and a width direction (TD) after being heated by 15 〇t in advance. The shrinkage ratio is 5% or less of the matrix, and the conductive film is attached. [7] The conductive film for a touch panel according to the above <6>, wherein at least one of the hardened layers is in a range of from 1 to 180. (The temperature between the two is obtained by heat-treating the pET film, or by heat-treating the ruthenium film at a temperature between loo: 18 (r), and then bridging the bridging material on at least one side of the ruthenium film. The conductive film for a touch panel according to the above <7>, wherein at least one of the hardened layers is heat-treated at a temperature of 100 Å to 180 Å. Or, after the heat treatment of the film is performed at a temperature between 10 ° C and 18 ° cc, and the PET film is cooled to room temperature, the bridging material is obtained by hardening at least one side of the PET film. <9> The conductive film for a touch panel according to the above <7>, wherein the hardened layer of at least one layer is at a temperature between 120 ° C and 180 ° C, and the pET film is used.

進行熱處理之同時,或以12CTC至180°C間之溫度,將PET 膜進行熱處理之後,使架橋性物質在前述PET膜之至少一 面硬化所獲得。 〈10〉如前述〈1〉至〈9〉中任一項所記載之觸控面板 4 4 1291182 用導電性膜,其中PET膜為二軸延伸之ρΕτ膜。 〈11 &gt;如岫述〈2〉所記載之觸控面板用導電性膜,其中 架橋性物質藉由熱而硬化成膜之硬化層之厚度為至 5 # m。 &lt; 12〉如前述〈3〉所記載之觸控面板用導電性膜,其中 導電性膜之與導電膜相反側之表面之錯筆硬度為3h以上。 〈13〉如前述〈丨〉至〈12〉中任一項所記載之觸控面板 用導電性膜,其中硬化層之至少丨層係霾值為丨至川%之具 有反眩光機能之層。 a 〈14〉如前述〈〇至〈13〉中任一項所記載之觸控面板 用導電性膜,其中於基體’將使導電膜附著之層作為反眩 光層。 〈15〉如前述〈〇至〈14〉中任一項所記載之觸控面板 用導電性膜,其中在與作為前述基體之第一基體之導電膜 相反側之面,經由接著層進一步具有第二基體。 〈16〉一種觸控面板用導電性膜之製造方法,其特徵在 於具有:基體準備工序,其係準備基體,該基體至少具有 由PET膜所形成之層,及架橋性物質已硬化成膜之硬化層 ,在以150°C加熱1小時之後之長度方向(ME))及寬度方向 (TD)之收縮率均為〇·5%以下;及導電膜附著工序,其係 使導電膜附著於藉由前述基體準備工序所準備之基體者; 於前述基體準備工序,以l〇〇°C至180°C間之温度,將pET 膜進行熱處理之同時,或以loot:至18crc間之溫度,將PET 膜進行熱處理之後,使架橋性物質在前述PET膜之至少一 1291182 ‘ 面硬化,以使至少1層之硬化層硬化成膜而形成。 〈Π &gt;如前述〈1 6〉所記載之觸控面板用導電性膜之製 造方法,其.中於前述基體準備工序,以100°C至180°C間之 溫度,將PET膜進行熱處理之同時,或以100°c至180°c間 之溫度,將PET膜進行熱處理之後,且前述PET膜冷卻至室 ' 溫之前,使架橋性物質在前述PET膜之至少一面硬化,以 使至少1層之硬化層硬化成膜而形成。 〈18〉如前述〈16〉所記載之觸控面板用導電性膜之製 % 造方法’其中基體準備工序係於PET膜之至少一面,使熱 架橋性物質硬化上,包含將5kg/cm2至50kg/cm2之力施加於 長度方向(MD)之狀態下,於l〇(Tc至180°C之範圍之溫度 使之硬化之工序。 【實施方式】 以下,說明本發明之實施型態。 本發明之觸控面板用導電性膜係在至少具有ΡΕτ膜層及 架橋性物質已硬化成膜之硬化層之基體上,形成導電膜而 ® 成;前述基體在以150t:加熱!小時之後之MD (長度方向( 膜流動方向))及TD (寬度方向(膜寬度方向))之收縮 、 率均為0.5%以下。 ' 本發明之導電性膜由於以PET膜作為基體之主要構成要 素口此具有透明性,作為觸控面板用導電性膜而使用。 本發月之$電性膜之透明性並未特別限制,但用於丁p之情 〇透明性甚為重要,可視光之透過率宜為70%以上,85 %以上尤佳。除了基材之PET臈之透過率以外,透明性亦 12 1291182 按照各種架橋性物質之種類、厚度或硬化條件、汀〇之氧 化程度或厚度、結晶性或非晶性之種類不同等而變化,宜 調整此等所有變化要因,以獲得高透明。 前述PET膜亦可進行不損及透明性或耐熱性等特性之^ 度之變質。又,於而膜中,亦可含有防止氧化劑、㈣ 線吸收劑、著色劑、滑劑等以各種目的所添加之添加劑。 又,為了提升附著於表面之硬化性物質或IT〇等導電膜之 密接性,多半使用有施加可羅那處理或電漿處理,或者預 先塗布用以提升接著性之丙烯酸樹脂等易接著層者,反而 較適合使用。 前述ΡΕΤ膜之厚度並未特別限定,但用於ΤΡ之情況,從 作業性方面餘性強度的觀點考量,宜為厚度 之膜,特別是厚度80〜250/zm之膜較佳。貼合2片PET以提 升滑動性時’於適用本技術之情況,2片ρΕτ膜之合計厚度The heat treatment is carried out, or the PET film is heat-treated at a temperature between 12 CTC and 180 ° C, and then the bridging material is obtained by hardening at least one side of the PET film. <10> The conductive panel according to any one of the above-mentioned <1> to <9>, wherein the PET film is a biaxially stretched ρΕτ film. The conductive film for a touch panel described in <2>, wherein the thickness of the hardened layer of the bridging material hardened by heat is up to 5 # m. The conductive film for a touch panel according to the above <3>, wherein the surface of the conductive film opposite to the conductive film has a erroneous hardness of 3 hours or more. The conductive film for a touch panel according to any one of the above-mentioned items, wherein at least the 丨 layer of the hardened layer is a layer having an anti-glare function from 丨 to 川%. The conductive film for a touch panel according to any one of the above aspects, wherein the substrate to which the conductive film is attached is used as an anti-glare layer. The conductive film for a touch panel according to any one of the aspects of the present invention, wherein the surface of the conductive film corresponding to the first substrate of the substrate is further provided via a bonding layer. Two substrates. <16> A method for producing a conductive film for a touch panel, comprising: a substrate preparation step of preparing a substrate having at least a layer formed of a PET film, and a bridging material having been cured into a film. The shrinkage ratio of the hardened layer in the longitudinal direction (ME) and the width direction (TD) after heating at 150 ° C for 1 hour is 5%·5% or less; and the conductive film adhesion step is performed by attaching the conductive film The substrate prepared by the substrate preparation step; in the substrate preparation step, the pET film is heat treated at a temperature between 10 ° C and 180 ° C, or at a temperature between loot: 18 crc After the PET film is subjected to heat treatment, the bridging material is hardened on at least one of the 1291182's of the PET film to form a hardened layer of at least one layer to form a film. The method for producing a conductive film for a touch panel according to the above aspect, wherein the PET film is heat-treated at a temperature between 100 ° C and 180 ° C in the substrate preparation step. At the same time, or after heat treatment of the PET film at a temperature between 100 ° C and 180 ° C, and before the PET film is cooled to room temperature, the bridging material is hardened on at least one side of the PET film to at least The hard layer of one layer is formed by hardening a film. <18> The method for producing a conductive film for a touch panel according to the above <16>, wherein the substrate preparation step is performed on at least one side of the PET film, and the heat-bridged material is cured, and comprises 5 kg/cm 2 to A process in which the force of 50 kg/cm 2 is applied to the longitudinal direction (MD) and is hardened at a temperature in the range of Tc to 180 ° C. [Embodiment] Hereinafter, an embodiment of the present invention will be described. The conductive film for a touch panel of the present invention is formed by forming a conductive film on a substrate having at least a ΡΕτ film layer and a hardened layer in which a bridging material has been hardened into a film; and the substrate is heated at 150 t: (The longitudinal direction (film flow direction)) and the TD (width direction (film width direction)) are both 0.5% or less. The conductive film of the present invention has a PET film as a main component of the substrate. Transparency is used as a conductive film for touch panels. The transparency of the electric film of this month is not particularly limited, but it is very important for the transparency of the light, and the transmittance of visible light is suitable. More than 70%, more than 85% In addition to the transmittance of the substrate, the transparency is also 12 1291182. It varies according to the type, thickness or hardening condition of various bridging materials, the degree or thickness of oxidation or thickness of crystal, or the type of amorphous or amorphous. It is advisable to adjust all the factors of these changes to obtain high transparency. The PET film can also be deteriorated without impairing the properties such as transparency or heat resistance. Moreover, the film may also contain an anti-oxidant, (4) Additives added for various purposes such as line absorbers, colorants, and lubricants. In order to improve the adhesion between a curable substance adhering to the surface or a conductive film such as IT〇, it is often used to apply a corona treatment or a plasma. The thickness of the ruthenium film is not particularly limited, but it is used in the case of a ruthenium. Considering, it is preferable to use a film of thickness, especially a film having a thickness of 80 to 250/zm. When two sheets of PET are attached to improve the sliding property, two pieces of ρΕτ are applied in the case of applying the technology. The total thickness

宜為上述厚度。 X 關於前述基體之層構成,除了至少具有膜層及架橋 #十生物質已硬化成膜之硬化層以外,並未特別限制,具有單 -硬化層或複數硬化層均可。又,硬化層層疊於藉由ρΕτ .膜所形成之層之導電膜側、層疊在與導電膜相反側或層疊 於兩側均可。 前述架橋性物質已硬化成膜之硬化層係硬化於PET膜表 面’由於PET膜對於熱安定,即使進行使ιτ〇附著於此膜之 後再以150(:知度之溫度使銀糊硬化之處s,由於尺寸變 化小,可大幅改善導電性膜之耐滑動性。 13 4 1291182 , 省 作為木橋丨生物貝亚未特別限定,可使用習知者,可採用 - 熱架橋性物質、如势々k綠力u 2 — 、 I外線木橋物質之藉由光之架橋性物質 三及:由電子線之架橋性物質等。作為例如:熱架橋性物 f、藉由光之架橋性物質及藉由電子線之架橋性物質,可 舉出.二聚鼠胺系樹脂、胺甲酸乙酯系樹脂、胺甲酸乙酯 丙烯馱系树月θ、酸醇樹脂、丙烯酸樹脂、矽酮系樹脂、環 氧系樹月曰等硬化型樹脂等,此等可使用混合2種以上或在構 造上將2種以上混成者。為了硬化,分別調製引發劑或分子 φ 量調節劑等。 舉出在本發明所使用之架橋性物質之-例。例如:於分 子内,有2個以上丙烯酸系或甲基丙稀酸系雙重結合之架 橋!·生單體、於分子内具有2個以上之烯丙基之架橋性單體、 2分子内具有2個以上之芳香性乙烯系雙重結合之架橋性 單體、或此等之低聚物或聚合物。 作為市售品,例示於分子内具有2個以上丙烯酸系或甲基 丙烯酸系雙重結合之架橋性單體等,可舉出:bisc〇at7⑻ 修(大阪有機化學工業股份有限公司製)、KAYARAD R-551 (曰本化學股份有限公司製)、ar〇nix j 5 (東亞合 - 成股份有限公司製)、ARONIX M-210 (同)、BP-4PA (It is preferably the above thickness. X The layer structure of the above-mentioned substrate is not particularly limited, and may have a single-hardened layer or a plurality of hardened layers, except for a hardened layer having at least a film layer and a bridge #10 biomass hardened into a film. Further, the hardened layer may be laminated on the side of the conductive film of the layer formed of the film of ρΕτ., laminated on the side opposite to the conductive film or laminated on both sides. The hardened layer in which the bridging material has been hardened into a film is hardened on the surface of the PET film. Since the PET film is thermally stable, even if the film is adhered to the film, the silver paste is cured at a temperature of 150 (the temperature of the temperature is hardened). s, since the dimensional change is small, the sliding resistance of the conductive film can be greatly improved. 13 4 1291182, The province is not particularly limited as a wooden bridge, and can be used by a conventional person, and can be used - a heat bridge material, such as a squat k Green Force u 2 — , I The external bridge of the wooden bridge material by the bridge material of light and the bridge material of the electron line, etc. as, for example, the thermal bridging property f, the bridging material by light and by Examples of the bridging material of the electron beam include a dimeric murine amine resin, an urethane resin, an urethane propylene fluorene tree θ, an acid alcohol resin, an acrylic resin, an anthrone resin, and an epoxy resin. A hardening type resin, etc., such as a eucalyptus, may be used, and two or more types may be mixed or two or more types may be mixed. For the purpose of curing, an initiator, a molecular φ amount adjusting agent, and the like are prepared, respectively. Bridged material used - For example, in the molecule, there are two or more acrylic or methyl acrylic acid double-bonded bridges! • Raw monomer, bridging monomer having two or more allyl groups in the molecule, and two molecules. A bridging monomer having two or more aromatic vinyl-based double bonds, or such an oligomer or a polymer. As a commercially available product, it is exemplified by having two or more acrylic or methacrylic double molecules in the molecule. The bridge-type monomer and the like are exemplified by: bisc〇at7 (8) repair (manufactured by Osaka Organic Chemical Industry Co., Ltd.), KAYARAD R-551 (manufactured by Sakamoto Chemical Co., Ltd.), ar〇nix j 5 (East Asia- Co., Ltd.), ARONIX M-210 (same), BP-4PA (

• 共榮社油脂股份有限公司製)、BP-4EA (同)、UVIMAR UVSA-1002 (三菱油化股份有限公司製)、uvimar UVSA-2006 (同)等。 又,作為於分子内具有2個以上之烯丙基之架橋性單體, 可舉出:苯二甲酸二烯丙基酯、對苯二甲酸二烯丙基酯、 14 1291182 j 異本一曱酸一烯丙基s旨、三烯丙基三聚異氣酸g旨、三烯丙 - 基三聚氰酸酯、二乙二醇雙烯丙基碳酸酯等。 並且’作為於分子内具有2個以上之芳香性乙烯系雙重結 合之架橋性單體,可舉出:二乙烯基苯、二異丙烯基苯' 二乙烯基甲苯、三乙烯基苯、二異丙烯基甲苯、二乙烯基 • 萘、二異丙烯基萘、4,4、二乙烯基聯苯、4,4,_二異丙烯基 聯苯等。 &amp; 並且,架橋性物質中,作為低聚物可舉出前述架橋性單 • 體之低聚物,其聚合度通常為2〜1,000,更好是2〜1〇〇程 度。 並且,架橋性物質中,作為聚合物可舉出:於分子末端 具有起因於丙烯酸系或甲基丙烯酸系雙重結合之乙烯性不 飽和基之聚醚聚胺甲酸乙醋、聚醋聚胺甲酸乙酯、聚己内 酯聚胺甲酸乙酯等。 並且可使用於環氧基丙烯酸酯預聚物中添加矽氧烷耦合 4者,矽氧烷耦合劑之添加量一般添加〇.5〜〗重量%,宜 _ 具有環氧基、胺基、硫醇基。 且 作為胺甲酸乙醋系樹脂,宜使用將!分子内具有2個以上 =羥基之多元醇化合物,以多官能異氰酸醋化合物所硬化 ' 。作為多元醇化合物,可舉f乙二醇、二乙二醇等之 聚喊多元醇,·環氧樹脂變性多元醇、聚醋多元醇、乙撐義 乙歸醇共聚物之驗化物、苯氧系樹脂等。 土 再者,架橋性物質作為熱架橋性物質使用之情況,亦可 1291182 添加具有熱聚合性之其他單體、低聚物或聚合物。 此情況,若熱架橋性物質之比例變 的覆膜,因此其比例至少含有2〇重量%以:…有強度 量%以上’並且更好是含有50重量%以上。1含有3°重 又’作為熱架橋性物質使用之情況, 合引發劑。 ㈢田暴t 化::此自由基聚:引發劑,可舉例如:過氧化物、偶氮 口更具體^ ’可舉出:過氧化苯甲醯基、L_過氧 Z苯甲酸醋、偶氮雙異丁腈等”匕自由基聚合引發劑 可為早獨1種,或併用2種以上。 ,自由基聚合引發劑之添加量係對於熱架橋性物質_ 重置部,使用G〜2重量部,更好是〇·_〜β量部。 另一方面’架橋性物質作為紫外線等之光架橋性物質使 ,情況,亦I添加光聚合成之其他單體、低聚物或聚合 。此情況’若光架橋性物質之比例變少,無法獲得有強 -之覆膜’其比例必須至少含有2〇重量%以上宜含有川 重量%以上,更好是含有5〇重量%以上。 又,於作為光架橋性物質使用之情況,亦可添加光聚合 引發劑。 作為此光聚合引發劑,可舉例如·· 1-經基環己基苯基酮 ’ ψ氧基笨基笨乙_、苯乙酮、二笨曱酮、氧雜 w _ Μ Μ苯並甲駿、苟、葱跟、三苯基胺、卡嗤、^ 曱基苯乙酮、4-氣-絮田⑽ , 一 虱一本曱_、‘4、二曱氧基二苯甲酮、4-4、 一胺二苯曱綱、来兼 勒酵1、本偶姻丙基_、苯偶姻乙基醚 16 1291182 ; Λ 4 4 、苯曱基二曱基縮_、1(4 —異丙基苯基)-2,基—2 一甲基丙 烧1酮2 L基2甲基—苯基丙烧_ 1 —酮、硫氧雜蒽酮系 化合物、2-曱基-1-[4 —(甲基硫)苯基卜2一嗎啉基一丙烷一卜 酮、2,4,6-三甲基苯曱醯基二苯基_磷氧化物等。此等光聚 合引發劑可為單獨1種,或併用2種以上。 相對於光架橋性物質1〇〇重量部,光聚合引發劑之添加量 為0〜5重望部,宜為〇‘重量部,更好是〇·2〜”量部。 又,於光聚合引發劑,可因應需要而併用胺系化合物等之 | 光增感劑(聚合促進劑)。 使用於本發明之架橋性物質,除了因應需要所添加之溶 媒,亦可調配反應性稀釋劑、防止老化劑、聚合禁止劑、 平滑劑、界面活性劑等。 此等硬化性樹脂亦可組合使用,亦可數層重疊塗布,於 藉由熱之硬化層之上,層疊藉由紫外線等之光之硬化層等 。從透明性等觀點來看,適合使用丙烯酸系或胺甲酸乙酯 丙烯酸系、矽酮系樹脂。以通常溶液,將添加有防止帶電 I 劑或聚合引發劑等各種添加物而成之組成物稀帛,並調整 成架橋性樹脂固體物為20〜80重量%而使用。 此等硬化後之層厚度並未特別限定,但從熱安定性及耐 滑動性的觀點考量,宜為〇1 Am以上,上更佳。又 ,仗生產性的觀點考量,!層宜1〇//m以下,以下更佳 ,特別是熱硬化性硬化層之情況,從硬化所需之生產性之 觀點來看,特別宜為5 # m以下。 圖1係例示本發明之觸控面板用導電性膜之較佳構成。圖 17 1291182• Co-Prosperity Oil Co., Ltd.), BP-4EA (same), UVIMAR UVSA-1002 (manufactured by Mitsubishi Petrochemical Co., Ltd.), uvimar UVSA-2006 (same), etc. Further, examples of the bridging monomer having two or more allyl groups in the molecule include diallyl phthalate, diallyl terephthalate, and 14 1291182 j iso-n-decanoic acid. Allyl s, triallyl trimeric acid, triallyl-propyl cyanurate, diethylene glycol bisallyl carbonate, and the like. Further, as a bridging monomer having two or more aromatic vinyl double bonds in the molecule, divinylbenzene, diisopropenylbenzene 'divinyltoluene, trivinylbenzene, and diiso are mentioned. Propylene toluene, divinyl naphthalene, diisopropenyl naphthalene, 4,4, divinylbiphenyl, 4,4, diisopropenylbiphenyl, and the like. Further, among the bridging materials, examples of the oligomer include the above-mentioned bridging monomer oligomer, and the degree of polymerization is usually 2 to 1,000, more preferably 2 to 1 degree. Further, among the bridging materials, examples of the polymer include a polyether polyurethane urethane having a double-bonded ethylenic unsaturated group derived from acrylic acid or methacrylic acid at the molecular terminal, and a polyacetic acid urethane. Ester, polycaprolactone polyurethane or the like. And can be used in the epoxy acrylate prepolymer to add oxoxane coupling 4, the amount of oxane coupling agent is generally added 〇.5~〗 〖% by weight, preferably _ with epoxy, amine, sulfur Alcohol base. And as a urethane vinegar resin, it should be used! A polyol compound having two or more = hydroxyl groups in the molecule, which is hardened by a polyfunctional isocyanate compound. The polyhydric alcohol compound may, for example, be a polyacrylic acid such as ethylene glycol or diethylene glycol, an epoxy resin denatured polyol, a polyacetate polyol, an ethylene-ethylidene alcohol copolymer, or a phenoxy group. Resin or the like. In addition, when bridging materials are used as thermal bridging materials, other monomers, oligomers or polymers having thermal polymerization properties may be added to 1291182. In this case, if the ratio of the thermal bridging material is changed to a film, the ratio thereof is at least 2% by weight to be: 5% by weight or more and more preferably 50% by weight or more. 1 In the case of a material having a weight of 3° and used as a heat bridge material, an initiator is used. (3) Field violence t:: This radical polymerization: initiator, for example, peroxide, azo port more specific ^ 'may be: benzoyl peroxide, L_ peroxy Z benzoic acid vinegar, The ruthenium radical polymerization initiator such as azobisisobutyronitrile may be used alone or in combination of two or more. The amount of the radical polymerization initiator added is G to the heat bridge material _ reset portion. 2 weight parts, more preferably 〇·_~β quantity part. On the other hand, 'the bridging substance is used as a light bridging substance such as ultraviolet light, and in other cases, I add photopolymerization to other monomers, oligomers or polymerization. In this case, if the ratio of the light bridging material is small, a film having a strong film cannot be obtained, and the ratio thereof must be at least 2% by weight or more, preferably more than 5% by weight, more preferably 5% by weight or more. In addition, a photopolymerization initiator may be added as a photo-branching material. Examples of the photopolymerization initiator include 1-cyclohexyl phenyl ketone ' ψ 笨 笨 笨 笨 _ , acetophenone, dioxin, oxab _ Μ benzophenone, scorpion, onion, Phenylamine, carbenol, acetophenone, 4-gas-float (10), one 曱, ', '4, dimethoxy benzophenone, 4-4, monoamine diphenyl hydrazine Outline, come and leave yeast 1, benzoate propyl _, benzoin ethyl ether 16 1291182; Λ 4 4 , benzoquinone dimercapto _, 1 (4-isopropylphenyl)-2, —2-methylpropanone 1 ketone 2 L-based 2-methyl-phenylpropanone _ 1 -ketone, thioxanthone-based compound, 2-mercapto-1-[4-(methylthio)benzene Keb 2-morpholinyl-propane-propanone, 2,4,6-trimethylphenylnonyldiphenyl-phosphorus oxide, etc. These photopolymerization initiators may be used alone or in combination 2 The amount of the photopolymerization initiator added is 0 to 5 by weight, and is preferably 〇'weight portion, more preferably 〇2~". Further, as the photopolymerization initiator, a photo sensitizer (polymerization accelerator) such as an amine compound may be used in combination. The bridging material to be used in the present invention may be formulated with a reactive diluent, an anti-aging agent, a polymerization inhibiting agent, a smoothing agent, a surfactant, and the like, in addition to the solvent to be added as needed. These curable resins may be used in combination or in a plurality of layers, and a hardened layer of light such as ultraviolet rays may be laminated on the heat-hardened layer. From the viewpoint of transparency and the like, an acrylic or urethane acrylic or an oxime resin is suitably used. In the usual solution, a composition obtained by adding various additives such as a charge preventing agent or a polymerization initiator is diluted and adjusted to have a bridging resin solid content of 20 to 80% by weight. The thickness of the layer after the hardening is not particularly limited, but it is preferably 〇1 Am or more from the viewpoint of thermal stability and slidability. Also, 仗 productive considerations,! The layer is preferably 1 Å/m or less, more preferably the following, particularly in the case of a thermosetting hardenable layer, and particularly preferably 5 Å or less from the viewpoint of productivity required for hardening. Fig. 1 is a view showing a preferred configuration of a conductive film for a touch panel of the present invention. Figure 17 1291182

• 1A為具有基體1及導電膜2之導電性膜,基體丨係在由pET - 膜所形成之層3之單側,形成有架橋性物質已硬化成膜之硬 化層4 ’於其上具有導電膜2之例。又,圖iB係基體1在由 PET膜所形成之層3之單側,形成有架橋性物質已硬化成膜 之硬化層4 ’在由PET膜所形成之層3之相反側,形成有導 - 電層2之例。如此,前述硬化層設在由前述PET膜所形成之 層之導電膜側、設在與導電膜相反側或設在兩側均可。於 任一情況,作為硬化層,可從熱架橋性物質已硬化成膜之 • 硬化層、藉由光之架橋性物質已硬化成膜之硬化層、及藉 由電子線之架橋性物質已硬化成膜之硬化層等適當地選擇 使用。作為前述硬化層,在由前述PET膜所形成之層3,具 有架橋性物質藉由熱而硬化成膜之硬化層,如後面詳述, 在能以簡化之工序製造,獲得優異耐滑動性之點來看較適 又,圖1C、D、E&amp;F係硬化層4有複數之例,例如:於圖 1C及圖1D,舉出作為硬化層鈍,具有熱架橋性物質已硬化 • 成膜之硬化層,作為熱硬化層仆,具有光或電子線架橋性 物質已硬化成膜之硬化層之構成等。 &quot; 作為本發明之導電性膜之較佳態樣,舉例一種導電性膜 ,其係基體包含熱架橋性物質已硬化成膜之硬化層,並且 至少具有1層之藉由光或電子線之架橋性物質已硬化成膜 之硬化層者。作為前述硬化層,使用架橋性物質由於熱而 硬=成膜之硬化層,在可簡化工序且獲得優異耐滑動性之 點來看,較適宜,但於例如·· Tp等需要防止損傷之用途, 18 1291182 僅以熱硬化性樹脂,使之具有ΤΡ之觸控面用之導電性膜之 防止損傷效果’在硬度上仍不足。—般而言’作為τρ電極 使用之情況,以手指或筆觸碰或以筆摩擦,因此為了難以 損傷,ΙΤΟ層等導電膜之相反面(觸控面)要求3Η以上之 高硬度。通常於5”以下之厚度,熱架橋性物質之硬度多 半以Η或2Η為限度,只要未實施在經濟上不利之長時二硬 化,或使膜厚變厚,難以達成此以上之硬度。相對於此, 以光或電子線所架橋之硬化| ’可在短時間獲得纽之硬度 ,因此例如:於圖…及!)之構成,主要作為低收縮且用: 熱安定化之硬化層,使硬化層4a成為厚|5心以下之熱硬 化樹脂層,作為兼具獲得表面硬度之損傷防止層之作用之 硬化層,使硬化層4b成為硬化速度快、硬度充分之藉由光 或電子線之架橋性物質已硬化成膜之硬化層(特別^紫外 線硬化樹脂層或電子線硬化樹脂層),在同時達成生產性 及較大硬度,並且熱安定性或耐滑動性優異之點來看,較 適宜。從防止損傷的觀點來看,前述藉由光或電子線之架 橋!·生物貝已硬化成膜之硬化層,宜至少設在與藉由膜 所形成之層3之導電膜2相反側,使之為觸控面。於本發明 敢初將藉由熱所架橋之硬化層43,形成在由膜所形 成之層3之單側,以謀求對於熱之安定化,其後宜形成以光 或電子線架橋硬化之層。圖1C係熱硬化層4a及光或電子線 硬化層4b重疊形成於觸控面,導電膜直接形成於PET層3。 圖1 D係熱硬化層4a及光或電子線硬化層4b形成於PET層3 之兩側,導電膜2形成於熱硬化層物上。圖m係至少於兩 19 :1291182 λ * - 4 側形成辟化Μ V . 、 Μ 、s,於作為電極使用之情況,難以發生翹曲之 萨=看或例如:於此層疊膜形成ITO等之工序或於處理 U難以發生擦痕等點來看,為較佳構成。又,對於在 外部使用之丁 p,曰^ 、 ,马了提高視認性,亦可使4a或4b之硬化層 成為亦具備反眩光效果之硬化層。 再者,如則述,藉由熱所架橋之硬化層由於硬度稍微 乂防止損傷為目的,不使用在設於與ITO面相反側之 觸控面之以往之樹脂層。於現在所使用之TP電極,多半於 τρ之觸控面’形成藉由光所架橋之硬化層。 又從進一步提高耐滑動性之觀點來看,宜進一步設置 ,化層。又,於圖1Ε及圖1F,舉出作為硬化層4a,具有熱 架橋性物質6硬化成膜之硬化層,料硬化層4b及4c,具 有光或電子線架橋性物質已硬化成膜之硬化層之構成等。 仆、心層存在於由pET膜所形成之層之兩側之構成,係觸 控面獲得3H以上之硬度,可賦予反牛頓環性能,於兩面具 _ 有硬化層,可達成機械強度平衡,難以翹曲,而且兩面為 3H以上,在工序或處理上,難以發生擦痕等,為最適當的 構成。於圖1E及圖1F,首先於PET膜層3,塗布藉由熱所架 ” 橋之硬化層牦,以l〇〇°C至18(TC使之乾燥及硬化。此後, • 於扣層上或塗布有钩層之面之任一者,形成以光或電子線 所架橋之硬化層,其次可於相反面,同樣地形成硬化層。 此情況,為了使TP之觸控面成為3H以上,宜選定樹脂^類 、厚度或架橋度。塗布有ITO等導電膜之面之硬度,未必 要3H,但以可抑制工序或處理上發生損傷之點來看,可考 20 1291182 種類、厚度、架橋度等 慮兩面機械強度之平衡,選定樹脂 於兩面5又置硬化層之情況,選定兩面具有相同程度 之熱%脹係數者,以達成強度平衡、暴露於高熱時不易產 生皺、、文或裂缝之點來看,較適宜。以實用於τρ之觀點來看 ,此圖1E及圖1F為最佳構成。 層疊熱架橋性物質已硬化成膜之硬化層,及藉由光或電 子線之架橋性物質之已硬化成膜之硬化層之情況,重疊塗 布之層之全體厚度只要按照必要厚度決定即可,若是一般 所而之3H程度’宜為2/Zm〜1〇/^m。若從生產性、低收縮 性、其安定性及硬度等综合地判斷,熱硬化性樹脂層宜為 〇.5心〜5_,塗布於其上之紫外線硬化層等宜為卜以 m ° 又’為7TP用導電膜所需之防止圖像偏差、防止反射、 防止牛頓環發生等之處理,可於前述硬化層(於硬化層有 複數之情況,為至少任一 Μ、‘ λ、 、 9力入各種添加物或施加處理 。又’為了此等目的,亦可协治 丌了於則述基體進一步添加熱或紫 外線硬化樹脂。 可使形成導電膜之面之下側之麻 惻之硬化層,例如:於圖1Ε為 4c層,於圖1F為4b層,具有反牛賴 干員衣效果。具體而言,為 了使霾值為0.5至3%,可使於葬士 、 1定於猎由先或電子線所架橋之樹 脂成分,含有丙烯酸粒子等有機系 韦钱糸粒子或矽粒子等無機系 粒子者硬化。調配成霾值小之棒 ㈡况,反牛頓效果小,大的 情況’可能圖像會出現偏差,此厣 層之缠值宜調整為0.5%至 21 1291182 « Λ Λ 3%之間。從取得反牛頓性與防止圖像偏差之平衡的觀點來 ' 冑’此等之粒子係混人直徑不同者比具有均勻粒徑者適宜 。具體而言,宜混入;!〜6 # m範圍之直徑不同的粒子混 入2〜5/zm範圍之直控不同之粒子更佳。 反眩光祕在外部使用之顯示器。使具有反炫光效果之 - 情況’例如:於圖踐,之知、4卜4嶙,可控制霾值, 選=總和的霾值。-般而言,霾值可選定於2%至2〇%之間 。貍值係使架橋之樹脂成分中混入丙烯酸粒子或矽粒子者 • 硬化所獲得。為了獲得作為目標之霾值,將以光或電子線 架橋之樹脂硬化之仆及乜,係作為相同霾值而調整,但從 可減少獲得硬化層之樹脂種類之點來看,較為適宜。又, 硬化層之至少丨層為具有霾值丨至20%之反眩光機能之層之 悲樣較佳。 又,在與PET膜之導電膜相反面之硬化層,宜使之含有 矽粒子等’以便具有反眩光或防止牛頓環效果。 冑晰塗層之情況,宜在任-硬化層均未含有石夕或丙稀酸 •等粒子’全體之霾值宜抑制在2%以下。於此情況,亦可能 避免牛頓環發生,可使ITO層下側之硬化層中含有矽或丙 - 烯酸粒子,宜將霾值調整在2%以下。 . 矽粒子為非晶質且多孔性。作為代表例可舉出矽膠。作 為有機系粒子之代表例為丙烯酸粒子。作為此等之平均粒 徑,通常為30#m以下,更好是2〜15//111程度,調配比例 係相對於硬化性樹脂100重量部,粒子宜為〇1〜1〇重量部 。又,使相接於基體之導電膜之層,成為含有粒子之反眩 22 4 I291J82 光層或反牛頓環層,可使耐滑動性更加優異。亦即,使之 具有防止牛頓環效果之際,使含有矽等之粒子之硬化層附 著之情況,若於此上部形成導電性物質,含有粒子之硬化 層位於導電膜之下部的話,可提升滑動性,因此為適當構 成。 本發明之導電性膜之要件為,基體在以1 5〇它加熱1小時 之後之長度方向(MD )及寬度方向(TD )之收縮率均為 0·5%以下。在此,「以15〇°C加熱1小時之後之長度方向( _ MD )及寬度方向(TD )之收縮率」,其係以室溫將基體 取得尺寸後,加熱至150°C,並保持!小時之後,回復到室 溫,再度取得尺寸所計測之收縮率。 為了符合熱之尺寸安定性或TP之25〇g、1〇萬次之滑動測 試,若於MD及TD,使本發明之導電性膜之15〇。〇之熱收縮 率均為0.5%以下即可獲得,但為了符合5〇〇g、3〇萬次之滑 動測试,宜使MD及TD之收縮率為〇 4%以下,在〇·3%以下 更佳。 籲 低收縮化之方法並未特別限制,但必須在使導電膜附著 之前,使基體低收縮率化。又,至少丨層之硬化層係在以1〇〇 °〇至180°(::間之溫度,將PET膜進行熱處理之同時,或者以 以100 C至180 C間之溫度,將pET膜進行熱處理之後,使 架橋性物質在前述PET膜之至少一面硬化所獲得,在抑制 PET膜之收縮率且使之安定上,較為適宜。熱處理在12〇它 以上更佳,120°C〜160°C間之溫度尤佳。為了在IT〇層附 著後,使ιτο結晶化,據知係以15〇r附近之溫度進行退火 23 1291182 〇此情況,作為亦含右 更化層之透明導電膜,MD及TD方 向之熱收縮率可的盔n &lt; 0/ 千“勾為〇·5%以下,但由於IT〇等導電膜與 PET膜等有機物之熱特^同,^此退火處理,可能於 TO層’、有機物界面之間殘留應力’由於筆等之滑動,IT。 層剝離,於層產生裂缝。• 1A is a conductive film having a substrate 1 and a conductive film 2, and the substrate is entangled on one side of the layer 3 formed of the pET-film, and a hardened layer 4' having a bridging substance hardened into a film is formed thereon. An example of the conductive film 2. Further, in Fig. iB, the substrate 1 is formed on one side of the layer 3 formed of the PET film, and the hardened layer 4' in which the bridging material has been hardened into a film is formed on the opposite side of the layer 3 formed of the PET film. - An example of electrical layer 2. In this manner, the hardened layer may be provided on the side of the conductive film of the layer formed of the PET film, on the side opposite to the conductive film, or on both sides. In either case, as a hardened layer, the hardened layer can be hardened into a film, the hardened layer, the hardened layer which has been hardened by the bridge of light, and the hardened layer by the electron beam. The hardened layer of the film formation or the like is appropriately selected and used. As the hardened layer, the layer 3 formed of the PET film has a hardened layer in which a bridging material is hardened by heat, and can be produced in a simplified process as described later in detail to obtain excellent sliding resistance. In view of the point that the hardened layer 4 of FIG. 1C, D, E & F is plural, for example, in FIG. 1C and FIG. 1D, it is blunt as a hardened layer, and has a heat-bridged substance hardened. The hardened layer serves as a thermosetting layer, and has a structure in which a hardened layer in which a light or electron bridge bridging material has been hardened into a film. &quot; As a preferred aspect of the conductive film of the present invention, there is exemplified a conductive film comprising a hardened layer in which a thermally bridged substance has been hardened into a film, and having at least one layer by light or electron beam The bridging material has hardened into a hardened layer of the film. As the hardened layer, a hardened layer in which a bridging material is hard-formed by heat is used, and it is preferable from the viewpoint of simplifying the process and obtaining excellent sliding resistance, but it is necessary to prevent damage such as Tp. , 18 1291182 Only the thermosetting resin, which has the anti-damage effect of the conductive film for the touch surface of the crucible, is still insufficient in hardness. As a general case, when the τρ electrode is used, it is rubbed with a finger or a pen or rubbed with a pen. Therefore, in order to be hard to damage, the opposite surface (touch surface) of the conductive film such as the ruthenium layer requires a high hardness of 3 Η or more. Usually, the thickness of the thermal bridging material is usually limited to 5 or 2 厚度, and it is difficult to achieve the above hardness as long as the economically unfavorable long-term secondary hardening is not performed or the film thickness is made thick. Here, the hardening by the bridge of light or electron wire | 'The hardness of the knot can be obtained in a short time, so for example: in the figure... and!), mainly as a low shrinkage and use: a hardened layer of heat stabilization The hardened layer 4a is a thermosetting resin layer having a thickness of 5 or less and a hardened layer which functions as a damage preventing layer for obtaining surface hardness, and the hardened layer 4b has a high curing speed and a sufficient hardness by light or electron beam. The bridging material has been hardened into a hardened layer of the film (especially an ultraviolet curable resin layer or an electron beam hardened resin layer), and at the same time, it is productive and has a large hardness, and the thermal stability or the sliding resistance is excellent. Suitable from the viewpoint of preventing damage, the above-mentioned bridging by light or electron wires! The hardened layer in which the bioshell has been hardened into a film is preferably provided at least in contrast to the electroconductive film 2 of the layer 3 formed by the film. In the present invention, it is said that the hardened layer 43 of the bridge is formed on one side of the layer 3 formed by the film to achieve heat stabilization, and then it is preferably formed. The layer of the optical or electronic wire bridge is hardened. The thermosetting layer 4a and the optical or electron hardening layer 4b are formed on the touch surface, and the conductive film is directly formed on the PET layer 3. Fig. 1 D-type thermosetting layer 4a and light Or an electron hardening layer 4b is formed on both sides of the PET layer 3, and a conductive film 2 is formed on the thermosetting layer. Fig. m is formed on at least two 19:1291182 λ* -4 sides to form a bismuth V. , Μ, s When it is used as an electrode, it is difficult to cause warpage. For example, it is preferable that the laminated film forms a step of forming ITO or the like, or that the treatment U is less likely to cause scratches, etc. External use of the p, 曰 ^, , horse to improve visibility, can also make the hardened layer of 4a or 4b into a hardened layer that also has anti-glare effect. Furthermore, as described, the hardened layer by thermal bridge For the purpose of preventing damage slightly, the touch surface provided on the side opposite to the ITO surface is not used. In the conventional TP electrode, a hardened layer bridged by light is formed on the touch surface of τρ. Further, from the viewpoint of further improving the sliding resistance, it is preferable to further provide a layer. Further, Fig. 1A and Fig. 1F show a hardened layer which is a hardened layer 4a and has a heat-bridged substance 6 which is cured to form a film, and the hardened layers 4b and 4c have a hardening of a light or electron bridge bridging material to form a film. The composition of the layer, etc. The servant and the core layer are formed on both sides of the layer formed by the pET film, and the touch surface obtains a hardness of 3H or more, which can impart anti-Newton ring performance, and the two masks _ have a hardened layer. The mechanical strength balance is achieved, and it is difficult to warp, and the both surfaces are 3H or more. In the process or the treatment, scratches and the like are less likely to occur, and the most suitable configuration is obtained. In FIG. 1E and FIG. 1F, first, in the PET film layer 3, the hardened layer of the bridge by heat is applied, and dried and hardened by l ° ° C to 18 (TC). Thereafter, • on the buckle layer Or a surface coated with a hook layer to form a hardened layer bridged by light or an electron beam, and secondly, a hardened layer may be formed on the opposite side. In this case, in order to make the touch surface of the TP 3H or more, It is advisable to select the type of resin, thickness or bridging degree. The hardness of the surface coated with a conductive film such as ITO is not necessary 3H, but in view of the point that the process or the treatment may be damaged, 20 1291182 type, thickness, bridging can be tested. The degree of mechanical strength of the two sides is considered, and the resin is selected on both sides and the hardened layer is selected. The two sides have the same degree of thermal % expansion coefficient to achieve the balance of strength, and it is not easy to wrinkle, text or crack when exposed to high heat. From the point of view of τρ, this Figure 1E and Figure 1F are the best composition. The laminated thermal bridging material has hardened into a hardened layer of the film, and is bridged by light or electron wires. a hardened layer of a hardened film In this case, the total thickness of the layer to be overcoated may be determined according to the required thickness, and the general 3H degree is preferably 2/Zm to 1 〇/^m. From the viewpoint of productivity, low shrinkage, stability, and In general, it is judged that the thermosetting resin layer is 〇.5 core 〜5_, and the ultraviolet ray hardening layer or the like applied thereto is preferably used to prevent image deviation, which is required for the conductive film of 7 TP. In order to prevent reflections and prevent the occurrence of Newton's rings, etc., it is possible to apply various treatments or apply treatments to at least one of the hardened layers (in the case of a plurality of hardened layers). The purpose of the method is to further add a heat or ultraviolet curing resin to the substrate. The hardened layer of the paralysis on the lower side of the surface of the conductive film can be formed, for example, as shown in FIG. Layer 4b, which has the effect of anti-British clothing. Specifically, in order to make the 霾 value of 0.5 to 3%, it can be used in the resin component of the funeral, the bridge set by the hunting or the electron line, and contains acrylic particles. Inorganic, such as Wei Qiang particles or bismuth particles The particle is hardened. It is blended into a small 霾 value (2). The anti-Newton effect is small. In large cases, the image may be biased. The entanglement value of this layer should be adjusted to 0.5% to 21 1291182 « Λ Λ 3% From the point of view of achieving the balance between anti-Newtonian and preventing image deviation, it is appropriate to use a particle having a different diameter than a particle having a uniform particle size. Specifically, it is preferable to mix it; It is better to mix particles of different diameters in the m range into the range of 2~5/zm. The anti-glare is used in the external display. The anti-glare effect - the situation is as follows: 4, 4 嶙, can control the 霾 value, select = the sum of the 霾. In general, the 霾 value can be selected between 2% and 2〇%. The raccoon value is obtained by mixing the resin component of the bridge with acrylic particles or bismuth particles. In order to obtain the target enthalpy, it is preferable to adjust the resin and the enamel which are hardened by the resin of the optical or electronic bridge as the same enthalpy value, but it is preferable from the viewpoint of reducing the kind of the resin which obtains the hardened layer. Further, it is preferable that at least the tantalum layer of the hardened layer is a layer having an anti-glare function of from 霾 to 20%. Further, the hardened layer on the opposite side to the conductive film of the PET film is preferably made to contain ruthenium particles or the like in order to have an anti-glare or prevent Newton's ring effect. In the case of a clear coating, it is preferable that the ruthenium of the particles of the enamel or the acrylic acid is not contained in any of the hardened layers. In this case, it is also possible to prevent the Newton's ring from occurring, and the hardened layer on the lower side of the ITO layer may contain strontium or propionic acid particles, and the enthalpy value should be adjusted to 2% or less. The ruthenium particles are amorphous and porous. As a representative example, silicone rubber can be mentioned. A representative example of the organic particles is acrylic particles. The average particle diameter of these is usually 30 #m or less, more preferably 2 to 15//111, and the blending ratio is preferably 〇1 to 1〇 by weight of the curable resin 100 parts by weight. Further, the layer which is in contact with the conductive film of the substrate is an anti-glare 22 4 I291J82 light layer or a reverse Newton ring layer containing particles, and the sliding resistance can be further improved. In other words, when the effect of preventing the Newton's ring is applied, the hardened layer containing particles such as ruthenium may be attached. If the conductive material is formed on the upper portion, and the hardened layer containing the particles is located under the conductive film, the sliding can be improved. Sex, so it is appropriate. The material of the conductive film of the present invention is such that the shrinkage ratio in the longitudinal direction (MD) and the width direction (TD) of the substrate after heating at 15 Torr for 1 hour is 0.5% or less. Here, "the shrinkage ratio in the longitudinal direction (_MD) and the width direction (TD) after heating at 15 °C for 1 hour" is obtained by taking the substrate at room temperature, heating it to 150 °C, and maintaining it. ! After the hour, return to the room temperature and regain the shrinkage measured by the size. In order to comply with the dimensional stability of heat or the sliding test of 25 〇g and 10,000 times of TP, if the MD and TD are used, the conductive film of the present invention is 15 〇. The heat shrinkage rate of bismuth is 0.5% or less, but in order to meet the sliding test of 5〇〇g and 30,000 times, the shrinkage of MD and TD should be less than %4%, at 〇·3%. The following is better. The method of lowering the shrinkage is not particularly limited, but it is necessary to reduce the shrinkage of the substrate before the conductive film is attached. Further, at least the hardened layer of the tantalum layer is subjected to heat treatment of the PET film at a temperature of from 1 〇〇 ° to 180 ° (or between, or at a temperature between 100 ° C and 180 ° C, and the pET film is subjected to a temperature of from 100 ° C to 180 ° C. After the heat treatment, the bridging material is obtained by hardening at least one side of the PET film, and it is preferable to suppress the shrinkage rate of the PET film and stabilize it. The heat treatment is preferably 12 Å or more, 120 ° C to 160 ° C. The temperature between the two is particularly good. In order to crystallize ιτο after the adhesion of the IT layer, it is known that the film is annealed at a temperature around 15 〇r 23 1291182. This is a transparent conductive film which also contains a right-changing layer, MD And the heat shrinkage rate in the TD direction can be n &lt; 0 / thousand "hooks 〇 · 5% or less, but due to the thermal properties of conductive films such as IT 与 and PET films, etc., this annealing treatment may be The TO layer ', the residual stress between the organic interface' is slipped by the pen or the like, and the layer is peeled off to cause cracks in the layer.

作為知述基體之由Ρ ·ρ T 膜所形成之層之材料而使用之 PET膜’能以熔融壓出法等習知方法製造。可從表面平滑The PET film 'used from the material of the layer formed of the ρ·ρ T film as the substrate can be produced by a conventional method such as a melt extrusion method. Smooth from surface

度或透明性、機械強度、耐熱性等觀點,選擇變質程度、 製造法°若以此觀點來看’特別是藉由二軸延伸所製造之 PET膜較佳。二軸延伸膜係縱橫延伸,—般加熱時係大幅 收縮。若採用本發明之手法,以即使是二軸延伸膜,仍可 較低地保純縮率,可安定之點來看,較為適宜。於如此 製造之PET膜表面,多半施加有用以提高表面硬度、防止 作為觸控面板使之偏差或防止反射之塗層,因此亦可使用 於單面或雙面塗布有易接著處理者。作為易接著處理,可 使用可羅那放電、紫外線照射、電漿處理、_㈣處理 、打底處理等習知方法。作為打底處理之易接著層之塗層 劑,只要是具有該效果者,並未特別限定,據知塗布例如 ••聚酯系聚合物或丙烯酸系聚合物。於此層亦可含有矽等 之微粒’以作為滑材。 前述二軸延伸PET膜之15(rc、】小時之收縮率,通常MD (々丨L動方向)為1·〇〜1.8% ’ TD (橫向)為〇1〜。為 了將此在未設置硬化層之狀態,縮小收縮率,可採用··將 已製造之二軸延伸PET膜,一面連續地施加2kg/cm2至 24 4 1291182 4 * 50kg/cm2之張力,以1〇〇。(:至18〇。(:進行加熱處理之方法; 暫且將PET膜捲成輥狀之後,將此輥置入電爐等之 、 150°c附近之溫度進行處理之方法;及進行此等雙方之方法 等。 / 本發明之導電性膜係預先準備以前述方法進行低收縮處 理之PET膜,將此PET膜層疊於硬化層亦可,但藉由預先2 行低收縮處理,以取得本發明之收縮率範圍之pET膜,需 要長時間之處理,產生成本上的問題。將15(rc、!小時之 收縮率為0.5%以上,未進行低收縮處理之二軸延伸膜作為 材料使用,在生產線上同時或連續進行層疊低收縮工序及 熱硬化層之工序,從成本及作為導電膜之情況之提升耐滑 動性之觀點來看較適宜。 於本發明之較佳實施態樣,架橋性物質已硬化成膜之硬 化層係可藉由對於從輥狀之PET膜,一面施加2kg/cm2s 50kg/cm2之應力,一面連續地供給之pET膜,藉由晶片塗層 機、反向塗層機、凹版塗層機、微凹版塗層機、噴霧塗^ 機、槽孔塗層機、輥塗層機、絲網印刷等方法,塗布架橋 性物質,架橋性物質為熱架橋性物質之情況,通過設 1〇〇°(:至18〇1之爐中,使之硬化並捲取等方法做成。此時 ,以100。(:〜180。(:之溫度,架橋性物質之硬化及PET膜之 熱處理。在生產性上,通常宜將此爐在i分至60分之間通過 。爐亦可為1室,但分割成數室,調整溫度,可抑制氣泡產 生,提高硬化速度,提升硬化膜之平滑度。於此方法,無 須預先將PET膜熱處理,進行低收縮化,在工序上可簡化 25 1291182 的點來看,較適宜。又,同時進行PET膜之熱處理及硬化 層硬化之基體係滑動性亦良好。 “於用以取代熱架橋性物質,塗布之架橋性物質係首先使 猎由光之架橋性(例如··紫外線架橋性)或藉由電子線之 架橋性物質硬化,提高PET膜之熱安定性之情況,與熱架 橋性物質相同’通過爐之前,先塗布架橋性物質,通過設 定於loot:〜18(TC之爐之後,照射紫外線等使之硬化,或 通過設定於1()(rc〜18(rc之爐之後,進行冷卻,塗布架橋 性物質,通過設定於2(rc〜13(rc程度之爐並乾燥之後,照 射紫外線等以使之硬化而做成。為了上述PET膜安定化以 外之目的,例如:將硬度提升至311等,將光或電子線所架 橋之物質塗布硬化之情況,可採用習知之方法。例如:以 凹版塗層機將紫外線硬化樹脂塗布PET膜,乾燥後照射紫 外線以使之硬化。 作為前述光架橋性物質之硬化條件,可舉出將波長2〇〇 〜500nm範圍内之紫外線照射〇丨秒以上,更好是〇5〜6〇秒 間等。 再者,於此,照射量之積算量通常為3〇〜5,〇〇〇叫^瓜2, 作為光源可使用低壓水銀燈、高壓水銀燈、碳電弧、金屬 承光燈、水銀放電官、鎢燈、齒素燈、鈉放電管、氖放電 管等。 鈾述收縮率可藉由硬化性樹脂塗布時之pET膜之張力或 爐溫度、硬化速度等控制。 於如此所獲得之具有低收縮率之基體,以濺鍍等手法使 26 1291182 Λ Μ 導電性物質附著,形成導電膜,可製成以低收縮膜為基材 之導電性膜。於PET膜之單面具有硬化層之構成之情況, 導電性物質亦可附著於設有該硬化層之側之表面,及未設 有硬化層之側之表面之任一。作為導電性薄膜之形成方法 ’可使用真空蒸錄法、麟法、離子鍍層法等習知技術之 任一,但從膜之均勻性或薄膜對於PET基材之密接性之觀 點來看,宜以濺鍍法形成薄膜。實施濺鍍法時之溫度,特 別只要可賦予適於TP之電阻值即可,並未特別限制了但6〇 t:〜20(TC較佳。為了使IT〇膜充分氧化,提升ιτ〇膜之密 接性,6Gt:以上較佳,更好&amp;⑻。c以上。若2⑻。c以上, 殘存於PET膜之低聚物將析出,會使之白濁,並不適宜。 如此’於滅鑛時,亦需要高溫’因此可能產生赵曲,但藉 由本發明之熱硬化樹脂而安定化之pET膜,亦具有不會產 生麵曲的特徵。 又,關於導電性之薄膜材料並未特別限制,例如··含有 氧化錫、氧化銦錫(稱為IT〇)、銻之氧化锡等金屬氧化物 、錫之氟添加氧化物、氧化鋅之外,亦可使用金、銀、鉑 、鈀、銅、鋁、鎳、鉻、鈦、鈷、錫或此等之混合物或合 王等此‘電性薄膜之厚度只要可賦予導電性均可,均未 特別限定,但可為5〇Α以上,若過薄,表面電阻值變高,於 作為ΤΡ之電極使用之情況,成^_Ω/□以上,難以成為 /、有良好‘電性之連績薄膜。另一方面,若過厚,會使透 明丨生降低,因此適合之厚度為100〜2000Α。 作為導電性物質,以透.明性料電性之觀點來看,使用 27 1291182 4 4 以濺鍍使ITO附著者較佳,但此ITO —般在附著時點為非晶 質。為了提升耐擦傷性、耐滑動性及環境安定性,據知係 嘗試如前述實施熱處理,使ΙΤΟ結晶化。於要求高可靠性 之導電性膜,此結晶化處理者雖增加,但此結晶化處理係 以高溫實施1至數十小時,使ΙΤΟ膜變得昂貴。又,耐滑動 性亦未必充分。本發明之使用低收縮基體之導電性膜,即 使使用以往認為滑動性不佳之非晶質ΙΤΟ,仍可達成優異 之耐滑動性。又,於使用結晶化ΙΤΟ之導電性膜,耐滑動 &gt; 性亦提升。於使用結晶化ΙΤΟ之導電性膜,耐滑動性未必 充分,可能是因為由於用以ΙΤΟ結晶化之熱處理,ΙΤΟ之強 度或緻密性雖增加,但由於施以熱而導致PET膜膨脹收縮 ,由於ITO與PET膜之膨脹率及收縮率不同,甚大之應力殘 留於ITO層所致。由此可知,於本發明可使用非結晶ITO, 以及一部分或幾乎全部結晶之ITO之任一者,但從無需結 晶化處理,降低成本的觀點來看,可使用非結晶ITO之優 點甚大。 ► 於此導電膜下,或於PET膜之相反面,若使高折射材料 附著,於其上附著低折射材料的話,可製成低反射之導電 性膜。高折射材料能以蒸鍍或濺鍍等手法,使氧化鈦或氧 化锆附著,或者使此等粒子含於藉由紫外線或熱所硬化之 材料中,使之硬化附著。低折射材料能以蒸鍍或濺鍍,使 下述所示之介電體之Si Ox ( X = 1〜2 )等附著,以熱或紫外 線使氟系樹脂硬化而附著。此為了低反射之層實施於PET 膜之任一單面,或者為了進一步低反射而實施於雙面均可 28 1291182 。近年來’高透過率2TP之需求高張,適於使用形成防止 反射層者。 右於上述導電性薄膜上形成透明介電體薄膜,將進一步 改善透明性及耐擦傷性’可能較適宜。此介電體薄膜宜比 導電性薄膜之折射率小,通常具有13〜18之折射率,使用 以SiOx較廉價’較為適宜。此等材料可組合2種以上使用。 介電體之膜厚並未特別限定,但通常為i⑼〜侧A,鳩 〜1500A更佳。若過薄,難以獲得連續薄膜,若過厚,導電 性或透明性惡化,容易產生裂縫。 又’導電性膜用於顯示器裝置等之情況,於加工時或使 用時,可能於其表面產生指紋或污垢。為了解決此問題, 亦可㈣成有導電膜之面之相反最外層面,使防水或防污 層附著。作為具有此類效果之材料,&amp;了例如:由含仲 =或乙婦基之二甲基㈣氧烧及甲基水二烯㈣氧烧之: δ所組成之含矽嗣化合物;及四氟乙 友 « &amp; Jil 聚虱二氟乙烯等 亂糸树月曰以外’亦可單獨或混合使用硫化錳等。此等之形 成方法並未特別限定’按照材料可採用塗布法 / 真空蒸鑛法、錢錢法、捧咐、、共望老 、 阳一、_、 4。處理層之厚度並未特別 限疋’通#宜為1〇〇Α至lL ^ 八至50&quot;蛛度。此處理亦可組合2種以 只轭右與硬化性樹脂組合使用較有效率。 於=述構成,本發明之導電性膜具有良好滑動性,作亦 可將則述基體作為第一基體,在 M ^ ^ ^ 弟基體之導電膜相反 側之面,經由接著層進-步具有第二基體。在此,不止是 29 1291182 〇第:基體,第二基體亦可藉由已述之方法’使熱收縮率為 為低進―步謀求提升耐滑動性。亦可僅使第—基體 *、、、-、、、“ ’但採用本發明之方法,使兩基體均為低收缩 ’以耐滑動性效果變大之點來看,較為適宜。From the viewpoints of degree, transparency, mechanical strength, heat resistance, etc., the degree of deterioration and the manufacturing method are selected. From this point of view, it is preferable that the PET film produced by biaxial stretching is preferable. The biaxially stretched film system extends vertically and horizontally, and is generally shrunk when heated. According to the method of the present invention, even if it is a biaxially stretched film, the shrinkage ratio can be kept low, and it is preferable from the viewpoint of stability. On the surface of the PET film thus produced, a coating which is useful for improving the surface hardness and preventing the deviation as a touch panel or preventing reflection is often applied, and therefore it is also possible to use a single-sided or double-sided coating for easy handling. As the easy-to-treat treatment, a conventional method such as a corona discharge, an ultraviolet ray irradiation, a plasma treatment, a _(four) treatment, or a primer treatment can be used. The coating agent which is an easy-to-adhere layer for the priming treatment is not particularly limited as long as it has such an effect, and it is known to apply, for example, a polyester polymer or an acrylic polymer. This layer may also contain fine particles of ruthenium or the like as a sliding material. The contraction rate of 15 (rc, hr) of the above-mentioned biaxially stretched PET film is usually MD (々丨L moving direction) of 1·〇~1.8% ' TD (transverse direction) is 〇1~. In order to do this, hardening is not provided. In the state of the layer, the shrinkage ratio is reduced, and the manufactured biaxially stretched PET film can be continuously applied with a tension of 2 kg/cm 2 to 24 4 1291182 4 * 50 kg/cm 2 on one side, to 1 〇〇. (: to 18 (: A method of performing heat treatment; a method in which the PET film is wound into a roll, and the roll is placed in a furnace or the like at a temperature of around 150 ° C; and both methods are performed. In the conductive film of the present invention, a PET film which has been subjected to a low shrinkage treatment by the above method is prepared in advance, and the PET film may be laminated on the cured layer. However, the shrinkage ratio of the present invention is obtained by performing two shrinkage treatments in advance. The pET film requires a long time of treatment, which causes a problem in cost. The 15 (rc, ! hour shrinkage ratio is 0.5% or more, and the biaxially stretched film which has not been subjected to low shrinkage treatment is used as a material, and is simultaneously or continuously on the production line. a step of laminating a low shrinkage process and a thermosetting layer, It is preferable from the viewpoint of cost and improvement of the sliding resistance as a case of the conductive film. In a preferred embodiment of the present invention, the hardened layer of the bridging material which has been hardened into a film can be used for the PET from the roll shape. The film is continuously supplied with a pET film while applying a stress of 50 kg/cm 2 of 2 kg/cm 2 s on one side, by a wafer coater, a reverse coater, a gravure coater, a micro gravure coater, a spray coater, Slot coating machine, roll coating machine, screen printing, etc., coating bridging materials, bridging materials are hot bridging materials, by setting 1 〇〇 ° (: to 18 〇 1 furnace, so It is made by hardening and coiling, etc. At this time, it is 100. (: ~180. (: temperature, hardening of bridging material and heat treatment of PET film. In terms of productivity, it is usually appropriate to divide the furnace in i The furnace can be passed through 60 minutes. However, the furnace can be divided into several chambers, but the temperature can be adjusted to suppress the generation of bubbles, improve the hardening speed, and improve the smoothness of the cured film. In this method, it is not necessary to heat-treat the PET film in advance. Low shrinkage, which simplifies the point of 25 1291182 in the process It is more suitable. Moreover, the base system of the heat treatment of the PET film and the hardening layer hardening is also good. "In order to replace the thermal bridging material, the coated bridging material first makes the hunting by light bridging (for example) ··UV bridging property) or hardening of the bridging material by the electron beam to improve the thermal stability of the PET film, the same as the thermal bridging material. 'Before passing the furnace, apply the bridging material first, and set it to loot:~ 18 (After the furnace of TC, it is cured by ultraviolet rays or the like, or by setting it at 1 () (rc~18 (after rc furnace, cooling, coating of bridging material, by setting at 2 (rc~13 (rc degree) After the furnace is dried, it is made by irradiating ultraviolet rays or the like to harden it. For the purpose of the above-mentioned stabilization of the PET film, for example, when the hardness is raised to 311 or the like, and the material bridged by the light or the electron beam is applied and hardened, a conventional method can be employed. For example, a UV-curable resin is coated with a PET film by a gravure coater, dried, and irradiated with ultraviolet rays to harden it. The curing conditions of the optical bridging material include ultraviolet rays having a wavelength in the range of 2 〜 to 500 nm, and more preferably 〇丨 seconds or more, more preferably 〇 5 to 6 〇 seconds. Furthermore, the total amount of the irradiation amount is usually 3 〇 to 5, and the squeaking is 2, and as the light source, a low-pressure mercury lamp, a high-pressure mercury lamp, a carbon arc, a metal illuminating lamp, a mercury discharge lamp, a tungsten lamp can be used. , tooth lamp, sodium discharge tube, xenon discharge tube, and the like. The uranium shrinkage rate can be controlled by the tension of the pET film when the curable resin is applied, the furnace temperature, the hardening speed, and the like. The substrate having a low shrinkage ratio thus obtained is adhered to a conductive material by a method such as sputtering to form a conductive film, and a conductive film having a low shrink film as a base material can be obtained. In the case where the single side of the PET film has a hardened layer, the conductive material may be attached to either the surface on the side where the hardened layer is provided and the surface on the side where the hardened layer is not provided. As a method of forming a conductive film, any of conventional techniques such as a vacuum vapor deposition method, a lining method, and an ion plating method can be used, but from the viewpoint of uniformity of the film or adhesion of the film to the PET substrate, The film is formed by sputtering. The temperature at which the sputtering method is carried out is not particularly limited as long as it can impart a resistance value suitable for TP, but 6 〇 t: 〜20 (TC is preferable. In order to sufficiently oxidize the IT ruthenium film, the ι 〇 〇 film is promoted. Adhesiveness, 6Gt: preferably above, better &amp; (8). c or more. If 2(8).c or more, the oligomer remaining in the PET film will precipitate, making it white and turbid, which is not suitable. In the case of a high temperature, it is also possible to produce a koji, but the pET film which is stabilized by the thermosetting resin of the present invention also has a feature of not causing surface curvature. Further, the film material for conductivity is not particularly limited. For example, metal oxides such as tin oxide, indium tin oxide (called IT〇), tin oxide such as antimony, tin fluoride oxide, and zinc oxide may be used. Gold, silver, platinum, palladium, and copper may also be used. And aluminum, nickel, chromium, titanium, cobalt, tin, or a mixture of these or the like, and the thickness of the 'electric thin film' is not particularly limited as long as it can impart conductivity, but may be 5 Å or more. If it is too thin, the surface resistance value becomes high, and it is used as an electrode of tantalum. ^_Ω/□ or more, it is difficult to be a good performance film with a good 'electricity. On the other hand, if it is too thick, the transparency will be lowered, so the suitable thickness is 100 to 2000 Å. As a conductive material, From the viewpoint of the conductivity of the material, it is preferable to use 271 1291182 4 4 to sputter the ITO attacher, but the ITO is generally amorphous at the time of adhesion. In order to improve the scratch resistance and the sliding resistance, Environmental stability, it is known that the heat treatment is performed as described above to crystallize ruthenium. In the case of a conductive film requiring high reliability, the crystallization treatment is increased, but the crystallization treatment is carried out at a high temperature for 1 to several tens of hours. Further, the ruthenium film is expensive, and the slidability is not necessarily sufficient. The conductive film using the low-shrinkage substrate of the present invention can achieve excellent slidability even when amorphous enamel which is conventionally considered to have poor slidability is used. Further, in the case of using a conductive film of crystallized yttrium, the sliding resistance is also improved. In the case of using a conductive film of crystallization ruthenium, the sliding resistance is not necessarily sufficient, possibly because of the heat used for crystallization of ruthenium. However, although the strength or compactness of the crucible is increased, the PET film expands and contracts due to the application of heat, and since the expansion ratio and the shrinkage ratio of the ITO and the PET film are different, a large stress remains in the ITO layer. Any one of amorphous ITO and some or almost all of the crystalline ITO can be used in the present invention, but from the viewpoint of not requiring crystallization treatment and reducing cost, the advantage of using amorphous ITO is very large. On the opposite side of the PET film, if a high refractive material is adhered and a low refractive material is attached thereto, a highly reflective conductive film can be formed. The high refractive material can be vapor deposited or sputtered. Titanium oxide or zirconium oxide is attached, or these particles are contained in a material hardened by ultraviolet rays or heat to be hardened and adhered. The low refractive material can be deposited by vapor deposition or sputtering to adhere Si Ox (X = 1 to 2) or the like of the dielectric body shown below, and the fluorine resin can be cured by heat or ultraviolet rays. This layer for low reflection is applied to either side of the PET film or can be applied to both sides for further low reflection 28 1291182. In recent years, the demand for high transmittance 2TP is high, and it is suitable for use in forming a reflection preventing layer. It may be preferable to form a transparent dielectric film on the conductive film to further improve transparency and scratch resistance. The dielectric film is preferably smaller than the refractive index of the conductive film, and usually has a refractive index of 13 to 18, and is preferably used in the case where SiOx is relatively inexpensive. These materials can be used in combination of two or more kinds. The film thickness of the dielectric body is not particularly limited, but is usually i(9) to side A, and more preferably 鸠 to 1500A. If it is too thin, it is difficult to obtain a continuous film, and if it is too thick, conductivity or transparency is deteriorated, and cracks are likely to occur. Further, when the conductive film is used in a display device or the like, fingerprints or dirt may be generated on the surface thereof during processing or use. In order to solve this problem, it is also possible to (4) form the opposite outermost layer of the surface of the conductive film to adhere the waterproof or antifouling layer. As a material having such an effect, for example, a ruthenium-containing compound consisting of: δ containing dimethyl (tetra) oxy- and/or methyl-diene (tetra) oxygen: δ; Fluoride is not used alone or in combination with sulphuric acid, such as fluorinated eucalyptus « &amp; Jil, fluorinated with difluoroethylene, etc. The formation method of these is not particularly limited. Depending on the material, the coating method/vacuum evaporation method, the money method, the holding method, the Gongwang old, the Yangyi, _, 4 may be employed. The thickness of the treatment layer is not particularly limited to 疋 '通# should be 1 〇〇Α to lL ^ 八 to 50 &quot; This treatment can also be combined with two types, and it is more efficient to use only the yoke right in combination with the curable resin. In the above description, the conductive film of the present invention has good slidability, and the substrate may be used as the first substrate, and the surface of the substrate opposite to the conductive film of the M ^ ^ ^ substrate may be further advanced via the subsequent layer. Second substrate. Here, it is not limited to 29 1291182 〇: base body, and the second base body can also improve the slidability by the method of the above-mentioned method of making the heat shrinkage rate low. It is also preferable to use only the first substrate *, , -, , and "', but the method of the present invention is used to make both substrates low-shrinking', and the sliding resistance effect is increased.

::具:此類第二基體之構成,亦可例如:於形成有前 α ¥包1·生薄膜之低收縮基體之另一面,經由透明黏著劑層 、口透明基體。此貼合係於透明基體上^置黏著劑層, 於此貼合形成有前述導電性薄膜之低收縮基體,或者相反 地於形成有雨述導電性薄膜之低收縮基體上,設置黏著 』層於此貼合透明基體均可。從可使膜基劑成為輥狀, 連續形成黏著劑層的觀點來看,於前述低收縮基體上設置 黏著劑層係於生產面較有利。 又,亦可例如:於前述低收縮之第一基體上,經由透明 之黏著劑層’貼合第二透明基體,使總厚度在4〇〜扇㈣ 以内之後,於前述基體上設置導電性薄膜。 作為黏著·,只要是具有透日祕者均可,可無特別限 制地使用,可舉例如·丙烯酸系黏著劑n系黏著劑、 橡膠系«#丨等。從提升導t性膜之耐擦傷性及打點特性 的觀點來看,宜將其彈性係數設定於1χ1〇5〜ixi〇7d%/cm2 之範圍,將厚度設定K1/zm以上,通常設定於5〜l〇〇//m 之範圍。若上述彈性係數未滿lxl05dyn/cm2,由於黏著劑 層為非彈性,因此由於加壓容易變形,於基體甚至導電性 薄膜產生凹凸,或者黏著劑同於從加工切斷面溢出,而且 減低耐擦傷性及打點特性之提升效果。另一方面,彈性係 30 1291182 • &lt; 數若超過lxl07dyn/cm'黏著劑層變硬,無法期待其緩衝 效果’因Λ無法提升耐擦傷性及打點特纟,不能期待貼合 :斤帶來的效果。又,若黏著劑層之厚度未滿一,仍舊不 b』待/、緩衝效果,因此無法提升㈤擦傷性及打點特性, 不能期待貼合所帶來的效果。再者,錢厚,會破壞透明 ^或者在黏著劑層之形成或透明基體之貼合作業性、進 而在成本面,難以獲得好結果。 具有第二基體之構成之經由黏著劑層而貼合之第二基體 :於貼合此之後亦要求可撓性之情況,若塑膠膜未特別要 求可撓{·生之^况,係使用玻璃板、膜狀或板狀之塑膠。透 月基體為塑膠膜之情況,前述低收縮之膜或其他塑膠 膜均可;作為具體材料’可舉出:聚醯亞胺、聚㈣、聚:: The composition of the second substrate may be, for example, a transparent adhesive layer or a transparent substrate on the other side of the low-shrinkage matrix on which the front film is formed. The bonding is performed on the transparent substrate, and the adhesive layer is disposed thereon, and the low-shrinkage substrate on which the conductive film is formed is bonded thereto, or the adhesive layer is provided on the low-shrinkage substrate on which the conductive film is formed. Here, the transparent substrate can be attached. From the viewpoint that the film base can be formed into a roll shape and the adhesive layer is continuously formed, it is advantageous to provide an adhesive layer on the low shrinkage substrate on the production surface. Moreover, for example, a conductive film may be disposed on the substrate after the second transparent substrate is bonded to the first substrate of the low shrinkage via the transparent adhesive layer to a total thickness of 4 〇 to 4 (four). . The adhesive can be used without any particular limitation, and may be, for example, an acrylic adhesive n-based adhesive or a rubber-based «#丨. From the viewpoint of improving the scratch resistance and the dot characteristics of the t-retardant film, the elastic modulus should be set in the range of 1χ1〇5 to ixi〇7d%/cm2, and the thickness should be set to K1/zm or more, usually set at 5 The range of ~l〇〇//m. If the elastic modulus is less than lxl05dyn/cm2, since the adhesive layer is inelastic, the pressure is easily deformed, and unevenness is generated in the substrate or even the conductive film, or the adhesive is the same as overflowing from the cut surface, and the abrasion resistance is reduced. Enhancement of sex and management characteristics. On the other hand, the elastic system 30 1291182 • &lt; If the number exceeds lxl07dyn/cm, the adhesive layer becomes hard, and the cushioning effect cannot be expected. 'Because it cannot improve the scratch resistance and the spotting characteristics, it cannot be expected to fit: Effect. Moreover, if the thickness of the adhesive layer is not full, the effect of the adhesive layer is still not improved, and the scratching property and the dot characteristics cannot be improved, and the effect of the bonding cannot be expected. Furthermore, if the money is thick, it will break the transparency. Or, in the formation of the adhesive layer or the cooperation of the transparent substrate, it is difficult to obtain good results on the cost side. A second substrate having a structure of a second substrate adhered via an adhesive layer: flexibility is also required after bonding, and if the plastic film is not particularly required to be flexible, the glass is used. Plate, film or plate plastic. In the case where the moon base is a plastic film, the above-mentioned low-shrink film or other plastic film may be used; as a specific material, it may be exemplified by polyimine, poly(tetra), and poly.

鍵鱗綱、聚瑞酿gfc 取工X 人-夂S日來丙烯、聚醯胺、聚丙烯酸、乙醯基 纖維素、聚芳酸醋、聚颯、冰片浠系之聚合物等。冰片埽 系聚口物3有將具有冰片烯構造之單體及按照需要所添加 之其他聚合性單體’進行開環聚合或附加聚合所獲得之聚 ^物’可例示:日本Z卿股份有限公司之非極性冰片稀系 二 之商ασ名輪.ZE〇NEX4ZE〇NOR、JSR股份有限二 司之極性冰片稀系聚合物之商品名稱:術⑽、三 股份有限公司之、土 H么Μ A 千 ' 席糸永θ物之商品名稱:ABEL、或許 國一公司所開發之商品名稱:7一 於在此所舉出者,含有含冰片烯系構造體之聚合物。 ==基體之構成之經由黏著劑層所貼合之第二透 月土體之厂予度,宜為2〜300 ,m之範圍。若比2”薄,盈 31 !291182 • * 法產生機械強度,缺乏製成貼合構造的意義,於使此基體 成為輥狀,塗布黏著劑層,或進行後述之硬塗層處理等連 績作業時,不僅會伴隨困難,亦可能於貼合產生皺紋等。 以此觀點,厚度宜為1 〇 # m以上,2 0 // m以上尤佳。若為3 〇 〇 以上,製成輥狀時會產生捲摺,不僅難以連續作業, 而且由於殘留有捲摺,無法使用。以此觀點,較佳厚度為 250 #m以下,更好是23()/Ζίη以下。 如以上,本發明係使含有PET膜之基體以15(rc加熱2小 • 時之後之熱收縮率,於MD及TD均為〇·5%以下,以便獲得 一種導電性膜,其係於作為ΤΡ之電極使用之情況,即使於 製造工序暴露在高溫之情況,仍不致產生翹曲,電極位置 之紊亂小,且耐滑動性極端地改善者。特別是藉由在一面 以loot〜18CTC進行熱處理,一面使架橋性樹脂硬化於 PET膜之基體,使導電膜附著所獲得之導電性膜,係於上 述财滑動性極端優異。 本發明之觸控面板用導電性膜之製造方法係具有··基體 • 準備工序,其係準備基體,該基體至少具有由PET膜所形 成之層,及架橋性物質已硬化成膜之硬化層,在以1 5〇它加 - 熱1小時之後之長度方向(MD)及寬度方向(TD)之收縮 率均為〇·5%以下;及導電膜附著工序,其係使導電膜附著 於藉由前述基體準備工序所準備之基體者;於前述基體準 備工序,以100C至180°c間之溫度,將pET膜進行熱處理 之同時,或以10(TC至18(TC間之溫度,將PET膜進行熱處 理之後,使架橋性物質在前述PET膜之至少一面硬化,以 32 1291182 Μ * Λ 使至少1層之硬化層硬化成膜而形成。若根據本發明之製造 方法,可獲得一種導電性膜,其係即使於製造工序暴露在 高溫之情況,仍不致產生翹曲,電極位置之紊亂小,且耐 滑動性極端地改善者。 最有效的方法最初於PET膜塗布熱架橋型樹脂,以100°c 〜1 80°C之溫度保持數分鐘至數小時,以使之乾燥、硬化之 方法。若根據此方法,能以一工序同時達到PET膜之尺寸 安定性及熱安定性,且製造滑動性極優異之導電性膜。在 工序上成為2工序,但亦可預先以100°C〜180°C,將PET膜 進行熱處理,於其塗布以熱、光或電子線架橋之樹脂,使 之硬化。如此所獲得之架橋性物質已硬化之PET膜,其後 係因應目的而進一步層疊架橋型硬化層。於層疊有該硬化 層之PET膜,附著有ITO等導電層。於本發明,在無機系之 ITO等導電層附著之前,必須使PET膜對於熱之收縮率減低 ,且安定化。 又,於前述基體準備工序,若根據以100°C至180°C間之 &gt; 溫度,將PET膜進行熱處理之後,且前述PET膜冷卻至室溫 之前,使架橋性物質在前述PET膜之至少一面硬化,以使 至少1層之硬化層硬化成膜而形成之方法,可簡單地製造耐 滑動性良好之導電性膜。 特別是藉由使用未進行低收縮處理之二軸延伸PET膜, 以100°C至180°C間之温度,將PET膜進行熱處理之同時, 使藉由熱所架橋硬化之硬化層在前述PET膜之至少一面硬 化而形成,可使用廉價的材料,無需預先將PET膜進行熱 33 1291182 處理之工序,且可製造耐滑動性極為優異之導電性膜。 以下’以實施例更具體說明此發明。 (實施例1 )於二軸延伸之厚188 # ^之PET膜(東洋紡織 製八4300)之一面,於輥上以張力1〇kg/cm2連續供給,並且 以凹版塗層機,將丙烯酸樹脂(總研化學製U_230 ) 100重 夏部及硬化劑(日本聚胺甲酸乙酯工業社製CORONET L) 30重量部溶解於甲苯1〇〇重量部之溶液,塗布成乾燥後之塗 布層厚度為2/zni。 Φ 一面以5m/分之速度,將此連續供給至設定於120°C、140 c、150°c、130°c之分別長5m之4室所組成之乾燥爐,一 面進行乾燥,同時使丙烯酸樹脂硬化。所獲得之膜設為膜 A1。於此膜A1之塗層面之相反面,藉由能以輥狀連續供給 膜A1之濺鍍裝置’在氬氣8〇%及氧2〇%所組成之〇·〇〇4τ〇η 之氣氛中,藉由採用銦一錫合金之反應性濺鍍法,使厚度 450Α之氧化銦及氧化錫之複合氧化物(ΙΤ〇)所組成之透 明非晶性導電性薄膜附著,獲得全光線透過率88·2%、表 _ 面電阻值420Ω/□之導電性膜(膜Β1)。此膜之特性評估結 果係表示於表1-1至1-3。亦即,膜Α之熱收縮率記載於表Μ . ,膜Β之特性值記載於表1-2,膜Β之作為TP之電極之特性 記載於表1-3。 (貫施例2 )除了使非晶性IT〇附著於膜幻之塗層面,以 取代使非晶性ΙΤΟ附著於膜八丨之塗層面之相反面以外,與 貫施例相同地獲得膜Β2。於表丨_ i表示特性評估結果。 (實施例3)與實施例}相同地獲得膜A1之後,於此塗層 34 4 * 1291182 面’以晶片塗層機’將中國塗料製之i 〇〇重量部之AUREX 344及5部之IRUGACURE 184添加於甲苯1〇〇重量部之溶液 (塗層劑、/谷液),連續地塗布成厚度為3 # m。與實施例i 相同’將鈾述膜以20m/分供給至4室所組成、設定於7〇°c、 looc、lioc、9〇°c之乾燥爐以進行乾燥之後,以120W/cm 之同壓水銀燈照射紫外線,使之硬化,獲得膜A3。於此膜 A3之塗層面之相反面,與實施例工相同,使非晶性附著 ,獲得膜B3。特性評估結果表示於表^。 • (實施例4)除了於實施例1所獲得之膜A1之塗層面,使 用於貝施例3之塗層劑溶液添加平均粒徑8 &quot; m之石夕粒子5 重$部,並混合均勻之溶液以外,與實施例3相同地塗布、 乾燥硬化,獲得膜A4。於此膜A4之塗層面之相反面,與 實施例1相同地使非晶性ITO附著,獲得膜B4。於表^表 示特性評估結果。 (貫施例5 )除了於實施例3所獲得之膜A3之塗層面之相 反面,將於貫施例3之塗層劑溶液添加平均粒徑8 # m之石夕 籲粒子2重量部,並使混合均勻之溶液相同地塗布、乾燥、硬 化獲彳于兩面塗層之膜A5。於此膜A5之含石夕粒子之塗層面 - ,與灵施例1相同地使非晶性1丁0附著,獲得膜B5。於表 表示特性評估結果。 (貫施例6 )於實施例4所獲得之膜A4之塗層面之相反面 ,使與實施例4完全相同之塗層液塗布、乾燥、硬化,獲得 兩面塗層之膜A6。於此膜A6之最初塗層側之塗層面,與實 ^例1相同地使非晶性1TO附著,獲得膜B6。於表卜1表示 35 1291182 Λ Μ Λ 特性評估結果。 (實施例7〜9 )使用實施例3之膜A3、實施例5之膜Α5 、實施例6之膜A6,依序藉由濺鍍法,於ιτο面之下設置厚 度500 A之Ti〇2層及厚度600 A之Si〇2層之後,與實施例1相同 地使ITO附著,獲得膜B7、膜B8、膜B9。於表1-1表示特性 ’ 評估結果。 (實施例10)於二軸延伸之厚188//m之PET膜(東洋紡 織製A4300 ),以晶片塗層機,將實施例3之中國塗料製之 _ AUREX 344稀釋於甲苯之溶液,塗布成厚度6//m,以張力 l〇kg/cm連續地供給’通過分別設定於1⑼。c、12〇 C、150C之4室所組成之乾燥爐以乾燥之後,以i2〇w/cm 之高壓水銀燈照射紫外線,使之硬化,獲得膜a7。於此膜 A7,與實施例1相同,使ITO附著,獲得膜B10。特性評估 結果表不於表。 (實施例11 )於實施例1〇之膜A7之塗層面之相反面,將 含有實施例5之矽粒子之塗層液,與實施例5相同地塗布、 _ 乾燥、硬化,獲得膜A8。於此膜A8之含矽粒子之塗布面, 依序藉由錢鑛使與實施例7相同構成之Ti〇2、Si〇2、IT〇附 • 著’獲得膜Β11。於表1-1表示特性評估結果。 ’ (實施例12〜13 )於實施例1,除了使熱硬化樹脂之塗布 後之乾燥速度設為3m/分及i〇m/分,以製造膜A9及A10以外 ,完全相同地獲得膜B12及膜B13。於表U表示特性評估 結果。 (貝施例14 )將厚188 // m之東洋紡織製A4300之輥,放 36 4 - 1291182 置於《又在1 50 C之恆溫層24小時,進行熱處理。於此塗布與 實施例4相同之UV硬化型之塗布液。與實施例*相同地乾燥 後,使之硬化,獲得A11。於A11,與實施例4相同地使ιτ〇 附著,獲得Β 14。於表1 -1表示特性評估結果。 (比杈例1 )不塗布塗層液,於二軸延伸之厚i 8 8 /z m之 • PET膜(東洋紡織製A4300)(膜A12),與實施例丨相同地附 著ITO ’獲得膜B 1 5。於表1 -1表示特性評估結果。 (比較例2 )於膜A12之單面,將實施例3之中國塗料製 【表1 -1】 • 之AUREX 344稀釋於曱苯之溶液,塗布成厚度6 ,通過 为別设疋於80C、100C、100°C、100°C之4室所組成之乾 燥爐以乾燥之後,以120W/cm之高壓水銀燈照射紫外線, 使之硬化,獲得膜A13,與實施例1相同,使IT〇附著,獲 得膜Β16。特性評估結果表示於表^。 實施例及比較例 膜Α種類 150°C處理1小辑 ^後之熱收縮率 MD ( % ) TD ( % ) 實施例1 A1 0.35 0.10 實施例2 A1 0.35 0.10 實施例3 A3 0.32 0.08 實施例4 A4 0.31 ^ 0.08 實施例5 A5 0.30 0.08 實施例6 A6 0.30 0.08 實施例7 A3 0.32 0.08 實施例8 A5 0.30 0.08 實施例9 A6 0.30 0.08 實施例1 0 A7 0.38 0.13 實施例1 1 A8 0.36 0.12 實施例1 2 A9 0.22 0.05 貫施例1 3 A10 0.43 0.13 實施例1 4 All 0.40 0.12 比較例1 A12 1.28 0.60 比較例2 A13 1.05 0.53 37 1291182 •熱收縮率係將l〇cm&amp;方之膜A,放置於設定為150°C之電 爐中1小時之後,冷卻至室溫,從加熱前後之尺寸所算出。 【表1-2】 實施例及 比較例 膜B 透過率 (% ) 電阻值 (Ω/Π ) ITO之相反 面錯筆硬度 霾值 (% ) 實施例1 B1 88.2 420 2H 0.8 實施例2 B2 87.8 418 B 0.8 實施例3 B3 88.0 422 3H 0.8 實施例4 B4 87.9 420 3H 5.3 實施例5 B5 88.0 425 3H 1.5 實施例6 B6 87.8 418 3H 9.8 實施例7 B7 92.3 420 3H 1.0 實施例8 B8 92.0 423 3H 1.5 實施例9 B9 87.8 422 3H 9.9 實施例1 0 B10 88.3 425 3H 1.0 實施例11 B11 92.6 一 409 3H 1.6 實施例12 B12 88.4 418 2H 0.8 ^施例1 3 B13 88.1 419 2H 0.9 ^施例14 B14 87.0 420 3H 12.5 比較例1 B15 87.8 420 B 1.2 比較例2 B16 88.0 425 3H 1.3 電阻值係採用4端子法,以寬度700mm、長度lm,等 間隔測定5 0點,計算平均值求出。 •透過率係採用分光透過計,測定波長550nm之光之透 過率。 •鉛筆硬度係使用三菱Uni,以荷重5〇〇g,1〇次不會留 . 下擦痕之硬度。 , ·霾值係以霾值計測定平行透過率及擴散透過率所算 出0 【表1-3】 實施例及 150〇C、1 250g 、 1〇 5〇〇g 、 30 250g 、 10 500g 、 30 比較例 小時後之 萬次直線 萬次直線 萬次文字 萬次文字 輕曲 / \ 滑動後之 滑動後之 滑動後之 滑動後之 (mm ) 電阻值變 電阻值變 電阻值變 電阻值變 化(% ) 化(% ) 化(% ) 38 1291182 ΛKey squama, Jurui Gfc, X-man S, propylene, polyacrylamide, polyacrylic acid, ethyl phthalocyanine, polyarylate, polyfluorene, borneol, etc. The borneol lanthanum yoke 3 has a polymer obtained by subjecting a monomer having a norbornene structure and other polymerizable monomers added as needed to ring-opening polymerization or additional polymerization, which can be exemplified: Japan Z. The company's non-polar borneol rare two of the business ασ name round. ZE〇NEX4ZE〇NOR, JSR shares limited two division of polar borneol thin polymer product name: surgery (10), three companies, soil H Μ A The product name of the product is: ABEL, perhaps the product name developed by Guoyi Company: 7 I, as mentioned here, contains a polymer containing a borneol-based structure. == The factory of the second moon-crossing body to which the composition of the substrate is bonded via the adhesive layer is preferably in the range of 2 to 300 m. If it is thinner than 2", the 31:291182 • * method produces mechanical strength and lacks the meaning of making a bonded structure. This substrate is made into a roll shape, coated with an adhesive layer, or subjected to hard coating treatment as described later. In the case of work, not only will it be accompanied by difficulties, but also wrinkles may be applied to the fit. From this point of view, the thickness is preferably 1 〇# m or more, and more preferably 2 0 // m or more. If it is 3 〇〇 or more, it is made into a roll shape. In the case of a roll-to-fold, it is not only difficult to work continuously, but also cannot be used because of the residual crimp. From this viewpoint, the thickness is preferably 250 #m or less, more preferably 23 () / Ζίη or less. As described above, the present invention is The substrate containing the PET film was heated at a temperature of 2 rc for 2 hours, and the MD and TD were both 5% or less in order to obtain a conductive film which was used as an electrode of ruthenium. Even if the manufacturing process is exposed to high temperatures, warpage does not occur, the position of the electrode is less disordered, and the sliding resistance is extremely improved. In particular, the bridge resin is made by heat treatment on one side at a temperature of loot to 18 CTC. Hardened to the base of the PET film The conductive film obtained by adhering the conductive film is extremely excellent in the above-described slidability. The method for producing a conductive film for a touch panel of the present invention has a substrate preparation step for preparing a substrate having at least a substrate. The layer formed of the PET film and the hardened layer in which the bridging material has been hardened into a film, and the shrinkage ratios in the length direction (MD) and the width direction (TD) after being heated for 1 hour at 15 Torr are all 〇 5% or less; and a conductive film adhesion step of adhering the conductive film to the substrate prepared by the substrate preparation step; and performing the pET film at a temperature between 100 C and 180 ° C in the substrate preparation step At the same time of heat treatment, or at a temperature of 10 (TC to 18 (temperature between TC, after the heat treatment of the PET film, the bridging material is hardened on at least one side of the PET film, and at least one layer of the hardened layer is made by 32 1291182 Μ * Λ It is formed by hardening a film. According to the manufacturing method of the present invention, a conductive film can be obtained which does not cause warpage even when the manufacturing process is exposed to a high temperature, has small disturbance of electrode position, and is resistant to sliding. Extremely improved. The most effective method is to apply a heat-bridge type resin to a PET film, and keep it at a temperature of 100 ° C to 180 ° C for several minutes to several hours to dry and harden it. It is possible to simultaneously achieve the dimensional stability and thermal stability of the PET film in one step, and to produce a conductive film having excellent slidability. The process is two steps, but it may be 100 ° C to 180 ° C in advance. The PET film is subjected to heat treatment, and is coated with a resin bridging by heat, light or electrons to be hardened. The thus obtained bridging material has a hardened PET film, and thereafter, a bridging type hardened layer is further laminated in accordance with the purpose. A conductive film such as ITO is adhered to the PET film in which the hardened layer is laminated. In the present invention, before the inorganic layer of ITO or the like is adhered, it is necessary to reduce the shrinkage rate of the PET film with respect to heat and to stabilize it. Further, in the substrate preparation step, after the PET film is heat-treated at a temperature between 100 ° C and 180 ° C, and the PET film is cooled to room temperature, the bridging material is allowed to be in the PET film. A method of forming at least one surface of a hardened layer to form a film by hardening at least one layer of the hardened layer can easily produce a conductive film having excellent sliding resistance. In particular, by using a biaxially stretched PET film which is not subjected to a low shrinkage treatment, the PET film is heat-treated at a temperature between 100 ° C and 180 ° C, and a hardened layer hardened by heat is bridged in the aforementioned PET. At least one surface of the film is formed by hardening, and an inexpensive material can be used, and it is not necessary to carry out the process of treating the PET film by heat 33 1291182 in advance, and it is possible to produce a conductive film which is extremely excellent in sliding resistance. The invention is more specifically described below by way of examples. (Example 1) One side of a PET film (8,300, manufactured by Toyobo Co., Ltd.) having a thickness of 188 # ^ extending in two directions was continuously supplied on a roll at a tension of 1 〇 kg/cm 2 , and an acrylic resin was used as a gravure coater. (U.S. Chemical Co., Ltd. U_230) 100 heavy summer portion and hardener (CORONET L manufactured by Japan Polyurethane Co., Ltd.) 30 parts by weight of a solution dissolved in a toluene 1 〇〇 weight portion, and coated to a thickness of a coating layer after drying 2/zni. Φ One side is continuously supplied to a drying furnace composed of four chambers each set at 120 ° C, 140 c, 150 ° c, and 130 ° C, 5 m long, at a speed of 5 m/min, while drying, while making acrylic The resin is hardened. The obtained film was designated as film A1. On the opposite side of the coated surface of the film A1, an atmosphere of 溅·〇〇4τ〇η composed of argon gas 8〇% and oxygen 2〇% can be continuously supplied to the film A1 by a sputtering apparatus in a roll form. A transparent amorphous conductive film composed of a composite oxide of indium oxide and tin oxide having a thickness of 450 Å is adhered by a reactive sputtering method using an indium-tin alloy to obtain a total light transmittance. 88·2%, a conductive film (film Β1) having a surface resistance of 420 Ω/□. The evaluation results of the properties of this film are shown in Tables 1-1 to 1-3. That is, the heat shrinkage rate of the film is described in Table 1-2, and the characteristic values of the film are described in Table 1-2, and the characteristics of the electrode as the TP of the film are described in Table 1-3. (Example 2) The same procedure as in the example was obtained except that the amorphous IT〇 was attached to the surface of the film of the film, instead of the opposite side of the coated surface of the film gossip. Membrane Β 2. The table _ i indicates the characteristic evaluation result. (Example 3) After obtaining the film A1 in the same manner as in the example}, the coating layer 34 4 * 1291182 was used as the wafer coating machine to make the AUREX 344 and the 5 parts of the IRUGACURE of the weight of the Chinese paint. 184 was added to the toluene 1 〇〇 weight portion of the solution (coating agent, / gluten solution), and continuously applied to a thickness of 3 # m. In the same manner as in the example i, the uranium film was supplied to a drying oven of 7 ° C, looc, lioc, and 9 ° C at 20 m/min to dry, and then dried at 120 W/cm. The mercury lamp is irradiated with ultraviolet rays to harden it to obtain a film A3. On the opposite side of the coated surface of the film A3, as in the embodiment, the amorphous layer was adhered to obtain the film B3. The results of the characteristic evaluation are shown in Table 2. • (Example 4) In addition to the coating surface of the film A1 obtained in Example 1, the coating agent solution of Example 3 was used to add an average particle size of 8 &quot; m to the stone particles of 5 parts, and The film was uniformly coated and dried in the same manner as in Example 3 except that the solution was uniformly mixed to obtain a film A4. On the opposite side to the coated surface of the film A4, amorphous ITO was adhered in the same manner as in Example 1 to obtain a film B4. The characteristics evaluation results are shown in Table 2. (Example 5) In addition to the opposite side of the coating surface of the film A3 obtained in Example 3, the coating agent solution of Example 3 was added with a weight of 8 # m of Shi Xiyu particles 2 parts by weight. And uniformly mixing the solution, coating, drying, and hardening to obtain a film A5 coated on both sides. On the coated surface of the film A5 containing the zealand particles, amorphous 1 butyl was adhered in the same manner as in the case of the example 1 to obtain a film B5. The table shows the results of the characteristic evaluation. (Example 6) On the opposite side to the coated surface of the film A4 obtained in Example 4, the coating liquid identical to that of Example 4 was applied, dried, and hardened to obtain a film A6 of the double-coated layer. On the coating surface on the first coating side of the film A6, amorphous 1TO was adhered in the same manner as in Example 1 to obtain a film B6. In Table 1, the results of the evaluation of the characteristics of 35 1291182 Λ Μ 。 are indicated. (Examples 7 to 9) Using the film A3 of Example 3, the film of the film of Example 5, and the film A6 of Example 6, a film of a thickness of 500 A was placed under the surface of the film by a sputtering method. After the layer and the Si 2 layer having a thickness of 600 A, ITO was adhered in the same manner as in Example 1 to obtain a film B7, a film B8, and a film B9. The characteristics of the evaluation results are shown in Table 1-1. (Example 10) A PET film (A4300 manufactured by Toyobo Co., Ltd.) having a thickness of 188/m in two-axis extension was prepared by diluting a solution of AUREX 344 of the Chinese coating of Example 3 into toluene by a wafer coater. The thickness was 6/m, and the continuous supply 'passage was set to 1 (9) at a tension of l〇kg/cm. After drying in a drying oven consisting of four chambers of c, 12, C, and 150C, ultraviolet rays were irradiated with a high-pressure mercury lamp of i2 〇 w/cm to harden it to obtain a film a7. In the film A7, as in Example 1, ITO was adhered to obtain a film B10. The evaluation of the characteristics is not shown in the table. (Example 11) The coating liquid containing the cerium particles of Example 5 was applied, dried, and cured in the same manner as in Example 5 on the opposite side to the coated surface of the film A7 of Example 1 to obtain a film A8. . On the coated surface of the ruthenium-containing particles of the film A8, Ti 〇 2, Si 〇 2, and IT 相同 having the same structure as in Example 7 were sequentially attached to the film Β 11 to obtain the film Β 11 . The results of the characteristic evaluation are shown in Table 1-1. (Examples 12 to 13) In the first embodiment, except that the drying speed after application of the thermosetting resin was set to 3 m/min and i〇m/min, the film B12 was obtained in the same manner except for the production of the films A9 and A10. And film B13. The characteristics evaluation results are shown in Table U. (Bei Shi Example 14) The A4300 roll of Toyo Kogyo, 188 // m thick, was placed in a constant temperature layer of 1 50 C for 24 hours for heat treatment. The same UV-curable coating liquid as in Example 4 was applied thereto. After drying in the same manner as in Example *, it was hardened to obtain A11. In A11, ιτ〇 was attached in the same manner as in Example 4 to obtain Β14. The results of the characteristic evaluation are shown in Table 1-1. (Comparative Example 1) No coating liquid was applied, and a PET film (A4300 manufactured by Toyobo Co., Ltd.) (film A12) having a thickness of i 8 8 /zm extending in two directions was attached, and ITO was attached in the same manner as in Example 获得 to obtain film B. 1 5. The results of the characteristic evaluation are shown in Table 1-1. (Comparative Example 2) On the single side of the film A12, AUREX 344 of the Chinese coating material of Example 3 [Table 1-1] was diluted with a solution of toluene, and applied to a thickness of 6 and set to 80C by After drying in a drying oven composed of four chambers of 100 C, 100 ° C, and 100 ° C, ultraviolet rays were irradiated with a high-pressure mercury lamp of 120 W/cm to harden it, and a film A13 was obtained, and the IT crucible was attached in the same manner as in Example 1. Membrane Β 16 was obtained. The results of the characteristic evaluation are shown in Table 2. EXAMPLES AND COMPARATIVE EXAMPLES Membrane type 150 ° C treatment 1 small heat contraction rate MD (%) TD (%) Example 1 A1 0.35 0.10 Example 2 A1 0.35 0.10 Example 3 A3 0.32 0.08 Example 4 A4 0.31 ^ 0.08 Example 5 A5 0.30 0.08 Example 6 A6 0.30 0.08 Example 7 A3 0.32 0.08 Example 8 A5 0.30 0.08 Example 9 A6 0.30 0.08 Example 1 0 A7 0.38 0.13 Example 1 1 A8 0.36 0.12 Example 1 2 A9 0.22 0.05 Example 1 3 A10 0.43 0.13 Example 1 4 All 0.40 0.12 Comparative Example 1 A12 1.28 0.60 Comparative Example 2 A13 1.05 0.53 37 1291182 • The heat shrinkage rate is 1〇cm&amp; After 1 hour in an electric furnace set to 150 ° C, it was cooled to room temperature and calculated from the dimensions before and after heating. [Table 1-2] Example and Comparative Example Film B Transmittance (%) Resistance Value (Ω/Π) ITO's opposite facet pen hardness 霾 value (%) Example 1 B1 88.2 420 2H 0.8 Example 2 B2 87.8 418 B 0.8 Example 3 B3 88.0 422 3H 0.8 Example 4 B4 87.9 420 3H 5.3 Example 5 B5 88.0 425 3H 1.5 Example 6 B6 87.8 418 3H 9.8 Example 7 B7 92.3 420 3H 1.0 Example 8 B8 92.0 423 3H 1.5 Example 9 B9 87.8 422 3H 9.9 Example 1 0 B10 88.3 425 3H 1.0 Example 11 B11 92.6 a 409 3H 1.6 Example 12 B12 88.4 418 2H 0.8 ^ Example 1 3 B13 88.1 419 2H 0.9 ^ Example 14 B14 87.0 420 3H 12.5 Comparative Example 1 B15 87.8 420 B 1.2 Comparative Example 2 B16 88.0 425 3H 1.3 The resistance value was determined by a 4-terminal method using a width of 700 mm and a length of lm at intervals of 50 points. • Transmittance is measured by a spectroscopic transmission meter to measure the transmittance of light with a wavelength of 550 nm. • The hardness of the pencil is Mitsubishi Uni, and the load is 5〇〇g, which will not stay for 1 time. The hardness of the under scratch. · Depreciation is calculated by measuring the parallel transmittance and the diffuse transmittance by a 霾 value. [Table 1-3] Examples and 150 〇C, 1 250g, 1〇5〇〇g, 30 250g, 10 500g, 30 After the comparison example, the 10,000-time straight line, the 10,000-time straight line, the 10,000-time text, the text, the light, the light, the sliding value, the sliding value, the sliding resistance, the sliding resistance, the resistance value, the resistance value, the resistance value, the resistance value Change (%) (%) (%) 38 1291182 Λ

爐60分鐘,測定端部之浮起。 直線滑動性及文字滑動性係經由玻璃ΙΤ〇及間隔物 ’做成ΤΡ模組,實施滑動性測試。 直線β動性係以〇』R聚縮駿筆,施加25〇§及5〇〇g之荷 重,10萬次之情況則來回5萬次,30萬次之情況則15 萬-人來回,測定該部分之電阻值,計算電阻值從初始 值之上升比例。 •文字滑動性亦與直線滑動性相同地測定。 。如實施例所示可知,本發明之觸控面板用導電性膜係15〇 C、1小時之加熱處理後之翹曲小,且即使實施作為TP之 電極使用時之直線及文字滑動性測試,電阻值之變化仍小 ’成為具有極優異之耐環境性及耐久性tTP之電極。 【圖式簡單說明】 圖1A係表示本發明之觸控面板用導電性膜之一例之圖。 圖1B係表示本發明之觸控面板用導電性膜之其他一例 39 1291182 之圖。 圖1 c係表示本發 X乃之觸控面板用導 之圖。 v電性臈之其他一例 明之觸控面板用導電性膜之其他一例 之觸控面板用導電性膜之其他一例之 圖1D係表示本發 之圖。 圖1E係表示本發明 圖 例之 圖1F係I示本發明之觸控面板用導電性膜之其他一 圖 【主要元件符號說明】 1 基體 2 導電膜 3 由聚對苯二曱酸乙二酯膜(PET膜) 所形成之層 4、4a、4b 硬^[匕層 40The furnace was allowed to float for 60 minutes. The linear slidability and the text slidability were measured by a squeegee test using a glass crucible and a spacer ′. The linear β-moving system uses the load of 25〇§ and 5〇〇g, and the back and forth is 50,000 times in 100,000 times, and 150,000-person back and forth in 300,000 times. The resistance value of this part is calculated as the ratio of the increase of the resistance value from the initial value. • Text slidability is also measured in the same manner as linear slidability. . As shown in the examples, the conductive film for a touch panel of the present invention has a small warpage after heat treatment at 15 〇C for 1 hour, and the straight line and text slidability test when used as an electrode of TP is performed. The change in resistance value is still small' to become an electrode with excellent environmental resistance and durability tTP. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1A is a view showing an example of a conductive film for a touch panel of the present invention. Fig. 1B is a view showing another example of a conductive film for a touch panel of the present invention 39 1291182. Fig. 1c is a view showing a guide for a touch panel of the present invention. Other examples of the conductive film for a touch panel Other examples of the conductive film for a touch panel are shown in Fig. 1D. 1A is a view showing a pattern of the present invention. FIG. 1F is a view showing another embodiment of the conductive film for a touch panel of the present invention. [Main component symbol description] 1 Base 2 Conductive film 3 is made of polyethylene terephthalate film. (PET film) formed layers 4, 4a, 4b hard ^ [匕 layer 40

Claims (1)

4 1291182 Μ 4 拾、申請專利範圍: 1. 一種觸控面板用導電性膜,其特徵在於:在至少具有 由聚對苯二甲酸乙二酯膜所形成之層,及架橋性物質已硬 化成膜之硬化層之基體上,形成導電膜而成;前述基體在 以150C加熱1小時之後之長度方向(MD)及寬度方向 )之收縮率均為〇·5%以下。 2·如申請專利範圍第丨項所述之觸控面板用導電性膜, 其中作為硬化層者,基體係具有熱架橋性物質已硬化成膜 之硬化層。 3·如申請專利範圍第2項所述之觸控面板用導電性膜, 其中基體係進一步具有:藉由光或電子線之架橋性物質已 硬化成膜之硬化層。4 1291182 Μ 4 Pickup, Patent Application Range: 1. A conductive film for a touch panel, characterized in that at least a layer formed of a polyethylene terephthalate film and a bridging substance have been hardened A conductive film was formed on the substrate of the hardened layer of the film; and the shrinkage ratio of the substrate in the longitudinal direction (MD) and the width direction after heating at 150 C for 1 hour was 5% or less. The conductive film for a touch panel according to the above aspect of the invention, wherein the base system has a hardened layer in which a heat bridge material has been hardened into a film. The conductive film for a touch panel according to claim 2, wherein the base system further comprises a hardened layer which has been hardened into a film by a bridging material of light or electron wires. 如申請專利範圍第3項所述之觸控面板用導電性膜, 基體係於藉由聚對苯二甲酸乙二酯膜所形成之層之兩 具有藉由光或電子線之架橋性物質已硬化成膜之硬化 5·如申請專利範圍第丨項所述之觸控面板用導電性膜, 其中導電膜為非晶性ITO (氧化銦錫)。 6.如申請專利範圍第〗項所述之觸控面板用導電性膜, 其藉由預先在處理成以150它加熱丨小時之後之長度方向( MD )及寬度方向(TD )之收縮率均為〇·5%以下之基體, 使導電膜附著所獲得。 7·如申請專利範圍第6項所述之觸控面板用導電性膜, 其中至少1層之硬化層係在以l〇(rc至l8〇〇c間之溫度,將聚 41 1291182 4 » * 斐^ 一 ΤΓ^ —、文乙二酯臈進行熱處理之同時,或以10(TC至180 蚀力之'置度’將聚對苯二甲酸乙二醋膜進行熱處理之後, 使錢性物質在前述聚對苯二甲酸乙二㈣之至少—面硬 化所獲得。 8· 一種觸控面板用導電性膜之製造方法,其特徵在於具 有·基體準備工序,其係準備基體,該基體至少具有由聚 對苯一甲酸乙二酯膜所形成之層,及架橋性物質已硬化成 膜之硬化層,在以150°C加熱1小時之後之長度方向(MD &gt; )及寬度方向(TD)之收縮率均為〇.5%以下;及 導電膜附著工序,其係使導電膜附著於藉由前述基體準 備工序所準備之基體者;於前述基體準備工序,以1〇〇〇c至 180 C間之溫度,將聚對苯二甲酸乙二酯膜進行熱處理之同 時,或以100°C至180°C間之溫度,將聚對苯二甲酸乙二酯 膜進行熱處理之後,使架橋性物質在前述聚對苯二甲酸乙 二酯膜之至少一面硬化,以使至少1層之硬化層硬化成膜而 形成。 42The conductive film for a touch panel according to claim 3, wherein the base system is formed of a polyethylene terephthalate film and has a bridging substance by light or electron wires. The conductive film for a touch panel according to the above aspect of the invention, wherein the conductive film is amorphous ITO (indium tin oxide). 6. The conductive film for a touch panel according to the above-mentioned claim, which has a shrinkage ratio in a length direction (MD) and a width direction (TD) after being heated for 150 hours in advance. It is obtained by attaching a conductive film to a substrate of 5% or less. 7. The conductive film for a touch panel according to claim 6, wherein at least one of the hardened layers is at a temperature between 1 rc and 18 〇〇c, and the poly 41 1291182 4 » Fiji ^ ΤΓ — 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 The at least one of the polyethylene terephthalate (four) is obtained by surface hardening. 8. A method for producing a conductive film for a touch panel, comprising: a substrate preparation step of preparing a substrate, the substrate having at least a layer formed of a polyethylene terephthalate film and a hardened layer in which a bridging material has been hardened into a film, and a length direction (MD &gt;) and a width direction (TD) after heating at 150 ° C for 1 hour The shrinkage ratio is 5% or less; and the conductive film adhesion step of attaching the conductive film to the substrate prepared by the substrate preparation step; in the substrate preparation step, from 1 〇〇〇c to 180 C Temperature between the polyethylene terephthalate film At the same time, after the polyethylene terephthalate film is heat-treated at a temperature between 100 ° C and 180 ° C, the bridging material is hardened on at least one side of the polyethylene terephthalate film. It is formed by hardening at least one layer of the hardened layer into a film.
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